TW201718110A - Treatment liquid supplying apparatus and controlling method of treatment liquid supplying apparatus able to suppress the pressure difference between the front and back of suck-back valve for suppressing the gas to be mixed into the treatment liquid, and capable of preventing the dropping of treatment liquid when turning off the on-off valve - Google Patents

Abstract

The present invention is characterized din that, before turning off an on-off valve 17, not only the needle 62 of a suck-back valve 19 is used to shrink and narrow down the flowing path 70 of treatment liquid, but also the diaphragm 46 of the on-off valve 17 is used for shrinking and narrowing down. Because the diaphragm 46 of the on-off valve 17 is applied for shrinking and narrowing down, the pressure of treatment liquid transported to the suck-back valve 19 is reduced. Therefore, it can suppress the pressure difference between the front and back of the suck-back valve 19. As a result, it can suppress the gas to be mixed into the treatment liquid. In addition, when increasing the moving speed of diaphragm 46 and turning off the on-off valve 17, since the moving quantity of diaphragm 46 decreases, the amount of treatment liquid being pressed out accompanying the moving of diaphragm 46 decreases. Therefore, it can further prevent the dropping of treatment liquid when turning off the on-off valve 17.

Description

Treatment liquid supply device and control method of treatment liquid supply device

The present invention relates to a method of controlling a processing liquid supply device and a processing liquid supply device, and is a substrate processing device for processing a semiconductor substrate, a glass substrate for liquid crystal display, a glass substrate for a photomask, and a substrate for a disk. The processing liquid is supplied to the substrate.

As shown in FIG. 10, the conventional processing liquid supply apparatus includes a discharge nozzle 111 for discharging a developing liquid as a processing liquid, a developing liquid supply source 113, and a piping 115 for supplying a pair of developing liquids 113. The discharge nozzle 111 conveys the developing liquid. A pump P and an opening and closing valve 117 are provided in the pipe 115 so as to be interposed.

The on-off valve 117 is for discharging the developing liquid and stopping the ejection of the developing liquid. The on-off valve 117 is driven by the gas supply unit 147 to allow gas to flow in and out. Further, the opening and closing valve 117 is configured to be capable of adjusting the flow rate. That is, the operator rotates the flow regulating disk 118 of the opening and closing valve 117. This makes it possible to circulate a developing liquid of an arbitrary flow rate in the open state of the opening and closing valve 117.

In the case of supplying a photoresist liquid as a processing liquid, for example, a sucking valve is provided in a pipe 115 interposed between the discharge nozzle 111 and the opening and closing valve 117. (Refer to Patent Document 1). Thereby, the "falling liquid" of the photoresist is dropped from the discharge nozzle.

[Previous Technical Literature]

[Patent Literature]

Patent Document 1: Japanese Patent No. 5442232.

Not only a photoresist liquid, but also in the case of supplying a developing liquid, it is desirable to prevent the developer liquid from falling onto the substrate or the like. Further, when the flow rate of the developing liquid flowing through the flow path is large, when the flow path is quickly closed by the opening and closing valve, the developing liquid is slender due to the water hammer of the impact caused by the developing liquid. The flowing and imaging liquid will tickle and drop. Therefore, it is desirable to prevent the liquid of the developing liquid from falling when the opening and closing valve is closed. Further, as described above, since the flow rate of the developing liquid is adjusted by the user to sensibly rotate the flow rate adjusting disk 118, it is difficult to adjust the flow rate. Therefore, it is desirable to easily adjust the flow rate of the treatment liquid.

The present invention has been made in view of the above circumstances, and an object of the invention is to provide a treatment liquid supply device and a control method for a treatment liquid supply device that prevent liquid falling when the on-off valve is closed. Further, a treatment liquid supply device and a control method for the treatment liquid supply device capable of preventing liquid flow of the treatment liquid and adjusting the flow rate of the treatment liquid with a reasonable configuration are provided.

The inventors have made the following findings in order to solve the above problems. In the configuration in which the flow rate adjusting valve is provided downstream of the opening and closing valve, when the processing liquid flow path is closed by the opening and closing valve, the flow rate adjusting valve narrows the processing liquid flow path, thereby reducing the flow rate of the processing liquid. Thereby, it is possible to prevent the liquid falling due to the impact of the treatment liquid when the opening and closing valve is closed. However, there is still the possibility of falling liquid. In other words, when the processing liquid flow path is not narrowed by the first valve body of the opening and closing valve, the flow rate of the processing liquid is narrowed by the second valve body provided in the flow rate adjusting valve downstream of the opening and closing valve. When reducing, the pressure difference will increase before and after the flow adjustment valve. In this way, there is a possibility that gas may be mixed into the treatment liquid passing through the flow rate adjustment valve. When the gas is mixed, the treatment liquid vibrates and the liquid falls easily when the opening and closing valve is quickly closed. Further, when the moving distance of the first valve body when the opening and closing valve is closed is long, the processing liquid corresponding to the length of the valve body is pressed out, and liquid falling is likely to occur.

The present invention according to such an aspect is constructed as follows.

In other words, the processing liquid supply device of the present invention includes a processing liquid flow path for circulating the processing liquid, and an opening and closing valve for opening and closing the processing liquid flow path, and a first valve body for performing opening and closing and Used to make the aforementioned a first driving unit for moving the valve body; and a flow rate adjusting valve disposed downstream of the opening and closing valve and having a second valve body for adjusting a narrowing of the processing liquid flow path and for making the second a second driving unit that moves the valve body; and a control unit that starts moving the second valve body so that the second valve body narrows the processing liquid flow path when the processing liquid flow path is closed by the opening and closing valve And starting to move the first valve body so that the first valve body narrows the processing liquid flow path, and after starting to move the first valve body, when the second valve body reaches a predetermined position, the first step is raised The moving speed of the valve body is set to the closed state.

According to the processing liquid supply device of the present invention, before the opening and closing valve is set to the closed state, not only the second valve body of the flow rate adjusting valve narrows the processing liquid flow path, but also the first valve body of the opening and closing valve is narrowed. Before the opening and closing valve is closed, the flow rate of the treatment liquid is reduced by narrowing the first valve body of the opening and closing valve, and narrowing the flow rate of the treatment liquid by the second valve body of the flow rate adjustment valve. The pressure difference becomes larger before the liquid passes through the flow adjustment valve. In this way, there is a possibility that gas is mixed into the treatment liquid passing through the flow rate adjustment valve. When the gas is mixed, when the opening and closing valve is set to the closed state, the treatment liquid vibrates and the liquid falling of the treatment liquid is likely to occur. However, the first valve body of the opening and closing valve is also narrowed so that the pressure of the treatment liquid supplied to the flow rate adjustment valve can be suppressed, and the pressure difference can be suppressed before and after the flow rate adjustment valve. As a result, it is possible to suppress the gas from being mixed into the treatment liquid. Further, when the moving speed of the first valve body is raised and the opening and closing valve is set to the closed state, since the amount of movement of the first valve body is small, the amount of the processing liquid that is pressed out as the first valve body moves is reduced. . Therefore, it is possible to further prevent the opening and closing The falling of the treatment liquid at the time of the valve.

Further, in the processing liquid supply device, it is preferable that the control unit allows the processing liquid that can pass through the opening and closing valve to be moved after the movement of the second valve body is started until the second valve body reaches a predetermined position. The flow rate is adjusted to be equal to or higher than the set flow rate of the treatment liquid passing through the flow rate adjustment valve. By adjusting the allowable flow rate of the on-off valve to be equal to or higher than the set flow rate of the flow rate adjustment valve, the treatment liquid flow path can be narrowed by the first valve body without hindering the flow rate adjustment of the flow rate adjustment valve.

Further, in the processing liquid supply device, it is preferable that the control unit starts moving the second valve body to narrow the processing liquid flow path by the second valve body, and then starts moving the first valve body to cause movement The flow path of the treatment liquid is narrowed by the first valve body. Thereby, the allowable flow rate of the on-off valve can be easily adjusted to be equal to or higher than the set flow rate of the flow rate adjustment valve.

Further, in the processing liquid supply device described above, it is preferable that the first driving unit is a motor. Thereby, the position change of the first valve body can be easily performed. Further, it is preferable that the second drive unit is a motor. Thereby, the position of the second valve body can be easily changed, and the flow rate of the treatment liquid can be easily adjusted.

Further, in the processing liquid supply device, it is preferable that the flow rate adjusting valve further includes a volume changing unit that is interlocked with the second valve body and that further flows downstream of the opening and closing valve volume of Variety. Thereby, the flow regulating valve can have a reverse suction function.

For example, when the treatment liquid flow path is closed by the opening and closing valve, the second drive unit can move the volume change unit that is interlocked with the second valve body and increase the volume of the downstream side treatment liquid flow path, that is, can be sucked back to prevent it. The falling liquid of the treatment liquid. Further, when the treatment liquid flow path is opened by the opening and closing valve, the valve body can be moved by the second drive unit to adjust the flow rate of the treatment liquid, that is, the second drive unit can be easily adjusted by the operator's feeling. The flow rate of the treatment liquid passed. In addition, since both the liquid drop prevention of the treatment liquid and the flow rate adjustment of the treatment liquid can be performed by the same second drive unit, the unnecessary configuration can be omitted and the space can be made smaller than the configuration in which the drive unit or the like is separately provided. structure. Therefore, the processing liquid can be supplied to each of the substrates at different flow rates, and the flow rate of the processing liquid can be changed in the middle in the same substrate.

Further, in an example of the processing liquid supply device, the control unit reciprocates the volume changing unit that is interlocked with the second valve body by the second driving unit when the processing liquid flow path is closed by the opening and closing valve . For example, the tip end portion of the discharge nozzle for ejecting the developing liquid as the treatment liquid is immersed in pure water, and the pure water is sucked, and the sucked pure water is directly held for a predetermined period of time, and the sucked pure water is pushed out, whereby the washing and discharging can be performed. The front end of the nozzle.

Further, in the processing liquid supply device described above, it is preferable that the processing liquid flow path is constituted by a single member. Thereby, the opening and closing valve and the flow regulating valve having the reverse suction function can be integrally formed, and the configuration can be simplified.

Further, in an example of the processing liquid supply device, the discharge nozzle is further provided downstream of the flow rate adjustment valve, and is connected to the processing liquid flow path via a pipe to discharge the processing liquid. Thereby, it is possible to prevent the treatment liquid from falling from the discharge nozzle due to the impact when the opening and closing valve is closed.

The control method of the processing liquid supply device according to the present invention is for controlling a processing liquid supply device including: a processing liquid flow path for circulating the processing liquid; and an opening and closing valve for opening and closing the processing liquid flow And a first valve body for performing opening and closing and a first driving unit for moving the first valve body; and a flow rate adjusting valve disposed downstream of the opening and closing valve and having a function to adjust the a second valve body for narrowing the processing liquid flow path and a second driving portion for moving the second valve body; the control method of the processing liquid supply device is configured to close the processing liquid flow by the opening and closing valve In the road, the second valve body is moved to narrow the processing liquid flow path by the second valve body, and the first valve body is moved to narrow the processing liquid flow path by the first valve body. And a step of raising the moving speed of the first valve body and setting the opening and closing valve to a closed state when the second valve body reaches a predetermined position after starting to move the first valve body.

According to the control method of the processing liquid supply device of the present invention, before the opening and closing valve is set to the closed state, not only the second valve body of the flow rate adjusting valve is narrowed. The fluid flow path is also narrowed by the first valve body of the opening and closing valve. Before the opening and closing valve is closed, the flow rate of the treatment liquid is reduced by narrowing the first valve body of the opening and closing valve, and narrowing the flow rate of the treatment liquid by the second valve body of the flow rate adjustment valve. The pressure difference becomes larger before the liquid passes through the flow adjustment valve. In this way, there is a possibility that gas is mixed into the treatment liquid passing through the flow rate adjustment valve. When the gas is mixed, when the opening and closing valve is set to the closed state, the treatment liquid vibrates and the liquid falling of the treatment liquid is likely to occur. However, the first valve body of the opening and closing valve is also narrowed so that the pressure of the treatment liquid supplied to the flow rate adjustment valve can be suppressed, and the pressure difference can be suppressed before and after the second valve body. As a result, it is possible to suppress the gas from being mixed into the treatment liquid. Further, when the moving speed of the first valve body is raised and the opening and closing valve is set to the closed state, since the amount of movement of the first valve body is small, the amount of the processing liquid that is pressed out as the first valve body moves is reduced. . Therefore, it is possible to further prevent the liquid of the treatment liquid from falling when the opening and closing valve is closed.

According to the control liquid supply device and the control method of the processing liquid supply device of the present invention, before the opening and closing valve is closed, not only the second valve body of the flow rate adjustment valve narrows the treatment liquid flow path, but also the opening and closing valve A valve body is narrowed. The first valve body of the opening and closing valve is also narrowed so that the pressure of the treatment liquid supplied to the flow rate adjustment valve can be suppressed, and the pressure difference can be suppressed before and after the flow rate adjustment valve. As a result, it is possible to suppress the gas from being mixed into the treatment liquid. Further, when the moving speed of the first valve body is raised and the opening and closing valve is set to the closed state, the amount of movement of the first valve body is reduced, so that the amount of the processing liquid that is pushed out by the movement of the first valve body is reduced. Therefore, it is possible to further prevent the falling of the treatment liquid when the opening and closing valve is closed. liquid.

1‧‧‧Substrate processing unit

2‧‧‧ Keeping the rotating part

3‧‧‧Processing liquid supply department

4‧‧‧Rotary fixture

5‧‧‧Rotary drive department

6‧‧‧ Cover

11, 111‧‧‧ spray nozzle

13‧‧‧Processing fluid supply source

15‧‧‧Processing liquid piping

17, 117‧‧‧Open valve

19‧‧‧Injection valve

21‧‧‧Nozzle moving mechanism

23‧‧‧Standby area

31‧‧‧Control Department

33‧‧‧Operation Department

41‧‧‧Opening and closing room

42‧‧‧Piston

43‧‧‧ upstream side flow path

44‧‧‧First seat

45, 82a‧‧‧ next door

46, 66‧‧‧ diaphragm

47‧‧‧ Spring

48, 147‧‧‧ Gas Supply Department

48a‧‧‧ gas piping

49‧‧‧Intake vents

50‧‧‧Opening and closing indoor flow path

51‧‧‧ Link flow path

61‧‧‧ valve room

61a‧‧‧ Sidewall

62, 82‧‧ needles

63‧‧‧Valve indoor flow path

64‧‧‧Second seat

64a‧‧‧ openings

67‧‧‧ downstream side flow path

68, 84‧‧‧ motor

70‧‧‧Processing fluid flow path

72‧‧‧ downstream joint

81‧‧‧ slope

82b‧‧‧Airtight retaining members

85‧‧‧ Container

86‧‧‧ imaging liquid layer

87‧‧‧ gas layer

88‧‧‧ pure water

113‧‧‧Photographic fluid supply

115‧‧‧Pipe

118‧‧‧Flow adjustment disk

AX‧‧‧Rotary axis

C‧‧‧ Center

E‧‧‧End

F‧‧‧Flow

L‧‧‧ dotted line

NA, NB, NC‧‧‧ position

P‧‧‧ pump

SB0‧‧‧Reverse suction reference position

SB1‧‧‧Reverse suction execution position

SB2, SB3‧‧‧ position

SD‧‧‧Mobile

T0 to t8, t11 to t19, t30 to t36‧‧‧

W‧‧‧Substrate

Fig. 1 is a block diagram showing a schematic configuration of a substrate processing apparatus of the first embodiment.

Fig. 2 is a longitudinal sectional view showing the opening and closing valve of the first embodiment and a suction valve having a flow rate adjusting function.

Fig. 3 is a timing chart for explaining the operation of the on-off valve and the reverse suction valve having the flow rate adjustment function in the first embodiment.

4(a) is a view for explaining the operation of the processing liquid supply unit, and is a view for showing the position of the discharge nozzle with respect to the substrate; (b) is for displaying the positional relationship of (a). A diagram showing an example of the discharge amount (flow rate); (c) is a diagram showing another example of the discharge amount (flow rate) in the positional relationship of (a).

Fig. 5 is a timing chart for explaining the operation of the on-off valve and the reverse suction valve having the flow rate adjustment function in the second embodiment.

Fig. 6 is a longitudinal sectional view for explaining the opening and closing valve and the sucking valve having the flow rate adjusting function in the third embodiment.

Fig. 7 is a timing chart for explaining the operation of the opening and closing valve and the sucking valve having the flow rate adjusting function in the third embodiment.

Fig. 8 is a longitudinal sectional view showing an opening and closing valve and a reverse suction valve having a flow rate adjusting function in a modification.

FIG. 9 is a view for explaining an operation of the processing liquid supply unit of the modification.

FIG. 10 is a block diagram showing a schematic configuration of a conventional processing liquid supply unit.

[Example 1]

Embodiment 1 of the present invention will be described below with reference to the drawings. Fig. 1 is a block diagram showing a schematic configuration of a substrate processing apparatus. Fig. 2 is a longitudinal sectional view showing an on-off valve and a reverse suction valve having a flow adjustment function.

<Configuration of Substrate Processing Apparatus 1>

Refer to Figure 1. The substrate processing apparatus 1 includes a holding rotating unit 2 that holds the substrate W in a slightly horizontal posture and rotates the substrate W, and a processing liquid supply unit 3 that supplies the processing liquid. The treatment liquid can be washed with a coating liquid such as a photoresist, a developing solution, a solvent, or pure water. The treatment liquid supply unit 3 corresponds to the treatment liquid supply device of the present invention.

The holding rotary unit 2 includes a spin chuck 4 that holds the back surface of the substrate W by vacuum suction, and a rotation driving unit 5 that is constituted by a motor or the like for winding the rotation jig 4 The rotation axis AX in the vertical direction is rotated. A cup 6 that can be moved up and down is provided around the rotating portion 2 so as to surround the side surface of the substrate W.

The processing liquid supply unit 3 includes a discharge nozzle 11 that ejects a processing liquid to the substrate W, a processing liquid supply source 13 that is configured by a tank for storing the processing liquid, and a processing liquid pipe 15, It is used to transport the treatment liquid from the treatment liquid supply source 13 to the discharge nozzle 11. From the treatment liquid supply source 13 The treatment liquid pipe 15 is sequentially provided with a pump P, an opening and closing valve 17, and a reverse suction valve 19 having a flow rate adjustment function. Further, another configuration may be interposed between the processing liquid pipe 15. For example, a filter (not shown) may be interposed between the pump P and the opening and closing valve 17. Further, the treatment liquid pipe 15 corresponds to the pipe of the present invention.

The discharge nozzle 11 is moved between the standby area 23 on the outer side of the substrate W and the discharge position above the substrate W by the nozzle moving mechanism 21. The nozzle moving mechanism 21 is constituted by a support arm, a motor, or the like. Further, the discharge nozzle 11 is provided downstream of the dump valve 19, and is connected to the processing liquid flow path 70 to be described later with the processing liquid pipe 15 interposed therebetween.

The pump P is for conveying the treatment liquid to the discharge nozzle 11. The on-off valve 17 supplies the supply of the treatment liquid and the supply of the treatment liquid. The reverse suction valve 19 is combined with the operation of the opening and closing valve 17, whereby the treatment liquid is sucked (sucked), and the flow rate of the treatment liquid is adjusted. The opening and closing valve 17 and the reverse suction valve 19 are described below in detail. Further, the reverse suction valve 19 having a flow adjustment function may also be referred to as a flow adjustment valve having a reverse suction function.

The processing liquid supply unit 3 includes a control unit 31 including a central processing unit (CPU (Central Processing Unit)), and an operation unit 33 for operating the substrate processing apparatus 1 . The control unit 31 controls each configuration of the substrate processing apparatus 1. The operation unit 33 is provided with a display unit such as a liquid crystal screen or a ROM (Read Only Memory; Read memory), RAM (Random Access Memory) and hard disk and other memory units; and keyboard, mouse and various buttons and other input units. The conditions for controlling the on-off valve 17 and the reverse suction valve 19 and other substrate processing conditions are stored in the memory portion.

<Opening and closing valve 17 and a reverse suction valve 19 having a flow rate adjustment function>

Next, the detailed configuration of the opening and closing valve 17 and the reverse suction valve 19 will be described. Refer to Figure 2. The opening and closing valve 17 opens and closes the processing liquid flow path 70, which is an upstream side flow path 43, an opening and closing indoor flow path 50, a connection flow path 51, a valve indoor flow path 63, and a downstream side flow path 67 which will be described later. Composition. The reverse suction valve 19 is combined with the operation of the opening and closing valve 17, and sucks up the treatment liquid to adjust the flow rate of the treatment liquid.

[Configuration of On-Off Valve 17]

The opening and closing valve 17 is provided in the middle of the path of the processing liquid pipe 15, and is configured to connect the upstream side flow path 43, the opening and closing indoor flow path 50 of the opening and closing chamber 41, and the connecting flow path that communicates with the valve indoor flow path 63 of the dump valve 19. 51 is connected in series. The treatment liquid pipe 15 is attached to the opening and closing chamber 41 by the upstream side joint portion 71, and is connected to the upstream side flow path 43 of the opening and closing valve 17 in a flow path. The opening and closing valve 17 switches the flow of the treatment liquid into the flow state and the blocked state in the opening and closing chamber 41 by the opening and closing operation as will be described later.

The end of the upstream side flow path 43 is connected to the bottom of the opening and closing indoor flow path 50 of the opening and closing chamber 41. Further, the other end of the treatment liquid pipe 15 is coupled Connect to pump P. Therefore, the processing liquid sent from the pump P flows into the opening and closing indoor flow path 50 of the opening and closing chamber 41 through the upstream side flow path 43.

The opening and closing chamber 41 is a hollow box-shaped member, and a piston 42, a spring 47, a partition wall 45, and a diaphragm 46 as a valve body are provided inside the opening and closing chamber 41. The piston 42 is configured to be slidable in the longitudinal direction of the drawing in the interior of the opening and closing chamber 41. The spring 47 is disposed between the upper surface of the piston 42 and the upper inner wall surface of the opening and closing chamber 41. Further, the diaphragm 46 is for performing opening and closing, and corresponds to the first valve body of the present invention.

The partition wall 45 is a flat member that vertically partitions the inside of the opening and closing chamber 41, and a piston 42 is penetrated through the center portion thereof. Although the piston 42 is slidable relative to the partition wall 45, the contact portion between the piston 42 and the partition wall 45 is completely sealed, and when air is sent from the gas pipe 48a to the opening and closing chamber 41, the air does not leak to the partition wall. 45 is also on the lower side (the side of the diaphragm 46).

The peripheral portion of the diaphragm 46 is fixed to the inner wall surface of the opening and closing chamber 41. The central portion of the diaphragm 46 is fixed to the lower end portion of the piston 42.

A first valve seat 44 is provided at the center of the bottom of the opening and closing indoor flow path 50 of the opening and closing chamber 41. The connection flow path 51 communicates with the valve chamber flow path 63 that connects the first valve seat 44 of the opening and closing chamber 41 and the valve chamber 61 of the reverse suction valve 19 to be described later.

The side wall of the opening and closing chamber 41 is provided to be used to supply the gas supply portion 48. The gas is supplied to the intake and exhaust port 49 of the intake and exhaust. The gas supply unit 48 is controlled by the control unit 31. The gas supply unit 48 is composed of a gas supply source, a gas on-off valve, a speed controller, and the like (all not shown). The gas supply unit 48 can supply air to the intake air exhaust port 49 through the gas pipe 48a under the control of the control unit 31, and exhaust the gas from the intake air exhaust port 49.

In the configuration of the above-described opening and closing valve 17, when the gas is supplied from the gas supply unit 48 to the inside of the opening and closing chamber 41 via the intake and exhaust port 49, the piston 42 is pushed up against the elastic force of the spring 47. State (state shown by a solid line in Fig. 2). When the piston 42 is pushed up, the diaphragm 46 fixed to the piston 42 is deformed and is separated from the first valve seat 44.

As shown by the solid line in FIG. 2, when the diaphragm 46 belonging to the valve body is separated from the first valve seat 44, the upstream side flow path 43, the opening and closing indoor flow path 50, and the connection flow path 51 are in communication state, respectively, from the pump. The processing liquid sent from P reaches the discharge nozzle 11 from the upstream side flow path 43 via the opening and closing indoor flow path 50, the connection flow path 51, the valve indoor flow path 63 and the downstream side flow path 67, and is ejected from the discharge nozzle 11 toward The substrate W ejects the treatment liquid. In other words, the state shown by the solid line in FIG. 2 is a state in which the processing liquid flow path 70 is opened and the processing liquid flows. In other words, the state in which the processing liquid flow path 70 is opened by the opening and closing valve 17 (open state).

On the other hand, when the gas is exhausted from the gas supply unit 48 through the intake and exhaust port 49 to the inside of the opening and closing chamber 41, the pressure in the opening and closing chamber 41 becomes low, and there is no resistance to the spring 47 and the piston 42 is pushed up. The pressure. because Thus, as indicated by the broken line in Fig. 2, the piston 42 is pushed down by the restoring force of the spring 47. When the piston 42 is pushed down, as shown by the broken line in FIG. 2, the diaphragm 46 fixed to the piston 42 is deformed and adhered to the first valve seat 44.

As shown in FIG. 2, when the diaphragm 46 belonging to the valve body is adhered to the first valve seat 44, the opening and closing chamber flow path 50 and the connection flow path 51 are blocked, and the processing liquid sent from the pump P cannot be directed toward The side of the connecting flow path 51 flows, and the flow of the processing liquid stops. In other words, the processing liquid flow path 70 is closed by the opening and closing valve 17 (closed state).

In this manner, the gas supply unit 48, the piston 42, the spring 47, and the like function as an actuating means for actuating the diaphragm 46 as a valve body.

[Configuration of the reverse suction valve 19 having the flow adjustment function]

As shown in FIG. 2, the reverse suction valve 19 is disposed downstream of the opening and closing valve 17. The reverse suction valve 19 includes a valve chamber 61 and a hollow box-shaped member, and a needle 62 that is provided inside the valve chamber 61 so as to be movable in the vertical direction of FIG. 2 and a downstream side flow path 67.

A valve indoor flow path 63 for circulating the processing liquid is provided inside the valve chamber 61. Further, a second valve seat 64 for receiving the needle 62 is provided at the center of the bottom portion of the valve chamber flow path 63 of the valve chamber 61, and an opening portion 64a for circulating the processing liquid, for example, is provided in the second valve seat 64. The opening 64a is connected to the downstream side flow path 67 by a flow path. The treatment liquid pipe 15 is connected by the downstream side joint portion 72 It is attached to the valve chamber 61, and is connected to the flow path of the downstream side flow path 67 of the reverse suction valve 19. When the second valve seat 64 receives the needle 62, the opening portion 64a is caught by the needle 62. Thereby, the flow path between the valve inner flow path 63 and the downstream side flow path is closed.

Further, the needle 62 is configured to adjust the flow path width (opening state of the opening portion 64a) formed between the valve chamber flow path 63 and the downstream side flow path 67, in other words, to adjust the narrowing of the treatment liquid flow path 70. . That is, the needle 62 can adjust the flow rate of the treatment liquid flowing through the gap by adjusting the gap with the opening 64a of the second valve seat 64.

Further, the reverse suction valve 19 is provided with a diaphragm 66 attached to the distal end portion of the needle 62, and a motor (motor) 68 for driving the needle 62 in the vertical direction of FIG. The peripheral portion of the diaphragm 66 is fixed to the side wall 61a inside the valve chamber 61; the diaphragm 66 separates the inside of the valve chamber 61 so as to cross the moving direction of the needle 62.

Further, as shown in FIG. 2, the diaphragm 66 is interlocked with the needle 62. Thereby, the diaphragm 66 can change the flow path volume from the connection flow path 51 downstream of the opening and closing valve 17 to the downstream side flow path 67 from the valve interior flow path 63. In other words, the movement of the needle 62 simultaneously changes the gap between the second valve seat 64 and the flow path volume from the connection flow path 51 through the valve chamber flow path 63 to the downstream side flow path 67.

The needle 62 corresponds to the second valve body of the present invention, and the diaphragm 66 is equivalent to The volume change portion of the present invention. The motor 68 corresponds to the second drive unit.

The motor 68 is controlled by the control unit 31 by, for example, a pulse wave number. The rotation of the motor 68 is changed by a mechanism (not shown), and the needle 62 is given a driving force in the vertical direction. For example, when the opening and closing valve 17 is in the closed state, the control unit 31 moves the diaphragm 66 that is interlocked with the needle 62 by the motor 68, and increases the passage from the connecting passage 51 through the valve chamber flow path 63 to the downstream side flow path 67. The flow path volume is sucked up. Further, the control unit 31 moves the needle 62 by the motor 68 when the on-off valve 17 is in the open state, and adjusts the flow rate of the treatment liquid. Further, it is preferable that the motor 68 is provided with a sensor (not shown) such as a rotary encoder to obtain a correct amount of movement of the needle 62 in the vertical direction.

Further, the on-off valve 17 and the reverse suction valve 19 are disposed adjacent to each other. Therefore, the on-off valve 17 and the reverse suction valve 19 are integrally configured to have a simple configuration. Further, the upstream side flow path 43 of the opening and closing valve 17, the downstream side flow path 67 of the reverse suction valve 19, and the connection flow path 51 for connecting the opening and closing indoor flow path 50 and the valve indoor flow path 63 may be constituted by a single member. In this case, for example, a part of the opening and closing chamber 41 and a part of the valve chamber 61 may be constituted by a single member like the opening and closing chamber 41 and the valve chamber 61 on the lower side of the broken line L in FIG. 2 .

Further, the upstream side flow path 43, the opening and closing indoor flow path 50, the connection flow path 51, the valve indoor flow path 63, and the downstream side flow path 67 are formed for processing. The treatment liquid flow path 70 through which the liquid flows. Further, the connection flow path 51, the valve indoor flow path 63, and the downstream side flow path 67 correspond to the downstream side treatment liquid flow path of the present invention.

<Operation of Substrate Processing Apparatus 1>

Next, the operation of the processing liquid supply unit 3 in the operation of the substrate processing apparatus 1 will be described. Fig. 3 is a timing chart for explaining the operation of the opening and closing valve 17 and the reverse suction valve 19 having the flow rate adjusting function. The control unit 31 controls each configuration of the substrate processing apparatus 1 in accordance with a predetermined discharge condition (recipe).

In the present invention, the needle 62 is moved by the motor 68 of the reverse suction valve 19 in response to opening and closing of the opening and closing valve 17, thereby performing reverse suction (falling prevention of liquid) and flow rate adjustment of the treatment liquid. At this time, when the reverse suction is performed, the flow adjustment is affected; when the flow adjustment is performed, the reverse suction is affected. The present invention has been made in consideration of this point.

Further, in the reverse suction valve 19, the needle 62 is moved up and down by the motor 68, but the action of the raising needle 62 and the second valve seat 64 is separated, and the lowering needle 62 and the second valve seat 64 are close to each other. In addition, in FIG. 3 and FIG. 5 and FIG. 7 which will be described later, the position of the needle 62 is "0", and the position where the needle 62 and the second valve seat 64 are closest to each other is displayed, and there is no flow of the processing liquid.

First, in the substrate processing apparatus 1 of FIG. 1, the substrate W is conveyed to the holding rotating portion 2 by a transport mechanism (not shown). Keep the rotating part 2 secured The back surface of the substrate W is held, and the held substrate W is rotated. Further, the nozzle moving mechanism 21 moves the discharge nozzle 11 from the standby area 23 on the outer side of the substrate W to the discharge position above the substrate W. The control unit 31 controls the opening and closing valve 17 and the reverse suction valve 19, and discharges the processing liquid from the discharge nozzle 11. Further, when the pump P is driven to open the on-off valve 17, the processing liquid stored in the processing liquid supply source 13 is sent out and ejected from the ejection nozzle 11.

At time t0 of FIG. 3, the opening and closing valve 17 is in an open state, and the processing liquid is discharged from the discharge nozzle 11. Further, when the opening and closing valve 17 is opened, the needle 62 is moved to the position NA by the motor 68 in the reverse suction valve 19, and is adjusted to the flow rate of the treatment liquid corresponding to the position NA.

When the control unit 31 stops the discharge of the processing liquid from the discharge nozzle 11, the flow rate is reduced and the operation of preventing the liquid drop is more reliably performed before the opening and closing valve 17 is placed in the closed state. That is, at time t1, the control unit 31 moves the needle 62 to the sucking reference position SB0 by the motor 68, thereby reducing the flow rate of the processing liquid. Then, at time t2, the control unit 31 closes between the opening and closing indoor flow path 50 of the processing liquid flow path 70 and the connection flow path 51 by the opening and closing valve 17 to be in a closed state.

Further, at time t3, the control unit 31 moves the needle 62 to the reverse suction execution position SB1 by the motor 68 and performs the reverse suction. In other words, the control unit 31 moves the diaphragm 66 that is interlocked with the needle 62 by the motor 68, and increases the flow path from the connection flow path 51 to the downstream side flow path 67 through the valve chamber flow path. volume. Thereby, the treatment liquid inside the tip end of the discharge nozzle 11 is sucked (sucked). In addition, time t2 and time t3 may be the same timing. Time t2 can also be slightly slower than time t3. Further, the suck-up system is set by the movement amount SD of the needle 62. The amount of movement SD can be constant or varied.

The processing liquid is discharged to the substrate W, and the replacement of the substrate W on the rotating portion 2 is performed. That is, the holding rotation unit 2 of FIG. 1 stops the rotation of the substrate W and releases the holding of the substrate W. The nozzle moving mechanism 21 moves the discharge nozzle 11 to the standby area 23 outside the substrate W. Next, the substrate W is replaced by a transport mechanism (not shown). As described above, the holding rotating portion 2 holds the back surface of the substrate W and rotates the held substrate W. Further, the nozzle moving mechanism 21 moves the discharge nozzle 11 from the standby area 23 on the outer side of the substrate W to the discharge position above the substrate W.

The treatment liquid is again ejected from the discharge nozzle 11. In the configuration of the reverse suction valve 19 of the present invention, the needle 62 is moved to perform a reverse suction operation. When the needle 62 moves, the flow adjustment needs to be performed again. The control unit 31 is a needle 62 in a state in which the needle 62 is moved from the connection flow path 51 to the downstream flow path 67 from the connection flow path 51 to the downstream flow path 67 by the motor 68 at time t4. The reverse suction execution position SB1 is moved to a position at which a predetermined flow rate is reached, and the opening and closing valve 17 is opened at time t5.

Two control examples are described for the operation at time t4. The two control examples refer to the case of rising to the position NB and the case of dropping to the position NC.

First, a case where the needle 62 is raised from the suck-up execution position SB1 to the position NB will be described. The control unit 31 raises the needle 62 from the reverse suction execution position SB1 to the position NB by the motor 68 at time t4. When the needle 62 is raised, the diaphragm 66 that is interlocked with the needle 62 also rises. Therefore, it is further sucked up. In this state, at time t5, the control unit 31 opens the processing liquid flow path 70 by the opening and closing valve 17, and discharges the processing liquid from the discharge nozzle 11. When the processing liquid flow path 70 is opened by the opening and closing valve 17, since the suction suction execution position SB1 rises, the processing liquid is not pushed out from the discharge nozzle 11, but is further sucked up. Therefore, there is no need to worry about falling liquid.

Next, a case where the needle 62 is lowered from the reverse suction execution position SB1 to the position NC will be described. The control unit 31 lowers the needle 62 from the suck-up execution position SB1 to the position NC by the motor 68 at time t4. Since the needle 62 is lowered, the treatment liquid is pressed. Therefore, there is a possibility that the processing liquid is ejected from the ejection nozzle 11 due to the amount of drop of the needle 62.

Therefore, when the needle 62 is lowered to the position NC at which the flow rate F is set in advance, the control unit 31 changes the moving speed of the needle 62 by the motor 68 so as to be the predetermined flow rate F. In other words, the lowering speed of the needle 62 is adjusted so as to be equal to or close to the flow rate F of the flow rate F at the position NC of the needle 62 (see the inclination 81 of FIG. 3). Then, at time t5, the control unit 31 opens the processing liquid flow path 70 by the opening and closing valve 17, and discharges the processing liquid from the discharge nozzle 11. Since the falling speed of the needle 62 is adjusted and the opening and closing valve 17 is opened Since it is in an open state, it is possible to continuously and naturally flow the processing liquid of the predetermined flow rate F.

After ejecting the treatment liquid from the discharge nozzle 11 for a predetermined period of time, as described above, the needle 62 of the reverse suction valve 19 is lowered to the suction suction reference position SB0 at time t6 and adjusted so as to reduce the flow rate, and then it is made at time t7. The opening and closing valve 17 is in a closed state. At time t8, the needle 62 of the reverse suction valve 19 is raised to the reverse suction execution position SB1, and the diaphragm 66 interlocked with the needle 62 is raised to thereby suck back.

Next, a case where the discharge flow rate is changed in the same substrate W will be described with reference to FIGS. 4(a) to 4(c). According to the present invention, as in the case of the position NA and the position NB of FIG. 3, in the case where different substrates W or a plurality of substrates are set, each group is easily adjusted in flow rate. Furthermore, even in the same substrate W, the flow rate adjustment is easy.

Fig. 4(a) is a view showing the position of the discharge nozzle 11 with respect to the substrate W. In addition, FIG. 4(b) is a view showing an example of the discharge amount (flow rate) in the positional relationship of FIG. 4(a). There is a case where the discharge liquid is ejected from the discharge nozzle 11 and the discharge nozzle 11 is moved from the center C of the substrate W to the end portion E of the substrate W by the nozzle moving mechanism 21. In this case, as shown in FIG. 4(b), the discharge amount may be increased from the end portion E to, for example, a width of 50 mm. In addition, it can be reduced as needed. Further, the treatment liquid may be ejected from the discharge nozzle 11 by the inclination of FIG. 4(c).

According to the present embodiment, the needle 62 is provided downstream of the opening and closing valve 17 for opening and closing the processing liquid flow path 70, and the flow path width (opening) formed between the valve chamber flow path 63 and the downstream side flow path 67 is adjusted. And the diaphragm 66 is interlocked with the needle 62 so as to change the flow path volume from the connection flow path 51 downstream of the opening and closing valve 17 to the downstream side flow path 67 through the valve interior flow path 63. . The needle 62 is driven by a motor 68. When the control unit 31 closes the processing liquid flow path 70 by the opening and closing valve 17, the control unit 31 moves the diaphragm 66 that is interlocked with the needle 62 by the motor 68, and increases the flow from the connection flow path 51 to the downstream side flow through the valve chamber flow path 63. The flow path volume up to the road 67. Therefore, it is possible to prevent the falling of the treatment liquid by sucking back. Further, when the control unit 31 opens the processing liquid flow path 70 by the opening and closing valve 17, the motor 62 moves the needle 62 to adjust the flow rate of the processing liquid. Therefore, the flow rate adjustment of the treatment liquid adjusted by the operator's feeling can be easily adjusted by the motor 68. In addition, since the liquid drop prevention of the treatment liquid and the flow rate adjustment of the treatment liquid can be performed by the same motor 68, the useless configuration can be omitted and the space-saving configuration can be omitted as compared with the configuration in which the motor 68 or the like is separately provided. Therefore, the processing liquid can be supplied to each of the substrates W at a different flow rate, and the flow rate of the processing liquid can be changed in the middle in the same substrate W.

Further, according to the present embodiment, the opening and closing valve 17 is mainly used for opening and closing, and the reverse suction valve 19 is configured to be capable of detailed adjustment. Therefore, for example, a simple valve can be selected as the opening and closing valve 17.

Further, since the motor 68 drives the needle 62 of the reverse suction valve 19, it is easy to divide into a plurality of reverse suctions, that is, it is easy to perform the reverse suction in multiple stages. Further, the position of the needle 62 for performing flow adjustment is easily changed.

Further, the control unit 31 moves the needle 62 to the sucking reference position SB0 by the motor 68 and reduces the flow rate of the processing liquid, and then closes the processing liquid flow path 70 by the opening and closing valve 17, and further interlocks with the needle 62 by the motor 68. The diaphragm 66 moves and increases the volume of the treatment liquid flow path 70. When the processing liquid flow path 70 is closed by the opening and closing valve 17, the flow rate of the processing liquid is reduced, so that the liquid falling of the processing liquid generated when the flow rate of the processing liquid is large can be suppressed. That is, it is possible to prevent liquid falling more reliably.

Further, the control unit 31 moves the needle 62 from the position of the needle 62 in a state in which the needle 62 has increased from the connection flow path 51 to the downstream side flow path 67 through the valve flow path 63 to the downstream side flow path 67 by the motor 68. The position of the flow rate set in advance is set, and the treatment liquid flow path 70 is opened by the opening and closing valve 17. When the suction suction is performed, the position of the needle 62 is changed. However, when the treatment liquid flow path 70 is opened by the opening and closing valve 17, the treatment liquid having a predetermined flow rate can be supplied.

Further, when the processing liquid flow path 70 is opened by the opening and closing valve 17, the movement of the needle 62 toward the position at which the flow rate is set is increased. When the processing liquid flow path 70 is opened by the opening and closing valve 17, the predetermined flow rate is caused to flow by the needle 62, so that the processing liquid is not pushed out and is further sucked up. Therefore, there is no need to worry about falling liquid.

Further, when the needle 62 is lowered to a position at which a predetermined flow rate is reached, The speed of the first set flow rate is changed by the motor 68 (see the inclination 81 of Fig. 3). For example, when the needle 62 is lowered to a position at a predetermined flow rate and the processing liquid is discharged from the discharge nozzle 11, the lowering speed of the needle 62 is changed, and the discharge speed is ejected from the discharge nozzle 11 at a predetermined flow rate. Thereby, the flow rate of the processing liquid discharged by the movement of the needle 62 can be approximated to the flow rate when the processing liquid flow path 70 is opened by the opening and closing valve 17.

Further, the processing liquid supply unit 3 is further provided with a discharge nozzle 11 that is provided downstream of the dump valve 19 and that is connected to the processing liquid flow path 70 via the processing liquid pipe 15 to discharge the processing liquid. Thereby, the processing liquid can be sucked in the discharge nozzle 11, and the processing liquid discharged from the discharge nozzle 11 can be adjusted in flow rate.

[Embodiment 2]

Next, a second embodiment of the present invention will be described with reference to the drawings. In addition, the description overlapping with the embodiment 1 is omitted.

In the first embodiment, as shown in time t1 of FIG. 3, before the opening and closing valve 17 is closed, the needle 62 of the reverse suction valve 19 is lowered to the sucking suction reference position SB0. In this case, in the case where it is not necessary to descend to the sucking suction reference position SB0, the opening and closing valve 17 can be directly closed without moving the needle 62.

At the time t11 of Fig. 5, the position NA of the needle 62 of the reverse suction valve 19 is not lowered, and the opening and closing valve 17 is directly closed. At time t12, the needle 62 is raised to the position SB2 with a predetermined movement amount SD. That is, the diaphragm 66 that is interlocked with the needle 62 is raised and sucked up. After the replacement of the substrate W, the needle 62 is moved to a position lower than the position NA. When NC is set, the treatment liquid is ejected again from the discharge nozzle 11.

An example of the action in this case will be explained. The discharge nozzle 11 is moved to the standby area 23 by the nozzle moving mechanism 21. In this state, at time t13, the needle 62 is lowered to the position NC. At this time, even if the treatment liquid is pushed out from the discharge nozzle 11, it is recovered in the standby area 23. Next, at time t15, the needle 62 is raised to the position SB3 by the amount of movement SD. That is, the suction is performed by the diaphragm 66 that is interlocked with the needle 62. As shown by the symbol 83 from the time t14 to the time t15 in Fig. 5, the on-off valve 17 can be opened and the treatment liquid can be dummy dispensed.

Thereafter, the discharge nozzle 11 is moved from the standby area 23 toward the upper side of the substrate W by the nozzle moving mechanism 21. At time t16, the needle 62 is lowered and the flow rate is adjusted. At time t17, the opening and closing valve 17 is opened, and the processing liquid is discharged from the discharge nozzle 11. Further, at time t18, the opening and closing valve 17 is closed, and the discharge of the processing liquid from the discharge nozzle 11 is stopped. At time t19, the diaphragm 66 that is interlocked with the needle 62 is sucked up.

Further, at time t13, the lowering speed of the needle 62 may be adjusted on the substrate W such that the flow rate F is the same as or close to the flow rate F at the position NC of the needle 62 (see FIGS. 3 and 5). The inclination is 81), and the flow rate is adjusted while the treatment liquid is pushed out from the discharge nozzle 11. Next, the on-off valve 17 may be opened.

[Example 3]

Next, a third embodiment of the present invention will be described with reference to the drawings. In addition, omitted The description is repeated with the embodiment 1.

In the first embodiment, as shown in time t1 of Fig. 3, the needle 62 of the reverse suction valve 19 having the flow rate adjustment function is lowered to the sucking reference position SB0 to adjust the flow rate of the treatment liquid, at time t2. In the middle, the on-off valve 17 is closed. By this action, although the liquid drop can be prevented more reliably, there is still a possibility of falling liquid.

That is, in Fig. 3, before the opening and closing valve 17 is set to the closed state, the needle 62 of the reverse suction valve 19 is adjusted to reduce the flow rate of the treatment liquid. In the case where the size of the narrowing when the treatment liquid flow path 70 has been narrowed by the needle 62 is small, the pressure difference before and after the suction valve 19 is increased. Thus, the gas is easily mixed into the treatment liquid that has passed through the reverse suction valve 19. When the gas is mixed into the treatment liquid, when the opening and closing valve 17 is set to the closed state at time t2, the treatment liquid vibrates and the liquid falls easily. Further, when the moving distance of the diaphragm 46 when the opening and closing valve 17 is closed is long, the processing liquid of the length is pressed out, and liquid falling is likely to occur.

Therefore, when the control unit 31 closes the processing liquid flow path 70 by the opening and closing valve 17, the needle 62 starts to descend, and the needle 62 of the reverse suction valve 19 narrows the processing liquid flow path 70, and the diaphragm 46 starts to descend. The treatment liquid flow path 70 is narrowed by the diaphragm 46 of the opening and closing valve 17. Next, when the diaphragm 46 starts to descend and the needle 62 reaches a predetermined position, the control unit 31 lifts the descending speed of the diaphragm 46 and sets the opening and closing valve 17 to the closed state.

Further, as shown in FIG. 6, the diaphragm 46 and the piston 42 of the opening and closing valve 17 of the present embodiment are moved by a motor (motor) 84. The position of the diaphragm 46 is easily changed by using the motor 84. The motor 84 corresponds to the first drive unit of the present invention. Further, the reverse suction valve 19 may also be referred to as a flow regulating valve having a reverse suction function.

The operation will be described with reference to Fig. 7 . At time t30, the on-off valve 17 is in the closed state (OFF), and the needle 62 of the reverse suction valve 19 is present in the reverse suction execution position SB1. Since the needle 62 is present in the reverse suction execution position SB1, the reverse suction is performed, and the treatment liquid is sucked into the discharge nozzle 11.

At time t31, the diaphragm 46 of the opening and closing valve 17 is raised by the motor 84 to a predetermined position of the ON state. Further, the needle 62 is raised by the motor 68 from the suck-up execution position SB1 to the position NB. Thereby, the processing liquid is ejected from the ejection nozzle 11 toward the substrate W.

After a predetermined amount of the processing liquid is ejected to the substrate W, the processing liquid flow path 70 is closed by the opening and closing valve 17. At this time, first, at time t32, the needle 62 is started to descend, so that the treatment liquid flow path 70 is narrowed by the needle 62. The lowering of the needle 62 is performed while the needle 62 reaches the predetermined back suction reference position SB0 (time t35). Further, the arrival of the needle 62 to the reverse suction reference position SB0 may be referred to as a predetermined flow rate by the set flow rate of the reverse suction valve 19. In addition, in FIG. 7, although the descending speed of the needle 62 is constant, it is also Can be variable.

Further, at time t32, after the needle 62 starts to descend, the diaphragm 46 starts to descend at time t33. That is, the diaphragm 46 is started to fall lower than the start of the lowering of the needle 62. Not only the needle 62 is lowered, but also the diaphragm 46 is lowered, whereby the pressure of the treatment liquid supplied to the suction valve 19 becomes small. Thereby, it is possible to suppress the pressure difference between the front and rear of the above-described reverse suction valve 19 from increasing.

Further, while the needle 62 is started to move until the needle 62 reaches the predetermined reverse suction reference position SB0, the allowable flow rate through the opening and closing valve 17 is adjusted to be equal to or higher than the set flow rate by the reverse suction valve 19. In addition, the allowable flow rate of the on-off valve 17 is a flow rate that can be flown when the treatment liquid flow path 70 is not narrowed by the needle 62 of the reverse suction valve 19.

For example, in the case where the set flow rate of the reverse suction valve 19 is 200 mL/min at time t34, the allowable flow rate of the opening and closing valve 17 is adjusted to 200 mL/min or more. Thereby, the flow rate adjustment by the reverse suction valve 19 is not disturbed, and the diaphragm 46 can be narrowed.

In addition, in the above description, although the allowable flow rate of the opening and closing valve 17 is adjusted to be equal to or higher than the set flow rate of the reverse suction valve 19, the allowable flow rate of the opening and closing valve 17 may be adjusted to be larger than the set flow rate of the reverse suction valve 19. Thereby, it is possible to more reliably obtain the effect that the diaphragm 46 does not interfere with the flow adjustment by the reverse suction valve 19.

Further, the comparison between the allowable flow rate of the on-off valve 17 and the set flow rate of the reverse suction valve 19 can be performed as follows. The size (sectional area) at which the narrowing of the treatment liquid flow path 70 by the diaphragm 46 can be adjusted to be smaller than the narrowed size (sectional area) when the treatment liquid flow path 70 is narrowed by the needle 62, or It is adjusted to be larger than the narrowed size (sectional area) when the treatment liquid flow path 70 is narrowed by the needle 62. Further, the pressure of the treatment liquid before the opening and closing valve 17 may be adjusted to be equal to or higher than the pressure of the treatment liquid before passing through the suction valve 19, or may be adjusted to be larger than the pressure of the treatment liquid before passing through the suction valve 19.

Incidentally, even when the processing liquid is ejected, the allowable flow rate of the opening and closing valve 17 is adjusted to be equal to or higher than the set flow rate of the opening and closing valve 19. For example, in the period from the time t31 to the time t32, when the set flow rate of the reverse suction valve 19 is 1 L/min, the allowable flow rate of the opening and closing valve 17 is adjusted to 1 L/min or more.

At time t35, when the needle 62 reaches the sucking suction reference position SB0, the moving speed of the diaphragm 46 is lifted, and the opening and closing valve 17 is set to the closed state (OFF). When the opening and closing valve 17 is closed, the diaphragm 46 is lowered at a low speed, and the diaphragm 46 is lowered at a high speed. Further, the drop of the diaphragm 46 may be changed to three or more stages. Further, the operation of lowering the needle 62 to the sucking suction reference position SB0 may be performed by lowering the needle 62 at a preset speed and a predetermined time.

After the processing liquid flow path 70 at time t35 is set to the closed state, at time t36 In the middle, the needle 62 is raised to the reverse suction execution position SB1 and the reverse suction is performed.

According to the present embodiment, before the opening and closing valve 17 is in the closed state, not only the treatment liquid flow path 70 is narrowed by the needle 62 of the reverse suction valve 19, but also the diaphragm 46 of the opening and closing valve 17 is narrowed. Before the opening and closing valve 17 is closed, the diaphragm 46 of the opening and closing valve 17 is not narrowed, but the treatment liquid flow path 70 is narrowed by the needle 62 of the reverse suction valve 19 to reduce the flow rate of the treatment liquid. The pressure difference before and after passing through the suction valve 19 becomes large. Thus, there is a possibility that gas is mixed into the treatment liquid that has passed through the suction valve 19. When the air is mixed in, when the opening and closing valve 17 is set to the closed state, the treatment liquid vibrates and the liquid falling of the treatment liquid is likely to occur. However, since the diaphragm 46 of the opening and closing valve 17 is also narrowed to suppress the pressure of the treatment liquid supplied to the reverse suction valve 19, the pressure difference between the front and rear of the reverse suction valve 19 can be suppressed. Further, when the moving speed of the diaphragm 46 is raised and the opening and closing valve 17 is set to the closed state, since the amount of movement of the diaphragm 46 is small, the amount of the processing liquid that is pushed out by the movement of the diaphragm 46 is reduced. Therefore, it is possible to further prevent the liquid of the treatment liquid from falling when the opening and closing valve 17 is closed. That is, the accuracy of the liquid blocking when the opening and closing valve 17 is set to the closed state can be improved.

Further, the allowable flow rate of the treatment liquid that has passed through the opening and closing valve 17 during the period from the start of the movement of the needle 62 to the time when the needle 62 reaches the predetermined position is adjusted to be equal to or higher than the set flow rate of the treatment liquid passing through the reverse suction valve 19. The allowable flow rate of the on-off valve 17 is adjusted to be equal to or higher than the set flow rate of the reverse suction valve 19, whereby the flow rate adjustment by the suction valve 19 is not disturbed, and the treatment liquid flow path 70 can be narrowed by the diaphragm 46.

Further, after the needle 62 starts to move, the treatment liquid flow path 70 is narrowed by the needle 62, and the diaphragm 46 is moved to narrow the treatment liquid flow path 70 by the diaphragm 46. Thereby, the adjustment of the allowable flow rate of the opening and closing valve 17 to the set flow rate of the reverse suction valve 19 can be easily performed.

Further, in the present embodiment, before the opening and closing valve 17 is set to the closed state, the needle 62 is started to descend, and the diaphragm 46 is started to descend. At this point, the diaphragm 46 and the needle 62 can also be lowered at the same timing. Further, after the diaphragm 46 starts to descend, the needle 62 can also be lowered. However, the lowering of the diaphragm 46 adjusts the allowable flow rate of the opening and closing valve 17 to the set flow rate of the reverse suction valve 19 so as not to interfere with the flow rate adjustment by the needle 62.

Further, in the present embodiment, although the motors 68 and 84 are provided to move the diaphragm 46 and the needle 62, other driving may be used as long as the position of the diaphragm 46 and the needle 62 can be changed as easily as a motor. unit.

The present invention is not limited to the above embodiment, and can be modified as described below.

(1) In each of the above embodiments, the diaphragm 66 is provided as a volume change portion of the reverse suction valve 19. This point is as shown in FIG. 8. The partition 82a may be provided on the needle 82 so as to cross the direction of movement of the needle 82. The partition 82a is provided with an airtight holding member 82b such as an O-ring and is movably contacted. To the valve room The inner side wall of 61.

(2) In each of the above embodiments and modifications (1), for example, a developing liquid is used as the processing liquid. Thereby, it is possible to prevent the liquid of the developing liquid from falling and to adjust the flow rate of the developing liquid. As shown in FIG. 9, the control unit 31 moves the discharge nozzle 11 to the standby area 23 or the like by the nozzle moving mechanism 21, and dipped the tip end portion of the discharge nozzle 11 into the container 85 in which pure water or the like is retained. Next, the control unit 31 reciprocates the diaphragm 66 that is interlocked with the needle 62 by the motor 68 of the reverse suction valve 19 when the upstream side flow path 43 is closed. The tip end portion of the discharge nozzle 11 is immersed in pure water to attract pure water, and the sucked pure water is directly held for a predetermined period of time, and the sucked pure water is pushed out, whereby the tip end of the discharge nozzle 11 can be washed. In Fig. 9, reference numeral 86 is a developing liquid layer, element symbol 87 is a gas layer such as air, and element symbol 88 is pure water.

(3) In the first embodiment, the second embodiment, and the respective modifications, the opening and closing valve 17 is a gas operated valve, but may be driven by a motor like the reverse suction valve 19.

(4) In the above embodiments and the respective modifications, the valve system of the opening and closing valve 17 is constituted by the diaphragm 46, but the flow rate can be adjusted as in the case of the needle 62 of the reverse suction valve 19. Further, although the opening and closing valve 17 is configured as shown in Fig. 2, it may have other known configurations.

(5) As shown in Fig. 3, in each of the above embodiments and each modification, the sucking reference position SB0 is a flow of the processing liquid. The back suction reference position SB0 can also respond It is necessary to make it not to circulate the treatment liquid.

(6) In each of the above embodiments and the respective modifications, the flow paths in the reverse suction valve 19 are formed of a single member, but may be individual members. That is, the opening and closing valve 17 and the reverse suction valve 19 are configured separately. In this case, the on-off valve 17 and the reverse suction valve 19 are connected to each other with the treatment liquid pipe 15 interposed therebetween.

(7) In each of the above embodiments and each modification, a reverse suction valve 19 having a flow rate adjustment function is provided downstream of the opening and closing valve 17. The reverse suction valve 19 may also be a flow regulating valve that does not have a reverse suction function, as needed.

NB‧‧‧ position

SB0‧‧‧Reverse suction reference position

SB1‧‧‧Reverse suction execution position

SD‧‧‧Mobile

T30 to t36‧‧‧ time

Claims (10)

A processing liquid supply device includes: a processing liquid flow path for circulating a processing liquid; and an opening and closing valve for opening and closing the processing liquid flow path, and a first valve body for performing opening and closing and for causing the aforementioned a first driving unit for moving the first valve body; a flow rate adjusting valve disposed downstream of the opening and closing valve and having a second valve body for adjusting a narrowing of the processing liquid flow path and for making the second a second driving unit that moves the valve body; and a control unit that starts moving the second valve body so that the second valve body narrows the processing liquid flow path when the processing liquid flow path is closed by the opening and closing valve And starting to move the first valve body so that the first valve body narrows the processing liquid flow path, and after starting to move the first valve body, when the second valve body reaches a predetermined position, the first step is raised The moving speed of the valve body is set to the closed state. The processing liquid supply device according to claim 1, wherein the control unit is configured to be capable of passing through the processing liquid of the opening and closing valve after the movement of the second valve body is started until the second valve body reaches a predetermined position. The allowable flow rate is adjusted to be equal to or higher than the set flow rate of the treatment liquid passing through the flow rate adjustment valve. The processing liquid supply device according to claim 2, wherein the control unit starts moving the second valve body to narrow the second valve body The processing liquid flow path is thereafter moved to move the first valve body so that the first valve body narrows the processing liquid flow path. The processing liquid supply device according to any one of claims 1 to 3, wherein the first driving unit is a motor. The processing liquid supply device according to any one of claims 1 to 3, wherein the second driving unit is a motor. The processing liquid supply device according to any one of claims 1 to 3, wherein the flow rate adjusting valve further includes a volume changing unit that is interlocked with the second valve body and further downstream of the opening and closing valve The volume change of the downstream treatment liquid flow path. The processing liquid supply device according to claim 6, wherein the control unit reciprocates the volume change portion that is interlocked with the second valve body by the second drive unit when the processing liquid flow path is closed by the opening and closing valve mobile. The processing liquid supply device according to any one of claims 1 to 3, wherein the processing liquid flow path is constituted by a single member. The processing liquid supply device according to any one of claims 1 to 3, further comprising: a discharge nozzle provided downstream of the flow rate adjustment valve and connected to the processing liquid flow path via a pipe; The aforementioned treatment liquid is sprayed. A control method of a processing liquid supply device for controlling a processing liquid supply device including: a processing liquid flow path for circulating a processing liquid; and an opening and closing valve for opening and closing the processing liquid flow path And having a first valve body useful for performing opening and closing and a first driving unit that moves the first valve body, and a flow rate adjusting valve that is disposed downstream of the opening and closing valve and includes a second valve body for adjusting a narrowing of the processing liquid flow path and for making a second valve body a second driving unit for moving the second valve body; the method for controlling the processing liquid supply device includes: when the opening and closing valve closes the processing liquid flow path, starting to move the second valve body to be the second a valve body narrowing the flow path of the treatment liquid, and starting to move the first valve body to narrow the flow path of the treatment liquid by the first valve body; and after starting to move the first valve body, in the foregoing When the two valve bodies reach a predetermined position, the moving speed of the first valve body is raised, and the opening and closing valve is set to a closed state.