TWI671127B - 處理液供給方法、可讀取之電腦記憶媒體及處理液供給裝置 - Google Patents

處理液供給方法、可讀取之電腦記憶媒體及處理液供給裝置 Download PDF

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Publication number
TWI671127B
TWI671127B TW105109775A TW105109775A TWI671127B TW I671127 B TWI671127 B TW I671127B TW 105109775 A TW105109775 A TW 105109775A TW 105109775 A TW105109775 A TW 105109775A TW I671127 B TWI671127 B TW I671127B
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Taiwan
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filter
processing liquid
container
liquid
diluent
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TW105109775A
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English (en)
Chinese (zh)
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TW201706042A (zh
Inventor
志手英男
木村一彥
湯本知行
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東京威力科創股份有限公司
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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TW105109775A 2015-03-31 2016-03-29 處理液供給方法、可讀取之電腦記憶媒體及處理液供給裝置 TWI671127B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015-071960 2015-03-31
JP2015071960 2015-03-31
JP2016011836A JP6425669B2 (ja) 2015-03-31 2016-01-25 処理液供給方法、読み取り可能なコンピュータ記憶媒体及び処理液供給装置
JP2016-011836 2016-01-25

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TW201706042A TW201706042A (zh) 2017-02-16
TWI671127B true TWI671127B (zh) 2019-09-11

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TW105109775A TWI671127B (zh) 2015-03-31 2016-03-29 處理液供給方法、可讀取之電腦記憶媒體及處理液供給裝置

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TW (1) TWI671127B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6979852B2 (ja) * 2017-10-26 2021-12-15 株式会社Ｓｃｒｅｅｎホールディングス 処理液供給装置、基板処理装置、および処理液供給方法
JP7161955B2 (ja) * 2019-02-20 2022-10-27 東京エレクトロン株式会社 フィルタウェッティング方法及び処理液供給装置
JP7490500B2 (ja) * 2019-09-12 2024-05-27 住友化学株式会社 ポリビニルアルコール除去装置及び偏光子の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120241469A1 (en) * 2009-11-11 2012-09-27 Koganei Corporation Chemical liquid supply device and chemical liquid supply method
US20140097147A1 (en) * 2012-10-09 2014-04-10 Tokyo Electron Limited Processing liquid supply method, processing liquid supply apparatus and storage medium

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3461725B2 (ja) * 1998-06-26 2003-10-27 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP5524154B2 (ja) * 2011-09-09 2014-06-18 東京エレクトロン株式会社 液処理装置及び液処理方法
JP5910401B2 (ja) * 2012-08-03 2016-04-27 東京エレクトロン株式会社 処理液供給装置の運転方法、処理液供給装置及び記憶媒体
US9446331B2 (en) * 2013-03-15 2016-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for dispensing photoresist

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120241469A1 (en) * 2009-11-11 2012-09-27 Koganei Corporation Chemical liquid supply device and chemical liquid supply method
US20140097147A1 (en) * 2012-10-09 2014-04-10 Tokyo Electron Limited Processing liquid supply method, processing liquid supply apparatus and storage medium
JP2014078562A (ja) * 2012-10-09 2014-05-01 Tokyo Electron Ltd 処理液供給方法、処理液供給装置及び記憶媒体

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JP2016195237A (ja) 2016-11-17
JP6425669B2 (ja) 2018-11-21
TW201706042A (zh) 2017-02-16

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