CN103805959B - 图案化缝隙片框架组件 - Google Patents

图案化缝隙片框架组件 Download PDF

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Publication number
CN103805959B
CN103805959B CN201310228379.7A CN201310228379A CN103805959B CN 103805959 B CN103805959 B CN 103805959B CN 201310228379 A CN201310228379 A CN 201310228379A CN 103805959 B CN103805959 B CN 103805959B
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CN
China
Prior art keywords
applying unit
patterned slot
pulling force
slot piece
patterned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201310228379.7A
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English (en)
Chinese (zh)
Other versions
CN103805959A (zh
Inventor
韩政洹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
Original Assignee
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of CN103805959A publication Critical patent/CN103805959A/zh
Application granted granted Critical
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Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
CN201310228379.7A 2012-11-14 2013-06-08 图案化缝隙片框架组件 Active CN103805959B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020120129102A KR101980232B1 (ko) 2012-11-14 2012-11-14 패터닝 슬릿 시트 프레임 어셈블리
KR10-2012-0129102 2012-11-14

Publications (2)

Publication Number Publication Date
CN103805959A CN103805959A (zh) 2014-05-21
CN103805959B true CN103805959B (zh) 2018-04-03

Family

ID=50680432

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310228379.7A Active CN103805959B (zh) 2012-11-14 2013-06-08 图案化缝隙片框架组件

Country Status (5)

Country Link
US (1) US9163306B2 (enExample)
JP (1) JP6527304B2 (enExample)
KR (1) KR101980232B1 (enExample)
CN (1) CN103805959B (enExample)
TW (1) TWI625853B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102079170B1 (ko) * 2013-04-09 2020-02-20 삼성디스플레이 주식회사 증착 장치 및 그에 적용되는 마스크 조립체
JP2015069806A (ja) * 2013-09-27 2015-04-13 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置の製造方法
CN104561892B (zh) * 2014-12-04 2016-11-23 深圳市华星光电技术有限公司 Oled材料真空热蒸镀用掩膜板
KR102868862B1 (ko) * 2020-12-10 2025-10-13 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 증착 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1265519A (zh) * 1999-01-22 2000-09-06 三星Sdi株式会社 平面阴极射线管的张力荫罩和框架组件
CN1535082A (zh) * 2002-11-22 2004-10-06 �����ձ������ƶ���ʾ��ʽ���� 淀积掩模框架组件及其制造方法、有机电致发光器制造方法
CN1542160A (zh) * 2003-02-20 2004-11-03 �����ɷ� 真空蒸镀用掩模及用其制造的有机电致发光显示器面板
CN1965420A (zh) * 2004-12-09 2007-05-16 大日本印刷株式会社 金属掩模组件及其制造方法、金属带的安装方法以及拉力施加装置

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JPS5441157Y2 (enExample) * 1975-07-30 1979-12-03
US4721488A (en) * 1986-02-21 1988-01-26 Zenith Electronics Corporation Apparatus for tensing a shadow mask foil
FR2610139B1 (fr) * 1987-01-27 1996-07-12 Videocolor Procede de montage d'un masque d'ombre dans un tube cathodique trichrome et tube cathodique comportant un masque d'ombre monte selon ce procede
KR20010046478A (ko) * 1999-11-12 2001-06-15 구자홍 수직형 대면적 노광장치
DE60228599D1 (de) * 2001-08-24 2008-10-09 Dainippon Printing Co Ltd Maskeneinrichtung zur bildung mehrerer seiten für die vakuumablagerung
KR100490534B1 (ko) 2001-12-05 2005-05-17 삼성에스디아이 주식회사 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체
KR100813832B1 (ko) 2002-05-31 2008-03-17 삼성에스디아이 주식회사 증착용 마스크 프레임 조립체와 이의 제조방법
JP4440563B2 (ja) 2002-06-03 2010-03-24 三星モバイルディスプレイ株式會社 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
JP4173722B2 (ja) 2002-11-29 2008-10-29 三星エスディアイ株式会社 蒸着マスク、これを利用した有機ｅｌ素子の製造方法及び有機ｅｌ素子
KR100659057B1 (ko) 2004-07-15 2006-12-21 삼성에스디아이 주식회사 박막 증착용 마스크 프레임 조립체 및 유기 전계 발광표시장치
KR100615536B1 (ko) 2004-11-19 2006-08-25 알투스주식회사 열 인가 스트레칭 마스크 제조 방법 및 장치
KR101081180B1 (ko) 2005-12-13 2011-11-07 사천홍시현시기건유한공사 새도우 마스크 및 그 제작 장치
KR20070063307A (ko) * 2005-12-14 2007-06-19 주성엔지니어링(주) 마스크 어셈블리
KR100947442B1 (ko) 2007-11-20 2010-03-12 삼성모바일디스플레이주식회사 수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법
EP2133444A1 (en) * 2008-04-18 2009-12-16 Applied Materials, Inc. Mask support, mask assembly, and assembly comprising a mask support and a mask
KR101156442B1 (ko) 2010-04-29 2012-06-18 삼성모바일디스플레이주식회사 마스크 프레임 조립체

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1265519A (zh) * 1999-01-22 2000-09-06 三星Sdi株式会社 平面阴极射线管的张力荫罩和框架组件
CN1535082A (zh) * 2002-11-22 2004-10-06 �����ձ������ƶ���ʾ��ʽ���� 淀积掩模框架组件及其制造方法、有机电致发光器制造方法
CN1542160A (zh) * 2003-02-20 2004-11-03 �����ɷ� 真空蒸镀用掩模及用其制造的有机电致发光显示器面板
CN1965420A (zh) * 2004-12-09 2007-05-16 大日本印刷株式会社 金属掩模组件及其制造方法、金属带的安装方法以及拉力施加装置

Also Published As

Publication number Publication date
KR20140061911A (ko) 2014-05-22
TWI625853B (zh) 2018-06-01
CN103805959A (zh) 2014-05-21
JP6527304B2 (ja) 2019-06-05
US20140130733A1 (en) 2014-05-15
KR101980232B1 (ko) 2019-05-21
JP2014098208A (ja) 2014-05-29
US9163306B2 (en) 2015-10-20
TW201419514A (zh) 2014-05-16

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