TWI785197B - 半導體裝置的製造方法及膜狀接著劑 - Google Patents

半導體裝置的製造方法及膜狀接著劑 Download PDF

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TWI785197B
TWI785197B TW108103160A TW108103160A TWI785197B TW I785197 B TWI785197 B TW I785197B TW 108103160 A TW108103160 A TW 108103160A TW 108103160 A TW108103160 A TW 108103160A TW I785197 B TWI785197 B TW I785197B
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Taiwan
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film
adhesive
semiconductor element
component
semiconductor device
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TW108103160A
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Chinese (zh)
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TW201936829A (zh
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山崎智陽
中村祐樹
橋本慎太郎
菊地健太
舛野大輔
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日商昭和電工材料股份有限公司
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    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
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    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
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    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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    • H01L23/00Details of semiconductor or other solid state devices
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    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
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    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/46Structure, shape, material or disposition of the wire connectors prior to the connecting process of a plurality of wire connectors
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    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
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    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
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    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
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    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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    • H01L2224/4809Loop shape
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
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    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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    • H01L2224/732Location after the connecting process
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    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Die Bonding (AREA)
  • Adhesive Tapes (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Dicing (AREA)
TW108103160A 2018-01-30 2019-01-28 半導體裝置的製造方法及膜狀接著劑 TWI785197B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
PCT/JP2018/003021 WO2019150444A1 (ja) 2018-01-30 2018-01-30 半導体装置の製造方法、及びフィルム状接着剤
??PCT/JP2018/003021 2018-01-30
WOPCT/JP2018/003021 2018-01-30

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TW201936829A TW201936829A (zh) 2019-09-16
TWI785197B true TWI785197B (zh) 2022-12-01

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JP (1) JP6988923B2 (ja)
KR (1) KR102429210B1 (ja)
CN (1) CN111630642B (ja)
SG (1) SG11202004755QA (ja)
TW (1) TWI785197B (ja)
WO (1) WO2019150444A1 (ja)

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Publication number Priority date Publication date Assignee Title
CN111819672A (zh) * 2018-03-08 2020-10-23 日立化成株式会社 半导体装置的制造方法及膜状粘接剂
CN117170005B (zh) * 2023-08-19 2024-08-06 荣谕科技(成都)有限公司 镜片组件及加工方法

Citations (3)

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US20100035381A1 (en) * 2008-08-06 2010-02-11 Kabushiki Kaisha Toshiba Method of manufacturing stacked semiconductor device
JP2014175459A (ja) * 2013-03-08 2014-09-22 Hitachi Chemical Co Ltd 半導体装置及び半導体装置の製造方法
TW201506117A (zh) * 2013-06-04 2015-02-16 Nitto Denko Corp 熱固型晶片接合薄膜、附切割薄片的晶片接合薄膜及半導體裝置的製造方法

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JPH11238856A (ja) * 1998-02-23 1999-08-31 Mitsubishi Electric Corp 半導体記憶装置、半導体記憶装置の製造方法及び該製造方法に用いる保護シート
JP2004217859A (ja) * 2003-01-17 2004-08-05 Hitachi Chem Co Ltd 接着シートの製造方法、半導体装置およびその製造方法
JP4599800B2 (ja) * 2003-02-20 2010-12-15 日立化成工業株式会社 接着シートの製造方法、半導体装置およびその製造方法
JP2004323543A (ja) * 2003-04-21 2004-11-18 Nitto Denko Corp 光学部材用粘着剤組成物、光学部材用粘着剤層、粘着型光学部材および画像表示装置
JP2005103180A (ja) 2003-10-02 2005-04-21 Matsushita Electric Ind Co Ltd 洗濯機
US8017444B2 (en) * 2004-04-20 2011-09-13 Hitachi Chemical Company, Ltd. Adhesive sheet, semiconductor device, and process for producing semiconductor device
KR20090128400A (ko) * 2007-02-28 2009-12-15 스미토모 베이클리트 컴퍼니 리미티드 반도체용 접착 필름 및 그것을 이용한 반도체 장치
JP5524465B2 (ja) 2007-10-24 2014-06-18 日立化成株式会社 接着シート及びこれを用いた半導体装置およびその製造方法
JP2010118554A (ja) * 2008-11-13 2010-05-27 Nec Electronics Corp 半導体装置およびその製造方法
JP5736899B2 (ja) * 2011-03-28 2015-06-17 日立化成株式会社 フィルム状接着剤、接着シート及び半導体装置
JP6114149B2 (ja) * 2013-09-05 2017-04-12 トヨタ自動車株式会社 半導体装置
JP6603479B2 (ja) 2015-05-18 2019-11-06 日東電工株式会社 接着フィルム、ダイシングテープ一体型接着フィルム、複層フィルム、半導体装置の製造方法および半導体装置

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Publication number Priority date Publication date Assignee Title
US20100035381A1 (en) * 2008-08-06 2010-02-11 Kabushiki Kaisha Toshiba Method of manufacturing stacked semiconductor device
JP2014175459A (ja) * 2013-03-08 2014-09-22 Hitachi Chemical Co Ltd 半導体装置及び半導体装置の製造方法
TW201506117A (zh) * 2013-06-04 2015-02-16 Nitto Denko Corp 熱固型晶片接合薄膜、附切割薄片的晶片接合薄膜及半導體裝置的製造方法

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WO2019150444A1 (ja) 2019-08-08
TW201936829A (zh) 2019-09-16
KR102429210B1 (ko) 2022-08-03
SG11202004755QA (en) 2020-06-29
JPWO2019150444A1 (ja) 2021-01-07
JP6988923B2 (ja) 2022-01-05
CN111630642A (zh) 2020-09-04
KR20200112820A (ko) 2020-10-05
CN111630642B (zh) 2023-05-26

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