KR102163139B1 - 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법 - Google Patents

이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법 Download PDF

Info

Publication number
KR102163139B1
KR102163139B1 KR1020147030730A KR20147030730A KR102163139B1 KR 102163139 B1 KR102163139 B1 KR 102163139B1 KR 1020147030730 A KR1020147030730 A KR 1020147030730A KR 20147030730 A KR20147030730 A KR 20147030730A KR 102163139 B1 KR102163139 B1 KR 102163139B1
Authority
KR
South Korea
Prior art keywords
moving body
base
stage
delete delete
step guide
Prior art date
Application number
KR1020147030730A
Other languages
English (en)
Korean (ko)
Other versions
KR20150003250A (ko
Inventor
야스오 아오키
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20150003250A publication Critical patent/KR20150003250A/ko
Application granted granted Critical
Publication of KR102163139B1 publication Critical patent/KR102163139B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020147030730A 2012-04-04 2013-04-03 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법 KR102163139B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-085455 2012-04-04
JP2012085455A JP5910992B2 (ja) 2012-04-04 2012-04-04 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
PCT/JP2013/002306 WO2013150788A1 (ja) 2012-04-04 2013-04-03 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020207027970A Division KR102228708B1 (ko) 2012-04-04 2013-04-03 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20150003250A KR20150003250A (ko) 2015-01-08
KR102163139B1 true KR102163139B1 (ko) 2020-10-12

Family

ID=49300291

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020207027970A KR102228708B1 (ko) 2012-04-04 2013-04-03 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
KR1020147030730A KR102163139B1 (ko) 2012-04-04 2013-04-03 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020207027970A KR102228708B1 (ko) 2012-04-04 2013-04-03 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법

Country Status (6)

Country Link
JP (1) JP5910992B2 (ja)
KR (2) KR102228708B1 (ja)
CN (2) CN104221128B (ja)
HK (1) HK1249777A1 (ja)
TW (2) TWI691796B (ja)
WO (1) WO2013150788A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10048600B2 (en) * 2014-03-28 2018-08-14 Nikon Corporation Movable body apparatus, exposure apparatus, manufacturing method of flat panel display, device manufacturing method, and movable body drive method
JP6689489B2 (ja) * 2015-03-27 2020-04-28 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
NL2016688A (en) * 2015-07-09 2017-01-17 Asml Netherlands Bv Movable support and lithographic apparatus
KR20180059864A (ko) * 2015-09-30 2018-06-05 가부시키가이샤 니콘 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 계측 방법
US10268121B2 (en) * 2015-09-30 2019-04-23 Nikon Corporation Exposure apparatus and exposure method, and flat panel display manufacturing method
NL2017808A (en) * 2015-11-23 2017-06-02 Asml Netherlands Bv Positioning device, lithographic apparatus and device manufacturing method
CN106933051B (zh) * 2015-12-31 2019-04-12 上海微电子装备（集团）股份有限公司 运动台装置、曝光装置及光刻机
KR20180029145A (ko) 2016-09-09 2018-03-20 삼성전자주식회사 기판 처리 장치
JP6508268B2 (ja) * 2017-08-24 2019-05-08 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR20190052533A (ko) 2017-11-08 2019-05-16 삼성전자주식회사 기판 지지 및 이송 장치, 기판 지지 및 이송 방법 및 이를 이용한 표시 장치의 제조 방법
CN110554573B (zh) * 2018-05-31 2021-05-14 上海微电子装备（集团）股份有限公司 吸附载台及光刻设备
CN116974152A (zh) * 2023-07-31 2023-10-31 苏州天准科技股份有限公司 多自由度调平的物料输送装置及非接触式曝光设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
JP3301387B2 (ja) * 1998-07-09 2002-07-15 ウシオ電機株式会社 プロキシミティ露光におけるマスクとワークのギャップ制御方法およびプロキシミティ露光装置
US20030173833A1 (en) * 2000-04-21 2003-09-18 Hazelton Andrew J. Wafer stage with magnetic bearings
JP4362862B2 (ja) * 2003-04-01 2009-11-11 株式会社ニコン ステージ装置及び露光装置
JP5448070B2 (ja) * 2007-03-05 2014-03-19 株式会社ニコン 移動体装置、パターン形成装置及びパターン形成方法、デバイス製造方法、並びに移動体駆動方法
JP5057382B2 (ja) * 2007-12-18 2012-10-24 Ｎｓｋテクノロジー株式会社 露光装置及び基板の製造方法
JP4819839B2 (ja) * 2008-04-21 2011-11-24 キヤノン株式会社 位置決め装置の製造方法
KR20100056789A (ko) * 2008-11-20 2010-05-28 주식회사 탑 엔지니어링 반력 상쇄 장치, 그것의 질량체 설정 방법, 그것을 이용한 반력 상쇄 방법 및 그것을 구비한 디스펜서
US8659746B2 (en) * 2009-03-04 2014-02-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
TW201100975A (en) * 2009-04-21 2011-01-01 Nikon Corp Moving-object apparatus, exposure apparatus, exposure method, and device manufacturing method
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP5849955B2 (ja) * 2010-09-07 2016-02-03 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Also Published As

Publication number Publication date
TWI731628B (zh) 2021-06-21
KR102228708B1 (ko) 2021-03-16
HK1249777A1 (zh) 2018-11-09
CN107577116A (zh) 2018-01-12
WO2013150788A1 (ja) 2013-10-10
JP5910992B2 (ja) 2016-04-27
CN104221128A (zh) 2014-12-17
TWI691796B (zh) 2020-04-21
CN104221128B (zh) 2017-10-10
CN107577116B (zh) 2021-04-09
JP2013214691A (ja) 2013-10-17
KR20200118217A (ko) 2020-10-14
TW202028888A (zh) 2020-08-01
KR20150003250A (ko) 2015-01-08
TW201400991A (zh) 2014-01-01

Similar Documents

Publication Publication Date Title
KR102163139B1 (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
JP6304509B2 (ja) 移動体装置、移動方法、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR101911724B1 (ko) 이동체 장치, 물체 처리 디바이스, 노광 장치, 플랫 패널 디스플레이 제조 방법, 및 디바이스 제조 방법
KR101967135B1 (ko) 이동체 장치, 노광 장치, 및 디바이스 제조 방법
TWI789689B (zh) 曝光裝置、平面顯示器之製造方法、及元件製造方法
KR20190131146A (ko) 물체 처리 장치, 노광 장치 및 노광 방법, 및 디바이스 제조 방법
KR20120055574A (ko) 물체 이동 장치, 물체 처리 장치, 노광 장치, 물체 검사 장치 및 디바이스 제조 방법
TWI728425B (zh) 移動體裝置、曝光裝置、平面顯示器之製造方法、以及元件製造方法
KR102307527B1 (ko) 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
KR102202760B1 (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법 및 디바이스 제조 방법
KR102151930B1 (ko) 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
JP6197909B2 (ja) 移動体装置
JP5772196B2 (ja) 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体装置の組立方法。
JP6508268B2 (ja) 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP6774038B2 (ja) 露光装置及び露光方法、並びにフラットパネルディスプレイの製造方法、及びデバイス製造方法
JP5958692B2 (ja) 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法並びに露光方法
JP2013214024A (ja) 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right