TWI626495B - Polarized light irradiation device for light alignment and polarized light irradiation method for light alignment - Google Patents

Abstract

Provides a photo-alignment technology that uses the practicality of handling and can improve the uniformity of in-plane exposure.

The light from the light source (3) in the long strip-shaped light emitting part passes through the polarizing element unit (4) and is irradiated to the irradiation area (R). The transport system (2) transports the substrate (S) in the first direction while passing through the irradiation area (R) Round-trip. The margin line (40) of each polarizing element (41) is along the first direction, and the conveying system (2) is after the onward movement and before the onward transportation, and the substrate (S) is moved in the second direction. Since the position of the margin line (40) is shifted when viewed from the substrate (S), the exposure amount becomes uniform.

Description

Polarized light irradiation device for light alignment and polarized light irradiation method for light alignment

The invention of this case relates to a technique for irradiating polarized light when performing light alignment.

Recently, when an alignment layer of a liquid crystal display element such as a liquid crystal panel and an alignment layer of a viewing angle compensation film are obtained, a technique called photo-alignment is used to perform alignment by light irradiation. Hereinafter, a film and a layer that generate alignment by light irradiation are collectively referred to as a photo-alignment film. In addition, the so-called "alignment" and even "alignment processing" provide directionality to certain properties of an object.

The photo-alignment is performed by irradiating a film for a photo-alignment film (hereinafter referred to as a film material) with polarized light. The film material is, for example, a resin made of polyimide, and polarized light polarized in a desired direction (the direction in which it should be aligned) is irradiated to the film material. By irradiating the polarized light with a predetermined wavelength, the molecular structure (for example, a side chain) of the film is aligned with the direction of the polarized light to obtain a light alignment film.

Photo-alignment film and the enlargement of the liquid crystal panel using the same From large. Therefore, the width of the required irradiation area of the polarized light is 1500 mm or more, which is significantly wider. As such a polarized light irradiation device that irradiates polarized light to such a wide irradiation area, there is a device disclosed in Patent Document 1, for example. This device is provided with a rod-shaped light source having a length corresponding to the width of the irradiation area, and a wire grid polarizing element that polarizes light from the light source, and irradiates polarized light to a film conveyed in a direction orthogonal to the longitudinal direction of the light source Light. The light alignment needs to irradiate polarized light with a wavelength visible in the ultraviolet range. Therefore, as a rod-shaped light source, an ultraviolet light source such as a high-pressure mercury lamp is mostly used.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2006-126464

[Patent Document 2] Japanese Patent No. 4815995

As an indicator of the quality of the photo-alignment process, what is important is the uniformity of the exposure amount. The uniformity of the exposure amount not only means that the accumulated exposure amount is uniform in the plane of the film material, but also refers to how uniformly the polarized light is irradiated. That is, it is necessary to not irradiate unpolarized light (hereinafter referred to as unpolarized light) as much as possible, and to make the exposure amount uniform as a state where only polarized light is irradiated. If exposure is performed locally in a state that contains a large amount of unpolarized light, even if the overall exposure is distributed uniformly, it will become only that part. A state where photo-alignment is not sufficiently performed. That is, from the viewpoint of uniformity of light alignment, the quality is degraded.

What is problematic from the viewpoint of uniform irradiation of polarized light is the limitation of polarizing elements. The wire grid polarizing element has an excellent function as a person who can polarize light from the visible to the ultraviolet range, but it is difficult to manufacture a larger size. For this reason, the irradiated area is covered by using a plurality of side-by-side plural wire grid polarizing elements and singulating them.

When a plurality of wire-grid polarizing elements are arranged side by side, unpolarized light is irradiated from the marginal portion (contact portion of the end surface) of each polarizing element, and light alignment processing cannot be performed at a position directly below the marginal portion of each polarizing element. If the light alignment processing is performed under such a state of uneven illumination distribution, the light alignment will be inadequate on the surface of the workpiece (film) passing through the area directly below the marginal portion of each polarizing element. The in-plane uniformity of the photo-alignment treatment is reduced.

Considering such a problem, in Patent Document 1, a light-shielding plate is provided so as to block the marginal portion of each polarizing element so that light does not exit from the marginal portion. This system considers the use of a light-shielding plate. Although the exposure will be reduced in the area passing directly below the light-shielding plate, the light alignment is better than the situation where the light alignment is locally insufficient than a large amount of unpolarized light is irradiated. The illuminance of the polarized light at the position directly below the light-shielding plate is reduced, which can increase the output of the light source to increase the illuminance as a whole, and increase the irradiation distance to mitigate the decrease in illuminance. In the following description, when the illuminance or the exposure amount is referred to, it represents the illuminance or the exposure amount with respect to polarized light.

In addition, in order to eliminate the illuminance drop at the position directly below the light shielding plate, Patent Document 2 discloses a structure in which a light irradiator formed by a light source and a polarizing element unit is arranged side by side in the conveyance direction of a workpiece. In this structure, the marginal lines of the wire-grid polarizing elements of the polarizing element unit are not aligned on the same straight line in the two light irradiators, and the arrangement is deviated from the direction perpendicular to the conveying direction of the workpiece. When a workpiece is added between two light irradiators to irradiate polarized light, even the surface area of the workpiece passing through the position directly below the margin line in one light irradiator (that is, the position directly below the light shielding plate) A light irradiator does not pass directly below the margin line, so the exposure is uniform as a whole.

Although the technologies of Patent Literature 1 and Patent Literature 2 can irradiate uniform polarized light to a certain extent, there is also a case where it is not possible to sufficiently cope with a situation where high productivity is required and higher uniformity is required. .

On the other hand, in this technology of optical alignment, in addition to the situation where the object (workpiece) irradiated by the polarized light is a strip-shaped person (hereinafter referred to as a long work piece) where the film material is continuously connected, there are also film materials It is set on a substrate, and the substrate with a film is in a state of a workpiece. When such a plate-like object is a workpiece, various variations can be made as the conveying system, and the degree of freedom is high. Therefore, the use of time and effort to transport can make up for the unevenness of the illumination distribution caused by the use of the shading plate, and achieve a uniform light alignment process.

The invention of this case is based on the inventors of the foregoing viewpoint, and has the meaning of providing a practical light alignment technology that can improve the in-plane uniformity of the exposure amount by taking care of the transportation system.

In order to solve the aforementioned problems, the invention described in the first patent application scope of the present application has the following structure: a polarized light irradiation device for light alignment, which is provided with a light irradiator for irradiating polarized light to a set irradiation area, and passing the irradiation area The polarizing light irradiation device for light alignment of the conveying system that conveys the workpiece in the above manner, wherein the light irradiator is a light source having a light-emitting section with a long stripe shape, and a polarizing element unit disposed between the light source and the irradiation area; The unit is formed by a plurality of polarizing elements arranged side by side along the long side direction of the light-emitting part; the workpiece is cut away one by one; the transport system is used to move the workpiece by moving the workpiece holding body holding the workpiece; the transport system It is used to move the workpiece holding body in the first direction crossing the long side direction of the light-emitting part to transport the workpiece through the irradiation area, and the workpiece holding body can be moved to each of the polarizing elements of the polarizing element unit. The direction of the margin line moves in the second direction crossing; the movement of the workpiece holder in the second direction caused by the conveying system is The position of the marginal line of each polarizing element viewed from the workpiece is relatively displaced in the second direction when light is irradiated.

In addition, in order to solve the aforementioned problems, the invention described in the second patent application scope has the structure in the first patent scope of the patent application scope, and the first direction of movement caused by the transportation system is to hold the workpiece of the workpiece. The holder moves the workpiece holder back and forth by irradiating the area; the aforementioned transportation system is before the return movement after the outbound movement is completed, A constructor who performs the movement in the second direction.

In order to solve the above-mentioned problem, the invention described in claim 3 of the scope of patent application has a structure in the scope of claim 1 of the scope of patent application, and the transportation system performs the second time when moving in the first direction. Constructor of the direction of movement.

In addition, in order to solve the above-mentioned problems, the invention described in claim 4 of the scope of patent application has a structure in the scope of the first scope of patent application, and the light irradiator is the first and second plural light irradiators; The marginal lines of the polarizing elements of the first light irradiator and the marginal lines of the polarizing elements of the second light irradiator are mutually deviated from each other in the second direction.

In addition, in order to solve the aforementioned problem, the invention described in claim 5 of the patent application has the following structure: a method for irradiating polarized light for light alignment, which transmits light from a light source of a light-emitting part having a long strip shape through a polarizing element unit, A method for irradiating light onto an irradiated area and transporting the workpiece through the irradiated area to irradiate the workpiece with polarized light for light alignment. The polarizing element unit is arranged along the long side of the light emitting part. A plurality of polarizing elements formed side by side; a method in which workpieces are cut away one by one, and the workpiece is moved by moving the workpiece holding body holding the workpiece; and as a method, the workpiece holding body is moved toward the long side of the light emitting part Moving in the first direction of crossing to carry the workpiece by the irradiation area, and the workpiece holding body can be moved to the side of each polarizing element of the polarizing element unit. A method of moving in a second direction where the direction of the line intersects; the position of the margin line of each polarizing element viewed from the workpiece is changed relative to the second direction when light is irradiated by the workpiece holding body in the second direction. Bit.

In order to solve the aforementioned problem, the invention described in the sixth aspect of the patent application has a structure in the fifth aspect of the aforementioned patent application, and the movement in the first direction is to pass the irradiation area by the workpiece holder holding the workpiece. This method has a structure in which the workpiece holding body is moved back and forth, and the movement in the second direction is performed before the return movement after the outbound movement is completed.

In order to solve the aforementioned problems, the invention described in claim 7 of the scope of patent application has a structure in the structure of scope 5 of the aforementioned patent application that moves in the second direction when moving in the first direction. .

In addition, in order to solve the aforementioned problems, the invention described in claim 8 of the scope of patent application has a structure in the scope of claim 5 of the aforementioned scope of application, and the light irradiator is the first and second plural light irradiators; A structure in which the marginal lines of the polarizing elements of the first light irradiator and the marginal lines of the polarizing elements of the second light irradiator are deviated from each other in the second direction.

As described in the following description, according to the invention described in item 1 or item 5 of the scope of patent application for this application, it is used to move the workpiece in the first direction. When the workpiece is passed through the irradiation area, the workpiece is moved to the second direction, and the position of the margin line of each polarizing element viewed from the workpiece can be changed relative to the second direction. Therefore, there is no relation to the existence of the margin line. The exposure of the workpiece on the illuminated surface will become uniform.

In addition, according to the invention described in the second or sixth scope of the patent application, in addition to the aforementioned effects, the workpiece is moved back and forth, which is suitable for a situation requiring a large amount of exposure. In addition, since the workpiece is mounted and recovered on one side of the irradiation area, the structure and operation are simplified.

In addition, according to the inventions described in the third or seventh scope of the patent application, in addition to the aforementioned effects, the second-direction transportation is performed during the first-direction transportation. Therefore, the production interval can be shortened and productivity can be improved.

In addition, according to the invention described in item 4 or 8 of the scope of the patent application, in addition to the aforementioned effects, because a plurality of light irradiators are provided, it is easy to increase the exposure amount. The deviation is so that the exposure amount becomes uniform. Then, since the second-direction conveyance is introduced, the exposure amount can be made more uniform.

1‧‧‧light irradiator

2‧‧‧ Transport Department

21‧‧‧ base plate

3‧‧‧ light source

4‧‧‧ polarizing element unit

40‧‧‧ Margin

41‧‧‧polarizing element

43‧‧‧shield

5‧‧‧ platform

61‧‧‧First platform mobile mechanism

611‧‧‧The first ball screw

612‧‧‧first linear guide

613‧‧‧first drive source

62‧‧‧Second platform mobile mechanism

621‧‧‧Second ball screw

622‧‧‧Second linear guide

623‧‧‧Second drive source

7‧‧‧Control Department

S‧‧‧ substrate

R‧‧‧ Irradiated area

FIG. 1 is a schematic perspective view of a polarized light irradiation device for light alignment according to an embodiment of the present invention.

[FIG. 2] A schematic cross-sectional view of the light irradiator 1 shown in FIG. 1, (1) is a schematic cross-sectional view of the irradiation area R in the short-side direction, and (2) is a schematic cross-sectional view of the irradiation area R in the long-side direction.

[Fig. 3] A schematic perspective view of the platform 5 shown in Fig. 1. [Fig.

4 is a schematic plan view of the platform moving mechanisms 61 and 62 provided in the transport system 2.

[FIG. 5] A schematic front view of the platform moving mechanisms 61 and 62 provided in the transport system 2. [FIG.

6 is a schematic plan view illustrating the operation of the transport system 2 of the apparatus according to the embodiment.

FIG. 7 is a schematic plan view illustrating a moving distance in the second direction of the device according to the embodiment.

[Fig. 8] Fig. 8 is a schematic perspective view of a polarized light irradiation device for light alignment according to a second embodiment.

[FIG. 9] A plan view schematically showing an arrangement position of each polarizing element unit 4 according to the second embodiment.

10 is a schematic plan view illustrating the operation of the transport system 2 of the apparatus according to the second embodiment.

11 is a schematic plan view illustrating a second direction moving distance of the device according to the second embodiment.

FIG. 12 is a schematic plan view showing a device and method for irradiating polarized light for light alignment according to a third embodiment.

FIG. 13 is a diagram showing the results of an experiment for confirming that the integrated exposure amount becomes uniform by the transfer of the substrate S introduced in the second direction.

Next, with regard to the form (implemented by the invention) Hereinafter, embodiment) will be described.

FIG. 1 is a schematic perspective view of a polarized light irradiation device for light alignment according to an embodiment of the present invention. The polarized light irradiation device shown in FIG. 1 is a device for performing optical alignment processing on a plate-like workpiece (hereinafter referred to as a substrate) S of a liquid crystal substrate with a film.

Specifically, the apparatus of FIG. 1 includes a light irradiator 1 that irradiates polarized light to a set irradiation area R, and a transport system 2 that transports a substrate S through the irradiation area R. As shown in FIG. 1, the irradiation area R is set as a rectangular horizontal area. The light irradiator 1 is a light source 3 including a light-emitting portion having a long strip shape. The long-side direction of the light-emitting portion of the light source 3 coincides with the long-side direction of the irradiation region R.

2 is a schematic cross-sectional view of the light irradiator 1 shown in FIG. 1, (1) is a schematic cross-sectional view of the irradiation region R in the short-side direction, and (2) is a schematic cross-sectional view of the irradiation region R in the long-side direction. As shown in FIG. 2, the light irradiator 1 is a light source 3 including a light-emitting portion having a long strip shape, and a polarizing element unit 4 disposed between the light source 3 and the irradiation region R.

As the light source 3, a rod-shaped high-pressure mercury lamp was used. In addition, there are cases where metal halide lamps or LEDs are used. In addition, the rod-shaped light source 3 is an example of the light source 3 which is a strip-shaped light-emitting part, and the side-by-side light sources 3 may also be a strip-shaped light-emitting part.

A lens 31 is arranged behind the light source 3 (on the opposite side to the irradiation area R). The lens 31 is a long strip extending in the long-side direction of the light source 3, covering the back of the light source 3, reflecting the light to the side of the irradiation area R, and improving the utilization efficiency of the light. The cross-sectional shape of the reflecting surface of the lens 31 is oval A circular arc or parabola.

The polarizing element unit 4 is composed of a plurality of polarizing elements 41 and a frame 42 that holds the plurality of polarizing elements 41. In this embodiment, each polarizing element 41 is a wire grid polarizing element 41. Each of the polarizing elements 41 has a square plate shape, and is arranged in the longitudinal direction of the light emitting portion of the light source 3. Therefore, the margin line of each polarizing element 41 is perpendicular to the longitudinal direction of the light emitting section.

The frame 42 holding each of the polarizing elements 41 has a rectangular frame shape in which the direction of each of the polarizing elements 41 is long.

In addition, a light shielding plate 43 is provided so as to cover each of the margin lines 40. The light shielding plate 43 prevents unpolarized light from being emitted from a portion of the margin line 40.

The light source 3 and the lens 31 are housed in a lamp room 32. The polarizing element unit 4 is a light irradiation opening attached to the lamp chamber 32.

The transfer system 2 transfers the substrate S by moving a workpiece holding body holding the substrate S. In this embodiment, the stage 5 is used as a workpiece holding body. FIG. 3 is a schematic perspective view of the platform 5 shown in FIG. 1.

As shown in FIGS. 1 and 3, the stage 5 has a square shape, and the substrate S is held almost at the center on the upper side. The stage 5 is provided with the holding pin 51 so that the board | substrate S may be hold | maintained at the position which floated slightly from the upper surface. The holding pins 51 are integrally held by the platform 5. When the platform 5 is moved, the substrate S to be held moves together.

Four holding pins 51 are provided at the corner positions of the square. In addition, there are also those that are installed at a center position in accordance with the size of the substrate S. Each holding pin 51 has a tubular shape, and is connected to a vacuum exhaust system (not shown). The holding pin 51 is sucked from the opening at the upper end and vacuum-sucks the substrate S.

The contact position of the holding pin 51 with respect to the substrate S is a position where there is no obstacle in the manufacturing process of the product using the substrate S. For example, the substrate S is a liquid crystal display manufacturer. When manufacturing a plurality of liquid crystal displays from a single substrate, the substrate S is in contact with the retaining pin 51 when leaving a region used for manufacturing each liquid crystal display.

The conveyance system 2 is provided with the platform moving mechanisms 61 and 62 which move the stage 5 in order to convey the board | substrate S. 4 and 5 are schematic diagrams of the platform moving mechanisms 61 and 62 provided in the transport system 2, FIG. 4 is a schematic diagram of a plan view, and FIG. 5 is a schematic diagram of a front view.

In this embodiment, the transfer system 2 is a person who transports the substrate S in different directions from the first and second. The first direction is a horizontal direction perpendicular to the long-side direction of the light emitting portion formed by the light source 3. The second direction is a direction crossing the direction of the margin line 40 of each polarizing element 41 of the polarizing element unit 4. In this embodiment, the second direction is a horizontal direction perpendicular to the direction of the margin line 40 of each polarizing element 41. As described above, the polarizing element unit 4 is arranged such that the direction of each margin line 40 becomes a horizontal direction perpendicular to the long side direction of the light-emitting portion. Therefore, the first direction is consistent with the direction of each margin line 40, and the second direction is Horizontal direction perpendicular to the direction of each margin line 40.

The transport in the first direction is the main transport. The substrate S is transported from the mounting position of the substrate S to the irradiation area R, and is used to transport the substrate S to the recovery position while passing through the irradiation area R. The conveyance in the second direction is for conveying the exposure amount in the plane of the substrate S uniformly.

As shown in FIG. 1, the transportation system 2 is provided with the platform 5 to move in the first direction. The first platform moving mechanism 61 is movable, and the second platform moving mechanism 62 moves the platform 5 in the second direction. The platform 5 is mounted on the base plate 21, and the first platform moving mechanism 61 uses the moving base plate 21 to move the platform 5. The second platform moving mechanism 62 is fixed to the base plate 21 and moves the platform 5 on the base plate 21.

In this embodiment, the substrate mounting position is set on one side of the irradiation area R. The first stage moving mechanism 61 is a first linear pair of first ball screws 611 extending from the substrate mounting position to the irradiation area R, and a pair of first ball screws 611 extending parallel to the first ball screws 611 on both sides of the first ball screws 611. The guide 612 and a first driving source 613 that drives the first ball screw 611 are configured.

As shown in FIG. 1, a first ball screw 611 and a pair of first linear guides 612 extend horizontally through the irradiation area R. One end of the first ball screw 611 is connected to the first driving source 613, and the other end is supported by a bearing. A pair of first linear guides 612 are supported by bearings at both ends, respectively.

Near the center of the lower surface of the base plate 21, a first driven block 22 screwed to a first ball screw 611 (screw engagement) is fixed. A pair of first guide blocks 23 are fixed to the lower surface of the base plate 21. The fixed position of the first guide block 23 corresponds to the positions of the first linear guides 612 on both sides. A bearing is provided in the first guide block 23, and linear guides on both sides penetrate the first guide block 23.

The first drive source 613 is a motor such as an AC servo motor. When the first drive source 613 rotates the ball screw, it is guided by a pair of first linear guides 612, and the base plate 21 and the platform 5 are integrally straight. The line moves. Thereby, the board | substrate S held by the stage 5 is conveyed to a 1st direction.

In addition, the second platform moving mechanism 62 is composed of a second ball screw 621 fixed on the base plate 21, a pair of second linear guides 622 also fixed on the base, and a drive for the second ball screw 621. The second driving source 623 is fixed.

The second ball screw 621 and the pair of second linear guides 622 are fixed so as to extend in the second direction. A second driven block 24 screwed to a second ball screw 621 is fixed to the center of the lower surface of the platform 5. A pair of second guide blocks 25 are fixed below the platform 5. The fixed position of the second guide block 25 corresponds to the positions of the second linear guides 622 on both sides. A bearing is provided in the second guide block 25, and linear guides on both sides penetrate the second guide block 25.

When the second driving source 623 rotates the ball screw, the platform 5 moves linearly on the base plate 21 while being guided by the pair of second linear guides 622. Thereby, the board | substrate S held by the stage 5 is conveyed to a 2nd direction.

FIG. 6 is a schematic plan view illustrating the operation of the transport system 2 of the apparatus according to the embodiment. As shown in FIG. 6 (1), in the initial state, the stage 5 is located at the substrate mounting position. When the substrate S is placed on the stage 5 and held by the holding pins 51, the transport system 2 drives the first drive source 613 to advance the base plate 21 and the stage 5 in the first direction. When the platform 5 reaches the first forward limit position, the first driving source 613 stops. As shown in FIG. 6 (2), the first advance limit position is a position where the substrate S on the stage 5 completely passes the irradiation area R. The so-called "complete pass" means that the trailing edge of the substrate S is connected. Over-irradiated area R.

The transport system 2 is at the first forward limit position, and after stopping the base plate 21 and the platform 5, the second drive source 623 is operated, and the platform 5 is moved to the second direction on the base plate 21. The second drive source 623 is stopped when the platform 5 reaches the second forward limit position (FIG. 6 (3)).

Next, the conveying system 2 moves the first driving source 613 again, so that the base plate 21 and the platform 5 face the first direction and move in the opposite direction. That is, the first driving source 613 is operated by rotating the first ball screw 611 in the reverse direction. The first drive source 613-based stage 5 passes through the irradiation area R again and stops when it reaches the substrate recovery position (FIG. 6 (4)).

As shown in FIG. 4, the polarized light irradiation device is provided with a control section 7 that controls each section of the device. In addition, sensors (not shown) that monitor the positions of the base plate 21 and the platform 5 are installed in various places, and the signals of each sensor are sent to the control unit 7. Furthermore, in the apparatus of the embodiment, it is assumed that the robot mounts the substrate S on the platform 5 and recovers the exposed substrate S from the platform 5. However, the control unit 7 performs signal processing between the robot and the robot.

A sequence program is installed in the control section 7 to optimally control each section including each drive source of the transport system 2. The sequence program follows the signal from the sensor and sends the control signal to each unit, as shown in Figure 6, to make the transport system 2 operate.

(FIG. 7 d _m), the system according to the exposure amount of surface of the substrate S uniform viewpoint, it is optimized to the conveying system 2, the moving distance in the second direction. Hereinafter, this point will be described using FIG. 7. FIG. 7 is a schematic plan view illustrating a moving distance in the second direction of the device according to the embodiment.

In addition to the first direction, the movement of the platform 5 in the second direction is to avoid the problem of non-uniformity of the exposure amount due to the decrease in the illuminance at the position directly below the margin line 40 described above. As described above, in the apparatus of the embodiment, the transport system 2 moves the platform 5 back and forth in the first direction. At this time, the platform 5 does not return through the same path, but shifts slightly in the horizontal direction and returns through different paths.

When the substrate S passes through the irradiation area R in the return path and the return path, if it is the same path, the position on the substrate S that passes under the margin line 40 in the return path is also similar to that in the return path that passes under the margin line 40. position. In such a conveyance of the substrate S, the unevenness of the exposure amount due to the decrease in local illuminance has not been eliminated.

On the other hand, when the substrate S returns through a different path, the path S passes on the substrate S where the illuminance decreases, because in the return path, it returns through a position other than the place where the illuminance decreases. Will become uniform.

However, in this embodiment, there are margin lines 40 formed by a plurality of polarizing elements 41 (there are three or more polarizing elements 41). Therefore, if the distance d _a between the marginal lines 40 (or _a distance that is an integral multiple of d _a ) is the same as the moving distance d _m , the area on the substrate S that passes through the position with lower illuminance on the way forward will be in the return path. The position where the illuminance is low cannot uniformize the exposure amount. Therefore, the moving distance d _{m in the} second direction may be separated from the integral distance of the marginal line 40 (hereinafter, referred to as the distance between the marginal lines 40) d _a formed by each polarizing element 41 in the polarizing element unit 4. (d _m ≠ n. d _a , n is an integer). From the viewpoint of shortening the production interval time, it is preferable that the moving distance d _{m is} shorter. Therefore, the moving distance d _m is appropriately determined within _a range of d _m <d _a .

In addition, the movement distance d _m may be deviated from the distance d _a between the marginal lines 40 to a certain extent, and it is determined based on how the illuminance of the area directly below each of the marginal lines 40 decreases. In FIG. 7, the moving distance of the second direction is d _m, the distance between each of the lines 40 d _a margin along a schematic line disclosed illumination area 40 immediately below the marginal distribution. The illuminance distribution shown here is an illuminance distribution on a straight line passing through the second direction of the position directly below the margin line 40 in the irradiation area R.

As shown in FIG. 7 (1), when the decrease in the illuminance distribution is limited to a very narrow area located directly below the margin line 40, the moving distance dm may be a small distance exceeding the unilateral width w of the area where the illuminance decreases.

On the other hand, as shown in FIG. 7 (2), when the width w of the area where the illuminance is reduced is somewhat wide, even if the moving distance d _m is set in a manner that exceeds the width w, the width w will not exceed each margin. The distance d _a between the lines 40 is 1/2. Therefore, the moving distance d _m may be 1/2 of the distance d _a between the marginal lines 40. That is, if d _m = d _a / 2, a uniform exposure amount can be achieved regardless of the width w. However, when the width w is small, d _m <d _a / 2 may be set, and the moving distance in the second direction may be reduced to shorten the production interval time.

The method of determining the width w is optimized based on the relationship with the required uniformity of the exposure amount. For example, if the exposure uniformity is ± 5%, the width w is a unilateral area that is reduced by more than 10% from the maximum illuminance. The width.

In any case, the moving distance d _m is input to the control unit 7 in advance, and is stored in the storage unit as a control value. Then, it is sent to the second drive source 623 as an operation amount.

The overall operation of the polarized light irradiation device for light alignment according to the embodiment related to the above structure will be described below. The following description is also a description of an embodiment of the invention of a method for irradiating a polarized light for light alignment.

The control unit 7 lights the light source 3. The light from the light source 3 passes through each polarizing element 41 and becomes polarized light, and is irradiated to the irradiation area R. The transfer system 2 is such that the base plate 21 and the platform 5 are located at a substrate mounting position which is a standby position.

The light-aligned substrate S is transferred to a polarized light irradiation device by a batch transfer mechanism such as an AGV (Auto Guided Vehicle) or a single-chip transfer mechanism such as an air conveyor. A single substrate S is mounted on the platform 5 by a robot (not shown). The substrate S is placed on each holding pin 51, and is vacuum-sucked on each holding pin 51.

When receiving a signal from the robot where the substrate is mounted, the control unit 7 sends a signal to the transfer system 2 to perform one of the aforementioned series of transfer operations. Thereby, the stage 5 is reciprocated while passing through the irradiation area R, and when passing, the substrate S on the stage 5 is irradiated with polarized light. Then, during the return path, the path is shifted only by the shift distance dm, and the points in the plane of the substrate S are uniformly exposed.

When the base plate 21 reaches the substrate recovery position, the control unit 7 turns off the vacuum suction, sends a signal to the robot, and recovers the substrate S from the platform 5. Furthermore, in this embodiment, the moving distance of the return path is the same as the moving distance of the return path. Therefore, the substrate recovery position is shifted from the substrate mounting position by only the component of the moving distance d _{m in} the second direction. The robot is adjusted in advance so that the substrate S is recovered at the substrate recovery position.

The polarized light irradiating device or the polarized light irradiating method according to the structure and operation related to the embodiment described above is a method in which the conveying system 2 passes the irradiation area R while the substrate S is reciprocated. Those who move toward the second direction of transportation and set the return path to a path different from the return path. At this time, the moving distance dm is a deviation from the distance da between the margin lines 40 of each polarizing element 41. Therefore, each polarization can be compensated. The illuminance at the position directly below the margin line 40 of the element 41 decreases, and the exposure amount in the plane of the substrate S becomes uniform.

Next, the apparatus and method of the second embodiment will be described.

FIG. 8 is a schematic perspective view of a polarized light irradiation device for light alignment according to the second embodiment. The apparatus of the second embodiment shown in FIG. 8 includes two light irradiators 1. The structure of each light irradiator 1 is almost the same as that of the device of the first embodiment.

As shown in FIG. 8, the long-side direction of the light emitting sections of the two light irradiators 1 and the light source 3 is a horizontal direction perpendicular to the first direction. Then, the two light irradiators 1 are arranged so that the polarizing elements 41 of the polarizing element unit 4 are deviated from each other. This point will be described using FIG. 9. FIG. 9 is a plan view schematically showing the arrangement position of each polarizing element unit 4 according to the second embodiment.

As shown in FIG. 9, polarizing elements in two light irradiators 1 The units 4 are basically the same structure, and the arrangement positions of the polarizing elements 41 are slightly different. That is, each of the polarizing elements 41 of one polarizing element unit 4 deviates from each of the polarizing elements 41 of the other polarizing element unit 4 in the direction of the long side of the light emitting portion of the light source (not shown in FIG. 9). . The amount of deviation is ½ of the width t of each polarizing element 41 in this embodiment.

Furthermore, for such a deviated position, the size and shape of the frame 42 and each polarizing element 41, and the number of each polarizing element 41 are set to be the same in the two polarizing element units 4, and the installation of the lamp chamber 32 will be performed. The position can be set to a deviation position.

FIG. 10 is a schematic plan view illustrating the operation of the transport system 2 of the apparatus of the second embodiment. Even in the second embodiment, the conveying system 2 moves the platform 5 holding the substrate S to the first direction and the second direction. The movement in the first direction is a reciprocating movement. Through the irradiation area R, the substrate S is irradiated with polarized light at this time. Then, the movement in the second direction is performed between the forward movement and the return movement, and the substrate S passes through different paths and passes the irradiation distance in the forward and return movements. The two light irradiators 1 irradiate polarized light rays to the respective irradiation regions R.

FIG. 11 is a schematic plan view illustrating a moving distance in the second direction of the device according to the second embodiment. In addition, in FIG. 11, for reference, a state in which the movement in the second direction is not performed is also disclosed. FIG. 11 (1) shows a state where it is not moving, and (2) shows a state where it is moving.

In FIG. 11 (1) (2) to I ₁ discloses a first light irradiator 1 caused the illuminance distribution I ₂ to reveal an illuminance of the second light irradiator caused by the distribution. I ₁ and I ₂ are illuminance distributions on a straight line in the second direction passing through the positions directly below the margin lines 40 as in FIG. 7. In addition, E shows the distribution of the exposure amount in the plane of the substrate S after the round-trip transfer is completed.

As can be seen from the foregoing description, the substrate S passes through each of the irradiation regions R in order in the forward path and the return path, and is irradiated with polarized light. Therefore, the exposure amount E is a total of the exposure amount at the time of passage of each irradiation area R. At this time, even if the stage 5 does not move in the second direction (a state of reciprocating on the same path), the arrangement of each polarizing element 41 is deviated. Therefore, as shown in FIG. 7 (1), the exposure amount E may be somewhat affected. Become uniform.

In the apparatus of the second embodiment, since the exposure amount is made more uniform, the moving distance dm in the second direction is set to be optimal. As shown in FIG. 7 (1), in the distribution of the exposure amount E when the movement in the second direction is not performed, the place where the exposure amount reaches the minimum is the margin passing through any one of the two polarizing element units 4. Just below line 40. In the second embodiment, the two polarizing element units 4 are arranged so as to deviate from only one half (t / 2) of the width of one polarizing element 41. Therefore, the interval where the minimum value is obtained is also t / 2. The place where the minimum value is obtained is directly below the margin line 40 of any polarizing element unit 4, so the distance d _a between the margin lines can also be said to be t / 2.

Therefore, in order to make the exposure amount more uniform from the state shown in FIG. 7 (1), because the distance da = t / 2 between the marginal lines, the moving distance dm is only required to be inconsistent with t / 2 (or an integer multiple thereof). .

Then, the unilateral width w of the area where the exposure is reduced is essentially the same as the situation shown in FIG. 7 and does not exceed 1/2 of the distance d _a between the marginal lines 40. Therefore, as in the case of the first embodiment, the moving distance d _m = d _a / 2 = t / 4 (or its natural multiple) is optimal.

The situation of the second embodiment is also the same. The unilateral width w of the illuminance reduction area is selected according to the degree of uniformity of the required exposure amount. When the width w is narrower, the moving distance d _m will be set to a ratio t / 4. Still a short distance situation.

Next, an apparatus and method according to the third embodiment will be described. FIG. 12 is a schematic plan view showing a device and method for polarizing light irradiation for light alignment according to a third embodiment.

The apparatus of the third embodiment is different from that of the first and second embodiments in the transport by the transport system 2. In the first and second embodiments, the substrate S in the first direction is transferred back and forth, and the second direction is transferred between the forward transfer and the return transfer. However, in the third embodiment, the first direction The conveyance in one direction is performed simultaneously with the conveyance in the second direction. That is, the control unit 7 sends signals to the first driving source 613 and the second driving source 623 to cause the first driving source 613 and the second driving source 623 to operate simultaneously. However, the operation of the second driving source 623 does not need to be constantly performed during the operation of the first driving source 613, and only the intermediate operation of the substrate S when passing through the irradiation region R is sufficient.

In FIG. 12, it is disclosed that in the third embodiment, the ideal substrate S having a higher in-plane uniformity of light amount is transferred. As shown in FIG. 12 (1), when the substrate S is conveyed in the first direction and the leading edge reaches the edge of the irradiation region R, the second direction of transportation is started. It is better to end the transport in the second direction. In FIG. 12 (1), the dotted line indicates the trajectory of a point P ₁ at the leading edge of the substrate S, and the dotted line indicates the trajectory of a point P ₂ at the trailing edge.

In addition to the situation shown in FIG. 12 (1), as shown in FIG. 12 (2), the moving inclusion in the second direction may also be carried out through time zones before and after the time zone of the irradiation region R. Furthermore, as shown in FIG. 12 (3), the movement in the second direction is not linear, and may meander.

In either situation shown in FIG. 12, the same as the moving distance d of the form of embodiment of _m lines in the second direction. Furthermore, in any embodiment, the moving distance d _m needs to be different from an integer multiple of the distance a between the marginal lines. However, it is necessary to move the substrate S even if only a part of the substrate S does not deviate by moving in the second direction. Irradiated area R.

In this third embodiment, the substrate S can be transported only as a forward path. At this time, the substrate S is mounted on the stage 5 on one side of the irradiation area R, and the substrate S is recovered from the stage 5 on the other side. It is preferable from the standpoint of productivity that the transportation only has a forward route because the production interval is shortened.

However, even in the third embodiment, the substrate S may be irradiated with polarized light even if it is transported back and forth. At this time, it is preferable to carry out the second-direction conveyance at the same time in the passing and irradiating region R of the forward path and the return path.

In addition, when the substrate S is irradiated with polarized light by a round-trip conveyance, the exposure amount is doubled compared to a case where only the path is left (when the conveying speed is not changed). Therefore, it is suitable for use in situations where light alignment processing with a large amount of exposure is required. Since the substrate S can be mounted and recovered on one side of the irradiation area R when the substrate S is transported back and forth, it can be simplified. Home and surrounding structures. The production interval time only increases the length of the return path. However, the production interval time can be shortened by increasing the transfer speed.

In each of the above embodiments, the movement of the workpiece holder in the second direction caused by the conveyance system 2 is such that the position of the margin line 40 of each polarizing element 41 viewed from the substrate S can be moved to the second position when the light is irradiated. Directional relative displacement. When the position of the marginal line 40 is relatively changed when the light is irradiated, the area where the illuminance decreases due to the influence of the marginal line 40 is displaced within the plane of the substrate S, thereby achieving uniform exposure.

Furthermore, in each embodiment, the substrate S is transported in the first direction in a direction perpendicular to the long-side direction of the light-emitting portion of the light source 3, but it is not limited to this. The conveyance in the first direction is for a person who passes the substrate S through the irradiation area R, as long as it intersects with the long-side direction of the light-emitting portion of the light source 3. Even if the substrate S is transported in a direction inclined with respect to the long-side direction of the light-emitting portion of the light source 3, while irradiating polarized light, it is possible to compensate for unevenness in exposure amount caused by the presence of the margin line 40 of each polarizing element 41, Make a uniform exposure. In this case, if the second-direction movement is also introduced, the exposure amount can be made more uniform.

The second direction is a direction perpendicular to the direction of the margin line 40 of each polarizing element 41 in the foregoing embodiments and examples, but it is not limited to this. Even if the substrate S is transported along the direction of the margin line 40, the effect of uniformizing the exposure amount cannot be obtained, but the effect can be obtained if it is a direction crossing the direction of the margin line 40.

Furthermore, in each of the embodiments and examples, the platform 5 is adopted as an example of a member that holds the substrate S during conveyance, and the platform 5 may be used. Other components.

In addition, as the conveyance system 2, in addition to rotating the ball screw by a drive source, for example, a magnetic conveyance mechanism (linear motor platform) such as disclosed in Japanese Patent No. 4581641 may be used. This mechanism is arranged on a platform 5 on which magnetic poles are arranged side by side with salient poles of a magnetic body to form a checkerboard on a checkerboard. The platform 5 is slightly raised from the platform by air jet, etc., while using the control platform The polarity of the magnetic pole of 5 comes to move the mechanism of the platform 5. When this mechanism is adopted, since the accuracy of the conveying direction of the substrate S is also maintained, it is preferable to arrange the linear guides that guide the movement of the platform 5 on both sides.

In addition, a magnetic transfer mechanism may be used in combination with a transfer mechanism using a ball screw and a drive source as described above. For example, it is possible to consider the transfer in the first direction, using a magnetic transfer mechanism (linear motor platform), and the transfer in the second direction, using a transfer mechanism using ball screws and a drive source.

In the first and second embodiments, the substrate recovery position is shifted by a distance of dm in the second direction with respect to the substrate mounting position. However, at the same position as the substrate mounting position, the recovered substrate S is also can. At this time, after moving the base plate 21 and the platform 5 at the same distance as the return path in the return path, an operation of moving the moving distance dm in the reverse direction is added in the second direction. Although the production interval time will be somewhat longer, the robot can often carry and recover the substrate S at the same position, which is simplified in this regard.

Moreover, the workpieces are cut off one by one and held by the workpiece holder. If it is, it is not plate-like. "Cut-off" is intended to exclude those who are connected in a band and are transported by winding.

In addition, the present invention is intended to compensate for a decrease in the illuminance of polarized light, and is applicable to a structure in which a light shielding plate is not provided in a marginal portion of a plurality of polarizing elements of a polarizing element unit.

[Example]

Next, as described above, the results of an experiment to confirm that the exposure amount is made uniform by conveying the substrate S introduced in the second direction will be described as an example. FIG. 13 is a diagram showing a result of an experiment for confirming that the integrated exposure amount becomes uniform by the conveyance of the substrate S introduced in the second direction.

In this experiment, the width of the irradiation area R seen in the second direction was 1500 mm, the light source 3 was a high-pressure mercury lamp, and the average illuminance in the irradiation area R was about 130 mW / cm ² .

Since the width t of each polarizing element 41 is 150 mm, the distance between the marginal lines is 150 mm. 13 (1), it is disclosed that the substrate S is transported in the same path during the forward path and the return path without being moved in the second direction. The exposure amount distribution when the polarized light is irradiated is disclosed in (2). After the forward path is conveyed, The distance in the second direction is moved by about 75 mm, and the exposure amount distribution during the homeward conveyance becomes a more uniform exposure amount distribution. The exposure amount distribution is the same as that in FIG. 7 and FIG. 11, and the distribution is in the second direction.

As shown in FIG. 13 (1), when the movement in the second direction is not performed, a place where the periodic exposure amount is significantly reduced can be observed. Become exposure The minimum value is a position passing directly below the margin line 40 of each polarizing element 41. In this example, the minimum value is approximately 70.4% (± 14.8% uniformity) relative to the maximum value.

On the other hand, in the embodiment in which the second-direction movement of about 80 mm is introduced, as shown in FIG. 13 (2), the uniformity is greatly improved. In this example, the minimum value is about 85% relative to the maximum value (± 7.5% uniformity). In this way, it can be seen that the uniformity of the exposure amount can be greatly improved by appropriately introducing the movement in the second direction.

Claims (5)

A polarized light irradiation device for light alignment includes a light irradiator that irradiates polarized light to a set irradiation area, and a polarized light irradiation device for light alignment of a transport system that transports a workpiece through the irradiation area. The characteristics are as follows: The light irradiator is a light source having a light-emitting portion in the shape of a long strip, and a polarizing element unit disposed between the light source and the irradiation area; the polarizing element unit is arranged side by side along the long side direction of the light-emitting portion. A plurality of polarizing elements are formed, and a margin line between the individual polarizing elements has a light-shielding portion, and a decrease in illuminance occurs at a position on the irradiation area corresponding to the light-shielding portion; the workpieces are cut away one by one; the transportation system Is used to move the workpiece holding body holding the workpiece to carry the workpiece; the transportation system is used to move the workpiece holding body in a first direction crossing the long-side direction of the light-emitting portion to pass Transporting the workpiece by way of forward movement and return movement when the irradiation area is irradiated with light, The workpiece holding body can be moved in a second direction that intersects with the direction of the margin line between the polarizing elements of the polarizing element unit; the movement of the workpiece holding body in the second direction caused by the transportation system is such that The position of the margin line between the polarizing elements viewed from the workpiece is relatively displaced in the second direction when the light is irradiated, so that the return path moves through a path different from the forward path, and the polarized light on the workpiece is enhanced Uniformity of exposure. According to the polarized light irradiation device for light alignment described in item 1 of the patent application scope, the moving distance of the workpiece holder in the second direction caused by the conveyance system is shorter than the distance between the margin lines. The polarized light irradiation device for light alignment according to item 1 or 2 of the patent application scope, wherein the light irradiator is a first and second plural light irradiator; The margin line of the polarizing element and the margin line of each polarizing element of the second light irradiator are deviated from each other in the second direction. A method for irradiating polarized light for light alignment uses a light source having a light-emitting portion having a long strip shape, a polarizing element unit, a plurality of polarizing elements arranged side by side along a long side direction of an irradiation area, and a polarizing element provided on the polarizing element. The polarized light irradiating device with the structure of the shading part of the margin line between the individual irradiates the light from the light source to the irradiation area through the polarizing element unit, and holds the workpieces that are cut off one by one by the workpiece holding body. A method for irradiating polarized light for alignment of polarized light for irradiating the workpiece with polarized light for light alignment is performed by carrying the workpiece through the irradiated area. The method is characterized in that: The first direction that the long side direction intersects is moved back and forth, and the workpiece is transported in the first direction so as to pass the irradiation area of light irradiation, and before the return movement after the outbound movement is completed, by moving the foregoing workpiece holding body, In a direction intersecting the margin line between the polarizing elements of the polarizing element unit. Moving in two directions, the position of the light-shielding portion provided on the margin line between the polarizing elements viewed from the workpiece is transported to the second direction, which is relatively displaced in the second direction, on the irradiation area corresponding to the light-shielding portion. In the state where the illuminance is reduced in the position, the return path is moved through a path different from the forward path to improve the uniformity of the exposure amount of the polarized light on the workpiece. According to the polarized light irradiation method for light alignment described in item 4 of the scope of the patent application, the moving distance in the second direction is shorter than the distance between the margin lines.