TWI619166B - Vacuum device and valve control method - Google Patents

Vacuum device and valve control method Download PDF

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Publication number
TWI619166B
TWI619166B TW103112995A TW103112995A TWI619166B TW I619166 B TWI619166 B TW I619166B TW 103112995 A TW103112995 A TW 103112995A TW 103112995 A TW103112995 A TW 103112995A TW I619166 B TWI619166 B TW I619166B
Authority
TW
Taiwan
Prior art keywords
valve
exhaust
flow rate
gas
path
Prior art date
Application number
TW103112995A
Other languages
English (en)
Chinese (zh)
Other versions
TW201511125A (zh
Inventor
Satoshi Toda
Hideki Saitoh
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW201511125A publication Critical patent/TW201511125A/zh
Application granted granted Critical
Publication of TWI619166B publication Critical patent/TWI619166B/zh

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  • Engineering & Computer Science (AREA)
  • Drying Of Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
TW103112995A 2013-04-15 2014-04-09 Vacuum device and valve control method TWI619166B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013084632A JP6063803B2 (ja) 2013-04-15 2013-04-15 真空装置及びバルブ制御方法

Publications (2)

Publication Number Publication Date
TW201511125A TW201511125A (zh) 2015-03-16
TWI619166B true TWI619166B (zh) 2018-03-21

Family

ID=51709381

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103112995A TWI619166B (zh) 2013-04-15 2014-04-09 Vacuum device and valve control method

Country Status (4)

Country Link
JP (1) JP6063803B2 (ko)
KR (1) KR101747490B1 (ko)
CN (1) CN104112636B (ko)
TW (1) TWI619166B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6638576B2 (ja) * 2016-06-27 2020-01-29 東京エレクトロン株式会社 真空処理装置及び真空処理方法並びに記憶媒体
JP2018053272A (ja) * 2016-09-26 2018-04-05 株式会社Ｓｃｒｅｅｎホールディングス 成膜装置
WO2019101318A1 (en) * 2017-11-23 2019-05-31 Applied Materials, Inc. Lock valve for vacuum sealing, vacuum chamber and vacuum processing system
JP6969465B2 (ja) 2018-03-20 2021-11-24 株式会社島津製作所 目標開度推定器および圧力調整真空バルブ
WO2022157986A1 (ja) * 2021-01-25 2022-07-28 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、圧力制御装置及び基板処理プログラム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745492A (ja) * 1993-07-27 1995-02-14 Kokusai Electric Co Ltd 真空チャンバの圧力制御装置
JP2009016382A (ja) * 2007-06-29 2009-01-22 Tokyo Electron Ltd 真空処理装置及び真空処理方法並びに記憶媒体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4594800B2 (ja) * 2005-06-02 2010-12-08 東京エレクトロン株式会社 基板処理方法、基板処理プログラム及び記憶媒体

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745492A (ja) * 1993-07-27 1995-02-14 Kokusai Electric Co Ltd 真空チャンバの圧力制御装置
JP2009016382A (ja) * 2007-06-29 2009-01-22 Tokyo Electron Ltd 真空処理装置及び真空処理方法並びに記憶媒体

Also Published As

Publication number Publication date
KR101747490B1 (ko) 2017-06-14
TW201511125A (zh) 2015-03-16
JP2014207353A (ja) 2014-10-30
JP6063803B2 (ja) 2017-01-18
KR20140123905A (ko) 2014-10-23
CN104112636A (zh) 2014-10-22
CN104112636B (zh) 2017-04-12

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