TWI732178B - Chemical liquid control valve and substrate processing device - Google Patents

Chemical liquid control valve and substrate processing device Download PDF

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TWI732178B
TWI732178B TW108104752A TW108104752A TWI732178B TW I732178 B TWI732178 B TW I732178B TW 108104752 A TW108104752 A TW 108104752A TW 108104752 A TW108104752 A TW 108104752A TW I732178 B TWI732178 B TW I732178B
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flow path
valve chamber
wall
valve
opening
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TW201938933A (en
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柏山真人
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日商斯庫林集團股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Fluid-Driven Valves (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Valve Housings (AREA)
  • Lift Valve (AREA)
  • Multiple-Way Valves (AREA)

Abstract

本發明提供一種能夠提高藥液之置換特性之藥液控制閥及基板處理裝置。 流路閥塊21具有第1外壁21a及作為與第1外壁21a呈直角之面之第2外壁21b。配置針41之流量調整用閥室27以流路閥塊21之第1外壁21a凹陷之方式形成。另一方面,配置隔膜51之開閉用閥室29以第2外壁21b凹陷之方式形成。中間流路31將流量調整用閥室27與開閉用閥室29連接,中間流路31相對於第1外壁21a及第2外壁21b之任一個呈直角延伸。藉由此種構成,能夠將中間流路31形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。The present invention provides a chemical liquid control valve and a substrate processing device capable of improving the replacement characteristics of the chemical liquid. The flow path valve block 21 has a first outer wall 21a and a second outer wall 21b that is a surface at a right angle to the first outer wall 21a. The valve chamber 27 for adjusting the flow rate in which the needle 41 is arranged is formed such that the first outer wall 21a of the flow path valve block 21 is recessed. On the other hand, the opening and closing valve chamber 29 in which the diaphragm 51 is arranged is formed so that the second outer wall 21b is recessed. The intermediate flow path 31 connects the flow rate adjustment valve chamber 27 and the opening/closing valve chamber 29, and the intermediate flow path 31 extends at a right angle with respect to any one of the first outer wall 21a and the second outer wall 21b. With this configuration, the intermediate flow path 31 can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.

Description

藥液控制閥及基板處理裝置Chemical liquid control valve and substrate processing device

本發明係關於一種藥液控制閥及具備其之基板處理裝置,該藥液控制閥用來控制對半導體基板、液晶顯示裝置或有機EL (electroluminescence,電致發光)顯示裝置等FPD(Flat Panel Display,平板顯示器)用基板、光罩用玻璃基板、光碟用基板、磁碟用基板、陶瓷基板、太陽電池用基板等基板供給之藥液。The present invention relates to a chemical liquid control valve and a substrate processing device provided with the chemical liquid control valve. The chemical liquid control valve is used to control a FPD (Flat Panel Display) such as a semiconductor substrate, a liquid crystal display device, or an organic EL (electroluminescence) display device. , Flat panel display) substrates, glass substrates for photomasks, substrates for optical disks, substrates for magnetic disks, ceramic substrates, substrates for solar cells, and other substrates supplied with chemical solutions.

如圖7所示,先前之藥液控制閥201具備流量調整閥202與開閉閥(ON ·OFF閥)203(例如參照專利文獻1、2)。流量調整閥202對所供給之藥液之流量進行調整。另一方面,開閉閥203使藥液進行供給,又,使藥液之供給停止。流量調整閥202與開閉閥203之間利用V字流路205或專利文獻2所記載之圓弧狀流路(以下稱為「V字流路205等」)連接。因此,從流量調整閥202輸送之藥液通過V字流路205等被輸送至開閉閥203。 [背景技術文獻] [專利文獻]As shown in Fig. 7, the conventional chemical liquid control valve 201 includes a flow rate adjustment valve 202 and an on-off valve (ON/OFF valve) 203 (for example, refer to Patent Documents 1 and 2). The flow rate adjustment valve 202 adjusts the flow rate of the supplied liquid medicine. On the other hand, the on-off valve 203 supplies the liquid medicine and stops the supply of the liquid medicine. The flow control valve 202 and the on-off valve 203 are connected by a V-shaped flow path 205 or an arc-shaped flow path described in Patent Document 2 (hereinafter referred to as "V-shaped flow path 205, etc."). Therefore, the chemical liquid sent from the flow rate adjusting valve 202 is sent to the opening and closing valve 203 through the V-shaped flow path 205 and the like. [Background Technical Literature] [Patent Literature]

[專利文獻1] 日本專利特開2001-263507號公報 [專利文獻2] 日本專利特開2017-207121號公報[Patent Document 1] Japanese Patent Publication No. 2001-263507 [Patent Document 2] Japanese Patent Laid-Open No. 2017-207121

[發明所欲解決之問題][The problem to be solved by the invention]

此種先前之藥液控制閥201存在如下問題。如上所述,從流量調整閥202輸送之藥液通過V字流路205等被輸送至開閉閥203。若使藥液通過V字流路205等,則有從藥液控制閥201之入口至出口之藥液之置換特性變差之掛慮。假若藥液之置換特性差,則有因滯留之以前之藥液而導致液體中產生污物之掛慮。因此,較佳為提高藥液控制閥201中之藥液之置換特性。The conventional liquid medicine control valve 201 has the following problems. As described above, the liquid medicine delivered from the flow rate adjusting valve 202 is delivered to the opening and closing valve 203 through the V-shaped flow path 205 and the like. If the liquid medicine passes through the V-shaped flow path 205 or the like, there is a concern that the replacement characteristics of the liquid medicine from the inlet to the outlet of the liquid medicine control valve 201 will deteriorate. If the replacement characteristics of the liquid medicine are poor, there is a concern that dirt will be generated in the liquid due to the retention of the previous liquid medicine. Therefore, it is preferable to improve the replacement characteristics of the liquid medicine in the liquid medicine control valve 201.

本發明係鑒於此種情形而完成者,其目的在於提供一種能夠提高藥液之置換特性之藥液控制閥及具備其之基板處理裝置。 [解決問題之技術手段]The present invention was completed in view of this situation, and its object is to provide a chemical liquid control valve capable of improving the replacement characteristics of the chemical liquid and a substrate processing apparatus having the same. [Technical means to solve the problem]

為了達成此種目的,本發明採用如下構成。即,本發明之藥液控制閥之特徵在於具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁呈直角之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁之任一個呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,與上述開閉用閥室連接;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。In order to achieve such an object, the present invention adopts the following configuration. That is, the chemical liquid control valve of the present invention is characterized by comprising: a single flow path valve block having a first outer wall and a second outer wall that is a surface at right angles to the first outer wall; The first outer wall is recessed; the valve chamber for opening and closing is formed by recessing the second outer wall; the intermediate flow path is formed inside the flow path valve block and is linear, and the flow rate adjustment The valve chamber is connected to the valve chamber for opening and closing, and extends at right angles to any one of the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block to adjust the flow rate Connected by a valve chamber; a second flow path formed inside the flow path valve block and connected to the opening and closing valve chamber; a needle moving mechanism having a needle arranged in the flow rate adjustment valve chamber to block the flow Adjusting the valve chamber and moving the needle in order to adjust the flow rate of the liquid medicine; and an opening and closing valve body moving mechanism having an opening and closing valve body arranged in the opening and closing valve chamber to block the opening and closing valve chamber, and The valve body for opening and closing is moved in order to supply and stop the supply of the liquid medicine.

根據本發明之藥液控制閥,流路閥塊具有第1外壁及作為與第1外壁呈直角之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁之任一個呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the chemical liquid control valve of the present invention, the flow path valve block has a first outer wall and a second outer wall that is a plane at right angles to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to either the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.

又,本發明之藥液控制閥之特徵在於具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁對向並且與上述第1外壁平行之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,與上述開閉用閥室連接;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。In addition, the liquid medicine control valve of the present invention is characterized by comprising: a single flow path valve block having a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall; flow rate The valve chamber for adjustment is formed with the first outer wall recessed; the valve chamber for opening and closing is formed with the second outer wall recessed; the intermediate flow path is formed inside the flow path valve block and is linear , And connect the flow rate adjustment valve chamber and the opening and closing valve chamber to extend at right angles to the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block, Connected to the valve chamber for the flow rate adjustment; a second flow path formed inside the flow path valve block and connected to the valve chamber for opening and closing; a needle moving mechanism having a needle arranged in the valve chamber for the flow rate adjustment, The valve chamber for adjusting the flow rate is blocked, and the needle is moved to adjust the flow rate of the liquid medicine; and a valve body moving mechanism for opening and closing, which has an opening and closing valve body arranged in the valve chamber for opening and closing, and blocking the opening and closing In the valve chamber, the valve body for opening and closing is moved for the purpose of supplying and stopping the supply of the liquid medicine.

根據本發明之藥液控制閥,流路閥塊具有第1外壁、及作為與第1外壁對向並且與上述第1外壁平行之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the medicinal solution control valve of the present invention, the flow path valve block has a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.

又,於上述藥液控制閥中,較佳為上述第1流路及上述第2流路分別為直線狀,且相對於上述中間流路呈直角延伸。於使材料流入至模具中而形成流路閥塊時,能夠將為了形成中間流路而插入至模具內之第1銷部件、與為了形成第1流路及第2流路而插入至模具內之第2銷部件及第3銷部件各者呈直角配置。因此,相較於第1銷部件與第2銷部件及第3銷部件各者傾斜地配置(並非直角)之情形,能夠容易地形成中間流路、第1流路及第2流路。In addition, in the chemical liquid control valve, it is preferable that the first flow path and the second flow path are linear and extend at right angles to the intermediate flow path. When the material is poured into the mold to form the flow path valve block, the first pin member inserted into the mold to form the intermediate flow path and the first pin member to form the first flow path and the second flow path can be inserted into the mold. The second pin part and the third pin part are arranged at right angles. Therefore, compared with the case where the first pin member, the second pin member, and the third pin member are arranged obliquely (not at a right angle), the intermediate flow path, the first flow path, and the second flow path can be easily formed.

又,於上述藥液控制閥中,較佳為上述第1流路與上述第2流路平行,上述第1流路中與連接上述流量調整用閥室之部分為相反側之第1連接口,朝向與上述第2流路中與連接上述開閉用閥室之部分為相反側之第2連接口相同之方向開口。於使材料流入至模具中而形成流路閥塊時,能夠使為了形成第1流路及第2流路而插入至模具內之第2銷部件及第3銷部件朝相同之方向移動。因此,相較於第2銷部件插入至模具內之朝向與第3銷部件之朝向不同之情形,能夠容易地形成第1流路及第2流路。Furthermore, in the chemical liquid control valve, it is preferable that the first flow path is parallel to the second flow path, and the portion of the first flow path that connects to the flow rate adjustment valve chamber is a first connection port on the opposite side It opens in the same direction as the second connection port on the opposite side of the part connecting the opening and closing valve chamber in the second flow path. When the material is poured into the mold to form the flow path valve block, the second pin member and the third pin member inserted into the mold to form the first flow path and the second flow path can be moved in the same direction. Therefore, compared with the case where the orientation of the second pin member inserted into the mold is different from the orientation of the third pin member, the first flow path and the second flow path can be easily formed.

又,於上述藥液控制閥中,較佳為上述流路閥塊係由PFA(perfluoroalkoxyalkane,全氟烷氧基烷烴)形成。若流路閥塊由PFA形成,則流路閥塊之表面會由作為較其內部硬之層(膜)之表層覆蓋。若藥液滲入至流路閥塊之內部,則結果有從流路閥塊之內部引出污物之掛慮。但是,因為表層會防止藥液之滲入,故而能夠抑制藥液之純淨度變差之掛慮。In addition, in the chemical liquid control valve, it is preferable that the flow path valve block is formed of PFA (perfluoroalkoxyalkane, perfluoroalkoxyalkane). If the flow path valve block is formed of PFA, the surface of the flow path valve block will be covered with a surface layer (film) that is harder than the inside. If the liquid medicine penetrates into the inside of the flow path valve block, as a result, there is a concern that dirt will be drawn from the inside of the flow path valve block. However, because the surface layer prevents the penetration of the liquid medicine, it can suppress the fear of deterioration of the purity of the liquid medicine.

又,本發明之基板處理裝置之特徵在於具備:保持旋轉部,其保持基板,且使所保持之基板旋轉;噴嘴,其對保持於上述保持旋轉部之基板噴出藥液;藥液配管,其連接於上述噴嘴;及藥液控制閥,其調整從上述噴嘴噴出之藥液之流量,且使藥液從上述噴嘴噴出,使藥液噴出停止;上述藥液控制閥具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁呈直角之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁之任一個呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,且與上述開閉用閥室連接,並且經由上述藥液配管連接於上述噴嘴;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。Furthermore, the substrate processing apparatus of the present invention is characterized by comprising: a holding and rotating part that holds a substrate and rotates the held substrate; a nozzle that ejects a chemical solution to the substrate held by the holding and rotating part; and a chemical solution piping, which Connected to the nozzle; and a liquid chemical control valve, which adjusts the flow rate of the liquid chemical sprayed from the nozzle and causes the liquid chemical to be sprayed from the nozzle to stop the spray of the chemical liquid; the liquid chemical control valve includes: a single flow path valve Block, which has a first outer wall and a second outer wall that is a surface at right angles to the first outer wall; a valve chamber for flow adjustment formed in such a way that the first outer wall is recessed; and a valve chamber for opening and closing is the same as the second The outer wall is recessed; the intermediate flow path is formed inside the flow path valve block, is linear, and connects the flow rate adjustment valve chamber and the opening and closing valve chamber relative to the first outer wall and Any one of the second outer walls extends at a right angle; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment valve chamber; the second flow path is formed in the flow path valve block Inside, and connected to the valve chamber for opening and closing, and connected to the nozzle via the drug solution pipe; a needle moving mechanism having a needle arranged in the valve chamber for flow rate adjustment to block the valve chamber for flow rate adjustment, and Adjusting the flow rate of the liquid medicine to move the needle; and an opening and closing valve body moving mechanism having an opening and closing valve body arranged in the opening and closing valve chamber, blocking the opening and closing valve chamber, and for supplying the liquid medicine and The stop of the supply moves the valve body for opening and closing.

根據本發明之基板處理裝置,具備藥液控制閥。於藥液控制閥中,流路閥塊具有第1外壁及作為與第1外壁呈直角之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁之任一個呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the substrate processing apparatus of the present invention, a chemical liquid control valve is provided. In the chemical liquid control valve, the flow path valve block has a first outer wall and a second outer wall that is a plane at right angles to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to either the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.

又,本發明之基板處理裝置之特徵在於具備:保持旋轉部,其保持基板,且使所保持之基板旋轉;噴嘴,其對保持於上述保持旋轉部之基板噴出藥液;藥液配管,其連接於上述噴嘴;及藥液控制閥,其調整從上述噴嘴噴出之藥液之流量,且使藥液從上述噴嘴噴出,使藥液噴出停止;上述藥液控制閥具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁對向並且與上述第1外壁平行之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,且與上述開閉用閥室連接,並且經由上述藥液配管連接於上述噴嘴;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。Furthermore, the substrate processing apparatus of the present invention is characterized by comprising: a holding and rotating part that holds a substrate and rotates the held substrate; a nozzle that ejects a chemical solution to the substrate held by the holding and rotating part; and a chemical solution piping, which Connected to the nozzle; and a liquid chemical control valve, which adjusts the flow rate of the liquid chemical sprayed from the nozzle and causes the liquid chemical to be sprayed from the nozzle to stop the spray of the chemical liquid; the liquid chemical control valve includes: a single flow path valve A block having a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall; a valve chamber for flow adjustment, which is formed in such a way that the first outer wall is recessed; and a valve for opening and closing A chamber formed in such a manner that the second outer wall is recessed; an intermediate flow path is formed inside the flow path valve block, is linear, and connects the flow rate adjustment valve chamber and the opening and closing valve chamber, Extends at right angles to the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment valve chamber; the second flow path is formed in the flow The inside of the valve block is connected to the valve chamber for opening and closing, and is connected to the nozzle via the chemical liquid pipe; a needle moving mechanism having a needle arranged in the valve chamber for flow adjustment to block the valve for flow adjustment And move the needle in order to adjust the flow rate of the liquid medicine; and an opening and closing valve body moving mechanism, which has an opening and closing valve body arranged in the opening and closing valve chamber, blocking the opening and closing valve chamber, and in order to perform the medicine The supply of the liquid and the stop of the supply move the valve body for opening and closing.

根據本發明之基板處理裝置,具備藥液控制閥。於藥液控制閥中,流路閥塊具有第1外壁、及作為與第1外壁對向並且與上述第1外壁平行之面之第2外壁。配置針之流量調整用閥室以流路閥塊之第1外壁凹陷之方式形成。另一方面,配置開閉用閥體之開閉用閥室以第2外壁凹陷之方式形成。中間流路將流量調整用閥室與開閉用閥室連接,中間流路相對於第1外壁及第2外壁呈直角延伸。藉由此種構成,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to the substrate processing apparatus of the present invention, a chemical liquid control valve is provided. In the chemical liquid control valve, the flow path valve block has a first outer wall and a second outer wall that is a surface facing the first outer wall and parallel to the first outer wall. The valve chamber for adjusting the flow rate of the needle is formed in such a way that the first outer wall of the flow path valve block is recessed. On the other hand, the opening and closing valve chamber in which the opening and closing valve body is arranged is formed so that the second outer wall is recessed. The intermediate flow path connects the valve chamber for flow rate adjustment and the valve chamber for opening and closing, and the intermediate flow path extends at a right angle with respect to the first outer wall and the second outer wall. With this configuration, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.

再者,本說明書亦公開了如下藥液控制閥之製造方法之發明。Furthermore, this specification also discloses the invention of the following method of manufacturing the liquid medicine control valve.

本發明之藥液控制閥之製造方法之特徵在於包括如下步驟:準備一對模具,上述一對模具於內部空間具有第1內壁及作為與上述第1內壁呈直角之面之第2內壁,且具有:第1突出部,其為了形成流量調整用閥室而設置於上述第1內壁;第2突出部,其為了形成開閉用閥室而設置於上述第2內壁;及直線狀之第1銷部件,其使上述第1突出部與上述第2突出部連接,並且沿相對於上述第1內壁及第2內壁之任一個呈直角延伸之方向插入;以與上述第1突出部連接之方式將直線狀之第2銷部件插入至上述內部空間;以與上述第2突出部連接之方式將直線狀之第3銷部件插入至上述內部空間;於將上述第2銷部件及上述第3銷部件插入至上述內部空間後,使經加熱而熔化之樹脂流入至上述內部空間;以及於將流入至上述內部空間之樹脂冷卻固化後,將成為單一之流路閥塊之樹脂從一對模具卸下。The method for manufacturing a liquid medicine control valve of the present invention is characterized by including the steps of preparing a pair of molds, the pair of molds having a first inner wall in the inner space and a second inner wall that is a surface at right angles to the first inner wall. The wall has: a first protrusion that is provided on the first inner wall to form a valve chamber for flow rate adjustment; a second protrusion that is provided on the second inner wall to form a valve chamber for opening and closing; and a straight line A first pin member in a shape that connects the first protrusion with the second protrusion, and is inserted in a direction extending at right angles to any one of the first inner wall and the second inner wall; 1. Insert the linear second pin member into the internal space by connecting the protruding portion; insert the linear third pin member into the internal space so as to connect with the second protruding portion; then insert the second pin After the components and the third pin component are inserted into the internal space, the heated and melted resin flows into the internal space; and after the resin flowing into the internal space is cooled and solidified, it will become a single flow path valve block The resin is removed from a pair of molds.

根據本發明之藥液控制閥之製造方法,一對模具於內部空間具有第1內壁及作為與第1內壁呈直角之面之第2內壁。一對模具具有:第1突出部,其為了形成流量調整用閥室而設置於第1內壁;第2突出部,為了形成開閉用閥室而設置於第2內壁;及直線狀之第1銷部件,其使第1突出部與上述第2突出部連接,並且沿相對於第1內壁及第2內壁之任一個呈直角延伸之方向插入。藉由以此種構造形成流路閥塊,能夠將中間流路形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。再者,於先前之藥液控制閥中,V字流路係藉由於形成後從流量調整用閥室及開閉用閥室這兩個方向進行切削來形成。根據本發明,不進行切削便能形成直線狀之中間流路31。 [發明之效果]According to the method of manufacturing a chemical liquid control valve of the present invention, a pair of molds has a first inner wall and a second inner wall that is a plane at right angles to the first inner wall in the inner space. A pair of molds have: a first protrusion provided on the first inner wall to form a valve chamber for flow adjustment; a second protrusion provided on the second inner wall to form a valve chamber for opening and closing; and a linear first A pin member that connects the first protrusion to the second protrusion, and is inserted in a direction extending at right angles to any one of the first inner wall and the second inner wall. By forming the flow path valve block with such a structure, the intermediate flow path can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like. Furthermore, in the conventional chemical liquid control valve, the V-shaped flow path is formed by cutting from the two directions of the valve chamber for flow rate adjustment and the valve chamber for opening and closing after formation. According to the present invention, the linear intermediate flow path 31 can be formed without cutting. [Effects of Invention]

根據本發明之藥液控制閥及具備其之基板處理裝置,能夠提高藥液之置換特性。According to the chemical liquid control valve and the substrate processing apparatus provided with the chemical liquid control valve of the present invention, the replacement characteristics of the chemical liquid can be improved.

以下,參照附圖對本發明之實施例進行說明。圖1係實施例之基板處理裝置之概略構成圖。圖2係實施例之藥液控制閥之概略構成圖。Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a schematic configuration diagram of the substrate processing apparatus of the embodiment. Fig. 2 is a schematic configuration diagram of the liquid medicine control valve of the embodiment.

<基板處理裝置1之構成> 參照圖1。基板處理裝置1具備噴嘴2與保持旋轉部3。噴嘴2對由保持旋轉部3所保持之基板W噴出藥液。藥液例如為抗蝕液、抗反射膜形成用塗佈液、稀釋劑等溶劑、純水(DIW)等沖洗液、顯影液、或蝕刻液。<Configuration of Substrate Processing Device 1> Refer to Figure 1. The substrate processing apparatus 1 includes a nozzle 2 and a holding and rotating part 3. The nozzle 2 ejects the chemical liquid to the substrate W held by the holding and rotating part 3. The chemical solution is, for example, a resist solution, a coating solution for forming an anti-reflection film, a solvent such as a diluent, a rinse solution such as pure water (DIW), a developer solution, or an etching solution.

保持旋轉部3保持基板W且使所保持之基板W旋轉。保持旋轉部3具備旋轉夾頭4與旋轉驅動部5。旋轉夾頭4構成為能夠繞旋轉軸AX旋轉。旋轉夾頭4例如藉由真空吸附基板W之背面而以大致水平姿勢保持基板W。另一方面,旋轉驅動部5進行使旋轉夾頭4繞旋轉軸AX旋轉之驅動。旋轉驅動部5包括電動馬達等。The holding and rotating part 3 holds the substrate W and rotates the held substrate W. The holding and rotating part 3 includes a rotating chuck 4 and a rotating drive part 5. The rotating chuck 4 is configured to be rotatable about the rotation axis AX. The spin chuck 4 holds the substrate W in a substantially horizontal posture by vacuum suction of the back surface of the substrate W, for example. On the other hand, the rotation driving unit 5 drives the rotation chuck 4 to rotate around the rotation axis AX. The rotation driving unit 5 includes an electric motor and the like.

又,基板處理裝置1具備藥液供給源7、藥液配管8a、8b、泵P及藥液控制閥9。藥液供給源7例如包括貯存藥液之槽或瓶。藥液配管8a、8b之一端連接於藥液供給源7,另一端連接於噴嘴2。In addition, the substrate processing apparatus 1 includes a chemical liquid supply source 7, chemical liquid pipes 8 a and 8 b, a pump P, and a chemical liquid control valve 9. The liquid medicine supply source 7 includes, for example, a tank or bottle for storing liquid medicine. One end of the chemical liquid pipes 8 a and 8 b is connected to the chemical liquid supply source 7, and the other end is connected to the nozzle 2.

於藥液供給源7與噴嘴2之間之藥液配管8a設有泵P。於泵P與噴嘴2之間之藥液配管8a、8b設有藥液控制閥9。泵P為輸送藥液之機構。藥液控制閥9調整從噴嘴2噴出之藥液之流量,且使藥液從噴嘴2噴出,使藥液噴出停止。藥液控制閥9之詳細情形將於下文敍述。再者,亦可於藥液配管8a、8b設置例如異物去除過濾器及用來防止液體滴落之回吸閥之至少任一個。A pump P is provided in the chemical liquid pipe 8a between the chemical liquid supply source 7 and the nozzle 2. The chemical liquid piping 8a, 8b between the pump P and the nozzle 2 is provided with a chemical liquid control valve 9. The pump P is a mechanism for transporting liquid medicine. The chemical liquid control valve 9 adjusts the flow rate of the chemical liquid sprayed from the nozzle 2 and causes the chemical liquid to be sprayed from the nozzle 2 to stop the spraying of the chemical liquid. The details of the liquid medicine control valve 9 will be described below. Furthermore, it is also possible to provide at least any one of, for example, a foreign material removal filter and a suction valve for preventing liquid from dripping in the chemical liquid pipes 8a and 8b.

基板處理裝置1具備1個或2個以上之控制部11、及操作部13。控制部11具有中央運算處理裝置(CPU,central processing unit,中央處理單元)。控制部11對基板處理裝置1及藥液控制閥9之各構成進行控制。操作部13具備輸入部、顯示部及記憶部。記憶部包括ROM(Read-only Memory,唯讀記憶體)、RAM(Random-Access Memory,隨機存取記憶體)、及硬碟等。記憶部中記憶著例如基板處理之各種條件。The substrate processing apparatus 1 includes one or more control units 11 and operation units 13. The control unit 11 has a central processing unit (CPU, central processing unit). The control unit 11 controls each configuration of the substrate processing apparatus 1 and the chemical liquid control valve 9. The operation unit 13 includes an input unit, a display unit, and a storage unit. The memory includes ROM (Read-only Memory), RAM (Random-Access Memory), and hard disk. The storage unit stores various conditions such as substrate processing.

<藥液控制閥9之構成> 參照圖2。藥液控制閥9具備單一之流路閥塊21、針移動機構23及開閉用閥體移動機構25。<Constitution of chemical liquid control valve 9> Refer to Figure 2. The medicinal solution control valve 9 includes a single flow path valve block 21, a needle moving mechanism 23, and a valve body moving mechanism 25 for opening and closing.

流路閥塊21例如由PFA(全氟烷氧基烷類,perfluoroalkoxyalkane)等具有熱塑性及熔融流動性之氟樹脂等樹脂來形成。流路閥塊21亦可由PTFE(polytetrafluoroethylene,聚四氟乙烯)等氟樹脂來形成。The flow path valve block 21 is formed of a resin such as a fluororesin having thermoplasticity and melt fluidity, such as PFA (perfluoroalkoxyalkane). The flow path valve block 21 may be formed of fluororesin such as PTFE (polytetrafluoroethylene).

再者,流路閥塊21較佳為由PFA形成。若藉由射出成形以PFA形成流路閥塊21,則流路閥塊21之表面會由作為較其內部硬之層(膜)之表層覆蓋。若藥液滲入至流路閥塊21之內部,則結果有從流路閥塊21之內部引出污物之掛慮。但是,由於表層會防止藥液之滲入,故而能夠抑制藥液之純淨度變差之掛慮。Furthermore, the flow path valve block 21 is preferably formed of PFA. If the flow path valve block 21 is formed of PFA by injection molding, the surface of the flow path valve block 21 will be covered with a surface layer that is a harder layer (film) than the inside. If the liquid medicine penetrates into the inside of the flow path valve block 21, as a result, there is a concern that dirt will be drawn from the inside of the flow path valve block 21. However, since the surface layer prevents the penetration of the liquid medicine, it can suppress the fear of deterioration of the purity of the liquid medicine.

流路閥塊21具有第1外壁(面)21a及第2外壁(面)21b。第2外壁21b係與第1外壁21a呈大致直角之面。於流路閥塊21之第1外壁(外表面)21a設有流量調整用閥室27。於流路閥塊21之第2外壁(外表面)21b設有開閉用閥室29。流量調整用閥室27以第1外壁21a之一部分凹陷之方式形成。即,流量調整用閥室27呈凹狀形成於第1外壁21a。開閉用閥室29以第2外壁21b之一部分凹陷之方式形成。即,開閉用閥室29呈凹狀形成於流路閥塊21之第2外壁21b。The flow path valve block 21 has a first outer wall (surface) 21a and a second outer wall (surface) 21b. The second outer wall 21b is a surface at a substantially right angle to the first outer wall 21a. A valve chamber 27 for flow rate adjustment is provided on the first outer wall (outer surface) 21 a of the flow path valve block 21. A valve chamber 29 for opening and closing is provided on the second outer wall (outer surface) 21 b of the flow path valve block 21. The valve chamber 27 for flow rate adjustment is formed in such a way that a part of the first outer wall 21a is recessed. That is, the valve chamber 27 for flow rate adjustment is formed in the first outer wall 21a in a concave shape. The valve chamber 29 for opening and closing is formed in such a manner that a part of the second outer wall 21b is recessed. That is, the valve chamber 29 for opening and closing is formed in a concave shape on the second outer wall 21 b of the flow path valve block 21.

於流路閥塊21之內部形成著中間流路31、第1流路33及第2流路35。中間流路31、第1流路33及第2流路35分別形成為直線狀。中間流路31以使流量調整用閥室27與開閉用閥室29之間連接之方式形成。又,中間流路31以與第2外壁21b呈大致直角延伸之方式形成。An intermediate flow path 31, a first flow path 33 and a second flow path 35 are formed inside the flow path valve block 21. The intermediate flow path 31, the first flow path 33, and the second flow path 35 are each formed in a linear shape. The intermediate flow path 31 is formed so as to connect the valve chamber 27 for flow rate adjustment and the valve chamber 29 for opening and closing. In addition, the intermediate flow path 31 is formed so as to extend at a substantially right angle to the second outer wall 21b.

第1流路33之一端與流量調整用閥室27連接。第1流路33之另一端與作為流路閥塊21之外部之設有泵P之藥液配管8a連接。第2流路35之一端與開閉用閥室29連接。第2流路35之另一端與作為流路閥塊21之外部之設有噴嘴2之藥液配管8b連接。即,第2流路35經由藥液配管8b連接著噴嘴2。One end of the first flow path 33 is connected to the valve chamber 27 for flow rate adjustment. The other end of the first flow path 33 is connected to a chemical solution pipe 8a provided with a pump P as the outside of the flow path valve block 21. One end of the second flow path 35 is connected to the valve chamber 29 for opening and closing. The other end of the second flow path 35 is connected to the chemical liquid pipe 8b provided with the nozzle 2 as the outside of the flow path valve block 21. That is, the second flow path 35 is connected to the nozzle 2 via the chemical liquid pipe 8b.

第1流路33及第2流路35分別以相對於中間流路31呈直角延伸之方式形成。又,第1流路33與第2流路35平行。而且,第1流路33中與連接流量調整用閥室27之部分為相反側之第1連接口37,朝向與第2流路35中與連接開閉用閥室29之部分為相反側之第2連接口39相同之方向開口。即,以通過第1流路33之藥液之朝向與通過第2流路35之藥液之朝向成為相反方向之方式形成著第1流路33及第2流路35。The first flow path 33 and the second flow path 35 are each formed so as to extend at a right angle with respect to the intermediate flow path 31. In addition, the first flow path 33 and the second flow path 35 are parallel. In addition, the portion of the first flow path 33 connected to the valve chamber 27 for flow adjustment is the first connection port 37 on the opposite side, and the portion facing the second flow path 35 that is connected to the valve chamber 29 for opening and closing is the first connection port 37 on the opposite side. 2 The connection port 39 opens in the same direction. That is, the first flow path 33 and the second flow path 35 are formed so that the direction of the chemical liquid passing through the first flow path 33 and the direction of the chemical liquid passing through the second flow path 35 are opposite to each other.

針移動機構23安裝於流路閥塊21。針移動機構23具有針41。針移動機構23以堵住流量調整用閥室27,並且為了調整藥液之流量而使針41移動之方式構成。The needle moving mechanism 23 is attached to the flow path valve block 21. The needle moving mechanism 23 has a needle 41. The needle moving mechanism 23 is configured to block the valve chamber 27 for flow rate adjustment and to move the needle 41 in order to adjust the flow rate of the liquid medicine.

再者,於圖2中,流量調整用閥室27具有第1延長流路40a。第1延長流路40a設置於流量調整用閥室27之底部以外之例如內側壁。藉由將中間流路31連接於第1延長流路40a,而將中間流路31連接於流量調整用閥室27。又,開閉用閥室29具有第2延長流路40b。第2延長流路40b設置於開閉用閥室29之底部。藉由將第2流路35連接於第2延長流路40b,而將第2流路35連接於開閉用閥室29。In addition, in FIG. 2, the valve chamber 27 for flow rate adjustment has the 1st extension flow path 40a. The first extension flow path 40a is provided on, for example, an inner side wall other than the bottom of the valve chamber 27 for flow rate adjustment. By connecting the intermediate flow path 31 to the first extended flow path 40a, the intermediate flow path 31 is connected to the valve chamber 27 for flow rate adjustment. In addition, the valve chamber 29 for opening and closing has a second extension flow path 40b. The second extension flow path 40b is provided at the bottom of the valve chamber 29 for opening and closing. By connecting the second flow path 35 to the second extended flow path 40b, the second flow path 35 is connected to the valve chamber 29 for opening and closing.

針移動機構23除具備針41以外,還具備罩體43、電動馬達45及轉換機構47。針41配置於流量調整用閥室27內。又,針41以與設置於流量調整用閥室27之開口部49對向之方式配置。開口部49形成為圓形。開口部49連接於第1流路33。針41之前端部41a形成為圓錐狀。針41之圓錐狀之前端部41a貫穿開口部49,即,藉由使針41橫向移動(X方向移動)來調整圓錐狀之前端部41a與開口部49之間隙(參照圖2)。由此,調整流經該間隙之藥液之流量。罩體43以針41通過之方式構成。罩體43堵住流量調整用閥室27。The needle moving mechanism 23 includes a cover 43, an electric motor 45, and a conversion mechanism 47 in addition to the needle 41. The needle 41 is arranged in the valve chamber 27 for flow rate adjustment. In addition, the needle 41 is arranged so as to face the opening 49 provided in the valve chamber 27 for flow rate adjustment. The opening 49 is formed in a circular shape. The opening 49 is connected to the first flow path 33. The front end 41a of the needle 41 is formed in a conical shape. The conical front end 41a of the needle 41 penetrates the opening 49, that is, the gap between the conical front end 41a and the opening 49 is adjusted by moving the needle 41 laterally (moving in the X direction) (see FIG. 2). Thus, the flow rate of the liquid medicine flowing through the gap is adjusted. The cover 43 is configured by a needle 41 passing through it. The cover 43 blocks the valve chamber 27 for flow rate adjustment.

電動馬達45使針41驅動。電動馬達45例如包括步進馬達或伺服馬達。於電動馬達45包括伺服馬達之情形時,因為設有旋轉編碼器等傳感器,故而能夠準確地獲得針41之橫向移動量或位置。轉換機構47設置於電動馬達45與針41之間,將電動馬達45輸出之旋轉轉換為針41之直線移動。轉換機構47例如係具有螺旋軸及引導部而構成。The electric motor 45 drives the needle 41. The electric motor 45 includes, for example, a stepping motor or a servo motor. When the electric motor 45 includes a servo motor, since sensors such as a rotary encoder are provided, the lateral movement amount or position of the needle 41 can be accurately obtained. The conversion mechanism 47 is provided between the electric motor 45 and the needle 41 and converts the rotation output by the electric motor 45 into the linear movement of the needle 41. The conversion mechanism 47 is configured to include, for example, a screw shaft and a guide portion.

開閉用閥體移動機構25安裝於流路閥塊21。開閉用閥體移動機構25具有隔膜51。開閉用閥體移動機構25以堵住開閉用閥室29,並且為了開閉第2流路35而使隔膜51移動之方式構成。隔膜51相當於本發明之開閉用閥體。The valve body moving mechanism 25 for opening and closing is attached to the flow path valve block 21. The valve body moving mechanism 25 for opening and closing has a diaphragm 51. The opening and closing valve body moving mechanism 25 is configured to block the opening and closing valve chamber 29 and to move the diaphragm 51 in order to open and close the second flow path 35. The diaphragm 51 corresponds to the valve body for opening and closing of the present invention.

開閉用閥體移動機構25除具備隔膜51以外,還具備罩體53、活動部件55、間隔壁57、活動分隔部件59、彈簧61、吸氣排氣口63及調整螺絲部65。In addition to the diaphragm 51, the valve body moving mechanism 25 for opening and closing includes a cover 53, a movable member 55, a partition wall 57, a movable partition member 59, a spring 61, an air intake and exhaust port 63, and an adjustment screw portion 65.

隔膜51例如包含PTFE或PFA等氟樹脂。隔膜51之周緣部固定於開閉用閥室29之內側壁。隔膜51以橫跨隔膜51之上下移動方向之方式將下述閥座75側與間隔壁57側之間隔開。隔膜51之中央之厚壁部51a固定於活動部件55。罩體53堵住開閉用閥室29。The diaphragm 51 contains, for example, a fluororesin such as PTFE or PFA. The peripheral edge of the diaphragm 51 is fixed to the inner wall of the valve chamber 29 for opening and closing. The diaphragm 51 separates the below-mentioned valve seat 75 side and the partition wall 57 side so as to straddle the upward and downward movement direction of the diaphragm 51. The thick part 51 a in the center of the diaphragm 51 is fixed to the movable member 55. The cover 53 blocks the valve chamber 29 for opening and closing.

圓盤狀之間隔壁57設置於罩體53之內側壁。間隔壁57將活動分隔部件59側與隔膜51側隔開。於間隔壁57之中央部插入著活動部件55。活動部件55能夠相對於間隔壁57進行滑動。活動分隔部件59固定於隔膜51之相反側之活動部件55。活動分隔部件59能夠相對於罩體53之內側壁進行滑動。活動分隔部件59將彈簧61側與間隔壁57側之間隔開。活動部件55與間隔壁57之接觸部分、及活動分隔部件59與罩體53之內側壁之接觸部分被密封。The disc-shaped partition wall 57 is arranged on the inner side wall of the cover 53. The partition wall 57 partitions the movable partition member 59 side from the diaphragm 51 side. A movable member 55 is inserted in the center of the partition wall 57. The movable member 55 can slide with respect to the partition wall 57. The movable partition member 59 is fixed to the movable member 55 on the opposite side of the diaphragm 51. The movable partition member 59 can slide relative to the inner side wall of the cover 53. The movable partition member 59 partitions the spring 61 side and the partition wall 57 side. The contact portion between the movable member 55 and the partition wall 57 and the contact portion between the movable partition member 59 and the inner side wall of the cover 53 are sealed.

彈簧61配置於罩體53之頂壁53a與活動分隔部件59之間。彈簧61以始終向下方向(隔膜51存在之方向)按壓之方式設置。吸氣排氣口63係使氣體進出於罩體53內之活動分隔部件59與間隔壁57之間之空間之開口。氣體配管67使儲氣瓶或工廠內之配管等氣體供給源69與吸氣排氣口63連接。於氣體配管67設有例如三向閥71。三向閥71選擇性地切換從氣體供給源69對罩體53內供給氣體、及將氣體從罩體53內排出。The spring 61 is arranged between the top wall 53 a of the cover 53 and the movable partition member 59. The spring 61 is arranged to always be pressed downward (the direction in which the diaphragm 51 exists). The suction and exhaust port 63 is an opening for gas to enter and exit the space between the movable partition 59 and the partition wall 57 in the cover 53. The gas piping 67 connects a gas supply source 69 such as a gas tank or a piping in a factory to the intake and exhaust port 63. The gas pipe 67 is provided with, for example, a three-way valve 71. The three-way valve 71 selectively switches between supplying gas from the gas supply source 69 to the inside of the cover 53 and discharging the gas from the inside of the cover 53.

調整螺絲部65具有公螺紋65a。該公螺紋65a與設置於罩體53之頂壁53a附近之母螺紋53b以嚙合之方式構成。調整螺絲部65與活動分隔部件59分離。藉由公螺紋65a之位置來限制活動分隔部件59、活動部件55、及隔膜51之厚壁部51a等之上方向移動。再者,開口部73連接於第2流路35。閥座75設置於開口部73之周圍,承接隔膜51之厚壁部51a。The adjustment screw portion 65 has a male screw 65a. The male thread 65a and the female thread 53b arranged near the top wall 53a of the cover body 53 are formed in a meshing manner. The adjustment screw portion 65 is separated from the movable partition member 59. The position of the male screw 65a restricts the upward movement of the movable partition member 59, the movable member 55, and the thick portion 51a of the diaphragm 51. Furthermore, the opening 73 is connected to the second flow path 35. The valve seat 75 is provided around the opening 73 and receives the thick portion 51 a of the diaphragm 51.

<藥液控制閥9之製造方法> 接下來,對藥液控制閥9之製造方法之一例進行說明。圖3(a)係XY方向上之一對模具之橫剖視圖。圖3(b)係XZ方向上之一對模具之縱剖視圖。又,圖3(b)係圖3(a)中之第1突出部87及第2銷部件90部分之縱剖視圖。<Manufacturing method of chemical liquid control valve 9> Next, an example of a method of manufacturing the chemical liquid control valve 9 will be described. Figure 3(a) is a cross-sectional view of a pair of molds in the XY direction. Figure 3(b) is a longitudinal cross-sectional view of a pair of molds in the XZ direction. 3(b) is a longitudinal cross-sectional view of the first protrusion 87 and the second pin member 90 in FIG. 3(a).

[步驟S01]準備一對模具81、82之步驟 準備一對模具81、82。若一對模具81、82對向配置,則於一對模具81、82中形成內部空間83。於圖3(a)、圖3(b)中,以粗間隔表示之右下斜線之影線為內部空間83。內部空間83為填滿樹脂之空間。一對模具81、82於內部空間83具有第1內壁(面)85及第2內壁(面)86。第2內壁86係與第1內壁85呈大致直角之面。[Step S01] Step of preparing a pair of molds 81 and 82 Prepare a pair of molds 81 and 82. If the pair of molds 81 and 82 are arranged to face each other, an internal space 83 is formed in the pair of molds 81 and 82. In Fig. 3(a) and Fig. 3(b), the inner space 83 is the hatched line of the lower right oblique line represented by thick intervals. The internal space 83 is a space filled with resin. The pair of molds 81 and 82 have a first inner wall (surface) 85 and a second inner wall (surface) 86 in the internal space 83. The second inner wall 86 and the first inner wall 85 are at a substantially right angle.

一對模具81、82具備用來形成流量調整用閥室27之第1突出部87、用來形成開閉用閥室29之第2突出部88、及用來形成中間流路31之直線狀之第1銷部件89。第1突出部87設置於一對模具81、82中之內部空間83之第1內壁85。於第1突出部87設有與第1延長流路40a對應之第1連接凸部87a。第2突出部88設置於第2內壁86。於第2突出部88設有與第2延長流路40b對應之第2連接凸部88a。A pair of molds 81 and 82 are provided with a first protrusion 87 for forming the valve chamber 27 for flow adjustment, a second protrusion 88 for forming the valve chamber 29 for opening and closing, and a straight line for forming the intermediate flow path 31 The first pin member 89. The first protrusion 87 is provided on the first inner wall 85 of the inner space 83 in the pair of molds 81 and 82. The first protruding portion 87 is provided with a first connecting convex portion 87a corresponding to the first extended flow path 40a. The second protrusion 88 is provided on the second inner wall 86. The second protruding portion 88 is provided with a second connecting convex portion 88a corresponding to the second extended flow path 40b.

第1銷部件89以使第1突出部87與第2突出部88之間連接之方式沿相對於第2內壁86呈大致直角延伸之方向插入。第1突出部87能夠沿橫向(X方向)移動。第1突出部87插入至一對模具81、82之內部空間83。又,如圖3(a)所示,第2突出部88與第1銷部件89一體地構成。成為一體之第2突出部88及第1銷部件89能夠於縱向(Y方向)上移動,插入至一對模具81、82之內部空間83。第1銷部件89之前端部89a與第1突出部87之第1連接凸部87a接觸。The first pin member 89 is inserted in a direction extending at a substantially right angle to the second inner wall 86 so as to connect the first protrusion 87 and the second protrusion 88. The first protrusion 87 can move in the lateral direction (X direction). The first protrusion 87 is inserted into the internal space 83 of the pair of molds 81 and 82. Moreover, as shown in FIG. 3(a), the second protrusion 88 and the first pin member 89 are integrally configured. The integrated second protrusion 88 and the first pin member 89 can move in the longitudinal direction (Y direction) and are inserted into the internal space 83 of the pair of molds 81 and 82. The front end 89a of the first pin member 89 is in contact with the first connecting convex portion 87a of the first protruding portion 87.

再者,第2突出部88及第1銷部件89亦可並非一體,而以個別地移動之方式構成。Furthermore, the second protrusion 88 and the first pin member 89 may not be integrated, but may be configured to move individually.

[步驟S02]插入第2銷部件90之步驟 以與第1突出部87連接之方式將直線狀之第2銷部件90插入至內部空間83。第2銷部件90能夠沿橫向(X方向)移動。第2銷部件90之前端部90a與第1突出部87接觸。第2銷部件90係用來形成第1流路33者。[Step S02] Step of inserting the second pin member 90 The linear second pin member 90 is inserted into the internal space 83 so as to be connected to the first protrusion 87. The second pin member 90 can move in the lateral direction (X direction). The front end 90a of the second pin member 90 is in contact with the first protrusion 87. The second pin member 90 is used to form the first flow path 33.

[步驟S03]插入第3銷部件91之步驟 以與第2突出部88連接之方式將直線狀之第3銷部件91插入至內部空間83。第3銷部件91能夠沿橫向(X方向)移動。第3銷部件91之前端部91a與第2突出部88之第2連接凸部88a接觸。第3銷部件91係用來形成第2流路35者。[Step S03] Step of inserting the third pin member 91 The linear third pin member 91 is inserted into the internal space 83 so as to be connected to the second protrusion 88. The third pin member 91 can move in the lateral direction (X direction). The front end 91a of the third pin member 91 is in contact with the second connecting convex portion 88a of the second protruding portion 88. The third pin member 91 is used to form the second flow path 35.

[步驟S04]流入樹脂之步驟 於將第1突出部87、第2突出部88、第1銷部件89、第2銷部件90及第3銷部件91插入至內部空間83後(亦就係步驟S01〜S03後),使經加熱而熔化之樹脂(例如PFA)流入至內部空間83。未圖示之射出成形機之加熱機筒內部之樹脂藉由進行加熱而熔化。即,流入至一對模具81、82內之樹脂係藉由加熱而流體化之樹脂。而且,藉由加熱機筒流入至一對模具81、82之內部空間83。[Step S04] Step of pouring resin After inserting the first protrusion 87, the second protrusion 88, the first pin member 89, the second pin member 90, and the third pin member 91 into the internal space 83 (also after steps S01 to S03), the The heated and melted resin (for example, PFA) flows into the internal space 83. The resin inside the heating barrel of the injection molding machine not shown is melted by heating. That is, the resin flowing into the pair of molds 81 and 82 is a resin fluidized by heating. Then, the heating barrel flows into the inner space 83 of the pair of molds 81 and 82.

[步驟S05]卸下流路閥塊(成形品)之步驟 於流入至內部空間83之樹脂經冷卻固化後,從一對模具81、82內抽出第1突出部87、第2突出部88、第1銷部件89、第2銷部件90及第3銷部件91。之後,從一對模具81、82卸下樹脂作為單一之流路閥塊21。該卸下係藉由使一對模具81、82於上下方向(圖3(b)之Z方向)上相對移動來進行。再者,流入至內部空間83之樹脂於與一對模具81、82之內壁(符號85、86等)、第1突出部87、第2突出部88、第1銷部件89、第2銷部件90及第3銷部件91相接之部分形成表層。[Step S05] Step of removing the flow path valve block (molded product) After the resin flowing into the internal space 83 is cooled and solidified, the first protrusion 87, the second protrusion 88, the first pin member 89, the second pin member 90, and the third pin member are drawn out from the pair of molds 81 and 82 91. After that, the resin is removed from the pair of molds 81 and 82 as a single flow path valve block 21. This removal is performed by relatively moving the pair of molds 81 and 82 in the vertical direction (the Z direction in FIG. 3(b)). Furthermore, the resin that has flowed into the internal space 83 interacts with the inner walls (symbols 85, 86, etc.) of the pair of molds 81, 82, the first protrusion 87, the second protrusion 88, the first pin member 89, and the second pin. The part where the member 90 and the third pin member 91 contact each other forms a surface layer.

[步驟S06]安裝針移動機構及開閉用閥體移動機構之步驟 對從一對模具81、82卸下之流路閥塊21進行用來研磨圖2所示之開口部49及閥座75之表面等之處理。然後,將針移動機構23及開閉用閥體移動機構25等零件安裝於流路閥塊21。[Step S06] Step of installing the needle moving mechanism and the valve body moving mechanism for opening and closing The flow path valve block 21 removed from the pair of molds 81 and 82 is processed for polishing the surface of the opening 49 and the valve seat 75 shown in FIG. 2. Then, components such as the needle moving mechanism 23 and the valve body moving mechanism 25 for opening and closing are attached to the flow path valve block 21.

再者,根據下述變化例等之流路閥塊21之構造,一對模具81、82、第1突出部87、第2突出部88等亦可藉由如下方式構成。例如,第1突出部87亦可相對於模具81不移動而固定於模具81之第1內壁85。同樣地,第2突出部88亦可相對於模具82不移動而固定於模具82之第2內壁86。又,對應於下述圖4之構成,第2內壁86亦可為與第1內壁85對向之面。In addition, according to the structure of the flow path valve block 21 in the following modification examples, the pair of molds 81, 82, the first protrusion 87, the second protrusion 88, and the like can also be configured as follows. For example, the first protrusion 87 may be fixed to the first inner wall 85 of the mold 81 without moving relative to the mold 81. Similarly, the second protrusion 88 may be fixed to the second inner wall 86 of the mold 82 without moving relative to the mold 82. In addition, corresponding to the configuration of FIG. 4 described below, the second inner wall 86 may be a surface facing the first inner wall 85.

再者,於先前之藥液控制閥9中,圖7所示之V字流路205係藉由於形成後從流量調整用閥室及開閉用閥室這兩個方向進行切削來形成。即,受模具之限制,圖7所示之V字流路205無法形成為直線狀。又,例如於流路閥塊21由PFA形成之情形時,於V字流路205部分會削去PFA之表層,因此有藥液滲入至流路閥塊21(PFA)之內部之掛慮。根據本實施例之藥液控制閥9之製造方法,不進行切削便能形成直線狀之中間流路31。Furthermore, in the conventional chemical liquid control valve 9, the V-shaped flow path 205 shown in FIG. 7 is formed by cutting from the two directions of the valve chamber for flow rate adjustment and the valve chamber for opening and closing. That is, due to the limitation of the mold, the V-shaped flow path 205 shown in FIG. 7 cannot be formed in a linear shape. In addition, for example, when the flow path valve block 21 is formed of PFA, the surface layer of the PFA is shaved off in the V-shaped flow path 205, so there is a concern that the liquid medicine penetrates into the flow path valve block 21 (PFA). According to the method of manufacturing the chemical liquid control valve 9 of this embodiment, the linear intermediate flow path 31 can be formed without cutting.

<基板處理裝置及藥液控制閥之動作> 接著,對基板處理裝置1及藥液控制閥9之動作進行說明。<Operation of substrate processing equipment and chemical liquid control valve> Next, the operations of the substrate processing apparatus 1 and the chemical liquid control valve 9 will be described.

參照圖1。未圖示之搬送機構將基板W搬送到保持旋轉部3上。保持旋轉部3藉由吸附基板W之背面來保持基板W。之後,保持旋轉部3使所保持之基板W旋轉。噴嘴2藉由未圖示之移動機構移動到基板W之上方。控制部11藉由操作藥液控制閥9而使藥液從噴嘴2噴出到基板W上。Refer to Figure 1. A transport mechanism not shown transports the substrate W to the holding and rotating part 3. The holding and rotating part 3 holds the substrate W by sucking the back surface of the substrate W. After that, the holding and rotating part 3 rotates the held substrate W. The nozzle 2 is moved above the substrate W by a moving mechanism not shown. The control unit 11 operates the chemical liquid control valve 9 to eject the chemical liquid from the nozzle 2 onto the substrate W.

於圖2所示之藥液控制閥9中,首先對開閉用閥體移動機構25之動作進行說明。隔膜51之厚壁部51a藉由彈簧61之彈性力(復原力)而被壓抵於設置於開閉用閥室29之開口部73周圍之閥座75(參照圖2之虛線所表示之厚壁部51a)。該狀態為不使藥液從開閉用閥室29流通至第2流路35之關閉狀態。當為關閉狀態時,不從噴嘴2噴出藥液。In the chemical liquid control valve 9 shown in FIG. 2, first, the operation of the valve body moving mechanism 25 for opening and closing will be described. The thick-walled portion 51a of the diaphragm 51 is pressed by the elastic force (restoring force) of the spring 61 against the valve seat 75 provided around the opening 73 of the valve chamber 29 for opening and closing (refer to the thick-walled portion shown by the dotted line in FIG. 2 Section 51a). This state is a closed state in which the chemical liquid is not allowed to flow from the valve chamber 29 for opening and closing to the second flow path 35. When it is in the closed state, the liquid chemical is not sprayed from the nozzle 2.

藉由操作三向閥71,經由氣體配管67及吸氣排氣口63,從氣體供給源69對罩體53內之活動分隔部件59與間隔壁57之間之空間輸送氣體。由此,活動分隔部件59排斥彈簧61之彈性力而上升,隨之,活動部件55及隔膜51之厚壁部51a上升(參照圖2之實線所表示之厚壁部51a)。該狀態為使藥液流通之打開狀態。當為打開狀態時,從噴嘴2噴出藥液。By operating the three-way valve 71, gas is delivered from the gas supply source 69 to the space between the movable partition member 59 and the partition wall 57 in the cover 53 through the gas pipe 67 and the air intake and exhaust port 63. As a result, the movable partition member 59 repels the elastic force of the spring 61 and rises, and accordingly, the movable member 55 and the thick portion 51a of the diaphragm 51 rise (refer to the thick portion 51a indicated by the solid line in FIG. 2). This state is an open state that allows the liquid medicine to circulate. When it is in the open state, the chemical liquid is sprayed from the nozzle 2.

此處,對成為打開狀態時之藥液之流動進行具體說明。圖1所示之泵P將藥液從藥液供給源7通過藥液配管8a輸送至藥液控制閥9之第1流路33。輸送至圖2所示之第1流路33之藥液通過針41之前端部41a與開口部49之間隙,被輸送至流量調整用閥室27。之後,藥液通過中間流路31從流量調整用閥室27被輸送至開閉用閥室29。再者,因為中間流路31構成為直線狀,故而與圖7所示之V字流路205等相比,能夠更順利地輸送藥液。Here, the flow of the liquid medicine when it is in the open state will be specifically described. The pump P shown in FIG. 1 transports the liquid medicine from the liquid medicine supply source 7 to the first flow path 33 of the liquid medicine control valve 9 through the liquid medicine pipe 8 a. The medical solution sent to the first flow path 33 shown in FIG. 2 passes through the gap between the front end 41 a of the needle 41 and the opening 49, and is sent to the valve chamber 27 for flow rate adjustment. After that, the medicinal solution is sent from the valve chamber 27 for flow adjustment to the valve chamber 29 for opening and closing through the intermediate flow path 31. Furthermore, since the intermediate flow path 31 is configured to be linear, it is possible to transport the liquid medicine more smoothly than the V-shaped flow path 205 and the like shown in FIG. 7.

之後,藥液通過閥座75之開口部73及第2流路35從開閉用閥室29被輸送至藥液配管8b。輸送至藥液配管8b之藥液被輸送至噴嘴2而從噴嘴2噴出藥液。After that, the medicinal solution passes through the opening 73 of the valve seat 75 and the second flow path 35 and is transported from the opening/closing valve chamber 29 to the medicinal solution piping 8b. The chemical liquid delivered to the chemical liquid pipe 8b is delivered to the nozzle 2 and the chemical liquid is ejected from the nozzle 2.

又,對針移動機構23之動作進行說明。針移動機構23係藉由調整針41之前端部41a與開口部49之間隙,來調整第1流路33等流路閥塊21內之藥液之流量。針41藉由電動馬達45之旋轉驅動來移動。轉換機構47將電動馬達45之旋轉轉換為針41之直線移動。針41沿橫向(X方向)移動。In addition, the operation of the needle moving mechanism 23 will be described. The needle moving mechanism 23 adjusts the flow rate of the liquid medicine in the flow path valve block 21 such as the first flow path 33 by adjusting the gap between the front end 41 a of the needle 41 and the opening 49. The needle 41 is moved by the rotation drive of the electric motor 45. The conversion mechanism 47 converts the rotation of the electric motor 45 into the linear movement of the needle 41. The needle 41 moves in the lateral direction (X direction).

於噴出藥液後,控制部11藉由操作三向閥71,停止從氣體供給源69供給氣體,並且將圖2所示之罩體53內之氣體通過吸氣排氣口63等排出。由此,利用彈簧61之彈性力將隔膜51之厚壁部51a下壓,且將厚壁部51a壓抵於閥座75(關閉狀態)。當為關閉狀態時,不從噴嘴2噴出藥液。After spraying the chemical liquid, the control unit 11 operates the three-way valve 71 to stop the gas supply from the gas supply source 69, and discharges the gas in the cover 53 shown in FIG. 2 through the suction and exhaust ports 63 and the like. As a result, the thick-walled portion 51a of the diaphragm 51 is pressed down by the elastic force of the spring 61, and the thick-walled portion 51a is pressed against the valve seat 75 (closed state). When it is in the closed state, the liquid chemical is not sprayed from the nozzle 2.

於藥液從噴嘴2之噴出結束後,噴嘴2從基板W之上方退避至基板外。保持旋轉部3使所保持之基板W停止旋轉,之後解除基板W之保持。未圖示之搬送機構使保持旋轉部3上之基板W移動到其他裝置、載置部或載體等。After the ejection of the chemical liquid from the nozzle 2 is completed, the nozzle 2 is retracted from above the substrate W to the outside of the substrate. The holding and rotating part 3 stops the rotation of the held substrate W, and then releases the holding of the substrate W. A transport mechanism not shown in the figure moves the substrate W on the holding and rotating part 3 to another device, a mounting part, a carrier, or the like.

根據本實施例,流路閥塊21具有第1外壁21a及作為與第1外壁21a呈直角之面之第2外壁21b。配置針41之流量調整用閥室27以流路閥塊21之第1外壁21a凹陷之方式形成。另一方面,配置隔膜51之開閉用閥室29以第2外壁21b凹陷之方式形成。中間流路31將流量調整用閥室27與開閉用閥室29連接,中間流路31相對於第2外壁21b呈直角延伸。藉由此種構成,能夠將中間流路31形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。再者,置換特性係以使新之藥液流入至第1連接口37,而擠出原來之藥液並且使之到達第2連接口39之時間表示之特性。According to this embodiment, the flow path valve block 21 has a first outer wall 21a and a second outer wall 21b that is a surface at a right angle to the first outer wall 21a. The valve chamber 27 for adjusting the flow rate in which the needle 41 is arranged is formed such that the first outer wall 21a of the flow path valve block 21 is recessed. On the other hand, the opening and closing valve chamber 29 in which the diaphragm 51 is arranged is formed so that the second outer wall 21b is recessed. The intermediate flow path 31 connects the flow rate adjustment valve chamber 27 and the opening and closing valve chamber 29, and the intermediate flow path 31 extends at a right angle with respect to the second outer wall 21b. With this configuration, the intermediate flow path 31 can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like. In addition, the replacement characteristic is a characteristic represented by the time required for the new liquid medicine to flow into the first connection port 37 and the original liquid medicine to be squeezed out to reach the second connection port 39.

又,第1流路33及第2流路35分別為直線狀,且相對於中間流路31呈直角延伸。於使樹脂流入至一對模具81、82而形成流路閥塊21時,能夠將為了形成中間流路31而插入至一對模具81、82內之第1銷部件89、與為了形成第1流路33及第2流路35而插入至一對模具81、82內之第2銷部件90及第3銷部件91各者呈直角配置。因此,相較於第1銷部件89與第2銷部件90及第3銷部件91各者傾斜地配置(並非直角)之情形,能夠容易地形成中間流路31、第1流路33及第2流路35。In addition, the first flow path 33 and the second flow path 35 are linear and extend at right angles to the intermediate flow path 31. When the resin is poured into the pair of molds 81, 82 to form the flow path valve block 21, the first pin member 89 inserted into the pair of molds 81, 82 for forming the intermediate flow path 31 and the first pin member 89 for forming the first Each of the second pin member 90 and the third pin member 91 inserted into the pair of molds 81 and 82 with the flow path 33 and the second flow path 35 is arranged at a right angle. Therefore, compared with the case where the first pin member 89, the second pin member 90, and the third pin member 91 are arranged obliquely (not at a right angle), the intermediate flow path 31, the first flow path 33, and the second pin member can be easily formed. Flow Path 35.

又,第1流路33與第2流路35平行。第1流路33中與連接流量調整用閥室27之部分為相反側之第1連接口37,朝向與第2流路35中與連接開閉用閥室29之部分為相反側之第2連接口39相同之方向開口。於使樹脂流入至一對模具81、82而形成流路閥塊21時,能夠使為了形成第1流路33及第2流路35而插入至一對模具81、82內之第2銷部件90及第3銷部件91朝相同之方向移動。因此,相較於第2銷部件90插入至模具內之朝向與第3銷部件91之朝向不同之情形,能夠容易地形成第1流路33及第2流路35。In addition, the first flow path 33 and the second flow path 35 are parallel. The first connection port 37 of the first flow path 33 on the opposite side to the part connected to the valve chamber 27 for flow adjustment is directed toward the second connection on the opposite side to the part of the second flow path 35 connected to the valve chamber 29 for opening and closing. The interface 39 opens in the same direction. When the resin is poured into the pair of molds 81, 82 to form the flow path valve block 21, the second pin member inserted into the pair of molds 81, 82 in order to form the first flow path 33 and the second flow path 35 can be made 90 and the third pin member 91 move in the same direction. Therefore, the first flow path 33 and the second flow path 35 can be easily formed compared to the case where the direction in which the second pin member 90 is inserted into the mold is different from the direction in which the third pin member 91 is inserted.

本發明並不限於上述實施形態,能夠如下所述實施變化。The present invention is not limited to the above-mentioned embodiment, and can be modified as described below.

(1)於上述實施例中,設有開閉用閥室29之第2外壁21b係與設有流量調整用閥室27之第1外壁21a呈直角之面。關於這一點,第2外壁21b亦可如圖4所示為與第1外壁21a對向並且與第1外壁21a大致平行之面。即,第2外壁(面)21b設置於隔著流路閥塊21而與第1外壁(面)21a相反之側。又,第2外壁21b相對於第1外壁21a大致平行。(1) In the above embodiment, the second outer wall 21b provided with the valve chamber 29 for opening and closing is a right-angled surface with the first outer wall 21a provided with the valve chamber 27 for flow adjustment. In this regard, the second outer wall 21b may also be a surface facing the first outer wall 21a and substantially parallel to the first outer wall 21a as shown in FIG. 4. That is, the second outer wall (surface) 21b is provided on the side opposite to the first outer wall (surface) 21a with the flow path valve block 21 interposed therebetween. In addition, the second outer wall 21b is substantially parallel to the first outer wall 21a.

流量調整用閥室27以流路閥塊21之第1外壁21a之一部分凹陷之方式形成。開閉用閥室29以流路閥塊21之第2外壁21b之一部分凹陷之方式形成。如圖4所示,流量調整用閥室27以與開閉用閥室29對向之方式配置。The valve chamber 27 for flow rate adjustment is formed in such a way that a part of the first outer wall 21a of the flow path valve block 21 is recessed. The opening and closing valve chamber 29 is formed in such a manner that a part of the second outer wall 21b of the flow path valve block 21 is recessed. As shown in FIG. 4, the valve chamber 27 for flow rate adjustment is arrange|positioned so that it may oppose the valve chamber 29 for opening and closing.

直線狀之中間流路31以使開閉用閥室29與流量調整用閥室27連接之方式形成。又,中間流路31相對於第1外壁21a及第2外壁21b呈直角延伸。第1流路33及第2流路35分別相對於中間流路31呈直角延伸。第1流路33連接於流量調整用閥室27。另一方面,第2流路35連接於開閉用閥室29。The linear intermediate flow path 31 is formed so as to connect the valve chamber 29 for opening and closing and the valve chamber 27 for flow rate adjustment. In addition, the intermediate flow path 31 extends at a right angle with respect to the first outer wall 21a and the second outer wall 21b. The first flow path 33 and the second flow path 35 respectively extend at right angles to the intermediate flow path 31. The first flow path 33 is connected to the valve chamber 27 for flow rate adjustment. On the other hand, the second flow path 35 is connected to the valve chamber 29 for opening and closing.

圖4所示之隔膜51沿縱向(Y方向)移動。而且,本變化例之針41亦沿縱向移動。針41之前端部41a貫穿流量調整用閥室27與中間流路31之連接部分之開口部49。The diaphragm 51 shown in FIG. 4 moves in the longitudinal direction (Y direction). Moreover, the needle 41 of this modification also moves in the longitudinal direction. The front end 41a of the needle 41 penetrates the opening 49 of the connection portion between the flow rate adjusting valve chamber 27 and the intermediate flow path 31.

根據本變化例,流路閥塊21具有第1外壁21a、及作為與第1外壁21a對向並且與第1外壁21a平行之面之第2外壁21b。配置針41之流量調整用閥室27以流路閥塊21之第1外壁21a凹陷之方式形成。另一方面,配置隔膜51之開閉用閥室29以第2外壁21b凹陷之方式形成。中間流路31將流量調整用閥室27與開閉用閥室29連接,中間流路31相對於第1外壁21a及第2外壁21b呈直角延伸。藉由此種構成,能夠將中間流路31形成為直線狀。因此,能夠提高有因V字流路等而導致藥液劣化之掛慮之藥液之置換特性。According to this modification, the flow path valve block 21 has a first outer wall 21a and a second outer wall 21b which is a surface facing the first outer wall 21a and parallel to the first outer wall 21a. The valve chamber 27 for adjusting the flow rate in which the needle 41 is arranged is formed such that the first outer wall 21a of the flow path valve block 21 is recessed. On the other hand, the opening and closing valve chamber 29 in which the diaphragm 51 is arranged is formed so that the second outer wall 21b is recessed. The intermediate flow path 31 connects the flow rate adjustment valve chamber 27 and the opening and closing valve chamber 29, and the intermediate flow path 31 extends at a right angle to the first outer wall 21a and the second outer wall 21b. With this configuration, the intermediate flow path 31 can be formed in a linear shape. Therefore, it is possible to improve the replacement characteristics of the liquid medicine, which may cause deterioration of the liquid medicine due to the V-shaped flow path or the like.

(2)於上述實施例中,例如圖2所示,中間流路31以與設有開閉用閥室29之第2外壁21b呈大致直角延伸之方式形成。關於這一點,中間流路31亦可如圖5(a)所示以與設有流量調整用閥室27之第1外壁21a呈大致直角延伸之方式形成。(2) In the above embodiment, for example, as shown in FIG. 2, the intermediate flow path 31 is formed so as to extend substantially at right angles to the second outer wall 21b provided with the valve chamber 29 for opening and closing. In this regard, the intermediate flow path 31 may be formed so as to extend substantially at right angles to the first outer wall 21a provided with the valve chamber 27 for flow rate adjustment as shown in FIG. 5(a).

(3)於上述實施例及變化例(1)中,如圖2及圖4所示,開閉用閥室29之底部之開口部73連接於第2流路35。關於這一點,開閉用閥室29之底部之開口部73亦可如圖5(b)所示連接於中間流路31。(3) In the above-mentioned embodiment and modification (1), as shown in FIGS. 2 and 4, the opening 73 at the bottom of the valve chamber 29 for opening and closing is connected to the second flow path 35. In this regard, the opening 73 at the bottom of the valve chamber 29 for opening and closing may be connected to the intermediate flow path 31 as shown in FIG. 5(b).

(4)於上述實施例及各變化例中,如圖2及圖4所示,於流量調整用閥室27之底部之開口部49連接著沿針41之移動方向延伸之中間流路31或第1流路33。關於這一方面,亦可如圖5(b)所示,於流量調整用閥室27之底部之開口部49,經由第3延長流路40c連接沿與針41之移動方向正交之方向延伸之中間流路31(或第1流路33)。第3延長流路40c係從開口部49向針41之移動方向延伸,與中間流路31連接。(4) In the above-mentioned embodiment and each modification example, as shown in Figures 2 and 4, the opening 49 at the bottom of the valve chamber 27 for flow adjustment is connected to the intermediate flow path 31 extending in the moving direction of the needle 41 or The first flow path 33. Regarding this aspect, as shown in FIG. 5(b), the opening 49 at the bottom of the flow rate adjusting valve chamber 27 may be connected via a third extension flow path 40c to extend in a direction orthogonal to the moving direction of the needle 41 The middle flow path 31 (or the first flow path 33). The third extension flow path 40 c extends from the opening 49 in the moving direction of the needle 41 and is connected to the intermediate flow path 31.

再者,於圖5(a)、圖5(b)以及下述圖6(a)、圖6(b)中,將針移動機構23及開閉用閥體移動機構25簡化表示。In addition, in FIGS. 5(a) and 5(b) and the following FIGS. 6(a) and 6(b), the needle moving mechanism 23 and the valve body moving mechanism 25 for opening and closing are simplified and shown.

(5)於上述實施例及各變化例中,針移動機構23構成為,具備電動馬達45與轉換機構47,且藉由轉換機構47將電動馬達45所輸出之旋轉轉換為針41之直線移動。但是,並不限於此。亦可構成為,設置作業人員手動轉動之把手或手柄代替電動馬達45,將把手或手柄之旋轉轉換為針41之直線移動。(5) In the above embodiments and various modifications, the needle moving mechanism 23 is configured to include an electric motor 45 and a conversion mechanism 47, and the conversion mechanism 47 converts the rotation output by the electric motor 45 into linear movement of the needle 41 . However, it is not limited to this. It can also be configured that a handle or handle manually turned by the operator is provided instead of the electric motor 45, and the rotation of the handle or handle is converted into the linear movement of the needle 41.

(6)於上述實施例及各變化例中,例如圖2及圖4所示,第1流路33之一端之第1連接口37朝向與第2流路35之一端之第2連接口39相同之方向。即,第1連接口37及第2連接口39於圖2及圖4中均朝向右方開口。關於這一點,第1連接口37亦可如圖6(a)及圖6(b)所示朝向與第2連接口39相反之方向開口。即,於圖6(a)及圖6(b)中,第1連接口37朝向左方開口,第2連接口39朝向右方開口。(6) In the above embodiments and various modifications, for example, as shown in FIGS. 2 and 4, the first connection port 37 at one end of the first flow path 33 faces the second connection port 39 at one end of the second flow path 35 The same direction. That is, the first connection port 37 and the second connection port 39 both open to the right in FIGS. 2 and 4. In this regard, the first connection port 37 may be opened in a direction opposite to the second connection port 39 as shown in FIGS. 6(a) and 6(b). That is, in FIGS. 6(a) and 6(b), the first connection port 37 opens to the left, and the second connection port 39 opens to the right.

再者,於圖6(a)及圖6(b)中,第1連接口37朝向與第2連接口39相反之方向,即,相對於第2連接口39繞中間流路31反轉180度開口。關於這一點,第1連接口37亦可相對於第2連接口39繞中間流路31例如朝向90º之方向(亦就係除0度及180度以外之方向)開口。Furthermore, in FIGS. 6(a) and 6(b), the first connection port 37 faces the opposite direction to the second connection port 39, that is, it reverses 180 degrees around the intermediate flow path 31 with respect to the second connection port 39 Degree openings. In this regard, the first connection port 37 may also open in a direction of, for example, 90° (that is, a direction other than 0 degrees and 180 degrees) around the intermediate flow path 31 relative to the second connection port 39.

(7)於上述實施例及各變化例中,開閉用閥體移動機構25藉由氣體驅動隔膜51。關於這一點,開閉用閥體移動機構25亦可與針移動機構23同樣地藉由電動馬達驅動隔膜51。利用電動馬達進行之旋轉藉由轉換機構轉換為直線移動。由此,將隔膜51之厚壁部51a壓抵於閥座75、或使厚壁部51a從閥座75離開。(7) In the above-mentioned embodiment and each modification example, the opening and closing valve body moving mechanism 25 drives the diaphragm 51 by gas. In this regard, the valve body moving mechanism 25 for opening and closing may drive the diaphragm 51 by an electric motor similarly to the needle moving mechanism 23. The rotation performed by the electric motor is converted into linear movement by the conversion mechanism. As a result, the thick portion 51 a of the diaphragm 51 is pressed against the valve seat 75 or the thick portion 51 a is separated from the valve seat 75.

1‧‧‧基板處理裝置 2‧‧‧噴嘴 3‧‧‧保持旋轉部 4‧‧‧旋轉夾頭 5‧‧‧旋轉驅動部 7‧‧‧藥液供給源 8a‧‧‧藥液配管 8b‧‧‧藥液配管 9‧‧‧藥液控制閥 11‧‧‧控制部 13‧‧‧操作部 21‧‧‧單一之流路閥塊 21a‧‧‧第1外壁 21b‧‧‧第2外壁 23‧‧‧針移動機構 25‧‧‧開閉用閥體移動機構 27‧‧‧流量調整用閥室 29‧‧‧開閉用閥室 31‧‧‧中間流路 33‧‧‧第1流路 35‧‧‧第2流路 37‧‧‧第1連接口 39‧‧‧第2連接口 40a‧‧‧第1延長流路 40b‧‧‧第2延長流路 40c‧‧‧第3延長流路 41‧‧‧針 41a‧‧‧前端部 43‧‧‧罩體 45‧‧‧電動馬達 47‧‧‧轉換機構 49‧‧‧開口部 51‧‧‧隔膜 51a‧‧‧厚壁部 53‧‧‧罩體 53a‧‧‧頂壁 53b‧‧‧母螺紋 55‧‧‧活動部件 57‧‧‧間隔壁 59‧‧‧活動分隔部件 61‧‧‧彈簧 63‧‧‧吸氣排氣口 65‧‧‧調整螺絲部 65a‧‧‧公螺紋 67‧‧‧氣體配管 69‧‧‧氣體供給源 71‧‧‧三向閥 73‧‧‧開口部 75‧‧‧閥座 81‧‧‧模具 82‧‧‧模具 83‧‧‧內部空間 85‧‧‧第1內壁 86‧‧‧第2內壁86 87‧‧‧第1突出部 87a‧‧‧第1連接凸部 88‧‧‧第2突出部 88a‧‧‧第2連接凸部 89‧‧‧第1銷部件 89a‧‧‧前端部 90‧‧‧第2銷部件 90a‧‧‧前端部 91‧‧‧第3銷部件 91a‧‧‧前端部 201‧‧‧藥液控制閥 202‧‧‧流量調整閥 203‧‧‧開閉閥(ON/OFF閥) 205‧‧‧V字流路 AX‧‧‧旋轉軸 P‧‧‧泵 W‧‧‧基板 X‧‧‧方向 Y‧‧‧方向 Z‧‧‧方向1‧‧‧Substrate processing equipment 2‧‧‧Nozzle 3‧‧‧Keep rotating part 4‧‧‧Rotating Chuck 5‧‧‧Rotation drive unit 7‧‧‧Medicinal solution supply source 8a‧‧‧Liquid piping 8b‧‧‧Liquid piping 9‧‧‧Liquid control valve 11‧‧‧Control Department 13‧‧‧Operation Department 21‧‧‧Single flow path valve block 21a‧‧‧The first outer wall 21b‧‧‧The second outer wall 23‧‧‧Needle moving mechanism 25‧‧‧Valve body moving mechanism for opening and closing 27‧‧‧Valve chamber for flow adjustment 29‧‧‧Valve chamber for opening and closing 31‧‧‧Intermediate flow path 33‧‧‧First flow path 35‧‧‧Second flow path 37‧‧‧The first connection port 39‧‧‧The second connection port 40a‧‧‧The first extension flow path 40b‧‧‧Second extension flow path 40c‧‧‧The third extension flow path 41‧‧‧Needle 41a‧‧‧Front end 43‧‧‧Hood 45‧‧‧Electric Motor 47‧‧‧Transformation Organization 49‧‧‧Opening 51‧‧‧Diaphragm 51a‧‧‧Thick Wall 53‧‧‧Hood 53a‧‧‧Top wall 53b‧‧‧Female thread 55‧‧‧moving parts 57‧‧‧The next wall 59‧‧‧Activity divider 61‧‧‧Spring 63‧‧‧Suction and exhaust port 65‧‧‧Adjusting screw part 65a‧‧‧Male thread 67‧‧‧Gas piping 69‧‧‧Gas supply source 71‧‧‧Three-way valve 73‧‧‧Opening 75‧‧‧Valve seat 81‧‧‧Mould 82‧‧‧Mould 83‧‧‧Internal space 85‧‧‧The first inner wall 86‧‧‧Second inner wall 86 87‧‧‧The first protrusion 87a‧‧‧The first connecting convex part 88‧‧‧Second protrusion 88a‧‧‧Second connecting convex 89‧‧‧The first pin part 89a‧‧‧Front end 90‧‧‧Second pin part 90a‧‧‧Front end 91‧‧‧Pin 3 91a‧‧‧Front end 201‧‧‧Liquid Control Valve 202‧‧‧Flow control valve 203‧‧‧Open and close valve (ON/OFF valve) 205‧‧‧V-shaped flow path AX‧‧‧Rotation axis P‧‧‧Pump W‧‧‧Substrate X‧‧‧direction Y‧‧‧ direction Z‧‧‧ direction

圖1係實施例之基板處理裝置之概略構成圖。 圖2係實施例之藥液控制閥之概略構成圖。 圖3(a)係XY方向上之一對模具之橫剖視圖,(b)係XZ方向上之一對模具之縱剖視圖。 圖4係變化例之藥液控制閥之概略構成圖。 圖5(a)、(b)係變化例之藥液控制閥之概略構成圖。 圖6(a)、(b)係變化例之藥液控制閥之概略構成圖。 圖7係先前之藥液控制閥之概略構成圖。Fig. 1 is a schematic configuration diagram of the substrate processing apparatus of the embodiment. Fig. 2 is a schematic configuration diagram of the liquid medicine control valve of the embodiment. Figure 3 (a) is a cross-sectional view of a pair of molds in the XY direction, and (b) is a longitudinal cross-sectional view of a pair of molds in the XZ direction. Fig. 4 is a schematic configuration diagram of a chemical liquid control valve of a modified example. Figures 5 (a) and (b) are schematic diagrams of the chemical liquid control valve of a modified example. Figure 6 (a) and (b) are schematic diagrams of the chemical liquid control valve of the modified example. Fig. 7 is a schematic configuration diagram of the conventional chemical liquid control valve.

8a‧‧‧藥液配管 8a‧‧‧Liquid piping

8b‧‧‧藥液配管 8b‧‧‧Liquid piping

9‧‧‧藥液控制閥 9‧‧‧Liquid control valve

21‧‧‧單一之流路閥塊 21‧‧‧Single flow path valve block

21a‧‧‧第1外壁 21a‧‧‧The first outer wall

21b‧‧‧第2外壁 21b‧‧‧The second outer wall

23‧‧‧針移動機構 23‧‧‧Needle moving mechanism

25‧‧‧開閉用閥體移動機構 25‧‧‧Valve body moving mechanism for opening and closing

27‧‧‧流量調整用閥室 27‧‧‧Valve chamber for flow adjustment

29‧‧‧開閉用閥室 29‧‧‧Valve chamber for opening and closing

31‧‧‧中間流路 31‧‧‧Intermediate flow path

33‧‧‧第1流路 33‧‧‧First flow path

35‧‧‧第2流路 35‧‧‧Second flow path

37‧‧‧第1連接口 37‧‧‧The first connection port

39‧‧‧第2連接口 39‧‧‧The second connection port

40a‧‧‧第1延長流路 40a‧‧‧The first extension flow path

40b‧‧‧第2延長流路 40b‧‧‧Second extension flow path

41‧‧‧針 41‧‧‧Needle

41a‧‧‧前端部 41a‧‧‧Front end

43‧‧‧罩體 43‧‧‧Hood

45‧‧‧電動馬達 45‧‧‧Electric Motor

47‧‧‧轉換機構 47‧‧‧Transformation Organization

49‧‧‧開口部 49‧‧‧Opening

51‧‧‧隔膜 51‧‧‧Diaphragm

51a‧‧‧厚壁部 51a‧‧‧Thick Wall

53‧‧‧罩體 53‧‧‧Hood

53a‧‧‧頂壁 53a‧‧‧Top wall

53b‧‧‧母螺紋 53b‧‧‧Female thread

55‧‧‧活動部件 55‧‧‧moving parts

57‧‧‧間隔壁 57‧‧‧The next wall

59‧‧‧活動分隔部件 59‧‧‧Activity divider

61‧‧‧彈簧 61‧‧‧Spring

63‧‧‧吸氣排氣口 63‧‧‧Suction and exhaust port

65‧‧‧調整螺絲部 65‧‧‧Adjusting screw part

65a‧‧‧公螺紋 65a‧‧‧Male thread

67‧‧‧氣體配管 67‧‧‧Gas piping

69‧‧‧氣體供給源 69‧‧‧Gas supply source

71‧‧‧三向閥 71‧‧‧Three-way valve

73‧‧‧開口部 73‧‧‧Opening

75‧‧‧閥座 75‧‧‧Valve seat

X‧‧‧方向 X‧‧‧direction

Y‧‧‧方向 Y‧‧‧ direction

Claims (13)

一種藥液控制閥,其特徵在於具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁呈直角之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁之任一個呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,與上述開閉用閥室連接;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。 A liquid medicine control valve, characterized by comprising: a single flow path valve block having a first outer wall and a second outer wall as a plane at right angles to the first outer wall; a valve chamber for flow adjustment, which is based on the first The outer wall is recessed; the valve chamber for opening and closing is formed with the second outer wall recessed; the intermediate flow path is formed inside the flow path valve block and is linear, and the flow rate adjustment valve chamber is aligned with The connection between the opening and closing valve chambers extends at right angles to any one of the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment valve chamber The second flow path, which is formed inside the flow path valve block, is connected to the opening and closing valve chamber; the needle moving mechanism has a needle arranged in the flow rate adjustment valve chamber to block the flow rate adjustment valve And move the needle in order to adjust the flow rate of the liquid medicine; and an opening and closing valve body moving mechanism, which has an opening and closing valve body arranged in the opening and closing valve chamber, blocking the opening and closing valve chamber, and in order to perform the medicine The supply of the liquid and the stop of the supply move the valve body for opening and closing. 一種藥液控制閥,其特徵在於具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁對向並且與上述第1外壁平行之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成; 開閉用閥室,其以上述第2外壁凹陷之方式形成,且配置於上述流量調整用閥室之上方;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,與上述開閉用閥室連接;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動;且上述藥液從上述流量調整用閥室通過上述中間流路被輸送至上述開閉用閥室。 A chemical liquid control valve, characterized by comprising: a single flow path valve block having a first outer wall and a second outer wall as a surface facing the first outer wall and parallel to the first outer wall; a valve for flow adjustment A chamber, which is formed in a way that the first outer wall is recessed; The valve chamber for opening and closing is formed in such a manner that the second outer wall is recessed and is arranged above the valve chamber for flow adjustment; the intermediate flow path is formed inside the flow path valve block and has a linear shape, and the The flow rate adjustment valve chamber is connected to the opening and closing valve chamber and extends at right angles to the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment Connected by a valve chamber; a second flow path formed inside the flow path valve block and connected to the opening and closing valve chamber; a needle moving mechanism having a needle arranged in the flow rate adjustment valve chamber to block the flow Adjusting the valve chamber and moving the needle in order to adjust the flow rate of the liquid medicine; and an opening and closing valve body moving mechanism having an opening and closing valve body arranged in the opening and closing valve chamber to block the opening and closing valve chamber, and The opening and closing valve body is moved in order to perform the supply of the liquid medicine and the stop of the supply; and the liquid medicine is transported from the valve chamber for flow rate adjustment to the valve chamber for opening and closing through the intermediate flow path. 如請求項1或2之藥液控制閥,其中上述第1流路及上述第2流路分別為直線狀,且相對於上述中間流路呈直角延伸。 The liquid medicine control valve of claim 1 or 2, wherein the first flow path and the second flow path are respectively linear and extend at right angles to the intermediate flow path. 如請求項1或2之藥液控制閥,其中上述第1流路與上述第2流路平行,上述第1流路中與連接上述流量調整用閥室之部分為相反側之第1連 接口,朝向與上述第2流路中與連接上述開閉用閥室之部分為相反側之第2連接口相同之方向開口。 The chemical liquid control valve of claim 1 or 2, wherein the first flow path is parallel to the second flow path, and the portion of the first flow path that connects to the flow rate adjustment valve chamber is the first connection on the opposite side The port opens in the same direction as the second connection port on the opposite side of the part connecting the opening and closing valve chamber in the second flow path. 如請求項1或2之藥液控制閥,其中上述流路閥塊係由PFA形成。 The liquid medicine control valve of claim 1 or 2, wherein the flow path valve block is formed of PFA. 如請求項1或2之藥液控制閥,其中上述第1流路於水平方向呈直線狀延伸,且與上述流量調整用閥室直接連接。 The chemical liquid control valve of claim 1 or 2, wherein the first flow path extends linearly in the horizontal direction and is directly connected to the valve chamber for flow rate adjustment. 如請求項1或2之藥液控制閥,其中上述流量調整用閥室配置於上述中間流路之上游側,上述開閉用閥室配置於上述中間流路之下游側,且上述開閉用閥室配置於上述流量調整用閥室之上方。 The liquid chemical control valve of claim 1 or 2, wherein the valve chamber for flow rate adjustment is arranged on the upstream side of the intermediate flow path, the valve chamber for opening and closing is arranged on the downstream side of the intermediate flow path, and the valve chamber for opening and closing is arranged on the downstream side of the intermediate flow path. It is arranged above the valve chamber for flow adjustment. 如請求項2之藥液控制閥,其中上述流量調整用閥室以上述第1外壁向垂直上方凹陷之方式形成,上述開閉用閥室以上述第2外壁向垂直下方凹陷之方式形成。 The liquid chemical control valve according to claim 2, wherein the valve chamber for flow rate adjustment is formed so that the first outer wall is recessed vertically upward, and the valve chamber for opening and closing is formed so that the second outer wall is recessed vertically downward. 一種基板處理裝置,其特徵在於具備:保持旋轉部,其保持基板,且使所保持之基板旋轉;噴嘴,其對保持於上述保持旋轉部之基板噴出藥液;藥液配管,其連接於上述噴嘴;及 藥液控制閥,其調整從上述噴嘴噴出之藥液之流量,且使藥液從上述噴嘴噴出,使藥液噴出停止;上述藥液控制閥具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁呈直角之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁之任一個呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,且與上述開閉用閥室連接,並且經由上述藥液配管連接於上述噴嘴;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動。 A substrate processing apparatus comprising: a holding and rotating part that holds a substrate and rotates the held substrate; a nozzle that ejects a chemical solution to the substrate held in the holding and rotating part; and a chemical solution piping connected to the above Nozzle; and The chemical liquid control valve adjusts the flow rate of the chemical liquid sprayed from the nozzle, and causes the chemical liquid to be sprayed from the nozzle to stop the chemical liquid ejection; the chemical liquid control valve includes: a single flow path valve block, which has a first An outer wall and a second outer wall that is a plane at right angles to the first outer wall; a valve chamber for flow adjustment, which is formed in such a way that the first outer wall is recessed; and a valve chamber for opening and closing, which is formed in a way that the second outer wall is recessed; The intermediate flow path is formed inside the flow path valve block, is linear, and connects the flow rate adjustment valve chamber and the opening and closing valve chamber, and is opposed to either the first outer wall or the second outer wall. One extends at a right angle; the first flow path is formed inside the flow path valve block and is connected to the flow rate adjustment valve chamber; the second flow path is formed inside the flow path valve block and is connected to the opening and closing Connected with a valve chamber, and connected to the nozzle via the chemical liquid pipe; a needle moving mechanism having a needle arranged in the valve chamber for flow rate adjustment to block the valve chamber for flow rate adjustment, and to adjust the flow rate of the chemical solution Moving the needle; and an opening and closing valve body moving mechanism having an opening and closing valve body arranged in the opening and closing valve chamber, blocking the opening and closing valve chamber, and for supplying and stopping the supply of the liquid medicine The valve body for opening and closing moves. 一種基板處理裝置,其特徵在於具備:保持旋轉部,其保持基板,且使所保持之基板旋轉;噴嘴,其對保持於上述保持旋轉部之基板噴出藥液;藥液配管,其連接於上述噴嘴;及 藥液控制閥,其調整從上述噴嘴噴出之藥液之流量,且使藥液從上述噴嘴噴出,使藥液噴出停止;上述藥液控制閥具備:單一之流路閥塊,其具有第1外壁及作為與上述第1外壁對向並且與上述第1外壁平行之面之第2外壁;流量調整用閥室,其以上述第1外壁凹陷之方式形成;開閉用閥室,其以上述第2外壁凹陷之方式形成,且配置於上述流量調整用閥室之上方;中間流路,其形成於上述流路閥塊之內部,呈直線狀,且使上述流量調整用閥室與上述開閉用閥室之間連接,相對於上述第1外壁及上述第2外壁呈直角延伸;第1流路,其形成於上述流路閥塊之內部,與上述流量調整用閥室連接;第2流路,其形成於上述流路閥塊之內部,且與上述開閉用閥室連接,並且經由上述藥液配管連接於上述噴嘴;針移動機構,其具有配置於上述流量調整用閥室內之針,堵住上述流量調整用閥室,並且為了調整藥液之流量而使上述針移動;以及開閉用閥體移動機構,其具有配置於上述開閉用閥室內之開閉用閥體,堵住上述開閉用閥室,並且為了進行藥液之供給及其供給之停止而使上述開閉用閥體移動;且上述藥液從上述流量調整用閥室通過上述中間流路被輸送至上述開閉用閥室。 A substrate processing apparatus comprising: a holding and rotating part that holds a substrate and rotates the held substrate; a nozzle that ejects a chemical solution to the substrate held in the holding and rotating part; and a chemical solution piping connected to the above Nozzle; and The chemical liquid control valve adjusts the flow rate of the chemical liquid sprayed from the nozzle, and causes the chemical liquid to be sprayed from the nozzle to stop the chemical liquid ejection; the chemical liquid control valve includes: a single flow path valve block, which has a first An outer wall and a second outer wall that is a surface facing the first outer wall and parallel to the first outer wall; a valve chamber for flow rate adjustment formed in such a way that the first outer wall is recessed; and a valve chamber for opening and closing is formed as the first outer wall 2 The outer wall is formed in a recessed manner and is arranged above the valve chamber for flow adjustment; the intermediate flow path is formed inside the flow path valve block and is linear, and the valve chamber for flow adjustment is connected to the opening and closing valve block. The connection between the valve chambers extends at right angles to the first outer wall and the second outer wall; the first flow path is formed inside the flow path valve block and is connected to the valve chamber for flow adjustment; the second flow path , Which is formed inside the flow path valve block, is connected to the opening and closing valve chamber, and is connected to the nozzle via the chemical liquid pipe; a needle moving mechanism having a needle arranged in the flow rate adjustment valve chamber, blocking Holding the valve chamber for adjusting the flow rate and moving the needle in order to adjust the flow rate of the chemical solution; and a valve body moving mechanism for opening and closing, which has a valve body for opening and closing arranged in the valve chamber for opening and closing, and blocking the valve for opening and closing The valve body for opening and closing is moved in order to perform the supply of the liquid medicine and the stop of the supply thereof; and the liquid medicine is transported from the valve chamber for flow rate adjustment to the valve chamber for opening and closing through the intermediate flow path. 如請求項9或10之基板處理裝置,其中 上述第1流路於水平方向呈直線狀延伸,且與上述流量調整用閥室直接連接。 Such as the substrate processing apparatus of claim 9 or 10, wherein The first flow path extends linearly in the horizontal direction and is directly connected to the valve chamber for flow rate adjustment. 如請求項9或10之基板處理裝置,其中上述流量調整用閥室配置於上述中間流路之上游側,上述開閉用閥室配置於上述中間流路之下游側,且上述開閉用閥室配置於上述流量調整用閥室之上方。 The substrate processing apparatus of claim 9 or 10, wherein the valve chamber for flow rate adjustment is arranged on the upstream side of the intermediate flow path, the valve chamber for opening and closing is arranged on the downstream side of the intermediate flow path, and the valve chamber for opening and closing is arranged Above the valve chamber for flow adjustment. 如請求項10之基板處理裝置,其中上述流量調整用閥室以上述第1外壁向垂直上方凹陷之方式形成,上述開閉用閥室以上述第2外壁向垂直下方凹陷之方式形成。 The substrate processing apparatus of claim 10, wherein the valve chamber for flow rate adjustment is formed so that the first outer wall is recessed vertically upward, and the valve chamber for opening and closing is formed so that the second outer wall is recessed vertically downward.
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Families Citing this family (2)

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Publication number Priority date Publication date Assignee Title
KR102326247B1 (en) * 2020-02-21 2021-11-12 한국기술교육대학교 산학협력단 Exhaust control apparatus
KR102355356B1 (en) 2020-03-25 2022-01-25 무진전자 주식회사 Chemical providing management system of semiconductor process

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007058339A (en) * 2005-08-22 2007-03-08 Asahi Organic Chem Ind Co Ltd Fluid control device
CN101243368A (en) * 2005-08-22 2008-08-13 旭有机材工业株式会社 Fluid control apparatus
JP2015170267A (en) * 2014-03-10 2015-09-28 旭有機材工業株式会社 Flow regulating valve and fluid control device including the same
TW201718110A (en) * 2015-11-10 2017-06-01 斯庫林集團股份有限公司 Treatment liquid supplying apparatus and controlling method of treatment liquid supplying apparatus able to suppress the pressure difference between the front and back of suck-back valve for suppressing the gas to be mixed into the treatment liquid, and capable of preventing the dropping of treatment liquid when turning off the on-off valve

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0442913Y2 (en) * 1984-11-30 1992-10-12
JP4319322B2 (en) 2000-03-22 2009-08-26 シーケーディ株式会社 Method for assembling flow regulating valve and flow regulating valve assembled by the assembling method
KR20100012792U (en) * 2010-01-22 2010-12-24 홍성정공(주) Pressure Compensated Flow Control Valve
KR101660115B1 (en) * 2010-05-18 2016-09-26 시케이디 가부시키가이샤 Chemical liquid circuit apparatus
JP6196538B2 (en) 2013-11-14 2017-09-13 旭化成株式会社 Cover material for press-through pack packaging body, manufacturing method thereof, and packaging body
JP2015114966A (en) * 2013-12-13 2015-06-22 アドバンス電気工業株式会社 Flow control valve and flow controller using the same
JP6512426B2 (en) * 2015-01-15 2019-05-15 株式会社Screenホールディングス Substrate processing equipment
JP6512894B2 (en) * 2015-03-27 2019-05-15 株式会社Screenホールディングス Treatment liquid supply apparatus and control method of treatment liquid supply apparatus
KR101821863B1 (en) * 2015-11-19 2018-01-25 서문원 Hydraulic pressure buffer solenoid valve and method for operating the solenoid valve
JP6588819B2 (en) * 2015-12-24 2019-10-09 株式会社Screenホールディングス Substrate processing apparatus and substrate processing method
JP2017207121A (en) 2016-05-18 2017-11-24 Ckd株式会社 Flow passage block, fluid control device, and method for producing flow passage block

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007058339A (en) * 2005-08-22 2007-03-08 Asahi Organic Chem Ind Co Ltd Fluid control device
CN101243368A (en) * 2005-08-22 2008-08-13 旭有机材工业株式会社 Fluid control apparatus
JP2015170267A (en) * 2014-03-10 2015-09-28 旭有機材工業株式会社 Flow regulating valve and fluid control device including the same
TW201718110A (en) * 2015-11-10 2017-06-01 斯庫林集團股份有限公司 Treatment liquid supplying apparatus and controlling method of treatment liquid supplying apparatus able to suppress the pressure difference between the front and back of suck-back valve for suppressing the gas to be mixed into the treatment liquid, and capable of preventing the dropping of treatment liquid when turning off the on-off valve

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