TWI662087B - 光壓印用硬化性組成物、圖案形成方法及圖案 - Google Patents
光壓印用硬化性組成物、圖案形成方法及圖案 Download PDFInfo
- Publication number
- TWI662087B TWI662087B TW104108890A TW104108890A TWI662087B TW I662087 B TWI662087 B TW I662087B TW 104108890 A TW104108890 A TW 104108890A TW 104108890 A TW104108890 A TW 104108890A TW I662087 B TWI662087 B TW I662087B
- Authority
- TW
- Taiwan
- Prior art keywords
- curable composition
- fluorine
- acrylate
- meth
- photoimprint
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014063488A JP6139448B2 (ja) | 2014-03-26 | 2014-03-26 | 光インプリント用硬化性組成物、パターン形成方法、パターンおよび含フッ素化合物 |
JP2014-063488 | 2014-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201542714A TW201542714A (zh) | 2015-11-16 |
TWI662087B true TWI662087B (zh) | 2019-06-11 |
Family
ID=54195232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104108890A TWI662087B (zh) | 2014-03-26 | 2015-03-20 | 光壓印用硬化性組成物、圖案形成方法及圖案 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6139448B2 (ja) |
KR (1) | KR101849615B1 (ja) |
TW (1) | TWI662087B (ja) |
WO (1) | WO2015146709A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180014287A (ko) * | 2016-07-28 | 2018-02-08 | 삼성디스플레이 주식회사 | 패터닝된 경화물의 제조 방법 및 패터닝된 경화물 |
CN113354857A (zh) * | 2021-06-22 | 2021-09-07 | 湖南鼎一致远科技发展有限公司 | 一种耐候性能优异的热转印树脂碳带及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW363976B (en) * | 1996-06-10 | 1999-07-11 | Nof Corp | Fluoride-containing polyfunctional (meth)acrylates, compositions comprising the same, materials with low refractivity and reflection-reduction film |
TW201038596A (en) * | 2009-03-09 | 2010-11-01 | Fujifilm Corp | Curable composition for imprint, patterning method and pattern |
CN103339216A (zh) * | 2011-02-18 | 2013-10-02 | Agc清美化学股份有限公司 | 表面活性剂、含该表面活性剂的组合物、该表面活性剂的用途及含氟化合物 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5857014B2 (ja) * | 2012-09-27 | 2016-02-10 | 富士フイルム株式会社 | 光インプリント用硬化性組成物、パターン形成方法およびパターン |
JP2014192377A (ja) * | 2013-03-27 | 2014-10-06 | Asahi Glass Co Ltd | インプリント用光硬化性組成物の製造方法 |
-
2014
- 2014-03-26 JP JP2014063488A patent/JP6139448B2/ja active Active
-
2015
- 2015-03-17 KR KR1020167025983A patent/KR101849615B1/ko active IP Right Grant
- 2015-03-17 WO PCT/JP2015/057868 patent/WO2015146709A1/ja active Application Filing
- 2015-03-20 TW TW104108890A patent/TWI662087B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW363976B (en) * | 1996-06-10 | 1999-07-11 | Nof Corp | Fluoride-containing polyfunctional (meth)acrylates, compositions comprising the same, materials with low refractivity and reflection-reduction film |
TW201038596A (en) * | 2009-03-09 | 2010-11-01 | Fujifilm Corp | Curable composition for imprint, patterning method and pattern |
CN103339216A (zh) * | 2011-02-18 | 2013-10-02 | Agc清美化学股份有限公司 | 表面活性剂、含该表面活性剂的组合物、该表面活性剂的用途及含氟化合物 |
Also Published As
Publication number | Publication date |
---|---|
KR20160125452A (ko) | 2016-10-31 |
KR101849615B1 (ko) | 2018-05-31 |
TW201542714A (zh) | 2015-11-16 |
JP6139448B2 (ja) | 2017-05-31 |
JP2015185797A (ja) | 2015-10-22 |
WO2015146709A1 (ja) | 2015-10-01 |
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