TWI733546B - Substrate processing apparatus - Google Patents

Abstract

The substrate processing apparatus 1 includes: a chemical tank 30; a first circulation pipe 31 connected to the chemical tank 30; a pump that sends the chemical solution in the chemical tank 30 to the first circulation pipe 31; and a second circulation pipe 32, which is branched and connected to the first circulation pipe 31; a filter 39, which is interposed in the first circulation pipe 31, and is installed in the upstream portion 33 on the upstream side than the connection position P2 of the second circulation pipe 32; and a pressure adjustment unit , Which adjusts the pressure of the liquid medicine flowing in the upstream portion 33. The pressure adjustment unit includes a regulator 71 that adjusts the opening degree of the second circulation pipe 32. The regulator 71 makes the pressure of the chemical liquid flowing in the upstream portion 33 in the circulating idle state of the substrate processing apparatus 1 coincide with or close to the pressure of the chemical liquid flowing in the upstream portion 33 in the ready state of the substrate processing apparatus 1.

Description

Substrate processing device

The invention relates to a substrate processing device. Examples of substrates to be processed include semiconductor wafers, substrates for liquid crystal display devices, and substrates for FPD (Flat Panel Display) such as organic EL (Electroluminescence) display devices, substrates for optical disks, and substrates for magnetic disks. , Magneto-optical disc substrate, photomask substrate, ceramic substrate, solar cell substrate, etc.

In the manufacturing steps of semiconductor devices, liquid crystal display devices, etc., a substrate processing apparatus that processes substrates such as semiconductor wafers or glass substrates for liquid crystal display devices is used.

As described in Japanese Patent Laid-Open No. 2013-175552 and Japanese Patent Laid-Open No. 2007-266211, this type of substrate processing apparatus includes: a processing unit; a processing liquid tank that stores processing liquid to be supplied to the processing unit; and a circulation piping , Which circulates the treatment liquid in the treatment liquid tank; a pump, which transports the treatment liquid in the treatment liquid tank to the circulation piping; and a filter, which filters the treatment liquid flowing in the circulation piping.

The inventors of this case studied the installation of two circulation pipes. Specifically, the research setup: the outer circulation piping, which is connected to the treatment liquid tank and supplies the treatment liquid to the treatment unit; and the inner circulation piping, whose branches are connected to the outer circulation piping.

In this case, it is considered that a filter is installed in the upstream part of the outer circulation piping that is closer to the upstream side than the connection position of the inner circulation piping in the outer circulation piping. In order to keep the processing liquid flowing in the inner circulation piping and/or the outer circulation piping clean, it is necessary to constantly maintain the particulate trapping ability of the filter.

The particle capture capacity of the filter changes with the pressure of the liquid applied to the filter. When the particle capturing ability of the filter decreases, the particles previously captured by the filter may leak from the filter and contaminate the downstream side of the filter.

The main reason for the reduced particle capture ability of the filter is not just this. The clogging of the filter due to the supply of a large amount of particles to the filter will also reduce the particle capturing ability of the filter.

In addition, if the amount of particles in the treatment liquid flowing in the inner circulation pipe and/or the outer circulation pipe can be measured, the treatment solution containing a large amount of particles can also be eliminated from the inner circulation pipe and/or the outer circulation pipe.

Therefore, one of the objectives of the present invention is to provide a substrate processing apparatus capable of supplying a clean processing liquid with a small particle content to a processing unit.

A first aspect of the present invention provides a substrate processing apparatus, which includes: a processing unit having a discharge port for discharging a processing liquid to a substrate; a processing liquid tank that stores the processing liquid supplied to the discharge port; and an external circulation The piping includes the upstream end and the downstream end connected to the processing liquid tank, and together with the processing liquid tank, it forms a circulation flow path that circulates the processing liquid in the processing liquid tank; a pump that circulates the processing liquid in the processing liquid tank The processing liquid is sent to the outer circulation pipe; the discharge port communication pipe is branched and connected to the outer circulation pipe at the first connection position and communicates with the discharge port; the inner circulation pipe is closer to the first connection position The second connection position on the upstream side is branched and connected to the outer circulation piping, and is formed with the portion of the outer circulation piping that is more upstream than the second connection position, that is, the second upstream side portion and the treatment tank to form the treatment tank. The internal circulation flow path in which the treatment liquid in the tank circulates, and returns the treatment liquid supplied from the outer circulation pipe to the treatment liquid tank; a filter, which is interposed in the second upstream part; a pressure adjustment unit, which Adjusting the pressure of the processing liquid flowing in the second upstream part; and a control device that controls the pressure adjusting unit in such a way that the processing liquid does not circulate in the outer circulation flow path but the processing liquid is in the inner The pressure of the treatment liquid flowing in the second upstream part in the circulation state of one side of the circulation flow path and the treatment liquid circulating in both the outer circulation flow path and the inner circulation flow path are in a dual circulation state The pressure of the processing liquid flowing in the second upstream part is the same or close to each other.

The particle capture ability of the filter will vary depending on the pressure applied to the filter. When pressure is applied to the filter, it can capture smaller particles than when no pressure is applied to the filter. Moreover, as the pressure applied to the filter increases, even smaller particles can be captured. Conversely, when the pressure applied to the filter decreases, the amount of particles that can be captured becomes larger, and the particle capture ability of the filter decreases. That is, the particle capturing ability of the filter changes according to the change of the pressure applied to the filter. When the particle capturing ability of the filter decreases, the particles previously captured by the filter may flow out of the filter to the secondary side.

On the other hand, when the pressure applied to the filter is too high, the flow rate and/or the flow velocity in the filter exceed the allowable, and as a result, there is a risk of particulates passing through the filter. In order to use the filter to better capture the particles, the pressure applied to the filter needs to be fixedly maintained.

According to the above configuration, the pressure adjusting unit is controlled in such a way that the pressure of the processing liquid flowing in the second upstream part in the state of one side of the circulation of the processing liquid in the inner circulation flow path is the same as the pressure of the processing liquid flowing in the outer circulation flow path. The pressure of the treatment liquid flowing in the second upstream part in the double-circulation state of both the internal circulation channel and the internal circulation channel is the same or close. Since the pressure applied to the filter in one cycle state is the same as or close to the pressure applied to the filter in the double cycle state, it does not vary depending on the circulation state of the treatment liquid, and the filter’s particle capture ability is fixed. .

Thereby, it is possible to suppress or prevent the trapped particles from leaking from the filter due to changes in the pressure applied to the filter. Therefore, a clean treatment liquid (preferably, a clean treatment liquid that does not contain particles) with less particulate content can be supplied to the processing unit.

In the first aspect, the pressure adjustment unit includes an opening adjustment unit that adjusts the opening of the internal circulation pipe.

According to the above configuration, the pressure of the processing liquid flowing in the second upstream portion is adjusted by adjusting the opening degree of the internal circulation pipe by the pressure adjusting unit. Thereby, the pressure of the processing liquid flowing in the second upstream portion can be adjusted with a simple structure.

In the first aspect, as the operating state of the substrate processing apparatus, there are selectively executable states: an executable state, which executes the above-mentioned two-cycle state; and a standby state, which is a state different from the above-mentioned executable state, And the power supply to the substrate processing apparatus is maintained; the standby state includes a cycle standby state that realizes the one cycle state.

According to the above configuration, the pressure adjusting unit is controlled in such a way that the pressure of the processing liquid flowing in the second upstream side portion in the circulation standby state of the substrate processing apparatus and the second upstream portion in the executable state of the substrate processing apparatus are controlled The pressure of the processing liquid flowing in the side part is the same or close. Since the pressure applied to the filter in the cycle standby state of the substrate processing apparatus is the same as or close to the pressure applied to the filter in the executable state of the substrate processing apparatus 1, it is not necessary for the operation state of the substrate processing apparatus to be the cycle standby state or The executable state is different, and the particle capture ability of the filter is fixed or substantially fixed.

In the first aspect, the standby state further includes a cycle stop standby state in which the power supply to the substrate processing apparatus is maintained while the pump is stopped, so that the outer circulation flow path and the inner circulation are stopped. The circulation of the treatment liquid in the flow path stops.

According to the above configuration, the standby state includes: a circulating standby state in which the processing liquid does not circulate in the outer circulation flow path but the processing liquid circulates in the inner circulation flow path; and a circulation stop standby state in which the driving of the pump is stopped (in Stop the circulation of the treatment liquid in both the outer circulation flow path and the inner circulation flow path).

In the circulation standby state, the treatment liquid does not circulate in the outer circulation flow path, but the treatment liquid circulates in the inner circulation flow path. Therefore, when the target part of the maintenance work is a part that does not affect the circulation of the processing liquid in the internal circulation flow path (for example, when performing maintenance work on the processing unit or the transport robot), the substrate processing device can be set to In the cyclic standby state, maintenance operations are performed while facing the substrate processing device.

On the other hand, when the maintenance object is a position that affects the circulation of the treatment liquid in the inner circulation flow path, it is impossible to perform maintenance work while circulating the treatment liquid in the inner circulation flow path. Therefore, in this case, the operation state of the substrate processing apparatus is set to the cycle stop standby state.

In this way, a plurality of standby states can be used separately according to the maintenance location. Therefore, the period during which the pump is in the stopped state can be shortened. Therefore, the operation rate of the substrate processing apparatus can be improved.

In the first aspect, the substrate processing apparatus further includes: an internal circulation valve installed in the internal circulation piping to open and close the internal circulation piping; and a drain piping that is branched and connected to the external at a third connection position The part of the circulation piping that is further downstream than the second connection position, that is, the second downstream part, discharges the processing liquid from the second downstream part; and the first switching unit, which displaces the second downstream part The destination of the treatment liquid on the upstream side than the third connection position is switched between the second downstream side portion on the downstream side than the third connection position and the discharge piping; When the cycle stop standby state transitions to the executable state, the following steps are executed, that is, start the drive of the pump, close the internal circulation valve, and make the second downstream side part more upstream than the third connection position The processing liquid flows into the discharge pipe to drive the first switching unit, thereby discharging the processing liquid in the second upstream portion and the processing liquid in the second downstream portion through the drainage pipe.

In the cycle stop standby state of the substrate processing device, stop the driving of the pump. In this state, the circulation of the treatment liquid is stopped, and there is no movement of the treatment liquid in the filter. At this time, no pressure is applied to the filter. Therefore, the particle capturing ability of the filter is reduced. Therefore, in the cycle stop standby state of the substrate processing apparatus, the particles captured by the filter flow out from the filter to the secondary side and are accumulated on the secondary side of the filter. When particles are accumulated on the secondary side of the filter, the pump is driven to start the circulation of the treatment liquid, and the particles accumulated on the secondary side of the filter diffuse in the outer circulation flow path and/or the inner circulation The whole area of the flow path is concerned.

According to the above configuration, when transitioning from the cycle stop standby state to the executable state, the processing liquid in the second upstream portion and the processing liquid in the second downstream portion are discharged to the outside of the substrate processing apparatus through the liquid discharge pipe. Thereby, it is possible to suppress or prevent the inner circulation flow path and/or the outer circulation flow path from being contaminated by the treatment liquid containing particles.

In the first aspect, the substrate processing apparatus further includes a selection unit operated by a user to select any one of a plurality of standby states including the cycle standby state and the cycle stop standby state.

According to the above configuration, by operating the selection unit by the user of the substrate processing apparatus (including maintenance personnel, etc.), the cycle standby state and the cycle stop standby state can be selectively executed.

In the first aspect, the substrate processing apparatus further includes a detection unit that detects a state related to the substrate processing apparatus, and detects the state by the detection unit in the cycle standby state In this case, the control device further executes the steps of stopping the driving of the pump and stopping the circulation of the processing liquid in the outer circulation flow path.

According to the above structure, when the predetermined state is detected by the detection unit in the cyclic standby state, the driving of the pump is stopped. That is, in this case, the circulation of the processing liquid in the internal circulation flow path is stopped. In the cycle standby state, maintenance work can be performed on the substrate processing apparatus. When the substrate processing device has a predetermined state, it is sometimes not appropriate to continue the maintenance operation.

Therefore, a configuration capable of detecting a predetermined state is adopted. When such a predetermined state is generated, the circulation of the subsequent processing liquid in the outer circulation flow path is stopped, thereby preventing the occurrence of undesirable things.

In a first aspect, the substrate processing apparatus includes a plurality of the processing units, the outer circulation piping includes a first circulation piping that supplies the processing liquid to the plurality of the processing units in common, and the discharge port communication pipe includes the plurality of processing units. The above-mentioned processing unit corresponds to a plurality of supply pipes one-to-one.

According to the above configuration, the supply pipe provided in one-to-one correspondence with the processing unit is branched and connected to the first circulation pipe, and the processing liquid flowing in the first circulation flow path is supplied to the processing unit via the supply pipe.

A second aspect of the present invention provides a substrate processing apparatus including: a processing unit having a discharge port for discharging a processing liquid to a substrate; a processing liquid tank that stores the processing liquid supplied to the discharge port; and an external circulation pipe, which It includes the upstream end and the downstream end connected to the above-mentioned treatment liquid tank, and together with the above-mentioned treatment liquid tank, forms a circulation flow path for circulating the treatment liquid in the above-mentioned treatment liquid tank; a pump which transfers the treatment liquid in the above-mentioned treatment liquid tank It is sent to the outer circulation pipe; the discharge port communication pipe is branched and connected to the outer circulation pipe at the first connection position and communicates with the discharge port; the inner circulation pipe is located on the upstream side than the first connection position The second connection position is branched and connected to the outer circulation piping, and is formed with the portion of the outer circulation piping that is more upstream than the second connection position, that is, the second upstream side portion and the treatment liquid tank to form the inside of the treatment liquid tank. The inner circulation flow path of the processing liquid circulating, and the processing liquid supplied from the outer circulation pipe is returned to the processing liquid tank; the first filter and the second filter, etc. are respectively interposed as the second upstream side Part of the first parallel pipe and second parallel pipe connected in parallel on the upstream side of the second connection position; the second switching unit will be connected in parallel than the upstream end of the first parallel pipe and the second parallel The fourth connection position where the upstream ends of the piping are connected to each other is closer to the destination of the treatment liquid on the upstream side, which is switched between the first parallel piping and the second parallel piping; and the control device, which is driven by the pump When the drive of the pump is started in the stopped state, the second switching unit is controlled to set the destination of the processing liquid on the upstream side of the fourth connection position to the second parallel pipe, and then the second switching is controlled The unit switches the destination of the processing liquid on the upstream side from the fourth connection position to the first parallel pipe.

In the state of stopping the drive of the pump, machine replacement, piping modification, etc. are sometimes carried out. After modification, etc., particles may adhere to the equipment. In this state, when the driving of the pump starts and the circulation of the treatment liquid starts, a large amount of particles attached to the equipment etc. may be supplied to the filter and the filter may become clogged. As a result, the particle capturing ability of the filter is reduced, and the particles may leak from the filter.

According to the above configuration, when starting the driving of the pump, the destination of the processing liquid on the upstream side of the fourth connection position is set to the second parallel pipe. When a predetermined time elapses thereafter, the destination of the processing liquid on the upstream side of the fourth connection position is switched to the first parallel pipe. That is, at the start of the driving of the pump, and beyond, the filter that captures the particles in the treatment liquid in the second upstream portion is switched between the first filter and the second filter. At the beginning of the driving of the pump, the second filter which is different from the normally used first filter is used to capture particulates, so that clogging of the normally used first filter can be suppressed. Thereby, the leakage of particles from the first filter can be suppressed or prevented. Therefore, a clean treatment liquid (preferably, a clean treatment liquid that does not contain particles) with less particulate content can be supplied to the processing unit.

In this case, the first filter is preferably different in filtration performance from the second filter. It is particularly desirable that the mesh of the second filter is thicker than the mesh of the first filter. If the pore size of the first filter is small, the particles trapped in the pores of the first filter occupy a larger proportion of the pores, which may easily cause clogging of the first filter.

In this case, at the start of the driving of the pump, relatively large particles can be captured by the second filter, and during other periods, relatively small particles can be captured by the first filter. Therefore, at the start of driving of the pump, the amount of particulates captured by the second filter can be suppressed, and therefore clogging of the second filter and leakage of particulates from the second filter can be suppressed.

A third aspect of the present invention provides a substrate processing apparatus, including: a processing unit having a discharge port for discharging a processing liquid to a substrate; a processing liquid tank that stores the processing liquid supplied to the discharge port; an external circulation pipe, which It includes the upstream end and the downstream end connected to the above-mentioned treatment liquid tank, and together with the above-mentioned treatment liquid tank, forms a circulation flow path for circulating the treatment liquid in the above-mentioned treatment liquid tank; a pump which transfers the treatment liquid in the above-mentioned treatment liquid tank It is sent to the outer circulation pipe; the discharge port communication pipe is branched and connected to the outer circulation pipe at the first connection position and communicates with the discharge port; the inner circulation pipe is located on the upstream side than the first connection position The second connection position is branched and connected to the outer circulation piping, and is formed with the portion of the outer circulation piping that is more upstream than the second connection position, that is, the second upstream side portion and the treatment liquid tank to form the inside of the treatment liquid tank. The inner circulation flow path of the treatment liquid circulating, and the treatment liquid supplied from the outer circulation piping is returned to the treatment liquid tank; and the pollution state measuring device, which is installed in the downstream area of the machine, and the pollution state of the downstream area of the machine In the measurement, the downstream area of the machine is set on the downstream side of the machine installed in the second upstream part in the middle of the second upstream part.

According to the above configuration, the pollution state measuring device installed in the downstream area of the equipment at the second upstream side portion measures the particles generated by the equipment. With the pollution state measuring device, not only the presence or absence of particles generated by the machine can be measured, but also the amount of particles generated by the machine can be measured. In addition, the pollution state measuring device is installed in the downstream area of the machine where the particles produced by the machine flow, so the amount of particles produced by the machine can be accurately measured.

Therefore, a clean treatment liquid (preferably, a clean treatment liquid that does not contain particles) with less particulate content can be supplied to the processing unit.

In a third aspect, the substrate processing apparatus includes: a plurality of the above-mentioned machines, which are interposed on the second upstream side part; and a plurality of the above-mentioned contamination state measuring devices, which are one-to-one with the plurality of the machines in the downstream area It corresponds to the ground, and is interposed in the second upstream side portion, and the plurality of the equipment downstream areas correspond to the plurality of the equipment on a one-to-one basis.

According to the above-mentioned configuration, the pollution state measuring device is installed in the downstream area of each device correspondingly. Based on the measured values of multiple pollution state measuring devices, the machine that becomes the source of particle generation can be identified.

In the third aspect, the substrate processing apparatus further includes: a plurality of discharge pipes, which are equal to a plurality of fifth connection positions provided for each of the downstream regions of the machine, branched and connected to the plurality of downstream regions of the machine; and 3 A switching unit that connects the destination of the processing liquid on the upstream side of the second upstream side portion than the fifth connection position to the downstream side of the second upstream side portion than the fifth connection position, and Switch between the above-mentioned drain piping connected to the downstream area of the machine.

According to the above configuration, the drain pipe is branched and connected to the downstream area of each device. When a device that is a source of particle generation is identified, the treatment liquid can be discharged to the downstream area of the device corresponding to the device through the liquid discharge pipe. In this case, the processing liquid containing the particles can be directly discharged through the downstream area of the machine corresponding to the machine that is the source of the particle generation. Thereby, it is possible to suppress or prevent the particles from diffusing in other parts of the second upstream part and the internal circulation pipe.

In a third aspect, the substrate processing apparatus further includes: a plurality of the third switching units, which correspond one-to-one with the plurality of discharge pipes; and a control device that controls the plurality of the third switching units ; When the number of particles contained in the processing liquid flowing in the downstream area of the machine exceeds the threshold value, the control device controls the third switching unit corresponding to the discharge pipe in the following manner, that is, the machine The destination of the processing liquid in the downstream area is switched to the liquid discharge pipe, and the processing liquid on the upstream side of the second upstream portion of the machine downstream area is discharged to the outside of the substrate processing apparatus.

According to the above configuration, when the number of particles contained in the processing liquid flowing in the downstream area of the machine (measured by the pollution state measuring device or calculated based on it) exceeds the threshold, it is judged to correspond to the downstream area of the machine The machine is the source of particle generation. Furthermore, by discharging the processing liquid containing the particles through the discharge pipe corresponding to the downstream area of the device, it is possible to suppress or prevent the particles from spreading to other parts of the second upstream portion and the internal circulation pipe.

In a third aspect, the substrate processing apparatus further includes: a plurality of the third switching units, which correspond one-to-one with the plurality of discharge pipes; and a control device that controls the plurality of the third switching units ; When the difference between the number of particles contained in the processing liquid flowing in the downstream areas of the two adjacent devices exceeds the threshold, the control device controls the third corresponding to the discharge pipe in the following manner The switching unit, that is, switches the destination of the processing liquid in the downstream area of the machine with a large number of particles to the liquid discharge pipe, and discharges the processing liquid on the upstream side of the second upstream part than the downstream area of the machine To the outside of the above-mentioned substrate processing device.

According to the above configuration, when the difference between the number of particles (measured value of the pollution state measuring device or calculated value based on it) contained in the processing liquid flowing in the downstream area of the adjacent equipment exceeds the threshold value, it is judged The machine corresponding to the downstream area of the machine with a large number of particles is the source of particle generation. Furthermore, by discharging the processing liquid containing the particles through the discharge pipe corresponding to the downstream area of the device, it is possible to suppress or prevent the particles from spreading to other parts of the second upstream portion and the internal circulation pipe.

In the third aspect, the substrate processing apparatus further includes: a bypass piping that connects the downstream region of the machine and the internal circulation piping, and is closer to the second upstream portion than the bypass piping is connected The part on the upstream side and the part of the inner circulation piping that is further downstream than the connection position of the bypass piping together form a bypass circulation flow path that circulates the treatment liquid in the treatment liquid tank; and a fourth switching unit, It places the destination of the processing liquid on the upstream side of the second upstream side portion than the sixth connection position connected to the bypass piping to the downstream side of the second upstream side portion than the sixth connection position, Switch with the bypass piping.

According to the above configuration, the bypass pipe connecting the downstream area of the device and the internal circulation pipe is branched and connected to the downstream area of each device. In the case of identifying the machine that is the source of particle generation, the processing liquid in the downstream area of the machine corresponding to the machine can be guided to the internal circulation piping via the bypass piping. In this case, the processing liquid containing the particles can be directly guided to the internal circulation piping from the downstream area of the machine corresponding to the machine that is the source of the particle generation. The treatment liquid containing particles is cleaned by passing through a filter installed in the bypass pipe. Thereby, it is possible to suppress or prevent the particles from diffusing in other parts of the second upstream part and the internal circulation pipe.

In a third aspect, the substrate processing apparatus further includes: a plurality of the bypass pipes; a plurality of the fourth switching units corresponding to the plurality of bypass pipes one-to-one; and a control device that controls The plurality of the fourth switching units; the control device switches the destination of the processing liquid in the downstream area of the machine when the number of particles contained in the processing liquid flowing in the downstream area of the machine exceeds a threshold value It is the above-mentioned bypass piping method, which controls the above-mentioned fourth switching unit corresponding to the bypass piping.

According to the above configuration, when the number of particles contained in the processing liquid flowing in the downstream area of the machine (measured by the pollution state measuring device or calculated based on it) exceeds the threshold, it is judged to correspond to the downstream area of the machine The machine is the source of particle generation. In addition, the processing liquid containing particles is guided to the internal circulation piping through the bypass piping corresponding to the downstream area of the device, thereby suppressing or preventing the particles from spreading to other parts of the second upstream portion and the internal circulation piping.

In a third aspect, the substrate processing apparatus further includes: a plurality of the bypass pipes; a plurality of the fourth switching units corresponding to the plurality of bypass pipes one-to-one; and a control device that controls The plurality of the fourth switching units; the control device, when the difference between the number of particles contained in the processing liquid flowing in the downstream areas of the two adjacent devices exceeds a threshold, to increase the number of particles The destination of the processing liquid in the downstream area of the machine is switched to the bypass piping, and the fourth switching unit corresponding to the bypass piping is controlled.

According to the above configuration, when the difference between the number of particles (measured value of the pollution state measuring device or calculated value based on it) contained in the processing liquid flowing in the downstream area of the adjacent equipment exceeds the threshold value, it is judged The machine corresponding to the downstream area of the machine with a large number of particles is the source of particle generation. In addition, the processing liquid containing particles is guided to the internal circulation piping through the bypass piping corresponding to the downstream area of the device, thereby suppressing or preventing the particles from spreading to other parts of the second upstream portion and the internal circulation piping.

In a third aspect, the substrate processing apparatus further includes: a plurality of the bypass pipes; a plurality of the fourth switching units corresponding to the plurality of bypass pipes one-to-one; and a control device that controls The plurality of the fourth switching unit; the plurality of the bypass pipes are connected to the second upstream side portion at a plurality of the sixth connection positions corresponding to the plurality of the bypass pipes one-to-one, the control When the device starts the drive of the pump from the state where the drive of the pump is stopped, it controls the plurality of the fourth switching units in the following manner, that is, the position of the plurality of the sixth connection positions in the direction in which the liquid medicine flows The relationship is based on the relationship, and the plurality of bypass pipes are sequentially opened from the upstream side.

When the pump drive is stopped, machine replacement, piping modification, etc. are sometimes carried out. Sometimes particles may adhere to the replaced equipment or modified piping. When the circulation of the treatment liquid is started by the driving of the pump in this state, a large amount of particles attached to the replaced equipment and modified piping diffuses in the entire outer circulation flow path and/or the inner circulation flow path. The whole area is in danger.

According to the above configuration, when the pump is driven from the state where the drive of the pump is stopped, the bypass pipe is sequentially opened from the pipe on the upstream side of the sixth connection position. Therefore, the flow path of the treatment liquid circulation can be expanded step by step. Thereby, by sequentially opening the bypass piping, it is possible to suppress or prevent the diffusion of particles to other parts of the second upstream portion and the internal circulation piping, and to allow the treatment liquid to circulate in the internal circulation flow path.

In the third aspect, the substrate processing apparatus further includes a filter inserted in the bypass pipe.

According to the above-mentioned configuration, particles are removed from the treatment liquid flowing through each bypass pipe by the filter, thereby making the treatment liquid clean. Since a filter is interposed in each bypass pipe, the particles can be efficiently removed from the processing liquid containing the particles.

In the third aspect, the substrate processing apparatus reports an abnormal state when the number of particles contained in the processing liquid flowing in the downstream area of the machine exceeds a threshold during the execution of the substrate processing in the processing unit, and And after the execution of the substrate processing is completed, the supply of processing liquid to the processing unit is stopped.

According to the above configuration, during the execution of the substrate processing in the processing unit, the number of particles contained in the processing liquid flowing in the downstream area of the machine (measured value of the contamination state measuring device or calculated value based on it) exceeds the threshold Report an exception in case of value. Furthermore, the substrate processing in execution is continued, and after the substrate processing in execution is completed, the supply of the processing liquid to the substrate processing unit is stopped.

Thereby, it is possible to suppress or prevent the supply of the processing liquid containing particles to the substrate without extremely lowering the yield.

In the first to third aspects, the above-mentioned pump includes a telescopic pump, the telescopic pump includes: a moving member configured to be reciprocally movable; and a telescopic tube, one end of which is fixed to the frame and the other end to the above-mentioned moving member; When discharging the processing liquid in at least one of the outer circulation pipe and the inner circulation pipe to the outside of the substrate processing apparatus, the control device controls the telescopic pump so as to increase the stroke time of the moving member.

The telescopic pump has the property of capturing particles flowing from the upstream side, particles generated on the surface of the telescopic tube and accumulating the particles in the telescopic tube. In addition, there is a possibility that the treatment liquid will continue to be contaminated for a long time due to the small particles discharged from the telescopic pump.

According to the above structure, by making the stroke time of the moving member of the telescopic pump longer than usual, the particles accumulated in the telescopic tube are discharged to the outside of the telescopic pump. When the processing liquid in the outer circulation pipe and/or the inner circulation pipe is discharged to the outside of the substrate processing apparatus through the liquid discharge pipe, the telescopic pump is driven in a way that the stroke time of the moving member of the telescopic pump is longer than usual. Thereby, the particles in the telescopic pump can be discharged to the outside of the substrate processing device.

In addition, by performing this method at the beginning of the drive of the telescopic pump, the processing liquid containing particles can be discharged from the telescopic pump, the outer circulation flow path, and the inner circulation flow path, and then the clean processing liquid can be circulated in the outer circulation. Road and/or internal circulation flow path circulation. Thereby, the amount of processing liquid required at the start of driving of the telescopic pump can be reduced.

In the first to third aspects, the substrate processing apparatus may further include: a heater interposed on the second upstream side portion; and a degassing section provided on the upstream side and the downstream side of the heater At least one.

When the circulation of the treatment liquid in the outer circulation flow path and the inner circulation flow path is stopped, the treatment liquid accumulated in the heater may be vaporized. Sometimes the pressure in the heater rises due to the vaporization of the treatment liquid.

According to the above configuration, since the degassing section is provided on one of the upstream and downstream sides of the heater, even when the treatment liquid is vaporized, the generated gas will flow out of the degassing section to the outside of the heater, thereby heating The pressure in the device does not rise or hardly rises. Thereby, it is possible to suppress or prevent the pressure increase in the heater when the circulation of the treatment liquid in the outer circulation flow path and the inner circulation flow path is stopped.

The above and other objects, features, and effects of the present invention can be made clear by referring to the accompanying drawings and the description of the embodiments described below.

Fig. 1 is a schematic view of the substrate processing apparatus of the first embodiment of the present invention viewed from above.

The substrate processing apparatus 1 is a monolithic apparatus that processes disk-shaped substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 includes: a load port LP that holds a carrier C that accommodates the substrate W; and a plurality of processing units 2 that use processing fluids, processing gases, and other processing fluids to process the substrate W transported from the carrier C on the load port LP The transfer robot, which transfers the substrate W between the carrier C on the load port LP and the processing unit 2; and the control device 3, which controls the substrate processing device 1.

The transfer robot includes: the indexing robot IR, which carries in and out of the substrate W with respect to the carrier C on the load port LP; and the central robot CR, which carries in and out of the substrate W with respect to the plurality of processing units 2. The indexing robot IR transfers the substrate W between the loading port LP and the center robot CR, and the center robot CR transfers the substrate W between the indexing robot IR and the processing unit 2. The center robot CR includes a hand H1 supporting the substrate W, and the indexing robot IR includes a hand H2 supporting the substrate W.

The substrate processing apparatus 1 includes a plurality of (for example, four) fluid cartridges 4 that accommodate fluid devices such as a discharge valve 23 described later. The processing unit 2 and the fluid box 4 are arranged in the outer wall 1 a of the substrate processing apparatus 1 and are covered by the outer wall 1 a of the substrate processing apparatus 1. The chemical solution tank 5 accommodating the chemical solution tank 30 and the like described later is arranged outside the outer wall 1 a of the substrate processing apparatus 1. The chemical tank 5 can be arranged on the side of the substrate processing apparatus 1 or under the clean room (underground) where the substrate processing apparatus 1 is installed.

The plural processing units 2 form plural (for example, 4) towers TW arranged in a plan view to surround the central robot CR. The central robot CR can access any tower TW. Each tower TW includes a plurality of (for example, three) processing units 2 stacked one above the other. The four fluid boxes 4 correspond to the four towers TW, respectively. The liquid medicine in the liquid medicine tank 5 is supplied to all the processing units 2 included in the tower TW corresponding to the liquid box 4 through any fluid box 4.

FIG. 2 is a schematic view of the inside of the processing unit 2 included in the substrate processing apparatus 1 when viewed horizontally.

The processing unit 2 includes: a box-shaped chamber 6 with an internal space; a rotating chuck 10, which holds the substrate W horizontally in the chamber 6 and rotates it around a vertical rotation axis A1 passing through the center of the substrate W And a cylindrical cup 14, which receives the processing liquid discharged from the substrate W.

The chamber 6 includes: a box-shaped partition wall 8 provided with a loading and unloading port through which the substrate W can pass; a shutter 9 which opens and closes the loading and unloading port; and an FFU 7 (fan-filter-unit), which is installed in the cavity The downflow of clean air, which is filtered by the filter, is formed in the chamber 6. The center robot CR carries the substrate W into the chamber 6 through the carry-in/outlet, and carries the substrate W out of the chamber 6 through the carry-in/outlet.

The rotating chuck 10 includes: a disk-shaped rotating base 12 that is held in a horizontal position; a plurality of chuck pins 11 that hold the substrate W in a horizontal position above the rotating base 12; and a rotating motor 13, which By rotating the chuck pin 11 and the rotation base 12, the substrate W is rotated about the rotation axis A1. The rotating chuck 10 is not limited to a clamping chuck in which a plurality of chuck pins 11 are in contact with the outer peripheral surface of the substrate W, and may be a non-device forming surface, that is, the back surface (lower surface) of the substrate W by being attracted to A vacuum chuck that rotates the upper surface of the base 12 to hold the substrate W horizontally.

The cup 14 includes: a cylindrical inclined portion 14a that extends obliquely upward toward the axis of rotation A1; a cylindrical guide portion 14b that extends downward from the lower end (outer end) of the inclined portion 14a; and liquid receiving The portion 14c forms an upwardly open annular groove. The inclined portion 14a includes an annular upper end having an inner diameter larger than that of the substrate W and the rotating base 12. The upper end of the inclined portion 14a corresponds to the upper end of the cup 14. The upper end of the cup 14 surrounds the substrate W and the rotating base 12 in a plan view.

The processing unit 2 includes a cup lifting unit 15 that vertically lifts the cup 14 between an upper position (the position shown in FIG. 2) and a lower position. The upper end of the cup 14 is higher than the rotating chuck 10 The holding position for holding the substrate W is higher, and the lower position is that the upper end of the cup 14 is lower than the holding position. When the processing liquid is supplied to the substrate W, the cup 14 is arranged in the upper position. After the processing liquid scattered from the substrate W to the outside is received by the inclined portion 14a, it is collected in the liquid receiving portion 14c by the guide portion 14b.

The processing unit 2 includes a rinse liquid nozzle 16 that discharges a rinse liquid downward toward the upper surface of the substrate W held by the spin chuck 10. The flushing fluid nozzle 16 is connected to a flushing fluid piping 17 in which a flushing fluid valve 18 is interposed. The processing unit 2 may also be equipped with a nozzle moving unit that moves the rinse liquid nozzle 16 horizontally between the processing position and the retreat position. The processing position supplies the rinse liquid discharged from the rinse liquid nozzle 16 to the substrate W. The retracted position is such that the rinse liquid nozzle 16 is away from the substrate W in a plan view.

When the rinsing liquid valve 18 is opened, the rinsing liquid is supplied from the rinsing liquid pipe 17 to the rinsing liquid nozzle 16 and discharged from the rinsing liquid nozzle 16. The rinsing liquid is, for example, pure water (DIW (Deionized water)). The rinsing fluid is not limited to pure water, and can be any of carbonated water, electrolyzed ionized water, hydrogen water, ozone water, ammonia water (for example, 0.1~100 ppm), and hydrochloric acid water with a dilution concentration (for example, about 10~100 ppm) One.

The processing unit 2 includes a discharge nozzle 21 having a discharge port 21a that discharges the chemical liquid downward toward the upper surface of the substrate W held by the spin chuck 10. The discharge nozzle 21 is connected to a supply pipe (discharge port communication pipe) 22 in which a discharge valve 23 is interposed. The discharge valve 23 switches the supply of the liquid medicine to the discharge nozzle 21 and the supply stop.

When the discharge valve 23 is opened, the liquid medicine is supplied to the discharge nozzle 21 from the supply pipe 22, and the liquid medicine is discharged from the discharge port 21a of the discharge nozzle 21. The chemical liquid supplied to the discharge nozzle 21 is an organic solvent such as IPA (isopropyl alcohol). In addition, the chemical liquid supplied to the discharge nozzle 21 may be a liquid containing sulfuric acid such as SPM (mixed liquid of sulfuric acid and hydrogen peroxide water), sulfuric acid, and the like. In addition, the chemical solution supplied to the discharge nozzle 21 may also include nitric acid, hydrochloric acid, hydrofluoric acid, phosphoric acid, acetic acid, ammonia water, hydrogen peroxide water, organic acid (such as citric acid, oxalic acid, etc.), and organic alkali (such as TMAH). : Tetramethylammonium hydroxide, etc.), a surfactant, and an anticorrosive agent. Other liquids may be supplied to the discharge nozzle 21.

The discharge valve 23 is switched between a discharge execution state in which the supply of the liquid medicine from the supply pipe 22 to the discharge nozzle 21 is performed, and a discharge stop state in which the supply of the liquid medicine from the supply pipe 22 to the discharge nozzle 21 is stopped. The spit stop state can also be the state where the valve body leaves the valve seat. Although not shown, the discharge valve 23 includes a valve body including an annular valve seat surrounding the internal flow path through which the medical solution flows; and a valve body, which is arranged in the internal flow path and can move relative to the valve seat . The discharge valve 23 may be an air operated valve that uses air pressure to change its opening degree, or it may be an electric valve that uses electricity to change its opening degree. Unless otherwise specified, the same applies to other valves.

The processing unit 2 includes a nozzle moving unit 26 that horizontally moves the discharge nozzle 21 between a processing position and a retreat position that supplies the chemical solution discharged from the discharge port 21a of the discharge nozzle 21 to the substrate On the upper surface of W, the retracted position is where the discharge nozzle 21 is away from the substrate W in a plan view. The nozzle moving unit 26 is, for example, a turning unit that moves the discharge nozzle 21 horizontally around a swing axis A2 that extends vertically around the cup 14.

FIG. 3 is a block diagram showing the hardware of the substrate processing apparatus 1.

The control device 3 is a computer, which includes a computer body 3a and a peripheral device 3d connected to the computer body 3a. The computer body 3a includes a CPU 3b (central processing unit) that executes various commands, and a main memory device 3c that stores information. The peripheral device 3d includes an auxiliary memory device 3e for storing information such as the program P, a reading device 3f for reading information from the removable medium RM, and a communication device 3g for communicating with other devices such as the host computer HC.

The control device 3 is connected to a display input device (selection unit) 3h. The display input device 3h is operated when an operator, such as a user or a maintenance person in charge, inputs information to the substrate processing apparatus 1. The information is displayed on the screen of the display input device 3h. The display input device 3h may be, for example, a touch panel type display device. The input device and the display device can also be separated from each other. The input device may be any one of a keyboard, a pointing device, and a touch panel, or may be other devices.

The CPU 3b executes the program P stored in the auxiliary memory device 3e. The program P in the auxiliary memory device 3e can be pre-installed in the control device 3, can also be sent from the removable medium RM to the auxiliary memory device 3e through the reading device 3f, or can be transmitted from an external device such as the host computer HC via the communication device 3g Send to the auxiliary memory device 3e.

The auxiliary memory device 3e and the removable medium RM are non-volatile memory that can retain memory even if power is not supplied. The auxiliary memory device 3e is, for example, a magnetic memory device such as a hard disk drive. The removable medium RM is, for example, an optical disc such as a compact disc or a semiconductor memory such as a memory card. The removable medium RM is an example of a computer-readable recording medium on which the program P is recorded. Removable media RM is a non-transitory tangible media (non-transitory tangible media).

The auxiliary memory device 3e memorizes a plurality of recipes. The recipe specifies the processing content, processing conditions, and processing procedures of the substrate W. At least one of the processing content, processing conditions, and processing procedures of the substrate W for the plurality of recipes is different from each other. The control device 3 controls the substrate processing device 1 to process the substrate W according to the recipe specified by the host computer HC. The control device 3 is programmed to execute the substrate processing example described below.

FIG. 4 is a step diagram for explaining an example of the processing of the substrate W by the substrate processing apparatus 1. Hereinafter, refer to FIG. 1, FIG. 2 and FIG. 4.

When the substrate W is processed by the substrate processing apparatus 1, a carrying-in step of carrying the substrate W into the chamber 6 (step S1 in FIG. 4) is performed.

Specifically, in the state where the discharge nozzle 21 is retracted from above the substrate W and the cup 14 is in the lower position, the center robot CR (refer to FIG. 1) supports the substrate W with the hand H2, while allowing the hand H2 to enter the chamber Within 6. After that, the center robot CR places the substrate W on the hand H2 on the spin chuck 10 with the front surface of the substrate W facing up. The rotation motor 13 starts to rotate the substrate W after the substrate W is held by the chuck pin 11. After placing the substrate W on the rotating chuck 10, the center robot CR causes the hand H2 to withdraw from the inside of the chamber 6.

Next, the chemical liquid supply step of supplying the chemical liquid to the substrate W is performed (step S2 in FIG. 4).

Specifically, the nozzle moving unit 26 moves the discharge nozzle 21 to the processing position, and the cup raising and lowering unit 15 raises the cup 14 to the upper position. After that, the discharge valve 23 is opened, and the discharge nozzle 21 starts to discharge the liquid medicine. When the discharge nozzle 21 discharges the chemical liquid, the nozzle moving unit 26 can make the chemical liquid discharged from the discharge nozzle 21 at the discharge port 21a of the discharge nozzle 21 collide with the central processing position at the center of the upper surface of the substrate W, and discharge from the discharge nozzle 21 The chemical liquid collides with the outer peripheral portion of the upper surface of the substrate W and moves between the outer peripheral processing positions, and the discharge nozzle 21 can also be stationary such that the drop position of the chemical liquid is located at the center of the upper surface of the substrate W.

After the chemical liquid discharged from the discharge nozzle 21 collides with the upper surface of the substrate W, it flows outward along the upper surface of the rotating substrate W. Thereby, a liquid film covering the entire upper surface of the substrate W is formed, and the chemical liquid is supplied to the entire upper surface of the substrate W. In particular, when the nozzle moving unit 26 moves the discharge nozzle 21 between the central processing position and the outer peripheral processing position, the drop position of the chemical liquid is used to scan the entire upper surface of the substrate W, so that the chemical liquid is uniformly supplied to the substrate W The entire upper surface. Thereby, the upper surface of the substrate W is uniformly processed. When a predetermined time has elapsed after opening the discharge valve 23, the discharge valve 23 is closed, and the discharge of the medical solution from the discharge nozzle 21 is stopped. After that, the nozzle moving unit 26 moves the discharge nozzle 21 to the retracted position.

Next, a rinse liquid supply step of supplying pure water as an example of the rinse liquid to the upper surface of the substrate W is performed (step S3 in FIG. 4).

Specifically, the rinsing liquid valve 18 is opened, and the rinsing liquid nozzle 16 starts to discharge pure water. The pure water falling on the upper surface of the substrate W flows outward along the upper surface of the rotating substrate W. The chemical liquid on the substrate W is rinsed by pure water discharged from the rinse liquid nozzle 16. Thereby, a liquid film of pure water covering the entire upper surface of the substrate W is formed. When a predetermined time has elapsed after opening the rinsing liquid valve 18, the rinsing liquid valve 18 is closed and the pure water is stopped.

Next, a drying step of drying the substrate W by high-speed rotation of the substrate W (step S4 in FIG. 4) is performed.

Specifically, the rotation motor 13 accelerates the substrate W in the rotation direction, and rotates the substrate W at a higher rotation speed (for example, thousands of rpm) than the rotation speed of the substrate W in the chemical liquid supply step and the rinse liquid supply step. Thereby, the liquid is removed from the substrate W, and the substrate W is dried. When a predetermined time elapses after the substrate W starts to rotate at a high speed, the rotation motor 13 stops rotating. Thereby, the rotation of the substrate W is stopped.

Next, the unloading step of unloading the substrate W from the chamber 6 (step S5 in FIG. 4) is performed.

Specifically, the cup lifting unit 15 lowers the cup 14 to the lower position. After that, the central robot CR (refer to FIG. 1) causes the hand H2 to enter the chamber 6. After the plurality of chuck pins 11 release the holding of the substrate W, the center robot CR uses the hand H2 to support the substrate W on the rotating chuck 10. After that, while supporting the substrate W with the hand H2, the center robot CR retracts the hand H2 from the inside of the chamber 6. Thereby, the processed substrate W is carried out from the chamber 6.

FIG. 5 is a schematic diagram showing the chemical liquid supply device CS1 of the substrate processing apparatus 1. FIG. 6 is a diagram for explaining the structure of the pump 37. As shown in FIG. FIG. 7 is a diagram for explaining the structure of the filter 39. As shown in FIG. In FIG. 5, the fluid box 4 is represented by a one-dot chain line, and the chemical liquid tank 5 is represented by a two-dot chain line. The components arranged in the area surrounded by the one-dot chain line are arranged in the fluid box 4, and the components arranged in the area surrounded by the two-dot chain line are arranged in the liquid medicine tank 5.

The chemical liquid supply device CS1 of the substrate processing apparatus 1 includes: a chemical liquid tank (processing liquid tank) 30 that stores chemical liquid supplied to the substrate W; and a plurality of circulation pipes that circulate the chemical liquid in the chemical liquid tank 30.

As shown in FIG. 5, the plurality of circulation pipes include: a first circulation pipe (outer circulation pipe) 31 whose upstream end 31a and downstream end 31b are connected to the chemical tank 30; and a second circulation pipe (inner circulation pipe) 32, It is branched and connected to the first circulation pipe 31 and returns the liquid medicine in the first circulation pipe 31 to the return pipe of the liquid medicine tank 30. The first circulation piping 31 includes: an upstream portion (second upstream portion) 33 that is closer to the upstream side than the connection position P2 (second connection position) to which the second circulation pipe 32 is connected; and a downstream portion (second The downstream portion) 34 is located further downstream than the connection position P2. In the example of FIG. 5, the chemical solution tank 30 and the first circulation pipe 31 form a first circulation flow path C1 that circulates the chemical solution in the chemical solution tank 30. In the example of FIG. 5, the chemical liquid tank 30, the upstream portion 33, and the second circulation pipe 32 form a second circulating flow path C2 for circulating the chemical liquid in the chemical liquid tank 30. In the example of FIG. 5, the first circulating flow path C1 is not only arranged in the medicine tank 5 but also in the fluid box 4, and the second circulating flow path C2 is arranged only in the medicine tank 5.

In the first embodiment, the first circulation channel C1 constitutes an outer circulation channel, and the second circulation channel C2 constitutes an inner circulation channel that circulates inside the outer circulation channel.

In the example of FIG. 5, the first circulation channel C1 constitutes a circulation channel that extends to the outside of the fluid cartridge 4. The first circulating flow path C1 supplies the liquid medicine to each of the plurality of processing units 2. Specifically, a plurality of supply pipes (discharge outlet communication pipes) 22 are connected to the first circulation pipe 31 and branched from the first circulation pipe 31. The plurality of supply pipes 22 correspond to the plurality of processing units 2 on a one-to-one basis. The medicinal solution supplied from the first circulation channel C1 to the supply pipe 22 is supplied to the processing unit 2 corresponding to the supply pipe 22.

In the example of FIG. 5, the first circulation pipe 31 includes a common pipe 35 extending downstream from the chemical tank 30 and a plurality of individual pipes 36 branching from the common pipe 35. The upstream end of the common pipe 35 corresponds to the upstream end of the first circulation pipe 31. The upstream end of the common pipe 35 is connected to the chemical tank 30. The downstream end of each individual pipe 36 corresponds to the downstream end of the first circulation pipe 31. The downstream end of each individual pipe 36 is connected to the chemical tank 30. The upstream portion 33 of the first circulation pipe 31 is included in the common pipe 35. The connection position P2 is set in the common pipe 35. Therefore, the second circulation pipe 32 is connected to the common pipe 35. The downstream portion 34 of the first circulation pipe 31 includes a part of the common pipe 35 and a plurality of individual pipes 36.

The plurality of individual pipes 36 respectively correspond to the plurality of towers TW. FIG. 5 shows the whole of one individual pipe 36 and a part of the remaining three individual pipes 36 (upstream end and downstream end). Figure 5 shows three processing units 2 included in the same tower TW. The three supply pipes 22 corresponding to the three processing units 2 included in the same tower TW are connected to the same individual pipe 36. In other words, the supply pipe 22 is branched and connected in the first circulation pipe 31 to a connection position (first connection position) P1 that is set downstream from the connection position P2.

A first circulation valve 40 for opening and closing the individual pipe 36 is interposed between each individual pipe 36. In the state where the first circulation valve 40 is closed, the liquid medicine flowing in the common pipe 35 will not be guided to each individual pipe 36 (that is, the liquid medicine flowing in the upstream portion 33 will not be guided to The downstream part 34). Furthermore, by opening the first circulation valve 40, the liquid medicine flowing in the common pipe 35 is guided to each individual pipe 36 (that is, the liquid medicine flowing in the upstream portion 33 is guided to the downstream portion 34 ).

As shown in FIG. 5, the chemical solution supply device CS1 of the substrate processing apparatus 1 includes: a pump 37 that sends the chemical solution in the chemical solution tank 30 to the first circulation pipe 31; and a heater 38 that is opposed to the chemical solution tank 30 The liquid medicine is heated to adjust the temperature of the liquid medicine in the liquid medicine tank 30; and a filter 39, which removes foreign matter from the liquid medicine flowing in the first circulation pipe 31. The pump 37, the heater 38, and the filter 39 are sequentially installed in the upstream portion 33 from the chemical tank 30 side. The heater 38 heats the liquid medicine flowing in the upstream portion 33. Although not shown, at least one of a flow meter and a temperature sensor may be installed in the upstream portion 33. Although not shown, at least one of a flow meter, a flow adjustment unit, and a heater may be installed in the supply pipe 22. Although not shown, a flow meter and a flow adjustment unit may be installed on the downstream side of the connection position P1 and the upstream side of the connection position P3 described later.

The pump 37 is, for example, a telescopic pump. In this case, as shown in FIG. 6, one side pump chamber 44 and the other side pump chamber 45 are divided and formed in the pump 37. One side pump chamber 44 is formed by a side cylinder head 41, a pump head 42, and a cylinder tube 43 interposed therebetween. The other side pump chamber 45 is formed by the other side cylinder head 41, the pump head 42, and the cylinder tube 43 interposed therebetween.

The pump 37 further includes two moving members 46 having a substantially disc shape, which are arranged in one side pump chamber 44 and the other side pump chamber 45, and two resin-made telescopic tubes 47, which are free to expand and contract. One end of each telescopic tube 47 is connected to the corresponding moving member 46, and the other end of each telescopic tube 47 is fixed to the pump head (frame) 42. In the one side pump chamber 44, a side air chamber 48 on the outer side of the telescopic tube 47 and a medical solution chamber 49 on the inner side of the telescopic tube 47 are separated from each other by the telescopic tube 47. In the other pump chamber 45, the other side air chamber 50 outside the telescopic tube 47 and the other side chemical liquid chamber 51 inside the telescopic tube 47 are separated from each other by the telescopic tube 47. The pump head 42 is provided with: one side of the liquid medicine introduction port 55, which is used to introduce the liquid medicine into one side of the liquid medicine chamber 49; the other side of the liquid medicine introduction port 56, which is used to introduce the medicine liquid into the other side of the liquid medicine chamber 51 The liquid medicine is introduced into the inside; and the liquid medicine outlet port 57 is used to discharge the liquid medicine from the liquid medicine chamber 49 on one side and the liquid medicine chamber 51 on the other side.

When one side of the air chamber 48 is open, air is supplied to the other side of the air chamber 50. When the air pressure in the other side of the air chamber 50 rises, the moving member 46 in the other side of the pump chamber 45 uses the air pressure And move to the pump head 42 side. Thereby, the volume of the liquid medicine chamber 51 on the other side is reduced, and the liquid medicine in the liquid medicine chamber 51 on the other side is sent out from the liquid medicine outlet port 57. The moving member 46 in the pump chamber 44 on one side moves to the cylinder head 41 side in conjunction with this. Thereby, the volume of the one-side liquid medicine chamber 49 is enlarged, and the liquid medicine is sucked into the one-side liquid medicine chamber 49 from the one-side liquid medicine introduction port 55.

Conversely, when the air chamber 50 on the other side is open, air is supplied to the air chamber 48 on the other side. When the air pressure in the air chamber 48 on the one side rises, the moving member 46 in the pump chamber 44 on the one side uses the air pressure. And move to the pump head 42 side. Thereby, the volume of the one-side liquid medicine chamber 49 is reduced, and the liquid medicine in the one-side liquid medicine chamber 49 is sent out from the liquid medicine outlet port 57. The moving member 46 in the pump chamber 45 on the other side moves in conjunction with this to the cylinder head 41 side. Thereby, the volume of the liquid medicine chamber 51 on the other side is enlarged, and the liquid medicine is sucked into the liquid medicine chamber 51 from the other side liquid medicine introduction port 56.

In this way, the moving member 46 moves back and forth between the cylinder head 41 and the pump head 42, whereby the liquid medicine can be sent out from the liquid medicine outlet port 57, and the liquid medicine from the liquid medicine tank 30 can be sent to the first circulation pipe 31 .

When the pump 37 is in its driving state, regardless of the type of operation state of the substrate processing apparatus 1 (ready state, or cycle stop idling state, or cycle idling state), the chemical liquid in the chemical liquid tank 30 is continuously delivered to In the first circulation pipe 31. The substrate processing apparatus 1 may be provided with a pressure applying device instead of the pump 37. The pressure applying device increases the air pressure in the chemical tank 30 to discharge the hydraulic pressure of the chemical in the chemical tank 30 to the first circulation pipe 31. Both the pump 37 and the pressure adding device are examples of pumps that send the liquid medicine in the liquid medicine tank 30 to the first circulation pipe 31.

As shown in FIG. 5, the heater 38 is a heater that generates Joule heat. At least one of the upstream side and the downstream side of the heater 38 is provided with a deaeration part (not shown). When the circulation of the liquid medicine in both the first circulating flow path C1 and the second circulating flow path C2 is stopped, the liquid medicine stored in the heater 38 may be vaporized. However, since a degassing part is provided on one of the upstream side and the downstream side of the heater 38, even when the chemical liquid is vaporized, the gas generated will flow out of the degassing part to the outside of the heater 38, heating The pressure in the device 38 does not rise or hardly rises. Thereby, it is possible to suppress or prevent the pressure increase in the heater 38 when the circulation of the Chinese medicinal solution in both the first circulation flow path C1 and the second circulation flow path C2 is stopped.

As shown in FIG. 7, the filter 39 includes a filter body 61 and a housing 62 that holds the filter body 61 inside. The housing 62 can be opened and closed, and the filter body 61 is detachably attached to the housing 62. The filter body 61 is, for example, a cylindrical shape with one end closed. The inside of the housing 62 is partitioned by the filter body 61 into a primary space (primary side of the filter 39) X1 and a secondary space (secondary side of the filter 39) X2. The primary space X1 is the internal space of the filter body 61. The secondary space X2 is the space outside the filter body 61 in the internal space of the housing 62.

The filter body 61 is, for example, a standard closed type filter. The filter 39 filters the liquid medicine circulating in the primary space X1, and removes particles from the liquid medicine. A plurality of holes 63 are formed in the entire area of the filter body 61. The holes 63 extend from the inner surface of the filter body 61 to the outer surface of the filter body 61, and penetrate the filter body in the thickness direction of the filter body 61 61. When viewed from the thickness direction of the filter main body 61, the hole 63 is, for example, a square shape. However, when viewed from the thickness direction of the filter main body 61, it may have a polygonal shape, a circular shape, or an elliptical shape other than a square shape.

The liquid medicine flows from the primary space X1 to the secondary space X2 and passes through the holes 63 of the filter body 61. When the particles contained in the liquid medicine flowing in the primary space X1 pass through the hole 63, they are adsorbed by the wall surface of the filter body 61 that divides the hole 63 to be captured in the hole 63. In this way, particles are removed from the chemical liquid.

In this type of filter 39, the particle capturing ability of the filter 39 changes with the change of the pressure applied to the filter 39. In a state where pressure is applied to the filter 39, smaller particles can be captured than in a state where no pressure is applied to the filter 39. Moreover, as the pressure applied to the filter 39 increases, even smaller particles can be captured. Conversely, when the pressure applied to the filter 39 decreases, the amount of particles that can be captured becomes larger, and the particle capturing ability of the filter 39 decreases. That is, the particle capturing ability of the filter 39 changes according to the fluctuation of the pressure applied to the filter 39. When the particle capturing ability of the filter 39 is reduced, the particles captured by the filter 39 may flow out of the filter 39 to the secondary side before the capturing ability is reduced.

In this type of filter 39, if the number of particles captured by the filter 39 gradually increases due to continuous use of the filter 39, the filter 39 gradually becomes clogged, and the adsorption performance of the filter 39 gradually decreases. As a result, the particle capturing ability of the filter 39 is reduced.

As shown in FIGS. 5 and 7, the chemical liquid supply device CS1 of the substrate processing apparatus 1 further includes: a degassing pipe 64 for removing bubbles (air) on the primary side in the filter 39; and a liquid drain pipe 66, It is used to drain the liquid in the filter 39. The degassing piping 64 is used to remove air bubbles in the filter 39 that causes particles to be generated. Specifically, one end (upstream end) of the degassing pipe 64 and the drain pipe 66 is connected to the primary side of the filter 39 (in the primary side space X1). The other end of the degassing pipe 64 is connected to the chemical liquid tank 30. As shown in FIG. 5, a degassing valve 65 for opening and closing the degassing pipe 64 is interposed in the degassing pipe 64. The other end of the drain pipe 66 is connected to the drain tank 80. A drain valve 67 for opening and closing the drain pipe 66 is interposed between the drain pipe 66.

As shown in FIG. 5, the chemical liquid supply device CS1 of the substrate processing apparatus 1 includes: a second circulation valve (internal circulation valve) 70, which is interposed in the second circulation pipe 32; and a pressure adjustment unit, which is opposed to the first The pressure of the liquid medicine flowing in the upstream portion 33 of the circulation pipe 31 is adjusted. The pressure adjustment unit is an opening adjustment unit that adjusts the opening of the second circulation pipe 32. The opening adjustment unit is interposed in the second circulation pipe 32. In the example of FIG. 5, the opening adjustment unit is an adjuster 71. The regulator 71 is, for example, an electro-pneumatic regulator. The opening adjustment unit is not limited to the regulator 71, and may be an electric valve such as a relief valve and an electric needle valve. In addition, the opening adjustment unit may be integrated with the second circulation valve 70.

The pressure adjusting unit further includes a pressure sensor 72 that detects the pressure of the liquid medicine in the upstream portion 33. The pressure sensor 72 detects the pressure of the liquid medicine in the upstream portion 33 at a predetermined detection position P11 on the upstream portion 33. In the circulating idling state of the substrate processing apparatus 1, the pressure of the chemical liquid flowing in the filter 39 is substantially equal to the pressure of the chemical liquid at the detection position P11. Therefore, detecting the pressure of the liquid medicine in the upstream portion 33 by the pressure sensor 72 at the detection position P11 can be regarded as substantially equal to detecting the pressure of the liquid medicine flowing in the filter 39. The detection position P11 may be upstream of the filter 39 or downstream of the filter 39 as shown in FIG. 5.

As shown in FIG. 5, the chemical liquid supply device CS1 of the substrate processing apparatus 1 further includes a drain tank 80 for storing the chemical liquid discharged from the chemical liquid tank 30. The chemical tank 30 is connected with a discharge pipe 81 extending to the discharge tank 80. A discharge valve 82 that opens and closes the discharge pipe 81 is interposed in the middle of the discharge pipe 81. When the liquid medicine in the liquid medicine tank 30 is discharged, the discharge valve 82 is opened. Thereby, the liquid medicine in the liquid medicine tank 30 is guided from the liquid medicine tank 30 to the drain tank 80 and stored in the drain tank 80.

A drain pipe 83 is connected to the drain tank 80. The liquid medicine stored in the liquid discharge tank 80 is sent to the liquid discharge treatment equipment outside the substrate processing apparatus 1 by opening a valve (not shown) installed in the liquid discharge pipe 83, and is discharged in the liquid discharge treatment equipment.液处理。 Liquid treatment.

One end of the branched liquid discharge pipe (drain pipe) 85 is branched and connected to the vicinity of the downstream end of each individual pipe 36 (that is, the vicinity of the downstream end of the first circulation pipe 31). The other end of the branch drain pipe 85 is connected to the drain tank 80. A branch drain valve 86 for opening and closing the branch drain pipe 85 is interposed in the middle of the branch drain pipe 85. In each of the individual pipes 36, a return valve 89 for opening and closing the individual pipe 36 is interposed on the downstream side of the connection position (third connection position) P3 of the branch discharge pipe 85.

The branch drain valve 86 and the return valve 89 constitute a first switching unit. The first switching unit turns the destination of the chemical solution on the upstream side of the connection position P3 in the downstream portion 34 of the first circulation pipe 31 to the downstream side of the connection position P3 in the downstream portion 34, and discharges the liquid from the branch. Switch between piping (drainage piping) 85. The first switching unit may include a three-way valve instead of the branch drain valve 86 and the return valve 89, or it may include a three-way valve in addition to the branch drain valve 86 and the return valve 89.

By opening the return valve 89 with the branch drain valve 86 closed, the liquid medicine flowing in the individual pipe 36 on the upstream side than the connection position P3 of the branch drain pipe 85 is connected through the individual pipe 36 The position P3 is guided to the liquid medicine tank 30 more on the downstream side. On the other hand, by opening the branch drain valve 86 with the return valve 89 closed, the liquid medicine flowing on the upstream side of the connection position P3 of the branch drain pipe 85 in the individual pipe 36 is drained through the branch The pipe 85 is guided to the drain tank 80.

As shown in FIG. 5, the chemical liquid supply device CS1 of the substrate processing apparatus 1 further includes: a chemical liquid replenishing pipe 87, which replenishes new chemical liquid (new liquid), that is, unused chemical liquid, to the chemical liquid tank 30; and The liquid replenishing valve 88 is used to open and close the chemical liquid replenishing pipe 87.

The operation state of the substrate processing apparatus 1 includes: a ready state (executable state, that is, an operating state), which is an operation state that can execute processing in the processing unit 2; and an idling state (standby state), which is not available in the processing unit 2 The action state of the process being executed (preparation is not completed). When the power supply to the substrate processing apparatus 1 is started by the activation of the substrate processing apparatus 1, the substrate processing apparatus 1 becomes an idling state. After that, by performing the ready operation, the substrate processing apparatus 1 shifts to the ready state. In the ready state of the substrate processing apparatus 1, the substrate processing apparatus 1 can be used to realize a substrate processing operation (batch processing).

When it is necessary to perform maintenance work on the substrate processing apparatus 1 (inspection at the time of error, replacement of equipment, replacement of consumables, etc.), the maintenance person in charge shifts the substrate processing apparatus 1 in the ready state to the idling state. Then, the maintenance person performs maintenance work on the substrate processing apparatus 1 in the idling state. That is, the maintenance work of the substrate processing apparatus 1 can only be performed in the idling state of the substrate processing apparatus 1. In addition, the operation state of the substrate processing apparatus 1 shifts to the ready state by performing the ready operation after the maintenance work is completed.

Regarding the chemical liquid supply device CS1, the ready state of the substrate processing apparatus 1 is a state in which chemical liquid can be supplied to the processing unit 2. Regarding the chemical liquid supply device CS1, the idling state of the substrate processing apparatus 1 is an operating state in which chemical liquid cannot be supplied to the processing unit 2 (preparation is not completed).

The idling state of the substrate processing apparatus 1 includes: a cycle stop idling state (cycle stop standby state), which stops the circulation of the chemical solution in both the first circulating flow path C1 and the second circulating flow path C2; and the circulating idling state (Circulation standby state), which is to stop the circulation of the liquid medicine in the first circulation flow path C1, and continue the circulation of the liquid medicine in the second circulation flow path C2. That is, two kinds of idling states are prepared for the substrate processing apparatus 1. In any idling state, the power supply to the substrate processing apparatus 1 is maintained. Therefore, in the idling state of the substrate processing device 1, the operations required for the maintenance of the respective driving parts of the substrate processing device 1 (actions of the transport robot, etc.), etc. can be performed.

FIG. 8 is a diagram showing an example of the maintenance screen 90 in the display input device 3h.

In the case of performing maintenance work in the substrate processing apparatus 1, the maintenance person in charge operates the maintenance screen 90 in the display input device 3h. As shown in FIG. 8, the maintenance screen 90 displays a button for the stop operation of the substrate transfer process in the substrate processing apparatus 1, a system restart button 91 that is operated to restore the ready state, and a shutdown (idling) of the substrate processing apparatus 1 Stateful) button for operation, and emergency stop button 92.

The buttons used for the stop operation of the substrate transport process in the substrate processing apparatus 1 include a transport stop button 93 and a cycle stop button 94. When the transfer stop button 93 is operated in the ready state of the substrate processing apparatus 1, the center robot CR and the indexing robot IR during substrate transfer are immediately stopped. When the cycle stop button 94 is operated, the center robot CR and the indexing robot IR stop operating after the substrate transport process being executed at that point in time is completed.

The buttons used for the shutdown operation of the substrate processing apparatus 1 include: a cycle stop idling button 95, which is used to transfer the substrate processing apparatus 1 to a cycle stop idling state; and a cycle idling button 96, which is used to transfer the substrate processing apparatus 1 to Cycle idling state. When the cycle stop idling button 95 is operated in the ready state of the substrate processing apparatus 1, the substrate processing apparatus 1 shifts to the cycle stop idling state. When the circulating idle button 96 is operated in the ready state of the substrate processing apparatus 1, the substrate processing apparatus 1 shifts to the circulating idle state. That is, the maintenance person in charge operates the maintenance screen 90 to perform selection of the cycle idling state and the cycle stop idling state.

FIG. 9 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device CS1 in the ready state.

Two valves and two pumps are depicted in the lower part of FIG. 9. Among the two valves, the upper valve (part of the black-painted valve) indicates the state of valve open (marked as "open" in Figure 9), and the lower valve indicates the state of valve closed (marked as "closed in Figure 9"). "). Of the two pumps, the upper pump (part of the black-painted pump) indicates the state of the pump delivering liquid (marked as "on" in Figure 9), and the lower pump indicates the state of the pump not delivering liquid (Figure 9 Marked as "disconnected"). This is the same in FIG. 10, FIG. 11, FIG. 14, FIG. 16, FIG. 19, FIG. 20, and FIG. 27 to FIG. 29.

In the ready state of the substrate processing apparatus 1, the pump 37 is in a driving state, and the second circulation valve 70 and the first circulation valve 40 are opened. In this state, the degas valve 65 is opened, and the drain valve 67 is closed. Furthermore, in this state, the return valve 89 is opened, and the branch drain valve 86 is closed. In this state, the discharge valve 82 is closed.

In the ready state of the substrate processing apparatus 1, the chemical liquid in the chemical liquid tank 30 is sent to the upstream portion 33 of the first circulation pipe 31 by the pump 37, and passes through the connection position P2. Thereby, the chemical liquid flows from the upstream portion 33 to the downstream portion 34 and returns to the chemical liquid tank 30 from the downstream portion 34. During this period, the filter 39 removes foreign substances contained in the liquid medicine. In addition, the liquid medicine in the liquid medicine tank 30 is heated by the heater 38 so as to reach the temperature prescribed by the formula, and the liquid medicine is sent to the downstream portion 34. Thereby, the liquid medicine in the liquid medicine tank 30 maintains a fixed temperature higher than the ambient temperature (for example, 20-26° C.) in the processing unit 2 and is sent to the downstream portion 34.

The medical solution in the upstream portion 33 of the first circulation pipe 31 flows into the downstream portion 34 from the connection position P2 and flows into the second circulation pipe 32 from the connection position P2. The chemical solution flowing into the second circulation pipe 32 returns to the chemical solution tank 30 from the downstream end of the second circulation pipe 32.

That is, in the ready state, the chemical liquid circulates in the first circulation channel C1, and the chemical liquid circulates in the second circulation channel C2 (double-circulation state).

If the circulation of the chemical solution in the second circulation flow path C2 is stopped in the ready state of the substrate processing apparatus 1, the chemical solution will not move in the second circulation pipe 32, and the particles will accumulate in the second circulation pipe 32. Yu. In order to prevent the accumulation of such particles, the circulation of the chemical solution in the second circulation channel C2 is not stopped when the substrate processing apparatus 1 is in the ready state.

FIG. 10 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device CS1 in the circulating stop idling state.

In the cycle stop idling state of the substrate processing apparatus 1, the pump 37 is in a driving stop state. The second circulation valve 70 and the first circulation valve 40 are closed. Also close other valves.

In the circulation stop idling state, the driving of the pump 37 is stopped, so in both the first circulation flow path C1 and the second circulation flow path C2, the circulation of the liquid medicine is stopped. In addition, in the circulating stop idling state, the chemical liquid stays in the middle of the first circulating flow path C1 and the second circulating flow path C2. Specifically, the chemical liquid stays in the entire area of the upstream portion 33, the upstream side of the first circulation valve 40 in the downstream portion 34, and the upstream side of the second circulation valve 70 in the second circulation pipe 32. Of course, the chemical liquid also stays in the pump 37, the heater 38, and the filter 39.

At this time, there is a high possibility that a large amount of particles are contained in the liquid medicine retained in the secondary space X2 of the filter 39. It is considered that the reason is as follows. That is, when the driving of the pump 37 is stopped, the liquid medicine in the filter 39 does not move, and the pressure of the liquid medicine is not applied to the filter 39. Therefore, the particles captured by the filter 39 flow out into the secondary side space X2 and are accumulated in the liquid medicine retained in the secondary side space X2.

In particular, when the chemical liquid is a sulfuric acid liquid, the amount of particles generated by the oxidation of the chemical liquid in the pipe increases. When the chemical solution is IPA, the amount of particles generated by the elution of the piping (resin piping) also increases. Therefore, when the chemical liquid is a sulfuric acid liquid or IPA, the amount of particulates contained in the chemical liquid retained in the secondary space X2 of the filter 39 further increases.

FIG. 11 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device CS1 in the circulating idling state.

In the circulating idling state of the chemical liquid supply device CS1, the pump 37 is in a driving state. In this state, the second circulation valve 70 is opened, and the first circulation valve 40 is closed. In this state, the degas valve 65 is opened, and the drain valve 67 is closed. Close other valves.

The chemical liquid in the upstream portion 33 does not flow into the downstream portion 34 from the connection position P2, but only flows into the second circulation pipe 32. The chemical solution flowing into the second circulation pipe 32 returns to the chemical solution tank 30 from the downstream end of the second circulation pipe 32.

That is, in the circulating idling state, the chemical liquid does not circulate in the first circulating flow path C1, and the chemical liquid circulates in the second circulating flow path C2 (one cycle state).

FIG. 12 is a flowchart for explaining the transition of the operation state of the substrate processing apparatus 1 from the ready state to the idling state.

In the ready state of the substrate processing apparatus 1, by operating the button for stopping operation (step S11), the operation state of the substrate processing apparatus 1 shifts from the ready state to the idling state. Specifically, any one of the cyclic stop idling state and the cyclic idling state is selected, and the button corresponding to the selected idling state is operated (step S12). When the cycle stop idling button 95 (refer to FIG. 8) is operated, the substrate processing apparatus 1 will transition to the cycle stop idling state. When the circulating idle button 96 (refer to FIG. 8) is operated, the substrate processing apparatus 1 shifts to the circulating idle state.

If the cycle stop idling button 95 is operated (YES in step S12), the control device 3 stops the driving of the pump 37 (step S13), and closes the first circulation valve 40 and the second circulation valve 70 (step S14). The control device 3 in turn also closes other valves. Thereby, the substrate processing apparatus 1 shifts to the cycle stop idling state.

On the other hand, if the circulation idle button 96 is operated (NO in step S12), the control device 3 continues to drive the pump 37 (step S16), and closes the first circulation valve 40 (marked as "outer circulation valve 40" in FIG. 12) ) (Step S17). Furthermore, the control device 3 controls the regulator 71 in such a way that the pressure of the liquid medicine flowing in the upstream portion 33 is equal to or close to the pressure of the liquid medicine flowing in the upstream portion 33 in the ready state (step S18). By adjusting the opening degree of the second circulation pipe 32 by the regulator 71, the pressure of the liquid medicine flowing in the upstream portion 33 is adjusted.

Specifically, the pressure sensor 72 detects the pressure of the liquid medicine at the detection position P11 where the upstream portion 33 is located. The control device 3 memorizes the value of the liquid medicine pressure at the detection position P11 in the ready state. Furthermore, the control device 3 controls the regulator 71 so that the pressure of the liquid medicine at the detection position P11 coincides with or approximates the value of the memorized pressure. Thereby, the pressure of the liquid medicine flowing in the upstream portion 33 is maintained at or near the value of the pressure of the liquid medicine flowing in the upstream portion 33 in the ready state.

Thereby, the substrate processing apparatus 1 shifts to a circulating idle state.

FIG. 13 is a diagram for explaining the flow of processing performed in the idling state of the cycle stop. Fig. 14 is a diagram for explaining the flow of the liquid medicine shortly after the circulation stops and the idling state transitions to the ready state.

In the idling state of the cycle stop of the substrate processing apparatus 1, the maintenance person in charge performs maintenance work (step S21 in FIG. 13). In the circulation stop idling state, the driving of the pump 37 is stopped, and the circulation of the liquid medicine in the circulation flow path (the first circulation flow path C1 and the second circulation flow path C2) is stopped. Therefore, the person in charge of maintenance can perform maintenance work on the processing unit 2, the transport robot, etc. while the cycle is stopped and idling. In addition, the maintenance person in charge can perform maintenance operations related to the chemical liquid supply device CS1 when the cycle is stopped and idling, that is, to perform maintenance operations on the equipment and piping in the fluid box 4 and the chemical liquid tank 5 (reconstruction of the equipment and piping, Repair and replacement, replacement of consumables. Hereinafter, this is sometimes referred to as "reconstruction of equipment, etc."). However, when the cycle is stopped and idling, it is ideal to perform maintenance work on the equipment and piping in the medicine tank 5 that cannot be maintained in the cycle idling state.

If the cycle of the substrate processing apparatus 1 is in the idling state, the operating system restarts the button 91 (refer to FIG. 8) (ready, YES in step S22 of FIG. 13), the operation state of the substrate processing apparatus 1 shifts to the ready state (FIG. 13的Step S23). Specifically, as shown in FIG. 14, the control device 3 restarts the driving of the pump 37 and opens the first circulation valve 40. Furthermore, shortly after the control device 3 transitions to the ready state, as shown in FIG. 14, the branch drain valve 86 and the drain valve 67 are opened with the return valve 89 and the degassing valve 65 closed. Thereby, the medicinal solution retained in the first circulation flow path C1 and the second circulation flow path C2 is not returned to the medicinal solution tank 30 but is discharged to the drain tank 80. The discharge period at this time is set according to the supply capacity of the pump 37, the viscosity of the chemical solution, the diameter of the pipe, and the length of the pipe. The new chemical solution supplied after the drive of the pump 37 is restarted can be used to replace the first circulating flow path C1 and the second 2 All the remaining liquid medicine in the circulating flow path C2.

When a predetermined period has elapsed since opening the branch drain valve 86, the control device 3 closes the branch drain valve 86 and the drain valve 67, and opens the return valve 89. Thereby, it returns to the ready state shown in FIG. 9 (step S24 in FIG. 13). In this ready state, the substrate W is processed in the processing unit 2 (mass production processing).

Fig. 15 is a diagram for explaining the processing flow in the circulating idling state. FIG. 16 is a diagram for explaining the flow of the liquid medicine shortly after the transition from the circulating idle state to the ready state.

In the past, as the idling state of the substrate processing apparatus, the cyclic idling state was not provided. Therefore, in the idling state of the substrate processing apparatus, the driving of the pump is stopped to stop the circulation of the liquid medicine in the circulating flow path. When the pump is stopped, the pressure of the chemical liquid applied to the filter becomes zero, and the particles flow out from the filter. Therefore, after restarting the circulation of the liquid medicine in the circulating flow path, there are a large number of particles in the circulating flow path. Therefore, it is necessary to perform a preliminary cycle to preliminarily circulate the liquid medicine in the circulation flow path, and to replace the liquid medicine in the circulation flow path. However, these preliminary cycles and flushing require a lot of time. Not only that, but a large amount of liquid medicine is also consumed during washing.

In the cycle idling state of the substrate processing apparatus 1, since the driving without the pump 37 is stopped, after the cycle idling state is restarted, there is no need to perform pre-circulation and flushing.

In the circulating idling state of the substrate processing apparatus 1, the maintenance person in charge performs maintenance work (step S31 in FIG. 15). In the circulating idling state, the pump 37 is driven to circulate the liquid medicine in the second circulation flow path C2, but the circulation of the liquid medicine is stopped in the first circulation flow path C1. Therefore, the person in charge of maintenance can perform maintenance work on the processing unit 2, the transport robot, etc. in the circulating idling state. In addition, the maintenance person in charge can perform maintenance work related to the chemical liquid supply device CS1 in the circulating idling state, that is, perform maintenance work on the equipment, piping, consumables, etc. inside the fluid box 4 (reconstruction of equipment, etc.).

However, in the circulating idling state, when the liquid medicine circulates in a part of the circulating flow path, maintenance work is performed. When the chemical liquid supply device CS1 has a predetermined state, depending on the state type, it is sometimes not appropriate to continue the maintenance work. Therefore, in the cyclic idling state, prepare for a hard chain.

Specifically, the medicine tank 5 is provided with: a detection sensor (detection unit) 100 (refer to FIG. 3), which is used to detect the opening of the lid (not shown) of the medicine tank 5; and The sensor (detection unit) 101 (refer to FIG. 3) is used to detect leakage in the liquid medicine tank 5. In the cyclic idling state, the control device 3 monitors whether the sensors 100 and 101 detect these conditions. When the detection sensors 100 and 101 detect that the lid of the liquid medicine tank 5 is open and liquid leakage occurs in the liquid medicine tank 5, the control device 3 stops the driving of the pump 37 to enable the second circulating flow after the detection The circulation of liquid medicine in road C2 is stopped. In this way, it is possible to prevent the occurrence of undesirable situations.

When the maintenance work is carried out in the circulating idling state, when the maintenance person in charge operates the emergency stop button 92 (refer to FIG. 8), the control device 3 also stops the driving of the pump 37 to make the second circulating flow after the emergency stop button 92 is operated The circulation of liquid medicine in road C2 is stopped.

If in the cycle idling state of the substrate processing apparatus 1, the operating system restarts the button 91 (refer to FIG. 8) (ready operation, YES in step S32 of FIG. 15), the operation state of the substrate processing apparatus 1 shifts to the ready state (FIG. 15的Step S33). Specifically, the control device 3 opens the first circulation valve 40 as shown in FIG. 16. Moreover, immediately after the control device 3 shifts to the ready state, as shown in FIG. 16, the branch drain valve 86 is opened with the return valve 89 closed. Thereby, the liquid medicine retained in the upstream portion 33 and the downstream portion 34 does not return to the liquid medicine tank 30 but is discharged into the drain tank 80. By opening the first circulation valve 40 while continuing to drive the pump 37, the circulation of the liquid medicine in the first circulation flow path C1 is restarted, so that the circulation pressure can be applied from the restart of the liquid medicine circulation The liquid medicine flows into the downstream portion 34. As a result, compared to the situation where the idling state is restored from the circulation stop (the state shown in Fig. 14), the discharge time required for the discharge when the idling state is transferred from the circulation state to the ready state can be greatly shortened (for example, about 1/5~about 1/10).

When a predetermined period has elapsed since the opening of the branch drain valve 86, the control device 3 closes the branch drain valve 86 and the drain valve 67, and opens the return valve 89. Thereby, it returns to the ready state shown in FIG. 9 (step S34 in FIG. 15). In this ready state, the substrate W is processed in the processing unit 2 (mass production processing).

As described above, according to the first embodiment, the regulator 71 is controlled in such a manner that the substrate processing apparatus 1 is in an idling state (the chemical liquid circulates only in one of the second circulation channels C2) upstream The pressure of the chemical liquid flowing in the side part 33 and the ready state of the substrate processing apparatus 1 (in a dual-circulation state where the chemical liquid circulates in both the first circulation channel C1 and the second circulation channel C2) are upstream The pressure of the liquid medicine flowing in the side part 33 is the same or close. Since the pressure applied to the filter 39 in the cycle idling state (one cycle state) of the substrate processing apparatus 1 is the same or close to the pressure applied to the filter 39 in the ready state (double cycle state) of the substrate processing apparatus 1, it does not matter The operation state of the substrate processing apparatus 1 is a cyclic idling state or a ready state, and the particle capturing ability of the filter 39 can be maintained fixedly or similarly.

Thereby, it is possible to suppress or prevent the trapped particles from leaking from the filter 39 as the pressure applied to the filter 39 changes. Therefore, it is possible to supply a clean chemical solution with a small content of particles (preferably, a clean chemical solution that does not contain particles) to the processing unit 2.

Furthermore, in the first embodiment, by adjusting the opening degree of the second circulation pipe 32 by the regulator 71, the pressure of the liquid medicine flowing in the upstream portion 33 is adjusted. Thereby, the pressure of the liquid medicine flowing in the upstream portion 33 can be adjusted with a simple structure.

Moreover, in the circulating idling state, the chemical liquid does not circulate in the first circulating flow path C1, but the chemical liquid circulates in the second circulating flow path C2. Therefore, when the target part of the maintenance work is a part that does not affect the circulation of the chemical liquid in the second circulation flow path C2 (for example, when the maintenance work is performed on the processing unit 2, the transport robot, etc.), the substrate can be The processing device 1 is set in a circulating idling state, while maintaining the chemical liquid supply device CS1 and the processing unit 2.

On the other hand, when the maintenance object is a part that affects the circulation of the liquid medicine in the second circulation flow path C2, it is impossible to perform maintenance work while circulating the liquid medicine in the second circulation flow path C2. Therefore, in this case, the operating state of the substrate processing apparatus 1 can be set to the cycle stop idling state.

In this way, by separately using a plurality of idling states according to the maintenance location, the period during which the pump 37 is stopped can be shortened. At present, most of the maintenance performed on the substrate processing apparatus 1 is to set the object as a location that does not affect the circulation of the chemical solution in the second circulation flow path C2. Therefore, by adopting the cycle stop idling state as the idling state of the substrate processing apparatus 1, the operation rate of the substrate processing apparatus 1 can be drastically improved.

In addition, in the first embodiment, when the liquid is discharged after returning to the ready state from the idling state (circulation stop idling state and/or circulation idling state), the stroke time of the moving member 46 of the pump 37 (moving member 46 (Refer to Figure 6) The time required for one round-trip operation) is longer than the idling state and the ready state. In other words, it is also possible to make the travel time of the moving member 46 during liquid discharge after returning from the idling state to the ready state to be longer than the travel time of the other states, that is, the idling state, the ready state, and other stable states.

The telescopic tube 47 of the pump 37 (telescopic pump) is made of resin in addition to its large surface area (that is, the liquid contact area with the chemical liquid), so it is easy to generate particles. On the other hand, the pump 37 (telescopic pump) has the property of capturing the generated particles and accumulating them in the telescopic tube 47 due to its structural characteristics. In addition, since the pump 37 is driven in the ready state to discharge particles from the telescopic tube 47 little by little, there is a chemical liquid circulating in the circulation flow path (the first circulation flow path C1 and/or the second circulation flow path C2) There is a long-term risk of being polluted.

FIG. 17 is a diagram for explaining the relationship between the stroke time of the pump 37 and the number of particles attached. In Fig. 17, the circulation pressure and circulation flow rate of the pump 37 are respectively fixed.

By making the stroke time of the moving member 46 of the pump 37 longer (2.0 seconds) than the normal stroke time (1.5 seconds), the particles previously accumulated in the telescopic tube 47 of the pump 37 can be effectively discharged to the pump 37 outside.

When the liquid medicine in the first circulation channel C1 and/or the second circulation channel C2 is discharged to the outside of the liquid medicine supply device CS1 after returning to the ready state, the control device 3 causes the moving member of the pump 37 The stroke time of 46 is longer than the idling state and the ready state to control the pump 37. As a result, the amount of particles stored in the pump 37 can be reduced, and therefore, the particles contained in the chemical solution supplied to the substrate W can be reduced.

FIG. 18 is a schematic diagram showing the chemical solution supply device CS2 of the substrate processing apparatus 201 according to the second embodiment of the present invention.

In the second embodiment, the same reference numerals as in the case of FIGS. 1 to 17 are assigned to the parts common to the above-mentioned first embodiment, and the description is omitted.

The main difference between the chemical solution supply device CS2 of the second embodiment and the chemical solution supply device CS1 of the first embodiment is that the first parallel pipe 211A and the second parallel pipe 211B are provided in the middle of the upstream portion 33, and A first filter 239A and a second filter 239B are interposed in the first parallel pipe 211A and the second parallel pipe 211B, respectively. The second filter 239B is a dedicated filter when it transitions to the ready state. Hereinafter, a specific description will be given.

As described above, the first circulation pipe 31 includes the upstream portion 33 on the upstream side of the connection position P2 and the downstream portion 34 on the downstream side of the connection position P2. The second circulation pipe 32 is branched from the first circulation pipe 31 at the connection position P2. In the second embodiment, the first circulation pipe 31 is branched into two parts at the connection position P4 between the chemical tank 30 and the connection position P2, and thereafter merges at a position between the connection position P4 and the connection position P2. The upstream portion 33 includes a first parallel pipe 211A and a second parallel pipe 211B connected in parallel. The upstream ends of the first parallel pipe 211A and the second parallel pipe 211B are connected to each other at the connection position P4. The downstream ends of the first parallel pipe 211A and the second parallel pipe 211B are connected to each other at a position between the connection position P4 and the connection position P2.

A first filter 239A and a first parallel valve 212A for opening and closing the first parallel pipe 211A are interposed between the first parallel pipe 211A. A second filter 239B and a second parallel valve 212B for opening and closing the second parallel pipe 211B are interposed between the second parallel pipe 211B. The first filter 239A and the second filter 239B are the same filters as the filter 39 (refer to FIG. 7).

The first parallel valve 212A and the second parallel valve 212B constitute a second switching unit. The second switching unit switches the destination of the chemical solution on the upstream side of the connection position P4 in the upstream portion 33 between the first parallel pipe 211A and the second parallel pipe 211B. The second switching unit may include a three-way valve instead of the first parallel valve 212A and the second parallel valve 212B, or may include a three-way valve in addition to the first parallel valve 212A and the second parallel valve 21B.

With the second parallel valve 212B closed, the first parallel valve 212A is opened. Thereby, in the upstream portion 33, the liquid medicine flowing on the upstream side than the connection position P4 of the first parallel pipe 211A and the second parallel pipe 211B is guided to the first parallel pipe 211A and passes through the first filter 239A.

On the other hand, the second parallel valve 212B is opened with the first parallel valve 212A closed. Thereby, in the upstream portion 33, the liquid medicine flowing on the upstream side than the connection position P4 of the first parallel pipe 211A and the second parallel pipe 211B is guided to the second parallel pipe 211B and passes through the second filter 239B.

The first filter 239A is different from the second filter 239B in terms of filtering performance. The diameter of the hole 63 (refer to FIG. 7) of the second filter 239B is larger than the diameter of the hole 63 (refer to FIG. 7) of the first filter 239A. That is, if the pore diameter of the first filter 239A is small, the proportion of the particles trapped in the pores 63 of the first filter 239A in the pores 63 increases, and therefore the first filter 239A is likely to be clogged.

In the example of FIG. 18, the degassing piping is omitted, but the same degassing piping as the degassing piping 64 (refer to FIG. 5) may be provided in each filter 239A, 239B. Moreover, the same drain piping as the drain piping 66 (refer to FIG. 5) may be provided in each filter 239A, 239B.

FIG. 19 is a diagram for explaining the flow of the chemical liquid in the substrate processing apparatus 201 in the ready state. FIG. 20 is a diagram for explaining the flow of the liquid medicine shortly after the transition from the circulating stop idling state to the ready state.

The flow of the chemical liquid in the ready state of the substrate processing apparatus 201 is shown in FIG. 19, which is the same as the flow of the chemical liquid in the ready state (refer to FIG. 9) of the substrate processing apparatus 1 of the first embodiment. In addition, in the ready state of the substrate processing apparatus 201, as shown in FIG. 19, the control device 3 closes the second parallel valve 212B and opens the first parallel valve 212A. Thereby, in the ready state, in the upstream side portion 33, the liquid medicine flowing on the upstream side of the connection position P4 (fourth connection position) of the first parallel pipe 211A and the second parallel pipe 211B is guided to the first parallel pipe 211A and the second parallel pipe 211B. A parallel pipe 211A passes through the first filter 239A.

On the other hand, the flow of the chemical solution in the cycle stop idling state of the substrate processing apparatus 201 is also the same as the chemical solution flow in the cycle stop idling state of the substrate processing apparatus 1 of the first embodiment (refer to FIG. 10). In the circulation stop idling state, the driving of the pump 37 is stopped, and therefore the circulation of the liquid medicine in both the first circulation flow path C1 and the second circulation flow path C2 is stopped.

In the idling state of the circulation stop, the circulation of the liquid medicine in both the first circulation flow path C1 and the second circulation flow path C2 is stopped, so the equipment inside the medicine tank 5 (machines, piping, consumables, etc.) Carry out maintenance work. This maintenance work includes modification (modification, repair, and replacement) of the equipment arranged upstream of the filters 239A and 239B in the upstream portion 33. Particles may adhere to equipment that has undergone modifications, etc. In this state, when the pump 37 is driven to start the circulation of the chemical solution, a large amount of particles attached to the equipment are supplied to the filters 239A and 239B. As a result, the filters 239A and 239B are clogged and the filter The particle capture capability of the filters 239A and 239B is reduced. As a result, particulates may leak from the filters 239A and 239B.

When transitioning from the cycle-stop idling state to the ready state, as shown in FIG. 20, the control device 3 closes the first parallel valve 212A and opens the second parallel valve 212B. Thereby, in the upstream portion 33, the liquid medicine flowing on the upstream side than the connection position P4 of the first parallel pipe 211A and the second parallel pipe 211B is guided to the second parallel pipe 211B and passes through the second filter 239B.

When a predetermined time has passed since the transition to the ready state, the control device 3 closes the second parallel valve 212B and opens the first parallel valve 212A. Thereby, in the upstream portion 33, the liquid medicine flowing on the upstream side than the connection position P4 of the first parallel pipe 211A and the second parallel pipe 211B is guided to the first parallel pipe 211A and passes through the first filter 239A.

As described above, according to the second embodiment, when the substrate processing apparatus 201 transitions to the ready state, the second filter 239B, which is different from the first filter 239A used in the ready state, is used to filter the chemical solution. 1 Filter 239A to filter the liquid medicine. This can prevent clogging of the first filter 239A. Thereby, the leakage of particulates from the first filter 239A can be suppressed or prevented. Therefore, it is possible to supply a clean chemical solution with a small content of particles (preferably, a clean chemical solution that does not contain particles) to the processing unit 2.

In addition, the mesh of the second filter 239B is thicker than the mesh of the first filter 239A. Therefore, the second filter 239B can capture relatively large particles during the transition to the ready state. In addition, The relatively small particles are captured by the first filter 239A. Therefore, at the time of transition to the ready state, the amount of particulates captured by the second filter 239B can be suppressed, and therefore clogging of the second filter 239B and leakage of particulates from the second filter 239B can be suppressed.

21A is a schematic diagram showing the chemical liquid supply device CS3 of the substrate processing apparatus 301 according to the third embodiment of the present invention.

In the third embodiment, the parts common to the above-mentioned first embodiment are denoted by the same reference numerals as in the case of FIGS. 1 to 17, and the description is omitted.

The main difference between the chemical solution supply device CS3 of the third embodiment and the chemical solution supply device CS1 of the first embodiment is that the return pipe (outer circulation pipe) 302 is branched and connected to the middle of each supply pipe 22. The circulation piping system outside the third embodiment is composed of a portion of the first circulation pipe 31 that is on the upstream side of the connection position P1, a portion of the supply pipe 22 that is on the upstream side of the connection position P9, and a return pipe 302. The internal circulation piping system of the third embodiment is constituted by the portion of the first circulation piping 31 on the downstream side of the connection position P1. The discharge port communication piping system of the third embodiment is constituted by a flow path from the connection position P9 to the discharge port 21a.

In the example of FIG. 21A, not only the discharge valve 23 but also a heater 303, a flow meter 304, a flow adjustment valve 305, etc. are interposed in each supply pipe 22. The return piping 302 is branched in the supply piping 22 and connected to a connection position P9 that is set downstream of the installation position of each of the flow meter 304, the flow control valve 305, and the heater 303. The other end of the return pipe 302 is connected to the chemical tank 30. The third circulation channel C3 that circulates the liquid medicine in the liquid medicine tank 30 is composed of the liquid medicine tank 30, the part of the first circulation pipe 31 that is more upstream than the connection position P1, and the supply pipe 22 that is more upstream than the connection position P9. The part on the upstream side and the return pipe 302 are formed. A return valve 306 for opening and closing the return pipe 302 is interposed in the middle of the return pipe 302.

In the third embodiment, the third circulation channel C3 constitutes an outer circulation channel, and the portion of the first circulation channel C1 on the downstream side of the connection position P1 constitutes an inner circulation channel.

A second discharge valve 307 for opening and closing the downstream portion of each supply pipe 22 is interposed on the downstream side of the connection position P9. By opening the return valve 306 with the second discharge valve 307 closed, the medical solution flowing in the supply pipe 22 on the upstream side of the connection position P9 is guided to the medical solution tank 30 via the return pipe 302. On the other hand, by opening the second discharge valve 307 with the return valve 306 closed, the liquid medicine flowing on the upstream side of the connection position P9 in the supply pipe 22 is guided to the discharge port 21a of the discharge nozzle 21 .

In the third embodiment, as shown in FIG. 21A, the medical solution supply device CS3 includes a pressure adjustment unit that is relatively connected to the upstream portion 33 of the third embodiment, that is, the first circulation pipe 31 P1 is adjusted by the pressure of the part of the flowing liquid medicine on the upstream side. The pressure adjustment unit is an opening adjustment unit that adjusts the opening of the downstream portion 34 on the downstream side of the connection position P1. The opening adjustment unit is interposed in the downstream portion 34. In the example of FIG. 21A, the opening adjustment unit is the adjuster 308. The regulator 308 is, for example, an electro-pneumatic regulator. The opening adjustment unit is not limited to the regulator 308, and may be an electric valve such as a relief valve and an electric needle valve. The pressure adjusting unit further includes a pressure sensor 72 that detects the pressure of the liquid medicine in the upstream portion 33.

As with the substrate processing apparatus 1, as the operation state of the substrate processing apparatus 301, there are a ready state, a cycle stop idling state, and a cycle idling state. In the ready state of the substrate processing apparatus 301, the chemical liquid circulates in both the third circulation flow path C3 constituting the outer circulation flow path and the first circulation flow path C1 constituting the inner circulation flow path (dual circulation state). When the circulation stop of the substrate processing apparatus 301 is idling, the circulation of the liquid medicine in both the third circulation flow path C3 and the first circulation flow path C1 is stopped. In the circulating idling state of the substrate processing apparatus 301, the circulation of the liquid medicine in the third circulating flow path C3 is stopped, and the circulation of the liquid medicine in the first circulating flow path C1 continues. Regardless of whether the substrate processing apparatus 301 is in a ready state or a circulating idle state, the chemical liquid circulates in the second circulating flow path C2. When the substrate processing apparatus 301 is in the circulating stop idling state, the chemical solution does not circulate in the second circulating flow path C2.

In the circulating idling state of the substrate processing apparatus 301, the maintenance person in charge can perform maintenance operations on the processing unit 2 and the transport robot. In addition, the maintenance person in charge of the equipment related to the chemical liquid supply device CS3, that is, the supply pipe 22 and the return pipe 302, and the equipment installed in the supply pipe 22 and the return pipe 302 (for example, The discharge valve 23, the heater 303, the flow meter 304, the flow rate adjustment valve 305, the return valve 306, and the second discharge valve 307 are maintained (remodeling, etc.).

The regulator 308 is controlled in such a way that the pressure of the chemical liquid flowing in the upstream portion 33 in the circulating idle state of the substrate processing apparatus 301 (the chemical liquid circulates in the first circulating flow path C1) , And the pressure of the chemical liquid flowing in the upstream portion 33 in the ready state of the substrate processing apparatus 301 (in the double-circulation state where the chemical liquid circulates in both the first circulating flow path C1 and the third circulating flow path C3) Consistent or close. Since the pressure applied to the filter 39 in the cycle idling state (one cycle state) of the substrate processing apparatus 301 is the same or close to the pressure applied to the filter 39 in the ready state (double cycle state) of the substrate processing apparatus 301, it does not matter The operation state of the substrate processing apparatus 301 is a cyclic idling state or a ready state, and the particle capturing ability of the filter 39 can be maintained fixedly or substantially fixedly.

Thereby, it is possible to suppress or prevent the trapped particles from leaking from the filter 39 in accordance with the change of the pressure applied to the filter 39. Therefore, it is possible to supply a clean chemical solution with a small content of particles (preferably, a clean chemical solution that does not contain particles) to the processing unit 2.

Fig. 21B is a schematic diagram showing a modification of the third embodiment of the present invention.

The modification shown in FIG. 21B is different from the third embodiment shown in FIG. 21A in that the connection position P9 is arranged in the middle of each discharge nozzle 21, that is, in the inside of the processing unit 2. In the modification shown in FIG. 21B, the part of the supply pipe 22 on the downstream side of the connection position P9 constitutes a discharge port communication pipe connected to the discharge port 21a. In the modification shown in FIG. 21B, the third circulation flow path C3 extends to the middle of the discharge nozzle 21, that is, extends to the inside of the processing unit 2. By circulating the liquid medicine heated by the heater in the third circulation flow path C3, the liquid medicine whose temperature is controlled to a high temperature with high accuracy can be discharged from the discharge port of the discharge nozzle 21.

FIG. 21C is a schematic diagram showing the chemical solution supply device CS4 of the substrate processing apparatus 401 according to the fourth embodiment of the present invention.

In the fourth embodiment, the parts common to the first embodiment described above are denoted by the same reference numerals as in the case of FIGS. 1 to 17, and the description is omitted.

The main difference between the chemical solution supply device CS4 of the fourth embodiment and the chemical solution supply device CS1 of the first embodiment is that the upstream portion 33 is set in the device (for example, the pump 37) installed in the upstream portion 33. , The heater 38, the filter 39) downstream of the equipment downstream area 402 is interposed with a pollution state measuring device 403 that measures the pollution state of the equipment downstream area 402.

The machine downstream area 402 is a part of the upstream part 33, which includes the installation position of the machine installed in the upstream part 33 and the downstream of the installation position. When a plurality of machines are installed in the upstream part 33, if the two machines adjacent to each other in the direction of the flow of the liquid medicine are defined as the upstream machine and the downstream machine, the intermediary from the installation position of the upstream machine to the downstream machine The area of the loading position is the downstream area 402 of the machine corresponding to the upstream machine. As shown in FIG. 21C, a machine downstream area 402 is provided for each machine (pump 37, heater 38, filter 39).

In the example of FIG. 21C, three equipment downstream areas 402 are provided in the upstream part 33, and three pollution state measuring devices 403 are interposed in the upstream part 33 corresponding to the second upstream part. Therefore, one pollution state measuring device 403 is provided corresponding to the downstream area 402 of each device.

The contamination state measuring device 403 measures the amount of particles contained in the liquid medicine flowing in the downstream area 402 of each device. Specifically, the contamination state measuring device 403 measures the number of particles contained in the chemical liquid passing through the downstream area 402 of the machine within a fixed time. The measurement result of the pollution state measurement device 403 is input to the control device 3. The contamination state measurement device 403 includes, for example, a particle counter, a total reflection fluorescent X-ray analyzer (TRXRF), an energy dispersive X-ray analyzer (EDX: Energy Dispersive X-ray spectrometer), and a scanning electron microscope (SEM: Scanning Electron Microscope). ), and at least one of image recognition foreign object inspection devices.

The individual drain piping (drain piping) 404 is branched and connected to the downstream area 402 of each device. The downstream end of each individual drain pipe 404 is connected to the drain tank 80. An individual drain valve 405 for opening and closing the individual drain pipe 404 is interposed in the individual drain pipe 404.

The individual drain pipe 404 is connected to the upstream portion 33 at the connection position (fifth connection position) P5. The pollution state measuring device 403 is located at the measurement position P12 of the upstream portion 33 to measure the pollution state. The connection position P5 is arranged at a position separated by a predetermined interval (for example, 15 cm) from the corresponding devices (the pump 37, the heater 38, and the filter 39) to the downstream side. The measurement position P12 is arrange|positioned at the position with a small space|interval (for example, 10 cm) downstream from each corresponding apparatus (pump 37, heater 38, filter 39). In the example of FIG. 21C, the connection position P5 is arrange|positioned more downstream than the measurement position P12. The connection position P5 may be arranged more upstream than the measurement position P12. The measurement position P12 and the connection position P5 may be arranged at the same interval from the corresponding devices (the pump 37, the heater 38, and the filter 39).

A machine downstream valve 406 for opening and closing the machine downstream region 402 is interposed in the downstream region 402 of each machine.

In the fourth embodiment, the individual drain valve 405 and the machine downstream valve 406 constitute a third switching unit. The third switching unit sets the destination of the liquid medicine on the upstream side of the connection position P5 in the downstream area 402 of each device to the downstream side of the connection position P5 in the downstream area 402 of each device, and the individual discharge pipe 404 Switch between. The third switching unit may also be provided with a three-way valve instead of the individual drain valve 405 and the machine downstream valve 406, or be provided with a three-way valve in addition to the individual drain valve 405 and the machine downstream valve 406.

In each machine downstream area 402, by closing the machine downstream valve 406 installed in the machine downstream area 402, and opening the individual drain valve 405 corresponding to the machine downstream area 402, the machine downstream area 402 The flowing liquid medicine is guided to the drain tank 80 through the individual drain pipe 404 corresponding to the downstream area 402 of the machine.

On the other hand, in each machine downstream area 402, by closing the individual drain valve 405 corresponding to the machine downstream area 402, the machine downstream valve 406 interposed in the machine downstream area 402 is opened, and the machine downstream area The liquid medicine in 402 passes through the downstream valve 406 of the machine, and is discharged downstream from the downstream area 402 of the machine. If the machine downstream area 402 is not the most downstream machine downstream area 402, the liquid medicine passing through the machine downstream area 402 is guided to the next machine (in the example of FIG. 21C, the heater 38 or the filter 39).

FIG. 22 is a flowchart for explaining the content of the processing executed in the liquid medicine supply device CS4 in the ready state.

In the ready state of the liquid medicine supply device CS4, the control device 3 constantly monitors the amount of particles contained in the liquid medicine flowing in the downstream area 402 of each device (step S41). In addition, the control device 3 identifies the source of particle generation (the device that becomes the source of particle generation) based on the measurement result of the pollution state measurement device 403.

Then, the control device 3 identifies the machine downstream area 402 corresponding to the specified particle generation source (the machine that becomes the particle generation source) (step S42), and opens the individual drain valve 405 corresponding to the machine downstream area 402 (step S42). S43). At this time, the other individual drain valves 405 are maintained in a closed state (step S43).

FIG. 23 is a flowchart for explaining the first method for identifying the source of particle generation.

The control device 3 investigates whether the measurement value of the pollution state measurement device 403 exceeds a predetermined first threshold value based on the measurement result of the pollution state measurement device 403 (step S51). Furthermore, when the measured value of the pollution state measuring device 403 exceeds the first threshold value (YES in step S51), the control device 3 specifies the downstream area 402 of the equipment corresponding to the pollution state measuring device 403 as the particle generation source ( Step S52).

Fig. 24 is a flow chart for explaining the second method for the specific particle generation source.

Based on the measurement result of the pollution state measuring device 403, the control device 3 investigates whether the difference in the measured values of the pollution state measuring devices 403 adjacent to each other exceeds the second threshold value (step S61). Furthermore, when the difference between the measured values of the adjacent pollution state measuring devices 403 exceeds the second threshold (YES in step S61), the control device 3 will correspond to the pollution state measuring device 403 with the higher measured value. The downstream area 402 is specified as a particle generation source (step S62).

In the first method shown in FIG. 23 and the second method shown in FIG. 24, it is also possible not to base on the magnitude relationship between the measured value and the threshold value, but the magnitude of the calculated value and threshold value calculated based on the measured value Relations to specify the source of particle generation.

According to the fourth embodiment, the pollution state measuring device 403 installed in the downstream area 402 of the machine of the upstream portion 33 measures the particles generated by the machine. With the pollution state measuring device 403, not only the presence or absence of particles generated by the machine can be measured, but also the amount of particles generated by the machine can be measured. In addition, the pollution state measuring device 403 is installed in the downstream area 402 of the machine through which the particles generated by the machine pass, so that the amount of the particles generated by the machine can be accurately measured.

Therefore, it is possible to supply a clean chemical solution with a small content of particles (preferably, a clean chemical solution that does not contain particles) to the processing unit 2.

In addition, the pollution state measuring device 403 is installed corresponding to the downstream area 402 of each device. Based on the measured values of a plurality of pollution state measuring devices 403, it is possible to identify the machine that is the source of particle generation.

In addition, the individual drain piping 404 is branched and connected to the downstream area 402 of each device. When the machine that is the source of particle generation is identified, by discharging the liquid medicine through the individual drain pipe 404 to the downstream area 402 of the machine corresponding to the machine, the liquid medicine containing the particles can be passed through and become the source of particle generation. The machine is directly discharged from the downstream area 402 corresponding to the machine.

In the fourth embodiment, when the substrate processing apparatus 401 is in the ready state and the processing unit 2 is processing the substrate W, the number of particles contained in the chemical liquid flowing in the downstream area 402 of the machine (contamination state measuring device 403 When the measured value or the calculated value based on it exceeds the third threshold value higher than the first threshold value, at least one of the input device 3h (refer to Figure 3) and the alarm device (not shown) will be displayed It can also issue a warning of chemical contamination (abnormal state) to stop substrate processing. Alternatively, when the number of particles in the downstream area 402 of a plurality of machines exceeds the first threshold value, an abnormal state warning is issued to stop the substrate processing. In this case, if there is a substrate processing that is being executed, it will not be stopped immediately, but will be stopped after the processing.

Such processing is not only performed in the substrate processing of the fourth embodiment, but may also be performed in the substrate processing of the fifth embodiment described below.

FIG. 25 is a schematic diagram showing the chemical solution supply device CS5 of the substrate processing apparatus 501 according to the fifth embodiment of the present invention.

In the fifth embodiment, the same reference numerals as in the case of FIGS. 21C to 24 are assigned to the parts common to the above-mentioned fourth embodiment, and the description is omitted.

The main difference between the chemical solution supply device CS5 of the fifth embodiment and the chemical solution supply device CS4 of the fourth embodiment is that a bypass pipe connecting the device downstream area 402 and the second circulation pipe 32 is provided in the downstream area 402 of each device 502 instead of the individual drain piping 404. In addition, the bypass pipe 502 corresponding to the device downstream area 402 on the most downstream side is not provided.

The upstream end of each bypass pipe 502 is connected to the upstream portion 33 at a connection position (sixth connection position) P61. The downstream end of each bypass pipe 502 is connected to the second circulation pipe 32 at the connection position P62. The bypass circulation channels CB1 and CB2 (refer to FIGS. 27 to 28) that circulate the liquid medicine in the liquid medicine tank 30 are composed of the bypass pipe 502, the part on the upstream side of the connection position P61 in the upstream part 33, and The second circulation pipe 32 is formed at the downstream side of the connection position P62.

The upstream end of the bypass piping 502 on the upper side in FIG. 25 (hereinafter, also referred to as "the bypass piping 502 on the upper side") is arranged in comparison with the bypass piping 502 on the lower side in FIG. 25 (hereinafter, also referred to as " The upstream end of the lower bypass pipe 502") is more upstream. On the other hand, the downstream end of the bypass pipe 502 on the upper side is arranged downstream of the downstream end of the bypass pipe 502 on the lower side. Therefore, the positional relationship between the upstream ends of the plurality of bypass pipes 502 in the direction in which the liquid medicine flows is different from the positional relationship between the downstream ends of the plurality of bypass pipes 502 in the direction in which the liquid medicine flows.

Each bypass pipe 502 is interposed with a bypass valve 503 for opening and closing the bypass pipe 502, and a bypass filter 504 for removing foreign substances from the liquid medicine flowing in the bypass pipe 502. The bypass filter 504 is the same filter as the filter 39 (refer to FIG. 7).

In the example of FIG. 25, in each equipment downstream area 402, the connection position P61 of the bypass pipe 502 corresponding to the equipment downstream area 402 is arranged downstream of the measurement position P12 measured by the pollution state measurement device 403 . More specifically, the connection position P61 of the bypass pipe 502 is arranged at a predetermined interval (for example, 15 cm) downstream from the corresponding equipment (the pump 37, the heater 38, and the filter 39). The measurement position P12 and the connection position P61 may be arranged at the same interval from each corresponding device (pump 37, heater 38, filter 39). The connection position P61 may be arranged more upstream than the measurement position P12.

In the fifth embodiment, the bypass valve 503 and the equipment downstream valve 406 constitute a fourth switching unit. The fourth switching unit connects the destination of the liquid medicine on the upstream side of the connection position P61 in the downstream area 402 of each device to the downstream side of the connection position P61 of each device in the downstream area 402 of each device, and the bypass piping 502 Switch between. The fourth switching unit may be provided with a three-way valve instead of the bypass valve 503 and the machine downstream valve 406, or may be provided with a three-way valve in addition to the bypass valve 503 and the machine downstream valve 406.

In each machine downstream area 402, by closing the machine downstream valve 406 corresponding to the machine downstream area 402, and opening the bypass valve 503 corresponding to the machine downstream area 402, the flow will flow in the machine downstream area 402 The medicinal solution is guided to the second circulation pipe 32 through the bypass pipe 502 corresponding to the downstream area 402 of the device.

On the other hand, in each machine downstream area 402, by closing the bypass valve 503 corresponding to the machine downstream area 402, the machine downstream valve 406 corresponding to the machine downstream area 402 is opened, and the machine downstream area 402 The liquid medicine inside passes through the downstream valve 406 of the machine, and is discharged downstream from the downstream area 402 of the machine. If the machine downstream area 402 is not the most downstream machine downstream area 402, the liquid medicine passing through the machine downstream area 402 is guided to the next machine (in the example of FIG. 25, the heater 38 or the filter 39).

FIG. 26 is a flowchart for explaining the content of the processing executed in the liquid medicine supply device CS5 in the ready state.

In the ready state of the liquid medicine supply device CS5, the control device 3 constantly monitors the amount of particles contained in the liquid medicine flowing in the downstream area 402 of each device (step S71). Then, the control device 3 specifies the particle generation source (the device that becomes the particle generation source) based on the measurement result of the pollution state measurement device 403 (step S72). As a method for identifying the source of the particles, the first method shown in FIG. 23 and the second method shown in FIG. 24 can be used.

Then, the control device 3 identifies the machine downstream area 402 corresponding to the specified particle generation source (the machine that becomes the particle generation source), and opens the bypass valve 503 corresponding to the machine downstream area 402 (step S73). At this time, the bypass valve 503 and the second circulation valve 70 (marked as "internal circulation valve 70" in FIG. 23) other than this are maintained in a closed state (step S73).

According to the fifth embodiment, in addition to the functions and effects explained in connection with the fourth embodiment, the following functions and effects are also exhibited.

That is, the bypass pipe 502 that connects the device downstream area 402 and the second circulation pipe 32 is branched and connected to each device downstream area 402. When a device that is a source of particle generation is identified, the liquid medicine in the downstream area 402 of the device corresponding to the device can be directly guided to the second circulation pipe 32 via the bypass pipe 502. In this case, the medicinal solution containing the microparticles can be directly guided to the second circulation pipe 32 from the machine downstream area 402 corresponding to the machine that is the source of the microparticles. The liquid medicine containing particles is cleaned by passing through the bypass filter 504 installed in the bypass pipe 502. Thereby, it is possible to suppress or prevent the particles from spreading to other parts of the upstream part 33 and the second circulation pipe 32.

Figures 27 to 29 are diagrams for explaining the flow of the liquid medicine just after the transition from the circulating stop idling state to the ready state in the fifth embodiment.

If equipment replacement or piping modification is performed while the cycle is stopped and idling, particles may adhere to the replaced equipment or modified piping. When the state transitions to the ready state, when the circulation of the liquid medicine in the circulating flow path starts, a large number of particles attached to the replaced equipment or the remodeled piping diffuse in the first circulating flow path C1 and/or the second 2 The whole area of the circulating flow path C2 is concerned.

When the circulation stops and the idling state transitions to the ready state, as shown in FIGS. 27 to 29, the bypass pipe 502 is opened in order from the bypass pipe 502 whose connection position P61 is located more upstream. First, as shown in FIG. 27, a medical solution flows through the bypass pipe 502 (the bypass pipe 502 corresponding to the pump 37) on the upstream side. Thereby, the chemical liquid circulates in the bypass circulation channel CB1 (refer to FIG. 27).

After the chemical liquid flowing in the bypass circulation channel CB1 becomes clean, as shown in FIG. 28, the chemical liquid flows through the bypass pipe 502 (bypass pipe 502 corresponding to the heater 38) on the downstream side. Thereby, the chemical liquid circulates in the bypass circulation channel CB2 (refer to FIG. 28).

After the liquid medicine flowing in the bypass circulation flow path CB2 becomes clean, as shown in FIG. 29, the liquid medicine is allowed to flow into the second circulation flow path C2. Thereby, the chemical liquid circulates in the second circulation flow path C2.

When the circulation stop and the idling state transition to the ready state, by opening the bypass pipe 502 on the more upstream side from the connection position P61 in order, the circulation flow path of the chemical liquid circulation can be followed by the bypass circulation flow path CB1 → side The order of the circulation channel CB2→the second circulation channel C2 expands step by step. Thereby, it is possible to suppress or prevent the particles from spreading to other parts of the upstream portion 33 or the second circulation pipe 32, and it is possible to circulate the chemical liquid in the second circulation channel C2.

Above, the five embodiments of the present invention have been described, but the present invention can also be implemented in other embodiments.

For example, in the first embodiment, the regulator 71 may adjust the opening degree of the upstream portion 33 instead of the opening degree of the second circulation pipe 32.

In the first and third embodiments described above, the pressure sensor 72 may be arranged on the downstream side of the filter 39. In addition, even if the pressure of the upstream portion 33 is not detected, when the regulator 71 can be used to adjust the pressure of the upstream portion 33 well, the pressure sensor 72 may be omitted.

In the first and third embodiments, the regulators 71 and 308 can also adjust the flow rate in both the ready state and the cycle stop idling state.

In the second, fourth, and fifth embodiments, as the operating state of the substrate processing apparatus, the circulating idling state may not be provided.

As a method of discharging the liquid medicine in the first circulation channel C1 and/or the second circulation channel C2 when shifting to the ready state, the liquid medicine can also be temporarily returned to the medicine liquid tank 30, and then the medicine liquid tank 30 The liquid medicine inside is discharged instead of being discharged through the branch discharge pipe 85.

Instead of connecting the downstream end of each individual pipe 36 of the first circulation pipe 31 to the chemical tank 30, the downstream end of the downstream pipe to which a plurality of individual pipes 36 are connected may be connected to the chemical tank 30.

Instead of connecting the downstream end of each return pipe 302 to the chemical tank 30, the downstream end of the common return pipe connected with a plurality of return pipes 302 may be connected to the chemical tank 30, or the downstream end of each return pipe 302 may be connected to the chemical tank 30. The end is connected to the first circulation pipe 31.

As the pump 37, a pump other than a telescopic pump may be used.

The liquid stored in the liquid medicine tank 30 is not limited to liquid medicine, and may be other liquids such as washing liquid.

The number of supply pipes 22 connected to the same individual pipe 36 may be less than two or more than four.

The number of individual piping 36 provided in the first circulation piping 31 may be less than 3, or may be 5 or more.

In the first to fifth embodiments, the deaeration section 600 may be provided on the downstream side of the heater 38 interposed in the upstream portion 33. As shown by the dotted line in FIG. 5, the degassing part 600 includes a relief pipe 601 and a relief valve 602 installed in the relief pipe 601. The upstream end of the relief pipe 601 is connected to the downstream side of the heater 38 in the upstream portion 33. The downstream end of the drain pipe 601 is connected to the drain tank 80.

When the circulation of the chemical liquid (processing liquid) is stopped, the chemical liquid (processing liquid) accumulated in the heater 38 may vaporize. Sometimes the pressure in the heater 38 increases due to the vaporization of the chemical liquid (treatment liquid).

In the modified example shown by the broken line in FIG. 5, since the degassing part 600 is provided on the downstream side of the heater 38, even when the liquid medicine is vaporized, the generated gas will be discharged by the degassing part 600. Thereby, it is possible to suppress or prevent the pressure increase in the heater 38 when the circulation of the chemical liquid (treatment liquid) is stopped.

In this modification, the downstream end of the discharge pipe 601 may also be connected to the chemical tank 30 instead of being connected to the drain tank 80. In addition, the deaeration unit 600 may also be provided on the upstream side of the heater 38 instead of being provided on the downstream side of the heater 38.

The substrate processing devices 1, 201, 301, 401, and 501 are not limited to devices that process the disc-shaped substrate W, and may be devices that process the polygonal substrate W.

Two or more of the above-mentioned configurations may be combined.

The embodiments of the present invention have been described in detail, but these are only specific examples used to make the technical content of the present invention clear. The present invention should not be limited to these specific examples for interpretation. The spirit of the present invention And the scope is limited only by the scope of the attached patent application.

1: Substrate processing equipment 1a: outer wall 2: processing unit 3: control device 3a: Computer body 3b: CPU 3c: Main memory device 3d: peripheral devices 3e: auxiliary memory device 3f: Reading device 3g: communication device 3h: Display input device 4: fluid box 5: Medicine cabinet 6: Chamber 7: FFU 8: Next door 9: Block gate 10: Rotating chuck 11: Chuck pin 12: Rotating base 13: Rotating motor 14: Cup 14a: Inclined part 14b: Guiding Department 14c: Liquid receiving part 15: Cup lifting unit 16: flushing fluid nozzle 17: Flushing fluid piping 18: Flushing fluid valve 21: Spit out the nozzle 21a: spit out 22: Supply piping 23: Discharge valve 26: Nozzle moving unit 30: medicine tank 31: 1st cycle piping 31a: Upstream 31b: Downstream 32: 2nd cycle piping 33: Upstream part 34: Downstream part 35: Common piping 36: Individual piping 37: Pump 38: heater 39: filter 40: 1st circulation valve 41: Cylinder head 42: Pump head 43: cylinder 44: One side pump room 45: Pump room on the other side 46: Moving components 47: Telescopic tube 48: One side air chamber 49: One side of the liquid chamber 50: Air chamber on the other side 51: The other side of the liquid chamber 55: One side of the liquid introduction port 56: The other side of the liquid introduction port 57: medicinal solution outlet port 61: Filter body 62: shell 63: Hole 64: Degassing piping 65: Degas valve 66: Drainage piping 67: Drain valve 70: 2nd circulation valve 71: regulator 72: Pressure sensor 80: Drain tank 81: Discharge piping 82: discharge valve 83: Drainage piping 85: Branch drain piping 86: Branch drain valve 87: Liquid replenishment piping 88: Liquid replenishment valve 89: return valve 90: Maintenance screen 91: System restart button 92: Emergency stop button 93: Transport stop button 94: Cycle stop button 95: Cycle stop idling button 96: Cycle idle button 100: detection sensor 101: detection sensor 201: Substrate processing equipment 211A: 1st parallel piping 211B: 2nd parallel piping 212A: 1st parallel valve 212B: 2nd parallel valve 239A: 1st filter 239B: 2nd filter 301: Substrate processing device 302: return piping 303: heater 304: Flowmeter 305: Flow adjustment valve 306: Return Valve 307: 2nd discharge valve 308: regulator 401: substrate processing device 402: Downstream area of the machine 403: Pollution state measuring device 404: Individual drain piping 405: Individual drain valve 406: Machine Downstream Valve 501: Substrate processing device 502: Bypass piping 503: Bypass valve 504: Bypass filter 600: degassing part 601: Relief Piping 602: Relief Valve A1: Rotation axis A2: swing axis C: carrier C1: The first circulating flow path C2: Second circulation flow path C3: 3rd circulation flow path CB1: Bypass circulation flow path CB2: Bypass circulation flow path CR: Central Robot CS1: Liquid chemical supply device CS2: Liquid chemical supply device CS3: Liquid chemical supply device CS4: Liquid chemical supply device CS5: Liquid medicine supply device H1: Hand H2: Hands HC: host computer IR: Indexing robot LP: load port P: program P1: Connection position P11: Detection position P12: Measurement position P2: Connection location P3: Connection location P4: Connection location P5: Connection position P61: Connection position P62: Connection position P9: Connection location RM: removable media S1: Step S2: Step S3: steps S4: Step S5: steps S11: steps S12: steps S13: steps S14: Step S16: steps S17: steps S18: steps S21: Step S22: Step S23: Step S24: steps S31: Step S32: Step S33: Step S34: Step S41: Step S42: Step S43: Step S51: Step S52: Step S61: Step S62: Step S71: Step S72: Step S73: Step TW: Tower W: substrate X1: Primary side space X2: Secondary space

Fig. 1 is a schematic view of the substrate processing apparatus of the first embodiment of the present invention viewed from above. FIG. 2 is a schematic view of the inside of the processing unit included in the above-mentioned substrate processing apparatus viewed horizontally. Fig. 3 is a block diagram showing the hardware of the above-mentioned substrate processing apparatus. FIG. 4 is a step diagram for explaining an example of substrate processing performed by the above-mentioned substrate processing apparatus. Fig. 5 is a schematic diagram showing a chemical liquid supply device of the above-mentioned substrate processing apparatus. Fig. 6 is a diagram for explaining the structure of the pump shown in Fig. 5. Fig. 7 is a diagram for explaining the structure of the filter shown in Fig. 5. Fig. 8 is a diagram showing an example of a maintenance screen in the display input device shown in Fig. 3; Fig. 9 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device in the ready state. Fig. 10 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device in the cyclically stopped idling state. Fig. 11 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device in the circulating idling state. FIG. 12 is a flowchart for explaining the transition of the operation state of the substrate processing apparatus from the ready state to the idling state. FIG. 13 is a diagram for explaining the flow of processing performed in the idling state of the cycle stop. Fig. 14 is a diagram for explaining the flow of the liquid medicine shortly after the circulation stops and the idling state transitions to the ready state. Fig. 15 is a diagram for explaining the processing flow in the circulating idling state. FIG. 16 is a diagram for explaining the flow of the liquid medicine shortly after the transition from the circulating idle state to the ready state. Figure 17 is a diagram for explaining the relationship between the stroke time of the pump and the number of particles attached. Fig. 18 is a schematic diagram showing a chemical liquid supply device of a substrate processing apparatus according to a second embodiment of the present invention. Fig. 19 is a diagram for explaining the flow of the liquid medicine in the liquid medicine supply device in the ready state. FIG. 20 is a diagram for explaining the flow of the liquid medicine shortly after the transition from the circulating stop idling state to the ready state. Fig. 21A is a schematic diagram showing a chemical liquid supply device of a substrate processing apparatus according to a third embodiment of the present invention. Fig. 21B is a schematic diagram showing a modification of the third embodiment of the present invention. Fig. 21C is a schematic diagram showing a chemical liquid supply device of a substrate processing apparatus according to a fourth embodiment of the present invention. Fig. 22 is a flowchart for explaining the content of the processing executed in the liquid medicine supply device in the ready state. FIG. 23 is a flowchart for explaining the first method for identifying the source of particle generation. FIG. 24 is a flowchart for explaining the second method for identifying the source of particle generation. Fig. 25 is a schematic diagram showing a chemical liquid supply device of a substrate processing apparatus according to a fifth embodiment of the present invention. Fig. 26 is a flowchart for explaining the content of the processing executed in the liquid medicine supply device in the ready state. Fig. 27 is a diagram for explaining the flow of liquid medicine shortly after the transition from the circulating stop idling state to the ready state. Fig. 28 is a diagram showing the state after Fig. 27; Fig. 29 is a diagram showing the state after Fig. 28;

1: Substrate processing equipment 2: processing unit 4: fluid box 5: Medicine cabinet 6: Chamber 10: Rotating chuck 21: Spit out the nozzle 21a: spit out 22: Supply piping 23: Discharge valve 30: medicine tank 31: 1st cycle piping 31a: Upstream 31b: Downstream 32: 2nd cycle piping 33: Upstream part 34: Downstream part 35: Common piping 36: Individual piping 37: Pump 38: heater 39: filter 40: 1st circulation valve 64: Degassing piping 65: Degas valve 66: Drainage piping 67: Drain valve 70: 2nd circulation valve 71: regulator 72: Pressure sensor 80: Drain tank 81: Discharge piping 82: discharge valve 83: Drainage piping 85: Branch drain piping 86: Branch drain valve 87: Liquid replenishment piping 88: Liquid replenishment valve 89: return valve 600: degassing part 601: Relief Piping 602: Relief Valve C1: The first circulating flow path C2: Second circulation flow path CS1: Liquid chemical supply device P1: Connection position P2: Connection location P3: Connection location P11: Detection position TW: Tower W: substrate

Claims (23)

A substrate processing device, which includes: A processing unit, which has a discharge port for discharging the processing liquid to the substrate; Treatment liquid tank, which stores the treatment liquid supplied to the above-mentioned discharge port; The external circulation piping includes an upstream end and a downstream end connected to the above-mentioned treatment liquid tank, and forms an external circulation flow path for circulating the treatment liquid in the above-mentioned treatment liquid tank together with the above-mentioned treatment liquid tank; A pump that sends the processing liquid in the processing liquid tank to the outer circulation piping; The discharge port communication pipe is branched and connected to the outer circulation pipe at the first connection position, and is connected to the discharge port; The inner circulation piping is branched and connected to the outer circulation piping at a second connection position that is more upstream than the first connection position, and is connected to the outer circulation piping that is more upstream than the second connection position, that is, the first 2 The upstream part and the treatment liquid tank together form an inner circulation flow path that circulates the treatment liquid in the treatment liquid tank, and returns the treatment liquid supplied from the outer circulation piping to the treatment liquid tank; A filter, which is installed in the second upstream part; A pressure adjusting unit that adjusts the pressure of the processing liquid flowing in the second upstream part; and A control device that controls the pressure adjustment unit in such a manner that the processing liquid does not circulate in the outer circulation flow path but the treatment liquid circulates in the inner circulation flow path in one of the circulation states on the second upstream side The pressure of the partially flowing processing liquid is the same as or close to the pressure of the partially flowing processing liquid on the second upstream side in a double-circulation state in which the processing liquid circulates in both the outer circulation channel and the inner circulation channel. Such as the substrate processing apparatus of claim 1, wherein: The pressure adjustment unit includes an opening adjustment unit that adjusts the opening of the internal circulation pipe. Such as the substrate processing apparatus of claim 1, wherein: As the operating state of the above-mentioned substrate processing apparatus, selectively executable states are provided: an executable state, which executes the above-mentioned two-cycle state; and a standby state, which is a state different from the above-mentioned executable state and maintains the processing Power supply for the device; The standby state includes a cyclic standby state that realizes the one-sided cyclic state. Such as the substrate processing apparatus of claim 3, wherein: The standby state further includes a cycle stop standby state in which the power supply to the substrate processing apparatus is maintained while the pump is stopped, so that the processing liquid in the outer circulation channel and the inner circulation channel is stopped. The loop stops. Such as the substrate processing apparatus of claim 4, wherein: The above-mentioned substrate processing apparatus further includes: An internal circulation valve, which is installed in the internal circulation piping, and opens and closes the internal circulation piping; A drain piping, which is branched and connected at a third connection position to the second downstream side part of the outer circulation piping that is more downstream than the second connection position, and discharges the treatment liquid from the second downstream side part; and A first switching unit that transfers the destination of the processing liquid on the upstream side of the second downstream side portion than the third connection position to the downstream side of the second downstream side portion than the third connection position, Switch with the above-mentioned drain piping; The control device executes the following steps when transitioning from the cycle stop standby state to the executable state, that is, start driving the pump, close the internal circulation valve, and make the second downstream part more connected to the third The first switching unit is driven in such a way that the processing liquid located on the upstream side flows into the drain pipe, thereby passing the processing liquid in the second upstream portion and the processing liquid in the second downstream portion through the drain The liquid is discharged through the piping. Such as the substrate processing apparatus of claim 4, which further includes a selection unit operated by a user to select any one of a plurality of standby states including the above-mentioned cycle standby state and the above-mentioned cycle stop standby state. Such as the substrate processing apparatus of claim 3, wherein: The substrate processing apparatus further includes a detection unit that detects the state related to the substrate processing apparatus, When the above-mentioned state is detected by the above-mentioned detection unit in the above-mentioned circulating standby state, the above-mentioned control device further executes the following steps, namely, stopping the driving of the above-mentioned pump to make the treatment liquid in the above-mentioned outer circulation flow path be reduced The loop stops. Such as the substrate processing apparatus of claim 1, wherein: The substrate processing apparatus includes a plurality of the processing units, The outer circulation piping includes a first circulation piping that supplies the processing liquid to the plurality of the processing units in common, and The discharge port communication pipe includes a plurality of supply pipes corresponding to the plurality of the processing units on a one-to-one basis. A substrate processing device, which includes: A processing unit, which has a discharge port for discharging the processing liquid to the substrate; Treatment liquid tank, which stores the treatment liquid supplied to the above-mentioned discharge port; The external circulation piping includes an upstream end and a downstream end connected to the above-mentioned treatment liquid tank, and forms an external circulation flow path for circulating the treatment liquid in the above-mentioned treatment liquid tank together with the above-mentioned treatment liquid tank; A pump that sends the processing liquid in the processing liquid tank to the outer circulation piping; The discharge port communication pipe is branched and connected to the outer circulation pipe at the first connection position, and is connected to the discharge port; The inner circulation piping is branched and connected to the outer circulation piping at a second connection position that is more upstream than the first connection position, and is connected to the outer circulation piping that is more upstream than the second connection position, that is, the first 2 The upstream part and the treatment liquid tank together form an inner circulation flow path that circulates the treatment liquid in the treatment liquid tank, and returns the treatment liquid supplied from the outer circulation piping to the treatment liquid tank; The first filter and the second filter are respectively inserted in the first parallel piping and the second parallel connected in parallel on the upstream side of the second connection position as a part of the second upstream part. Piping; The second switching unit connects the destination of the treatment liquid on the upstream side of the fourth connection position where the upstream end of the first parallel pipe and the upstream end of the second parallel pipe are connected to each other, in the first parallel pipe, and Switch between the above-mentioned second parallel piping; and A control device that controls the second switching unit to set the destination of the processing liquid on the upstream side of the fourth connection position to the second parallel when starting the drive of the pump from the state where the drive of the pump is stopped After that, the piping controls the second switching unit to switch the destination of the processing liquid on the upstream side of the fourth connection position to the first parallel piping. Such as the substrate processing apparatus of claim 9, wherein: The above-mentioned first filter is different from the above-mentioned second filter in terms of filtration performance. A substrate processing device, which includes: A processing unit, which has a discharge port for discharging the processing liquid to the substrate; Treatment liquid tank, which stores the treatment liquid supplied to the above-mentioned discharge port; The external circulation piping includes an upstream end and a downstream end connected to the above-mentioned treatment liquid tank, and forms an external circulation flow path for circulating the treatment liquid in the above-mentioned treatment liquid tank together with the above-mentioned treatment liquid tank; A pump that sends the processing liquid in the processing liquid tank to the outer circulation piping; The discharge port communication pipe is branched and connected to the outer circulation pipe at the first connection position, and is connected to the discharge port; The inner circulation piping is branched and connected to the outer circulation piping at a second connection position that is more upstream than the first connection position, and is connected to the outer circulation piping that is more upstream than the second connection position, that is, the first 2 The upstream part and the treatment liquid tank together form an inner circulation flow path that circulates the treatment liquid in the treatment liquid tank, and returns the treatment liquid supplied from the outer circulation piping to the treatment liquid tank; and A pollution state measuring device installed in the downstream area of the machine to measure the pollution state in the downstream area of the machine. The downstream area of the machine is set in the second upstream part and downstream of the machine installed in the second upstream part side. Such as the substrate processing device of claim 11, which includes: A plurality of the above-mentioned machines are installed in the above-mentioned second upstream side part; and A plurality of the above-mentioned pollution state measuring devices correspond to a plurality of the above-mentioned equipment downstream areas on a one-to-one basis, and are interposed in the above-mentioned second upstream side portion, and the plurality of the above-mentioned equipment downstream areas are one with the above-mentioned plural equipment One-to-one correspondence. Such as the substrate processing apparatus of claim 12, which further includes: A plurality of drainage pipes, which are branched and connected to the plurality of downstream regions of the above-mentioned equipment at a plurality of fifth connection positions provided for each downstream region of the above-mentioned equipment; and A third switching unit that transfers the destination of the treatment liquid on the upstream side of the second upstream side portion than the fifth connection position to the downstream side of the second upstream side portion than the fifth connection position, Switch with the above-mentioned drain piping connected to the downstream area of the machine. Such as the substrate processing apparatus of claim 13, wherein: The above-mentioned substrate processing apparatus further includes: A plurality of the above-mentioned third switching units, which correspond one-to-one with the above-mentioned plurality of discharge pipes; and A control device that controls the plurality of the third switching units; When the number of particles contained in the processing liquid flowing in the downstream area of the machine exceeds the threshold value, the control device controls the third switching unit corresponding to the liquid discharge pipe in the following manner, that is, the machine downstream The destination of the processing liquid in the area is switched to the liquid discharge pipe, and the processing liquid on the upstream side of the second upstream part of the machine downstream area is discharged to the outside of the substrate processing apparatus. Such as the substrate processing apparatus of claim 13, wherein: The above-mentioned substrate processing apparatus further includes: A plurality of the above-mentioned third switching units, which correspond one-to-one with the above-mentioned plurality of discharge pipes; and A control device that controls the plurality of the third switching units; When the difference between the number of particles contained in the processing liquid flowing in the downstream regions of the two adjacent devices exceeds a threshold value, the control device controls the third switch corresponding to the discharge pipe as follows The unit, that is, the destination of the treatment liquid in the downstream area of the machine with a large number of particles is switched to the liquid discharge pipe, and the treatment liquid of the second upstream part is discharged to the upstream side of the downstream area of the machine. Outside the above-mentioned substrate processing apparatus. Such as the substrate processing apparatus of claim 12, which further includes: Bypass piping, which connects the downstream region of the machine and the internal circulation piping, and the part on the upstream side of the second upstream side part that is more upstream than the connection position of the bypass piping, and the internal circulation piping The connection position of the bypass piping is closer to the downstream side together to form a bypass circulation flow path that circulates the processing liquid in the processing liquid tank; and A fourth switching unit that transfers the destination of the processing liquid that is more upstream than the sixth connection position of the bypass pipe in the second upstream part to the second upstream part than the sixth connection position Switching to the bypass piping further downstream. Such as the substrate processing apparatus of claim 16, wherein: The above-mentioned substrate processing apparatus further includes: Multiple bypass piping mentioned above; A plurality of the above-mentioned fourth switching units, which correspond to the above-mentioned plurality of bypass piping one-to-one; and A control device, which controls the plurality of the fourth switching units; When the number of particles contained in the processing liquid flowing in the downstream area of the machine exceeds the threshold, the control device switches the destination of the processing liquid in the downstream area of the machine to the bypass piping to control The above-mentioned fourth switching unit corresponding to the bypass piping. Such as the substrate processing apparatus of claim 16, wherein: The above-mentioned substrate processing apparatus further includes: Multiple bypass piping mentioned above; A plurality of the above-mentioned fourth switching units, which correspond to the above-mentioned plurality of bypass piping one-to-one; and A control device, which controls the plurality of the fourth switching units; When the difference between the number of particles contained in the processing liquid flowing in the two adjacent downstream areas of the machine exceeds a threshold value, the control device can reduce the number of particles in the processing liquid in the downstream area of the machine. The destination is switched to the bypass piping method, and the fourth switching unit corresponding to the bypass piping is controlled. Such as the substrate processing apparatus of claim 16, wherein: The above-mentioned substrate processing apparatus further includes: Multiple bypass piping mentioned above; A plurality of the above-mentioned fourth switching units, which correspond to the above-mentioned plurality of bypass piping one-to-one; and A control device, which controls the plurality of the fourth switching units; The plurality of the bypass pipes are connected to the second upstream side portion at a plurality of the sixth connection positions corresponding to the plurality of the bypass pipes one-to-one, and When starting the driving of the pump from the state where the driving of the pump is stopped, the control device controls the plurality of the fourth switching units in the following manner, that is, the plurality of the sixth connection positions in the direction in which the liquid medicine flows The positional relationship is the reference, and the plurality of bypass pipes are opened sequentially from the upstream side. The substrate processing apparatus of claim 16, which further includes a filter installed in the bypass pipe. Such as the substrate processing apparatus of claim 11, wherein: In the execution of the substrate processing in the above-mentioned processing unit, when the number of particles contained in the processing liquid flowing in the downstream area of the above-mentioned machine exceeds the threshold value, an abnormal state is reported, and after the substrate processing in execution is completed, Stop supplying the processing liquid to the above-mentioned processing unit. Such as the substrate processing apparatus of any one of claims 5, 14 and 15, wherein: The above-mentioned pump includes a telescopic pump, and the telescopic pump includes: a moving member configured to be reciprocally movable; and a telescopic tube, one end of which is fixed to the frame body, and the other end of which is fixed to the moving member; When discharging the processing liquid in at least one of the outer circulation pipe and the inner circulation pipe to the outside of the substrate processing apparatus, the control device controls the telescopic pump so as to increase the stroke time of the moving member. Such as the substrate processing apparatus of any one of claims 1 to 21, which further comprises: A heater, which is installed in the second upstream part; and The deaeration part is provided on at least one of the upstream side and the downstream side of the heater.

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