TWI707426B - Pre-alignment device and method - Google Patents

Pre-alignment device and method Download PDF

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TWI707426B
TWI707426B TW108134274A TW108134274A TWI707426B TW I707426 B TWI707426 B TW I707426B TW 108134274 A TW108134274 A TW 108134274A TW 108134274 A TW108134274 A TW 108134274A TW I707426 B TWI707426 B TW I707426B
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aforementioned
suction
claw plate
claw
silicon wafer
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TW108134274A
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TW202013579A (en
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王剛
付紅艷
夏海
王鑫鑫
陳文樞
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大陸商上海微電子裝備(集團)股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

本發明揭示一種預對準裝置及方法,該預對準裝置包含底板、設置在底板上的升降軸、補償軸及光機組件,亦進一步包含旋轉軸組件、爪盤及圓環吸盤。旋轉軸組件包含設置在升降軸上的旋轉軸及與旋轉軸連接的延長杆;爪盤與延長杆連接,其上間隔設置有多個第一吸附組件;圓環吸盤與補償軸連接,其上設置有多個第二吸附組件,圓環吸盤的直徑小於爪盤的分佈圓直徑,且圓環吸盤套設在旋轉軸組件外側,圓環吸盤與旋轉軸組件之間具有間隙,爪盤上設有交接空隙,用於當爪盤及圓環吸盤進行矽片交接時供第二吸附組件穿過。上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,提高大翹曲片預對準精度。相應地,本發明進一步提供一種預對準方法。 The present invention discloses a pre-alignment device and method. The pre-alignment device includes a bottom plate, a lifting shaft, a compensation shaft, and an opto-mechanical component arranged on the bottom plate, and further includes a rotating shaft component, a claw plate, and a ring sucker. The rotating shaft assembly includes a rotating shaft arranged on the lifting shaft and an extension rod connected to the rotating shaft; the claw plate is connected with the extension rod, and a plurality of first suction components are arranged on it at intervals; the ring sucker is connected with the compensation shaft, on which A plurality of second suction components are provided, the diameter of the circular suction cup is smaller than the diameter of the distribution circle of the claw plate, and the circular suction cup is sleeved on the outside of the rotating shaft assembly, there is a gap between the circular suction cup and the rotating shaft assembly, and the claw plate is provided There is a transfer gap, which is used for the second suction component to pass through when the claw disk and the ring sucker are transferred. The above-mentioned pre-alignment device realizes the adsorption, positioning and flattening of the large warped sheet, and improves the pre-alignment accuracy of the large warped sheet. Correspondingly, the present invention further provides a pre-alignment method.

Description

預對準裝置及方法 Pre-alignment device and method

本發明關於積體電路製造領域,例如關於一種預對準裝置及方法。 The present invention relates to the field of integrated circuit manufacturing, for example, to a pre-alignment device and method.

在半導體器件的生產過程中,為確保矽片能夠以一個固定的姿態進行曝光,矽片傳輸過程中需要以較高的定心及定向精度傳送到工件臺上。因當矽片放置在矽片槽中時,其位置及方向都不確定,因此,在矽片傳輸至工件台之前,需要對矽片進行一定精度的預對準,具體地,藉由測量矽片的圓心來確定矽片的當前位置,並藉由測量矽片缺口的方向來確定矽片的方向。 In the production process of semiconductor devices, in order to ensure that the silicon wafer can be exposed in a fixed posture, the silicon wafer needs to be transferred to the workpiece table with high centering and orientation accuracy during the transmission process. Because when the silicon wafer is placed in the wafer slot, its position and direction are uncertain. Therefore, before the silicon wafer is transferred to the work stage, the silicon wafer needs to be pre-aligned with a certain precision. Specifically, by measuring the silicon wafer The center of the wafer is used to determine the current position of the wafer, and the direction of the wafer is determined by measuring the direction of the wafer gap.

隨著半導體行業的發展,矽片的種類越來越多,為滿足翹曲片、超薄片等多種工藝片的定位需求,中國專利公開號CN105336654A的發明專利揭示一種適應多種工藝類型矽片的預對準裝置,該裝置藉由設置陶瓷吸盤及半月吸盤對矽片進行多點吸附定位以滿足不同類型工藝片的定位需求,能夠適應多種工藝吸盤的預對準。然而,近年來,大翹曲片的出現對預對準設備的適應性提出新的要求。在對大翹曲片進行預對準時,為了確保預對準的精度,需要對翹曲片進行平整化處理,而為了實現翹曲片平整化處理,需要在靠近翹曲片邊緣的區域吸附翹曲片以將翹曲片拉 平,這樣即需要增大陶瓷吸盤的分佈圓直徑,而上述裝置的半月吸盤圍繞在陶瓷吸盤外側設置,如果增大陶瓷吸盤的分佈圓直徑,為了避免陶瓷吸盤及半月吸盤發生干涉,亦需要相應增加半月吸盤的分佈圓直徑。但是,如果半月吸盤的分佈圓直徑增加,會使得半月吸盤的分佈圓直徑大於翹曲片的直徑,導致出現半月吸盤位於翹曲片分佈區域外側,無法對翹曲片進行吸附的情況發生。因此,先前的矽片預對準裝置無法滿足大翹曲片的預對準定位需求。 With the development of the semiconductor industry, there are more and more types of silicon wafers. In order to meet the positioning needs of warped wafers, ultra-thin wafers and other process wafers, the invention patent of China Patent Publication No. CN105336654A discloses a kind of silicon wafers suitable for multiple process types. Pre-alignment device. This device uses ceramic suction cups and half-moon suction cups to perform multi-point adsorption and positioning of silicon wafers to meet the positioning requirements of different types of process wafers, and can adapt to pre-alignment of various process suction cups. However, in recent years, the emergence of large warped sheets has put forward new requirements for the adaptability of pre-alignment equipment. When pre-aligning the large warped sheet, in order to ensure the accuracy of the pre-alignment, the warped sheet needs to be flattened, and in order to realize the flattening process of the warped sheet, the area near the edge of the warped sheet needs to be adsorbed and warped The curved piece is used to flatten the warped piece, so that the diameter of the distribution circle of the ceramic suction cup needs to be increased. The half moon suction cup of the above device is arranged around the outside of the ceramic suction cup. If the distribution circle diameter of the ceramic suction cup is increased, in order to avoid the ceramic suction cup and the half moon When the suction cup interferes, the diameter of the distribution circle of the half moon suction cup needs to be increased accordingly. However, if the diameter of the distribution circle of the half-moon suction cup increases, the diameter of the distribution circle of the half-moon suction cup will be larger than the diameter of the warped sheet, resulting in a situation where the half-moon suction cup is located outside the distribution area of the warped sheet and cannot absorb the warped sheet. Therefore, the prior silicon wafer pre-alignment device cannot meet the pre-alignment and positioning requirements of large warped wafers.

先前的矽片預對準裝置無法滿足大翹曲片的預對準定位需求。本發明實施例的目的在於提出一種預對準裝置及方法,能夠對大翹曲片進行吸附定位及平整化處理,滿足大翹曲片的預對準定位需求,提高大翹曲片的預對準精度。 Previous silicon wafer pre-alignment devices cannot meet the pre-alignment and positioning requirements of large warped wafers. The purpose of the embodiments of the present invention is to provide a pre-alignment device and method that can perform adsorption positioning and flattening processing on large warped sheets, meet the pre-alignment and positioning requirements of large warped sheets, and improve the pre-alignment of large warped sheets. Quasi-precision.

為達此目的,一方面,本發明實施例採用下列技術手段: To achieve this goal, on the one hand, the embodiments of the present invention adopt the following technical means:

一種預對準裝置,包含:底板、設置在底板上的升降軸、補償軸及光機組件,其進一步包含: A pre-alignment device includes: a bottom plate, a lifting shaft, a compensation shaft and an optomechanical component arranged on the bottom plate, and further includes:

旋轉軸組件,包含旋轉軸及延長杆,旋轉軸設置在升降軸上,延長杆的一端與旋轉軸連接; The rotating shaft assembly includes a rotating shaft and an extension rod, the rotating shaft is arranged on the lifting shaft, and one end of the extension rod is connected with the rotating shaft;

爪盤,連接至延長杆的另一端,爪盤上沿周向間隔設置有多個第一吸 附組件; The claw plate is connected to the other end of the extension rod, and a plurality of first suction components are arranged on the claw plate at intervals in the circumferential direction;

圓環吸盤,與補償軸連接,其上設置有多個第二吸附組件,圓環吸盤的直徑小於爪盤的分佈圓直徑,且圓環吸盤套設在旋轉軸組件外側,圓環吸盤與旋轉軸組件之間具有間隙; The ring sucker is connected to the compensation shaft, and a plurality of second suction components are arranged on it. The diameter of the ring sucker is smaller than the diameter of the distribution circle of the claw plate, and the ring sucker is sleeved on the outside of the rotating shaft assembly. There is a gap between the shaft components;

旋轉軸組件能夠帶動爪盤旋轉,升降軸能夠帶動爪盤沿垂直方向做升降運動,補償軸能夠帶動圓環吸盤沿水平方向運動,爪盤上設有交接空隙,用於當爪盤及圓環吸盤進行矽片交接時供第二吸附組件穿過。 The rotating shaft assembly can drive the claw plate to rotate, the lifting shaft can drive the claw plate to move up and down in the vertical direction, and the compensation shaft can drive the ring sucker to move in the horizontal direction. The claw plate is provided with a connection gap for the claw plate and the ring The second suction component passes through the suction cup when the silicon wafer is transferred.

在一實施例中,每個第一吸附組件及/或每個第二吸附組件均包含剛性支柱及橡膠吸盤,剛性支柱上開設有第一通氣孔,橡膠吸盤與剛性支柱連接,且橡膠吸盤與第一通氣孔連通。 In an embodiment, each first suction component and/or each second suction component includes a rigid support and a rubber suction cup, the rigid support is provided with a first vent hole, the rubber suction cup is connected to the rigid support, and the rubber suction cup is connected to the rigid support The first vent is connected.

在一實施例中,每個第一吸附組件及/或每個第二吸附組件均包含:剛性支柱、彈性件、彈性支柱及橡膠吸盤,彈性件設置在剛性支柱內部,彈性支柱上開設有第二通氣孔,彈性支柱一端設置在剛性支柱內與彈性件套接,另一端設置在剛性支柱外部與橡膠吸盤連接,橡膠吸盤與第二通氣孔連通。 In one embodiment, each first suction component and/or each second suction component includes: a rigid pillar, an elastic member, an elastic pillar, and a rubber suction cup. The elastic member is arranged inside the rigid pillar, and the elastic pillar is provided with a first Two vents, one end of the elastic support is arranged in the rigid support to be sleeved with the elastic member, and the other end is arranged outside the rigid support to be connected to the rubber suction cup, and the rubber suction cup is connected to the second ventilation hole.

在一實施例中,爪盤上進一步設置有多個第三吸附組件,每個前述第三吸附組件的中心與對應的前述第一吸附組件的中心及前述爪盤的中心共線,且前述第三吸附組件設置在對應的前述第一吸附組件及前述爪盤的中心之間。 In an embodiment, a plurality of third suction components are further provided on the claw plate, and the center of each third suction component is collinear with the center of the corresponding first suction component and the center of the claw plate, and the first suction component The three suction components are arranged between the corresponding first suction component and the center of the claw plate.

在一實施例中,每個第三吸附組件包含剛性支柱及橡膠吸盤,剛性支柱上開設有第一通氣孔,橡膠吸盤與剛性支柱連接,且橡膠吸盤與第一通氣孔連通。 In one embodiment, each third suction component includes a rigid pillar and a rubber suction cup, the rigid pillar is provided with a first vent hole, the rubber suction cup is connected to the rigid pillar, and the rubber suction cup communicates with the first vent hole.

在一實施例中,每個第三吸附組件包含:剛性支柱、彈性件、彈性支柱及橡膠吸盤,彈性件設置在剛性支柱內部,彈性支柱上開設有第二通氣孔,彈性支柱一端設置在剛性支柱內與彈性件套接,另一端設置在剛性支柱外部與橡膠吸盤連接,橡膠吸盤與第二通氣孔連通。 In one embodiment, each third suction component includes: a rigid support, an elastic member, an elastic support, and a rubber suction cup. The elastic member is arranged inside the rigid support, the elastic support is provided with a second vent hole, and one end of the elastic support is set on the rigid The inside of the pillar is sleeved with the elastic member, and the other end is arranged outside the rigid pillar to connect with a rubber suction cup, and the rubber suction cup communicates with the second vent hole.

在一實施例中,預對準裝置進一步包含位置調整組件,位置調整組件包含滑軌、滑塊及驅動件。滑軌與底板連接,滑塊可在滑軌上滑動,且光機組件安裝在滑塊上,驅動件與滑塊連接。 In one embodiment, the pre-alignment device further includes a position adjustment component, and the position adjustment component includes a sliding rail, a sliding block, and a driving member. The sliding rail is connected with the bottom plate, the sliding block can slide on the sliding rail, and the optical machine component is installed on the sliding block, and the driving part is connected with the sliding block.

在一實施例中,預對準裝置進一步包含氣滑環,氣滑環套設在延長杆內側,且氣滑環分別與多個第一吸附組件及多個第三吸附組件連通。 In one embodiment, the pre-alignment device further includes an air slip ring, the air slip ring is sleeved inside the extension rod, and the air slip ring is respectively communicated with the plurality of first suction components and the plurality of third suction components.

在一實施例中,預對準裝置進一步包含感測器及擋片,感測器設置在圓環吸盤或第二吸附組件上,擋片設置在爪盤上;或,感測器設置在爪盤上,擋片設置在圓環吸盤或第二吸附組件上;當多個第一吸附組件與多個第二吸附組件沿徑向位置重疊時,擋片觸發感測器。 In one embodiment, the pre-alignment device further includes a sensor and a stopper, the sensor is arranged on the ring suction cup or the second suction assembly, and the stopper is arranged on the claw plate; or, the sensor is arranged on the claw On the disk, the baffle is arranged on the ring suction cup or the second suction assembly; when the plurality of first suction components and the plurality of second suction components overlap in the radial position, the baffle triggers the sensor.

在一實施例中,爪盤至少包含多個爪杆,多個爪杆由爪盤中心向外發散分佈,相鄰的所爪杆之間形成交接空隙,每個第一吸附組件設置在對應的爪杆的端部。 In an embodiment, the claw plate includes at least a plurality of claw rods, and the plurality of claw rods are distributed outwardly from the center of the claw plate, and a communication gap is formed between the adjacent claw rods, and each first suction component is arranged in a corresponding The end of the claw rod.

在一實施例中,相鄰的兩個爪杆之間設置有加強筋。 In an embodiment, a reinforcing rib is provided between two adjacent claw rods.

在一實施例中,爪盤的中心位置處設置有剛性支撐塊。 In an embodiment, a rigid support block is provided at the center of the claw plate.

在一實施例中,當爪盤與圓環吸盤進行矽片交接時,若多個第一吸附組件與多個第二吸附組件沿徑向位置重疊,旋轉軸帶動爪盤旋轉預設角度使多個第一吸附組件與多個第二吸附組件的位置錯開,其中, 預設角度小於相鄰的兩個第一吸附組件之間的夾角的1/3倍。 In one embodiment, when the claw plate and the ring sucker are connected to the silicon wafer, if the plurality of first suction components and the plurality of second suction components overlap in the radial position, the rotating shaft drives the claw plate to rotate by a predetermined angle so that the The positions of the first suction components and the plurality of second suction components are staggered, wherein the preset angle is less than 1/3 of the included angle between two adjacent first suction components.

另一方面,本發明實施例進一步提供一種基於上述任一項的預對準裝置的預對準方法,包含下列步驟: On the other hand, an embodiment of the present invention further provides a pre-alignment method based on any one of the above-mentioned pre-alignment devices, including the following steps:

爪盤接收矽片; The claw plate receives the silicon wafer;

旋轉軸帶動爪盤旋轉,光機組件採集矽片邊緣訊息,並將採集到的矽片邊緣訊息發送至控制器; The rotating shaft drives the claw plate to rotate, and the opto-mechanical component collects the edge information of the silicon wafer and sends the collected edge information of the silicon wafer to the controller;

控制器根據接收到的矽片邊緣訊息計算矽片的偏心量,並根據偏心量控制旋轉軸旋轉,將矽片偏心量最大的方向旋轉至補償軸運動方向; The controller calculates the eccentricity of the silicon wafer according to the received silicon edge information, and controls the rotation of the rotating shaft according to the eccentricity, and rotates the direction of the largest silicon eccentricity to the compensation axis movement direction;

升降軸下降至交接工位,矽片由爪盤交接至圓環吸盤; The lifting shaft is lowered to the transfer station, and the silicon wafer is transferred from the claw plate to the ring suction cup;

升降軸帶動爪盤繼續下降至交接低位,補償軸帶動圓環吸盤運動,補償矽片的偏心量; The lifting shaft drives the claw plate to continue to descend to the transfer low position, and the compensation shaft drives the ring sucker to move to compensate for the eccentricity of the silicon wafer;

升降軸帶動爪盤上升至交接工位,矽片由圓環吸盤交接至爪盤上; The lifting shaft drives the claw plate up to the transfer station, and the silicon wafer is transferred from the ring sucker to the claw plate;

升降軸帶動爪盤繼續上升至預對準工位,旋轉軸帶動爪盤旋轉,光機組件採集矽片缺口訊息及矽片邊緣訊息,並將採集到的矽片缺口訊息及矽片邊緣訊息發送至控制器; The lifting shaft drives the claw plate to continue to rise to the pre-alignment position, and the rotating shaft drives the claw plate to rotate. The opto-mechanical component collects silicon chip gap information and silicon chip edge information, and sends the collected silicon chip gap information and silicon chip edge information To the controller

控制器根據矽片缺口訊息及矽片邊緣訊息計算矽片的偏心餘量,當矽片的偏心餘量滿足預設條件時,旋轉軸轉動將矽片的缺口旋轉至光機組件下方; The controller calculates the eccentricity margin of the silicon wafer according to the wafer gap information and the wafer edge information. When the eccentricity margin of the silicon wafer meets the preset conditions, the rotation axis rotates to rotate the wafer gap below the optomechanical component;

旋轉軸小角度往返旋轉,光機組件採集矽片缺口訊息並發送至控制器,控制器根據矽片缺口訊息計算得到矽片缺口位置誤差,旋轉軸根據補償缺口位置誤差旋轉,完成矽片的定向。 The rotation axis rotates back and forth at a small angle. The opto-mechanical component collects the wafer gap information and sends it to the controller. The controller calculates the wafer gap position error according to the wafer gap information. The rotation axis rotates according to the compensation gap position error to complete the wafer orientation .

在一實施例中,升降軸下降至交接工位,矽片由爪盤交接 至圓環吸盤的步驟之前包含:當第一吸附組件與第二吸附組件沿徑向位置重疊時,旋轉軸帶動爪盤旋轉預設角度使第一吸附組件與第二吸附組件的位置錯開; In one embodiment, the lifting shaft is lowered to the transfer station, and the silicon wafer is transferred from the claw plate to the ring sucker before the step includes: when the first suction component and the second suction component overlap in the radial position, the rotating shaft drives the claw The disc rotates at a preset angle so that the positions of the first suction component and the second suction component are staggered;

升降軸帶動爪盤繼續下降至交接低位的步驟之後包含:旋轉軸帶動爪盤繼續同向旋轉預設角度; After the step that the lifting shaft drives the claw plate to continue to descend to the transfer low position includes: the rotating shaft drives the claw plate to continue to rotate in the same direction by a preset angle;

升降軸帶動爪盤上升至交接工位,矽片由圓環吸盤交接至爪盤上的步驟之後包含:旋轉軸帶動爪盤反向旋轉預設角度。 The lifting shaft drives the claw plate up to the transfer station, and the step of transferring the silicon wafer from the ring sucker to the claw plate includes: the rotating shaft drives the claw plate to reversely rotate a preset angle.

在一實施例中,預設角度小於相鄰的兩個第一吸附組件之間的夾角的1/3倍。 In one embodiment, the preset angle is less than 1/3 of the included angle between two adjacent first suction components.

在一實施例中,爪盤接收矽片的步驟包含:片叉將矽片放置在爪盤上,第一吸附組件開真空,吸附矽片。 In one embodiment, the step of receiving the silicon wafer by the claw plate includes: placing the silicon wafer on the claw plate by the wafer fork, and the first suction component is vacuumed to adsorb the silicon wafer.

在一實施例中,爪盤接收矽片的步驟包含: In one embodiment, the step of receiving the silicon wafer by the claw plate includes:

升降軸帶動爪盤下降至上片工位,片叉將矽片放置在圓環吸盤上,第二吸附組件開真空,吸附矽片; The lifting shaft drives the claw plate down to the loading station, the wafer fork places the silicon wafer on the circular suction cup, and the second suction assembly opens the vacuum to adsorb the silicon wafer;

升降軸帶動爪盤上升至交接工位,第一吸附組件開真空,吸附矽片,第二吸附組件關真空,升降軸帶動爪盤上升至預對準工位。 The lifting shaft drives the claw plate up to the transfer station, the first suction component opens the vacuum to suck the silicon wafer, the second suction component closes the vacuum, and the lifting shaft drives the claw plate to the pre-alignment station.

在其中一個實施例中,爪盤接收矽片的步驟之前,包含下列步驟:根據矽片的尺寸調節位置調整組件,調整光機組件至與矽片尺寸對應的工位。 In one of the embodiments, the step of receiving the silicon wafer by the claw plate includes the following steps: adjusting the position adjustment component according to the size of the silicon wafer, and adjusting the opto-mechanical component to a position corresponding to the size of the silicon wafer.

上述的預對準裝置包含爪盤及圓環吸盤,圓環吸盤的直徑小於爪盤的分佈圓直徑,旋轉軸上設置有延長杆,爪盤與延長杆連接,圓環吸盤套設在旋轉軸組件外側,且圓環吸盤與旋轉軸組件之間具有間隙。 爪盤的分佈圓直徑大於圓環吸盤的直徑,設置在爪盤上的第一吸附組件能夠在大翹曲片的邊緣區域吸附大翹曲片,以拉平大翹曲片,從而實現大翹曲片平正化處理。同時,爪盤及圓環吸盤進行矽片交接時,爪盤沿垂直方向下降,第一吸附組件與第二吸附組件相互錯開設置,第二吸附組件位於相鄰的兩個第一吸附組件之間的交接空隙內,第一吸附組件及第二吸附組件互不干涉。並且,圓環吸盤與旋轉軸組件之間具有間隙,為圓環吸盤水平運動提供運動空間,圓環吸盤隨補償軸做水平運動時亦不會與旋轉軸組件發生干涉。因此,與先前的矽片對準裝置相比,上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,能夠滿足大翹曲片的預對準定位需求,提高大翹曲片預對準精度。 The above-mentioned pre-alignment device includes a claw plate and a ring suction cup. The diameter of the ring suction cup is smaller than the diameter of the distribution circle of the claw plate. An extension rod is arranged on the rotating shaft. The claw plate is connected with the extension rod. The ring suction cup is sleeved on the rotating shaft. There is a gap between the ring sucker and the rotating shaft assembly on the outside of the assembly. The diameter of the distribution circle of the claw plate is larger than the diameter of the ring sucker, and the first suction component arranged on the claw plate can absorb the large warping piece at the edge area of the large warping piece to flatten the large warping piece, thereby achieving large warpage Flattening the film. At the same time, when the claw plate and the circular suction cup are connected to the silicon wafer, the claw plate is lowered in the vertical direction, the first suction assembly and the second suction assembly are staggered with each other, and the second suction assembly is located between two adjacent first suction assemblies The first suction component and the second suction component do not interfere with each other in the connecting gap. In addition, there is a gap between the ring sucker and the rotating shaft assembly, which provides movement space for the horizontal movement of the ring sucker, and the ring sucker will not interfere with the rotating shaft assembly when it moves horizontally with the compensation shaft. Therefore, compared with the previous silicon wafer alignment device, the above-mentioned pre-alignment device realizes the adsorption positioning and flattening treatment of the large warped sheet, which can meet the pre-aligned positioning requirements of the large warped sheet and improve the large warpage Film pre-alignment accuracy.

基於上述預對準裝置的預對準方法能夠對大翹曲片進行吸附定位及平整化處理,提高大翹曲片預對準精度。 The pre-alignment method based on the above-mentioned pre-alignment device can perform adsorption positioning and flattening treatment on the large warped sheet, and improve the pre-alignment accuracy of the large warped sheet.

本發明實施例的目的在於提出一種預對準裝置及方法,能夠對大翹曲片進行吸附定位及平整化處理,滿足大翹曲片的預對準定位需求,提高大翹曲片的預對準精度。 The purpose of the embodiments of the present invention is to provide a pre-alignment device and method that can perform adsorption positioning and flattening processing on large warped sheets, meet the pre-alignment and positioning requirements of large warped sheets, and improve the pre-alignment of large warped sheets. Quasi-precision.

10‧‧‧底板 10‧‧‧Bottom plate

20‧‧‧升降軸 20‧‧‧Lift shaft

30‧‧‧補償軸 30‧‧‧Compensation axis

40‧‧‧光機組件 40‧‧‧Optical Machine Components

41‧‧‧光機支撐座 41‧‧‧Optical Machine Support

42‧‧‧第一光源 42‧‧‧First light source

43‧‧‧鏡頭 43‧‧‧Lens

44‧‧‧CCD相機 44‧‧‧CCD camera

45‧‧‧第二光源 45‧‧‧Second light source

50‧‧‧旋轉軸組件 50‧‧‧Rotating shaft assembly

51‧‧‧旋轉軸 51‧‧‧Rotation axis

52‧‧‧延長杆 52‧‧‧Extension Rod

60‧‧‧爪盤 60‧‧‧Claw plate

61‧‧‧爪杆 61‧‧‧Claw lever

62‧‧‧第一吸附組件 62‧‧‧First suction assembly

63‧‧‧氣管接頭 63‧‧‧Air pipe joint

64‧‧‧剛性支撐塊 64‧‧‧Rigid support block

65‧‧‧第三吸附組件 65‧‧‧Third suction assembly

66‧‧‧加強筋 66‧‧‧Reinforcing rib

70‧‧‧圓環吸盤 70‧‧‧Ring Suction Cup

71‧‧‧第二吸附組件 71‧‧‧Second suction assembly

80‧‧‧位置調整組件 80‧‧‧Position adjustment components

81‧‧‧滑軌 81‧‧‧Slide rail

82‧‧‧滑塊 82‧‧‧Slider

83‧‧‧驅動件 83‧‧‧Drive

200‧‧‧感測器 200‧‧‧Sensor

300‧‧‧擋片 300‧‧‧Block

621‧‧‧剛性支柱 621‧‧‧rigid pillar

622‧‧‧彈性件 622‧‧‧Elastic Parts

623‧‧‧彈性支柱 623‧‧‧Elastic pillar

624‧‧‧橡膠吸盤 624‧‧‧Rubber Suction Cup

625‧‧‧第二通氣孔 625‧‧‧Second vent

626‧‧‧第一通氣孔 626‧‧‧First vent

【圖1】為本發明一實施例中預對準裝置的結構示意圖。 [Figure 1] is a schematic structural diagram of a pre-alignment device in an embodiment of the present invention.

【圖2】為本發明一實施例中第一吸附組件與氣管接頭連接的結構剖視圖。 [Figure 2] is a cross-sectional view of the connection between the first suction component and the tracheal joint in an embodiment of the present invention.

【圖3】為本發明又一實施例中預對準裝置的結構示意圖。 [Fig. 3] is a schematic structural diagram of a pre-alignment device in another embodiment of the present invention.

【圖4】為本發明又一實施例中第一吸附組件的結構剖視圖。 [Figure 4] is a cross-sectional view of the structure of the first suction component in another embodiment of the present invention.

【圖5】為本發明另一實施例中預對準裝置的結構示意圖。 [Fig. 5] is a schematic structural diagram of a pre-alignment device in another embodiment of the present invention.

【圖6】為本發明一實施例中預對準裝置的方法流程圖。 [Figure 6] is a flow chart of a method of pre-aligning a device in an embodiment of the present invention.

下面結合圖式並藉由具體實施方式來進一步說明本發明的技術手段。 The technical means of the present invention will be further described below in conjunction with the drawings and specific implementations.

在本發明的描述中,需要理解的是,詞彙「上」、「下」、「前」、「後」、「左」、「右」、「垂直」、「水平」、「頂」、「底」、「內」、「外」等指示的方位或位置關係為基於圖式所示的方位或位置關係,僅是為了便於描述本發明及簡化描述,而不是指示或暗示所指的裝置或組件必須具有特定的方位、以特定的方位構造及操作,因此不能理解為對本發明的限制。 In the description of the present invention, it should be understood that the words "up", "down", "front", "rear", "left", "right", "vertical", "horizontal", "top", " The orientation or positional relationship indicated by "bottom", "inner", "outer", etc. are based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply the device or The components must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present invention.

請參閱圖1,一實施例的預對準裝置包含:底板10、設置在底板10上的升降軸20、補償軸30及光機組件40,進一步包含旋轉軸組件50、爪盤60及圓環吸盤70。旋轉軸組件50包含旋轉軸51及延長杆52,旋轉軸51設置在升降軸20上,延長杆52的一端與旋轉軸51連接;爪盤60連接至延長杆52的另一端,爪盤60上沿周向間隔設置有多個第一吸附組件62;圓環吸盤70與補償軸30連接,其上設置有多個第二吸附組件71,圓環吸盤70的直徑小於爪盤60的分佈圓直徑,且圓環吸盤70套設在旋轉軸組件50外側,圓環吸盤70與旋轉軸組件50之間具有間隙。 Please refer to FIG. 1, the pre-alignment device of an embodiment includes: a bottom plate 10, a lifting shaft 20 arranged on the bottom plate 10, a compensation shaft 30, and an optomechanical component 40, and further includes a rotating shaft component 50, a claw plate 60, and a ring吸盘70. The rotating shaft assembly 50 includes a rotating shaft 51 and an extension rod 52. The rotating shaft 51 is arranged on the lifting shaft 20. One end of the extension rod 52 is connected to the rotating shaft 51; the claw plate 60 is connected to the other end of the extension rod 52 on the claw plate 60 A plurality of first suction components 62 are arranged at intervals along the circumferential direction; the annular suction cup 70 is connected to the compensation shaft 30, and a plurality of second suction components 71 are arranged thereon. The diameter of the annular suction cup 70 is smaller than the distribution circle diameter of the claw disk 60 , And the annular sucker 70 is sleeved on the outside of the rotating shaft assembly 50, and there is a gap between the annular sucker 70 and the rotating shaft assembly 50.

旋轉軸組件50能夠帶動爪盤60旋轉,升降軸20能夠帶動爪盤60沿垂直方向做升降運動,補償軸30能夠帶動圓環吸盤70沿水平方向運動,爪盤60上設有交接空隙,該交接空隙用於當轉盤(60)及圓環吸盤70進行矽片交接時供第二吸附組件71穿過。 The rotating shaft assembly 50 can drive the claw plate 60 to rotate, the lifting shaft 20 can drive the claw plate 60 to move up and down in the vertical direction, and the compensation shaft 30 can drive the ring sucker 70 to move in the horizontal direction. The claw plate 60 is provided with a transfer gap. The transfer gap is used to allow the second suction assembly 71 to pass through when the turntable (60) and the circular sucker 70 are transferring silicon wafers.

具體地,光機組件40與升降軸20相鄰設置,其用於在爪盤60及圓環吸盤70運動過程中採集大翹曲矽片的邊緣訊息及缺口訊息並將採集到訊息發送給控制器,控制器用於根據大翹曲矽片的邊緣訊息及缺口訊息進行計算,得到大翹曲矽片的圓心及方向,具體控制器可以為集成在光刻機控制器內的控制模組,亦可以為預對準裝置獨立設置的控制器,本實施例不做具體限定。 Specifically, the opto-mechanical component 40 is arranged adjacent to the lifting shaft 20, which is used to collect the edge information and notch information of the large warped silicon wafer during the movement of the claw plate 60 and the ring sucker 70 and send the collected information to the control The controller is used to calculate the edge information and gap information of the large warpage silicon wafer to obtain the center and direction of the large warpage silicon wafer. The specific controller can be a control module integrated in the lithography machine controller, or It may be a controller independently provided for the pre-alignment device, which is not specifically limited in this embodiment.

進一步地,如圖1所示,光機組件40包含光機支撐座41、第一光源42、鏡頭43、CCD相機44及第二光源45,光機支撐座41安裝在底板10上,CCD相機44安裝在光機支撐座41上,第一光源42及鏡頭43均安裝在CCD相機44上,第二光源45安裝在光機支撐座41上。CCD相機44藉由鏡頭43採集大翹曲矽片的圖像,獲取大翹曲矽片的邊緣訊息及缺口訊息發送至控制器。 Further, as shown in FIG. 1, the optomechanical assembly 40 includes an optomechanical support base 41, a first light source 42, a lens 43, a CCD camera 44, and a second light source 45. The optomechanical support base 41 is installed on the base plate 10, and the CCD camera 44 is installed on the optomechanical support base 41, the first light source 42 and the lens 43 are both installed on the CCD camera 44, and the second light source 45 is installed on the optomechanical support base 41. The CCD camera 44 collects the image of the large warped silicon wafer through the lens 43, obtains the edge information and notch information of the large warped silicon wafer and sends it to the controller.

上述的預對準裝置包含爪盤60及圓環吸盤70,圓環吸盤70的直徑小於爪盤60的分佈圓直徑,旋轉軸51上設置有延長杆52,爪盤60與延長杆52連接,圓環吸盤70套設在旋轉軸組件50外側,且圓環吸盤70與旋轉軸組件50之間具有間隙。爪盤60的分佈圓直徑大於圓環吸盤70的直徑,設置在爪盤60上的多個第一吸附組件62能夠在大翹曲 片的邊緣區域吸附大翹曲片,以拉平大翹曲片,實現大翹曲片平正化處理。同時,爪盤60及圓環吸盤70進行矽片交接時,爪盤60沿垂直方向下降,多個第一吸附組件62與多個第二吸附組件71相互錯開設置,每個第二吸附組件71位於相鄰的兩個第一吸附組件62之間的交接空隙內,多個第一吸附組件62及多個第二吸附組件71互不干涉。並且,圓環吸盤70與旋轉軸組件50之間具有間隙,為圓環吸盤70水平運動提供運動空間,圓環吸盤70隨補償軸30做水平運動時亦不會與旋轉軸51組件發生干涉。因此,與先前的矽片對準裝置相比,上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,能夠滿足大翹曲片的預對準定位需求,提高大翹曲片預對準精度。 The above-mentioned pre-alignment device includes a claw plate 60 and a circular suction cup 70. The diameter of the circular suction cup 70 is smaller than the distribution circle diameter of the claw plate 60. An extension rod 52 is provided on the rotating shaft 51, and the claw plate 60 is connected to the extension rod 52. The annular sucker 70 is sleeved on the outside of the rotating shaft assembly 50, and there is a gap between the annular sucker 70 and the rotating shaft assembly 50. The diameter of the distribution circle of the claw plate 60 is larger than the diameter of the ring suction plate 70, and the plurality of first suction components 62 arranged on the claw plate 60 can warp The edge area of the sheet absorbs the large warped sheet to flatten the large warped sheet and realize the flattening treatment of the large warped sheet. At the same time, when the claw plate 60 and the ring suction plate 70 are handed over the silicon wafer, the claw plate 60 descends in the vertical direction, and the plurality of first suction components 62 and the plurality of second suction components 71 are staggered to each other, and each second suction component 71 Located in the connecting gap between two adjacent first suction components 62, the plurality of first suction components 62 and the plurality of second suction components 71 do not interfere with each other. In addition, there is a gap between the annular sucker 70 and the rotating shaft assembly 50 to provide a movement space for the annular sucker 70 to move horizontally. When the annular sucker 70 moves horizontally with the compensation shaft 30, it will not interfere with the rotating shaft 51 assembly. Therefore, compared with the previous silicon wafer alignment device, the above-mentioned pre-alignment device realizes the adsorption positioning and flattening treatment of the large warped sheet, which can meet the pre-aligned positioning requirements of the large warped sheet and improve the large warpage Film pre-alignment accuracy.

在一個實施例中,爪盤60至少包含多個爪杆61,多個爪杆61由爪盤中心向外發散分佈,相鄰的兩個爪杆61之間形成交接空隙,每個第一吸附組件62設置在對應的爪杆61的端部。具體地,如圖1所示,爪盤60包含多個爪杆61,多個爪杆61由爪盤中心向外發散分佈,多個爪杆61沿周向等間距間隔設置,相鄰的兩個爪杆61之間形成交接空隙,每個爪杆61的端部設置一個第一吸附組件62。當爪盤60及圓環吸盤70進行矽片交接時,前述多個爪杆61與多個第二吸附組件71相互錯開設置,以帶動多個第一吸附組件62與多個第二吸附組件71相互錯開設置,使多個第二吸附組件71可穿過交接空隙。本實施例中,爪盤60包含多個間隔設置的爪杆61,以在相鄰的兩個爪杆61之間形成交接空隙,在其它實施例中,亦可以在爪盤60上於相鄰的兩個第一吸附組件62之間開設能夠使對應的第二吸附組件71穿過的通孔作為交接間隙,本實施例並不做 具體限定。 In one embodiment, the claw plate 60 includes at least a plurality of claw rods 61, and the plurality of claw rods 61 are divergently distributed from the center of the claw plate, and a communication gap is formed between two adjacent claw rods. The assembly 62 is provided at the end of the corresponding claw rod 61. Specifically, as shown in FIG. 1, the claw plate 60 includes a plurality of claw rods 61, and the plurality of claw rods 61 are distributed outwardly from the center of the claw plate, and the plurality of claw rods 61 are arranged at equal intervals along the circumferential direction, and two adjacent ones A communication gap is formed between the two claw rods 61, and the end of each claw rod 61 is provided with a first suction assembly 62. When the claw plate 60 and the ring suction cup 70 are connected with silicon wafers, the plurality of claw rods 61 and the plurality of second suction components 71 are staggered to drive the plurality of first suction components 62 and the plurality of second suction components 71 The staggered arrangement allows the plurality of second suction components 71 to pass through the handover gap. In this embodiment, the claw plate 60 includes a plurality of claw rods 61 arranged at intervals to form a communication gap between two adjacent claw rods 61. In other embodiments, the claw plate 60 can also be positioned adjacent to each other. The two first suction components 62 are provided with a through hole through which the corresponding second suction component 71 can pass as a handover gap, which is not done in this embodiment Specific restrictions.

如圖2所示,在一個實施例中,每個第一吸附組件62包含:剛性支柱621、彈性件622、彈性支柱623及橡膠吸盤624,彈性件622設置在剛性支柱621內部,彈性支柱623上開設有第二通氣孔625,彈性支柱623一端設置在剛性支柱621內與彈性件622套接,另一端設置在剛性支柱621外部與橡膠吸盤624連接,橡膠吸盤624與第二通氣孔625連通。進一步地,第二通氣孔625藉由氣管接頭63連接氣源。本實施例中,橡膠吸盤624藉由彈性支柱623與剛性支柱621連接,並且彈性支柱623與剛性支柱621之間設置有彈性件622,彈性件622製成彈性支柱623,橡膠吸盤624用於適應剛性支柱621對應的吸附區域內翹曲片的翹曲量,彈性件622支撐彈性支柱623的彈性移動量適應多個第一吸附組件62之間的翹曲片的翹曲量,能夠有效提高多個第一吸附組件62的吸附精度及平整化處理精度。具體地,本實施例中,彈性件622採用彈簧,在其它實施例中,彈性件622進一步可採用其它彈性組件,本實施例並不做具體限定。 As shown in FIG. 2, in one embodiment, each first suction component 62 includes a rigid support 621, an elastic member 622, an elastic support 623, and a rubber suction cup 624. The elastic member 622 is disposed inside the rigid support 621, and the elastic support 623 A second vent hole 625 is opened on the upper side. One end of the elastic support 623 is set in the rigid support 621 to be sleeved with the elastic member 622, and the other end is set outside the rigid support 621 to connect to the rubber suction cup 624, and the rubber suction cup 624 is connected to the second vent 625 . Furthermore, the second vent hole 625 is connected to a gas source through a tracheal joint 63. In this embodiment, the rubber suction cup 624 is connected to the rigid support 621 through the elastic support 623, and an elastic member 622 is arranged between the elastic support 623 and the rigid support 621. The elastic member 622 is made of the elastic support 623. The rubber suction cup 624 is used to adapt to The amount of warpage of the warped piece in the suction area corresponding to the rigid pillar 621, the elastic movement of the elastic member 622 supporting the elastic pillar 623 adapts to the amount of warpage of the warped piece between the plurality of first suction components 62, which can effectively increase the amount of warpage. The suction precision and leveling processing precision of the first suction component 62. Specifically, in this embodiment, the elastic member 622 adopts a spring. In other embodiments, the elastic member 622 may further adopt other elastic components, which is not specifically limited in this embodiment.

具體地,每個第二吸附組件71與第一吸附組件62的區別僅在於二者尺寸不同,第二吸附組件71的高度大於第一吸附組件62的高度,其具體結構組成及原理與上述第一吸附組件62的結構組成及原理相同,在此不予贅述。具體第二吸附組件71及第一吸附組件62之間的高度差能夠滿足爪盤60與圓環吸盤70交接時,第一吸附組件62的吸附表面與第二吸附組件71的吸附表面共面,並且,當第二吸附組件71的高度能夠滿足爪盤60與圓環吸盤70完成交接,爪盤繼續向下運動後,第二吸附 組件71的吸附表面高於第一吸附組件62的吸附表面即可,具體第二吸附組件71與第一吸附組件62之間的高度差本實施例並不做具體限定。 Specifically, the difference between each second adsorption assembly 71 and the first adsorption assembly 62 is only that the two are different in size. The height of the second adsorption assembly 71 is greater than the height of the first adsorption assembly 62, and its specific structural composition and principle are the same as those described above. The structural composition and principle of a suction assembly 62 are the same, and will not be repeated here. Specifically, the height difference between the second suction component 71 and the first suction component 62 can satisfy that when the claw plate 60 is handed over to the annular suction cup 70, the suction surface of the first suction component 62 and the suction surface of the second suction component 71 are coplanar. Moreover, when the height of the second suction assembly 71 is sufficient for the claw plate 60 to complete the handover with the circular suction cup 70, after the claw plate continues to move downward, the second suction The suction surface of the component 71 may be higher than the suction surface of the first suction component 62, and the specific height difference between the second suction component 71 and the first suction component 62 is not specifically limited in this embodiment.

如圖3、圖4所示,在又一個實施例中,每個第一吸附組件62包含剛性支柱621及橡膠吸盤624,剛性支柱621上開設有第一通氣孔626,橡膠吸盤624與剛性支柱621連接,且橡膠吸盤624與第一通氣孔626連通。進一步地,第一通氣孔626可藉由氣管接頭等導氣組件連接氣源。具體地,每個第二吸附組件71與第一吸附組件62的區別僅在於二者尺寸不同,其具體結構組成及原理與本實施例中第一吸附組件62的結構組成及原理相同,在此不予贅述。本實施例的第一吸附組件62藉由適應翹曲片的翹曲量對翹曲片進行真空吸附,實現對翹曲片的吸附定位及平整化處理,因省去彈性件622及彈性支柱623,本實施例中的第一吸附組件62及第二吸附組件71有利於節約裝置成本。具體地,在實際應用中,可根據具體工藝要求及成本要求選取合適的第一吸附組件62及第二吸附組件71。並且,第一吸附組件62及第二吸附組件71可以採用相同結構,亦可以採用不同結構,上述實施例並不做具體限定。 As shown in Figures 3 and 4, in another embodiment, each first suction assembly 62 includes a rigid support 621 and a rubber suction cup 624. The rigid support 621 is provided with a first vent 626, the rubber suction cup 624 and the rigid support 621 is connected, and the rubber suction cup 624 is in communication with the first vent 626. Further, the first vent hole 626 can be connected to an air source through an air guide component such as a tracheal joint. Specifically, the difference between each second suction component 71 and the first suction component 62 is only that they are different in size, and their specific structure and composition are the same as those of the first suction component 62 in this embodiment. Do not repeat it. The first suction component 62 of the present embodiment performs vacuum suction on the warped sheet by adapting to the warping amount of the warped sheet, so as to realize the suction positioning and flattening treatment of the warped sheet, because the elastic member 622 and the elastic support 623 are omitted. In this embodiment, the first adsorption assembly 62 and the second adsorption assembly 71 are beneficial to save device cost. Specifically, in practical applications, suitable first adsorption assembly 62 and second adsorption assembly 71 can be selected according to specific process requirements and cost requirements. In addition, the first suction assembly 62 and the second suction assembly 71 may adopt the same structure or different structures, and the foregoing embodiment does not specifically limit it.

在一個實施例中,上述的預對準裝置進一步包含感測器200及擋片300,感測器200設置在圓環吸盤70或第二吸附組件71上,擋片300設置在爪盤60上;或,感測器200設置在爪盤60上,擋片300設置在圓環吸盤70或第二吸附組件71上;當每個第一吸附組件62與對應的第二吸附組件71在徑向方向存在位置重疊時,擋片300觸發感測器200。具體地,如圖1、圖3所示,爪盤60上設置有六個爪杆61,圓環吸盤70上設置有三個第二吸附組件71,對應的,感測器200的數量為3 個,擋片300的數量為六個,三個感測器200分別設置在第二吸附組件71上,六個擋片300則對應設置在六個爪杆61上,當爪杆61與第二吸附組件71位置有重疊(即第一吸附組件62與第二吸附組件71在徑向方向存在位置重疊)時,擋片300觸發感測器200,此時,爪杆61與第二吸附組件71兩者的位置相互之間存在干涉,導致爪盤60不能直接下降,此時,需要轉動旋轉軸51帶動爪盤60旋轉,使爪盤60旋轉一定角度與第二吸附組件71的位置相互錯開,然後再藉由升降軸20帶動爪盤60下降。上述實施例中,感測器200設置在第二吸附組件71上,擋片300設置在爪杆61上,在其它實施例中,感測器200進一步可以設置在圓環吸盤70上,或者,進一步可以將擋片300設置在圓環吸盤70或第二吸附組件上,而將感測器200設置在爪杆上,只要能確保每個第一吸附組件62與對應的第二吸附組件71在徑向方向存在位置重疊時擋片300能夠觸發感測器200即可,本實施例並不限定感測器200及擋片300的具體設置位置。 In one embodiment, the above-mentioned pre-alignment device further includes a sensor 200 and a stopper 300, the sensor 200 is arranged on the ring suction cup 70 or the second suction assembly 71, and the stopper 300 is arranged on the claw plate 60 Or, the sensor 200 is set on the claw plate 60, and the baffle 300 is set on the ring suction cup 70 or the second suction assembly 71; when each first suction assembly 62 and the corresponding second suction assembly 71 are in the radial direction When the direction overlaps, the barrier 300 triggers the sensor 200. Specifically, as shown in FIGS. 1 and 3, six claw rods 61 are provided on the claw plate 60, and three second suction assemblies 71 are provided on the ring suction plate 70. Correspondingly, the number of sensors 200 is 3. The number of the blocking pieces 300 is six, the three sensors 200 are respectively arranged on the second suction assembly 71, and the six blocking pieces 300 are correspondingly arranged on the six claw rods 61, when the claw rod 61 and the second When the position of the suction component 71 overlaps (that is, the position of the first suction component 62 and the second suction component 71 overlap in the radial direction), the stopper 300 triggers the sensor 200. At this time, the claw rod 61 and the second suction component 71 There is interference between the positions of the two, which causes the claw plate 60 to not be directly lowered. At this time, it is necessary to rotate the rotating shaft 51 to drive the claw plate 60 to rotate, so that the claw plate 60 rotates to a certain angle and the position of the second suction assembly 71 is mutually offset. Then the lifting shaft 20 drives the claw plate 60 down. In the above-mentioned embodiment, the sensor 200 is arranged on the second suction assembly 71, and the baffle 300 is arranged on the claw rod 61. In other embodiments, the sensor 200 may be further arranged on the ring suction cup 70, or, Further, the baffle 300 can be arranged on the ring suction cup 70 or the second suction assembly, and the sensor 200 can be arranged on the claw rod, as long as it can be ensured that each first suction assembly 62 and the corresponding second suction assembly 71 are in contact with each other. When the positions in the radial direction overlap, the stopper 300 can trigger the sensor 200. This embodiment does not limit the specific positions of the sensor 200 and the stopper 300.

進一步地,在一個實施例中,當爪盤60與圓環吸盤70進行矽片交接時,若多個第一吸附組件62與多個第二吸附組件71在徑向方向發生位置重疊,則旋轉軸51帶動爪盤60旋轉預設角度使多個第一吸附組件62與多個第二吸附組件71的位置錯開,其中,預設角度小於相鄰的兩個第一吸附組件62之間的夾角的1/3倍。具體地,當需要將爪盤60上的翹曲片交接到圓環吸盤70上時,升降軸20帶動爪盤60沿垂直方向下降,如果第一吸附組件62與第二吸附組件71位置有重疊,即多個爪杆61與多個第二吸附組件71位置發生重疊,要先旋轉爪盤60使多個爪杆61 及多個第二吸附組件71位置錯開。但是,因爪盤60在下降前就進行旋轉操作,爪盤60帶著翹曲片一起旋轉,這使得翹曲片相對原檢測位置轉動一定角度,而當翹曲片由圓環吸盤70交接回爪盤60,再次上升繼續進行檢測時,需要保證翹曲片保持原檢測方位,這樣就需要進行回轉補償,而如果直接進行回轉補償又會使多個爪杆61及多個第二吸附組件71位置重合,對爪盤60上升產生干涉。為使爪盤60在上升過程中不會產生干涉,當爪盤60下降並將翹曲片交接到圓環吸盤70上後,繼續以下降前相同的角度同向旋轉爪盤60,之後,在翹曲片由圓環吸盤70交接回爪盤60之後,爪盤60再逆向旋轉相同角度,即可保證翹曲片回到原檢測方位。因此,本實施例中,設置預設角度小於相鄰的兩個第一吸附組件62之間的夾角的1/3倍,亦就是相鄰的兩個爪杆61之間的夾角的1/3倍,以確保爪盤60同向旋轉兩次都不與第二吸附組件71發生干涉。 Further, in one embodiment, when the claw plate 60 and the ring suction cup 70 are connected to the silicon wafer, if the plurality of first suction components 62 and the plurality of second suction components 71 overlap in the radial direction, the rotation The shaft 51 drives the claw plate 60 to rotate at a predetermined angle so that the positions of the plurality of first suction components 62 and the plurality of second suction components 71 are staggered, wherein the predetermined angle is smaller than the included angle between two adjacent first suction components 62 1/3 times. Specifically, when it is necessary to transfer the warped piece on the claw plate 60 to the annular suction plate 70, the lifting shaft 20 drives the claw plate 60 to descend in the vertical direction. If the positions of the first suction assembly 62 and the second suction assembly 71 overlap , That is, the positions of the plurality of claw rods 61 and the plurality of second suction components 71 overlap, and the claw plate 60 must be rotated to make the plurality of claw rods 61 And the positions of the plurality of second suction components 71 are staggered. However, because the claw plate 60 performs a rotating operation before descending, the claw plate 60 rotates with the warping piece, which makes the warping piece rotate a certain angle relative to the original detection position, and when the warping piece is transferred back by the ring sucker 70 When the claw plate 60 is raised again to continue the detection, it is necessary to ensure that the warped piece maintains the original detection orientation, so that rotation compensation is required. If the rotation compensation is directly performed, multiple claw rods 61 and multiple second suction components 71 The positions overlap and interfere with the ascent of the claw plate 60. In order to prevent the claw plate 60 from interfering during the ascent process, when the claw plate 60 is lowered and the warping piece is transferred to the ring sucker 70, continue to rotate the claw plate 60 in the same direction at the same angle before descending. After the warping piece is transferred back to the claw plate 60 by the ring suction cup 70, the claw plate 60 is rotated in the reverse direction by the same angle to ensure that the warping piece returns to the original detection position. Therefore, in this embodiment, the preset angle is set to be less than 1/3 of the included angle between two adjacent first suction components 62, that is, 1/3 of the included angle between two adjacent claw rods 61. To ensure that the claw plate 60 rotates in the same direction twice without interference with the second suction assembly 71.

在一個實施例中,如圖1、圖3所示,爪盤60的中心位置處設置有剛性支撐塊64。具體地,剛型支撐塊64的上表面與第一吸附組件62的剛性支柱621的上表面共面。剛性支撐塊64設置在爪盤60中心,六個爪杆61以爪盤60的中心為中心,周向等間距分佈,六個第一吸附組件62分別設置在六個爪杆61的端部,剛性支撐塊64的上表面與各個第一吸附組件62的剛性支柱621的上表面共面,當六個第一吸附組件62吸附翹曲片邊緣並下拉翹曲片邊緣對翹曲片進行拉平時,剛型支撐塊64在翹曲片中心提供共面支撐,能夠進一步提高翹曲片平整化精度。 In one embodiment, as shown in FIGS. 1 and 3, a rigid support block 64 is provided at the center of the claw plate 60. Specifically, the upper surface of the rigid support block 64 is coplanar with the upper surface of the rigid pillar 621 of the first suction assembly 62. The rigid support block 64 is arranged at the center of the claw plate 60. The six claw rods 61 are centered on the center of the claw plate 60 and distributed at equal intervals in the circumferential direction. The six first suction components 62 are respectively arranged at the ends of the six claw rods 61, The upper surface of the rigid support block 64 is coplanar with the upper surface of the rigid support 621 of each first suction component 62, when the six first suction components 62 suction the edge of the warped sheet and pull down the edge of the warped sheet to flatten the warped sheet , The rigid support block 64 provides coplanar support at the center of the warped sheet, which can further improve the flattening accuracy of the warped sheet.

上述實施例中,爪盤60上設置六個爪杆61,相應地,多個第一吸附組件62的數量為六個。然而,本實施例並不用於對爪杆61及 多個第一吸附組件62的數量做具體限定,實際應用中,可根據實際需要設置多個爪杆61及第一吸附組件62的數量,只要保證二者數量相等即可,可多於六個,亦可少於六個。同樣的,本實施例中,多個第二吸附組件71的數量為三個,實際應用中多個第二吸附組件71的數量可根據多個爪杆61的數量對應設置。進一步地,為了確保吸附定位及平整化效果,多個爪杆61及多個第二吸附組件71的數量均以不少於三個為佳。 In the above embodiment, six claw rods 61 are provided on the claw plate 60, and correspondingly, the number of the plurality of first suction assemblies 62 is six. However, this embodiment is not used for the claw rod 61 and The number of multiple first suction components 62 is specifically limited. In actual applications, the number of multiple claw rods 61 and the number of first suction components 62 can be set according to actual needs, as long as the numbers of the two are equal, and can be more than six , Can be less than six. Similarly, in this embodiment, the number of the plurality of second suction components 71 is three, and the number of the plurality of second suction components 71 can be correspondingly set according to the number of the plurality of claw rods 61 in practical applications. Further, in order to ensure the suction positioning and leveling effect, the number of the plurality of claw rods 61 and the plurality of second suction components 71 is preferably not less than three.

如圖5所示,在另一個實施例中,爪杆61上進一步設置有多個第三吸附組件65,每個第三吸附組件65與對應的第一吸附組件62間隔設置。本實施例中,爪杆61上設置有兩組吸附組件,藉由第三吸附組件65及第一吸附組件62能夠對翹曲片進行兩級平整化處理,有助於提高翹曲片平整化精度。並且,兩組吸附組件進一步可以用於吸附平整不同尺寸的翹曲片,可提高預對準裝置的通用性。例如,第一吸附組件62可用於吸附平整尺寸較大的翹曲片(如12寸翹曲矽片),第三吸附組件65可用於吸附平整尺寸較小的翹曲片(如8寸翹曲矽片)。當吸附12寸翹曲矽片時,第三吸附組件65先開真空吸附,然後第一吸附組件62再開真空吸附,可實現對矽片的兩級梯次吸附,提高平整化精度。 As shown in FIG. 5, in another embodiment, a plurality of third suction components 65 are further provided on the claw rod 61, and each third suction component 65 is spaced apart from the corresponding first suction component 62. In this embodiment, the claw rod 61 is provided with two sets of suction components. The third suction component 65 and the first suction component 62 can perform two-level flattening treatment on the warped sheet, which helps to improve the flattening of the warped sheet. Accuracy. In addition, the two sets of suction components can be further used to suck and flatten warped sheets of different sizes, which can improve the versatility of the pre-alignment device. For example, the first suction component 62 can be used to suction warped sheets with a larger flat size (such as 12-inch warped silicon wafers), and the third suction component 65 can be used to suction warped sheets with a smaller flat size (such as 8-inch warped silicon wafers). Silicon). When the 12-inch warped silicon wafer is adsorbed, the third suction assembly 65 first opens the vacuum suction, and then the first suction assembly 62 opens the vacuum suction again, which can realize the two-stage adsorption of the silicon wafer and improve the leveling accuracy.

如圖5所示,在一個實施例中,上述的預對準裝置進一步包含位置調整組件80,位置調整組件80包含滑軌81、滑塊82及驅動件83,滑軌81與底板10連接,滑塊82在滑軌81上滑動,且滑塊82上安裝光機組件40,驅動件83與滑塊82連接。本實施例中,光機組件40安裝在位置調整組件80上,藉由調節位置調整組件80即可以調節光機組件40的工位,以使光機組件40的工位與不同尺寸的翹曲片對應。具體地, 當需要調節光機組件40的工位時,啟動驅動件83帶動滑塊82在滑軌81上滑動,進而帶動光機組件40移動,當光機組件40移動到目標工位時,關閉驅動件83,使滑塊82停止滑動即可。具體地,驅動件83包含驅動組件及傳動機構,驅動組件藉由傳動機構與滑塊82連接,驅動組件可以為電機、氣壓缸或液壓缸中的任意一種,傳動機構可以為齒輪傳動機構、絲杠傳動機構等,本實施例不做具體限定。 As shown in FIG. 5, in one embodiment, the above-mentioned pre-alignment device further includes a position adjustment component 80. The position adjustment component 80 includes a sliding rail 81, a sliding block 82, and a driving member 83. The sliding rail 81 is connected to the bottom plate 10, The sliding block 82 slides on the sliding rail 81, and the optical-mechanical assembly 40 is installed on the sliding block 82, and the driving member 83 is connected with the sliding block 82. In this embodiment, the optomechanical component 40 is installed on the position adjusting component 80, and the position of the optomechanical component 40 can be adjusted by adjusting the position adjusting component 80, so that the position of the optomechanical component 40 can be warped with different sizes.片 corresponding. specifically, When the station of the optomechanical assembly 40 needs to be adjusted, the drive 83 drives the sliding block 82 to slide on the slide rail 81 to drive the optomechanical assembly 40 to move. When the optomechanical assembly 40 moves to the target station, the driver is turned off 83. Just stop the sliding of the slider 82. Specifically, the driving member 83 includes a driving component and a transmission mechanism. The driving component is connected to the slider 82 through the transmission mechanism. The driving component may be any of a motor, a pneumatic cylinder or a hydraulic cylinder, and the transmission mechanism may be a gear transmission mechanism or a wire. The lever transmission mechanism, etc., are not specifically limited in this embodiment.

如圖5所示,在一個實施例中,上述的預對準裝置進一步包含氣滑環(圖中未示出),氣滑環套設在延長杆內側,且氣滑環分別與多個第一吸附組件62及多個第三吸附組件65連通。本實施例中,藉由氣滑環實現對第一吸附組件62及第三吸附組件65的單獨供氣提供氣道,具體地,氣滑環為兩進兩出的氣滑環。 As shown in FIG. 5, in one embodiment, the above-mentioned pre-alignment device further includes an air slip ring (not shown in the figure), the air slip ring is sleeved inside the extension rod, and the air slip ring is connected to a plurality of first A suction assembly 62 and a plurality of third suction assemblies 65 are in communication. In this embodiment, an air slip ring is used to provide air passages for the first adsorption assembly 62 and the third adsorption assembly 65 to separately supply air. Specifically, the air slip ring is an air slip ring with two inlets and two outlets.

在一個實施例中,相鄰的兩個爪杆61之間設置有加強筋66。本實施例中,在相鄰的兩個爪杆61之間設置加強筋66能夠提高爪盤60的結構強度。如圖5所示,本實施例中,加強筋66連接至爪杆61的末端,在其它實施例中,加強筋66可以連接至爪杆61的任意位置,只要保證加強筋與第二吸附組件71之間不干涉即可。 In one embodiment, a reinforcing rib 66 is provided between two adjacent claw rods 61. In this embodiment, the reinforcing rib 66 is provided between two adjacent claw rods 61 to improve the structural strength of the claw plate 60. As shown in FIG. 5, in this embodiment, the reinforcing rib 66 is connected to the end of the claw rod 61. In other embodiments, the reinforcing rib 66 can be connected to any position of the claw rod 61, as long as the reinforcing rib and the second suction assembly are ensured No interference between 71 is enough.

進一步地,如圖5所示,本實施例中,感測器200的數量為一個,擋片300的數量為六個,感測器200設置在圓環吸盤70上與多個第二吸附組件71錯開設置,擋片300設置在加強筋上與多個第一吸附組件62錯開設置,只要其中一個擋片300觸發感測器200,就表示有多個爪杆61與多個第二吸附組件71在徑向方向存在位置重疊。本實施例中,僅設置一個感測器200即可實現多個爪杆61與多個第二吸附組件71干涉 檢測,能夠有效節約感測器成本。 Further, as shown in FIG. 5, in this embodiment, the number of the sensor 200 is one, the number of the baffle 300 is six, and the sensor 200 is arranged on the ring suction cup 70 and the plurality of second suction components 71 is staggered, the baffle 300 is set on the reinforcing rib and the multiple first suction components 62 are staggered. As long as one of the baffles 300 triggers the sensor 200, it means that there are multiple claw rods 61 and multiple second suction components. 71 has positional overlap in the radial direction. In this embodiment, only one sensor 200 can be provided to achieve interference between multiple claw rods 61 and multiple second suction components 71 Detection can effectively save the cost of the sensor.

在一個實施例中,每個第三吸附組件65包含剛性支柱及橡膠吸盤,剛性支柱上開設有第一通氣孔,橡膠吸盤與剛性支柱連接,且橡膠吸盤與通氣孔連通。在又一個實施例中,每個第三吸附組件65包含:剛性支柱、彈性件、彈性支柱及橡膠吸盤,彈性件設置在剛性支柱內部,彈性支柱上開設有第二通氣孔,彈性支柱一端設置在剛性支柱內與彈性件套接,另一端設置在剛性支柱外部與橡膠吸盤連接,橡膠吸盤與第二通氣孔連通。具體地,每個第三吸附組件65的結構組成及結構原理與前述實施例中第一吸附組件62的結構組成及原理均相同,在此不再贅述。另外,在實際應用中,第一吸附組件62、第二吸附組件71及第三吸附組件65可以都採用相同結構,亦可以採用不同結構。 In one embodiment, each third suction assembly 65 includes a rigid pillar and a rubber suction cup, the rigid pillar is provided with a first vent hole, the rubber suction cup is connected to the rigid pillar, and the rubber suction cup communicates with the vent hole. In another embodiment, each third suction component 65 includes: a rigid support, an elastic member, an elastic support, and a rubber suction cup. The elastic member is arranged inside the rigid support, the elastic support is provided with a second vent hole, and one end of the elastic support is provided The rigid pillar is sleeved with the elastic member, and the other end is arranged on the outside of the rigid pillar and connected with the rubber sucker, and the rubber sucker is connected with the second vent hole. Specifically, the structural composition and structural principle of each third suction component 65 are the same as the structural composition and principle of the first suction component 62 in the foregoing embodiment, and will not be repeated here. In addition, in actual applications, the first adsorption assembly 62, the second adsorption assembly 71, and the third adsorption assembly 65 may all adopt the same structure or different structures.

如圖6所示,基於上述的預對準裝置,本發明進一步提供一種預對準方法,包含以下步驟: As shown in FIG. 6, based on the above-mentioned pre-alignment device, the present invention further provides a pre-alignment method, including the following steps:

步驟S11:爪盤60接收矽片。 Step S11: The claw plate 60 receives the silicon wafer.

在一個實施例中,當爪盤60上的第一吸附組件62的高度能夠滿足片叉取放矽片所需的運動空間時,可直接將矽片放在爪盤60上,具體地,步驟S11包含:片叉將矽片放置在爪盤60上,第一吸附組件62開真空,吸附矽片,如果矽片為翹曲片,第一吸附組件62吸附矽片並將其拉平。 In one embodiment, when the height of the first suction assembly 62 on the claw plate 60 can meet the movement space required by the fork to pick and place the silicon wafer, the silicon wafer can be directly placed on the claw plate 60. Specifically, the step S11 includes: the wafer fork places the silicon wafer on the claw plate 60, and the first suction component 62 opens a vacuum to suck the silicon wafer. If the silicon wafer is a warped wafer, the first suction component 62 suctions the silicon wafer and flattens it.

在一個實施例中,當爪盤60上的多個第一吸附組件62的高度不能滿足片叉取放矽片所需的運動空間時,需要先藉由圓環吸盤70接收矽片,再將矽片交接到爪盤60上。具體地,步驟S11爪盤接收矽片 的步驟包含:升降軸20帶動爪盤60下降至上片工位,片叉將矽片放置在圓環吸盤70上,多個第二吸附組件71開真空,吸附矽片;升降軸20帶動爪盤60上升至交接工位,第一吸附組件62開真空,吸附矽片,如果矽片為翹曲片,第一吸附組件62吸附矽片並將其拉平,之後,第二吸附組件71關真空,升降軸20帶動爪盤60上升至預對準工位。 In one embodiment, when the height of the plurality of first suction components 62 on the claw plate 60 cannot satisfy the movement space required by the wafer fork to pick and place the silicon wafer, it is necessary to first receive the silicon wafer by the ring suction cup 70, and then The silicon wafer is transferred to the claw plate 60. Specifically, step S11, the claw plate receives the silicon wafer The steps include: the lifting shaft 20 drives the claw plate 60 down to the loading station, the chip fork places the silicon wafer on the ring suction plate 70, the plurality of second suction components 71 turn on the vacuum to adsorb the silicon wafer; the lifting shaft 20 drives the claw plate 60 rises to the handover station, the first suction unit 62 opens the vacuum to suck the silicon wafer, if the silicon wafer is a warped piece, the first suction unit 62 sucks and flattens the silicon wafer, after which the second suction unit 71 closes the vacuum, The lifting shaft 20 drives the claw plate 60 to rise to the pre-alignment station.

具體地,上述上片工位為第一吸附組件62上的橡膠吸盤624頂面低於第二吸附組件71剛性支柱621頂部支撐面的距離,該距離能夠滿足片叉取放矽片所需的運動空間。 Specifically, the above-mentioned loading station is the distance between the top surface of the rubber suction cup 624 on the first suction assembly 62 and the top support surface of the rigid support 621 of the second suction assembly 71, which can meet the requirements for picking and placing silicon wafers by the fork. Sports space.

上述交接工位為第一吸附組件62的剛性支柱621的頂部支撐面及第二吸附組件71的剛性支柱621的頂部支撐面共面。 The above-mentioned transfer station is that the top supporting surface of the rigid pillar 621 of the first suction assembly 62 and the top supporting surface of the rigid pillar 621 of the second suction assembly 71 are coplanar.

上述預對準工位為第二吸附組件71的橡膠吸盤624頂面低於爪盤60下表面的距離,該距離為第二吸附組件71上的橡膠吸盤624與爪盤60沿垂直方向的安全空間。 The above-mentioned pre-alignment station is the distance between the top surface of the rubber suction cup 624 of the second suction assembly 71 and the bottom surface of the claw plate 60, which is the safety of the rubber suction cup 624 on the second suction assembly 71 and the claw plate 60 in the vertical direction. space.

步驟S12:旋轉軸51帶動爪盤60旋轉,光機組件40採集矽片邊緣訊息,並將採集到的矽片邊緣訊息發送至控制器。 Step S12: The rotating shaft 51 drives the claw plate 60 to rotate, and the opto-mechanical component 40 collects the edge information of the silicon wafer, and sends the collected edge information of the silicon wafer to the controller.

步驟S13:控制器根據接收到的矽片邊緣訊息計算矽片的偏心量,並根據偏心量控制旋轉軸旋轉50,將矽片偏心量最大的方向旋轉至補償軸30運動方向。 Step S13: The controller calculates the eccentricity of the silicon wafer according to the received wafer edge information, and controls the rotation axis to rotate 50 according to the eccentricity, and rotates the direction of the largest eccentricity of the silicon wafer to the movement direction of the compensation axis 30.

步驟S14:升降軸20帶動爪盤60下降至交接工位,矽片由爪盤60交接至圓環吸盤70。具體地,升降軸20帶動爪盤60下降至交接工位後,第二吸附組件71開真空,第一吸附組件62關真空,矽片由爪盤60交接至圓環吸盤70。 Step S14: the lifting shaft 20 drives the claw disk 60 to descend to the transfer station, and the silicon wafer is transferred from the claw disk 60 to the ring sucker 70. Specifically, after the lifting shaft 20 drives the claw plate 60 down to the transfer station, the second suction assembly 71 opens the vacuum, the first suction assembly 62 closes the vacuum, and the silicon wafer is transferred from the claw plate 60 to the ring suction plate 70.

步驟S15:升降軸20帶動爪盤60繼續下降至交接低位,補償軸30帶動圓環吸盤70運動,補償矽片的偏心量。 Step S15: The lifting shaft 20 drives the claw plate 60 to continue to descend to the transfer low position, and the compensation shaft 30 drives the ring sucker 70 to move to compensate for the eccentricity of the silicon wafer.

具體地,交接低位為第一吸附組件62上的橡膠吸盤624頂面低於圓環吸盤70下表面的距離,該距離為第一吸附組件62上的橡膠吸盤624與圓環吸盤70的沿垂直方向的安全空間。 Specifically, the transfer low position is the distance between the top surface of the rubber suction cup 624 on the first suction assembly 62 and the bottom surface of the ring suction cup 70, and the distance is the vertical edge between the rubber suction cup 624 on the first suction assembly 62 and the ring suction cup 70 Direction of the safe space.

步驟S16:升降軸20帶動爪盤60上升至交接工位,矽片由圓環吸盤70交接至爪盤60上。具體地,升降軸20帶動爪盤60上升至交接工位後,第一吸附組件62開真空,第二吸附組件71關真空,矽片由圓環吸盤70交接至爪盤60上。 Step S16: The lifting shaft 20 drives the claw plate 60 to rise to the transfer station, and the silicon wafer is transferred from the ring sucker 70 to the claw plate 60. Specifically, after the lifting shaft 20 drives the claw plate 60 up to the transfer station, the first suction assembly 62 turns on the vacuum, the second suction assembly 71 turns off the vacuum, and the silicon wafer is transferred from the ring suction cup 70 to the claw plate 60.

步驟S17:升降軸20帶動爪盤60繼續上升至預對準工位,旋轉軸51帶動爪盤60旋轉,光機組件40採集矽片缺口訊息及矽片邊緣訊息,並將採集到的矽片缺口訊息及矽片邊緣訊息發送至控制器。 Step S17: The lifting shaft 20 drives the claw plate 60 to continue to rise to the pre-alignment position, the rotating shaft 51 drives the claw plate 60 to rotate, and the optomechanical assembly 40 collects silicon chip notch information and silicon chip edge information, and then collects the silicon chip Notch messages and silicon edge messages are sent to the controller.

步驟S18:控制器根據矽片缺口訊息及矽片邊緣訊息計算矽片的偏心餘量,當矽片的偏心餘量滿足預設條件時,旋轉軸51轉動將矽片的缺口旋轉至光機組件40下方。 Step S18: The controller calculates the eccentricity margin of the silicon wafer according to the wafer gap information and the wafer edge information. When the eccentricity margin of the silicon wafer meets the preset condition, the rotating shaft 51 rotates to rotate the wafer gap to the optomechanical component Below 40.

具體地,當矽片的偏心餘量滿足預設條件時,確定矽片圓心,將矽片的缺口旋轉至光機組件40下方執行步驟S19。當偏心餘量不滿足預設條件時,重複步驟S12至步驟S17,直至矽片的偏心餘量滿足預設條件。 Specifically, when the eccentricity margin of the silicon wafer satisfies the preset condition, the center of the silicon wafer circle is determined, and the notch of the silicon wafer is rotated to below the optomechanical component 40 to perform step S19. When the eccentricity margin does not meet the preset condition, steps S12 to S17 are repeated until the eccentricity margin of the silicon wafer meets the preset condition.

步驟S19:旋轉軸51小角度往返旋轉,光機組件40採集矽片缺口訊息並發送至控制器,控制器根據矽片缺口訊息計算得到矽片缺口位置誤差,旋轉軸51根據補償缺口位置誤差旋轉,完成矽片的定向。 Step S19: The rotating shaft 51 rotates back and forth at a small angle. The opto-mechanical component 40 collects the wafer gap information and sends it to the controller. The controller calculates the wafer gap position error according to the wafer gap information, and the rotation axis 51 rotates according to the compensation gap position error , Complete the orientation of the silicon wafer.

在一個實施例中,步驟S14之前包含:當第一吸附組件62與第二吸附組件71在徑向方向存在位置重疊時,旋轉軸51帶動爪盤60旋轉預設角度使第一吸附組件62與第二吸附組件71的位置錯開。進一步地,步驟S15中,升降軸20繼續下降至交接低位之後包含:旋轉軸51帶動爪盤60繼續同向旋轉預設角度。更進一步地,步驟S16之後包含:旋轉軸51帶動爪盤60反向旋轉預設角度。具體地,旋轉軸51帶動爪盤60反向旋轉預設角度後再執行步驟S17。具體地,本實施例中,為了使爪盤60在下降過程中不會與第二吸附組件71產生干涉,先將爪盤60旋轉預設角度,進一步的,為了使爪盤60在上升過程中不會產生干涉,當爪盤60下降並將矽片交接到圓環吸盤70上後,繼續以下降前相同的角度同向旋轉爪盤60。最後,在矽片由圓環吸盤70交接回爪盤60之後,爪盤60再逆向旋轉相同角度,以使矽片回到原檢測方位。具體地,在一個實施例中,預設角度小於相鄰的兩個第一吸附組件62之間的夾角的1/3倍 In one embodiment, before step S14, it includes: when the first suction component 62 and the second suction component 71 overlap in the radial direction, the rotating shaft 51 drives the claw plate 60 to rotate a preset angle so that the first suction component 62 and The position of the second suction assembly 71 is staggered. Further, in step S15, after the lifting shaft 20 continues to descend to the transfer low position, it includes: the rotating shaft 51 drives the claw plate 60 to continue to rotate the predetermined angle in the same direction. Furthermore, after step S16, it includes: the rotating shaft 51 drives the claw plate 60 to reversely rotate by a predetermined angle. Specifically, the rotating shaft 51 drives the claw plate 60 to reversely rotate by a preset angle before performing step S17. Specifically, in this embodiment, in order to prevent the claw plate 60 from interfering with the second suction assembly 71 during the descending process, the claw plate 60 is first rotated by a preset angle, and further, in order to make the claw plate 60 in the ascending process Without interference, when the claw plate 60 is lowered and the silicon wafer is transferred to the ring sucker 70, the claw plate 60 continues to rotate in the same direction at the same angle before descending. Finally, after the silicon wafer is transferred back to the claw plate 60 by the ring sucker 70, the claw plate 60 is rotated in the reverse direction by the same angle to return the silicon wafer to the original detection position. Specifically, in one embodiment, the preset angle is less than 1/3 times the included angle between two adjacent first suction components 62

在一個實施例中,爪盤接收矽片的步驟之前,包含以下步驟:根據矽片的尺寸調節位置調整組件80,調整光機組件40至與矽片尺寸對應的工位。具體地,當採用圖5所示的預對準裝置時,在爪盤60接收矽片之前先根據矽片的尺寸調節光機組件40至對應的工位。進一步地,當採用圖5所示的預對準裝置時,根據矽片的尺寸,上述步進行矽片交接的步驟中,進一步可以是開啟或關閉第三吸附65,或同時開啟或關閉第三吸附組件65以完成矽片在爪盤60及圓環吸盤70之間的交接操作。 In one embodiment, the step of receiving the silicon wafer by the claw plate includes the following steps: adjusting the position adjustment component 80 according to the size of the silicon wafer, and adjusting the opto-mechanical component 40 to a position corresponding to the size of the silicon wafer. Specifically, when the pre-alignment device shown in FIG. 5 is used, before the claw plate 60 receives the silicon wafer, the optomechanical assembly 40 is adjusted to the corresponding station according to the size of the silicon wafer. Furthermore, when the pre-alignment device shown in FIG. 5 is used, according to the size of the silicon wafer, in the above step for the silicon wafer transfer step, the third adsorption 65 may be turned on or off, or the third adsorption 65 may be turned on or off at the same time. The suction component 65 is used to complete the transfer operation of the silicon wafer between the claw plate 60 and the ring suction plate 70.

上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,能夠滿足大翹曲片的預對準定位需求,提高大翹曲片預對準精度。基於上述預對準裝置的預對準方法能夠對大翹曲片進行吸附定位及平整化處理,提高大翹曲片預對準精度。 The above-mentioned pre-alignment device realizes the adsorption positioning and flattening processing of the large warped sheet, can meet the pre-alignment positioning requirements of the large warped sheet, and improve the pre-alignment accuracy of the large warped sheet. The pre-alignment method based on the above-mentioned pre-alignment device can perform adsorption positioning and flattening treatment on the large warped sheet, and improve the pre-alignment accuracy of the large warped sheet.

以上所述實施例的各技術特徵可以進行任意的組合,為使描述簡潔,未對上述實施例中的各個技術特徵所有可能的組合皆進行描述,然而,若此等技術特徵的組合不存在矛盾,皆應當認為是本說明書記載的範圍。 The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, all possible combinations of the various technical features in the above-mentioned embodiments are not described. However, if there is no contradiction in the combination of these technical features , Should be regarded as the scope of this specification.

10‧‧‧底板 10‧‧‧Bottom plate

20‧‧‧升降軸 20‧‧‧Lift shaft

30‧‧‧補償軸 30‧‧‧Compensation axis

40‧‧‧光機組件 40‧‧‧Optical Machine Components

51‧‧‧旋轉軸 51‧‧‧Rotation axis

52‧‧‧延長杆 52‧‧‧Extension Rod

60‧‧‧爪盤 60‧‧‧Claw plate

61‧‧‧爪杆 61‧‧‧Claw lever

62‧‧‧第一吸附組件 62‧‧‧First suction assembly

65‧‧‧第三吸附組件 65‧‧‧Third suction assembly

66‧‧‧加強筋 66‧‧‧Reinforcing rib

70‧‧‧圓環吸盤 70‧‧‧Ring Suction Cup

71‧‧‧第二吸附組件 71‧‧‧Second suction assembly

80‧‧‧位置調整組件 80‧‧‧Position adjustment components

81‧‧‧滑軌 81‧‧‧Slide rail

82‧‧‧滑塊 82‧‧‧Slider

83‧‧‧驅動件 83‧‧‧Drive

200‧‧‧感測器 200‧‧‧Sensor

300‧‧‧擋片 300‧‧‧Block

Claims (19)

一種預對準裝置,其特徵係,其包含: A pre-alignment device, characterized by: 底板(10); Bottom plate (10); 設置在前述底板(10)上的升降軸(20)、補償軸(30)及光機組件(40);旋轉軸組件(50),包含旋轉軸(51)及延長杆(52),前述旋轉軸(51)設置在前述升降軸(20)上,前述延長杆(52)的一端與前述旋轉軸(51)連接; The lifting shaft (20), the compensation shaft (30) and the opto-mechanical assembly (40) are arranged on the aforementioned bottom plate (10); the rotating shaft assembly (50) includes a rotating shaft (51) and an extension rod (52), the aforementioned rotating The shaft (51) is arranged on the aforementioned lifting shaft (20), and one end of the aforementioned extension rod (52) is connected with the aforementioned rotating shaft (51); 爪盤(60),連接至前述延長杆(52)的另一端,前述爪盤(60)上沿周向間隔設置有多個第一吸附組件(62);及 The claw plate (60) is connected to the other end of the aforementioned extension rod (52), and the aforementioned claw plate (60) is provided with a plurality of first suction components (62) at intervals in the circumferential direction; and 圓環吸盤(70),與前述補償軸(30)連接,其上設置有多個第二吸附組件(71),前述圓環吸盤(70)的直徑小於前述爪盤(60)的分佈圓直徑,且前述圓環吸盤(70)套設在前述旋轉軸組件(50)外側,前述圓環吸盤(70)與前述旋轉軸組件(50)之間具有間隙; The annular sucker (70) is connected with the aforementioned compensation shaft (30), and a plurality of second suction components (71) are arranged on it. The diameter of the aforementioned annular sucker (70) is smaller than the diameter of the distribution circle of the aforementioned claw disc (60) , And the aforementioned annular sucker (70) is sleeved on the outside of the aforementioned rotating shaft assembly (50), and there is a gap between the aforementioned annular sucker (70) and the aforementioned rotating shaft assembly (50); 前述旋轉軸組件(50)能夠帶動前述爪盤(60)旋轉,前述升降軸(20)能夠帶動前述爪盤(60)沿垂直方向做升降運動,前述補償軸(30)能夠帶動前述圓環吸盤(70)沿水平方向運動,前述爪盤(60)上設有交接空隙,前述交接空隙用於當前述爪盤(60)及前述圓環吸盤(70)進行矽片交接時供前述第二吸附組件(71)穿過。 The rotating shaft assembly (50) can drive the claw plate (60) to rotate, the lifting shaft (20) can drive the claw plate (60) to move vertically, and the compensation shaft (30) can drive the ring sucker (70) Move in the horizontal direction, the claw plate (60) is provided with a transfer gap, and the transfer gap is used for the second suction when the claw plate (60) and the ring sucker (70) are transferred to silicon wafers The assembly (71) passes through. 如申請專利範圍第1項所記載之預對準裝置,其中,前述每個第一吸附組件(62)及/或每個前述第二吸附組件(71)包含剛性支柱(621)及橡膠吸盤(624),前述剛性支柱(621)上開設有第一通氣孔(626), 前述橡膠吸盤(624)與前述剛性支柱(621)連接,且前述橡膠吸盤(624)與前述第一通氣孔(626)連通。 As the pre-alignment device described in item 1 of the scope of patent application, each of the aforementioned first suction components (62) and/or each of the aforementioned second suction components (71) includes a rigid support (621) and a rubber suction cup ( 624), the rigid pillar (621) is provided with a first vent (626), the rubber suction cup (624) is connected to the rigid pillar (621), and the rubber suction cup (624) is connected to the first vent (626) ) Connected. 如申請專利範圍第1項所記載之預對準裝置,其中,每個前述第一吸附組件(62)及/或每個前述第二吸附組件(71)包含:剛性支柱(621)、彈性件(622)、彈性支柱(623)及橡膠吸盤(624),前述彈性件(622)設置在前述剛性支柱(621)內部,前述彈性支柱(623)上開設有第二通氣孔(625),前述彈性支柱(623)一端設置在前述剛性支柱(621)內與前述彈性件(622)套接,另一端設置在前述剛性支柱(621)外部與前述橡膠吸盤(624)連接,前述橡膠吸盤(624)與前述第二通氣孔(625)連通。 The pre-alignment device described in item 1 of the scope of patent application, wherein each of the aforementioned first suction components (62) and/or each of the aforementioned second suction components (71) includes: a rigid support (621) and an elastic member (622), an elastic pillar (623) and a rubber suction cup (624), the elastic member (622) is arranged inside the rigid pillar (621), the elastic pillar (623) is provided with a second vent (625), One end of the elastic support (623) is set in the aforementioned rigid support (621) to be sleeved with the aforementioned elastic member (622), and the other end is set outside the aforementioned rigid support (621) to be connected to the aforementioned rubber suction cup (624), the aforementioned rubber suction cup (624) ) Communicates with the aforementioned second vent hole (625). 如申請專利範圍第1項所記載之預對準裝置,其中,前述爪盤(60)上進一步設置有多個第三吸附組件(65),每個前述第三吸附組件(65)的中心與對應的前述第一吸附組件(62)的中心及前述爪盤(60)的中心共線,且前述第三吸附組件設置在前述對應的前述第一吸附組件及前述爪盤(60)的中心之間。 As the pre-alignment device described in item 1 of the scope of patent application, wherein the claw plate (60) is further provided with a plurality of third suction components (65), and the center of each third suction component (65) is The center of the corresponding first suction assembly (62) and the center of the claw plate (60) are collinear, and the third suction assembly is arranged between the centers of the corresponding first suction assembly and the claw plate (60) between. 如申請專利範圍第4項所記載之預對準裝置,其中,每個前述第三吸附組件(65)包含剛性支柱(621)及橡膠吸盤(624),前述剛性支柱(621)上開設有第一通氣孔(626),前述橡膠吸盤(624)與前述剛性支柱(621)連接,且前述橡膠吸盤(624)與前述第一通氣孔(626)連通。 As the pre-alignment device described in item 4 of the scope of patent application, each of the aforementioned third suction components (65) includes a rigid pillar (621) and a rubber suction cup (624), and the rigid pillar (621) is provided with a A vent (626), the rubber suction cup (624) is connected with the rigid support (621), and the rubber suction cup (624) is connected with the first vent (626). 如申請專利範圍第4項所記載之預對準裝置,其中,每個前述第三吸附組件(65)包含:剛性支柱(621)、彈性件(622)、彈性支柱(623) 及橡膠吸盤(624),前述彈性件(622)設置在前述剛性支柱(621)內部,前述彈性支柱(623)上開設有第二通氣孔(625),前述彈性支柱(623)一端設置在前述剛性支柱(621)內與前述彈性件(622)套接,另一端設置在前述剛性支柱(621)外部與前述橡膠吸盤(624)連接,前述橡膠吸盤(624)與前述第二通氣孔(625)連通。 As the pre-alignment device described in item 4 of the scope of patent application, each of the aforementioned third suction components (65) includes: a rigid support (621), an elastic member (622), an elastic support (623) and a rubber suction cup ( 624), the elastic member (622) is arranged inside the rigid pillar (621), the elastic pillar (623) is provided with a second vent (625), and one end of the elastic pillar (623) is arranged on the rigid pillar (621) ) Is sleeved with the aforementioned elastic member (622), and the other end is arranged outside the aforementioned rigid pillar (621) to connect with the aforementioned rubber suction cup (624), and the aforementioned rubber suction cup (624) communicates with the aforementioned second vent hole (625). 如申請專利範圍第4項所記載之預對準裝置,其中,前述預對準裝置進一步包含位置調整組件,前述位置調整組件包含滑軌(81)、滑塊(82)及驅動件(83),前述滑軌(81)與前述底板(10)連接,前述滑塊(82)可在前述滑軌(81)上滑動,且前述光機組件(40)安裝在前述滑塊(82)上,前述驅動件(83)與前述滑塊(82)連接。 The pre-alignment device described in item 4 of the scope of patent application, wherein the pre-alignment device further includes a position adjustment component, and the position adjustment component includes a slide rail (81), a slider (82), and a driving member (83) The slide rail (81) is connected to the bottom plate (10), the slider (82) can slide on the slide rail (81), and the optical-mechanical assembly (40) is mounted on the slider (82), The aforementioned driving member (83) is connected with the aforementioned slider (82). 如申請專利範圍第4項所記載之預對準裝置,其中,前述預對準裝置進一步包含氣滑環,前述氣滑環套設在前述延長杆(52)內側,且前述氣滑環分別與前述多個第一吸附組件(62)及前述多個第三吸附組件(65)連通。 The pre-alignment device described in item 4 of the scope of patent application, wherein the pre-alignment device further includes an air slip ring, the air slip ring is sleeved inside the extension rod (52), and the air slip ring is respectively connected with The plurality of first suction components (62) and the plurality of third suction components (65) are in communication. 如申請專利範圍第1或4項所記載之預對準裝置,其中,前述預對準裝置進一步包含感測器(200)及擋片(300),前述感測器(200)設置在前述圓環吸盤(70)或前述第二吸附組件(71)上,前述擋片(300)設置在前述爪盤(60)上;或,前述感測器(200)設置在前述爪盤(60)上,前述擋片(300)設置在前述圓環吸盤(70)或前述第二吸附組件(71)上;當前述多個第一吸附組件(62)與前述多個第二吸附組件(71)沿徑向位置發生重疊時,前述擋片(300)觸發前述感測器(200)。 The pre-alignment device described in item 1 or 4 of the scope of patent application, wherein the pre-alignment device further includes a sensor (200) and a baffle (300), and the sensor (200) is arranged on the circle On the ring sucker (70) or the aforementioned second suction assembly (71), the aforementioned baffle (300) is arranged on the aforementioned claw plate (60); or, the aforementioned sensor (200) is arranged on the aforementioned claw plate (60) , The aforementioned baffle (300) is arranged on the aforementioned annular suction cup (70) or the aforementioned second adsorption assembly (71); when the aforementioned multiple first adsorption assemblies (62) and the aforementioned multiple second adsorption assemblies (71) are along When the radial positions overlap, the shutter (300) triggers the sensor (200). 如申請專利範圍第1項所記載之預對準裝置,其中,前述爪盤(60)至少包含多個爪杆(61),前述多個爪杆(61)由爪盤(60)中心向外發散分佈,相鄰的兩個爪杆(61)之間形成前述交接空隙,每個前述第一吸附組件(62)設置在對應的前述爪杆(61)的端部。 The pre-alignment device described in the first item of the scope of patent application, wherein the claw plate (60) includes at least a plurality of claw rods (61), and the claw rods (61) extend from the center of the claw plate (60) outward Divergent distribution, the aforementioned handover gap is formed between two adjacent claw rods (61), and each of the aforementioned first suction components (62) is arranged at the end of the corresponding aforementioned claw rod (61). 如申請專利範圍第10項所記載之預對準裝置,其中,相鄰的兩個爪杆(61)之間設置有加強筋(66)。 For the pre-alignment device described in item 10 of the scope of patent application, a reinforcing rib (66) is provided between two adjacent claw rods (61). 如申請專利範圍第1或4項所記載之預對準裝置,其中,前述爪盤(60)的中心位置處設置有剛性支撐塊(64)。 For the pre-alignment device described in item 1 or 4 of the scope of patent application, a rigid support block (64) is provided at the center of the aforementioned claw plate (60). 如申請專利範圍第1或4項所記載之預對準裝置,其中,當前述爪盤(60)與前述圓環吸盤(70)進行矽片交接時,若前述多個第一吸附組件(62)與前述多個第二吸附組件(71)沿徑向位置發生重疊,前述旋轉軸(51)帶動前述爪盤(60)旋轉預設角度使前述多個第一吸附組件(62)與前述多個第二吸附組件(71)的位置錯開,其中,前述預設角度小於相鄰的兩個前述第一吸附組件(62)之間的夾角的1/3倍。 For example, the pre-alignment device described in item 1 or 4 of the scope of patent application, wherein, when the claw plate (60) and the ring sucker (70) are transferred to silicon wafers, if the plurality of first suction components (62) ) Overlaps with the aforementioned plurality of second suction components (71) in the radial position, the aforementioned rotating shaft (51) drives the aforementioned claw plate (60) to rotate a preset angle so that the aforementioned plurality of first suction components (62) and the aforementioned multiple The positions of the two second suction components (71) are staggered, wherein the predetermined angle is less than 1/3 of the included angle between two adjacent first suction components (62). 一種基於申請專利範圍第1至13項中任一項所記載之預對準裝置的預對準方法,其特徵係,其包含以下步驟: A pre-alignment method based on the pre-alignment device described in any one of items 1 to 13 in the scope of the patent application, which is characterized by including the following steps: 爪盤(60)接收矽片; The claw plate (60) receives the silicon wafer; 旋轉軸(51)帶動爪盤(60)旋轉,光機組件(40)採集矽片邊緣訊息,並將採集到的矽片邊緣訊息發送至控制器; The rotating shaft (51) drives the claw plate (60) to rotate, and the opto-mechanical component (40) collects the edge information of the silicon wafer, and sends the collected edge information of the silicon wafer to the controller; 控制器根據接收到的矽片邊緣訊息計算矽片的偏心量,並根據偏心量控制旋轉軸(51)旋轉,將矽片偏心量最大的方向旋轉至補償軸 (30)運動方向; The controller calculates the eccentricity of the silicon wafer according to the received wafer edge information, and controls the rotation of the rotating shaft (51) according to the eccentricity, and rotates the direction of the largest eccentricity of the silicon wafer to the movement direction of the compensation axis (30); 升降軸(20)下降至交接工位,矽片由爪盤(60)交接至圓環吸盤(70); The lifting shaft (20) is lowered to the transfer station, and the silicon wafer is transferred from the claw plate (60) to the ring sucker (70); 升降軸(20)帶動爪盤(60)繼續下降至交接低位,補償軸(30)帶動圓環吸盤(70)運動,補償矽片的偏心量; The lifting shaft (20) drives the claw plate (60) to continue to descend to the transfer low position, and the compensation shaft (30) drives the ring sucker (70) to move to compensate for the eccentricity of the silicon wafer; 升降軸(20)帶動爪盤(60)上升至交接工位,矽片由圓環吸盤(70)交接至爪盤(60)上; The lifting shaft (20) drives the claw plate (60) up to the transfer station, and the silicon wafer is transferred from the ring sucker (70) to the claw plate (60); 升降軸(20)帶動爪盤(60)繼續上升至預對準工位,旋轉軸(51)帶動爪盤(60)旋轉,光機組件(40)採集矽片缺口訊息及矽片邊緣訊息,並將採集到的矽片缺口訊息及矽片邊緣訊息發送至控制器; The lifting shaft (20) drives the claw plate (60) to continue to rise to the pre-alignment position, the rotating shaft (51) drives the claw plate (60) to rotate, and the optomechanical component (40) collects silicon chip notch information and silicon edge information, And send the collected silicon gap information and silicon edge information to the controller; 控制器根據矽片缺口訊息及矽片邊緣訊息計算矽片的偏心餘量,當矽片的偏心餘量滿足預設條件時,旋轉軸(51)轉動將矽片的缺口旋轉至光機組件(40)下方; The controller calculates the eccentricity margin of the silicon wafer according to the wafer gap information and the wafer edge information. When the eccentricity margin of the silicon wafer meets the preset condition, the rotating shaft (51) rotates to rotate the wafer gap to the optomechanical component ( 40) Below; 旋轉軸(51)小角度往返旋轉,光機組件(40)採集矽片缺口訊息並發送至控制器,控制器根據矽片缺口訊息計算得到矽片缺口位置誤差,旋轉軸(51)根據補償缺口位置誤差旋轉,完成矽片的定向。 The rotating shaft (51) rotates back and forth at a small angle. The opto-mechanical component (40) collects the wafer gap information and sends it to the controller. The controller calculates the wafer gap position error according to the wafer gap information, and the rotation axis (51) compensates for the gap The position error rotates to complete the orientation of the silicon wafer. 如申請專利範圍第14項所記載之預對準方法,其中, Such as the pre-alignment method described in item 14 of the scope of patent application, where: 前述升降軸(20)下降至交接工位,矽片由爪盤(60)交接至圓環吸盤(70)的步驟之前包含:當前述第一吸附組件(62)與第二吸附組件(71)沿徑向位置重疊時,旋轉軸(51)帶動爪盤(60)旋轉預設角度使前述第一吸附組件(62)與前述第二吸附組件(71)的位置錯開; The lifting shaft (20) is lowered to the transfer station, and the silicon wafer is transferred from the claw plate (60) to the ring suction cup (70) before the step includes: when the first suction assembly (62) and the second suction assembly (71) When the positions overlap in the radial direction, the rotating shaft (51) drives the claw plate (60) to rotate a preset angle so that the positions of the first suction assembly (62) and the second suction assembly (71) are staggered; 前述升降軸(20)帶動爪盤(60)繼續下降至交接低位的步驟之後包含:旋轉軸(51)帶動爪盤(60)繼續同向旋轉預設角度; After the step of the lifting shaft (20) driving the claw plate (60) to continue to descend to the transfer low position, the step includes: the rotating shaft (51) drives the claw plate (60) to continue to rotate at a predetermined angle in the same direction; 前述升降軸(20)帶動爪盤(60)上升至交接工位,矽片由圓環吸盤(70)交接至爪盤(60)上的步驟之後包含:旋轉軸(51)帶動爪盤(60)反向旋轉預設角度。 The lifting shaft (20) drives the claw plate (60) up to the transfer station, and the step of transferring the silicon wafer from the ring sucker (70) to the claw plate (60) includes: the rotating shaft (51) drives the claw plate (60) ) Reverse rotation by preset angle. 如申請專利範圍第15項所記載之預對準方法,其中,前述預設角度小於相鄰的兩個前述第一吸附組件(62)之間的夾角的1/3倍。 The pre-alignment method described in item 15 of the scope of patent application, wherein the predetermined angle is less than 1/3 of the included angle between two adjacent first suction components (62). 如申請專利範圍第14項所記載之預對準方法,其中,前述爪盤(60)接收矽片的步驟包含:片叉將矽片放置在爪盤(60)上,第一吸附組件(62)開真空,吸附矽片。 For example, the pre-alignment method described in item 14 of the scope of patent application, wherein the step of receiving the silicon wafer by the claw plate (60) includes: placing the silicon wafer on the claw plate (60) by a fork, and the first suction assembly (62) ) Turn on the vacuum to absorb the silicon wafer. 如申請專利範圍第14項所記載之預對準方法,其中,前述爪盤(60)接收矽片的步驟包含: Such as the pre-alignment method described in item 14 of the scope of patent application, wherein the step of receiving the silicon wafer by the claw plate (60) includes: 升降軸(20)帶動爪盤(60)下降至上片工位,片叉將矽片放置在圓環吸盤(70)上,第二吸附組件(71)開真空,吸附矽片; The lifting shaft (20) drives the claw plate (60) down to the wafer loading station, the wafer fork places the silicon wafer on the ring suction cup (70), the second suction assembly (71) opens a vacuum to adsorb the silicon wafer; 升降軸(20)帶動爪盤(60)上升至交接工位,第一吸附組件(62)開真空,吸附矽片,第二吸附組件(71)關真空,升降軸(20)帶動爪盤(60)上升至預對準工位。 The lifting shaft (20) drives the claw plate (60) up to the transfer station, the first suction assembly (62) opens the vacuum to suck the silicon wafer, the second suction assembly (71) closes the vacuum, and the lifting shaft (20) drives the claw plate ( 60) Ascend to the pre-alignment station. 如申請專利範圍第14項所記載之預對準方法,其中,前述爪盤(60)接收矽片的步驟之前,包含以下步驟:根據矽片的尺寸調節位置調整組件,調整光機組件(40)至與矽片尺寸對應的工位。 For example, the pre-alignment method described in item 14 of the scope of patent application, wherein, before the step of receiving the silicon wafer by the claw plate (60), it includes the following steps: adjusting the position adjustment component according to the size of the silicon wafer, and adjusting the optomechanical component (40 ) To the station corresponding to the size of the silicon wafer.
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