TWI643828B - Scribing device - Google Patents

Scribing device Download PDF

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Publication number
TWI643828B
TWI643828B TW104101935A TW104101935A TWI643828B TW I643828 B TWI643828 B TW I643828B TW 104101935 A TW104101935 A TW 104101935A TW 104101935 A TW104101935 A TW 104101935A TW I643828 B TWI643828 B TW I643828B
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TW
Taiwan
Prior art keywords
substrate
gripper
cutter wheel
scoring
scribe line
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TW104101935A
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Chinese (zh)
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TW201600480A (en
Inventor
得永直
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日商三星鑽石工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B3/00Sharpening cutting edges, e.g. of tools; Accessories therefor, e.g. for holding the tools
    • B24B3/36Sharpening cutting edges, e.g. of tools; Accessories therefor, e.g. for holding the tools of cutting blades
    • B24B3/46Sharpening cutting edges, e.g. of tools; Accessories therefor, e.g. for holding the tools of cutting blades of disc blades
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/22Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
    • B28D1/24Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising with cutting discs
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/10Glass-cutting tools, e.g. scoring tools

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Mining & Mineral Resources (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Clamps And Clips (AREA)

Abstract

提供一種刻劃裝置,即使其基板之末端材料區域之寬度小至與夾爪之邊緣握把略為相同程度,亦不干擾夾爪,且能夠刻劃X方向之刻劃預定線。 A scoring device is provided. Even if the width of the material region of the end of the substrate is as small as the edge grip of the gripper, it does not interfere with the gripper, and can scribe a predetermined scribe line in the X direction.

一種刻劃裝置,具備使基板W由夾爪11抓持之狀態下,將基板W搬送至下游之刻劃單元C之抓持搬送單元B,且藉由刻劃單元C之刀輪23沿著於基板表面與基板搬送方向正交之X方向之刻劃預定線S1之刻劃線進行加工,其特徵在於,於將鄰接於前述夾爪11之X方向之刻劃線S1以刀輪23進行加工時,由前述夾爪11進行解除前述基板W之抓持,並且前述夾爪11以退避至不干擾前述刀輪23之位置之方式構成。 A scoring device includes a gripping and transporting unit B that transports a substrate W to a downstream scoring unit C in a state where the substrate W is gripped by the clamping claws 11, and is moved along by a cutter wheel 23 of the scoring unit C The scribe line of the scribe line S1 in the X direction which is orthogonal to the substrate surface and the substrate conveying direction is processed. The scribe line S1 adjacent to the X direction of the clamping jaw 11 is processed by the cutter wheel 23. During processing, the gripping claw 11 is used to release the grip of the substrate W, and the gripping claw 11 is configured to retreat to a position that does not interfere with the cutter wheel 23.

Description

刻劃裝置 Scribing device

本發明係關於一種脆性材料基板之刻劃裝置,將於由玻璃、矽、陶瓷等脆性材料形成之基板之表面沿刻劃預定線而裂斷用之刻劃線(切溝)加工。尤其本發明係關於一種於四方之周邊部分形成有末端材料區域之脆性材料基板之刻劃裝置。 The invention relates to a scoring device for a substrate made of brittle material. The surface of a substrate made of a brittle material such as glass, silicon, ceramics, etc. is processed along a predetermined line for scoring (grooving) for breaking. In particular, the present invention relates to a scoring device for a brittle material substrate having a terminal material region formed on a peripheral portion of the four sides.

一般而言,在自脆性材料基板(以下,僅稱為「基板」)切斷單位基板時,如圖9所示,首先,沿著於基板W’之表面互相正交之X方向之刻劃預定線S1,以及Y方向之刻劃預定線S2將刻劃線加工,接下來之步驟藉由沿著此等刻劃線S1、S2刻劃,切斷成為製品之單位基板。此情況下,為了使被切斷之單位基板之端面有高精度,於基板W’之鄰近四邊形成有末端材料區域T,於裂斷時,末端材料區域切除並銷毀。 In general, when a unit substrate is cut from a brittle material substrate (hereinafter simply referred to as a "substrate"), as shown in FIG. 9, first, the scribes along the X direction orthogonal to the surface of the substrate W ' The predetermined line S1 and the scribe line S2 in the Y direction are processed by scribing. The next step is to cut the unit substrate to be a product by scribing along these scribing lines S1 and S2. In this case, in order to make the end face of the unit substrate to be cut to have high accuracy, a terminal material region T is formed on the four sides adjacent to the substrate W '. When the chip is broken, the terminal material region is cut off and destroyed.

作為形成上述刻劃線S1、S2之方法,使基板之一端部(對於搬送方向上游側部)藉夾爪抓持之狀態下向刻劃單元搬送,且藉由該刻劃單元形成刻劃線之手法,已知有例如專利文獻1等。 As a method of forming the scribe lines S1 and S2 described above, one end of the substrate (for the upstream side in the conveying direction) is transported to the scribe unit by the gripper, and the scribe line is formed by the scribe unit. As a method, for example, Patent Document 1 and the like are known.

圖10(a)係表示,上述圖9所示之使基板W’藉夾爪抓持而搬送至刻劃單元,且藉刻劃單元之刀輪於基板表面形成刻劃線之一般方法之說明圖。 FIG. 10 (a) is a description of a general method for causing the substrate W ′ to be transported to the scribe unit by gripping the claws shown in FIG. 9, and forming a scribe line on the surface of the substrate by the cutter wheel of the scribe unit. Illustration.

基板W’以水平姿態藉由夾爪30被抓持,且向刻劃單元31之柱體32 被搬送,藉由將安裝於柱體32之刻劃頭33之刀輪34壓抵於基板W’之表面同時使其於X方向轉動,沿著X方向之刻劃預定線S1加工刻劃線。又,Y方向之刻劃預定線S2之加工係,使刀輪34之支架(圖式外)旋轉等,而使刀輪34之轉動方向變更為Y方向,並藉由將基板W’藉夾爪30抓持而向刀輪34移動而進行。 The substrate W 'is held in a horizontal posture by the clamping claws 30, and is directed toward the pillar 32 of the scoring unit 31. It is conveyed, by pressing the cutter wheel 34 of the scoring head 33 mounted on the cylinder 32 against the surface of the substrate W ′ and rotating it in the X direction, the scribe line is processed along the scribe line S1 in the X direction . In addition, the processing line of the scribe line S2 in the Y direction is such that the holder (outside of the drawing) of the cutter wheel 34 is rotated, and the rotation direction of the cutter wheel 34 is changed to the Y direction, and the substrate W 'is borrowed. The claw 30 grasps and moves toward the cutter wheel 34.

一般而言,藉夾爪30將基板W’抓持之情況下,如圖10(b)所示,邊緣握把L1必須為2.5~3mm。以往,末端材料區域T之寬度L2約形成為10mm,即使邊緣握把需要2.5~3mm,與鄰近之X方向之刻劃預定線S1之間殘留有7~7.5mm,因此能夠不干擾夾爪30而進行刻劃。又,沿基板搬送方向之Y方向之刻劃預定線S2刻劃之情形,藉由將夾爪30自刻劃預定線S1遠離之位置夾持之方式配置,能夠不被夾爪30干擾而刻劃。又,即使假設夾爪30乘載於必須加工之Y方向之刻劃預定線S2上,亦由於刀輪34之直徑小至直徑1~3mm,於跨越鄰接於夾爪30之X方向之刻劃預定線S1之位置,藉由於與夾爪30接觸前停止基板運送,而能夠刻劃Y方向之刻劃預定線S2。 Generally, when the substrate W 'is held by the clamping claws 30, as shown in Fig. 10 (b), the edge grip L1 must be 2.5 to 3 mm. In the past, the width L2 of the end material region T was approximately 10 mm, and even if the edge grip required 2.5 to 3 mm, 7 to 7.5 mm remained between the adjacent scribe line S1 in the X direction, so that it could not interfere with the gripper 30 And scribing. In addition, in the case where the scribe line S2 along the Y direction of the substrate conveying direction is scribed, the chuck jaw 30 is arranged to be held away from the scribe line S1 away from the scribe line S1, and can be engraved without being disturbed by the chuck 30. Draw. In addition, even if it is assumed that the clamping jaw 30 is loaded on the scribe line S2 in the Y direction that must be processed, the diameter of the cutter wheel 34 is as small as 1 to 3 mm in diameter. The position of the predetermined line S1 can be scribed by the scribe line S2 in the Y direction by stopping the substrate transportation before contacting the gripper 30.

[專利文獻1]日本特開2013-249206號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2013-249206

然而近年來,成為製品之單位基板之緊緻化或為了使材料有效利用,追求縮小末端材料區域T之寬度,具體而言,要求縮小至約3mm。但,若將末端材料區域T之寬度縮小至3mm,則如圖6(b)所示,夾爪11於鄰接於其之X方向之刻劃預定線S1上干擾,無法刻劃該刻劃預定線S1。 However, in recent years, in order to make the unit substrate of the product compact or to effectively use the material, the width of the terminal material region T has been narrowed. Specifically, it is required to be reduced to about 3 mm. However, if the width of the terminal material region T is reduced to 3 mm, as shown in FIG. 6 (b), the jaw 11 interferes with the scribe line S1 adjacent to the X direction, and the scribe line cannot be scribed. Line S1.

因此本發明之目的係鑒於上述課題,提供一種刻劃裝置,即 使基板之末端材料區域之寬度小至與夾爪之邊緣握把略等約3mm之情況,亦不被夾爪干擾而能夠沿X方向之刻劃預定線進行刻劃。 Therefore, the object of the present invention is to provide a scoring device in view of the above problems, that is, The width of the material area at the end of the substrate is as small as about 3 mm from the edge grip of the clamping claw, and it is not disturbed by the clamping claw, and can be scribed along a predetermined line of the X direction.

為解決上述課題,本發明採取了接下來之技術手段。即,本發明之刻劃裝置係,具備:抓持搬送單元,將基板之上游側端部以藉由夾爪抓持之狀態,搬送至下游側之刻劃單元,前述刻劃單元具備之刀輪,對前述基板之表面進行於與基板搬送方向正交之方向延伸之刻劃線之加工,其特徵在於:於將鄰接於前述夾爪之刻劃線以前述刀輪進行加工時,由前述夾爪進行解除前述基板之抓持,並且前述夾爪以退避至不干擾前述刀輪之位置之方式構成。 To solve the above problems, the present invention adopts the following technical means. That is, the scoring device of the present invention is provided with a gripping and conveying unit that transfers an upstream end portion of a substrate to a scoring unit on a downstream side in a state of being gripped by a gripper, and a knife provided in the scoring unit. The wheel is used to process the scribe line extending on the surface of the substrate in a direction orthogonal to the substrate conveying direction, and is characterized in that when the scribe line adjacent to the gripper is processed by the cutter wheel, The gripper releases the grip of the substrate, and the gripper is configured to retract to a position that does not interfere with the cutter wheel.

根據本發明,被加工之基板之末端材料區域即使設定為與夾爪之邊緣握把略為相同程度之寬度之情況,於對鄰接於夾爪之X方向之刻劃線進行加工時,夾爪進行解除基板之抓持,並且使該夾爪退避至不與刀輪干擾之位置,藉此能夠圓滑地進行刻劃。 According to the present invention, even if the end material area of the substrate to be processed is set to be approximately the same width as the edge grip of the gripper, when processing the scribe line adjacent to the X direction of the gripper, the gripper performs The grip of the substrate is released, and the gripper is retracted to a position where it does not interfere with the cutter wheel, so that the scoring can be performed smoothly.

於上述之發明中,於前述刻劃單元中,設有按壓前述基板之上面且於載置基板之台盤之間保持前述基板之升降可能之按壓構件之構成為佳。 In the above-mentioned invention, it is preferable that the scoring unit includes a pressing member configured to press the upper surface of the substrate and to hold the substrate between the platen on which the substrate is placed, and which is capable of lifting and lowering the substrate.

藉此,於對鄰接於夾爪之X方向之刻劃線加工時,夾爪解除對基板之抓持後,亦能夠對基板之表面由按壓構件之推壓使基板安定地保持。 Thereby, during the scribe process of the X direction adjacent to the clamping claw, after the clamping claw releases the gripping of the substrate, the surface of the substrate can also be stably held by the pressing member.

A‧‧‧裝載機 A‧‧‧Loader

B‧‧‧抓持搬送單元 B‧‧‧Grasp and transfer unit

C‧‧‧刻劃單元 C‧‧‧Scribing unit

S1‧‧‧X方向之刻劃預定線 S1‧‧‧X direction scribe line

S2‧‧‧Y方向之刻劃預定線 S2 ‧‧‧Y-line scribe line

T‧‧‧末端材料區域 T‧‧‧end material area

W‧‧‧基板 W‧‧‧ substrate

W1‧‧‧單位基板區域 W1‧‧‧Unit substrate area

1‧‧‧輸送帶 1‧‧‧ conveyor belt

3‧‧‧吸附板 3‧‧‧Adsorption plate

10‧‧‧台盤 10‧‧‧platform

11‧‧‧夾爪 11‧‧‧Jaw

11a‧‧‧上部爪片 11a‧‧‧Upper claw

11b‧‧‧下部爪片 11b‧‧‧Lower claw

12‧‧‧夾爪構件 12‧‧‧ jaw member

20‧‧‧柱體 20‧‧‧ cylinder

23‧‧‧刀輪 23‧‧‧knife wheel

26‧‧‧按壓構件 26‧‧‧Pressing member

圖1係表示本發明之刻劃裝置之一例之整體立體圖。 FIG. 1 is an overall perspective view showing an example of a scoring device of the present invention.

圖2係圖1所示之刻劃裝置之側視圖。 FIG. 2 is a side view of the scoring device shown in FIG. 1. FIG.

圖3係表示台盤上之夾爪進行之基板抓持狀態之部分放大剖面圖。 FIG. 3 is a partially enlarged cross-sectional view showing a state in which a substrate is gripped by a gripper on a platen.

圖4係抓持搬送單元之夾爪之動作說明圖。 FIG. 4 is an operation explanatory diagram of a gripper of a conveying unit.

圖5係表示刻劃單元部分之側視圖。 Fig. 5 is a side view showing a portion of the scoring unit.

圖6係以俯視表示夾爪進行之基板抓持後之往刻劃單元搬送之狀態之說明圖。 FIG. 6 is an explanatory view showing a state in which the substrate is transported to the scribe unit after the substrate is gripped by the gripper in a plan view.

圖7係表示裝載機進行之基板之台盤搬送過程之說明圖。 FIG. 7 is an explanatory view showing a platen transfer process of a substrate by a loader.

圖8係表示夾爪進行之干擾迴避動作之另外一例之說明圖。 FIG. 8 is an explanatory diagram showing another example of the interference avoidance operation by the gripper.

圖9係表示於基板之刻劃預定線之習知之佈局之俯視圖。 FIG. 9 is a plan view showing a conventional layout of a predetermined scribe line on a substrate.

圖10係以俯視表示圖9之基板刻劃方法之一例之說明圖。 FIG. 10 is an explanatory diagram showing an example of the substrate scribing method of FIG. 9 in a plan view.

於以下,參照圖1~8對本發明之刻劃裝置之詳細進行說明。於本發明中被刻劃之基板W係,如圖6(a)所示,藉由互相正交之X方向之刻劃預定線S1及Y方向之刻劃預定線S2,被區分為六個單位基板區域W1,及四方周邊之末端材料區域T。於本實施例中,使此末端材料區域T之寬度為3mm程度。 Hereinafter, details of the scoring device of the present invention will be described with reference to FIGS. 1 to 8. As shown in FIG. 6 (a), the substrate W that is scribed in the present invention is divided into six scribe lines S1 in the X direction and scribe lines S2 in the Y direction. The unit substrate region W1 and the terminal material region T around the four sides. In this embodiment, the width of the terminal material region T is about 3 mm.

本發明之刻劃裝置係,如圖1、2所示,由自基板搬送方向之上游側依序配置之裝載機A、抓持搬送單元B、刻劃單元C所構成。 The scoring device of the present invention, as shown in FIGS. 1 and 2, is composed of a loader A, a gripping and conveying unit B, and a scoring unit C which are sequentially arranged from the upstream side of the substrate conveying direction.

於以下之說明中,將基板搬送方向作為Y方向,與基板搬送方向(Y方向)正交之方向作為X方向。又,基板搬送方向之上游側僅稱為上游側,基板搬送方向之下游側僅稱為下游側。 In the following description, the substrate transfer direction is referred to as the Y direction, and the direction orthogonal to the substrate transfer direction (Y direction) is referred to as the X direction. The upstream side in the substrate transfer direction is referred to as the upstream side only, and the downstream side in the substrate transfer direction is referred to as the downstream side only.

裝載機具備:吸附搬送構件2,選取藉由輸送帶1送來之基板W而移送至下游側之抓持搬送單元B。 The loader includes a gripping and conveying unit B that sucks the conveying member 2 and selects the substrate W sent by the conveyer 1 and transfers it to the downstream side.

吸附搬送構件2具備於下面具有多數個空氣吸引孔之吸附板3,且吸附板3係藉由液壓汽缸等之升降機構4以能夠升降之方式被支持構件5保持。又,支持構件5係沿著於Y方向延伸之柱體6之導軌7而以能夠往復移動之方式形成。 The suction conveying member 2 includes a suction plate 3 having a plurality of air suction holes underneath, and the suction plate 3 is held by the support member 5 so as to be able to move up and down by a lifting mechanism 4 such as a hydraulic cylinder. The support member 5 is formed so as to be able to reciprocate along the guide rail 7 of the pillar 6 extending in the Y direction.

搬送單元B具備,使載置於台盤10上之基板W之上游側端部由夾爪11抓持之狀態下,將基板W搬送至下游側之刻劃單元C之複數個、於本實施例中為5個之夾爪構件12。夾爪構件12係被延伸於X方項之共通框架13所保持,且框架13係於兩端部分沿著延伸於Y方向之左右導軌14而以能夠往復移動之方式形成。 The transfer unit B includes a plurality of scribe units C for transferring the substrate W to the downstream side while the upstream end portion of the substrate W placed on the table 10 is held by the clamping claws 11. In the example, five gripper members 12 are provided. The gripper member 12 is held by a common frame 13 extending in the X-square term, and the frame 13 is formed at both ends along the left and right guide rails 14 extending in the Y direction so as to be able to reciprocate.

各夾爪構件12之夾爪11係,沿著延伸於設於台盤10之Y方向之溝槽15而以能夠移動之方式配置。而,將基板W由夾爪11抓持時,如圖3所示,基板之下面係連接於台盤10之上面之狀態下,以能夠載置於台盤10之方式形成。 The jaws 11 of each jaw member 12 are movably arranged along a groove 15 extending in the Y direction of the table 10. When the substrate W is held by the clamping claws 11, as shown in FIG. 3, the lower surface of the substrate is connected to the upper surface of the platen 10 so as to be able to be placed on the platen 10.

又,夾爪11係,如圖4詳細所示,由上部爪片11a與下部爪面11b而形成,且上部爪片11a以樞紐11c做為支點,以能夠自圖4(a)之基板夾頭位置轉動至圖4(b)之解除位置之方式形成。於此解除位置,在本實施例中,藉由後述之刻劃單元C之刀輪23,刻劃最上游側之X方向之刻劃預定線S1時,上部爪片11a以必須成為不與刀輪23干擾之回避姿勢而大敞開之方式形成。再者,上部爪片11a之夾頭以及解除動作係藉由液壓汽缸11d所進行。 Moreover, as shown in detail in FIG. 4, the clamping jaw 11 is formed by an upper claw piece 11 a and a lower claw surface 11 b, and the upper claw piece 11 a uses a hinge 11 c as a fulcrum so that it can be clamped from the substrate of FIG. 4 (a). It is formed by turning the head position to the release position of FIG. 4 (b). At this release position, in the present embodiment, when the scribe line S1 in the X direction on the most upstream side is scribed by the cutter wheel 23 of the scribe unit C described later, the upper claw piece 11a must be incompatible with the knife. The manner in which the wheel 23 interferes with the avoidance posture and is wide open is formed. The chuck and release operation of the upper claw piece 11a is performed by the hydraulic cylinder 11d.

刻劃單元C係,如圖5詳細所示,具備:以跨過台盤10之方式配置之門型柱體20;及延伸於設於此柱體之X方向(圖5之前後方向)之引導構件21;及沿著設於此引導構件之導軌21a而能夠於X方向移動地 安裝之刻劃頭22。於刻劃頭22中,於下端部具有刀輪23之支架24係透過液壓汽缸等之升降機構25升降可能地設置。支架24相對於刻劃頭22,已安裝角度可變更之方式安裝,且藉此使刀輪23之刃端之方向能夠於X方向以及Y方向上變更。 The scoring unit C is, as shown in detail in FIG. 5, provided with: a gate-shaped pillar 20 arranged across the table 10; and a gate extending in the X direction (front and rear directions in FIG. 5) provided on the pillar. A guide member 21; and a guide member 21 that can move in the X direction along a guide rail 21a provided on the guide member Installed scoring head 22. In the scoring head 22, a bracket 24 having a cutter wheel 23 at a lower end portion is provided by a lifting mechanism 25 such as a hydraulic cylinder to be lifted and lowered. The bracket 24 is mounted with respect to the scoring head 22 in a manner that the mounting angle can be changed, and thereby the direction of the blade end of the cutter wheel 23 can be changed in the X direction and the Y direction.

又,於刻劃單元C設有,按壓載置於台盤10上之基板W之上面之一部分而於台盤10之間使前述基板W保持之升降可能之按壓構件26。按壓構件26之驅動係藉由液壓汽缸等之驅動機構27所進行。 Further, the scoring unit C is provided with a pressing member 26 that is capable of lifting and lowering the substrate W placed on the table 10 and holding the substrate W between the table 10. The pressing member 26 is driven by a driving mechanism 27 such as a hydraulic cylinder.

再者,於圖1、2中,使上述之裝載機A之吸附搬送構件2沿著導軌7而往Y方向往復移動為目的之驅動機構、沿著抓持搬送單元B之導軌8a、20而於X方向移動為目的之驅動機構、使抓持搬送單元B之框架13沿著導軌14而往Y方向往復移動為目的之驅動機構、使刻劃單元C之刻劃頭22沿著導軌21a而往X方向往復移動為目的之驅動機構,其分別為了避免圖式之複雜化而將圖示省略。 Furthermore, in FIGS. 1 and 2, the drive mechanism for the purpose of reciprocating the suction conveying member 2 of the loader A along the guide rail 7 in the Y direction, and holding the guide rails 8 a and 20 of the conveying unit B, A driving mechanism for moving in the X direction, a driving mechanism for moving the frame 13 holding the transport unit B to and fro in the Y direction along the guide rail 14, and a scoring head 22 of the scoring unit C along the guide rail 21a. The driving mechanism for the purpose of reciprocating in the X direction is omitted to avoid complication of the drawings.

接著,關於上述之刻劃裝置之動作進行說明。 Next, the operation of the scoring device will be described.

如圖7(a)~(d)所示,藉由輸送帶1搬運而來之基板W係,由裝載機A之吸附板3選取,且沿著導軌7移動至下游側,且跨越抓持搬送單元B之框架13送至台盤10上。 As shown in Figs. 7 (a) to (d), the substrate W system carried by the conveyor belt 1 is selected by the suction plate 3 of the loader A, and moves to the downstream side along the guide rail 7 and spans the grip The frame 13 of the transfer unit B is sent onto the table 10.

被移送至台盤10上之基板W係,如圖6所示,其上游側一端部之末端材料區域T部分被抓持於抓持搬送單元B之夾爪11。此狀況下之夾爪11之邊緣握把係與末端材料區域T之寬度略為相同之3mm。於此狀態基板W朝向下游側之刻劃單元C移動。而,基板W之最下游側(前導端側)之X方向刻劃預定線S1到達刻劃單元C之刀輪23之正下方時,抓持搬送單元B 之基板輸送停止,使刀輪23降下而沿此刻劃預定線一面推壓一面於X方向上刻劃。 As shown in FIG. 6, the substrate W transferred to the table 10 is gripped on the gripper 11 of the transfer unit B by the end material region T of the upstream end portion. In this case, the edge grip of the jaw 11 is 3 mm which is slightly the same as the width of the end material region T. In this state, the substrate W moves toward the scribe unit C on the downstream side. When the X-direction scribe line S1 on the most downstream side (leading end side) of the substrate W reaches directly below the cutter wheel 23 of the scribe unit C, the transport unit B is held. The substrate conveyance is stopped, the cutter wheel 23 is lowered, and the scribe is pushed in the X direction while pushing along the predetermined scribe line at this moment.

如此進行而將X方向之刻劃預定線S1自下游側依序進行刻劃。但,如圖6(b)所示,加工最上游之X方向刻劃預定線S1之情況,因夾爪11之邊緣握把係與末端材料區域T之寬度略為相同,刀輪23與夾爪11干擾而無法進行刻劃。故此時,如圖4(b)所示,使抓持基板W之夾爪11之上部爪片11a藉由液壓汽缸11d旋動至不與刀輪23干擾之解除姿態。藉此,能夠使最上游側之X方向刻劃預定線S1圓滑地刻劃。 In this way, the scribe line S1 in the X direction is sequentially scribed from the downstream side. However, as shown in FIG. 6 (b), in the case of scoring the planned line S1 in the X direction upstream of the processing, since the edge grip of the jaw 11 and the width of the end material region T are slightly the same, the cutter wheel 23 and the jaw 11 Disturbance cannot be scored. Therefore, at this time, as shown in FIG. 4 (b), the upper claw piece 11 a of the clamping claw 11 holding the substrate W is rotated by the hydraulic cylinder 11 d to a releasing posture without interfering with the cutter wheel 23. Thereby, the X-direction scribe line S1 on the most upstream side can be smoothly scribed.

又,於此實施例,於夾爪11解除對基板W之抓持後之位置,因夾爪11之上部爪片11a旋動至退避姿態,夾爪11之基板解除動作與干擾迴避動作能夠以一個動作迅速的進行。 Also, in this embodiment, at the position after the gripping claw 11 releases the gripping of the substrate W, since the upper claw piece 11a of the gripping claw 11 is rotated to the retracted posture, the substrate releasing action and interference avoiding motion of the gripping claw 11 can be controlled by An action proceeds quickly.

再者,刻劃最上游之X方向刻劃預定線S1時,使按壓構件27降下至連接於基板W表面之位置,且藉由夾爪11之夾頭解除將變得不安定之基板W夾持保持於台盤10之間為佳。 Furthermore, when scoring the predetermined line S1 in the X direction upstream of the scribe, the pressing member 27 is lowered to a position connected to the surface of the substrate W, and the substrate W clamp which becomes unstable by the chuck of the clamp jaw 11 is released. It is better to hold between the platens 10.

全部之X方向刻劃預定線S1刻劃後,加工Y方向之刻劃預定線S2時,刀輪23之刃端之方向變更為Y方向,使基板W返回圖6(a)之位置而藉由夾爪11將基板W抓持而使其向刀輪23移動而進行。此時,若使夾爪11如圖6(a)所示以預先夾持自Y方向之刻劃預定線S2遠離之位置之方式,則刀輪23不被夾爪11干擾而能夠進行刻劃。 After all the scribe lines S1 in the X direction are scribed, when the scribe line S2 in the Y direction is processed, the direction of the cutting edge of the cutter wheel 23 is changed to the Y direction, so that the substrate W is returned to the position shown in FIG. 6 (a) and borrowed. The substrate W is grasped by the gripper 11 and moved to the cutter wheel 23. At this time, as shown in FIG. 6 (a), if the clamping jaw 11 is held in advance at a position away from the scribe line S2 in the Y direction, the cutter wheel 23 can be scored without being disturbed by the clamping jaw 11. .

於上述實施例中,最上游之X方向刻劃預定線S1加工時,於夾爪11之解除位置上,雖藉由使上部爪片11a於上方大敞開而回避與刀輪23之干擾,但如圖8所示,將夾爪11間隔框架23移動至上游側而回避 與刀輪23之干擾亦為佳。 In the above-mentioned embodiment, during the processing of the scoring predetermined line S1 in the uppermost X direction, although the upper jaw piece 11a is opened at the upper position in the release position of the clamping jaw 11 to avoid interference with the cutter wheel 23, As shown in FIG. 8, the gripper 11 is moved away from the frame 23 to the upstream side to avoid it. Interference with the cutter wheel 23 is also preferable.

以上,雖關於本發明之代表性之實施例進行說明,但本發明未必僅特定於上述實施例之構造,使其目的達成,且不脫離申請專利範圍之範圍內能夠進行適當地修正、變更。 As mentioned above, although the representative embodiment of the present invention has been described, the present invention is not necessarily limited to the structure of the above embodiment to achieve its purpose, and can be appropriately modified and changed without departing from the scope of the patent application.

本發明能夠適用於,於玻璃等脆性材料基板之表面加工刻劃線之刻劃裝置。 The invention can be applied to a scoring device for processing a scribe line on the surface of a substrate made of a brittle material such as glass.

Claims (3)

一種刻劃裝置,具備:抓持搬送單元,將基板上游側端部由夾爪抓持之狀態下搬送至下游側之刻劃單元;由前述刻劃單元所具備之刀輪對前述基板之表面進行於與基板搬送方向正交之方向延伸之刻劃線之加工,其特徵在於:於將鄰接於前述夾爪之刻劃線以刀輪進行加工時,由前述夾爪進行解除前述基板之抓持,並且前述夾爪以退避至不干擾前述刀輪之位置之方式形成;其中,前述刻劃單元具備按壓前述基板之上面且於與載置前述基板之台盤之間保持前述基板之可升降之按壓構件。A scoring device includes: a gripping and transporting unit that transports an upstream end portion of a substrate to a scoring unit on a downstream side while being gripped by a gripper; and a cutter wheel provided on the scoring unit to the surface of the substrate The processing of the scribe line extending in a direction orthogonal to the substrate conveying direction is characterized in that when the scribe line adjacent to the gripper is processed by a cutter wheel, the gripper releases the substrate. The gripper is formed so as to retreat to a position that does not interfere with the cutter wheel; wherein the scoring unit is provided with a lifting mechanism capable of pressing the upper surface of the substrate and holding the substrate between the substrate and a platen on which the substrate is placed. Pressing member. 如申請專利範圍第1項之刻劃裝置,其中,前述夾爪解除前述基板之抓持時,於其解除位置,前述夾爪之上部爪片以回避與前述刀輪之干擾之姿態旋動之方式形成。For example, the scoring device of the first patent application range, wherein when the gripper releases the gripping of the substrate, the upper jaw piece of the gripper rotates in a posture to avoid interference with the cutter wheel in its released position. Way to form. 如申請專利範圍第1項之刻劃裝置,其中,前述夾爪解除前述基板之抓持時,藉由前述夾爪移動至基板搬送方向之上游側,回避與前述刀輪之干擾。For example, in the scoring device of the first patent application range, when the gripper releases the substrate, the gripper moves to the upstream side of the substrate carrying direction to avoid interference with the cutter wheel.
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