JP6607003B2 - Light irradiation apparatus and light irradiation method - Google Patents

Description

  The present invention relates to a light irradiation apparatus and a light irradiation method for irradiating a workpiece with polarized light.

In recent years, a technique called photo-alignment has been adopted in which alignment is performed by irradiating polarized light of a predetermined wavelength with respect to alignment processing of alignment films for liquid crystal display elements such as liquid crystal panels and alignment layers for viewing angle compensation films. Has been.
For example, Patent Document 1 discloses a light irradiation apparatus used for photo-alignment. The light irradiation apparatus includes a linear light source having a length corresponding to the width of the light irradiation region and a polarizing element that polarizes light from the light source, and is conveyed in a direction orthogonal to the longitudinal direction of the light source. A photo-alignment process is performed by irradiating the work to be polarized with polarized light.

JP 2014-174352 A

By the way, the photo-alignment process has been developed not only for a large substrate such as a liquid crystal panel for a television screen but also for a small and medium liquid crystal display such as a smartphone. Therefore, there is a demand for efficiently producing displays of different sizes and different uses such as a large liquid crystal display and a small and medium liquid crystal display.
In order to meet such a demand, it is necessary to form a plurality of alignment regions having different alignment directions on a single substrate and to create a plurality of types of substrates using this substrate as a mother substrate. However, the conventional light irradiation apparatus can only irradiate the entire surface of one substrate with polarized light having a polarization axis in a certain direction. Therefore, a plurality of alignment regions having different alignment directions cannot be formed on one substrate.
Then, this invention makes it the subject to provide the light irradiation apparatus and light irradiation method which can form several area | regions from which an orientation direction differs on one workpiece | work.

In order to solve the above-described problems, one aspect of a light irradiation apparatus according to the present invention is a light irradiation apparatus that performs light alignment by irradiating polarized light onto a work on which a photo-alignment film is formed. A stage that is transported along a transport path of the first workpiece, and a first light that is installed on the transport path of the workpiece, polarizes light from the light source by the first polarizer, and irradiates the first polarized light from the light exit port. An irradiation unit and a second light polarizer arranged in parallel with the first light irradiation unit on the transport path, and polarized by a second polarizer having a transmission axis in a direction different from that of the first polarizer, A second light irradiating unit configured to irradiate a second polarized light from an exit; and a first use position in a region where the polarized light of the workpiece can be irradiated on the stage. first area on the workpiece to be photo-alignment by the polarized light It said first defining said first region by allowing the irradiation of the polarized light, in a second use position different from the first use position in the irradiation-enabled area, the second polarization A plate member that defines the second region by allowing irradiation of the second polarized light to the second region on the workpiece to be photo-aligned by light; and A drive unit that moves between the second use position and the second use position, and a rotation of the stage about an axis that is orthogonal to the work placement surface of the stage. A rotation control unit configured to be in a posture of the above, and the plate member is rotated together with the stage by the rotation control unit.

With the above configuration, the plate member causes the region on the workpiece to be irradiated with the first polarized light emitted from the first light irradiation unit and the second polarized light emitted from the second light irradiation unit. The area on the workpiece to be irradiated can be defined. As a result, a plurality of polarized light beams having different polarization axes can be irradiated onto a single workpiece in divided irradiation regions, and a plurality of alignment regions having different alignment directions can be formed on a single workpiece. Therefore, substrates of different sizes and different applications can be efficiently manufactured, and productivity can be improved. Further, a plurality of alignment regions can be formed by separating a single workpiece not only in a direction along the conveyance path or in a direction orthogonal to the conveyance path but also in any direction that does not coincide with these directions.

In the above light irradiation apparatus, the plate member may be configured by an optical filter that blocks polarized light having a wavelength that contributes to the photo-alignment of the photo-alignment film. Thus, if a plate member is comprised with an optical filter, a deformation | transformation and deterioration of the 1st plate member and the 2nd plate member by the heat | fever from a light source can be suppressed.
Further, in the light irradiation apparatus, the plate member may be movable between the first use position and the second use position and a retreat position retracted from the irradiation possible area. If the plate member is retracted to the retracted position and, for example, the irradiation of the polarized light from the second light irradiation unit is stopped, the first polarized light can be uniformly applied to the entire surface of the workpiece. Therefore, a photo-alignment process in which the entire surface of one workpiece is irradiated with polarized light having a polarization axis in the same direction, and one workpiece is divided into a plurality of alignment regions, and polarization axes in different directions for each alignment region. It is also possible to switch between the photo-alignment process of irradiating polarized light having

In the light irradiation device, the plate member may be slidable in the horizontal direction. In this case, space saving in the height direction (vertical direction) of the apparatus can be achieved.
Furthermore, in the above-described light irradiation device, the plate member is configured by a plurality of sub-plate members, and the plurality of sub-plate members are arranged at the first use position and the second use position at the sub positions. You may arrange | position so that the edge part of plate members may overlap and it may continue in a line. In this case, the size of the alignment region formed on the workpiece can be adjusted according to the overlap amount. In addition, since a plurality of sub-plate members can be stacked in the retracted position, the space at the retracted position can be reduced.

Further, in the light irradiation apparatus, the plate member is disposed on the stage, and on the support member that crosses the stage across the light exit port side of the work placement surface of the stage. It may be fixed. In this case, the bending of the plate member can be prevented, and the contact between the plate member and the workpiece can be prevented.
Furthermore, in the above-described light irradiation device, the driving unit may be disposed below a placement surface of the workpiece on the stage. In this case, it is possible to prevent dust generated by the movement of the plate member from falling on the stage.

In the light irradiation apparatus, the first area is set on one side in a direction along the conveyance path on the workpiece, and the second area is on the conveyance path on the workpiece. It may be set on the other side in the direction along. In this way, the first region and the second region can be formed by being arranged in the direction along the conveyance path.
Further, in the light irradiation device, the position of the one end of the plate member at the first use position and the position of the other end of the plate member at the second use position are respectively You may set between said 1st area | region and said 2nd area | region. By setting the end position of the plate member in this way, it is possible to appropriately form a plurality of orientation regions by separating a single workpiece in a direction along the conveyance path.

The light irradiation device may further include a tip member provided at an end portion of the plate member and having a lower end surface positioned below the end portion. In this case, it is possible to reduce the wraparound of light to the region directly below the plate member, compared to the case where the tip member is not provided. Therefore, it is possible to appropriately form the alignment region on the workpiece.
Further, in the light irradiation device, the tip member may be capable of adjusting a height direction position of the lower end surface. In this case, it becomes possible to adjust the amount of wraparound of the light, and an alignment region can be formed on the workpiece more appropriately.

Et al is, in the light irradiation apparatus, the stage, the at conveying path, from the one waiting position set on the side of the first light irradiation part and the second irradiation area of the light irradiation section The movement toward the irradiation area is configured to be reciprocating as a forward movement, and the drive unit moves the position of the plate member between the first use position and the second use position on the forward path and the return path of the stage. It may be switched between the use position. In this case, two different alignment regions can be formed on one workpiece by reciprocating movement of the stage.

In the light irradiation apparatus, the first light irradiation unit and the second light irradiation unit are disposed on the light emission side of the light emission port, so that the light emitted from the light emission port is provided. You may provide the light-shielding part which can light-shield the polarized light of the wavelength which contributes to the photo-alignment of an alignment film. In this case, it is possible to appropriately switch between irradiation of the first polarized light from the first light irradiation unit and irradiation of the second polarized light from the second light irradiation unit .

Furthermore, one aspect of the light irradiation method according to the present invention is a light irradiation method for performing photo-alignment by irradiating polarized light onto a work on which a photo-alignment film is formed, and polarization of the work placed on a stage. The plate member is arranged at the first use position in the light irradiable region, and the light from the light source emitted by the first light irradiation unit installed on the conveyance path of the work is irradiated by the first polarizer. Defining the first region by allowing the first region on the workpiece to be photo-aligned by the polarized first polarized light to be irradiated with the first polarized light ; and A step of controlling rotation around an axis orthogonal to the mounting surface of the workpiece, rotating the plate member together with the stage, and setting the posture of the stage to a posture at the time of light irradiation; By the transport Irradiating the first region on the workpiece with the first polarized light, and the plate member from the first use position in the irradiable region. Moves to a second use position different from the use position, and irradiates light from the light source, which is irradiated by a second light irradiation unit arranged in parallel with the first light irradiation unit on the transport path, to the first polarized light. Allowing irradiation of the second polarized light to the second region on the workpiece to be photo-aligned by the second polarized light polarized by the second polarizer having a transmission axis in a direction different from that of the child The step of defining the second region by the above, the step of transporting the work along the transport path by the stage, irradiating the second polarized light on the second region on the work, including.
With the above configuration, a plurality of polarized light beams having different polarization axes can be irradiated onto a single work in divided irradiation areas, and a plurality of alignment areas having different alignment directions can be formed on a single work. it can. Therefore, substrates of different sizes and different applications can be efficiently manufactured, and productivity can be improved. Further, a plurality of alignment regions can be formed by separating a single workpiece not only in a direction along the conveyance path or in a direction orthogonal to the conveyance path but also in any direction that does not coincide with these directions.

  According to the present invention, it is possible to irradiate a single workpiece with a plurality of polarized light beams having different polarization axes, and thus form a plurality of alignment regions having different alignment directions on a single workpiece. be able to. Therefore, substrates of different sizes and different applications can be efficiently manufactured, and productivity can be improved.

It is a schematic block diagram which shows the polarized light irradiation apparatus of this embodiment. It is a figure which shows the open state of a shutter part. It is a figure which shows the closed state of a shutter part. It is a figure which shows the structural example of a shutter drive part. It is a figure which shows the structural example of a shutter drive part. It is a figure which shows the retracted state of the light-shielding mask part. It is a figure which shows the outward light-shielding state of the light-shielding mask part. It is a figure which shows the structural example of a light-shielding mask drive part. It is a figure which shows the return path light-shielding state of a light-shielding mask part. It is a figure which shows the state at the time of rotation of a stage. It is a figure which shows an example of a front-end | tip member. It is a block diagram which shows the structure of a control part. It is a figure explaining operation | movement of a polarized light irradiation apparatus.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
(First embodiment)
FIG. 1 is a schematic configuration diagram showing a polarized light irradiation apparatus 100 of the present embodiment.
The polarized light irradiation apparatus 100 includes light irradiation units 10 </ b> A, 10 </ b> B, and 10 </ b> C and a transport unit 20 that transports the workpiece W. Here, the workpiece W is, for example, a rectangular substrate on which a photo-alignment film is formed. The polarized light irradiation apparatus 100 linearly moves the workpiece W by the transport unit 20 while irradiating polarized light (polarized light) from at least one of the light irradiation units 10A to 10C, and the polarized light is applied to the photo-alignment film of the workpiece W. Light alignment is performed by irradiating light.

In the present embodiment, the polarized light irradiation apparatus 100 includes a first optical alignment process that irradiates the entire surface of a single workpiece W with polarized light having a polarization axis in the same direction, and a plurality of workpieces on the single workpiece W. It is possible to switch to a second optical alignment process that irradiates polarized light having a polarization axis in a different direction for each alignment region. In the present embodiment, the first photo-alignment process is described as being performed more frequently than the second photo-alignment process.
Each of the light irradiation units 10A to 10C includes a lamp 11 that is a linear light source and a mirror 12 that reflects light from the lamp 11. In addition, each of the light irradiation units 10A to 10C includes a polarizer unit 13 disposed on the light emission side. Further, each of the light emitting units 10A to 10C includes a lamp house 14 that houses the lamp 11, the mirror 12, and the polarizer unit 13. The light irradiation units 10A to 10C are configured so that the longitudinal direction of the lamp 11 coincides with the direction (Y direction) orthogonal to the conveyance direction (X direction) that is the direction in which the conveyance path of the workpiece W extends. They are juxtaposed along the transport direction (X direction). In addition, in FIG. 1, although the lamp (light irradiation part) is set to 3 lamps, it should just be 2 or more lamps. The number of lamps can be determined according to the amount of energy required for the light alignment process, the tact time, and the like.

Hereinafter, a specific configuration of the light irradiation units 10A to 10C will be described.
The lamp 11 is a long so-called long arc discharge lamp, and the light emitting portion thereof has a length corresponding to the width in the direction orthogonal to the conveying direction of the workpiece W. This lamp 11 is, for example, a discharge lamp such as a high-pressure mercury lamp, a metal halide lamp in which other metal and halogen are added to mercury, or a metal halide lamp in which a metal other than mercury and halogen is enclosed. Accordingly, ultraviolet light having a wavelength of 200 nm to 400 nm is emitted.
As materials for the photo-alignment film, those that are aligned by light having a wavelength of 254 nm, those that are aligned by light having a wavelength of 313 nm, and materials that are aligned by light having a wavelength of 365 nm are known. It selects suitably according to the wavelength to be performed.
As the light source, a linear light source in which LEDs or LDs that emit ultraviolet light are arranged in a straight line can be used. In that case, the direction in which the LEDs and LDs are arranged corresponds to the longitudinal direction of the lamp 11.

The mirror 12 reflects the radiated light from the lamp 11 in a predetermined direction, and is a bowl-shaped condensing mirror whose section is elliptical or parabolic. The mirror 12 is arranged such that its longitudinal direction coincides with the longitudinal direction of the lamp 11.
The lamp house 14 has, on the bottom surface thereof, a light exit port through which radiated light from the lamp 11 and reflected light from the mirror 12 pass. The polarizer unit 13 is attached to the light exit of the lamp house 14 and polarizes light passing through the light exit.

The polarizer unit 13 has a configuration in which a plurality of polarizers are arranged side by side along the Y direction, in the present embodiment, along the longitudinal direction of the lamp 11. The plurality of polarizers are supported by, for example, a frame. The polarizer is, for example, a wire grid type polarizing element, and the number of polarizers is appropriately selected according to the size of the region where the polarized light is irradiated. Each polarizer constituting one polarizer unit 13 is arranged such that the transmission axis faces the same direction. In the present embodiment, the direction of the transmission axis of each polarizer included in the light irradiation unit 10A is the same as the direction of the transmission axis of each polarizer included in the light irradiation unit 10B. Then, the direction of the transmission axis of each polarizer included in the light irradiation unit 10C is set to a direction different from the direction of the transmission axis of the polarizer included in each of the light irradiation units 10A and 10B.
That is, the light irradiation unit 10A and the light irradiation unit 10B polarize the light from the lamp 11 by the first polarizer and irradiate the first polarized light from the light exit. In addition, the light irradiation unit 10C polarizes the light from the lamp 11 with a second polarizer having a transmission axis in a direction different from that of the first polarized light, and the first polarized light from the light exit has a polarization axis. The second polarized light having a different direction is irradiated. The light irradiation unit 10A corresponds to the first light irradiation unit, and the light irradiation unit 10C corresponds to the second light irradiation unit.

In addition, among the three light irradiation units 10A to 10C arranged in parallel in the X direction, the light irradiation units 10A and 10C arranged at both ends in the X direction are respectively on the light emission side of the light emission port of the polarizer unit 13. A shutter unit 16 (see FIGS. 2 and 3) is provided as a light blocking unit capable of completely blocking the polarized light polarized by the polarizer unit 13.
2 and 3 are diagrams showing a configuration of the shutter unit 16. FIG. 2 shows the opened state of the shutter unit 16, and FIG. 3 shows the closed state of the shutter unit 16. Since the shutter unit 16 of the light irradiation unit 10A and the shutter unit 16 of the light irradiation unit 10C have the same configuration, the configuration of the shutter unit 16 of the light irradiation unit 10A will be described below as an example.

The shutter unit 16 is configured to be able to completely block at least the polarized light having the predetermined wavelength among the polarized light emitted from the polarizer unit 13 of the light irradiation unit 10A. Specifically, the shutter unit 16 includes a shutter plate 17 and a shutter drive unit 18 that moves the shutter plate 17. The shutter plate 17 is disposed at the retracted position 161 shown in FIG. 2 when the polarized light from the light irradiation unit 10A is not shielded. When the polarized light from the light irradiation unit 10A is shielded, the shutter plate 17 is shown in FIG. It is arranged at the use position 162. In the use position 162 of FIG. 3, the shutter plate 17 covers the entire region of the effective light emission length of the light irradiation unit 10A so that no polarized light is irradiated directly under the light irradiation unit 10A.
The shutter drive unit 18 is configured by a drive cylinder (for example, an air cylinder). 4 shows the state of the shutter drive unit 18 when the shutter unit 16 is closed, and FIG. 5 shows the state of the shutter drive unit 18 when the shutter unit 16 is open. As shown in FIGS. 4 and 5, the shutter drive unit 18 can move the shutter plate 17 in the X direction by fixing the distal end portion of the rod portion 18 a that can advance and retract in the X direction to the shutter plate 17.
The shutter driving unit 18 is not limited to the driving cylinder, and may be configured by, for example, a motor driving mechanism.

  Returning to FIG. 1, the transport unit 20 includes a stage 21 on which the workpiece W is placed. The stage 21 is a flat plate stage that can hold the work W by suction using a method such as vacuum suction. In the present embodiment, the stage 21 and the workpiece W are rectangular, but the present invention is not limited to this and may be any shape. Further, the configuration is not limited to the configuration in which the workpiece W is sucked and held by a flat plate stage, and may be a configuration in which the workpiece W is sucked and held by a plurality of pins.

In addition, the transport unit 20 includes an X-direction drive mechanism 22 for moving the stage 21 in the X direction. The X direction drive mechanism 22 is, for example, a linear motor drive mechanism, and includes two guides 22A extending along the X direction, a magnet plate 22B disposed between the two guides 22A, and a coil module 22C. . The two guides 22 </ b> A and the magnet plate 22 </ b> B are disposed on the upper surface of an installation base (not shown). The magnet plate 22B is composed of a plurality of magnets arranged at equal intervals in the X direction by alternately changing the polarities of adjacent magnetic poles. The coil module 22C is attached to the center of the back surface of the stage 21 so as to face the magnet plate 22B. As the X-direction drive mechanism 22, for example, a mechanism using a ball screw can be adopted.
As described above, the stage 21 is configured to be capable of reciprocating in the X direction along the guide 22 </ b> A that is a conveyance axis. The configuration of the X-direction drive mechanism 22 is not limited to the configuration shown in FIG. 1, and any configuration can be adopted as long as the stage 21 can be moved in the X direction.

Further, the transport unit 20 includes a θ moving mechanism 24 that constitutes a rotation control unit capable of rotating the stage 21 in the θ direction (around the Z axis). The stage 21 is mounted on the fixed base 25 so as to be rotatable in the θ direction, and the θ moving mechanism 24 can adjust the rotation angle of the stage 21 in the θ direction.
The moving path of the stage 21 is designed to pass directly under the light irradiation units 10A, 10B, and 10C. The conveyance unit 20 is configured to convey the workpiece W to the irradiation region of the polarized light by the light irradiation units 10A, 10B, and 10C and pass the irradiation region. Furthermore, after the workpiece W has completely passed through the irradiation area, the transport unit 20 is configured to return the workpiece W and pass the irradiation area again.
In the present embodiment, when performing the first photo-alignment process, the polarized light irradiation device 100 sets the light irradiation units 10A and 10B to the operating state and sets the light irradiation unit 10C to the non-operating state. In addition, the polarized light irradiation device 100 deactivates the shutter unit 16 of the light irradiation unit 10A so that the shutter unit 16 does not block the polarized light emitted from the light irradiation unit 10A. Thereby, the first polarized light can be applied to the entire surface of the workpiece W from the light irradiation units 10A and 10B, and the optical alignment process can be performed.

  On the other hand, when performing the second photo-alignment process, the polarized light irradiation device 100 puts the light irradiation units 10A and 10C into an operating state and puts the light irradiation unit 10B into a non-operational state. Then, the polarized light irradiation apparatus 100 drives and controls the shutter units 16 of the light irradiation units 10A and 10C and a stage-side mask mechanism to be described later, and only the first polarized light is irradiated onto the workpiece W to perform photo-alignment processing. And a second alignment region that is irradiated with only the second polarized light and is subjected to a photo-alignment treatment. At this time, the first alignment region and the second alignment region are formed on the workpiece W by being divided in a predetermined direction. The configuration of the stage side mask mechanism and the control method of the shutter unit 16 and the stage side mask mechanism will be described in detail later.

The basic operation of the stage 21 is as follows.
The stage 21 is subjected to workpiece W replacement processing and alignment processing at a workpiece mounting position set on one side of the irradiation region in the X direction. After the alignment is completed, the stage 21 is rotationally moved by the θ moving mechanism 24. Thereby, the direction of the workpiece W becomes a predetermined direction with respect to the polarization axis of the polarized light.
Thereafter, the stage 21 starts moving in the X direction toward the irradiation region. Then, after reaching the predetermined turn-back position that has passed through the irradiation area, the stage 21 starts the backward movement and returns to the work mounting position. At the workpiece mounting position, the workpiece W replacement processing and alignment processing are performed again, and after the alignment is completed, the stage 21 starts moving forward toward the irradiation region again. This operation is repeated. Each part of the conveyance part 20 of FIG. 1 is controlled by the control part not shown so that said stage operation | movement may be implement | achieved. In the present embodiment, it is assumed that the first optical alignment process is performed in the forward movement, and the second optical alignment process is performed in the backward movement.

Hereinafter, the stage side mask mechanism will be specifically described.
FIG. 6 is a diagram illustrating a configuration of the light shielding mask unit 30 as a stage-side mask mechanism. The light shielding mask unit 30 includes a light shielding plate 31, a bridge-shaped support member including a support portion 32 and a leg portion 33 that support the light shielding plate 31, and a light shielding mask driving unit 34. The light shielding plate 31 is disposed below the polarizer unit 13 of the light irradiation units 10 </ b> A and 10 </ b> C and above the surface of the workpiece W placed on the stage 21. The light shielding plate 31 can selectively shield polarized light having a predetermined wavelength among the polarized light emitted from the light irradiation units 10A and 10C. Here, the predetermined wavelength is a wavelength at which the material of the photo-alignment film of the workpiece W has sensitivity. The light shielding plate 31 is a plate-like member such as an optical filter.
The light shielding plate 31 extends over the stage 21 and is fixed on a support portion 32 that is wider in the Y direction than the stage 21. The leg portion 33 has an end portion of the support portion 32 fixed to one end thereof and a movable portion of the light shielding mask drive portion 34 fixed to the other end thereof. That is, the light shielding plate 31 is moved in the X direction by the leg 33 being moved in the X direction by the movable portion of the light shielding mask driving unit 34. Further, the support members (support portion 32, leg portion 33) are configured by a highly rigid member such as metal.

In order to form a light shielding region on the stage 21 by light shielding, the light shielding plate 31 is required to have a wide area. Further, in order to save the space in the height direction (Z direction) and reduce the weight of the light shielding plate 31, the light shielding plate 31 is required to have a thin form. Therefore, a plate member having a thin shape and a wide area is used for the light shielding plate 31. The light shielding plate 31 has a configuration in which a functional film (a reflective film or an absorption film) is formed on the surface of the substrate by a vacuum deposition method, a sputtering method, or the like. The substrate is, for example, quartz glass. The functional film is, for example, a dielectric multilayer film made of an inorganic material such as tantalum pentoxide (Ta ₂ O ₅ ) or silicon oxide (SiO ₂ ), or a metal vapor deposition film made of chromium (Cr), aluminum, or the like. .
That is, the light-shielding plate 31 has a configuration in which a wavelength selection thin film is coated on a substrate made of a light-transmitting material. Specifically, the light-shielding plate 31 shields light having a wavelength (wavelength contributing to the photo-alignment of the workpiece W) with which the photo-alignment film material has sensitivity such as 254 nm and 313 nm, and transmits light having other wavelengths. A cut filter is used. The light shielding plate 31 is disposed with the surface on which the coating film is formed facing upward (the lamp 11 side). The light shielding plate 31 may be a wavelength selective cut filter in which the material itself is doped with impurities, for example, quartz glass doped with a doping material that absorbs ultraviolet light.

The light shielding mask driving unit 34 is, for example, a motor driving mechanism, and is configured to be able to slide the light shielding plate 31 in the horizontal direction. Specifically, the light shielding plate 31 includes a retreat position 301 set at a position adjacent to the stage 21 in the moving direction of the light shielding plate 31 by the light shielding mask driving unit 34, and a predetermined use position on the stage 21. Can be slid in the horizontal direction. In the use position, the light shielding plate 31 has a region on the stage 21 immediately below the use position as a light shielding region for shielding the polarized light having the predetermined wavelength described above, and the remaining region on the stage 21 is polarized light to the workpiece W. It is set as the irradiation permissible region that allows the irradiation of. That is, the use position is set in a region where the polarized light of the work W placed on the stage 21 can be irradiated, and the light shielding plate 31 defines an area on the work W to be photo-oriented by the polarized light at the use position. Stipulate.
The moving direction of the light shielding plate 31 is not limited to the horizontal direction depending on the apparatus configuration, and may be retracted in the vertical direction, for example. Specifically, an elevating mechanism for the light shielding plate 31 formed of an air cylinder or the like is provided at a portion where the light shielding plate 31 and the light shielding mask driving unit 34 are connected. In this case, in order to avoid the robot hand when the work W is carried in, the light shielding plate 31 may be raised, and after the work W is carried in, the light shielding plate 31 may be lowered to a predetermined position when the robot hand is retracted from the apparatus.

  The light-shielding mask driving unit 34 is fixed to a rotation support member 24a that constitutes a θ moving mechanism 24 that can rotate the stage 21 in the θ direction. That is, the light shielding mask unit 30 is configured to be able to rotate and move in the θ direction together with the stage 21 by the θ moving mechanism 24. FIG. 6 shows a state where the stage 21 is not rotating (θ = 0) and the light shielding plate 31 is disposed at the retreat position 301 (a state where the work W is not shielded from light at all). As shown in FIG. 6, in the state where the stage 21 is not rotating, the moving direction of the light shielding plate 31 coincides with the transport direction (X direction) of the stage 21.

  As described above, the light shielding plate 31 is composed of a plate member. However, the plate member may be composed of a set of a plurality of sub-plate members. Specifically, as illustrated in FIG. 7, the light shielding plate 31 can be configured by light shielding plates 31 a to 31 c that are three sub-plate members having the same shape. These light shielding plates 31a to 31c are individually movable in the horizontal direction, and are sequentially moved from the light shielding plate located at the bottom (work W side) or the top (lamp 11 side) to the retreat position 301 in FIG. 7 is arranged at a predetermined use position (light-shielding position) 302 so as to be drawn out in a row in a forward direction indicated by an arrow A in FIG. Here, the forward direction is a direction from the retracted position 301 toward the light shielding position 302 in the moving direction of the light shielding plates 31a to 31c. In the present embodiment, a case will be described in which the light shielding plates 31a to 31c are drawn out in a line in the forward direction from the light shielding plate 31a positioned at the top and arranged at the light shielding position 302.

  As shown in FIG. 8, the light shielding plates 31 a to 31 c are arranged in a completely overlapped state at the retracted position 301 as shown in FIG. 8. That is, at the retracted position 301, the amount of overlap between the light shielding plates is maximized. At the retracted position 301, the light shielding plates 31a to 31c do not shield the work placement area of the stage 21. As described above, the plurality of light shielding plates 31a to 31c are supported with slightly different heights, and are disposed so as to completely overlap each other at the retracted position 301. Thereby, the retreat space in the X direction can be reduced, and the installation occupation area (footprint) in the X direction of the entire apparatus can be reduced.

Then, by reducing the overlap amount from the retracted state, as shown in FIG. 7, the light shielding plates 31a to 31c are arranged at the light shielding position 302, and a light shielding region is formed immediately below. As described above, the support members (support portion 32 and leg portion 33) that support the light shielding plates 31a to 31c do not interfere with the light shielding plates 31a to 31c in the height direction (Z direction), and the light shielding plates 31a to 31c. The shape is such that the support members do not interfere with each other in the movement direction (X direction in FIG. 7).
In the light shielding position 302, the light shielding plates 31a to 31c are arranged so that the rear end portion of the front light shielding plate and the front end portion of the rear light shielding plate overlap each other. Thereby, it can prevent that the light leaks from the joint part of light shielding plates (subplate members), and is irradiated to the workpiece | work W, and can form a light shielding area appropriately. Further, the overlap amount can be freely adjusted, and as shown in FIG. 9, the position and size of the light shielding region in the moving direction of the light shielding plates 31a to 31c are set according to the arrangement positions of the light shielding plates 31a to 31c. Can be adjusted in stages.
As described above, the light shielding plates 31 a to 31 c can form a desired light shielding region on the stage 21 by covering the necessary region on the stage 21. Such multi-stage light shielding by the plurality of light shielding plates 31 a to 31 c can be realized by the light shielding mask driving unit 34.

  As shown in FIG. 8, the light shielding mask drive unit 34 is connected to the linear rails 34a extending in the X direction and the respective leg portions 33, and slides along the linear rails 34a so that the light shielding plates 31a to 31c are moved. A movable portion 34b to be slid and a cable 34c are provided. The light shielding mask drive unit 34 is disposed below the work placement surface of the stage 21. As described above, since the light shielding mask drive unit 34 is driven below the stage surface, it is possible to prevent the dust generated by the movement of the light shielding plates 31a to 31c from dropping on the stage 21. In addition, an air flow mechanism (not shown) causes an air flow from the top to the bottom in the apparatus, so that dust and the like are less likely to fly.

  In addition, although this embodiment demonstrates the case where the light-shielding plates 31a-31c have the same shape, the shape of the light-shielding plates 31a-31c can be set suitably. Further, the number of light shielding plates (sub-plate members) is not limited to three. However, since the height is shifted, the number of sub-plate members is limited to a certain number in order to realize space saving in the height direction (Z direction). Furthermore, each light-shielding plate 31a-31c can also be set as the structure which connected further several subplate members with the flame | frame etc., respectively. In this case, a light-shielding plate with less bending can be configured.

In the present embodiment, the retracted position 301 of the light shielding plates 31a to 31c is the end of the stage 21 opposite to the irradiation region in the X direction when the stage 21 is not rotating as shown in FIG. Although set in the vicinity, the position of the retreat position 301 is not limited to this. For example, the retreat position 301 may be set near the end of the stage 21 on the irradiation region side in the X direction in a state where the stage 21 is not rotating, or set near the end of the stage 21 in the Y direction. May be.
In the present embodiment, the light shielding plates 31 a to 31 c are arranged in the forward light shielding position 302 which is the first use position (light shielding position) shown in FIG. 31a to 31c are arranged at the return light shielding position 303 which is the second use position (light shielding position) shown in FIG.

  Here, the light shielding plates 31a to 31c are drawn out from the retreat position 301 so as to be connected in a line in the forward direction in order from the light shielding plate 31a located at the top in the forward light shielding position 302 and the backward light shielding position 303. It is arranged with. However, in the forward light shielding position 302 shown in FIG. 7, the light shielding plates 31a to 31c are arranged in such a manner that they are sequentially drawn from the retreat position 301 in a line in the forward direction from the light shielding plate 31c located at the bottom. May be. That is, in both the transport forward path and the transport return path, the switching position between the light shielding area and the irradiation allowable area on the stage 21 may be defined by the tip position of the light shielding plate 31c disposed at the bottom. This is because as the gap between the upper surface of the workpiece W and the lower surface of the light shielding plate 31 is narrower, the amount of light sneaking into the light shielding region can be reduced.

  In the present embodiment, the region switching position (forward position in the forward direction of the light shielding plate 31a) in the transport forward path and the region switching position (forward position rear end position in the forward direction of the light shielding plate 31c) in the transport backward path are the light shielding plate 31a. It shall be made to correspond in the moving direction of -31c. Specifically, the region switching position on the transport forward path and the region switching position on the transport return path are the regions on the workpiece W (first first) to be irradiated with only the first polarized light emitted from the light irradiation unit 10A. Area) and the center position in the moving direction of the gap between the area (second area) on the workpiece W to be irradiated with only the second polarized light emitted from the light irradiation unit 10C.

  It should be noted that the area switching position in the transport forward path and the area switching position in the transport backward path are not necessarily matched in the moving direction. Each switching position can be set as appropriate as long as it is between the first area and the second area. However, in consideration of light sneaking into the light shielding area formed immediately below the light shielding plates 31a to 31c, the area switching position in the transport forward path is preferably closer to the rear end position in the forward direction of the first area. The same applies to the area switching position in the transport return path.

  In the traveling path of the stage 21, the polarized light irradiation device 100 sets the shutter unit 16 of the light irradiation unit 10A to the non-operating state and sets the shutter unit 16 of the light irradiation unit 10C to the operating state. Accordingly, when the stage 21 moves forward and passes through the light irradiation units 10A and 10C, the irradiation allowable region formed by the light shielding plates 31a to 31c arranged at the forward light shielding position 302 shown in FIG. Only the first polarized light from the part 10A is irradiated. In this way, the first alignment region is formed on the workpiece W in the transport path of the stage 21.

On the other hand, in the return path of the stage 21, the polarized light irradiation device 100 puts the shutter unit 16 of the light irradiation unit 10 </ b> A into an operating state and puts the shutter unit 16 of the light irradiation unit 10 </ b> C into a non-operational state. Thereby, when the stage 21 moves forward and passes through the light irradiation units 10A and 10C, the irradiation allowable region formed by the light shielding plates 31a to 31c arranged at the return light shielding position 303 shown in FIG. Only the second polarized light from the part 10C is irradiated. In this way, the second alignment region is formed on the workpiece W in the transport return path of the stage 21.
That is, when performing the second photo-alignment process, first, the polarized light irradiation device 100 sets the shutter unit 16 of the light irradiation unit 10A to the non-operating state, and sets the shutter unit 16 of the light irradiation unit 10C to the operating state. The light shielding plates 31a to 31c are arranged at the forward light shielding position 302 shown in FIG. In this state, the stage 21 moves forward and passes under the light irradiators 10 </ b> A and 10 </ b> C, so that the first polarized light is irradiated onto the first alignment region of the workpiece W.

  When the stage 21 reaches the turn-back position and the irradiation of the polarized light in the forward path is finished, the polarized light irradiation apparatus 100 stops the stage 21 at the turn-back position, puts the shutter unit 16 of the light irradiation unit 10A into the operating state, and the light irradiation unit. The shutter portion 16 of 10C is deactivated, and the light shielding plates 31a to 31c are arranged at the return light shielding position 302 shown in FIG. Note that the switching of the shutter unit 16 and the movement of the light shielding plates 31a to 31c are possible in several seconds to several tens of seconds. In this state, the return movement of the stage 21 is started, and the second polarized light is irradiated to the second alignment region of the workpiece W by passing under the light irradiation units 10C and 10A.

  In the present embodiment, as described above, the stage 21 is rotated in the X direction while being rotated by the θ moving mechanism 24 so that the direction of the workpiece W is a predetermined direction with respect to the polarization axis of the polarized light. Move back and forth. FIG. 10 is a diagram illustrating a state when the stage 21 is rotated. Thus, the light shielding mask portion 30 rotates θ together with the stage 21 by the rotation of the rotation support member 24 a of the θ moving mechanism 24. Therefore, the direction of dividing the alignment region by the light-shielding mask portion 30 (the arrangement direction of the first alignment region and the second alignment region) can be freely changed with respect to the transport direction (X direction) of the stage 21. That is, in the present embodiment, when θ = 0 °, the alignment region is divided in the X direction, and the first alignment region and the second alignment region are formed on the work W by dividing in the X direction. Can do. For example, if θ = 90 °, the direction of division of the alignment region can be set as the Y direction, and the first alignment region and the second alignment region can be divided and formed in the Y direction on the work W.

  In addition, as shown in FIG. 11, you may provide the front-end | tip member 31d in the front-end | tip part in the advancing direction of the light-shielding plate 31a, and the rear-end part in the advancing direction of the light-shielding plate 31c, respectively. The tip member 31d is a member for reducing the wraparound of the light emitted from the light exit of the light irradiator 10A or 10C to the light shielding region on the workpiece W. As shown in FIG. It has a lower end surface located below the end of 31c. The tip member 31d is made of the same material as the light shielding plates 31a to 31c, for example. The tip member 31d is attached to the light shielding plates 31a and 31c, for example, by screws 31e so that the height direction (Z direction) position can be adjusted. The tip member 31d is installed at a position that is closer to the workpiece W than the light shielding plates 31a and 31c and is separated from the workpiece W by a predetermined distance in the height direction.

As shown by a two-dot chain line in FIG. 11, when the above-described light wraparound occurs, the boundary position between the irradiation allowable region and the light shielding region on the workpiece W is on the backward direction side with respect to the tip position of the tip member 31d. Set to The amount of light sneaking to the light shielding area is determined according to the gap G between the upper surface of the workpiece W and the lower surface of the tip member 31d. Therefore, the gap G is set in consideration of the allowable value of the amount of light sneaking into the light shielding region, the possibility of contact between the tip member 31d and the workpiece W, and the like.
The shape of the tip member 31d is not limited to the shape shown in FIG. The shape of the tip member 31d viewed from the Y direction may be, for example, an L shape or an I shape. Further, the tip member 31d may be a flat plate member having one end portion that is equal to the forward end portion of the light shielding plates 31a and 31c, or that protrudes horizontally from the forward end portion. In this case, a flat plate member may be attached to the lower surfaces of the light shielding plates 31a and 31c via a height adjusting spacer.

The above processing is performed by a control unit included in the polarized light irradiation apparatus 100. The said control part is PLC (programmable logic controller), for example, and controls each part of the polarized light irradiation apparatus 100. FIG. Specifically, the control unit controls lighting of the light irradiation units 10A to 10C, control of the shutter unit 16 of the light irradiation units 10A and 10C, control of the light shielding mask unit 30 as a stage side mask mechanism, and transport control of the stage 21. In addition, rotation control of the stage 21 is performed.
FIG. 12 is a block diagram illustrating a configuration of the control unit 50.
As shown in FIG. 12, the control unit 50 includes an irradiation control unit 51, a light shielding mask control unit 52, and a stage control unit 53.
The irradiation control unit 51 performs lighting control of the light irradiation units 10A to 10C and opening / closing control of the shutter unit 16 of the light irradiation units 10A and 10C. The light shielding mask control unit 52 controls the light shielding mask unit 30 provided on the stage 21 side. The stage control unit 53 drives and controls the X-direction drive mechanism 22 and the θ moving mechanism 24 that are stage controllers, and controls the stage 21 to be conveyed. In addition, the stage control unit 53 acquires position information (X direction position and θ rotation angle) of the stage 21 from the stage controller.

Hereinafter, the operation of the polarized light irradiation apparatus 100 will be described in detail with reference to FIG. Here, the operation when the second photo-alignment process is performed will be described.
First, the irradiation control unit 51 supplies power to the light irradiation units 10A and 10C, and turns on the light irradiation units 10A and 10C. Further, the irradiation control unit 51 stops the power supply to the light irradiation unit 10B and turns off the light irradiation unit 10C. And the irradiation control part 51 operates the shutter part 16 of 10 C of light irradiation parts, and makes the shutter board 17 of 10 C of light irradiation parts closed as shown to Fig.13 (a).

  After the workpiece W is mounted on the stage 21 and alignment processing is performed at the workpiece mounting position, the light shielding mask control unit 52 controls the light shielding mask unit 30 to shield the light shielding plates 31 (31a to 31c) from the retracted position in the outward direction. Move to position. Accordingly, as shown in FIG. 13A, the first alignment region including the first region A1 on which only the first polarized light emitted from the light irradiation unit 10A should be irradiated on the workpiece W. A2 is formed. In FIG. 13, for the sake of simplicity, it is assumed that the θ rotation movement of the stage 21 by the θ movement mechanism 24 is not performed. When the rotational movement of the stage 21 is performed by the θ moving mechanism 24, the light shielding mask controller 52 retracts the light shielding plate 31 after the rotational movement of the stage 21 by the θ moving mechanism 24 is completed or during the rotational movement. It is assumed to move from the position to the forward light shielding position.

  When the light shielding plate 31 is moved to the forward light shielding position at the workpiece mounting position, the stage control unit 53 controls the X-direction drive mechanism 22 and starts the forward movement of the stage 21. Note that the timing of starting the forward movement is not limited to the above, and may be after the alignment process is completed at the workpiece mounting position. For example, the forward movement may be started before the rotational movement of the stage 21 is completed or before the arrangement of the light shielding plate 31 at the forward light shielding position is completed. That is, when the stage 21 starts to move forward, the stage 21 that has moved forward travels after the shutter plate 17 of the light irradiation unit 10C is closed and the light shielding plate 31 is placed at the forward light shielding position. Any timing that reaches the area may be used.

When the stage 21 starts moving forward, the stage control unit 53 monitors the position of the stage 21 in the X direction. When the stage 21 passes under the light irradiation units 10A and 10C and reaches the folding position as shown in FIG. 13B, the stage control unit 53 controls the X-direction drive mechanism to move the stage 21. Stop. In this way, the outward movement of the stage 21 is completed. In this outward path, the first alignment region A2 formed on the workpiece W is irradiated with only the first polarized light emitted from the light irradiation unit 10A, and the first region A1 is irradiated with the first polarized light. Photo-aligned.
The stage 21 may move at different speeds while moving within the irradiation area (while irradiating polarized light) and while moving outside the irradiation area. Specifically, the stage 21 moves at a low first moving speed in order to obtain a predetermined exposure amount within the irradiation area, and when the workpiece 21 is only transporting the workpiece W outside the irradiation area, You may move by the 2nd moving speed faster than the 1 moving speed. Thereby, the tact time can be shortened.

Further, as shown in FIG. 13, when the dividing direction of the alignment region is the conveyance direction (X direction) of the stage 21, the following speed control may be performed in order to further reduce the tact time. Good.
For example, in the forward movement, the stage control unit 53 moves the stage 21 at the second movement speed until the tip position of the first alignment area A2 in the forward movement direction enters the irradiation area of the light irradiation unit 10A. The stage 21 may be moved at the first moving speed when the tip position of the first alignment region A2 in the forward movement direction enters the irradiation region of the light irradiation unit 10A. That is, even if the workpiece W is in the irradiation area, the stage 21 may be moved at a high-speed second moving speed while the area shielded by the light shielding plate 31 is in the irradiation area.

Similarly, in the backward movement, the stage control unit 53 moves the stage 21 at the second movement speed until the tip position of the second alignment region B2 in the backward movement direction enters the irradiation region of the light irradiation unit 10C. The stage 21 may be moved at the first moving speed when the tip position of the second alignment region B2 in the backward movement direction enters the irradiation region of the light irradiation unit 10C.
When the dividing direction of the alignment region is a direction (Y direction) orthogonal to the conveying direction of the stage 21, the first alignment region A2 and the second alignment region B2 are formed on the workpiece W over the entire length in the X direction. . Therefore, in the forward movement and the backward movement, the stage 21 must be moved at a low first movement speed while at least a part of the workpiece W is in the irradiation area. Therefore, as described above, the stage 21 cannot be moved at the high-speed second moving speed while the workpiece W is in the irradiation region.
As described above, when the dividing direction of the alignment region is the conveyance direction (X direction) of the stage 21, the tact time can be further shortened by the speed control of the stage 21 as described above.
When the stage 21 stops at the turn-back position, the irradiation control unit 51 operates the shutter unit 16 of the light irradiation unit 10A to close the shutter plate 17 of the light irradiation unit 10A as shown in FIG. In addition, the irradiation control unit 51 deactivates the shutter unit 16 of the light irradiation unit 10C and opens the shutter plate 17 of the light irradiation unit 10C.

The light shielding mask control unit 52 controls the light shielding mask unit 30 to move the light shielding plate 31 from the forward light shielding position to the backward light shielding position. Thereby, as shown in FIG.13 (c), on the workpiece | work W, the 2nd orientation area | region containing 2nd area | region B1 which should be irradiated only with the 2nd polarized light radiate | emitted from 10 C of light irradiation parts. B2 is formed.
When the light shielding plate 31 is moved to the return light shielding position at the return position, the stage control unit 53 controls the X-direction drive mechanism 22 to start the return movement of the stage 21. It should be noted that the timing of starting the backward movement is such that after the shutter plate 17 of the light irradiation unit 10A is closed and the light shielding plate 31 is disposed at the backward light shielding position, the stage 21 moved in the backward direction reaches the irradiation area. The timing may be any time.

  When the stage 21 starts moving backward, the stage control unit 53 monitors the position of the stage 21 in the X direction. When the stage 21 passes under the light irradiation units 10A and 10C and reaches the workpiece mounting position as shown in FIG. 13D, the stage control unit 53 controls the X-direction drive mechanism to control the stage 21. To stop. In this way, the backward movement of the stage 21 is completed. In this return path, the second alignment region B2 formed on the workpiece W is irradiated with only the second polarized light emitted from the light irradiation unit 10C, and the second region B1 is irradiated with the second polarized light. Photo-aligned.

At the work mounting position, the light shielding mask control unit 52 controls the light shielding mask unit 30 to move the light shielding plate 31 from the return path light shielding position to the retracted position. As a result, the second optical alignment process for the workpiece W is completed, and the processed workpiece W can be unloaded. The timing of the movement of the light shielding plate 31 to the retracted position is not limited to the above, and may be any time after the stage 21 has moved backward and the work W has passed through the irradiation area. That is, the light shielding mask control unit 52 may start the movement of the light shielding plate 31 to the retracted position while the stage 21 moves in the backward direction.
Thus, two different alignment regions can be appropriately formed on the workpiece W by a single (reciprocating) light irradiation process.

By the way, in recent years, photo-alignment processing has been developed not only for large-sized liquid crystal displays for TV screens but also for small and medium-sized liquid crystal displays for smartphones, and production of liquid crystal displays of various types and dimensions is expected. Yes. In order to efficiently process such various types of substrates, it is necessary to cut out a plurality of different types of cell substrates from one multi-sided mother substrate.
With the configuration described above, the polarized light irradiation apparatus 100 according to the present embodiment can form a plurality of alignment regions having different alignment directions on a single workpiece W by a single light irradiation process. Therefore, it is possible to efficiently produce a plurality of types of substrates and to obtain cost merit. In addition, it is possible to respond flexibly to individual orders.
Specifically, the polarized light irradiation apparatus 100 of the present embodiment includes three light irradiation units 10A to 10C, and the light emission side of the light emission port of the light irradiation unit 10A and the light emission port of the light irradiation unit 10C. A shutter portion 16 is provided on each of the emission sides. The polarized light irradiation device 100 switches between irradiation of the first polarized light from the light irradiation unit 10A and irradiation of the second polarized light from the light irradiation unit 10C by the shutter unit 16.

  Furthermore, the polarized light irradiation apparatus 100 of this embodiment includes a light shielding mask unit 30 on the stage 21 side, and irradiation that allows irradiation of polarized light onto the workpiece W placed on the stage 21 by the light shielding mask unit 30. An allowable region and a light shielding region that blocks irradiation of polarized light are formed. Here, the light shielding mask unit 30 is movable between the first use position (outward light shielding position 302) and the second use position (return light shielding position 303) in the irradiation region of the polarized light on the workpiece W. And Therefore, the light-shielding mask unit 30 defines a first region A1 that is to be photo-oriented by the first polarized light on the workpiece W and a second region B1 that is to be photo-oriented by the second polarized light. be able to. Thus, the polarized light irradiation apparatus 100 can appropriately form a plurality of different alignment regions on the workpiece W.

  Furthermore, the polarized light irradiation device 100 is configured to rotate the light shielding mask portion 30 disposed on the stage 21 side together with the stage 21 in the θ direction. Therefore, the polarized light irradiation apparatus 100 divides the workpiece W into a plurality of regions not only in the X direction and the Y direction but also in any direction that does not coincide with the X direction and the Y direction, and the orientation direction of each of these divided regions is Different orientation regions can be set. When an alignment region having different alignment directions is set in a predetermined direction that does not coincide with the X direction and the Y direction only by the functions provided on the light irradiation units 10A and 10C, the region is clearly considered in consideration of the deviation of θ rotation. Can not be separated. The reason is that the light irradiators 10A and 10C are fixed with the longitudinal direction of the lamp 11 aligned with the Y direction, and if the light irradiators 10A and 10C are rotated by θ, there is a high risk of shifting the polarization axis. It can be mentioned.

Further, the light irradiators 10A and 10B used when performing the first photo-alignment process are arranged on the side close to the workpiece mounting position in the X direction. The shorter the distance from the work mounting position to the irradiation region where the photo-alignment process is performed, the shorter the tact time, so the light irradiation units 10A and 10B used in the first photo-alignment process with high frequency of implementation are mounted on the work. Productivity can be improved by arrange | positioning at the side close | similar to a position. In the above embodiment, the case where the frequency of the first photo-alignment process is higher than the frequency of the second photo-alignment process has been described. However, the frequency of the second photo-alignment process is the first. In the case where the frequency of performing the photo-alignment process is higher, the light irradiation units 10A and 10C may be arranged on the side closer to the work mounting position.
When the first photo-alignment process is not performed, or the first photo-alignment process is performed using only one light irradiation unit 10A according to conditions such as the amount of irradiation light and the photo-alignment process time required for the photo-alignment process. If possible, the light irradiation unit 10B that does not include the shutter unit 16 may not be installed.

Further, the light shielding mask unit 30 on the stage 21 side includes a light shielding plate 31 that is a plate member and a light shielding mask driving unit 34 that slides the light shielding plate 31 in the horizontal direction. Thereby, space saving in the height direction (Z direction) of the light shielding mask part 30 can be achieved. Therefore, even when the distance from the light exits of the light irradiators 10A and 10C to the workpiece W is very close, the light shielding plate 31 can be disposed at an appropriate position on the light exit side of the light exit.
Further, the light shielding plate 31 is configured to be movable between a use position on the stage 21 (an outward light shielding position 302 and a backward light shielding position 303) and a retreat position 301 retracted from the stage 21. In this case, in a state where the light shielding plate 31 is disposed at the retracted position 301, no light shielding region is formed on the stage 21. Therefore, the stage 21 provided with the light shielding mask part 30 can be used in combination for both the first photo-alignment process and the second photo-alignment process.

Furthermore, since the light shielding plate 31 is configured by an optical filter, deformation and deterioration of the lamp 11 due to heat and ultraviolet rays can be suppressed as compared to the case where the light shielding plate 31 is configured by a metal plate or resin. If the light-shielding plate 31 is a metal plate, the light-shielding plate 31 is deformed by the heat of the lamp 11, which may cause a problem that it cannot be slid and contacts the workpiece W. On the other hand, in this embodiment, since the light-shielding plate 31 is comprised with an optical filter, generation | occurrence | production of the said malfunction can be suppressed. The light shielding plate 31 is not limited to an optical filter, and can be appropriately applied as long as it is a material that can withstand heat and ultraviolet rays and can appropriately form a light shielding region.
The light shielding plate 31 includes a plurality of (three in the above embodiment) light shielding plates 31a to 31c, and the light shielding plates 31a to 31c are overlapped in the Z direction at the retracted position 301. Deploy. Therefore, the space of the retreat position 301 can be reduced, and downsizing of the apparatus can be realized.

Further, at the use positions such as the forward light shielding position 302 and the backward light shielding position 303, the rear end portions of the front light shielding plates and the front end portions of the rear light shielding plates are overlapped so that the light shielding plates 31a to 31c are arranged in a line. Arrange. Therefore, it is possible to prevent the polarized light from leaking from the gap between the light shielding plates and irradiating the light shielding region, and to appropriately form the light shielding region on the workpiece W. Moreover, the size of the light shielding region can be easily adjusted by adjusting the overlap amount of the light shielding plates.
Thus, since the freedom degree of the arrangement position of light-shielding plates 31a-31c can be improved, the orientation area | region formed on the workpiece | work W can be set comparatively freely, and liquid crystal orientation area | region of various sizes can be set. Can respond. In the embodiment described above, for example, as illustrated in FIGS. 7 and 9, the case where one side in a predetermined direction on the workpiece W is a light shielding region has been described. However, the region corresponding to the central region on the workpiece W is a light shielding region. It can also be.

Furthermore, since the tip members 31d are provided at both ends in the forward direction of the light shielding plate 31, it is possible to suppress the wraparound of the polarized light to the light shielding region. Furthermore, since the tip member 31d is configured to be capable of adjusting the height direction position of the lower end surface thereof, the amount of light wraparound can be adjusted, and a light shielding region can be formed appropriately.
Further, the light shielding plate 31 is formed in a bridge shape that includes a support portion 32 that extends over the stage 21 and is wider in the moving direction of the light shielding plate 31 than the stage 21, and leg portions 33 that respectively support both ends of the support portion 32. It is fixed on the support member. Thereby, the bending of the light shielding plate 31 whose length in the direction orthogonal to the moving direction of the light shielding plate 31 is long can be prevented, and the contact between the light shielding plate 31 and the workpiece W can be prevented. Further, the distance between the upper surface of the workpiece W and the lower surface of the light shielding plate 31 can be kept constant in the direction orthogonal to the moving direction of the light shielding plate 31, and the amount of light sneaking into the light shielding region can be appropriately controlled. it can.

Further, since the light shielding mask drive unit 34 constituting the light shielding mask unit 30 is disposed below the work W placement surface of the stage 21, the driving body can be driven below the stage surface. Further, it is possible to prevent dust generated by the movement of the light shielding plates 31a to 31c from dropping on the stage 21. Further, even in the configuration in which a linear motor is mounted near both ends of the stage 21 and the light shielding plate 31 is moved, the thickness of the entire light shielding mask portion 30 in the height direction (Z direction) can be reduced as much as possible. Space can be achieved.
The shutter plates 17 of the light irradiation units 10A and 10C have a size (shape) that can cover the entire area of the effective light emission length of each light irradiation unit, and in the width direction (X direction) of each light irradiation unit. The slide can be moved. Therefore, space saving in the height direction (Z direction) of the shutter unit 16 can be achieved. Further, the moving distance between the retracted position 161 and the light shielding position 162 of the shutter plate 17 can be shortened, and the opening / closing time of the shutter plate 17 can be shortened.

  In the above-described embodiment, the case where the shutter plate 17 is retracted in the X direction has been described. However, the shutter plate 17 may be retracted in the Y direction. Further, like the light shielding plate 31, the shutter plate 17 may be constituted by a set of a plurality of sub-plate members. By configuring the shutter plate 17 by a set of a plurality of sub-plate members, the space at the retracted position 161 of the shutter plate 17 can be reduced, and the footprint of the apparatus can be reduced accordingly. However, in this case, when the opening / closing control of the shutter plate 17 is performed, the position control of each sub-plate member is necessary, so that the control becomes complicated compared to the case where the shutter plate 17 is constituted by one plate member. .

(Modification)
In the above embodiment, the case where the light shielding plate 31 is configured to be slidable in the horizontal direction has been described. However, the light shielding plate 31 may be configured to be detachably screwed to the stage 21. In this case, if the light shielding plate 31 having a size corresponding to the size of the light shielding area is attached to the stage 21, the size of the alignment area formed on the workpiece W can be freely set. That is, the light shielding plate 31 may be moved manually.
Furthermore, in the above-described embodiment, the case where two alignment regions are formed on the workpiece W has been described, but three or more alignment regions can also be formed.

  Moreover, in the said embodiment, although the case where one stage 21 applied the present invention to the single stage type polarized light irradiation apparatus 100 which reciprocates directly under a lamp (light irradiation part 10A-10C) was demonstrated, polarized light The configuration of the irradiation apparatus 100 is not limited to the configuration shown in FIG. For example, the present invention can also be applied to a so-called twin stage type polarized light irradiation apparatus 100 in which two stages reciprocate under a lamp. Further, the present invention can also be applied to an apparatus in which a plurality of workpieces W are placed on one stage and a light alignment process is performed by irradiating polarized light having a different polarization axis for each workpiece W.

Furthermore, in the said embodiment, although the workpiece loading position set to one side of the irradiation area | region in a X direction demonstrated the case where carrying in of the unprocessed workpiece | work W and unloading of the processed workpiece | work W were performed, The present invention can also be applied to an apparatus that loads a workpiece W from one side of an irradiation region in the X direction and unloads the workpiece W from the other side.
In that case, in the X direction, a standby space for the stage 21 may be provided between the first light irradiation unit that irradiates the first polarized light and the second light irradiation unit that irradiates the second polarized light. . And after irradiating 1st polarized light to the 1st orientation area and performing 1st photo-alignment processing, the stage 21 was stopped in the standby space and the light-shielding plate 31 of the light-shielding mask part 30 was moved. Thereafter, the stage 21 may be advanced again, and the second optical alignment process may be performed by irradiating the second polarized light to the second alignment region. That is, in the above embodiment, the case where the first optical alignment process is performed in the outward path of the stage 21 and the second optical alignment process is performed in the backward path of the stage 21 has been described. An alignment process and a second photo-alignment process may be performed.

  Moreover, in the said embodiment, although the case where this invention was applied to a polarized light irradiation apparatus was demonstrated, it is not limited to this. For example, the present invention can also be applied to a light irradiation apparatus such as a DI (direct image) exposure apparatus or an ultraviolet irradiation apparatus that performs thermosetting treatment from ultraviolet rays. In the case of these light irradiation apparatuses, it is possible to divide the work into a plurality of regions and perform different light irradiation processes for each of the divided regions.

  DESCRIPTION OF SYMBOLS 10A-10C ... Light irradiation part, 11 ... Lamp, 12 ... Mirror, 13 ... Polarizer unit, 14 ... Lamp house, 16 ... Shutter part, 17 ... Shutter plate, 18 ... Shutter plate drive part, 20 ... Conveyance part, 21 ... stage, 22 ... X-direction drive mechanism, 22A ... guide, 22B ... magnet plate, 22C ... coil module, 24 ... theta moving mechanism, 30 ... light shielding mask part, 31 (31a-31c) ... light shielding plate, 31d ... tip member , 31e ... screw, 32 ... support part, 33 ... leg part, 34 ... light shielding mask drive part, 100 ... polarized light irradiation device, 301 ... retracted position, 302 ... forward light shielding position, 303 ... return light shielding position

Claims (14)

A light irradiation device that performs light alignment by irradiating polarized light onto a work on which a photo-alignment film is formed,
A stage for conveying the workpiece along a predetermined conveyance path;
A first light irradiating unit that is installed on the conveyance path of the workpiece, polarizes light from the light source by the first polarizer, and irradiates the first polarized light from the light exit port;
The light from the light source is arranged in parallel with the first light irradiation unit on the transport path, and is polarized by a second polarizer having a transmission axis in a direction different from that of the first polarizer. A second light irradiation unit for irradiating two polarized lights;
A first position on the workpiece to be photo-aligned by the first polarized light at a first use position in a region where the polarized light of the workpiece on the stage can be irradiated . The first polarized light is defined by allowing irradiation of the first polarized light, and the second polarized light is used at a second use position different from the first use position in the irradiable area. A plate member defining the second region by allowing irradiation of the second polarized light to the second region on the workpiece to be photo-aligned by:
A drive unit for moving the plate member between the first use position and the second use position;
A rotation control unit that controls the rotation of the stage about an axis orthogonal to the mounting surface of the workpiece, and sets the posture of the stage to a posture at the time of light irradiation ,
The said plate member rotates with the said stage by the said rotation control part, The light irradiation apparatus characterized by the above-mentioned . The plate member is
The light irradiation apparatus according to claim 1, wherein the light irradiation apparatus includes an optical filter that blocks polarized light having a wavelength that contributes to the photo-alignment of the photo-alignment film. The plate member is
The light irradiation apparatus according to claim 1, wherein the light irradiation apparatus is movable between the first use position and the second use position and a retreat position retracted from the irradiation possible region.   The light irradiation apparatus according to claim 1, wherein the plate member is slidable in a horizontal direction. The plate member is composed of a plurality of sub-plate members,
The plurality of sub-plate members are arranged so as to be connected in a row with overlapping end portions of the sub-plate members at the first use position and the second use position. The light irradiation apparatus according to any one of claims 1 to 4. The plate member is
6. The apparatus according to claim 1, wherein the stage is disposed on the stage, and is fixed on a support member that crosses over the stage and is closer to the light exit port than a surface on which the workpiece is placed. The light irradiation apparatus of any one of these.   The light irradiation apparatus according to claim 6, wherein the driving unit is disposed below a mounting surface of the workpiece of the stage.   The first area is set on one side in the direction along the conveyance path on the workpiece, and the second area is set on the other side in the direction along the conveyance path on the workpiece. The light irradiation device according to claim 1, wherein the light irradiation device is a light irradiation device.   The position of the one end of the plate member at the first use position and the position of the other end of the plate member at the second use position are respectively the first region and the second The light irradiation device according to claim 8, wherein the light irradiation device is set between the first region and the second region.   The light irradiation apparatus according to claim 1, further comprising a tip member provided at an end portion of the plate member and having a lower end surface positioned below the end portion.   The light irradiation apparatus according to claim 10, wherein the tip member is capable of adjusting a height direction position of the lower end surface. The stage is configured to be capable of reciprocating the irradiation areas of the first light irradiation unit and the second light irradiation unit on the transport path,
The drive unit is in the forward path and the backward path of the stage, the position of said plate member, one of claims 1 1 1, characterized in that for switching between the second use position and said first position of use The light irradiation apparatus of Claim 1. The wavelength that contributes to the photo-alignment of the photo-alignment film emitted from the light exit port by arranging the first light emitter and the second light emitter on the light exit side of the light exit port, respectively. light irradiation apparatus according to any one of claims 1 1 2, characterized in that it comprises a light blocking portion capable shielding polarized light in. A light irradiation method for performing photo-alignment by irradiating polarized light to a work on which a photo-alignment film is formed,
A light source that a plate member is disposed at a first use position in a region where the polarized light of the workpiece placed on the stage can be irradiated, and is irradiated by a first light irradiation unit installed on a conveyance path of the workpiece. By allowing the first polarized light to irradiate the first region on the workpiece to be photo-oriented by the first polarized light polarized by the first polarizer. Defining a region ;
Controlling the rotation of the stage about an axis orthogonal to the workpiece mounting surface, rotating the plate member together with the stage, and setting the posture of the stage to a posture during light irradiation;
Transporting the work along the transport path by the stage, and irradiating the first polarized light on the first region on the work;
The plate member is moved from the first use position to a second use position different from the first use position in the irradiable region, and is arranged in parallel with the first light irradiation unit on the transport path. The second light irradiating unit irradiates the light from the light source with the second polarized light polarized by the second polarizer having a transmission axis in a direction different from that of the first polarizer. Defining the second region by allowing the second region on the workpiece to be irradiated with the second polarized light ;
Transporting the work along the transport path by the stage, and irradiating the second polarized light on the second region on the work.

Images