TWI598698B - 曝光裝置、曝光方法、及元件製造方法 - Google Patents

曝光裝置、曝光方法、及元件製造方法 Download PDF

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Publication number
TWI598698B
TWI598698B TW103145928A TW103145928A TWI598698B TW I598698 B TWI598698 B TW I598698B TW 103145928 A TW103145928 A TW 103145928A TW 103145928 A TW103145928 A TW 103145928A TW I598698 B TWI598698 B TW I598698B
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TW
Taiwan
Prior art keywords
liquid
substrate
space
disposed
exposure
Prior art date
Application number
TW103145928A
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English (en)
Chinese (zh)
Other versions
TW201518877A (zh
Inventor
佐藤真路
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201518877A publication Critical patent/TW201518877A/zh
Application granted granted Critical
Publication of TWI598698B publication Critical patent/TWI598698B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW103145928A 2008-12-29 2009-12-28 曝光裝置、曝光方法、及元件製造方法 TWI598698B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US19383608P 2008-12-29 2008-12-29
US19383408P 2008-12-29 2008-12-29
US19383508P 2008-12-29 2008-12-29
US19383308P 2008-12-29 2008-12-29
US12/644,703 US8896806B2 (en) 2008-12-29 2009-12-22 Exposure apparatus, exposure method, and device manufacturing method

Publications (2)

Publication Number Publication Date
TW201518877A TW201518877A (zh) 2015-05-16
TWI598698B true TWI598698B (zh) 2017-09-11

Family

ID=42061940

Family Applications (4)

Application Number Title Priority Date Filing Date
TW106117608A TWI644182B (zh) 2008-12-29 2009-12-28 曝光裝置、曝光方法、及元件製造方法
TW098145223A TWI479276B (zh) 2008-12-29 2009-12-28 曝光裝置、曝光方法、及元件製造方法
TW107138629A TWI709002B (zh) 2008-12-29 2009-12-28 曝光裝置及元件製造方法
TW103145928A TWI598698B (zh) 2008-12-29 2009-12-28 曝光裝置、曝光方法、及元件製造方法

Family Applications Before (3)

Application Number Title Priority Date Filing Date
TW106117608A TWI644182B (zh) 2008-12-29 2009-12-28 曝光裝置、曝光方法、及元件製造方法
TW098145223A TWI479276B (zh) 2008-12-29 2009-12-28 曝光裝置、曝光方法、及元件製造方法
TW107138629A TWI709002B (zh) 2008-12-29 2009-12-28 曝光裝置及元件製造方法

Country Status (5)

Country Link
US (2) US8896806B2 (enExample)
JP (2) JP5408258B2 (enExample)
KR (2) KR102087015B1 (enExample)
TW (4) TWI644182B (enExample)
WO (1) WO2010076894A1 (enExample)

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CN106662822A (zh) 2014-07-01 2017-05-10 Asml荷兰有限公司 光刻设备和制造光刻设备的方法
CN113156772A (zh) 2016-09-12 2021-07-23 Asml荷兰有限公司 用于光刻设备的流体处理结构及浸没光刻设备
KR102649164B1 (ko) * 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
KR20220058559A (ko) 2019-09-13 2022-05-09 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 시스템 및 리소그래피 장치

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Also Published As

Publication number Publication date
TWI479276B (zh) 2015-04-01
KR20180021907A (ko) 2018-03-05
WO2010076894A1 (en) 2010-07-08
US9612538B2 (en) 2017-04-04
US8896806B2 (en) 2014-11-25
JP5408258B2 (ja) 2014-02-05
JP2014027320A (ja) 2014-02-06
TW201518877A (zh) 2015-05-16
US20150036112A1 (en) 2015-02-05
KR20110106908A (ko) 2011-09-29
TW201908875A (zh) 2019-03-01
TW201732458A (zh) 2017-09-16
JP2012514315A (ja) 2012-06-21
KR101831984B1 (ko) 2018-02-23
JP5668825B2 (ja) 2015-02-12
TWI709002B (zh) 2020-11-01
TWI644182B (zh) 2018-12-11
US20100304310A1 (en) 2010-12-02
KR102087015B1 (ko) 2020-03-10
TW201030479A (en) 2010-08-16

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