TWI691796B - 移動體裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法 - Google Patents

移動體裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法 Download PDF

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Publication number
TWI691796B
TWI691796B TW102112056A TW102112056A TWI691796B TW I691796 B TWI691796 B TW I691796B TW 102112056 A TW102112056 A TW 102112056A TW 102112056 A TW102112056 A TW 102112056A TW I691796 B TWI691796 B TW I691796B
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TW
Taiwan
Prior art keywords
support
supported
mobile body
stage
guide
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Application number
TW102112056A
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English (en)
Chinese (zh)
Other versions
TW201400991A (zh
Inventor
青木保夫
Original Assignee
日商尼康股份有限公司
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Publication of TW201400991A publication Critical patent/TW201400991A/zh
Application granted granted Critical
Publication of TWI691796B publication Critical patent/TWI691796B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW102112056A 2012-04-04 2013-04-03 移動體裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法 TWI691796B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP2012-085455 2012-04-04
JP2012085455A JP5910992B2 (ja) 2012-04-04 2012-04-04 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
TW201400991A TW201400991A (zh) 2014-01-01
TWI691796B true TWI691796B (zh) 2020-04-21

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ID=49300291

Family Applications (2)

Application Number Title Priority Date Filing Date
TW109109219A TWI731628B (zh) 2012-04-04 2013-04-03 移動體裝置、曝光裝置、移動方法、曝光方法、平面顯示器之製造方法、及元件製造方法
TW102112056A TWI691796B (zh) 2012-04-04 2013-04-03 移動體裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法

Family Applications Before (1)

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TW109109219A TWI731628B (zh) 2012-04-04 2013-04-03 移動體裝置、曝光裝置、移動方法、曝光方法、平面顯示器之製造方法、及元件製造方法

Country Status (6)

Country Link
JP (1) JP5910992B2 (ja)
KR (2) KR102163139B1 (ja)
CN (2) CN104221128B (ja)
HK (1) HK1249777A1 (ja)
TW (2) TWI731628B (ja)
WO (1) WO2013150788A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI701514B (zh) * 2014-03-28 2020-08-11 日商尼康股份有限公司 移動體裝置、曝光裝置、平板顯示器之製造方法、元件製造方法、及移動體驅動方法
JP6689489B2 (ja) * 2015-03-27 2020-04-28 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
WO2017005387A1 (en) * 2015-07-09 2017-01-12 Asml Netherlands B.V. Movable support and lithographic apparatus
CN113900361B (zh) * 2015-09-30 2024-02-09 株式会社尼康 曝光装置及曝光方法、以及平面显示器制造方法
WO2017057465A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法
JP6681982B2 (ja) * 2015-11-23 2020-04-15 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めデバイス、リソグラフィ装置、及びデバイス製造方法
CN106933051B (zh) * 2015-12-31 2019-04-12 上海微电子装备（集团）股份有限公司 运动台装置、曝光装置及光刻机
KR20180029145A (ko) 2016-09-09 2018-03-20 삼성전자주식회사 기판 처리 장치
JP6508268B2 (ja) * 2017-08-24 2019-05-08 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR20190052533A (ko) 2017-11-08 2019-05-16 삼성전자주식회사 기판 지지 및 이송 장치, 기판 지지 및 이송 방법 및 이를 이용한 표시 장치의 제조 방법
CN110554573B (zh) * 2018-05-31 2021-05-14 上海微电子装备（集团）股份有限公司 吸附载台及光刻设备
CN116974152A (zh) * 2023-07-31 2023-10-31 苏州天准科技股份有限公司 多自由度调平的物料输送装置及非接触式曝光设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100266961A1 (en) * 2009-04-21 2010-10-21 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
JP3301387B2 (ja) * 1998-07-09 2002-07-15 ウシオ電機株式会社 プロキシミティ露光におけるマスクとワークのギャップ制御方法およびプロキシミティ露光装置
US20030173833A1 (en) * 2000-04-21 2003-09-18 Hazelton Andrew J. Wafer stage with magnetic bearings
JP4362862B2 (ja) * 2003-04-01 2009-11-11 株式会社ニコン ステージ装置及び露光装置
WO2008129762A1 (ja) * 2007-03-05 2008-10-30 Nikon Corporation 移動体装置、パターン形成装置及びパターン形成方法、デバイス製造方法、移動体装置の製造方法、並びに移動体駆動方法
JP5057382B2 (ja) * 2007-12-18 2012-10-24 Ｎｓｋテクノロジー株式会社 露光装置及び基板の製造方法
JP4819839B2 (ja) * 2008-04-21 2011-11-24 キヤノン株式会社 位置決め装置の製造方法
KR20100056789A (ko) * 2008-11-20 2010-05-28 주식회사 탑 엔지니어링 반력 상쇄 장치, 그것의 질량체 설정 방법, 그것을 이용한 반력 상쇄 방법 및 그것을 구비한 디스펜서
US8659746B2 (en) * 2009-03-04 2014-02-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
JP5849955B2 (ja) * 2010-09-07 2016-02-03 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100266961A1 (en) * 2009-04-21 2010-10-21 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Also Published As

Publication number Publication date
JP2013214691A (ja) 2013-10-17
TW201400991A (zh) 2014-01-01
TWI731628B (zh) 2021-06-21
KR20200118217A (ko) 2020-10-14
HK1249777A1 (zh) 2018-11-09
KR102228708B1 (ko) 2021-03-16
WO2013150788A1 (ja) 2013-10-10
CN104221128A (zh) 2014-12-17
CN104221128B (zh) 2017-10-10
KR102163139B1 (ko) 2020-10-12
TW202028888A (zh) 2020-08-01
KR20150003250A (ko) 2015-01-08
CN107577116B (zh) 2021-04-09
CN107577116A (zh) 2018-01-12
JP5910992B2 (ja) 2016-04-27

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