KR102381155B1 - 공간 선택적 파장 필터에 의해 수정된 조명원으로 샘플을 영상화하는 시스템 및 방법 - Google Patents

공간 선택적 파장 필터에 의해 수정된 조명원으로 샘플을 영상화하는 시스템 및 방법 Download PDF

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KR102381155B1
KR102381155B1 KR1020177036597A KR20177036597A KR102381155B1 KR 102381155 B1 KR102381155 B1 KR 102381155B1 KR 1020177036597 A KR1020177036597 A KR 1020177036597A KR 20177036597 A KR20177036597 A KR 20177036597A KR 102381155 B1 KR102381155 B1 KR 102381155B1
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KR
South Korea
Prior art keywords
wavelengths
filter element
illumination
spatial filter
spatial
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KR1020177036597A
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English (en)
Korean (ko)
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KR20180000734A (ko
Inventor
웨이 자오
케네스 피 그로스
일리야 베즐
매튜 팬저
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케이엘에이 코포레이션
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Priority claimed from US14/839,338 external-priority patent/US10616987B2/en
Application filed by 케이엘에이 코포레이션 filed Critical 케이엘에이 코포레이션
Publication of KR20180000734A publication Critical patent/KR20180000734A/ko
Application granted granted Critical
Publication of KR102381155B1 publication Critical patent/KR102381155B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/203—Filters having holographic or diffractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N2021/0106—General arrangement of respective parts
    • G01N2021/0112—Apparatus in one mechanical, optical or electronic block
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8845—Multiple wavelengths of illumination or detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020177036597A 2015-05-20 2016-05-16 공간 선택적 파장 필터에 의해 수정된 조명원으로 샘플을 영상화하는 시스템 및 방법 KR102381155B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562164085P 2015-05-20 2015-05-20
US62/164,085 2015-05-20
US14/839,338 US10616987B2 (en) 2015-08-28 2015-08-28 System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter
US14/839,338 2015-08-28
PCT/US2016/032743 WO2016187139A1 (en) 2015-05-20 2016-05-16 System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter

Publications (2)

Publication Number Publication Date
KR20180000734A KR20180000734A (ko) 2018-01-03
KR102381155B1 true KR102381155B1 (ko) 2022-03-30

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KR1020177036597A KR102381155B1 (ko) 2015-05-20 2016-05-16 공간 선택적 파장 필터에 의해 수정된 조명원으로 샘플을 영상화하는 시스템 및 방법

Country Status (5)

Country Link
JP (2) JP2018514788A (ja)
KR (1) KR102381155B1 (ja)
CN (2) CN107636449A (ja)
TW (1) TWI702387B (ja)
WO (1) WO2016187139A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10444161B2 (en) * 2017-04-05 2019-10-15 Kla-Tencor Corporation Systems and methods for metrology with layer-specific illumination spectra

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
JP2013506162A (ja) * 2009-09-30 2013-02-21 カール ツァイス マイクロスコピー ゲーエムベーハー 空間的な色分離による可変フィルタリングを用いたスペクトル検出器又はレーザ走査顕微鏡
JP2013546000A (ja) * 2010-12-14 2013-12-26 ウィリアム・マーシュ・ライス・ユニバーシティ イメージマップ分光偏光法
JP2014521991A (ja) 2011-06-29 2014-08-28 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための適応光学系

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833833A (ja) * 1971-09-03 1973-05-14
US3907430A (en) * 1973-08-13 1975-09-23 Northrop Corp Optical bandpass filter
US5793049A (en) * 1995-07-06 1998-08-11 Yale University Optical filtering and spectroscopic imaging
US6590645B1 (en) * 2000-05-04 2003-07-08 Kla-Tencor Corporation System and methods for classifying anomalies of sample surfaces
TW567406B (en) * 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
US7130039B2 (en) * 2002-04-18 2006-10-31 Kla-Tencor Technologies Corporation Simultaneous multi-spot inspection and imaging
US7365834B2 (en) * 2003-06-24 2008-04-29 Kla-Tencor Technologies Corporation Optical system for detecting anomalies and/or features of surfaces
JP4508708B2 (ja) * 2004-04-12 2010-07-21 キヤノン株式会社 Ｅｕｖ光を用いた露光装置および露光方法
WO2007064830A1 (en) * 2005-12-02 2007-06-07 Massachusetts Institute Of Technology Method and apparatus for two-dimensional spectroscopy
JP2010010607A (ja) * 2008-06-30 2010-01-14 Seiko Epson Corp レーザ光源装置、プロジェクタ、モニタ装置
JP5609932B2 (ja) * 2012-08-07 2014-10-22 株式会社島津製作所 光度計を用いた試料測定方法
CN110474685A (zh) * 2013-12-02 2019-11-19 吴东辉 一种利用照明光源传输信息的方法和系统及装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
JP2013506162A (ja) * 2009-09-30 2013-02-21 カール ツァイス マイクロスコピー ゲーエムベーハー 空間的な色分離による可変フィルタリングを用いたスペクトル検出器又はレーザ走査顕微鏡
JP2013546000A (ja) * 2010-12-14 2013-12-26 ウィリアム・マーシュ・ライス・ユニバーシティ イメージマップ分光偏光法
JP2014521991A (ja) 2011-06-29 2014-08-28 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための適応光学系

Also Published As

Publication number Publication date
JP7344952B2 (ja) 2023-09-14
TWI702387B (zh) 2020-08-21
CN107636449A (zh) 2018-01-26
JP2022029462A (ja) 2022-02-17
JP2018514788A (ja) 2018-06-07
WO2016187139A1 (en) 2016-11-24
CN115060650A (zh) 2022-09-16
TW201706589A (zh) 2017-02-16
KR20180000734A (ko) 2018-01-03

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