TWI669294B - Composition for optical member, optical member, and image display device - Google Patents

Composition for optical member, optical member, and image display device Download PDF

Info

Publication number
TWI669294B
TWI669294B TW107115233A TW107115233A TWI669294B TW I669294 B TWI669294 B TW I669294B TW 107115233 A TW107115233 A TW 107115233A TW 107115233 A TW107115233 A TW 107115233A TW I669294 B TWI669294 B TW I669294B
Authority
TW
Taiwan
Prior art keywords
substituent
group
film
layer
carbon number
Prior art date
Application number
TW107115233A
Other languages
Chinese (zh)
Other versions
TW201900622A (en
Inventor
形見普史
藤田昌邦
野中崇弘
喜多川丈治
Original Assignee
日商日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW201900622A publication Critical patent/TW201900622A/en
Application granted granted Critical
Publication of TWI669294B publication Critical patent/TWI669294B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3462Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Polarising Elements (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

本發明之光學構件用組成物含有基底聚合物及下述通式(1)所示之新穎化合物: [化學式1]。 本發明之光學構件用組成物應用於影像顯示裝置時可抑制顯示元件的劣化,並可形成具有高透明性而且在嚴苛環境條件下耐久性仍優異的光學構件。The composition for an optical member of the present invention contains a base polymer and a novel compound represented by the following formula (1): [Chemical Formula 1] . When the composition for an optical member of the present invention is applied to an image display device, deterioration of the display element can be suppressed, and an optical member having high transparency and excellent durability under severe environmental conditions can be formed.

Description

光學構件用組成物、光學構件及影像顯示裝置Composition for optical member, optical member, and image display device

本發明是關於一種光學構件用組成物、以及由該光學構件用組成物所形成之光學構件。又,本發明是關於使用了前述光學構件用組成物之影像顯示裝置。The present invention relates to a composition for an optical member and an optical member formed of the composition for the optical member. Moreover, the present invention relates to an image display device using the composition for an optical member.

本發明適用之光學構件為適用於各種光學用途的構件,可舉例如光學薄膜本身、光學薄膜用黏著劑層或接著劑層、設置於光學薄膜之表面處理層、設置於光學薄膜之機能層等。前述光學薄膜,舉例而言,可例示如偏光薄膜、偏光件、偏光件用透明保護薄膜、相位差薄膜、光擴散薄膜、增亮薄膜、透鏡薄膜、視窗外蓋薄膜(前面板)、防飛散薄膜、裝飾印刷薄膜等。前述光學構件,可作成包含偏光件及相位差薄膜之光學積層體使用。又,前述表面處理層,舉例而言,可例示如硬塗層、防眩層、抗反射層、折射率調整層等。前述機能層,舉例而言,可例示如易接著層、抗靜電層、抗結塊層、寡聚物防止層、阻障層等。又,前述光學構件,在具有透明基材薄膜及透明導電層之透明導電性薄膜中,可作為前述透明基材薄膜、或作為設於與前述透明基材薄膜之間的中間層使用。前述中間層可例示如折射率調整層、易接著劑層、硬塗層、裂紋防止層等。該等光學構件可形成液晶顯示裝置(LCD)、有機EL(電致發光)顯示裝置(OLED)等影像顯示裝置。The optical member to which the present invention is applied is a member suitable for various optical applications, and examples thereof include an optical film itself, an adhesive layer or an adhesive layer for an optical film, a surface treatment layer provided on the optical film, and a functional layer provided on the optical film. . Examples of the optical film include, for example, a polarizing film, a polarizing member, a transparent protective film for a polarizing member, a retardation film, a light diffusing film, a brightness enhancing film, a lens film, a window cover film (front panel), and anti-scattering. Film, decorative printed film, etc. The optical member can be used as an optical layered body including a polarizer and a retardation film. Further, the surface treatment layer may, for example, be a hard coat layer, an antiglare layer, an antireflection layer, a refractive index adjusting layer, or the like. The aforementioned functional layer may, for example, be an easy-adhesion layer, an antistatic layer, an anti-caking layer, an oligomer preventing layer, a barrier layer, or the like. Further, the optical member may be used as the transparent base film or as an intermediate layer provided between the transparent base film and the transparent conductive film having a transparent base film and a transparent conductive layer. The intermediate layer may, for example, be a refractive index adjusting layer, an easy-adhesive layer, a hard coat layer, a crack preventing layer, or the like. The optical members can form an image display device such as a liquid crystal display (LCD) or an organic EL (electroluminescence) display device (OLED).

近年來,光學構件係用於各種領域,例如作為構成影像顯示裝置的構件而廣泛利用。影像顯示裝置正廣泛用於行動電話、導航裝置、個人電腦用螢幕、電視等各種用途。影像顯示裝置為有機EL顯示裝置時所用的光學構件方面,為了防止外界光線在金屬電極(陰極)反射而看起來有如鏡面般的狀況,會在有機EL面板之觀視側表面配置圓偏光薄膜(偏光薄膜與1/4波長板之積層體等)。又,在已積層於有機EL面板之觀視側表面的圓偏光薄膜上,有時會進一步積層裝飾面板等作為光學構件。又,透明導電性薄膜係作為透明電極薄膜使用,以形成觸控面板等。前述圓偏光薄膜或裝飾面板等有機EL顯示裝置的構成構件和透明電極薄膜等,通常作為光學構件並隔著黏著劑層或接著劑層等接合材料而積層。In recent years, optical members have been used in various fields, and are widely used as components constituting image display devices, for example. Image display devices are widely used in various applications such as mobile phones, navigation devices, screens for personal computers, and televisions. In order to prevent the external light from being reflected by the metal electrode (cathode) and appearing as a mirror-like condition, the optical display member used in the image display device is a circular polarizing film on the viewing side surface of the organic EL panel ( a laminate of a polarizing film and a quarter-wave plate, etc.). Further, on the circularly polarizing film which has been laminated on the viewing side surface of the organic EL panel, a decorative panel or the like may be further laminated as an optical member. Further, the transparent conductive film is used as a transparent electrode film to form a touch panel or the like. The constituent members of the organic EL display device such as the circularly polarizing film or the decorative panel, and the transparent electrode film are usually laminated as an optical member via a bonding material such as an adhesive layer or an adhesive layer.

有機EL顯示裝置等影像顯示裝置中,會有入射之紫外線使得影像顯示裝置內的構成構件等劣化的狀況,已知為了抑制該紫外線所致劣化,而設置含有紫外線吸收劑之層。具體上,已知有例如下述者:具有至少1層紫外線吸收層且波長380nm之光線穿透率在30%以下、波長較430nm長之波長側的可見光穿透率在80%以上的影像顯示裝置用透明雙面黏著片(例如參照專利文獻1);具有含丙烯酸系聚合物及三系紫外線吸收劑之黏著劑層的黏著片(例如參照專利文獻2)。In an image display device such as an organic EL display device, the incident ultraviolet rays cause deterioration of constituent members and the like in the image display device, and it is known to provide a layer containing the ultraviolet absorber in order to suppress deterioration due to the ultraviolet rays. Specifically, for example, an image display having at least one ultraviolet absorbing layer and having a light transmittance of 30% or less at a wavelength of 380 nm and a visible light transmittance of 80% or more on a wavelength side longer than 430 nm is known. a transparent double-sided adhesive sheet for a device (for example, refer to Patent Document 1); having an acrylic-containing polymer and three An adhesive sheet of an adhesive layer of an ultraviolet absorber (for example, see Patent Document 2).

先前技術文獻 專利文獻 專利文獻1:日本特開第2012-211305號公報 專利文獻2:日本特開第2013-75978號公報CITATION LIST Patent Literature Patent Literature 1: Japanese Laid-Open Patent Publication No. 2012-211305

發明欲解決之課題 專利文獻1、2所記載之黏著片,雖能控制波長380nm之光穿透率,但在將該黏著片使用於有機EL顯示裝時,會有因長時間使用而導致有機EL元件劣化的狀況,並不堪用。吾人認為此係專利文獻1、2記載之黏著片雖然能吸收波長380nm的光,但並未充分吸收較有機EL元件發光區域(較430nm長之波長側)更短波長側之波長區域(380nm~430nm)的光,該穿透光會致使劣化發生。Problems to be Solved by the Invention The adhesive sheets described in Patent Documents 1 and 2 can control the light transmittance at a wavelength of 380 nm. However, when the adhesive sheet is used in an organic EL display, it may be organic due to long-term use. The deterioration of the EL element is not acceptable. The adhesive sheet described in Patent Documents 1 and 2 can absorb light having a wavelength of 380 nm, but does not sufficiently absorb the wavelength region shorter than the light-emitting region of the organic EL element (on the wavelength side longer than 430 nm) (380 nm~ 430 nm) of light that causes degradation to occur.

因此,為能抑制有機EL元件的劣化,必須於有機EL顯示裝置使用下述之層:可抑制較有機EL元件之發光區域(較430nm長之波長側)更短波長側之波長(380nm~430nm)之光的穿透、可充分確保前述有機EL元件之發光區域中的可見光穿透率、並且具有高透明性的層。又,影像顯示裝置為能在高溫、高濕環境下使用,亦需要在嚴苛環境條件下的耐久性。Therefore, in order to suppress the deterioration of the organic EL device, it is necessary to use a layer which can suppress the wavelength of the shorter wavelength side (380 nm to 430 nm) than the light-emitting region (the wavelength side longer than 430 nm) of the organic EL device. The light is penetrated, and a layer having high transparency in the light-emitting region of the organic EL element and having high transparency can be sufficiently ensured. Moreover, the image display device can be used in a high-temperature, high-humidity environment, and also requires durability under severe environmental conditions.

本發明之目的在於提供一種光學構件用組成物,當應用於影像顯示裝置時其可抑制顯示元件的劣化,並可形成具有高透明性而且在嚴苛環境條件下耐久性仍優異的光學構件。An object of the present invention is to provide a composition for an optical member which can suppress deterioration of a display element when applied to an image display device, and can form an optical member having high transparency and excellent durability under severe environmental conditions.

又,本發明之目的在於提供由前述組成物所形成之光學構件,還有使用了該光學構件之影像顯示裝置。Further, an object of the present invention is to provide an optical member formed of the above composition, and an image display device using the optical member.

用以解決課題之手段 本案發明人等為解決前述課題而反覆精心探究,結果發現了下述光學構件用組成物,遂完成本發明。Means for Solving the Problem The inventors of the present invention have intensively studied in order to solve the above problems, and as a result, have found the following composition for an optical member, and have completed the present invention.

即,本發明係有關於一種光學構件用組成物,特徵在於含有基底聚合物及下述通式(1)所示化合物。That is, the present invention relates to a composition for an optical member characterized by comprising a base polymer and a compound represented by the following formula (1).

[化學式1] [Chemical Formula 1]

(通式(1)中,m表示1~6之整數, Q1 於m為1時表示氫原子,m為2~6時表示2~6價之連結基, D1 表示自下述通式(2)所示化合物脫落1個氫原子後之基團,當m為2~6時,多個D1 可全部相同,亦可有所不同。(In the formula (1), m represents an integer of 1 to 6, and Q 1 represents a hydrogen atom when m is 1, and represents a 2 to 6 valent linkage when m is 2 to 6, and D 1 represents a general formula (2) When the compound shown is detached from one hydrogen atom, when m is 2 to 6, a plurality of D 1 's may be the same or different.

[化學式2] [Chemical Formula 2]

(通式(2)中、R1 表示氫原子、可具有取代基之烷基或可具有取代基之芳基。R2 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7 或-SO2 -R8 。R7 表示羥基或-OR71 ,R8 表示鹵素原子、羥基、-OR81 、-NR82 R83 或-R84 。R71 及R81 ~R84 係相同或相異,表示氫原子、可具有取代基之烷基或可具有取代基之芳基。 R3 表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基。 R402 及R403 為相同或相異,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406 R407 、-OR408 、氰基、-C(O)R409 、-O-C(O)R410 或-C(O)OR411 , R404 ~R411 為相同或相異,表示氫原子、可具有取代基之烷基或可具有取代基之芳基。以R404 、R405 及R404 和R405 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環))。(In the formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, and a heterocyclic ring. a group, -C(O)-R 7 or -SO 2 -R 8 . R 7 represents a hydroxyl group or -OR 71 , and R 8 represents a halogen atom, a hydroxyl group, -OR 81 , -NR 82 R 83 or -R 84 . 71 and R 81 to R 84 are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. R 3 represents a hydrogen atom, a halogen atom, a cyano group, and may have a substituent. An alkyl group or an aryl group which may have a substituent. R 402 and R 403 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, -NR 406 R 407 , -OR 408 , cyano, -C(O)R 409 , -OC(O)R 410 or -C(O)OR 411 , R 404 ~R 411 are the same or different and represent a hydrogen atom, which may have a substitution An alkyl group or an aryl group which may have a substituent. The nitrogen atom bonded to R 404 , R 405 and R 404 and R 405 may also form a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent) .

本發明中,上述通式(1)的m宜為1或2。In the present invention, m of the above formula (1) is preferably 1 or 2.

上述通式(1)所示化合物,宜為下述通式(3)所示化合物。The compound represented by the above formula (1) is preferably a compound represented by the following formula (3).

[化學式3] [Chemical Formula 3]

(通式(3)中,R1a 表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,R2a 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7a 或-SO2 -R8a 。R7a 表示羥基或-OR71a ,R8a 表示鹵素原子、羥基、-OR81a 、-NR82a R83a 或-R84a 。R71a 及R81a ~R84a 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R3a 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402a 表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406a R407a 、-OR408a 、氰基、-C(O)R409a 、-O-C(O)R410a 或-C(O)OR411a ,R404a ~R411a 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404a 、R405a 及R404a 和R405a 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。 R413 表示氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基或下述通式(4)所示基團。(In the formula (3), R 1a represents a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a 6 to 20 aryl group which may have a substituent, and R 2a represents a hydrogen atom, a cyano group, and a nitrate a group, a trifluoromethyl group, a heterocyclic group-containing group, -C(O)-R 7a or -SO 2 -R 8a . R 7a represents a hydroxyl group or -OR 71a , and R 8a represents a halogen atom, a hydroxyl group, -OR 81a , - NR 82a R 83a or -R 84a . R 71a and R 81a to R 84a are the same or different and each represents a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or a carbon number which may have a substituent of 6 to 20 R 3a represents a hydrogen atom, a halogen atom, a cyano group, a carbon number of 1 to 20 which may have a substituent, or a carbon number of 6 to 20 aryl groups which may have a substituent. R 402a represents a hydrogen atom, a halogen atom, a carbon number of 1 to 20 alkyl groups which may have a substituent, a carbon number of 6 to 20 aryl groups which may have a substituent, -NR 406a R 407a , -OR 408a , cyano group, -C(O)R 409a , -OC( O) R 410a or -C(O)OR 411a , R 404a to R 411a are the same or different and represent a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or a carbon number which may have a substituent 6~ 20 aryl. in R 404a, R 405a and R 404a and R 405a are bonded may also form with the nitrogen atom Substituted 4 to 8-membered nitrogen-containing heterocyclic group of the. R 413 represents a hydrogen atom, a substituent having a carbon number of 1 to 20 alkyl group, a substituent having a carbon number of 6 to 20 aryl group or the following formula ( 4) The group shown.

[化學式4] [Chemical Formula 4]

(通式(4)中,Q2 表示可具有取代基之碳數1~20之2價烴基,*表示與通式(3)之結合位置。 R1b 表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,R2b 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7b 或-SO2 -R8b 。R7b 表示羥基或-OR71b ,R8b 表示鹵素原子、羥基、-OR81b 、-NR82b R83b 或-R84b 。R71b 及R81b ~R84b 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R3b 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402b 表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406b R407b 、-OR408b 、氰基、-C(O)R409b 、-O-C(O)R410b 或-C(O)OR411b ,R404b ~R411b 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404b 、R405b 及R404b 和R405b 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環))。(In the formula (4), Q 2 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a binding position to the general formula (3). R 1b represents a hydrogen atom and a carbon which may have a substituent. a number of 1 to 20 alkyl groups or a carbon number 6 to 20 aryl group which may have a substituent, and R 2b represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic group-containing group, and -C(O)-R 7b Or -SO 2 -R 8b . R 7b represents a hydroxyl group or -OR 71b , and R 8b represents a halogen atom, a hydroxyl group, -OR 81b , -NR 82b R 83b or -R 84b . R 71b and R 81b to R 84b are the same or Different from each other, it represents a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a 6 to 20 aryl group which may have a substituent. R 3b represents a hydrogen atom, a halogen atom, a cyano group, and may have a substituent. a carbon number of 1 to 20 alkyl groups or a carbon number of 6 to 20 aryl groups which may have a substituent. R 402b represents a hydrogen atom, a halogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups, and a carbon number which may have a substituent 6~20 aryl, -NR 406b R 407b , -OR 408b , cyano, -C(O)R 409b , -OC(O)R 410b or -C(O)OR 411b , R 404b ~R 411b are the same Or different, representing a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or may have a substituent An aryl group having 6 to 20. In R 404b, R 405b and R 404b and R 405b are bonded to the nitrogen atom may form a nitrogen-containing 4 to 8-membered heterocyclic ring of the substituent group)).

本發明之一態樣中,上述R413 宜為上述通式(4)所示基團。In one aspect of the invention, the above R 413 is preferably a group represented by the above formula (4).

上述通式(1)所示化合物,亦宜為下述通式(5)所示化合物。The compound represented by the above formula (1) is also preferably a compound represented by the following formula (5).

[化學式5] [Chemical Formula 5]

(通式(5)中、R2c 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7c 或-SO2 -R8c 。R7c 表示羥基或-OR71c ,R8c 表示鹵素原子、羥基、-OR81c 、-NR82c R83c 或-R84c 。R71c 及R81c ~R84c 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R3c 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402c 及R403c 為相同或相異,表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406c R407c 、-OR408c 、氰基、-C(O)R409c 、-O-C(O)R410c 或-C(O)OR411c ,R404c ~R411c 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404c 、R405c 及R404c 和R405c 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。 R501 表示氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基或下述通式(6)所示基團。(In the formula (5), R 2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic group-containing group, -C(O)-R 7c or -SO 2 -R 8c. R 7c represents a hydroxyl group. Or -OR 71c , R 8c represents a halogen atom, a hydroxyl group, -OR 81c , -NR 82c R 83c or -R 84c . R 71c and R 81c to R 84c are the same or different and represent a hydrogen atom and may have a substituent. a carbon number of 1 to 20 alkyl groups or a carbon number of 6 to 20 aryl groups which may have a substituent. R 3c represents a hydrogen atom, a halogen atom, a cyano group, a carbon number which may have a substituent of 1 to 20 alkyl groups or may have a substituent. The carbon number is 6 to 20 aryl. R 402c and R 403c are the same or different, and represent a hydrogen atom, a halogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups, and a carbon number which may have a substituent of 6 to 20 aryl, -NR 406c R 407c, -OR 408c , cyano, -C (O) R 409c, -OC (O) R 410c , or -C (O) oR 411c, R 404c ~ R 411c is the same or different And a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a 6 to 20 aryl group which may have a substituent. The nitrogen atom bonded by R 404c , R 405c and R 404c and R 405c is also may be formed may have 4 to 8-membered nitrogen-containing heterocyclic group of the substituent. R 501 represents a hydrogen atom, an The carbon number of the substituent alkyl group having 1 to 20, carbon atoms may have a substituent group of the aryl group having 6 to 20 or the following formula (6) a group represented.

[化學式6] [Chemical Formula 6]

(通式(6)中,Q3 表示可具有取代基之碳數1~20之2價烴基,*表示與通式(5)之結合位置。 R2d 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7d 或-SO2 -R8d 。R7d 表示羥基或-OR71d ,R8d 表示鹵素原子、羥基、-OR81d 、-NR82d R83d 或-R84d 。R71d 及R81d ~R84d 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R3d 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402d 及R403d 為相同或相異,表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406d R407d 、-OR408d 、氰基、-C(O)R409d 、-O-C(O)R410d 或-C(O)OR411d ,R404d ~R411d 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404d 、R405d 及R404d 和R405d 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環))。(In the formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a binding position to the formula (5). R 2d represents a hydrogen atom, a cyano group, a nitro group, Trifluoromethyl, heterocyclic group-containing, -C(O)-R 7d or -SO 2 -R 8d . R 7d represents a hydroxyl group or -OR 71d , and R 8d represents a halogen atom, a hydroxyl group, -OR 81d , -NR 82d R 83d or -R 84d . R 71d and R 81d to R 84d are the same or different and each represents a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or a carbon number of 6 to 20 aryl groups which may have a substituent. R 3d represents a hydrogen atom, a halogen atom, a cyano group, a carbon number of 1 to 20 groups which may have a substituent, or a carbon number of 6 to 20 aryl groups which may have a substituent. R 402d and R 403d are the same or different, A hydrogen atom, a halogen atom, a carbon number of 1 to 20 which may have a substituent, a 6 to 20 aryl group which may have a substituent, -NR 406d R 407d , -OR 408d , a cyano group, a -C(O) R 409d , -OC(O)R 410d or -C(O)OR 411d , R 404d -R 411d are the same or different and represent a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or may have the carbon number of the substituent having 6 to 20 aryl group. in R 404d, R 405d and R 404d and R 405d are bonded nitrogen May also be formed may have a promoter having 4 to 8-membered nitrogen-containing heterocyclic group of the substituent)).

本發明之一態樣中,上述R501 宜為上述通式(6)所示基團。In one aspect of the invention, the above R 501 is preferably a group represented by the above formula (6).

前述光學構件用組成物中,前述通式(1)所示化合物宜為吸收光譜之極大吸收波長存在於380~430nm波長區域的色素化合物。In the composition for an optical member, the compound represented by the above formula (1) is preferably a dye compound having a maximum absorption wavelength of the absorption spectrum in a wavelength region of 380 to 430 nm.

前述光學構件用組成物中,宜進一步含有紫外線吸收劑。前述紫外線吸收劑之吸收光譜宜於300~400nm波長區域存在極大吸收波長。The composition for an optical member preferably further contains an ultraviolet absorber. The absorption spectrum of the ultraviolet absorber described above preferably has a maximum absorption wavelength in a wavelength region of 300 to 400 nm.

又,本發明是關於一種光學構件,特徵在於其係由前述光學構件用組成物所形成。Further, the present invention relates to an optical member characterized in that it is formed of the above-described composition for an optical member.

前述光學構件可作為例如光學薄膜使用。The aforementioned optical member can be used as, for example, an optical film.

前述光學構件可作為例如光學薄膜用黏著劑層或接著劑層使用。形成前述光學薄膜用黏著劑層之組成物所含有的基底聚合物,宜為(甲基)丙烯酸系聚合物。The optical member can be used, for example, as an adhesive layer or an adhesive layer for an optical film. The base polymer contained in the composition for forming the pressure-sensitive adhesive layer for an optical film is preferably a (meth)acrylic polymer.

前述光學構件可作為例如設置於光學薄膜之表面處理層使用。The optical member can be used, for example, as a surface treatment layer provided on an optical film.

前述光學構件相關之前述光學薄膜,可舉例如偏光薄膜、偏光件、偏光件用透明保護薄膜或相位差薄膜。The optical film related to the optical member may, for example, be a polarizing film, a polarizing material, a transparent protective film for a polarizing element, or a retardation film.

又,本發明係關於一種包含偏光件及相位差薄膜的光學積層體, 特徵在於前述光學積層體為含有前述光學構件之光學積層體(1)。Further, the present invention relates to an optical layered body comprising a polarizer and a retardation film, characterized in that the optical layered body is an optical layered body (1) containing the optical member.

又,本發明係關於一種影像顯示裝置,特徵在於具有影像顯示部及前述光學構件或前述光學積層體(1)。本發明之前述影像顯示裝置,以前述光學構件或光學積層體(1)較影像顯示部更靠觀視側設置的情形為佳。Furthermore, the present invention relates to an image display device comprising an image display unit, the optical member, or the optical layered body (1). In the video display device of the present invention, it is preferable that the optical member or the optical layered body (1) is disposed closer to the viewing side than the image display portion.

前述影像顯示裝置,可舉例如包含光學積層體及作為前述影像顯示部之有機EL面板的有機EL顯示裝置,其中前述光學積層體係自觀視側起至少依序包含偏光件與相位差薄膜者,並且,前述光學積層體可適宜使用含有前述光學構件或光學積層體(1)者。The image display device includes, for example, an organic EL display device including an optical layered body and an organic EL panel as the image display unit, wherein the optical layering system includes at least a polarizer and a retardation film from the viewing side. Further, as the optical layered body, those containing the optical member or the optical layered body (1) can be suitably used.

前述光學構件,在具有透明基材薄膜及透明導電層的透明導電性薄膜中,可作為前述透明基材薄膜、或作為設於前述透明基材薄膜與透明導電層之間的中間層使用。The optical member may be used as the transparent base film or as an intermediate layer provided between the transparent base film and the transparent conductive layer in the transparent conductive film having the transparent base film and the transparent conductive layer.

前述中間層可舉如選自折射率調整層、易接著劑層、硬塗層及裂紋防止層中之至少任1者。The intermediate layer may be at least one selected from the group consisting of a refractive index adjusting layer, an easy-adhesive layer, a hard coat layer, and a crack preventing layer.

又,本發明係有關於一種具有透明基材薄膜及透明導電層的透明導電性薄膜,特徵在於含有前述光學構件以作為前述透明基材薄膜、或作為設於與前述透明基材薄膜之間的中間層。Furthermore, the present invention relates to a transparent conductive film having a transparent base film and a transparent conductive layer, characterized in that the optical member is contained as the transparent base film or as a film provided between the transparent substrate and the transparent substrate film. middle layer.

又,本發明係有關於一種影像顯示裝置,特徵在於含有影像顯示部及前述透明導電性薄膜。本發明之前述影像顯示裝置,以前述透明導電性薄膜較影像顯示部更靠觀視側設置的情形為佳。Furthermore, the present invention relates to an image display device comprising a video display unit and the transparent conductive film. In the image display device of the present invention, it is preferable that the transparent conductive film is disposed closer to the viewing side than the image display portion.

前述影像顯示裝置可舉例如包含有機EL面板以作為前述影像顯示部的有機EL顯示裝置。The image display device may be, for example, an organic EL display device including an organic EL panel as the image display unit.

發明效果 本發明之光學構件用組成物,除了形成光學構件之基底聚合物外,還含有上述通式(1)所示化合物。該化合物由於吸收光譜於400nm附近存在極大吸收波長,故適宜用作色素,藉由將該化合物(色素化合物)與紫外線吸收劑組合使用,可充分吸收不影響有機EL面板等顯示元件之波長區域的光,並且較前述區域更長之波長側可充分穿透。再者,上述通式(1)所示化合物在高溫、高濕環境下之嚴苛環境條件下的耐久性仍優異。其結果,本發明之光學構件用組成物所形成之光學構件可抑制顯示元件因外界光線所致之劣化,並可具有優良的耐候劣化性而長壽命化。Advantageous Effects of Invention The composition for an optical member of the present invention contains the compound represented by the above formula (1) in addition to the base polymer forming the optical member. Since the absorption spectrum has a maximum absorption wavelength in the vicinity of 400 nm, the compound is suitably used as a dye, and by using the compound (pigment compound) in combination with an ultraviolet absorber, it can sufficiently absorb a wavelength region of a display element such as an organic EL panel. The light, and the longer wavelength side than the aforementioned region, can penetrate sufficiently. Further, the compound represented by the above formula (1) is excellent in durability under severe environmental conditions in a high-temperature, high-humidity environment. As a result, the optical member formed of the composition for an optical member of the present invention can suppress degradation of the display element due to external light, and can have excellent weathering deterioration and long life.

<光學構件用組成物> 以下說明本發明之光學構件用組成物所含各成分。本發明之光學構件用組成物,除了形成光學構件之基底聚合物外,還含有上述通式(1)所示化合物。此外,本發明之光學構件用組成物因應各種用途,可含有上述通式(1)所示化合物以外之各種添加劑。<Composition for Optical Member> Each component contained in the composition for an optical member of the present invention will be described below. The composition for an optical member of the present invention contains a compound represented by the above formula (1) in addition to the base polymer forming the optical member. Further, the composition for an optical member of the present invention may contain various additives other than the compound represented by the above formula (1) in accordance with various uses.

<基底聚合物> 前述基底聚合物係因應光學構件適用之用途而作適當選擇。用於前述基底聚合物的樹脂沒有特別限定,可舉如熱可塑性樹脂、光硬化性樹脂、熱硬化性樹脂等。可舉例如丙烯酸樹脂、聚碳酸酯樹脂、聚苯乙烯樹脂、低密度聚乙烯樹脂、聚丙烯樹脂、聚胺甲酸乙酯樹脂、聚醯胺樹脂、聚縮醛樹脂、聚伸苯基硫化物樹脂、聚對苯二甲酸乙二酯樹脂、聚對苯二甲酸丁二酯樹脂、聚環烯烴樹脂、聚碸樹脂、聚醚碸樹脂、氟樹脂、聚矽氧樹脂、聚酯樹脂、環氧樹脂、苯酚樹脂、三聚氰胺樹脂等樹脂。其等可單獨使用1種,亦可組合2種以上使用。<Base Polymer> The aforementioned base polymer is appropriately selected depending on the application to which the optical member is applied. The resin used for the base polymer is not particularly limited, and examples thereof include a thermoplastic resin, a photocurable resin, and a thermosetting resin. For example, an acrylic resin, a polycarbonate resin, a polystyrene resin, a low density polyethylene resin, a polypropylene resin, a polyurethane resin, a polyamide resin, a polyacetal resin, a polyphenylene sulfide resin , polyethylene terephthalate resin, polybutylene terephthalate resin, polycycloolefin resin, polyfluorene resin, polyether oxime resin, fluororesin, polyoxyxylene resin, polyester resin, epoxy resin A resin such as a phenol resin or a melamine resin. These may be used alone or in combination of two or more.

此外,因應光學用途之具體的基底聚合物方面,可使用該光學用途會使用之物。基底聚合物為形成各光學構件之主成分,與光學用途之說明一同後述。基底聚合物相關材料亦以各種用途中的周知標記方式來表示。例如,在黏著劑用途方面,若為丙烯酸系黏著劑,便可理解是以(甲基)丙烯酸系聚合物為基底聚合物。Further, in view of the specific base polymer aspect for optical use, it is possible to use the object for use in the optical use. The base polymer is a main component for forming each optical member, and will be described later together with the description of the optical use. Base polymer related materials are also indicated by well-known marking means in various applications. For example, in the case of an adhesive, if it is an acrylic adhesive, it is understood that a (meth)acrylic polymer is used as a base polymer.

<通式(1)所示化合物> 上述通式(1)所示化合物於本說明書中亦稱為化合物(1)。其他式號之化合物亦同,例如通式(2)所示化合物亦稱為化合物(2)。<Compound represented by the formula (1)> The compound represented by the above formula (1) is also referred to as the compound (1) in the present specification. Other compounds of the formula are also the same, for example, the compound represented by the formula (2) is also referred to as the compound (2).

本發明之化合物(1)若存在幾何異構性時,本發明亦包含其幾何異構物之任一者。又,本發明之化合物(1)若存在1個以上不對稱碳原子時,本發明亦包成各不對稱碳原子為R配置之化合物、S配置之化合物及其等任意組合之化合物中任一者。並且其等之消旋化合物、消旋混合物、單一光學異構物、非鏡像異構物混合物之任均包含於本發明中。In the case of the geometrical isomerism of the compound (1) of the present invention, the present invention also encompasses any of its geometric isomers. Further, when the compound (1) of the present invention has one or more asymmetric carbon atoms, the present invention also encompasses any of the compounds in which the asymmetric carbon atom is R, the compound in the S configuration, and any combination thereof. By. And any of the racemic compounds, racemic mixtures, single optical isomers, and non-imagewise isomer mixtures thereof are included in the present invention.

上述通式(1)中,m表示1~6之整數。m若為2~6,則化合物(1)的耐熱性便會提升故為佳。本發明之一態樣中,m宜為1或2、較佳為2。In the above formula (1), m represents an integer of 1 to 6. If m is 2 to 6, the heat resistance of the compound (1) is improved. In one aspect of the invention, m is preferably 1 or 2, preferably 2.

Q1 於m為1時表示氫原子,m為2~6時表示2~6價連結基。 2~6價連結基可舉例如可具有取代基之碳數1~20之2~6價烴基、-SO2 -等。 可具有取代基之碳數1~20之2~6價烴基可舉如:可具有取代基之碳數1~20之直鏈、分支或環狀之2~6價烷基,可具有取代基之碳數6~20之2~6價伸芳基。Q1 宜為氫原子或2價連結基。Q 1 represents a hydrogen atom when m is 1, and a 2 to 6-valent linking group when m is 2 to 6. The 2 to 6-valent linking group may, for example, be a 2 to 6-valent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, or -SO 2 -. The 2 to 6-valent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent may be a linear, branched or cyclic 2 to 6-valent alkyl group having 1 to 20 carbon atoms which may have a substituent, and may have a substituent. The carbon number is 6~20, and the 2~6 price is extended to aryl. Q 1 is preferably a hydrogen atom or a divalent linking group.

2價連結基以可具有取代基之碳數1~20之2價烴基、-SO2 -等為佳,而可具有取代基之碳數1~20之2價烴基較佳。可具有取代基之碳數1~20之2價烴基宜為可具有取代基之碳數1~20之直鏈、分支或環狀的2價烷基,可具有取代基之碳數6~20之2價伸芳基。 碳數1~20之直鏈、分支或環狀之2價烷基可為碳-碳間有氧原子、硫原子或可具有取代基之伸芳基插入的2價烷基,宜為-(CH2 )k1 -(k1表示1~20之整數)所示碳數1~20之直鏈狀2價烷基,可舉例如、亞甲基、伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基、伸癸基等。又,經1個以上鹵素原子取代之2價烷基亦佳,可舉例如雙三氟甲基亞甲基等。直鏈狀2價烷基的碳數以2~10(上述式中的k1為2~10)較佳、4~8(上述式中的k1為4~8)更佳。The divalent linking group is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, -SO 2 - or the like, and a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. The divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent is preferably a linear, branched or cyclic divalent alkyl group having 1 to 20 carbon atoms which may have a substituent, and may have a carbon number of 6 to 20 having a substituent. The price of 2 is aryl. The linear, branched or cyclic divalent alkyl group having 1 to 20 carbon atoms may be a divalent alkyl group having an oxygen atom, a sulfur atom or a aryl group which may have a substituent, and is preferably -( CH 2 ) k1 - (k1 represents an integer of 1 to 20) The linear divalent alkyl group having 1 to 20 carbon atoms, and examples thereof include a methylene group, an ethyl group, a propyl group, and a butyl group. Stretching pentyl, stretching hexyl, stretching heptyl, stretching octyl, stretching sputum and so on. Further, a divalent alkyl group substituted with one or more halogen atoms is also preferable, and examples thereof include a bistrifluoromethylmethylene group. The carbon number of the linear divalent alkyl group is preferably 2 to 10 (k1 in the above formula is 2 to 10), and 4 to 8 (k1 in the above formula is 4 to 8).

可具有取代基之碳數6~20之2價伸芳基宜為例如下述通式(20)所示基團。The divalent aryl group having 6 to 20 carbon atoms which may have a substituent is preferably a group represented by the following formula (20).

[化學式7] [Chemical Formula 7]

上述通式(20)中,X係彼此獨立地表示鹵素原子、硝基、羥基、磺基、碳數1~3之烷基或碳數1~3之烷氧基,s表示0~4之整數。苯環的2處鍵結位置為o-、m-、p-位向任一者均可。又,苯環以無取代基(s=0)為佳。In the above formula (20), X each independently represents a halogen atom, a nitro group, a hydroxyl group, a sulfo group, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms, and s represents a group of 0 to 4 Integer. The two bonding positions of the benzene ring may be any of o-, m-, and p-position. Further, the benzene ring is preferably an unsubstituted group (s = 0).

通式(1)中,D1 表示自化合物(2)脫落1個氫原子後之基團。自化合物(2)脫落1個氫原子後之基團,亦可說是自化合物(2)除去1個氫原子後之基團。化合物(2)含有含氮芳香環及拉電子基,並包含可成為色素的次甲基結構。化合物(1)由於包含這樣的次甲基結構而可作為色素化合物使用。m為2~6時,多個D1 可全部相同亦可有所差異。於一態樣中,多個D1 宜全部相同。 通式(1)中,m為1時的化合物(1)即為化合物(2)。m為1的化合物(1)亦稱為單體化合物。m為2~6之化合物(1)為具有2~6聚體結構之化合物,該結構係經由連結基(Q1 )連結了2~6個自化合物(2)脫落氫原子後之基團。m為2~6之化合物(1)亦稱為2~6聚體化合物。 D1 宜為自化合物(2)之R1 、R403 或R404 脫落1個氫原子後之基團(R1 為氫原子時R1 為脫落基),較佳為自R1 或R403 脫落1個氫原子後之基團。換言之,通式(1)中,Q1 係宜與通式(2)中之R1 、R403 或R404 的部分鍵結,而與R1 或R403 之部分鍵結較佳。In the formula (1), D 1 represents a group obtained by dropping one hydrogen atom from the compound (2). The group after the compound (2) is detached from one hydrogen atom can also be said to be a group obtained by removing one hydrogen atom from the compound (2). The compound (2) contains a nitrogen-containing aromatic ring and an electron-withdrawing group, and contains a methine structure which can be a pigment. The compound (1) can be used as a dye compound because it contains such a methine structure. When m is 2 to 6, a plurality of D 1 may be the same or different. In one aspect, a plurality of D 1 should be all the same. In the general formula (1), the compound (1) when m is 1, is the compound (2). The compound (1) wherein m is 1 is also referred to as a monomer compound. The compound (1) wherein m is 2 to 6 is a compound having a 2 to 6-mer structure, and the structure is bonded to a group of 2 to 6 from the compound (2) by a hydrogen atom via a linking group (Q 1 ). Compounds in which m is 2 to 6 (1) are also referred to as 2 to 6-mer compounds. D 1 is preferably a group obtained by detaching one hydrogen atom from R 1 , R 403 or R 404 of the compound (2) (wherein R 1 is a leaving group when R 1 is a hydrogen atom), preferably from R 1 or R 403 A group after dropping one hydrogen atom. In other words, in the formula (1), Q 1 is preferably bonded to a moiety of R 1 , R 403 or R 404 in the formula (2), and a bond to a moiety of R 1 or R 403 is preferred.

通式(2)中,R1 表示氫原子、可具有取代基之烷基或可具有取代基之芳基。可具有取代基之烷基,可舉如可具有取代基之碳數1~20烷基。可具有取代基之芳基,可舉如可具有取代基之碳數6~20芳基。通式(2)中之-C(O)-O-R1 為拉電子基。R1 宜為可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,較佳為可具有取代基之碳數1~20烷基。In the formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. The alkyl group which may have a substituent may, for example, be a C 1-20 alkyl group which may have a substituent. The aryl group which may have a substituent may, for example, be a 6 to 20 aryl group having a substituent. -C(O)-OR 1 in the formula (2) is a electron withdrawing group. R 1 is preferably a C 1-20 alkyl group which may have a substituent or a C 6-20 aryl group which may have a substituent, and preferably has a C 1-20 alkyl group which may have a substituent.

R2 表示氫原子、氰基、硝基、三氟甲基(CF3 基)、含雜環基、-C(O)-R7 或-SO2 -R8 。R7 表示羥基或-OR71 ,R8 表示鹵素原子、羥基、-OR81 、-NR82 R83 或-R84 。R71 及R81 ~R84 係相同或相異,表示氫原子、可具有取代基之烷基或可具有取代基之芳基。R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group (CF 3 group), a heterocyclic group-containing group, -C(O)-R 7 or -SO 2 -R 8 . R 7 represents a hydroxyl group or -OR 71 , and R 8 represents a halogen atom, a hydroxyl group, -OR 81 , -NR 82 R 83 or -R 84 . R 71 and R 81 to R 84 are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent.

R2 中的含雜環基可舉如吡咯環、吡啶環、喹啉環、嘧啶環、嗒嗪環、吡環、咪唑環、苯并咪唑環、三環、三唑環、四唑環等含氮雜環;呋喃環、苯并呋喃環等含氧雜環;噻吩環、苯并噻吩環等含硫雜環;唑環、苯并唑環等含氧原子及氮原子之雜環;噻唑環、苯并噻唑環、噻二唑環等含硫雜環等,該等環可再與其他碳環(例如苯環)或雜環(例如吡啶環)形成縮合環,並以唑環、苯并唑環為佳。The heterocyclic group in R 2 may, for example, be a pyrrole ring, a pyridine ring, a quinoline ring, a pyrimidine ring, a pyridazine ring or a pyridyl group. Ring, imidazole ring, benzimidazole ring, three a nitrogen-containing heterocyclic ring such as a ring, a triazole ring or a tetrazole ring; an oxygen-containing hetero ring such as a furan ring or a benzofuran ring; a sulfur-containing hetero ring such as a thiophene ring or a benzothiophene ring; Oxazole ring, benzo a heterocyclic ring containing an oxygen atom and a nitrogen atom such as an azole ring; a sulfur-containing hetero ring such as a thiazole ring, a benzothiazole ring or a thiadiazole ring, and the like may be further bonded to another carbocyclic ring (for example, a benzene ring) or a heterocyclic ring ( For example, a pyridine ring) forms a condensed ring and Oxazole ring, benzo The azole ring is preferred.

本發明之一態樣中,R2 所含雜環基,宜為自苯并唑環或唑環之氮與氧之間的碳(2位)脫落氫原子後之基團(亦可為已除去氫原子之基),較佳為自苯并唑環之氮與氧之間的碳(2位)脫落氫原子後之基團。 又,例如通式(1)中,當m為2~6,R2 為自苯并唑環或唑環脫落氫原子後之基團,且Q1 與D1 以化合物(2)之R2 之部位鍵結時,R2 宜以苯并唑環或唑環之氮與氧之間的碳(2位)以外的碳原子與Q1 鍵結。In one aspect of the invention, the heterocyclic group contained in R 2 is preferably self-benzoyl. Oxazole ring or a group after the carbon (position 2) of the azole ring is detached from the hydrogen atom (which may also be a group from which a hydrogen atom has been removed), preferably from a benzo group. The group after the carbon (2 position) between the nitrogen of the azole ring and the oxygen sheds the hydrogen atom. Further, for example, in the general formula (1), when m is 2 to 6, R 2 is self-benzo Oxazole ring or When the azole ring is detached from the hydrogen atom, and Q 1 and D 1 are bonded to the R 2 moiety of the compound (2), R 2 is preferably benzo. Oxazole ring or A carbon atom other than carbon (position 2) between the nitrogen of the azole ring and oxygen is bonded to Q 1 .

R1 、R71 、R81 、R82 、R83 及R84 中可具有取代基之烷基,可舉如可具有取代基之碳數1~20烷基。可具有取代基之碳數1~20烷基,可舉如後述之可具有取代基之碳數1~20之直鏈、分支或環狀烷基。本發明之一態樣中,可具有取代基之碳數1~20烷基,係宜為碳數4~20之直鏈、分支或環狀烷基,且碳數4以上之分支或環狀之立體巨大烷基為佳,較佳為碳數6~20之環狀烷基,尤佳為可具有直鏈或分支烷基作為取代基的環狀烷基。R1 、R71 、R81 、R82 、R83 及R84 中,碳數1~20烷基可舉例如甲基、乙基、n-丙基、i-丙基、n-丁基、i-丁基、t-丁基、n-己基、環己基、n-辛基、2-乙基己基、4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等為佳,而t-丁基、環己基、4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等較佳,4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等更佳。 R1 、R71 、R81 、R82 、R83 及R84 中,可具有取代基之芳基可舉如可具有取代基之碳數6~20芳基。可具有取代基之碳數6~20芳基,可舉如後述之可具有取代基之碳數6~20芳基,例如可被烷基取代之苯基(例如苯基、3-甲基苯基、2,6-二甲基苯基等)等。The alkyl group which may have a substituent in R 1 , R 71 , R 81 , R 82 , R 83 and R 84 may, for example, be a C 1-20 alkyl group which may have a substituent. The alkyl group having 1 to 20 carbon atoms which may have a substituent may be a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms which may have a substituent as described later. In one aspect of the present invention, the carbon number of the substituent may be 1 to 20 alkyl groups, and is preferably a linear, branched or cyclic alkyl group having 4 to 20 carbon atoms, and a branch or ring having a carbon number of 4 or more. The tridimensional macroalkyl group is preferably a cyclic alkyl group having 6 to 20 carbon atoms, and particularly preferably a cyclic alkyl group which may have a linear or branched alkyl group as a substituent. In R 1 , R 71 , R 81 , R 82 , R 83 and R 84 , the C 1-20 alkyl group may, for example, be a methyl group, an ethyl group, an n-propyl group, an i-propyl group or an n-butyl group. I-butyl, t-butyl, n-hexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-t-butylcyclohexyl, 2,6-di-t-butyl-4- Methylcyclohexyl or the like is preferred, and t-butyl, cyclohexyl, 4-t-butylcyclohexyl, 2,6-di-t-butyl-4-methylcyclohexyl, etc. are preferred, 4-t More preferably, butylcyclohexyl, 2,6-di-t-butyl-4-methylcyclohexyl or the like. Among the R 1 , R 71 , R 81 , R 82 , R 83 and R 84 , the aryl group which may have a substituent may be a C 6-20 aryl group which may have a substituent. The carbon number 6 to 20 aryl group which may have a substituent may, for example, be a carbon number 6 to 20 aryl group which may have a substituent, such as a phenyl group which may be substituted by an alkyl group (for example, phenyl group, 3-methylbenzene group). Base, 2,6-dimethylphenyl, etc.).

R1 宜為n-丁基、s-丁基、i-丁基、t-丁基、n-戊基、n-己基、環己基、n-辛基、2-乙基己基、4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等,而4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等較佳。 R2 宜為氰基、硝基、三氟甲基、含雜環基、-C(O)-R7 或-SO2 -R8 ,較佳為氰基、含雜環基或-C(O)-R7 ,更佳為氰基或-C(O)-OR71R 1 is preferably n-butyl, s-butyl, i-butyl, t-butyl, n-pentyl, n-hexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-t -butylcyclohexyl, 2,6-di-t-butyl-4-methylcyclohexyl, etc., and 4-t-butylcyclohexyl, 2,6-di-t-butyl-4-methyl A cyclohexyl group or the like is preferred. R 2 is preferably a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic group-containing group, -C(O)-R 7 or -SO 2 -R 8 , preferably a cyano group, a heterocyclic group or a -C ( O)-R 7 , more preferably cyano or -C(O)-OR 71 .

R71 及R81 係相同或相異,宜為例如甲基、乙基、n-丙基、i-丙基、n-丁基、s-丁基、i-丁基、t-丁基、n-戊基、n-己基、環己基、n-辛基、2-乙基己基、4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等,而4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等較佳。R82 宜為氫原子。R83 宜為氫原子、苯基、3-甲基苯基或2,6-二甲基苯基。R84 宜為甲基、乙基、t-丁基、環己基、苯基、萘基等。R 71 and R 81 are the same or different and are preferably, for example, methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl, i-butyl, t-butyl, N-pentyl, n-hexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-t-butylcyclohexyl, 2,6-di-t-butyl-4-methylcyclohexyl, etc. Further, 4-t-butylcyclohexyl, 2,6-di-t-butyl-4-methylcyclohexyl or the like is preferred. R 82 is preferably a hydrogen atom. R 83 is preferably a hydrogen atom, a phenyl group, a 3-methylphenyl group or a 2,6-dimethylphenyl group. R 84 is preferably a methyl group, an ethyl group, a t-butyl group, a cyclohexyl group, a phenyl group, a naphthyl group or the like.

通式(2)中,R3 表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基。 R402 及R403 係相同或相異,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406 R407 、-OR408 、氰基、-C(O)R409 、-O-C(O)R410 或-C(O)OR411 。 R404 ~R411 為相同或相異,表示氫原子、可具有取代基之烷基或可具有取代基之芳基。以R404 、R405 及R404 和R405 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。In the formula (2), R 3 represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group which may have a substituent or an aryl group which may have a substituent. R 402 and R 403 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, -NR 406 R 407 , -OR 408 , a cyano group, -C ( O) R 409 , -OC(O)R 410 or -C(O)OR 411 . R 404 to R 411 are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. The nitrogen atom bonded to R 404 , R 405 and R 404 and R 405 may also form a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent.

R3 、R402 及R403 的烷基可舉例如碳數1~20之直鏈、分支或環狀烷基。 碳數1~20之直鏈、分支或環狀烷基,具體上可舉如甲基、乙基、n-丙基、iso-丙基、n-丁基、iso-丁基、sec-丁基、t-丁基、n-戊基、2-甲基丁基、1-甲基丁基、neo-戊基、1,2-二甲基丙基、1,1-二甲基丙基、環戊基、n-己基、4-甲基戊基、3-甲基戊基、2-甲基戊基、1-甲基戊基、3,3-二甲基丁基、2,3-二甲基丁基、1,3-二甲基丁基、2,2-二甲基丁基、1,2-二甲基丁基、1,1-二甲基丁基、2-乙基丁基、1-乙基丁基、1,1,2-三甲基丁基、1-乙基-2-甲基丙基、環己基、n-庚基、2-甲基己基、3-甲基己基、4-甲基己基、5-甲基己基、2,4-二甲基戊基、n-辛基、2-乙基己基、2,5-二甲基己基、2,4-二甲基己基、2,2,4-三甲基戊基、t-辛基、n-壬基、3,5,5-三甲基己基、n-癸基、4-乙基辛基、4-乙基-4,5-二甲基己基、4-t-丁基環己基、n-十一基、n-十二基、1,3,5,7-四甲基辛基、4-丁基辛基、6,6-二乙基辛基、n-十三基、6-甲基-4-丁基辛基、n-十四基、n-十五基、3,5-二甲基十七基、2,6-二甲基十七基、2,4-二甲基十七基、2,2,5,5-四甲基己基、1-環戊基-2,2-二甲基丙基、1-環己基-2,2-二甲基丙基、2,6-二-t-丁基-4-甲基環己基、n-十八基等。The alkyl group of R 3 , R 402 and R 403 may, for example, be a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms. a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, specifically, methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, sec-butyl Base, t-butyl, n-pentyl, 2-methylbutyl, 1-methylbutyl, neo-pentyl, 1,2-dimethylpropyl, 1,1-dimethylpropyl , cyclopentyl, n-hexyl, 4-methylpentyl, 3-methylpentyl, 2-methylpentyl, 1-methylpentyl, 3,3-dimethylbutyl, 2,3 - dimethyl butyl, 1,3-dimethylbutyl, 2,2-dimethylbutyl, 1,2-dimethylbutyl, 1,1-dimethylbutyl, 2-B Butyl, 1-ethylbutyl, 1,1,2-trimethylbutyl, 1-ethyl-2-methylpropyl, cyclohexyl, n-heptyl, 2-methylhexyl, 3 -methylhexyl, 4-methylhexyl, 5-methylhexyl, 2,4-dimethylpentyl, n-octyl, 2-ethylhexyl, 2,5-dimethylhexyl, 2,4 - dimethylhexyl, 2,2,4-trimethylpentyl, t-octyl, n-fluorenyl, 3,5,5-trimethylhexyl, n-fluorenyl, 4-ethyloctyl , 4-ethyl-4,5-dimethylhexyl, 4-t-butylcyclohexyl, n-undecyl, n-dodecyl, 1,3,5,7-tetramethyloctyl, 4-butyloctyl, 6,6-diethyloctyl, n-tride , 6-methyl-4-butyloctyl, n-tetradecyl, n-pentadepyl, 3,5-dimethylheptyl, 2,6-dimethylheptyl, 2, 4-Dimethylheptyl, 2,2,5,5-tetramethylhexyl, 1-cyclopentyl-2,2-dimethylpropyl, 1-cyclohexyl-2,2-dimethyl Propyl, 2,6-di-t-butyl-4-methylcyclohexyl, n-octadecyl, and the like.

可具有取代基之烷基,其取代基並無特別限定,可舉如碳數6~10之單環或多環的芳香環基(苯基、萘基等)、碳數1~8之直鏈、分支或環狀烷氧基、胺基、單-或二-烷基胺基(烷基碳數為1~8)、鹵素原子、氰基、羥基、硝基、羧基、碳數1~8之烷氧基羰基、碳數2~10之醯基(例如、乙醯基、丙醯基、丁醯基、戊醯基、三甲基乙醯基、丙烯醯基、甲基丙烯醯基、苯甲醯基、甲苯甲醯基、桂皮醯基、大茴香醯基、萘甲醯基等)、碳數2~10之醯氧基等。The alkyl group which may have a substituent is not particularly limited, and examples thereof include a monocyclic or polycyclic aromatic ring group (phenyl group, naphthyl group, etc.) having a carbon number of 6 to 10, and a carbon number of 1 to 8. Chain, branched or cyclic alkoxy group, amine group, mono- or di-alkylamino group (alkyl group number of 1-8), halogen atom, cyano group, hydroxyl group, nitro group, carboxyl group, carbon number 1~ Alkoxycarbonyl group of 8 or a fluorenyl group having 2 to 10 carbon atoms (for example, ethyl fluorenyl group, propyl fluorenyl group, butyl fluorenyl group, amyl group, trimethyl ethane group, acryl fluorenyl group, methacryl fluorenyl group, benzene group) A mercapto group, a tolylmethyl group, a cinnamyl group, an anisidine group, a naphthyl group, or the like, and an anthracene group having a carbon number of 2 to 10.

R3 、R402 及R403 中的芳基,可舉如碳數6~20之單環或多環芳香環基。 碳數6~20之單環或多環芳香環基,具體上可舉如苯基等單環芳香族烴基;萘基、蒽基、稠四苯基、稠五苯基、菲基、芘基等多環芳香族烴基。 可具有取代基之芳基中,其取代基並無特別限定,可舉例如碳數1~8之直鏈、分支或環狀烷基、碳數1~8之烷氧基、胺基、單-或二-烷基胺基(烷基碳數為1~8)、鹵素原子、氰基、羥基、硝基、碳數1~8之鹵化烴基、羧基、碳數1~8之烷氧基羰基等。宜為碳數1~8之直鏈、分支或環狀烷基。例如,若舉具有取代基之苯基及萘基之一例,則可舉如硝基苯基、氰基苯基、羥苯基、甲基苯基、二甲基苯基、三甲基苯基、氟苯基、氯苯基、二氯苯基、溴苯基、甲氧基苯基、乙氧基苯基、三氟甲基苯基、N,N-二甲基胺基苯基、硝基萘基、氰基萘基、羥萘基、甲基萘基、氟萘基、氯萘基、溴萘基、三氟甲基萘基等。The aryl group in R 3 , R 402 and R 403 may, for example, be a monocyclic or polycyclic aromatic ring group having 6 to 20 carbon atoms. a monocyclic or polycyclic aromatic ring group having 6 to 20 carbon atoms, specifically, a monocyclic aromatic hydrocarbon group such as a phenyl group; a naphthyl group, an anthracenyl group, a condensed tetraphenyl group, a fused pentaphenyl group, a phenanthryl group, and a fluorenyl group. A polycyclic aromatic hydrocarbon group. In the aryl group which may have a substituent, the substituent is not particularly limited, and examples thereof include a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an amine group, and a single group. - or a dialkylamino group (alkyl group having 1 to 8 carbon atoms), a halogen atom, a cyano group, a hydroxyl group, a nitro group, a halogenated hydrocarbon group having 1 to 8 carbon atoms, a carboxyl group, and an alkoxy group having 1 to 8 carbon atoms. Carbonyl group and the like. It is preferably a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms. For example, examples of the phenyl group and the naphthyl group having a substituent include a nitrophenyl group, a cyanophenyl group, a hydroxyphenyl group, a methylphenyl group, a dimethylphenyl group, and a trimethylphenyl group. , fluorophenyl, chlorophenyl, dichlorophenyl, bromophenyl, methoxyphenyl, ethoxyphenyl, trifluoromethylphenyl, N,N-dimethylaminophenyl, nitrate Naphthyl, cyanonaphthyl, hydroxynaphthyl, methylnaphthyl, fluoronaphthyl, chloronaphthyl, bromonaphthyl, trifluoromethylnaphthyl and the like.

通式(2)中,以R404 、R405 及R404 和R405 所鍵結的氮原子形成的4~8員含氮雜環,可為含氧原子的含氮雜環。含氮雜環可舉如非芳香族性含氮雜環。4~8員含氮雜環可舉例如吡咯啶環、哌啶環、哌環、嗎福林環等非芳香族性含氮雜環。 可具有取代基之4~8員含氮雜環中的取代基並無特別限定,可舉例如碳數1~8之直鏈、分支或環狀烷基、碳數1~8之烷氧基、胺基、單-或二-烷基胺基(烷基碳數為1~8)、鹵素原子、氰基、羥基、硝基、碳數1~8之鹵化烴基、羧基、碳數1~8之烷氧基羰基等。宜為碳數1~8之直鏈、分支或環狀烷基。In the formula (2), the 4-8 member nitrogen-containing heterocyclic ring formed by the nitrogen atom bonded to R 404 , R 405 and R 404 and R 405 may be a nitrogen-containing hetero ring containing an oxygen atom. The nitrogen-containing heterocyclic ring may, for example, be a non-aromatic nitrogen-containing hetero ring. 4 to 8 members of the nitrogen-containing heterocyclic ring may, for example, be a pyrrolidine ring, a piperidine ring, or a piperidine. A non-aromatic nitrogen-containing heterocyclic ring such as a ring or a phenylephrine ring. The substituent in the 4 to 8 member nitrogen-containing heterocyclic ring which may have a substituent is not particularly limited, and examples thereof include a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms and an alkoxy group having 1 to 8 carbon atoms. , amine, mono- or di-alkylamino group (alkyl carbon number is 1-8), halogen atom, cyano group, hydroxyl group, nitro group, halogenated hydrocarbon group having 1 to 8 carbon atoms, carboxyl group, carbon number 1~ 8 alkoxycarbonyl and the like. It is preferably a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms.

烷基、芳基、含氮雜環、雜環等環具有取代基時,若取代基為2個以上,則各取代基可相同亦可相異。When a ring such as an alkyl group, an aryl group, a nitrogen-containing hetero ring or a heterocyclic ring has a substituent, when the substituent is two or more, the substituents may be the same or different.

進一步說明通式(2)中的各基團理想態樣。 R3 宜為氫原子、可具有取代基之碳數1~20烷基或氰基,較佳為氫原子或可具有取代基之碳數1~5烷基,更佳為氫原子或碳數1~3烷基,尤佳為氫原子。Further, the ideal aspect of each group in the formula (2) will be explained. R 3 is preferably a hydrogen atom, a C 1-20 alkyl group or a cyano group which may have a substituent, preferably a hydrogen atom or a C 1 to 5 alkyl group which may have a substituent, more preferably a hydrogen atom or a carbon number 1 to 3 alkyl groups, particularly preferably a hydrogen atom.

R402 宜為氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基或烷氧基,而可具有取代基之碳數1~20烷基較佳。較佳為氫原子或可具有取代基之碳數1~5烷基,更佳為氫原子或碳數1~3烷基,尤佳為甲基。R 402 is preferably a hydrogen atom, a C 1-20 alkyl group which may have a substituent, a 6-20 aryl group or an alkoxy group which may have a substituent, and a C 1-20 alkyl group which may have a substituent Preferably. It is preferably a hydrogen atom or a C 1-5 alkyl group which may have a substituent, more preferably a hydrogen atom or a C 1-3 alkyl group, and particularly preferably a methyl group.

R403 宜為-OR408 。R408 宜為氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,較佳為氫原子或可具有取代基之碳數1~5烷基,更佳為碳數1~3烷基,尤佳為乙基。 本發明之一態樣中,R402 及R403 宜至係任一者為氫原子以外的取代基,R402 及R403 係相同或相異地為氫原子以外之取代基較佳。R 403 should be -OR 408 . R 408 is preferably a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a 6 to 20 aryl group which may have a substituent, preferably a hydrogen atom or a carbon number of 1 to 5 which may have a substituent The base is more preferably a C 1 to 3 alkyl group, and particularly preferably an ethyl group. One aspect of the present invention, R 402 and R 403 to appropriate lines of any one substituent other than a hydrogen atom, the same or different places than a hydrogen atom as a substituent of R 402 and R 403 preferably lines.

R404 及R405 係相同或相異,宜為可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,較佳為碳數1~10烷基或碳數6~10芳基,更佳為碳數1~10烷基,尤佳為甲基、乙基、n-丙基、n-丁基。 R406 、R407 、R408 、R409 、R410 及R411 係相同或相異,宜為可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。R 404 and R 405 are the same or different and are preferably a C 1-20 alkyl group which may have a substituent or a C 6-20 aryl group which may have a substituent, preferably a C 1-10 alkyl group or The carbon number is 6 to 10 aryl groups, more preferably a carbon number of 1 to 10 alkyl groups, and particularly preferably a methyl group, an ethyl group, an n-propyl group or an n-butyl group. R 406 , R 407 , R 408 , R 409 , R 410 and R 411 are the same or different and are preferably a C 1-20 alkyl group which may have a substituent or a C 6-20 aryl group which may have a substituent .

通式(1)中m為1或2時之化合物,宜為上述通式(3)所示化合物(化合物(3))、通式(5)所示化合物(化合物(5))等。The compound of the formula (1) wherein m is 1 or 2 is preferably a compound represented by the above formula (3) (compound (3)), a compound represented by the formula (5) (compound (5)), or the like.

本發明之一態樣中,宜以化合物(3)作為化合物(1)。化合物(3)因耐光性優異故為佳。 通式(3)中,R1a 表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,R2a 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7a 或-SO2 -R8a 。R7a 表示羥基或-OR71a ,R8a 表示鹵素原子、羥基、-OR81a 、-NR82a R83a 或-R84a 。R71a 及R81a ~R84a 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。In one aspect of the invention, the compound (3) is preferably used as the compound (1). The compound (3) is preferred because it is excellent in light resistance. In the formula (3), R 1a represents a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a 6 to 20 aryl group which may have a substituent, and R 2a represents a hydrogen atom, a cyano group, or a nitro group. , trifluoromethyl, heterocyclic group-containing, -C(O)-R 7a or -SO 2 -R 8a . R 7a represents a hydroxyl group or -OR 71a , and R 8a represents a halogen atom, a hydroxyl group, -OR 81a , -NR 82a R 83a or -R 84a . R 71a and R 81a to R 84a are the same or different and each represent a hydrogen atom, a C 1-20 alkyl group which may have a substituent, or a C 6-20 aryl group which may have a substituent.

R1a 之理想態樣係與上述R1 之理想態樣相同。 R2a 以氰基、含雜環基或-C(O)-R7a 為佳,氰基或-C(O)-OR71a 較佳。R71a 、R81a 、R82a 、R83a 及R84a 之理想態樣分別與上述R71 、R81 、R82 、R83 及R84 之理想態樣相同。The ideal aspect of R 1a is the same as the ideal aspect of R 1 described above. R 2a is preferably a cyano group, a heterocyclic group-containing group or -C(O)-R 7a , and a cyano group or -C(O)-OR 71a is preferred. The ideal aspects of R 71a , R 81a , R 82a , R 83a and R 84a are the same as those of the above-mentioned R 71 , R 81 , R 82 , R 83 and R 84 , respectively.

通式(3)中、R3a 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402a 表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406a R407a 、-OR408a 、氰基、-C(O)R409a 、-O-C(O)R410a 或-C(O)OR411a ,R404a ~R411a 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404a 、R405a 及R404a 和R405a 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。 R3a 、R402a 、R404a 、R405a 、R406a 、R407a 、R408a 、R409a 、R410a 及R411a 之理想態樣分別與上述R3 、R402 、R404 、R405 、R406 、R407 、R408 、R409 、R410 及R411 之理想態樣相同。In the formula (3), R 3a represents a hydrogen atom, a halogen atom, a cyano group, a carbon number of 1 to 20 alkyl groups which may have a substituent, or a carbon number of 6 to 20 aryl groups which may have a substituent. R 402a represents a hydrogen atom, a halogen atom, a carbon number of 1 to 20 which may have a substituent, a carbon number of 6 to 20 aryl which may have a substituent, -NR 406a R 407a , -OR 408a , cyano group, -C (O) R 409a , -OC(O)R 410a or -C(O)OR 411a , R 404a to R 411a are the same or different and represent a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or The carbon number which may have a substituent is 6 to 20 aryl groups. The nitrogen atom bonded to R 404a , R 405a and R 404a and R 405a may also form a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent. The ideal aspects of R 3a , R 402a , R 404a , R 405a , R 406a , R 407a , R 408a , R 409a , R 410a and R 411a are respectively related to R 3 , R 402 , R 404 , R 405 , R 406 , respectively. The ideal aspects of R 407 , R 408 , R 409 , R 410 and R 411 are the same.

通式(3)中、R413 表示氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基,或表示上述通式(4)所示基團。R413 宜為可具有取代基之碳數1~5烷基或通式(4)所示基團,較佳為碳數1~3烷基或通式(4)所示基團,更佳為乙基或上述通式(4)所示基團。本發明之一態樣中,R413 宜為通式(4)所示基團。In the formula (3), R 413 represents a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, a carbon number of 6 to 20 aryl which may have a substituent, or a group represented by the above formula (4) group. R 413 is preferably a C 1 to 5 alkyl group which may have a substituent or a group represented by the formula (4), preferably a C 1 to 3 alkyl group or a group represented by the formula (4), more preferably It is an ethyl group or a group represented by the above formula (4). In one aspect of the invention, R 413 is preferably a group represented by the formula (4).

通式(4)中,Q2 表示可具有取代基之碳數1~20之2價烴基,*表示與通式(3)之結合位置。通式(4)中,Q2 係與通式(3)結合。Q2 中可具有取代基之碳數1~20之2價烴基及其理想態樣係與上述Q1 中可具有取代基之碳數1~20之2價烴基及其理想態樣相同。In the formula (4), Q 2 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a binding position to the formula (3). In the formula (4), the Q 2 system is bonded to the formula (3). 1 to 20 monovalent hydrocarbon group of 2 over its aspects lines Q 2 may have a substituent group of carbon number of the above-described Q 1 may have a substituent group of a carbon number of 1 to 20 divalent hydrocarbon group and over the same aspect.

通式(4)中,R1b 表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,R2b 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7b 或-SO2 -R8b 。R7b 表示羥基或-OR71b ,R8b 表示鹵素原子、羥基、-OR81b 、-NR82b R83b 或-R84b 。R71b 及R81b ~R84b 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R1b 之理想態樣係與上述R1 之理想態樣相同。 R2b 以氰基、含雜環基或-C(O)-R7b 為佳,氰基或-C(O)-OR71b 較佳。R71b 、R81b 、R82b 、R83b 及R84b 之理想態樣分別與上述R71 、R81 、R82 、R83 及R84 之理想態樣相同。In the formula (4), R 1b represents a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a 6 to 20 aryl group which may have a substituent, and R 2b represents a hydrogen atom, a cyano group, or a nitro group. , trifluoromethyl, heterocyclic group-containing, -C(O)-R 7b or -SO 2 -R 8b . R 7b represents a hydroxyl group or -OR 71b , and R 8b represents a halogen atom, a hydroxyl group, -OR 81b , -NR 82b R 83b or -R 84b . R 71b and R 81b to R 84b are the same or different and each represent a hydrogen atom, a C 1-20 alkyl group which may have a substituent, or a C 6-20 aryl group which may have a substituent. The ideal aspect of R 1b is the same as the ideal aspect of R 1 described above. R 2b is preferably a cyano group, a heterocyclic group-containing group or -C(O)-R 7b , and a cyano group or -C(O)-OR 71b is preferred. The ideal aspects of R 71b , R 81b , R 82b , R 83b and R 84b are the same as those of the above-mentioned R 71 , R 81 , R 82 , R 83 and R 84 , respectively.

通式(4)中、R3b 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402b 表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406b R407b 、-OR408b 、氰基、-C(O)R409b 、-O-C(O)R410b 或-C(O)OR411b ,R404b ~R411b 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404b 、R405b 及R404b 和R405b 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。 R3b 、R402b 、R404b 、R405a 、R406b 、R407b 、R408b 、R409b 、R410b 及R411b 之理想態樣分別與上述R3 、R402 、R404 、R405 、R406 、R407 、R408 、R409 、R410 及R411 之理想態樣相同。In the formula (4), R 3b represents a hydrogen atom, a halogen atom, a cyano group, a carbon number of 1 to 20 alkyl groups which may have a substituent, or a carbon number of 6 to 20 aryl groups which may have a substituent. R 402b represents a hydrogen atom, a halogen atom, a carbon number of 1 to 20 which may have a substituent, a carbon number of 6 to 20 aryl which may have a substituent, -NR 406b R 407b , -OR 408b , cyano group, -C (O) R 409b , -OC(O)R 410b or -C(O)OR 411b , R 404b -R 411b are the same or different and represent a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or The carbon number which may have a substituent is 6 to 20 aryl groups. The nitrogen atom bonded to R 404b , R 405b and R 404b and R 405b may also form a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent. Ideal aspects of R 3b , R 402b , R 404b , R 405a , R 406b , R 407b , R 408b , R 409b , R 410b , and R 411b are respectively associated with R 3 , R 402 , R 404 , R 405 , and R 406 , respectively. The ideal aspects of R 407 , R 408 , R 409 , R 410 and R 411 are the same.

化合物(1)亦宜為化合物(5)。 通式(5)中、R2c 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7c 或-SO2 -R8c 。R7c 表示羥基或-OR71c ,R8c 表示鹵素原子、羥基、-OR81c 、-NR82c R83c 或-R84c 。R71c 及R81c ~R84c 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。R2c 以氰基、含雜環基或-C(O)-R7c 為佳,氰基或-C(O)-OR71c 較佳。 R71c 、R81c 、R82c 、R83c 及R84c 之理想態樣分別與上述R71 、R81 、R82 、R83 及R84 之理想態樣相同。Compound (1) is also preferably compound (5). In the formula (5), R 2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic group-containing group, -C(O)-R 7c or -SO 2 -R 8c . R 7c represents a hydroxyl group or -OR 71c , and R 8c represents a halogen atom, a hydroxyl group, -OR 81c , -NR 82c R 83c or -R 84c . R 71c and R 81c to R 84c are the same or different and each represent a hydrogen atom, a C 1-20 alkyl group which may have a substituent, or a C 6-20 aryl group which may have a substituent. R 2c is preferably a cyano group, a heterocyclic group-containing group or -C(O)-R 7c , and a cyano group or -C(O)-OR 71c is preferred. The ideal aspects of R 71c , R 81c , R 82c , R 83c and R 84c are the same as those of the above-mentioned R 71 , R 81 , R 82 , R 83 and R 84 , respectively.

通式(5)中、R3c 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402c 及R403c 為相同或相異,表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406c R407c 、-OR408c 、氰基、-C(O)R409c 、-O-C(O)R410c 或-C(O)OR411c ,R404c ~R411c 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404c 、R405c 及R404c 和R405c 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。 R3c 、R402c 、R403c 、R404c 、R405c 、R406c 、R407c 、R408c 、R409c 、R410c 及R411c 之理想態樣分別與上述R3 、R402 、R403 、R404 、R405 、R406 、R407 、R408 、R409 、R410 及R411 之理想態樣相同。In the formula (5), R 3c represents a hydrogen atom, a halogen atom, a cyano group, a carbon number of 1 to 20 alkyl groups which may have a substituent, or a carbon number of 6 to 20 aryl groups which may have a substituent. R 402c, and R 403c are the same or different, represent a hydrogen atom, a halogen atom, a substituent having a carbon number of 1 to 20 alkyl group, a substituent having a carbon number of 6 to 20 aryl group, -NR 406c R 407c, -OR 408c , cyano, -C(O)R 409c , -OC(O)R 410c or -C(O)OR 411c , R 404c ~R 411c are the same or different and represent a hydrogen atom and may have a substituent The carbon number is 1 to 20 alkyl groups or the carbon number 6 to 20 aryl groups which may have a substituent. The nitrogen atom bonded to R 404c , R 405c and R 404c and R 405c may also form a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent. R 3c, R 402c, R 403c , R 404c, R 405c, R 406c, R 407c, R 408c, R 409c, R 410c , and R 411c of over aspects are identical to said R 3, R 402, R 403 , R 404 The ideal aspects of R 405 , R 406 , R 407 , R 408 , R 409 , R 410 and R 411 are the same.

通式(5)中,R501 表示氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基或上述通式(6)所示基團。R501 宜為可具有取代基之碳數1~20烷基(例如甲基、乙基、t-丁基、環己基、4-t-丁基環己基、2,6-二-t-丁基-4-甲基環己基等)、可具有取代基之碳數6~20芳基(例如苯基、甲基苯基、二甲基苯基、三甲基苯基等)、或上述通式(6)所示基團。本發明之一態樣中,R501 宜為上述通式(6)所示基團。In the formula (5), R 501 represents a hydrogen atom, a carbon number of 1 to 20 alkyl groups which may have a substituent, a carbon number of 6 to 20 aryl groups which may have a substituent, or a group represented by the above formula (6). R 501 is preferably a C 1-20 alkyl group which may have a substituent (for example, methyl, ethyl, t-butyl, cyclohexyl, 4-t-butylcyclohexyl, 2,6-di-t-butyl) a 4-methylcyclohexyl group, etc., a 6 to 20 aryl group having a substituent (for example, a phenyl group, a methylphenyl group, a dimethylphenyl group, a trimethylphenyl group, etc.), or the above-mentioned a group represented by the formula (6). In one aspect of the invention, R 501 is preferably a group represented by the above formula (6).

通式(6)中,Q3 表示可具有取代基之碳數1~20之2價烴基,*表示與通式(5)之結合位置。通式(6)中,Q3 係與通式(5)結合。Q3 中可具有取代基之碳數1~20之2價烴基及其理想態樣係與上述Q1 中可具有取代基之碳數1~20之2價烴基及其理想態樣相同。於一態樣中,Q3 較佳為以上述通式(20)表示且s為0的2價芳基。In the formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a binding position to the formula (5). In the formula (6), the Q 3 system is bonded to the formula (5). The divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent in Q 3 and an ideal state thereof are the same as the divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent in the above Q 1 and the ideal state thereof. In one aspect, Q 3 is preferably a divalent aryl group represented by the above formula (20) and s is 0.

通式(6)中、R2d 表示氫原子、氰基、硝基、三氟甲基、含雜環基、-C(O)-R7d 或-SO2 -R8d 。R7d 表示羥基或-OR71d ,R8d 表示鹵素原子、羥基、-OR81d 、-NR82d R83d 或-R84d 。R71d 及R81d ~R84d 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R2d 以氰基、含雜環基或-C(O)-R7d 為佳,氰基或-C(O)-OR71d 較佳。R71d 、R81d 、R82d 、R83d 及R84d 之理想態樣分別與上述R71 、R81 、R82 、R83 及R84 之理想態樣相同。In the formula (6), R 2d represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic group-containing group, -C(O)-R 7d or -SO 2 -R 8d . R 7d represents a hydroxyl group or -OR 71d , and R 8d represents a halogen atom, a hydroxyl group, -OR 81d , -NR 82d R 83d or -R 84d . R 71d and R 81d to R 84d are the same or different and each represent a hydrogen atom, a C 1-20 alkyl group which may have a substituent, or a C 6-20 aryl group which may have a substituent. R 2d is preferably a cyano group, a heterocyclic group-containing group or -C(O)-R 7d , and a cyano group or -C(O)-OR 71d is preferred. The ideal aspects of R 71d , R 81d , R 82d , R 83d and R 84d are the same as those of the above-mentioned R 71 , R 81 , R 82 , R 83 and R 84 , respectively.

R3d 表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。 R402d 及R403d 為相同或相異,表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406d R407d 、-OR408d 、氰基、-C(O)R409d 、-O-C(O)R410d 或-C(O)OR411d ,R404d ~R411d 為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基。以R404d 、R405d 及R404d 和R405d 所鍵結的氮原子亦可形成可具有取代基之4~8員之含氮雜環。 R3d 、R402d 、R403d 、R404d 、R405d 、R406d 、R407d 、R408d 、R409d 、R410d 及R411d 之理想態樣分別與上述R3 、R402 、R403 、R404 、R405 、R406 、R407 、R408 、R409 、R410 及R411 之理想態樣相同。R 3d represents a hydrogen atom, a halogen atom, a cyano group, a C 1-20 alkyl group which may have a substituent, or a C 6-20 aryl group which may have a substituent. R 402d and R 403d are the same or different and each represents a hydrogen atom, a halogen atom, a carbon number of 1 to 20 which may have a substituent, a carbon number of 6 to 20 aryl groups which may have a substituent, and -NR 406d R 407d . -OR 408d , cyano, -C(O)R 409d , -OC(O)R 410d or -C(O)OR 411d , R 404d ~R 411d are the same or different and represent a hydrogen atom and may have a substituent The carbon number is 1 to 20 alkyl groups or the carbon number 6 to 20 aryl groups which may have a substituent. The nitrogen atom bonded to R 404d , R 405d and R 404d and R 405d may also form a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent. The ideal aspects of R 3d , R 402d , R 403d , R 404d , R 405d , R 406d , R 407d , R 408d , R 409d , R 410d and R 411d are respectively related to R 3 , R 402 , R 403 , R 404 described above. The ideal aspects of R 405 , R 406 , R 407 , R 408 , R 409 , R 410 and R 411 are the same.

化合物(3)在R413 為通式(4)所示基團時為具有2聚體結構之化合物,即通式(1)之Q1 為Q2 (可具有取代基之碳數1~20之2價烴基),而通式(3)所示基團及通式(4)所示基團經由該Q2 於兩側連結成2聚體結構。通式(3)所示基團及通式(4)所示基團含有次甲基結構,均為會成為色素之結構。藉由讓此種會成為色素之結構作成2聚體結構,分子量會增大,故化合物變得難以昇華,而成為耐熱性優異的色素化合物。R413 為通式(4)所示基團的化合物(3)即下述通式(3-1)所示化合物。The compound (3) is a compound having a dimer structure when R 413 is a group represented by the formula (4), that is, Q 1 of the formula (1) is Q 2 (carbon number 1 to 20 which may have a substituent) The divalent hydrocarbon group) and the group represented by the formula (3) and the group represented by the formula (4) are bonded to each other via a Q 2 to form a dimer structure. The group represented by the formula (3) and the group represented by the formula (4) contain a methine structure, and both of them have a structure which becomes a dye. When such a structure which becomes a pigment is formed into a dimer structure, the molecular weight increases, and the compound becomes difficult to sublimate, and it becomes a pigment compound excellent in heat resistance. The compound (3) wherein R 413 is a group represented by the formula (4) is a compound represented by the following formula (3-1).

[化學式8] [Chemical Formula 8]

上述式(3-1)中、R1a 、R2a 、R3a 、R402a 、R404a 及R405a 以及Q2 、R1b 、R2b 、R3b 、R402b 、R404b 及R405b 分別與前述同義。In the above formula (3-1), R 1a , R 2a , R 3a , R 402a , R 404a and R 405a and Q 2 , R 1b , R 2b , R 3b , R 402b , R 404b and R 405b are respectively Synonymous.

化合物(5)在R501 為通式(6)所示基團時為具有2聚體結構之化合物,即通式(1)之Q1 為Q3 (可具有取代基之碳數1~20之2價烴基),而通式(5)所示基團及通式(6)所示基團經由該Q3 於兩側連結成2聚體結構。通式(5)所示基團及通式(6)所示結構含有次甲基結構,為會成為色素之結構。藉由讓此種會成為色素之結構作成2聚體結構,分子量會增大,故化合物變得難以昇華,而成為耐熱性優異的色素化合物。 R501 為通式(6)所示基團的化合物(5)即下述通式(5-1)所示化合物。The compound (5) is a compound having a 2-mer structure when R 501 is a group represented by the formula (6), that is, Q 1 of the formula (1) is Q 3 (carbon number 1 to 20 which may have a substituent) The divalent hydrocarbon group) and the group represented by the formula (5) and the group represented by the formula (6) are bonded to each other via a Q 3 to form a dimer structure. The group represented by the formula (5) and the structure represented by the formula (6) contain a methine structure and are a structure which becomes a dye. When such a structure which becomes a pigment is formed into a dimer structure, the molecular weight increases, and the compound becomes difficult to sublimate, and it becomes a pigment compound excellent in heat resistance. The compound (5) wherein R 501 is a group represented by the formula (6) is a compound represented by the following formula (5-1).

[化學式9] [Chemical Formula 9]

上述通式(5-1)中、R2c 、R3c 、R402c 、R403c 、R404c 和R405c 以及Q3 、R2d 、R3d 、R402d 、R403d 、R404d 及R405d 係與前述同義。In the above formula (5-1), R 2c , R 3c , R 402c , R 403c , R 404c and R 405c and Q 3 , R 2d , R 3d , R 402d , R 403d , R 404d and R 405d are The aforementioned synonymous.

作為本發明化合物(1)之理想態樣之一例,可舉例如實施例所製造的化合物C1~C5等。其中,因耐光性高故以化合物C1、C2及C5為佳。而從耐熱性高此點來看,係以化合物C1~C3為佳。從對有機溶劑之溶解度高此點來看,以化合物C1~C5為佳。化合物C1~C5為化合物(3)之一例。An example of a preferred aspect of the compound (1) of the present invention is, for example, the compounds C1 to C5 produced in the examples. Among them, compounds C1, C2 and C5 are preferred because of their high light resistance. From the viewpoint of high heat resistance, the compounds C1 to C3 are preferred. From the viewpoint of high solubility in an organic solvent, the compounds C1 to C5 are preferred. The compounds C1 to C5 are examples of the compound (3).

本發明化合物(1)之製造方法沒有特別限定,例如可依以下方法製造。咸舉以下合成方法一例,說明本發明之化合物之製造方法,惟本發明化合物(1)之製造方法不受下述方法限定。又,在進行後述反應時,該部位以外之官能基可視需要預先利用適當的保護基加以保護,並於適當階段將其脫保護。The method for producing the compound (1) of the present invention is not particularly limited, and for example, it can be produced by the following method. The production method of the compound of the present invention will be described by way of an example of the following synthesis method, but the production method of the compound (1) of the present invention is not limited by the following method. Further, in the case of the reaction described later, the functional group other than the moiety may be protected by an appropriate protecting group in advance and may be deprotected at an appropriate stage.

本發明之一態樣中,當通式(1)所示化合物為下述通式(11)所示化合物(化合物(11))時,舉例而言,可依如下方法進行合成。化合物(11)為本發明化合物(1)之一例,是通式(1)之m為2時的化合物(二聚體化合物)。化合物(11)亦可說是化合物(3)中R413 為通式(4)所示基團之化合物之一例。下述係藉由使化合物(M21)對化合物(M4)進行脫水縮合反應,而獲得化合物(11)。In one aspect of the invention, when the compound represented by the formula (1) is a compound represented by the following formula (11) (compound (11)), for example, it can be synthesized by the following method. The compound (11) is an example of the compound (1) of the present invention, and is a compound (dimer compound) in which m of the formula (1) is 2. The compound (11) can also be said to be an example of a compound of the compound (3) wherein R 413 is a group represented by the formula (4). The compound (11) is obtained by subjecting the compound (M21) to a dehydration condensation reaction of the compound (M4).

[化學式10] [Chemical Formula 10]

上述反應式中,Qf 表示2價連結基。R1f 、R2f 及其等之理想態樣分別與上述R1 、R2 及其等之理想態樣相同。R402f 、R404f 和R405f 以及其等之理想態樣分別與上述R402 、R404 和R405 以及其等之理想態樣相同。Qf 之2價連結基係與Q1 之2價連結基相同。Qf 宜為可具有取代基之碳數1~20之2價烴基。In the above reaction formula, Q f represents a divalent linking group. The ideal aspects of R 1f , R 2f and the like are the same as those of the above-mentioned R 1 , R 2 and the like. The ideal aspects of R 402f , R 404f , and R 405f , and the like, are the same as those of R 402 , R 404 , and R 405 described above, respectively. The two-valent linking group of Q f is the same as the two-valent linking group of Q 1 . Q f is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.

[化學式11] [Chemical Formula 11]

上方所示波浪線(上述波浪線與化學式中的波浪線相同)表示單鍵,且其所鍵結之雙鍵的立體組態係各自獨立地為E組態或Z組態或其等之混合。以下亦同。The wavy line shown above (the wavy line is the same as the wavy line in the chemical formula) represents a single bond, and the stereo configuration of the double key to which it is bonded is independently a configuration of E or a configuration of Z or the like. . The same is true below.

化合物(M4)係可藉由例如使二鹵化烷基化合物對下述通式(M1)所示化合物(M1)反應,使化合物(M1)之羥基進行烷氧基化而得。化合物(M1)可依照Journal of the Chemical Society 1957, 4845所記載之方法而得。The compound (M4) can be obtained by, for example, reacting a dihalogenated alkyl compound with a compound (M1) represented by the following formula (M1) to alkoxylate a hydroxyl group of the compound (M1). The compound (M1) can be obtained by the method described in Journal of the Chemical Society 1957, 4845.

[化學式12] [Chemical Formula 12]

上述通式(M1)中,R402f 、R404f 及R405f 係與上述同義。 又,化合物(11)亦可令化合物(M1)與化合物(M21)脫水縮合後經由烷氧基化使其二聚化而得。In the above formula (M1), R 402f , R 404f and R 405f are synonymous with the above. Further, the compound (11) can also be obtained by dehydrating and condensing the compound (M1) and the compound (M21), followed by dimerization by alkoxylation.

通式(1)所示化合物為下述通式(12)所示化合物(化合物(12))時,舉例而言,可藉由如下方法合成。化合物(12)係本發明化合物(1)之一例,為二聚體化合物。化合物(12)亦可說是化合物(5)的R501 為通式(6)所示基團之化合物之一例。下述係藉由使化合物(M22)對化合物(M2-1)進行脫水縮合反應而獲得化合物(12)。When the compound represented by the formula (1) is a compound represented by the following formula (12) (compound (12)), for example, it can be synthesized by the following method. The compound (12) is an example of the compound (1) of the present invention and is a dimer compound. The compound (12) can also be said to be an example of a compound in which R 501 of the compound (5) is a group represented by the formula (6). The compound (12) is obtained by subjecting the compound (M22) to a dehydration condensation reaction of the compound (M2-1).

[化學式13] [Chemical Formula 13]

上述反應式中,R2g 及其理想態樣分別與上述R2c 及其理想態樣相同。Wg 表示-C(O)-O-Qg -O-C(O)-,Qg 表示2價連結基。Qg 之2價連結基係與Q1 之2價連結基相同。Qg 宜為可具有取代基之碳數1~20之2價烴基。sR402g 、R403g 、R404g 和R405g 以及其等之理想態樣分別與上述R402 、R403 、R404 和R405 以及其等之理想態樣相同。 化合物(M2-1)及後述之化合物(M2-2)可藉由例如使上述化合物(M1)之羥基進行烷氧基化而得。 又,化合物(12)亦可使上述化合物(M21)與化合物(M2-1)脫水縮合後,使其等以R1f 連結作為Wg ,進行二聚化而得。In the above reaction formula, R 2g and its ideal form are the same as those of the above R 2c and its ideal form. W g represents -C(O)-OQ g -OC(O)-, and Q g represents a divalent linking group. The two-valent linking group of Q g is the same as the two-valent linking group of Q 1 . Q g is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. The ideal aspects of sR 402g , R 403g , R 404g and R 405g and the like are the same as those of R 402 , R 403 , R 404 and R 405 described above, respectively. The compound (M2-1) and the compound (M2-2) described later can be obtained, for example, by alkoxylating a hydroxyl group of the above compound (M1). Further, the compound (12) may be obtained by dehydrating and condensing the compound (M21) and the compound (M2-1), and then dimerizing it by using R 1f as a W g .

通式(1)所示化合物為下述通式(13)所示化合物(化合物(13))時,可例如藉由如下方法合成。化合物(13)係本發明化合物(1)之一例,為單體化合物(通式(1)中的m為1)。化合物(13)亦為化合物(3)中R413 表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基之化合物之一例。下述係藉由使化合物(M23)對化合物(M2-2)進行脫水縮合反應而獲得化合物(13)。When the compound represented by the formula (1) is a compound represented by the following formula (13) (compound (13)), it can be synthesized, for example, by the following method. The compound (13) is an example of the compound (1) of the present invention and is a monomer compound (m in the formula (1) is 1). The compound (13) is also an example of a compound of the compound (3) in which R 413 represents a hydrogen atom, a carbon number of 1 to 20 alkyl groups which may have a substituent, or a carbon number of 6 to 20 aryl groups which may have a substituent. The compound (13) is obtained by subjecting the compound (M23) to a dehydration condensation reaction of the compound (M2-2).

[化學式14] [Chemical Formula 14]

上述式中,R402h 、R403h 、R404h 和R405h 以及其等之理想態樣分別與上述R402 、R403 、R404 和R405 以及其等之理想態樣相同。R1h 、R2h 及其等之理想態樣分別與上述R1 、R2 及其等之理想態樣相同。In the above formula, R 402h , R 403h , R 404h and R 405h and their ideal aspects are the same as those of the above R 402 , R 403 , R 404 and R 405 and the like. The ideal states of R 1h , R 2h and the like are the same as those of the above-mentioned R 1 , R 2 and the like.

上述製造方法中,各生成物之單離或純化,可適當組合一般有機合成所用方法來進行,例如過濾、萃取、洗淨、乾燥、濃縮、結晶化、各種層析法等。又,中間體亦可不特別純化而供予下個反應。In the above production method, the separation or purification of each product can be carried out by appropriately combining methods used in general organic synthesis, such as filtration, extraction, washing, drying, concentration, crystallization, various chromatography methods, and the like. Further, the intermediate may be supplied to the next reaction without particular purification.

本發明之化合物(1)通常於360~430nm具有極大吸收波長。一旦於360~430nm具有極大吸收波長,便能選擇性吸收紫外線、藍色光。本發明之化合物(1)以於370~420nm具極大吸收波長為佳,於380~400nm具極大吸收波長較佳。又,本發明之化合物(1)的400nm之克吸光係數(gram-extinctioni coefficient)亦宜為30以上。極大吸收波長及克吸光係數可依實施例所記載之方法進行測定。 又,本發明之化合物(1)通常對有機溶劑之溶解性良好。The compound (1) of the present invention usually has a maximum absorption wavelength at 360 to 430 nm. Once it has a maximum absorption wavelength at 360~430nm, it can selectively absorb ultraviolet light and blue light. The compound (1) of the present invention preferably has a maximum absorption wavelength at 370 to 420 nm, and has a maximum absorption wavelength at 380 to 400 nm. Further, the compound (1) of the present invention preferably has a gram-extinctioni coefficient of 400 nm or more. The maximum absorption wavelength and the gram absorption coefficient can be measured by the method described in the examples. Further, the compound (1) of the present invention generally has good solubility in an organic solvent.

本發明之化合物(1)宜為可溶解於以下有機溶劑之化合物。 有機溶劑可舉例如芳香族烴類(例如甲苯、二甲苯等),酮類(甲乙酮、丙酮、環己酮、2-庚酮、3-庚酮等),醚類(例如丙二醇單甲基醚乙酸酯、甲基賽璐蘇乙酸酯、乙基賽璐蘇乙酸酯、丙二醇單甲基醚等),酯類(例如3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乳酸乙酯、醋酸乙酯、醋酸丁酯、3-甲氧基丙酸甲酯等)及其等2種以上之混合溶劑。 化合物(1)對至少1種上述有機溶劑宜溶解0.1質量%以上,例如溶解0.1質量%以上且50質量%以下溶解為佳、溶解1質量%以上且40質量%以下較佳、溶解3質量%以上且30質量%以下更佳。較佳為於20℃時對有機溶劑之溶解性為如此範圍。一旦對有機溶劑之溶解性為如此範圍,便能在將本發明之化合物(1)使用於例如光學構件之製造時有良好的製造性,故為佳。The compound (1) of the present invention is preferably a compound which is soluble in the following organic solvent. Examples of the organic solvent include aromatic hydrocarbons (for example, toluene, xylene, etc.), ketones (methyl ethyl ketone, acetone, cyclohexanone, 2-heptanone, 3-heptanone, etc.), and ethers (for example, propylene glycol monomethyl ether). Acetate, methyl cyproterone acetate, ethyl cyproterone acetate, propylene glycol monomethyl ether, etc., esters (eg methyl 3-ethoxypropionate, 3-ethoxy propyl) Ethyl acetate, ethyl lactate, ethyl acetate, butyl acetate, methyl 3-methoxypropionate, and the like, and a mixed solvent of two or more thereof. The compound (1) is preferably dissolved in at least one of the above organic solvents in an amount of 0.1% by mass or more, for example, dissolved in an amount of 0.1% by mass or more and 50% by mass or less, more preferably dissolved in an amount of 1% by mass or more and 40% by mass or less, and preferably dissolved in an amount of 3% by mass. The above and 30% by mass or less are more preferable. It is preferred that the solubility in an organic solvent at 20 ° C is such a range. When the solubility in an organic solvent is in such a range, it is preferable that the compound (1) of the present invention has good manufacturability when it is used in the production of, for example, an optical member.

本發明之化合物(1),其熱分解溫度以200℃以上為佳,而210℃以上較佳,例如宜為250~400℃。熱分解溫度可藉由熱重測定裝置來測定。The compound (1) of the present invention preferably has a thermal decomposition temperature of 200 ° C or more, more preferably 210 ° C or more, and for example, preferably 250 to 400 ° C. The thermal decomposition temperature can be measured by a thermogravimetric measuring device.

本發明之化合物(1)通常在360~430nm有極大吸收波長,可有效吸收該波長的光。本發明之化合物(1)可有效吸收在400nm左右的光。於一態樣中,本發明之化合物(1)一旦為2~6聚體化合物(通式(1)中m為2~6),便能使耐熱性提升。又,本發明之理想態樣中,本發明之化合物(1)對有機溶劑之溶解性優異。因此本發明之化合物(1)適宜使用於例如光學構件等。The compound (1) of the present invention usually has a maximum absorption wavelength at 360 to 430 nm, and can effectively absorb light of this wavelength. The compound (1) of the present invention can effectively absorb light of about 400 nm. In one aspect, the compound (1) of the present invention can improve heat resistance once it is a 2-6 mer compound (m is 2 to 6 in the formula (1)). Further, in a preferred embodiment of the present invention, the compound (1) of the present invention is excellent in solubility in an organic solvent. Therefore, the compound (1) of the present invention is suitably used for, for example, an optical member or the like.

<色素化合物> 前述於360~430nm有極大吸收波長的化合物(1)可作為色素化合物使用。前述化合物(1)之中,適宜使用吸收光譜於380~430nm之波長區域存在極大吸收波長的色素化合物。色素化合物之吸收光譜較佳係於380~420nm之波長區域存在極大吸收波長。本發明中,藉由將此種色素化合物與前述紫外線吸收劑組合使用,舉例而言,能夠充分吸收不影響有機EL元件發光之區域(波長380nm~430nm)的光,並且有機EL元件之發光區域(較430nm長之波長側)能穿份穿透,結果可抑制有機EL元件因外界光線所致之劣化。又,色素化合物若具有前述波長特性便無特別限制,惟宜不妨礙有機EL元件之顯示性之不具螢光及燐光性能(光致發光)的材料。<Pigment Compound> The compound (1) having a maximum absorption wavelength at 360 to 430 nm can be used as a dye compound. Among the above-mentioned compounds (1), a dye compound having an absorption spectrum having a maximum absorption wavelength in a wavelength region of from 380 to 430 nm is suitably used. The absorption spectrum of the dye compound preferably has a maximum absorption wavelength in the wavelength region of 380 to 420 nm. In the present invention, by using such a dye compound in combination with the ultraviolet absorber, for example, light which does not affect the light-emitting region (wavelength: 380 nm to 430 nm) of the organic EL element can be sufficiently absorbed, and the light-emitting region of the organic EL element can be sufficiently absorbed. (Besides the wavelength side of the 430 nm long side) can penetrate the penetration, and as a result, deterioration of the organic EL element due to external light can be suppressed. Further, the dye compound is not particularly limited as long as it has the above-mentioned wavelength characteristics, and is preferably a material which does not inhibit the display property of the organic EL element and which does not have fluorescence and calendering properties (photoluminescence).

又,前述色素化合物的半幅寬度(half-width)沒有特別限定,惟以80nm以下為佳、5~70nm較佳、10~60nm更佳。藉由令色素化合物之半幅寬度在前述範圍,便能調控以充分吸收不影響有機EL元件發光之區域的光,同時較430nm長之波長側的光則充分穿透,故為佳。此外,半幅寬度之測定方法係依以下記載之方法。 <半幅寬度之測定方法> 色素化合物的半幅寬度係使用紫外可見光分光光度計(U-4100,日立先端科技(股)製)以下列條件由色素化合物之溶液的穿透吸收光譜測定。從經調整濃度以使極大吸收波長之吸光度為1.0所測出的分光光譜,以峰値為50%之2點間的波長間隔(半幅全寬)為該色素化合物的半幅寬度。 (測定條件) 溶劑:甲苯或氯仿 比色管:石英比色管 光路長:10mmFurther, the half-width of the dye compound is not particularly limited, but is preferably 80 nm or less, more preferably 5 to 70 nm, and still more preferably 10 to 60 nm. By setting the half width of the dye compound to the above range, it is possible to adjust the light to sufficiently absorb the region which does not affect the light emission of the organic EL element, and it is preferable to sufficiently penetrate the light on the wavelength side longer than 430 nm. In addition, the method of measuring the half width is based on the method described below. <Measurement Method of Half-Width Width> The half-width of the pigment compound was measured by a transmission absorption spectrum of a solution of the pigment compound under the following conditions using an ultraviolet-visible spectrophotometer (U-4100, manufactured by Hitachi Advanced Technology Co., Ltd.). From the spectral range measured by adjusting the concentration so that the absorbance at the maximum absorption wavelength is 1.0, the wavelength interval (full width at half maximum) between two points at which the peak 値 is 50% is the half width of the dye compound. (Measurement conditions) Solvent: Toluene or chloroform Colorimetric tube: Quartz colorimetric tube Optical path length: 10 mm

前述化合物(1)、尤其是前述色素化合物,可單獨使用復亦可混合2種以上使用,而整體含量相對於100重量份之前述基底聚合物(或形成該聚合物之單體成分)宜為0.01~10重量份左右,而0.02~5重量份左右較佳。藉由使前述化合物(1)——尤其是前述色素化合物——的添加量設於前述範圍,便能例如充分吸收不影響有機EL元件發光之區域的光,而藉由使用該黏著劑組成物所形成之黏著劑層,可抑制有機EL元件的劣化,故為佳。The above-mentioned compound (1), particularly the above-mentioned dye compound, may be used singly or in combination of two or more kinds, and the total content is preferably 100 parts by weight or more based on 100 parts by weight of the base polymer (or monomer component forming the polymer). It is preferably about 0.01 to 10 parts by weight, and preferably about 0.02 to 5 parts by weight. By setting the amount of the compound (1), particularly the aforementioned dye compound, in the above range, it is possible to sufficiently absorb light which does not affect the region where the organic EL element emits light, for example, by using the adhesive composition. The formed adhesive layer is preferable because it can suppress deterioration of the organic EL element.

<紫外線吸收劑> 前述紫外線吸收劑沒有特別限制,可舉例如三系紫外線吸收劑、苯并三唑系紫外線吸收劑、二苯基酮系紫外線吸收劑、氧基二苯基酮系紫外線吸收劑、柳酸酯系紫外線吸收劑、氰基丙烯酸酯系紫外線吸收劑等,其等可單獨使用1種或組合2種以上使用。其等之中,以三系紫外線吸收劑、苯并三唑系紫外線吸收劑為佳,且以選自於由1分子中有2個以下羥基之三系紫外線吸收劑、及1分子中有1個苯并三唑骨架之苯并三唑系紫外線吸收劑所構成群組中之至少1種紫外線吸收劑為佳,因為此等紫外線吸收劑在例如使用丙烯酸系黏著劑組成物作成光學構件時,會對其形成所用之單體具有良好溶解性,並且在波長380nm附近的紫外線吸收能力高。<Ultraviolet absorber> The ultraviolet absorber is not particularly limited, and for example, three UV absorber, benzotriazole UV absorber, diphenyl ketone UV absorber, oxydiphenyl ketone UV absorber, salicylate UV absorber, cyanoacrylate UV absorber The above may be used alone or in combination of two or more. Among them, three It is preferably a UV absorber or a benzotriazole-based ultraviolet absorber, and is selected from the group consisting of two or less hydroxyl groups in one molecule. It is preferred to use at least one ultraviolet absorber in the group consisting of a UV absorber and a benzotriazole-based ultraviolet absorber having one benzotriazole skeleton in one molecule, since such ultraviolet absorbers are used, for example. When the acrylic adhesive composition is used as an optical member, it has good solubility for the monomer used for its formation, and has a high ultraviolet absorbing ability at a wavelength of around 380 nm.

1分子中有2個以下羥基的三系紫外線吸收劑,具體而言可舉如2,4-雙-[{4-(4-乙基己基氧基)-4-羥基}-苯基]-6-(4-甲氧基苯基)-1,3,5-三(Tinosorb S, BASF製)、2,4-雙[2-羥基-4-丁氧基苯基]-6-(2,4-二丁氧基苯基)-1,3,5-三(TINUVIN 460, BASF製)、2-(4,6-雙(2,4-二甲基苯基)-1,3,5-三-2-基)-5-羥基苯基與[(C10-C16(以C12-C13為主)烷基氧基)甲基]環氧乙烷的反應生成物(TINUVIN400, BASF製)、2-[4,6-雙(2,4-二甲基苯基)-1,3,5-三-2-基]-5-[3-(十二基氧基)-2-羥基丙氧基]酚)、2-(2,4-二羥基苯基)-4,6-雙(2,4-二甲基苯基)-1,3,5-三與(2-乙基己基)-去水甘油酸酯的反應生成物(TINUVIN405, BASF製)、2-(4,6-二苯基-1,3,5-三-2-基)-5-[(己基)氧基]-酚(TINUVIN1577, BASF製)、2-(4,6-二苯基-1,3,5-三-2-基)-5-[2-(2-乙基己醯氧基)乙氧基]-酚(ADK STAB LA46, ADEKA製)、2-(2-羥基-4-[1-辛基氧基羰基乙氧基]苯基)-4,6-雙(4-苯基苯基)-1,3,5-三(TINUVIN479, BASF公司製)等。Three of the following hydroxyl groups in one molecule It is a UV absorber, specifically, 2,4-bis-[{4-(4-ethylhexyloxy)-4-hydroxy}-phenyl]-6-(4-methoxyphenyl) )-1,3,5-three (Tinosorb S, manufactured by BASF), 2,4-bis[2-hydroxy-4-butoxyphenyl]-6-(2,4-dibutoxyphenyl)-1,3,5-tri (TINUVIN 460, manufactured by BASF), 2-(4,6-bis(2,4-dimethylphenyl)-1,3,5-three Reaction product of 2-(4-)-5-hydroxyphenyl group with [(C10-C16 (C12-C13-based) alkyloxy)methyl]oxirane (TINUVIN400, manufactured by BASF), 2- [4,6-bis(2,4-dimethylphenyl)-1,3,5-three 2-yl]-5-[3-(dodecyloxy)-2-hydroxypropoxy]phenol), 2-(2,4-dihydroxyphenyl)-4,6-bis (2, 4-dimethylphenyl)-1,3,5-three Reaction product with (2-ethylhexyl)-dehydroglycerate (TINUVIN405, manufactured by BASF), 2-(4,6-diphenyl-1,3,5-three -2-yl)-5-[(hexyl)oxy]-phenol (TINUVIN 1577, manufactured by BASF), 2-(4,6-diphenyl-1,3,5-three 2-yl)-5-[2-(2-ethylhexyloxy)ethoxy]-phenol (ADK STAB LA46, manufactured by ADEKA), 2-(2-hydroxy-4-[1-octyl] Oxycarbonylcarbonyl]phenyl)-4,6-bis(4-phenylphenyl)-1,3,5-three (TINUVIN479, manufactured by BASF Corporation), etc.

又,1分子中有1個苯并三唑骨架的苯并三唑系紫外線吸收劑可舉如2-(2H-苯并三唑-2-基)-6-(1-甲基-1-苯基乙基)-4-(1,1,3,3-四甲基丁基)酚(TINUVIN 928, BASF製)、2-(2-羥基-5-tert-丁基苯基)-2H-苯并三唑(TINUVIN PS, BASF製)、苯丙酸及3-(2H-苯并三唑-2-基)-5-(1,1-二甲基乙基)-4-羥基(C7-9側鏈及直鏈烷基)的酯類化合物(TINUVIN384-2, BASF製)、2-(2H-苯并三唑-2-基)-4,6-雙(1-甲基-1-苯基乙基)酚(TINUVIN900, BASF製)、2-(2H-苯并三唑-2-基)-6-(1-甲基-1-苯基乙基)-4-(1,1,3,3-四甲基丁基)酚(TINUVIN928, BASF製)、甲基-3-(3-(2H-苯并三唑-2-基)-5-t-丁基-4-羥基苯基)丙酸酯/聚乙二醇300的反應生成物(TINUVIN1130, BASF製)、2-(2H-苯并三唑-2-基)-p-甲酚(TINUVIN P, BASF製)、2(2H-苯并三唑-2-基)-4-6-雙(1-甲基-1-苯基乙基)酚(TINUVIN234, BASF製)、2-[5-氯(2H)-苯并三唑-2-基]-4-甲基-6-(tert-丁基)酚(TINUVIN326, BASF製)、2-(2H-苯并三唑-2-基)-4,6-二-tert-戊基酚(TINUVIN328, BASF製)、2-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)酚(TINUVIN329, BASF製)、甲基-3-(3-(2H-苯并三唑-2-基)-5-tert-丁基-4-羥基苯基)丙酸酯與聚乙二醇300的反應生成物(TINUVIN213, BASF製)、2-(2H-苯并三唑-2-基)-6-十二基-4-甲基酚(TINUVIN571, BASF製)、2-[2-羥基-3-(3,4,5,6-四氫酞醯亞胺甲基)-5-甲基苯基]苯并三唑(Sumisorb250, 住友化學工業(股)製)、2-(2-羥基-3-tert-丁基-5-甲基苯基)-5-氯苯并三唑(SeeSorb 703, SHIPRO化成(股)製、或KEMISORB 73、SHIPRO化成(股)製)等。Further, a benzotriazole-based ultraviolet absorber having one benzotriazole skeleton in one molecule is exemplified by 2-(2H-benzotriazol-2-yl)-6-(1-methyl-1- Phenylethyl)-4-(1,1,3,3-tetramethylbutyl)phenol (TINUVIN 928, manufactured by BASF), 2-(2-hydroxy-5-tert-butylphenyl)-2H -benzotriazole (TINUVIN PS, manufactured by BASF), phenylpropionic acid and 3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyl ( C7-9 side chain and linear alkyl) ester compound (TINUVIN384-2, manufactured by BASF), 2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl- 1-phenylethyl)phenol (TINUVIN900, manufactured by BASF), 2-(2H-benzotriazol-2-yl)-6-(1-methyl-1-phenylethyl)-4-(1) ,1,3,3-tetramethylbutyl)phenol (TINUVIN928, manufactured by BASF), methyl-3-(3-(2H-benzotriazol-2-yl)-5-t-butyl-4 -Hydroxyphenyl)propionate/polyethylene glycol 300 reaction product (TINUVIN1130, manufactured by BASF), 2-(2H-benzotriazol-2-yl)-p-cresol (TINUVIN P, manufactured by BASF , 2(2H-benzotriazol-2-yl)-4-6-bis(1-methyl-1-phenylethyl)phenol (TINUVIN234, manufactured by BASF), 2-[5-chloro (2H) )-benzotriazol-2-yl]-4-methyl-6-(tert-butyl)phenol (TINUVIN 326, manufactured by BASF), 2-(2H-benzotriazol-2-yl)-4, 6-di-tert-penta Phenol (TINUVIN328, manufactured by BASF), 2-(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol (TINUVIN329, manufactured by BASF), A Reaction product of benzyl-3-(3-(2H-benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl)propionate with polyethylene glycol 300 (TINUVIN213, BASF , 2-(2H-benzotriazol-2-yl)-6-dodecyl-4-methylphenol (TINUVIN571, manufactured by BASF), 2-[2-hydroxy-3-(3,4, 5,6-tetrahydroindenine methyl)-5-methylphenyl]benzotriazole (Sumisorb 250, manufactured by Sumitomo Chemical Co., Ltd.), 2-(2-hydroxy-3-tert-butyl) -5-Methylphenyl)-5-chlorobenzotriazole (SeeSorb 703, SHIPRO Chemical Co., Ltd., or KEMISORB 73, SHIPRO Chemical Co., Ltd.).

又,前述二苯基酮系紫外線吸收劑(二苯基酮系化合物)、及氧基二苯基酮系紫外線吸收劑(氧基二苯基酮系化合物)可舉例如2,4-二羥基二苯基酮、2-羥基-4-甲氧基二苯基酮、2-羥基-4-甲氧基二苯基酮-5-磺酸(酐及三水鹽)、2-羥基-4-辛基氧基二苯基酮、4-十二基氧基-2-羥基二苯基酮、4-苄基氧基-2-羥基二苯基酮、2,2´,4,4´-四羥基二苯基酮、2,2´-二羥基-4,4-二甲氧基二苯基酮、2,2´,4,4’-四羥基二苯基酮(SeeSorb 106, SHIPRO化成(股)製)、2,2’-二羥基-4-甲氧基二苯基酮(KEMISORB 111、CHEMIPRO化成(股)製)等。In addition, the diphenyl ketone-based ultraviolet absorber (diphenyl ketone compound) and the oxydiphenyl ketone ultraviolet absorber (oxydiphenyl ketone compound) may, for example, be a 2,4-dihydroxy group. Diphenyl ketone, 2-hydroxy-4-methoxydiphenyl ketone, 2-hydroxy-4-methoxydiphenyl ketone-5-sulfonic acid (anhydride and trihydrate), 2-hydroxy-4 -octyloxydiphenyl ketone, 4-dodecyloxy-2-hydroxydiphenyl ketone, 4-benzyloxy-2-hydroxydiphenyl ketone, 2,2 ́, 4,4 ́ -tetrahydroxydiphenyl ketone, 2,2 ́-dihydroxy-4,4-dimethoxydiphenyl ketone, 2,2 ́, 4,4'-tetrahydroxydiphenyl ketone (SeeSorb 106, SHIPRO Chemical (manufactured by the company), 2,2'-dihydroxy-4-methoxydiphenyl ketone (KEMISORB 111, manufactured by CHEMIPRO Chemical Co., Ltd.).

又前述柳酸酯系紫外線吸收劑(柳酸酯系化合物)可舉例如苯基-2-丙烯醯氧基苯甲酸酯、苯基-2-丙烯醯氧基-3-甲基苯甲酸酯、苯基-2-丙烯醯氧基-4-甲基苯甲酸酯、苯基-2-丙烯醯氧基-5-甲基苯甲酸酯、苯基-2-丙烯醯氧基-3-甲氧基苯甲酸酯、苯基-2-羥基苯甲酸酯、苯基-2-羥基-3-甲基苯甲酸酯、苯基-2-羥基-4-甲基苯甲酸酯、苯基-2-羥基-5-甲基苯甲酸酯、苯基-2-羥基-3-甲氧基苯甲酸酯、2,4-二-tert-丁基苯基-3,5-二-tert-丁基-4-羥基苯甲酸酯(TINUVIN120, BASF製)等。Further, the salicylate-based ultraviolet absorber (saltate-based compound) may, for example, be phenyl-2-propenyloxybenzoate or phenyl-2-propenyloxy-3-methylbenzoic acid. Ester, phenyl-2-propenyloxy-4-methylbenzoate, phenyl-2-propenyloxy-5-methylbenzoate, phenyl-2-propenyloxy- 3-methoxybenzoate, phenyl-2-hydroxybenzoate, phenyl-2-hydroxy-3-methylbenzoate, phenyl-2-hydroxy-4-methylbenzoate Acid ester, phenyl-2-hydroxy-5-methyl benzoate, phenyl-2-hydroxy-3-methoxybenzoate, 2,4-di-tert-butylphenyl-3 , 5-di-tert-butyl-4-hydroxybenzoate (TINUVIN 120, manufactured by BASF), and the like.

前述氰基丙烯酸酯系紫外線吸收劑(氰基丙烯酸酯系化合物)可舉例如烷基-2-氰基丙烯酸酯、環烷基-2-氰基丙烯酸酯、烷氧基烷基-2-氰基丙烯酸酯、烯基-2-氰基丙烯酸酯、炔基-2-氰基丙烯酸酯等。The cyanoacrylate ultraviolet absorber (cyanoacrylate compound) may, for example, be an alkyl-2-cyanoacrylate, a cycloalkyl-2-cyanoacrylate or an alkoxyalkyl-2-cyanide. Acrylate, alkenyl-2-cyanoacrylate, alkynyl-2-cyanoacrylate, and the like.

前述紫外線吸收劑之吸收光譜宜於300~400nm波長區域存在極大吸收波長,而於300~380nm波長區域存在較佳。在此,極大吸收波長意指於300~460nm波長區域的分光吸收光譜中,有多個吸收極大值存在時,表示其中最大的吸光度之極大吸收波長。極大吸收波長之測定方法與色素系化合物之測定方法相同。The absorption spectrum of the ultraviolet absorber preferably has a maximum absorption wavelength in a wavelength range of 300 to 400 nm, and is preferably in a wavelength range of 300 to 380 nm. Here, the maximum absorption wavelength means a maximum absorption wavelength of the maximum absorbance in the case where there are a plurality of absorption maximum values in the spectral absorption spectrum in the wavelength region of 300 to 460 nm. The method for measuring the maximum absorption wavelength is the same as the method for measuring the dye-based compound.

前述紫外線吸收劑可單獨使用,亦可混合2種以上使用,但整體含量相對於100重量份之前述基底聚合物(或形成該聚合物之單體成分)宜為0.1~8重量份左右、而0.2~6重量份左右較佳。藉由令紫外線吸收劑之添加量為前述範圍,可充分發揮光學構件之紫外線吸收機能。而且在光學構件之基底聚合物為例如丙烯酸系聚合物的情況下,當丙烯酸系聚合物進行紫外線聚合時不至於妨礙該聚合,故為佳。The ultraviolet absorber may be used singly or in combination of two or more kinds, but the total content is preferably about 0.1 to 8 parts by weight based on 100 parts by weight of the base polymer (or a monomer component forming the polymer). It is preferably about 0.2 to 6 parts by weight. By setting the amount of the ultraviolet absorber to be in the above range, the ultraviolet absorbing function of the optical member can be sufficiently exhibited. Further, in the case where the base polymer of the optical member is, for example, an acrylic polymer, it is preferred that the polymerization is not inhibited when the acrylic polymer is subjected to ultraviolet polymerization.

<其他添加劑> 本發明之光學構件用組成物,除了前述成分外,可因應用途而含有適宜之添加劑。<Other Additives> The composition for an optical member of the present invention may contain a suitable additive depending on the intended use, in addition to the above components.

<光學構件用組成物的調製> 本發明之光學構件用組成物,可藉由至少將形成光學構件之基底聚合物、紫外線吸收劑、及上述通式(1)所示化合物加以混合來調製。例如,可藉由下述方式來調製前述組成物:可於基底聚合物中將紫外線吸收劑及上述化合物(1)混練、或於溶劑溶解並混合等,復亦可在形成基底聚合物之單體成分中預先摻混紫外線吸收劑及上述化合物(1),令該摻混物聚合而獲得聚合物。又,在形成光學構件當下,可令光學構件用組成物適當地含有溶劑;又,可含有因應光學構件之各種添加劑。上述溶劑未特別受限,可舉如上述有機溶劑等。<Preparation of Composition for Optical Member> The composition for an optical member of the present invention can be prepared by mixing at least a base polymer forming an optical member, an ultraviolet absorber, and a compound represented by the above formula (1). For example, the composition may be prepared by kneading the ultraviolet absorber and the compound (1) in a base polymer, or dissolving and mixing in a solvent, etc., or forming a single base polymer. The ultraviolet absorber and the above compound (1) are previously blended in the body component, and the blend is polymerized to obtain a polymer. Further, in the case of forming an optical member, the composition for an optical member may be appropriately contained in a solvent; and various additives corresponding to the optical member may be contained. The solvent is not particularly limited, and examples thereof include the above organic solvents.

本發明之光學構件用組成物,可利用因應光學構件之各種方法來形成各種光學構件。例如,形成方法可採用將光學構件用組成物利用射出成形法、壓縮成形法、擠壓成形法等來成形的方法、或後述之將本發明之光學構件用組成物塗佈形成於支持體上的方法等各種方法。前述塗佈方法可舉如利用浸塗法、氣動刮刀塗佈法、簾幕式塗佈法、輥塗法、線棒塗佈法、凹版塗佈法、旋塗法、擠壓塗佈法等塗覆方法於支持體上形成塗膜的方法。The composition for an optical member of the present invention can be formed into various optical members by various methods in accordance with the optical member. For example, a method of forming an optical member composition by an injection molding method, a compression molding method, an extrusion molding method, or the like, or a composition for an optical member of the present invention described later may be applied to a support. Various methods such as methods. The coating method may be, for example, a dip coating method, a pneumatic blade coating method, a curtain coating method, a roll coating method, a bar coating method, a gravure coating method, a spin coating method, an extrusion coating method, or the like. A method of coating a method of forming a coating film on a support.

<光學構件> 光學構件可舉例如光學薄膜。具體而言,可適於作為本發明之光學構件的光學薄膜可舉如偏光件用透明保護薄膜、相位差薄膜、光擴散薄膜、集光薄膜、增亮薄膜、透鏡薄膜、視窗外蓋薄膜(前面板)、防飛散薄膜、裝飾印刷薄膜等。<Optical member> The optical member may, for example, be an optical film. Specifically, an optical film which can be suitably used as the optical member of the present invention may be a transparent protective film for a polarizing member, a retardation film, a light diffusing film, a light collecting film, a brightness enhancing film, a lens film, or a window cover film ( Front panel), anti-scattering film, decorative printed film, etc.

又,光學構件可舉如適用於光學薄膜之黏著劑層或接著劑層。該等黏著劑層或接著劑層可適用於設置在偏光薄膜、偏光件、偏光件用透明保護薄膜、相位差薄膜、光擴散薄膜、集光薄膜、增亮薄膜、透鏡薄膜、視窗外蓋薄膜(前面板)、防飛散薄膜、裝飾印刷薄膜等光學薄膜。前述光學構件,可作成包含偏光件及相位差薄膜之光學積層體使用。Further, the optical member may be an adhesive layer or an adhesive layer which is suitable for an optical film. The adhesive layer or the adhesive layer can be applied to a polarizing film, a polarizing member, a transparent protective film for a polarizing member, a retardation film, a light diffusing film, a light collecting film, a brightness enhancing film, a lens film, and a window cover film. Optical film (front panel), anti-scattering film, decorative printed film, etc. The optical member can be used as an optical layered body including a polarizer and a retardation film.

又,光學構件可舉如設置於光學薄膜的表面處理層等。該等表面處理層可舉如硬塗層、抗反射層、防眩處理層、抗反射層、折射率調整層等,可適用於設置在偏光薄膜、偏光件、偏光件用透明保護薄膜、相位差薄膜、光擴散薄膜、集光薄膜、增亮薄膜、透鏡薄膜、視窗外蓋薄膜(前面板)、防飛散薄膜、裝飾印刷薄膜等光學薄膜。Further, the optical member may be, for example, a surface treatment layer provided on an optical film. The surface treatment layer may be, for example, a hard coat layer, an antireflection layer, an antiglare treatment layer, an antireflection layer, a refractive index adjustment layer, etc., and may be applied to a polarizing film, a polarizing member, a transparent protective film for a polarizing member, and a phase. Optical films such as poor film, light diffusing film, light collecting film, brightness enhancing film, lens film, window cover film (front panel), anti-scatter film, decorative printed film.

又,光學構件可舉如設置於光學薄膜之機能層等。該等機能層可舉如易接著層、抗靜電層、抗結塊層、抗寡聚層、阻障層等,可適用於設置在偏光薄膜、偏光件、偏光件用透明保護薄膜、相位差薄膜、光擴散薄膜、集光薄膜、增亮薄膜、透鏡薄膜、視窗外蓋薄膜(前面板)、防飛散薄膜、裝飾印刷薄膜等等光學薄膜。Further, the optical member may be a functional layer provided on an optical film or the like. The functional layers may be an easy-adhesive layer, an antistatic layer, an anti-caking layer, an anti-oligomer layer, a barrier layer, etc., and may be applied to a polarizing film, a polarizing member, a transparent protective film for a polarizing member, and a phase difference. Optical films such as films, light diffusing films, light collecting films, brightness enhancing films, lens films, window cover films (front panels), anti-scatter films, decorative printed films, and the like.

又,前述光學構件在具有透明基材薄膜及透明導電層之透明導電性薄膜中,可作為前述透明基材薄膜、或作為設於與前述透明基材薄膜之間的中間層使用。前述中間層可例示為折射率調整層、易接著劑層、硬塗層、裂紋防止等。Further, the optical member may be used as the transparent base film or as an intermediate layer provided between the transparent base film and the transparent conductive film having a transparent base film and a transparent conductive layer. The intermediate layer can be exemplified by a refractive index adjusting layer, an easy-adhesive layer, a hard coat layer, crack prevention, and the like.

<影像顯示裝置> 本發明之影像顯示裝置係具備影像顯示部及前述光學構件。具備影像顯示部之影像顯示裝置的代表例,可舉如液晶顯示裝置、有機電致發光(EL)顯示裝置。前述光學構件宜較影像顯示部更靠觀視側設置。<Image Display Device> The image display device of the present invention includes a video display unit and the optical member. Representative examples of the image display device including the image display unit include a liquid crystal display device and an organic electroluminescence (EL) display device. Preferably, the optical member is disposed closer to the viewing side than the image display portion.

例如,於有機EL顯示裝置中,具備有機EL面板作為前述影像顯示部,並於該有機EL面板之觀視側含有光學積層體,而該光學積層體自觀視側起依序包含至少偏光件及相位差薄膜。本發明之光學構件,舉例而言,可使用作為形成前述光學積層體之構件。For example, the organic EL display device includes an organic EL panel as the image display unit, and an optical layered body on the viewing side of the organic EL panel, and the optical layered body includes at least a polarizing member from the viewing side. And phase difference film. As the optical member of the present invention, for example, a member which forms the optical layered body can be used.

以下,以使用含本發明之式(1)所示化合物的光學構件作為有機EL顯示裝置用光學積層體的情形作為代表例予以說明。前述光學積層體包含偏光件及相位差薄膜。In the following, a case where an optical member containing the compound represented by the formula (1) of the present invention is used as an optical layered product for an organic EL display device will be described as a representative example. The optical laminate includes a polarizer and a retardation film.

如圖1所示,光學積層體1係可例示自觀視側起依序至少積層有黏接著劑層2/透明保護薄膜3/偏光件4/相位差薄膜5/黏著劑層6的光學積層體。亦可為依序積層有黏接著劑層2/(觀視側)透明保護薄膜3/偏光件4/有機EL面板側透明保護薄膜/層間黏著劑層(或接著劑層)/相位差薄膜5/(有機EL面板側)黏著劑層6者。又,其等之外,亦可含有例如硬塗層、防眩處理層、抗反射層等機能層、或感測層、及用於積層其等之黏著劑層或接著劑層等。前述透明保護薄膜4/偏光件5亦稱為偏光薄膜。含有本發明之通式(1)所示化合物的光學構件,可使用作為形成前述光學積層體的各種構件或層。前述光學積層體,宜為含有含本發明通式(1)所示化合物之光學構件的光學積層體(1)。As shown in FIG. 1, the optical layered body 1 can be exemplified by an optical layer of at least a layer of an adhesive layer 2/transparent protective film 3/polarizer 4/phase difference film 5/adhesive layer 6 laminated from the viewing side. body. It is also possible to laminate the adhesive layer 2/(view side) transparent protective film 3/polarizer 4/organic EL panel side transparent protective film/interlayer adhesive layer (or adhesive layer)/phase difference film 5 in order. / (Organic EL panel side) Adhesive layer 6 of the. Further, in addition to these, a functional layer such as a hard coat layer, an antiglare treatment layer, and an antireflection layer, or a sensing layer, an adhesive layer or an adhesive layer for laminating them, and the like may be contained. The transparent protective film 4/polarizer 5 is also referred to as a polarizing film. As the optical member containing the compound represented by the formula (1) of the present invention, various members or layers which form the optical layered body can be used. The optical layered body is preferably an optical layered body (1) containing an optical member containing the compound of the formula (1) of the present invention.

(1-1)黏接著劑層2 本發明中的「接著劑層」係指黏著劑層或接著劑層。(1-1) Adhesive Layer 2 The "adhesive layer" in the present invention means an adhesive layer or an adhesive layer.

(1-1-1)接著劑層 接著劑層可採用由任意適當的接著劑構成之層。此種接著劑,可舉例如天然橡膠接著劑、α-烯烴系接著劑、胺甲酸乙酯樹脂系接著劑、乙烯-乙酸乙烯酯乳膠接著劑、乙烯-乙酸乙烯酯樹脂系熱熔接著劑、環氧樹脂系接著劑、氯化乙烯樹脂溶劑系接著劑、氯丁二烯橡膠系接著劑、氰基丙烯酸酯系接著劑、聚矽氧系接著劑、苯乙烯-丁二烯橡膠溶劑系接著劑、腈橡膠系接著劑、硝化纖維素系接著劑、反應性熱熔接著劑、苯酚樹脂系接著劑、改質聚矽氧系接著劑、聚酯系熱熔接著劑、聚醯胺樹脂熱熔接著劑、聚醯亞胺系接著劑、聚胺甲酸乙酯樹脂熱熔接著劑、聚烯烴樹脂熱熔接著劑、聚醋酸乙烯酯樹脂溶劑系接著劑、聚苯乙烯樹脂溶劑系接著劑、聚乙烯醇系接著劑、聚乙烯吡咯啶酮樹脂系接著劑、聚乙烯丁醛系接著劑、聚苯并咪唑接著劑、聚甲基丙烯酸酯樹脂溶劑系接著劑、三聚氰胺樹脂系接著劑、脲樹脂系接著劑、間苯二酚系接著劑等。此種接著劑可單獨使用1種或混合2種以上使用。因應前述接著劑的種類使用基底聚合物。(1-1-1) Adhesive Layer The subsequent layer may be a layer composed of any appropriate adhesive. Examples of such an adhesive include a natural rubber adhesive, an α-olefin-based adhesive, an urethane resin-based adhesive, an ethylene-vinyl acetate emulsion adhesive, and an ethylene-vinyl acetate resin-based hot melt adhesive. An epoxy resin-based adhesive, a vinyl chloride resin solvent-based adhesive, a chloroprene rubber-based adhesive, a cyanoacrylate-based adhesive, a polyfluorene-based adhesive, and a styrene-butadiene rubber solvent Agent, nitrile rubber-based adhesive, nitrocellulose-based adhesive, reactive hot-melt adhesive, phenol resin-based adhesive, modified polyoxynized adhesive, polyester hot-melt adhesive, and polyamide heat A flux-curing agent, a polyimide-based adhesive, a polyurethane resin hot-melt adhesive, a polyolefin resin hot-melt adhesive, a polyvinyl acetate resin solvent-based adhesive, a polystyrene resin solvent-based adhesive, Polyvinyl alcohol-based adhesive, polyvinylpyrrolidone resin-based adhesive, polyvinyl butyral-based adhesive, polybenzimidazole adhesive, polymethacrylate resin solvent-based adhesive, melamine resin-based adhesive, urea Lipid-based adhesive, resorcinol-based adhesive agent. These adhesives may be used alone or in combination of two or more. The base polymer is used in accordance with the kind of the above-mentioned adhesive.

接著劑若以接著形態來分類,則可舉例如熱硬化型接著劑、熱熔接著劑等。如此之接著劑可僅為1種,亦可為2種以上。The subsequent agent may be classified into a subsequent form, for example, a thermosetting adhesive, a hot melt adhesive, or the like. Such an adhesive may be used alone or in combination of two or more.

熱硬化型接著劑,係經由加熱進行熱硬化而固化,藉此展現接著力。熱硬化型接著劑可舉例如環氧系熱硬化型接著劑、胺基甲酸酯系熱硬化型接著劑、丙烯酸系熱硬化型接著劑等。熱硬化型接著劑的硬化溫度係例如100~200℃。The thermosetting type adhesive is cured by heat hardening by heating, thereby exhibiting an adhesive force. Examples of the thermosetting type adhesive include an epoxy-based thermosetting adhesive, a urethane-based thermosetting adhesive, and an acrylic thermosetting adhesive. The curing temperature of the thermosetting adhesive is, for example, 100 to 200 °C.

熱熔接著劑係藉由加熱來熔融或軟化而於被接著體熱熔著,隨後經由冷卻而固化,藉此接著於被接著體。熱熔接著劑可舉例如橡膠系熱熔接著劑、聚酯系熱熔接著劑、聚烯烴系熱熔接著劑、乙烯-乙酸乙烯酯樹脂系熱熔接著劑、聚醯胺樹脂熱熔接著劑、聚胺基甲酸酯樹脂熱熔接著劑等。熱熔接著劑的軟化溫度(環球法)係例如100~200℃。又,熱熔接著劑的熔融黏度於180℃下為例如100~30000mPa・s。The hot melt adhesive is melted or softened by heating to be thermally fused by the adherend, and then solidified by cooling, thereby being followed by the adherend. Examples of the hot-melt adhesive include a rubber-based hot-melt adhesive, a polyester-based hot-melt adhesive, a polyolefin-based hot-melt adhesive, an ethylene-vinyl acetate resin-based hot-melt adhesive, and a polyamide resin hot-melt adhesive. , a polyurethane resin hot melt adhesive, and the like. The softening temperature (ring and ball method) of the hot melt adhesive is, for example, 100 to 200 °C. Further, the melt viscosity of the hot melt adhesive is, for example, 100 to 30,000 mPa·s at 180 °C.

接著劑層的厚度沒有特別限制,舉例而言,以0.01~10μm左右為佳、0.05~8μm左右較佳。The thickness of the layer is not particularly limited. For example, it is preferably about 0.01 to 10 μm and preferably about 0.05 to 8 μm.

(1-1-2)黏著劑層 形成黏著劑層的黏著劑組成物種類沒有特別限定,可舉例如橡膠系黏著劑、丙烯酸系黏著劑、聚矽氧系黏著劑、胺基甲酸酯系黏著劑、乙烯基烷基醚系黏著劑、聚乙烯醇系黏著劑、聚乙烯吡咯啶酮系黏著劑、聚丙烯醯胺系黏著劑、纖維素系黏著劑等。該等黏著劑之中,就光學透明性優異且可展現適當密著性、凝聚性及接著性之黏著特性並且具優異耐候性及耐熱性等觀點來看,適宜使用丙烯酸系黏著劑。因應前述黏著劑的種類使用基底聚合物。本發明中,宜為含有(甲基)丙烯酸系聚合物以作為基底聚合物的丙烯酸系黏著劑組成物。(1-1-2) The type of the adhesive composition for forming the adhesive layer of the adhesive layer is not particularly limited, and examples thereof include a rubber-based adhesive, an acrylic adhesive, a polyoxygen-based adhesive, and an urethane-based adhesive. An adhesive, a vinyl alkyl ether-based adhesive, a polyvinyl alcohol-based adhesive, a polyvinylpyrrolidone-based adhesive, a polypropylene amide-based adhesive, or a cellulose-based adhesive. Among these adhesives, an acrylic adhesive is preferably used from the viewpoints of excellent optical transparency, adhesion characteristics of appropriate adhesion, cohesiveness, and adhesion, and excellent weather resistance and heat resistance. The base polymer is used in accordance with the kind of the aforementioned adhesive. In the present invention, an acrylic adhesive composition containing a (meth)acrylic polymer as a base polymer is preferred.

前述丙烯酸系黏著劑組成物宜包含例如由含(甲基)丙烯酸烷酯之單體成分的部分聚合物及/或前述單體成分所得之(甲基)丙烯酸系聚合物,並可在該丙烯酸系黏著劑組成物添加色素化合物(進一步為紫外線吸收劑)。The acrylic adhesive composition preferably contains, for example, a (meth)acrylic polymer obtained from a partial polymer of a monomer component containing an alkyl (meth)acrylate and/or the above monomer component, and may be used in the acrylic acid. A pigment compound (further an ultraviolet absorber) is added to the adhesive composition.

(單體成分之部分聚合物、及(甲基)丙烯酸系聚合物) 前述丙烯酸系黏著劑組成物含有:含(甲基)丙烯酸烷酯之單體成分的部分聚合物及/或由前述單體成分所獲得之(甲基)丙烯酸系聚合物。(Partial polymer of monomer component and (meth)acrylic polymer) The acrylic adhesive composition contains a partial polymer containing a monomer component of an alkyl (meth)acrylate and/or a single A (meth)acrylic polymer obtained by the body component.

前述(甲基)丙烯酸烷酯可例示如在酯基末端具有直鏈狀或分枝狀之碳數1~24的烷基者。(甲基)丙烯酸烷酯可單獨使用1種或將2種以上組合使用。另,「(甲基)丙烯酸烷酯」係指丙烯酸烷酯及/或甲基丙烯酸烷酯,本發明之(甲基)均同義。The alkyl (meth)acrylate may, for example, be an alkyl group having a linear or branched carbon number of 1 to 24 at the ester terminal. The alkyl (meth)acrylate may be used alone or in combination of two or more. Further, "alkyl (meth)acrylate" means an alkyl acrylate and/or an alkyl methacrylate, and the (meth) groups of the present invention are synonymous.

前述(甲基)丙烯酸烷酯,可舉如前述直鏈狀或分支鏈狀之碳數1~24烷基(甲基)丙烯酸酯,其等當中以碳數1~9烷基(甲基)丙烯酸酯為佳,理想上可例示如碳數4~9並具分支之烷基(甲基)丙烯酸酯。該(甲基)丙烯酸烷酯在容易取得黏著特性平衡的觀點上甚是理想。碳數4~9並具分支之烷基(甲基)丙烯酸酯,具體上可舉如(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸異己酯、(甲基)丙烯酸異庚酯、(甲基)丙烯酸-2-乙基己酯、(甲基)丙烯酸異辛酯及(甲基)丙烯酸異壬酯等,其等可單獨使用1種或組合2種以上來使用。The alkyl (meth)acrylate may, for example, be a linear or branched carbon number of 1 to 24 alkyl (meth) acrylates, and among them, a carbon number of 1 to 9 alkyl groups (methyl) The acrylate is preferred, and an alkyl (meth) acrylate having a carbon number of 4 to 9 and having a branch is desirably exemplified. The alkyl (meth)acrylate is preferred from the viewpoint of easily obtaining a balance of adhesion characteristics. Alkyl (meth) acrylate having a carbon number of 4 to 9 and having a branch, and specifically, n-butyl (meth) acrylate, second butyl (meth) acrylate, and third butyl (meth) acrylate Ester, isobutyl (meth)acrylate, n-amyl (meth)acrylate, isoamyl (meth)acrylate, isohexyl (meth)acrylate, iso-heptyl (meth)acrylate, (methyl) 2-ethylhexyl acrylate, isooctyl (meth) acrylate, isodecyl (meth) acrylate, etc. may be used alone or in combination of two or more.

於本發明中,前述於酯末端具有碳數1~24烷基的(甲基)丙烯酸烷酯,相對於可形成(甲基)丙烯酸系聚合物之單官能性單體成分的總量為40重量%以上,而50重量%以上較佳,60重量%以上更佳。In the present invention, the alkyl (meth)acrylate having a C 1-24 alkyl group at the ester terminal is 40 in total with respect to the monofunctional monomer component capable of forming a (meth)acrylic polymer. More preferably, it is 50% by weight or more, and more preferably 60% by weight or more.

前述單體成分中,可含有前述(甲基)丙烯酸烷酯以外之共聚單體作為單官能性單體成分。共聚單體可用作單體成分中前述(甲基)丙烯酸烷酯之殘餘部分。The monomer component other than the alkyl (meth)acrylate may be contained as a monofunctional monomer component. The comonomer can be used as a residue of the aforementioned alkyl (meth)acrylate in the monomer component.

舉例來說,共聚單體可含有環狀含氮單體。就上述環狀含氮單體而言,可無特別限制地使用具有聚合性官能基並具有環狀氮結構之物,且該聚合性官能基係(甲基)丙烯醯基或乙烯基等具不飽和雙鍵之官能基。環狀氮結構以在環狀結構內具有氮原子者為佳。環狀含氮單體可舉例如N-乙烯基吡咯啶酮、N-乙烯基-ε-己內醯胺、甲基乙烯基吡咯啶酮等內醯胺系乙烯基單體;乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌嗪、乙烯基吡嗪、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基嗎啉等具有含氮雜環之乙烯系單體等等。又可舉如啉環、哌啶環、吡咯啶環、哌環等含雜環之(甲基)丙烯酸系單體。具體上可舉如N-丙烯醯基啉、N-丙烯醯基哌啶、N-甲基丙烯醯基哌啶及N-丙烯醯基吡咯啶等。前述環狀含氮單體之中,以內醯胺系乙烯單體為佳。For example, the comonomer can contain a cyclic nitrogen-containing monomer. In the above-mentioned cyclic nitrogen-containing monomer, a polymerizable functional group having a cyclic nitrogen structure and having a cyclic nitrogen structure can be used without any particular limitation, and the polymerizable functional group is a (meth)acrylonitrile group or a vinyl group. A functional group of an unsaturated double bond. The cyclic nitrogen structure is preferably one having a nitrogen atom in the cyclic structure. Examples of the cyclic nitrogen-containing monomer include an intrinsic amine-based vinyl monomer such as N-vinylpyrrolidone, N-vinyl-ε-caprolactam, and methylvinylpyrrolidone; vinylpyridine; Vinylpiperidone, vinylpyrimidine, vinylpiperazine, vinylpyrazine, vinylpyrrole, vinylimidazole, vinylcarbazole, vinylmorpholine, etc., vinyl monomer having a nitrogen-containing heterocycle, etc. . Another example Chloride ring, piperidine ring, pyrrolidine ring, piperazine A heterocyclic ring-containing (meth)acrylic monomer. N-propylene fluorenyl Porphyrin, N-acrylopylpiperidine, N-methylpropenylpiperidine and N-propenylpyrrolidine. Among the above cyclic nitrogen-containing monomers, an internal guanamine-based ethylene monomer is preferred.

於本發明中,環狀含氮單體相對於可形成(甲基)丙烯酸系聚合物之單官能性單體成分總量以0.5~50重量%為佳,而0.5~40重量%較佳,0.5~30重量%更佳。In the present invention, the cyclic nitrogen-containing monomer is preferably 0.5 to 50% by weight based on the total amount of the monofunctional monomer component capable of forming the (meth)acrylic polymer, and preferably 0.5 to 40% by weight. 0.5 to 30% by weight is more preferable.

本發明所用之單體成分可含有含羥基單體來作為單官能性單體成分。含羥基單體可無特別限制地使用具有聚合性官能基並具有羥基之物,且該聚合性官能基係(甲基)丙烯醯基或乙烯基等具不飽和雙鍵之官能基。含羥基單體可舉例如(甲基)丙烯酸-2-羥乙酯、(甲基)丙烯酸-2-羥丙酯、(甲基)丙烯酸-2-羥丁酯、(甲基)丙烯酸-3-羥丙酯、(甲基)丙烯酸-4-羥丁酯、(甲基)丙烯酸-6-羥己酯、(甲基)丙烯酸-8-羥辛酯、(甲基)丙烯酸-10-羥癸酯、(甲基)丙烯酸-12-羥月桂酯等(甲基)丙烯酸羥烷酯、(甲基)丙烯酸(4-羥甲基環己基)甲酯等(甲基)丙烯酸羥烷基環烷酯。此外,還可舉如羥乙基(甲基)丙烯醯胺、烯丙醇、2-羥乙基乙烯基醚、4-羥丁基乙烯基醚及二乙二醇單乙烯基醚等。其等可單獨使用或組合使用。其等之中,以(甲基)丙烯酸羥烷酯尤為合宜。The monomer component used in the present invention may contain a hydroxyl group-containing monomer as a monofunctional monomer component. The hydroxyl group-containing monomer can be a compound having a polymerizable functional group and having a hydroxyl group, and the polymerizable functional group is a functional group having an unsaturated double bond such as a (meth)acryl fluorenyl group or a vinyl group. The hydroxyl group-containing monomer may, for example, be 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate or (meth)acrylic acid-3. -Hydroxypropyl ester, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxyl (meth)acrylate a hydroxyalkyl (meth) acrylate such as an oxime ester or a hydroxyalkyl (meth) acrylate such as 12-hydroxylauryl (meth)acrylate or a (meth)acrylic acid (4-hydroxymethylcyclohexyl)methyl ester. Alkyl ester. Further, examples thereof include hydroxyethyl (meth) acrylamide, allyl alcohol, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, and diethylene glycol monovinyl ether. They may be used singly or in combination. Among them, a hydroxyalkyl (meth) acrylate is particularly preferable.

於本發明中,從提高接著力及凝集力之觀點來看,前述含羥基單體相對於可形成(甲基)丙烯酸系聚合物之單官能性單體成分係以1重量%以上為佳,而2重量%以上較佳,3重量%以上更佳。另一方面,一旦前述含羥基單體過多,便會有黏著劑層變硬、接著力降低之情況,或是有黏著劑黏度過高、發生凝膠化之情況,因此,前述含羥基單體相對於可形成(甲基)丙烯酸系聚合物之單官能性單體成分總量係以30重量%以下為佳,27重量%以下較佳,25重量%以下更佳。In the present invention, from the viewpoint of improving the adhesion and the cohesive force, the hydroxyl group-containing monomer is preferably 1% by weight or more based on the monofunctional monomer component capable of forming the (meth)acrylic polymer. More preferably, it is 2% by weight or more, and more preferably 3% by weight or more. On the other hand, if the amount of the hydroxyl group-containing monomer is too large, there is a case where the adhesive layer is hardened, the adhesion force is lowered, or the viscosity of the adhesive is too high, and gelation occurs. Therefore, the aforementioned hydroxyl group-containing monomer The total amount of the monofunctional monomer component capable of forming the (meth)acrylic polymer is preferably 30% by weight or less, more preferably 27% by weight or less, and still more preferably 25% by weight or less.

此外,在可形成(甲基)丙烯酸系聚合物之單體成分中,可含有其他含官能基單體來作為單官能性單體,可舉例如含羧基單體及具有環狀醚基之單體。Further, among the monomer components capable of forming a (meth)acrylic polymer, other functional group-containing monomers may be contained as a monofunctional monomer, and examples thereof include a carboxyl group-containing monomer and a monomer having a cyclic ether group. body.

就含羧基單體而言,可無特別限制地使用具有聚合性官能基並具有羧基之物,且該聚合性官能基係(甲基)丙烯醯基或乙烯基等具不飽和雙鍵之官能基。含羧基單體可舉例如(甲基)丙烯酸、(甲基)丙烯酸羧乙酯、(甲基)丙烯酸羧戊酯、伊康酸、順丁烯二酸、反丁烯二酸、巴豆酸及異巴豆酸等,其等可單獨使用或組合使用。伊康酸、順丁烯二酸可使用其等之酸酐。其等之中以丙烯酸、甲基丙烯酸為佳,尤以丙烯酸為佳。另,本發明之用於製造(甲基)丙烯酸系聚合物之單體成分中,可任意使用含羧基單體,但另一方面,也可不使用含羧基單體。In the case of the carboxyl group-containing monomer, a polymerizable functional group having a carboxyl group, and the polymerizable functional group is a functional group having an unsaturated double bond such as a (meth) acryl fluorenyl group or a vinyl group, without any particular limitation. base. The carboxyl group-containing monomer may, for example, be (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid and Isocrotonic acid or the like, which may be used singly or in combination. Anaconic acid or maleic acid can be used as an acid anhydride. Among them, acrylic acid and methacrylic acid are preferred, and acrylic acid is preferred. Further, in the monomer component for producing a (meth)acrylic polymer of the present invention, a carboxyl group-containing monomer may be used arbitrarily, but on the other hand, a carboxyl group-containing monomer may not be used.

就具有環狀醚基之單體而言,可無特別限制地使用具有聚合性官能基並具有環氧基或氧呾基等環狀醚基之物,且該聚合性官能基係(甲基)丙烯醯基或乙烯基等具不飽和雙鍵之官能基。含環氧基單體可舉例如縮水甘油(甲基)丙烯酸酯、3, 4-環氧基環己基甲基(甲基)丙烯酸酯、4-羥丁基(甲基)丙烯酸酯縮水甘油醚等。含氧呾基單體可舉例如3-氧呾基甲基(甲基)丙烯酸酯、3-甲基-氧呾基甲基(甲基)丙烯酸酯、3-乙基-氧呾基甲基(甲基)丙烯酸酯、3-丁基-氧呾基甲基(甲基)丙烯酸酯、3-己基-氧呾基甲基(甲基)丙烯酸酯等。其等可單獨使用或組合使用。In the monomer having a cyclic ether group, a polymerizable functional group having a cyclic functional group such as an epoxy group or an oxo group can be used without particular limitation, and the polymerizable functional group (methyl group) a functional group having an unsaturated double bond such as an acrylonitrile group or a vinyl group. Examples of the epoxy group-containing monomer include glycidyl (meth) acrylate, 3, 4-epoxycyclohexylmethyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate glycidyl ether. Wait. The oxo group-containing monomer may, for example, be 3-oxomethylmethyl (meth) acrylate, 3-methyl-oxydecylmethyl (meth) acrylate, 3-ethyl-oxomethylmethyl (Meth) acrylate, 3-butyl-oxomethyl (meth) acrylate, 3-hexyl-oxomethyl (meth) acrylate, and the like. They may be used singly or in combination.

於本發明中,前述含羧基單體、具有環狀醚基之單體相對於可形成(甲基)丙烯酸系聚合物之單官能性單體成分總量係以30重量%以下為佳,而27重量%以下較佳,25重量%以下更佳。In the present invention, the carboxyl group-containing monomer and the monomer having a cyclic ether group are preferably 30% by weight or less based on the total amount of the monofunctional monomer component capable of forming the (meth)acrylic polymer. It is preferably 27% by weight or less, more preferably 25% by weight or less.

本發明之可形成(甲基)丙烯酸系聚合物之單體成分中,就共聚單體而言,可舉例如CH2 =C(R1 )COOR2 (前述R1 表示氫或甲基,R2 表示碳數1~3經取代之烷基及環狀之環烷基)所示之(甲基)丙烯酸烷酯。In the monomer component of the (meth)acrylic polymer of the present invention, the comonomer may, for example, be CH 2 =C(R 1 )COOR 2 (the above R 1 represents hydrogen or methyl, R 2 represents an alkyl (meth)acrylate represented by a carbon number of 1 to 3 substituted alkyl groups and a cyclic cycloalkyl group.

其中R2 ,即碳數1~3經取代之烷基,其取代基係宜為碳數3~8個之芳基或碳數3~8個之芳氧基。芳基雖未特別受限,但以苯基為宜。Wherein R 2 , that is, an alkyl group having 1 to 3 carbon atoms, the substituent is preferably an aryl group having 3 to 8 carbon atoms or an aryloxy group having 3 to 8 carbon atoms. Although the aryl group is not particularly limited, a phenyl group is preferred.

此種以CH2 =C(R1 )COOR2 表示之單體之例可舉如苯氧基乙基(甲基)丙烯酸酯、苄基(甲基)丙烯酸酯、環己基(甲基)丙烯酸酯、3,3,5-三甲基環己基(甲基)丙烯酸酯、異莰基(甲基)丙烯酸酯等。其等可單獨使用或組合使用。Examples of such a monomer represented by CH 2 =C(R 1 )COOR 2 may be phenoxyethyl (meth) acrylate, benzyl (meth) acrylate or cyclohexyl (meth) acrylate. Ester, 3,3,5-trimethylcyclohexyl (meth) acrylate, isodecyl (meth) acrylate, and the like. They may be used singly or in combination.

於本發明中,前述CH2 =C(R1 )COOR2 所示(甲基)丙烯酸酯相對於可形成(甲基)丙烯酸系聚合物之單官能性單體成分總量係可使用50重量%以下,並以45重量%以下為佳,40重量%以下較佳,35重量%以下更佳。In the present invention, the (meth) acrylate represented by the above CH 2 =C(R 1 )COOR 2 may be used in an amount of 50% by weight based on the total amount of the monofunctional monomer component capable of forming the (meth)acrylic polymer. % or less is preferably 45% by weight or less, more preferably 40% by weight or less, and still more preferably 35% by weight or less.

其他共聚單體亦可使用醋酸乙烯酯、丙酸乙烯酯、苯乙烯、α-甲基苯乙烯;聚乙二醇(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯、甲氧基乙二醇(甲基)丙烯酸酯、甲氧基聚丙二醇(甲基)丙烯酸酯等二醇系丙烯酸酯單體;(甲基)丙烯酸四氫呋喃甲酯、氟素(甲基)丙烯酸酯、聚矽氧(甲基)丙烯酸酯或2-甲氧基乙基丙烯酸酯等丙烯酸酯系單體;含醯胺基單體、含胺基單體、含醯亞胺基單體、N-丙烯醯基嗎福林、乙烯醚單體等。此外,共聚單體可使用萜(甲基)丙烯酸酯、二環戊烯基(甲基)丙烯酸酯等具有環狀結構之單體。Other comonomers may also use vinyl acetate, vinyl propionate, styrene, α-methyl styrene; polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, methoxy ethoxylate a diol-based acrylate monomer such as diol (meth) acrylate or methoxypolypropylene glycol (meth) acrylate; tetrahydrofuran methyl (meth) acrylate, fluoro (meth) acrylate, polyoxyl Acrylate-based monomer such as (meth) acrylate or 2-methoxyethyl acrylate; amide-containing monomer, amine-containing monomer, quinone-containing monomer, N-propylene fluorenyl group? Forin, vinyl ether monomer, etc. Further, as the comonomer, a monomer having a cyclic structure such as fluorenyl (meth) acrylate or dicyclopentenyl (meth) acrylate can be used.

進一步可舉如含矽原子之矽烷系單體等。作為矽烷系單體,可舉例如3-丙烯醯氧基丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、4-乙烯基丁基三甲氧基矽烷、4-乙烯基丁基三乙氧基矽烷、8-乙烯基辛基三甲氧基矽烷、8-乙烯基辛基三乙氧基矽烷、10-氧癸基三甲氧基矽烷、10-丙烯醯氧癸基三甲氧基矽烷、10-甲基丙烯醯基氧癸基三乙氧基矽烷、10-丙烯醯氧癸基三乙氧基矽烷等。Further, a decane-based monomer containing a halogen atom or the like can be given. Examples of the decane-based monomer include 3-propenyloxypropyltriethoxydecane, vinyltrimethoxydecane, vinyltriethoxydecane, 4-vinylbutyltrimethoxydecane, and 4 -vinylbutyltriethoxydecane, 8-vinyloctyltrimethoxydecane, 8-vinyloctyltriethoxydecane, 10-oxodecyltrimethoxydecane, 10-propenyloxime Trimethoxy decane, 10-methyl propylene fluorenyl methoxy decyl triethoxy decane, 10-propenyl fluorenyl decyl triethoxy decane, and the like.

本發明之可形成(甲基)丙烯酸系聚合物之單體成分中,除了前述例示之單官能性單體之外,為了調整黏著劑之凝集力,可視需要而含有多官能性單體。In the monomer component of the (meth)acrylic polymer which can be formed in the present invention, in addition to the monofunctional monomer exemplified above, a polyfunctional monomer may be contained as needed in order to adjust the cohesive force of the adhesive.

多官能性單體是具有至少2個聚合性官能基之單體且所述聚合性官能基係(甲基)丙烯醯基或乙烯基等具不飽和雙鍵之官能基,其可舉例如(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、新戊四醇二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、1,2-乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,12-十二碳二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷三(甲基)丙烯酸酯等多元醇與(甲基)丙烯酸的酯化合物;(甲基)丙烯酸烯丙酯、(甲基)丙烯酸乙烯酯、二乙烯苯、環氧基丙烯酸酯、聚酯丙烯酸酯、胺基甲酸酯丙烯酸酯、丁基二(甲基)丙烯酸酯、己基二(甲基)丙烯酸酯等。其等當中,尤以三羥甲基丙烷三(甲基)丙烯酸酯、己二醇二(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯適合使用。多官能性單體可單獨使用1種或組合2種以上使用。The polyfunctional monomer is a monomer having at least two polymerizable functional groups, and the polymerizable functional group is a functional group having an unsaturated double bond such as a (meth) acrylonitrile group or a vinyl group, and examples thereof include ( Poly)ethylene glycol di(meth)acrylate, (poly)propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate, new Pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,2-ethanediol di(meth)acrylate, 1,6-hexanediol di(methyl) Polyols such as acrylate, 1,12-dodecanediol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, tetramethylolmethanetri(meth)acrylate, and the like Ester compound of (meth)acrylic acid; allyl (meth)acrylate, vinyl (meth)acrylate, divinylbenzene, epoxy acrylate, polyester acrylate, urethane acrylate, butyl Di(meth)acrylate, hexyl di(meth)acrylate, and the like. Among them, trimethylolpropane tri(meth)acrylate, hexanediol di(meth)acrylate, and dipentaerythritol hexa(meth)acrylate are particularly preferably used. The polyfunctional monomer may be used alone or in combination of two or more.

多官能性單體之使用量雖依其分子量及官能基數等而異,但相對於單官能性單體合計100重量份以使用3重量份以下為佳,而2重量份以下較佳,1重量份以下更佳。又,下限值雖未特別受限,但宜為0重量份以上,更宜為0.001重量份以上。藉由使多官能性單體之使用量在前述範圍內,可提高接著力。The amount of the polyfunctional monomer to be used varies depending on the molecular weight and the number of functional groups, and is preferably 3 parts by weight or less based on 100 parts by weight of the monofunctional monomer, and preferably 2 parts by weight or less, and 1 part by weight. The following is better. Further, the lower limit is not particularly limited, but is preferably 0 parts by weight or more, more preferably 0.001 parts by weight or more. By using the amount of the polyfunctional monomer within the above range, the adhesion can be improved.

前述(甲基)丙烯酸系聚合物之製造可適當選擇溶液聚合、紫外線(UV)聚合等放射線聚合、塊狀聚合、乳化聚合等各種自由基聚合等習知製造方法。又,所得(甲基)丙烯酸系聚合物可為無規共聚物、嵌段共聚物、接枝共聚物等任一者。In the production of the (meth)acrylic polymer, a conventional production method such as various types of radical polymerization such as solution polymerization or ultraviolet (UV) polymerization, such as radiation polymerization, bulk polymerization, or emulsion polymerization, can be appropriately selected. Further, the obtained (meth)acrylic polymer may be any of a random copolymer, a block copolymer, and a graft copolymer.

此外,於本發明中,亦可適合使用前述單體成分的部分聚合物。Further, in the present invention, a partial polymer of the above monomer component may also be suitably used.

在以自由基聚合來製造前述(甲基)丙烯酸系聚合物時,可在前述單體成分中適當添加自由基聚合所用之聚合引發劑、鏈轉移劑、乳化劑等進行聚合。前述自由基聚合所用之聚合引發劑、鏈轉移劑、乳化劑等可無特別限制地適當選擇使用。另,(甲基)丙烯酸系聚合物之重量平均分子量可藉由聚合引發劑、鏈轉移劑之使用量及反應條件來控制,並可因應其等之種類來適當地調整其使用量。When the (meth)acrylic polymer is produced by radical polymerization, a polymerization initiator, a chain transfer agent, an emulsifier, or the like for radical polymerization may be appropriately added to the monomer component to carry out polymerization. The polymerization initiator, the chain transfer agent, the emulsifier, and the like used in the radical polymerization can be appropriately selected and used without particular limitation. Further, the weight average molecular weight of the (meth)acrylic polymer can be controlled by the amount of the polymerization initiator, the chain transfer agent used, and the reaction conditions, and the amount thereof can be appropriately adjusted depending on the type thereof.

舉例來說,在溶液聚合等中,聚合溶劑可使用諸如醋酸乙酯、甲苯等。就具體之溶液聚合例而言,反應是在氮等惰性氣體之氣流下添加聚合引發劑,並且一般是在50~70℃左右、5~30小時左右之反應條件下進行。For example, in solution polymerization or the like, a polymerization solvent such as ethyl acetate, toluene or the like can be used. In the specific solution polymerization example, the reaction is carried out by adding a polymerization initiator under a gas stream of an inert gas such as nitrogen, and is usually carried out under the reaction conditions of about 50 to 70 ° C for about 5 to 30 hours.

可用於溶液聚合等之熱聚合引發劑可舉例如:2, 2’-偶氮二異丁腈、2, 2’-偶氮二-2-甲基丁腈、2, 2’-偶氮二(2-甲基丙酸)二甲酯、4, 4’-偶氮二-4-氰基吉草酸、偶氮二異戊腈、2, 2’-偶氮二(2-甲脒基丙烷)二氫氯化物、2, 2’-偶氮二[2-(5-甲基-2-咪唑啉-2-基)丙烷]二氫氯化物、2, 2’-偶氮二(2-甲基丙脒)二硫酸鹽、2, 2’-偶氮二(N, N’-二亞甲基異丁基脒)、2, 2’-偶氮二[N-(2-羧乙基)-2-甲基丙脒]水合物(和光純藥公司製,VA-057)等之偶氮系引發劑;過硫酸鉀、過硫酸銨等之過硫酸鹽、二(2-乙基己基)過氧二碳酸酯、二(4-第三丁基環己基)過氧二碳酸酯、二第二丁基過氧二碳酸酯、第三丁基過氧新癸酸酯、第三己基過氧三甲基乙酸酯、第三丁基過氧三甲基乙酸酯、過氧化二月桂醯基、過氧化二正辛醯基、1, 1, 3, 3-四甲基丁基過氧基-2-乙基己酸酯、過氧化二(4-甲基苯甲醯基)、過氧化二苯甲醯基、第三丁基過氧基異丁酸酯、1, 1-二(第三己基過氧基)環己烷、第三丁基氫過氧化物、過氧化氫等之過氧化物系引發劑;過硫酸鹽與亞硫酸氫鈉的組合、過氧化物與抗壞血酸鈉的組合等將過氧化物與還原劑組合而得之氧化還原系引發劑等;但不受限於此。The thermal polymerization initiator which can be used for solution polymerization or the like can be, for example, 2,2'-azobisisobutyronitrile, 2,2'-azobis-2-methylbutyronitrile, 2,2'-azodi (2-methylpropionic acid) dimethyl ester, 4, 4'-azobis-4-cyanojimic acid, azobisisovaleronitrile, 2,2'-azobis(2-carboxamidopropane Dihydrochloride, 2, 2'-azobis[2-(5-methyl-2-imidazolin-2-yl)propane]dihydrochloride, 2, 2'-azobis(2- Methyl propyl hydrazine) disulfate, 2, 2'-azobis(N, N'-dimethylene isobutyl hydrazine), 2, 2'-azobis[N-(2-carboxyethyl) An azo initiator such as -2-methylpropionamidine hydrate (manufactured by Wako Pure Chemical Industries, Ltd., VA-057); persulfate such as potassium persulfate or ammonium persulfate, and di(2-ethylhexyl) Peroxydicarbonate, bis(4-t-butylcyclohexyl)peroxydicarbonate, di-tert-butylperoxydicarbonate, tert-butylperoxy neodecanoate, third hexyl Oxytrimethyl acetate, tert-butylperoxytrimethyl acetate, dilauroyl peroxide, di-n-octyl peroxy, 1,1,3,3-tetramethylbutylperoxy 2-ethylhexanoate, bis(4-methylbenzhydrazide) ), benzoyl peroxide, t-butylperoxy isobutyrate, 1,1-di(t-hexylperoxy)cyclohexane, tert-butyl hydroperoxide, peroxidation a peroxide-based initiator such as hydrogen; a combination of a persulfate and sodium hydrogen sulfite; a combination of a peroxide and sodium ascorbate; a redox initiator obtained by combining a peroxide with a reducing agent; Limited by this.

前述聚合引發劑可單獨使用亦可混合2種以上來使用,惟相對於100重量份之單體成分總量,以1重量份左右以下為佳,0.005~1重量份左右較佳,0.02~0.5重量份左右更佳。The polymerization initiator may be used alone or in combination of two or more. It is preferably about 1 part by weight or less, more preferably about 0.005 to 1 part by weight, and preferably 0.02 to 0.5, based on 100 parts by weight of the total amount of the monomer components. The weight is preferably around.

此外,在使用2,2’-偶氮二異丁腈作為聚合引發劑時,相對於100重量份之單體成分總量,聚合引發劑之使用量宜為0.2重量份以下左右,更宜作成0.06~0.2重量份左右。Further, when 2,2'-azobisisobutyronitrile is used as the polymerization initiator, the polymerization initiator is preferably used in an amount of about 0.2 part by weight or less based on 100 parts by weight of the total amount of the monomer components, and is more preferably produced. 0.06~0.2 parts by weight.

作為鏈轉移劑,可舉例如月桂硫醇、環氧丙硫醇、巰醋酸、2-巰乙醇、硫代二醇酸、硫代乙醇酸-2-乙基己酯、2,3-二巰-1-丙醇等。鏈轉移劑可單獨使用亦可混合2種以上使用,但其全體含量相對於100重量份之單體成分總量為0.3重量份左右以下。As the chain transfer agent, for example, lauryl mercaptan, propylene oxide thiol, hydrazine acetic acid, 2-hydrazine ethanol, thioglycolic acid, thioglycolic acid 2-ethylhexyl ester, 2,3-difluorene may be mentioned. -1-propanol and the like. The chain transfer agent may be used singly or in combination of two or more kinds, and the total content thereof is about 0.3 parts by weight or less based on 100 parts by weight of the total amount of the monomer components.

又,作為用於乳化聚合時的乳化劑,可舉例如月桂基硫酸鈉、月桂基硫酸銨、十二基苯磺酸鈉、聚氧乙烯烷基醚硫酸銨、聚氧乙烯烷基苯基醚硫酸鈉等之陰離子系乳化劑、聚氧乙烯烷基醚、聚氧乙烯烷基苯基醚、聚氧乙烯脂肪酸酯、聚氧乙烯-聚氧丙烯嵌段聚合物等之非離子系乳化劑等。該等乳化劑可單獨使用亦可併用2種以上。Further, examples of the emulsifier used in the emulsion polymerization include sodium lauryl sulfate, ammonium lauryl sulfate, sodium dodecylbenzenesulfonate, ammonium polyoxyethylene alkyl ether sulfate, and polyoxyethylene alkylphenyl ether. Nonionic emulsifier such as an anionic emulsifier such as sodium sulfate, a polyoxyethylene alkyl ether, a polyoxyethylene alkylphenyl ether, a polyoxyethylene fatty acid ester, or a polyoxyethylene-polyoxypropylene block polymer Wait. These emulsifiers may be used alone or in combination of two or more.

進一步就反應性乳化劑而言,導入有丙烯基、烯丙基醚基等自由基聚合性官能基之乳化劑可具體舉例如Aqualon HS-10、HS-20、KH-10、BC-05、BC-10、BC-20(以上皆為第一工業製藥(股)製)、Adeka Reasoap SE10N(ADEKA公司製)等。乳化劑之使用量相對於100重量份之單體成分總量宜為5重量份以下。Further, as the reactive emulsifier, an emulsifier to which a radical polymerizable functional group such as a propenyl group or an allyl ether group is introduced may, for example, be Aqualon HS-10, HS-20, KH-10, BC-05, or the like. BC-10, BC-20 (all of which are manufactured by First Industrial Pharmaceutical Co., Ltd.), Adeka Reasoap SE10N (made by Adeka Co., Ltd.), and the like. The amount of the emulsifier used is preferably 5 parts by weight or less based on 100 parts by weight of the total amount of the monomer components.

此外,在以放射線聚合來製造前述(甲基)丙烯酸系聚合物時,可藉由照射電子線、紫外線(UV)等放射線使前述單體成分聚合進而製得該聚合物。其等之中又以紫外線聚合為佳。以下,就作為放射線聚合中理想態樣的紫外線聚合予以說明。Further, when the (meth)acrylic polymer is produced by radiation polymerization, the polymer can be obtained by polymerizing the monomer component by irradiation with an electron beam or ultraviolet rays (UV). Among them, ultraviolet polymerization is preferred. Hereinafter, ultraviolet polymerization which is an ideal aspect in radiation polymerization will be described.

由於有可縮短聚合時間的優點等,故在進行紫外線聚合時宜於單體成分中含有光聚合引發劑。Since there is an advantage that the polymerization time can be shortened, it is preferable to contain a photopolymerization initiator in the monomer component at the time of ultraviolet polymerization.

前述光聚合引發劑可舉如在波長低於400nm處具有吸收帶的光聚合引發劑(B)。又,光聚合引發劑(B)宜於波長400nm以上無吸收帶。該光聚合引發劑(B),只是要可藉由紫外線來產生自由基而引發光聚合並在波長低於400nm處具吸收帶者即可,並無特別限制,一般所使用的光聚合引發劑均可適用。舉例來說,可使用安息香醚系光聚合引發劑、苯乙酮系光聚合引發劑、α-酮醇系光聚合引發劑、光活性肟系光聚合引發劑、安息香系光聚合引發劑、二苯乙二酮系光聚合引發劑、二苯甲酮系光聚合引發劑、縮酮系光聚合引發劑、9-氧硫 系光聚合引發劑及醯基膦氧化物系光聚合引發劑等。The photopolymerization initiator may, for example, be a photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm. Further, the photopolymerization initiator (B) is preferably one having no absorption band at a wavelength of 400 nm or more. The photopolymerization initiator (B) is only required to generate a radical by ultraviolet rays to cause photopolymerization and has an absorption band at a wavelength of less than 400 nm, and is not particularly limited, and a photopolymerization initiator generally used is used. Can be applied. For example, a benzoin ether photopolymerization initiator, an acetophenone photopolymerization initiator, an α-keto alcohol photopolymerization initiator, a photoactive oxime photopolymerization initiator, a benzoin photopolymerization initiator, and the like can be used. Phenylethylenedione photopolymerization initiator, benzophenone photopolymerization initiator, ketal photopolymerization initiator, 9-oxosulfur A photopolymerization initiator, a mercaptophosphine oxide photopolymerization initiator, etc.

具體而言,安息香醚系光聚合引發劑可舉例如安息香甲醚、安息香乙醚、安息香丙醚、安息香異丙醚、安息香異丁醚、2,2-二甲氧基-1,2-二苯基乙-1-酮及大茴香醚甲醚等。Specifically, the benzoin ether photopolymerization initiator may, for example, be benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 2,2-dimethoxy-1,2-diphenyl. Ethyl ethyl ketone and anisole methyl ether.

苯乙酮系光聚合引發劑可舉例如2,2-二乙氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、1-羥基環己基苯基酮、4-苯氧基二氯苯乙酮、4-t-丁基二氯苯乙酮等。The acetophenone-based photopolymerization initiator may, for example, be 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone or 1-hydroxycyclohexyl phenyl ketone, 4 - phenoxydichloroacetophenone, 4-t-butyldichloroacetophenone, and the like.

α-酮醇系光聚合引發劑可舉例如2-甲基-2-羥基丙醯苯、1-[4-(2-羥乙基)-苯基]-2-羥基-2-甲基丙-1-酮等。The α-keto alcohol-based photopolymerization initiator may, for example, be 2-methyl-2-hydroxypropionylbenzene or 1-[4-(2-hydroxyethyl)-phenyl]-2-hydroxy-2-methylpropane. -1-ketone and the like.

光活性肟系光聚合引發劑可舉例如1-苯基-1,2-丙二酮-2-(鄰乙氧羰基)-肟等。The photoactive oxime-based photopolymerization initiator may, for example, be 1-phenyl-1,2-propanedione-2-(o-ethoxycarbonyl)-ruthenium or the like.

安息香系光聚合引發劑可舉例如安息香等。The benzoin-based photopolymerization initiator may, for example, be benzoin or the like.

二苯乙二酮系光聚合引發劑包含例如二苯乙二酮等。The diphenylethylenedione-based photopolymerization initiator contains, for example, diphenylethylenedione or the like.

二苯甲酮系光聚合引發劑包含諸如二苯甲酮、苯甲醯基安息香酸、3, 3´-二甲基-4-甲氧基二苯甲酮、聚乙烯基二苯甲酮、α-羥基環己基苯基酮等。The benzophenone-based photopolymerization initiator contains, for example, benzophenone, benzamidine benzoic acid, 3,3 ́-dimethyl-4-methoxybenzophenone, polyvinyl benzophenone, --hydroxycyclohexyl phenyl ketone and the like.

縮酮系光聚合引發劑包含苄基二甲基縮酮等。The ketal-based photopolymerization initiator contains benzyldimethylketal or the like.

9-氧硫 系光聚合引發劑包含諸如9-氧硫 、2-氯-9-氧硫 、2-甲基-9-氧硫 、2,4-二甲基-9-氧硫 、異丙基-9-氧硫 、2,4-二氯-9-氧硫 、2,4-二乙基-9-氧硫 、2,4-二異丙基-9-氧硫 、十二基-9-氧硫 等。9-oxygen sulfur a photopolymerization initiator containing, for example, 9-oxosulfur 2-chloro-9-oxosulfur 2-methyl-9-oxosulfur 2,4-dimethyl-9-oxosulfur Isopropyl-9-oxosulfur 2,4-dichloro-9-oxosulfur 2,4-diethyl-9-oxosulfur 2,4-diisopropyl-9-oxosulfur Twelve base-9-oxosulfur Wait.

醯基膦氧化物系光聚合引發劑包含諸如2,4,6-三甲基苯甲醯基-二苯基-膦氧化物、雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物等。The mercaptophosphine oxide photopolymerization initiator contains, for example, 2,4,6-trimethylbenzimidyl-diphenyl-phosphine oxide, bis(2,4,6-trimethylbenzylidene) - phenylphosphine oxide or the like.

前述在波長低於400nm處具吸收帶之光聚合引發劑(B)可單獨使用或組合2種以上使用。前述在波長低於400nm處具吸收帶之光聚合引發劑(B)可在不損及本發明效果的範圍下添加,惟其添加量以相對於100重量份之可形成(甲基)丙烯酸系聚合物之單官能性單體成分計,係0.005~0.5重量份左右為佳,0.02~0.1重量份左右較佳。The photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm may be used singly or in combination of two or more. The photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm can be added in a range that does not impair the effects of the present invention, except that it is added in an amount of 100 parts by weight to form a (meth)acrylic polymerization. The monofunctional monomer component is preferably from 0.005 to 0.5 parts by weight, preferably from 0.02 to 0.1 parts by weight.

又,在令前述黏著劑層中含有色素化合物(進一步為紫外線吸收劑)的情形時,舉例來說,於進行紫外線聚合時,宜藉由使包含「含前述(甲基)丙烯酸烷酯之單體成分及/或前述單體成分之部分聚合物、色素化合物(進一步為紫外線吸收劑)及光聚合引發劑」的紫外線硬化型丙烯酸系黏著劑組成物進行紫外線聚合而形成。由前述紫外線硬化型丙烯酸系黏著劑組成物進行紫外線聚合而形成的黏著劑層,就算是150μm以上的厚物亦能形成,因其可形成廣域厚度範圍的黏著劑層故為佳。Further, in the case where the coloring matter compound (further, an ultraviolet absorber) is contained in the pressure-sensitive adhesive layer, for example, when ultraviolet polymerization is carried out, it is preferable to include "the above-mentioned (meth)acrylic acid alkyl ester. The ultraviolet ray-curable acrylic pressure-sensitive adhesive composition of the body component and/or the partial polymer of the monomer component, the dye compound (further an ultraviolet absorber), and the photopolymerization initiator is formed by ultraviolet polymerization. The adhesive layer formed by ultraviolet polymerization of the ultraviolet curable acrylic pressure-sensitive adhesive composition can be formed even in a thickness of 150 μm or more, and it is preferable because it can form an adhesive layer in a wide range of thickness.

此時光聚合引發劑宜含有在波長400nm以上有吸收帶的光聚合引發劑(A)。在黏著劑組成物含有色素化合物(進一步為紫外線吸收劑)時,一旦進行紫外線聚合,紫外線就會被前述色素化合物(進一步為紫外線吸收劑)所吸收而會有未能充分聚合的情形。不過,若是在波長400nm以上具吸收帶的光聚合引發劑(A),則就算含有色素化合物(進一步為紫外線吸收劑)也能夠充分進行聚合,故為佳。In this case, the photopolymerization initiator preferably contains a photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more. When the adhesive composition contains a dye compound (further an ultraviolet absorber), when ultraviolet polymerization is carried out, ultraviolet rays are absorbed by the dye compound (further an ultraviolet absorber) and may not be sufficiently polymerized. However, in the case of the photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more, it is preferable that the dye compound (further an ultraviolet absorber) can be sufficiently polymerized.

在波長400nm以上具有吸收帶的光聚合引發劑(A)可舉如雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物(Irgacure819,BASF製),2,4,6-三甲基苯甲醯基-二苯基-膦氧化物(LUCIRIN TPO,BASF製)等。The photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more is bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide (Irgacure 819, manufactured by BASF), 2, 4 6-trimethylbenzimidyl-diphenyl-phosphine oxide (LUCIRIN TPO, manufactured by BASF).

前述在波長400nm以上具吸收帶的光聚合引發劑(A)可單獨使用1種,亦可將2種以上混合使用。The photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more may be used singly or in combination of two or more kinds.

又,前述在波長400nm以上具吸收帶之光聚合引發劑(A)的添加量雖無特別受限,惟宜低於色素化合物(進一步為紫外線吸收劑)的添加量,而相對於100重量份之可形成(甲基)丙烯酸系聚合物之單官能性單體成分,以0.005~1重量份左右為佳,0.02~0.8重量份左右較佳。藉由讓光聚合引發劑(A)的添加量為前述範圍,可令紫外線聚合充分進行故為佳。In addition, the amount of the photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more is not particularly limited, and is preferably lower than the amount of the dye compound (further an ultraviolet absorber), and is relative to 100 parts by weight. The monofunctional monomer component of the (meth)acrylic polymer can be formed in an amount of about 0.005 to 1 part by weight, preferably about 0.02 to 0.8 part by weight. By allowing the amount of the photopolymerization initiator (A) to be added in the above range, it is preferred that the ultraviolet polymerization is sufficiently carried out.

又,在使前述黏著劑層中含有色素化合物(進一步為紫外線吸收劑)的情況下,在進行紫外線聚合時宜於前述單體成分中先行添加在波長低於400nm處具吸收帶之光聚合引發劑(B),在經照射紫外線而有一部份聚合的單體成分部分聚合物(預聚物組成物)中,添加前述在波長400nm以上具吸收帶之光聚合引發劑(A)、色素化合物(進一步為紫外線吸收劑),進行紫外線聚合。當前述在波長400nm以上具吸收帶之光聚合引發劑(A)添加到經紫外線照射而有一部份聚合的單體成分之部分聚合物(預聚物組成物)中時,宜將前述光聚合引發劑溶解於單體後添加。Further, when the coloring agent compound (further an ultraviolet absorber) is contained in the pressure-sensitive adhesive layer, it is preferred to add a photopolymerization initiator having an absorption band at a wavelength of less than 400 nm before the ultraviolet polymerization in the ultraviolet polymerization. (B) The photopolymerization initiator (A) having a absorption band at a wavelength of 400 nm or more and a dye compound are added to a partially polymerized monomer component (prepolymer composition) which is partially polymerized by irradiation with ultraviolet rays. Further, the ultraviolet absorber is subjected to ultraviolet polymerization. When the photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more is added to a part of the polymer (prepolymer composition) of a partially polymerized monomer component irradiated with ultraviolet rays, the photopolymerization is preferably carried out. The initiator is added after being dissolved in the monomer.

前述丙烯酸系聚合物之外,宜以橡膠系聚合物作為基底聚合物。橡膠系聚合物可包括:經由聚合1種共軛二烯烴化合物而得的共軛二烯烴系聚合物、經由聚合2種以上之共軛二烯烴化合物而得的共軛二烯烴系共聚物、經由使共軛二烯烴化合物與芳香族乙烯化合物共聚而得的共軛二烯烴系共聚物。又,其等之氫化物亦可適宜使用。二烯烴系共聚物可為無規共聚物亦可為嵌段共聚物,又亦可使共軛二烯烴化合物、芳香族乙烯化合物以外之化合物共聚合。In addition to the aforementioned acrylic polymer, a rubber-based polymer is preferably used as the base polymer. The rubber-based polymer may include a conjugated diene-based polymer obtained by polymerizing one conjugated diene compound, and a conjugated diene-based copolymer obtained by polymerizing two or more kinds of conjugated diene compounds. A conjugated diene-based copolymer obtained by copolymerizing a conjugated diene compound and an aromatic vinyl compound. Further, a hydride such as the above may be suitably used. The diene-based copolymer may be a random copolymer or a block copolymer, or may be a copolymer of a compound other than the conjugated diene compound or the aromatic vinyl compound.

如此之共軛二烯烴系(共)聚合物,具體上可舉如丁二烯橡膠(BR)、異戊二烯橡膠(IR)、苯乙烯-丁二烯共聚物(SBR)、丁二烯-異戊二烯-苯乙烯無規共聚物、異戊二烯-苯乙烯無規共聚物、苯乙烯-異戊二烯嵌段共聚物(SIS)、丁二烯-苯乙烯共聚物、苯乙烯-乙烯-丁二烯嵌段共聚物(SEBS)、丙烯腈-丁二烯橡膠(NBR)等,其等可單獨使用1種或混合2種以上使用。其等之中又以異戊二烯-苯乙烯共聚物為佳。又,其等之氫化物亦可適宜使用。Such a conjugated diene-based (co)polymer may specifically be, for example, butadiene rubber (BR), isoprene rubber (IR), styrene-butadiene copolymer (SBR), butadiene. -isoprene-styrene random copolymer, isoprene-styrene random copolymer, styrene-isoprene block copolymer (SIS), butadiene-styrene copolymer, benzene Ethylene-ethylene-butadiene block copolymer (SEBS), acrylonitrile-butadiene rubber (NBR), etc. may be used alone or in combination of two or more. Among them, an isoprene-styrene copolymer is preferred. Further, a hydride such as the above may be suitably used.

(矽烷偶合劑) 再者,本發明之黏著劑組成物中可含有矽烷偶合劑。矽烷偶合劑之摻混量相對於100重量份之基底聚合物(例如上述(甲基)丙烯酸系聚合物)係以1重量份以下為佳、0.01~1重量份較佳、0.02~0.6重量份更佳。(Chane coupling agent) Further, the adhesive composition of the present invention may contain a decane coupling agent. The blending amount of the decane coupling agent is preferably 1 part by weight or less, preferably 0.01 to 1 part by weight, more preferably 0.02 to 0.6 part by weight per 100 parts by weight of the base polymer (for example, the above (meth)acrylic polymer). Better.

前述矽烷偶合劑可舉例如:3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷等含環氧基之矽烷偶合劑;3-胺丙基三甲氧基矽烷、N-2-(胺乙基)-3-胺丙基甲基二甲氧基矽烷、3-三乙氧基矽烷-N-(1,3-二甲基亞丁基)丙基胺、N-苯基-γ-胺丙基三甲氧基矽烷等含胺基之矽烷偶合劑;3-丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧丙基三乙氧基矽烷等含(甲基)丙烯基之矽烷偶合劑;3-異氰酸酯丙基三乙氧基矽烷等含異氰酸酯基之矽烷偶合劑等。The aforementioned decane coupling agent may, for example, be 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropylmethyldiethyl An epoxy group-containing decane coupling agent such as oxydecane or 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane; 3-aminopropyltrimethoxydecane, N-2-(aminoethyl) 3-aminopropylmethyldimethoxydecane, 3-triethoxydecane-N-(1,3-dimethylbutylidene)propylamine, N-phenyl-γ-aminopropyl Amino group-containing decane coupling agent such as trimethoxy decane; (meth) propylene-based decane such as 3-propenyloxypropyltrimethoxydecane or 3-methylpropenyloxypropyltriethoxydecane a coupling agent; an isocyanate group-containing decane coupling agent such as 3-isocyanate propyl triethoxy decane.

(交聯劑) 本發明之黏著劑組成物可含有交聯劑。交聯劑包含異氰酸酯系交聯劑、環氧系交聯劑、聚矽氧系交聯劑、唑啉系交聯劑、吖環丙烷系交聯劑、矽烷系交聯劑、烷基醚化三聚氰胺系交聯劑、金屬螯合物系交聯劑、過氧化物等交聯劑。交聯劑可為單獨1種或組合2種以上。其等之中以異氰酸酯系交聯劑適宜使用。(Crosslinking Agent) The adhesive composition of the present invention may contain a crosslinking agent. The crosslinking agent includes an isocyanate crosslinking agent, an epoxy crosslinking agent, and a polyfluorene crosslinking agent. A crosslinking agent such as an oxazoline crosslinking agent, an anthracycline crosslinking agent, a decane crosslinking agent, an alkyl etherified melamine crosslinking agent, a metal chelate crosslinking agent, or a peroxide. The crosslinking agent may be used alone or in combination of two or more. Among them, an isocyanate crosslinking agent is suitably used.

上述交聯劑可單獨使用1種亦可混合2種以上使用,惟其整體含量相對於100重量份之可形成(甲基)丙烯酸系聚合物之單官能性單體成分係以5重量份以下為佳,而0.01~5重量份較佳,0.01~4重量份更佳,0.02~3重量份尤佳。The above-mentioned crosslinking agent may be used singly or in combination of two or more kinds, and the total content thereof is 5 parts by weight or less based on 100 parts by weight of the monofunctional monomer component capable of forming a (meth)acrylic polymer. Preferably, 0.01 to 5 parts by weight is more preferably 0.01 to 4 parts by weight, more preferably 0.02 to 3 parts by weight.

異氰酸酯系交聯劑係指在1分子中具有2個以上異氰酸酯基(包含已將異氰酸酯基以封端劑或低聚化予以暫時保護之異氰酸酯再生型官能基)之化合物。異氰酸酯系交聯劑可舉如:甲伸苯基二異氰酸酯、二甲苯二異氰酸酯等芳香族異氰酸酯;異佛爾酮二異氰酸酯等脂環族異氰酸酯;以及六亞甲基二異氰酸酯等脂肪族異氰酸酯等等。The isocyanate-based crosslinking agent is a compound having two or more isocyanate groups in one molecule (including an isocyanate-regenerating functional group in which an isocyanate group is temporarily protected by a blocking agent or oligomerization). Examples of the isocyanate crosslinking agent include aromatic isocyanates such as methylphenyl diisocyanate and xylene diisocyanate; alicyclic isocyanates such as isophorone diisocyanate; and aliphatic isocyanates such as hexamethylene diisocyanate. .

可更具體舉例如:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;環伸戊基二異氰酸酯、環伸己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲伸苯基二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、伸茬基二異氰酸酯、聚亞甲基聚苯基異氰酸酯等芳香族二異氰酸酯類;三羥甲基丙烷/甲伸苯基二異氰酸酯3聚體加成物(日本聚胺基甲酸酯工業製, 商品名Coronate L)、三羥甲基丙烷/六亞甲基二異氰酸酯3聚體加成物(日本聚胺基甲酸酯工業製, 商品名Coronate HL)、六亞甲基二異氰酸酯之三聚異氰酸酯體(日本聚胺基甲酸酯工業製, 商品名Coronate HX)等之異氰酸酯加成物;伸二甲苯基二異氰酸酯之三羥甲基丙烷加成物(商品名:D110N, 三井化學(股)製),六亞甲基異氰酸酯的三羥甲基丙烷加成物(商品名:D160N, 三井化學(股)製);聚醚聚異氰酸酯、聚酯聚異氰酸酯、及其等與各種多元醇的加成物,利用三聚異氰酸酯鍵結、縮二脲鍵結、脲甲酸酯(allophanate)鍵結等而多官能化之聚異氰酸酯等等。More specifically, for example, lower aliphatic polyisocyanates such as butyl diisocyanate and hexamethylene diisocyanate; alicyclic isocyanates such as cyclopentyl diisocyanate, cyclohexyl diisocyanate, and isophorone diisocyanate; Classes; aromatic diisocyanates such as 2,4-methylphenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, decyl diisocyanate, polymethylene polyphenyl isocyanate; trimethylol Propane/methylphenylene diisocyanate 3-mer adduct (manufactured by Nippon Polyurethane Co., Ltd., trade name Coronate L), trimethylolpropane/hexamethylene diisocyanate 3-mer adduct ( Isocyanate adducts such as the Japanese polyurethane industrial product, trade name Coronate HL), hexamethylene diisocyanate trimeric isocyanate (manufactured by Japan Polyurethane Co., Ltd., trade name Coronate HX); Trimethylolpropane adduct of xylylene diisocyanate (trade name: D110N, manufactured by Mitsui Chemicals Co., Ltd.), trimethylolpropane adduct of hexamethylene isocyanate (trade name: D160N, Mitsui Chemicals) (share) system; polyether polyisocyanate An ester, a polyester polyisocyanate, and an adduct thereof with various polyols, a polyisocyanate which is polyfunctionalized by a trimeric isocyanate bond, a biuret bond, an allophanate bond, or the like. Wait.

(其他添加劑) 本發明之黏著劑組成物,除了前述成分外,可因應用途而含有適宜之添加劑。可舉例如黏著賦予劑(例如由松脂衍生物樹脂、聚萜烯樹脂、石油樹脂、油溶性苯酚樹脂等構成之常溫下為固體、半固體或液態之物);中空玻璃珠等填充劑;可塑劑;抗老化劑;抗氧化劑;光安定劑(HALS)等。(Other Additives) The adhesive composition of the present invention may contain a suitable additive depending on the intended use, in addition to the above components. For example, an adhesion-imparting agent (for example, a solid, semi-solid or liquid substance at normal temperature composed of a rosin derivative resin, a polydecene resin, a petroleum resin, an oil-soluble phenol resin, etc.); a filler such as a hollow glass bead; Agent; anti-aging agent; antioxidant; light stabilizer (HALS).

於本發明中,前述黏著劑組成物宜調整成適於在基材上進行塗佈等作業的黏度。黏著劑組成物之黏度的調整,可藉由例如添加增黏性添加劑等各種聚合物或多官能性單體等來進行,或是藉由使黏著劑組成物中的單體成分部分聚合來進行。此外,所述部分聚合可在添加增黏性添加劑等各種聚合物或多官能性單體等之前進行,亦可在添加後進行。上述黏著劑組成物之黏度會因添加劑量等而變化,因而在使黏著劑組成物中之單體成分進行部分聚合時的聚合率無法一概而定,但大體來說20%以下左右為佳,3~20%左右較佳,5~15%左右更佳。若超過20%,黏度就會過高,故會變得難以塗佈於基材上。In the present invention, the adhesive composition is preferably adjusted to have a viscosity suitable for application to a substrate or the like. The viscosity of the adhesive composition can be adjusted by, for example, adding various polymers such as a tackifier additive or a polyfunctional monomer, or by partially polymerizing the monomer component in the adhesive composition. . Further, the partial polymerization may be carried out before adding various polymers such as a tackifier or a polyfunctional monomer, or may be carried out after the addition. The viscosity of the above-mentioned adhesive composition varies depending on the amount of the additive, etc., so that the polymerization rate when the monomer component in the adhesive composition is partially polymerized cannot be determined uniformly, but it is preferably about 20% or less. 3~20% is better, and 5~15% is better. If it exceeds 20%, the viscosity is too high, so it becomes difficult to apply it to a substrate.

(黏著劑層之形成方法) 黏著劑層之形成方法並無特別限定,可利用通常本發明領域會使用的方法來形成。具體而言,可將前述黏著劑組成物塗覆於基材之至少單面上,並將該黏著劑組成物所形成之塗佈膜乾燥而成、或照射紫外線等活性能量線而成。又,亦可將已形成於前述基材上的黏著劑層轉到至偏光薄膜等。(Method of Forming Adhesive Layer) The method of forming the adhesive layer is not particularly limited, and can be formed by a method generally used in the field of the present invention. Specifically, the adhesive composition may be applied to at least one surface of the substrate, and the coating film formed of the adhesive composition may be dried or irradiated with an active energy ray such as ultraviolet rays. Further, the adhesive layer formed on the substrate may be transferred to a polarizing film or the like.

前述基材沒有特別受限,可為諸如離型薄膜、透明樹脂薄膜基材等各種基材,而後述之偏光薄膜亦適於作為基材使用。The substrate is not particularly limited, and may be various substrates such as a release film or a transparent resin film substrate, and a polarizing film to be described later is also suitable as a substrate.

前述離型薄膜的構成材料,可舉例如聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯薄膜等樹脂薄膜,紙、布、不織布等多孔質材料、網子、發泡片材、金屬箔及其等之積層體等適當的薄片物等等,但從表面平滑性優良此點來看,適宜使用樹脂薄膜。The constituent material of the release film may, for example, be a resin film such as polyethylene, polypropylene, polyethylene terephthalate or polyester film, or a porous material such as paper, cloth or nonwoven fabric, a net, or a foamed sheet. A suitable thin film or the like, such as a metal foil or a laminate thereof, is preferably a resin film from the viewpoint of excellent surface smoothness.

該樹脂薄膜可舉例如聚乙烯薄膜、聚丙烯薄膜、聚丁烯薄膜、聚丁二烯薄膜、聚甲基戊烯薄膜、聚氯乙烯薄膜、氯乙烯共聚物薄膜、聚對苯二甲酸乙二酯薄膜、聚對苯二甲酸丁二酯薄膜、聚胺基甲酸酯薄膜、乙烯-乙酸乙烯酯共聚物薄膜等。The resin film may, for example, be a polyethylene film, a polypropylene film, a polybutene film, a polybutadiene film, a polymethylpentene film, a polyvinyl chloride film, a vinyl chloride copolymer film, or polyethylene terephthalate. An ester film, a polybutylene terephthalate film, a polyurethane film, an ethylene-vinyl acetate copolymer film, or the like.

前述離型薄膜的厚度通常為5~200μm,並宜為5~100μm左右。可視需要利用矽氧系、氟系、長鏈烷基系或者脂肪酸醯胺系之離型劑、矽石粉等對前述離型薄膜作離型及防污處理,或進行塗佈型、捏合型、蒸鍍型等抗靜電處理。特別是,藉由在前述離型薄膜之表面適當施以矽氧處理、長鏈烷基處理、氟處理等剝離處理,可更加提高脫離前述黏著劑層之剝離性。The thickness of the release film is usually 5 to 200 μm, and preferably about 5 to 100 μm. The release film and the antifouling treatment may be used for the release film by a deuterium, a fluorine-based, a long-chain alkyl or a fatty acid amide-based release agent, a vermiculite powder, or the like, or may be applied by a coating type or a kneading type. Antistatic treatment such as vapor deposition type. In particular, by appropriately applying a release treatment such as an oxygen treatment, a long-chain alkyl treatment, or a fluorine treatment on the surface of the release film, the peeling property from the adhesive layer can be further improved.

前述透明樹脂薄膜基材未特別受限,可使用具透明性的各種樹脂薄膜。該樹脂薄膜係由1層薄膜所形成。其材料可舉例如聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂,乙酸酯系樹脂、聚醚碸系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚烯烴系樹脂、(甲基)丙烯酸系樹脂、聚氯乙烯系樹脂、聚氯化亞乙烯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂、聚芳酯系樹脂、聚苯硫醚系樹脂等。其等當中尤佳的是聚酯系樹脂、聚醯亞胺系樹脂及聚醚碸系樹脂。The transparent resin film substrate is not particularly limited, and various resin films having transparency can be used. This resin film is formed of a single film. The material thereof may, for example, be a polyester resin such as polyethylene terephthalate or polyethylene naphthalate, an acetate resin, a polyether oxime resin, a polycarbonate resin, or a polyamide resin. Polyimine resin, polyolefin resin, (meth)acrylic resin, polyvinyl chloride resin, polyvinyl chloride resin, polystyrene resin, polyvinyl alcohol resin, polyarylate A resin, a polyphenylene sulfide resin, or the like. Among them, polyester resins, polyimide resins, and polyether oxime resins are particularly preferred.

前述薄膜基材之厚度以15~200μm為佳,25~188μm較佳。The thickness of the film substrate is preferably 15 to 200 μm, more preferably 25 to 188 μm.

將上述黏著劑組成物塗佈在上述基材上的方法可使用如輥塗法、接觸上膠輥塗佈法、凹版塗佈法、反向塗佈法、輥刷法、噴塗法、浸漬輥塗法、棒塗法、刀塗法、氣刀塗佈法、淋幕式塗佈法、唇模塗佈法、鑄模塗佈機等公知的適當方法,並未特別受限。The method of applying the above adhesive composition onto the above substrate may be, for example, a roll coating method, a contact top coat coating method, a gravure coating method, a reverse coating method, a roll brush method, a spray coating method, or a dip roller. Known suitable methods such as coating, bar coating, knife coating, air knife coating, curtain coating, lip coating, and die coating are not particularly limited.

在前述黏著劑層是由前述黏著劑組成物所形成之塗佈膜乾燥而成的情況下,其乾燥條件(溫度、時間)並無特別限定,可依黏著劑組成物的組成、濃度等作適當設定,可為例如在60~170℃左右(並以60~150℃為佳)下進行1~60分鐘(並以2~30分鐘為佳)。In the case where the pressure-sensitive adhesive layer is dried by a coating film formed of the above-described pressure-sensitive adhesive composition, the drying conditions (temperature, time) are not particularly limited, and may be determined depending on the composition and concentration of the adhesive composition. The appropriate setting can be, for example, about 60 to 170 ° C (and preferably 60 to 150 ° C) for 1 to 60 minutes (and preferably 2 to 30 minutes).

當前述黏著劑組成物為紫外線硬化型黏著劑組成物並對該紫外線硬化型黏著劑組成物所形成之塗佈膜照射紫外線以形成的情況下,所照射的紫外線之照度宜為5mW/cm2 以上。若該紫外線照度低於5mW/cm2 ,聚合反應時間就會變長,而有生產性差的狀況。此外,該紫外線照度以200mW/cm2 以下為佳。若該紫外線照度超過200mW/cm2 ,光聚合引發劑就會急速消耗,因而導致聚合物的低分子量化,特別是在高溫下會有保持力降低的狀況。又,紫外線的累積光量以100mJ/cm2 ~5000mJ/cm2 為佳。When the adhesive composition is an ultraviolet curable adhesive composition and the coating film formed of the ultraviolet curable adhesive composition is irradiated with ultraviolet rays, the illuminance of the ultraviolet ray to be irradiated is preferably 5 mW/cm 2 . the above. If the ultraviolet illuminance is less than 5 mW/cm 2 , the polymerization reaction time becomes long and the productivity is poor. Further, the ultraviolet illuminance is preferably 200 mW/cm 2 or less. When the ultraviolet illuminance exceeds 200 mW/cm 2 , the photopolymerization initiator is rapidly consumed, resulting in a decrease in the molecular weight of the polymer, particularly in a case where the holding power is lowered at a high temperature. Further, the cumulative amount of ultraviolet light is preferably 100 mJ/cm 2 to 5000 mJ/cm 2 .

本發明所使用的紫外線燈沒有特別受限,惟以LED燈為佳。LED燈是放熱較其他紫外線燈更低的燈具,故可抑制黏著劑層聚合期間的溫度。從而可避免聚合物的低分子量化,並防止黏著劑層凝集力的降低,同時可提高作為黏著片時的高溫保持力。又亦可將多個紫外線燈組合。又亦可間歇性地照射紫外線來設定照射紫外線的亮期與不照射紫外線的暗期。The ultraviolet lamp used in the present invention is not particularly limited, but an LED lamp is preferred. LED lamps are lamps that emit less heat than other UV lamps, thus suppressing the temperature during polymerization of the adhesive layer. Thereby, the low molecular weight of the polymer can be avoided, and the cohesive force of the adhesive layer can be prevented from being lowered, and the high-temperature holding force as the adhesive sheet can be improved. It is also possible to combine a plurality of ultraviolet lamps. Alternatively, ultraviolet rays may be intermittently irradiated to set a bright period in which ultraviolet rays are irradiated and a dark period in which ultraviolet rays are not irradiated.

本發明中,紫外線硬化型黏著劑組成物中單體成分的最終聚合率係90%以上為佳,95%以上較佳,98%以上更佳。In the present invention, the final polymerization ratio of the monomer component in the ultraviolet curable adhesive composition is preferably 90% or more, more preferably 95% or more, and still more preferably 98% or more.

本發明之中,上述照射紫外線硬化型黏著劑組成物的紫外線峰值波長宜在200~500nm之範圍內,更宜在300~450nm之範圍內。紫外線的峰值波長若超過500nm,就會有光聚合引發劑未裂解而未引發聚合反應的狀況。又,紫外線的峰值波長若未達200nm,就會有聚合物鏈被切斷而接著特性低落的狀況。In the present invention, the ultraviolet ray peak wavelength of the ultraviolet ray curable adhesive composition is preferably in the range of 200 to 500 nm, more preferably in the range of 300 to 450 nm. When the peak wavelength of the ultraviolet light exceeds 500 nm, the photopolymerization initiator is not cleaved and the polymerization reaction is not initiated. Further, if the peak wavelength of the ultraviolet light is less than 200 nm, the polymer chain is cut and the characteristics are lowered.

由於空氣中的氧會妨礙反應的進行,故為求阻斷氧,宜在紫外線硬化型丙烯酸系黏著劑組成物所形成之塗佈膜上形成有離型薄膜等,或是在氮氣環境下進行光聚合反應。作為離型薄膜可舉如先前所述之物。此外,在使用了離型薄膜的情況下,該離型薄膜可直接作為附黏著劑層之偏光薄膜的分離件來使用。Since oxygen in the air hinders the progress of the reaction, in order to block the oxygen, it is preferable to form a release film or the like on the coating film formed of the ultraviolet curable acrylic adhesive composition, or to carry out the reaction under a nitrogen atmosphere. Photopolymerization. As the release film, what has been described above can be mentioned. Further, in the case where a release film is used, the release film can be directly used as a separator of a polarizing film with an adhesive layer.

又,本發明所用之紫外線硬化型黏著劑組成物在含有色素化合物(進一步為紫外線吸收劑)的情況下,宜對含有含(甲基)丙烯酸烷酯之單體成分與前述光聚合引發劑(B)(亦稱「前添加聚合引發劑」)的組成物照射紫外線,形成前述單體成分的部分聚合物,並在前述單體成分的部分聚合物中添加色素化合物(進一步為紫外線吸收劑)、以及於波長400nm以上具吸收帶的光聚合引發劑(A)(亦稱「後添加聚合引發劑」),製作出紫外線硬化型黏著劑組成物。部分聚合物的聚合率以20%以下左右為佳,3~20%左右較佳,5~15%左右更佳。紫外線的照射條件係如前述。Further, in the case where the ultraviolet curable adhesive composition used in the present invention contains a dye compound (further an ultraviolet absorber), it is preferred to contain a monomer component containing an alkyl (meth)acrylate and the above photopolymerization initiator ( The composition of B) (also referred to as "pre-addition polymerization initiator") is irradiated with ultraviolet rays to form a partial polymer of the monomer component, and a dye compound (further an ultraviolet absorber) is added to a part of the polymer of the monomer component. And a photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more (also referred to as "post-addition polymerization initiator") to prepare an ultraviolet curable adhesive composition. The polymerization rate of the partial polymer is preferably about 20% or less, preferably about 3 to 20%, and more preferably about 5 to 15%. The irradiation conditions of ultraviolet rays are as described above.

如前所述,在由含色素化合物(進一步為紫外線吸收劑)之紫外線硬化型黏著劑組成物來形成黏著劑層的情況下,藉由進行如前述之2階段聚合方式可提升單體成分的聚合率,並可增進最後製出之黏著劑層的紫外線吸收機能。As described above, in the case where the adhesive layer is formed of the ultraviolet curable adhesive composition containing a dye-containing compound (further an ultraviolet absorber), the monomer component can be enhanced by performing the two-stage polymerization method as described above. The polymerization rate and the UV absorbing function of the finally produced adhesive layer can be improved.

黏著劑層之厚度係12μm以上為佳、50μm以上較佳、100μm以上更佳、150μm以上尤佳。黏著劑層厚度的上限値沒有特別限定,惟宜為1mm以下。黏著劑層的厚度一旦超過1mm,紫外線的穿透就會變得困難,除了單體成分之的合變得費時外,還會有加工性或步驟中的捲取、輸送性發生問題而生產性差的狀況,故並不適宜。The thickness of the adhesive layer is preferably 12 μm or more, more preferably 50 μm or more, still more preferably 100 μm or more, and still more preferably 150 μm or more. The upper limit of the thickness of the adhesive layer is not particularly limited, but is preferably 1 mm or less. When the thickness of the adhesive layer exceeds 1 mm, the penetration of ultraviolet rays becomes difficult, and in addition to the time-consuming combination of the monomer components, there are problems in the processability or the winding and transportability in the steps, and the productivity is poor. The situation is not appropriate.

本發明之黏著劑層的凝膠分率雖未特別受限,但以35%以上為佳,50%以上較佳,75%以上更佳,85%以上尤佳。黏著劑層的凝膠分率低時,便會有加工性或操作性出現問題的狀況。The gel fraction of the adhesive layer of the present invention is not particularly limited, but is preferably 35% or more, more preferably 50% or more, still more preferably 75% or more, and particularly preferably 85% or more. When the gel fraction of the adhesive layer is low, there is a problem that workability or workability is problematic.

前述黏著劑層於厚度25μm所測定之霧度値宜為2%以下,而0~1.5%較佳、0~1.0%更佳。藉由讓霧度在前述範圍內,黏著劑層會具有高透明性,故為佳。The haze of the adhesive layer measured at a thickness of 25 μm is preferably 2% or less, and more preferably 0 to 1.5% and more preferably 0 to 1.0%. It is preferred that the adhesive layer has high transparency by allowing the haze to be within the above range.

在前述黏著劑層暴露的情形時,在供予實際使用為前,亦可藉離型薄膜來保護黏著劑層。In the case where the aforementioned adhesive layer is exposed, the adhesive layer may be protected by a release film before being used for practical use.

(1-2)偏光薄膜 前述偏光薄膜可舉如於偏光件之至少一面具有透明保護薄膜之物。(1-2) Polarizing film The polarizing film may be one having a transparent protective film on at least one side of the polarizing member.

(1-2-1)偏光件4 偏光件未特別受限,可使用各種偏光件。作為偏光件,可舉如使聚乙烯醇系薄膜、部分縮甲醛化聚乙烯醇系薄膜、乙烯-乙酸乙烯酯共聚物系部分皂化薄膜等親水性高分子薄膜吸附碘或二色性染料等二色性材料並加以單軸延伸者,以及聚乙烯醇之脫水處理物或聚氯乙烯之脫鹽酸處理物等聚烯系配向薄膜等。其等之中,又以由聚乙烯醇系薄膜與碘等二色性物質所構成之偏光件為宜。該等偏光件的厚度雖無特別限制,但一般而言為5~80μm左右。(1-2-1) Polarizer 4 The polarizer is not particularly limited, and various polarizers can be used. The polarizing material may be a hydrophilic polymer film such as a polyvinyl alcohol-based film, a partially formalized polyvinyl alcohol-based film or an ethylene-vinyl acetate copolymer-based partially saponified film, which adsorbs iodine or a dichroic dye. The coloring material is uniaxially stretched, and a polyene-based alignment film such as a dehydrated material of polyvinyl alcohol or a dehydrochlorinated product of polyvinyl chloride is used. Among them, a polarizing member composed of a polyvinyl alcohol-based film and a dichroic substance such as iodine is preferable. The thickness of the polarizers is not particularly limited, but is generally about 5 to 80 μm.

將聚乙烯醇系薄膜以碘染色再單軸延伸而成之偏光件舉例來說可以下述方式製作:將聚乙烯醇薄膜浸漬到碘之水溶液藉此染色,再延伸到原長之3~7倍。亦可視需要浸漬於可含有硼酸或硫酸鋅、氯化鋅等之碘化鉀等的水溶液中。進一步亦可視需要在染色前將聚乙烯醇系薄膜浸漬於水中進行水洗。藉由水洗聚乙烯醇系薄膜,可洗淨聚乙烯醇系薄膜表面的污垢及抗結塊劑,除此之外也有使聚乙烯醇系薄膜膨潤從而防止染色參差等不均缺陷的效果。延伸可於以碘染色後進行,亦可一邊染色一邊延伸,復亦可於延伸後以碘染色。亦可於硼酸或碘化鉀等水溶液中或水浴中進行延伸。The polarizing member obtained by dyeing a polyvinyl alcohol-based film by iodine and then uniaxially stretching can be produced, for example, by dipping a polyvinyl alcohol film into an aqueous solution of iodine to be dyed, and then extending to the original length of 3 to 7. Times. It may also be immersed in an aqueous solution containing potassium iodide or the like such as boric acid or zinc sulfate or zinc chloride as needed. Further, it is also possible to immerse the polyvinyl alcohol-based film in water for washing with water before dyeing. By washing the polyvinyl alcohol-based film with water, the dirt and the anti-caking agent on the surface of the polyvinyl alcohol-based film can be washed, and the polyvinyl alcohol-based film can be swollen to prevent unevenness such as dyeing unevenness. The extension may be carried out after dyeing with iodine, or may be extended while dyeing, or may be dyed with iodine after extension. It can also be extended in an aqueous solution such as boric acid or potassium iodide or in a water bath.

又,本發明中亦可使用厚度10μm以下的薄型偏光件。從薄型化的觀點而言,以該厚度為1~7μm者為佳。此種薄型偏光件,厚度不均現象較少且觀視性優異,且尺寸變化較少故耐久性優異,而且作成偏光板的厚度亦能力求薄型化,就此等觀點來看係為優選。Further, in the present invention, a thin polarizer having a thickness of 10 μm or less can also be used. From the viewpoint of thinning, it is preferred that the thickness be 1 to 7 μm. Such a thin polarizer is preferred because it has less thickness unevenness and is excellent in visibility, and has small dimensional change, so that durability is excellent, and the thickness of the polarizing plate is also reduced.

作為薄型之偏光件,代表性而言,可舉如日本特開昭51-069644號公報及日本特開2000-338329號公報、國際公開案第2010/100917號說明書、國際公開案第2010/100917號說明書、或日本特許4751481號說明書及日本特開2012-073563號公報所記載之薄型偏光膜。該等薄型偏光膜,可藉由包含將聚乙烯基醇系樹脂(以下亦稱為PVA系樹脂)層與延伸用樹脂基材在積層體的狀態下延伸之步驟與染色步驟之製法來獲得。若為此種製法,則即使PVA系樹脂層很薄,仍可藉延伸用樹脂基材來支撐,從而可在不因延伸產生斷裂等不良狀況下進行延伸。As a thin type of polarizer, a typical example is disclosed in Japanese Laid-Open Patent Publication No. SHO-51-069644, JP-A-2000-338329, International Publication No. 2010/100917, and International Publication No. 2010/100917. A thin polarizing film described in Japanese Laid-Open Patent Publication No. Hei. No. 4,751, 481, and Japanese Patent Application Publication No. 2012-073563. The thin polarizing film can be obtained by a method comprising a step of stretching a layer of a polyvinyl alcohol-based resin (hereinafter also referred to as a PVA-based resin) and a resin substrate for stretching in a layered body, and a dyeing step. According to this method, even if the PVA-based resin layer is thin, it can be supported by the resin substrate for stretching, and the film can be stretched without causing breakage due to stretching.

作為前述薄型偏光膜,在包含以積層體狀態進行延伸之步驟與染色步驟的製法中,就可高倍率延伸並可提升偏光性能此點而言,宜為如國際公開案第2010/100917號說明書、國際公開案第2010/100917號說明書、或日本特許4751481號說明書及日本特開2012-073563號公報所記載般由一種包括在硼酸水溶液中進行延伸之步驟的製法所得者,尤其宜為利用日本特許4751481號說明書及日本特開2012-073563號公報所記載之一種包括在硼酸水溶液中延伸前進行輔助性空中延伸步驟的製法所獲得者。As the thin polarizing film, in the method including the step of stretching in the state of the laminated body and the dyeing step, it is possible to extend at a high magnification and to improve the polarizing performance, and it is preferable to use the specification of International Publication No. 2010/100917. In the case of the method disclosed in the specification of the International Publication No. 2010/100917, or the specification of Japanese Patent No. 4751481, and the method of extending in an aqueous solution of boric acid, it is particularly preferable to use Japan. One of the methods described in the specification of the Japanese Patent Application Laid-Open No. Hei.

(1-2-2)透明保護薄膜3 本發明所用透明保護薄膜3係配置於偏光件4之觀視側,惟可於偏光件4之有機EL面板側亦配置透明保護薄膜。(1-2-2) Transparent Protective Film 3 The transparent protective film 3 used in the present invention is disposed on the viewing side of the polarizing member 4, and a transparent protective film may be disposed on the organic EL panel side of the polarizing member 4.

透明保護薄膜方面,可適宜使用習知所用之物。具體上宜為透明性、機械強度、熱穩定性、水分阻斷性、等向性等優異之材料(基底聚合物)所形成的透明保護薄膜,可舉如聚對苯二甲酸乙二酯及聚萘二甲酸乙二酯等聚酯系聚合物;二乙醯纖維素及三乙醯纖維素等纖維素系聚合物;聚甲基丙烯酸甲酯等丙烯酸系聚合物;聚苯乙烯及丙烯腈-苯乙烯共聚物(AS樹脂)等苯乙烯系聚合物;以及聚碳酸酯系聚合物等。又,亦可列舉下述聚合物作為形成前述透明保護薄膜之聚合物之例:聚乙烯、聚丙烯、具有環狀系乃至降莰烯結構之聚烯烴、乙烯-丙烯共聚物等聚烯烴系聚合物、氯化乙烯系聚合物、尼龍及芳香族聚醯胺等醯胺系聚合物、醯亞胺系聚合物、碸系聚合物、聚醚碸系聚合物、聚醚醚酮系聚合物、聚伸苯硫系聚合物、乙烯醇系聚合物、氯化亞乙烯系聚合物、乙烯縮丁醛系聚合物、芳酯系聚合物、聚甲醛系聚合物、環氧系聚合物或前述聚合物之摻合物等。透明保護薄膜亦可作成丙烯酸系、胺基甲酸酯系、丙烯醯基胺基甲酸酯系、環氧系、聚矽氧系等熱硬化型樹脂之硬化層或紫外線硬化型樹脂之硬化層而形成。As the transparent protective film, a conventionally used one can be suitably used. Specifically, it is preferably a transparent protective film formed of a material (base polymer) excellent in transparency, mechanical strength, thermal stability, moisture barrier property, and isotropic property, and examples thereof include polyethylene terephthalate and a polyester-based polymer such as polyethylene naphthalate; a cellulose-based polymer such as diethyl phthalocyanine or triethyl fluorene cellulose; an acrylic polymer such as polymethyl methacrylate; polystyrene and acrylonitrile; a styrene-based polymer such as a styrene copolymer (AS resin); a polycarbonate-based polymer or the like. Further, examples of the polymer which forms the transparent protective film include polyethylene, polypropylene, polyolefin having a cyclic system or a norbornene structure, and polyolefin polymerization such as an ethylene-propylene copolymer. a phthalic acid-based polymer, a phthalamide-based polymer such as nylon or an aromatic polyamine, a quinone-based polymer, a fluorene-based polymer, a polyether fluorene-based polymer, or a polyetheretherketone-based polymer. a polyphenylene sulfide polymer, a vinyl alcohol polymer, a vinylidene chloride polymer, an ethylene butyral polymer, an aryl ester polymer, a polyoxymethylene polymer, an epoxy polymer or the foregoing polymerization Blends and the like. The transparent protective film can also be used as a hardened layer of a thermosetting resin such as an acrylic, urethane-based, acryl-based urethane-based, epoxy-based or polyfluorene-based resin or a cured layer of an ultraviolet-curable resin. And formed.

透明保護薄膜的厚度可適當決定,惟一般由強度及操作性等作業性及薄層性等觀點係為1~500μm左右。The thickness of the transparent protective film can be appropriately determined, and it is generally about 1 to 500 μm from the viewpoints of workability and thinness such as strength and workability.

(1-2-3)接著劑層 前述偏光件與透明保護薄膜宜透過水系接著劑等而密著。就水系接著劑而言,可例示如異氰酸酯系接著劑、聚乙烯醇系接著劑、明膠系接著劑、乙烯基系乳膠系、水系聚胺酯、水系聚酯等。上述之外,作為偏光件與透明保護薄膜的接著劑可舉如紫外硬化型接著劑、電子束硬化型接著劑等。電子束硬化型偏光薄膜用接著劑對上述各種觀視側透明保護薄膜展現適當的接著性。又本發明所用接著劑中可令其含有金屬化合物填料。(1-2-3) Adhesive layer The polarizer and the transparent protective film are preferably adhered to each other by a water-based adhesive or the like. The water-based adhesive may, for example, be an isocyanate-based adhesive, a polyvinyl alcohol-based adhesive, a gelatin-based adhesive, a vinyl-based latex, an aqueous polyurethane or an aqueous polyester. In addition to the above, examples of the adhesive for the polarizer and the transparent protective film include an ultraviolet curable adhesive, an electron beam curable adhesive, and the like. The electron beam-curable polarizing film exhibits an appropriate adhesion to the above various viewing-side transparent protective films with an adhesive. Further, the adhesive used in the present invention may contain a metal compound filler.

(1-2-4)表面處理層:機能層 前述透明保護薄膜之未接著偏光件之面上,可形成硬塗層或抗反射層、抗粘層等機能層,復亦可施以目的在於擴散乃至防眩而作的處理。(1-2-4) Surface treatment layer: functional layer The surface of the transparent protective film which is not attached to the polarizing member can form a functional layer such as a hard coat layer or an anti-reflection layer or an anti-adhesion layer. Dispersion and even anti-glare treatment.

前述硬塗層宜使用例如以三聚氰胺系樹脂、胺基甲酸酯系樹脂、醇酸系樹脂、丙烯酸系樹脂、聚矽氧系樹脂等為基底聚合物之硬化型樹脂所構成的硬化覆膜。前述硬化型樹脂可作為活性能量線硬化型化合物使用,其於分子中具有含至少一個聚合性雙鍵的官能基。前述硬塗層的厚度宜為0.1~30μm。As the hard coat layer, for example, a cured film made of a curable resin of a base polymer such as a melamine resin, an urethane resin, an alkyd resin, an acrylic resin or a polyoxyn resin is preferably used. The above-mentioned curable resin can be used as an active energy ray-curable compound having a functional group containing at least one polymerizable double bond in the molecule. The thickness of the aforementioned hard coat layer is preferably from 0.1 to 30 μm.

前述機能層中亦可添加光安定劑(HALS)、抗氧化劑等。A light stabilizer (HALS), an antioxidant, or the like may be added to the functional layer.

(1-3)相位差薄膜5 前述相位差薄膜,在以慢軸方向折射率為nx、面內快軸方向折射率為ny、且厚度方向折射率為nz時,滿足nx=ny>nz、nx>ny>nz、nx>ny=nz、nx>nz>ny、nz=nx>ny、nz>nx>ny、nz>nx=ny之關係,並因應各種用途選擇使用。此外,nx=ny不僅指nx與ny完全相同的情形,亦包括nx與ny實質相同的情形。又,ny=nz不僅指ny與nz完全相同的情形,亦包括ny與nz實質相同的情形。(1-3) Phase difference film 5 The retardation film satisfies nx=ny>nz when the refractive index in the slow axis direction is nx, the refractive index in the in-plane fast axis direction is ny, and the refractive index in the thickness direction is nz. Nx>ny>nz, nx>ny=nz, nx>nz>ny, nz=nx>ny, nz>nx>ny, nz>nx=ny, and are used for various purposes. In addition, nx=ny not only refers to the case where nx and ny are exactly the same, but also includes the case where nx and ny are substantially the same. Also, ny=nz not only refers to the case where ny is exactly the same as nz, but also includes the case where ny and nz are substantially the same.

本發明中,為了應用於有機EL顯示裝置,前述相位差薄膜宜為正面延遲作成1/4波長(約100~170nm)的1/4波長板。藉由將前述偏光薄膜與1/4波長板積層,便能作為有機EL顯示裝置之抗反射用圓偏光薄膜而發揮功能,故為佳。In the present invention, in order to apply to an organic EL display device, the retardation film is preferably a quarter-wavelength plate having a front retardation of 1/4 wavelength (about 100 to 170 nm). By laminating the polarizing film and the quarter-wavelength plate, it is preferable to function as a circularly polarizing film for antireflection of an organic EL display device.

即,入射該有機EL顯示裝置的外界光線,經由偏光薄膜僅穿透直線偏光成分。該直線偏光經由相位差薄膜通常會成為橢圓偏光,特別是在相位差板為1/4波長板,而且與相位差薄膜之偏光方向的夾角為π/4時會成為圓偏光。That is, the external light incident on the organic EL display device penetrates only the linearly polarized light component via the polarizing film. The linearly polarized light usually has elliptically polarized light through the retardation film, and particularly when the phase difference plate is a quarter-wave plate and the angle of the polarizing direction of the retardation film is π/4, it becomes circularly polarized light.

該圓偏光會穿透有機EL面板中的透明基板、透明電極、有機薄膜,並在金屬電極反射,再次穿透有機薄膜、透明電極、透明基板,而於相位差薄膜再次成為直線偏光。因此,該直線偏光係與偏光薄膜的偏光方向垂直相交,故無法穿透偏光板。結果可完全遮蔽金屬電極的鏡面。The circularly polarized light penetrates the transparent substrate, the transparent electrode, and the organic thin film in the organic EL panel, and is reflected by the metal electrode to penetrate the organic thin film, the transparent electrode, and the transparent substrate again, and the retardation film again becomes linearly polarized. Therefore, the linear polarizing system intersects the polarizing direction of the polarizing film perpendicularly, so that the polarizing plate cannot be penetrated. As a result, the mirror surface of the metal electrode can be completely shielded.

相位差薄膜可舉如高分子材料經單軸或雙軸延伸處理而成的複折射性薄膜、液晶聚合物之配向薄膜、及以薄膜支撐液晶聚合物配向層而成之物。The retardation film may be a birefringent film obtained by subjecting a polymer material to a uniaxial or biaxial stretching treatment, an alignment film of a liquid crystal polymer, and a film supporting a liquid crystal polymer alignment layer.

高分子材(基底聚合物)可舉例如聚乙烯醇、聚乙烯丁醛、散甲基乙烯醚、聚羥乙基丙烯酸酯、羥乙基纖維素、羥丙基纖維素、甲基纖維素、聚碳酸酯、聚芳酯、聚碸、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚醚碸、聚苯硫醚、聚伸苯醚、聚烯丙基碸、聚醯胺、聚醯亞胺、聚烯烴、聚氯化乙烯、纖維素系聚合物、環烯烴系樹脂或其等之二元系、三元系各種共聚物、接枝共聚物、摻合物等。該等高分子材料經由延伸等而成為配向物(延伸薄膜)。The polymer material (base polymer) may, for example, be polyvinyl alcohol, polyvinyl butyral, disperse methyl vinyl ether, polyhydroxyethyl acrylate, hydroxyethyl cellulose, hydroxypropyl cellulose, methyl cellulose, Polycarbonate, polyarylate, polyfluorene, polyethylene terephthalate, polyethylene naphthalate, polyether oxime, polyphenylene sulfide, polyphenylene ether, polyallyl fluorene, polyfluorene A binary system, a ternary system of various copolymers, a graft copolymer, a blend, or the like of an amine, a polyimide, a polyolefin, a polyvinyl chloride, a cellulose polymer, a cycloolefin resin, or the like. These polymer materials become an alignment material (stretched film) by stretching or the like.

液晶聚合物(基底聚合物)可舉例如於聚合物主鏈或側鏈導入提供液晶配向性之共軛性直線狀原子團(液晶元)而成的主鏈型或側鏈型各種物質等等。作為主鏈型液晶聚合物之具體例可舉如:於提供可撓性之隔片部鍵結有液晶元基團之結構的諸如向列配向性之聚酯系液晶聚合物、圓盤形聚合物或膽固醇聚合物等。側鏈型液晶聚合物之具體例可舉如以聚矽氧烷、聚丙烯酸酯、聚甲基丙烯酸酯或聚丙二酸酯作為主鏈骨架,並隔著包含共軛性原子團之間隔部而具有液晶元部以作為側鏈者,其中該液晶元部係由向列配向賦予性之經對位取代的環狀化合物單元構成。該等液晶聚合物是以例如對已形成在玻璃板上之聚醯亞胺或已將聚乙烯醇等薄膜的表面進行摩擦處理而成者、或已斜向蒸鍍氧化矽而成者等,在其配向處理面上展開液晶聚合物之溶液並進行熱處理而行。The liquid crystal polymer (base polymer) may be, for example, a main chain type or a side chain type which is obtained by introducing a conjugated linear atomic group (liquid crystal cell) which provides liquid crystal alignment properties to a polymer main chain or a side chain. Specific examples of the main chain type liquid crystal polymer include, for example, a nematically oriented polyester-based liquid crystal polymer having a structure in which a liquid crystal cell group is bonded to a flexible separator portion, and a disk-shaped polymerization. Or cholesterol polymer, etc. Specific examples of the side chain type liquid crystal polymer include polysiloxane, polyacrylate, polymethacrylate or polymalonate as a main chain skeleton, and have a partition portion containing a conjugated atomic group. The liquid crystal cell portion is composed of a side chain, wherein the liquid crystal cell portion is composed of a para-aligned cyclic compound unit substituted in a nematic alignment. These liquid crystal polymers are, for example, those obtained by rubbing a surface of a film formed on a glass plate with a polyimide or a film such as polyvinyl alcohol, or by vapor-depositing cerium oxide. A solution of the liquid crystal polymer is developed on the alignment treatment surface and heat treatment is performed.

(1-4)黏著劑層6、層間黏著劑層(或接著劑層) 本發明所用黏著劑層6(有機EL面板側之黏著劑層),可舉如與層間黏著劑層(或接著劑層)、前述黏接著劑層之黏著劑層相同之物,其等之中宜為以(甲基)丙烯酸系聚合物作為基底聚合物之(甲基)丙烯酸系黏著劑組成物所形成的丙烯酸系黏著劑層。又宜可適用以橡膠系聚合物為基底聚合物之橡膠系黏著劑組成物所形成的橡膠黏著劑層。又,黏著劑層之製造方法或理想態樣等亦可舉如與之相同者。(1-4) Adhesive Layer 6, Interlayer Adhesive Layer (or Adhesive Layer) The adhesive layer 6 (adhesive layer on the organic EL panel side) used in the present invention may be, for example, an interlayer adhesive layer (or an adhesive) The layer is the same as the adhesive layer of the adhesive layer, and among them, acrylic acid formed by a (meth)acrylic adhesive composition using a (meth)acrylic polymer as a base polymer is preferable. Adhesive layer. Further, a rubber adhesive layer formed of a rubber-based adhesive composition containing a rubber-based polymer as a base polymer is preferably used. Further, the method of manufacturing the adhesive layer, the ideal aspect, and the like may be the same as those of the adhesive layer.

黏著劑層的厚度沒有特別限定,惟以10~75μm左右為佳、12~50μm左右較佳。The thickness of the adhesive layer is not particularly limited, but is preferably about 10 to 75 μm and preferably about 12 to 50 μm.

(1-5)其他層 作為前述(有機EL面板側)透明保護薄膜,可例示與透明保護薄膜3相同之物;作為前述有機EL面板側第1黏著劑層(或接著劑層),可適宜使用本說明書中任何黏著劑層、接著劑層。(1-5) The other layer is the same as the transparent protective film 3 as the transparent protective film (organic EL panel side), and may be suitably used as the first adhesive layer (or adhesive layer) on the organic EL panel side. Use any adhesive layer or adhesive layer in this specification.

≪光學構件之穿透率≫ 本發明之組成物所形成之光學構件(各層)於波長380nm下的穿透率係15%以下為佳、10%以下較佳、7%以下更佳、3%以下尤佳。藉由令波長380nm下的穿透率為前述範圍,可更高程度地遮蔽入射的紫外線,故能夠顯著抑制有機EL元件的劣化。The transmittance of the optical member of the ≫ optical member 各 The transmittance of the optical member (each layer) formed by the composition of the present invention at a wavelength of 380 nm is preferably 15% or less, preferably 10% or less, more preferably 7% or less, or 3%. The following is especially good. By making the transmittance at a wavelength of 380 nm into the above range, the incident ultraviolet rays can be shielded to a higher degree, and deterioration of the organic EL element can be remarkably suppressed.

又,本發明之組成物所形成的光學構件(各層)於波長400nm下的穿透率係15%以下為佳、10%以下較佳、7%以下更佳、3%以下尤佳。藉由令波長400nm下的穿透率為前述範圍,可更高程度地遮蔽入射的紫外線,故能夠顯著抑制有機EL元件的劣化。Further, the optical member (each layer) formed by the composition of the present invention has a transmittance of 15% or less at a wavelength of 400 nm, preferably 10% or less, more preferably 7% or less, and still more preferably 3% or less. By making the transmittance at a wavelength of 400 nm as the above range, the incident ultraviolet rays can be shielded to a higher degree, and deterioration of the organic EL element can be remarkably suppressed.

另一方面,由本發明之組成物所形成的光學構件(各層)於波長440nm下的穿透率係60%以上為佳、75%以上為佳、85%以上較佳。藉由令波長440nm下之穿透率為前述範圍,可使有機EL元件發出的光線充分穿透,而能確保有機EL顯示裝置有充分的顯示性能,故為佳。On the other hand, the optical member (each layer) formed of the composition of the present invention has a transmittance of 60% or more at a wavelength of 440 nm, preferably 75% or more, and preferably 85% or more. By making the transmittance at a wavelength of 440 nm to the above range, the light emitted from the organic EL element can be sufficiently penetrated, and it is preferable to ensure sufficient display performance of the organic EL display device.

≪光學積層體之穿透率≫ 前述光學積層體在波長380nm下的穿透率係9%以下為佳、7%以下較佳、5%以下更佳、3%以下尤佳。藉由令波長380nm下的穿透率為前述範圍,可更高程度地遮蔽入射的紫外線,而能顯著抑制有機EL元件的劣化,故為佳。The transmittance of the optical layered body ≫ The transmittance of the optical layered body at a wavelength of 380 nm is preferably 9% or less, more preferably 7% or less, still more preferably 5% or less, and still more preferably 3% or less. By setting the transmittance at a wavelength of 380 nm to the above range, it is possible to shield the incident ultraviolet rays to a higher degree and to suppress the deterioration of the organic EL element remarkably.

又,前述光學積層體於波長400nm下的穿透率係20%以下為佳、15%以下為佳、10%以下較佳。藉由令波長400nm下的穿透率為前述範圍,可更高程度地遮蔽入射的紫外線,而能顯著抑制有機EL元件的劣化,故為佳。Further, the optical layered body has a transmittance of 20% or less at a wavelength of 400 nm, preferably 15% or less, more preferably 10% or less. By setting the transmittance at a wavelength of 400 nm to the above range, the incident ultraviolet rays can be shielded to a higher degree, and deterioration of the organic EL element can be remarkably suppressed, which is preferable.

又,前述光學積層體於波長440nm下的穿透率係25%以上為佳、30%以上為佳、33%以上較佳。藉由令波長440nm下之穿透率為前述範圍,可使有機EL元件發出的光線充分穿透,而能確保有機EL顯示裝置有充分的顯示性能,故為佳。Further, the optical layered body has a transmittance of 25% or more at a wavelength of 440 nm, preferably 30% or more, and preferably 33% or more. By making the transmittance at a wavelength of 440 nm to the above range, the light emitted from the organic EL element can be sufficiently penetrated, and it is preferable to ensure sufficient display performance of the organic EL display device.

≪有機EL顯示裝置≫ 本發明之有機EL顯示裝置為包含前述光學積層體1與有機EL面板者,亦可包含其他層。具體上如圖2所示,宜為自觀視側起依序積層有外蓋構件7/黏接著劑層2/保護薄膜3/偏光件4/相位差薄膜5/黏著劑層6/有機EL面板8的有機EL顯示裝置10,亦可舉如依序積層有外蓋構件7/黏接著劑層2/(觀視側)保護薄膜3/偏光件4/有機EL面板側保護薄膜/有機EL面板側第1黏著劑層(或接著劑層)/相位差薄膜5/(有機EL面板側第2)黏著劑層6/有機EL面板8的有機EL顯示裝置等。又,其等之外,亦可舉如含有硬塗層、防眩處理層、抗反射層等機能層、或感測層、及用於積層其等之黏著劑層或接著劑層等的結構。≪Organic EL display device The organic EL display device of the present invention includes the optical layered body 1 and the organic EL panel, and may include other layers. Specifically, as shown in FIG. 2, it is preferable to laminate the outer cover member 7/adhesive layer 2/protective film 3/polarizer 4/phase difference film 5/adhesive layer 6/organic EL from the self-viewing side. The organic EL display device 10 of the panel 8 may be provided with an outer cover member 7/adhesive layer 2/(view side) protective film 3/polarizer 4/organic EL panel side protective film/organic EL. The organic EL display device of the first adhesive layer (or adhesive layer) / retardation film 5 / (organic EL panel side second) adhesive layer 6 / organic EL panel 8 on the panel side. In addition, the functional layer including a hard coat layer, an antiglare treatment layer, and an antireflection layer, or a sensing layer, and an adhesive layer or an adhesive layer for laminating or the like may be used. .

前述外蓋構件並無特別限定,可適宜使用本發明領域通常使用之物,可舉如外蓋玻璃、外蓋塑膠等。又,有機EL面板並無特別限定,可適宜使用本發明領域通常使用之物,可舉例如具有「基材、於前述基材上並列設置之多個有機EL元件、設於前述有機EL元件上之保護層、及設於前述保護層上之密封薄膜」的面板。The outer cover member is not particularly limited, and those generally used in the field of the invention can be suitably used, and examples thereof include a cover glass and a cover plastic. In addition, the organic EL panel is not particularly limited, and a material which is generally used in the field of the invention can be suitably used, and for example, a substrate, a plurality of organic EL elements arranged in parallel on the substrate, and the organic EL device are provided. A panel of a protective layer and a sealing film provided on the protective layer.

以下說明將含有本發明通式(1)所示化合物之光學構件用於透明導電性薄膜的狀況。前述透明導電性薄膜包含透明基材薄膜及透明導電層。The state in which the optical member containing the compound represented by the general formula (1) of the present invention is used for a transparent conductive film will be described below. The transparent conductive film includes a transparent base film and a transparent conductive layer.

如圖3所示,作為透明導電性薄膜20,舉例而言,可例示依序積層有透明導電層22/中間層23/透明基材薄膜21之物。中間層23可任意設置。前述中間層可舉如折射率調整層、易接著劑層、硬塗層、裂紋防止層等,可使用由其等之中任意選擇之至少1者。含本發明通式(1)所示化合物的光學構件,可使用作為形成前述透明導電性薄膜的透明基材薄膜或中間層。又,透明導電性薄膜20中,於透明基材薄膜21之未設置透明導電層22側可設置防結塊層24。可將防結塊層作為含本發明通式(1)所示化合物的光學構件使用。As the transparent conductive film 20, as shown in FIG. 3, for example, a material in which the transparent conductive layer 22/intermediate layer 23/transparent base film 21 are laminated in this order can be exemplified. The intermediate layer 23 can be arbitrarily set. The intermediate layer may, for example, be a refractive index adjusting layer, an easy-adhesive layer, a hard coat layer, a crack preventing layer, or the like, and at least one selected from the group may be used. As the optical member containing the compound represented by the formula (1) of the present invention, a transparent base film or an intermediate layer which forms the transparent conductive film can be used. Further, in the transparent conductive film 20, the anti-caking layer 24 may be provided on the side of the transparent base film 21 where the transparent conductive layer 22 is not provided. The anti-caking layer can be used as an optical member containing the compound of the formula (1) of the present invention.

在透明導電性薄膜20具有中間層23、防結塊層24時,舉例而言,可例示下述態樣。 態樣1:透明導電層22/中間層23(折射率調整層)/透明基材薄膜21/防結塊層24。 態樣2:透明導電層22/中間層23(折射率調整層/硬塗層)/透明基材薄膜21/防結塊層24。 態樣3:透明導電層22/中間層23(裂紋防止層)/透明基材薄膜21/防結塊層24。 態樣4:透明導電層22/中間層23(裂紋防止層/易接著劑層)/透明基材薄膜21/防結塊層24。 態樣5:透明導電層22/中間層23(折射率調整層/硬塗層/易接著劑層)/透明基材薄膜21/防結塊層24。When the transparent conductive film 20 has the intermediate layer 23 and the anti-caking layer 24, for example, the following aspects can be exemplified. Aspect 1: Transparent conductive layer 22 / intermediate layer 23 (refractive index adjusting layer) / transparent substrate film 21 / anti-caking layer 24. Aspect 2: Transparent conductive layer 22 / intermediate layer 23 (refractive index adjusting layer / hard coat layer) / transparent substrate film 21 / anti-caking layer 24. Aspect 3: Transparent conductive layer 22 / intermediate layer 23 (crack prevention layer) / transparent substrate film 21 / anti-caking layer 24. Aspect 4: Transparent conductive layer 22 / intermediate layer 23 (crack preventing layer / easy adhesive layer) / transparent substrate film 21 / anti-caking layer 24. Aspect 5: Transparent conductive layer 22 / intermediate layer 23 (refractive index adjusting layer / hard coat layer / easy adhesive layer) / transparent substrate film 21 / anti-caking layer 24.

前述透明導電性薄膜之中,含本發明通式(1)所示化合物的光學構件,宜使用作為形成前述透明導電性薄膜的透明基材薄膜或中間層。將含本發明通式(1)所示化合物的光學構件應用於防結塊層時,可能會因為對防結塊層中的防結塊粒子之密著性不良,而變得難以確保耐擦傷性。Among the transparent conductive films, an optical member containing the compound represented by the formula (1) of the present invention is preferably used as a transparent base film or an intermediate layer forming the transparent conductive film. When the optical member containing the compound represented by the general formula (1) of the present invention is applied to the anti-caking layer, it may become difficult to ensure abrasion resistance due to poor adhesion to the anti-caking particles in the anti-caking layer. Sex.

(2-1)透明基材薄膜21 透明基材薄膜的材料(基底聚合物)未特別受限,可舉如具透明性之各種塑膠材料。該材料(基底聚合物)可舉例如聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂、乙酸酯系樹脂、聚醚碸系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚烯烴系樹脂、聚降莰烯系樹脂等聚環烯烴系樹脂、(甲基)丙烯酸系樹脂、聚氯化乙烯系樹脂、聚氯化亞乙烯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂、聚芳酯系樹脂、聚苯硫醚系樹脂等。其等之中尤佳的是聚環烯烴系樹脂、聚酯系樹脂、聚碳酸酯系樹脂、聚烯烴系樹脂。(2-1) Transparent base film 21 The material (base polymer) of the transparent base film is not particularly limited, and various plastic materials having transparency can be mentioned. The material (base polymer) may, for example, be a polyester resin such as polyethylene terephthalate or polyethylene naphthalate, an acetate resin, a polyether oxime resin, or a polycarbonate resin. a polycycloolefin-based resin such as a polyamide resin, a polyimide resin, a polyolefin resin, or a polydecene-based resin, a (meth)acrylic resin, a polychlorinated resin, or a polychlorinated A vinyl resin, a polystyrene resin, a polyvinyl alcohol resin, a polyarylate resin, a polyphenylene sulfide resin, or the like. Among these, a polycycloolefin type resin, a polyester type resin, a polycarbonate type resin, and a polyolefin type resin are especially preferable.

前述透明基材薄膜的厚度通常以30~250μm為佳,而較佳為45~200μm。The thickness of the transparent base film is usually from 30 to 250 μm, preferably from 45 to 200 μm.

(2-2)透明導電層22 透明導電層的構成材料沒有特別限定,可使用選自於由銦、錫、鋅、鎵、銻、鈦、矽、鋯、鎂、鋁、金、銀、銅、鈀、鎢所構成群組中之至少1種金屬的金屬氧化物。該金屬氧化物亦可依需要而進一步含有示於上述群組中之金屬原子。宜使用例如含氧化錫之氧化銦(ITO)、含銻之氧化錫(ATO)等。(2-2) Transparent Conductive Layer 22 The constituent material of the transparent conductive layer is not particularly limited, and may be selected from the group consisting of indium, tin, zinc, gallium, germanium, titanium, lanthanum, zirconium, magnesium, aluminum, gold, silver, and copper. a metal oxide of at least one metal selected from the group consisting of palladium and tungsten. The metal oxide may further contain a metal atom shown in the above group as needed. For example, tin oxide-containing indium oxide (ITO), antimony-containing tin oxide (ATO), or the like is preferably used.

透明導電層的厚度未特別受限,惟為求作成其表面阻抗為1×103 Ω/□以下之具有良好導電性的連續覆膜,厚度宜設為10nm以上。一旦膜厚過厚,就會導致透明性的低落等,因此宜在15~35nm之範圍內,而較佳為20~30nm。The thickness of the transparent conductive layer is not particularly limited, but a continuous film having a surface conductivity of 1 × 10 3 Ω/□ or less and having good conductivity is preferably obtained, and the thickness is preferably set to 10 nm or more. When the film thickness is too thick, transparency is lowered, and the like, and therefore it is preferably in the range of 15 to 35 nm, and preferably 20 to 30 nm.

透明導電層之形成方法沒有特別限定,可採用習所周知之方法。具體而言可例示如真空蒸鍍法、濺鍍法、離子電鍍法。又,亦可根據所需膜厚而採用適當之方法。此外,形成透明導電層後,可視需要在100~150℃之範圍內施以退火處理進行結晶化。The method of forming the transparent conductive layer is not particularly limited, and a well-known method can be employed. Specifically, a vacuum vapor deposition method, a sputtering method, and an ion plating method can be exemplified. Further, an appropriate method may be employed depending on the desired film thickness. Further, after the transparent conductive layer is formed, it may be subjected to annealing treatment in the range of 100 to 150 ° C for crystallization.

(2-3-1)中間層23:折射率調整層 折射率調整層可利用無機物、有機物或無機物與有機物之混合物而形成。例如,無機物可舉如NaF(1.3)、Na3 AlF6 (1.35)、LiF(1.36)、MgF2 (1.38)、CaF2 (1.4)、BaF2 (1.3)、SiO2 (1.46)、LaF3 (1.55)、CeF3 (1.63)、Al2 O3 (1.63)等無機物〔上述各材料之( )內的數値為光之折射率〕。又,有機物可舉如丙烯酸樹脂、胺甲酸乙酯樹脂、三聚氰胺樹脂、醇酸樹脂、矽氧烷系聚合物、有機矽烷縮合物等,可使用該等有機物作為基底聚合物。該等基底聚合物係至少使用1種。(2-3-1) Intermediate Layer 23: Refractive Index Adjustment Layer The refractive index adjustment layer can be formed using a mixture of an inorganic substance, an organic substance, or an inorganic substance and an organic substance. For example, the inorganic substance may, for example, be NaF (1.3), Na 3 AlF 6 (1.35), LiF (1.36), MgF 2 (1.38), CaF 2 (1.4), BaF 2 (1.3), SiO 2 (1.46), LaF 3 . (1.55), inorganic substances such as CeF 3 (1.63) and Al 2 O 3 (1.63) [the number 値 in ( ) of each of the above materials is the refractive index of light]. Further, the organic substance may, for example, be an acrylic resin, a urethane resin, a melamine resin, an alkyd resin, a decane-based polymer or an organic decane condensate, and these organic substances may be used as the base polymer. At least one of these base polymers is used.

折射率調整層可具有平均粒徑為1nm~500nm的奈米微粒子,並宜為5nm~300nm。折射率調整層中的奈米微粒子含量宜為0.1重量%~90重量%、較佳為10重量%~80重量%,更佳為20重量%~70重量%。藉由令折射率調整層中含有奈米微粒子,可容易進行折射率調整層本身之折射率的調整。The refractive index adjusting layer may have nano fine particles having an average particle diameter of from 1 nm to 500 nm, and preferably from 5 nm to 300 nm. The content of the nanoparticles in the refractive index adjusting layer is preferably from 0.1% by weight to 90% by weight, preferably from 10% by weight to 80% by weight, more preferably from 20% by weight to 70% by weight. By including the nanoparticles in the refractive index adjusting layer, the refractive index of the refractive index adjusting layer itself can be easily adjusted.

形成奈米微粒子的無機氧化物可舉例如氧化矽(矽石)、中空奈米氧化矽、氧化鈦、氧化鋁、氧化鋅、氧化錫、氧化鋯等微粒子。其等之中,宜為氧化矽(矽石)、氧化鈦、氧化鋁、氧化鋅、氧化錫、氧化鋯的微粒子。其等可單獨使用1種亦可併用2種以上。Examples of the inorganic oxide forming the nanoparticles include fine particles such as cerium oxide ( vermiculite), hollow nano cerium oxide, titanium oxide, aluminum oxide, zinc oxide, tin oxide, and zirconium oxide. Among them, fine particles of cerium oxide ( vermiculite), titanium oxide, aluminum oxide, zinc oxide, tin oxide, and zirconium oxide are preferable. These may be used alone or in combination of two or more.

前述折射率調整層的厚度並未特別受限,但從光學設計及避免從前述透明基材薄膜產生寡聚物發生之效果的觀點來看,通常以10nm~200nm為佳、20nm~150nm較佳、20nm~130nm更佳。The thickness of the refractive index adjusting layer is not particularly limited, but is preferably from 10 nm to 200 nm, preferably from 20 nm to 150 nm, from the viewpoint of optical design and avoidance of the effect of generating oligomers from the transparent substrate film. 20nm~130nm is better.

(2-3-2)中間層23:硬塗層 硬塗層係利用含有機成分(基底聚合物)等之塗覆液來形成,硬塗層係利用含有機成分(基底聚合物)等之塗覆液來形成,藉由形成硬塗層讓局部過大的凹凸被填埋,藉此可提高透明導電層的表面一致性,並可提高透明導電性薄膜的耐撓曲性。(2-3-2) Intermediate layer 23: The hard coat layer is formed by using a coating liquid containing an organic component (base polymer) or the like, and the hard coat layer is made of an organic component (base polymer) or the like. By forming a coating liquid, a portion of the excessively large unevenness is filled by forming a hard coat layer, whereby the surface uniformity of the transparent conductive layer can be improved, and the flexural resistance of the transparent conductive film can be improved.

前述硬塗層的厚度未特別受限,惟0.5μm以上且3μm以下為佳,0.8μm以上且2μm以下較佳。The thickness of the hard coat layer is not particularly limited, but is preferably 0.5 μm or more and 3 μm or less, and more preferably 0.8 μm or more and 2 μm or less.

前述有機成分沒有特別限定,可使用紫外線硬化型樹脂、熱硬化型樹脂、熱可塑性樹脂等。從加工速度快或抑制對透明基材薄膜之熱傷害的觀點來看,係使用紫外線硬化型樹脂尤佳。如此之紫外線硬化型樹脂,係例如可使用經由光(紫外線)來硬化之具有丙烯酸酯基及甲基丙烯酸酯基中至少一種基團的硬化型化合物。硬化型化合物可舉例如聚矽氧樹脂、聚酯樹脂、聚醚樹脂、環氧樹脂、胺基甲酸酯樹脂、醇酸樹脂、螺縮醛樹脂、聚丁二烯樹脂、聚硫醇多烯樹脂、多價醇等多官能化合物之丙烯酸酯或甲基丙烯酸酯等的寡聚物或預聚物等。其等可單獨使用1種亦可併用2種以上。The organic component is not particularly limited, and an ultraviolet curable resin, a thermosetting resin, a thermoplastic resin or the like can be used. From the viewpoint of fast processing speed or suppression of thermal damage to the transparent substrate film, it is particularly preferable to use an ultraviolet curable resin. As the ultraviolet curable resin, for example, a curable compound having at least one of an acrylate group and a methacrylate group which is cured by light (ultraviolet rays) can be used. The hardening type compound may, for example, be a polyoxyl resin, a polyester resin, a polyether resin, an epoxy resin, a urethane resin, an alkyd resin, a acetal resin, a polybutadiene resin, or a polythiol polyene. An oligomer or prepolymer such as an acrylate or methacrylate of a polyfunctional compound such as a resin or a polyvalent alcohol. These may be used alone or in combination of two or more.

硬塗層可含有無機成分。無機成分可舉例如氧化矽(矽石)、氧化鈦、氧化鋁、氧化鋅、氧化錫、氧化鋯等無機氧化物的微粒子乃至微粉末。無機成分從硬塗層之防止著色及透明性之觀點等來看,係以最頻(mode)粒徑1nm~100nm的奈米粒子為佳、5nm~80nm之範圍的奈米粒子較佳、10nm~60nm之範圍的奈米粒子更佳。如此這般,若奈米粒子之最頻粒徑小,則可見光不易發生散射,即便有機成分與奈米粒子之折射率不同時,硬塗層的霧度大幅提高的狀況仍會受抑。The hard coat layer may contain an inorganic component. Examples of the inorganic component include fine particles or fine powders of inorganic oxides such as cerium oxide ( vermiculite), titanium oxide, aluminum oxide, zinc oxide, tin oxide, and zirconium oxide. From the viewpoint of preventing coloration and transparency of the hard coat layer, the inorganic component is preferably a nanoparticle having a mode diameter of 1 nm to 100 nm, preferably a nanoparticle having a range of 5 nm to 80 nm, and 10 nm. Nanoparticles in the range of ~60 nm are more preferred. As described above, when the particle size of the nanoparticle is small, the visible light is less likely to be scattered, and even if the refractive index of the organic component and the nanoparticle are different, the haze of the hard coat layer is greatly improved.

以控制表面凹凸或光學特性等為目的的情形下,硬塗層除上述奈米粒子外亦可含有粒徑較奈米粒子更大的粗粒子,或以其取代奈米粒子。粗粒子之最頻粒徑必須考量與硬塗層厚度的關係,惟以0.5μm~3.0μm之範圍為佳、1.0μm~2.5μm較佳、1.5μm~2.0μm更佳。In the case of controlling surface irregularities, optical characteristics, and the like, the hard coat layer may contain coarse particles having a larger particle diameter than the nanoparticles, or may be substituted for the nano particles in addition to the above nanoparticles. The most frequent particle size of the coarse particles must be considered in relation to the thickness of the hard coat layer, preferably in the range of 0.5 μm to 3.0 μm, preferably 1.0 μm to 2.5 μm, and more preferably 1.5 μm to 2.0 μm.

硬塗層的形成材料除了有機成分、無機成分及粗粒子外,亦可再外加各種添加劑。添加劑可使用例如用於使有機成分硬化形成硬塗層的聚合引發劑、流平劑、顔料、充填劑、分散劑、可塑劑、紫外線吸收劑、界面活性劑、抗氧化劑、搖變劑等。硬塗層之形成材料可適當地含有溶劑。In addition to the organic component, the inorganic component, and the coarse particles, the hard coat layer forming material may be further added with various additives. As the additive, for example, a polymerization initiator, a leveling agent, a pigment, a filler, a dispersant, a plasticizer, a UV absorber, a surfactant, an antioxidant, a shaker, or the like for hardening the organic component to form a hard coat layer can be used. The material for forming the hard coat layer may suitably contain a solvent.

(2-3-3)中間層23:裂紋防止層 裂紋防止層可使用例如日本專利特開2017-224269號公報記載為硬化樹脂層者。裂紋防止層即便在上述透明基材薄膜的厚度大的情況下,仍能防止透明導電層的裂紋而發揮所欲之電氣特性。(2-3-3) Intermediate layer 23: Crack-preventing layer The crack-preventing layer can be described as a cured resin layer, for example, in JP-A-H99-224269. The crack preventing layer can prevent cracks of the transparent conductive layer and exhibit desired electrical characteristics even when the thickness of the transparent base film is large.

裂紋防止層的厚度未特別受限,從耐濕熱性、防止從前述透明樹脂薄膜1產生寡聚物之效果、及光學特性的觀點來看係150nm以下,並宜為20~100nm左右,較佳為30~50nm。此外,裂紋防止層2設置2層以上時,各層厚度為20~60nm左右,並宜為25~55nm。The thickness of the crack preventing layer is not particularly limited, and is preferably 150 nm or less, and preferably about 20 to 100 nm, from the viewpoint of moisture heat resistance, effect of preventing generation of oligomers from the transparent resin film 1, and optical properties. It is 30~50nm. Further, when the crack preventing layer 2 is provided in two or more layers, the thickness of each layer is about 20 to 60 nm, and preferably 25 to 55 nm.

裂紋防止層可使用例如含有重量平均分子量1500以上之環氧樹脂的樹脂組成物經硬化而成的裂紋防止層。前述環氧樹脂宜為橡膠改質環氧樹脂。藉此,可對裂紋防止層適當地提供韌性或耐衝撃性。用於改質環氧樹脂的橡膠成分沒有特別限定,可舉如丁二烯橡膠、丙烯腈丁二烯橡膠、苯乙烯丁二烯橡膠、丁基橡膠、腈橡膠、天然橡膠、異戊二烯橡膠、氯丁二烯橡膠、乙烯-丙烯橡膠、胺基甲酸酯橡膠、聚矽氧橡膠、氟橡膠、乙烯-乙酸乙烯酯橡膠、環氧氯丙烷橡膠等。其中就韌性或耐藥品性之觀點而言,係以丁二烯橡膠為佳。橡膠改質環氧樹脂可單獨使用亦可將2種以上併用。As the crack preventing layer, for example, a crack preventing layer obtained by curing a resin composition containing an epoxy resin having a weight average molecular weight of 1,500 or more can be used. The aforementioned epoxy resin is preferably a rubber modified epoxy resin. Thereby, the crack prevention layer can be appropriately provided with toughness or impact resistance. The rubber component used for the modified epoxy resin is not particularly limited, and examples thereof include butadiene rubber, acrylonitrile butadiene rubber, styrene butadiene rubber, butyl rubber, nitrile rubber, natural rubber, and isoprene. Rubber, chloroprene rubber, ethylene-propylene rubber, urethane rubber, polyoxyethylene rubber, fluororubber, ethylene-vinyl acetate rubber, epichlorohydrin rubber, and the like. Among them, from the viewpoint of toughness or chemical resistance, butadiene rubber is preferred. The rubber-modified epoxy resin may be used alone or in combination of two or more.

上述樹脂組成物宜含有硬化促進劑。藉此可使環氧樹脂的硬化反應迅速且充分地進行,而可形成膜強度高的硬化物膜。硬化促進劑沒有特別限定,可舉例如辛烷酸、硬脂酸、乙醯丙酮、環烷酸、柳酸等有機酸的鋅、銅、鐵、銻等有機金屬鹽;金屬螯合物等。其中,硬化促進劑以含銻為佳。含銻之硬化促進劑能夠使樹脂組成物的硬化反應迅速且充分地進行,能有效形成更強固的硬化物膜。此外,硬化促進劑可單獨使用或將2種以上組合使用。The above resin composition preferably contains a hardening accelerator. Thereby, the hardening reaction of the epoxy resin can be quickly and sufficiently performed, and a cured film having a high film strength can be formed. The hardening accelerator is not particularly limited, and examples thereof include zinc, an organic metal salt such as copper, iron, or cerium of an organic acid such as octanoic acid, stearic acid, acetamidine, naphthenic acid or salicylic acid; and a metal chelate compound. Among them, the hardening accelerator is preferably cerium-containing. The hardening accelerator containing cerium can rapidly and sufficiently carry out the hardening reaction of the resin composition, and can effectively form a stronger cured film. Further, the hardening accelerators may be used singly or in combination of two or more.

硬化促進劑的含量沒有特別限定,相對於樹脂組成物中所含具環氧基之化合物的總量(100重量份)係0.005~5重量份為佳、較佳為0.01~4重量份,更佳為0.01~1重量份。硬化促進劑的含量一旦低於上述下限,就會有硬化促進效果變得不足的狀況。The content of the curing accelerator is not particularly limited, and is preferably 0.005 to 5 parts by weight, preferably 0.01 to 4 parts by weight, based on the total amount (100 parts by weight) of the epoxy group-containing compound contained in the resin composition. It is preferably 0.01 to 1 part by weight. When the content of the hardening accelerator is less than the above lower limit, the hardening promoting effect may be insufficient.

前述樹脂組成物中,除環氧樹脂外,亦可適當摻混丙烯酸樹脂、胺基甲酸酯樹脂、醯胺樹脂、聚矽氧樹脂等。再者於樹脂組成物中亦可加入各種添加劑。添加劑可使用例如流平劑、顔料、充填劑、分散劑、可塑劑、紫外線吸收劑、界面活性劑、抗氧化劑、搖變劑等。In the resin composition, in addition to the epoxy resin, an acrylic resin, a urethane resin, a guanamine resin, a polyoxymethylene resin or the like may be appropriately blended. Further, various additives may be added to the resin composition. As the additive, for example, a leveling agent, a pigment, a filler, a dispersant, a plasticizer, a UV absorber, a surfactant, an antioxidant, a shaker, or the like can be used.

(2-3-4)中間層23:易接著劑層 形成前述易接著層之基底聚合物係可使用例如具有聚酯骨架、聚醚骨架、聚碳酸酯骨架、聚胺基甲酸酯骨架、聚矽氧系、聚醯胺骨架、聚醯亞胺骨架、聚乙烯醇骨架等之各種樹脂。該等聚合物樹脂可單獨使用1種,或組合2種以上來使用。(2-3-4) Intermediate Layer 23: Easy Adhesive Layer The base polymer of the above-mentioned easy-adhesion layer can be used, for example, having a polyester skeleton, a polyether skeleton, a polycarbonate skeleton, a polyurethane skeleton, Various resins such as polyoxymethylene, polyamine skeleton, polyimine skeleton, and polyvinyl alcohol skeleton. These polymer resins may be used alone or in combination of two or more.

又,在形成易接著層時,亦可於前述基底聚合物中加入添加劑。具體上可進一步使用黏著賦予劑、紫外線吸收劑、耐熱安定劑等安定劑等。易接著層的膜厚宜為0.01~20μm。Further, when an easy-adhesion layer is formed, an additive may be added to the base polymer. Specifically, a stabilizer such as an adhesion-imparting agent, an ultraviolet absorber, or a heat-resistant stabilizer can be further used. The film thickness of the easy-adhesion layer is preferably 0.01 to 20 μm.

(2-4)防結塊層24 防結塊層為含有黏結劑樹脂(基底聚合物)及粒子之樹脂組成物的硬化物層,於表面具有平坦部及隆起部,藉由其等可使操作性與低反射特性有高水準的發揮。防結塊層之平坦部的厚度未特別限定,惟以200nm以上且30μm以下為佳、500nm以上且10μm以下較佳、800nm以上且5μm以下更佳。(2-4) Anti-caking layer 24 The anti-caking layer is a cured layer containing a resin composition of a binder resin (base polymer) and particles, and has a flat portion and a ridge portion on the surface, and the like. The operability and low reflection characteristics are of a high standard. The thickness of the flat portion of the anti-caking layer is not particularly limited, but is preferably 200 nm or more and 30 μm or less, more preferably 500 nm or more and 10 μm or less, and more preferably 800 nm or more and 5 μm or less.

粒子之最頻粒徑可考量其與最外表面層之隆起部的尺寸或防結塊層之平坦部的厚度的關係等而作適當設定,沒有特別限制。此外,從充分賦予透明導電性薄膜抗結塊性並充分抑制光散射等的觀點來看,粒子之最頻粒徑係500nm以上且30μm以下為佳、800nm以上且20μm以下較佳、1μm以上且10μm以下較佳。此外,本說明書中,「最頻粒徑」係指顯示粒子分布極大値的粒徑,藉由以流動式粒子影像分析裝置(Sysmex公司製,製品名「FPIA-3000S」)在預定條件下(Sheath液:醋酸乙酯,測定模式:HPF測定,測定方式:全計數)進行測定而得。測定試料係使用以醋酸乙酯將粒子稀釋成1.0重量%並使用超音波洗淨機使其均勻分散而成者。The virgin particle diameter of the particles can be appropriately set in consideration of the relationship between the size of the ridge portion of the outermost surface layer or the thickness of the flat portion of the anti-caking layer, and the like, and is not particularly limited. In addition, from the viewpoint of sufficiently imparting anti-caking property to the transparent conductive film and sufficiently suppressing light scattering, the particle diameter of the particles is preferably 500 nm or more and 30 μm or less, more preferably 800 nm or more and 20 μm or less, and 1 μm or more. It is preferably 10 μm or less. In addition, in this specification, "the most frequent particle size" is a particle diameter which shows the particle distribution extremely large, and it is a predetermined condition by the flow particle image analysis apparatus (The product name "FPIA-3000S" by Sysmex company). Sheath solution: ethyl acetate, measurement mode: HPF measurement, measurement method: full count) was measured. The measurement sample was obtained by diluting the particles to 1.0% by weight with ethyl acetate and uniformly dispersing the particles using an ultrasonic cleaner.

隆起部的高度係考量所需潤滑性等而作設定。隆起部,即防結塊層自平坦部起往上突起部分的高度可利用防結塊層之平坦部的厚度或粒子最頻粒徑等來作控制。隆起部的高度宜為100nm以上且3μm以下,較佳為200nm以上且2μm以下,更佳為300nm以上且1.5μm以下。藉由將隆起部的高度設定為上述範圍,便能在滿足透明導電性薄膜之耐結塊性的同時,充分抑制光散射或消偏光。The height of the ridge is set by considering the required lubricity and the like. The ridge portion, that is, the height of the anti-caking layer from the flat portion to the upper protruding portion can be controlled by the thickness of the flat portion of the anti-caking layer or the particle size of the particle. The height of the ridge portion is preferably 100 nm or more and 3 μm or less, preferably 200 nm or more and 2 μm or less, more preferably 300 nm or more and 1.5 μm or less. By setting the height of the ridge portion to the above range, it is possible to sufficiently suppress light scattering or depolarization while satisfying the blocking resistance of the transparent conductive film.

粒子為多分散粒子及單分散粒子任一者均可,惟若考量賦與隆起部的容易性和光散射防止性等,則以單分散粒子為宜。於單分散粒子之情形時,粒子的粒徑與最頻粒徑可視為實質相同。The particles may be any of the polydisperse particles and the monodisperse particles, and it is preferable to use monodisperse particles in consideration of the easiness of imparting the ridge portion and the light scattering prevention property. In the case of monodisperse particles, the particle size of the particles can be considered to be substantially the same as the most frequent particle size.

防結塊層中的粒子含量,相對於100重量份之樹脂組成物固體成分係0.01~5重量份為佳、0.02~1重量份較佳、0.05~0.5重量份更佳。The content of the particles in the anti-caking layer is preferably 0.01 to 5 parts by weight, more preferably 0.02 to 1 part by weight, more preferably 0.05 to 0.5 part by weight, per 100 parts by weight of the resin composition solid content.

形成防結塊層的樹脂組成物中的黏結劑樹脂可無特別限制地使用可讓粒子分散、形成防結塊層後之皮膜具有足夠強度、並具有透明性的樹脂。可用的黏結劑樹脂可舉如熱硬化型樹脂、熱可塑型樹脂、紫外線硬化型樹脂、電子束硬化型樹脂、二液混合型樹脂等,惟其等當中以紫外線硬化型樹脂為宜,其可藉由利用紫外線照射之硬化處理以簡單的加工操作高效率地形成皮膜。The binder resin in the resin composition forming the anti-caking layer can be used without any particular limitation, and a resin which can disperse the particles and form an anti-caking layer can have sufficient strength and transparency. The usable binder resin may be a thermosetting resin, a thermoformable resin, an ultraviolet curable resin, an electron beam curing resin, a two-liquid mixed resin, etc., but among them, an ultraviolet curable resin is preferable, and it may be borrowed. The film is formed efficiently by a simple processing operation by a hardening treatment by ultraviolet irradiation.

紫外線硬化型樹脂可舉如聚酯系、丙烯酸系、胺基甲酸酯系、醯胺系、聚矽氧系、環氧基系等各種物質,包括紫外線硬化型之單體、寡聚物、聚合物等。適宜使用的紫外線硬化型樹脂係例如具有紫外線聚合性官能基的樹脂,其中可舉如包含具有2個以上(特別是3~6個)該官能基的丙烯酸系單體或寡聚物成分的樹脂。又,紫外線硬化型樹脂中可摻混紫外線聚合引發劑。Examples of the ultraviolet curable resin include polyester, acrylic, urethane, guanamine, polyfluorene, and epoxy groups, and include ultraviolet curable monomers and oligomers. Polymers, etc. The ultraviolet curable resin to be used is, for example, a resin having an ultraviolet polymerizable functional group, and examples thereof include a resin containing an acrylic monomer or oligomer component having two or more (particularly 3 to 6) functional groups. . Further, an ultraviolet polymerization initiator may be blended in the ultraviolet curable resin.

樹脂組成物中除了前述材料外,亦可使用流平劑、搖變劑、抗靜電劑、可塑劑、界面活性劑、抗氧化劑、硬化觸媒、及紫外線吸收劑等添加劑。若使用搖變劑,則會有益於形成微細凹凸形狀表面的突起粒子。該等添加劑的含量相對於100重量份之紫外線硬化型樹脂通常宜設為15重量份以下左右,並以0.01~15重量份為佳。形成防結塊層的樹脂組成物可適當地含有溶劑。In addition to the above materials, additives such as a leveling agent, a rocking agent, an antistatic agent, a plasticizer, a surfactant, an antioxidant, a hardening catalyst, and an ultraviolet absorber may be used in the resin composition. If a rocking agent is used, it is advantageous for forming the protruding particles on the surface of the fine uneven shape. The content of the additives is usually preferably 15 parts by weight or less based on 100 parts by weight of the ultraviolet curable resin, and preferably 0.01 to 15 parts by weight. The resin composition forming the anti-caking layer may suitably contain a solvent.

防結塊層2所含有的粒子可無特別限制地使用各種金屬氧化物、玻璃、塑膠等具透明性之物。可舉例如氧化矽、氧化鋁、二氧化鈦、氧化鋯、氧化鈣等無機系粒子,聚甲基丙烯酸甲酯、聚苯乙烯、聚胺基甲酸酯、丙烯酸系樹脂、丙烯酸類-苯乙烯共聚物、苯胍胺、三聚氰胺、聚碳酸酯等各種聚合物構成之交聯或未交聯的有機系粒子或聚矽氧系粒子等。前述粒子可適當選擇1種或2種以上來使用,並以有機系粒子為佳。從折射率的觀點來看,有機系粒子以丙烯酸系樹脂為佳。The particles contained in the anti-caking layer 2 can be used without any particular limitation, and various transparent materials such as metal oxides, glass, and plastics can be used. Examples thereof include inorganic particles such as cerium oxide, aluminum oxide, titanium oxide, zirconium oxide, and calcium oxide, and polymethyl methacrylate, polystyrene, polyurethane, acrylic resin, and acrylic-styrene copolymer. A crosslinked or uncrosslinked organic particle or polyoxynoid particle composed of various polymers such as benzoguanamine, melamine, and polycarbonate. The particles may be used singly or in combination of two or more kinds, and organic particles are preferred. From the viewpoint of the refractive index, the organic particles are preferably an acrylic resin.

實施例 以下藉由實施例以具體說明本發明,但本發明並不受此等實施例所限定。此外,各例中的份及%除非特別記載否則均為重量基準。EXAMPLES Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited by the examples. In addition, parts and % in each case are based on weight unless otherwise specified.

以下,測定所得化合物之物性時使用的機器及測定條件係如同下述。 (GC-MS) (股)島津製作所製,氣相層析質量分析儀GCMS-QP2010Plus(EI法) (LC/MS) (股)島津製作所製, 高速液體層析質量分析儀LCMS-2010EV(ESI法)Hereinafter, the apparatus and measurement conditions used when measuring the physical properties of the obtained compound are as follows. (GC-MS) (share) manufactured by Shimadzu Corporation, gas chromatography mass spectrometer GCMS-QP2010Plus (EI method) (LC/MS) (share) manufactured by Shimadzu Corporation, high-speed liquid chromatography mass spectrometer LCMS-2010EV (ESI law)

<製造例1> 化合物IM3、化合物IM5及化合物IM6的合成 化合物IM3係依以下方法合成。反應式如下所示。<Production Example 1> Synthesis of Compound IM3, Compound IM5, and Compound IM6 The compound IM3 was synthesized by the following method. The reaction formula is as follows.

[化學式15] [Chemical Formula 15]

(化合物IM2的合成) 於Journal of American Chemical Society 1954,76,1879所記載之2-二甲基胺基-4-羥基-6-甲基嘧啶之合成中,將N,N-二甲基胍硫酸鹽換成完全比照BE639386所載方法而獲得的1,1-二丁基胍鹽酸鹽,除此之外以相同方式於附冷卻管及溫度計的1L四口燒瓶進行合成,獲得化合物IM1。使用化合物IM1,以和Journal of the Chemical Society 1957,4845所載方法相同的程序,經由李莫-帝曼(Reimer-Tiemann)反應而甲醯化,獲得化合物IM2(18.4g,收率69%)。 GC-MS:m/z=265([M] )(Synthesis of Compound IM2) In the synthesis of 2-dimethylamino-4-hydroxy-6-methylpyrimidine described in Journal of American Chemical Society 1954, 76, 1879, N,N-dimethylhydrazine The sulfate was replaced with 1,1-dibutylphosphonium hydrochloride obtained in a manner completely in accordance with the method of BE 639 386, except that it was synthesized in the same manner in a 1 L four-necked flask equipped with a cooling tube and a thermometer to obtain a compound IM1. Using the compound IM1, the same procedure as that described in the Journal of the Chemical Society 1957, 4845 was carried out by the Reimer-Tiemann reaction to obtain the compound IM2 (18.4 g, yield 69%). . GC-MS: m/z = 265 ([M] + )

(化合物IM3的合成) 於附冷卻管及溫度計之100mL四口燒瓶中將化合物IM2(15.8g)、碘乙烷(14g)(東京化成工業股份公司製)、碳酸鉀(14g)及二甲基甲醯胺(DMF)(60mL)的混合液於70℃下攪拌3小時,之後靜置冷卻至室溫。將反應液排至水(300mL)中,並以甲苯(300mL)萃取。藉由將有機層減壓濃縮而獲得化合物IM3(17.3g,收率99%)。 GC-MS:m/z=293([M] )(Synthesis of Compound IM3) Compound IM2 (15.8 g), ethyl iodide (14 g) (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium carbonate (14 g), and dimethyl group were placed in a 100 mL four-necked flask equipped with a cooling tube and a thermometer. A mixture of formamide (DMF) (60 mL) was stirred at 70 ° C for 3 hours, and then allowed to stand to cool to room temperature. The reaction solution was poured into water (300 mL) and extracted with toluene (300 mL). The compound IM3 (17.3 g, yield 99%) was obtained by concentration of the organic layer under reduced pressure. GC-MS: m/z = 293 ([M] + )

化合物IM5及化合物IM6係依以下方法合成。反應式如下所示。下式中的p為5之化合物係化合物IM5;p為6之化合物係化合物IM6。The compound IM5 and the compound IM6 were synthesized in the following manner. The reaction formula is as follows. In the following formula, p is a compound of compound IM5 of 5; and p is a compound of compound IM6 of 6.

[化學式16] [Chemical Formula 16]

(化合物IM5的合成) 於附冷卻管及溫度計之50mL四口燒瓶中裝入化合物IM2(2.7g)、1,5-二溴戊烷(1.1g)(東京化成工業股份公司製)、碳酸鉀(1.7g)及DMF(20mL),於80℃下攪拌2.5小時。將反應液排至水中,將所析出的結晶過濾並取出。以甲醇洗淨該結晶,獲得2.1g的化合物IM5(收率71%)。(Synthesis of Compound IM5) In a 50 mL four-necked flask equipped with a cooling tube and a thermometer, a compound IM2 (2.7 g), 1,5-dibromopentane (1.1 g) (manufactured by Tokyo Chemical Industry Co., Ltd.), and potassium carbonate were charged. (1.7 g) and DMF (20 mL) were stirred at 80 ° C for 2.5 hours. The reaction solution was discharged into water, and the precipitated crystals were filtered and taken out. The crystal was washed with methanol to obtain 2.1 g of the compound IM5 (yield: 71%).

(化合物IM6的合成) 除了將化合物IM5之合成中的1,5-二溴戊烷換成1,6-二溴己烷(東京化成工業股份公司製)外,以相同程序獲得化合物IM6(收率82%)。(Synthesis of Compound IM6) The compound IM6 was obtained by the same procedure except that the 1,5-dibromopentane in the synthesis of the compound IM5 was replaced by 1,6-dibromohexane (manufactured by Tokyo Chemical Industry Co., Ltd.). Rate 82%).

<製造例2> 合成化合物C1~C5。化合物C1係以下式表示之化合物。<Production Example 2> Compounds C1 to C5 were synthesized. The compound C1 is a compound represented by the following formula.

[化學式17] [Chemical Formula 17]

化合物C2~C4係以下式表示之化合物。化合物C2於下式中的R為2,6-二-t-丁基-4-甲基環己基。化合物C3於下式中的R為4-t-丁基環己基。化合物C4於下式中的R為t-丁基。The compound C2 to C4 is a compound represented by the following formula. R of the compound C2 in the following formula is 2,6-di-t-butyl-4-methylcyclohexyl. R of the compound C3 in the following formula is 4-t-butylcyclohexyl. The compound C4 in the following formula is R-t-butyl.

[化學式18] [Chemical Formula 18]

化合物C5係以下式表示之化合物。The compound C5 is a compound represented by the following formula.

[化學式19] [Chemical Formula 19]

獲得化合物C1~C4之反應式係如下所示。式中的p所及對應的化合物係示於表1。合成所使用的化合物IM12、化合物IM13及化合物IM14之結構表示如下。The reaction formula for obtaining the compounds C1 to C4 is shown below. The p in the formula and the corresponding compound are shown in Table 1. The structures of the compound IM12, the compound IM13, and the compound IM14 used for the synthesis are shown below.

[化學式20] [Chemical Formula 20]

[表1] [Table 1]

[化學式21] [Chemical Formula 21]

(化合物C1的合成) 於附冷卻管及溫度計的50mL四口燒瓶中混合化合物IM6(2.0g)、完全比照日本專利特開2000-310841號公報所載方法合成的化合物IM12(2.0g)、哌啶(0.06g)及乙醇(13mL),於75℃下攪拌18小時。靜置冷卻至室溫,將析出的結晶過濾取出並以乙醇洗淨,獲得化合物C1(3.5g,收率93%)。 LC-MS:m/z=1164([M+H] )(Synthesis of Compound C1) The compound IM6 (2.0 g) was synthesized in a 50 mL four-necked flask equipped with a cooling tube and a thermometer, and the compound IM12 (2.0 g) synthesized by the method described in Japanese Patent Laid-Open Publication No. 2000-310841, Pyridine (0.06 g) and ethanol (13 mL) were stirred at 75 ° C for 18 hours. The solution was cooled to room temperature, and the precipitated crystals were filtered and washed with ethanol to give Compound C1 (3.5 g, yield 93%). LC-MS: m/z = 1164 ([M+H] + )

(化合物C2的合成) 除了將化合物C1之合成中的化合物IM6換成化合物IM5以外,以相同程序獲得化合物C2(收率81%)。 LC-MS:m/z1150([M+H] )(Synthesis of Compound C2) Compound C2 was obtained by the same procedure except that the compound IM6 in the synthesis of the compound C1 was changed to the compound IM5 (yield: 81%). LC-MS: m/z 1150 ([M+H] + )

(化合物C3的合成) 將化合物C1之合成中的化合物IM6換成化合物IM5、並將化合物IM12換成以和化合物IM12之合成相同方式獲得的化合物IM13,除此之外以相同程序獲得化合物C3(收率61%)。 LC-MS:m/z=1010([M+H] )(Synthesis of Compound C3) The compound IM6 in the synthesis of the compound C1 was replaced with the compound IM5, and the compound IM12 was replaced with the compound IM13 obtained in the same manner as the synthesis of the compound IM12, except that the compound C3 was obtained by the same procedure ( Yield 61%). LC-MS: m/z = 1010 ([M+H] + )

(化合物C4的合成) 將化合物C1之合成中的化合物IM6換成化合物IM5、並將化合物IM12換成化合物IM14(東京化成工業股份公司製),除此之外以相同程序獲得化合物C4(收率80%)。 LC-MS:m/z=846([M+H] )(Synthesis of the compound C4) The compound IM6 in the synthesis of the compound C1 was replaced with the compound IM5, and the compound IM12 was replaced with the compound IM14 (manufactured by Tokyo Chemical Industry Co., Ltd.), except that the compound C4 was obtained by the same procedure (yield) 80%). LC-MS: m/z = 846 ([M+H] + )

(化合物C5的合成) 於附冷卻管及溫度計的25mL四口燒瓶中,將化合物IM3(1.2g)、IM12(1.5g)、哌啶(0.02g)、乙醇(4mL)的混合液於75℃下攪拌1小時。靜置冷卻至室溫,將析出的結晶過濾取出。以乙醇洗淨所得結晶,獲得1.9g的化合物C5(收率80%)。反應式如下所示。 LC-MS:m/z=569([M+H] )(Synthesis of Compound C5) A mixture of compound IM3 (1.2 g), IM12 (1.5 g), piperidine (0.02 g), and ethanol (4 mL) was placed at 75 ° C in a 25 mL four-neck flask equipped with a cooling tube and a thermometer. Stir under 1 hour. The mixture was allowed to stand to cool to room temperature, and the precipitated crystals were removed by filtration. The obtained crystals were washed with ethanol to obtain 1.9 g of Compound C5 (yield: 80%). The reaction formula is as follows. LC-MS: m/z = 569 ([M+H] + )

[化學式22] [Chemical Formula 22]

<比較製造例(比較例化合物)><Comparative Production Example (Comparative Example Compound)>

[化學式23] [Chemical Formula 23]

(比較例化合物Z1的合成) 完全比照日本專利特開2011-184414號公報所載方法進行合成,獲得比較例化合物Z1。(Synthesis of Comparative Compound Z1) The synthesis was carried out in exactly the same manner as in the method of JP-A-2011-184414, and Comparative Compound Z1 was obtained.

(比較例化合物Z2的合成) 完全比照日本專利特開2014-194508號公報所載方法進行合成,獲得比較例化合物Z2。(Synthesis of Comparative Example Compound Z2) The synthesis was carried out in the same manner as in the method of JP-A-2014-194508, to obtain a comparative example compound Z2.

(比較例化合物Z3的合成)(Synthesis of Comparative Compound Z3)

完全比照日本專利特開2009-067973號公報所載方法進行合成,獲得比較例化合物Z3。 (比較例化合物Z4的合成) 完全比照US2986528號公報所載方法進行合成,獲得比較例化合物Z4。The synthesis was carried out in exactly the same manner as in the method disclosed in Japanese Patent Laid-Open Publication No. 2009-067973, and the comparative compound Z3 was obtained. (Synthesis of Comparative Compound Z4) The synthesis was carried out in exactly the same manner as in the method of US Pat. No. 2,986,528, to obtain Comparative Compound Z4.

對各製造例所得化合物進行以下的評價。結果示於表2。 <分光特性試驗> 測定各化合物在氯仿中的吸收光譜,並測定極大吸收波長(λmax)及400nm下的克吸光係數,依下述基準進行評。 測定機器:日本分光公司製紫外可見光分光光度計V-560 A:克吸光係數30以上 B:克吸光係數20以上且低於30 C:克吸光係數10以上且低於20 D:克吸光係數低於10The compounds obtained in the respective Production Examples were subjected to the following evaluations. The results are shown in Table 2. <Spectroscopic characteristic test> The absorption spectrum of each compound in chloroform was measured, and the maximum absorption wavelength (λmax) and the gram extinction coefficient at 400 nm were measured, and evaluated according to the following criteria. Measuring machine: UV-Vis spectrophotometer V-560 A manufactured by JASCO Corporation: gram absorption coefficient above 30 B: gram absorption coefficient above 20 and below 30 C: gram absorption coefficient above 10 and below 20 D: gram low absorption coefficient At 10

<耐光性試驗> 對製造例及比較製造例所得之一部份化合物進行耐光性試驗。將10mg的各化合物溶融於聚甲基丙烯酸酯8重量%之甲苯溶液5mL中,以旋塗法塗佈在玻璃基板上並使其乾燥,藉此製作膜厚1.5μm的薄膜。 將所製出之薄膜以氙燈(142klux)光線連續照射96小時,以分光光度計測定照射前(0時間)、照射後的薄膜穿透率,依下式(1)測定色素殘存率。 色素殘存率(%)={(1-T1 )/(1-T0 )}×100   (1) [惟其中T0 為氙燈照射前的穿透率、T1 為氙燈照射後的穿透率,T0 及T1 為0~1。] 此外,「穿透率」係表示於各化合物之極大吸收波長下的穿透率,色素殘存率越高,就表示化合物越難因光而分解,即耐光性高。 耐光性係依下述基準進行評價。 A:色素殘存率65%以上 B:色素殘存率40%以上且低於65% C:色素殘存率10%以上且低於40% D:色素殘存率低於10%<Light resistance test> A light resistance test was performed on a part of the compound obtained in the production example and the comparative production example. 10 mg of each compound was melted in 5 mL of a 8 wt% toluene solution of polymethacrylate, and coated on a glass substrate by a spin coating method and dried to prepare a film having a film thickness of 1.5 μm. The produced film was continuously irradiated with a xenon lamp (142 klux) for 96 hours, and the film penetration rate before the irradiation (0 time) and after the irradiation was measured by a spectrophotometer, and the residual ratio of the dye was measured according to the following formula (1). Residual rate of pigment (%) = {(1-T 1 ) / (1-T 0 )} × 100 (1) [Where T 0 is the transmittance before the xenon lamp irradiation, and T 1 is the penetration after the xenon lamp irradiation Rate, T 0 and T 1 are 0~1. Further, the "transmission ratio" indicates the transmittance at the maximum absorption wavelength of each compound, and the higher the residual ratio of the dye, the more difficult it is to decompose by light, that is, the light resistance is high. The light resistance was evaluated according to the following criteria. A: The residual ratio of the pigment is 65% or more. B: The residual ratio of the dye is 40% or more and less than 65%. C: The residual ratio of the dye is 10% or more and less than 40%. D: The residual ratio of the pigment is less than 10%.

<耐熱性> 對於製造例及比較製造例所得之一部份化合物,使用島津製作所(股)製熱重測定裝置TGA-50依下述測定條件測定熱分解所致之重量損失,以初期重量起算減少1%時的溫度為分解開始溫度而作測定。 (測定條件) 以試料量5mg、升溫速度10℃/分(最高到達溫度400℃)、氮氣環境中、流量10mL/分的條件進行測定。 耐熱性係由分解開始溫度依下述基準進行評價。 A:250℃以上 B:210℃以上且低於250℃ C:低於210℃<Heat resistance> For the part of the compound obtained in the production example and the comparative production example, the weight loss due to thermal decomposition was measured using the Shimadzu Corporation's thermogravimetric measuring device TGA-50 according to the following measurement conditions, starting from the initial weight. The temperature at which the reduction was 1% was measured as the decomposition starting temperature. (Measurement conditions) The measurement was carried out under the conditions of a sample amount of 5 mg, a temperature increase rate of 10 ° C/min (maximum reaching temperature of 400 ° C), a nitrogen atmosphere, and a flow rate of 10 mL/min. The heat resistance was evaluated from the decomposition starting temperature according to the following criteria. A: above 250 °C B: above 210 °C and below 250 °C C: below 210 °C

<溶解度試驗> 對於製造例及比較製造例所得之一部份化合物,依以下方法分別測定20℃時對甲苯、甲乙酮(MEK)及丙二醇單甲基醚乙酸酯(PGMEA)的溶解度(重量%)。 於玻璃製試驗管秤取各化合物,與溶劑混合並於20℃攪拌使其溶解,目視觀察該溶液的狀態,評價可溶解的重量濃度。 A:溶解3重量%以上 B:溶解1重量%以上且低於3重量% C:低於1重量%或未溶解<Solubility Test> For a part of the compound obtained in the production example and the comparative production example, the solubility of toluene, methyl ethyl ketone (MEK), and propylene glycol monomethyl ether acetate (PGMEA) at 20 ° C was measured by the following method (% by weight) ). Each compound was weighed in a glass test tube, mixed with a solvent, and dissolved by stirring at 20 ° C. The state of the solution was visually observed, and the soluble weight concentration was evaluated. A: dissolved in 3% by weight or more B: dissolved in 1% by weight or more and less than 3% by weight C: less than 1% by weight or undissolved

[表2] [Table 2]

由上述結果可知,各製造例所製造的化合物C1~C5於400nm附近有極大吸收波長,且於400nm有高克吸光係數。該等化合物可有效吸收400nm附近的光。化合物C1~C5對有機溶劑的溶解性良好。又,該等化合物的耐久性亦良好。例如,化合物C1~C2係耐光性、溶解度、耐熱性均優異。From the above results, it was found that the compounds C1 to C5 produced in the respective production examples had a maximum absorption wavelength in the vicinity of 400 nm and a high gram absorption coefficient at 400 nm. These compounds are effective for absorbing light in the vicinity of 400 nm. The solubility of the compounds C1 to C5 in an organic solvent is good. Moreover, the durability of these compounds is also good. For example, the compounds C1 to C2 are excellent in light resistance, solubility, and heat resistance.

製造例3(丙烯酸系黏著劑組成物(a)的調製) 在由丙烯酸-2-乙基己酯(2EHA)76重量份、N-乙烯-2-吡咯啶酮(NVP)18重量份及丙烯酸-2-羥乙酯(HEA)16重量份所構成的單體混合物中,摻混作為光聚合引發劑的1-羥基環己基苯基酮(商品名:IRGACURE 184,於波長200~370nm具吸收帶,BASF公司製)0.035重量份、2,2-二甲氧基-1,2-二苯基乙-1-酮(商品名:IRGACURE 651,於波長200~380nm具吸收帶,BASF公司製)0.035重量份,然後照射外線至黏度(量測條件:BH黏度計No.5轉子,10rpm,測定溫度30℃)達到約20Pa・s為止,獲得上述單體成分之一部份已聚合的預聚物組成物(聚合率:9%)。接著,在該預聚物組成物中添加己二醇二丙烯酸酯(HDDA)0.080重量份、矽烷偶合劑(商品名:KBM-403,信越化學工業(股)製)0.3重量份並加以混合,獲得丙烯酸系黏著劑組成物(a)。Production Example 3 (Preparation of Acrylic Adhesive Composition (a)) In 76 parts by weight of 2-ethylhexyl acrylate (2EHA), 18 parts by weight of N-vinyl-2-pyrrolidone (NVP), and acrylic acid 1-hydroxycyclohexyl phenyl ketone as a photopolymerization initiator (trade name: IRGACURE 184, absorbing at a wavelength of 200 to 370 nm) in a monomer mixture composed of 16 parts by weight of 2-hydroxyethyl ester (HEA) Belt, manufactured by BASF Corporation, 0.035 parts by weight, 2,2-dimethoxy-1,2-diphenylethan-1-one (trade name: IRGACURE 651, with absorption band at a wavelength of 200 to 380 nm, manufactured by BASF Corporation 0.035 parts by weight, and then irradiated the outer line to the viscosity (measurement condition: BH viscometer No. 5 rotor, 10 rpm, measurement temperature 30 ° C) to about 20 Pa·s, and obtained a part of the above monomer component which has been polymerized Polymer composition (polymerization rate: 9%). Next, 0.080 parts by weight of hexanediol diacrylate (HDDA) and 0.3 parts by weight of a decane coupling agent (trade name: KBM-403, manufactured by Shin-Etsu Chemical Co., Ltd.) were added to the prepolymer composition and mixed. An acrylic adhesive composition (a) was obtained.

(黏著劑組成物(A1)的製造) 對製造例3所得丙烯酸系黏著劑組成物(a)(以形成丙烯酸系聚合物之單體成分為100重量份),添加已溶解於丙烯酸丁酯中並使固體成分呈15%的2,4-雙[{4-(4-乙基己基氧基)-4-羥基}-苯基]-6-(4-甲氧基苯基)-1,3,5-三(商品名:Tinosorb S,表3中的「紫外線吸收劑(b1)」,吸收光譜之極大吸收波長:346nm,BASF汽巴公司製)0.8重量份(固體成分重量)、與雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物(商品名:IRGACURE 819,於波長200~450nm具吸收帶域,BASF汽巴公司製)0.3重量份,進行攪拌藉此獲得黏著劑組成物(A1)。(Manufacture of Adhesive Composition (A1)) The acrylic pressure-sensitive adhesive composition (a) obtained in Production Example 3 (100 parts by weight of the monomer component forming the acrylic polymer) was dissolved in butyl acrylate. And the solid component is 15% 2,4-bis[{4-(4-ethylhexyloxy)-4-hydroxy}-phenyl]-6-(4-methoxyphenyl)-1, 3,5-three (trade name: Tinosorb S, "ultraviolet absorber (b1)" in Table 3, absorption wavelength maximum absorption wavelength: 346 nm, manufactured by BASF Ciba) 0.8 parts by weight (solid content weight), and double (2, 4 , 6-trimethyl benzhydryl)-phenylphosphine oxide (trade name: IRGACURE 819, having an absorption band at a wavelength of 200 to 450 nm, manufactured by BASF Ciba) 0.3 parts by weight, and stirred to obtain adhesion Composition (A1).

(黏著劑層(A1)的製造) 將前述黏著劑組成物(A1)以黏著劑層形成後的厚度為100μm的方式塗佈在離型薄膜中經剝離處理的薄膜面上,接著在該黏著劑組成物層的表面貼合離型薄膜。隨後以照度:6.5mW/cm2 、光量:2000mJ/cm2 、峰波長:350nm的條件進行紫外線照射,使黏著劑組成物層光硬化,形成黏著劑層(A1)。相對於黏著劑層(A1)中丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為0.8重量%。(Manufacture of Adhesive Layer (A1)) The adhesive composition (A1) was applied to the surface of the release-treated film in a release film after the thickness of the adhesive layer was 100 μm, followed by adhesion. The surface of the composition layer is attached to the release film. Subsequently, ultraviolet irradiation was carried out under the conditions of illuminance: 6.5 mW/cm 2 , light amount: 2000 mJ/cm 2 , and peak wavelength: 350 nm, and the adhesive composition layer was photohardened to form an adhesive layer (A1). The amount of the ultraviolet absorber added was 0.8% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (A1).

製造例4 (黏著劑組成物(B1)的製造) 在配備有溫度計、攪拌機、回流冷卻管及氮氣導入管的可分離式燒瓶中,投入丙烯酸丁酯95重量份、丙烯酸5重量份、作為聚合引發劑的偶氮二異丁腈0.2重量份及醋酸乙酯233重量份後通入氮氣,邊攪拌邊進行約1小時的氮氣置換。然後,將燒杯加熱至60℃,反應7小時,獲得重量平均分子量(Mw)110萬的丙烯酸系聚合物。在上述丙烯酸系聚合物溶液(固體成分設為100重量份)中,加入作為異氰酸酯系交聯劑的三羥甲基丙烷甲苯二異氰酸酯(商品名:CORONATE L,日本聚胺酯工業(股)製)0.8重量份、矽烷偶合劑(商品名:KBM-403,信越化學工業(股)製)0.1重量份,調製出黏著劑組成物(溶液)。Production Example 4 (Production of Adhesive Composition (B1)) In a separable flask equipped with a thermometer, a stirrer, a reflux cooling tube, and a nitrogen introduction tube, 95 parts by weight of butyl acrylate and 5 parts by weight of acrylic acid were charged as a polymerization. 0.2 part by weight of azobisisobutyronitrile and 233 parts by weight of ethyl acetate of the initiator were passed through a nitrogen gas, and the mixture was purged with nitrogen for about 1 hour while stirring. Then, the beaker was heated to 60 ° C and reacted for 7 hours to obtain an acrylic polymer having a weight average molecular weight (Mw) of 1.1 million. To the above-mentioned acrylic polymer solution (solid content: 100 parts by weight), trimethylolpropane toluene diisocyanate (trade name: CORONATE L, manufactured by Japan Polyurethane Industry Co., Ltd.) as an isocyanate crosslinking agent was added. An adhesive composition (solution) was prepared in an amount of 0.1 part by weight based on parts by weight of a decane coupling agent (trade name: KBM-403, manufactured by Shin-Etsu Chemical Co., Ltd.).

(黏著劑層(B1)的製造) 在厚度38μm的分離件(表面經剝離處理的聚對苯二甲酸乙二酯系薄膜)上以乾燥後厚度為15μm的方式塗佈前述黏著劑組成物(B1:溶液),並使其在100℃下乾燥3分鐘以除去溶劑,獲得黏著劑層。隨後在50℃下加熱48小時進行交聯處理。以下,將該黏著劑層稱為「黏著劑層(B1)」。並且,於黏著劑層的暴露面貼合另一離型薄膜。(Manufacture of Adhesive Layer (B1)) The above-mentioned adhesive composition was applied to a separator having a thickness of 38 μm (a polyethylene terephthalate film having a surface-treated surface) so as to have a thickness of 15 μm after drying ( B1: solution), and dried at 100 ° C for 3 minutes to remove the solvent to obtain an adhesive layer. Subsequently, it was heated at 50 ° C for 48 hours for crosslinking treatment. Hereinafter, this adhesive layer is referred to as "adhesive layer (B1)". Further, another release film is attached to the exposed surface of the adhesive layer.

製造例5 (黏著劑層(B2)的製造) 除了將製造例4之黏著劑層(B1)之製造中的塗佈以乾燥後厚度為20μm的方式進行外,以和製造例4相同方式形成黏著劑層。隨後在50℃下加熱48小時進行交聯處理。以下,將該黏著劑層稱為「黏著劑層(B2)」。Production Example 5 (Production of Adhesive Layer (B2)) The coating in the production of the adhesive layer (B1) of Production Example 4 was carried out in the same manner as in Production Example 4 except that the coating was dried to a thickness of 20 μm. Adhesive layer. Subsequently, it was heated at 50 ° C for 48 hours for crosslinking treatment. Hereinafter, this adhesive layer is referred to as "adhesive layer (B2)".

實施例1 (黏著劑組成物(A1‐1)的製造) 於製造例3之黏著劑組成物(A1)的製造中,將雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物(商品名:IRGACURE 819,BASF汽巴公司製)之添加量改成0.6重量份,並進一步直接添加製造例2所得色素化合物(C5)「吸收光譜之極大吸收波長:394nm,半幅全寬48.5nm」0.48重量份(固體成分重量)進行攪拌,除此之外以和製造例3相同方式進行,獲得黏著劑組成物(A1‐1)。Example 1 (Manufacture of Adhesive Composition (A1-1)) In the production of the adhesive composition (A1) of Production Example 3, bis(2,4,6-trimethylbenzylidene)- The amount of the phenylphosphine oxide (trade name: IRGACURE 819, manufactured by BASF Ciba) was changed to 0.6 parts by weight, and the pigment compound (C5) obtained in Production Example 2 was further directly added. "The maximum absorption wavelength of the absorption spectrum: 394 nm, The adhesive composition (A1-1) was obtained in the same manner as in Production Example 3 except that the full width of the half width of 48.5 nm and 0.48 parts by weight (solid component weight) was stirred.

(黏著劑層(A1‐1)的製造) 將前述黏著劑組成物(A1‐1)以黏著劑層形成後的厚度為100μm的方式塗佈在離型薄膜中經剝離處理的薄膜面上,除此之外以和製造例1相同的方式形成黏著劑層(A1‐1)。相對於黏著劑層(A1‐1)中的丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為0.8重量%,而色素化合物(C5)的添加量為0.48重量%。(Manufacture of Adhesive Layer (A1-1)) The adhesive composition (A1-1) was applied to the release-treated film surface of the release film by a thickness of 100 μm after the adhesive layer was formed. Otherwise, an adhesive layer (A1-1) was formed in the same manner as in Production Example 1. The amount of the ultraviolet absorber added was 0.8% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (A1-1), and the amount of the pigment compound (C5) added was 0.48% by weight.

實施例2 (黏著劑組成物(A1‐2)的製造) 於製造例3之黏著劑組成物(A1)的製造中,將紫外線吸收劑換成2‐(2H‐苯并三唑‐2‐基)‐6‐(1‐甲基‐1‐苯基乙基)‐4‐(1,1,3,3‐四甲基丁基)酚(商品名:Tinuvin 928,表3中的「紫外線吸收劑b2」,吸收光譜之極大吸收波長:349nm,BASF汽巴公司製)1.0重量份(固體成分重量),並將雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物(商品名:IRGACURE 819,BASF汽巴公司製)的添加量改成0.6重量份,並進一步直接添加製造例2所得色素化合物(C5)0.5重量份(固體成分重量)進行攪拌,除此之外以和製造例3相同方式進行,獲得黏著劑組成物(A1‐2)。Example 2 (Manufacture of Adhesive Composition (A1‐2)) In the manufacture of the adhesive composition (A1) of Production Example 3, the ultraviolet absorber was replaced with 2‐(2H-benzotriazole-2‐ Base)‐6‐(1‐methyl‐1‐phenylethyl)‐4‐(1,1,3,3‐tetramethylbutyl)phenol (trade name: Tinuvin 928, “UV in Table 3” Absorbent b2", absorption spectrum maximum absorption wavelength: 349 nm, manufactured by BASF Ciba) 1.0 part by weight (solid component weight), and bis(2,4,6-trimethylbenzylidene)-phenyl The addition amount of the phosphine oxide (trade name: IRGACURE 819, manufactured by BASF Ciba) was changed to 0.6 part by weight, and 0.5 part by weight (solid component weight) of the pigment compound (C5) obtained in Production Example 2 was further directly added and stirred. Further, in the same manner as in Production Example 3, an adhesive composition (A1 - 2) was obtained.

(黏著劑層(A1‐2)的製造) 將前述黏著劑組成物(A1‐2)以黏著劑層形成後的厚度為175μm的方式塗佈在離型薄膜中經剝離處理的薄膜面上,除此之外以和製造例1相同的方式形成黏著劑層(A1‐2)。相對於黏著劑層(A1‐2)中的丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為1.0重量%,而色素化合物(C5)的添加量為0.50重量%。(Manufacture of Adhesive Layer (A1 - 2)) The adhesive composition (A1 - 2) was applied to the surface of the release film which was peeled off by a thickness of 175 μm after the adhesive layer was formed. Otherwise, an adhesive layer (A1 - 2) was formed in the same manner as in Production Example 1. The amount of the ultraviolet absorber added was 1.0% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (A1-2), and the amount of the pigment compound (C5) added was 0.50% by weight.

實施例3 (黏著劑組成物(B1‐1)的製造) 於製造例4之黏著劑組成物(B1)之製造中,將異氰酸酯系交聯劑、矽烷偶合劑和作為紫外線吸收劑之2,2’,4,4’-四羥基二苯基酮(商品名:Seesorb 106,表3中的「紫外線吸收劑b3」,吸收光譜之極大吸收波長:348nm,SHIPRO化成股份公司製)3.0重量份(固體成分重量)一同加入上述丙烯酸系聚合物溶液(以固體成分為100重量份),再加入製造例2所得色素化合物(C1)「極大吸收波長:393nm,半幅全寬49.5nm)」3.0重量份(固體成分重量),除此之外以和製造例4相同方式調製黏著劑組成物(溶液)。Example 3 (Production of Adhesive Composition (B1‐1)) In the production of the adhesive composition (B1) of Production Example 4, an isocyanate crosslinking agent, a decane coupling agent, and 2 as an ultraviolet absorber were used. 2',4,4'-tetrahydroxydiphenyl ketone (trade name: Seesorb 106, "ultraviolet absorber b3" in Table 3, maximum absorption wavelength of absorption spectrum: 348 nm, manufactured by SHIPRO Chemical Co., Ltd.) 3.0 parts by weight (The solid content weight) was added together with the above-mentioned acrylic polymer solution (100 parts by weight of solid content), and the pigment compound (C1) obtained in Production Example 2 was added, "maximum absorption wavelength: 393 nm, full width at half width 49.5 nm", 3.0 weight. The adhesive composition (solution) was prepared in the same manner as in Production Example 4 except for the weight (solid content).

(黏著劑層(B1‐1)的製造) 在厚度38μm的分離件(表面經剝離處理的聚對苯二甲酸乙二酯系薄膜)上以乾燥後厚度為15μm的方式塗佈前述黏著劑組成物(B1‐1:溶液),並使其在100℃下乾燥3分鐘以除去溶劑,獲得黏著劑層。隨後在50℃下加熱48小時進行交聯處理。以下,將該黏著劑層稱為「黏著劑層(B1-1)」。相對於黏著劑層(B1-1)中的丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為3.0重量%,而色素化合物(C1)的添加量為3.0重量%。(Manufacture of Adhesive Layer (B1‐1)) The above-mentioned adhesive composition was applied to a separator having a thickness of 38 μm (a polyethylene terephthalate film having a surface-treated surface) so as to have a thickness of 15 μm after drying. (B1 -1: solution), and dried at 100 ° C for 3 minutes to remove the solvent to obtain an adhesive layer. Subsequently, it was heated at 50 ° C for 48 hours for crosslinking treatment. Hereinafter, this adhesive layer is referred to as "adhesive layer (B1-1)". The amount of the ultraviolet absorber added was 3.0% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (B1-1), and the amount of the dye compound (C1) added was 3.0% by weight.

實施例4 (黏著劑組成物(B1‐2)的製造) 於實施例3之黏著劑組成物(B1-1)的製造中,改使用製造例2所得色素化合物(C2)「吸收光譜之極大吸收波長393nm、半幅全寬49.5nm)3.0重量份(固體成分重量)來代替製造例2所得色素化合物(C1),除此之外以和實施例3相同方式調製黏著劑組成物(溶液)。Example 4 (Production of Adhesive Composition (B1-2)) In the production of the adhesive composition (B1-1) of Example 3, the pigment compound (C2) obtained in Production Example 2 was used instead. The adhesive composition (solution) was prepared in the same manner as in Example 3 except that the dye compound (C1) obtained in Production Example 2 was used instead of the dye compound (C1) having a wavelength of 393 nm and a full width of 49.5 nm.

(黏著劑層(B1‐2)的製造) 又,使用該黏著劑組成物(溶液),除了乾燥後厚度作成20μm以外,以和實施例3相同方式形成黏著劑層。隨後在50℃下加熱48小時進行交聯處理。以下,將該黏著劑層稱為「黏著劑層(B1‐2)」。相對於黏著劑層(B1‐2)中的丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為3.0重量%,而色素化合物(C2)的添加量為3.0重量%。(Manufacturing of Adhesive Layer (B1-2)) The adhesive composition (solution) was used, and an adhesive layer was formed in the same manner as in Example 3 except that the thickness was 20 μm after drying. Subsequently, it was heated at 50 ° C for 48 hours for crosslinking treatment. Hereinafter, the adhesive layer is referred to as "adhesive layer (B1 - 2)". The amount of the ultraviolet absorber added was 3.0% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (B1-2), and the amount of the dye compound (C2) added was 3.0% by weight.

實施例5 (黏著劑組成物(B1‐3)的製造) 於實施例3之黏著劑組成物(B1-1)之製造中,不添加紫外線吸收劑(b3),除此之外以和實施例3相同方式調製黏著劑組成物(溶液)。Example 5 (Production of Adhesive Composition (B1‐3)) In the production of the adhesive composition (B1-1) of Example 3, the ultraviolet absorber (b3) was not added, and Example 3 Modifies the adhesive composition (solution) in the same manner.

(黏著劑層(B1‐3)的製造) 又,使用該黏著劑組成物(溶液),除了乾燥後厚度作成20μm以外,以和實施例3相同方式形成黏著劑層。隨後在50℃下加熱48小時進行交聯處理。以下,將該黏著劑層稱為「黏著劑層(B2-2)」。相對於黏著劑層(B1‐3)中的丙烯酸系聚合物重量(100重量%),色素化合物(C2)的添加量為3.0重量%。(Manufacturing of Adhesive Layer (B1-3)) The adhesive composition (solution) was used, and an adhesive layer was formed in the same manner as in Example 3 except that the thickness was 20 μm after drying. Subsequently, it was heated at 50 ° C for 48 hours for crosslinking treatment. Hereinafter, this adhesive layer is referred to as "adhesive layer (B2-2)". The amount of the dye compound (C2) added was 3.0% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (B1-3).

比較例2 (黏著劑組成物(A1‐3)的製造) 於實施例1之黏著劑組成物(A1-1)的製造中,將紫外線吸收劑b1的使用量改為1.0重量份,並將色素化合物(C6)(「BONASORB UA3911」、氯仿溶劑中的吸收光譜之極大吸收波長:395nm,半幅全寬48nm,ORIENT工業股份公司製)0.45重量份以N-乙烯-2-吡咯啶酮(NVP)溶解成6重量%加入,以代替製造例2所得之色素化合物(C5),除此之外以和實施例1相同方式調製黏著劑組成物。Comparative Example 2 (Manufacture of Adhesive Composition (A1-3)) In the production of the adhesive composition (A1-1) of Example 1, the amount of the ultraviolet absorber b1 was changed to 1.0 part by weight, and The pigment compound (C6) ("BONASORB UA3911", the absorption spectrum of the chloroform solvent, the maximum absorption wavelength: 395 nm, half width of 48 nm, manufactured by ORIENT INDUSTRIAL CO., LTD.) 0.45 parts by weight of N-vinyl-2-pyrrolidone (NVP) The adhesive composition was prepared in the same manner as in Example 1 except that the pigment compound (C5) obtained in Production Example 2 was added in an amount of 6% by weight.

(黏著劑層(A1‐3)的製造) 又,使用該黏著劑組成物,以和實施例1相同方式形成黏著劑層(A1-3)。 相對於黏著劑層(A1-3)中的丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為1.0重量%,而色素化合物(C6)的添加量為0.45重量%。(Manufacture of Adhesive Layer (A1-3)) Further, an adhesive layer (A1-3) was formed in the same manner as in Example 1 using the adhesive composition. The amount of the ultraviolet absorber added was 1.0% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (A1-3), and the amount of the dye compound (C6) added was 0.45% by weight.

比較例3 (黏著劑組成物(B1‐4)的製造) 於實施例3之(黏著劑組成物(B1-1)的製造中,將紫外線吸收劑b3的使用量改為2.0重量份,將色素化合物(C6)(「BONASORB UA3911」、氯仿溶劑中的吸收光譜之極大吸收波長:395nm、半幅全寬48nm、ORIENT工業股份公司製)2.5重量份以N,N-二甲基甲醯胺溶解成10重量%加入,以代替製造例2所得色素化合物(C1),並將乾燥溫度設為100℃下3分鐘、155℃下5分鐘,除此之外以和實施例3相同方式調製黏著劑組成物。Comparative Example 3 (Manufacture of Adhesive Composition (B1-4)) In the production of the adhesive composition (B1-1) of Example 3, the amount of the ultraviolet absorber b3 used was changed to 2.0 parts by weight. The pigment compound (C6) ("BONASORB UA3911", the absorption spectrum of the chloroform solvent, the maximum absorption wavelength: 395 nm, half width of 48 nm, manufactured by ORIENT INDUSTRIAL CO., LTD.), 2.5 parts by weight, dissolved in N,N-dimethylformamide The adhesive compound was prepared in the same manner as in Example 3 except that the pigment compound (C1) obtained in Production Example 2 was added in an amount of 10% by weight, and the drying temperature was set to 100 ° C for 3 minutes and 155 ° C for 5 minutes. Composition.

(黏著劑層(B1‐4)的製造) 又,使用該黏著劑組成物(溶液),除了乾燥後厚度作成20μm以外,以和實施例3相同方式形成黏著劑層。隨後在50℃下加熱48小時進行交聯處理。以下,將該黏著劑層稱為「黏著劑層(B1‐4)」。相對於黏著劑層(B1‐4)中的丙烯酸系聚合物重量(100重量%),紫外線吸收劑的添加量為2.0重量%,而色素化合物(C6)的添加量為2.5重量%。(Manufacturing of Adhesive Layer (B1-4)) The adhesive composition (solution) was used, and an adhesive layer was formed in the same manner as in Example 3 except that the thickness was 20 μm after drying. Subsequently, it was heated at 50 ° C for 48 hours for crosslinking treatment. Hereinafter, the adhesive layer is referred to as "adhesive layer (B1 - 4)". The amount of the ultraviolet absorber added was 2.0% by weight based on the weight of the acrylic polymer (100% by weight) in the adhesive layer (B1-4), and the amount of the dye compound (C6) added was 2.5% by weight.

(評價) 針對實施例1~5及比較例2~3所得黏著劑層,進行以下的評價。結果示於表3、表4。而比較例1中,係使用製造例3所得黏著劑層(A1)進行評價。(Evaluation) The adhesive layers obtained in Examples 1 to 5 and Comparative Examples 2 to 3 were subjected to the following evaluations. The results are shown in Tables 3 and 4. In Comparative Example 1, the adhesive layer (A1) obtained in Production Example 3 was used for evaluation.

<穿透率、色相的測定:初期値> 將實施例及比較例所得黏著劑層之離型薄膜剝離,貼合於載玻片(商品名:白研磨 No.1、厚度:0.8~1.0mm、全光線穿透率:92%、霧度:0.2%、松浪硝子工業(股)製)。再將另一邊的離型薄膜剝離,同樣貼合於載玻片,經高壓釜處理(50℃、0.5MPa、15分),製作具有載玻片/黏著劑層/載玻片之層結構的試驗片。將所作成之試驗片以分光光度計(製品名:U4100、日立高科技(股)製)進行測定。測定波長350nm~780nm範圍的穿透率(表3中顯示380nm、400nm、420nm、440nm之測定値),穿透Y値、穿透色相(L , a* , b )係測定D65光源、視角2度下的色相。<Measurement of Transmittance and Hue: Initial 値> The release film of the adhesive layer obtained in the examples and the comparative examples was peeled off and bonded to a glass slide (trade name: white polishing No. 1, thickness: 0.8 to 1.0 mm) , the total light transmittance: 92%, haze: 0.2%, Songlang nitrocellulose industry (shares) system. The release film on the other side was peeled off, and the film was bonded to the glass slide, and subjected to autoclaving (50 ° C, 0.5 MPa, 15 minutes) to prepare a layer structure having a slide glass/adhesive layer/slide glass. Test piece. The prepared test piece was measured by a spectrophotometer (product name: U4100, manufactured by Hitachi High-Tech Co., Ltd.). The transmittance of the wavelength range of 350 nm to 780 nm was measured (measured in 380 nm, 400 nm, 420 nm, and 440 nm in Table 3), and the D65 source was measured by penetrating Y値 and penetrating hue (L * , a * , b * ). Hue at 2 degrees of viewing angle.

<可靠度的評價> 將已以前述方式進行初期測定的試驗片投入85℃、85%RH的烘箱中500小時,實施耐熱性試驗。又同樣地,於紫外線褪色試驗機(裝置名:UV FADE METER試驗機U48,SUGA試驗機股份公司製)投入試驗片,連續照射100小時,實施耐光性試驗。以和初期測定相同的方式,對試驗後的試驗片實施穿透Y値、穿透色相(L , a* , b )的測定。計算求出試驗前後Y値的變化ΔY,色相變化ΔE ,以ΔY≦0.3且ΔE ≦1.0的情況為合格(OK),此外為不合格(NG)。<Evaluation of Reliability> The test piece which had been initially measured in the above manner was placed in an oven at 85 ° C and 85% RH for 500 hours to carry out a heat resistance test. In the same manner, a test piece was placed in an ultraviolet fading tester (device name: UV FADE METER tester U48, manufactured by SUGA Test Machine Co., Ltd.), and the film was continuously irradiated for 100 hours to carry out a light resistance test. The test piece after the test was subjected to measurement of penetration Y値 and penetrating hue (L * , a * , b * ) in the same manner as in the initial measurement. The change ΔY of Y値 before and after the test was calculated, and the hue change ΔE * was determined to be acceptable (OK) with ΔY≦0.3 and ΔE * ≦1.0, and was also unacceptable (NG).

<接著性> 從實施例及比較例所得黏著劑層裁出長100mm、寬度20mm的片材。接著將黏著劑層一邊的離型薄膜剝離,並貼附(襯墊)PET薄膜(商品名:LUMIRROR S-10、厚度:25μm、東麗(股)製)。接下來,將另一邊的離型薄膜剝離,於作為試驗板的玻璃板(商品名:鈉鈣玻璃♯0050,松浪硝子工業(股)製)以2kg輥筒來回1次的壓接條件進行壓接,製作由試驗板/黏著劑層/PET薄膜構成的試樣。對所得試樣進行高壓釜處理(50℃、0.5MPa、15分),然後於23℃、50%R.H.的環境下靜置冷卻30分鐘。靜置冷卻後,使用拉伸試驗機(裝置名:Autograph AG-IS、(股)島津製作所製),依據JIS Z0237,在23℃、50%R.H.之環境下,以拉伸速度300mm/分、剝離角度180°的條件,從試驗板將黏著片(黏著劑層/PET薄膜)撕開,測定180°拉伸剝離接著力(N/20mm)。<Adhesiveness> A sheet having a length of 100 mm and a width of 20 mm was cut out from the adhesive layers obtained in the examples and the comparative examples. Next, the release film on one side of the adhesive layer was peeled off, and a PET film (trade name: LUMIRROR S-10, thickness: 25 μm, manufactured by Toray Industries, Inc.) was attached. Next, the release film on the other side was peeled off, and the glass plate (trade name: soda lime glass ♯0050, manufactured by Songlang Glass Industry Co., Ltd.) as a test plate was pressed with a 2 kg roll back and forth under pressure conditions. A sample composed of a test plate/adhesive layer/PET film was prepared. The obtained sample was subjected to autoclave treatment (50 ° C, 0.5 MPa, 15 minutes), and then left to stand in an environment of 23 ° C and 50% R.H. for 30 minutes. After standing and cooling, a tensile tester (device name: Autograph AG-IS, manufactured by Shimadzu Corporation) was used, and according to JIS Z0237, at a tensile speed of 300 mm/min under an environment of 23 ° C and 50% RH, The adhesive sheet (adhesive layer/PET film) was peeled off from the test plate under the condition of a peeling angle of 180°, and a 180° stretch peeling force (N/20 mm) was measured.

<全光線穿透率、霧度> 從實施例及比較例所得黏著劑層將一邊的離型薄膜剝離,貼合於載玻片(商品名:白研磨 No.1、厚度:0.8~1.0mm、全光線穿透率:92%、霧度:0.2%、松浪硝子工業(股)製)。再將另一離型薄膜剝離,製作具有黏著劑層(A)/載玻片之層結構的試驗片。使用霧度計(裝置名:HM-150、(股)村上色彩研究所製)測定上述試驗片之可見光區域的全光線穿透率、霧度値。<Total Light Transmittance, Haze> The release film on one side was peeled off from the adhesive layer obtained in the examples and the comparative examples, and bonded to a glass slide (trade name: white polishing No. 1, thickness: 0.8 to 1.0 mm) , the total light transmittance: 92%, haze: 0.2%, Songlang nitrocellulose industry (shares) system. Further, another release film was peeled off to prepare a test piece having a layer structure of the adhesive layer (A)/slide. The total light transmittance and haze 可见光 of the visible light region of the test piece were measured using a haze meter (device name: HM-150, manufactured by Murakami Color Research Laboratory Co., Ltd.).

[表3] [table 3]

[表4] [Table 4]

以下製作附黏著劑層之偏光薄膜並進行評價。A polarizing film with an adhesive layer was prepared and evaluated.

(環烯烴聚合物薄膜(G)) 使用厚度25μm之環烯烴聚合物薄膜(商品名ZEONOR 薄膜,日本ZEON 股份公司製)。(Cycloolefin polymer film (G)) A cycloolefin polymer film (trade name: ZEONOR film, manufactured by Japan ZEON Co., Ltd.) having a thickness of 25 μm was used.

(偏光件(P1)之製造) 使用由已含浸碘之厚度5μm的延伸聚乙烯醇薄膜構成之偏光件。偏光件(或已貼合保護薄膜的偏光薄膜)之單體穿透率Y値為42.4%、偏光度為99.995。(Manufacture of polarizer (P1)) A polarizing member composed of an extended polyvinyl alcohol film having a thickness of 5 μm which was impregnated with iodine was used. The polarizing member (or the polarizing film to which the protective film has been attached) has a monomer transmittance Y値 of 42.4% and a degree of polarization of 99.995.

(丙烯酸系樹脂薄膜(E)) 將日本專利特開2010-284840號公報之製造例1記載之醯亞胺化MS樹脂100重量份所構成的樹脂粒以100.5kPa、100℃乾燥12小時,於單軸擠壓機在模頭溫度270℃下從T模頭擠出,成形為薄膜狀(厚度80μm)。再將該薄膜沿其輸送方向於150℃之環境下延伸(厚度40μm),隨後於與薄膜輸送方向垂直相交的方向於150℃之環境下延伸,獲得厚度20μm的丙烯酸系樹脂薄膜。(Acrylic Resin Film (E)) The resin pellets composed of 100 parts by weight of the ruthenium iodide resin described in Production Example 1 of JP-A-2010-284840 were dried at 100.5 kPa and 100 ° C for 12 hours. The uniaxial extruder was extruded from a T die at a die temperature of 270 ° C to form a film (thickness 80 μm). Further, the film was stretched in an environment of 150 ° C in its transport direction (thickness: 40 μm), and then extended in an environment perpendicular to the film transport direction at 150 ° C to obtain an acrylic resin film having a thickness of 20 μm.

(相位差薄膜(H)) 使用厚度56μm的聚碳酸酯薄膜(日東電工股份公司製「NRF」、面內相位差Re(550):135nm)。(Retardation film (H)) A polycarbonate film (NRF) manufactured by Nitto Denko Corporation and in-plane retardation Re (550): 135 nm) was used.

比較例4 製具具有黏著劑層(A1)/環烯烴聚合物薄膜(G)/偏光件(P1)/丙烯酸系樹脂薄膜(E)/黏著劑層(B1:層間接著劑層)/相位差薄膜(H)/黏著劑層(B2)之結構的附黏著劑層之偏光薄膜。 黏著劑層(A1)係使用製造例3所製造之物。 黏著劑層(B1)係使用製造例4所製造之物。 黏著劑層(B2)係使用製造例5所製造之物。 製作附黏著劑層之偏光薄膜時,係透過各黏著劑層貼合各薄膜。此外,偏光件(P1)兩側的環烯烴聚合物薄膜(G)及丙烯酸系樹脂薄膜(E)係使用聚乙烯醇系接著劑來貼合。 所得之附黏著劑層之偏光薄膜可使用作為用於有機EL顯示裝置的光學積層體,黏著劑層(A1)對應觀視側、而黏著劑層(B2)對應有機EL面板側。Comparative Example 4 Tool having adhesive layer (A1) / cycloolefin polymer film (G) / polarizing member (P1) / acrylic resin film (E) / adhesive layer (B1: interlayer adhesive layer) / phase difference A polarizing film with an adhesive layer of the structure of the film (H)/adhesive layer (B2). The adhesive layer (A1) was produced by the production example 3. The adhesive layer (B1) was produced by the production example 4. The adhesive layer (B2) was produced by the production example 5. When a polarizing film with an adhesive layer is produced, the respective films are bonded through the respective adhesive layers. Further, the cycloolefin polymer film (G) and the acrylic resin film (E) on both sides of the polarizer (P1) were bonded together using a polyvinyl alcohol-based adhesive. The obtained polarizing film with an adhesive layer can be used as an optical laminate for an organic EL display device, the adhesive layer (A1) corresponds to the viewing side, and the adhesive layer (B2) corresponds to the organic EL panel side.

實施例6 於比較例4中,改使用實施例1所製造之黏著劑層(A1-1)來代替黏著劑層(A1),除此之外以和比較例4相同的方式製作具有黏著劑層(A1-1)/環烯烴聚合物薄膜(G)/偏光件/丙烯酸系樹脂薄膜(E)/黏著劑層(B1)/相位差薄膜(H)/黏著劑層(B2)之結構的附黏著劑層之偏光薄膜。[Example 6] In Comparative Example 4, an adhesive layer (A1-1) produced in Example 1 was used instead of the adhesive layer (A1), and an adhesive was prepared in the same manner as in Comparative Example 4. Layer (A1-1)/cycloolefin polymer film (G)/polarizer/acrylic resin film (E)/adhesive layer (B1)/phase difference film (H)/adhesive layer (B2) A polarizing film with an adhesive layer.

實施例7 於比較例4中,改使用實施例4所製造之黏著劑層(B1-2)來代替黏著劑層(B2),除此之外以和比較例4相同的方式,製作具有黏著劑層(A1)/環烯烴聚合物薄膜(G)/偏光件/丙烯酸系樹脂薄膜(E)/黏著劑層(B1)/相位差薄膜(H)/黏著劑層(B1-2)之結構的附黏著劑層之偏光薄膜。[Example 7] In Comparative Example 4, the adhesive layer (B1-2) produced in Example 4 was used instead of the adhesive layer (B2), and in the same manner as in Comparative Example 4, the adhesive was produced. Composition of agent layer (A1)/cycloolefin polymer film (G)/polarizer/acrylic resin film (E)/adhesive layer (B1)/phase difference film (H)/adhesive layer (B1-2) A polarizing film with an adhesive layer.

實施例8 於比較例4中,改使用實施例1所製造之黏著劑層(A1-1)來代替黏著劑層(A1),使用附表面處理層之保護薄膜(D-1)來代替環烯烴聚合物薄膜(G),除此之外以和比較例4相同方式,製作具有黏著劑層(A1-1)/附表面處理層之保護薄膜(D-1)/偏光件(P1)/丙烯酸系樹脂薄膜(E)/黏著劑層(B1)/相位差薄膜(H)/黏著劑層(B2)之結構的附黏著劑層之偏光薄膜。Example 8 In Comparative Example 4, the adhesive layer (A1-1) produced in Example 1 was used instead of the adhesive layer (A1), and a protective film (D-1) with a surface treatment layer was used instead of the ring. A protective film (D-1)/polarizer (P1) having an adhesive layer (A1-1)/surface-treated layer was prepared in the same manner as in Comparative Example 4 except for the olefin polymer film (G). A polarizing film with an adhesive layer of a structure of an acrylic resin film (E)/adhesive layer (B1)/phase difference film (H)/adhesive layer (B2).

此外,附表面處理層之保護薄膜(D-1)係如下所示。附表面處理層之保護薄膜(D-1)係以下述基材薄膜A側與偏光件(P1)相接的方式,使用聚乙烯醇系接著劑來貼合。Further, the protective film (D-1) with a surface treatment layer is as follows. The protective film (D-1) having a surface-treated layer is bonded to each other by a polyvinyl alcohol-based adhesive so that the base film A side is in contact with the polarizer (P1).

(基材薄膜A的製作) 將日本專利特開2010-284840號公報之製造例1記載之醯亞胺化MS樹脂100重量份、及6,6’,6’’-(1,3,5-三-2,4,6-三基)參(3-己基氧基-2-甲基酚)(商品名:LA-F70,表1中的「紫外線吸收劑(b4)」,吸收光譜之最大吸收波長:357nm、(股)ADEKA製)0.65重量份以2軸混練機在220℃下混合,製作樹脂粒。將獲得之樹脂粒於100.5kPa、100℃下乾燥12小時,以單軸擠壓機在模頭溫度270℃下從T模頭擠壓並成形為薄膜狀(厚度160μm)。再將該薄膜於其輸送方向上150℃之環境下進行延伸(厚度80μm),接著在與薄膜輸送方向垂直相交之方向於150℃之環境下進行延伸,獲得厚度40μm之基材薄膜A((甲基)丙烯酸系樹脂薄膜)。所得基材薄膜A之波長380nm之光穿透率為7%、波長400nm之光穿透率為68%、420nm之光穿透率為90%、440nm之光穿透率為91%。(Production of the base film A) 100 parts by weight of the ruthenium iodide resin described in Production Example 1 of JP-A-2010-284840, and 6,6',6''-(1,3,5 -three -2,4,6-triyl) ginseng (3-hexyloxy-2-methylphenol) (trade name: LA-F70, "ultraviolet absorber (b4)" in Table 1, maximum absorption of absorption spectrum Wavelength: 357 nm, manufactured by ADEKA, 0.65 parts by weight, and mixed at 220 ° C in a 2-axis kneader to prepare resin pellets. The obtained resin pellet was dried at 100.5 kPa and 100 ° C for 12 hours, extruded from a T die at a die temperature of 270 ° C in a uniaxial extruder, and formed into a film shape (thickness: 160 μm). Further, the film was stretched in an environment of 150 ° C in the transport direction (thickness: 80 μm), and then stretched in an environment perpendicular to the film transport direction at 150 ° C to obtain a substrate film A having a thickness of 40 μm (( Methyl) acrylic resin film). The obtained base film A had a light transmittance of 7% at a wavelength of 380 nm, a light transmittance of 68% at a wavelength of 400 nm, a light transmittance of 90% at 420 nm, and a light transmittance of 91% at 440 nm.

(附表面處理層之保護薄膜(D-1)的作成) 於含有異三聚氰酸三丙烯酸酯13份、新戊四醇三丙烯酸酯16份、二新戊四醇六丙烯酸酯62份、及異佛酮二異氰酸酯聚胺甲酸乙酯9份的紫外線硬化型樹脂(商品名:UNIDIC 17-806,固體成分:80%,溶劑:醋酸丁酯,DIC(股)製)100份中,混合製造例2所得色素化合物(C2)3.0重量份、流平劑(商品名:GRANDIC PC-4100, DIC(股)製)5份、作為光聚合引發劑之雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物(商品名:IRGACURE 819,於波長200~450nm具吸收帶域,BASF汽巴公司製)5重量份,以甲基異丁酮稀釋使其固體成分濃度成為50%,調製出硬塗層形成用組成物。於所得基材薄膜A上塗佈前述硬塗層形成用組成物而形成塗佈層,將該塗佈層於120℃下加熱1分鐘。加熱後之塗佈層在氮氣環境下以高壓水銀燈照射累積光量2000mJ/cm2 的紫外線,使塗佈層硬化,形成8μm之硬塗層。所得附表面處理層之保護薄膜(D-1)之波長380nm的光穿透率為0.2%、波長400nm的光穿透率為3.0%、420nm的光穿透率為65%、440nm的光穿透率為89%,而相對於附表面處理層之保護薄膜(D-1)總重量(100重量%),色素化合物(C2)的添加量為0.5重量%。(Preparation of the protective film (D-1) with a surface treatment layer) containing 13 parts of isomeric isocyanurate, 16 parts of pentaerythritol triacrylate, 62 parts of dipentaerythritol hexaacrylate, And isophorone diisocyanate polyurethane 9 parts of ultraviolet curable resin (trade name: UNIDIC 17-806, solid content: 80%, solvent: butyl acetate, DIC (manufactured by DIC)), 100 parts, mixed 3.0 parts by weight of the pigment compound (C2) obtained in Production Example 2, a leveling agent (trade name: GRANDIC PC-4100, manufactured by DIC Co., Ltd.), 5 parts, and a double (2,4,6-trimethyl) as a photopolymerization initiator. 5 parts by weight of benzyl benzhydryl)-phenylphosphine oxide (trade name: IRGACURE 819, having an absorption band at a wavelength of 200 to 450 nm, manufactured by BASF Ciba), diluted with methyl isobutyl ketone to form a solid component The concentration became 50%, and a composition for forming a hard coat layer was prepared. The coating layer for forming a hard coat layer was applied onto the obtained base film A to form a coating layer, and the coating layer was heated at 120 ° C for 1 minute. The heated coating layer was irradiated with ultraviolet light having a cumulative light amount of 2000 mJ/cm 2 in a nitrogen atmosphere under a nitrogen atmosphere to cure the coating layer to form a hard coat layer of 8 μm. The protective film (D-1) obtained with the surface treatment layer had a light transmittance of 0.2% at a wavelength of 380 nm, a light transmittance of 3.0% at a wavelength of 400 nm, a light transmittance of 420 nm of 65%, and a light penetration of 440 nm. The penetration rate was 89%, and the amount of the pigment compound (C2) added was 0.5% by weight based on the total weight (100% by weight) of the protective film (D-1) with the surface treatment layer.

實施例9 於比較例4中,改使用下述所示之丙烯酸系樹脂薄膜(E-1)來代替丙烯酸系樹脂薄膜(E),並使用實施例3所製造之黏著劑層(B1-1)來代替黏著劑層(B1),除此之外以和比較例4相同的方式,製作具有黏著劑層(A1)/環烯烴聚合物薄膜(G)/偏光件(P1)/丙烯酸系樹脂薄膜(E-1)/黏著劑層(B1-1)/相位差薄膜(H)/黏著劑層(B2)之結構的附黏著劑層之偏光薄膜。Example 9 In Comparative Example 4, an acrylic resin film (E-1) shown below was used instead of the acrylic resin film (E), and the adhesive layer (B1-1) produced in Example 3 was used. In the same manner as in Comparative Example 4, except that the adhesive layer (B1) was used, an adhesive layer (A1) / a cycloolefin polymer film (G) / a polarizing member (P1) / an acrylic resin was produced. A polarizing film with an adhesive layer of a structure of a film (E-1)/adhesive layer (B1-1)/phase difference film (H)/adhesive layer (B2).

而丙烯酸系樹脂薄膜(E-1)係如下所示。The acrylic resin film (E-1) is as follows.

(丙烯酸系樹脂薄膜(E-1)的製作) 將日本專利特開2010-284840號公報之製造例1記載的醯亞胺化MS樹脂100重量份溶解於二氯甲烷中,製作12重量%的鑄膜液(dope solution)。添加製造例2所得色素化合物(C1)1.2重量份,調製出丙烯酸系樹脂溶液。然後將前述丙烯酸系樹脂溶液以乾燥後厚度為40μm的方式塗佈在已施加離型處理的玻璃板上,使其於60℃下2分鐘再於100℃下3分鐘進行乾燥而去除溶劑,獲得厚度40μm之丙烯酸系樹脂薄膜(E-1)。所得丙烯酸系樹脂薄膜(E-1)之波長380nm之光穿透率為0.2%、波長400nm之光穿透率為1.2%、420nm之光穿透率為59%、440nm之光穿透率為89%。相對於丙烯酸系樹脂薄膜(E-1)中的基底聚合物重量(100重量%),色素化合物(C1)的添加量為1.2重量%。(Production of Acrylic Resin Film (E-1)) 100 parts by weight of the oxime imidized MS resin described in Production Example 1 of JP-A-2010-284840 was dissolved in dichloromethane to prepare 12% by weight. A dope solution. 1.2 parts by weight of the dye compound (C1) obtained in Production Example 2 was added to prepare an acrylic resin solution. Then, the acrylic resin solution was applied to a glass plate to which a release treatment was applied so as to have a thickness of 40 μm after drying, and dried at 60 ° C for 2 minutes and then at 100 ° C for 3 minutes to remove the solvent. Acrylic resin film (E-1) having a thickness of 40 μm. The obtained acrylic resin film (E-1) had a light transmittance of 0.2% at a wavelength of 380 nm, a light transmittance of 1.2% at a wavelength of 400 nm, a light transmittance of 59% at 420 nm, and a light transmittance of 440 nm. 89%. The amount of the dye compound (C1) added was 1.2% by weight based on the weight of the base polymer (100% by weight) in the acrylic resin film (E-1).

實施例10 於比較例4中,改使用下述所示三醋酸纖維素薄膜(F-1)來代替丙烯酸系樹脂薄膜(E),並使用實施例4所製造之黏著劑層(B1-2)來代替黏著劑層(B2),除此之外以和比較例4相同的方式,製作具有黏著劑層(A1)/環烯烴聚合物薄膜(G)/偏光件(P1)/三醋酸纖維素薄膜(F-1)/黏著劑層(B1)/相位差薄膜(H)/黏著劑層(B1-2)之結構的附黏著劑層之偏光薄膜。Example 10 In Comparative Example 4, the cellulose triacetate film (F-1) shown below was used instead of the acrylic resin film (E), and the adhesive layer (B1-2) produced in Example 4 was used. In place of the adhesive layer (B2), an adhesive layer (A1) / cycloolefin polymer film (G) / polarizing member (P1) / triacetate was produced in the same manner as in Comparative Example 4. A polarizing film with an adhesive layer of a structure of a film (F-1)/adhesive layer (B1)/phase difference film (H)/adhesive layer (B1-2).

而三醋酸纖維素薄膜(F-1)係如下所示。The cellulose triacetate film (F-1) is as follows.

(三醋酸纖維素薄膜(F-1)的製作) 將具UV吸收能之厚度40μm的三醋酸纖維素薄膜(商品名:KC4UY,Konica Minolta公司製)100重量份攪拌溶解於以二氯甲烷:乙醇:n-丁醇=80:15:5之重量比率調配之混合溶劑中,以使固體成分成為20重量%方式調配溶解液,再添加1.0重量份之製造例2所得色素化合物(C5),調製出三醋酸纖維素溶解液。將前述溶解液以乾燥後厚度為20μm的方式塗佈在已施加離型處理的玻璃板上,使其於80℃下3分鐘再於120℃下3分鐘進行乾燥而去除溶劑,從玻璃板剝離,從而獲得厚度20μm之三醋酸纖維素薄膜(F1)。所得三醋酸纖維素薄膜(F-1)之波長380nm之光穿透率為0.2%、波長400nm之光穿透率為8.8%、420nm之光穿透率為64%、440nm之光穿透率為90%。相對於三醋酸纖維素薄膜(F-1)中的基底聚合物重量(100重量%),色素化合物(C5)的添加量為1.0重量%。(Preparation of cellulose triacetate film (F-1)) 100 parts by weight of a cellulose triacetate film (trade name: KC4UY, manufactured by Konica Minolta Co., Ltd.) having a UV absorption energy of 40 μm was dissolved in dichloromethane: In the mixed solvent in which the weight ratio of n-butanol = 80:15:5 was adjusted, the solution was prepared so that the solid content became 20% by weight, and 1.0 part by weight of the dye compound (C5) obtained in Production Example 2 was further added. A cellulose triacetate solution was prepared. The solution was applied to a glass plate to which a release treatment was applied after drying to a thickness of 20 μm, and dried at 80 ° C for 3 minutes and then at 120 ° C for 3 minutes to remove the solvent and peeled off from the glass plate. Thus, a cellulose triacetate film (F1) having a thickness of 20 μm was obtained. The obtained cellulose triacetate film (F-1) has a light transmittance of 0.2% at a wavelength of 380 nm, a light transmittance of 8.8% at a wavelength of 400 nm, a light transmittance of 64% at 420 nm, and a light transmittance of 440 nm. It is 90%. The amount of the pigment compound (C5) added was 1.0% by weight based on the weight of the base polymer (100% by weight) in the cellulose triacetate film (F-1).

實施例11 於比較例4中,改使用實施例1所製造之黏著劑層(A1-1)來代替黏著劑層(A1),使用實施例8作成之附表面處理層之保護薄膜(D-1)來代替環烯烴聚合物薄膜(G),使用下述所示環烯烴聚合物薄膜(G-1)來代替丙烯酸系樹脂薄膜(E),使用下述所示黏著劑層(B3-1)來代替黏著劑層(B1),除此之以外以和比較例4相同方式,製作具有黏著劑層(A1-1)/附表面處理層之保護薄膜(D-1)/偏光件(P1)/環烯烴聚合物薄膜(G-1)/黏著劑層(B3-1)/相位差薄膜(H)/黏著劑層(B2)之結構的附黏著劑層之偏光薄膜。Example 11 In Comparative Example 4, the adhesive layer (A1-1) produced in Example 1 was used instead of the adhesive layer (A1), and the protective film with the surface treatment layer prepared in Example 8 was used (D- 1) Instead of the cycloolefin polymer film (G), the following cyclic olefin polymer film (G-1) was used instead of the acrylic resin film (E), and the following adhesive layer (B3-1) was used. In place of the adhesive layer (B1), a protective film (D-1)/polarizer (P1) having an adhesive layer (A1-1)/surface-treated layer was prepared in the same manner as in Comparative Example 4. / Polarizing film with an adhesive layer of a structure of a cycloolefin polymer film (G-1) / an adhesive layer (B3-1) / a retardation film (H) / an adhesive layer (B2).

而環烯烴聚合物薄膜(G-1)、黏著劑層(B3-1)係如下所示。附表面處理層之保護薄膜(D1)係以基材薄膜A側與偏光件(P1)相接的方式,使用聚乙烯醇系接著劑貼合。The cycloolefin polymer film (G-1) and the adhesive layer (B3-1) are as follows. The protective film (D1) with a surface treatment layer was bonded together with a polyvinyl alcohol-based adhesive so that the base film A side contacted the polarizer (P1).

(環烯烴聚合物薄膜(G-1)的製作) 作為材料樹脂,準備環烯烴聚合物(降莰烯系單體之開環聚合物的加氫產物,商品名「ZEONOR1420R」,日本ZEON 公司製,玻璃轉移溫度(Tg)為136℃)之顆粒,於100.5kPa及100℃下乾燥12小時。相對於樹脂重量(100重量份)添加製造例2所得色素化合物(C2)1.5重量份,以單軸擠壓機在模頭溫度260℃下使用T模頭式薄膜熔融擠壓成形機,獲得厚度20μm之環烯烴聚合物樹脂薄膜(G1)。所得環烯烴聚合物樹脂薄膜(G1)之波長380nm之光穿透率為2.5%、波長400nm之光穿透率為18%、420nm之光穿透率為75%、440nm之光穿透率為91%。相對於環烯烴聚合物薄膜(G-1)中的基底聚合物重量(100重量%),色素化合物(C2)的添加量為1.5重量%。(Preparation of a cycloolefin polymer film (G-1)) As a material resin, a cycloolefin polymer (hydrogenated product of a ring-opening polymer of a decene-based monomer, trade name "ZEONOR 1420R", manufactured by Japan ZEON Co., Ltd.) was prepared. The particles having a glass transition temperature (Tg) of 136 ° C were dried at 100.5 kPa and 100 ° C for 12 hours. 1.5 parts by weight of the pigment compound (C2) obtained in Production Example 2 was added to the weight of the resin (100 parts by weight), and a T-die type film melt extrusion molding machine was used at a die temperature of 260 ° C in a uniaxial extruder to obtain a thickness. 20 μm cycloolefin polymer resin film (G1). The obtained cycloolefin polymer resin film (G1) has a light transmittance of 2.5% at a wavelength of 380 nm, a light transmittance of 18% at a wavelength of 400 nm, a light transmittance of 75% at 420 nm, and a light transmittance of 440 nm. 91%. The amount of the pigment compound (C2) added was 1.5% by weight based on the weight of the base polymer (100% by weight) in the cycloolefin polymer film (G-1).

(黏著劑組成物(B3-1)的製造) 將摻混了作為橡膠系聚合物的苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS,商品名:SEPTON 2063,苯乙烯含量:13%,Kuraray(股)製)100重量份、作為黏著賦予劑之氫化萜烯酚(商品名:YS POLYSTER TH130,軟化點:130℃,羥價數:60,YASUHARA CHEMICAL(股)製)40.4重量份、石油系黏著賦予劑(商品名:Piccolastic A5,乙烯甲苯系黏著賦予劑,軟化點:5℃, Eastman Kodak 公司製)61.7份、及作為軟化劑之聚丁烯(商品名:HV-300,重量平均分子量:3000,JX日鑛日石能量(股)製)21.3份的甲苯溶液(黏著劑溶液)調配成固體成分為30重量%,再添加2.0重量份之製造例2所得色素化合物(C1),調製出黏著劑組成物(B3-1:溶液)。(Manufacture of Adhesive Composition (B3-1)) A styrene-ethylene-propylene-styrene block copolymer (SEPS, trade name: SEPTON 2063, styrene content: 13 as a rubber-based polymer) was blended. 100 parts by weight of a hydrogenated terpene phenol (trade name: YS POLYSTER TH130, softening point: 130 ° C, hydroxyl number: 60, manufactured by YASUHARA CHEMICAL Co., Ltd.), which is 100 parts by weight of Kuraray Co., Ltd. A petroleum-based adhesion-imparting agent (trade name: Piccolastic A5, vinyl toluene-based adhesion-imparting agent, softening point: 5 ° C, manufactured by Eastman Kodak Co., Ltd.), 61.7 parts, and polybutene as a softening agent (trade name: HV-300) , weight average molecular weight: 3000, JX Nippon Rock Energy Co., Ltd.) 21.3 parts of a toluene solution (adhesive solution) was formulated to have a solid content of 30% by weight, and 2.0 parts by weight of the pigment compound obtained in Production Example 2 was added ( C1), an adhesive composition (B3-1: solution) was prepared.

(黏著劑層(B3-1)的製造) 在厚度38μm的分離件(表面經剝離處理的聚對苯二甲酸乙二酯系薄膜)上以乾燥後厚度為15μm的方式塗佈前述黏著劑組成物(B2-1:溶液),並使其在120℃下乾燥3分鐘以除去溶劑,獲得黏著劑層。以下,將該黏著劑層稱為「黏著劑層(B3-1)」。相對於黏著劑層(B3-1)中的橡膠系聚合物重量(100重量%),色素化合物(C1)的添加量為2.0重量%。(Manufacture of Adhesive Layer (B3-1)) The above-mentioned adhesive composition was applied to a separator having a thickness of 38 μm (a polyethylene terephthalate film having a surface-treated surface) so as to have a thickness of 15 μm after drying. (B2-1: solution), and dried at 120 ° C for 3 minutes to remove the solvent to obtain an adhesive layer. Hereinafter, this adhesive layer is referred to as "adhesive layer (B3-1)". The amount of the pigment compound (C1) added was 2.0% by weight based on the weight of the rubber-based polymer (100% by weight) in the adhesive layer (B3-1).

實施例12 於比較例4中,改使用下述所示之相位差薄膜(H-1)來代替相位差薄膜(H),並使用實施例4所製造之黏著劑層(B1-2)來代替黏著劑層(B2),除此之外以和比較例4相同的方式,製作具有黏著劑層(A1)/環烯烴聚合物薄膜(G)/偏光件(P1)/丙烯酸系樹脂薄膜(E)/黏著劑層(B1)/相位差薄膜(H-1)/黏著劑層(B1-2)之結構的附黏著劑層之偏光薄膜。Example 12 In Comparative Example 4, a retardation film (H-1) shown below was used instead of the retardation film (H), and the adhesive layer (B1-2) produced in Example 4 was used. An adhesive layer (A1) / cycloolefin polymer film (G) / polarizing member (P1) / acrylic resin film was produced in the same manner as in Comparative Example 4 except for the adhesive layer (B2). E) / Adhesive layer (B1) / retardation film (H-1) / adhesive layer (B1-2) structure of the adhesive layer of the adhesive film.

而相位差薄膜(H-1)係如下所示。The retardation film (H-1) is as follows.

(相位差薄膜(H-1)的製作) 分別將異山梨酯(ISB)26.2重量份、9,9-[4-(2-羥乙氧基)苯基]茀(BHEPF)100.5重量份、1,4-環己烷二甲醇(1,4-CHDM)10.7重量份、二苯基碳酸酯(DPC)105.1重量份、及作為觸媒之碳酸銫(0.2重量%水溶液)0.591重量份投入反應容器中,在氮氣環境下,作為反應第1階段之步驟係將反應容器之熱媒溫度設為150℃,視需要攪拌約15分鐘來使原料溶解。接下來,將反應容器內的壓力從常壓設至13.3kPa,並將反應容器的熱媒溫度以1小時上升至190℃,同時一邊將所產生的酚往反應容器外抽出。 將反應容器內溫度保持在190℃15分鐘後,第2階段之步驟係將反應容器內的壓力設為6.67kPa,將反應容器的熱媒溫度以15分鐘上升至230℃,並將所產生的酚往反應容器外抽出。因攪拌機的攪拌轉矩一直上升故以8分鐘升溫至250℃,而為了將所產生的酚去除,將反應容器內的壓力減壓至0.200kPa以下。到達預定的攪拌轉矩後,反應結束,將所生成之反應物擠出至水中,然後進行粒化,獲得BHEPF/ISB/1,4-CHDM=47.4莫耳%/37.1莫耳%/15.5莫耳%的聚碳酸酯樹脂。 所得聚碳酸酯樹脂的玻璃轉移溫度為136.6℃,折合黏度為0.395dL/g。將所得聚碳酸酯樹脂於80℃下真空乾燥5小時後,相對於樹脂重量(100重量份)添加色素化合物(C2)1.0重量份,以單軸擠壓機在模頭溫度220℃下使用T模頭式薄膜熔融擠壓成形機製作厚度120μm之聚碳酸酯樹脂薄膜。使用拉伸拉幅機將所得聚碳酸酯樹脂薄膜橫向延伸,獲得厚度50μm之相位差薄膜(H-1)。此時,延伸倍率為250%,延伸溫度設為137~139℃。 所得相位差薄膜(H1)之Re(550)為137~147nm,而Δnxy為0.0027~0.0029。相對於相位差薄膜(H-1)中之基底聚合物重量(100重量%),色素化合物(C2)的添加量為1.0重量%。(Preparation of retardation film (H-1)) 10.2 parts by weight of isosorbide (ISB) and 100.5 parts by weight of 9,9-[4-(2-hydroxyethoxy)phenyl]indole (BHEPF), 10.7 parts by weight of 1,4-cyclohexanedimethanol (1,4-CHDM), 105.1 parts by weight of diphenyl carbonate (DPC), and 0.591 parts by weight of cesium carbonate (0.2% by weight aqueous solution) as a catalyst. In the vessel, in the nitrogen atmosphere, as the first step of the reaction, the temperature of the heat medium in the reaction vessel was set to 150 ° C, and the mixture was stirred for about 15 minutes as needed to dissolve the raw material. Next, the pressure in the reaction vessel was set from normal pressure to 13.3 kPa, and the temperature of the heat medium in the reaction vessel was raised to 190 ° C in 1 hour while the generated phenol was taken out of the reaction vessel. After maintaining the temperature in the reaction vessel at 190 ° C for 15 minutes, the second step was to set the pressure in the reaction vessel to 6.67 kPa, and the temperature of the heat medium in the reaction vessel was raised to 230 ° C in 15 minutes, and the resulting The phenol is taken out of the reaction vessel. The stirring torque of the stirrer was increased, so that the temperature was raised to 250 ° C in 8 minutes, and the pressure in the reaction vessel was reduced to 0.200 kPa or less in order to remove the generated phenol. After reaching the predetermined stirring torque, the reaction is completed, the resulting reactant is extruded into water, and then granulated to obtain BHEPF/ISB/1,4-CHDM=47.4 mol%/37.1 mol%/15.5 mo Ear% polycarbonate resin. The obtained polycarbonate resin had a glass transition temperature of 136.6 ° C and a reduced viscosity of 0.395 dL / g. After the obtained polycarbonate resin was vacuum dried at 80 ° C for 5 hours, 1.0 part by weight of the pigment compound (C2) was added with respect to the weight of the resin (100 parts by weight), and a T was used in a uniaxial extruder at a die temperature of 220 ° C. A polycarbonate film of a thickness of 120 μm was produced by a die-type film melt extrusion molding machine. The obtained polycarbonate resin film was laterally stretched using a tenter tenter to obtain a retardation film (H-1) having a thickness of 50 μm. At this time, the stretching ratio was 250%, and the stretching temperature was set to 137 to 139 °C. The Re(550) of the obtained retardation film (H1) was 137 to 147 nm, and Δnxy was 0.0027 to 0.0029. The amount of the pigment compound (C2) added was 1.0% by weight based on the weight of the base polymer (100% by weight) in the retardation film (H-1).

(評價) 對實施例6~12及比較例4所得附黏著劑層之偏光薄膜進行以下的評價。評價係依以下方式進行。結果示於表5、表6。(Evaluation) The polarizing films of the adhesive layers obtained in Examples 6 to 12 and Comparative Example 4 were evaluated as follows. The evaluation was carried out in the following manner. The results are shown in Tables 5 and 6.

<附黏著劑層之偏光薄膜的穿透率、色相測定:初期値> 將實施例及比較例所得附黏著劑層之偏光薄膜的離型薄膜剝離,貼合於載玻片(商品名:白研磨 No.1、厚度:0.8~1.0mm、全光線穿透率:92%、霧度:0.2%、松浪硝子工業(股)製)。再將另一邊的離型薄膜剝離,同樣貼合於載玻片,經高壓釜處理(50℃、0.5MPa、15分),製作具有載玻片/附黏著劑層之偏光薄膜/載玻片之層結構的試驗片。將試驗片以測定光從有機EL顯示面板側之黏著劑層側(B1側)入射的方式裝載於測定用治具,以自動偏光薄膜測定裝置(製品名:V7100、日本分光股份公司製)進行測定。測出波長380nm~780nm範圍的穿透率(表5中顯示380nm、400nm、420nm、440nm之測定値)、單體Y値、單體色相(L , a* , b )。<Transmission rate and hue measurement of polarizing film with adhesive layer: initial 値> The release film of the polarizing film with the adhesive layer obtained in the examples and the comparative examples was peeled off and bonded to a glass slide (trade name: white) Grinding No. 1, thickness: 0.8~1.0mm, total light transmittance: 92%, haze: 0.2%, Songlang Glass Industry Co., Ltd.). The release film on the other side was peeled off, and the film was bonded to the glass slide, and autoclaved (50 ° C, 0.5 MPa, 15 minutes) to prepare a polarizing film/slide with a slide/adhesive layer. A test piece of the layer structure. In the test piece, the test piece is placed on the side of the adhesive layer (B1 side) of the organic EL display panel, and the test piece is mounted on the measuring instrument, and the automatic polarizing film measuring device (product name: V7100, manufactured by JASCO Corporation) Determination. The transmittance in the wavelength range of 380 nm to 780 nm (measured in 380 nm, 400 nm, 420 nm, and 440 nm in Table 5), monomer Y値, and monomer hue (L * , a * , b * ) were measured.

<可靠度的評價> 將已以前述方式進行初期測定的試驗片投入85℃的烘箱中500小時,實施耐熱性試驗。又同樣地,於紫外線褪色試驗機(裝置名:UV FADE METER試驗機U48,SUGA試驗機股份公司製)投入試驗片,使其自觀視側黏著劑層側(A1側)照射紫外線,連續照射100小時,實施耐光性試驗。以和初期測定相同的方式,對試驗後的試驗片實施單體Y値、單體色相(L , a* , b )的測定。計算求出試驗前後單體Y値的變化ΔY,單體色相變化ΔE ,以ΔY≦0.5且ΔE ≦1.0的情況為合格(OK),此外為不合格(NG)。<Evaluation of Reliability> The test piece which had been initially measured in the above manner was placed in an oven at 85 ° C for 500 hours to carry out a heat resistance test. In the same manner, a test piece was placed in an ultraviolet fading tester (device name: UV FADE METER tester U48, manufactured by SUGA Test Machine Co., Ltd.), and the ultraviolet light was irradiated from the side of the viewing adhesive layer side (A1 side) to continuously irradiate. The light resistance test was carried out for 100 hours. The test piece after the test was subjected to measurement of monomer Y値 and monomer hue (L * , a * , b * ) in the same manner as in the initial measurement. The change ΔY of the monomer Y 前后 before and after the test was calculated, and the single color hue change ΔE * was determined to be acceptable (OK) with ΔY ≦ 0.5 and ΔE * ≦ 1.0, and was also unacceptable (NG).

[表5] [table 5]

[表6] [Table 6]

以下製作透明導電性薄膜並進行評價。The transparent conductive film was produced and evaluated as follows.

比較例5 (環烯烴聚合物薄膜(Z1)) 準備厚度40μm之環烯烴聚合物薄膜(Z1)(COP薄膜、日本ZEON 公司製、「ZEONOR ZF16」),作為長條狀透明基材。Comparative Example 5 (Cycloolefin polymer film (Z1)) A cycloolefin polymer film (Z1) (COP film, manufactured by Zeon Corporation, "ZEONOR ZF16") having a thickness of 40 μm was prepared as a long transparent substrate.

(防結塊層的形成) 相對於紫外線硬化性硬塗層樹脂(DIC公司製、商品名「UNIDIC(註冊商標)RS29-120」)固體成分100重量份,添加0.07重量份之直徑3μm多粒子(積水樹脂公司製、商品名「SSX105」),以固體成分濃度為30重量%的方式以醋酸乙酯稀釋,調製出防結塊層形成用組成物。將該組成物塗佈於上述環烯烴聚合物薄膜(Z1)之單面後,以80℃下1分鐘的條件乾燥,然後照射累積光量300mJ/cm2 的紫外線(高壓水銀燈),從而於COP薄膜的單面形成膜厚1.5μm的防結塊層(AB層)。(Formation of the anti-caking layer) 0.07 parts by weight of a 3 μm-diameter multiparticle was added to 100 parts by weight of the solid component of the ultraviolet curable hard coat resin (trade name "UNIDIC (registered trademark) RS29-120") (product name "SSX105" manufactured by Sekisui Resin Co., Ltd.) was diluted with ethyl acetate so that the solid content concentration was 30% by weight to prepare an anti-caking layer-forming composition. The composition was applied onto one surface of the cycloolefin polymer film (Z1), dried at 80 ° C for 1 minute, and then irradiated with an ultraviolet light (high pressure mercury lamp) having a cumulative light amount of 300 mJ/cm 2 to form a COP film. On one side, an anti-caking layer (AB layer) having a film thickness of 1.5 μm was formed.

(硬塗層(Y)的形成) 混合紫外線硬化型丙烯酸樹脂(DIC公司製、「ELS888」)100重量份及光聚合引發劑(BASF公司製、「Irgacure184」)2重量份及醋酸乙酯160重量份,調製出組成物溶液(Y)。接下來,於上述環烯烴聚合物薄膜(Z1)已形成上述防結塊層之面的相反面塗佈前述組成物溶液(Y),以80℃下1分鐘的條件乾燥,然後照射累積光量300mJ/cm2 的紫外線(高壓水銀燈)。藉此於環烯烴聚合物薄膜(Z1)之上面形成厚度1.0μm的硬塗層。(Formation of hard coat layer (Y)) 100 parts by weight of an ultraviolet curable acrylic resin ("ELS888" manufactured by DIC Corporation), 2 parts by weight of a photopolymerization initiator ("Irgacure 184" manufactured by BASF Corporation), and ethyl acetate 160 The composition solution (Y) was prepared in parts by weight. Next, the composition solution (Y) was applied to the opposite surface of the surface of the cycloolefin polymer film (Z1) on which the anti-caking layer was formed, and dried at 80 ° C for 1 minute, and then irradiated with a cumulative light amount of 300 mJ. /cm 2 of ultraviolet light (high pressure mercury lamp). Thereby, a hard coat layer having a thickness of 1.0 μm was formed on the surface of the cycloolefin polymer film (Z1).

(折射率調整層(X)的形成) 於含無機粒子之樹脂溶液(JSR公司製、「KZ7414」)100重量份中混合丙二醇單甲基醚700重量份,調製出組成物溶液(X)。接下來,於上述硬塗層(Y1)之上面塗佈前述組成物溶液(X),以60℃下1分鐘的條件乾燥,然後照射累積光量300mJ/cm2的紫外線(高壓水銀燈)。藉此於硬塗層之上面形成厚度100nm的折射率調整層(X)。(Formation of the refractive index adjusting layer (X)) 700 parts by weight of propylene glycol monomethyl ether was mixed with 100 parts by weight of a resin solution ("KZ7414" manufactured by JSR Corporation) containing an inorganic particle to prepare a composition solution (X). Next, the composition solution (X) was applied onto the hard coat layer (Y1), dried at 60 ° C for 1 minute, and then irradiated with an ultraviolet light (high pressure mercury lamp) having a cumulative light amount of 300 mJ/cm 2 . Thereby, a refractive index adjusting layer (X) having a thickness of 100 nm was formed on the hard coat layer.

(ITO層的形成) 接下來,將上述所得之折射率調整層(X)/硬塗層(Y)/環烯烴聚合物薄膜(Z1)/防結塊層結構的積層體投入捲取式濺鍍裝置中,於折射率調整層(X1)的上面形成厚度30nm的ITO層(非晶質)。具體而言,是在已導入氬氣98%及氧氣2%之氣壓0.4Pa的真空環境下,使用由97質量%氧化銦及3質量%氧化錫之燒結體構成的ITO靶材,對折射率調整層(X1)實施濺鍍。 以上述方式進行,製作出ITO層/折射率調整層(X)/硬塗層(Y)/環烯烴聚合物薄膜(Z1)/防結塊層結構的透明導電性薄膜。(Formation of ITO Layer) Next, the laminated body of the refractive index adjusting layer (X) / hard coat layer (Y) / cycloolefin polymer film (Z1) / anti-caking layer structure obtained above is put into a coiling type splashing In the plating apparatus, an ITO layer (amorphous) having a thickness of 30 nm was formed on the upper surface of the refractive index adjusting layer (X1). Specifically, an ITO target composed of a sintered body of 97% by mass of indium oxide and 3% by mass of tin oxide was used in a vacuum environment in which 98% of argon gas and 2% of oxygen gas were introduced, and the refractive index was used. The adjustment layer (X1) is sputtered. In the above manner, a transparent conductive film of an ITO layer/refractive index adjusting layer (X)/hard coat layer (Y)/cycloolefin polymer film (Z1)/anti-caking layer structure was produced.

實施例13 於比較例5中改形成硬塗層(Y-1)以代替硬塗層(Y),除此之外以和比較例5相同方式,製作出ITO層/折射率調整層(X1)/硬塗層(Y-1)/環烯烴聚合物薄膜(Z1)/防結塊層結構的透明導電性薄膜。Example 13 An ITO layer/refractive index adjusting layer (X1) was produced in the same manner as in Comparative Example 5 except that the hard coat layer (Y-1) was changed in Comparative Example 5 instead of the hard coat layer (Y). / / Hard coating (Y-1) / cycloolefin polymer film (Z1) / anti-caking layer structure of transparent conductive film.

而硬塗層(Y-1)的形成,是於硬塗層(Y)之形成中使用相對於紫外線硬化型丙烯酸樹脂(DIC公司製、「ELS888」)100重量份再添加2重量份之製造例2所得色素化合物(C2)調製而成的組成物溶液(Y-1),除此之外進行和硬塗層(Y)之形成相同的操作。相對於硬塗層(Y-1)中的基底聚合物(100重量%),色素化合物(C2)之添加量為2.0重量%。In the formation of the hard coat layer (Y), the hard coat layer (Y-1) is produced by adding 2 parts by weight to 100 parts by weight of an ultraviolet curable acrylic resin ("ELS888" manufactured by DIC Corporation). The composition solution (Y-1) prepared by the pigment compound (C2) obtained in Example 2 was subjected to the same operation as the formation of the hard coat layer (Y). The amount of the pigment compound (C2) added was 2.0% by weight based on the base polymer (100% by weight) in the hard coat layer (Y-1).

實施例14 於比較例5中改形成折射率調整層(X-1)來代替折射率調整層(X),除此之外以和比較例5相同方式,製作出ITO層/折射率調整層(X-1)/硬塗層(Y)/環烯烴聚合物薄膜(Z1)/防結塊層結構的透明導電性薄膜。Example 14 An ITO layer/refractive index adjusting layer was produced in the same manner as in Comparative Example 5 except that the refractive index adjusting layer (X-1) was changed in Comparative Example 5 instead of the refractive index adjusting layer (X). (X-1)/hard coat layer (Y)/cycloolefin polymer film (Z1)/anti-caking layer structure transparent conductive film.

而折射率調整層(X-1)的形成,是於折射率調整層(X)之形成中,使用組成物溶液(X-1)來代替組成物溶液(X),其係於含有無機粒子之樹脂溶液(JSR公司製、「KZ7412」)100重量份中混合丙二醇單甲基醚700重量份再將製造例2所得之色素化合物(C2)以相對於前述樹脂溶液中的樹脂固形成分為5重量份之方式混合調配而成的組成物溶液,除此之外進行和折射率調整層(X)之形成相同的操作。相對於折射率調整層(X-1)中的基底聚合物重量(100重量%),色素化合物(C2)之添加量為5.0重量%。The refractive index adjusting layer (X-1) is formed by using the composition solution (X-1) instead of the composition solution (X) in the formation of the refractive index adjusting layer (X), which is contained in the inorganic particles. In 100 parts by weight of the resin solution ("KZ7412" manufactured by JSR Corporation), 700 parts by weight of propylene glycol monomethyl ether was mixed, and the pigment compound (C2) obtained in Production Example 2 was further divided into 5 in terms of solid resin formation in the resin solution. The same composition as the formation of the refractive index adjusting layer (X) was carried out except that the composition solution prepared by mixing was added in the form of parts by weight. The amount of the pigment compound (C2) added was 5.0% by weight based on the weight of the base polymer (100% by weight) in the refractive index adjusting layer (X-1).

實施例15 於比較例5中改形成折射率調整層(X-2)來代替折射率調整層(X),除此之外以和比較例5相同方式,製作出ITO層/折射率調整層(X-2)/硬塗層(Y)/環烯烴聚合物薄膜(Z1)/防結塊層結構的透明導電性薄膜。Example 15 An ITO layer/refractive index adjusting layer was produced in the same manner as in Comparative Example 5 except that the refractive index adjusting layer (X-2) was changed in Comparative Example 5 instead of the refractive index adjusting layer (X). (X-2)/hard coat layer (Y)/cycloolefin polymer film (Z1)/anti-caking layer structure transparent conductive film.

而折射率調整層(X-2)的形成,是於折射率調整層(X)之形成中使用組成物溶液(X-2)來代替組成物溶液(X),其係於含有無機粒子之樹脂溶液(東洋油墨公司製、「TYZ68-A12」)100重量份中混合丙二醇單甲基醚700重量份再將製造例2所得之色素化合物(C2)2重量份以相對於前述樹脂溶液中的樹脂固形成分為5重量份之方式混合調配而成的組成物溶液,除此之外進行和折射率調整層(X1)之形成相同的操作。相對於折射率調整層(X-2)中的基底聚合物重量(100重量%),色素化合物(C2)之添加量為5.0重量%。The refractive index adjusting layer (X-2) is formed by using a composition solution (X-2) instead of the composition solution (X) in the formation of the refractive index adjusting layer (X), which is based on the inorganic particles. 700 parts by weight of propylene glycol monomethyl ether was mixed with 100 parts by weight of a resin solution ("TYZ68-A12" manufactured by Toyo Ink Co., Ltd.), and 2 parts by weight of the pigment compound (C2) obtained in Production Example 2 was used in the above resin solution. The composition of the composition in which the resin was solidified in an amount of 5 parts by weight was subjected to the same operation as the formation of the refractive index adjusting layer (X1). The amount of the dye compound (C2) added was 5.0% by weight based on the weight of the base polymer (100% by weight) in the refractive index adjusting layer (X-2).

比較例6 (聚酯薄膜(Z2)的調製) 由對苯二甲酸二甲基及乙二醇以三氧化銻為觸媒利用常規方法進行聚合,獲得熔融聚合聚對苯二甲酸乙二酯。將所得之聚對苯二甲酸乙二酯於160℃真空乾燥2小時後,投入薄膜熔融擠壓成形機,於290℃使其熔融,於鑄輪(casting drum)上擠出後,藉由延伸獲得厚度50μm之聚酯薄膜(Z2)。Comparative Example 6 (Preparation of polyester film (Z2)) Polymerization was carried out by a conventional method from dimethyl terephthalate and ethylene glycol using ruthenium trioxide as a catalyst to obtain melt-polymerized polyethylene terephthalate. The obtained polyethylene terephthalate was vacuum dried at 160 ° C for 2 hours, and then placed in a film melt extrusion molding machine, melted at 290 ° C, extruded on a casting drum, and extended by A polyester film (Z2) having a thickness of 50 μm was obtained.

(防結塊層的形成) 以和比較例5相同方式,於上述聚酯薄膜(Z2)之單面形成膜厚1.5μm之防結塊層(AB層)。(Formation of Anti-Agglomeration Layer) An anti-caking layer (AB layer) having a film thickness of 1.5 μm was formed on one surface of the above-mentioned polyester film (Z2) in the same manner as in Comparative Example 5.

(裂紋防止層(Q)的形成) 將10重量份以橡膠改質環氧樹脂(環氧樹脂骨架部分之重量平均分子量:2000)為主成分的ADEKA FILTERA BUR-12A(ADEKA公司製)與0.001份作為銻系硬化促進劑的ADEKA FILTERA BUR-12B(ADEKA公司製)混合,對該混合物添加90重量份甲基異丁基酮,以使全體為100重量份的方式,調製出組成物溶液(Q)。將該組成物溶液(Q)以170℃加熱時的膠化時間為10秒。接下來,於上述聚酯薄膜(Z2)已形成上述防結塊層之面的相反面塗佈前述組成物溶液(Q),以195℃下1分鐘的條件乾燥,藉此將厚度30nm之裂紋防止層(Q)形成在聚酯薄膜(Z2)之上面。(Formation of crack prevention layer (Q)) 10 parts by weight of ADEKA FILTERA BUR-12A (made by Adeka Co., Ltd.) containing 0.001% by weight of rubber-modified epoxy resin (weight average molecular weight of epoxy resin skeleton portion: 2000) and 0.001 ADEKA FILTERA BUR-12B (manufactured by Adeka Co., Ltd.) was added as a lanthanide-based hardening accelerator, and 90 parts by weight of methyl isobutyl ketone was added to the mixture to prepare a composition solution in such a manner that the whole was 100 parts by weight. Q). The gelation time when the composition solution (Q) was heated at 170 ° C was 10 seconds. Next, the composition solution (Q) was applied to the opposite side of the surface of the above-mentioned polyester film (Z2) on which the above-mentioned anti-caking layer was formed, and dried at 195 ° C for 1 minute, whereby a crack of 30 nm in thickness was formed. The prevention layer (Q) is formed on the polyester film (Z2).

(ITO層的形成) 接下來,將上述所得之裂紋防止層(Q)/聚酯薄膜(Z2)/防結塊層結構之積層體投入捲取式濺鍍裝置中,於裂紋防止層(Y2)的上面形成厚度30nm的ITO層(非晶質)。具體而言,是在已導入氬氣98%及氧氣2%之氣壓0.4Pa的真空環境下,使用由97質量%氧化銦及3質量%氧化錫之燒結體構成的ITO靶材,對裂紋防止層(Q)實施濺鍍。 以上述方式進行,製作出ITO層/裂紋防止層(Q)/聚酯薄膜(Z2)/防結塊層結構之透明導電性薄膜。(Formation of ITO Layer) Next, the laminate of the crack preventing layer (Q)/polyester film (Z2)/anti-caking layer structure obtained above is put into a take-up sputtering apparatus, and the crack preventing layer (Y2) An ITO layer (amorphous) having a thickness of 30 nm was formed on the upper surface. Specifically, an ITO target composed of a sintered body of 97% by mass of indium oxide and 3% by mass of tin oxide was used in a vacuum environment in which argon gas of 98% and oxygen gas of 2% of gas pressure of 0.4 Pa was introduced, and crack prevention was prevented. The layer (Q) is sputtered. In the above manner, a transparent conductive film of an ITO layer/crack preventing layer (Q)/polyester film (Z2)/anti-caking layer structure was produced.

實施例16 於比較例6中,改使用聚酯薄膜(Z2-1)來代替聚酯薄膜(Z2),除此之外以和比較例6相同的方式,製作出ITO層/裂紋防止層(Q)/聚酯薄膜(Z2-1)/防結塊層結構的透明導電性薄膜。Example 16 In the same manner as in Comparative Example 6, except that the polyester film (Z2-1) was used instead of the polyester film (Z2), the ITO layer/crack prevention layer was produced in the same manner as in Comparative Example 6. Q) / Polyester film (Z2-1) / anti-caking layer structure of transparent conductive film.

而聚酯薄膜(Z2-1)係使用:於聚酯薄膜(Z2)的調製中使用相對於所得聚對苯二甲酸乙二酯100重量份進一步添加有1重量份製造例2所得色素化合物(C2)的組成物來成膜,除此之外進行和聚酯薄膜(Z2)的調製相同操作而得之物。相對於聚酯薄膜(Z2-1)中之基底聚合物重量(100重量%),色素化合物(C2)的添加量為1重量%。The polyester film (Z2-1) is used by further adding 1 part by weight of the pigment compound obtained in Production Example 2 to 100 parts by weight of the obtained polyethylene terephthalate in the preparation of the polyester film (Z2) ( The composition of C2) was formed into a film, and the same operation as the preparation of the polyester film (Z2) was carried out. The amount of the pigment compound (C2) added was 1% by weight based on the weight of the base polymer (100% by weight) in the polyester film (Z2-1).

實施例17 於比較例6中進一步設置易接著層(R-1),除此之外以和比較例6相同方式,製作出ITO層/裂紋防止層(Q)/易接著層(R-1)/聚酯薄膜(Z2)/防結塊層結構的透明導電性薄膜。Example 17 An ITO layer/crack prevention layer (Q)/easy adhesion layer (R-1) was produced in the same manner as in Comparative Example 6, except that the easy-adhesion layer (R-1) was further provided in Comparative Example 6. ) / Polyester film (Z2) / anti-caking layer structure of transparent conductive film.

而易接著層(R-1)係依下述方法設置。易接著層形成用組成物(R-1),係藉由相對於100重量份由苯二甲酸酯(苯二甲酸/乙二醇・丙二醇之反應物)、甲基丙烯酸、唑啉、乙二醇、丙二醇及三聚氰胺所形成的樹脂添加5重量份製造例2所得色素化合物(C2)而調製。接下來,於上述聚酯薄膜(Z2)已形成上述防結塊層之面的相反面塗佈前述易接著組成物(R-1),以195℃下1分鐘的條件乾燥,藉此形成厚度0.1μm之易接著層(R-1)。接下來將裂紋防止層(Y2)設於易接著層(R-1)上。相對於易接著層(R-1)中的基底聚合物重量(100重量%),色素化合物(C2)之添加量為5重量%。The easy adhesion layer (R-1) is set as follows. The composition for easily forming an adhesive layer (R-1) is a phthalic acid ester (a reaction product of phthalic acid/ethylene glycol/propylene glycol) or methacrylic acid with respect to 100 parts by weight. A resin formed of oxazoline, ethylene glycol, propylene glycol, and melamine was added to prepare a pigment compound (C2) obtained in Production Example 2 in an amount of 5 parts by weight. Next, the above-mentioned easy-adhesive composition (R-1) is applied to the opposite surface of the surface of the polyester film (Z2) on which the anti-caking layer has been formed, and dried at 195 ° C for 1 minute, thereby forming a thickness. 0.1 μm of easy adhesion layer (R-1). Next, the crack preventing layer (Y2) is placed on the easy-adhesion layer (R-1). The amount of the pigment compound (C2) added was 5% by weight based on the weight of the base polymer (100% by weight) in the easy-adhesion layer (R-1).

實施例18 於比較例6中形成裂紋防止層(Q-1)來代替裂紋防止層(Y2),除此之外以和比較例6相同方式,製作出ITO層/裂紋防止層(Q-1)/聚酯薄膜(Z2)/防結塊層結構的透明導電性薄膜。Example 18 An ITO layer/crack preventing layer (Q-1) was produced in the same manner as in Comparative Example 6 except that the crack preventing layer (Q-1) was formed in Comparative Example 6 instead of the crack preventing layer (Y2). ) / Polyester film (Z2) / anti-caking layer structure of transparent conductive film.

而裂紋防止層(Q-1)的形成,是於裂紋防止層(Q)之形成中使用組成物溶液(Q-1)來代替組成物溶液(Q-1),其係相對於100重量份橡膠改質環氧樹脂進一步添加5重量份製造例2所得色素化合物(C2)而調製成的組成物溶液,並進一步將厚度設為70nm,除此之外進行和裂紋防止層(Q)之形成相同的操作。The crack prevention layer (Q-1) is formed by using the composition solution (Q-1) instead of the composition solution (Q-1) in the formation of the crack prevention layer (Q), which is relative to 100 parts by weight. In the rubber-modified epoxy resin, a composition solution prepared by preparing the pigment compound (C2) obtained in Production Example 2 was further added, and the thickness was further set to 70 nm, and the crack prevention layer (Q) was formed. The same operation.

(評價) 針對實施例13~18及比較例5,6所得透明導電性薄膜進行以下的評價。評價係依以下方式進行。結果示於表4、表5。(Evaluation) The transparent conductive films obtained in Examples 13 to 18 and Comparative Examples 5 and 6 were evaluated as follows. The evaluation was carried out in the following manner. The results are shown in Tables 4 and 5.

<透明導電性薄膜之穿透率、色相測定:初期値> 將實施例及比較例所得透明導電性薄膜裁切,製作試驗片。將試驗片以測定光從透明導電層(ITO層)側入射的方式裝載於測定用治具,以反射型分光光度計(製品名:U4100、日立高科技公司製)進行測定。測出波長380nm~780nm範圍的穿透率(表5中顯示380nm、400nm、420nm之測定値)、單體Y値、單體色相(L , a* , b )。<Transmission Rate and Hue Measurement of Transparent Conductive Film: Initial Stage> The transparent conductive film obtained in the examples and the comparative examples was cut to prepare a test piece. The test piece was placed on the measuring jig so that the light was incident from the side of the transparent conductive layer (ITO layer), and the measurement was performed by a spectrophotometer (product name: U4100, manufactured by Hitachi High-Technologies Corporation). The transmittance in the wavelength range of 380 nm to 780 nm (measured in 380 nm, 400 nm, and 420 nm in Table 5), monomer Y値, and monomer hue (L * , a * , b * ) were measured.

<透明導電性薄膜之ITO層的表面阻抗値> 將ITO層成膜後進行140℃下90分鐘的加熱處理使ITO層結晶化,藉此製作出結晶質之透明導電性薄膜。結晶質之透明導電層的表面阻抗値(Ω/□)係依據JIS K7194(1994年)利用四端子法進行測定。<Surface Impedance of ITO Layer of Transparent Conductive Film> After the ITO layer was formed into a film, heat treatment was performed at 140 ° C for 90 minutes to crystallize the ITO layer, thereby producing a crystalline transparent conductive film. The surface resistance 値 (Ω/□) of the crystalline transparent conductive layer was measured by a four-terminal method in accordance with JIS K7194 (1994).

[表7] [Table 7]

1‧‧‧光學積層體1‧‧‧Optical laminate

2‧‧‧黏接著劑層2‧‧‧ adhesive layer

3‧‧‧透明保護薄膜3‧‧‧Transparent protective film

4‧‧‧偏光件4‧‧‧ polarizer

5‧‧‧相位差薄膜5‧‧‧ phase difference film

6‧‧‧黏著劑層6‧‧‧Adhesive layer

7‧‧‧外蓋構件7‧‧‧Cover components

8‧‧‧有機EL面板8‧‧‧Organic EL panel

10‧‧‧有機EL顯示裝置10‧‧‧Organic EL display device

20‧‧‧透明導電性薄膜20‧‧‧Transparent conductive film

21‧‧‧透明基材薄膜21‧‧‧Transparent substrate film

22‧‧‧透明導電層22‧‧‧Transparent conductive layer

23‧‧‧中間層23‧‧‧Intermediate

24‧‧‧防結塊層24‧‧‧Anti-caking layer

圖1為示意性表示可適用本發明之光學構件的光學積層體之一實施形態的剖面圖。 圖2為示意性表示可適用本發明之光學構件的有機EL顯示裝置之一實施形態的剖面圖。 圖3為示意性表示可適用本發明之光學構件的透明導電性薄膜之一實施形態的剖面圖。Fig. 1 is a cross-sectional view schematically showing an embodiment of an optical layered body to which an optical member of the present invention is applied. Fig. 2 is a cross-sectional view schematically showing an embodiment of an organic EL display device to which the optical member of the present invention is applied. Fig. 3 is a cross-sectional view schematically showing an embodiment of a transparent conductive film to which the optical member of the present invention is applied.

Claims (24)

一種光學構件用組成物,特徵在於含有基底聚合物及下述通式(1)所示化合物: (通式(1)中,m表示1或2,Q1於m為1時表示氫原子,m為2時表示2價之連結基,D1表示自下述通式(2)所示化合物的R1、R403或R404脫落1個氫原子後之基團,Q1結合至通式(2)中的R1、R403或R404之部分,且當m為2時,多個D1可全部相同,亦可有所不同: (通式(2)中,R1表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R2表示氰基;R3表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基;R402及R403為相同或相異,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406R407、-OR408、氰基、-C(O)R409、-O-C(O)R410或-C(O)OR411, R404~R411為相同或相異,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;在R404、R405及R404和R405所鍵結的氮原子上,亦可形成可具有取代基之4~8員之含氮雜環))。 A composition for an optical member characterized by comprising a base polymer and a compound represented by the following formula (1): (In the formula (1), m represents 1 or 2, and Q 1 represents a hydrogen atom when m is 1, and represents a divalent linking group when m is 2, and D 1 represents a compound represented by the following formula (2); a group in which R 1 , R 403 or R 404 sheds one hydrogen atom, Q 1 is bonded to a part of R 1 , R 403 or R 404 in the formula (2), and when m is 2, a plurality D 1 can all be the same or different: (In the formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent; R 2 represents a cyano group; and R 3 represents a hydrogen atom, a halogen atom, a cyano group, or may have The alkyl group of the substituent or the aryl group which may have a substituent; R 402 and R 403 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, -NR 406 R 407 , -OR 408 , cyano , -C(O)R 409 , -OC(O)R 410 or -C(O)OR 411 , R 404 ~R 411 are the same or different and represent a hydrogen atom, An alkyl group which may have a substituent or an aryl group which may have a substituent; in the nitrogen atom to which R 404 , R 405 and R 404 and R 405 are bonded, a group of 4 to 8 members which may have a substituent may be formed. Nitrogen heterocycle)). 如請求項1之光學構件用組成物,其中前述通式(1)所示化合物為下述通式(3)所示化合物: (通式(3)中,R1a表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,R2a表示氰基;R3a表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;R402a表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406aR407a、-OR408a、氰基、-C(O)R409a、-O-C(O)R410a或-C(O)OR411a,R404a~R411a為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;在R404a、R405a及R404a和R405a所鍵結的氮原子上,亦可形成可具有取代基之4~8員之含氮雜環;R413表示氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基或下述通式(4)所示基團: (通式(4)中,Q2表示可具有取代基之碳數1~20之2價烴基,*表示與通式(3)之結合位置;R1b表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基,R2b表示氰基;R3b表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;R402b表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406bR407b、-OR408b、氰基、-C(O)R409b、-O-C(O)R410b或-C(O)OR411b,R404b~R411b為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;在R404b、R405b及R404b和R405b所鍵結的氮原子上,亦可形成可具有取代基之4~8員之含氮雜環))。 The composition for an optical member according to claim 1, wherein the compound represented by the above formula (1) is a compound represented by the following formula (3): (In the formula (3), R 1a represents a hydrogen atom, a carbon number of 1 to 20 which may have a substituent, or a carbon number of 6 to 20 aryl which may have a substituent, and R 2a represents a cyano group; and R 3a represents a hydrogen atom; An atom, a halogen atom, a cyano group, a carbon number of 1 to 20 alkyl groups which may have a substituent or a carbon number of 6 to 20 aryl groups which may have a substituent; and R 402a represents a hydrogen atom, a halogen atom, and a carbon number which may have a substituent 1-20 alkyl, carbon number 6-20 aryl which may have a substituent, -NR 406a R 407a , -OR 408a , cyano, -C(O)R 409a , -OC(O)R 410a or -C (O)OR 411a , R 404a to R 411a are the same or different and represent a hydrogen atom, a C 1-20 alkyl group which may have a substituent or a 6 to 20 aryl group which may have a substituent; in R 404a And a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent may be formed on the nitrogen atom to which R 405a and R 404a and R 405a are bonded; R 413 represents a hydrogen atom, and the carbon number which may have a substituent is 1~ a 20 alkyl group, a carbon number 6 to 20 aryl group which may have a substituent or a group represented by the following formula (4): (In the formula (4), Q 2 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, * represents a binding position to the general formula (3); and R 1b represents a hydrogen atom, a carbon which may have a substituent a number of 1 to 20 alkyl groups or a carbon number 6 to 20 aryl group which may have a substituent, R 2b represents a cyano group; and R 3b represents a hydrogen atom, a halogen atom, a cyano group, and a carbon number of 1 to 20 which may have a substituent Or a carbon number of 6 to 20 aryl groups which may have a substituent; R 402b represents a hydrogen atom, a halogen atom, a carbon number of 1 to 20 which may have a substituent, a carbon number of 6 to 20 aryl groups which may have a substituent, NR 406b R 407b , -OR 408b , cyano group, -C(O)R 409b , -OC(O)R 410b or -C(O)OR 411b , R 404b ~R 411b are the same or different and represent a hydrogen atom a carbon number of 1 to 20 alkyl groups which may have a substituent or a 6 to 20 aryl group which may have a substituent; may also form a nitrogen atom bonded to R 404b , R 405b and R 404b and R 405b A nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent)). 如請求項2之光學構件用組成物,其中前述R413為前述通式(4)所示基團。 The composition for an optical member according to claim 2, wherein the aforementioned R 413 is a group represented by the above formula (4). 如請求項1之光學構件用組成物,其中前述通式(1)所示化合物為下述通式(5)所示化合物:[化學式5] (通式(5)中、R2c表示氰基;R3c表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;R402c及R403c為相同或相異,表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406cR407c、-OR408c、氰基、-C(O)R409c、-O-C(O)R410c或-C(O)OR411c,R404c~R411c為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;在R404c、R425c及R404c和R405c所鍵結的氮原子上,亦可形成可具有取代基之4~8員之含氮雜環;R501表示氫原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基或下述通式(6)所示基團: (通式(6)中,Q3表示可具有取代基之碳數1~20之2價烴基,*表示與通式(5)之結合位置; R2d表示氰基;R3d表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;R402d及R403d為相同或相異,表示氫原子、鹵素原子、可具有取代基之碳數1~20烷基、可具有取代基之碳數6~20芳基、-NR406dR407d、-OR408d、氰基、-C(O)R409d、-O-C(O)R410d或-C(O)OR411d,R404d~R411d為相同或相異,表示氫原子、可具有取代基之碳數1~20烷基或可具有取代基之碳數6~20芳基;在R404d、R405d及R404d和R405d所鍵結的氮原子上,亦可形成可具有取代基之4~8員之含氮雜環))。 The composition for an optical member according to claim 1, wherein the compound represented by the above formula (1) is a compound represented by the following formula (5): [Chemical Formula 5] (In the formula (5), R 2c represents a cyano group; R 3c represents a hydrogen atom, a halogen atom, a cyano group, a carbon number of 1 to 20 which may have a substituent, or a carbon number of 6 to 20 which may have a substituent R 402c and R 403c are the same or different and represent a hydrogen atom, a halogen atom, a carbon number of 1 to 20 which may have a substituent, a carbon number of 6 to 20 aryl which may have a substituent, and -NR 406c R 407c , -OR 408c , cyano, -C(O)R 409c , -OC(O)R 410c or -C(O)OR 411c , R 404c ~R 411c are the same or different and represent a hydrogen atom, which may have The substituent has a carbon number of 1 to 20 alkyl groups or a carbon number of 6 to 20 aryl groups which may have a substituent; and may form a substituent at a nitrogen atom bonded to R 404c , R 425c and R 404c and R 405c . a nitrogen-containing heterocyclic ring of 4 to 8 members; R 501 represents a hydrogen atom, a carbon number of 1 to 20 alkyl groups which may have a substituent, a carbon number of 6 to 20 aryl groups which may have a substituent or a formula (6) ) the group shown: (In the formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, * represents a binding position to the formula (5); R 2d represents a cyano group; and R 3d represents a hydrogen atom; a halogen atom, a cyano group, a C 1-20 alkyl group which may have a substituent or a C 6-20 aryl group which may have a substituent; R 402d and R 403d are the same or different, and represent a hydrogen atom, a halogen atom, a carbon number of 1 to 20 alkyl groups which may have a substituent, a carbon number of 6 to 20 aryl groups which may have a substituent, -NR 406d R 407d , -OR 408d , cyano group, -C(O)R 409d , -OC( O) R 410d or -C(O)OR 411d , R 404d to R 411d are the same or different and represent a hydrogen atom, a carbon number which may have a substituent of 1 to 20 alkyl groups or a carbon number which may have a substituent 6~ 20 aryl; at the nitrogen atom to which R 404d , R 405d and R 404d and R 405d are bonded, a nitrogen-containing heterocyclic ring of 4 to 8 members which may have a substituent may also be formed)). 如請求項4之光學構件用組成物,其中前述R501為前述通式(6)所示基團。 The composition for an optical member according to claim 4, wherein the aforementioned R 501 is a group represented by the above formula (6). 如請求項1之光學構件用組成物,其中前述通式(1)所示化合物為吸收光譜之極大吸收波長存在於380~430nm波長區域的色素化合物。 The composition for an optical member according to claim 1, wherein the compound represented by the above formula (1) is a dye compound having a maximum absorption wavelength of the absorption spectrum in a wavelength region of from 380 to 430 nm. 如請求項1至6中任一項之光學構件用組成物,其進一步含有紫外線吸收劑。 The composition for an optical member according to any one of claims 1 to 6, which further contains an ultraviolet absorber. 如請求項7之光學構件用組成物,前述紫外線吸收劑之吸收光譜係於300~400nm波長區域存在極大吸收波長。 The composition for an optical member according to claim 7, wherein the absorption spectrum of the ultraviolet absorber has a maximum absorption wavelength in a wavelength region of 300 to 400 nm. 一種光學構件,特徵在於其係由請求項1至8中任一項之光學構件用組成物所形成。 An optical member characterized in that it is formed of the composition for an optical member according to any one of claims 1 to 8. 如請求項9之光學構件,其係作為光學薄 膜使用。 The optical member of claim 9 is as an optical thin Membrane use. 如請求項9之光學構件,其係作為光學薄膜用黏著劑層或接著劑層使用。 The optical member of claim 9, which is used as an adhesive layer or an adhesive layer for an optical film. 如請求項11之光學構件,其中形成前述光學薄膜用黏著劑層之組成物所含有之基底聚合物為(甲基)丙烯酸系聚合物。 The optical member according to claim 11, wherein the base polymer contained in the composition for forming the adhesive layer for the optical film is a (meth)acrylic polymer. 如請求項9之光學構件,其係作為設置於光學薄膜之表面處理層使用。 The optical member of claim 9, which is used as a surface treatment layer provided on an optical film. 如請求項10至13中任一項之光學構件,其中前述光學薄膜為偏光薄膜、偏光件、偏光件用透明保護薄膜或相位差薄膜。 The optical member according to any one of claims 10 to 13, wherein the optical film is a polarizing film, a polarizing member, a transparent protective film for a polarizing member, or a retardation film. 一種光學積層體,包含偏光件及相位差薄膜,特徵在於:前述光學積層體為含有如請求項9至14中任一項之光學構件的光學積層體。 An optical layered body comprising a polarizing member and a retardation film, characterized in that the optical layered body is an optical layered body comprising the optical member according to any one of claims 9 to 14. 一種影像顯示裝置,特徵在於具有影像顯示部及如請求項9至14中任一項之光學構件或如請求項15之光學積層體。 An image display device characterized by having an image display portion and an optical member according to any one of claims 9 to 14 or an optical laminate as claimed in claim 15. 如請求項16之影像顯示裝置,其中前述光學構件或光學積層體設置在較影像顯示部更靠觀視側。 The image display device of claim 16, wherein the optical member or the optical layered body is disposed on a viewing side of the image display portion. 如請求項16或17之影像顯示裝置,該影像顯示裝置係包含光學積層體及作為前述影像顯示部之有機EL面板的有機EL顯示裝置,其中前述光學積層體係自觀視側起至少依序包含偏光件及相位差薄膜者,並且 前述光學積層體含有如請求項9至14中任一項之光學構件或如請求項15之光學積層體。 The image display device of claim 16 or 17, wherein the image display device comprises an optical layered body and an organic EL display device as an organic EL panel of the image display portion, wherein the optical layering system is included at least in order from the viewing side Polarizer and phase difference film, and The optical laminate described above contains the optical member of any one of claims 9 to 14 or the optical laminate of claim 15. 如請求項9之光學構件,其於具有透明基材薄膜及透明導電層之透明導電性薄膜中,係作為前述透明基材薄膜、或作為設於前述透明基材薄膜與透明導電層之間的中間層使用。 The optical member according to claim 9 which is used as the transparent substrate film or as a transparent substrate film and a transparent conductive layer in the transparent conductive film having a transparent substrate film and a transparent conductive layer. Used in the middle layer. 如請求項19之光學構件,其中前述中間層係選自折射率調整層、易接著劑層、硬塗層及裂紋防止層中之至少任1者。 The optical member according to claim 19, wherein the intermediate layer is at least one selected from the group consisting of a refractive index adjusting layer, an easy-adhesive layer, a hard coat layer, and a crack preventing layer. 一種透明導電性薄膜,特徵在於具有透明基材薄膜及透明導電層,並含有如請求項19或20之光學構件以作為前述透明基材薄膜、或作為設於與前述透明基材薄膜之間的中間層。 A transparent conductive film characterized by having a transparent substrate film and a transparent conductive layer, and comprising the optical member according to claim 19 or 20 as the transparent substrate film or as being disposed between the transparent substrate film and the transparent substrate film middle layer. 一種影像顯示裝置,特徵在於含有影像顯示部及如請求項21之透明導電性薄膜。 An image display device comprising an image display portion and a transparent conductive film as claimed in claim 21. 如請求項22之影像顯示裝置,其中前述透明導電性薄膜設置在較影像顯示部更靠觀視側。 The image display device of claim 22, wherein the transparent conductive film is disposed on a viewing side of the image display portion. 如請求項22或23之影像顯示裝置,該影像顯示裝置係包含作為前述影像顯示部之有機EL面板的有機EL顯示裝置。 The image display device according to claim 22 or 23, wherein the image display device includes an organic EL display device as an organic EL panel of the image display unit.
TW107115233A 2017-05-09 2018-05-04 Composition for optical member, optical member, and image display device TWI669294B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2017092869 2017-05-09
JP2017-092869 2017-05-09
JP2018-086402 2018-04-27
JP2018086402A JP6510113B2 (en) 2017-05-09 2018-04-27 Composition for optical member, optical member and image display device

Publications (2)

Publication Number Publication Date
TW201900622A TW201900622A (en) 2019-01-01
TWI669294B true TWI669294B (en) 2019-08-21

Family

ID=64668219

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107115233A TWI669294B (en) 2017-05-09 2018-05-04 Composition for optical member, optical member, and image display device

Country Status (5)

Country Link
JP (1) JP6510113B2 (en)
KR (1) KR102051269B1 (en)
CN (1) CN110249242B (en)
SG (1) SG11201909102RA (en)
TW (1) TWI669294B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI750736B (en) * 2019-09-05 2021-12-21 日商柯尼卡美能達股份有限公司 Optical film, polarizing plate and organic EL display device

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6545747B2 (en) * 2017-05-09 2019-07-17 山田化学工業株式会社 Dye compound
JP6735891B2 (en) * 2018-12-27 2020-08-05 住友化学株式会社 Flexible laminate and image display device including the same
JP6732089B2 (en) * 2018-12-27 2020-07-29 住友化学株式会社 Flexible laminate and image display device including the same
CN111801222B (en) * 2019-01-25 2023-05-12 杉金光电(苏州)有限公司 Method for manufacturing polarizing plate and adhesive composition for polarizing plate
JP2020138379A (en) * 2019-02-27 2020-09-03 住友化学株式会社 Laminate and display device
KR20210132074A (en) * 2019-02-27 2021-11-03 수미토모 케미칼 컴퍼니 리미티드 laminate
JP7039509B2 (en) 2019-02-27 2022-03-22 住友化学株式会社 Laminate
JP7039507B2 (en) * 2019-02-27 2022-03-22 住友化学株式会社 Laminate
JP2020140008A (en) * 2019-02-27 2020-09-03 住友化学株式会社 Flexible laminate
JP7039508B2 (en) 2019-02-27 2022-03-22 住友化学株式会社 Flexible laminate
WO2020189145A1 (en) * 2019-03-18 2020-09-24 住友化学株式会社 Laminate and display device containing same
WO2020189146A1 (en) * 2019-03-18 2020-09-24 住友化学株式会社 Multilayer body and display device comprising same
JP2022527886A (en) * 2019-03-29 2022-06-07 エルジー・ケム・リミテッド Optical laminate
US20220152980A1 (en) * 2019-03-29 2022-05-19 Lg Chem, Ltd. Optical laminate
WO2020204330A1 (en) * 2019-03-29 2020-10-08 주식회사 엘지화학 Optical stack
EP3950306A4 (en) * 2019-03-29 2022-05-04 Lg Chem, Ltd. Optical laminate
WO2020204331A1 (en) * 2019-03-29 2020-10-08 주식회사 엘지화학 Optical laminate
KR102484679B1 (en) * 2019-03-29 2023-01-05 주식회사 엘지화학 Optical Laminate
EP3950308A4 (en) * 2019-03-29 2022-04-27 Lg Chem, Ltd. Optical laminate
US20220171108A1 (en) * 2019-03-29 2022-06-02 Lg Chem, Ltd. Optical laminate
JP7348761B2 (en) * 2019-07-03 2023-09-21 日東電工株式会社 Adhesive sheet, optical film with adhesive, and method for producing image display device
JP7439238B2 (en) * 2019-09-23 2024-02-27 エルジー・ケム・リミテッド Polarizer
JP7341821B2 (en) * 2019-09-25 2023-09-11 日東電工株式会社 Transparent conductive film and its manufacturing method
KR20210040536A (en) * 2019-10-04 2021-04-14 주식회사 동진쎄미켐 Coating composition and laminates comprising a coating layer
JP6934996B2 (en) * 2019-10-09 2021-09-15 日東電工株式会社 Flexible image display device and optical laminate used for it
JP7336348B2 (en) * 2019-10-10 2023-08-31 リンテック株式会社 Display and adhesive sheet
WO2021084671A1 (en) 2019-10-31 2021-05-06 Tpr株式会社 Binder
WO2021097856A1 (en) * 2019-11-22 2021-05-27 南昌欧菲显示科技有限公司 Nano silver conductive film
EP4083155A4 (en) * 2019-12-27 2023-11-22 Nitto Denko Corporation Adhesive sheet
KR20220097949A (en) 2020-02-28 2022-07-08 코니카 미놀타 가부시키가이샤 Optical film, polarizing plate and organic electroluminescent image display device
TWI741636B (en) * 2020-06-05 2021-10-01 華宏新技股份有限公司 Multi-function diffusion film and diffusion plate containing the same
KR102395748B1 (en) * 2021-02-17 2022-05-10 (주)유티아이 Rollable, Slidable and Stretchable Cover Window and Manufacturing Method of Cover Window

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000319629A (en) * 1999-05-07 2000-11-21 Shiseido Co Ltd Water-soluble wide-range ultraviolet absorber and ultraviolet absorbing composition and external dermatologic preparation containing same
WO2011078157A1 (en) * 2009-12-21 2011-06-30 コニカミノルタオプト株式会社 Film mirror, method for producing same, and reflecting device for solar thermal power generator
TW201319208A (en) * 2011-09-30 2013-05-16 Nitto Denko Corp Pressure-sensitive adhesive sheet
US20150369974A1 (en) * 2013-02-20 2015-12-24 Fujifilm Corporation Film mirror for solar radiation collection and method for producing same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB741667A (en) * 1952-12-05 1955-12-07 Ici Ltd New pyrimidine derivatives
JPH1180130A (en) * 1997-09-08 1999-03-26 Chemprokasei Kaisha Ltd New aminomethylenepyrimidine derivative, ultraviolet absorber by using the same, and its production
JP4557335B2 (en) * 1999-08-17 2010-10-06 株式会社資生堂 Water-soluble ultraviolet absorber, ultraviolet-absorbing composition containing the same, and external preparation for skin
JP5952013B2 (en) 2011-03-23 2016-07-13 三菱樹脂株式会社 Transparent double-sided pressure-sensitive adhesive sheet for image display device and image display device
WO2017010280A1 (en) * 2015-07-13 2017-01-19 コニカミノルタ株式会社 Heat ray shielding film
JP2017165941A (en) * 2015-12-25 2017-09-21 日東電工株式会社 Adhesive composition for organic el display device, adhesive layer for organic el display device, polarizing film with adhesive layer for organic el display device, and organic el display device
CN116179119A (en) * 2015-12-25 2023-05-30 日东电工株式会社 Adhesive composition and adhesive layer for organic EL display device, polarizing film with adhesive layer, and organic EL display device
JP2018028974A (en) * 2016-08-15 2018-02-22 日東電工株式会社 Adhesive composition for organic el display device, adhesive layer for organic el display device, polarizing film with adhesive layer for organic el display device, and organic el display device
JP2018072712A (en) * 2016-11-02 2018-05-10 日東電工株式会社 Polarization plate
JP6545746B2 (en) * 2017-05-09 2019-07-17 山田化学工業株式会社 Dye compound
JP6545747B2 (en) * 2017-05-09 2019-07-17 山田化学工業株式会社 Dye compound

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000319629A (en) * 1999-05-07 2000-11-21 Shiseido Co Ltd Water-soluble wide-range ultraviolet absorber and ultraviolet absorbing composition and external dermatologic preparation containing same
WO2011078157A1 (en) * 2009-12-21 2011-06-30 コニカミノルタオプト株式会社 Film mirror, method for producing same, and reflecting device for solar thermal power generator
TW201319208A (en) * 2011-09-30 2013-05-16 Nitto Denko Corp Pressure-sensitive adhesive sheet
US20150369974A1 (en) * 2013-02-20 2015-12-24 Fujifilm Corporation Film mirror for solar radiation collection and method for producing same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI750736B (en) * 2019-09-05 2021-12-21 日商柯尼卡美能達股份有限公司 Optical film, polarizing plate and organic EL display device

Also Published As

Publication number Publication date
KR102051269B1 (en) 2019-12-02
TW201900622A (en) 2019-01-01
CN110249242B (en) 2020-07-03
JP2018200463A (en) 2018-12-20
JP6510113B2 (en) 2019-05-08
CN110249242A (en) 2019-09-17
SG11201909102RA (en) 2019-11-28
KR20190092601A (en) 2019-08-07

Similar Documents

Publication Publication Date Title
TWI669294B (en) Composition for optical member, optical member, and image display device
JP7193592B2 (en) Adhesive composition for organic EL display device, adhesive layer for organic EL display device, polarizing film with adhesive layer for organic EL display device, and organic EL display device
TWI711843B (en) Organic EL display device
JP6832246B2 (en) Adhesive composition for organic EL display device, adhesive layer for organic EL display device, polarizing film with adhesive layer for organic EL display device, and organic EL display device
JP2023027214A (en) Adhesive composition for organic EL display device, adhesive layer for organic EL display device, polarizing film with adhesive layer for organic EL display device, and organic EL display device
TWI503391B (en) An adhesive layer for an optical film, an adhesive type optical film, and an image display device
WO2018207701A1 (en) Composition for optical members, optical member and image display device
JP2023075141A (en) Polarizing film with pressure-sensitive adhesive layer, and image display device
JPWO2019107492A1 (en) Polarizing film with adhesive layer and liquid crystal display device
TW201730599A (en) Polarizing film with pressure-sensitive adhesive layer, and image display device
JP2006169428A (en) Adhesive composition for optical member, adhesive layer for optical member and its production process, optical member with adhesive, and image display device
JP2023139006A (en) Polarizing film with optical functional layer, and liquid crystal display device
JP6781818B2 (en) Optical member with optical functional layer
WO2016052538A1 (en) Method for producing polarizing film
WO2017111038A1 (en) Organic electroluminescent display device
JP2008045067A (en) Pressure-sensitive adhesive composition, adhesive layer, method for producing the same, and optical member with adhesive
JP2021144241A (en) Polarizing film with adhesive layer, and image display device
WO2023032795A1 (en) Adhesive composition, adhesive sheet, optical laminate, and image display device
WO2023032796A1 (en) Optical laminate, and image display device
TWI801562B (en) Liquid crystal display device
WO2022209042A1 (en) Curable water dispersion composition, optical film, and image display device
TW201743084A (en) Polarization film with adhesive layers attached to two surfaces and image display device for facilitating thinning by using a one-side protected polarizing film as the polarizing film while suppressing the occurrence of curling and improving re-workability