JP5983810B1 - Light irradiation device - Google Patents

Light irradiation device Download PDF

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JP5983810B1
JP5983810B1 JP2015075982A JP2015075982A JP5983810B1 JP 5983810 B1 JP5983810 B1 JP 5983810B1 JP 2015075982 A JP2015075982 A JP 2015075982A JP 2015075982 A JP2015075982 A JP 2015075982A JP 5983810 B1 JP5983810 B1 JP 5983810B1
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workpiece
light irradiation
work
holding
moving
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JP2016197140A (en
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洋平 那脇
洋平 那脇
憲太郎 野本
憲太郎 野本
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Ushio Denki KK
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Priority to CN201620270687.5U priority patent/CN205539851U/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166Manufacturing methods
    • G02B2006/12169Annealing

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  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Liquid Crystal (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract

【課題】効率良く光照射を行うことができる小型の光照射装置を提供する。【解決手段】光照射装置は、予め設定された照射領域を通過するワークに光を照射する光照射装置であって、照射領域をワークが通過する通過方向に延び、ワークの下に気体を吹き出してワークを浮上させる浮上台31と、浮上台31を通過方向と交わる方向に挟んだ両脇に一対で設けられ、一対の各々が、ワークを保持して通過方向へと移動する機能を有し、一対の一方がワークを保持して移動する際に、一対の他方がワークとすれ違って移動する保持移動機32、33と、を備える。【選択図】図1A compact light irradiation apparatus capable of performing light irradiation efficiently is provided. A light irradiation apparatus is a light irradiation apparatus that irradiates light to a workpiece that passes through a preset irradiation region, and extends in a direction in which the workpiece passes through the irradiation region, and blows gas under the workpiece. A pair of levitating bases 31 for levitating the work and a pair of both sides sandwiching the levitating base 31 in the direction intersecting the passing direction, each of the pair holding the work and moving in the passing direction When the pair of one side holds and moves the workpiece, the other pair of holding and moving machines 32 and 33 move to pass the workpiece. [Selection] Figure 1

Description

本発明は、光照射領域内を通過するワークに光を照射する光照射装置に関し、特に、液晶パネル用のガラス基板などの大型で重量の大きいワークを光処理するための光照射装置に関する。   The present invention relates to a light irradiation apparatus that irradiates light to a work passing through a light irradiation region, and more particularly to a light irradiation apparatus for light processing a large and heavy work such as a glass substrate for a liquid crystal panel.

従来、液晶パネル用基板(ワーク)に対して効率よく(高いスループットで)光照射処理を行う装置として、例えば特許文献1には、基板を2つのステージで交互に光照射領域内を通過させる光照射装置が記載されている。
液晶パネル用基板などは近年特に大型化し、例えば2mを超える長さのものも用いられている。ワークの大型化につれて重量も重くなっているため、上述したようなステージによる搬送の場合、大型で重いワークを搬送するためには、その分大型で重いステージが必要となり、搬送の機構を含んだ光照射装置全体も大型で重量が重いものとなる。
このようなステージを用いずにワークを搬送して処理する光照射装置として、例えば特許文献2には、エアの噴出でワークを浮かせて搬送するものが記載されている。
Conventionally, as an apparatus for performing light irradiation processing efficiently (with high throughput) on a substrate (workpiece) for a liquid crystal panel, for example, Patent Document 1 discloses light that allows a substrate to alternately pass through a light irradiation region on two stages. An irradiation device is described.
In recent years, liquid crystal panel substrates and the like have become particularly large, and for example, substrates having a length exceeding 2 m have been used. As the workpiece becomes larger, the weight also increases, so in the case of conveyance by the stage as described above, in order to convey a large and heavy workpiece, a larger and heavier stage is required, which includes a conveyance mechanism. The entire light irradiation device is also large and heavy.
As a light irradiation apparatus that transports and processes a workpiece without using such a stage, for example, Patent Document 2 describes a device that floats and transports a workpiece by ejecting air.

特許5344105号公報Japanese Patent No. 5344105 特開2014−123769号公報JP 2014-123769 A

特許文献2に記載の光照射装置の場合、ステージを用いないのでワークが大型化しても光照射装置は比較的小型であるが、特許文献2に記載の光照射装置では特許文献1に記載の光照射装置のような高いスループットは実現できない。
このため、ワークが大型化しても装置全体の軽量化小型化が図られ、高いスループットで光照射が可能な光照射装置が望まれている。
そこで、本発明は、効率良く光照射を行うことができる小型の光照射装置を提供することを課題とする。
In the case of the light irradiation apparatus described in Patent Document 2, since the stage is not used, the light irradiation apparatus is relatively small even if the workpiece is enlarged, but the light irradiation apparatus described in Patent Document 2 is described in Patent Document 1. A high throughput like a light irradiation device cannot be realized.
For this reason, there is a demand for a light irradiation apparatus that can reduce the weight of the entire apparatus and reduce the size of the apparatus even when the workpiece is large, and can perform light irradiation with high throughput.
Then, this invention makes it a subject to provide the small light irradiation apparatus which can perform light irradiation efficiently.

上記課題を解決するために、本発明に係る光照射装置の一態様は、予め設定された照射領域を通過するワークに光を照射する光照射装置であって、前記照射領域を前記ワークが通過する通過方向に延び、該ワークの下に気体を吹き出して該ワークを浮上させる浮上台と、前記浮上台を前記通過方向と交わる方向に挟んだ両脇に一対で設けられ、該一対の各々が、前記ワークを保持して前記通過方向へと移動する機能を有し、該一対の一方が該ワークを保持して移動する際に、該一対の他方が該ワークとすれ違って移動する保持移動機と、を備える。   In order to solve the above-described problem, one aspect of a light irradiation apparatus according to the present invention is a light irradiation apparatus that irradiates light to a workpiece that passes through a preset irradiation region, and the workpiece passes through the irradiation region. A pair of levitation bases that extend in the passing direction and blow the gas under the work to float the work, and a pair on both sides sandwiching the levitation base in a direction crossing the passing direction, each of the pair A holding and moving machine having a function of holding the workpiece and moving in the passing direction, and moving the pair of the other by passing the workpiece while the one of the pair of holding and moving the workpiece. And comprising.

このような光照射装置によれば、浮上台の両脇に設けられた一対の保持移動機が前記通過方向に交互に移動することで複数のワークを続けて搬送することができ、高いスループットが実現する。また、気体の吹き出しでワークを浮上させるのでステージ不要であるとともに、搬送方向が前記通過方向の一方向であるので照射領域を前記通過方向に挟んだそれぞれのサイズはワーク1つ分が載るサイズであればよい。このため、光照射装置の軽量化小型化が図られる。
前記光照射装置において、前記保持搬送機が、前記ワークとすれ違う方向に移動するに際して該ワークよりも下方に下がった状態で移動するものであることが好ましい。このような好ましい構成の光照射装置によれば、ワークと保持搬送機とのすれ違いにおける接触を容易に防ぐことができる。
According to such a light irradiation device, a pair of holding and moving machines provided on both sides of the levitating platform can alternately convey a plurality of workpieces by moving alternately in the passing direction, resulting in high throughput. Realize. In addition, since the work is lifted by blowing the gas, a stage is not necessary, and since the transport direction is one direction of the passing direction, each size sandwiching the irradiation region in the passing direction is a size on which one work is placed. I just need it. For this reason, the light irradiation apparatus can be reduced in weight and size.
In the light irradiation apparatus, it is preferable that the holding and transporting device is moved in a state of being lowered below the workpiece when moving in a direction passing the workpiece. According to the light irradiation device having such a preferable configuration, it is possible to easily prevent contact between the workpiece and the holding and conveying machine.

また、前記光照射装置において、前記保持搬送機が、前記浮上台から突き出した前記ワークの一部を下方から吸着して保持するものであることも好ましい。このような好ましい構成の光照射装置によれば、前記ワークの保持性を確保するとともに、保持された一部に対する光照射も可能となる。
また、前記光照射装置において、前記浮上台上のワークを回転させる回転機をさらに備え、前記ワークは矩形状のワークであり、前記保持搬送機が、前記回転機による回転で前記浮上台の脇から突き出た前記ワークの角部を保持するものであることが好適である。
この好適な構成の光照射装置によれば、浮上台から吹き出す気体を受ける面積を確保してワークの十分な浮上を図りつつワークを十分に保持することができる。
Moreover, in the light irradiation device, it is also preferable that the holding and transporting device holds and holds a part of the workpiece protruding from the levitation base from below. According to the light irradiation apparatus having such a preferable configuration, it is possible to ensure the holding property of the workpiece and to irradiate light to a held part.
The light irradiation apparatus further includes a rotating machine that rotates the work on the levitation table, the work is a rectangular work, and the holding and conveying machine is rotated by the rotating machine, It is preferable to hold the corner portion of the workpiece protruding from the edge.
According to the light irradiation device of this preferred configuration, it is possible to sufficiently hold the workpiece while ensuring the area for receiving the gas blown from the levitation stand and sufficiently floating the workpiece.

本発明の光照射装置によれば、効率良く光照射を行うことができるとともに装置の小型化も図られる。   According to the light irradiation apparatus of the present invention, light irradiation can be performed efficiently and the apparatus can be miniaturized.

本発明の光照射装置の一実施形態に相当する偏光光照射装置の概略的構成を示す斜視図である。It is a perspective view which shows schematic structure of the polarized light irradiation apparatus corresponded to one Embodiment of the light irradiation apparatus of this invention. 本発明の光照射装置の一実施形態に相当する偏光光照射装置の概略的構成を示す上面図である。It is a top view which shows schematic structure of the polarized light irradiation apparatus corresponded to one Embodiment of the light irradiation apparatus of this invention. ワークWが偏光光照射装置に搬送されてきた状態を示す上面図であるIt is a top view which shows the state in which the workpiece | work W was conveyed by the polarized light irradiation apparatus. ワークWが偏光光照射装置に搬送されてきた状態を示す側面図である。It is a side view which shows the state in which the workpiece | work W was conveyed by the polarized light irradiation apparatus. ワークWの向きが所望の向きに調整される様子を示す上面図である。It is a top view which shows a mode that the direction of the workpiece | work W is adjusted to a desired direction. ワークWの向きが所望の向きに調整される様子を示す側面図である。It is a side view which shows a mode that the direction of the workpiece | work W is adjusted to a desired direction. ワーク保持移動機構の移動を示す上面図である。It is a top view which shows the movement of a workpiece | work holding | maintenance moving mechanism. ワーク保持移動機構の移動を示す正面図である。It is a front view which shows the movement of a workpiece | work holding | maintenance moving mechanism.

以下、本発明の実施の形態を図面に基づいて説明する。
図1と図2は、本発明の光照射装置の一実施形態に相当する偏光光照射装置の概略的構成を示す図である。図1は斜視図であり、図2は上面図である。
偏光光照射装置100は、高い剛性を有する土台5上に、所定の波長の偏光光(偏光した光)を照射する光照射部10と、ワークWの向きを所定の向きに合わせるアライメント部20(図1では図示省略、図2参照)と、ワークWを搬送する搬送部30とを備える。ここで、ワークWは、光配向膜が形成された、例えば液晶パネルの製造に用いられる、例えば300mm×500mmを超す大型の矩形状の基板である。なお、本実施形態ではワークWを矩形状としているが、本発明にいうワークはこれに限定されるものではなく、任意の形状とすることができる。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
1 and 2 are diagrams showing a schematic configuration of a polarized light irradiation apparatus corresponding to an embodiment of the light irradiation apparatus of the present invention. 1 is a perspective view, and FIG. 2 is a top view.
The polarized light irradiation apparatus 100 includes a light irradiation unit 10 that irradiates polarized light having a predetermined wavelength (polarized light) on a base 5 having high rigidity, and an alignment unit 20 that aligns the direction of the workpiece W with a predetermined direction. In FIG. 1, an illustration is omitted, see FIG. Here, the workpiece W is a large rectangular substrate having a photo-alignment film formed thereon, for example, used for manufacturing a liquid crystal panel, for example, exceeding 300 mm × 500 mm. In the present embodiment, the work W is rectangular, but the work referred to in the present invention is not limited to this, and can be any shape.

偏光光照射装置100は、光照射部10から偏光光を照射しながら、搬送部30によってワークWを直線移動させ、ワークWの光配向膜に偏光光を照射して光配向処理をするものである。
光照射部10は、線状の光源であるランプ11と、ランプ11の光を反射するミラー12とを備える。また、光照射部10は、その光出射側に配置された偏光子ユニット13を備える。さらに、光出射部10は、ランプ11、ミラー12及び偏光子ユニット13を収容するランプハウス14を備える。
The polarized light irradiation device 100 linearly moves the work W by the transport unit 30 while irradiating the polarized light from the light irradiation unit 10, and irradiates the light alignment film of the work W with the polarized light to perform the light alignment process. is there.
The light irradiation unit 10 includes a lamp 11 that is a linear light source and a mirror 12 that reflects light from the lamp 11. Moreover, the light irradiation part 10 is equipped with the polarizer unit 13 arrange | positioned at the light emission side. Furthermore, the light emitting unit 10 includes a lamp house 14 that houses the lamp 11, the mirror 12, and the polarizer unit 13.

光照射部10は、ランプ11の長手方向をワークWの搬送方向(X方向)に直交する方向(Y方向)に一致させた状態で設置されている。
ランプ11は長尺状のランプであり、その発光部が、搬送方向に直交する方向におけるワークWの幅に相応した長さを有する。このランプ11は、例えば、高圧水銀ランプや、水銀に他の金属を加えたメタルハライドランプ等であり、波長200nm〜400nmの紫外光を放射する。
The light irradiation unit 10 is installed in a state in which the longitudinal direction of the lamp 11 is made to coincide with the direction (Y direction) orthogonal to the conveyance direction (X direction) of the workpiece W.
The lamp 11 is a long lamp, and its light emitting portion has a length corresponding to the width of the workpiece W in a direction orthogonal to the transport direction. The lamp 11 is, for example, a high-pressure mercury lamp or a metal halide lamp obtained by adding another metal to mercury, and emits ultraviolet light having a wavelength of 200 nm to 400 nm.

光配向膜の材料としては、波長254nmの光で配向されるもの、波長313nmの光で配向されるもの、波長365nmの光で配向されるものなどが知られており、光源の種類は必要とされる波長に応じて適宜選択される。
なお、光源としては、紫外光を放射するLEDやLDを直線状に並べて配置した線状光源を用いることもできる。その場合、LEDやLDを並べる方向がランプの長手方向に相当する。また、複数のランプを上記Y方向に並べて構成してもよい。
As materials for the photo-alignment film, those that are aligned by light having a wavelength of 254 nm, those that are aligned by light having a wavelength of 313 nm, and materials that are aligned by light having a wavelength of 365 nm are known. Depending on the wavelength to be selected, it is appropriately selected.
As the light source, a linear light source in which LEDs or LDs that emit ultraviolet light are arranged in a straight line can be used. In that case, the direction in which the LEDs and LDs are arranged corresponds to the longitudinal direction of the lamp. A plurality of lamps may be arranged in the Y direction.

ミラー12は、ランプ11からの放射光をランプハウス14の底面側に反射するものであり、断面が楕円形または放物線状となった樋状集光鏡である。ミラー12は、その長手方向がランプ11の長手方向と一致するように配置されている。
ランプハウス14は底面に、ランプ11からの放射光およびミラー12による反射光が通過する光出射口を有する。偏光子ユニット13は、ランプハウス14の光出射口に取り付けられ、当該光出射口を通過する光を偏光する。光出射口を通過した光は、光照射部10の下に形成された偏光光照射領域Rに照射される。
The mirror 12 reflects the radiated light from the lamp 11 to the bottom surface side of the lamp house 14 and is a bowl-shaped condensing mirror whose section is elliptical or parabolic. The mirror 12 is arranged such that its longitudinal direction coincides with the longitudinal direction of the lamp 11.
The lamp house 14 has, on the bottom surface, a light exit port through which radiated light from the lamp 11 and reflected light from the mirror 12 pass. The polarizer unit 13 is attached to the light exit of the lamp house 14 and polarizes light passing through the light exit. The light that has passed through the light exit is irradiated onto the polarized light irradiation region R formed under the light irradiation unit 10.

偏光子ユニット13は、複数の偏光子をランプ11の長手方向に沿って並べて配置した構成を有する。これら複数の偏光子は、例えばフレーム等により支持されている。
偏光子は、例えばワイヤーグリッド型偏光素子であり、偏光子の個数は、偏光光を照射する領域の大きさに合わせて適宜選択される。なお、各偏光子は、それぞれ透過軸が同一方向を向くように配置されている。
アライメント部20は、アライメントカメラ21と、回転ステージ22とを備え、アライメントマークの検出に基づいてワークWを予め設定された方向に向けるものである。回転ステージ22が、本発明にいう回転機の一例に相当する。
アライメントカメラ21はワークWの上方に例えば2つ配置されており、ワークW上に例えば2つ設けられたアライメントマークMを、アライメントカメラ21各々が1つずつ検出する。
The polarizer unit 13 has a configuration in which a plurality of polarizers are arranged side by side along the longitudinal direction of the lamp 11. The plurality of polarizers are supported by, for example, a frame.
The polarizer is, for example, a wire grid type polarization element, and the number of the polarizers is appropriately selected according to the size of the region where the polarized light is irradiated. Each polarizer is arranged such that the transmission axis faces the same direction.
The alignment unit 20 includes an alignment camera 21 and a rotary stage 22, and directs the workpiece W in a preset direction based on the detection of the alignment mark. The rotating stage 22 corresponds to an example of a rotating machine according to the present invention.
For example, two alignment cameras 21 are arranged above the workpiece W, and each alignment camera 21 detects one alignment mark M provided on the workpiece W, for example.

回転ステージ22は上面が丸板状のものであり、その上面には、ワークWを吸着保持できるように、例えば真空吸着孔や真空吸着溝が形成されている。なお、本実施形態では、ワークWを丸板状の上面で吸着保持する構成となっているが、本発明にいう回転機はこの構成に限定されるものではなく、複数のピンによってワークWを吸着保持するものであってもよい。
回転ステージ22はX軸とY軸とが含まれる平面に対して直交するZ軸を回転軸として回転する(θ回転)。この回転ステージ22がワークW下面を吸着保持して回転させ、アライメントカメラ21により検出されるアライメントマークMの位置が予め決められた位置となる角度にワークWを向けることにより、ワークWの方向と偏光光の偏光軸の方向とが、所望の関係になるように位置合せがなされる。
The upper surface of the rotary stage 22 has a round plate shape. For example, a vacuum suction hole or a vacuum suction groove is formed on the upper surface so that the work W can be sucked and held. In this embodiment, the work W is sucked and held on the upper surface of the round plate shape. However, the rotating machine according to the present invention is not limited to this structure, and the work W is held by a plurality of pins. It may be held by adsorption.
The rotary stage 22 rotates about a Z axis orthogonal to a plane including the X axis and the Y axis (θ rotation). The rotating stage 22 sucks and holds the lower surface of the workpiece W and rotates it, and directs the workpiece W to an angle at which the position of the alignment mark M detected by the alignment camera 21 becomes a predetermined position. The alignment is performed so that the direction of the polarization axis of the polarized light has a desired relationship.

搬送部30は、ワークWの下面にエアを噴出してワークWを浮上させるエア浮上ユニット31と、エア浮上ユニット31で浮上されているワークWを保持して移動する一対のワーク保持移動機構(第1のワーク保持移動機構32と第2のワーク保持移動機構33)と、ワーク保持移動機構32,33がエア浮上ユニット31に沿って移動するためのレール34と、ワーク保持移動機構32,33を駆動する駆動機(図示省略)とを備えている。
エア浮上ユニット31が、本発明にいう浮上台の一例に相当し、ワーク保持移動機構32,33が、本発明にいう保持移動機の一例に相当する。
搬送部30は、ワークWを上記搬送方向に搬送して偏光光照射領域Rを通過させるものである。
偏光光照射領域Rを挟んだ両側(図2の左右両側)における搬送部30のサイズは、例えば、それぞれワークW1つ分程度のサイズとなっており、ワークWが大型化した場合であっても偏光光照射装置100は比較的小型の装置となる。
The conveyance unit 30 ejects air onto the lower surface of the workpiece W to float the workpiece W, and a pair of workpiece holding and moving mechanisms that hold and move the workpiece W lifted by the air floating unit 31 ( A first workpiece holding and moving mechanism 32 and a second workpiece holding and moving mechanism 33), a rail 34 for moving the workpiece holding and moving mechanisms 32 and 33 along the air levitation unit 31, and workpiece holding and moving mechanisms 32 and 33. And a driving machine (not shown) for driving the motor.
The air levitation unit 31 corresponds to an example of a levitation base according to the present invention, and the workpiece holding and moving mechanisms 32 and 33 correspond to an example of a holding and moving machine according to the present invention.
The transport unit 30 transports the workpiece W in the transport direction and passes the polarized light irradiation region R.
The size of the conveyance unit 30 on both sides (the left and right sides in FIG. 2) sandwiching the polarized light irradiation region R is, for example, about the size of one workpiece W, and even when the workpiece W is enlarged. The polarized light irradiation device 100 is a relatively small device.

エア浮上ユニット31は、エアが吹き出す例えば孔や溝が上面に形成されたブロック状の部材が例えば3列に連結された構造を一例として有する。エアの吹き出す孔や溝、およびエアを吹き出すための構造については、図示が省略されている。エア浮上ユニット31の幅(上記Y方向のサイズ)はワークWのサイズよりも狭く、ワークWの一部はエア浮上ユニット31をY方向に挟んだ両脇から突き出る。   The air levitation unit 31 has, for example, a structure in which block members with holes and grooves formed on the upper surface are connected in, for example, three rows. Illustrations of holes and grooves for blowing air and structures for blowing air are omitted. The width of the air floating unit 31 (the size in the Y direction) is narrower than the size of the workpiece W, and part of the workpiece W protrudes from both sides of the air floating unit 31 in the Y direction.

第1および第2のワーク保持移動機構32,33は、エア浮上ユニット31の両脇に設けられ、エア浮上ユニット31から突き出したワークWの部分を下面から真空吸着等の方法により吸着してワークWを保持する。これらのワーク保持移動機構32,33は上面が平板状のものであり、その上面には、ワークWを吸着保持できるように、例えば真空吸着孔や真空吸着溝が形成されている。なお、本実施形態では、ワークWを平板状の上面で吸着保持する構成となっているが、本発明にいう保持移動機はこの構成に限定されるものではなく、複数のピンによってワークWを吸着保持するものであってもよい。   The first and second workpiece holding and moving mechanisms 32 and 33 are provided on both sides of the air levitation unit 31 and adsorb the portions of the workpiece W protruding from the air levitation unit 31 from the lower surface by a method such as vacuum adsorption. Hold W. These workpiece holding and moving mechanisms 32 and 33 have a flat top surface, and a vacuum suction hole or a vacuum suction groove is formed on the top surface so that the workpiece W can be sucked and held. In the present embodiment, the work W is sucked and held on a flat plate-like upper surface. However, the holding and moving machine according to the present invention is not limited to this structure, and the work W is held by a plurality of pins. It may be held by adsorption.

第1および第2のワーク保持移動機構32,33はいずれも、図2の左側でワークWを保持して図2の右側に移動する。ワーク保持移動機構32,33のこのような移動によってワークWは図2の左から右へと搬送される。搬送中にワークWは偏光光照射領域Rを通過し、光配向の処理が行われる。
このような偏光光照射装置100による光配向処理の手順について以下説明する。
光配向処理の第1段階では、偏光光照射装置100の外部からワークWが偏光光照射装置100のエア浮上ユニット31上に搬送されて来る。
図3および図4は、ワークWが偏光光照射装置に搬送されてきた状態を示す上面図および側面図である。図4には、偏光光照射装置100を図3の左方から見た状態が示されている。
Both the first and second workpiece holding and moving mechanisms 32 and 33 hold the workpiece W on the left side of FIG. 2 and move to the right side of FIG. By such movement of the workpiece holding and moving mechanisms 32 and 33, the workpiece W is transported from the left to the right in FIG. During conveyance, the workpiece W passes through the polarized light irradiation region R, and a photo-alignment process is performed.
The procedure of the photo-alignment process by the polarized light irradiation apparatus 100 will be described below.
In the first stage of the photo-alignment process, the workpiece W is conveyed from the outside of the polarized light irradiation device 100 onto the air floating unit 31 of the polarized light irradiation device 100.
3 and 4 are a top view and a side view showing a state in which the workpiece W has been conveyed to the polarized light irradiation device. FIG. 4 shows a state in which the polarized light irradiation device 100 is viewed from the left side of FIG.

ワークWがエア浮上ユニット31上に搬送されてきた時点でのアライメントマークMの位置は、図3に示すように、アライメントカメラ21の視野から外れている。この搬送されて来たワークWはエア浮上ユニット31によって浮上され、浮上したワークWに対し、図4に示すように、回転ステージ22の上面が上昇してきてワークWの下面を吸着保持する。
このような第1段階に続く光配向処理の第2段階では、ワークWの向きが所望の向きに調整される。
図5および図6は、ワークWの向きが所望の向きに調整される様子を示す上面図および側面図である。図6には、偏光光照射装置100を図5の左方から見た状態が示されている。
As shown in FIG. 3, the position of the alignment mark M at the time when the workpiece W is conveyed onto the air levitation unit 31 is out of the field of view of the alignment camera 21. The conveyed workpiece W is levitated by the air levitation unit 31, and the upper surface of the rotary stage 22 rises with respect to the levitated workpiece W as shown in FIG. 4 to suck and hold the lower surface of the workpiece W.
In the second stage of the photo-alignment process following the first stage, the direction of the workpiece W is adjusted to a desired direction.
5 and 6 are a top view and a side view showing how the orientation of the workpiece W is adjusted to a desired orientation. FIG. 6 shows a state where the polarized light irradiation apparatus 100 is viewed from the left side of FIG.

回転ステージ22は、図5に示すように、ワークWの向きが光照射部10に対して例えば20°程度傾くように回転する。回転ステージ22が回転した結果ワークW上のアライメントマークMがアライメントカメラ21の視野に入って検出される。また、回転ステージ22の回転角度の調整により、アライメントマークMの位置がアライメントカメラ21の視野中の所定位置に位置合わせされる。このような位置合わせにより、ワークWの方向と偏光光照射領域Rに照射される偏光光の偏光軸の方向とが所望の関係になる。また、ワークWが回転されることでワークWの角部Cがエア浮上ユニット31から突き出した状態となる。   As illustrated in FIG. 5, the rotary stage 22 rotates so that the direction of the workpiece W is inclined by, for example, about 20 ° with respect to the light irradiation unit 10. As a result of the rotation of the rotary stage 22, the alignment mark M on the workpiece W enters the field of view of the alignment camera 21 and is detected. Further, the position of the alignment mark M is aligned with a predetermined position in the field of view of the alignment camera 21 by adjusting the rotation angle of the rotary stage 22. By such alignment, the direction of the workpiece W and the direction of the polarization axis of the polarized light irradiated to the polarized light irradiation region R have a desired relationship. Further, when the workpiece W is rotated, the corner portion C of the workpiece W protrudes from the air levitation unit 31.

その後、図6に示すように、ワーク保持移動機構(ここでは一例として第1のワーク保持移動機構32)の上面が上昇し、エア浮上ユニット31から突き出したワークWの一部(この例では角部C)をワークWの下面から吸着して保持する。一方、回転ステージ22は上面が下降して待避する。1つのワークWは、第1および第2のワーク保持移動機構32,33のうちのどちらか一方(図6の例では第1のワーク保持移動機構32)によって保持される。   Thereafter, as shown in FIG. 6, the upper surface of the workpiece holding and moving mechanism (here, the first workpiece holding and moving mechanism 32 as an example) rises and a part of the workpiece W (in this example, the corner) protrudes from the air floating unit 31. Part C) is sucked and held from the lower surface of the workpiece W. On the other hand, the upper surface of the rotary stage 22 is lowered and retracted. One workpiece W is held by one of the first and second workpiece holding and moving mechanisms 32 and 33 (the first workpiece holding and moving mechanism 32 in the example of FIG. 6).

図5および図6に示す例のようにワーク保持移動機構32がワークWの角部Cを保持すると、エア浮上ユニット31からのエアを受ける面積が充分に広く、エア浮上ユニット31によりワークWが容易且つ充分に浮上する。また、角部Cは面積としては小さいものの、エア浮上ユニット31に直近の付け根部分では搬送方向に充分な長さを有しているので、ワーク保持移動機構32が角部Cを保持することで充分な保持性が確保される。
このような第2段階に続く光配向処理の第3段階では、ワーク保持移動機構32が移動してワークWが搬送される。
When the workpiece holding and moving mechanism 32 holds the corner C of the workpiece W as in the examples shown in FIGS. 5 and 6, the area for receiving the air from the air floating unit 31 is sufficiently large. Float easily and sufficiently. Further, although the corner portion C has a small area, the base portion closest to the air levitation unit 31 has a sufficient length in the transport direction, so that the workpiece holding and moving mechanism 32 holds the corner portion C. Sufficient retention is ensured.
In the third stage of the photo-alignment process following the second stage, the work holding and moving mechanism 32 moves and the work W is transported.

図7および図8は、ワーク保持移動機構の移動を示す上面図および正面図である。図8には、偏光光照射装置100を図7の下方側から見た状態が示されている。
ワークWを保持したワーク保持移動機構(ここでは一例として第1のワーク保持移動機構32)はレール34に沿って上記搬送方向に移動してワークWを搬送する。ワーク保持移動機構による搬送によってワークWは偏光光照射領域Rを通過し、偏光光照射領域Rで偏光光が照射されることによって光配向処理が行われる。ワークWの角部Cについても、ワーク保持移動機構が下面を吸着して保持しているので偏光光が照射されて光配向処理が施される。
7 and 8 are a top view and a front view showing movement of the workpiece holding and moving mechanism. FIG. 8 shows a state in which the polarized light irradiation device 100 is viewed from the lower side of FIG.
A workpiece holding / moving mechanism that holds the workpiece W (here, the first workpiece holding / moving mechanism 32 as an example) moves along the rail 34 in the transfer direction to transfer the workpiece W. The workpiece W passes through the polarized light irradiation region R by the conveyance by the workpiece holding and moving mechanism, and the polarized light is irradiated in the polarized light irradiation region R, so that the optical alignment process is performed. The corner portion C of the workpiece W is also subjected to a photo-alignment process by being irradiated with polarized light because the workpiece holding and moving mechanism holds and holds the lower surface.

ワークWを保持した一方のワーク保持移動機構(例えば第1のワーク保持移動機構32)が上記搬送方向に移動する際に、他方のワーク保持移動機構(例えば第2のワーク保持移動機構33)は、ワークWとすれ違って上記搬送方向とは逆方向に移動する。この逆方向の移動に際し、他方のワーク保持移動機構の上面は、一方のワーク保持移動機構に保持されたワークWの下面よりも下まで下がっており、ワークWとのすれ違いにおける接触が容易に回避される。
光配向処理の実行中でも偏光光照射装置100には、図7の左側にワークWが納まるスペースが空くので、偏光光照射装置100の外部から次のワークWが搬送されてきて、アライメント部20による位置合わせが行われる。
When one workpiece holding and moving mechanism (for example, the first workpiece holding and moving mechanism 32) holding the workpiece W moves in the transport direction, the other workpiece holding and moving mechanism (for example, the second workpiece holding and moving mechanism 33) Then, it passes by the workpiece W and moves in the direction opposite to the conveying direction. When moving in the opposite direction, the upper surface of the other workpiece holding / moving mechanism is lowered below the lower surface of the workpiece W held by the one workpiece holding / moving mechanism, so that contact with the workpiece W when passing is easily avoided. Is done.
Even during the execution of the photo-alignment process, the polarized light irradiation apparatus 100 has a space in which the work W is accommodated on the left side in FIG. 7, so that the next work W is conveyed from the outside of the polarized light irradiation apparatus 100 and Alignment is performed.

また、ワークWが偏光光照射領域Rを通過する通過速度は光配向処理のために制限された速度となるが、ワークWとすれ違う他方のワーク保持移動機構にはそのような速度制限はなく、光配向処理が完了する前に、次のワークWの搬入箇所(図7の左側)まで戻ることができる。そして、次のワークWが他方のワーク保持移動機構に保持され、前のワークWの光配向処理に続けて間断なく次のワークWの光配向処理が実行される。このため光配向処理のスループットが高い。   Further, the passing speed at which the workpiece W passes through the polarized light irradiation region R becomes a speed limited for the photo-alignment processing, but the other workpiece holding and moving mechanism passing the workpiece W has no such speed limitation. Before the photo-alignment process is completed, it is possible to return to the next work W loading position (left side in FIG. 7). Then, the next workpiece W is held by the other workpiece holding and moving mechanism, and the optical alignment processing of the next workpiece W is executed without interruption following the optical alignment processing of the previous workpiece W. For this reason, the throughput of photo-alignment processing is high.

なお、上記実施形態においては、偏光光照射装置に本発明を適用する場合について説明したが、本発明はこれに限定されるものではなく、ワークの下に気体を吹き出してワークを浮上させる浮上台を有する光照射装置であれば、本発明を適用することで上記実施形態と同様の効果が得られる。このような光照射装置としては、例えば、DI(ダイレクト・イメージ:直描)露光装置や、紫外線により熱硬化処理を行う紫外線照射装置等がある。
また、上記実施形態においては、光照射部が1つ設けられた例について説明したが、本発明の光照射装置は、複数の光照射部がワークの搬送方向に直列に設けられたものであってもよい。
In addition, in the said embodiment, although the case where this invention was applied to a polarized light irradiation apparatus was demonstrated, this invention is not limited to this, The floating stand which blows off gas under a workpiece | work and floats a workpiece | work If it is a light irradiation apparatus which has this, the effect similar to the said embodiment is acquired by applying this invention. Examples of such a light irradiation apparatus include a DI (direct image) exposure apparatus and an ultraviolet irradiation apparatus that performs thermosetting with ultraviolet rays.
In the above-described embodiment, an example in which one light irradiation unit is provided has been described. However, the light irradiation device of the present invention includes a plurality of light irradiation units provided in series in the workpiece conveyance direction. May be.

10…光照射部、11…放電ランプ、12…ミラー、13…偏光子ユニット、14…ランプハウス、20…アライメント部、21…アライメントカメラ、22…回転ステージ、30…搬送部、31…エア浮上ユニット、32…第1のワーク保持移動機構、33…第2のワーク保持移動機構、34…レール、100…偏光光照射装置   DESCRIPTION OF SYMBOLS 10 ... Light irradiation part, 11 ... Discharge lamp, 12 ... Mirror, 13 ... Polarizer unit, 14 ... Lamp house, 20 ... Alignment part, 21 ... Alignment camera, 22 ... Rotation stage, 30 ... Conveyance part, 31 ... Air floating Unit: 32... First work holding and moving mechanism, 33... Second work holding and moving mechanism, 34... Rail, 100.

Claims (4)

予め設定された照射領域を通過するワークに光を照射する光照射装置であって、
前記照射領域を前記ワークが通過する通過方向に延び、該ワークの下に気体を吹き出して該ワークを浮上させる浮上台と、
前記浮上台を前記通過方向と交わる方向に挟んだ両脇に一対で設けられ、該一対の各々が、前記ワークを保持して前記通過方向へと移動する機能を有し、該一対の一方が該ワークを保持して移動する際に、該一対の他方が該ワークとすれ違って該通過方向とは逆方向に移動する保持移動機と、
を備えたことを特徴とする光照射装置。
A light irradiation device for irradiating light to a workpiece passing through a preset irradiation region,
A levitation base that extends in the passing direction through which the work passes through the irradiation area, and blows a gas under the work to float the work;
A pair is provided on both sides sandwiching the levitation table in a direction intersecting the passing direction, each of the pair has a function of holding the workpiece and moving in the passing direction, and the one of the pair is A holding and moving machine that moves in the direction opposite to the passing direction when the other of the pair passes the workpiece when holding and moving the workpiece;
A light irradiation apparatus comprising:
前記保持移動機が、前記通過方向とは逆方向に移動する際、前記ワークよりも下方に下がった状態で移動することを特徴とする請求項1記載の光照射装置。   The light irradiation apparatus according to claim 1, wherein the holding and moving device moves in a state of being lowered below the workpiece when moving in a direction opposite to the passing direction. 前記保持移動機が、前記浮上台から突き出した前記ワークの一部を下方から吸着して保持することを特徴とする請求項1または2記載の光照射装置。   The light irradiation apparatus according to claim 1, wherein the holding and moving unit holds and holds a part of the work protruding from the levitation base from below. 前記浮上台上のワークを回転させる回転機をさらに備え、前記ワークは矩形状のワークであり、
前記保持移動機が、前記回転機による回転で前記浮上台の脇から突き出た前記ワークの角部を保持することを特徴とする請求項1または2記載の光照射装置。
It further comprises a rotating machine for rotating the work on the levitation table, the work is a rectangular work,
The light irradiation apparatus according to claim 1, wherein the holding and moving machine holds a corner portion of the work projecting from a side of the levitation base by rotation by the rotating machine.
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