TWI702387B - 用於以由空間選擇性波長濾波器所修改之照明源成像樣本之系統及方法 - Google Patents

用於以由空間選擇性波長濾波器所修改之照明源成像樣本之系統及方法 Download PDF

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Publication number
TWI702387B
TWI702387B TW105115828A TW105115828A TWI702387B TW I702387 B TWI702387 B TW I702387B TW 105115828 A TW105115828 A TW 105115828A TW 105115828 A TW105115828 A TW 105115828A TW I702387 B TWI702387 B TW I702387B
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Taiwan
Prior art keywords
wavelengths
sub
filter element
spatial filter
illumination
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TW105115828A
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English (en)
Chinese (zh)
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TW201706589A (zh
Inventor
偉 趙
肯尼斯Ｐ 葛洛斯
伊爾亞 畢札爾
馬修 潘茲爾
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美商克萊譚克公司
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Priority claimed from US14/839,338 external-priority patent/US10616987B2/en
Application filed by 美商克萊譚克公司 filed Critical 美商克萊譚克公司
Publication of TW201706589A publication Critical patent/TW201706589A/zh
Application granted granted Critical
Publication of TWI702387B publication Critical patent/TWI702387B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/203—Filters having holographic or diffractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N2021/0106—General arrangement of respective parts
    • G01N2021/0112—Apparatus in one mechanical, optical or electronic block
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8845—Multiple wavelengths of illumination or detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
TW105115828A 2015-05-20 2016-05-20 用於以由空間選擇性波長濾波器所修改之照明源成像樣本之系統及方法 TWI702387B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201562164085P 2015-05-20 2015-05-20
US62/164,085 2015-05-20
US14/839,338 2015-08-28
US14/839,338 US10616987B2 (en) 2015-08-28 2015-08-28 System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter

Publications (2)

Publication Number Publication Date
TW201706589A TW201706589A (zh) 2017-02-16
TWI702387B true TWI702387B (zh) 2020-08-21

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TW105115828A TWI702387B (zh) 2015-05-20 2016-05-20 用於以由空間選擇性波長濾波器所修改之照明源成像樣本之系統及方法

Country Status (5)

Country Link
JP (2) JP2018514788A (ja)
KR (1) KR102381155B1 (ja)
CN (2) CN115060650A (ja)
TW (1) TWI702387B (ja)
WO (1) WO2016187139A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10444161B2 (en) 2017-04-05 2019-10-15 Kla-Tencor Corporation Systems and methods for metrology with layer-specific illumination spectra

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5793049A (en) * 1995-07-06 1998-08-11 Yale University Optical filtering and spectroscopic imaging
US20040263977A1 (en) * 2001-12-12 2004-12-30 Nikon Corporation Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method

Family Cites Families (14)

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JPS4833833A (ja) * 1971-09-03 1973-05-14
US3907430A (en) * 1973-08-13 1975-09-23 Northrop Corp Optical bandpass filter
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
US6590645B1 (en) * 2000-05-04 2003-07-08 Kla-Tencor Corporation System and methods for classifying anomalies of sample surfaces
US7130039B2 (en) * 2002-04-18 2006-10-31 Kla-Tencor Technologies Corporation Simultaneous multi-spot inspection and imaging
US7365834B2 (en) * 2003-06-24 2008-04-29 Kla-Tencor Technologies Corporation Optical system for detecting anomalies and/or features of surfaces
JP4508708B2 (ja) * 2004-04-12 2010-07-21 キヤノン株式会社 Ｅｕｖ光を用いた露光装置および露光方法
WO2007064830A1 (en) * 2005-12-02 2007-06-07 Massachusetts Institute Of Technology Method and apparatus for two-dimensional spectroscopy
JP2010010607A (ja) 2008-06-30 2010-01-14 Seiko Epson Corp レーザ光源装置、プロジェクタ、モニタ装置
DE102009043745A1 (de) * 2009-09-30 2011-04-07 Carl Zeiss Microlmaging Gmbh Spektraldetektor mit variabler Filterung durch räumliche Farbtrennung und Laser-Scanning- Mikroskop
US9239263B2 (en) * 2010-12-14 2016-01-19 William Marsh Rice University Image mapped spectropolarimetry
US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
JP5609932B2 (ja) * 2012-08-07 2014-10-22 株式会社島津製作所 光度計を用いた試料測定方法
CN110474685A (zh) * 2013-12-02 2019-11-19 吴东辉 一种利用照明光源传输信息的方法和系统及装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5793049A (en) * 1995-07-06 1998-08-11 Yale University Optical filtering and spectroscopic imaging
US20040263977A1 (en) * 2001-12-12 2004-12-30 Nikon Corporation Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method

Also Published As

Publication number Publication date
TW201706589A (zh) 2017-02-16
CN107636449A (zh) 2018-01-26
CN115060650A (zh) 2022-09-16
JP7344952B2 (ja) 2023-09-14
WO2016187139A1 (en) 2016-11-24
JP2022029462A (ja) 2022-02-17
KR20180000734A (ko) 2018-01-03
KR102381155B1 (ko) 2022-03-30
JP2018514788A (ja) 2018-06-07

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