TWI654678B - 用於終點偵測的序列特徵追蹤 - Google Patents

用於終點偵測的序列特徵追蹤

Info

Publication number
TWI654678B
TWI654678B TW104112258A TW104112258A TWI654678B TW I654678 B TWI654678 B TW I654678B TW 104112258 A TW104112258 A TW 104112258A TW 104112258 A TW104112258 A TW 104112258A TW I654678 B TWI654678 B TW I654678B
Authority
TW
Taiwan
Prior art keywords
sequence
polishing
spectral feature
substrate
spectrum
Prior art date
Application number
TW104112258A
Other languages
English (en)
Chinese (zh)
Other versions
TW201606870A (zh
Inventor
大衛傑弗瑞杜魯
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TW201606870A publication Critical patent/TW201606870A/zh
Application granted granted Critical
Publication of TWI654678B publication Critical patent/TWI654678B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • H10P52/00—

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
TW104112258A 2014-04-30 2015-04-16 用於終點偵測的序列特徵追蹤 TWI654678B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/265,707 US9352440B2 (en) 2014-04-30 2014-04-30 Serial feature tracking for endpoint detection
US14/265,707 2014-04-30

Publications (2)

Publication Number Publication Date
TW201606870A TW201606870A (zh) 2016-02-16
TWI654678B true TWI654678B (zh) 2019-03-21

Family

ID=54354538

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104112258A TWI654678B (zh) 2014-04-30 2015-04-16 用於終點偵測的序列特徵追蹤

Country Status (6)

Country Link
US (1) US9352440B2 (enExample)
JP (1) JP6440741B2 (enExample)
KR (1) KR102368644B1 (enExample)
CN (1) CN106463378B (enExample)
TW (1) TWI654678B (enExample)
WO (1) WO2015167790A1 (enExample)

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Publication number Priority date Publication date Assignee Title
US8747189B2 (en) * 2011-04-26 2014-06-10 Applied Materials, Inc. Method of controlling polishing
JP6595987B2 (ja) * 2014-04-22 2019-10-23 株式会社荏原製作所 研磨方法
TWI789385B (zh) 2017-04-21 2023-01-11 美商應用材料股份有限公司 使用神經網路來監測的拋光裝置
US10898986B2 (en) * 2017-09-15 2021-01-26 Applied Materials, Inc. Chattering correction for accurate sensor position determination on wafer
TWI845444B (zh) 2018-04-03 2024-06-11 美商應用材料股份有限公司 針對墊子厚度使用機器學習及補償的拋光裝置、拋光系統、方法及電腦儲存媒體
US20200035495A1 (en) * 2018-07-25 2020-01-30 Globalfoundries Inc. Chemical-mechanical polishing with variable-pressure polishing pads
KR102631891B1 (ko) 2018-09-26 2024-02-01 어플라이드 머티어리얼스, 인코포레이티드 인-시튜 전자기 유도 모니터링에 대한 가장자리 재구성에서의 기판 도핑에 대한 보상
JP2021028099A (ja) * 2019-08-09 2021-02-25 株式会社荏原製作所 終点検知装置、終点検知方法
CN110549240B (zh) * 2019-09-18 2020-12-29 清华大学 一种终点检测方法和化学机械抛光装置
CN112247740B (zh) * 2020-09-25 2025-12-09 富联裕展科技(深圳)有限公司 打磨装置、方法、辅助打磨的装置、系统及方法
CN116141178B (zh) * 2023-04-17 2023-07-18 杭州鄂达精密机电科技有限公司 一种半导体阀门的加工系统及其方法

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US5838447A (en) 1995-07-20 1998-11-17 Ebara Corporation Polishing apparatus including thickness or flatness detector
JP2004001227A (ja) 1995-07-20 2004-01-08 Ebara Corp ポリッシング装置および方法
US6111634A (en) 1997-05-28 2000-08-29 Lam Research Corporation Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing
TW398036B (en) 1998-08-18 2000-07-11 Promos Technologies Inc Method of monitoring of chemical mechanical polishing end point and uniformity
JP4484370B2 (ja) 1998-11-02 2010-06-16 アプライド マテリアルズ インコーポレイテッド 基板上のメタル層の化学機械研磨に関して終点を決定するための方法及び基板のメタル層を研磨するための装置
US6399501B2 (en) 1999-12-13 2002-06-04 Applied Materials, Inc. Method and apparatus for detecting polishing endpoint with optical monitoring
JP2001287159A (ja) * 2000-04-05 2001-10-16 Nikon Corp 表面状態測定方法及び測定装置及び研磨装置及び半導体デバイス製造方法
JP2002359217A (ja) * 2001-05-31 2002-12-13 Omron Corp 研磨終点検出方法およびその装置
CN104526536B (zh) * 2005-08-22 2017-09-22 应用材料公司 基于光谱的监测化学机械研磨的装置及方法
US7226339B2 (en) * 2005-08-22 2007-06-05 Applied Materials, Inc. Spectrum based endpointing for chemical mechanical polishing
US7998358B2 (en) 2006-10-31 2011-08-16 Applied Materials, Inc. Peak-based endpointing for chemical mechanical polishing
JP5436969B2 (ja) * 2009-05-27 2014-03-05 株式会社荏原製作所 研磨終点検知方法、研磨終点検知装置、研磨方法、および研磨装置
JP2011000647A (ja) * 2009-06-16 2011-01-06 Ebara Corp 研磨監視方法
JP5339859B2 (ja) * 2008-11-07 2013-11-13 株式会社東京精密 研磨終了時点の検出方法及び検出装置
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US8751033B2 (en) * 2008-11-14 2014-06-10 Applied Materials, Inc. Adaptive tracking spectrum features for endpoint detection
JP5376293B2 (ja) * 2008-11-17 2013-12-25 株式会社ニコン 終点検出装置および研磨装置
WO2011056485A2 (en) * 2009-11-03 2011-05-12 Applied Materials, Inc. Endpoint method using peak location of spectra contour plots versus time
US8834229B2 (en) 2010-05-05 2014-09-16 Applied Materials, Inc. Dynamically tracking spectrum features for endpoint detection
CN106252220B (zh) * 2010-05-05 2019-06-11 应用材料公司 用于终点检测的动态或适应性追踪光谱特征
US8930013B2 (en) 2010-06-28 2015-01-06 Applied Materials, Inc. Adaptively tracking spectrum features for endpoint detection
TWI478259B (zh) * 2010-07-23 2015-03-21 應用材料股份有限公司 用於終點偵測之二維光譜特徵追蹤
JP6030636B2 (ja) * 2011-04-28 2016-11-24 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ モデルに基づく、研磨のためのスペクトルライブラリの生成
KR101892914B1 (ko) * 2012-03-08 2018-08-29 어플라이드 머티어리얼스, 인코포레이티드 측정된 스펙트럼에 대한 광학 모델의 피팅

Also Published As

Publication number Publication date
CN106463378A (zh) 2017-02-22
CN106463378B (zh) 2019-06-11
TW201606870A (zh) 2016-02-16
JP2017515307A (ja) 2017-06-08
KR20160148676A (ko) 2016-12-26
JP6440741B2 (ja) 2018-12-19
US20150314415A1 (en) 2015-11-05
KR102368644B1 (ko) 2022-02-25
US9352440B2 (en) 2016-05-31
WO2015167790A1 (en) 2015-11-05

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