TWI732178B - Chemical liquid control valve and substrate processing device - Google Patents
Chemical liquid control valve and substrate processing device Download PDFInfo
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- TWI732178B TWI732178B TW108104752A TW108104752A TWI732178B TW I732178 B TWI732178 B TW I732178B TW 108104752 A TW108104752 A TW 108104752A TW 108104752 A TW108104752 A TW 108104752A TW I732178 B TWI732178 B TW I732178B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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Abstract
本發明提供一種能夠提高藥液之置換特性之藥液控制閥及基板處理裝置。 流路閥塊21具有第1外壁21a及作為與第1外壁21a呈直角之面之第2外壁21b。配置針41之流量調整用閥室27以流路閥塊21之第1外壁21a凹陷之方式形成。另一方面,配置隔膜51之開閉用閥室29以第2外壁21b凹陷之方式形成。中間流路31將流量調整用閥室27與開閉用閥室29連接,中間流路31相對於第1外壁21a及第2外壁21b之任一個呈直角延伸。藉由此種構成,能夠將中間流路31形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。The present invention provides a chemical liquid control valve and a substrate processing device capable of improving the replacement characteristics of the chemical liquid. The flow path valve block 21 has a first outer wall 21a and a second outer wall 21b that is a surface at a right angle to the first outer wall 21a. The valve chamber 27 for adjusting the flow rate in which the needle 41 is arranged is formed such that the first outer wall 21a of the flow path valve block 21 is recessed. On the other hand, the opening and closing valve chamber 29 in which the diaphragm 51 is arranged is formed so that the second outer wall 21b is recessed. The intermediate flow path 31 connects the flow rate adjustment valve chamber 27 and the opening/closing valve chamber 29, and the intermediate flow path 31 extends at a right angle with respect to any one of the first outer wall 21a and the second outer wall 21b. With this configuration, the intermediate flow path 31 can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.
Description
本發明係關於一種藥液控制閥及具備其之基板處理裝置,該藥液控制閥用來控制對半導體基板、液晶顯示裝置或有機EL (electroluminescence,電致發光)顯示裝置等FPD(Flat Panel Display,平板顯示器)用基板、光罩用玻璃基板、光碟用基板、磁碟用基板、陶瓷基板、太陽電池用基板等基板供給之藥液。The present invention relates to a chemical liquid control valve and a substrate processing device provided with the chemical liquid control valve. The chemical liquid control valve is used to control a FPD (Flat Panel Display) such as a semiconductor substrate, a liquid crystal display device, or an organic EL (electroluminescence) display device. , Flat panel display) substrates, glass substrates for photomasks, substrates for optical disks, substrates for magnetic disks, ceramic substrates, substrates for solar cells, and other substrates supplied with chemical solutions.
如圖7所示,先前之藥液控制閥201具備流量調整閥202與開閉閥(ON ·OFF閥)203(例如參照專利文獻1、2)。流量調整閥202對所供給之藥液之流量進行調整。另一方面,開閉閥203使藥液進行供給,又,使藥液之供給停止。流量調整閥202與開閉閥203之間利用V字流路205或專利文獻2所記載之圓弧狀流路(以下稱為「V字流路205等」)連接。因此,從流量調整閥202輸送之藥液通過V字流路205等被輸送至開閉閥203。
[背景技術文獻]
[專利文獻]As shown in Fig. 7, the conventional chemical
[專利文獻1] 日本專利特開2001-263507號公報 [專利文獻2] 日本專利特開2017-207121號公報[Patent Document 1] Japanese Patent Publication No. 2001-263507 [Patent Document 2] Japanese Patent Laid-Open No. 2017-207121
[發明所欲解決之問題][The problem to be solved by the invention]
此種先前之藥液控制閥201存在如下問題。如上所述,從流量調整閥202輸送之藥液通過V字流路205等被輸送至開閉閥203。若使藥液通過V字流路205等,則有從藥液控制閥201之入口至出口之藥液之置換特性變差之掛慮。假若藥液之置換特性差,則有因滯留之以前之藥液而導致液體中產生污物之掛慮。因此,較佳為提高藥液控制閥201中之藥液之置換特性。The conventional liquid
本發明係鑒於此種情形而完成者,其目的在於提供一種能夠提高藥液之置換特性之藥液控制閥及具備其之基板處理裝置。 [解決問題之技術手段]The present invention was completed in view of this situation, and its object is to provide a chemical liquid control valve capable of improving the replacement characteristics of the chemical liquid and a substrate processing apparatus having the same. [Technical means to solve the problem]
為了達成此種目的,本發明採用如下構成。即,本發明之藥液控制閥之特徵在於具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁呈直角之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁之任一個呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,與上述開閉用閥室連接;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。In order to achieve such an object, the present invention adopts the following configuration. That is, the chemical liquid control valve of the present invention is characterized by comprising: a single flow path valve block having a first outer wall and a second outer wall that is a surface at right angles to the first outer wall; The first outer wall is recessed; the valve chamber for opening and closing is formed by recessing the second outer wall; the intermediate flow path is formed inside the flow path valve block and is linear, and the flow rate adjustment The valve chamber is connected to the valve chamber for opening and closing, and extends at right angles to any one of the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block to adjust the flow rate Connected by a valve chamber; a second flow path formed inside the flow path valve block and connected to the opening and closing valve chamber; a needle moving mechanism having a needle arranged in the flow rate adjustment valve chamber to block the flow Adjusting the valve chamber and moving the needle in order to adjust the flow rate of the liquid medicine; and an opening and closing valve body moving mechanism having an opening and closing valve body arranged in the opening and closing valve chamber to block the opening and closing valve chamber, and The valve body for opening and closing is moved in order to supply and stop the supply of the liquid medicine.
根據本發明之藥液控制閥,流路閥塊具有第1外壁及作為與第1外壁呈直角之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁之任一個呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the chemical liquid control valve of the present invention, the flow path valve block has a first outer wall and a second outer wall that is a plane at right angles to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to either the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.
又,本發明之藥液控制閥之特徵在於具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁對向並且與上述第1外壁平行之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,與上述開閉用閥室連接;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。In addition, the liquid medicine control valve of the present invention is characterized by comprising: a single flow path valve block having a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall; flow rate The valve chamber for adjustment is formed with the first outer wall recessed; the valve chamber for opening and closing is formed with the second outer wall recessed; the intermediate flow path is formed inside the flow path valve block and is linear , And connect the flow rate adjustment valve chamber and the opening and closing valve chamber to extend at right angles to the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block, Connected to the valve chamber for the flow rate adjustment; a second flow path formed inside the flow path valve block and connected to the valve chamber for opening and closing; a needle moving mechanism having a needle arranged in the valve chamber for the flow rate adjustment, The valve chamber for adjusting the flow rate is blocked, and the needle is moved to adjust the flow rate of the liquid medicine; and a valve body moving mechanism for opening and closing, which has an opening and closing valve body arranged in the valve chamber for opening and closing, and blocking the opening and closing In the valve chamber, the valve body for opening and closing is moved for the purpose of supplying and stopping the supply of the liquid medicine.
根據本發明之藥液控制閥,流路閥塊具有第1外壁、及作為與第1外壁對向並且與上述第1外壁平行之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the medicinal solution control valve of the present invention, the flow path valve block has a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.
又,於上述藥液控制閥中,較佳為上述第1流路及上述第2流路分別為直線狀,且相對於上述中間流路呈直角延伸。於使材料流入至模具中而形成流路閥塊時,能夠將為了形成中間流路而插入至模具內之第1銷部件、與為了形成第1流路及第2流路而插入至模具內之第2銷部件及第3銷部件各者呈直角配置。因此,相較於第1銷部件與第2銷部件及第3銷部件各者傾斜地配置(並非直角)之情形,能夠容易地形成中間流路、第1流路及第2流路。In addition, in the chemical liquid control valve, it is preferable that the first flow path and the second flow path are linear and extend at right angles to the intermediate flow path. When the material is poured into the mold to form the flow path valve block, the first pin member inserted into the mold to form the intermediate flow path and the first pin member to form the first flow path and the second flow path can be inserted into the mold. The second pin part and the third pin part are arranged at right angles. Therefore, compared with the case where the first pin member, the second pin member, and the third pin member are arranged obliquely (not at a right angle), the intermediate flow path, the first flow path, and the second flow path can be easily formed.
又,於上述藥液控制閥中,較佳為上述第1流路與上述第2流路平行,上述第1流路中與連接上述流量調整用閥室之部分為相反側之第1連接口,朝向與上述第2流路中與連接上述開閉用閥室之部分為相反側之第2連接口相同之方向開口。於使材料流入至模具中而形成流路閥塊時,能夠使為了形成第1流路及第2流路而插入至模具內之第2銷部件及第3銷部件朝相同之方向移動。因此,相較於第2銷部件插入至模具內之朝向與第3銷部件之朝向不同之情形,能夠容易地形成第1流路及第2流路。Furthermore, in the chemical liquid control valve, it is preferable that the first flow path is parallel to the second flow path, and the portion of the first flow path that connects to the flow rate adjustment valve chamber is a first connection port on the opposite side It opens in the same direction as the second connection port on the opposite side of the part connecting the opening and closing valve chamber in the second flow path. When the material is poured into the mold to form the flow path valve block, the second pin member and the third pin member inserted into the mold to form the first flow path and the second flow path can be moved in the same direction. Therefore, compared with the case where the orientation of the second pin member inserted into the mold is different from the orientation of the third pin member, the first flow path and the second flow path can be easily formed.
又,於上述藥液控制閥中,較佳為上述流路閥塊係由PFA(perfluoroalkoxyalkane,全氟烷氧基烷烴)形成。若流路閥塊由PFA形成,則流路閥塊之表面會由作為較其內部硬之層(膜)之表層覆蓋。若藥液滲入至流路閥塊之內部,則結果有從流路閥塊之內部引出污物之掛慮。但是,因為表層會防止藥液之滲入,故而能夠抑制藥液之純淨度變差之掛慮。In addition, in the chemical liquid control valve, it is preferable that the flow path valve block is formed of PFA (perfluoroalkoxyalkane, perfluoroalkoxyalkane). If the flow path valve block is formed of PFA, the surface of the flow path valve block will be covered with a surface layer (film) that is harder than the inside. If the liquid medicine penetrates into the inside of the flow path valve block, as a result, there is a concern that dirt will be drawn from the inside of the flow path valve block. However, because the surface layer prevents the penetration of the liquid medicine, it can suppress the fear of deterioration of the purity of the liquid medicine.
又,本發明之基板處理裝置之特徵在於具備:保持旋轉部,其保持基板,且使所保持之基板旋轉;噴嘴,其對保持於上述保持旋轉部之基板噴出藥液;藥液配管,其連接於上述噴嘴;及藥液控制閥,其調整從上述噴嘴噴出之藥液之流量,且使藥液從上述噴嘴噴出,使藥液噴出停止;上述藥液控制閥具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁呈直角之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁之任一個呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,且與上述開閉用閥室連接,並且經由上述藥液配管連接於上述噴嘴;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。Furthermore, the substrate processing apparatus of the present invention is characterized by comprising: a holding and rotating part that holds a substrate and rotates the held substrate; a nozzle that ejects a chemical solution to the substrate held by the holding and rotating part; and a chemical solution piping, which Connected to the nozzle; and a liquid chemical control valve, which adjusts the flow rate of the liquid chemical sprayed from the nozzle and causes the liquid chemical to be sprayed from the nozzle to stop the spray of the chemical liquid; the liquid chemical control valve includes: a single flow path valve Block, which has a first outer wall and a second outer wall that is a surface at right angles to the first outer wall; a valve chamber for flow adjustment formed in such a way that the first outer wall is recessed; and a valve chamber for opening and closing is the same as the second The outer wall is recessed; the intermediate flow path is formed inside the flow path valve block, is linear, and connects the flow rate adjustment valve chamber and the opening and closing valve chamber relative to the first outer wall and Any one of the second outer walls extends at a right angle; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment valve chamber; the second flow path is formed in the flow path valve block Inside, and connected to the valve chamber for opening and closing, and connected to the nozzle via the drug solution pipe; a needle moving mechanism having a needle arranged in the valve chamber for flow rate adjustment to block the valve chamber for flow rate adjustment, and Adjusting the flow rate of the liquid medicine to move the needle; and an opening and closing valve body moving mechanism having an opening and closing valve body arranged in the opening and closing valve chamber, blocking the opening and closing valve chamber, and for supplying the liquid medicine and The stop of the supply moves the valve body for opening and closing.
根據本發明之基板處理裝置,具備藥液控制閥。於藥液控制閥中,流路閥塊具有第1外壁及作為與第1外壁呈直角之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁之任一個呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the substrate processing apparatus of the present invention, a chemical liquid control valve is provided. In the chemical liquid control valve, the flow path valve block has a first outer wall and a second outer wall that is a plane at right angles to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to either the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.
又,本發明之基板處理裝置之特徵在於具備:保持旋轉部,其保持基板,且使所保持之基板旋轉;噴嘴,其對保持於上述保持旋轉部之基板噴出藥液;藥液配管,其連接於上述噴嘴;及藥液控制閥,其調整從上述噴嘴噴出之藥液之流量,且使藥液從上述噴嘴噴出,使藥液噴出停止;上述藥液控制閥具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁對向並且與上述第1外壁平行之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,且與上述開閉用閥室連接,並且經由上述藥液配管連接於上述噴嘴;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。Furthermore, the substrate processing apparatus of the present invention is characterized by comprising: a holding and rotating part that holds a substrate and rotates the held substrate; a nozzle that ejects a chemical solution to the substrate held by the holding and rotating part; and a chemical solution piping, which Connected to the nozzle; and a liquid chemical control valve, which adjusts the flow rate of the liquid chemical sprayed from the nozzle and causes the liquid chemical to be sprayed from the nozzle to stop the spray of the chemical liquid; the liquid chemical control valve includes: a single flow path valve A block having a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall; a valve chamber for flow adjustment, which is formed in such a way that the first outer wall is recessed; and a valve for opening and closing A chamber formed in such a manner that the second outer wall is recessed; an intermediate flow path is formed inside the flow path valve block, is linear, and connects the flow rate adjustment valve chamber and the opening and closing valve chamber, Extends at right angles to the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment valve chamber; the second flow path is formed in the flow The inside of the valve block is connected to the valve chamber for opening and closing, and is connected to the nozzle via the chemical liquid pipe; a needle moving mechanism having a needle arranged in the valve chamber for flow adjustment to block the valve for flow adjustment And move the needle in order to adjust the flow rate of the liquid medicine; and an opening and closing valve body moving mechanism, which has an opening and closing valve body arranged in the opening and closing valve chamber, blocking the opening and closing valve chamber, and in order to perform the medicine The supply of the liquid and the stop of the supply move the valve body for opening and closing.
根據本發明之基板處理裝置,具備藥液控制閥。於藥液控制閥中,流路閥塊具有第1外壁、及作為與第1外壁對向並且與上述第1外壁平行之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the substrate processing apparatus of the present invention, a chemical liquid control valve is provided. In the chemical liquid control valve, the flow path valve block has a first outer wall and a second outer wall that is a surface facing the first outer wall and parallel to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.
再者,本說明書亦公開了如下藥液控制閥之製造方法之發明。Furthermore, this specification also discloses the invention of the following method of manufacturing the liquid medicine control valve.
本發明之藥液控制閥之製造方法之特徵在於包括如下步驟:準備一對模具,上述一對模具於內部空間具有第1內壁及作為與上述第1內壁呈直角之面之第2內壁,且具有:第1突出部,其為了形成流量調整用閥室而設置於上述第1內壁;第2突出部,其為了形成開閉用閥室而設置於上述第2內壁;及直線狀之第1銷部件,其使上述第1突出部與上述第2突出部連接,並且沿相對於上述第1內壁及第2內壁之任一個呈直角延伸之方向插入;以與上述第1突出部連接之方式將直線狀之第2銷部件插入至上述內部空間;以與上述第2突出部連接之方式將直線狀之第3銷部件插入至上述內部空間;於將上述第2銷部件及上述第3銷部件插入至上述內部空間後,使經加熱而熔化之樹脂流入至上述內部空間;以及於將流入至上述內部空間之樹脂冷卻固化後,將成為單一之流路閥塊之樹脂從一對模具卸下。The method for manufacturing a liquid medicine control valve of the present invention is characterized by including the steps of preparing a pair of molds, the pair of molds having a first inner wall in the inner space and a second inner wall that is a surface at right angles to the first inner wall. The wall has: a first protrusion that is provided on the first inner wall to form a valve chamber for flow rate adjustment; a second protrusion that is provided on the second inner wall to form a valve chamber for opening and closing; and a straight line A first pin member in a shape that connects the first protrusion with the second protrusion, and is inserted in a direction extending at right angles to any one of the first inner wall and the second inner wall; 1. Insert the linear second pin member into the internal space by connecting the protruding portion; insert the linear third pin member into the internal space so as to connect with the second protruding portion; then insert the second pin After the components and the third pin component are inserted into the internal space, the heated and melted resin flows into the internal space; and after the resin flowing into the internal space is cooled and solidified, it will become a single flow path valve block The resin is removed from a pair of molds.
根據本發明之藥液控制閥之製造方法,一對模具於內部空間具有第1內壁及作為與第1內壁呈直角之面之第2內壁。一對模具具有:第1突出部,其為了形成流量調整用閥室而設置於第1內壁;第2突出部,為了形成開閉用閥室而設置於第2內壁;及直線狀之第1銷部件,其使第1突出部與上述第2突出部連接,並且沿相對於第1內壁及第2內壁之任一個呈直角延伸之方向插入。藉由以此種構造形成流路閥塊,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。再者,於先前之藥液控制閥中,V字流路係藉由於形成後從流量調整用閥室及開閉用閥室這兩個方向進行切削來形成。根據本發明,不進行切削便能形成直線狀之中間流路31。
[發明之效果]According to the method of manufacturing a chemical liquid control valve of the present invention, a pair of molds has a first inner wall and a second inner wall that is a plane at right angles to the first inner wall in the inner space. A pair of molds have: a first protrusion provided on the first inner wall to form a valve chamber for flow adjustment; a second protrusion provided on the second inner wall to form a valve chamber for opening and closing; and a linear first A pin member that connects the first protrusion to the second protrusion, and is inserted in a direction extending at right angles to any one of the first inner wall and the second inner wall. By forming the flow path valve block with such a structure, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like. Furthermore, in the conventional chemical liquid control valve, the V-shaped flow path is formed by cutting from the two directions of the valve chamber for flow rate adjustment and the valve chamber for opening and closing after formation. According to the present invention, the linear
根據本發明之藥液控制閥及具備其之基板處理裝置,能夠提高藥液之置換特性。According to the chemical liquid control valve and the substrate processing apparatus provided with the chemical liquid control valve of the present invention, the replacement characteristics of the chemical liquid can be improved.
以下,參照附圖對本發明之實施例進行說明。圖1係實施例之基板處理裝置之概略構成圖。圖2係實施例之藥液控制閥之概略構成圖。Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a schematic configuration diagram of the substrate processing apparatus of the embodiment. Fig. 2 is a schematic configuration diagram of the liquid medicine control valve of the embodiment.
<基板處理裝置1之構成>
參照圖1。基板處理裝置1具備噴嘴2與保持旋轉部3。噴嘴2對由保持旋轉部3所保持之基板W噴出藥液。藥液例如為抗蝕液、抗反射膜形成用塗佈液、稀釋劑等溶劑、純水(DIW)等沖洗液、顯影液、或蝕刻液。<Configuration of
保持旋轉部3保持基板W且使所保持之基板W旋轉。保持旋轉部3具備旋轉夾頭4與旋轉驅動部5。旋轉夾頭4構成為能夠繞旋轉軸AX旋轉。旋轉夾頭4例如藉由真空吸附基板W之背面而以大致水平姿勢保持基板W。另一方面,旋轉驅動部5進行使旋轉夾頭4繞旋轉軸AX旋轉之驅動。旋轉驅動部5包括電動馬達等。The holding and
又,基板處理裝置1具備藥液供給源7、藥液配管8a、8b、泵P及藥液控制閥9。藥液供給源7例如包括貯存藥液之槽或瓶。藥液配管8a、8b之一端連接於藥液供給源7,另一端連接於噴嘴2。In addition, the
於藥液供給源7與噴嘴2之間之藥液配管8a設有泵P。於泵P與噴嘴2之間之藥液配管8a、8b設有藥液控制閥9。泵P為輸送藥液之機構。藥液控制閥9調整從噴嘴2噴出之藥液之流量,且使藥液從噴嘴2噴出,使藥液噴出停止。藥液控制閥9之詳細情形將於下文敍述。再者,亦可於藥液配管8a、8b設置例如異物去除過濾器及用來防止液體滴落之回吸閥之至少任一個。A pump P is provided in the chemical
基板處理裝置1具備1個或2個以上之控制部11、及操作部13。控制部11具有中央運算處理裝置(CPU,central processing unit,中央處理單元)。控制部11對基板處理裝置1及藥液控制閥9之各構成進行控制。操作部13具備輸入部、顯示部及記憶部。記憶部包括ROM(Read-only Memory,唯讀記憶體)、RAM(Random-Access Memory,隨機存取記憶體)、及硬碟等。記憶部中記憶著例如基板處理之各種條件。The
<藥液控制閥9之構成>
參照圖2。藥液控制閥9具備單一之流路閥塊21、針移動機構23及開閉用閥體移動機構25。<Constitution of chemical
流路閥塊21例如由PFA(全氟烷氧基烷類,perfluoroalkoxyalkane)等具有熱塑性及熔融流動性之氟樹脂等樹脂來形成。流路閥塊21亦可由PTFE(polytetrafluoroethylene,聚四氟乙烯)等氟樹脂來形成。The flow
再者,流路閥塊21較佳為由PFA形成。若藉由射出成形以PFA形成流路閥塊21,則流路閥塊21之表面會由作為較其內部硬之層(膜)之表層覆蓋。若藥液滲入至流路閥塊21之內部,則結果有從流路閥塊21之內部引出污物之掛慮。但是,由於表層會防止藥液之滲入,故而能夠抑制藥液之純淨度變差之掛慮。Furthermore, the flow
流路閥塊21具有第1外壁(面)21a及第2外壁(面)21b。第2外壁21b係與第1外壁21a呈大致直角之面。於流路閥塊21之第1外壁(外表面)21a設有流量調整用閥室27。於流路閥塊21之第2外壁(外表面)21b設有開閉用閥室29。流量調整用閥室27以第1外壁21a之一部分凹陷之方式形成。即,流量調整用閥室27呈凹狀形成於第1外壁21a。開閉用閥室29以第2外壁21b之一部分凹陷之方式形成。即,開閉用閥室29呈凹狀形成於流路閥塊21之第2外壁21b。The flow
於流路閥塊21之內部形成著中間流路31、第1流路33及第2流路35。中間流路31、第1流路33及第2流路35分別形成為直線狀。中間流路31以使流量調整用閥室27與開閉用閥室29之間連接之方式形成。又,中間流路31以與第2外壁21b呈大致直角延伸之方式形成。An
第1流路33之一端與流量調整用閥室27連接。第1流路33之另一端與作為流路閥塊21之外部之設有泵P之藥液配管8a連接。第2流路35之一端與開閉用閥室29連接。第2流路35之另一端與作為流路閥塊21之外部之設有噴嘴2之藥液配管8b連接。即,第2流路35經由藥液配管8b連接著噴嘴2。One end of the
第1流路33及第2流路35分別以相對於中間流路31呈直角延伸之方式形成。又,第1流路33與第2流路35平行。而且,第1流路33中與連接流量調整用閥室27之部分為相反側之第1連接口37,朝向與第2流路35中與連接開閉用閥室29之部分為相反側之第2連接口39相同之方向開口。即,以通過第1流路33之藥液之朝向與通過第2流路35之藥液之朝向成為相反方向之方式形成著第1流路33及第2流路35。The
針移動機構23安裝於流路閥塊21。針移動機構23具有針41。針移動機構23以堵住流量調整用閥室27,並且為了調整藥液之流量而使針41移動之方式構成。The
再者,於圖2中,流量調整用閥室27具有第1延長流路40a。第1延長流路40a設置於流量調整用閥室27之底部以外之例如內側壁。藉由將中間流路31連接於第1延長流路40a,而將中間流路31連接於流量調整用閥室27。又,開閉用閥室29具有第2延長流路40b。第2延長流路40b設置於開閉用閥室29之底部。藉由將第2流路35連接於第2延長流路40b,而將第2流路35連接於開閉用閥室29。In addition, in FIG. 2, the
針移動機構23除具備針41以外,還具備罩體43、電動馬達45及轉換機構47。針41配置於流量調整用閥室27內。又,針41以與設置於流量調整用閥室27之開口部49對向之方式配置。開口部49形成為圓形。開口部49連接於第1流路33。針41之前端部41a形成為圓錐狀。針41之圓錐狀之前端部41a貫穿開口部49,即,藉由使針41橫向移動(X方向移動)來調整圓錐狀之前端部41a與開口部49之間隙(參照圖2)。由此,調整流經該間隙之藥液之流量。罩體43以針41通過之方式構成。罩體43堵住流量調整用閥室27。The
電動馬達45使針41驅動。電動馬達45例如包括步進馬達或伺服馬達。於電動馬達45包括伺服馬達之情形時,因為設有旋轉編碼器等傳感器,故而能夠準確地獲得針41之橫向移動量或位置。轉換機構47設置於電動馬達45與針41之間,將電動馬達45輸出之旋轉轉換為針41之直線移動。轉換機構47例如係具有螺旋軸及引導部而構成。The
開閉用閥體移動機構25安裝於流路閥塊21。開閉用閥體移動機構25具有隔膜51。開閉用閥體移動機構25以堵住開閉用閥室29,並且為了開閉第2流路35而使隔膜51移動之方式構成。隔膜51相當於本發明之開閉用閥體。The valve
開閉用閥體移動機構25除具備隔膜51以外,還具備罩體53、活動部件55、間隔壁57、活動分隔部件59、彈簧61、吸氣排氣口63及調整螺絲部65。In addition to the
隔膜51例如包含PTFE或PFA等氟樹脂。隔膜51之周緣部固定於開閉用閥室29之內側壁。隔膜51以橫跨隔膜51之上下移動方向之方式將下述閥座75側與間隔壁57側之間隔開。隔膜51之中央之厚壁部51a固定於活動部件55。罩體53堵住開閉用閥室29。The
圓盤狀之間隔壁57設置於罩體53之內側壁。間隔壁57將活動分隔部件59側與隔膜51側隔開。於間隔壁57之中央部插入著活動部件55。活動部件55能夠相對於間隔壁57進行滑動。活動分隔部件59固定於隔膜51之相反側之活動部件55。活動分隔部件59能夠相對於罩體53之內側壁進行滑動。活動分隔部件59將彈簧61側與間隔壁57側之間隔開。活動部件55與間隔壁57之接觸部分、及活動分隔部件59與罩體53之內側壁之接觸部分被密封。The disc-shaped
彈簧61配置於罩體53之頂壁53a與活動分隔部件59之間。彈簧61以始終向下方向(隔膜51存在之方向)按壓之方式設置。吸氣排氣口63係使氣體進出於罩體53內之活動分隔部件59與間隔壁57之間之空間之開口。氣體配管67使儲氣瓶或工廠內之配管等氣體供給源69與吸氣排氣口63連接。於氣體配管67設有例如三向閥71。三向閥71選擇性地切換從氣體供給源69對罩體53內供給氣體、及將氣體從罩體53內排出。The spring 61 is arranged between the
調整螺絲部65具有公螺紋65a。該公螺紋65a與設置於罩體53之頂壁53a附近之母螺紋53b以嚙合之方式構成。調整螺絲部65與活動分隔部件59分離。藉由公螺紋65a之位置來限制活動分隔部件59、活動部件55、及隔膜51之厚壁部51a等之上方向移動。再者,開口部73連接於第2流路35。閥座75設置於開口部73之周圍,承接隔膜51之厚壁部51a。The
<藥液控制閥9之製造方法>
接下來,對藥液控制閥9之製造方法之一例進行說明。圖3(a)係XY方向上之一對模具之橫剖視圖。圖3(b)係XZ方向上之一對模具之縱剖視圖。又,圖3(b)係圖3(a)中之第1突出部87及第2銷部件90部分之縱剖視圖。<Manufacturing method of chemical
[步驟S01]準備一對模具81、82之步驟
準備一對模具81、82。若一對模具81、82對向配置,則於一對模具81、82中形成內部空間83。於圖3(a)、圖3(b)中,以粗間隔表示之右下斜線之影線為內部空間83。內部空間83為填滿樹脂之空間。一對模具81、82於內部空間83具有第1內壁(面)85及第2內壁(面)86。第2內壁86係與第1內壁85呈大致直角之面。[Step S01] Step of preparing a pair of
一對模具81、82具備用來形成流量調整用閥室27之第1突出部87、用來形成開閉用閥室29之第2突出部88、及用來形成中間流路31之直線狀之第1銷部件89。第1突出部87設置於一對模具81、82中之內部空間83之第1內壁85。於第1突出部87設有與第1延長流路40a對應之第1連接凸部87a。第2突出部88設置於第2內壁86。於第2突出部88設有與第2延長流路40b對應之第2連接凸部88a。A pair of
第1銷部件89以使第1突出部87與第2突出部88之間連接之方式沿相對於第2內壁86呈大致直角延伸之方向插入。第1突出部87能夠沿橫向(X方向)移動。第1突出部87插入至一對模具81、82之內部空間83。又,如圖3(a)所示,第2突出部88與第1銷部件89一體地構成。成為一體之第2突出部88及第1銷部件89能夠於縱向(Y方向)上移動,插入至一對模具81、82之內部空間83。第1銷部件89之前端部89a與第1突出部87之第1連接凸部87a接觸。The
再者,第2突出部88及第1銷部件89亦可並非一體,而以個別地移動之方式構成。Furthermore, the
[步驟S02]插入第2銷部件90之步驟
以與第1突出部87連接之方式將直線狀之第2銷部件90插入至內部空間83。第2銷部件90能夠沿橫向(X方向)移動。第2銷部件90之前端部90a與第1突出部87接觸。第2銷部件90係用來形成第1流路33者。[Step S02] Step of inserting the
[步驟S03]插入第3銷部件91之步驟
以與第2突出部88連接之方式將直線狀之第3銷部件91插入至內部空間83。第3銷部件91能夠沿橫向(X方向)移動。第3銷部件91之前端部91a與第2突出部88之第2連接凸部88a接觸。第3銷部件91係用來形成第2流路35者。[Step S03] Step of inserting the
[步驟S04]流入樹脂之步驟
於將第1突出部87、第2突出部88、第1銷部件89、第2銷部件90及第3銷部件91插入至內部空間83後(亦就係步驟S01〜S03後),使經加熱而熔化之樹脂(例如PFA)流入至內部空間83。未圖示之射出成形機之加熱機筒內部之樹脂藉由進行加熱而熔化。即,流入至一對模具81、82內之樹脂係藉由加熱而流體化之樹脂。而且,藉由加熱機筒流入至一對模具81、82之內部空間83。[Step S04] Step of pouring resin
After inserting the
[步驟S05]卸下流路閥塊(成形品)之步驟
於流入至內部空間83之樹脂經冷卻固化後,從一對模具81、82內抽出第1突出部87、第2突出部88、第1銷部件89、第2銷部件90及第3銷部件91。之後,從一對模具81、82卸下樹脂作為單一之流路閥塊21。該卸下係藉由使一對模具81、82於上下方向(圖3(b)之Z方向)上相對移動來進行。再者,流入至內部空間83之樹脂於與一對模具81、82之內壁(符號85、86等)、第1突出部87、第2突出部88、第1銷部件89、第2銷部件90及第3銷部件91相接之部分形成表層。[Step S05] Step of removing the flow path valve block (molded product)
After the resin flowing into the
[步驟S06]安裝針移動機構及開閉用閥體移動機構之步驟
對從一對模具81、82卸下之流路閥塊21進行用來研磨圖2所示之開口部49及閥座75之表面等之處理。然後,將針移動機構23及開閉用閥體移動機構25等零件安裝於流路閥塊21。[Step S06] Step of installing the needle moving mechanism and the valve body moving mechanism for opening and closing
The flow
再者,根據下述變化例等之流路閥塊21之構造,一對模具81、82、第1突出部87、第2突出部88等亦可藉由如下方式構成。例如,第1突出部87亦可相對於模具81不移動而固定於模具81之第1內壁85。同樣地,第2突出部88亦可相對於模具82不移動而固定於模具82之第2內壁86。又,對應於下述圖4之構成,第2內壁86亦可為與第1內壁85對向之面。In addition, according to the structure of the flow
再者,於先前之藥液控制閥9中,圖7所示之V字流路205係藉由於形成後從流量調整用閥室及開閉用閥室這兩個方向進行切削來形成。即,受模具之限制,圖7所示之V字流路205無法形成為直線狀。又,例如於流路閥塊21由PFA形成之情形時,於V字流路205部分會削去PFA之表層,因此有藥液滲入至流路閥塊21(PFA)之內部之掛慮。根據本實施例之藥液控制閥9之製造方法,不進行切削便能形成直線狀之中間流路31。Furthermore, in the conventional chemical
<基板處理裝置及藥液控制閥之動作>
接著,對基板處理裝置1及藥液控制閥9之動作進行說明。<Operation of substrate processing equipment and chemical liquid control valve>
Next, the operations of the
參照圖1。未圖示之搬送機構將基板W搬送到保持旋轉部3上。保持旋轉部3藉由吸附基板W之背面來保持基板W。之後,保持旋轉部3使所保持之基板W旋轉。噴嘴2藉由未圖示之移動機構移動到基板W之上方。控制部11藉由操作藥液控制閥9而使藥液從噴嘴2噴出到基板W上。Refer to Figure 1. A transport mechanism not shown transports the substrate W to the holding and
於圖2所示之藥液控制閥9中,首先對開閉用閥體移動機構25之動作進行說明。隔膜51之厚壁部51a藉由彈簧61之彈性力(復原力)而被壓抵於設置於開閉用閥室29之開口部73周圍之閥座75(參照圖2之虛線所表示之厚壁部51a)。該狀態為不使藥液從開閉用閥室29流通至第2流路35之關閉狀態。當為關閉狀態時,不從噴嘴2噴出藥液。In the chemical
藉由操作三向閥71,經由氣體配管67及吸氣排氣口63,從氣體供給源69對罩體53內之活動分隔部件59與間隔壁57之間之空間輸送氣體。由此,活動分隔部件59排斥彈簧61之彈性力而上升,隨之,活動部件55及隔膜51之厚壁部51a上升(參照圖2之實線所表示之厚壁部51a)。該狀態為使藥液流通之打開狀態。當為打開狀態時,從噴嘴2噴出藥液。By operating the three-
此處,對成為打開狀態時之藥液之流動進行具體說明。圖1所示之泵P將藥液從藥液供給源7通過藥液配管8a輸送至藥液控制閥9之第1流路33。輸送至圖2所示之第1流路33之藥液通過針41之前端部41a與開口部49之間隙,被輸送至流量調整用閥室27。之後,藥液通過中間流路31從流量調整用閥室27被輸送至開閉用閥室29。再者,因為中間流路31構成為直線狀,故而與圖7所示之V字流路205等相比,能夠更順利地輸送藥液。Here, the flow of the liquid medicine when it is in the open state will be specifically described. The pump P shown in FIG. 1 transports the liquid medicine from the liquid
之後,藥液通過閥座75之開口部73及第2流路35從開閉用閥室29被輸送至藥液配管8b。輸送至藥液配管8b之藥液被輸送至噴嘴2而從噴嘴2噴出藥液。After that, the medicinal solution passes through the
又,對針移動機構23之動作進行說明。針移動機構23係藉由調整針41之前端部41a與開口部49之間隙,來調整第1流路33等流路閥塊21內之藥液之流量。針41藉由電動馬達45之旋轉驅動來移動。轉換機構47將電動馬達45之旋轉轉換為針41之直線移動。針41沿橫向(X方向)移動。In addition, the operation of the
於噴出藥液後,控制部11藉由操作三向閥71,停止從氣體供給源69供給氣體,並且將圖2所示之罩體53內之氣體通過吸氣排氣口63等排出。由此,利用彈簧61之彈性力將隔膜51之厚壁部51a下壓,且將厚壁部51a壓抵於閥座75(關閉狀態)。當為關閉狀態時,不從噴嘴2噴出藥液。After spraying the chemical liquid, the
於藥液從噴嘴2之噴出結束後,噴嘴2從基板W之上方退避至基板外。保持旋轉部3使所保持之基板W停止旋轉,之後解除基板W之保持。未圖示之搬送機構使保持旋轉部3上之基板W移動到其他裝置、載置部或載體等。After the ejection of the chemical liquid from the
根據本實施例,流路閥塊21具有第1外壁21a及作為與第1外壁21a呈直角之面之第2外壁21b。配置針41之流量調整用閥室27以流路閥塊21之第1外壁21a凹陷之方式形成。另一方面,配置隔膜51之開閉用閥室29以第2外壁21b凹陷之方式形成。中間流路31將流量調整用閥室27與開閉用閥室29連接,中間流路31相對於第2外壁21b呈直角延伸。藉由此種構成,能夠將中間流路31形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。再者,置換特性係以使新之藥液流入至第1連接口37,而擠出原來之藥液並且使之到達第2連接口39之時間表示之特性。According to this embodiment, the flow
又,第1流路33及第2流路35分別為直線狀,且相對於中間流路31呈直角延伸。於使樹脂流入至一對模具81、82而形成流路閥塊21時,能夠將為了形成中間流路31而插入至一對模具81、82內之第1銷部件89、與為了形成第1流路33及第2流路35而插入至一對模具81、82內之第2銷部件90及第3銷部件91各者呈直角配置。因此,相較於第1銷部件89與第2銷部件90及第3銷部件91各者傾斜地配置(並非直角)之情形,能夠容易地形成中間流路31、第1流路33及第2流路35。In addition, the
又,第1流路33與第2流路35平行。第1流路33中與連接流量調整用閥室27之部分為相反側之第1連接口37,朝向與第2流路35中與連接開閉用閥室29之部分為相反側之第2連接口39相同之方向開口。於使樹脂流入至一對模具81、82而形成流路閥塊21時,能夠使為了形成第1流路33及第2流路35而插入至一對模具81、82內之第2銷部件90及第3銷部件91朝相同之方向移動。因此,相較於第2銷部件90插入至模具內之朝向與第3銷部件91之朝向不同之情形,能夠容易地形成第1流路33及第2流路35。In addition, the
本發明並不限於上述實施形態,能夠如下所述實施變化。The present invention is not limited to the above-mentioned embodiment, and can be modified as described below.
(1)於上述實施例中,設有開閉用閥室29之第2外壁21b係與設有流量調整用閥室27之第1外壁21a呈直角之面。關於這一點,第2外壁21b亦可如圖4所示為與第1外壁21a對向並且與第1外壁21a大致平行之面。即,第2外壁(面)21b設置於隔著流路閥塊21而與第1外壁(面)21a相反之側。又,第2外壁21b相對於第1外壁21a大致平行。(1) In the above embodiment, the second
流量調整用閥室27以流路閥塊21之第1外壁21a之一部分凹陷之方式形成。開閉用閥室29以流路閥塊21之第2外壁21b之一部分凹陷之方式形成。如圖4所示,流量調整用閥室27以與開閉用閥室29對向之方式配置。The
直線狀之中間流路31以使開閉用閥室29與流量調整用閥室27連接之方式形成。又,中間流路31相對於第1外壁21a及第2外壁21b呈直角延伸。第1流路33及第2流路35分別相對於中間流路31呈直角延伸。第1流路33連接於流量調整用閥室27。另一方面,第2流路35連接於開閉用閥室29。The linear
圖4所示之隔膜51沿縱向(Y方向)移動。而且,本變化例之針41亦沿縱向移動。針41之前端部41a貫穿流量調整用閥室27與中間流路31之連接部分之開口部49。The
根據本變化例,流路閥塊21具有第1外壁21a、及作為與第1外壁21a對向並且與第1外壁21a平行之面之第2外壁21b。配置針41之流量調整用閥室27以流路閥塊21之第1外壁21a凹陷之方式形成。另一方面,配置隔膜51之開閉用閥室29以第2外壁21b凹陷之方式形成。中間流路31將流量調整用閥室27與開閉用閥室29連接,中間流路31相對於第1外壁21a及第2外壁21b呈直角延伸。藉由此種構成,能夠將中間流路31形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to this modification, the flow
(2)於上述實施例中,例如圖2所示,中間流路31以與設有開閉用閥室29之第2外壁21b呈大致直角延伸之方式形成。關於這一點,中間流路31亦可如圖5(a)所示以與設有流量調整用閥室27之第1外壁21a呈大致直角延伸之方式形成。(2) In the above embodiment, for example, as shown in FIG. 2, the
(3)於上述實施例及變化例(1)中,如圖2及圖4所示,開閉用閥室29之底部之開口部73連接於第2流路35。關於這一點,開閉用閥室29之底部之開口部73亦可如圖5(b)所示連接於中間流路31。(3) In the above-mentioned embodiment and modification (1), as shown in FIGS. 2 and 4, the
(4)於上述實施例及各變化例中,如圖2及圖4所示,於流量調整用閥室27之底部之開口部49連接著沿針41之移動方向延伸之中間流路31或第1流路33。關於這一方面,亦可如圖5(b)所示,於流量調整用閥室27之底部之開口部49,經由第3延長流路40c連接沿與針41之移動方向正交之方向延伸之中間流路31(或第1流路33)。第3延長流路40c係從開口部49向針41之移動方向延伸,與中間流路31連接。(4) In the above-mentioned embodiment and each modification example, as shown in Figures 2 and 4, the
再者,於圖5(a)、圖5(b)以及下述圖6(a)、圖6(b)中,將針移動機構23及開閉用閥體移動機構25簡化表示。In addition, in FIGS. 5(a) and 5(b) and the following FIGS. 6(a) and 6(b), the
(5)於上述實施例及各變化例中,針移動機構23構成為,具備電動馬達45與轉換機構47,且藉由轉換機構47將電動馬達45所輸出之旋轉轉換為針41之直線移動。但是,並不限於此。亦可構成為,設置作業人員手動轉動之把手或手柄代替電動馬達45,將把手或手柄之旋轉轉換為針41之直線移動。(5) In the above embodiments and various modifications, the
(6)於上述實施例及各變化例中,例如圖2及圖4所示,第1流路33之一端之第1連接口37朝向與第2流路35之一端之第2連接口39相同之方向。即,第1連接口37及第2連接口39於圖2及圖4中均朝向右方開口。關於這一點,第1連接口37亦可如圖6(a)及圖6(b)所示朝向與第2連接口39相反之方向開口。即,於圖6(a)及圖6(b)中,第1連接口37朝向左方開口,第2連接口39朝向右方開口。(6) In the above embodiments and various modifications, for example, as shown in FIGS. 2 and 4, the
再者,於圖6(a)及圖6(b)中,第1連接口37朝向與第2連接口39相反之方向,即,相對於第2連接口39繞中間流路31反轉180度開口。關於這一點,第1連接口37亦可相對於第2連接口39繞中間流路31例如朝向90º之方向(亦就係除0度及180度以外之方向)開口。Furthermore, in FIGS. 6(a) and 6(b), the
(7)於上述實施例及各變化例中,開閉用閥體移動機構25藉由氣體驅動隔膜51。關於這一點,開閉用閥體移動機構25亦可與針移動機構23同樣地藉由電動馬達驅動隔膜51。利用電動馬達進行之旋轉藉由轉換機構轉換為直線移動。由此,將隔膜51之厚壁部51a壓抵於閥座75、或使厚壁部51a從閥座75離開。(7) In the above-mentioned embodiment and each modification example, the opening and closing valve
1‧‧‧基板處理裝置 2‧‧‧噴嘴 3‧‧‧保持旋轉部 4‧‧‧旋轉夾頭 5‧‧‧旋轉驅動部 7‧‧‧藥液供給源 8a‧‧‧藥液配管 8b‧‧‧藥液配管 9‧‧‧藥液控制閥 11‧‧‧控制部 13‧‧‧操作部 21‧‧‧單一之流路閥塊 21a‧‧‧第1外壁 21b‧‧‧第2外壁 23‧‧‧針移動機構 25‧‧‧開閉用閥體移動機構 27‧‧‧流量調整用閥室 29‧‧‧開閉用閥室 31‧‧‧中間流路 33‧‧‧第1流路 35‧‧‧第2流路 37‧‧‧第1連接口 39‧‧‧第2連接口 40a‧‧‧第1延長流路 40b‧‧‧第2延長流路 40c‧‧‧第3延長流路 41‧‧‧針 41a‧‧‧前端部 43‧‧‧罩體 45‧‧‧電動馬達 47‧‧‧轉換機構 49‧‧‧開口部 51‧‧‧隔膜 51a‧‧‧厚壁部 53‧‧‧罩體 53a‧‧‧頂壁 53b‧‧‧母螺紋 55‧‧‧活動部件 57‧‧‧間隔壁 59‧‧‧活動分隔部件 61‧‧‧彈簧 63‧‧‧吸氣排氣口 65‧‧‧調整螺絲部 65a‧‧‧公螺紋 67‧‧‧氣體配管 69‧‧‧氣體供給源 71‧‧‧三向閥 73‧‧‧開口部 75‧‧‧閥座 81‧‧‧模具 82‧‧‧模具 83‧‧‧內部空間 85‧‧‧第1內壁 86‧‧‧第2內壁86 87‧‧‧第1突出部 87a‧‧‧第1連接凸部 88‧‧‧第2突出部 88a‧‧‧第2連接凸部 89‧‧‧第1銷部件 89a‧‧‧前端部 90‧‧‧第2銷部件 90a‧‧‧前端部 91‧‧‧第3銷部件 91a‧‧‧前端部 201‧‧‧藥液控制閥 202‧‧‧流量調整閥 203‧‧‧開閉閥(ON/OFF閥) 205‧‧‧V字流路 AX‧‧‧旋轉軸 P‧‧‧泵 W‧‧‧基板 X‧‧‧方向 Y‧‧‧方向 Z‧‧‧方向1‧‧‧Substrate processing equipment 2‧‧‧Nozzle 3‧‧‧Keep rotating part 4‧‧‧Rotating Chuck 5‧‧‧Rotation drive unit 7‧‧‧Medicinal solution supply source 8a‧‧‧Liquid piping 8b‧‧‧Liquid piping 9‧‧‧Liquid control valve 11‧‧‧Control Department 13‧‧‧Operation Department 21‧‧‧Single flow path valve block 21a‧‧‧The first outer wall 21b‧‧‧The second outer wall 23‧‧‧Needle moving mechanism 25‧‧‧Valve body moving mechanism for opening and closing 27‧‧‧Valve chamber for flow adjustment 29‧‧‧Valve chamber for opening and closing 31‧‧‧Intermediate flow path 33‧‧‧First flow path 35‧‧‧Second flow path 37‧‧‧The first connection port 39‧‧‧The second connection port 40a‧‧‧The first extension flow path 40b‧‧‧Second extension flow path 40c‧‧‧The third extension flow path 41‧‧‧Needle 41a‧‧‧Front end 43‧‧‧Hood 45‧‧‧Electric Motor 47‧‧‧Transformation Organization 49‧‧‧Opening 51‧‧‧Diaphragm 51a‧‧‧Thick Wall 53‧‧‧Hood 53a‧‧‧Top wall 53b‧‧‧Female thread 55‧‧‧moving parts 57‧‧‧The next wall 59‧‧‧Activity divider 61‧‧‧Spring 63‧‧‧Suction and exhaust port 65‧‧‧Adjusting screw part 65a‧‧‧Male thread 67‧‧‧Gas piping 69‧‧‧Gas supply source 71‧‧‧Three-way valve 73‧‧‧Opening 75‧‧‧Valve seat 81‧‧‧Mould 82‧‧‧Mould 83‧‧‧Internal space 85‧‧‧The first inner wall 86‧‧‧Second inner wall 86 87‧‧‧The first protrusion 87a‧‧‧The first connecting convex part 88‧‧‧Second protrusion 88a‧‧‧Second connecting convex 89‧‧‧The first pin part 89a‧‧‧Front end 90‧‧‧Second pin part 90a‧‧‧Front end 91‧‧‧Pin 3 91a‧‧‧Front end 201‧‧‧Liquid Control Valve 202‧‧‧Flow control valve 203‧‧‧Open and close valve (ON/OFF valve) 205‧‧‧V-shaped flow path AX‧‧‧Rotation axis P‧‧‧Pump W‧‧‧Substrate X‧‧‧direction Y‧‧‧ direction Z‧‧‧ direction
圖1係實施例之基板處理裝置之概略構成圖。 圖2係實施例之藥液控制閥之概略構成圖。 圖3(a)係XY方向上之一對模具之橫剖視圖,(b)係XZ方向上之一對模具之縱剖視圖。 圖4係變化例之藥液控制閥之概略構成圖。 圖5(a)、(b)係變化例之藥液控制閥之概略構成圖。 圖6(a)、(b)係變化例之藥液控制閥之概略構成圖。 圖7係先前之藥液控制閥之概略構成圖。Fig. 1 is a schematic configuration diagram of the substrate processing apparatus of the embodiment. Fig. 2 is a schematic configuration diagram of the liquid medicine control valve of the embodiment. Figure 3 (a) is a cross-sectional view of a pair of molds in the XY direction, and (b) is a longitudinal cross-sectional view of a pair of molds in the XZ direction. Fig. 4 is a schematic configuration diagram of a chemical liquid control valve of a modified example. Figures 5 (a) and (b) are schematic diagrams of the chemical liquid control valve of a modified example. Figure 6 (a) and (b) are schematic diagrams of the chemical liquid control valve of the modified example. Fig. 7 is a schematic configuration diagram of the conventional chemical liquid control valve.
8a‧‧‧藥液配管 8a‧‧‧Liquid piping
8b‧‧‧藥液配管 8b‧‧‧Liquid piping
9‧‧‧藥液控制閥 9‧‧‧Liquid control valve
21‧‧‧單一之流路閥塊 21‧‧‧Single flow path valve block
21a‧‧‧第1外壁 21a‧‧‧The first outer wall
21b‧‧‧第2外壁 21b‧‧‧The second outer wall
23‧‧‧針移動機構 23‧‧‧Needle moving mechanism
25‧‧‧開閉用閥體移動機構 25‧‧‧Valve body moving mechanism for opening and closing
27‧‧‧流量調整用閥室 27‧‧‧Valve chamber for flow adjustment
29‧‧‧開閉用閥室 29‧‧‧Valve chamber for opening and closing
31‧‧‧中間流路 31‧‧‧Intermediate flow path
33‧‧‧第1流路 33‧‧‧First flow path
35‧‧‧第2流路 35‧‧‧Second flow path
37‧‧‧第1連接口 37‧‧‧The first connection port
39‧‧‧第2連接口 39‧‧‧The second connection port
40a‧‧‧第1延長流路 40a‧‧‧The first extension flow path
40b‧‧‧第2延長流路 40b‧‧‧Second extension flow path
41‧‧‧針 41‧‧‧Needle
41a‧‧‧前端部 41a‧‧‧Front end
43‧‧‧罩體 43‧‧‧Hood
45‧‧‧電動馬達 45‧‧‧Electric Motor
47‧‧‧轉換機構 47‧‧‧Transformation Organization
49‧‧‧開口部 49‧‧‧Opening
51‧‧‧隔膜 51‧‧‧Diaphragm
51a‧‧‧厚壁部 51a‧‧‧Thick Wall
53‧‧‧罩體 53‧‧‧Hood
53a‧‧‧頂壁 53a‧‧‧Top wall
53b‧‧‧母螺紋 53b‧‧‧Female thread
55‧‧‧活動部件 55‧‧‧moving parts
57‧‧‧間隔壁 57‧‧‧The next wall
59‧‧‧活動分隔部件 59‧‧‧Activity divider
61‧‧‧彈簧 61‧‧‧Spring
63‧‧‧吸氣排氣口 63‧‧‧Suction and exhaust port
65‧‧‧調整螺絲部 65‧‧‧Adjusting screw part
65a‧‧‧公螺紋 65a‧‧‧Male thread
67‧‧‧氣體配管 67‧‧‧Gas piping
69‧‧‧氣體供給源 69‧‧‧Gas supply source
71‧‧‧三向閥 71‧‧‧Three-way valve
73‧‧‧開口部 73‧‧‧Opening
75‧‧‧閥座 75‧‧‧Valve seat
X‧‧‧方向 X‧‧‧direction
Y‧‧‧方向 Y‧‧‧ direction
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