TWI599005B - Substrate processing apparatus and substrate processing method - Google Patents

Substrate processing apparatus and substrate processing method Download PDF

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Publication number
TWI599005B
TWI599005B TW105115728A TW105115728A TWI599005B TW I599005 B TWI599005 B TW I599005B TW 105115728 A TW105115728 A TW 105115728A TW 105115728 A TW105115728 A TW 105115728A TW I599005 B TWI599005 B TW I599005B
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TW
Taiwan
Prior art keywords
substrate
substrate processing
stage
cooling
load lock
Prior art date
Application number
TW105115728A
Other languages
English (en)
Chinese (zh)
Other versions
TW201703209A (zh
Inventor
Byoung Hoon Kim
Sang Jong Park
Original Assignee
Psk Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Psk Inc filed Critical Psk Inc
Publication of TW201703209A publication Critical patent/TW201703209A/zh
Application granted granted Critical
Publication of TWI599005B publication Critical patent/TWI599005B/zh

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Robotics (AREA)
TW105115728A 2015-05-29 2016-05-20 Substrate processing apparatus and substrate processing method TWI599005B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150076187A KR20160141244A (ko) 2015-05-29 2015-05-29 기판 처리 장치 및 방법

Publications (2)

Publication Number Publication Date
TW201703209A TW201703209A (zh) 2017-01-16
TWI599005B true TWI599005B (zh) 2017-09-11

Family

ID=57577142

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105115728A TWI599005B (zh) 2015-05-29 2016-05-20 Substrate processing apparatus and substrate processing method

Country Status (3)

Country Link
JP (1) JP2016225625A (ja)
KR (1) KR20160141244A (ja)
TW (1) TWI599005B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7109211B2 (ja) * 2018-03-06 2022-07-29 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
KR102541982B1 (ko) * 2022-04-14 2023-06-13 주성엔지니어링(주) 기판처리시스템 및 기판처리방법
KR20240043461A (ko) * 2022-09-27 2024-04-03 프리시스 주식회사 기판 승하강모듈, 이를 포함하는 기판처리모듈 및 기판처리시스템

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000208589A (ja) * 1998-11-09 2000-07-28 Tokyo Electron Ltd 処理装置
US7207766B2 (en) * 2003-10-20 2007-04-24 Applied Materials, Inc. Load lock chamber for large area substrate processing system
US7846845B2 (en) * 2006-10-26 2010-12-07 Applied Materials, Inc. Integrated method for removal of halogen residues from etched substrates in a processing system
CN104137248B (zh) * 2012-02-29 2017-03-22 应用材料公司 配置中的除污及剥除处理腔室

Also Published As

Publication number Publication date
TW201703209A (zh) 2017-01-16
KR20160141244A (ko) 2016-12-08
JP2016225625A (ja) 2016-12-28

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