TWI632392B - 具有反射防止功能之構件及其製造方法 - Google Patents

具有反射防止功能之構件及其製造方法 Download PDF

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Publication number
TWI632392B
TWI632392B TW103141593A TW103141593A TWI632392B TW I632392 B TWI632392 B TW I632392B TW 103141593 A TW103141593 A TW 103141593A TW 103141593 A TW103141593 A TW 103141593A TW I632392 B TWI632392 B TW I632392B
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TW
Taiwan
Prior art keywords
film
substrate
fine uneven
alumina
forming
Prior art date
Application number
TW103141593A
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English (en)
Chinese (zh)
Other versions
TW201534956A (zh
Inventor
仙波昌平
末木英人
Original Assignee
日商東京威力科創股份有限公司
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Application filed by 日商東京威力科創股份有限公司 filed Critical 日商東京威力科創股份有限公司
Publication of TW201534956A publication Critical patent/TW201534956A/zh
Application granted granted Critical
Publication of TWI632392B publication Critical patent/TWI632392B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Laminated Bodies (AREA)
TW103141593A 2013-12-09 2014-12-01 具有反射防止功能之構件及其製造方法 TWI632392B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013254257A JP2015114381A (ja) 2013-12-09 2013-12-09 反射防止機能を有する部材およびその製造方法
JP2013-254257 2013-12-09

Publications (2)

Publication Number Publication Date
TW201534956A TW201534956A (zh) 2015-09-16
TWI632392B true TWI632392B (zh) 2018-08-11

Family

ID=53345830

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103141593A TWI632392B (zh) 2013-12-09 2014-12-01 具有反射防止功能之構件及其製造方法

Country Status (4)

Country Link
JP (1) JP2015114381A (cg-RX-API-DMAC7.html)
KR (1) KR101833586B1 (cg-RX-API-DMAC7.html)
CN (1) CN104698512B (cg-RX-API-DMAC7.html)
TW (1) TWI632392B (cg-RX-API-DMAC7.html)

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* Cited by examiner, † Cited by third party
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KR102388422B1 (ko) * 2017-08-30 2022-04-20 현대자동차주식회사 차량용 투명 기판 및 그 제조방법
JP6794325B2 (ja) * 2017-08-31 2020-12-02 富士フイルム株式会社 導電性基材、導電性基材の製造方法、積層体およびタッチパネル
CN107793041A (zh) * 2017-09-29 2018-03-13 广东星弛光电科技有限公司 具有耐磨氧化铝镀膜层的钢化玻璃的制备方法
WO2019073111A1 (en) * 2017-10-11 2019-04-18 Aalto University Foundation Sr COATING OF AN OBJECT
JP7074849B2 (ja) * 2018-05-22 2022-05-24 富士フイルム株式会社 凹凸構造付き基体の製造方法
CN110600567A (zh) * 2018-05-25 2019-12-20 中国电子科技集团公司第十八研究所 一种空间太阳电池用全反射玻璃盖片及其制备方法
EP3951445A4 (en) * 2019-03-27 2022-12-21 Kuraray Co., Ltd. FINE UNEVEN SAMPLE FOIL AND HEAD-UP DISPLAY DEVICE
US11714212B1 (en) * 2020-09-14 2023-08-01 Apple Inc. Conformal optical coatings for non-planar substrates
CN113031124A (zh) * 2021-03-22 2021-06-25 浙江舜宇光学有限公司 微结构膜系、光学成像镜头和制备膜系的方法
CN113985504B (zh) * 2021-12-27 2022-04-26 诚瑞光学(苏州)有限公司 光学镜片
US12460789B2 (en) 2023-09-20 2025-11-04 Nichia Corporation Light transmissive member, light source device, method of producing light transmissive member, and method of producing light source device
FI20245571A1 (en) * 2024-05-08 2025-11-09 Beneq Oy An anti-reflective coating on a surface of a substrate

Citations (3)

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JP2002343790A (ja) * 2001-05-21 2002-11-29 Nec Corp 金属化合物薄膜の気相堆積方法及び半導体装置の製造方法
TW201131196A (en) * 2009-11-27 2011-09-16 Sharp Kk Mold for motheye structure, mold manufacturing method and motheye structure formation method
CN102267711A (zh) * 2010-05-07 2011-12-07 佳能株式会社 氧化铝的前体溶胶、光学部件和制备光学部件的方法

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JP2004176081A (ja) * 2002-11-25 2004-06-24 Matsushita Electric Works Ltd 原子層堆積法による光学多層膜の製造方法
WO2007139209A1 (en) * 2006-05-31 2007-12-06 Semiconductor Energy Laboratory Co., Ltd. Display device and electronic device
US8202582B2 (en) * 2006-06-30 2012-06-19 Oji Paper Co., Ltd. Single particle film etching mask and production method of single particle film etching mask, production method of micro structure with use of single particle film etching mask and micro structure produced by micro structure production method
JP5279344B2 (ja) * 2007-06-06 2013-09-04 キヤノン株式会社 光学素子の製造方法
US10041169B2 (en) * 2008-05-27 2018-08-07 Picosun Oy System and method for loading a substrate holder carrying a batch of vertically placed substrates into an atomic layer deposition reactor
JP5912228B2 (ja) * 2010-05-17 2016-04-27 凸版印刷株式会社 ガスバリア性積層体の製造方法
US20120207973A1 (en) * 2011-02-15 2012-08-16 Canon Kabushiki Kaisha Optical member, method of manufacturing the same, and optical system using the same
JP5647924B2 (ja) * 2011-03-18 2015-01-07 富士フイルム株式会社 光学部材の製造方法
CN102560419A (zh) * 2011-11-29 2012-07-11 华东师范大学 一种氧化铝超薄薄膜的制备方法
EP2645136B1 (en) * 2012-03-29 2017-01-18 Canon Kabushiki Kaisha Optical member having textured structure and method of producing same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002343790A (ja) * 2001-05-21 2002-11-29 Nec Corp 金属化合物薄膜の気相堆積方法及び半導体装置の製造方法
TW201131196A (en) * 2009-11-27 2011-09-16 Sharp Kk Mold for motheye structure, mold manufacturing method and motheye structure formation method
CN102267711A (zh) * 2010-05-07 2011-12-07 佳能株式会社 氧化铝的前体溶胶、光学部件和制备光学部件的方法

Also Published As

Publication number Publication date
JP2015114381A (ja) 2015-06-22
KR101833586B1 (ko) 2018-02-28
CN104698512B (zh) 2017-09-01
CN104698512A (zh) 2015-06-10
TW201534956A (zh) 2015-09-16
KR20150067057A (ko) 2015-06-17

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