KR102734341B1 - 반송 장치 및 해석 시스템 - Google Patents

반송 장치 및 해석 시스템 Download PDF

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Publication number
KR102734341B1
KR102734341B1 KR1020227034356A KR20227034356A KR102734341B1 KR 102734341 B1 KR102734341 B1 KR 102734341B1 KR 1020227034356 A KR1020227034356 A KR 1020227034356A KR 20227034356 A KR20227034356 A KR 20227034356A KR 102734341 B1 KR102734341 B1 KR 102734341B1
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South Korea
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mesh
holder
information
image data
control unit
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KR1020227034356A
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Korean (ko)
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KR20220151185A (ko
Inventor
나오후미 고바야시
겐이치 니시나카
츠네노리 노마구치
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주식회사 히타치하이테크
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/208—Elements or methods for movement independent of sample stage for influencing or moving or contacting or transferring the sample or parts thereof, e.g. prober needles or transfer needles in FIB/SEM systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020227034356A 2020-04-15 2020-04-15 반송 장치 및 해석 시스템 Active KR102734341B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/016525 WO2021210087A1 (ja) 2020-04-15 2020-04-15 搬送装置および解析システム

Publications (2)

Publication Number Publication Date
KR20220151185A KR20220151185A (ko) 2022-11-14
KR102734341B1 true KR102734341B1 (ko) 2024-11-27

Family

ID=78083575

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227034356A Active KR102734341B1 (ko) 2020-04-15 2020-04-15 반송 장치 및 해석 시스템

Country Status (5)

Country Link
US (1) US12586751B2 (https=)
JP (1) JP7322284B2 (https=)
KR (1) KR102734341B1 (https=)
TW (2) TWI745250B (https=)
WO (1) WO2021210087A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7322284B2 (ja) * 2020-04-15 2023-08-07 株式会社日立ハイテク 搬送装置および解析システム
JP7842907B2 (ja) * 2023-01-31 2026-04-08 株式会社日立ハイテク 搬送方法、搬送装置および解析システム
WO2024257241A1 (ja) * 2023-06-13 2024-12-19 株式会社日立ハイテク 搬送容器

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010257617A (ja) 2009-04-22 2010-11-11 Hitachi High-Technologies Corp 試料ホールダ，該試料ホールダの使用法、及び荷電粒子装置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58169762A (ja) * 1982-03-30 1983-10-06 Internatl Precision Inc 電子線装置
JPS61101945A (ja) 1984-10-24 1986-05-20 Hitachi Ltd 電子顕微鏡の試料ホルダ−
US5783830A (en) * 1996-06-13 1998-07-21 Hitachi, Ltd. Sample evaluation/process observation system and method
JPH1064473A (ja) 1996-06-13 1998-03-06 Hitachi Ltd 試料評価・処理観察システム
NL1022426C2 (nl) * 2003-01-17 2004-07-26 Fei Co Werkwijze voor het vervaardigen en transmissief bestralen van een preparaat alsmede deeltjes optisch systeem.
JP4636897B2 (ja) * 2005-02-18 2011-02-23 株式会社日立ハイテクサイエンスシステムズ 走査電子顕微鏡
JP4923716B2 (ja) * 2006-05-11 2012-04-25 株式会社日立製作所 試料分析装置および試料分析方法
JP4205122B2 (ja) * 2006-07-19 2009-01-07 株式会社日立ハイテクノロジーズ 荷電粒子線加工装置
JP5410286B2 (ja) 2006-10-20 2014-02-05 エフ・イ−・アイ・カンパニー Ｓ／ｔｅｍのサンプルを作成する方法およびサンプル構造
JP2011080869A (ja) 2009-10-07 2011-04-21 Bridgestone Corp 試験片の観察用メッシュ及び試験片の観察方法
JP5476115B2 (ja) 2009-12-21 2014-04-23 日本電子株式会社 グリッドを用いた試料ホルダ
JP5930922B2 (ja) 2012-09-14 2016-06-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
US9601305B2 (en) 2013-11-11 2017-03-21 Howard Hughes Medical Institute Specimen sample holder for workpiece transport apparatus
JP6711655B2 (ja) * 2016-03-18 2020-06-17 株式会社日立ハイテクサイエンス 集束イオンビーム装置
JP6636839B2 (ja) * 2016-03-28 2020-01-29 株式会社日立ハイテクサイエンス 試料ホルダー、集束イオンビーム装置
DE112016006484B4 (de) * 2016-03-31 2022-02-03 Hitachi, Ltd. Ladungsträgerstrahlvorrichtung sowie Steuerverfahren
CN111033676B (zh) * 2017-09-04 2022-08-30 株式会社日立高新技术 带电粒子线装置
JP2019145304A (ja) * 2018-02-20 2019-08-29 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、荷電粒子ビーム装置のステージ駆動範囲制限方法およびプログラム
WO2019207707A1 (ja) * 2018-04-26 2019-10-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112018007565B4 (de) * 2018-07-02 2024-02-08 Hitachi High-Tech Corporation Rasterelektronenmikroskop
JP7212592B2 (ja) * 2019-07-12 2023-01-25 株式会社荏原製作所 調整方法及び電子線装置
US12347707B2 (en) * 2020-02-27 2025-07-01 Hitachi High-Tech Corporation Semiconductor analysis system
JP7322284B2 (ja) * 2020-04-15 2023-08-07 株式会社日立ハイテク 搬送装置および解析システム
JP2025101945A (ja) 2023-12-26 2025-07-08 株式会社クボタ 作業車両

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010257617A (ja) 2009-04-22 2010-11-11 Hitachi High-Technologies Corp 試料ホールダ，該試料ホールダの使用法、及び荷電粒子装置

Also Published As

Publication number Publication date
TWI745250B (zh) 2021-11-01
TWI765830B (zh) 2022-05-21
TW202205508A (zh) 2022-02-01
US12586751B2 (en) 2026-03-24
JP7322284B2 (ja) 2023-08-07
US20230126577A1 (en) 2023-04-27
TW202141674A (zh) 2021-11-01
JPWO2021210087A1 (https=) 2021-10-21
WO2021210087A1 (ja) 2021-10-21
KR20220151185A (ko) 2022-11-14

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