JP2010049015A - Scan exposure apparatus and substrate for liquid crystal display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a scan exposure apparatus in which masks can be replaced while reliably preventing interference with an air pad by a mask replacing mechanism having a relatively simple configuration, and to provide a substrate for a liquid crystal display. <P>SOLUTION: A mask changer 2 of a proximity scan exposure apparatus 1 includes: a mask tray 41 capable of mounting a mask M on its upper face; a drive belt mechanism 42 disposed at a position higher than an air pad 21 and driving the mask tray 41 in the Y-direction; and a translatory guiding mechanism 44 guiding the mask tray 41 in a translatory manner so as not to contact with the air pad 21 upon moving the mask tray 41 below a mask holding section 11. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a scanning exposure apparatus and a liquid crystal display substrate.

  Large flat panel displays such as liquid crystal displays and plasma displays used for large thin televisions and the like are manufactured by proximity exposure transfer of a mask pattern onto a substrate by a division sequential exposure method. As this type of divided sequential exposure method, for example, a mask having the same size as the panel is used, the mask is held by a mask stage, the substrate is held by a work stage, and both are placed close to each other. Each time the work stage is moved stepwise relative to the mask, the substrate is irradiated with light for pattern exposure from the mask side, and a plurality of mask patterns are exposed and transferred onto the substrate.

  As another exposure method, a scan exposure method is known in which a mask is subdivided, a plurality of mask holding portions for holding these masks are arranged in a staggered manner, and exposure is performed while moving the substrate in one direction. (For example, refer to Patent Document 1). This exposure method utilizes the fact that a large pattern can be formed by joining together on the premise that there is a portion that is repeated to some extent in the pattern formed on the substrate. In this case, the mask does not need to be large in accordance with the panel, and a relatively inexpensive mask can be used.

Further, in Patent Document 1, since it is necessary to perform maintenance such as cleaning of the mask in a relatively short cycle in the scanning exposure method, a transport tray in which a plurality of masks are stacked using a spacer is arranged on the tray support portion. In addition, a transport device that drives the tray support portion with a linear motor or the like is disclosed, whereby the mask is efficiently transported to the mask holding portion. In this transport device, a plate-like driven part of the tray support part, a linear motor for moving the tray support part, and a linear guide are accommodated on the lower surface of the base in which the air discharge and suction holes are formed. A housing is attached.
JP 2007-165821 A

By the way, in recent scanning exposure apparatuses, an apparatus in which a plurality of air pads are arranged on a base is used to float and hold a glass substrate. For this reason, when replacing the mask, the transport tray moves directly on the air pad and moves below the mask holder. However, the transport tray contacts the air pad, especially at the joint of the air pad, and the air pad is damaged. It is desirable to prevent this.
In the transport device of Patent Document 1, there is no description about the air pad, and since the linear motor and the linear guide are arranged below the base, if a space for attaching these is provided, the position of the air pad may interfere. There is a problem that the processing of the base to which the air pad is attached becomes complicated.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to perform mask replacement while reliably preventing interference with an air pad by a mask replacement mechanism having a relatively simple configuration. A scanning exposure apparatus and a liquid crystal display substrate are provided.

The above object of the present invention can be achieved by the following constitution.
(1) a substrate transport mechanism that includes a plurality of air pads for levitating and holding a substrate, and capable of reciprocatingly transporting the levitated and held substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiating units disposed above the plurality of mask holding units and irradiating exposure light; and
A mask exchange mechanism for exchanging the plurality of masks held by the plurality of mask holding parts;
A scanning exposure apparatus comprising:
The mask exchange mechanism is
A mask placement portion on which the mask can be placed on an upper surface;
A driving means disposed at a position higher than the air pad and driving the mask mounting portion in a direction orthogonal to the predetermined direction;
A linear motion guide mechanism that linearly guides the mask mounting portion so as not to contact the air pad when the mask mounting portion moves below the mask holding portion;
A scanning exposure apparatus comprising:
(2) The linear motion guide mechanism includes a rolling or sliding component disposed on a lower surface of the mask mounting portion, and a guide rail for guiding the rolling or sliding component. The scan exposure apparatus according to (1).
(3) The scan exposure apparatus according to (2), wherein a plurality of the guide rails are arranged at a position lower than the upper surface of the air pad so as to straddle the air pad.
(4) A liquid crystal display substrate, wherein the pattern of each mask is exposed by the scanning exposure apparatus according to (1).

  According to the scanning exposure apparatus of the present invention, the mask exchange mechanism is arranged at a position higher than the air receiving pad and the mask placing portion on which the mask can be placed, and the mask placing portion is arranged in a direction orthogonal to the predetermined direction. Since it has a driving means for driving and a linear motion guide mechanism that linearly guides the mask mounting portion so as not to contact the air pad when the mask mounting portion moves below the mask holding portion, it is relatively simple. With the mask exchange mechanism having the configuration, the mask can be exchanged while reliably preventing interference with the air pad.

  Embodiments of a proximity scan exposure apparatus and a liquid crystal display substrate according to the present invention will be described below in detail with reference to the drawings.

  First, a schematic configuration of the proximity scan exposure apparatus 1 of the present embodiment will be described. As shown in FIGS. 1 and 2, the scan exposure apparatus 1 of the present embodiment floats and supports a substrate (for example, a color filter substrate as a substrate for a liquid crystal display) W and supports it in a predetermined direction (X in FIG. 1). The substrate transport mechanism 10 that transports in the direction) and the plurality of masks M are respectively held, and a plurality (as shown in FIG. 1) are arranged in two rows in a staggered manner along a direction (Y direction in FIG. 1) intersecting the predetermined direction. In the embodiment, the left and right mask holding units 11, the mask driving unit 12 that drives the mask holding unit 11, and the plurality of mask holding units 11 are arranged on the top of each of the plurality of mask holding units 11 to irradiate exposure light. The irradiation part 14 and the control part 15 which controls the motion of each operation | movement part of the scanning exposure apparatus 1 are mainly provided.

  The substrate transport mechanism 10 includes a floating unit 16 provided in a region for transporting the substrate W in the X direction, that is, a region below the plurality of mask holders 11 and a region extending from the bottom region to both sides in the X direction. And a substrate driving unit 17 that holds the one side in the Y direction (the upper side in FIG. 1) and conveys it in the X direction. The levitation unit 16 includes a plurality of exhaust air pads 20 and intake / exhaust air pads 21 respectively provided on a plurality of frames 19, and the exhaust air pads 20 and the intake / exhaust air pads 21 are provided via pumps (not shown) and solenoid valves (not shown). Air is exhausted or sucked and exhausted from the exhaust air pad 21. As shown in FIG. 1, the substrate driving unit 17 includes a suction pad 22 that holds one end of the substrate W that is levitated and supported by the levitating unit 16, and includes a motor 23, a ball screw 24, and a nut (not shown). The substrate W is transported in the X direction along the guide rail 26 by the ball screw mechanism 25. As shown in FIG. 2, the plurality of frames 19 are arranged via another level block 28 on the apparatus base 27 installed on the ground via the level block 18. Further, the substrate W may be transported by a linear servo actuator instead of the ball screw mechanism 25. Further, the air pad 20 may perform intake simultaneously with exhaust, or the air pad 21 may perform only exhaust.

  The mask drive unit 12 is attached to a frame (not shown), and is attached to the X direction drive unit 31 that drives the mask holding unit 11 along the X direction, and the tip of the X direction drive unit 31. Is attached to the tip of the Y direction drive unit 32, and the mask holding unit 11 is rotationally driven in the θ direction (around the horizontal plane of the X and Y directions). A θ-direction drive unit 33 and a Z-direction drive unit 34 that is attached to the tip of the θ-direction drive unit 33 and drives the mask holding unit 11 in the Z direction (vertical direction of the horizontal plane composed of the X and Y directions). Accordingly, the mask holding unit 11 attached to the tip of the Z direction driving unit 34 can be driven in the X, Y, Z, and θ directions by the mask driving unit 12. Note that the order of arrangement of the X, Y, θ, and Z direction drive units 31, 32, 33, and 34 can be changed as appropriate.

  As shown in FIG. 2, the irradiation unit 14 disposed on the upper part of the mask holding unit 11 includes a light source 6, a mirror 7, an optical integrator (not shown), a shutter (not shown), and the like. As the light source 6, for example, an ultra-high pressure mercury lamp, a xenon lamp or an ultraviolet light emitting laser that emits exposure light EL including ultraviolet light is used.

  In such a proximity scanning exposure apparatus 1, the substrate W is floated and held by the air flow of the exhaust air pad 20 and the intake / exhaust air pad 21 of the flying unit 16, and one end of the substrate W is sucked by the substrate driving unit 17 to be in the X direction. Transport to. Then, the exposure light EL from the irradiation unit 14 is irradiated onto the substrate M positioned below the mask holding unit 11 through the rectangular opening 11c formed in the mask holding unit 11, and the mask M The pattern is transferred to the color resist applied to the substrate W.

  Here, in this embodiment, as shown in FIG. 1, the masks M of the respective mask holding portions 11a and 11b are simultaneously exchanged between the carry-in side and carry-out side mask holding portions 11a and 11b arranged in two rows in a staggered manner. A mask changer 2 which is a possible mask exchange mechanism is provided. The used or unused mask M transported by the mask changer 2 is transferred to and from the mask stockers 3 and 4 by the loader 5. The mask M is pre-aligned by a mask pre-alignment mechanism (not shown) during the transfer between the mask stockers 3 and 4 and the mask changer 2.

  The mask changer 2 is provided between a mask tray 41, which is a pair of mask placing portions that can place a mask M attached to each mask holding portion 11a, 11b on the upper surface, and the carry-in side and carry-out side mask holding portions 11a, 11b. A driving belt mechanism 42 that is disposed at a position higher than the air pad 21 and that drives the pair of mask trays 41 in the Y direction; a connecting portion 43 that connects the pair of mask trays 41 and the driving belt mechanism 42; A linear motion guide mechanism 44 that linearly guides the mask tray 41 so as not to come into contact with the air pad 21 when the tray 41 moves below the mask holder 11 is provided.

  The linear motion guide mechanism 44 includes a roller 45 that is a rolling part disposed on the lower surface of the mask tray 41 and a pair of guide rails 46 that extend in the Y direction so as to straddle the air pad 21 and guide the roller 45. Prepare. The rollers 44 are configured to suppress dust generation, such as those made of Teflon (registered trademark), metal bearings, or bearings coated with resin around the bearings. Further, the pair of guide rails 45 is installed at a position lower than the upper surface of the air pad 21 so as not to hinder the conveyance of the substrate W.

  Further, when the mask M is transported, the mask belt 41 slides on the air pad 21 while being guided by the linear motion guide mechanism 44 by driving the drive belt mechanism 42 in a state where air is discharged from the air pad 21. To do. Then, when the mask M is conveyed to a position directly below the desired mask holding unit 11, it is held by the mask holding unit 11 by vacuum suction. Accordingly, since the mask tray 41 moves on the air pad 21 while the rollers 45 are supported by the guide rails 46, the mask tray 41 does not move even if the air volume from the air pad 21 is insufficient and the flying height is not sufficient. It does not touch the corners of the air pad 21 and damage the air pad.

  Therefore, according to the proximity scan exposure apparatus 1 of the present embodiment, the mask changer 2 is disposed at a position higher than the mask tray 41 and the air pad 21 on which the mask M can be placed on the upper surface, and the mask tray 41 is moved in the Y direction. Since it has a drive belt mechanism 42 for driving and a linear motion guide mechanism 44 that linearly guides the mask tray 41 so that it does not come into contact with the air pad when the mask tray 41 moves below the mask holding portion, it is relatively simple. With the mask changer 2 having a simple structure, the mask M can be replaced while reliably preventing interference with the air pad 21.

  In addition, this invention is not limited to the said embodiment, A change, improvement, etc. are possible suitably.

  The mask replacement mechanism of the present invention may be a sliding part that slides on the guide rail 46, such as a sled 50 shown in FIG. 5, instead of the rolling part that rolls on the guide rail.

  In this embodiment, the mask replacement mechanism has a pair of mask placement portions. However, when the mask holding portion is linearly arranged in the Y direction, one mask placement portion is provided. May be configured to be conveyed in the Y direction.

It is a top view of the proximity scanning exposure apparatus which is embodiment of this invention. It is a front view of the proximity scan exposure apparatus in FIG. It is a partially expanded front view for demonstrating a mask exchange mechanism. It is a partially expanded plan view for demonstrating a mask exchange mechanism. It is a perspective view for demonstrating the modification of the linear motion guide mechanism of a mask exchange mechanism.

Explanation of symbols

1 Proximity scanning exposure device 2 Mask changer (mask exchange mechanism)
DESCRIPTION OF SYMBOLS 10 Substrate conveyance mechanism 11 Mask holding part 12 Mask drive part 14 Irradiation part 15 Control part 41 Mask tray (mask mounting part)
42 Drive belt mechanism (drive means)
44 Linear motion guide mechanism 45 Rollers (rolling parts)
46 Guide rail EL Exposure light M Mask W Color filter substrate (substrate)

Claims (4)

A substrate transport mechanism comprising a plurality of air pads for levitating and holding the substrate, and capable of reciprocatingly transporting the levitated and held substrate along a predetermined direction;
A plurality of mask holding sections for holding a plurality of masks, respectively;
A plurality of irradiating units disposed above the plurality of mask holding units and irradiating exposure light; and
A mask exchange mechanism for exchanging the plurality of masks held by the plurality of mask holding parts;
A scanning exposure apparatus comprising:
The mask exchange mechanism is
A mask placement portion on which the mask can be placed on an upper surface;
A driving means disposed at a position higher than the air pad and driving the mask mounting portion in a direction orthogonal to the predetermined direction;
A linear motion guide mechanism that linearly guides the mask mounting portion so as not to contact the air pad when the mask mounting portion moves below the mask holding portion;
A scanning exposure apparatus comprising:   2. The linear motion guide mechanism includes a rolling or sliding component disposed on a lower surface of the mask mounting portion, and a guide rail that guides the rolling or sliding component. The scanning exposure apparatus described in 1.   The scan exposure apparatus according to claim 2, wherein a plurality of the guide rails are arranged at a position lower than the upper surface of the air pad so as to straddle the air pad.   A liquid crystal display substrate, wherein the pattern of each mask is exposed by the scanning exposure apparatus according to claim 1.

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