TWI594310B - 用於化學機械研磨銅之方法 - Google Patents

用於化學機械研磨銅之方法 Download PDF

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Publication number
TWI594310B
TWI594310B TW101128397A TW101128397A TWI594310B TW I594310 B TWI594310 B TW I594310B TW 101128397 A TW101128397 A TW 101128397A TW 101128397 A TW101128397 A TW 101128397A TW I594310 B TWI594310 B TW I594310B
Authority
TW
Taiwan
Prior art keywords
chemical mechanical
mechanical polishing
weight
substrate
copper
Prior art date
Application number
TW101128397A
Other languages
English (en)
Chinese (zh)
Other versions
TW201320173A (zh
Inventor
葉倩萩
Original Assignee
羅門哈斯電子材料Ｃｍｐ控股公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 羅門哈斯電子材料Ｃｍｐ控股公司 filed Critical 羅門哈斯電子材料Ｃｍｐ控股公司
Publication of TW201320173A publication Critical patent/TW201320173A/zh
Application granted granted Critical
Publication of TWI594310B publication Critical patent/TWI594310B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/062—Manufacture or treatment of conductive parts of the interconnections by smoothing of conductive parts, e.g. by planarisation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW101128397A 2011-08-15 2012-08-07 用於化學機械研磨銅之方法 TWI594310B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/209,864 US20130045599A1 (en) 2011-08-15 2011-08-15 Method for chemical mechanical polishing copper

Publications (2)

Publication Number Publication Date
TW201320173A TW201320173A (zh) 2013-05-16
TWI594310B true TWI594310B (zh) 2017-08-01

Family

ID=47625346

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101128397A TWI594310B (zh) 2011-08-15 2012-08-07 用於化學機械研磨銅之方法

Country Status (7)

Country Link
US (1) US20130045599A1 (https=)
JP (1) JP6041095B2 (https=)
KR (1) KR101945221B1 (https=)
CN (1) CN102950537B (https=)
DE (1) DE102012015824A1 (https=)
FR (1) FR2979071B1 (https=)
TW (1) TWI594310B (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101931930B1 (ko) * 2011-12-21 2018-12-24 바스프 에스이 Cmp 조성물의 제조 방법 및 그의 적용
US9299585B2 (en) * 2014-07-28 2016-03-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method for chemical mechanical polishing substrates containing ruthenium and copper
CN106916536B (zh) * 2015-12-25 2021-04-20 安集微电子（上海）有限公司 一种碱性化学机械抛光液
CN107145614B (zh) * 2016-03-01 2020-06-30 中国科学院微电子研究所 一种cmp工艺仿真方法及仿真系统
US10377921B2 (en) * 2017-09-21 2019-08-13 Rohm and Haas Electronics Materials CMP Holdings, Inc. Chemical mechanical polishing method for cobalt
US20200095502A1 (en) * 2018-09-26 2020-03-26 Versum Materials Us, Llc High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Planarization Polishing(CMP)
WO2020091242A1 (ko) * 2018-10-31 2020-05-07 영창케미칼 주식회사 구리 배리어층 연마용 슬러리 조성물
JP7803851B2 (ja) * 2019-09-04 2026-01-21 シーエムシー マテリアルズ リミティド ライアビリティ カンパニー ポリシリコンｃｍｐ用組成物および方法
JP7409899B2 (ja) * 2020-02-18 2024-01-09 株式会社フジミインコーポレーテッド 研磨用組成物、研磨方法、および半導体基板の製造方法
JP7519862B2 (ja) * 2020-10-05 2024-07-22 花王株式会社 酸化珪素膜用研磨液組成物
CN114975234A (zh) * 2021-02-24 2022-08-30 中国科学院微电子研究所 一种半导体器件的制造方法
US20240342856A1 (en) * 2023-04-17 2024-10-17 Taiwan Semiconductor Manufacturing Co., Ltd. Methods of Forming an Abrasive Slurry and Methods for Chemical-Mechanical Polishing

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070051917A1 (en) * 2005-09-08 2007-03-08 Thomas Terence M Polymeric barrier removal polishing slurry
US20080148652A1 (en) * 2006-12-21 2008-06-26 Junaid Ahmed Siddiqui Compositions for chemical mechanical planarization of copper
JP2009049402A (ja) * 2007-08-03 2009-03-05 Rohm & Haas Electronic Materials Cmp Holdings Inc バリヤ除去ポリマー研磨スラリー
CN101679810A (zh) * 2008-02-29 2010-03-24 株式会社Lg化学 化学机械抛光用含水浆液组合物及化学机械抛光方法
JP2010135792A (ja) * 2008-12-03 2010-06-17 Lg Chem Ltd １次化学的機械的研磨用スラリー組成物および化学的機械的研磨方法
JP2010153865A (ja) * 2008-12-22 2010-07-08 Rohm & Haas Electronic Materials Cmp Holdings Inc バリヤ除去ポリマー研磨スラリー

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6435944B1 (en) 1999-10-27 2002-08-20 Applied Materials, Inc. CMP slurry for planarizing metals
US6740591B1 (en) * 2000-11-16 2004-05-25 Intel Corporation Slurry and method for chemical mechanical polishing of copper
US20050090104A1 (en) * 2003-10-27 2005-04-28 Kai Yang Slurry compositions for chemical mechanical polishing of copper and barrier films
KR100645957B1 (ko) 2004-10-26 2006-11-14 삼성코닝 주식회사 Ｃｍｐ용 수성 슬러리 조성물
CN1900206B (zh) * 2005-07-21 2011-01-05 安集微电子（上海）有限公司 化学机械抛光液及其用途

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070051917A1 (en) * 2005-09-08 2007-03-08 Thomas Terence M Polymeric barrier removal polishing slurry
CN1927975A (zh) * 2005-09-08 2007-03-14 罗门哈斯电子材料Cmp控股股份有限公司 可除去聚合物阻挡层的抛光浆液
US20080148652A1 (en) * 2006-12-21 2008-06-26 Junaid Ahmed Siddiqui Compositions for chemical mechanical planarization of copper
JP2008160112A (ja) * 2006-12-21 2008-07-10 Dupont Air Products Nanomaterials Llc 銅の化学機械平坦化用組成物
CN101240147A (zh) * 2006-12-21 2008-08-13 杜邦纳米材料气体产品有限公司 用于铜的化学机械平坦化的组合物
JP2009049402A (ja) * 2007-08-03 2009-03-05 Rohm & Haas Electronic Materials Cmp Holdings Inc バリヤ除去ポリマー研磨スラリー
CN101679810A (zh) * 2008-02-29 2010-03-24 株式会社Lg化学 化学机械抛光用含水浆液组合物及化学机械抛光方法
US20100184291A1 (en) * 2008-02-29 2010-07-22 Lg Chem, Ltd. Aqueous slurry composition for chemical mechanical polishing and chemical mechanical polishing method
JP2011515023A (ja) * 2008-02-29 2011-05-12 エルジー・ケム・リミテッド 化学的機械的研磨用水系スラリー組成物及び化学的機械的研磨方法
JP2010135792A (ja) * 2008-12-03 2010-06-17 Lg Chem Ltd １次化学的機械的研磨用スラリー組成物および化学的機械的研磨方法
JP2010153865A (ja) * 2008-12-22 2010-07-08 Rohm & Haas Electronic Materials Cmp Holdings Inc バリヤ除去ポリマー研磨スラリー

Also Published As

Publication number Publication date
KR20130020585A (ko) 2013-02-27
CN102950537B (zh) 2016-06-01
TW201320173A (zh) 2013-05-16
DE102012015824A1 (de) 2013-02-21
US20130045599A1 (en) 2013-02-21
JP6041095B2 (ja) 2016-12-07
JP2013042132A (ja) 2013-02-28
KR101945221B1 (ko) 2019-02-07
CN102950537A (zh) 2013-03-06
FR2979071B1 (fr) 2016-08-26
FR2979071A1 (fr) 2013-02-22

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