TWI625853B - 圖樣化縫片框架組件 - Google Patents

圖樣化縫片框架組件 Download PDF

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Publication number
TWI625853B
TWI625853B TW102112677A TW102112677A TWI625853B TW I625853 B TWI625853 B TW I625853B TW 102112677 A TW102112677 A TW 102112677A TW 102112677 A TW102112677 A TW 102112677A TW I625853 B TWI625853 B TW I625853B
Authority
TW
Taiwan
Prior art keywords
patterned
applying unit
patterned slit
tension applying
slit
Prior art date
Application number
TW102112677A
Other languages
English (en)
Chinese (zh)
Other versions
TW201419514A (zh
Inventor
韓政洹
Original Assignee
三星顯示器有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三星顯示器有限公司 filed Critical 三星顯示器有限公司
Publication of TW201419514A publication Critical patent/TW201419514A/zh
Application granted granted Critical
Publication of TWI625853B publication Critical patent/TWI625853B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW102112677A 2012-11-14 2013-04-10 圖樣化縫片框架組件 TWI625853B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020120129102A KR101980232B1 (ko) 2012-11-14 2012-11-14 패터닝 슬릿 시트 프레임 어셈블리
??10-2012-0129102 2012-11-14

Publications (2)

Publication Number Publication Date
TW201419514A TW201419514A (zh) 2014-05-16
TWI625853B true TWI625853B (zh) 2018-06-01

Family

ID=50680432

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102112677A TWI625853B (zh) 2012-11-14 2013-04-10 圖樣化縫片框架組件

Country Status (5)

Country Link
US (1) US9163306B2 (enExample)
JP (1) JP6527304B2 (enExample)
KR (1) KR101980232B1 (enExample)
CN (1) CN103805959B (enExample)
TW (1) TWI625853B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102079170B1 (ko) * 2013-04-09 2020-02-20 삼성디스플레이 주식회사 증착 장치 및 그에 적용되는 마스크 조립체
JP2015069806A (ja) * 2013-09-27 2015-04-13 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置の製造方法
CN104561892B (zh) * 2014-12-04 2016-11-23 深圳市华星光电技术有限公司 Oled材料真空热蒸镀用掩膜板
KR102868862B1 (ko) * 2020-12-10 2025-10-13 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 증착 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1437926A1 (en) * 2001-08-24 2004-07-14 Dai Nippon Printing Co., Ltd. Multi-face forming mask device for vacuum deposition
US20110185561A1 (en) * 2008-04-18 2011-08-04 Applied Materials Inc. Mask support, mask assembly, and assembly comprising a mask support and a mask

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JPS5441157Y2 (enExample) * 1975-07-30 1979-12-03
US4721488A (en) * 1986-02-21 1988-01-26 Zenith Electronics Corporation Apparatus for tensing a shadow mask foil
FR2610139B1 (fr) * 1987-01-27 1996-07-12 Videocolor Procede de montage d'un masque d'ombre dans un tube cathodique trichrome et tube cathodique comportant un masque d'ombre monte selon ce procede
KR100322065B1 (ko) * 1999-01-22 2002-02-04 김순택 평면형 음극선관의 마스크 프레임 조립체
KR20010046478A (ko) * 1999-11-12 2001-06-15 구자홍 수직형 대면적 노광장치
KR100490534B1 (ko) 2001-12-05 2005-05-17 삼성에스디아이 주식회사 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체
KR100813832B1 (ko) 2002-05-31 2008-03-17 삼성에스디아이 주식회사 증착용 마스크 프레임 조립체와 이의 제조방법
JP4440563B2 (ja) 2002-06-03 2010-03-24 三星モバイルディスプレイ株式會社 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
JP4072422B2 (ja) * 2002-11-22 2008-04-09 三星エスディアイ株式会社 蒸着用マスク構造体とその製造方法、及びこれを用いた有機ｅｌ素子の製造方法
JP4173722B2 (ja) 2002-11-29 2008-10-29 三星エスディアイ株式会社 蒸着マスク、これを利用した有機ｅｌ素子の製造方法及び有機ｅｌ素子
US20040163592A1 (en) * 2003-02-20 2004-08-26 Tohoku Poineer Corporation Mask for vacuum deposition and organic EL display panel manufactured by using the same
KR100659057B1 (ko) 2004-07-15 2006-12-21 삼성에스디아이 주식회사 박막 증착용 마스크 프레임 조립체 및 유기 전계 발광표시장치
KR100615536B1 (ko) 2004-11-19 2006-08-25 알투스주식회사 열 인가 스트레칭 마스크 제조 방법 및 장치
JP5151004B2 (ja) * 2004-12-09 2013-02-27 大日本印刷株式会社 メタルマスクユニット及びその製造方法
KR101081180B1 (ko) 2005-12-13 2011-11-07 사천홍시현시기건유한공사 새도우 마스크 및 그 제작 장치
KR20070063307A (ko) * 2005-12-14 2007-06-19 주성엔지니어링(주) 마스크 어셈블리
KR100947442B1 (ko) 2007-11-20 2010-03-12 삼성모바일디스플레이주식회사 수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법
KR101156442B1 (ko) 2010-04-29 2012-06-18 삼성모바일디스플레이주식회사 마스크 프레임 조립체

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1437926A1 (en) * 2001-08-24 2004-07-14 Dai Nippon Printing Co., Ltd. Multi-face forming mask device for vacuum deposition
US20110185561A1 (en) * 2008-04-18 2011-08-04 Applied Materials Inc. Mask support, mask assembly, and assembly comprising a mask support and a mask

Also Published As

Publication number Publication date
KR20140061911A (ko) 2014-05-22
CN103805959A (zh) 2014-05-21
JP6527304B2 (ja) 2019-06-05
US20140130733A1 (en) 2014-05-15
CN103805959B (zh) 2018-04-03
KR101980232B1 (ko) 2019-05-21
JP2014098208A (ja) 2014-05-29
US9163306B2 (en) 2015-10-20
TW201419514A (zh) 2014-05-16

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