TWI745250B - 搬運裝置及解析系統 - Google Patents
搬運裝置及解析系統 Download PDFInfo
- Publication number
- TWI745250B TWI745250B TW110108832A TW110108832A TWI745250B TW I745250 B TWI745250 B TW I745250B TW 110108832 A TW110108832 A TW 110108832A TW 110108832 A TW110108832 A TW 110108832A TW I745250 B TWI745250 B TW I745250B
- Authority
- TW
- Taiwan
- Prior art keywords
- aforementioned
- grid
- image data
- information
- control unit
- Prior art date
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2007—Holding mechanisms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20292—Means for position and/or orientation registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/208—Elements or methods for movement independent of sample stage for influencing or moving or contacting or transferring the sample or parts thereof, e.g. prober needles or transfer needles in FIB/SEM systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| WOPCT/JP2020/016525 | 2020-04-15 | ||
| PCT/JP2020/016525 WO2021210087A1 (ja) | 2020-04-15 | 2020-04-15 | 搬送装置および解析システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI745250B true TWI745250B (zh) | 2021-11-01 |
| TW202141674A TW202141674A (zh) | 2021-11-01 |
Family
ID=78083575
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110108832A TWI745250B (zh) | 2020-04-15 | 2021-03-12 | 搬運裝置及解析系統 |
| TW110137003A TWI765830B (zh) | 2020-04-15 | 2021-03-12 | 搬運裝置及解析系統 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110137003A TWI765830B (zh) | 2020-04-15 | 2021-03-12 | 搬運裝置及解析系統 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12586751B2 (https=) |
| JP (1) | JP7322284B2 (https=) |
| KR (1) | KR102734341B1 (https=) |
| TW (2) | TWI745250B (https=) |
| WO (1) | WO2021210087A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7322284B2 (ja) * | 2020-04-15 | 2023-08-07 | 株式会社日立ハイテク | 搬送装置および解析システム |
| JP7842907B2 (ja) * | 2023-01-31 | 2026-04-08 | 株式会社日立ハイテク | 搬送方法、搬送装置および解析システム |
| WO2024257241A1 (ja) * | 2023-06-13 | 2024-12-19 | 株式会社日立ハイテク | 搬送容器 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040144924A1 (en) * | 2003-01-17 | 2004-07-29 | Peter Emile Stephan Joseph Asselbergs | Method for the manufacture and transmissive irradiation of a sample, and particle-optical system |
| US20060186337A1 (en) * | 2005-02-18 | 2006-08-24 | Michio Hatano | Scanning electron microscope |
| US20120112064A1 (en) * | 2009-04-22 | 2012-05-10 | Yasuhira Nagakubo | Sample holder, method for use of the sample holder, and charged particle device |
| TW201942936A (zh) * | 2018-02-20 | 2019-11-01 | 日商日立高新技術科學股份有限公司 | 帶電粒子束裝置、帶電粒子束裝置的載臺驅動範圍限制方法以及程式 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58169762A (ja) * | 1982-03-30 | 1983-10-06 | Internatl Precision Inc | 電子線装置 |
| JPS61101945A (ja) | 1984-10-24 | 1986-05-20 | Hitachi Ltd | 電子顕微鏡の試料ホルダ− |
| US5783830A (en) * | 1996-06-13 | 1998-07-21 | Hitachi, Ltd. | Sample evaluation/process observation system and method |
| JPH1064473A (ja) | 1996-06-13 | 1998-03-06 | Hitachi Ltd | 試料評価・処理観察システム |
| JP4923716B2 (ja) * | 2006-05-11 | 2012-04-25 | 株式会社日立製作所 | 試料分析装置および試料分析方法 |
| JP4205122B2 (ja) * | 2006-07-19 | 2009-01-07 | 株式会社日立ハイテクノロジーズ | 荷電粒子線加工装置 |
| JP5410286B2 (ja) | 2006-10-20 | 2014-02-05 | エフ・イ−・アイ・カンパニー | S/temのサンプルを作成する方法およびサンプル構造 |
| JP2011080869A (ja) | 2009-10-07 | 2011-04-21 | Bridgestone Corp | 試験片の観察用メッシュ及び試験片の観察方法 |
| JP5476115B2 (ja) | 2009-12-21 | 2014-04-23 | 日本電子株式会社 | グリッドを用いた試料ホルダ |
| JP5930922B2 (ja) | 2012-09-14 | 2016-06-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び試料観察方法 |
| US9601305B2 (en) | 2013-11-11 | 2017-03-21 | Howard Hughes Medical Institute | Specimen sample holder for workpiece transport apparatus |
| JP6711655B2 (ja) * | 2016-03-18 | 2020-06-17 | 株式会社日立ハイテクサイエンス | 集束イオンビーム装置 |
| JP6636839B2 (ja) * | 2016-03-28 | 2020-01-29 | 株式会社日立ハイテクサイエンス | 試料ホルダー、集束イオンビーム装置 |
| DE112016006484B4 (de) * | 2016-03-31 | 2022-02-03 | Hitachi, Ltd. | Ladungsträgerstrahlvorrichtung sowie Steuerverfahren |
| CN111033676B (zh) * | 2017-09-04 | 2022-08-30 | 株式会社日立高新技术 | 带电粒子线装置 |
| WO2019207707A1 (ja) * | 2018-04-26 | 2019-10-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| DE112018007565B4 (de) * | 2018-07-02 | 2024-02-08 | Hitachi High-Tech Corporation | Rasterelektronenmikroskop |
| JP7212592B2 (ja) * | 2019-07-12 | 2023-01-25 | 株式会社荏原製作所 | 調整方法及び電子線装置 |
| US12347707B2 (en) * | 2020-02-27 | 2025-07-01 | Hitachi High-Tech Corporation | Semiconductor analysis system |
| JP7322284B2 (ja) * | 2020-04-15 | 2023-08-07 | 株式会社日立ハイテク | 搬送装置および解析システム |
| JP2025101945A (ja) | 2023-12-26 | 2025-07-08 | 株式会社クボタ | 作業車両 |
-
2020
- 2020-04-15 JP JP2022514912A patent/JP7322284B2/ja active Active
- 2020-04-15 KR KR1020227034356A patent/KR102734341B1/ko active Active
- 2020-04-15 US US17/917,973 patent/US12586751B2/en active Active
- 2020-04-15 WO PCT/JP2020/016525 patent/WO2021210087A1/ja not_active Ceased
-
2021
- 2021-03-12 TW TW110108832A patent/TWI745250B/zh active
- 2021-03-12 TW TW110137003A patent/TWI765830B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040144924A1 (en) * | 2003-01-17 | 2004-07-29 | Peter Emile Stephan Joseph Asselbergs | Method for the manufacture and transmissive irradiation of a sample, and particle-optical system |
| US20060186337A1 (en) * | 2005-02-18 | 2006-08-24 | Michio Hatano | Scanning electron microscope |
| US20120112064A1 (en) * | 2009-04-22 | 2012-05-10 | Yasuhira Nagakubo | Sample holder, method for use of the sample holder, and charged particle device |
| TW201942936A (zh) * | 2018-02-20 | 2019-11-01 | 日商日立高新技術科學股份有限公司 | 帶電粒子束裝置、帶電粒子束裝置的載臺驅動範圍限制方法以及程式 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI765830B (zh) | 2022-05-21 |
| KR102734341B1 (ko) | 2024-11-27 |
| TW202205508A (zh) | 2022-02-01 |
| US12586751B2 (en) | 2026-03-24 |
| JP7322284B2 (ja) | 2023-08-07 |
| US20230126577A1 (en) | 2023-04-27 |
| TW202141674A (zh) | 2021-11-01 |
| JPWO2021210087A1 (https=) | 2021-10-21 |
| WO2021210087A1 (ja) | 2021-10-21 |
| KR20220151185A (ko) | 2022-11-14 |
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