TWI665755B - Isolation device and method - Google Patents

Isolation device and method Download PDF

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Publication number
TWI665755B
TWI665755B TW104139437A TW104139437A TWI665755B TW I665755 B TWI665755 B TW I665755B TW 104139437 A TW104139437 A TW 104139437A TW 104139437 A TW104139437 A TW 104139437A TW I665755 B TWI665755 B TW I665755B
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holding
tension
sheet
moving
holding means
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TW104139437A
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TW201633446A (en
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河崎仁彦
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日商琳得科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

Abstract

間離裝置(10)係具備有:分別以複數保持構件(25)保持接著薄片(AS)的複數保持手段(20);及使各保持手段(20)移動而在接著薄片(AS)賦予張力的張力賦予手段,保持手段(20)係被設為:以與張力賦予手段使保持手段(20)移動的方向呈交叉的交叉方向使複數保持構件(25)移動,藉此可對接著薄片(AS)以前述交叉方向賦予張力。 The separation device (10) includes a plurality of holding means (20) for holding the bonding sheet (AS) by a plurality of holding members (25), and each holding means (20) is moved to apply tension to the bonding sheet (AS). The tensioning means and the holding means (20) are configured to move the plurality of holding members (25) in an intersecting direction that intersects with the direction in which the tensioning means moves the holding means (20). (AS) Tension is applied in the aforementioned crossing direction.

Description

間離裝置及間離方法 Isolation device and method

本發明係關於間離裝置及間離方法。 The present invention relates to a separation device and a separation method.

以往,在半導體製造工程中,進行將半導體晶圓(以下有時僅稱之為「晶圓」)切斷成預定形狀、預定尺寸而個片化成複數半導體晶片(以下有時僅稱之為「晶片」),將經個片化的各晶片的相互間隔加寬之後,裝載在引線框架或基板等被裝載物上。 Conventionally, in a semiconductor manufacturing process, a semiconductor wafer (hereinafter sometimes referred to simply as a "wafer") is cut into a predetermined shape and a predetermined size and singulated into a plurality of semiconductor wafers (hereinafter referred to simply as " "Wafer"), after widening the space between the individual wafers, the wafers are mounted on a load such as a lead frame or a substrate.

以加寬晶片(片狀體)的相互間隔的間離方法而言,已知有在安裝平台吸附保持黏貼有晶圓(板狀構件)的保護膠帶(接著薄片),對內徑側的固定用平台,使在外徑側被分割成4個的擴張吸附部分別朝外徑方向移動(參照例如文獻1:特開2001-223186號公報)。在如上所示之加寬晶片的相互間隔的方法中,例如對接著薄片賦予+X軸方向、-X軸方向、+Y軸方向、-Y軸方向的4方向的張力,感測手段感測例如位於最外周的晶片已達至預定位置的情形,藉此加寬間隔的動作即完成。 As a method of widening the space between wafers (sheet-like bodies), a protective tape (adhesive sheet) to which a wafer (plate-like member) is adhered and held on a mounting platform is known to fix the inner diameter side. The stage is used to move each of the expanded suction sections divided into four on the outer diameter side in the outer diameter direction (see, for example, Document 1: Japanese Patent Application Laid-Open No. 2001-223186). In the method of widening the interval between the wafers as described above, for example, four directions of + X-axis direction, -X-axis direction, + Y-axis direction, and -Y-axis direction are applied to the bonding sheet, and the sensing means senses For example, if the wafer located at the outermost periphery has reached a predetermined position, the action of widening the interval is completed.

但是,在文獻1所記載之習知方法中,在接著薄片係 除了上述4方向之外,亦對例如該等之合成方向,亦即+X軸方向與+Y軸方向的合成方向、+X軸方向與-Y軸方向的合成方向、-X軸方向與+Y軸方向的合成方向、-X軸方向與-Y軸方向的合成方向賦予張力。結果,在內側的晶片的間隔與外側的晶片的間隔產生差異。但是,如上所示之間隔的差異極為微小,因此各晶片係被設為間隔被均等加寬者,以利用計算所導出的位置(以下有時稱為「理論上的位置」)為基準,藉由搬送裝置或拾取裝置等搬送手段予以搬送,被裝載在被裝載物上而形成製造物。結果,產生該製造物中的晶片與被裝載物的相對位置關係微妙地偏移的情形,打線接合的連接位置偏移、或晶片與被裝載物的端子彼此的位置偏移,產生無法取得該等的導通,使該製造物的良率降低的不良情形。 However, in the conventional method described in Document 1, the sheet system In addition to the above 4 directions, for example, the composite directions, such as the composite direction of + X axis direction and + Y axis direction, the composite direction of + X axis direction and -Y axis direction, -X axis direction and + Tension is applied to the combined direction of the Y-axis direction, and the combined direction of the -X-axis direction and the -Y-axis direction. As a result, there is a difference in the interval between the wafers on the inner side and the wafer. However, the difference between the gaps shown above is extremely small. Therefore, each chip is set to have an evenly widened gap, and based on the position derived from the calculation (hereinafter sometimes referred to as "theoretical position"), It is conveyed by conveyance means, such as a conveyance device and a pick-up device, and it is loaded on a to-be-loaded object, and a manufactured object is formed. As a result, the relative positional relationship between the wafer and the object in the manufactured product may be slightly shifted, the connection position of the wire bonding may be shifted, or the positions of the terminals of the wafer and the object may be shifted. And other conduction, a disadvantage that the yield of the manufactured product is reduced.

此外,對接著薄片賦予張力的結果,不僅晶片間相互的間隔,亦有設有各晶片的接著薄片上的黏貼區域全體由理論上的位置偏移的情形,產生亦對藉由搬送手段所為之搬送造成妨礙的不良情形。 In addition, as a result of applying tension to the bonding sheet, not only the interval between the wafers, but also the entire adhesion area on the bonding sheet provided with each wafer may be shifted from the theoretical position, which may also be caused by the conveyance method. The adverse situation caused by transportation.

其中,該等課題係不僅有關於半導體裝置的製造,在例如緻密的機械零件或微細的裝飾品等中亦會發生。 Among them, these problems are not only related to the manufacture of semiconductor devices, but also occur in, for example, dense mechanical parts or fine ornaments.

本發明之目的在提供當將由板狀構件所形成的複數片狀體的相互間隔加寬時,可盡量防止各片狀體的位置由理論上的位置偏移的間離裝置及間離方法。 An object of the present invention is to provide a separation device and a separation method capable of preventing the position of each sheet body from being shifted from the theoretical position as much as possible when the interval between a plurality of sheet bodies formed by a plate-shaped member is widened.

為達成前述目的,本發明之間離裝置係採用以下構成:其係在接著薄片上的板狀構件賦予至少2方向的張力而將由該板狀構件所形成的複數片狀體的相互間隔加寬的間離裝置,其具備有:分別以複數保持構件保持前述接著薄片的複數保持手段;及使前述各保持手段以前述至少2方向移動而在前述接著薄片賦予張力的張力賦予手段,前述保持手段係被設為:以與前述張力賦予手段使前述保持手段移動的方向呈交叉的交叉方向使前述保持構件移動,藉此可對前述接著薄片以前述交叉方向賦予張力。 In order to achieve the foregoing object, the separation device of the present invention adopts a structure in which a plate-like member attached to a sheet is provided with tension in at least two directions to widen the interval between a plurality of sheet-like bodies formed by the plate-like member. The separating device includes a plurality of holding means for holding the bonding sheet by a plurality of holding members, and a tension applying means for moving the holding means in at least two directions to apply tension to the bonding sheet, and the holding means. When the holding member is moved in an intersecting direction crossing the direction in which the tensioning means moves the holding means, tension can be applied to the adhesive sheet in the intersecting direction.

此時,在本發明之間離裝置中,較佳為前述各保持手段係具備有:以前述交叉方向使複數前述保持構件各個移動的第1移動手段;及以前述張力賦予手段使前述保持手段移動的方向使複數前述保持構件分別移動的複數第2移動手段。 In this case, in the separation device of the present invention, it is preferable that each of the holding means includes: a first moving means for moving each of the plurality of holding members in the crossing direction; and the holding means by the tension applying means. The moving direction is a plurality of second moving means for moving the plurality of holding members.

此外,在本發明之間離裝置中,較佳為具有測定前述片狀體的相互間隔的測定手段,複數前述保持構件係以可根據前述測定手段的測定結果來賦予張力的方式而設。 Further, in the separation device of the present invention, it is preferable to have a measuring means for measuring the mutual distance between the sheet-like bodies, and the plurality of holding members are provided so that tension can be imparted based on the measurement results of the measuring means.

另一方面,本發明之間離方法係採用以下構成:其係在接著薄片上的板狀構件賦予至少2方向的張力而將由該板狀構件所形成的複數片狀體的相互間隔加寬的間離方法,其具備有:分別以具備有複數保持構件的複數保持手段保持前述接著薄片的工程;以張力賦予手段使前述各保持手段以前述至少2方向移動而在前述接著薄片賦予張力的工程;及以與前述張力賦予手段使前述保持手段移動的 方向呈交叉的交叉方向使前述保持構件移動,藉此對前述接著薄片以前述交叉方向賦予張力的工程。 On the other hand, the separation method of the present invention adopts a configuration in which a plate-like member attached to a sheet is provided with tension in at least two directions to widen the interval between a plurality of sheet-like bodies formed by the plate-like member. The separation method includes a process of holding the bonding sheet by a plurality of holding means including a plurality of holding members, and a process of applying tension to the holding means by moving the holding means in at least two directions and applying tension to the bonding sheet. ; And moving the holding means with the tension applying means A process in which the holding member is moved in an intersecting direction in which the directions intersect, and tension is applied to the bonding sheet in the intersecting direction.

藉由如以上所示之本發明,以張力賦予手段使保持手段移動而在接著薄片賦予張力,並且藉由保持構件以與張力賦予手段使保持手段移動的方向呈交叉的交叉方向賦予張力,藉此可調整由板狀構件所形成的複數片狀體的相互間隔,且可盡量防止各片狀體的位置由理論上的位置偏移的情形。 According to the present invention as described above, the holding means is moved by the tension applying means, and then the sheet is given tension, and the holding member is given tension in an intersecting direction crossing the direction in which the holding means is moved by the tension applying means. This can adjust the interval between the plurality of sheet-like bodies formed by the plate-like members, and can prevent the position of each sheet-like body from being shifted from the theoretical position as much as possible.

此時,若各保持手段具備有:第1移動手段及第2移動手段,可更加緻密地調整各片狀體的相互間隔。 In this case, if the holding means includes the first moving means and the second moving means, the distance between the sheet-like bodies can be adjusted more densely.

此外,若複數保持構件以可根據片狀體的相互間隔的測定結果來賦予張力的方式而設,可按板狀構件被暫時接著在接著薄片的每個一體物,盡量防止各片狀體的位置由理論上的位置惼移。 In addition, if the plurality of holding members are provided so that tension can be provided based on the measurement results of the mutual distance between the sheet-like bodies, the plate-like members can be temporarily adhered to each of the integrated bodies of the sheet to prevent as much as possible the individual sheet-like bodies. The position shifts from the theoretical position.

10‧‧‧間離裝置 10‧‧‧ separation devices

20‧‧‧保持手段 20‧‧‧ means of retention

21‧‧‧第1線性馬達 21‧‧‧The first linear motor

22‧‧‧滑件 22‧‧‧ Slide

23‧‧‧第2線性馬達 23‧‧‧ 2nd linear motor

24‧‧‧滑件 24‧‧‧ Slide

25‧‧‧保持構件 25‧‧‧ holding member

26‧‧‧下支持構件 Supporting members under 26‧‧‧

27‧‧‧旋動馬達 27‧‧‧Rotating motor

27A‧‧‧輸出軸 27A‧‧‧Output shaft

28‧‧‧上支持構件 28‧‧‧up support components

30‧‧‧線性馬達 30‧‧‧ Linear Motor

31‧‧‧滑件 31‧‧‧ Slide

40‧‧‧測定手段 40‧‧‧Measurement method

AC‧‧‧包圍區域 AC‧‧‧ Surrounded Area

AL‧‧‧拉伸區域 AL‧‧‧Stretching area

AP‧‧‧頂部 AP‧‧‧Top

AS‧‧‧接著薄片 AS‧‧‧thin sheet

AW‧‧‧被著體黏貼區域 AW‧‧‧ adhered to the body

CP‧‧‧晶片 CP‧‧‧Chip

CT‧‧‧中心點 CT‧‧‧ Center Point

CU‧‧‧不干涉切口 CU‧‧‧No interference incision

WF‧‧‧晶圓 WF‧‧‧ Wafer

WK‧‧‧一體物 WK‧‧‧One

圖1係本發明之一實施形態的間離裝置的側面圖。 FIG. 1 is a side view of a separation device according to an embodiment of the present invention.

圖2係圖1的間離裝置的平面圖。 FIG. 2 is a plan view of the separation device of FIG. 1. FIG.

圖3A係以圖1的間離裝置賦予張力的接著薄片的態樣圖。 FIG. 3A is a view showing a state of a bonding sheet provided with tension by the separation device of FIG. 1. FIG.

圖3B係以圖1的間離裝置賦予張力的接著薄片的態樣圖。 FIG. 3B is a view showing a state of the adhesive sheet applied with tension by the separation device of FIG. 1.

以下根據圖示,說明本發明之一實施形態。 An embodiment of the present invention will be described below with reference to the drawings.

其中,在本實施形態中,X軸、Y軸、Z軸係處於分別呈正交的關係,X軸及Y軸係形成為預定平面內的軸,Z軸係形成為與前述預定平面呈正交的軸。此外,在本實施形態中,若將由與Y軸呈平行之圖1中跟前方向觀看時為基準而顯示方向時,「上」為Z軸的箭號方向,「下」為其相反方向,「左」為X軸的箭號方向,「右」為其相反方向,「前」為Y軸的箭號方向,圖1中與紙面呈正交的跟前方向,「後」為其相反方向。 Among them, in this embodiment, the X-axis, Y-axis, and Z-axis systems are orthogonal to each other, the X-axis and Y-axis systems are formed as axes in a predetermined plane, and the Z-axis system is formed to be positive with the predetermined plane. Intersecting axes. In addition, in this embodiment, if the display direction is viewed from the forward direction in FIG. 1 parallel to the Y axis as the reference, "up" is the direction of the arrow on the Z axis, and "down" is the opposite direction. "Left" is the direction of the arrow on the X axis, "Right" is the direction of the arrow, and "front" is the direction of the arrow on the Y axis. In Figure 1, the forward direction is orthogonal to the paper surface, and "back" is the opposite direction.

在圖1、圖2中,間離裝置10係在接著薄片AS上之作為板狀構件的四角形的晶圓WF,以+X軸方向、+Y軸方向、-X軸方向、-Y軸方向(參照圖3A)的4方向賦予張力,而將由該晶圓WF所形成之作為複數片狀體的晶片CP的相互間隔加寬的裝置,具備有:分別以4具保持構件25保持接著薄片AS的4具保持手段20;以各自的滑件31支持各保持手段20,且使各保持手段20朝前述4方向移動而對接著薄片AS賦予張力的驅動機器,亦即作為張力賦予手段的4具線性馬達30;及測定晶片CP的相互間隔的光學感測器或攝影機等測定手段40。其中,保持手段20及線性馬達30係以中心點CT為中心而分別在前後左右設有4具。此外,晶圓WF係可藉由切斷刀或加壓水等晶圓切斷手段而被個片化成晶片CP,或藉由雷射光或藥液等晶圓脆弱化手段而被個片化成晶片CP,被暫時接著在接著薄片AS而形成為一體物WK。此外,接著 薄片AS係由包圍黏貼有晶圓WF的被著體黏貼區域AW的多角形的包圍區域AC(參照圖2)的各頂部AP分別朝接著薄片AS的外緣方向延伸,形成防止對該包圍區域AC以各張力方向的合成方向賦予張力的不干涉切口CU,形成有由包圍區域AC的各邊分別以+X軸方向、-X軸方向、+Y軸方向、-Y軸方向延伸的拉伸區域AL。 In FIG. 1 and FIG. 2, the separation device 10 is a quadrangular wafer WF as a plate-like member on the bonding sheet AS in the + X-axis direction, + Y-axis direction, -X-axis direction, and -Y-axis direction. (Refer to FIG. 3A) A device for applying tension in four directions and widening the interval between wafers CP as a plurality of sheet bodies formed from the wafer WF includes four holding members 25 each holding the bonding sheet AS. 4 holding means 20; driving means for supporting each holding means 20 with their respective sliders 31 and moving each holding means 20 in the aforementioned 4 directions to apply tension to the sheet AS, that is, 4 means for applying tension Linear motor 30; and measuring means 40 such as an optical sensor or a camera that measures the distance between the wafers CP. Among them, the holding means 20 and the linear motor 30 are provided around the center point CT, and are provided at the front, back, left, and right. In addition, the wafer WF can be singulated into wafers by wafer cutting means such as a cutter or pressurized water, or singulated into wafers by means of wafer fragility such as laser light or chemical liquid. The CP is temporarily adhered to the sheet AS to form the integrated body WK. In addition, The sheet AS is formed by extending each of the top APs of the polygonal enclosing region AC (see FIG. 2) that surrounds the adhered area AW to which the wafer WF is adhered, so as to prevent the enclosing region. The non-interfering notch CU that applies tension in the combined direction of the directions of each of the ACs is formed with stretches extending in the + X-axis direction, -X-axis direction, + Y-axis direction, and -Y-axis direction from each side of the surrounding area AC Area AL.

保持手段20係具備有:以與線性馬達30使保持手段20移動的方向呈交叉的交叉方向,使複數保持構件25各個移動的驅動機器,亦即作為第1移動手段的第1線性馬達21;被支持在第1線性馬達21的滑件22,以線性馬達30使保持手段20移動的方向使保持構件25移動的4具驅動機器,亦即作為第2移動手段的第2線性馬達23;及被支持在第2線性馬達23的滑件24的保持構件25。 The holding means 20 is provided with a driving device that moves each of the plurality of holding members 25 in an intersection direction that intersects the direction in which the linear means 30 moves the holding means 20, that is, the first linear motor 21 as the first moving means; Four driving machines supported by the slider 22 of the first linear motor 21 and moving the holding member 25 in the direction in which the linear motor 30 moves the holding means 20, that is, the second linear motor 23 as the second moving means; and The holding member 25 is supported by the slider 24 of the second linear motor 23.

保持構件25係具備有:被支持在第2線性馬達23的滑件24的下支持構件26;被支持在下支持構件26的旋動馬達27;及被支持在旋動馬達27的輸出軸27A(貫穿軸)的上支持構件28。 The holding member 25 is provided with a lower support member 26 supported by the slider 24 of the second linear motor 23, a rotary motor 27 supported by the lower support member 26, and an output shaft 27A supported by the rotary motor 27 ( Through shaft) upper support member 28.

藉由如以上所示之構成,保持手段20係以與張力賦予手段使保持手段20移動的方向呈交叉的交叉方向使保持構件25移動,藉此以可對接著薄片AS以交叉方向賦予張力的方式而設。其中,保持手段20係根據測定手段40的測定結果,以可賦予張力的方式而設。 With the configuration as described above, the holding means 20 moves the holding member 25 in an intersecting direction that intersects the direction in which the holding means 20 moves with the tension applying means. Way. Among these, the holding means 20 is provided so that a tension | tensile_strength can be provided based on the measurement result of the measuring means 40.

在以上之間離裝置10中,說明將由晶圓WF所形成的複數晶片CP的相互間隔加寬的順序。 In the above separation device 10, a procedure for widening the mutual intervals of the plurality of wafers CP formed by the wafer WF will be described.

首先,對於各構件在初期位置待機之圖1中以實線所示的間離裝置10,人工或多關節機器人或帶式輸送機等未圖示的搬送手段搬送一體物WK,將該一體物WK被配置在各下支持構件26上的方式進行載置。此時,測定手段40與可移動一體物WK的未圖示的定位手段共同動作,進行晶圓WF與各保持構件25定位。之後,各保持手段20驅動旋動馬達27,如圖2所示,以下支持構件26及上支持構件28夾入接著薄片AS。 First, with respect to the separating device 10 shown by the solid line in FIG. 1 in which each member is waiting at an initial position, an integrated object WK is conveyed by an unillustrated conveying means such as a manual or articulated robot or a belt conveyor, and the integrated object The WK is placed so as to be placed on each of the lower supporting members 26. At this time, the measurement means 40 operates in conjunction with a positioning means (not shown) of the movable integrated body WK to perform positioning of the wafer WF and each holding member 25. Thereafter, each holding means 20 drives the rotation motor 27. As shown in FIG. 2, the lower support member 26 and the upper support member 28 are sandwiched between the sheet AS.

接著,張力賦予手段驅動線性馬達30,如圖3A所示,使各保持構件25各個朝+X軸方向、+Y軸方向、-X軸方向、-Y軸方向的4方向移動。藉此,在接著薄片AS中的包圍區域AC,以+X軸方向、+Y軸方向、-X軸方向、-Y軸方向的4方向被賦予張力,晶片CP的相互間隔擴展。接著,若測定手段40感測位於最外周的晶片CP已到達預定位置,亦即,經個片化而擴展的晶圓WF(相互間隔被擴展的晶片CP群)中對向2邊的預定位置(以下有將對向2邊的預定位置稱為「基準位置」的情形)的寬幅成為預定寬幅的情形時,張力賦予手段停止線性馬達30的驅動,並且測定手段40測定各晶片CP的相互間隔。 Next, the tension applying means drives the linear motor 30 to move each of the holding members 25 in four directions of the + X-axis direction, the + Y-axis direction, the -X-axis direction, and the -Y-axis direction, as shown in FIG. 3A. Thereby, the enclosing area AC in the adhesive sheet AS is given tension in four directions of + X-axis direction, + Y-axis direction, -X-axis direction, and -Y-axis direction, and the interval between the wafers CP is expanded. Next, if the measuring means 40 senses that the wafer CP located at the outermost periphery has reached a predetermined position, that is, the predetermined positions facing the two sides in the wafer WF (the wafer CP group whose distance is extended from each other) is expanded by individualization. (When the predetermined position facing the two sides is hereinafter referred to as the "reference position"). When the wide width becomes the predetermined width, the tension applying means stops the driving of the linear motor 30, and the measuring means 40 measures the chip CP. Spaced from each other.

在此,在接著薄片AS係形成有不干涉切口CU,因此可盡量抑制各張力方向的合成方向的張力被賦予至包圍區域AC的情形,但是即使如此,仍在晶片CP的相互間隔產生微妙產異,有無法將各晶片CP配置在理論上的位置的情形。其中,各晶片CP的理論上的位置係指由經個 片化而被擴展的晶圓WF的基準位置的寬幅,減掉擴展前的晶圓WF的基準位置的寬幅,各以除以該基準位置中形成在複數晶片CP間的間隔線的數量後的值份,使各晶片CP被均等擴展時的該各晶片CP的位置。 Here, the non-interfering notch CU is formed in the AS sheet. Therefore, it is possible to suppress the situation where the tension in the combined direction of the tension directions is applied to the surrounding area AC as much as possible. However, subtle production still occurs at the interval between the wafer CPs. However, there is a case where each chip CP cannot be arranged at a theoretical position. Among them, the theoretical position of each chip CP refers to the The width of the reference position of the wafer WF that has been expanded and expanded is subtracted from the width of the reference position of the wafer WF before the expansion, and each is divided by the number of space lines formed between the plurality of wafers CP in the reference position. The subsequent values make the position of each wafer CP when each wafer CP is evenly expanded.

因此,根據測定手段40的測定結果,各第1移動手段驅動各第1線性馬達21,如圖3B所示,使各保持構件25朝前後方向或左右方向移動來調整各保持構件25彼此的間隔,藉此可調整晶片CP的相互間隔。此外,各第2移動手段驅動第2線性馬達23,且使各保持構件25朝左右方向或前後方向移動,藉由線性馬達30以保持手段20移動的方向賦予張力,藉此可更加緻密地調整晶片CP的相互間隔。藉此,使各晶片CP配置在理論上的位置(盡量使各晶片CP的相互間隔成為等間隔)。 Therefore, based on the measurement result of the measurement means 40, each first moving means drives each first linear motor 21, and as shown in FIG. 3B, each holding member 25 is moved in the front-rear direction or left-right direction to adjust the interval between the holding members 25. In this way, the interval between the chips CP can be adjusted. In addition, each second moving means drives the second linear motor 23 and moves each holding member 25 in the left-right direction or the front-rear direction. The linear motor 30 applies tension in the direction in which the holding means 20 moves, thereby making it possible to adjust more densely. The wafers CP are spaced from each other. Thereby, each wafer CP is arrange | positioned at a theoretical position (the space | interval of each wafer CP should be made as uniform as possible).

其中,當藉由第1線性馬達21、第2線性馬達23的驅動來調整晶片CP的相互間隔時,可為各保持構件25的至少1個移動,該等的移動距離或移動方向可為相同,亦可為不同。 Among them, when the mutual distance between the wafers CP is adjusted by the driving of the first linear motor 21 and the second linear motor 23, at least one of the holding members 25 can be moved, and the moving distances and directions of these can be the same. It can also be different.

之後,搬送裝置或拾取裝置等未圖示的搬送手段以理論上的位置為基準來保持各晶片CP且搬送,且裝載在引線框架或基板等被裝載物上。之後,若全部晶片CP的搬送結束,各保持手段20、第1、第2移動手段、及張力賦予手段驅動各驅動機器,在使各構成構件恢復至初期位置之後,搬送手段回收晶片CP被卸下後的一體物WK,之後反覆上述同樣動作。 Thereafter, a transporting means (not shown) such as a transporting device or a pick-up device holds and conveys each wafer CP based on a theoretical position, and loads the wafers CP on a load such as a lead frame or a substrate. Thereafter, when the transfer of all the wafers CP is completed, each of the holding means 20, the first and second moving means, and the tension applying means drives each driving device, and after returning each constituent member to the initial position, the transfer means recovers the wafer CP and is unloaded After the lower body WK is lowered, the same operation as above is repeated.

藉由如以上所示之實施形態,以張力賦予手段使保持手段20移動而對接著薄片AS賦予張力,並且藉由保持構件25,張力賦予手段以相對使保持手段20移動的方向的交叉方向賦予張力,藉此可調整由晶圓WF所形成的複數晶片CP的相互間隔,且可盡量防止各晶片CP的位置由理論上的位置偏移。 According to the embodiment described above, the holding means 20 is moved by the tension applying means to apply tension to the adhesive sheet AS, and the holding member 25 is used to apply the tension applying means in a direction intersecting with the direction in which the holding means 20 is moved. The tension can adjust the interval between the plurality of wafers CP formed by the wafer WF, and can prevent the positions of the wafers CP from shifting from the theoretical position as much as possible.

如以上所示,用以實施本發明的最佳構成、方法等係已在前述記載中揭示,惟本發明並非為被限定於此者。亦即,本發明主要係關於特定的實施形態特別圖示且加以說明,惟未脫離本發明之技術的思想及目的的範圍,對於以上所述之實施形態,在形狀、材質、數量、其他詳細構成中,該領域熟習該項技術者可施加各種變形者。此外,限定以上所揭示的形狀、材質等的記載係為輕易理解本發明而例示性記載者,並非為限定本發明者,因此不在該等形狀、材質等限定的一部分或全部的限定的構件名稱的記載係包含在本發明中。 As shown above, the best configuration and method for implementing the present invention have been disclosed in the foregoing description, but the present invention is not limited to this. That is, the present invention is mainly illustrated and described with respect to specific embodiments, but does not depart from the scope of the technical idea and purpose of the present invention. For the above-mentioned embodiments, the shape, material, number, and other details are detailed. In the constitution, those skilled in the art can apply various deformations. In addition, the descriptions limiting the shapes, materials, etc. disclosed above are exemplified for easy understanding of the present invention, and are not intended to limit the present inventors. Therefore, they are not part or all of the names of members that are limited by such shapes, materials, etc. The description is included in the present invention.

保持手段20亦可為機械夾頭或夾頭汽缸等夾持手段、或減壓泵或真空抽氣器等未圖示的減壓手段、或以接著劑、磁力等支持一體物WK的構成。 The holding means 20 may be a holding means such as a mechanical chuck or a chuck cylinder, a pressure reducing means (not shown) such as a pressure reducing pump or a vacuum aspirator, or a structure that supports the integrated body WK with an adhesive or magnetic force.

保持手段20可為2具或3具,亦可為5具以上。 The holding means 20 may be two or three, and may be five or more.

保持手段20所具有的保持構件可為2具或3具,亦可為5具以上,在各保持手段20的個數可為相同,亦可為不同。 The holding means 20 may include two or three holding members, or five or more holding members. The number of holding members 20 may be the same or different.

各保持構件25進行移動的交叉方向亦可為與藉由線 性馬達30,保持手段20進行移動的方向呈正交的方向,亦可為斜向交叉的方向,此時,亦可至少1具保持構件的前述交叉方向為正交方向,其他保持構件的前述交叉方向為傾斜方向。 The intersecting direction in which each holding member 25 is moved may also be a line through a line. The direction of movement of the linear motor 30 and the holding means 20 is orthogonal, or may be an obliquely crossing direction. At this time, the crossing direction of at least one holding member may be an orthogonal direction, and the foregoing holding directions of other holding members may be orthogonal. The crossing direction is an oblique direction.

各第1移動手段係可先固定各保持構件25的至少1具,使其他保持構件以相對藉由線性馬達30,保持手段20進行移動的方向呈正交方向移動,此時,亦可未設置使固定的保持構件移動的第1移動手段。 Each of the first moving means may first fix at least one of the holding members 25 so that the other holding members are moved in an orthogonal direction relative to the direction in which the holding means 20 is moved by the linear motor 30. At this time, it may not be provided. The first moving means for moving the fixed holding member.

第2移動手段亦可先固定保持構件25的至少1具,使其他保持構件以藉由線性馬達30,保持手段20進行移動的方向移動,此時,亦可未設置使固定的保持構件移動的第2移動手段。 The second moving means may first fix at least one of the holding members 25, and move the other holding members in the direction in which the holding means 20 is moved by the linear motor 30. At this time, there may be no provision for moving the fixed holding members. 2nd moving means.

保持手段20亦可未具備第2移動手段。 The holding means 20 may not include the second moving means.

張力賦予手段係可先固定各保持手段20的至少1具,使其他保持手段移動,此時,亦可未設置使固定的保持手段移動的張力賦予手段。 The tension applying means may first fix at least one of the holding means 20 and move the other holding means. At this time, the tension applying means may not be provided to move the fixed holding means.

張力賦予手段可為2具或3具,亦可為5具以上。 The means for applying tension may be two or three, and may be five or more.

測定手段40亦可未設置,此時,亦可由辨識到晶片CP的相互間隔為不同的作業人員操作保持手段20、張力賦予手段,來調整晶片CP的相互間隔,亦可對全部一體物WK,以相同條件賦予張力。 The measurement means 40 may not be provided. At this time, it is also possible to adjust the interval between the wafer CPs by adjusting the distance between the wafer CPs by different operators operating the holding means 20 and the tension applying means. Tension is applied under the same conditions.

接著薄片AS的形狀係如在圖2、圖3A、圖3B中以二点鏈線所示,可為四角形,亦可為八角形,亦可為其他形狀。 Then, the shape of the sheet AS is shown as a two-dot chain line in FIG. 2, FIG. 3A, and FIG. 3B, and may be a quadrangle, an octagon, or other shapes.

賦予至晶圓WF的張力的方向可為2方向或3方向,亦可為5方向以上,若配合該方向的數量來設置保持手段及張力賦予手段即可。 The direction of the tension applied to the wafer WF may be 2 or 3 directions, or may be 5 or more directions. The holding means and the tension applying means may be provided in accordance with the number of the directions.

板狀構件或片狀體的形狀亦可為例如圓形、橢圓形、三角形或五角形以上的多角形等其他形狀。 The shape of the plate-like member or the sheet-like body may be other shapes such as a circle, an oval, a triangle, or a polygon having a pentagon or more.

此外,本發明中的接著薄片AS的材質、類別、形狀等並非特別限定。例如,接著薄片AS亦可為圓形、橢圓形、三角形或五角形以上的多角形等其他形狀。此外,接著薄片AS亦可為例如僅有接著劑層的單層者、在基材與接著劑層之間具有中間層者、在基材的上面具有被覆層等3層以上者、甚至可將基材由接著劑層剝離之所謂兩面接著薄片者,兩面接著薄片亦可為具有單層或複層的中間層者、或不具中間層的單層或複層者。此外,以板狀構件而言,例如矽半導體晶圓或化合物半導體晶圓等半導體晶圓、電路基板、光碟等資訊記錄基板、玻璃板、鋼板、陶器、木板或樹脂板等任意形態的構件或物品等亦可作為對象,片狀體若為該等被個片化者即可。其中,接著薄片AS若改為功能上、用途上的讀法,亦可為例如保護薄片、切割膠帶、晶粒附著薄膜、黏晶膠帶等任意薄片、薄膜、膠帶等。 The material, type, shape, and the like of the adhesive sheet AS in the present invention are not particularly limited. For example, the subsequent sheet AS may also have other shapes such as a circle, an oval, a triangle, or a polygon having a pentagon or more. In addition, the adhesive sheet AS may be, for example, a single layer having only an adhesive layer, an intermediate layer between the base material and the adhesive layer, a three or more layers including a coating layer on the base material, or the like. The so-called two-sided adhesive sheet with the substrate peeled off from the adhesive layer may be a single-layered or multi-layered intermediate layer or a single-layered or multi-layered layer without an intermediate layer. In addition, in terms of plate-like members, for example, semiconductor wafers such as silicon semiconductor wafers or compound semiconductor wafers, circuit substrates, information recording substrates such as optical discs, glass plates, steel plates, ceramics, wooden boards, or resin plates Articles and the like can also be used as objects, and the sheet-like body may be one that has been fragmented. Among them, if the sheet AS is changed to read functionally or in terms of use, it may be, for example, any sheet, film, or tape such as a protective sheet, a dicing tape, a die attach film, or a sticky crystal tape.

本發明中的手段及工程只要可達成針對該等手段及工程所說明的動作、功能或工程,即沒有任何限制,此外並沒有完全被限定為在前述實施形態中所示之僅為一實施形態的構成物或工程的情形。例如,張力賦予手段若為使複 數保持手段以至少2方向移動而在接著薄片賦予張力者,對照申請時之技術常識,若為該技術範圍內者,即沒有任何限定(省略有關其他手段及工程的說明)。 As long as the means and processes in the present invention can achieve the actions, functions, or processes described with respect to these means and processes, there are no restrictions, and they are not completely limited to the one shown in the foregoing embodiments. The situation of the components or works. For example, if Those who hold the number holding means in at least two directions and give tension to the subsequent sheet are compared with the technical common sense at the time of application. If it is within the technical scope, there is no limitation (the description of other means and engineering is omitted).

此外,前述實施形態中的驅動機器係可採用旋動馬達、直動馬達、線性馬達、單軸機器人、多關節機器人等電動機器、空氣汽缸、油壓汽缸、無桿式汽缸及旋轉汽缸等致動器等,此外亦可採用將該等直接或間接組合者(亦有與實施形態中所例示者重複者)。 In addition, in the foregoing embodiment, the driving machine may be a rotary motor, a direct-acting motor, a linear motor, a single-axis robot, a multi-joint robot, and other electric machines, air cylinders, hydraulic cylinders, rodless cylinders, and rotary cylinders. It is also possible to use a combination of actuators and the like directly or indirectly (there is also overlap with those exemplified in the embodiment).

Claims (4)

一種間離裝置,其係在接著薄片上的板狀構件賦予至少2方向的張力而將由該板狀構件所形成的複數片狀體的相互間隔加寬的間離裝置,其特徵為:具備有:分別以複數保持構件保持前述接著薄片的複數保持手段;及使前述各保持手段以前述至少2方向移動而在前述接著薄片賦予張力的張力賦予手段,前述保持手段係被設為:以與前述張力賦予手段使前述保持手段移動的方向呈交叉的交叉方向使前述保持構件移動,藉此可對前述接著薄片以前述交叉方向賦予張力。A separation device comprising a plate-shaped member attached to a sheet, which is provided with tension in at least two directions, and a separation device that widens the space between a plurality of sheet-like bodies formed by the plate-shaped member, comprising: : Each of a plurality of holding means for holding the adhesive sheet with a plurality of holding members; and a tension applying means for moving each of the holding means in the at least two directions to apply tension to the adhesive sheet, the holding means is set to be the same as the The tension applying means moves the holding member in an intersecting direction in which the direction in which the holding means moves crosses, thereby applying tension to the adhesive sheet in the intersecting direction. 如申請專利範圍第1項之間離裝置,其中,前述各保持手段係具備有:以前述交叉方向使複數前述保持構件各個移動的第1移動手段;及以前述張力賦予手段使前述保持手段移動的方向使複數前述保持構件分別移動的複數第2移動手段。For example, in the first range of the patent application, each of the holding means includes: a first moving means for moving each of the plurality of holding members in the crossing direction; and moving the holding means with the tension applying means. The direction is a plurality of second moving means for moving the plurality of holding members. 如申請專利範圍第1項或第2項之間離裝置,其中,具有測定前述片狀體的相互間隔的測定手段,複數前述保持構件係以可根據前述測定手段的測定結果來賦予張力的方式而設。For example, if there is a separation device in the first or second scope of the patent application, there is a measuring means for measuring the interval between the sheet-like bodies, and the plurality of holding members are configured to provide tension based on the measurement results of the measuring means. And set. 一種間離方法,其係在接著薄片上的板狀構件賦予至少2方向的張力而將由該板狀構件所形成的複數片狀體的相互間隔加寬的間離方法,其特徵為:具備有:分別以具備有複數保持構件的複數保持手段保持前述接著薄片的工程;以張力賦予手段使前述各保持手段以前述至少2方向移動而在前述接著薄片賦予張力的工程;及以與前述張力賦予手段使前述保持手段移動的方向呈交叉的交叉方向使前述保持構件移動,藉此對前述接著薄片以前述交叉方向賦予張力的工程。A separation method in which a plate-like member on an adhesive sheet is provided with tension in at least two directions to widen the interval between a plurality of sheet-like bodies formed by the plate-like member, and is characterized in that: : A process of holding the bonding sheet by a plurality of holding means including a plurality of holding members; a process of applying tension to the holding sheet by moving the holding means in at least two directions by a tension applying means; and applying a tension to the bonding sheet; A method of moving the holding member in a crossing direction in which the moving direction of the holding means intersects and moving the holding member to thereby apply tension to the bonding sheet in the crossing direction.
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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018160580A (en) * 2017-03-23 2018-10-11 株式会社ディスコ Expansion device and expansion method
JP7073606B2 (en) * 2017-04-11 2022-05-24 リンテック株式会社 Separation device and separation method
JP6880431B2 (en) * 2017-04-11 2021-06-02 リンテック株式会社 Separation device and separation method
JP6820099B2 (en) * 2017-05-10 2021-01-27 リンテック株式会社 Separation device and separation method
JP6884961B2 (en) * 2017-05-10 2021-06-09 リンテック株式会社 Separation device and separation method
JP6996046B2 (en) * 2017-05-10 2022-01-17 リンテック株式会社 Separation device and separation method
JP6880433B2 (en) * 2017-05-10 2021-06-02 リンテック株式会社 Separation device and separation method
JP6912938B2 (en) * 2017-05-29 2021-08-04 リンテック株式会社 Separation device and separation method
JP6848151B2 (en) * 2017-05-29 2021-03-24 リンテック株式会社 Separation device and separation method
JP6941022B2 (en) * 2017-10-06 2021-09-29 株式会社ディスコ Expansion method and expansion device
JP7076204B2 (en) * 2017-12-20 2022-05-27 株式会社ディスコ Split device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898940A (en) * 1981-12-09 1983-06-13 Nec Corp Semiconductor element separating device
JP2010221107A (en) * 2009-03-23 2010-10-07 Lintec Corp Light irradiating device and method
US20140339673A1 (en) * 2013-05-14 2014-11-20 Texas Instruments Incorporated Wafer processing

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339854A (en) * 1976-09-24 1978-04-12 Hitachi Ltd Jig for spacing
CN100547752C (en) * 2005-05-19 2009-10-07 琳得科株式会社 Adhering apparatus
JP4880293B2 (en) * 2005-11-24 2012-02-22 リンテック株式会社 Sheet sticking device and sticking method
JP5496692B2 (en) * 2010-01-22 2014-05-21 三洋電機株式会社 Manufacturing method of semiconductor module
JP2013026544A (en) * 2011-07-25 2013-02-04 Disco Abrasive Syst Ltd Wafer extension device
JP6009885B2 (en) * 2012-09-24 2016-10-19 株式会社ディスコ Tape expansion unit
JP6170681B2 (en) * 2013-01-24 2017-07-26 株式会社ディスコ Expansion device and expansion method
JP6087707B2 (en) * 2013-04-15 2017-03-01 株式会社ディスコ Tape expansion unit
CN204789359U (en) * 2015-05-27 2015-11-18 中科瑞阳膜技术(北京)有限公司 Diaphragm defect detecting ware

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898940A (en) * 1981-12-09 1983-06-13 Nec Corp Semiconductor element separating device
JP2010221107A (en) * 2009-03-23 2010-10-07 Lintec Corp Light irradiating device and method
US20140339673A1 (en) * 2013-05-14 2014-11-20 Texas Instruments Incorporated Wafer processing

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