TWI707426B - Pre-alignment device and method - Google Patents
Pre-alignment device and method Download PDFInfo
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- TWI707426B TWI707426B TW108134274A TW108134274A TWI707426B TW I707426 B TWI707426 B TW I707426B TW 108134274 A TW108134274 A TW 108134274A TW 108134274 A TW108134274 A TW 108134274A TW I707426 B TWI707426 B TW I707426B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
本發明揭示一種預對準裝置及方法,該預對準裝置包含底板、設置在底板上的升降軸、補償軸及光機組件,亦進一步包含旋轉軸組件、爪盤及圓環吸盤。旋轉軸組件包含設置在升降軸上的旋轉軸及與旋轉軸連接的延長杆;爪盤與延長杆連接,其上間隔設置有多個第一吸附組件;圓環吸盤與補償軸連接,其上設置有多個第二吸附組件,圓環吸盤的直徑小於爪盤的分佈圓直徑,且圓環吸盤套設在旋轉軸組件外側,圓環吸盤與旋轉軸組件之間具有間隙,爪盤上設有交接空隙,用於當爪盤及圓環吸盤進行矽片交接時供第二吸附組件穿過。上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,提高大翹曲片預對準精度。相應地,本發明進一步提供一種預對準方法。 The present invention discloses a pre-alignment device and method. The pre-alignment device includes a bottom plate, a lifting shaft, a compensation shaft, and an opto-mechanical component arranged on the bottom plate, and further includes a rotating shaft component, a claw plate, and a ring sucker. The rotating shaft assembly includes a rotating shaft arranged on the lifting shaft and an extension rod connected to the rotating shaft; the claw plate is connected with the extension rod, and a plurality of first suction components are arranged on it at intervals; the ring sucker is connected with the compensation shaft, on which A plurality of second suction components are provided, the diameter of the circular suction cup is smaller than the diameter of the distribution circle of the claw plate, and the circular suction cup is sleeved on the outside of the rotating shaft assembly, there is a gap between the circular suction cup and the rotating shaft assembly, and the claw plate is provided There is a transfer gap, which is used for the second suction component to pass through when the claw disk and the ring sucker are transferred. The above-mentioned pre-alignment device realizes the adsorption, positioning and flattening of the large warped sheet, and improves the pre-alignment accuracy of the large warped sheet. Correspondingly, the present invention further provides a pre-alignment method.
Description
本發明關於積體電路製造領域,例如關於一種預對準裝置及方法。 The present invention relates to the field of integrated circuit manufacturing, for example, to a pre-alignment device and method.
在半導體器件的生產過程中,為確保矽片能夠以一個固定的姿態進行曝光,矽片傳輸過程中需要以較高的定心及定向精度傳送到工件臺上。因當矽片放置在矽片槽中時,其位置及方向都不確定,因此,在矽片傳輸至工件台之前,需要對矽片進行一定精度的預對準,具體地,藉由測量矽片的圓心來確定矽片的當前位置,並藉由測量矽片缺口的方向來確定矽片的方向。 In the production process of semiconductor devices, in order to ensure that the silicon wafer can be exposed in a fixed posture, the silicon wafer needs to be transferred to the workpiece table with high centering and orientation accuracy during the transmission process. Because when the silicon wafer is placed in the wafer slot, its position and direction are uncertain. Therefore, before the silicon wafer is transferred to the work stage, the silicon wafer needs to be pre-aligned with a certain precision. Specifically, by measuring the silicon wafer The center of the wafer is used to determine the current position of the wafer, and the direction of the wafer is determined by measuring the direction of the wafer gap.
隨著半導體行業的發展,矽片的種類越來越多,為滿足翹曲片、超薄片等多種工藝片的定位需求,中國專利公開號CN105336654A的發明專利揭示一種適應多種工藝類型矽片的預對準裝置,該裝置藉由設置陶瓷吸盤及半月吸盤對矽片進行多點吸附定位以滿足不同類型工藝片的定位需求,能夠適應多種工藝吸盤的預對準。然而,近年來,大翹曲片的出現對預對準設備的適應性提出新的要求。在對大翹曲片進行預對準時,為了確保預對準的精度,需要對翹曲片進行平整化處理,而為了實現翹曲片平整化處理,需要在靠近翹曲片邊緣的區域吸附翹曲片以將翹曲片拉 平,這樣即需要增大陶瓷吸盤的分佈圓直徑,而上述裝置的半月吸盤圍繞在陶瓷吸盤外側設置,如果增大陶瓷吸盤的分佈圓直徑,為了避免陶瓷吸盤及半月吸盤發生干涉,亦需要相應增加半月吸盤的分佈圓直徑。但是,如果半月吸盤的分佈圓直徑增加,會使得半月吸盤的分佈圓直徑大於翹曲片的直徑,導致出現半月吸盤位於翹曲片分佈區域外側,無法對翹曲片進行吸附的情況發生。因此,先前的矽片預對準裝置無法滿足大翹曲片的預對準定位需求。 With the development of the semiconductor industry, there are more and more types of silicon wafers. In order to meet the positioning needs of warped wafers, ultra-thin wafers and other process wafers, the invention patent of China Patent Publication No. CN105336654A discloses a kind of silicon wafers suitable for multiple process types. Pre-alignment device. This device uses ceramic suction cups and half-moon suction cups to perform multi-point adsorption and positioning of silicon wafers to meet the positioning requirements of different types of process wafers, and can adapt to pre-alignment of various process suction cups. However, in recent years, the emergence of large warped sheets has put forward new requirements for the adaptability of pre-alignment equipment. When pre-aligning the large warped sheet, in order to ensure the accuracy of the pre-alignment, the warped sheet needs to be flattened, and in order to realize the flattening process of the warped sheet, the area near the edge of the warped sheet needs to be adsorbed and warped The curved piece is used to flatten the warped piece, so that the diameter of the distribution circle of the ceramic suction cup needs to be increased. The half moon suction cup of the above device is arranged around the outside of the ceramic suction cup. If the distribution circle diameter of the ceramic suction cup is increased, in order to avoid the ceramic suction cup and the half moon When the suction cup interferes, the diameter of the distribution circle of the half moon suction cup needs to be increased accordingly. However, if the diameter of the distribution circle of the half-moon suction cup increases, the diameter of the distribution circle of the half-moon suction cup will be larger than the diameter of the warped sheet, resulting in a situation where the half-moon suction cup is located outside the distribution area of the warped sheet and cannot absorb the warped sheet. Therefore, the prior silicon wafer pre-alignment device cannot meet the pre-alignment and positioning requirements of large warped wafers.
先前的矽片預對準裝置無法滿足大翹曲片的預對準定位需求。本發明實施例的目的在於提出一種預對準裝置及方法,能夠對大翹曲片進行吸附定位及平整化處理,滿足大翹曲片的預對準定位需求,提高大翹曲片的預對準精度。 Previous silicon wafer pre-alignment devices cannot meet the pre-alignment and positioning requirements of large warped wafers. The purpose of the embodiments of the present invention is to provide a pre-alignment device and method that can perform adsorption positioning and flattening processing on large warped sheets, meet the pre-alignment and positioning requirements of large warped sheets, and improve the pre-alignment of large warped sheets. Quasi-precision.
為達此目的,一方面,本發明實施例採用下列技術手段: To achieve this goal, on the one hand, the embodiments of the present invention adopt the following technical means:
一種預對準裝置,包含:底板、設置在底板上的升降軸、補償軸及光機組件,其進一步包含: A pre-alignment device includes: a bottom plate, a lifting shaft, a compensation shaft and an optomechanical component arranged on the bottom plate, and further includes:
旋轉軸組件,包含旋轉軸及延長杆,旋轉軸設置在升降軸上,延長杆的一端與旋轉軸連接; The rotating shaft assembly includes a rotating shaft and an extension rod, the rotating shaft is arranged on the lifting shaft, and one end of the extension rod is connected with the rotating shaft;
爪盤,連接至延長杆的另一端,爪盤上沿周向間隔設置有多個第一吸 附組件; The claw plate is connected to the other end of the extension rod, and a plurality of first suction components are arranged on the claw plate at intervals in the circumferential direction;
圓環吸盤,與補償軸連接,其上設置有多個第二吸附組件,圓環吸盤的直徑小於爪盤的分佈圓直徑,且圓環吸盤套設在旋轉軸組件外側,圓環吸盤與旋轉軸組件之間具有間隙; The ring sucker is connected to the compensation shaft, and a plurality of second suction components are arranged on it. The diameter of the ring sucker is smaller than the diameter of the distribution circle of the claw plate, and the ring sucker is sleeved on the outside of the rotating shaft assembly. There is a gap between the shaft components;
旋轉軸組件能夠帶動爪盤旋轉,升降軸能夠帶動爪盤沿垂直方向做升降運動,補償軸能夠帶動圓環吸盤沿水平方向運動,爪盤上設有交接空隙,用於當爪盤及圓環吸盤進行矽片交接時供第二吸附組件穿過。 The rotating shaft assembly can drive the claw plate to rotate, the lifting shaft can drive the claw plate to move up and down in the vertical direction, and the compensation shaft can drive the ring sucker to move in the horizontal direction. The claw plate is provided with a connection gap for the claw plate and the ring The second suction component passes through the suction cup when the silicon wafer is transferred.
在一實施例中,每個第一吸附組件及/或每個第二吸附組件均包含剛性支柱及橡膠吸盤,剛性支柱上開設有第一通氣孔,橡膠吸盤與剛性支柱連接,且橡膠吸盤與第一通氣孔連通。 In an embodiment, each first suction component and/or each second suction component includes a rigid support and a rubber suction cup, the rigid support is provided with a first vent hole, the rubber suction cup is connected to the rigid support, and the rubber suction cup is connected to the rigid support The first vent is connected.
在一實施例中,每個第一吸附組件及/或每個第二吸附組件均包含:剛性支柱、彈性件、彈性支柱及橡膠吸盤,彈性件設置在剛性支柱內部,彈性支柱上開設有第二通氣孔,彈性支柱一端設置在剛性支柱內與彈性件套接,另一端設置在剛性支柱外部與橡膠吸盤連接,橡膠吸盤與第二通氣孔連通。 In one embodiment, each first suction component and/or each second suction component includes: a rigid pillar, an elastic member, an elastic pillar, and a rubber suction cup. The elastic member is arranged inside the rigid pillar, and the elastic pillar is provided with a first Two vents, one end of the elastic support is arranged in the rigid support to be sleeved with the elastic member, and the other end is arranged outside the rigid support to be connected to the rubber suction cup, and the rubber suction cup is connected to the second ventilation hole.
在一實施例中,爪盤上進一步設置有多個第三吸附組件,每個前述第三吸附組件的中心與對應的前述第一吸附組件的中心及前述爪盤的中心共線,且前述第三吸附組件設置在對應的前述第一吸附組件及前述爪盤的中心之間。 In an embodiment, a plurality of third suction components are further provided on the claw plate, and the center of each third suction component is collinear with the center of the corresponding first suction component and the center of the claw plate, and the first suction component The three suction components are arranged between the corresponding first suction component and the center of the claw plate.
在一實施例中,每個第三吸附組件包含剛性支柱及橡膠吸盤,剛性支柱上開設有第一通氣孔,橡膠吸盤與剛性支柱連接,且橡膠吸盤與第一通氣孔連通。 In one embodiment, each third suction component includes a rigid pillar and a rubber suction cup, the rigid pillar is provided with a first vent hole, the rubber suction cup is connected to the rigid pillar, and the rubber suction cup communicates with the first vent hole.
在一實施例中,每個第三吸附組件包含:剛性支柱、彈性件、彈性支柱及橡膠吸盤,彈性件設置在剛性支柱內部,彈性支柱上開設有第二通氣孔,彈性支柱一端設置在剛性支柱內與彈性件套接,另一端設置在剛性支柱外部與橡膠吸盤連接,橡膠吸盤與第二通氣孔連通。 In one embodiment, each third suction component includes: a rigid support, an elastic member, an elastic support, and a rubber suction cup. The elastic member is arranged inside the rigid support, the elastic support is provided with a second vent hole, and one end of the elastic support is set on the rigid The inside of the pillar is sleeved with the elastic member, and the other end is arranged outside the rigid pillar to connect with a rubber suction cup, and the rubber suction cup communicates with the second vent hole.
在一實施例中,預對準裝置進一步包含位置調整組件,位置調整組件包含滑軌、滑塊及驅動件。滑軌與底板連接,滑塊可在滑軌上滑動,且光機組件安裝在滑塊上,驅動件與滑塊連接。 In one embodiment, the pre-alignment device further includes a position adjustment component, and the position adjustment component includes a sliding rail, a sliding block, and a driving member. The sliding rail is connected with the bottom plate, the sliding block can slide on the sliding rail, and the optical machine component is installed on the sliding block, and the driving part is connected with the sliding block.
在一實施例中,預對準裝置進一步包含氣滑環,氣滑環套設在延長杆內側,且氣滑環分別與多個第一吸附組件及多個第三吸附組件連通。 In one embodiment, the pre-alignment device further includes an air slip ring, the air slip ring is sleeved inside the extension rod, and the air slip ring is respectively communicated with the plurality of first suction components and the plurality of third suction components.
在一實施例中,預對準裝置進一步包含感測器及擋片,感測器設置在圓環吸盤或第二吸附組件上,擋片設置在爪盤上;或,感測器設置在爪盤上,擋片設置在圓環吸盤或第二吸附組件上;當多個第一吸附組件與多個第二吸附組件沿徑向位置重疊時,擋片觸發感測器。 In one embodiment, the pre-alignment device further includes a sensor and a stopper, the sensor is arranged on the ring suction cup or the second suction assembly, and the stopper is arranged on the claw plate; or, the sensor is arranged on the claw On the disk, the baffle is arranged on the ring suction cup or the second suction assembly; when the plurality of first suction components and the plurality of second suction components overlap in the radial position, the baffle triggers the sensor.
在一實施例中,爪盤至少包含多個爪杆,多個爪杆由爪盤中心向外發散分佈,相鄰的所爪杆之間形成交接空隙,每個第一吸附組件設置在對應的爪杆的端部。 In an embodiment, the claw plate includes at least a plurality of claw rods, and the plurality of claw rods are distributed outwardly from the center of the claw plate, and a communication gap is formed between the adjacent claw rods, and each first suction component is arranged in a corresponding The end of the claw rod.
在一實施例中,相鄰的兩個爪杆之間設置有加強筋。 In an embodiment, a reinforcing rib is provided between two adjacent claw rods.
在一實施例中,爪盤的中心位置處設置有剛性支撐塊。 In an embodiment, a rigid support block is provided at the center of the claw plate.
在一實施例中,當爪盤與圓環吸盤進行矽片交接時,若多個第一吸附組件與多個第二吸附組件沿徑向位置重疊,旋轉軸帶動爪盤旋轉預設角度使多個第一吸附組件與多個第二吸附組件的位置錯開,其中, 預設角度小於相鄰的兩個第一吸附組件之間的夾角的1/3倍。 In one embodiment, when the claw plate and the ring sucker are connected to the silicon wafer, if the plurality of first suction components and the plurality of second suction components overlap in the radial position, the rotating shaft drives the claw plate to rotate by a predetermined angle so that the The positions of the first suction components and the plurality of second suction components are staggered, wherein the preset angle is less than 1/3 of the included angle between two adjacent first suction components.
另一方面,本發明實施例進一步提供一種基於上述任一項的預對準裝置的預對準方法,包含下列步驟: On the other hand, an embodiment of the present invention further provides a pre-alignment method based on any one of the above-mentioned pre-alignment devices, including the following steps:
爪盤接收矽片; The claw plate receives the silicon wafer;
旋轉軸帶動爪盤旋轉,光機組件採集矽片邊緣訊息,並將採集到的矽片邊緣訊息發送至控制器; The rotating shaft drives the claw plate to rotate, and the opto-mechanical component collects the edge information of the silicon wafer and sends the collected edge information of the silicon wafer to the controller;
控制器根據接收到的矽片邊緣訊息計算矽片的偏心量,並根據偏心量控制旋轉軸旋轉,將矽片偏心量最大的方向旋轉至補償軸運動方向; The controller calculates the eccentricity of the silicon wafer according to the received silicon edge information, and controls the rotation of the rotating shaft according to the eccentricity, and rotates the direction of the largest silicon eccentricity to the compensation axis movement direction;
升降軸下降至交接工位,矽片由爪盤交接至圓環吸盤; The lifting shaft is lowered to the transfer station, and the silicon wafer is transferred from the claw plate to the ring suction cup;
升降軸帶動爪盤繼續下降至交接低位,補償軸帶動圓環吸盤運動,補償矽片的偏心量; The lifting shaft drives the claw plate to continue to descend to the transfer low position, and the compensation shaft drives the ring sucker to move to compensate for the eccentricity of the silicon wafer;
升降軸帶動爪盤上升至交接工位,矽片由圓環吸盤交接至爪盤上; The lifting shaft drives the claw plate up to the transfer station, and the silicon wafer is transferred from the ring sucker to the claw plate;
升降軸帶動爪盤繼續上升至預對準工位,旋轉軸帶動爪盤旋轉,光機組件採集矽片缺口訊息及矽片邊緣訊息,並將採集到的矽片缺口訊息及矽片邊緣訊息發送至控制器; The lifting shaft drives the claw plate to continue to rise to the pre-alignment position, and the rotating shaft drives the claw plate to rotate. The opto-mechanical component collects silicon chip gap information and silicon chip edge information, and sends the collected silicon chip gap information and silicon chip edge information To the controller
控制器根據矽片缺口訊息及矽片邊緣訊息計算矽片的偏心餘量,當矽片的偏心餘量滿足預設條件時,旋轉軸轉動將矽片的缺口旋轉至光機組件下方; The controller calculates the eccentricity margin of the silicon wafer according to the wafer gap information and the wafer edge information. When the eccentricity margin of the silicon wafer meets the preset conditions, the rotation axis rotates to rotate the wafer gap below the optomechanical component;
旋轉軸小角度往返旋轉,光機組件採集矽片缺口訊息並發送至控制器,控制器根據矽片缺口訊息計算得到矽片缺口位置誤差,旋轉軸根據補償缺口位置誤差旋轉,完成矽片的定向。 The rotation axis rotates back and forth at a small angle. The opto-mechanical component collects the wafer gap information and sends it to the controller. The controller calculates the wafer gap position error according to the wafer gap information. The rotation axis rotates according to the compensation gap position error to complete the wafer orientation .
在一實施例中,升降軸下降至交接工位,矽片由爪盤交接 至圓環吸盤的步驟之前包含:當第一吸附組件與第二吸附組件沿徑向位置重疊時,旋轉軸帶動爪盤旋轉預設角度使第一吸附組件與第二吸附組件的位置錯開; In one embodiment, the lifting shaft is lowered to the transfer station, and the silicon wafer is transferred from the claw plate to the ring sucker before the step includes: when the first suction component and the second suction component overlap in the radial position, the rotating shaft drives the claw The disc rotates at a preset angle so that the positions of the first suction component and the second suction component are staggered;
升降軸帶動爪盤繼續下降至交接低位的步驟之後包含:旋轉軸帶動爪盤繼續同向旋轉預設角度; After the step that the lifting shaft drives the claw plate to continue to descend to the transfer low position includes: the rotating shaft drives the claw plate to continue to rotate in the same direction by a preset angle;
升降軸帶動爪盤上升至交接工位,矽片由圓環吸盤交接至爪盤上的步驟之後包含:旋轉軸帶動爪盤反向旋轉預設角度。 The lifting shaft drives the claw plate up to the transfer station, and the step of transferring the silicon wafer from the ring sucker to the claw plate includes: the rotating shaft drives the claw plate to reversely rotate a preset angle.
在一實施例中,預設角度小於相鄰的兩個第一吸附組件之間的夾角的1/3倍。 In one embodiment, the preset angle is less than 1/3 of the included angle between two adjacent first suction components.
在一實施例中,爪盤接收矽片的步驟包含:片叉將矽片放置在爪盤上,第一吸附組件開真空,吸附矽片。 In one embodiment, the step of receiving the silicon wafer by the claw plate includes: placing the silicon wafer on the claw plate by the wafer fork, and the first suction component is vacuumed to adsorb the silicon wafer.
在一實施例中,爪盤接收矽片的步驟包含: In one embodiment, the step of receiving the silicon wafer by the claw plate includes:
升降軸帶動爪盤下降至上片工位,片叉將矽片放置在圓環吸盤上,第二吸附組件開真空,吸附矽片; The lifting shaft drives the claw plate down to the loading station, the wafer fork places the silicon wafer on the circular suction cup, and the second suction assembly opens the vacuum to adsorb the silicon wafer;
升降軸帶動爪盤上升至交接工位,第一吸附組件開真空,吸附矽片,第二吸附組件關真空,升降軸帶動爪盤上升至預對準工位。 The lifting shaft drives the claw plate up to the transfer station, the first suction component opens the vacuum to suck the silicon wafer, the second suction component closes the vacuum, and the lifting shaft drives the claw plate to the pre-alignment station.
在其中一個實施例中,爪盤接收矽片的步驟之前,包含下列步驟:根據矽片的尺寸調節位置調整組件,調整光機組件至與矽片尺寸對應的工位。 In one of the embodiments, the step of receiving the silicon wafer by the claw plate includes the following steps: adjusting the position adjustment component according to the size of the silicon wafer, and adjusting the opto-mechanical component to a position corresponding to the size of the silicon wafer.
上述的預對準裝置包含爪盤及圓環吸盤,圓環吸盤的直徑小於爪盤的分佈圓直徑,旋轉軸上設置有延長杆,爪盤與延長杆連接,圓環吸盤套設在旋轉軸組件外側,且圓環吸盤與旋轉軸組件之間具有間隙。 爪盤的分佈圓直徑大於圓環吸盤的直徑,設置在爪盤上的第一吸附組件能夠在大翹曲片的邊緣區域吸附大翹曲片,以拉平大翹曲片,從而實現大翹曲片平正化處理。同時,爪盤及圓環吸盤進行矽片交接時,爪盤沿垂直方向下降,第一吸附組件與第二吸附組件相互錯開設置,第二吸附組件位於相鄰的兩個第一吸附組件之間的交接空隙內,第一吸附組件及第二吸附組件互不干涉。並且,圓環吸盤與旋轉軸組件之間具有間隙,為圓環吸盤水平運動提供運動空間,圓環吸盤隨補償軸做水平運動時亦不會與旋轉軸組件發生干涉。因此,與先前的矽片對準裝置相比,上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,能夠滿足大翹曲片的預對準定位需求,提高大翹曲片預對準精度。 The above-mentioned pre-alignment device includes a claw plate and a ring suction cup. The diameter of the ring suction cup is smaller than the diameter of the distribution circle of the claw plate. An extension rod is arranged on the rotating shaft. The claw plate is connected with the extension rod. The ring suction cup is sleeved on the rotating shaft. There is a gap between the ring sucker and the rotating shaft assembly on the outside of the assembly. The diameter of the distribution circle of the claw plate is larger than the diameter of the ring sucker, and the first suction component arranged on the claw plate can absorb the large warping piece at the edge area of the large warping piece to flatten the large warping piece, thereby achieving large warpage Flattening the film. At the same time, when the claw plate and the circular suction cup are connected to the silicon wafer, the claw plate is lowered in the vertical direction, the first suction assembly and the second suction assembly are staggered with each other, and the second suction assembly is located between two adjacent first suction assemblies The first suction component and the second suction component do not interfere with each other in the connecting gap. In addition, there is a gap between the ring sucker and the rotating shaft assembly, which provides movement space for the horizontal movement of the ring sucker, and the ring sucker will not interfere with the rotating shaft assembly when it moves horizontally with the compensation shaft. Therefore, compared with the previous silicon wafer alignment device, the above-mentioned pre-alignment device realizes the adsorption positioning and flattening treatment of the large warped sheet, which can meet the pre-aligned positioning requirements of the large warped sheet and improve the large warpage Film pre-alignment accuracy.
基於上述預對準裝置的預對準方法能夠對大翹曲片進行吸附定位及平整化處理,提高大翹曲片預對準精度。 The pre-alignment method based on the above-mentioned pre-alignment device can perform adsorption positioning and flattening treatment on the large warped sheet, and improve the pre-alignment accuracy of the large warped sheet.
本發明實施例的目的在於提出一種預對準裝置及方法,能夠對大翹曲片進行吸附定位及平整化處理,滿足大翹曲片的預對準定位需求,提高大翹曲片的預對準精度。 The purpose of the embodiments of the present invention is to provide a pre-alignment device and method that can perform adsorption positioning and flattening processing on large warped sheets, meet the pre-alignment and positioning requirements of large warped sheets, and improve the pre-alignment of large warped sheets. Quasi-precision.
10‧‧‧底板 10‧‧‧Bottom plate
20‧‧‧升降軸 20‧‧‧Lift shaft
30‧‧‧補償軸 30‧‧‧Compensation axis
40‧‧‧光機組件 40‧‧‧Optical Machine Components
41‧‧‧光機支撐座 41‧‧‧Optical Machine Support
42‧‧‧第一光源 42‧‧‧First light source
43‧‧‧鏡頭 43‧‧‧Lens
44‧‧‧CCD相機 44‧‧‧CCD camera
45‧‧‧第二光源 45‧‧‧Second light source
50‧‧‧旋轉軸組件 50‧‧‧Rotating shaft assembly
51‧‧‧旋轉軸 51‧‧‧Rotation axis
52‧‧‧延長杆 52‧‧‧Extension Rod
60‧‧‧爪盤 60‧‧‧Claw plate
61‧‧‧爪杆 61‧‧‧Claw lever
62‧‧‧第一吸附組件 62‧‧‧First suction assembly
63‧‧‧氣管接頭 63‧‧‧Air pipe joint
64‧‧‧剛性支撐塊 64‧‧‧Rigid support block
65‧‧‧第三吸附組件 65‧‧‧Third suction assembly
66‧‧‧加強筋 66‧‧‧Reinforcing rib
70‧‧‧圓環吸盤 70‧‧‧Ring Suction Cup
71‧‧‧第二吸附組件 71‧‧‧Second suction assembly
80‧‧‧位置調整組件 80‧‧‧Position adjustment components
81‧‧‧滑軌 81‧‧‧Slide rail
82‧‧‧滑塊 82‧‧‧Slider
83‧‧‧驅動件 83‧‧‧Drive
200‧‧‧感測器 200‧‧‧Sensor
300‧‧‧擋片 300‧‧‧Block
621‧‧‧剛性支柱 621‧‧‧rigid pillar
622‧‧‧彈性件 622‧‧‧Elastic Parts
623‧‧‧彈性支柱 623‧‧‧Elastic pillar
624‧‧‧橡膠吸盤 624‧‧‧Rubber Suction Cup
625‧‧‧第二通氣孔 625‧‧‧Second vent
626‧‧‧第一通氣孔 626‧‧‧First vent
【圖1】為本發明一實施例中預對準裝置的結構示意圖。 [Figure 1] is a schematic structural diagram of a pre-alignment device in an embodiment of the present invention.
【圖2】為本發明一實施例中第一吸附組件與氣管接頭連接的結構剖視圖。 [Figure 2] is a cross-sectional view of the connection between the first suction component and the tracheal joint in an embodiment of the present invention.
【圖3】為本發明又一實施例中預對準裝置的結構示意圖。 [Fig. 3] is a schematic structural diagram of a pre-alignment device in another embodiment of the present invention.
【圖4】為本發明又一實施例中第一吸附組件的結構剖視圖。 [Figure 4] is a cross-sectional view of the structure of the first suction component in another embodiment of the present invention.
【圖5】為本發明另一實施例中預對準裝置的結構示意圖。 [Fig. 5] is a schematic structural diagram of a pre-alignment device in another embodiment of the present invention.
【圖6】為本發明一實施例中預對準裝置的方法流程圖。 [Figure 6] is a flow chart of a method of pre-aligning a device in an embodiment of the present invention.
下面結合圖式並藉由具體實施方式來進一步說明本發明的技術手段。 The technical means of the present invention will be further described below in conjunction with the drawings and specific implementations.
在本發明的描述中,需要理解的是,詞彙「上」、「下」、「前」、「後」、「左」、「右」、「垂直」、「水平」、「頂」、「底」、「內」、「外」等指示的方位或位置關係為基於圖式所示的方位或位置關係,僅是為了便於描述本發明及簡化描述,而不是指示或暗示所指的裝置或組件必須具有特定的方位、以特定的方位構造及操作,因此不能理解為對本發明的限制。 In the description of the present invention, it should be understood that the words "up", "down", "front", "rear", "left", "right", "vertical", "horizontal", "top", " The orientation or positional relationship indicated by "bottom", "inner", "outer", etc. are based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply the device or The components must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present invention.
請參閱圖1,一實施例的預對準裝置包含:底板10、設置在底板10上的升降軸20、補償軸30及光機組件40,進一步包含旋轉軸組件50、爪盤60及圓環吸盤70。旋轉軸組件50包含旋轉軸51及延長杆52,旋轉軸51設置在升降軸20上,延長杆52的一端與旋轉軸51連接;爪盤60連接至延長杆52的另一端,爪盤60上沿周向間隔設置有多個第一吸附組件62;圓環吸盤70與補償軸30連接,其上設置有多個第二吸附組件71,圓環吸盤70的直徑小於爪盤60的分佈圓直徑,且圓環吸盤70套設在旋轉軸組件50外側,圓環吸盤70與旋轉軸組件50之間具有間隙。
Please refer to FIG. 1, the pre-alignment device of an embodiment includes: a
旋轉軸組件50能夠帶動爪盤60旋轉,升降軸20能夠帶動爪盤60沿垂直方向做升降運動,補償軸30能夠帶動圓環吸盤70沿水平方向運動,爪盤60上設有交接空隙,該交接空隙用於當轉盤(60)及圓環吸盤70進行矽片交接時供第二吸附組件71穿過。
The rotating shaft assembly 50 can drive the
具體地,光機組件40與升降軸20相鄰設置,其用於在爪盤60及圓環吸盤70運動過程中採集大翹曲矽片的邊緣訊息及缺口訊息並將採集到訊息發送給控制器,控制器用於根據大翹曲矽片的邊緣訊息及缺口訊息進行計算,得到大翹曲矽片的圓心及方向,具體控制器可以為集成在光刻機控制器內的控制模組,亦可以為預對準裝置獨立設置的控制器,本實施例不做具體限定。
Specifically, the opto-
進一步地,如圖1所示,光機組件40包含光機支撐座41、第一光源42、鏡頭43、CCD相機44及第二光源45,光機支撐座41安裝在底板10上,CCD相機44安裝在光機支撐座41上,第一光源42及鏡頭43均安裝在CCD相機44上,第二光源45安裝在光機支撐座41上。CCD相機44藉由鏡頭43採集大翹曲矽片的圖像,獲取大翹曲矽片的邊緣訊息及缺口訊息發送至控制器。
Further, as shown in FIG. 1, the
上述的預對準裝置包含爪盤60及圓環吸盤70,圓環吸盤70的直徑小於爪盤60的分佈圓直徑,旋轉軸51上設置有延長杆52,爪盤60與延長杆52連接,圓環吸盤70套設在旋轉軸組件50外側,且圓環吸盤70與旋轉軸組件50之間具有間隙。爪盤60的分佈圓直徑大於圓環吸盤70的直徑,設置在爪盤60上的多個第一吸附組件62能夠在大翹曲
片的邊緣區域吸附大翹曲片,以拉平大翹曲片,實現大翹曲片平正化處理。同時,爪盤60及圓環吸盤70進行矽片交接時,爪盤60沿垂直方向下降,多個第一吸附組件62與多個第二吸附組件71相互錯開設置,每個第二吸附組件71位於相鄰的兩個第一吸附組件62之間的交接空隙內,多個第一吸附組件62及多個第二吸附組件71互不干涉。並且,圓環吸盤70與旋轉軸組件50之間具有間隙,為圓環吸盤70水平運動提供運動空間,圓環吸盤70隨補償軸30做水平運動時亦不會與旋轉軸51組件發生干涉。因此,與先前的矽片對準裝置相比,上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,能夠滿足大翹曲片的預對準定位需求,提高大翹曲片預對準精度。
The above-mentioned pre-alignment device includes a
在一個實施例中,爪盤60至少包含多個爪杆61,多個爪杆61由爪盤中心向外發散分佈,相鄰的兩個爪杆61之間形成交接空隙,每個第一吸附組件62設置在對應的爪杆61的端部。具體地,如圖1所示,爪盤60包含多個爪杆61,多個爪杆61由爪盤中心向外發散分佈,多個爪杆61沿周向等間距間隔設置,相鄰的兩個爪杆61之間形成交接空隙,每個爪杆61的端部設置一個第一吸附組件62。當爪盤60及圓環吸盤70進行矽片交接時,前述多個爪杆61與多個第二吸附組件71相互錯開設置,以帶動多個第一吸附組件62與多個第二吸附組件71相互錯開設置,使多個第二吸附組件71可穿過交接空隙。本實施例中,爪盤60包含多個間隔設置的爪杆61,以在相鄰的兩個爪杆61之間形成交接空隙,在其它實施例中,亦可以在爪盤60上於相鄰的兩個第一吸附組件62之間開設能夠使對應的第二吸附組件71穿過的通孔作為交接間隙,本實施例並不做
具體限定。
In one embodiment, the
如圖2所示,在一個實施例中,每個第一吸附組件62包含:剛性支柱621、彈性件622、彈性支柱623及橡膠吸盤624,彈性件622設置在剛性支柱621內部,彈性支柱623上開設有第二通氣孔625,彈性支柱623一端設置在剛性支柱621內與彈性件622套接,另一端設置在剛性支柱621外部與橡膠吸盤624連接,橡膠吸盤624與第二通氣孔625連通。進一步地,第二通氣孔625藉由氣管接頭63連接氣源。本實施例中,橡膠吸盤624藉由彈性支柱623與剛性支柱621連接,並且彈性支柱623與剛性支柱621之間設置有彈性件622,彈性件622製成彈性支柱623,橡膠吸盤624用於適應剛性支柱621對應的吸附區域內翹曲片的翹曲量,彈性件622支撐彈性支柱623的彈性移動量適應多個第一吸附組件62之間的翹曲片的翹曲量,能夠有效提高多個第一吸附組件62的吸附精度及平整化處理精度。具體地,本實施例中,彈性件622採用彈簧,在其它實施例中,彈性件622進一步可採用其它彈性組件,本實施例並不做具體限定。
As shown in FIG. 2, in one embodiment, each
具體地,每個第二吸附組件71與第一吸附組件62的區別僅在於二者尺寸不同,第二吸附組件71的高度大於第一吸附組件62的高度,其具體結構組成及原理與上述第一吸附組件62的結構組成及原理相同,在此不予贅述。具體第二吸附組件71及第一吸附組件62之間的高度差能夠滿足爪盤60與圓環吸盤70交接時,第一吸附組件62的吸附表面與第二吸附組件71的吸附表面共面,並且,當第二吸附組件71的高度能夠滿足爪盤60與圓環吸盤70完成交接,爪盤繼續向下運動後,第二吸附
組件71的吸附表面高於第一吸附組件62的吸附表面即可,具體第二吸附組件71與第一吸附組件62之間的高度差本實施例並不做具體限定。
Specifically, the difference between each
如圖3、圖4所示,在又一個實施例中,每個第一吸附組件62包含剛性支柱621及橡膠吸盤624,剛性支柱621上開設有第一通氣孔626,橡膠吸盤624與剛性支柱621連接,且橡膠吸盤624與第一通氣孔626連通。進一步地,第一通氣孔626可藉由氣管接頭等導氣組件連接氣源。具體地,每個第二吸附組件71與第一吸附組件62的區別僅在於二者尺寸不同,其具體結構組成及原理與本實施例中第一吸附組件62的結構組成及原理相同,在此不予贅述。本實施例的第一吸附組件62藉由適應翹曲片的翹曲量對翹曲片進行真空吸附,實現對翹曲片的吸附定位及平整化處理,因省去彈性件622及彈性支柱623,本實施例中的第一吸附組件62及第二吸附組件71有利於節約裝置成本。具體地,在實際應用中,可根據具體工藝要求及成本要求選取合適的第一吸附組件62及第二吸附組件71。並且,第一吸附組件62及第二吸附組件71可以採用相同結構,亦可以採用不同結構,上述實施例並不做具體限定。
As shown in Figures 3 and 4, in another embodiment, each
在一個實施例中,上述的預對準裝置進一步包含感測器200及擋片300,感測器200設置在圓環吸盤70或第二吸附組件71上,擋片300設置在爪盤60上;或,感測器200設置在爪盤60上,擋片300設置在圓環吸盤70或第二吸附組件71上;當每個第一吸附組件62與對應的第二吸附組件71在徑向方向存在位置重疊時,擋片300觸發感測器200。具體地,如圖1、圖3所示,爪盤60上設置有六個爪杆61,圓環吸盤70上設置有三個第二吸附組件71,對應的,感測器200的數量為3
個,擋片300的數量為六個,三個感測器200分別設置在第二吸附組件71上,六個擋片300則對應設置在六個爪杆61上,當爪杆61與第二吸附組件71位置有重疊(即第一吸附組件62與第二吸附組件71在徑向方向存在位置重疊)時,擋片300觸發感測器200,此時,爪杆61與第二吸附組件71兩者的位置相互之間存在干涉,導致爪盤60不能直接下降,此時,需要轉動旋轉軸51帶動爪盤60旋轉,使爪盤60旋轉一定角度與第二吸附組件71的位置相互錯開,然後再藉由升降軸20帶動爪盤60下降。上述實施例中,感測器200設置在第二吸附組件71上,擋片300設置在爪杆61上,在其它實施例中,感測器200進一步可以設置在圓環吸盤70上,或者,進一步可以將擋片300設置在圓環吸盤70或第二吸附組件上,而將感測器200設置在爪杆上,只要能確保每個第一吸附組件62與對應的第二吸附組件71在徑向方向存在位置重疊時擋片300能夠觸發感測器200即可,本實施例並不限定感測器200及擋片300的具體設置位置。
In one embodiment, the above-mentioned pre-alignment device further includes a
進一步地,在一個實施例中,當爪盤60與圓環吸盤70進行矽片交接時,若多個第一吸附組件62與多個第二吸附組件71在徑向方向發生位置重疊,則旋轉軸51帶動爪盤60旋轉預設角度使多個第一吸附組件62與多個第二吸附組件71的位置錯開,其中,預設角度小於相鄰的兩個第一吸附組件62之間的夾角的1/3倍。具體地,當需要將爪盤60上的翹曲片交接到圓環吸盤70上時,升降軸20帶動爪盤60沿垂直方向下降,如果第一吸附組件62與第二吸附組件71位置有重疊,即多個爪杆61與多個第二吸附組件71位置發生重疊,要先旋轉爪盤60使多個爪杆61
及多個第二吸附組件71位置錯開。但是,因爪盤60在下降前就進行旋轉操作,爪盤60帶著翹曲片一起旋轉,這使得翹曲片相對原檢測位置轉動一定角度,而當翹曲片由圓環吸盤70交接回爪盤60,再次上升繼續進行檢測時,需要保證翹曲片保持原檢測方位,這樣就需要進行回轉補償,而如果直接進行回轉補償又會使多個爪杆61及多個第二吸附組件71位置重合,對爪盤60上升產生干涉。為使爪盤60在上升過程中不會產生干涉,當爪盤60下降並將翹曲片交接到圓環吸盤70上後,繼續以下降前相同的角度同向旋轉爪盤60,之後,在翹曲片由圓環吸盤70交接回爪盤60之後,爪盤60再逆向旋轉相同角度,即可保證翹曲片回到原檢測方位。因此,本實施例中,設置預設角度小於相鄰的兩個第一吸附組件62之間的夾角的1/3倍,亦就是相鄰的兩個爪杆61之間的夾角的1/3倍,以確保爪盤60同向旋轉兩次都不與第二吸附組件71發生干涉。
Further, in one embodiment, when the
在一個實施例中,如圖1、圖3所示,爪盤60的中心位置處設置有剛性支撐塊64。具體地,剛型支撐塊64的上表面與第一吸附組件62的剛性支柱621的上表面共面。剛性支撐塊64設置在爪盤60中心,六個爪杆61以爪盤60的中心為中心,周向等間距分佈,六個第一吸附組件62分別設置在六個爪杆61的端部,剛性支撐塊64的上表面與各個第一吸附組件62的剛性支柱621的上表面共面,當六個第一吸附組件62吸附翹曲片邊緣並下拉翹曲片邊緣對翹曲片進行拉平時,剛型支撐塊64在翹曲片中心提供共面支撐,能夠進一步提高翹曲片平整化精度。
In one embodiment, as shown in FIGS. 1 and 3, a
上述實施例中,爪盤60上設置六個爪杆61,相應地,多個第一吸附組件62的數量為六個。然而,本實施例並不用於對爪杆61及
多個第一吸附組件62的數量做具體限定,實際應用中,可根據實際需要設置多個爪杆61及第一吸附組件62的數量,只要保證二者數量相等即可,可多於六個,亦可少於六個。同樣的,本實施例中,多個第二吸附組件71的數量為三個,實際應用中多個第二吸附組件71的數量可根據多個爪杆61的數量對應設置。進一步地,為了確保吸附定位及平整化效果,多個爪杆61及多個第二吸附組件71的數量均以不少於三個為佳。
In the above embodiment, six
如圖5所示,在另一個實施例中,爪杆61上進一步設置有多個第三吸附組件65,每個第三吸附組件65與對應的第一吸附組件62間隔設置。本實施例中,爪杆61上設置有兩組吸附組件,藉由第三吸附組件65及第一吸附組件62能夠對翹曲片進行兩級平整化處理,有助於提高翹曲片平整化精度。並且,兩組吸附組件進一步可以用於吸附平整不同尺寸的翹曲片,可提高預對準裝置的通用性。例如,第一吸附組件62可用於吸附平整尺寸較大的翹曲片(如12寸翹曲矽片),第三吸附組件65可用於吸附平整尺寸較小的翹曲片(如8寸翹曲矽片)。當吸附12寸翹曲矽片時,第三吸附組件65先開真空吸附,然後第一吸附組件62再開真空吸附,可實現對矽片的兩級梯次吸附,提高平整化精度。
As shown in FIG. 5, in another embodiment, a plurality of
如圖5所示,在一個實施例中,上述的預對準裝置進一步包含位置調整組件80,位置調整組件80包含滑軌81、滑塊82及驅動件83,滑軌81與底板10連接,滑塊82在滑軌81上滑動,且滑塊82上安裝光機組件40,驅動件83與滑塊82連接。本實施例中,光機組件40安裝在位置調整組件80上,藉由調節位置調整組件80即可以調節光機組件40的工位,以使光機組件40的工位與不同尺寸的翹曲片對應。具體地,
當需要調節光機組件40的工位時,啟動驅動件83帶動滑塊82在滑軌81上滑動,進而帶動光機組件40移動,當光機組件40移動到目標工位時,關閉驅動件83,使滑塊82停止滑動即可。具體地,驅動件83包含驅動組件及傳動機構,驅動組件藉由傳動機構與滑塊82連接,驅動組件可以為電機、氣壓缸或液壓缸中的任意一種,傳動機構可以為齒輪傳動機構、絲杠傳動機構等,本實施例不做具體限定。
As shown in FIG. 5, in one embodiment, the above-mentioned pre-alignment device further includes a
如圖5所示,在一個實施例中,上述的預對準裝置進一步包含氣滑環(圖中未示出),氣滑環套設在延長杆內側,且氣滑環分別與多個第一吸附組件62及多個第三吸附組件65連通。本實施例中,藉由氣滑環實現對第一吸附組件62及第三吸附組件65的單獨供氣提供氣道,具體地,氣滑環為兩進兩出的氣滑環。
As shown in FIG. 5, in one embodiment, the above-mentioned pre-alignment device further includes an air slip ring (not shown in the figure), the air slip ring is sleeved inside the extension rod, and the air slip ring is connected to a plurality of first A
在一個實施例中,相鄰的兩個爪杆61之間設置有加強筋66。本實施例中,在相鄰的兩個爪杆61之間設置加強筋66能夠提高爪盤60的結構強度。如圖5所示,本實施例中,加強筋66連接至爪杆61的末端,在其它實施例中,加強筋66可以連接至爪杆61的任意位置,只要保證加強筋與第二吸附組件71之間不干涉即可。
In one embodiment, a reinforcing
進一步地,如圖5所示,本實施例中,感測器200的數量為一個,擋片300的數量為六個,感測器200設置在圓環吸盤70上與多個第二吸附組件71錯開設置,擋片300設置在加強筋上與多個第一吸附組件62錯開設置,只要其中一個擋片300觸發感測器200,就表示有多個爪杆61與多個第二吸附組件71在徑向方向存在位置重疊。本實施例中,僅設置一個感測器200即可實現多個爪杆61與多個第二吸附組件71干涉
檢測,能夠有效節約感測器成本。
Further, as shown in FIG. 5, in this embodiment, the number of the
在一個實施例中,每個第三吸附組件65包含剛性支柱及橡膠吸盤,剛性支柱上開設有第一通氣孔,橡膠吸盤與剛性支柱連接,且橡膠吸盤與通氣孔連通。在又一個實施例中,每個第三吸附組件65包含:剛性支柱、彈性件、彈性支柱及橡膠吸盤,彈性件設置在剛性支柱內部,彈性支柱上開設有第二通氣孔,彈性支柱一端設置在剛性支柱內與彈性件套接,另一端設置在剛性支柱外部與橡膠吸盤連接,橡膠吸盤與第二通氣孔連通。具體地,每個第三吸附組件65的結構組成及結構原理與前述實施例中第一吸附組件62的結構組成及原理均相同,在此不再贅述。另外,在實際應用中,第一吸附組件62、第二吸附組件71及第三吸附組件65可以都採用相同結構,亦可以採用不同結構。
In one embodiment, each
如圖6所示,基於上述的預對準裝置,本發明進一步提供一種預對準方法,包含以下步驟: As shown in FIG. 6, based on the above-mentioned pre-alignment device, the present invention further provides a pre-alignment method, including the following steps:
步驟S11:爪盤60接收矽片。
Step S11: The
在一個實施例中,當爪盤60上的第一吸附組件62的高度能夠滿足片叉取放矽片所需的運動空間時,可直接將矽片放在爪盤60上,具體地,步驟S11包含:片叉將矽片放置在爪盤60上,第一吸附組件62開真空,吸附矽片,如果矽片為翹曲片,第一吸附組件62吸附矽片並將其拉平。
In one embodiment, when the height of the
在一個實施例中,當爪盤60上的多個第一吸附組件62的高度不能滿足片叉取放矽片所需的運動空間時,需要先藉由圓環吸盤70接收矽片,再將矽片交接到爪盤60上。具體地,步驟S11爪盤接收矽片
的步驟包含:升降軸20帶動爪盤60下降至上片工位,片叉將矽片放置在圓環吸盤70上,多個第二吸附組件71開真空,吸附矽片;升降軸20帶動爪盤60上升至交接工位,第一吸附組件62開真空,吸附矽片,如果矽片為翹曲片,第一吸附組件62吸附矽片並將其拉平,之後,第二吸附組件71關真空,升降軸20帶動爪盤60上升至預對準工位。
In one embodiment, when the height of the plurality of
具體地,上述上片工位為第一吸附組件62上的橡膠吸盤624頂面低於第二吸附組件71剛性支柱621頂部支撐面的距離,該距離能夠滿足片叉取放矽片所需的運動空間。
Specifically, the above-mentioned loading station is the distance between the top surface of the
上述交接工位為第一吸附組件62的剛性支柱621的頂部支撐面及第二吸附組件71的剛性支柱621的頂部支撐面共面。
The above-mentioned transfer station is that the top supporting surface of the
上述預對準工位為第二吸附組件71的橡膠吸盤624頂面低於爪盤60下表面的距離,該距離為第二吸附組件71上的橡膠吸盤624與爪盤60沿垂直方向的安全空間。
The above-mentioned pre-alignment station is the distance between the top surface of the
步驟S12:旋轉軸51帶動爪盤60旋轉,光機組件40採集矽片邊緣訊息,並將採集到的矽片邊緣訊息發送至控制器。
Step S12: The rotating
步驟S13:控制器根據接收到的矽片邊緣訊息計算矽片的偏心量,並根據偏心量控制旋轉軸旋轉50,將矽片偏心量最大的方向旋轉至補償軸30運動方向。
Step S13: The controller calculates the eccentricity of the silicon wafer according to the received wafer edge information, and controls the rotation axis to rotate 50 according to the eccentricity, and rotates the direction of the largest eccentricity of the silicon wafer to the movement direction of the
步驟S14:升降軸20帶動爪盤60下降至交接工位,矽片由爪盤60交接至圓環吸盤70。具體地,升降軸20帶動爪盤60下降至交接工位後,第二吸附組件71開真空,第一吸附組件62關真空,矽片由爪盤60交接至圓環吸盤70。
Step S14: the lifting
步驟S15:升降軸20帶動爪盤60繼續下降至交接低位,補償軸30帶動圓環吸盤70運動,補償矽片的偏心量。
Step S15: The lifting
具體地,交接低位為第一吸附組件62上的橡膠吸盤624頂面低於圓環吸盤70下表面的距離,該距離為第一吸附組件62上的橡膠吸盤624與圓環吸盤70的沿垂直方向的安全空間。
Specifically, the transfer low position is the distance between the top surface of the
步驟S16:升降軸20帶動爪盤60上升至交接工位,矽片由圓環吸盤70交接至爪盤60上。具體地,升降軸20帶動爪盤60上升至交接工位後,第一吸附組件62開真空,第二吸附組件71關真空,矽片由圓環吸盤70交接至爪盤60上。
Step S16: The lifting
步驟S17:升降軸20帶動爪盤60繼續上升至預對準工位,旋轉軸51帶動爪盤60旋轉,光機組件40採集矽片缺口訊息及矽片邊緣訊息,並將採集到的矽片缺口訊息及矽片邊緣訊息發送至控制器。
Step S17: The lifting
步驟S18:控制器根據矽片缺口訊息及矽片邊緣訊息計算矽片的偏心餘量,當矽片的偏心餘量滿足預設條件時,旋轉軸51轉動將矽片的缺口旋轉至光機組件40下方。
Step S18: The controller calculates the eccentricity margin of the silicon wafer according to the wafer gap information and the wafer edge information. When the eccentricity margin of the silicon wafer meets the preset condition, the rotating
具體地,當矽片的偏心餘量滿足預設條件時,確定矽片圓心,將矽片的缺口旋轉至光機組件40下方執行步驟S19。當偏心餘量不滿足預設條件時,重複步驟S12至步驟S17,直至矽片的偏心餘量滿足預設條件。
Specifically, when the eccentricity margin of the silicon wafer satisfies the preset condition, the center of the silicon wafer circle is determined, and the notch of the silicon wafer is rotated to below the
步驟S19:旋轉軸51小角度往返旋轉,光機組件40採集矽片缺口訊息並發送至控制器,控制器根據矽片缺口訊息計算得到矽片缺口位置誤差,旋轉軸51根據補償缺口位置誤差旋轉,完成矽片的定向。
Step S19: The rotating
在一個實施例中,步驟S14之前包含:當第一吸附組件62與第二吸附組件71在徑向方向存在位置重疊時,旋轉軸51帶動爪盤60旋轉預設角度使第一吸附組件62與第二吸附組件71的位置錯開。進一步地,步驟S15中,升降軸20繼續下降至交接低位之後包含:旋轉軸51帶動爪盤60繼續同向旋轉預設角度。更進一步地,步驟S16之後包含:旋轉軸51帶動爪盤60反向旋轉預設角度。具體地,旋轉軸51帶動爪盤60反向旋轉預設角度後再執行步驟S17。具體地,本實施例中,為了使爪盤60在下降過程中不會與第二吸附組件71產生干涉,先將爪盤60旋轉預設角度,進一步的,為了使爪盤60在上升過程中不會產生干涉,當爪盤60下降並將矽片交接到圓環吸盤70上後,繼續以下降前相同的角度同向旋轉爪盤60。最後,在矽片由圓環吸盤70交接回爪盤60之後,爪盤60再逆向旋轉相同角度,以使矽片回到原檢測方位。具體地,在一個實施例中,預設角度小於相鄰的兩個第一吸附組件62之間的夾角的1/3倍
In one embodiment, before step S14, it includes: when the
在一個實施例中,爪盤接收矽片的步驟之前,包含以下步驟:根據矽片的尺寸調節位置調整組件80,調整光機組件40至與矽片尺寸對應的工位。具體地,當採用圖5所示的預對準裝置時,在爪盤60接收矽片之前先根據矽片的尺寸調節光機組件40至對應的工位。進一步地,當採用圖5所示的預對準裝置時,根據矽片的尺寸,上述步進行矽片交接的步驟中,進一步可以是開啟或關閉第三吸附65,或同時開啟或關閉第三吸附組件65以完成矽片在爪盤60及圓環吸盤70之間的交接操作。
In one embodiment, the step of receiving the silicon wafer by the claw plate includes the following steps: adjusting the
上述的預對準裝置實現對大翹曲片進行吸附定位及平整化處理,能夠滿足大翹曲片的預對準定位需求,提高大翹曲片預對準精度。基於上述預對準裝置的預對準方法能夠對大翹曲片進行吸附定位及平整化處理,提高大翹曲片預對準精度。 The above-mentioned pre-alignment device realizes the adsorption positioning and flattening processing of the large warped sheet, can meet the pre-alignment positioning requirements of the large warped sheet, and improve the pre-alignment accuracy of the large warped sheet. The pre-alignment method based on the above-mentioned pre-alignment device can perform adsorption positioning and flattening treatment on the large warped sheet, and improve the pre-alignment accuracy of the large warped sheet.
以上所述實施例的各技術特徵可以進行任意的組合,為使描述簡潔,未對上述實施例中的各個技術特徵所有可能的組合皆進行描述,然而,若此等技術特徵的組合不存在矛盾,皆應當認為是本說明書記載的範圍。 The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, all possible combinations of the various technical features in the above-mentioned embodiments are not described. However, if there is no contradiction in the combination of these technical features , Should be regarded as the scope of this specification.
10‧‧‧底板 10‧‧‧Bottom plate
20‧‧‧升降軸 20‧‧‧Lift shaft
30‧‧‧補償軸 30‧‧‧Compensation axis
40‧‧‧光機組件 40‧‧‧Optical Machine Components
51‧‧‧旋轉軸 51‧‧‧Rotation axis
52‧‧‧延長杆 52‧‧‧Extension Rod
60‧‧‧爪盤 60‧‧‧Claw plate
61‧‧‧爪杆 61‧‧‧Claw lever
62‧‧‧第一吸附組件 62‧‧‧First suction assembly
65‧‧‧第三吸附組件 65‧‧‧Third suction assembly
66‧‧‧加強筋 66‧‧‧Reinforcing rib
70‧‧‧圓環吸盤 70‧‧‧Ring Suction Cup
71‧‧‧第二吸附組件 71‧‧‧Second suction assembly
80‧‧‧位置調整組件 80‧‧‧Position adjustment components
81‧‧‧滑軌 81‧‧‧Slide rail
82‧‧‧滑塊 82‧‧‧Slider
83‧‧‧驅動件 83‧‧‧Drive
200‧‧‧感測器 200‧‧‧Sensor
300‧‧‧擋片 300‧‧‧Block
Claims (19)
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CN111785659B (en) * | 2020-05-25 | 2021-04-06 | 杭州长川科技股份有限公司 | Wafer pre-alignment and wafer ID reading method and device and computer equipment |
WO2022153774A1 (en) * | 2021-01-15 | 2022-07-21 | 東レエンジニアリング株式会社 | Wafer holding device |
CN115140549A (en) * | 2022-03-14 | 2022-10-04 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | Transfer mechanism and equipment |
CN117012691A (en) * | 2022-04-29 | 2023-11-07 | 上海微电子装备(集团)股份有限公司 | Sucker assembly, silicon wafer adsorption device, exposure equipment and warpage silicon wafer adsorption method |
CN117471865B (en) * | 2023-11-03 | 2024-04-30 | 江苏雷博微电子设备有限公司 | Silicon wafer placement device for prealignment system of photoetching machine |
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