KR101980232B1 - 패터닝 슬릿 시트 프레임 어셈블리 - Google Patents

패터닝 슬릿 시트 프레임 어셈블리 Download PDF

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Publication number
KR101980232B1
KR101980232B1 KR1020120129102A KR20120129102A KR101980232B1 KR 101980232 B1 KR101980232 B1 KR 101980232B1 KR 1020120129102 A KR1020120129102 A KR 1020120129102A KR 20120129102 A KR20120129102 A KR 20120129102A KR 101980232 B1 KR101980232 B1 KR 101980232B1
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KR
South Korea
Prior art keywords
patterning slit
slit sheet
tensile force
force applying
sheet frame
Prior art date
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KR1020120129102A
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English (en)
Korean (ko)
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KR20140061911A (ko
Inventor
한정원
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삼성디스플레이 주식회사
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Application filed by 삼성디스플레이 주식회사 filed Critical 삼성디스플레이 주식회사
Priority to KR1020120129102A priority Critical patent/KR101980232B1/ko
Priority to US13/834,721 priority patent/US9163306B2/en
Priority to TW102112677A priority patent/TWI625853B/zh
Priority to CN201310228379.7A priority patent/CN103805959B/zh
Priority to JP2013219956A priority patent/JP6527304B2/ja
Publication of KR20140061911A publication Critical patent/KR20140061911A/ko
Application granted granted Critical
Publication of KR101980232B1 publication Critical patent/KR101980232B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020120129102A 2012-11-14 2012-11-14 패터닝 슬릿 시트 프레임 어셈블리 Active KR101980232B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020120129102A KR101980232B1 (ko) 2012-11-14 2012-11-14 패터닝 슬릿 시트 프레임 어셈블리
US13/834,721 US9163306B2 (en) 2012-11-14 2013-03-15 Patterning slit sheet frame assembly
TW102112677A TWI625853B (zh) 2012-11-14 2013-04-10 圖樣化縫片框架組件
CN201310228379.7A CN103805959B (zh) 2012-11-14 2013-06-08 图案化缝隙片框架组件
JP2013219956A JP6527304B2 (ja) 2012-11-14 2013-10-23 パターニングスリットシートフレーム・アセンブリ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120129102A KR101980232B1 (ko) 2012-11-14 2012-11-14 패터닝 슬릿 시트 프레임 어셈블리

Publications (2)

Publication Number Publication Date
KR20140061911A KR20140061911A (ko) 2014-05-22
KR101980232B1 true KR101980232B1 (ko) 2019-05-21

Family

ID=50680432

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120129102A Active KR101980232B1 (ko) 2012-11-14 2012-11-14 패터닝 슬릿 시트 프레임 어셈블리

Country Status (5)

Country Link
US (1) US9163306B2 (enExample)
JP (1) JP6527304B2 (enExample)
KR (1) KR101980232B1 (enExample)
CN (1) CN103805959B (enExample)
TW (1) TWI625853B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102079170B1 (ko) * 2013-04-09 2020-02-20 삼성디스플레이 주식회사 증착 장치 및 그에 적용되는 마스크 조립체
JP2015069806A (ja) * 2013-09-27 2015-04-13 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置の製造方法
CN104561892B (zh) * 2014-12-04 2016-11-23 深圳市华星光电技术有限公司 Oled材料真空热蒸镀用掩膜板
KR102868862B1 (ko) * 2020-12-10 2025-10-13 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 증착 장치

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5441157Y2 (enExample) * 1975-07-30 1979-12-03
US4721488A (en) * 1986-02-21 1988-01-26 Zenith Electronics Corporation Apparatus for tensing a shadow mask foil
FR2610139B1 (fr) * 1987-01-27 1996-07-12 Videocolor Procede de montage d'un masque d'ombre dans un tube cathodique trichrome et tube cathodique comportant un masque d'ombre monte selon ce procede
KR100322065B1 (ko) * 1999-01-22 2002-02-04 김순택 평면형 음극선관의 마스크 프레임 조립체
KR20010046478A (ko) * 1999-11-12 2001-06-15 구자홍 수직형 대면적 노광장치
DE60228599D1 (de) * 2001-08-24 2008-10-09 Dainippon Printing Co Ltd Maskeneinrichtung zur bildung mehrerer seiten für die vakuumablagerung
KR100490534B1 (ko) 2001-12-05 2005-05-17 삼성에스디아이 주식회사 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체
KR100813832B1 (ko) 2002-05-31 2008-03-17 삼성에스디아이 주식회사 증착용 마스크 프레임 조립체와 이의 제조방법
JP4440563B2 (ja) 2002-06-03 2010-03-24 三星モバイルディスプレイ株式會社 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
JP4072422B2 (ja) * 2002-11-22 2008-04-09 三星エスディアイ株式会社 蒸着用マスク構造体とその製造方法、及びこれを用いた有機ｅｌ素子の製造方法
JP4173722B2 (ja) 2002-11-29 2008-10-29 三星エスディアイ株式会社 蒸着マスク、これを利用した有機ｅｌ素子の製造方法及び有機ｅｌ素子
US20040163592A1 (en) * 2003-02-20 2004-08-26 Tohoku Poineer Corporation Mask for vacuum deposition and organic EL display panel manufactured by using the same
KR100659057B1 (ko) 2004-07-15 2006-12-21 삼성에스디아이 주식회사 박막 증착용 마스크 프레임 조립체 및 유기 전계 발광표시장치
KR100615536B1 (ko) 2004-11-19 2006-08-25 알투스주식회사 열 인가 스트레칭 마스크 제조 방법 및 장치
JP5151004B2 (ja) * 2004-12-09 2013-02-27 大日本印刷株式会社 メタルマスクユニット及びその製造方法
KR101081180B1 (ko) 2005-12-13 2011-11-07 사천홍시현시기건유한공사 새도우 마스크 및 그 제작 장치
KR20070063307A (ko) * 2005-12-14 2007-06-19 주성엔지니어링(주) 마스크 어셈블리
KR100947442B1 (ko) 2007-11-20 2010-03-12 삼성모바일디스플레이주식회사 수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법
EP2133444A1 (en) * 2008-04-18 2009-12-16 Applied Materials, Inc. Mask support, mask assembly, and assembly comprising a mask support and a mask
KR101156442B1 (ko) 2010-04-29 2012-06-18 삼성모바일디스플레이주식회사 마스크 프레임 조립체

Also Published As

Publication number Publication date
KR20140061911A (ko) 2014-05-22
TWI625853B (zh) 2018-06-01
CN103805959A (zh) 2014-05-21
JP6527304B2 (ja) 2019-06-05
US20140130733A1 (en) 2014-05-15
CN103805959B (zh) 2018-04-03
JP2014098208A (ja) 2014-05-29
US9163306B2 (en) 2015-10-20
TW201419514A (zh) 2014-05-16

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