TWI712659B - 形成交聯反應性之含矽膜組成物 - Google Patents
形成交聯反應性之含矽膜組成物 Download PDFInfo
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- TWI712659B TWI712659B TW104137922A TW104137922A TWI712659B TW I712659 B TWI712659 B TW I712659B TW 104137922 A TW104137922 A TW 104137922A TW 104137922 A TW104137922 A TW 104137922A TW I712659 B TWI712659 B TW I712659B
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- 239000000203 mixture Substances 0.000 title claims abstract description 103
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- YVWNUCYRJDGPGC-UHFFFAOYSA-N trimethoxy(3-phenanthren-9-ylpropyl)silane Chemical compound C1=CC=C2C(CCC[Si](OC)(OC)OC)=CC3=CC=CC=C3C2=C1 YVWNUCYRJDGPGC-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
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- DAVVOFDYOGMLNQ-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)C(C)OCC1CO1 DAVVOFDYOGMLNQ-UHFFFAOYSA-N 0.000 description 1
- FNBIAJGPJUOAPB-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)C(CC)OCC1CO1 FNBIAJGPJUOAPB-UHFFFAOYSA-N 0.000 description 1
- ZOWVSEMGATXETK-UHFFFAOYSA-N trimethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OC)(OC)OC)CCC2OC21 ZOWVSEMGATXETK-UHFFFAOYSA-N 0.000 description 1
- GUKYSRVOOIKHHB-UHFFFAOYSA-N trimethoxy-[4-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CCCCOCC1CO1 GUKYSRVOOIKHHB-UHFFFAOYSA-N 0.000 description 1
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical class C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- OOLZXLYYPCOPQZ-UHFFFAOYSA-N tripropylsulfanium Chemical class CCC[S+](CCC)CCC OOLZXLYYPCOPQZ-UHFFFAOYSA-N 0.000 description 1
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- 229940005605 valeric acid Drugs 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
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Abstract
本發明係提供一種使用於具有硬化性或埋入性等之良好的效果之形成膜組成物、半導體裝置之光微影步驟的阻劑下層膜。
一種形成膜組成物,其特徵為包含作為矽烷之水解性矽烷、其水解物、或其水解縮合物,該水解性矽烷包含式(1)所示之水解性矽烷:【化1】R1 aR2 bSi(R3)4-(a+b) 式(1)
〔式(1)中、R1係以式(2):
所表示的有機基且介由Si-C鍵與矽原子鍵結〕。該水解性矽烷為以式(1)所示之水解性矽烷與其他之水解性矽烷之組合,其他之水解性矽烷係選自式(3)及式(4)所成之群中選出之至少1種之水解性矽烷,【化3】R7 cSi(R8)4-c 式(3)
【化4】〔R9 dSi(R10)3-d〕2Ye 式(4)
形成膜組成物為使用於光微影步驟之阻劑下層形成膜組成物。塗佈阻劑下層形成膜組成物於半導體基板上,介由燒成所獲得阻劑下層膜。
Description
本發明係關於一種使用具有交聯反應性基之水解性矽烷形成膜的組成物。
以薄膜或塗佈或被覆劑之形式使用各種之材料。此等材料中例如為了改善耐熱性、透明性、耐電漿性耐性、平坦化性等使用矽氧烷材料。此等之材料通常介由矽烷醇之脫水縮合取得矽氧烷交聯方式者為一般。作為為了引起其他交聯之方法有在聚矽氧聚合物中導入丙烯酸酯基的方法(參照專利文獻1)。此等之基展現介由UV光的照射可進行交聯而硬化。
又,亦提案使用羥甲基交聯之有機矽氧烷(參照專利文獻2)。
即,提案使用包含具有至少兩個有機聚矽氧烷單位與羥甲基之含氮化合物的組成物,進行交聯有機聚矽氧烷。
又,提案將用於半導體裝置之光微影步驟的具有使用
羥甲基交聯之交聯材的組成物作為阻劑下層膜使用(參照專利文獻3)。
[專利文獻1]日本特開平3-275769
[專利文獻2]日本特開2009-537645
[專利文獻3]日本特開2011-170059
以往具有交聯性的聚矽氧烷係在聚矽氧烷之側鏈導入官能基,例如羧基、羥基、環氧基等官能基與交聯性化合物之間進行交聯反應。
此等交聯系中,低分子交聯劑參與交聯反應,有時發生交聯不良。
本發明係提供一種組成物,在聚矽氧烷之側鏈導入發生交聯反應的烷氧基甲基苯基,介由此交聯基相互或與其他成分之間形成交聯結構,形成充分強固的交聯結構且耐藥品性亦優異。
作為本發明之第1觀點,其特徵為一種形成膜組成物包含作為矽烷之水解性矽烷、其水解物、或其水
解縮合物,該水解性矽烷包含式(1)所示之水解性矽烷:[化1]R1 aR2 bSi(R3)4-(a+b) 式(1)
(式(2)中、R4表示氫原子、碳數1~10之烷基、或醯基、R5表示氫原子、碳數1~10之烷基、或具有碳數1~10之烷氧基之碳數1~10之烷基、R6表示碳數1~10之烷基、n1表示0~10之整數、n2表示0或1之整數、n3、n4及n5係整數、n3表示1≦n3≦5、n4表示0≦n4≦4、n5表示0≦n5≦4。並且,k1係n1為1~10時,表示與矽原子之鍵端、k2係n1為0及n2為1時,表示與矽原子之鍵端、k3係n1及n2為0時,表示與矽原子之鍵端。)所示之有機基且介由Si-C鍵或Si-O鍵與矽原子鍵結。R2係具有烷基、芳基、鹵化烷基、鹵化芳基、烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、胺基、或是具有氰基之有機基、或此等之組合且介由Si-C鍵與矽原子鍵結。R3係烷氧基、醯氧基、或鹵素
基。a表示1之整數、b表示0~2之整數、a+b表示1~3之整數〕,作為第2觀點,如第1觀點之形成膜組成物,其中該水解性矽烷係式(1)所示之水解性矽烷與其他水解性矽烷之組合,其他水解性矽烷係選自式(3)所示之水解性矽烷及式(4)所示之矽烷所成之群中選出之至少1種之水解性矽烷,[化3]R7 cSi(R8)4-c 式(3)
(式(3)中、R7係烷基、芳基、鹵化烷基、鹵化芳基、烷氧基烷基、烷氧基芳基、烷氧基烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、磺醯胺基、或是具有氰基之有機基、或此等之組合且介由Si-C鍵與矽原子鍵結、R8表示烷氧基、醯氧基、或鹵素基、c表示0~3之整數)
[化4]〔R9 dSi(R10)3-d〕2Ye 式(4)
(式(4)中、R9係烷基且介由Si-C鍵與矽原子鍵結,R10表示烷氧基、醯氧基、或鹵素基、Y表示伸烷基或伸芳基、d表示0或1之整數、e係0或1之整數),作為第3觀點,一種形成膜組成物,其特徵為包含第1觀點之形成膜組成物中的式(1)所示的水解性矽烷與
第2觀點之形成膜組成物中的式(3)所示之水解性矽烷的組合所成的水解性矽烷之水解縮合物作為聚合物,作為第4觀點,如第1觀點~第3觀點中任1項之形成膜組成物,其中更進一步包含鹽,作為第5觀點,如第1觀點~第4觀點中任1項之形成膜組成物,其中形成膜組成物為用於光微影步驟之阻劑下層形成膜組成物。
作為第6觀點,一種阻劑下層膜,其特徵為由如第5觀點之形成膜組成物之硬化物所成,且形成於半導體基板上。
作為第7觀點,一種半導體裝置之製造方法,其特徵係包含下述步驟:在半導體基板上塗佈如第5觀點之形成膜組成物並燒成而形成阻劑下層膜之步驟;在前述阻劑下層膜上塗佈阻劑組成物而形成阻劑膜之步驟;曝光前述阻劑膜之步驟;曝光後顯影該阻劑膜而獲得阻劑圖型之步驟;介由前述阻劑圖型而蝕刻阻劑下層膜之步驟;及介由圖型化阻劑與阻劑下層膜而加工半導體基板之步驟,作為第8觀點,一種半導體裝置之製造方法,其特徵係包含下述步驟:在半導體基板上形成有機下層膜之步驟;在其上塗佈如第5觀點之形成膜組成物並燒成而形成阻劑下層膜之步驟;在前述阻劑下層膜上塗佈阻劑組成物而形成阻劑膜之步驟;曝光前述阻劑膜之步驟;曝光後顯影該阻劑膜而獲
得阻劑圖型之步驟;介由前述阻劑圖型而蝕刻阻劑下層膜之步驟;介由圖型化後的阻劑下層膜蝕刻有機下層膜之步驟;及介由圖型化後的有機下層膜而加工半導體基板之步驟。
作為第9觀點,一種水解性矽烷,其特徵為式(1’)所示,[化5]R1 aR2 bSi(R3)4-(a+b) 式(1’)
(式(2’)中、R4表示氫原子、碳數1~10之烷基、或醯基,R5表示氫原子、碳數1~10之烷基、或具有碳數1~10之烷氧基之碳數1~10之烷基、R6表示碳數1~10之烷基、n1表示0~10之整數、n2表示0或1之整數、n3、n4及n5係整數、n3表示1≦n3≦5、n4表示0≦n4≦4、n5表示0≦n5≦4。並且,k1表示n1為1~10時,表示與矽原子之鍵端、k2表示n1為0及n2為1時,表示與矽原子之鍵端、k3表示n1及n2為0時,表示與矽原子之鍵端)所示之有機基且介由Si-C鍵或Si-O鍵與矽原子鍵
結。R2係烷基、芳基、鹵化烷基、鹵化芳基、烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、胺基、或是具有氰基之有機基、或此等之組合且介由Si-C鍵與矽原子鍵結。R3表示烷氧基、醯氧基、或鹵素基。a表示1之整數、b表示0~2之整數、a+b表示1~3之整數〕。
在本發明矽烷成分中,介由在聚矽氧烷之側鏈導入發生交聯反應之烷氧基甲基苯基等,此交聯基與富電子的苯基之間可相互地形成交聯反應。又,此烷氧基甲基苯基亦可與其他羥基之間形成交聯結構,可形成充分強固的交聯結構。因此,本發明之組成物之硬化後所形成之膜係機械性及耐藥品性均優異者。
本發明之形成膜組成物係可形成如此優異的膜,故可使用作為各種用途之形成膜組成物。例如利用矽氧烷原本具有之耐蝕刻性,可利用在作為為了形成半導體光微影之多層製程所利用阻劑下層膜的阻劑下層形成膜組成物。雖然典型中為了防止伴隨圖型之微細化的圖型坍塌(pattern collapse)進行阻劑之薄膜化,但是此時利用組合蝕刻氣體種改變矽氧烷層、有機層之蝕刻速度比,將阻劑圖型轉印在下層之矽硬式遮罩,進一步轉印在存在該下層之有機下層膜,最後進行加工矽基板之如此製程。本發明之形成膜組成物係亦可使用作為形成此步驟使用之矽硬
式遮罩(阻劑下層膜)之組成物。
又,本發明之形成膜組成物係矽系之組成物,藉由介由烷氧基甲基苯基產生交聯反應的溫度之調節,並且藉由調整硬化之程度,可利用作為要求平坦化性之基板的填孔材。即,本發明之形成膜組成物係未達藉由烷氧基甲基苯基產生交聯反應之溫度的溫度區域保持流動性,故藉由首先將維持在未達產生交聯反應之溫度的溫度之該組成物填充在基板上之微細孔中,之後,使溫度上昇進行交聯反應,展現可在微細孔形成充分填充了平坦化性高的膜之效果。
1‧‧‧硬化性樹脂膜
2‧‧‧段差基板
[圖1]圖1表示用於填孔評估試驗之段差基板的剖面圖。
本發明係作為矽烷包含水解性矽烷、其水解物、或其水解縮合物,該水解性矽烷包含式(1)所示之水解性矽烷之形成膜組成物。
本發明之形成膜組成物包含式(1)所示之水解性矽烷、其水解物、或其水解縮合物、與溶劑。並且,作為任意成分可包含酸、水、醇、硬化觸媒、酸產生劑、其他有機聚合物、吸光性化合物、及界面活性劑等。
本發明的之形成膜組成物中的固體成分,係例如0.1~50質量%、或0.1~30質量%、0.1~25質量%。在此,所謂的固體成分意指從形成膜組成物之全成分中除去溶劑成分者。
固體成分中所佔水解性矽烷、其水解物、及其水解縮合物的比例為20質量%以上,例如50~100質量%、60~99質量%、70~99質量%。
並且,上述水解性矽烷、其水解物、及其水解縮合物亦可作為該等混合物使用。可使用作為水解水解性矽烷,再縮合所獲得之水解物的縮合物。亦可使用獲得水解縮合物時未完全進行水解之部分水解物,或被混合在水解縮合物之矽烷化合物的混合物。該縮合物具有聚矽氧烷結構的聚合物。此聚矽氧烷包含式(1)所示之水解性矽烷,或式(1)所示之水解性矽烷與其他水解性矽烷(例如式(3)所示之水解性矽烷)之水解縮合物。又,式(1)所示之水解性矽烷、或由式(1)所示之水解性矽烷與式(3)所示之水解性矽烷之組合所成的水解性矽烷之水解物的水解縮合物(聚矽氧烷)中,可添加式(1)所示的水解性矽烷、或由式(1)所示之水解性矽烷與式(3)所示之水解性矽烷與之混合物所成的水解性矽烷。
式(1)中,R1係式(2)所示之有機基且藉由Si-C鍵或Si-O鍵與矽原子鍵結。R2係烷基、芳基、鹵化烷基、鹵化芳基、烷氧基芳基、烯基、或具有環氧基、丙烯醯基、甲基丙烯醯基、巰基、胺基、或具有氰基之有機基、或該等之組合且介由Si-C鍵與矽原子鍵結。R3表
示烷氧基、醯氧基、或鹵素基。a表示1的整數,b表示0~2的整數,a+b表示1~3的整數。
式(2)中,R4表示氫原子、碳數1~10之烷基、或醯基、R5表示氫原子、碳數1~10之烷基、或具有碳數1~10之烷氧基之碳數1~10之烷基、R6表示碳數1~10之烷基、n1表示0~10之整數、n2表示0或1之整數、n3、n4及n5係整數、n3表示1≦n3≦5、n4表示0≦n4≦4、n5表示0≦n5≦4。k1部分、k2部分、或k3部分表示與矽原子之鍵結端、k1表示n1為1~10時之與矽原子的鍵結端、k2表示n1為0及n2為1時之與矽原子的鍵結端、k3表示n1及n2為0時之與矽原子的鍵結端。
可選擇在k1部分與矽原子鍵結者。
烷基係例如碳數1~10之烷基、甲基、乙基、n-丙基、i-丙基、環丙基、n-丁基、i-丁基、s-丁基、t-丁基、環丁基、1-甲基-環丙基、2-甲基-環丙基、n-戊基、1-甲基-n-丁基、2-甲基-n-丁基、3-甲基-n-丁基、1,1-二甲基-n-丙基、1,2-二甲基-n-丙基、2,2-二甲基-n-丙基、1-乙基-n-丙基、環戊基、1-甲基-環丁基、2-甲基-環丁基、3-甲基-環丁基、1,2-二甲基-環丙基、2,3-二甲基-環丙基、1-乙基-環丙基、2-乙基-環丙基、n-己基、1-甲基-n-戊基、2-甲基-n-戊基、3-甲基-n-戊基、4-甲基-n-戊基、1,1-二甲基-n-丁基、1,2-二甲基-n-丁基、1,3-二甲基-n-丁基、2,2-二甲基-n-丁基、2,3-二甲基-n-丁基、3,3-二甲基-n-丁基、1-乙基-n-丁基、2-乙基-n-丁基、1,1,2-三甲基-n-丙
基、1,2,2-三甲基-n-丙基、1-乙基-1-甲基-n-丙基、1-乙基-2-甲基-n-丙基、環己基、1-甲基-環戊基、2-甲基-環戊基、3-甲基-環戊基、1-乙基-環丁基、2-乙基-環丁基、3-乙基-環丁基、1,2-二甲基-環丁基、1,3-二甲基-環丁基、2,2-二甲基-環丁基、2,3-二甲基-環丁基、2,4-二甲基-環丁基、3,3-二甲基-環丁基、1-n-丙基-環丙基、2-n-丙基-環丙基、1-i-丙基-環丙基、2-i-丙基-環丙基、1,2,2-三甲基-環丙基、1,2,3-三甲基-環丙基、2,2,3-三甲基-環丙基、1-乙基-2-甲基-環丙基、2-乙基-1-甲基-環丙基、2-乙基-2-甲基-環丙基及2-乙基-3-甲基-環丙基等。
芳基係例如碳數6~40之芳基、苯基、o-甲基苯基、m-甲基苯基、p-甲基苯基、o-氯苯基、m-氯苯基、p-氯苯基、o-氟苯基、p-氟苯基、o-甲氧基苯基、p-甲氧基苯基、p-硝基苯基、p-氰基苯基、α-萘基、β-萘基、o-聯苯基、m-聯苯基、p-聯苯基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基及9-菲基。
烯基係例如碳數2~10之烯基、乙烯基、1-丙烯基、2-丙烯基、1-甲基-1-乙烯基、1-丁烯基、2-丁烯基、3-丁烯基、2-甲基-1-丙烯基、2-甲基-2-丙烯基、1-乙基乙烯基、1-甲基-1-丙烯基、1-甲基-2-丙烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、1-n-丙基乙烯基、1-甲基-1-丁烯基、1-甲基-2-丁烯基、1-甲基-3-丁烯基、2-乙基-2-丙烯基、2-甲基-1-丁烯基、2-甲基-2-丁烯基、2-甲基-3-丁烯基、3-甲基-1-丁烯基、3-甲基-2-丁烯基、
3-甲基-3-丁烯基、1,1-二甲基-2-丙烯基、1-i-丙基乙烯基、1,2-二甲基-1-丙烯基、1,2-二甲基-2-丙烯基、1-環戊烯基、2-環戊烯基、3-環戊烯基、1-己烯基、2-己烯基、3-己烯基、4-己烯基、5-己烯基、1-甲基-1-戊烯基、1-甲基-2-戊烯基、1-甲基-3-戊烯基、1-甲基-4-戊烯基、1-n-丁基乙烯基、2-甲基-1-戊烯基、2-甲基-2-戊烯基、2-甲基-3-戊烯基、2-甲基-4-戊烯基、2-n-丙基-2-丙烯基、3-甲基-1-戊烯基、3-甲基-2-戊烯基、3-甲基-3-戊烯基、3-甲基-4-戊烯基、3-乙基-3-丁烯基、4-甲基-1-戊烯基、4-甲基-2-戊烯基、4-甲基-3-戊烯基、4-甲基-4-戊烯基、1,1-二甲基-2-丁烯基、1,1-二甲基-3-丁烯基、1,2-二甲基-1-丁烯基、1,2-二甲基-2-丁烯基、1,2-二甲基-3-丁烯基、1-甲基-2-乙基-2-丙烯基、1-s-丁基乙烯基、1,3-二甲基-1-丁烯基、1,3-二甲基-2-丁烯基、1,3-二甲基-3-丁烯基、1-i-丁基乙烯基、2,2-二甲基-3-丁烯基、2,3-二甲基-1-丁烯基、2,3-二甲基-2-丁烯基、2,3-二甲基-3-丁烯基、2-i-丙基-2-丙烯基、3,3-二甲基-1-丁烯基、1-乙基-1-丁烯基、1-乙基-2-丁烯基、1-乙基-3-丁烯基、1-n-丙基-1-丙烯基、1-n-丙基-2-丙烯基、2-乙基-1-丁烯基、2-乙基-2-丁烯基、2-乙基-3-丁烯基、1,1,2-三甲基-2-丙烯基、1-t-丁基乙烯基、1-甲基-1-乙基-2-丙烯基、1-乙基-2-甲基-1-丙烯基、1-乙基-2-甲基-2-丙烯基、1-i-丙基-1-丙烯基、1-i-丙基-2-丙烯基、1-甲基-2-環戊烯基、1-甲基-3-環戊烯基、2-甲基-1-環戊烯基、2-甲基-2-環戊烯基、2-甲基-3-環戊烯基、2-甲
基-4-環戊烯基、2-甲基-5-環戊烯基、2-伸甲基-環戊基、3-甲基-1-環戊烯基、3-甲基-2-環戊烯基、3-甲基-3-環戊烯基、3-甲基-4-環戊烯基、3-甲基-5-環戊烯基、3-伸甲基-環戊基、1-環己烯基、2-環己烯基及3-環己烯基等。
作為醯基係例如碳數2~10之醯基、甲基羰基、乙基羰基、n-丙基羰基、i-丙基羰基、環丙基羰基、n-丁基羰基、i-丁基羰基、s-丁基羰基、t-丁基羰基、環丁基羰基、1-甲基-環丙基羰基、2-甲基-環丙基羰基、n-戊基羰基、1-甲基-n-丁基羰基、2-甲基-n-丁基羰基、3-甲基-n-丁基羰基、1,1-二甲基-n-丙基羰基、1,2-二甲基-n-丙基羰基、2,2-二甲基-n-丙基羰基、1-乙基-n-丙基羰基、環戊基羰基、1-甲基-環丁基羰基、2-甲基-環丁基羰基、3-甲基-環丁基羰基、1,2-二甲基-環丙基羰基、2,3-二甲基-環丙基羰基、1-乙基-環丙基羰基、2-乙基-環丙基羰基、n-己基羰基、1-甲基-n-戊基羰基、2-甲基-n-戊基羰基、3-甲基-n-戊基羰基、4-甲基-n-戊基羰基、1,1-二甲基-n-丁基羰基、1,2-二甲基-n-丁基羰基、1,3-二甲基-n-丁基羰基、2,2-二甲基-n-丁基羰基、2,3-二甲基-n-丁基羰基、3,3-二甲基-n-丁基羰基、1-乙基-n-丁基羰基、2-乙基-n-丁基羰基、1,1,2-三甲基-n-丙基羰基等。
作為具有環氧基之有機基係可舉例環氧丙氧基甲基、環氧丙氧基乙基、環氧丙氧基丙基、環氧丙氧基丁基、環氧基環己基等。
作為具有丙烯醯基之有機基係可舉例丙烯醯基甲基、
丙烯醯基乙基、丙烯醯基丙基等。
作為具有甲基丙烯醯基之有機基係可舉例甲基丙烯醯基甲基、甲基丙烯醯基乙基、甲基丙烯醯基丙基等。
作為具有巰基之有機基係可舉例乙基巰基、丁基巰基、己基巰基、辛基巰基等。
作為具有胺基之有機基係可舉例胺基、胺基甲基、胺基乙基。
作為具有氰基之有機基係可舉例氰基乙基、氰基丙基等。
作為上述碳數1~20、或碳數1~10之烷氧基係可舉例具有碳數1~20之直鏈、分支、環狀之烷基部分之烷氧基、例如甲氧基、乙氧基、n-丙氧基、i-丙氧基、n-丁氧基、i-丁氧基、s-丁氧基、t-丁氧基、n-戊氧基、1-甲基-n-丁氧基、2-甲基-n-丁氧基、3-甲基-n-丁氧基、1,1-二甲基-n-丙氧基、1,2-二甲基-n-丙氧基、2,2-二甲基-n-丙氧基、1-乙基-n-丙氧基、n-己氧基、1-甲基-n-戊氧基、2-甲基-n-戊氧基、3-甲基-n-戊氧基、4-甲基-n-戊氧基、1,1-二甲基-n-丁氧基、1,2-二甲基-n-丁氧基、1,3-二甲基-n-丁氧基、2,2-二甲基-n-丁氧基、2,3-二甲基-n-丁氧基、3,3-二甲基-n-丁氧基、1-乙基-n-丁氧基、2-乙基-n-丁氧基、1,1,2-三甲基-n-丙氧基、1,2,2-三甲基-n-丙氧基、1-乙基-1-甲基-n-丙氧基及1-乙基-2-甲基-n-丙氧基等、或作為環狀之烷氧基係環丙氧基、環丁氧基、1-甲基-環丙氧基、2-甲基-環丙氧基、環戊氧基、1-甲基-環丁氧基、2-甲基-環
丁氧基、3-甲基-環丁氧基、1,2-二甲基-環丙氧基、2,3-二甲基-環丙氧基、1-乙基-環丙氧基、2-乙基-環丙氧基、環己氧基、1-甲基-環戊氧基、2-甲基-環戊氧基、3-甲基-環戊氧基、1-乙基-環丁氧基、2-乙基-環丁氧基、3-乙基-環丁氧基、1,2-二甲基-環丁氧基、1,3-二甲基-環丁氧基、2,2-二甲基-環丁氧基、2,3-二甲基-環丁氧基、2,4-二甲基-環丁氧基、3,3-二甲基-環丁氧基、1-n-丙基-環丙氧基、2-n-丙基-環丙氧基、1-i-丙基-環丙氧基、2-i-丙基-環丙氧基、1,2,2-三甲基-環丙氧基、1,2,3-三甲基-環丙氧基、2,2,3-三甲基-環丙氧基、1-乙基-2-甲基-環丙氧基、2-乙基-1-甲基-環丙氧基、2-乙基-2-甲基-環丙氧基及2-乙基-3-甲基-環丙氧基等。
上述碳數2~20、碳數1~10之醯氧基係例如甲基羰氧基、乙基羰氧基、n-丙基羰氧基、i-丙基羰氧基、n-丁基羰氧基、i-丁基羰氧基、s-丁基羰氧基、t-丁基羰氧基、n-戊基羰氧基、1-甲基-n-丁基羰氧基、2-甲基-n-丁基羰氧基、3-甲基-n-丁基羰氧基、1,1-二甲基-n-丙基羰氧基、1,2-二甲基-n-丙基羰氧基、2,2-二甲基-n-丙基羰氧基、1-乙基-n-丙基羰氧基、n-己基羰氧基、1-甲基-n-戊基羰氧基、2-甲基-n-戊基羰氧基、3-甲基-n-戊基羰氧基、4-甲基-n-戊基羰氧基、1,1-二甲基-n-丁基羰氧基、1,2-二甲基-n-丁基羰氧基、1,3-二甲基-n-丁基羰氧基、2,2-二甲基-n-丁基羰氧基、2,3-二甲基-n-丁基羰氧基、3,3-二甲基-n-丁基羰氧基、1-乙基-n-丁基羰氧基、2-乙基-n-丁基羰氧
基、1,1,2-三甲基-n-丙基羰氧基、1,2,2-三甲基-n-丙基羰氧基、1-乙基-1-甲基-n-丙基羰氧基、1-乙基-2-甲基-n-丙基羰氧基、苯基羰氧基、及甲苯磺醯基羰氧基等。
作為上述鹵素基係可舉例氟、鹼、溴、碘等。
上述水解性矽烷係可使用作為式(1)所示之水解性矽烷與其他水解性矽烷之組合。
其他之水解性矽烷係可使用式(3)及式(4)所成之群中選出至少1種的水解性矽烷。
式(3)中,R7係烷基、芳基、鹵化烷基、鹵化芳基、烷氧基烷基、烷氧基芳基、烷氧基烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、磺醯胺基、或者具有氰基之有機基、或該等之組合且介由Si-C鍵與矽原子鍵結,R8表示烷氧基、醯氧基、或鹵素基、c表示0~3之整數。
式(4)中,R9係烷基且介由Si-C鍵與矽原子鍵結、R10表示烷氧基、醯氧基、或鹵素基、Y表示伸烷基或伸芳基、d表示0或1之整數、e係0或1之整數。
烷基、芳基、鹵化烷基、鹵化芳基、烷氧基烷基、烷氧基芳基、烷氧基烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、磺醯胺基、或是具有氰基之有機基、烷氧基、醯氧基、鹵素基係可使用上述之例示。
烷氧基烷基係可舉例烷氧基所取代之烷基,
例如甲氧基甲基、乙氧基甲基、乙氧基乙基、乙氧基甲基等。
烷氧基芳基係可舉例烷氧基所取代之芳基,例如甲氧基苯基、乙氧基苯基等。
烷氧基烷氧基芳基係可舉例烷氧基所取代之烷氧基之有機基所取代之芳基、甲氧基甲氧基苯基、甲氧基乙氧基苯基、乙氧基甲氧基苯基、乙氧基乙氧基苯基等。
形成膜組成物可包含由式(1)所示之水解性矽烷與式(3)所示之水解性矽烷之組合所成的水解性矽烷之水解縮合物作為聚合物。
式(1)所示之水解性矽烷係可示例如下。
上述Me表示甲基、Et表示乙基。以下本說明書中亦可使用此等之簡稱。
本發明中該水解性矽烷係式(1)所示之水解性矽烷與其他水解性矽烷之組合,其他水解性矽烷可使用式(3)及式(4)所成之群中選出至少1種的水解性矽烷。
式(3)所示之矽含有化合物係可舉例四甲氧基矽烷、四氯矽烷、四乙醯氧基矽烷、四乙氧基矽烷、四n-丙氧基矽烷、四異丙氧基矽烷、四n-丁氧基矽烷、甲基三甲氧基矽烷、甲基三氯矽烷、甲基三乙醯氧基矽烷、甲基三丙氧基矽烷、甲基三丁氧基矽烷、甲基三戊氧基矽烷、甲基三苯氧基矽烷、甲基三苄基氧基矽烷、甲基三苯乙基氧基矽烷、環氧丙氧基甲基三甲氧基矽烷、環氧丙氧
基甲基三乙氧基矽烷、α-環氧丙氧基乙基三甲氧基矽烷、α-環氧丙氧基乙基三乙氧基矽烷、β-環氧丙氧基乙基三甲氧基矽烷、β-環氧丙氧基乙基三乙氧基矽烷、α-環氧丙氧基丙基三甲氧基矽烷、α-環氧丙氧基丙基三乙氧基矽烷、β-環氧丙氧基丙基三甲氧基矽烷、β-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基三丙氧基矽烷、γ-環氧丙氧基丙基三丁氧基矽烷、γ-環氧丙氧基丙基三苯氧基矽烷、α-環氧丙氧基丁基三甲氧基矽烷、α-環氧丙氧基丁基三乙氧基矽烷、β-環氧丙氧基丁基三乙氧基矽烷、γ-環氧丙氧基丁基三甲氧基矽烷、γ-環氧丙氧基丁基三乙氧基矽烷、δ-環氧丙氧基丁基三甲氧基矽烷、δ-環氧丙氧基丁基三乙氧基矽烷、(3,4-環氧基環己基)甲基三甲氧基矽烷、(3,4-環氧基環己基)甲基三乙氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷、β-(3,4-環氧基環己基)乙基三乙氧基矽烷、β-(3,4-環氧基環己基)乙基三丙氧基矽烷、β-(3,4-環氧基環己基)乙基三丁氧基矽烷、β-(3,4-環氧基環己基)乙基三苯氧基矽烷、γ-(3,4-環氧基環己基)丙基三甲氧基矽烷、γ-(3,4-環氧基環己基)丙基三乙氧基矽烷、δ-(3,4-環氧基環己基)丁基三甲氧基矽烷、δ-(3,4-環氧基環己基)丁基三乙氧基矽烷、環氧丙氧基甲基甲基二甲氧基矽烷、環氧丙氧基甲基甲基二乙氧基矽烷、α-環氧丙氧基乙基甲基二甲氧基矽烷、α-環氧丙氧基乙基甲基二乙氧基矽烷、β-環氧丙氧基
乙基甲基二甲氧基矽烷、β-環氧丙氧基乙基乙基二甲氧基矽烷、α-環氧丙氧基丙基甲基二甲氧基矽烷、α-環氧丙氧基丙基甲基二乙氧基矽烷、β-環氧丙氧基丙基甲基二甲氧基矽烷、β-環氧丙氧基丙基乙基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二乙氧基矽烷、γ-環氧丙氧基丙基甲基二丙氧基矽烷、γ-環氧丙氧基丙基甲基二丁氧基矽烷、γ-環氧丙氧基丙基甲基二苯氧基矽烷、γ-環氧丙氧基丙基乙基二甲氧基矽烷、γ-環氧丙氧基丙基乙基二乙氧基矽烷、γ-環氧丙氧基丙基乙烯基二甲氧基矽烷、γ-環氧丙氧基丙基乙烯基二乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三氯矽烷、乙烯基三乙醯氧基矽烷、乙烯基三乙氧基矽烷、甲氧基苯基三甲氧基矽烷、甲氧基苯基三乙氧基矽烷、甲氧基苯基三乙醯氧基矽烷、甲氧基苯基三氯矽烷、甲氧基苄基三甲氧基矽烷、甲氧基苄基三乙氧基矽烷、甲氧基苄基三乙醯氧基矽烷、甲氧基苄基三氯矽烷、甲氧基苯乙基三甲氧基矽烷、甲氧基苯乙基三乙氧基矽烷、甲氧基苯乙基三乙醯氧基矽烷、甲氧基苯乙基三氯矽烷、乙氧基苯基三甲氧基矽烷、乙氧基苯基三乙氧基矽烷、乙氧基苯基三乙醯氧基矽烷、乙氧基苯基三氯矽烷、乙氧基苄基三甲氧基矽烷、乙氧基苄基三乙氧基矽烷、乙氧基苄基三乙醯氧基矽烷、乙氧基苄基三氯矽烷、異丙氧基苯基三甲氧基矽烷、異丙氧基苯基三乙氧基矽烷、異丙氧基苯基三乙醯氧基矽烷、異丙氧基苯基三氯矽
烷、異丙氧基苄基三甲氧基矽烷、異丙氧基苄基三乙氧基矽烷、異丙氧基苄基三乙醯氧基矽烷、異丙氧基苄基三氯矽烷、t-丁氧基苯基三甲氧基矽烷、t-丁氧基苯基三乙氧基矽烷、t-丁氧基苯基三乙醯氧基矽烷、t-丁氧基苯基三氯矽烷、t-丁氧基苄基三甲氧基矽烷、t-丁氧基苄基三乙氧基矽烷、t-丁氧基苄基三乙醯氧基矽烷、t-丁氧基苄基三氯矽烷、甲氧基萘基三甲氧基矽烷、甲氧基萘基三乙氧基矽烷、甲氧基萘基三乙醯氧基矽烷、甲氧基萘基三氯矽烷、乙氧基萘基三甲氧基矽烷、乙氧基萘基三乙氧基矽烷、乙氧基萘基三乙醯氧基矽烷、乙氧基萘基三氯矽烷、γ-氯丙基三甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基三乙醯氧基矽烷、3、3、3-三氟丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基三乙氧基矽烷、β-氰基乙基三乙氧基矽烷、氯甲基三甲氧基矽烷、氯甲基三乙氧基矽烷、二甲基二甲氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二乙氧基矽烷、苯基甲基二乙氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-氯丙基甲基二乙氧基矽烷、二甲基二乙醯氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-巰基甲基二乙氧基矽烷、甲基乙烯基二甲氧基矽烷、甲基乙烯基二乙氧基矽烷等。
又,亦可使用下述之水解性矽烷。
式(4)所示之矽含有化合物係可舉例伸甲基雙三甲氧基矽烷、伸甲基雙三氯矽烷、伸甲基雙三乙醯氧基矽烷、伸乙基雙三乙氧基矽烷、伸乙基雙三氯矽烷、伸乙基雙三乙醯氧基矽烷、伸丙基雙三乙氧基矽烷、伸丁基雙三甲氧基矽烷、伸苯基雙三甲氧基矽烷、伸苯基雙三乙氧基矽烷、伸苯基雙甲基二乙氧基矽烷、伸苯基雙甲基二甲氧基矽烷、伸萘基雙三甲氧基矽烷、雙三甲氧基二矽烷、雙三乙氧基二矽烷、雙乙基二乙氧基二矽烷、雙甲基二甲氧基二矽烷等。
本發明中進一步作為水解性矽烷可使用具有碸基之矽烷、或具有磺醯胺基之矽烷,該等例如可例示如下。
作為用於本發明之水解縮合物(聚矽氧烷)之具體例可例示如下。
上述水解性矽烷的水解縮合物(聚有機矽氧烷)可獲得重量平均分子量1000~1000000、或1000~100000的縮合物。該等的分子量係介由GPC分析且聚苯乙烯換算所得的分子量。
GPC之測定條件,可使用例如GPC裝置(商品名HLC-8220GPC、東曹製)、GPC管柱(商品名Shodex KF803L、KF802、KF801、昭和電工製)、管柱溫度為40℃,洗提液(溶出溶劑)為四氫呋喃、流量(流速)為1.0ml/分,標準試樣可使用聚苯乙烯(昭和電工製)進行測定。
烷氧基甲矽烷基、醯氧基甲矽烷基、或鹵化
甲矽烷基之水解時,對於每1莫耳的水解性基,使用0.5~100莫耳的水,較佳為1~10莫耳的水。
又,對於每1莫耳的水解性基可使用0.001~10莫耳的水解觸媒,較佳為0.001~1莫耳的水解觸媒。
進行水解與縮合時的反應溫度,通常為20~80℃。
水解可進行完全水解,亦可進行部分水解。即,水解縮合物中可殘留水解物或單體。
進行水解且使縮合時可使用觸媒。
作為水解觸媒,可舉例金屬螯合化合物、有機酸、無機酸、有機鹼、無機鹼。
作為水解觸媒的金屬螯合化合物,可舉例如三乙氧基.單(乙醯丙酮(acetylacetonato))鈦、三-n-丙氧基.單(乙醯丙酮)鈦、三-i-丙氧基.單(乙醯丙酮)鈦、三-n-丁氧基.單(乙醯丙酮)鈦、三-sec-丁氧基.單(乙醯丙酮)鈦、三-t-丁氧基.單(乙醯丙酮)鈦、二乙氧基.雙(乙醯丙酮)鈦、二-n-丙氧基.雙(乙醯丙酮)鈦、二-i-丙氧基.雙(乙醯丙酮)鈦、二-n-丁氧基.雙(乙醯丙酮)鈦、二-sec-丁氧基.雙(乙醯丙酮)鈦、二-t-丁氧基.雙(乙醯丙酮)鈦、單乙氧基.參(乙醯丙酮)鈦、單-n-丙氧基.參(乙醯丙酮)鈦、單-i-丙氧基.參(乙醯丙酮)鈦、單-n-丁氧基.參(乙醯丙酮)鈦、單-sec-丁氧基.參(乙醯丙酮)鈦、單-t-丁氧基.參(乙醯丙酮)鈦、肆(乙醯丙酮)鈦、三乙氧基.單(乙醯乙酸乙酯(Ethyl Acetoacetate))鈦、三-n-丙氧基.單(乙醯乙
酸乙酯)鈦、三-i-丙氧基.單(乙醯乙酸乙酯)鈦、三-n-丁氧基.單(乙醯乙酸乙酯)鈦、三-sec-丁氧基.單(乙醯乙酸乙酯)鈦、三-t-丁氧基.單(乙醯乙酸乙酯)鈦、二乙氧基.雙(乙醯乙酸乙酯)鈦、二-n-丙氧基.雙(乙醯乙酸乙酯)鈦、二-i-丙氧基.雙(乙醯乙酸乙酯)鈦、二-n-丁氧基.雙(乙醯乙酸乙酯)鈦、二-sec-丁氧基.雙(乙醯乙酸乙酯)鈦、二-t-丁氧基.雙(乙醯乙酸乙酯)鈦、單乙氧基.參(乙醯乙酸乙酯)鈦、單-n-丙氧基.參(乙醯乙酸乙酯)鈦、單-i-丙氧基.參(乙醯乙酸乙酯)鈦、單-n-丁氧基.參(乙醯乙酸乙酯)鈦、單-sec-丁氧基.參(乙醯乙酸乙酯)鈦、單-t-丁氧基.參(乙醯乙酸乙酯)鈦、肆(乙醯乙酸乙酯)鈦、單(乙醯丙酮)參(乙醯乙酸乙酯)鈦、雙(乙醯丙酮)雙(乙醯乙酸乙酯)鈦、參(乙醯丙酮)單(乙醯乙酸乙酯)鈦、等的鈦螯合化合物;三乙氧基.單(乙醯丙酮)鋯、三-n-丙氧基.單(乙醯丙酮)鋯、三-i-丙氧基.單(乙醯丙酮)鋯、三-n-丁氧基.單(乙醯丙酮)鋯、三-sec-丁氧基.單(乙醯丙酮)鋯、三-t-丁氧基.單(乙醯丙酮)鋯、二乙氧基.雙(乙醯丙酮)鋯、二-n-丙氧基.雙(乙醯丙酮)鋯、二-i-丙氧基.雙(乙醯丙酮)鋯、二-n-丁氧基.雙(乙醯丙酮)鋯、二-sec-丁氧基.雙(乙醯丙酮)鋯、二-t-丁氧基.雙(乙醯丙酮)鋯、單乙氧基.參(乙醯丙酮)鋯、單-n-丙氧基.參(乙醯丙酮)鋯、單-i-丙氧基.參(乙醯丙酮)鋯、單-n-丁氧基.參(乙醯丙酮)鋯、單-sec-丁氧基.參(乙醯丙
酮)鋯、單-t-丁氧基.參(乙醯丙酮)鋯、肆(乙醯丙酮)鋯、三乙氧基.單(乙醯乙酸乙酯)鋯、三-n-丙氧基.單(乙醯乙酸乙酯)鋯、三-i-丙氧基.單(乙醯乙酸乙酯)鋯、三-n-丁氧基.單(乙醯乙酸乙酯)鋯、三-sec-丁氧基.單(乙醯乙酸乙酯)鋯、三-t-丁氧基.單(乙醯乙酸乙酯)鋯、二乙氧基.雙(乙醯乙酸乙酯)鋯、二-n-丙氧基.雙(乙醯乙酸乙酯)鋯、二-i-丙氧基.雙(乙醯乙酸乙酯)鋯、二-n-丁氧基.雙(乙醯乙酸乙酯)鋯、二-sec-丁氧基.雙(乙醯乙酸乙酯)鋯、二-t-丁氧基.雙(乙醯乙酸乙酯)鋯、單乙氧基.參(乙醯乙酸乙酯)鋯、單-n-丙氧基.參(乙醯乙酸乙酯)鋯、單-i-丙氧基.參(乙醯乙酸乙酯)鋯、單-n-丁氧基.參(乙醯乙酸乙酯)鋯、單-sec-丁氧基.參(乙醯乙酸乙酯)鋯、單-t-丁氧基.參(乙醯乙酸乙酯)鋯、肆(乙醯乙酸乙酯)鋯、單(乙醯丙酮)參(乙醯乙酸乙酯)鋯、雙(乙醯丙酮)雙(乙醯乙酸乙酯)鋯、參(乙醯丙酮)單(乙醯乙酸乙酯)鋯等的鋯螯合化合物;參(乙醯丙酮)鋁、參(乙醯乙酸乙酯)鋁等的鋁螯合化合物等。
作為水解觸媒的有機酸,可舉例如乙酸、丙酸、丁酸、戊酸、己酸、庚酸、辛酸、壬酸、癸酸、草酸、馬來酸、甲基丙二酸、己二酸、癸二酸、棓酸、丁酸、苯六甲酸、花生四烯酸、2-乙基己酸、油酸、硬脂酸、亞油酸、亞麻酸、水楊酸、苯甲酸、對-胺基苯甲酸、對-甲苯磺酸、苯磺酸、單氯乙酸、二氯乙酸、三氯
乙酸、三氟乙酸、甲酸、丙二酸、磺酸、酞酸、富馬酸、檸檬酸、酒石酸等。
作為水解觸媒的無機酸,可舉例如鹽酸、硝酸、硫酸、氟酸、磷酸等。
作為水解觸媒的有機鹼,可舉例如吡啶、吡咯、哌嗪、吡咯烷、哌啶、甲基吡啶、三甲基胺、三乙基胺、單乙醇胺、二乙醇胺、二甲基單乙醇胺、單甲基二乙醇胺、三乙醇胺、二氮雜雙環辛烷、二氮雜雙環壬烷、二氮雜雙環十一烯、四甲基銨氫氧化物、四乙基銨氫氧化物、四丙基銨氫氧化物、四丁基銨氫氧化物、三甲基苯基銨氫氧化物、苄基三甲基銨氫氧化物、苄基三乙基銨氫氧化物等。
無機鹼,可舉例如氨、氫氧化鈉、氫氧化鉀、氫氧化鋇、氫氧化鈣等。該等的觸媒之中,較佳為金屬螯合物、有機酸、無機酸,亦可同時使用該等的1種或2種以上。
作為水解時所使用的有機溶劑,可舉例如n-戊烷、i-戊烷、n-己烷、i-己烷、n-庚烷、i-庚烷、2,2,4-三甲基戊烷、n-辛烷、i-辛烷、環己烷、甲基環己烷等的脂肪族烴系溶劑;苯、甲苯、二甲苯、乙基苯、三甲基苯、甲基乙基苯、n-丙基苯、i-丙基苯、二乙基苯、i-丁基苯、三乙基苯、二-i-丙基苯、n-戊基萘、三甲基苯等的芳香族烴系溶劑;甲醇、乙醇、n-丙醇、i-丙醇、n-丁醇、i-丁醇、sec-丁醇、t-丁醇、n-戊醇、i-戊醇、2-甲基丁醇、sec-戊醇、t-戊醇、3-甲氧基丁醇、n-己醇、2-甲基
戊醇、sec-己醇、2-乙基丁醇、sec-庚醇、庚醇-3、n-辛醇、2-乙基己醇、sec-辛醇、n-壬醇、2,6-二甲基庚醇-4、n-癸醇、sec-十一烷醇、三甲基壬醇、sec-十四烷醇、sec-十七烷醇、酚、環己醇、甲基環己醇、3,3,5-三甲基環己醇、苄醇、苯基甲基甲醇、雙丙酮醇、甲酚等的一元醇系溶劑;乙二醇、丙二醇、1,3-丁二醇、2,4-戊二醇、2-甲基-2,4-戊二醇、2,5-己二醇、2,4-庚二醇、2-乙基-1,3-己二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、甘油等的多元醇系溶劑;丙酮、甲基乙基酮、甲基-n-丙基酮、甲基-n-丁基酮、二乙基酮、甲基-i-丁基酮、甲基-n-戊基酮、乙基-n-丁基酮、甲基-n-己基酮、二-i-丁基酮、三甲基壬酮、環己酮、甲基環己酮、2,4-戊二酮、丙酮基丙酮、二丙酮醇、苯乙酮、葑酮等的酮系溶劑;乙基醚、i-丙基醚、n-丁基醚、n-己基醚、2-乙基己基醚、環氧乙烷、1,2-環氧丙烷、二氧雜環戊烷、4-甲基二氧雜環戊烷、二噁烷、二甲基二噁烷、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇二乙基醚、乙二醇單-n-丁基醚、乙二醇單-n-己基醚、乙二醇單苯基醚、乙二醇單-2-乙基丁基醚、乙二醇二丁基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇二乙基醚、二乙二醇單-n-丁基醚、二乙二醇二-n-丁基醚、二乙二醇單-n-己基醚、乙氧基三二醇、四乙二醇二-n-丁基醚、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單丙基醚、丙二醇單丁基醚、丙二醇單甲基醚乙酸酯、二丙二醇單甲基醚、二丙二醇單乙基醚、二
丙二醇單丙基醚、二丙二醇單丁基醚、三丙二醇單甲基醚、四氫呋喃、2-甲基四氫呋喃等的醚系溶劑;碳酸二乙酯、乙酸甲酯、乙酸乙酯、γ-丁內酯、γ-戊內酯、乙酸n-丙酯、乙酸i-丙酯、乙酸n-丁酯、乙酸i-丁酯、乙酸sec-丁酯、乙酸n-戊酯、乙酸sec-戊酯、乙酸3-甲氧基丁酯、乙酸甲基戊酯、乙酸2-乙基丁酯、乙酸2-乙基己酯、乙酸苄酯、乙酸環己酯、乙酸甲基環己酯、乙酸n-壬酯、乙醯乙酸甲酯、乙醯乙酸乙酯、乙酸乙二醇單甲基醚、乙酸乙二醇單乙基醚、乙酸二乙二醇單甲基醚、乙酸二乙二醇單乙基醚、乙酸二乙二醇單-n-丁基醚、乙酸丙二醇單甲基醚、乙酸丙二醇單乙基醚、乙酸丙二醇單丙基醚、乙酸丙二醇單丁基醚、乙酸二丙二醇單甲基醚、乙酸二丙二醇單乙基醚、二乙酸乙二醇、乙酸甲氧基三二醇、丙酸乙酯、丙酸n-丁酯、丙酸i-戊酯、草酸二乙酯、草酸二-n-丁酯、乳酸甲酯、乳酸乙酯、乳酸n-丁酯、乳酸n-戊酯、丙二酸二乙酯、酞酸二甲酯、酞酸二乙酯等的酯系溶劑;N-甲基甲醯胺、N,N-二甲基甲醯胺、N,N-二乙基甲醯胺、乙醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、N-甲基丙醯胺、N-甲基吡咯烷酮(NMP)等的含氮系溶劑;二甲基硫、二乙基硫、噻吩、四氫噻吩、二甲亞碸、環丁碸、1,3-丙磺內酯等的含硫系溶劑等。該等的溶劑可使用1種或組合2種以上使用。
特別是就溶液的保存安定性的觀點而言,較佳為丙酮、甲基乙基酮、甲基-n-丙基酮、甲基-n-丁基
酮、二乙基酮、甲基-i-丁基酮、甲基-n-戊基酮、乙基-n-丁基酮、甲基-n-己基酮、二-i-丁基酮、三甲基壬酮、環己酮、甲基環己酮、2,4-戊二酮、丙酮基丙酮、二丙酮醇、苯乙酮、葑酮等的酮系溶劑。
又,作為添加劑可添加雙酚S、或雙酚S衍生物。雙酚S、或雙酚S衍生物,相對於聚有機矽氧烷100質量份為0.01~20質量份、或0.01~10質量份、或0.01~5質量份。
較佳的雙酚S、或雙酚S衍生物可例示如下。
本發明之形成膜組成物係可含有硬化觸媒。硬化觸媒係於使含有由水解縮合物所成之聚有機矽氧烷的塗佈膜加熱硬化時,進行硬化觸媒的作用。
硬化觸媒方面,可使用銨鹽、膦類、鏻鹽、鋶鹽。
(惟,m表示2~11之整數、n表示2~3之整數、R21表示烷基或芳基、YA -表示陰離子)所示之構造的第4級銨鹽、具有式(D-2):[化21]R22R23R24R25N+ YA - 式(D-2)
(惟,m表示2~11之整數、n表示2~3之整數、H表示氫原子、YA -表示陰離子)所示之構造的第3級銨鹽。
又,作為鏻鹽,可舉例式(D-7):
[化26]R31R32R33R34P+ YA - 式(D-7)
(惟,R31、R32、R33、及R34表示烷基或芳基、P表示磷原子、YA -表示陰離子,且R31、R32、R33、及R34各自介由C-P鍵與磷原子鍵結)所示之第4級鏻鹽。
又,鋶鹽方面,可舉例式(D-8):[化27]R35R36R37S+ YA - 式(D-8)
(惟,R35、R36、及R37表示烷基或芳基、S表示硫原子、YA -表示陰離子,且R35、R36、及R37各自以C-S鍵與硫原子鍵結)所示之第3級鋶鹽。
上述的式(D-1)所示之化合物係由胺所衍生的第4級銨鹽,m表示2~11、n表示2~3之整數。此第4級銨鹽之R21表示碳原子數1~18較佳為2~10之烷基或芳基,可舉例如乙基、丙基、丁基等的直鏈烷基,或者苄基、環己基、環己基甲基、二環戊二烯基等。又陰離子(YA -)方面,可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。
上述的式(D-2)所示之化合物係R22R23R24R25N+YA -所示之第4級銨鹽。此第4級銨鹽之R22、R23、R24及R25係碳原子數1~18之烷基或芳基,或包含以Si-C鍵而與矽原子鍵結之矽烷化合物。陰離子
(YA -)方面,可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或者羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。此第4級銨鹽係可以市售品來取得,可例示如四甲基銨乙酸酯、四丁基銨乙酸酯、氯化三乙基苄基銨、溴化三乙基苄基銨、氯化三辛基甲基銨、氯化三丁基苄基銨、氯化三甲基苄基銨等。
上述的式(D-3)所示之化合物係由1-取代咪唑所衍生的第4級銨鹽,R26及R27係碳原子數1~18之烷基或芳基,R26及R27之碳數之總合有7以上為佳。例如,R26可例示如甲基、乙基、丙基、苯基、苄基,R27可例示如苄基、辛基、十八烷基。陰離子(YA -),可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。此化合物雖可以市售品來取得,亦可例如使1-甲基咪唑、1-苄基咪唑等的咪唑系化合物、與溴化苄基、溴化甲基等的鹵素化烷基或鹵素化芳基反應來製造。
上述的式(D-4)所示之化合物係由吡啶所衍生的第4級銨鹽,R28係碳原子數1~18較佳為碳原子數4~18之烷基或芳基,可例示如丁基、辛基、苄基、十二烷基。陰離子(YA -),可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或者是羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。此化合物雖可以市售品來取得,但亦可例如使吡啶與氯化十二烷基、氯化苄基、溴化苄基、溴化甲基、溴化辛基等的
鹵素化烷基或鹵素化芳基反應來製造。此化合物可例示如氯化N-十二烷基吡啶鎓、溴化N-苄基吡啶鎓等。
上述的式(D-5)所示之化合物係由以甲吡啶等所代表之取代吡啶所衍生的第4級銨鹽,R29表示碳原子數1~18較佳為4~18之烷基或芳基,可例示如甲基、辛基、十二烷基、苄基等。R30係碳原子數1~18之烷基或芳基,例如作為由甲吡啶所衍生的第4級銨時,R30係甲基。陰離子(YA -)可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或者羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。此化合物雖可以市售品取得,但可例如使甲吡啶等的取代吡啶與溴化甲基、溴化辛基、氯化十二烷基、氯化苄基、溴化苄基等的鹵素化烷基或鹵素化芳基反應而製造。此化合物可例示如氯化N-苄基甲吡啶鎓、溴化N-苄基甲吡啶鎓、氯化N-十二烷基甲吡啶鎓等。
上述的式(D-6)所示之化合物係由胺所衍生的第3級銨鹽,m表示2~11、n表示2~3之整數。又陰離子(YA -)可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或者羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。可藉由胺與羧酸或苯酚等的弱酸反應來製造。羧酸方面,可舉例甲酸或醋酸,使用甲酸時,陰離子(YA -)為(HCOO-),使用醋酸時,陰離子(YA -)為(CH3COO-)。又使用苯酚時,陰離子(YA -)為(C6H5O-)。
上述的式(D-7)所示之化合物乃具有R31R32R33R34P+YA -所示之構造的第4級鏻鹽。R31、R32、R33、及R34係碳原子數1~18之烷基或芳基,或是以Si-C鍵與矽原子鍵結之矽烷化合物,較佳為R31~R34之4個取代基中的3個為苯基或經取代之苯基,可例示如苯基或甲苯基,且剩下的1個為碳原子數1~18之烷基、芳基或以Si-C鍵與矽原子鍵結之矽烷化合物。又陰離子(YA -)可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或者羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)等的酸基。此化合物可以市售品來取得,可舉例如鹵素化四n-丁基鏻、鹵素化四n-丙基鏻等的鹵素化四烷基鏻、鹵素化三乙基苄基鏻等的鹵素化三烷基苄基鏻、鹵素化三苯基甲基鏻、鹵素化三苯基乙基鏻等的鹵素化三苯基單烷基鏻、鹵素化三苯基苄基鏻、鹵素化四苯基鏻、鹵素化三甲苯基單芳基鏻或者鹵素化三甲苯基單烷基鏻(鹵素原子為氯原子或溴原子)。特別是以鹵素化三苯基甲基鏻、鹵素化三苯基乙基鏻等的鹵素化三苯基單烷基鏻、鹵素化三苯基苄基鏻等的鹵素化三苯基單芳基鏻、鹵素化三甲苯基單苯基鏻等的鹵素化三甲苯基單芳基鏻,或者鹵素化三甲苯基單甲基鏻等的鹵素化三甲苯基單烷基鏻(鹵素原子為氯原子或溴原子)為佳。
又,膦類方面,可舉例甲基膦、乙基膦、丙基膦、異丙基膦、異丁基膦、苯基膦等的第一膦、二甲基膦、二乙基膦、二異丙基膦、二異戊基膦、二苯基膦等的
第二膦、三甲基膦、三乙基膦、三苯基膦、甲基二苯基膦、二甲基苯基膦等的第三膦。
上述的式(D-8)所示之化合物係可使用具有R35R36R37S+YA -所表示之構造的第3級鋶鹽。R35、R36、及R37表示碳原子數1~18之烷基或芳基,或是以Si-C鍵與矽原子鍵結之矽烷化合物,較佳為R35~R37之4個取代基中的3個為苯基或經取代之苯基,可例示如苯基或甲苯基,且剩下的1個為碳原子數1~18之烷基或芳基。又陰離子(YA -)可舉例氯離子(Cl-)、溴離子(Br-)、碘離子(I-)等的鹵素離子,或者羧酸鹽(-COO-)、磺酸鹽(-SO3 -)、醇鹽(-O-)馬來酸陰離子、硝酸陰離子等的酸基。此化合物可以市售品來取得,例如鹵素化三n-丁基鋶、鹵素化三n-丙基鋶等的鹵素化四烷基鋶、鹵素化二乙基苄基鋶等的鹵素化三烷基苄基鋶、鹵素化二苯基甲基鋶、鹵素化二苯基乙基鋶等的鹵素化二苯基單烷基鋶、鹵素化三苯基鋶、(鹵素原子為氯原子或溴原子)、三n-丁基鋶羧酸鹽、三n-丙基鋶羧酸鹽等的四烷基鋶羧酸鹽、二乙基苄基鋶羧酸鹽等的三烷基苄基鋶羧酸鹽、二苯基甲基鋶羧酸鹽、二苯基乙基鋶羧酸鹽等的二苯基單烷基鋶羧酸鹽、三苯基鋶羧酸鹽。又以鹵素化三苯基鋶、三苯基鋶羧酸鹽為佳。
又,本發明中可添加作為硬化觸媒之含氮之矽烷化合物。作為含氮之矽烷化合物係可舉例N-(3-三乙氧基甲矽烷基丙基)-4,5-二羥基咪唑等含咪唑環的矽烷化
合物。
硬化觸媒係相對於聚有機矽氧烷100質量份,為0.01~10質量份、或0.01~5質量份、或0.01~3質量份。
在溶劑中使用觸媒水解後縮合水解性矽烷而所獲得之水解縮合物(聚合物),係可藉由減壓蒸餾等同時去除副生成物之醇或是所使用的水解觸媒或水。又,可藉由中和或離子交換去除用於水解的酸或鹼觸媒。
而且,在本發明之形成膜組成物中,為了含該水解縮合物之形成膜組成物的安定化,可添加安定化用的酸(有機酸)、水、醇或組合的該等。
作為上述有機酸,可舉例如草酸、丙二酸、甲基丙二酸、琥珀酸、馬來酸、蘋果酸、酒石酸、鄰苯二甲酸、檸檬酸、戊二酸、檸檬酸、乳酸、水楊酸等。其中,係以草酸、馬來酸等為佳。添加的有機酸相對於縮合物(聚有機矽氧烷)100質量份,為0.1~5.0質量份。又添加的水可使用純水、超純水、離子交換水等,其添加量係相對於形成膜組成物100質量份,可為1~20質量份。
又添加的醇方面,係以藉由塗佈後之加熱而易飛散者為佳,可舉例如甲醇、乙醇、丙醇、異丙醇、丁醇等。添加的醇,相對於形成膜組成物100質量份,可為1~20質量份。
本發明之形成膜組成物係可包含上述之成分之外,因應所需亦可包含有機聚合物化合物、光酸產生劑
及界面活性劑等。
作為有機聚合物化合物並無特別限制,可使用各種的有機聚合物。可使用縮聚合物及加成聚合聚合物等。可使用聚酯、聚苯乙烯、聚醯亞胺、丙烯酸聚合物、甲基丙烯酸聚合物、聚乙烯基醚、酚酚醛、萘酚酚醛、聚醚、聚醯胺、聚碳酸酯等的加成聚合聚合物及縮聚合物。較佳可使用具有作為吸光部位發揮作用的苯環、萘環、蒽環、三嗪環、喹啉環、及喹喔啉環等的芳香環構造的有機聚合物。
作為如此般的有機聚合物化合物,可舉例如包含丙烯酸苄酯、甲基丙烯酸苄酯、丙烯酸苯酯、丙烯酸萘酯、甲基丙烯酸蒽酯、甲基丙烯酸蒽甲酯、苯乙烯、羥基苯乙烯、苄基乙烯基醚及N-苯基馬來醯亞胺等的加成聚合性單體作為其構造單位的加成聚合聚合物、或酚酚醛及萘酚酚醛等的縮聚合物。
在使用加成聚合聚合物作為有機聚合物化合物時,該聚合物化合物可以是均聚物亦可以是共聚物。在加成聚合聚合物的製造中來使用加成聚合性單體。作為如此般的加成聚合性單體,可舉例丙烯酸酸、甲基丙烯酸、丙烯酸酯化合物、甲基丙烯酸酯化合物、丙烯醯胺化合物、甲基丙烯醯胺化合物、乙烯基化合物、苯乙烯化合物、馬來醯亞胺化合物、馬來酸酐、丙烯腈等。
作為丙烯酸酯化合物,可舉例、丙烯酸甲酯、丙烯酸乙酯、丙烯酸正己酯、丙烯酸異丙酯、丙烯酸
環己酯、丙烯酸苄酯、丙烯酸苯酯、蒽基丙烯酸甲酯、丙烯酸2-羥乙酯、丙烯酸3-氯-2-羥丙酯、丙烯酸2-羥丙酯、丙烯酸2,2,2-三氟乙酯、丙烯酸2,2,2-三氯乙酯、丙烯酸2-溴乙酯、丙烯酸4-羥丁酯、丙烯酸2-甲氧基乙酯、丙烯酸四氫糠酯、2-甲基-2-金剛烷基丙烯酸酯、5-丙烯醯氧基-6-羥基降莰烯-2-羧酸-6-內酯、3-丙烯醯氧基丙基三乙氧基矽烷及丙烯酸縮水甘油酯等。
作為甲基丙烯酸酯化合物,可舉例甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸正己酯、甲基丙烯酸異丙酯、甲基丙烯酸環己酯、甲基丙烯酸苄酯、甲基丙烯酸苯酯、甲基丙烯酸蒽甲酯、甲基丙烯酸2-羥乙酯、甲基丙烯酸2-羥丙酯、甲基丙烯酸2,2,2-三氟乙酯、甲基丙烯酸2,2,2-三氯乙酯、甲基丙烯酸2-溴乙酯、甲基丙烯酸4-羥丁酯、甲基丙烯酸2-甲氧基乙酯、甲基丙烯酸四氫糠酯、甲基丙烯酸2-甲基-2-金剛烷基酯、5-甲基丙烯醯氧基-6-羥基降莰烯-2-羧酸-6-內酯、3-甲基丙烯醯氧基丙基三乙氧基矽烷、甲基丙烯酸縮水甘油酯、甲基丙烯酸2-苯乙酯、甲基丙烯酸羥苯酯及甲基丙烯酸溴苯酯等。
作為丙烯醯胺化合物,可舉例丙烯醯胺、N-甲基丙烯醯胺、N-乙基丙烯醯胺、N-苄基丙烯醯胺、N-苯基丙烯醯胺、N,N-二甲基丙烯醯胺及N-蒽基丙烯醯胺等。
作為甲基丙烯醯胺化合物,可舉例甲基丙烯醯胺、N-甲基甲基丙烯醯胺、N-乙基甲基丙烯醯胺、N-苄
基甲基丙烯醯胺、N-苯基甲基丙烯醯胺、N,N-二甲基甲基丙烯醯胺及N-蒽基丙烯醯胺等。
作為乙烯基化合物,可舉例乙烯基醇、2-羥基乙基乙烯基醚、甲基乙烯基醚、乙基乙烯基醚、苄基乙烯基醚、乙烯基乙酸、乙烯基三甲氧基矽烷、2-氯乙基乙烯基醚、2-甲氧基乙基乙烯基醚、乙烯基萘及乙烯基蒽等。
作為苯乙烯化合物,可舉例苯乙烯、羥基苯乙烯、氯苯乙烯、溴苯乙烯、甲氧基苯乙烯、氰基苯乙烯及乙醯苯乙烯等。
作為馬來醯亞胺化合物,可舉例馬來醯亞胺、N-甲基馬來醯亞胺、N-苯基馬來醯亞胺、N-環己基馬來醯亞胺、N-苄基馬來醯亞胺及N-羥基乙基馬來醯亞胺等。
使用縮聚合物作為聚合物時,作為如此般的聚合物,可舉例如二醇化合物與二羧酸化合物的縮聚合物。作為二醇化合物,可舉例二乙二醇、六亞甲二醇、丁二醇等。作為二羧酸化合物,可舉例琥珀酸、己二酸、對苯二甲酸、馬來酸酐等。又,可舉例如聚均苯四醯亞胺、聚(p-苯二甲醯對苯二胺)、聚對苯二甲酸丁二酯、聚對苯二甲酸乙二酯等的聚酯、聚醯胺、聚醯亞胺。
有機聚合物化合物中含有羥基時,該羥基係可與聚有機矽氧烷形成交聯反應。
作為有機聚合物化合物,可以使用重量平均
分子量例如為1000~1000000、或3000~300000、或5000~200000、或10000~100000的聚合物化合物。
有機聚合物化合物係可僅使用一種、或可組合二種以上來使用。
在使用有機聚合物化合物時,作為該比例,相對於縮合物(聚有機矽氧烷)100質量份為1~200質量份、或5~100質量份、或10~50質量份、或20~30質量份。
本發明之形成膜組成物中可含有酸產生劑。
作為酸產生劑可舉例熱酸產生劑或光酸產生劑。
作為本發明的形成膜組成物中所包含的光酸產生劑,可舉例鎓鹽化合物、磺醯亞胺化合物、及二磺醯基重氮甲烷化合物等。
作為鎓鹽化合物,可舉例如二苯基錪(Iodonium)六氟磷酸酯、二苯基錪三氟甲烷磺酸酯、二苯基錪九氟正丁烷磺酸酯、二苯基錪全氟正辛烷磺酸酯、二苯基錪樟腦磺酸酯、雙(4-tert-丁基苯基)錪樟腦磺酸酯及雙(4-tert-丁基苯基)錪三氟甲烷磺酸酯等錪鹽化合物、及三苯基鋶六氟銻酸酯、三苯基鋶九氟正丁烷磺酸酯、三苯基鋶樟腦磺酸酯及三苯基鋶三氟甲烷磺酸酯等鋶鹽化合物等。
作為磺醯亞胺化合物,可舉例如N-(三氟甲磺醯氧基)琥珀醯亞胺、N-(九氟正丁烷磺醯氧基)琥珀醯亞胺、N-(樟腦磺醯氧基)琥珀醯亞胺及N-(三氟甲磺醯氧基)萘醯亞胺等。
作為二磺醯基重氮甲烷化合物,可舉例如雙(三氟甲基磺醯基)重氮甲烷、雙(環己基磺醯基)重氮甲烷、雙(苯基磺醯基)重氮甲烷、雙(p-甲苯磺醯基)重氮甲烷、雙(2,4-二甲基苯磺醯基)重氮甲烷、及甲基磺醯基-p-甲苯磺醯基重氮甲烷等。
光酸產生劑係可僅使用一種,或可組合二種以上而使用。在使用光酸產生劑時,作為該比例,相對於縮合物(聚有機矽氧烷)100質量份為0.01~5質量份、或0.1~3質量份、或0.5~1質量份。
界面活性劑係將本發明的形成膜組成物作為光微影用阻劑下層形成膜組成物塗佈在基板上時,對於抑制針孔及條痕(stration)等的產生有效。
作為本發明的形成膜組成物中所含的界面活性劑,可舉例如聚氧乙烯月桂醚、聚氧乙烯硬脂基醚、聚氧乙烯鯨蠟醚、聚氧乙烯油基醚等的聚氧乙烯烷基醚類、聚氧乙烯辛基酚醚、聚氧乙烯壬基酚醚等的聚氧乙烯烷基烯丙基醚類、聚氧乙烯.聚氧丙烯嵌段共聚物類、去水山梨醇單月桂酸酯、去水山梨醇單棕櫚酸酯、去水山梨醇單硬脂酸酯、去水山梨醇單油酸酯、去水山梨醇三油酸酯、去水山梨醇三硬脂酸酯等的去水山梨醇脂肪酸酯類、聚氧乙烯去水山梨醇單月桂酸酯、聚氧乙烯去水山梨醇單棕櫚酸酯、聚氧乙烯去水山梨醇單硬脂酸酯、聚氧乙烯去水山梨醇三油酸酯、聚氧乙烯去水山梨醇三硬脂酸酯等的聚氧乙烯去水山梨醇脂肪酸酯類等的非離子系界面活性劑、商品名F-
top EF301、EF303、EF352((股)Tochem Products製)、商品名Megafac F171、F173、R-08、R-30、R-30N、R-40LM(DIC(股)製)、Fluorad FC430、FC431(住友3M(股)製)、商品名Asahi Guard AG710,Surflon S-382、SC101、SC102、SC103、SC104、SC105、SC106(旭硝子(股)製)等的氟界面活性劑、及有機矽氧烷聚合物KP341(信越化學工業(股)製)等。該等的界面活性劑可單獨使用、或亦可二種以上的組合來使用。使用界面活性劑時,作為該比例,相對於縮合物(聚有機矽氧烷)100質量份為0.0001~5質量份、或0.001~1質量份、或0.01~1質量份。
又,本發明的形成膜組成物中可添加流變調整劑及接著輔助劑等。流變調整劑係對於提昇形成膜組成物的流動性有效。接著輔助劑係對於提昇半導體基板或阻劑與下層膜的密著性有效。
作為本發明的形成膜組成物中所使用的溶劑,只要是可溶解前述固體成分即可,無特別限制而可使用。作為如此般的溶劑,可舉例如甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇、丙二醇單甲基醚、丙二醇單乙基醚、甲基異丁基甲醇、丙二醇單丁基醚、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單丙基醚乙酸酯、丙二醇單丁基醚乙酸酯、甲苯、二甲苯、甲基乙基酮、環戊酮、環己酮、2-羥基丙酸乙酯、2-羥基-2-甲基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基
丁酸甲酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸乙酯、3-乙氧基丙酸甲酯、丙酮酸甲酯、丙酮酸乙酯、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丙基醚、乙二醇單丁基醚、乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單丙基醚乙酸酯、乙二醇單丁基醚乙酸酯、二乙二醇二甲基醚、二乙二醇二乙基醚、二乙二醇二丙基醚、二乙二醇二丁基醚丙二醇單甲基醚、丙二醇二甲基醚、丙二醇二乙基醚、丙二醇二丙基醚、丙二醇二丁基醚、乳酸乙酯、乳酸丙酯、乳酸異丙酯、乳酸丁酯、乳酸異丁酯、甲酸甲酯、甲酸乙酯、甲酸丙酯、甲酸異丙酯、甲酸丁酯、甲酸異丁酯、甲酸戊酯、甲酸異戊酯、乙酸甲酯、乙酸乙酯、乙酸戊酯、乙酸異戊酯、乙酸己酯、丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸異丙酯、丙酸丁酯、丙酸異丁酯、丁酸甲酯、丁酸乙酯、丁酸丙酯、丁酸異丙酯、丁酸丁酯、丁酸異丁酯、羥基乙酸乙酯、2-羥基-2-甲基丙酸乙酯、3-甲氧基-2-甲基丙酸甲酯、2-羥基-3-甲基丁酸甲酯、甲氧基乙酸乙酯、乙氧基乙酸乙酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸乙酯、3-甲氧基丁基乙酸酯、3-甲氧基丙基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、3-甲基-3-甲氧基丁基丁酸酯、乙醯乙酸甲酯、甲苯、二甲苯、甲基乙基酮、甲基丙基酮、甲基丁基酮、2-庚酮、3-庚酮、4-庚酮、環己酮、N,N-二甲基甲醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、4-甲基-2-戊醇、及
γ.-丁內酯等。該等的溶劑可單獨、或可二種以上的組合來使用。
本發明中可將形成膜組成物用於光微影步驟之阻劑下層形成膜組成物。
藉由旋轉器、塗佈機等適當的塗佈方法,在用於半導體裝置之製造的基板(例如矽晶圓基板、矽/二氧化矽被覆基板、氮化矽基板、玻璃基板、ITO基板、聚醯亞胺基板、及低介電率材料(low-k材料)被覆基板等)之上,塗佈由本發明之形成膜組成物所成的阻劑下層形成膜組成物,之後藉由燒成形成阻劑下層膜。作為燒成的條件,從燒成溫度80℃~250℃、燒成時間0.3~60分鐘中適當選擇。較佳為燒成溫度150℃~250℃、燒成時間0.5~2分鐘。在此,作為所形成的本發明之阻劑下層膜的膜厚,例如為10~1000nm、或20~500nm、或50~300nm、或100~200nm。
然後,於該阻劑下層膜之上例如形成光阻劑的層。光阻劑的層之形成係藉由周知的方法,即可在光阻劑組成物溶液的下膜膜上塗佈及燒成而進行。作為光阻劑的膜厚,例如為50~10000nm、或100~2000nm、或200~1000nm。
本發明中,在基板上成膜有機下層膜後,可於其上成膜本發明的阻劑下層膜,並進而於其上可被覆光阻劑。據此,即使是光阻劑的圖型寬度變窄,為了防止圖型坍塌故較薄地被覆光阻劑時,也可藉由選擇適當的蝕刻
氣體進行基板的加工。例如可將對於光阻劑而言為非常快的蝕刻速度之氟氣體作為蝕刻氣體加工本發明的阻劑下層膜、或可將對於本發明的阻劑下層膜而言為非常快的蝕刻速度之氧系氣體作為蝕刻氣體加工有機下層膜、進而對於有機下層膜而言為非常快的蝕刻速度之氟氣體作為蝕刻氣體進行基板的加工。
作為在本發明的阻劑下層膜之上所形成的光阻劑,只要能對曝光時所使用的光進行感光者即可,沒有特別限定。可任意使用負型光阻劑及正型光阻劑。例如有:由酚醛樹脂與1,2-萘醌二疊氮磺酸酯所構成的正型光阻劑;由具有藉由酸分解並使鹼溶解速度上昇之基的黏合劑、與光酸產生劑所構成的化學增寬型光阻劑;由藉由酸分解並使光阻劑的鹼溶解速度上昇之低分子化合物、鹼可溶性黏合劑、與光酸產生劑所構成之化學增寬型光阻劑;由具有藉由酸分解使鹼溶解速度上昇之基的黏合劑與藉由酸分解使光阻劑的鹼溶解速度上昇之低分子化合物與光酸產生劑所構成的化學增寬型光阻劑等。可舉例如Shipley公司製商品名APEX-E、住友化學工業(股)製商品名PAR710、及信越化學工業(股)製商品名SEPR430等。又,可舉例如Proc.SPIE,Vol.3999,330-334(2000)、Proc.SPIE,Vol.3999,357-364(2000)、或Proc.SPIE,Vol.3999,365-374(2000)中所記載般的含氟原子聚合物系光阻劑。
然後,透過特定的遮罩進行曝光。曝光時可
使用KrF準分子雷射(波長248nm)、ArF準分子雷射(波長193nm)及F2準分子雷射(波長157nm)。曝光後,因應所需亦可進行曝光後加熱(post exposure bake)。可從加熱溫度70℃~150℃、加熱時間0.3~10分鐘中適當選擇的條件下進行曝光後加熱。
又,本發明中作為阻劑之光阻劑可使用電子束光微影用阻劑、或EUV光微影用阻劑替代。作為電子束阻劑可使用負型、正型皆可。例如有:由酸產生劑,與具有藉由酸分解使鹼溶解速度變化之基的黏合劑所構成的化學增寬型阻劑;由鹼可溶性黏合劑與酸產生劑與藉由酸分解使阻劑的鹼溶解速度變化的低分子化合物所構成的化學增寬型阻劑;由酸產生劑與具有藉由酸分解使鹼溶解速度變化之基的黏合劑,與藉由酸分解並使阻劑之鹼溶解速度變化的低分子化合物所構成的化學增寬型阻劑;由具有藉由電子束分解使鹼溶解速度變化之基的黏合劑所構成的非化學增寬型阻劑;由具有藉由電子束被切斷使鹼溶解速度變化之部位的黏合劑所構成的非化學增寬型阻劑等。即使是使用該等的電子束阻劑,亦與將照射源作為電子束使用光阻劑的情形同樣地可形成阻劑圖型。
又,作為EUV阻劑可使用甲基丙烯酸酯樹脂系阻劑。
然後,藉由顯影液(例如鹼顯影液)進行顯影。據此,例如使用正型光阻劑時,曝光的部分的光阻劑被去除,而形成光阻劑的圖型。
作為顯影液,可舉例如氫氧化鉀、氫氧化鈉等的鹼金屬氫氧化物的水溶液、四甲基氫氧化銨、四乙基氫氧化銨、膽鹼等的四級氫氧化銨的水溶液、乙醇胺、丙基胺、乙二胺等的胺水溶液等的鹼性水溶液。進而,該等的顯影液中亦可添加界面活性劑等。作為顯影的條件從溫度5~50℃、時間10~600秒中適宜選擇。
又,本發明中作為顯影液可使用有機溶劑。曝光後介由顯影液(溶劑)進行顯影。介由此例如使用正型光阻劑時,未曝光的部分之光阻劑被除去,可形成光阻劑之圖型。
作為顯影液,可舉例如乙酸甲酯、乙酸丁酯、乙酸乙酯、乙酸異丙酯、乙酸戊酯、乙酸異戊酯、甲氧基乙酸乙酯、乙氧基乙酸乙酯、丙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單丙基醚乙酸酯、乙二醇單丁基醚乙酸酯、乙二醇單苯基醚乙酸酯、二乙二醇單甲基醚乙酸酯、二乙二醇單丙基醚乙酸酯、二乙二醇單乙基醚乙酸酯、二乙二醇單苯基醚乙酸酯、二乙二醇單丁基醚乙酸酯、2-甲氧基丁基乙酸酯、3-甲氧基丁基乙酸酯、4-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯、3-乙基-3-甲氧基丁基乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單丙基醚乙酸酯、2-乙氧基丁基乙酸酯、4-乙氧基丁基乙酸酯、4-丙氧基丁基乙酸酯、2-甲氧基戊基乙酸酯、3-甲氧基戊基乙酸酯、4-甲氧基戊基乙酸酯、2-甲基-3-甲氧基戊基乙酸酯、3-甲基-3-甲氧基戊基乙酸酯、3-甲基-
4-甲氧基戊基乙酸酯、4-甲基-4-甲氧基戊基乙酸酯、丙二醇二乙酸酯、甲酸甲酯、甲酸乙酯、甲酸丁酯、甲酸丙酯、乳酸乙酯、乳酸丁酯、乳酸丙酯、碳酸乙酯、碳酸丙酯、碳酸丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、丙酮酸丁酯、乙醯乙酸甲酯、乙醯乙酸乙酯、丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸異丙酯、2-羥基丙酸甲酯、2-羥基丙酸乙酯、甲基-3-甲氧基丙酸酯、乙基-3-甲氧基丙酸酯、乙基-3-乙氧基丙酸酯、丙基-3-甲氧基丙酸酯等。進而,該等的顯影液中亦可添加界面活性劑等。作為顯影的條件係從溫度5~50℃、時間10~600秒中適宜選擇。
然後,將如此般之方式所形成的光阻劑(上層)的圖型作為保護膜而去除本發明的阻劑下層膜(中間層),其次,將圖型化後的光阻劑及由本發明的阻劑下層膜(中間層)所構成的膜作為保護膜而去除有機下層膜(下層)。最後,將圖型化後的本發明之阻劑下層膜(中間層)及有機下層膜(下層)作為保護膜進行半導體基板的加工。
首先,藉由乾蝕刻去除本發明之除去光阻劑部分的阻劑下層膜(中間層),使半導體基板露出。對於本發明之阻劑下層膜的乾蝕刻,可使用四氟甲烷(CF4)、全氟環丁烷(C4F8)、全氟丙烷(C3F8)、三氟甲烷、一氧化碳、氬氣、氧氣、氮氣、六氟化硫、二氟甲烷、三氟化氮及三氟化氯、氯氣、三氯化硼及二氯化硼等氣體。對於阻劑下層膜的乾蝕刻,使用鹵素系氣體較
佳。相對於藉由鹵素系氣體的乾蝕刻中,難以去除基本上由有機物質所構成的光阻劑,包含大量矽原子的本發明之阻劑下層膜可藉由鹵素系氣體迅速地去除。因此,可抑制伴隨著阻劑下層膜的乾蝕刻而導致光阻劑的膜厚之減少。然後,其結果以薄膜的形式可使用光阻劑。藉由氟系氣體進行阻劑下層膜之乾蝕刻較佳,作為氟系氣體,可舉例如四氟甲烷(CF4)、全氟環丁烷(C4F8)、全氟丙烷(C3F8)、三氟甲烷、及二氟甲烷(CH2F2)等。
之後,將圖型化後的光阻劑及本發明的阻劑下層膜所構成的膜作為保護膜來進行有機下層膜的去除。有機下層膜(下層)係以藉由氧系氣體的乾蝕刻來進行為較佳。這是由於包含大量矽原子的本發明的阻劑下層膜難以在藉由氧系氣體的乾蝕刻中被去除之緣故。
最後,進行半導體基板的加工。半導體基板的加工係以藉由氟氣體的乾蝕刻來進行為較佳。
作為氟氣體,例如四氟甲烷(CF4)、全氟環丁烷(C4F8)、全氟丙烷(C3F8)、三氟甲烷、及二氟甲烷(CH2F2)等。
又,可以於光阻劑的形成前,於本發明的阻劑下層膜的上層形成有機系的抗反射膜。作為於此所使用的抗反射膜組成物無特別限制,可從迄今為止在光微影製程中所慣用者中任意地選擇來使用,又,可以藉由慣用方法例如用旋轉器、塗佈機的塗佈及燒成來進行抗反射膜的形成。
又,塗佈有由本發明的膜形成組成物構成的阻劑下層形成膜組成物的基板,可以是於該表面上具有以CVD法等所形成的有機系或無機系的抗反射膜,亦可於其上形成由本發明的阻劑下層膜。
介由本發明的阻劑下層形成膜組成物所形成的阻劑下層膜,又依據在光微影製程中所使用的光的波長,而有時對於該光具有吸收之情形。然後,如此般之情形時,可以作為具有防止來自基板反射光之效果的抗反射膜而發揮機能。進而,本發明的阻劑下層膜亦可使用作為如下:用於防止基板與光阻劑之相互作用的層;具有防止光阻劑中所使用的材料或於光阻劑曝光時所生的物質之對基板有不良作用的機能的層;具有防止於加熱燒成時由基板所生成的物質之對上層光阻劑之擴散的機能的層;使因為半導體基板電介質層而導致的光阻劑層的毒化效果減少的阻障層等。
又,介由本發明之阻劑下層膜形成組成物所形成的阻劑下層膜,可適用在雙重金屬鑲嵌製程中所使用的形成通孔的基板,作為可以無間隙地填充孔洞的填埋材來使用。又,亦可作為用於使具有凹凸的半導體基板的表面平坦化的平坦化材來使用。
又,作為EUV阻劑的下層膜,除了作為硬式遮罩的功能以外亦可使用於以下之目的。作為不與EUV阻劑混雜、可防止於EUV曝光(波長13.5nm)時不佳的曝光之光(例如上述的UV或DUV(ArF光、KrF光))的來自
基板或界面的反射之EUV阻劑的下層抗反射膜,可使用上述阻劑下層膜形成組成物。可於EUV阻劑的下層有效的防止反射。使用作為EUV阻劑下層膜時,製程係可與光阻劑用下層膜相同地進行。
又,本發明係關於式(1’)所示之水解性矽烷,[化28]R1 aR2 bSi(R3)4-(a+b) 式(1’)
所示之有機基且介由Si-C鍵或Si-O鍵與矽原子鍵結。R2係烷基、芳基、鹵化烷基、鹵化芳基、烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、胺基、或者具有氰基之有機基、或此等之組合且介由Si-C鍵與矽原子鍵結。R3表示烷氧基、醯氧基、或鹵素基。a表示1之整數、b表示0~2之整數、a+b表示1~3之整數。
式(2’)中,R4表示氫原子、碳數1~10之烷基、或醯基、R5表示氫原子、碳數1~10之烷基、或具有碳數
1~10之烷氧基之碳數1~10之烷基、R6表示碳數1~10之烷基、n1表示0~10之整數、n2表示0或1之整數、n3、n4及n5係整數、n3表示1≦n3≦5、n4表示0≦n4≦4、n5表示0≦n5≦4。並且,k1表示n1為1~10時,表示與矽原子之鍵端、k2表示n1為0及n2為1時,表示與矽原子之鍵端、k3表示n1及n2為0時,表示與矽原子之鍵端。
可選擇以k1部分與矽原子鍵結。
作為式(1’)所示之水解性矽烷化合物係例如例示上述式(1-1)、式(1-2)、式(1-3)、式(1-5)、式(1-6)、式(1-7)、式(1-8)、式(1-10)所表示之化合物。又,可舉例4-(三甲氧基甲矽烷基)苄基乙酸酯、4-(三乙氧基甲矽烷基)苄基乙酸酯等。
式(1’)中n2可表示1之整數的化合物。
在具備有磁攪拌器之1000ml茄形燒瓶中,加入羥苄基醇20.0g、乙醇400.0g,並使其溶解。於此加入濃硫酸
0.32g,並加熱使其迴流20小時。回復到室溫,以氫氧化鈉中和後,用蒸發除去乙醇。移至300ml之三頸燒瓶中,並於此加入此氫氧化鈉6.44g、甲苯40g、N-甲基吡咯烷酮(以下,亦簡稱為NMP)40g,並在油浴中用130℃水除去甲苯同時,使其反應4小時。於此滴入氯甲基三乙氧基矽烷34.28g,以130℃加熱攪拌4小時。將獲得之溶液回復到室溫,移至分液漏斗後加入甲苯120g、水90g洗淨有機層。洗淨係重覆進行3次。接著,於有機層中加入硫酸鎂並使其乾燥後,過濾並用蒸發除去溶劑獲得粗產物。之後,藉由減壓蒸餾進行純化而可獲得作為目標物的化合物1 15g。
1H-NMR(500MHz、DMSO-d6):1.13ppm(t、3H)、1.19ppm(t、9H)、3.43ppm(q、2H)、3.68ppm(s、2H)、3.86ppm(q、6H)、4.36ppm(s、2H)、6.95ppm(d、2H)、7.22ppm(d、2H)
在具備有磁攪拌器之1000ml茄形燒瓶中,加入2,6-雙(羥基甲基)-p-甲酚30.0g、甲醇600.0g,並使其溶解。於此加入濃硫酸0.35g,並加熱使其迴流20小時。回
復到室溫,用氫氧化鈉中和後,並用蒸發除去甲醇。移至300ml之三頸燒瓶中,於此加入氫氧化鈉7.13g、甲苯60g、NMP60g,在油浴中用130℃除去水、甲苯同時,使其反應4小時。於此滴入3-氯丙基三甲氧基矽烷35.54g,用130℃加熱攪拌4小時。將獲得之溶液回復到室溫,移至分液漏斗加入甲苯120g、水90g,洗淨有機層。洗淨係重覆操作3次。接著,於有機層加入硫酸鎂,並使其乾燥後,過濾並用蒸發除去溶劑獲得粗產物。之後,藉由減壓蒸餾進行純化而可獲得作為目標物的化合物2 5g。
1H-NMR(500MHz、DMSO-d6):0.70ppm(t、2H)、1.74ppm(quin、2H)、2.22ppm(s、3H)、3.27ppm(s、6H)、3.47ppm(s、9H)、3.67ppm(t、2H)、4.35ppm(s、4H)、7.07ppm(s、2H)
在具備有磁攪拌器之1000ml茄形燒瓶中,加入香草醇20.0g、甲醇400.0g,並使其溶解。於此加入濃硫酸0.25g,加熱並使其迴流1小時。回復到室溫,用氫氧化鈉中和後,用蒸發除去甲醇。移至300ml之三頸燒瓶,於此加入氫氧化鈉5.19g、甲苯40g、NMP40g,在油浴中用
130℃除去水、甲苯同時,使其反應4小時。於此滴入氯甲基三乙氧基矽烷27.60g,用130℃加熱攪拌4小時。將獲得之溶液回復到室溫,移至分液漏斗並加入甲苯120g、水90g洗淨有機層。洗淨係重覆操作3次。接著,於有機層中加入硫酸鎂並使其乾燥後,過濾並用蒸發除去溶劑獲得粗產物。之後,藉由減壓蒸餾進行純化而可獲得作為目標物的化合物3 15g。
1H-NMR(500MHz、DMSO-d6):1.20ppm(t、9H)、3.26ppm(s、3H)、3.68ppm(s、2H)、3.75ppm(s、3H)、3.87ppm(q、6H)、4.32ppm(s、2H)、6.83ppm(d、1H)、6.89ppm(s、1H)、7.00ppm(d、2H)
在具備有磁攪拌器之300ml之三頸燒瓶中,加入4-氯甲基苯基三甲氧基矽烷(Gelest社製)40g、NMP80g,並在油浴中加熱攪拌至130℃。於此加入甲醇鈉8.76g,用130℃加熱攪拌4小時。將獲得之溶液回復到室溫,移至分液漏斗並加入甲苯200g、水100g洗淨有機層。洗淨係重覆操作3次。接著,於有機層中加入硫酸鎂並使其乾燥後,過濾並用蒸發除去溶劑獲得粗產物。之後,藉由減壓
蒸餾進行純化而可獲得作為目標物的化合物4 5g。
1H-NMR(500MHz、DMSO-d6):3.30ppm(s、3H)、3.53ppm(s、9H)、4.43ppm(s、2H)、7.37ppm(d、2H)、7.56ppm(d、2H)
在1000ml茄形燒瓶中,加入2,6-雙(羥基甲基)-p-甲酚20.00g(0.119mol)、甲醇400g、濃硫酸0.23g(0.002mol),用迴流狀態加熱20小時。回復到室溫,用氫氧化鈉中和後,用蒸發除去甲醇。移至300ml之三頸燒瓶,於此加入甲苯40g、N-甲基吡咯烷酮40g、氫氧化鈉4.99g(0.125mol),在油浴中用130℃除去水、甲苯同時,並使其反應4小時。於此滴入氯甲基三乙氧基矽烷25.30g(0.119mol),用120℃使其反應4小時。反應液係使用、甲苯及丙酮、水進行分液後,介由用蒸發器除去有機溶劑,獲得粗產物。將粗產物,藉由減壓蒸餾,獲得目的物的化合物。
1H-NMR(500MHz、DMSO-d6):1.23ppm(t、9H)、2.26ppm(s、3H)、3.31ppm(s、6H)、3.59ppm(s、2H)、3.89ppm(q、6H)、4.40ppm(s、4H)、7.10ppm(s、2H)
在具備有磁攪拌器之300ml三頸燒瓶中,加入乙酸鈉30.0g、NMP150.0g、在油浴中加熱至130℃。於此滴入(p-氯甲基)苯基三甲氧基矽烷90.25g,並使其加熱4小時。將獲得之溶液回復到室溫,移至分液漏斗加入甲苯300g、水90g洗淨有機層。洗淨係重覆操作3次。接著,在有機層中加入硫酸鎂,使其乾燥後,過濾並用蒸發除去溶劑獲得粗產物。之後,藉由減壓蒸餾進行純化而可獲得作為目標物的4-(三甲氧基甲矽烷基)苄基乙酸酯60g。
1H-NMR(500MHz、DMSO-d6):2.08ppm(s、3H)、3.54ppm(s、9H)、5.10ppm(s、2H)、7.42ppm(d、2H)、7.58ppm(d、2H)
在具備有磁攪拌器之300ml茄形燒瓶中,加入4-溴代-3,5-二甲基苯酚(4-BP)42.0g、四氫呋喃(THF)(脫水)94.6g、吡啶鎓p-甲苯碸酸(PPTS)1.57g,並使其溶解。於此加入乙基乙烯基醚(EV)22.59g,用室溫使其反應20小時。用三乙基胺(TEA)0.63g進行中和,製作反應溶液A(4-(1-乙氧基乙氧基)-2,6-二甲基溴代苯(包含4-EOEO-2,6-DMePhBr))。在備有攪拌子(stirrerchip)之500ml之三頸燒瓶中加入乾燥之鎂粉末6.09g、碘0.53g、四氫呋喃(脫水)189.2g,在油浴中用60℃加熱至碘之色消失為止後,回復到室溫,將反應溶液A用室溫滴入並使其反應2小時,獲得反應溶液B。在備有攪拌子之1000ml的三頸燒瓶中,加入四甲氧基矽烷(TMOS)95.39g、四氫呋喃(脫水)189.2g,並攪拌。用室溫滴入反應溶液B,使其反應2小時。將獲得之溶液用蒸發濃縮後,加入500ml之庚烷溶液,攪拌並過濾。將獲得之濾液濃縮後,藉由減壓蒸餾進行純化而可獲
得作為目標物的(4-(1-乙氧基乙氧基)-2,6-二甲基苯基)三甲氧基矽烷(4-EOEO-2,6-DMePhTMOS)35g。
1H-NMR(500MHz、DMSO-d6):1.06ppm(t、3H)、1.34ppm(d、3H)、2.36ppm(s、6H)、3.47ppm(s、9H)、3.53ppm(multi、2H)、5.46ppm(q、1H)、6.61(s、2H)
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.251g、水0.777g、異丙醇7.014g、四氫呋喃3.846g並攪拌。於此在室溫下加入化合物3 5g(於全矽烷中50莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷4.157g(於全矽烷中50莫耳%),加熱至40℃並使其反應6小時。回復到室溫,加入乙酸乙酯54.942g、水27.471g,用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層並進行溶劑取代。獲得之聚合物作為聚合物1相當於式(3-1),分子量係Mw7200。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.263g、水0.815g、異丙醇7.169g、四氫呋喃3.931g並撹拌。於此在室溫下加入化合物1 5g(於全矽烷中50莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷4.360g(於全矽烷中50莫耳%),加熱至40℃並使
其反應6小時。回復到室溫,加入乙酸乙酯56.157g、水28.08g,用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物2,相當於式(3-2),分子量係Mw12800。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.178g、水0.553g、異丙醇4.18g、四氫呋喃2.290g並攪拌。於此在室溫下加入化合物4 2.5g(於全矽烷中50莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷2.955g(於全矽烷中50莫耳%),加熱至40℃並使其反應6小時。回復到室溫,加入乙酸乙酯32.73g、水16.36g,用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。將獲得之聚合物作為聚合物3,相當於式(3-3),分子量係Mw7300。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.232g、水0.719g、異丙醇6.775g、四氫呋喃7.315g並攪拌。於此在室溫下加入化合物5 5g(於全矽烷中50莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷3.844g(於全矽烷中50莫耳%),加熱至40℃並使
其反應6小時。回復到室溫,加入乙酸乙酯53.06g、水26.53g,用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。將獲得之聚合物作為聚合物4,相當於式(3-4),分子量係Mw2200。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.287g、水0.888g、異丙醇8.001g、四氫呋喃4.387g並攪拌。於此在室溫下加入化合物3 4g(於全矽烷中35莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷4.751g(於全矽烷中50莫耳%)、三甲氧基(3-(菲-9-基)丙基)矽烷1.695g(於全矽烷中15莫耳%),加熱至40℃並使其反應6小時。回復到室溫,加入乙酸乙酯62.67g、水31.34g,用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物5,相當於式(3-5)、分子量係Mw5200。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.287g、水0.888g、異丙醇7.959g、四氫呋喃4.364g並攪拌。於此在室溫下加入化合物3 4g(於全矽烷中35莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基
矽烷4.751g(於全矽烷中50莫耳%)、咔唑丙基三甲氧基矽烷1.640g(於全矽烷中15莫耳%),加熱至40℃並使其反應6小時。回復到室溫,加入乙酸乙酯62.34g、水31.17g,用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚25g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物6,相當於式(3-6),分子量係Mw5000。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.287g、水0.888g、異丙醇7.910g、四氫呋喃7.951g並攪拌。於此在室溫下加入化合物3 4g(於全矽烷中35莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷4.751g(於全矽烷中50莫耳%)、(4-(甲硫基)苯氧基)甲基三乙氧基矽烷1.575g(於全矽烷中15莫耳%),加熱至40℃並使其反應6小時。回復到室溫,加入乙酸乙酯61.96g、水30.98g,並用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物7,相當於式(3-7),分子量係Mw5600。
在100ml之反應燒瓶中,加入35質量%之四乙基銨
水溶液0.287g、水0.888g、異丙醇7.750g、四氫呋喃4.318g並攪拌。於此在室溫下加入化合物3 4g(於全矽烷中35莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷4.751g(於全矽烷中50莫耳%)、8-(3-(三甲氧基甲矽烷基)丙氧基)喹啉1.530g(於全矽烷中15莫耳%),加熱至40℃加熱並使其反應6小時。回復到室溫,加入乙酸乙酯61.96g、水30.98g,並用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚25g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物8,相當於式(3-8),分子量係Mw4300。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.287g、水0.888g、異丙醇8.196g、四氫呋喃4.494g並攪拌。於此在室溫下加入化合物3 4g(於全矽烷中35莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷4.751g(於全矽烷中50莫耳%)、4-甲氧基-N-(3-(三乙氧基甲矽烷基)丙基)苯碸醯胺1.949g(於全矽烷中15莫耳%),並加熱至40℃並反應6小時。回復到室溫,加入乙酸乙酯64.20g、水32.10g,並用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚25g,並濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物9,相當於式(3-9),分子量係
Mw4800。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液8.88g、異丙醇30.72g、四氫呋喃30.72g並攪拌。於此在室溫下加入化合物3 3.62g(於全矽烷中10莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷3.01g(於全矽烷中10莫耳%)、甲基三乙氧基矽烷15.00g(於全矽烷中80莫耳%),並加熱至40℃使其反應4小時。回復到室溫,加入乙酸乙酯129.81g,並用0.2N鹼酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,並濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物10,相當於式(3-10),分子量係Mw1500。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液1.541g、異丙醇7.99g、四氫呋喃7.99g並攪拌。於此在室溫下加入化合物3 0.63g(於全矽烷中10莫耳%)、(3-聯苯氧基)甲基三乙氧基矽烷5.00g(於全矽烷中90莫耳%),加熱至40℃並使其反應4小時。回復到室溫,加入乙酸乙酯33.77g,並用0.2N鹼酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。獲得
之聚合物作為聚合物11,相當於式(3-11),分子量係Mw3500。
在100ml之反應燒瓶中,加入35重量%之四乙基銨水溶液0.34g、超純水1.94g、異丙醇4.13g、四氫呋喃4.13g並攪拌。於此在室溫下加入化合物3 6.89g、乙醯氧基甲基三乙氧基矽烷2.36g、(4-(1-乙氧基乙氧基)-2,6-二甲基苯基)三甲氧基矽烷(化合物7)3.14g,加熱至40度並使其反應4小時。回復到室溫,加入乙酸乙酯62.00g,並用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯30g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物12,相當於式(3-12),分子量係Mw4000。
在100ml之反應燒瓶中,加入35重量%之四乙基銨水溶液0.419g、超純水2.42g、異丙醇5.45g、四氫呋喃5.45g並攪拌。於此在室溫下加入化合物3 8.57g、三乙氧基(3-((四羥基-2H-吡喃-2基)氧基)丙基)矽烷1.53g、(4-(1-乙氧基乙氧基)-2,6-二甲基苯基)三甲氧基矽烷(化合物7)6.26g,加熱至40度並使其反應4小時。回復到室溫,加入乙酸乙酯82.00g,並用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸
丙基乙二醇單甲基醚乙酸酯30g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物13,相當於式(3-13),分子量係Mw2800。
在100ml之反應燒瓶中,加入35重量%之四乙基銨水溶液0.34g、超純水1.94g、異丙醇4.13g、四氫呋喃4.13g並攪拌。於此在室溫下加入化合物3 6.89g、3-環氧丙氧基丙基三甲氧基矽烷2.36g、(4-(1-乙氧基乙氧基)-2,6-二甲基苯基)三甲氧基矽烷(化合物7)3.14g,加熱至40度並使其反應4小時。回復到室溫,加入乙酸乙酯62.00g,並用0.1N乙酸水溶液中和。移至分液漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯30g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物14,相當於式(3-14),分子量係Mw3800。
在100ml之反應燒瓶中,加入35質量%之四乙基銨水溶液0.436g、水1.351g、異丙醇9.362g、四氫呋喃5.133g並攪拌。於此在室溫下加入苯基三甲氧基矽烷5.000g(於全矽烷中50莫耳%)、(4-(1-乙氧基乙氧基)苯基)三甲氧基矽烷7.222g(於全矽烷中50莫耳%),加熱至40℃並使其反應4小時。回復到室溫,加入乙酸乙酯73.33g,並用0.1N乙酸水溶液中和。移至分液
漏斗,並用水洗淨3次後,添加伸丙基乙二醇單甲基醚乙酸酯25g,濃縮有機層進行溶劑取代。獲得之聚合物作為聚合物12,相當於式(4-1),分子量係Mw5200。
依表1所表示的比例,混合上述合成例1~14及比較合成例1獲得之含矽聚合物、酸、硬化觸媒、添加劑、溶劑,介由濾過以0.02μm之氟樹脂製的過濾器,分別調製形成膜組成物之硬化性樹脂組成物的溶液。表1中之聚合物的比例係並非聚合物溶液之質量,表示為聚合物本身之質量。
表1中三苯基鋶三氟甲烷磺酸鹽係TPS105、p-甲苯碸酸吡啶鎓鹽係pPTS、伸丙基乙二醇單甲基醚乙酸酯係PGMEA、伸丙基乙二醇單甲基醚係將PGME、DIC社製非離子性界面活性劑作為R30N(製品名)。水係使用超純水。各添加量係以質量份表示。
依實施例1~15、比較例1~2調製之硬化性樹脂組成物,使用旋轉器,分別塗佈在矽晶圓上。在加熱板上在
215℃下加熱1分鐘,並形成硬化性樹脂組成膜(膜厚0.05μm)。並且,將硬化性樹脂組成膜,使用分光橢圓偏光儀(J.A.Woollam公司製、VUV-VASEVU-302),測定折射率(n值)及光學吸光係數(亦稱為k值、衰減係數)。
將依實施例1~15、比較例1~2調製之硬化性樹脂組成物,使用旋轉器,分別塗佈在矽晶圓上。在加熱板上在215℃下加熱1分鐘,並形成硬化性樹脂組成膜(膜厚0.05μm)。之後,浸漬於伸丙基乙二醇單甲基醚乙酸酯,進行浸漬前後之膜厚測定,5nm以上變化者為×。
使大塞璐(DAICEL)化學工業(股)製、商品名:EHPE3150(40.0g)與9-蒽甲酸(20.3g)與苯甲酸(13.7g)溶解於伸丙基乙二醇單甲基醚(302.0g)後,加入苄基三乙基銨1.5g,使其迴流並反應24小時。將反應後溶液使用離子交換法並純化,獲得聚合物溶液。進行獲得之聚合物(相當於式(5-1))的GPC分析時,用標準聚苯乙烯換算,重量平均分子量係4100。
在獲得之聚合物溶液5g(聚合物之固體成分係16質量%)中,混合四甲氧基甲基甘脲0.2g、吡啶鎓-p-甲苯磺酸鹽0.03g、MEGAFACE[註冊商標]R-30(DIC(股)(舊
大日本油墨化學(股))製、商品名)0.0008g、伸丙基乙二醇單甲基醚6.4g、伸丙基乙二醇單甲基醚乙酸酯4.5g作為溶液。之後,使用孔徑0.10μm之聚伸乙基製微過濾器並濾過,進一步,使用孔徑0.05μm之聚伸乙基製微過濾器並濾過,調製使用在藉由多層膜之光微影步驟的有機阻劑下層形成膜組成物之溶液。
塗佈有機阻劑下層形成膜組成物在矽晶圓上,在加熱板上240℃下烘烤60秒,獲得膜厚200nm之有機阻劑下層膜。於其上,依實施例1~10、實施例13~15及比較例1所調製之硬化性樹脂組成物介由旋轉器塗佈。之後,在215℃之加熱板上烘烤1分,形成硬化樹脂膜(膜厚0.08μm)。於其上,將市售之光阻劑溶液(東京應化工業(股)製、商品名:TDUR-P3435LP)介由旋轉器塗佈,在90℃之加熱板上加熱1分,形成光阻劑膜(膜厚0.25μm)。接著,(股)NIKON製NSR-S205C雷射掃描方式步進電動機(波長248nm、NA:0.75、σ:0.85(CONVENTIONAL)),經由顯影後光阻劑圖型之線寬及該線間之寬為0.16μm之方式設定之遮罩,進行曝
光。之後,在110℃之加熱板上進行1分“曝光後加熱”。冷卻後,使用作為顯影液之2.38%之四甲基銨氫氧化物水溶液顯影。將獲得之圖型介由SEM評估,評估阻劑裙襬形狀。將阻劑形狀為矩形者作為直線,無法獲得圖型時或矩形性毀損時為圖型不良。
在圖1所示之段差基板2上,使用旋轉塗佈機,塗佈實施例1~15、比較例1~2之硬化性樹脂組成物,之後,在215℃之加熱板上介由加熱1分,形成膜厚180nm之硬化性樹脂膜1。前述段差基板係使用由CVD-TEOS所成高300nm、最小寬為20nm之孔圖型。接著,將獲得之基板介由截面SEM,觀察填孔形狀(埋入性),評估填孔特性。表示未發生孔隙之良好的埋入性時為良好。
本發明之形成膜組成物係硬化性為良好,對於段差基板之埋入性亦良好。又,使用於利用多層膜之半導體製造的光微影步驟之阻劑下層膜、或使用於矽硬式遮罩時,在良好的曝光、顯影、蝕刻後,可表示良好的形狀。
可使用作為使用在具有硬化性或埋入性等之良好的效果的形成膜組成物、半導體裝置之光微影步驟的阻劑下層膜。
1‧‧‧硬化性樹脂膜
2‧‧‧段差基板
Claims (9)
- 一種形成膜組成物,其特徵為作為矽烷含有水解性矽烷、其水解物、或其水解縮合物,該水解性矽烷包含式(1)所示之水解性矽烷:R1 aR2 bSi(R3)4-(a+b) 式(1)〔式(1)中、R1係式(2):
- 如請求項1之形成膜組成物,其中該水解性矽烷係式(1)所示之水解性矽烷與其他水解性矽烷之組合,其他水解性矽烷係選自式(3)所示之水解性矽烷及式(4)所示之水解性矽烷所成之群中選出之至少1種之水解性矽烷,R7 cSi(R8)4-c 式(3)(式(3)中、R7係烷基、芳基、鹵化烷基、鹵化芳基、烷氧基烷基、烷氧基芳基、烷氧基烷氧基芳基、烯基、或環氧基、丙烯醯基、甲基丙烯醯基、巰基、磺醯胺基、或是具有氰基之有機基、或此等之組合且介由Si-C鍵與矽原子鍵結、R8表示烷氧基、醯氧基、或鹵素基、c表示0~3之整數)〔R9 dSi(R10)3-d〕2Ye 式(4)(式(4)中、R9係烷基且介由Si-C鍵與矽原子鍵結,R10表示烷氧基、醯氧基、或鹵素基、Y表示伸烷基或伸芳基、d表示0或1之整數、e係0或1之整數)。
- 一種形成膜組成物,其特徵為包含請求項1之形成膜組成物中的式(1)所示的水解性矽烷與請求項2之形成膜組成物中的式(3)所示的水解性矽烷之組合所成的水解性矽烷之水解縮合物作為聚合物。
- 如請求項1之形成膜組成物,其中更進一步包含鹽。
- 如請求項1~請求項4中任1項之形成膜組成物,其中形成膜組成物為用於光微影步驟之阻劑下層形成膜組成物。
- 一種阻劑下層膜,其特徵為由如請求項5之形成膜組成物之硬化物所成,且形成於半導體基板上。
- 一種半導體裝置之製造方法,其特徵係包含下述步驟:在半導體基板上塗佈如請求項5之形成膜組成物並燒成而形成阻劑下層膜之步驟;在前述阻劑下層膜上塗佈阻劑組成物而形成阻劑膜之步驟;曝光前述阻劑膜之步驟;曝光後顯影該阻劑膜而獲得阻劑圖型之步驟;介由前述阻劑圖型而蝕刻阻劑下層膜之步驟;及介由圖型化阻劑與阻劑下層膜而加工半導體基板之步驟。
- 一種半導體裝置之製造方法,其特徵係包含下述步驟:在半導體基板上形成有機下層膜之步驟;在其上塗佈如請求項5之形成膜組成物並燒成而形成阻劑下層膜之步驟;在前述阻劑下層膜上塗佈阻劑組成物而形成阻劑膜之步驟;曝光前述阻劑膜之步驟;曝光後顯影該阻劑膜而獲得阻劑圖型之步驟;介由前述阻劑圖型蝕刻阻劑下層膜之步驟;介由圖型化後的阻劑下層膜而蝕刻有機下層膜之步驟;及介由圖型化後的有機下層膜而加工半導體基板之步驟。
- 一種水解性矽烷,其特徵為式(1’)所示 R1 aR2 bSi(R3)4-(a+b) 式(1’)〔式(1’)中R1係式(2’),
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CN117008420A (zh) * | 2015-06-11 | 2023-11-07 | 日产化学工业株式会社 | 感放射线性组合物 |
JP6603115B2 (ja) * | 2015-11-27 | 2019-11-06 | 信越化学工業株式会社 | ケイ素含有縮合物、ケイ素含有レジスト下層膜形成用組成物、及びパターン形成方法 |
WO2017154545A1 (ja) * | 2016-03-10 | 2017-09-14 | Jsr株式会社 | レジストプロセス用膜形成材料、パターン形成方法及び重合体 |
US11281104B2 (en) | 2017-07-06 | 2022-03-22 | Nissan Chemical Corporation | Alkaline developer soluable silicon-containing resist underlayer film-forming composition |
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WO2019117117A1 (ja) * | 2017-12-13 | 2019-06-20 | 株式会社ニコン | パターン形成方法、トランジスタの製造方法及びパターン形成用部材 |
US20210054231A1 (en) * | 2017-12-20 | 2021-02-25 | Nissan Chemical Corporation | Composition for forming photocurable silicon-containing coating film |
US20210018840A1 (en) * | 2018-03-19 | 2021-01-21 | Nissan Chemical Corporation | Silicon-containing resist underlayer film-forming composition which contains protected phenolic group and nitric acid |
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US20240010870A1 (en) * | 2020-08-20 | 2024-01-11 | Bar-Ilan University | Uv-blocking coatings and anti-fogging and superhydrophobic coatings |
TW202223542A (zh) * | 2020-08-21 | 2022-06-16 | 日商日產化學股份有限公司 | Euv阻劑下層膜形成組成物 |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6025117A (en) * | 1996-12-09 | 2000-02-15 | Kabushiki Kaisha Toshiba | Method of forming a pattern using polysilane |
TW200702910A (en) * | 2005-05-24 | 2007-01-16 | Nissan Chemical Ind Ltd | Underlayer coating forming composition for lithography containing polysilane compound |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3461027A (en) | 1966-02-01 | 1969-08-12 | Dow Corning | Bonding of thermoplastic polymer resins to silane-primed siliceous or metallic materials |
US3427340A (en) * | 1966-02-01 | 1969-02-11 | Dow Corning | Alkoxyalkarylsilanes and condensates thereof |
JP2873855B2 (ja) | 1990-03-26 | 1999-03-24 | 三菱レイヨン株式会社 | 被覆材組成物及びそれを用いた耐摩耗性合成樹脂成形品の製造方法 |
US5648201A (en) * | 1991-04-25 | 1997-07-15 | The United Sates Of America As Represented By The Secretary Of The Navy | Efficient chemistry for selective modification and metallization of substrates |
DE102006022842A1 (de) | 2006-05-16 | 2007-11-22 | Wacker Chemie Ag | Über Methylolgruppen vernetzbare Siliconpolymere |
EP1908472A1 (en) * | 2006-10-02 | 2008-04-09 | Bayer Schering Pharma Aktiengesellschaft | Silicon derivatives for PET imaging |
JP2010100591A (ja) * | 2008-10-27 | 2010-05-06 | Nissan Chem Ind Ltd | ハロゲン置換芳香環含有ポリシロキサン |
JP5538941B2 (ja) | 2010-02-18 | 2014-07-02 | Jsr株式会社 | レジスト下層膜形成方法、パターン形成方法、および組成物、レジスト下層膜形成材料用添加剤、架橋剤並びにレジスト下層膜 |
WO2012039337A1 (ja) | 2010-09-21 | 2012-03-29 | 日産化学工業株式会社 | 保護された脂肪族アルコールを含有する有機基を有するシリコン含有レジスト下層膜形成組成物 |
WO2013022099A1 (ja) | 2011-08-10 | 2013-02-14 | 日産化学工業株式会社 | スルホン構造を有するシリコン含有レジスト下層膜形成組成物 |
SG11201503389VA (en) | 2012-10-31 | 2015-06-29 | Nissan Chemical Ind Ltd | Resist underlayer film forming composition containing silicon having ester group |
US9290623B2 (en) | 2012-12-19 | 2016-03-22 | Nissan Chemical Industries, Ltd. | Composition for forming silicon-containing resist underlayer film having cyclic diester group |
-
2015
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6025117A (en) * | 1996-12-09 | 2000-02-15 | Kabushiki Kaisha Toshiba | Method of forming a pattern using polysilane |
TW200702910A (en) * | 2005-05-24 | 2007-01-16 | Nissan Chemical Ind Ltd | Underlayer coating forming composition for lithography containing polysilane compound |
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