TWI647739B - 圖案形成裝置及圖案形成方法 - Google Patents

圖案形成裝置及圖案形成方法 Download PDF

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Publication number
TWI647739B
TWI647739B TW104130672A TW104130672A TWI647739B TW I647739 B TWI647739 B TW I647739B TW 104130672 A TW104130672 A TW 104130672A TW 104130672 A TW104130672 A TW 104130672A TW I647739 B TWI647739 B TW I647739B
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TW
Taiwan
Prior art keywords
substrate
position information
pattern
imaging
group
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TW104130672A
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English (en)
Chinese (zh)
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TW201628060A (zh
Inventor
中井一博
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思可林集團股份有限公司
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Publication of TW201628060A publication Critical patent/TW201628060A/zh
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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
TW104130672A 2014-09-30 2015-09-16 圖案形成裝置及圖案形成方法 TWI647739B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-200521 2014-09-30
JP2014200521A JP6357064B2 (ja) 2014-09-30 2014-09-30 パターン形成装置およびパターン形成方法

Publications (2)

Publication Number Publication Date
TW201628060A TW201628060A (zh) 2016-08-01
TWI647739B true TWI647739B (zh) 2019-01-11

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Family Applications (1)

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TW104130672A TWI647739B (zh) 2014-09-30 2015-09-16 圖案形成裝置及圖案形成方法

Country Status (3)

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JP (1) JP6357064B2 (ko)
KR (1) KR102218136B1 (ko)
TW (1) TWI647739B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110073269B (zh) * 2016-12-20 2022-03-01 Ev 集团 E·索尔纳有限责任公司 用于曝光光敏层的设备和方法
US11460777B2 (en) 2016-12-20 2022-10-04 Ev Group E. Thallner Gmbh Method and device for exposure of photosensitive layer
CN109957504B (zh) * 2017-12-14 2022-08-02 长春长光华大智造测序设备有限公司 便于初始对准的高通量基因测序仪硅片及初始对准方法
JP7379183B2 (ja) * 2020-01-28 2023-11-14 株式会社Ｓｃｒｅｅｎホールディングス ステージ姿勢推定装置、搬送装置、およびステージ姿勢推定方法
JP7374790B2 (ja) 2020-01-30 2023-11-07 株式会社Ｓｃｒｅｅｎホールディングス 搬送装置および搬送方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4962423A (en) * 1988-01-27 1990-10-09 Canon Kabushiki Kaisha Mark detecting method and apparatus
US20040223157A1 (en) * 1999-03-24 2004-11-11 Nikon Corporation Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method
US20080273184A1 (en) * 2007-03-30 2008-11-06 Fujifilm Corporation Apparatus and method for referential position measurement and pattern-forming apparatus
US20080292177A1 (en) * 2007-05-23 2008-11-27 Sheets Ronald E System and Method for Providing Backside Alignment in a Lithographic Projection System
US20110262868A1 (en) * 2010-04-22 2011-10-27 Nitto Denko Corporation Method of detecting alignment mark and method of manufacturing printed circuit board
US20120083916A1 (en) * 2010-09-30 2012-04-05 Ryo Yamada Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000228347A (ja) * 1999-02-08 2000-08-15 Nikon Corp 位置決め方法及び露光装置
JP3169068B2 (ja) * 1997-12-04 2001-05-21 日本電気株式会社 電子線露光方法及び半導体ウエハ
JPH11329950A (ja) * 1998-05-13 1999-11-30 Nikon Corp 位置検出方法、露光方法及び露光装置
WO2006025386A1 (ja) * 2004-08-31 2006-03-09 Nikon Corporation 位置合わせ方法、処理システム、基板の投入再現性計測方法、位置計測方法、露光方法、基板処理装置、計測方法及び計測装置
JP5252249B2 (ja) * 2006-02-17 2013-07-31 株式会社ニコン デバイス製造処理方法
JP5703069B2 (ja) * 2010-09-30 2015-04-15 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
JP5722136B2 (ja) * 2011-06-30 2015-05-20 株式会社Ｓｃｒｅｅｎホールディングス パターン描画装置およびパターン描画方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4962423A (en) * 1988-01-27 1990-10-09 Canon Kabushiki Kaisha Mark detecting method and apparatus
US20040223157A1 (en) * 1999-03-24 2004-11-11 Nikon Corporation Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method
US20080273184A1 (en) * 2007-03-30 2008-11-06 Fujifilm Corporation Apparatus and method for referential position measurement and pattern-forming apparatus
US20080292177A1 (en) * 2007-05-23 2008-11-27 Sheets Ronald E System and Method for Providing Backside Alignment in a Lithographic Projection System
US20110262868A1 (en) * 2010-04-22 2011-10-27 Nitto Denko Corporation Method of detecting alignment mark and method of manufacturing printed circuit board
US20120083916A1 (en) * 2010-09-30 2012-04-05 Ryo Yamada Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus

Also Published As

Publication number Publication date
KR102218136B1 (ko) 2021-02-19
TW201628060A (zh) 2016-08-01
JP2016072434A (ja) 2016-05-09
KR20160038790A (ko) 2016-04-07
JP6357064B2 (ja) 2018-07-11

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