TWI581974B - Method for producing optical film, optical film, polarizer and image display device - Google Patents

Method for producing optical film, optical film, polarizer and image display device Download PDF

Info

Publication number
TWI581974B
TWI581974B TW099143668A TW99143668A TWI581974B TW I581974 B TWI581974 B TW I581974B TW 099143668 A TW099143668 A TW 099143668A TW 99143668 A TW99143668 A TW 99143668A TW I581974 B TWI581974 B TW I581974B
Authority
TW
Taiwan
Prior art keywords
refractive index
layer
optical film
hard coat
composition
Prior art date
Application number
TW099143668A
Other languages
Chinese (zh)
Other versions
TW201130658A (en
Inventor
宮之脇伸
篠原誠司
橋本浩二
林祐輔
村上茂樹
Original Assignee
大日本印刷股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大日本印刷股份有限公司 filed Critical 大日本印刷股份有限公司
Publication of TW201130658A publication Critical patent/TW201130658A/en
Application granted granted Critical
Publication of TWI581974B publication Critical patent/TWI581974B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00634Production of filters
    • B29D11/00644Production of filters polarizing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/34Applying different liquids or other fluent materials simultaneously
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08Cellulose derivatives
    • C08J2301/10Esters of organic acids
    • C08J2301/12Cellulose acetate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0087Simple or compound lenses with index gradient
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • G02B5/305Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/38Anti-reflection arrangements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50Protective arrangements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/02Materials and properties organic material
    • G02F2202/022Materials and properties organic material polymeric
    • G02F2202/023Materials and properties organic material polymeric curable
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/36Micro- or nanomaterials
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/40Materials having a particular birefringence, retardation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)

Description

光學薄膜之製造方法,光學薄膜,偏光板及影像顯示裝置Optical film manufacturing method, optical film, polarizing plate and image display device

本發明係關於在液晶顯示器(LCD)、陰極管顯示裝置(CRT)、有機電致發光(有機EL)或等離子體顯示器(PDP)等之顯示器(影像顯示裝置)的前面等所設置的光學薄膜、具備該光學薄膜的偏光板及影像顯示裝置。The present invention relates to an optical film provided in front of a display (image display device) such as a liquid crystal display (LCD), a cathode tube display device (CRT), an organic electroluminescence (organic EL), or a plasma display (PDP). A polarizing plate and an image display device including the optical film.

於如上述之顯示器中,要求對顯示器的影像顯示面賦予在操作時不公損傷般的耐擦傷性。對於此,一般經由利用基材薄膜上設置硬塗(以下,單稱為「HC」)層的光學薄膜和HC薄膜,則可對顯示器的影像顯示面賦予耐擦傷性(例如,專利文獻1)。In the above-described display, it is required to impart scratch resistance to the image display surface of the display in the case of unfair damage during operation. In this case, it is possible to impart scratch resistance to the image display surface of the display by using an optical film and an HC film which are provided with a hard coat (hereinafter referred to as "HC") layer on the base film (for example, Patent Document 1) .

又,於如上述之顯示器中,為提高其顯示面的辨視性,要求來自螢光燈等外部光源所照射的光線反射少。作為抑制外部光反射的方法,一般已知將顯示面最表面設置折射率最低的低折射率層,且,於低折射率層的顯示側鄰接設置折射率高之高折射率層的防止反射薄膜,設置於顯示器前面的方法。又,亦已知由顯示側設置折射率為中程度之層、折射率高之層以及折射率低之層的防止反射薄膜。Further, in the above-described display, in order to improve the visibility of the display surface, it is required that the light reflected from an external light source such as a fluorescent lamp is less reflected. As a method of suppressing reflection of external light, it is generally known to provide a low refractive index layer having the lowest refractive index on the outermost surface of the display surface, and an antireflection film having a high refractive index layer having a high refractive index adjacent to the display side of the low refractive index layer. , the method set in front of the display. Further, it is also known to provide an antireflection film having a medium refractive index layer, a high refractive index layer, and a low refractive index layer on the display side.

為形成此種折射率中程度至高之層,一般將含有高折射率微粒子之折射率層鄰接設置至低折射率層,並且使鄰接至低折射率之HC層和防靜電層等之機能層含有高折射率微粒子(例如,專利文獻2)。In order to form a layer having such a high degree of refractive index, a refractive index layer containing high refractive index fine particles is generally disposed adjacent to the low refractive index layer, and a functional layer such as an HC layer and an antistatic layer adjacent to the low refractive index is contained. High refractive index fine particles (for example, Patent Document 2).

但是,將中折射率層或高折射率層與HC層等機能層,分別以一層層依序(逐次)形成時,具有步驟數增加且製造成本上升的問題,及該高折射率層與HC層等之密合性低的問題。However, when the medium refractive index layer or the high refractive index layer and the functional layer such as the HC layer are sequentially formed one by one (sequentially), there is a problem that the number of steps increases and the manufacturing cost increases, and the high refractive index layer and the HC The problem of low adhesion of layers and the like.

又,於專利文獻2之發明中,高折射率微粒子在硬塗層之低折射率層側的界面附近偏在並且形成皮層,但硬塗層內的皮層與其他以外部分的邊界明顯,故在此邊界中具有產生干涉條紋的問題。Further, in the invention of Patent Document 2, the high refractive index fine particles are biased and formed in the vicinity of the interface on the low refractive index layer side of the hard coat layer, but the boundary between the skin layer in the hard coat layer and other portions is remarkable. There is a problem in the boundary that produces interference fringes.

於專利文獻3之發明中,恴圖提供可低反射化,且可防止干涉條紋發生的光學薄膜,係於基材上依序積層硬塗層、高折射率傾斜硬塗層及低折射率層的光學薄膜,提案根據特定之製法形成硬塗層與高折射率傾斜硬塗層呈一體的高折射率傾斜硬塗層,並且防止干涉條紋的光學薄膜。In the invention of Patent Document 3, an optical film which can reduce reflection and prevent interference fringes is provided, and a hard coat layer, a high refractive index oblique hard coat layer, and a low refractive index layer are sequentially laminated on a substrate. The optical film is proposed to form a high refractive index oblique hard coat layer in which a hard coat layer is integrated with a high refractive index oblique hard coat layer according to a specific method, and to prevent interference of the striped optical film.

但是,於專利文獻3的發明中亦難以良好效率取得折射率傾斜硬塗層,而要求更加容易、且以高生產性取得折射率傾斜硬塗層的方法。However, in the invention of Patent Document 3, it is also difficult to obtain a refractive index-slanted hard coat layer with good efficiency, and a method of obtaining a refractive index-slanted hard coat layer with higher productivity and high productivity is required.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1] 日本專利特開2008-165040號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-165040

[專利文獻2] 日本專利特開2009-086360號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2009-086360

[專利文獻3] 日本專利特開2009-265658號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2009-265658

本發明為解決上述問題點而完成者,以提供更加容易、且高生產性下具備折射率傾斜硬塗層的光學薄膜為其目的。The present invention has been made to solve the above problems, and an object of the invention is to provide an optical film having a refractive index oblique hard coat layer which is easier and more productive.

又,本發明以提供具備此種光學薄膜的偏光板及影像顯示裝置為其目的。Moreover, the present invention has an object of providing a polarizing plate and an image display device including such an optical film.

本發明者等人致力檢討之結果,發現準備含有具特定黏度之高折射率微粒子的組成物、和不含有具特定黏度之高折射率微粒子的組成物之2種組成物,並且由基材側之積層順序以該不含有高折射率微粒子的組成物及含有高折射率微粒子的組成物順序配置般同時塗佈,則可控制高折射率微粒子的擴散,而可容易,且高生產性下取得具備折射率傾斜硬塗層的光學薄膜,並且達到完成本發明。As a result of the review, the inventors of the present invention found that two compositions of a composition containing high refractive index fine particles having a specific viscosity and a composition containing no high refractive index fine particles having a specific viscosity were prepared from the substrate side. In the order of the layers, the composition containing no high refractive index fine particles and the composition containing the high refractive index fine particles are sequentially coated, and the diffusion of the high refractive index fine particles can be controlled, which is easy and high in productivity. An optical film having a refractive index oblique hard coat layer is obtained and the present invention has been completed.

即,解決上述問題之本發明之光學薄膜的製造方法,其特徵包含(i)準備光穿透性基材的步驟、(ii)準備含有第一黏合劑成分及第一溶劑,不含有高折射率微粒子,且黏度為3~100mPa‧s之第一硬塗層用硬化性樹脂組成物及含有平均粒徑1~100nm之高折射率微粒子、第二黏合劑成分及第二溶劑,且黏度為10~100mPa‧s之第二硬塗層用硬化性樹脂組成物的步驟、(iii)於該光穿透性基材的一面側,由該光穿透性基材側,將該第一硬塗層用硬化性樹脂組成物及該第二硬塗層用硬化性樹脂組成物予以鄰接,並以該第一硬塗層用硬化性樹脂組成物比該第二硬塗層用硬化性樹脂組成物更加位於該光穿透性基材側般進行同時塗佈,作成塗膜的步驟,(iv)對上述(iii)步驟所得之塗膜進行光照射使其硬化以形成折射率傾斜硬塗層的步驟。That is, the method for producing an optical film of the present invention which solves the above problems includes (i) a step of preparing a light-transmitting substrate, (ii) preparing a first binder component and a first solvent, and not containing high refractive index. a curable resin composition for a first hard coat layer having a particle size of 3 to 100 mPa·s and a high refractive index fine particle having a mean particle diameter of 1 to 100 nm, a second binder component, and a second solvent, and having a viscosity of a step of curing the resin composition for the second hard coat layer of 10 to 100 mPa·s, (iii) one side of the light-transmitting substrate, and the first hard surface of the light-transmitting substrate The curable resin composition for coating layer and the curable resin composition for the second hard coat layer are adjacent to each other, and the curable resin composition for the first hard coat layer is composed of the curable resin for the second hard coat layer. The coating is further coated on the side of the light-transmitting substrate to form a coating film, and (iv) the coating film obtained in the above step (iii) is subjected to light irradiation to be hardened to form a refractive index oblique hard coat layer. A step of.

經由將不含有高折射率微粒子,黏度3~100mPa‧s之第一硬塗層用硬化性樹脂組成物(以下,單稱為「第一組成物」)、與含有平均粒徑1~100nm之高折射率微粒子,黏度為10~100mPa‧s之第二硬塗層用硬化性樹脂組成物(以下,單稱為「第二組成物」,以該第一組成物在光穿透性基材側般鄰接且同時塗佈,並使其硬化,則可容易、且高生產性下取得折射率傾斜硬塗層。A curable resin composition for a first hard coat layer (hereinafter referred to simply as "first composition") having a viscosity of 3 to 100 mPa ‧ without containing high refractive index fine particles, and an average particle diameter of 1 to 100 nm a high-refractive-index fine particle, a curable resin composition for a second hard coat layer having a viscosity of 10 to 100 mPa·s (hereinafter, simply referred to as a "second composition", and the first composition is used in a light-transmitting substrate When the side is adjacent and coated at the same time and hardened, the refractive index oblique hard coat layer can be obtained easily and with high productivity.

此處,折射率傾斜HC層的折射率,意指與折射率傾斜HC層之光穿透性基材對面側界面的折射率。Here, the refractive index of the refractive index is inclined by the refractive index of the HC layer, which means the refractive index of the opposite side interface of the light-transmitting substrate of the HC layer with respect to the refractive index.

又,所謂折射率的傾斜,係意指於折射率傾斜HC層內,由光穿透性基材對面側的界面朝向光穿透性基材側界面,折射率為連續性變化。In addition, the inclination of the refractive index means that the refractive index is continuously changed in the gradient of the refractive index in the HC layer from the interface on the opposite side of the light-transmitting substrate toward the light-transmitting substrate-side interface.

於折射率傾斜HC層內折射率為傾斜,可根據下列方法加以確認。將折射率傾斜HC層經由氬濺鍍予以蝕刻使折射率傾斜HC層的特定深度之部分露出,並且使用X射線光電子分光裝置(XPS)測定此露出部分中的高折射率微粒子含量。根據此方法,特定出折射率傾斜HC層之深度方向的高折射率微粒子的存在量分佈。The refractive index is inclined in the gradient of the refractive index HC layer, which can be confirmed by the following method. The refractive index tilted HC layer was etched by argon sputtering to expose a portion of the specific depth of the refractive index tilted HC layer, and the high refractive index fine particle content in the exposed portion was measured using an X-ray photoelectron spectroscope (XPS). According to this method, the existence amount distribution of the high refractive index fine particles in the depth direction in which the refractive index is inclined in the HC layer is specified.

折射率傾斜HC層之各深度地點中的折射率,與高折射率微粒子的存在量相關,故經由確認折射率傾斜HC層之深度方向的高折射率微粒子的存在量分佈為傾斜,則亦可確認折射率為傾斜。Since the refractive index in each depth point of the gradient refractive index HC layer is related to the amount of the high refractive index fine particles, the presence of the high refractive index fine particles in the depth direction of the HC layer by the refractive index is inclined. Confirm that the refractive index is inclined.

又,使用熱硬化性樹脂將光學薄膜包埋,並使用LEICA公司製超微切片機由此包埋的光學薄膜製作80nm厚度的超薄切片,並且以穿透型電子顯微鏡(TEM)予以觀察亦可測定。Furthermore, the optical film was embedded with a thermosetting resin, and an ultrathin section having a thickness of 80 nm was formed using the optical film embedded by a LEICA micromicrotome, and observed by a transmission electron microscope (TEM). Can be measured.

所謂高折射率微粒子,意指折射率為1.50~2.80的微粒子。The term "high refractive index microparticles" means microparticles having a refractive index of 1.50 to 2.80.

於本發明之光學薄膜之製造方法中,上述第一硬塗層用硬化性樹脂組成物及/或第二硬塗層用硬化性樹脂組成物進一步含有增黏劑,就易於控制折射率傾斜硬塗層內之高折射率微粒子的分佈方面而言為佳。In the method for producing an optical film of the present invention, the curable resin composition for the first hard coat layer and/or the curable resin composition for the second hard coat layer further contains a tackifier, and it is easy to control the refractive index tilting hard. The distribution of the high refractive index microparticles in the coating is preferred.

於本發明之光學薄膜之製造方法中,上述第一硬塗層用硬化性樹脂組成物之黏度與上述第二硬塗層用硬化性樹脂組成物之黏度之差的絕對值為30以下,就易於控制折射率傾斜硬塗層內之高折射率微粒子的分佈方面而言為佳。In the method for producing an optical film of the present invention, the absolute value of the difference between the viscosity of the curable resin composition for the first hard coat layer and the viscosity of the curable resin composition for the second hard coat layer is 30 or less. It is preferable to easily control the distribution of the high refractive index fine particles in the gradient refractive hard coat layer.

於本發明之光學薄膜之製造方法中,上述光穿透性基材為三乙醯纖維素基材,上述第一溶劑對於該三乙醯纖維素基材具有浸透性,由抑制光學薄膜中之干涉條紋的觀點而言為佳。In the method for producing an optical film of the present invention, the light-transmitting substrate is a triacetyl cellulose substrate, and the first solvent has permeability to the triethylene cellulose substrate, and is suppressed by the optical film. It is preferable from the viewpoint of interference fringes.

於本發明之光學薄膜之製造方法中,在上述(iv)步驟之後,亦可進一步包含(v)在上述折射率傾斜硬塗層上,直接或介隔著高折射率層形成低折射率層的步驟。經由如此在折射率傾斜HC層上直接或介隔著高折射率層設置低折射率層,則可更加提高光學薄膜的防止反射性。In the method for producing an optical film of the present invention, after the step (iv), the method further includes (v) forming a low refractive index layer directly or via a high refractive index layer on the refractive index inclined hard coat layer. A step of. By providing the low refractive index layer directly or in the high refractive index layer on the refractive index inclined HC layer as described above, the antireflection property of the optical film can be further improved.

於本發明之光學薄膜之製造方法中,硬化形成上述低折射率層的低折射率層用組成物含有中空二氧化矽微粒子,因可對光學薄膜賦予優異的防止反射性,故為佳。In the method for producing an optical film of the present invention, the composition for a low refractive index layer which is formed by curing the low refractive index layer contains hollow cerium oxide fine particles, and it is preferable to impart excellent antireflection properties to the optical film.

於本發明之光學薄膜之製造方法中,硬化形成上述低折射率層的低折射率層用組成物,即使含有由金屬氟化物及硬化性氟樹脂所組成群中選出至少1種之低折射率材料的情況,亦可取得具有充分防止反射性的光學薄膜。In the method for producing an optical film of the present invention, the composition for a low refractive index layer which forms the low refractive index layer is cured, and at least one of the low refractive index selected from the group consisting of a metal fluoride and a curable fluororesin is contained. In the case of a material, an optical film having sufficient antireflection properties can also be obtained.

於本發明之光學薄膜之製造方法中,硬化形成上述低折射率層的低折射率層用組成物,不含有中空二氧化矽微粒子,含有由金屬氟化物及硬化性氟樹脂所組成群中選出至少1種的低折射率材料,就充分之防止反射性和耐鹼化性可兩相成立的觀點為佳。In the method for producing an optical film of the present invention, the composition for a low refractive index layer which forms the low refractive index layer is cured, and does not contain hollow ceria particles, and is selected from the group consisting of metal fluoride and curable fluororesin. At least one type of low refractive index material is preferable in that it is sufficient to prevent both reflectance and alkali resistance from being established.

於本發明之光學薄膜之製造方法中,亦可在上述(i)步驟與(iii)步驟之間,進一步包含(vi)在上述光穿透性基材之設置折射率傾斜硬塗層面形成防靜電層的步驟。經由防靜電層可提高光學薄膜的防靜電性。In the method for producing an optical film of the present invention, it may further comprise (vi) forming a refractive index oblique hard coat surface on the light-transmitting substrate between the steps (i) and (iii). The step of the antistatic layer. The antistatic property of the optical film can be improved via the antistatic layer.

本發明之光學薄膜係根據上述任一種製造方法而得的光學薄膜。The optical film of the present invention is an optical film obtained by any of the above production methods.

本發明之光學薄膜,係於光穿透性基材的一面側,至少設置折射率傾斜硬塗層的光學薄膜,其特徵為該折射率傾斜硬塗層含有平均粒徑1~100nm的高折射率微粒子,且於該折射率傾斜硬塗層中,在該折射率傾斜硬塗層的膜厚方向,該高折射率微粒子的存在量在愈接近該光穿透性基材側愈少。The optical film of the present invention is an optical film having at least one refractive index oblique hard coat layer on one side of the light-transmitting substrate, characterized in that the refractive index oblique hard coat layer has a high refractive index of an average particle diameter of 1 to 100 nm. The fine particles are present in the refractive index oblique hard coat layer, and the amount of the high refractive index fine particles is less toward the side of the light transmissive substrate in the film thickness direction of the gradient refractive index hard coat layer.

於本發明之光學薄膜中,於上述折射率傾斜硬塗層中,由上述光穿透性基材對面側界面直到該折射率傾斜硬塗層膜厚之70%為止的區域中,亦可存在上述高折射率微粒子全量的90%以上。如此,經由使高折射率微粒子分佈,則可有效率提高折射率傾斜HC層之光穿透性基材對面側界面側的折射率。In the optical film of the present invention, in the region of the refractive index oblique hard coat layer, the surface of the light-transmitting substrate opposite to the surface side until the refractive index is inclined to 70% of the film thickness of the hard coat layer may exist. 90% or more of the total amount of the high refractive index fine particles. By distributing the high refractive index fine particles in this manner, the refractive index of the surface side interface side of the light-transmitting substrate of the refractive index-slanted HC layer can be efficiently increased.

於本發明之光學薄膜中,亦可作成於上述折射率傾斜硬塗層含有增黏劑的態樣。In the optical film of the present invention, it is also possible to form the above-mentioned refractive index oblique hard coat layer containing a tackifier.

於本發明之光學薄膜中,上述光穿透性基材為三乙醯纖維素基材,構成上述折射率傾斜硬塗層的基質,亦存在於該三乙醯纖維素基材之折射率傾斜硬塗層側的界面,就抑制光學薄膜中之干涉條紋的觀點而言為佳。In the optical film of the present invention, the light-transmitting substrate is a triacetyl cellulose substrate, which constitutes a matrix of the above-mentioned refractive index oblique hard coat layer, and also has a refractive index tilt on the triacetyl cellulose substrate. The interface on the hard coat side is preferable from the viewpoint of suppressing interference fringes in the optical film.

於本發明之光學薄膜中,於上述折射率傾斜硬塗層之光穿透性基材對面側面,進一步由低折射率層或該折射率傾斜硬塗層側設置高折射率層及低折射率層,因可更加提高光學薄膜的防止反射性,故為佳。In the optical film of the present invention, a high refractive index layer and a low refractive index are further provided on the opposite side of the light transmissive substrate of the refractive index oblique hard coat layer from the low refractive index layer or the refractive index oblique hard coat layer side. The layer is preferable because the antireflection property of the optical film can be further improved.

於本發明之光學薄膜中,上述低折射率層含有中空二氧化矽微粒子,因可對光學薄膜賦予優異的防止反射性,故為佳。In the optical film of the present invention, the low refractive index layer contains hollow ceria particles, and it is preferable because it can provide excellent antireflection properties to the optical film.

於本發明之光學薄膜中,上述低折射率層即使含有由金屬氟化物及氟樹脂所組成群中選出至少1種之低折射率成分之情況,亦具有充分的防止反射性。In the optical film of the present invention, the low refractive index layer has sufficient antireflection properties even when at least one of the low refractive index components selected from the group consisting of metal fluorides and fluororesins is contained.

於本發明之光學薄膜中,上述低折射率層不含有中空二氧化矽微粒子,而含有由金屬氟化物及氟樹脂所組成群中選出至少1種之低折射率成分,即可使充分的防止反射性和耐鹼化性兩相成立。In the optical film of the present invention, the low refractive index layer does not contain hollow ceria particles, and contains at least one low refractive index component selected from the group consisting of metal fluorides and fluororesins, so that sufficient prevention can be achieved. The two phases of reflectivity and alkali resistance are established.

於本發明之光學薄膜中,在上述光穿透性基材與上述折射率傾斜硬塗層之間,進一步設置防靜電層,因可更加提高光學薄膜的防靜電性,故為佳。In the optical film of the present invention, an antistatic layer is further provided between the light-transmitting substrate and the refractive index oblique hard coat layer, and the antistatic property of the optical film can be further improved.

於本發明之光學薄膜中,亦可將該光學薄膜,放入保持於55℃的2當量濃度氫氧化鈉水溶液,浸漬2分鐘,其次,水洗後,以70℃乾燥5分鐘,其次,使用#0000號的鋼絲絨以摩擦荷重0.98N將低折射率層表面來回摩擦10次時,對低折射率層賦予不會損傷及剝離的性能。In the optical film of the present invention, the optical film may be immersed in a 2 N aqueous solution of sodium hydroxide maintained at 55 ° C for 2 minutes, and then, after washing with water, dried at 70 ° C for 5 minutes, and then, using # When the steel wool of No. 0000 rubbed the surface of the low refractive index layer back and forth 10 times with a friction load of 0.98 N, the low refractive index layer was imparted with no damage and peeling property.

本發明之偏光板,其特徵係在偏光元件的一面側,將上述光學薄膜,以該光學薄膜之光穿透性基材側朝向該偏光元件配置而成。The polarizing plate of the present invention is characterized in that the optical film is disposed on one surface side of the polarizing element with the light-transmitting substrate side of the optical film facing the polarizing element.

本發明之影像顯示裝置,其特徵為具備上述光學薄膜。An image display device of the present invention is characterized by comprising the above optical film.

於本發明之光學薄膜之製造方法中,經由將不含有高折射率微粒子之特定黏度的第一組成物與含有高折射率微粒子之特定黏度的第二組成物之2種組成物鄰接,且以該第一組成物為位於光穿透性基材側般同時塗佈形成折射率傾斜HC層,則可輕易控制折射率傾斜HC層之膜厚方向中的高折射率微粒子分佈。因此,若使用本發明之光學薄膜的製造方法,則可輕易,且高生產性下取得具備折射率傾斜HC層的光學薄膜。In the method for producing an optical film of the present invention, the first composition having a specific viscosity which does not contain the high refractive index fine particles is adjacent to the two compositions of the second composition containing the specific viscosity of the high refractive index fine particles, and When the first composition is coated on the side of the light-transmissive substrate and coated with a gradient-indexed HC layer, the high-refractive-index particle distribution in the film thickness direction of the gradient-inclined HC layer can be easily controlled. Therefore, according to the method for producing an optical film of the present invention, an optical film having a gradient refractive index HC layer can be obtained easily and with high productivity.

本發明之偏光板及影像顯示裝置,因具備上述具有折射率傾斜HC層的光學薄膜,故難使損傷。In the polarizing plate and the image display device of the present invention, since the optical film having the refractive index-inclined HC layer is provided, it is difficult to cause damage.

以下,首先說明關於本發明之光學薄膜的製造方法,其次說明關於光學薄膜。Hereinafter, a method of producing an optical film of the present invention will be described first, and an optical film will be described next.

於本發明中,(甲基)丙烯酸酯表示丙烯酸酯及/或甲基丙烯酸酯。In the present invention, (meth) acrylate means acrylate and/or methacrylate.

又,於本發明之光,不僅可見光及非可見光區域波長的電磁波,包含電子束般之粒子線、及電磁波與粒子線總稱的放射線或電離放射線。Further, in the light of the present invention, not only electromagnetic waves of wavelengths in the visible light and non-visible light regions, but also electron beam-like particle lines and radiation or ionizing radiation, which are collectively referred to as electromagnetic waves and particle lines.

於本發明中,所謂微粒子的平均粒徑,係意指硬化膜之剖面以穿透型電子顯微鏡(TEM)照片所觀察之粒子20個的平均值,且可為一次粒徑及二次粒徑之任一者。即,其係包含一次粒徑及二次粒徑之粒子群全體的平均分散粒徑。In the present invention, the average particle diameter of the microparticles means an average value of 20 particles observed by a transmission electron microscope (TEM) photograph of the cross section of the cured film, and may be a primary particle diameter and a secondary particle diameter. Either. That is, it is an average dispersed particle diameter of the whole particle group containing a primary particle diameter and a secondary particle diameter.

於本發明中,所謂分子量,於具有分子量分佈之情況,意指以THF作為溶劑之凝膠滲透層析(GPC)所測定之聚苯乙烯換算值的重量平均分子量,於不具有分子量分佈之情況,意指化合物本身的分子量。In the present invention, the molecular weight, in the case of having a molecular weight distribution, means a weight average molecular weight of a polystyrene-converted value measured by gel permeation chromatography (GPC) using THF as a solvent, and has no molecular weight distribution. , meaning the molecular weight of the compound itself.

於本發明中,所謂「硬塗層」係意指以JIS K5600-5-4(1999)規定之鉛筆硬度試驗(4.9N荷重),顯示「H」以上之硬度者。In the present invention, the term "hard coating layer" means a pencil hardness test (4.9 N load) prescribed in JIS K5600-5-4 (1999), and shows a hardness of "H" or more.

另外,薄膜與薄片以JIS-K6900的定義中,所謂薄片係指薄且一般其厚度於長度與寬度之比例上為小且平坦的製品,所謂薄膜係指相比於長度及寬度,厚度極小,且最大厚度為任意限定之薄且平坦的製品,通例,以輥型式供給者。因此,即使於薄片中亦有厚度特薄者被稱為薄膜,薄片與薄膜的界限並無確定,且難以明確區別,故本發明中,係包含厚度厚者及薄者兩者之意義,並定義為「薄膜」。Further, in the definition of the film and the sheet in the definition of JIS-K6900, the sheet refers to a product which is thin and generally has a thickness which is small and flat in the ratio of length to width, and the film means that the thickness is extremely small as compared with the length and the width. And the maximum thickness is an arbitrarily defined thin and flat product, generally, in the form of a roll type. Therefore, even if the thickness of the sheet is extremely thin, it is called a film, and the boundary between the sheet and the film is not determined, and it is difficult to distinguish clearly. Therefore, in the present invention, the meaning of both the thick and the thin is included, and Defined as "film".

折射率係使用分光光度計(島津製作所(股)製之UV-3100PC),測定波長380~780nm的平均反射率(R)。由所得之平均反射率(R),使用下式,求出折射率(n)之值。The refractive index was measured by using a spectrophotometer (UV-3100PC manufactured by Shimadzu Corporation) and measuring the average reflectance (R) at a wavelength of 380 to 780 nm. From the obtained average reflectance (R), the value of the refractive index (n) was obtained using the following formula.

R(%)=(1-n2)/(1+n2)R(%)=(1-n 2 )/(1+n 2 )

乾燥膜厚的測定使用(Mitsutoyo(股)製之IDF-130)進行。The measurement of the dried film thickness was carried out using (IDF-130, manufactured by Mitsutoyo Co., Ltd.).

(光學薄膜之製造方法)(Method of manufacturing optical film)

本發明之光學薄膜之製造方法,其特徵為包含(i)準備光穿透性基材的步驟、(ii)準備含有第一黏合劑成分及第一溶劑,不含有高折射率微粒子,且黏度為3~100mPa‧s之第一硬塗層用硬化性樹脂組成物以及含有平均粒徑1~100nm之高折射率微粒子、第二黏合劑成分及第二溶劑,且黏度為10~100mPa‧s之第二硬塗層用硬化性樹脂組成物的步驟、(iii)於該光穿透性基材的一面側,由該光穿透性基材側,將該第一硬塗層用硬化性樹脂組成物及該第二硬塗層用硬化性樹脂組成物予以鄰接,並以該第一硬塗層用硬化性樹脂組成物比該第二硬塗層用硬化性樹脂組成物更加位於該光穿透性基材側般進行同時塗佈,作成塗膜的步驟、(iv)對上述(iii)步驟所得之塗膜進行光照射使其硬化以形成折射率傾斜硬塗層的步驟。A method for producing an optical film according to the present invention, comprising (i) a step of preparing a light-transmitting substrate, (ii) preparing a first binder component and a first solvent, containing no high-refractive-index particles, and having a viscosity It is a hardening resin composition for a first hard coat layer of 3 to 100 mPa·s and a high refractive index fine particle having a mean particle diameter of 1 to 100 nm, a second binder component, and a second solvent, and has a viscosity of 10 to 100 mPa·s. a step of forming a curable resin composition for the second hard coat layer, (iii) one side of the light transmissive substrate, and a hardenability of the first hard coat layer from the side of the light transmissive substrate The resin composition and the curable resin composition for the second hard coat layer are adjacent to each other, and the curable resin composition for the first hard coat layer is located further than the curable resin composition for the second hard coat layer. The step of simultaneously coating the penetrating substrate side to form a coating film, and (iv) the step of hardening the coating film obtained in the above step (iii) to form a refractive index oblique hard coat layer.

將不含有高折射率微粒子、黏度為3~100mPa‧s之第一組成物,與含有平均粒徑1~100nm之高折射率微粒子、黏度為10~100mPa‧s之第二組成物,以該第一組成物鄰接光穿透性基材側般同時塗佈,並使其硬化,則可輕易、且以高生產性取得折射率傾斜HC層。a first composition containing no high refractive index fine particles, having a viscosity of 3 to 100 mPa·s, and a second composition having a high refractive index fine particle having an average particle diameter of 1 to 100 nm and a viscosity of 10 to 100 mPa·s. When the first composition is applied simultaneously to the side of the light-transmitting substrate and hardened, the refractive index-slanted HC layer can be easily and highly productive.

另外,第一組成物及第二組成物的黏度,使用Anton Paar公司製之MCR301,測定工具為PP50,測定溫度為25℃、剪切速度為10000[1/s]之條件將測定對象之組成物(墨水)適量、滴至台上測定。Further, the viscosity of the first composition and the second composition was measured using MCR301 manufactured by Anton Paar Co., Ltd., measuring instrument was PP50, and the measurement temperature was 25 ° C, and the shear rate was 10000 [1/s]. The amount of the substance (ink) was measured and dropped on the stage.

第一組成物與第二組成物的黏度未滿上述範圍之情況,於折射率傾斜HC層內,難以控制高折射率微粒子於該折射率傾斜HC層之膜厚方向的分佈,且高折射率微粒子於折射率傾斜HC層內易於均勻分佈。When the viscosity of the first composition and the second composition is less than the above range, it is difficult to control the distribution of the high refractive index fine particles in the film thickness direction of the refractive index inclined HC layer in the gradient refractive index HC layer, and the high refractive index The microparticles are easily distributed uniformly in the gradient refractive index HC layer.

若高折射率微粒子於層內均勻分佈,則在與折射率傾斜HC層鄰接之光穿透性基材和防靜電層的界面,折射率差變大。其後,於該界面中產生干涉條紋並且發生光學薄膜的外觀惡化的問題。又,高折射率微粒子的含量變多,製造成本亦增加。When the high refractive index fine particles are uniformly distributed in the layer, the refractive index difference becomes large at the interface between the light-transmitting substrate adjacent to the refractive index-inclined HC layer and the antistatic layer. Thereafter, interference fringes are generated in the interface and the appearance of the optical film is deteriorated. Further, the content of the high refractive index fine particles increases, and the manufacturing cost also increases.

另外,第一組成物與第二組成物的黏度未滿上述範圍之情況,於折射率傾斜HC層表面產生塗佈紋且亦有外觀惡化的問題。Further, when the viscosity of the first composition and the second composition is less than the above range, the coating of the refractive index is inclined on the surface of the HC layer, and the appearance is deteriorated.

相對地,經由第一組成物與第二組成物的黏度為上述特定之範圍,則即使將該等2種組成物同時塗佈,亦可適度控制高折射率微粒子的擴散或沈降,且可輕易、且以高生產性取得折射率傾斜HC層。On the other hand, when the viscosity of the first composition and the second composition is within the above specific range, even if the two compositions are simultaneously coated, the diffusion or sedimentation of the high refractive index fine particles can be appropriately controlled, and the coating can be easily performed. The refractive index tilting HC layer is obtained with high productivity.

第一組成物及第二組成物的黏度分別為3~100mPa‧s及10~100mPa‧s,第一組成物的黏度為3~50mPa‧s為佳,以5~30mPa‧s為更佳。第二組成物的黏度為10~50mPa‧s為佳,以15~30mPa‧s為更佳。第一組成物與第二組成物的黏度分別調節至上述範圍,則可輕易控制高折射率微粒子的擴散或沈降,易於形成折射率傾斜HC層。又,第一組成物的黏度為5~30mPa‧s、且、第二組成物的黏度為20~30mPa‧s,可更加容易控制高折射率微粒子的擴散或沈降,且易於形成折射率傾斜HC層,故為佳。The viscosity of the first composition and the second composition is 3 to 100 mPa·s and 10 to 100 mPa·s, respectively, and the viscosity of the first composition is preferably 3 to 50 mPa·s, more preferably 5 to 30 mPa·s. The viscosity of the second composition is preferably 10 to 50 mPa ‧ s, and more preferably 15 to 30 mPa ‧ s. When the viscosity of the first composition and the second composition are respectively adjusted to the above ranges, diffusion or sedimentation of the high refractive index fine particles can be easily controlled, and the refractive index inclined HC layer can be easily formed. Further, the viscosity of the first composition is 5 to 30 mPa·s, and the viscosity of the second composition is 20 to 30 mPa·s, which makes it easier to control the diffusion or sedimentation of the high refractive index microparticles, and is easy to form the refractive index tilt HC. Layer, so it is better.

第一組成物與第二組成物的黏度若為上述範圍內,則根據所欲之高折射率微粒子的分佈適當調節即可,但以硬化且成為折射率傾斜HC層上層側之第二組成物的黏度,比第一組成物的黏度更大,就生產性方面而言為佳。When the viscosity of the first composition and the second composition is within the above range, the distribution of the high refractive index fine particles may be appropriately adjusted, but the second composition of the upper layer side of the HC layer having the refractive index is inclined. The viscosity is greater than the viscosity of the first composition, and is superior in terms of productivity.

又,第一組成物與第二組成物之黏度(mPa‧s)之差的絕對值為30以下,可更加輕易控制高折射率微粒子的擴散或沈降,且易於形成折射率傾斜HC層,故為佳。Further, the absolute value of the difference between the viscosity (mPa‧s) of the first composition and the second composition is 30 or less, and the diffusion or sedimentation of the high refractive index fine particles can be more easily controlled, and the gradient refractive index HC layer is easily formed. It is better.

圖1示意性示出本發明之光學薄膜之製造方法的一例圖。Fig. 1 is a view schematically showing an example of a method for producing an optical film of the present invention.

如圖1(a)所示般,準備光穿透性基材10。其次,於光穿透性基材10上,將上述第一組成物與第二組成物,以第一組成物位於光穿透性基材10側般鄰接且同時塗佈,作成塗膜,並進行光照射使其硬化,如圖1(b)所示般,於層內以愈接近光穿透性基材側高折射率微粒子30的存在量愈少,形成折射率傾斜硬塗層20,取得光學薄膜1。As shown in Fig. 1(a), the light-transmitting substrate 10 is prepared. Next, on the light-transmitting substrate 10, the first composition and the second composition are applied adjacent to each other while the first composition is positioned on the side of the light-transmitting substrate 10 to form a coating film. The light is irradiated and hardened, and as shown in FIG. 1(b), the refractive index tilting hard coat layer 20 is formed as the amount of the high refractive index fine particles 30 in the layer is closer to the light-transmitting substrate side. The optical film 1 was obtained.

以下,說明本發明之光學薄膜之製造方法中所用的光穿透性基材及第一組成物及第二組成物。Hereinafter, the light-transmitting substrate, the first composition, and the second composition used in the method for producing an optical film of the present invention will be described.

(光穿透性基材)(light penetrating substrate)

本發明之光穿透性基材,若可滿足使用作為光學薄膜之光穿透性基材的物性者,則無特別限定,可適當選擇使用先前公知的硬塗薄膜和光學薄膜所用的三乙醯纖維素(TAC)、聚對苯二甲酸乙二酯(PET)、或環烯烴聚合物(COP)等。The light-transmitting substrate of the present invention is not particularly limited as long as it satisfies the physical properties of the light-transmitting substrate as the optical film, and the conventionally used hard-coated film and optical film can be appropriately selected and used. Cellulose (TAC), polyethylene terephthalate (PET), or cyclic olefin polymer (COP), and the like.

可見光區域380~780nm中之光穿透性基材的平均光穿透率為50%以上為佳,更佳為70%以上,特佳為85%以上。另外,光穿透率的測定可使用紫外線可見光分光光度計(例如,島津製作所(股)製UV-3100PC),使用於室溫、大氣中測定的值。The light transmittance of the light-transmitting substrate in the visible light region of 380 to 780 nm is preferably 50% or more, more preferably 70% or more, and particularly preferably 85% or more. In addition, the measurement of the light transmittance can be performed by using an ultraviolet-visible spectrophotometer (for example, UV-3100PC manufactured by Shimadzu Corporation) and using it at room temperature or in the atmosphere.

又,亦可對光穿透性基材施以鹼化處理和設置塗底層等的表面處理。又,於光穿透性基材中亦可含有防靜電劑等添加劑。Further, the light-transmitting substrate may be subjected to an alkalizing treatment and a surface treatment such as providing a primer layer or the like. Further, an additive such as an antistatic agent may be contained in the light transmissive substrate.

光穿透性基材的厚度並無特別限定,通常為20~300μm左右,較佳為40~200μm。The thickness of the light-transmitting substrate is not particularly limited, but is usually about 20 to 300 μm, preferably 40 to 200 μm.

使用1種組成物以1次形成如先前含有高折射率微粒子之HC層的方法(以下,稱為「單層1次塗佈法」中,光穿透性基材為TAC基材之情況,即使將組成物中所含之溶劑和黏合劑成分浸透TAC基材,亦使高折射率微粒子於HC層內均勻分佈,且在HC層之TAC基材側的界面和其附近亦易於存在。其次,於該界面中,經由TAC基材(折射率:1.49)與高折射率微粒子(折射率:1.50~2.80)的折射率差,發生干涉條紋,且外觀惡化。In the case where the HC layer having the high refractive index fine particles is formed once by using one composition (hereinafter referred to as "single layer one-time coating method", the light-transmitting substrate is a TAC substrate, Even if the solvent and the binder component contained in the composition are impregnated into the TAC substrate, the high refractive index fine particles are uniformly distributed in the HC layer, and are easily present at the interface on the TAC substrate side of the HC layer and in the vicinity thereof. At this interface, interference fringes occur through the difference in refractive index between the TAC substrate (refractive index: 1.49) and the high refractive index fine particles (refractive index: 1.50 to 2.80), and the appearance is deteriorated.

相對地,若根據本發明之光學薄膜之製造方法,於折射率傾斜HC層中,在折射率傾斜HC層的膜厚方向,高折射率微粒子的存在量(每單位體積的粒子密度)愈接近光穿透性基材側愈少,且在折射率傾斜HC層與光穿透性基材的界面和其附近不存在或少存在高折射率微粒子。因此,即使使用TAC基材之情況,第一溶劑和第一黏合劑成分易浸透TAC基材,且於折射率傾斜HC層與TAC基材的界面不會發生干涉條紋,可取得良好外觀的光學薄膜。In contrast, according to the method for producing an optical film of the present invention, in the gradient-inclined HC layer, the closer the refractive index of the HC layer is, the closer the amount of the high-refractive-index particles (the particle density per unit volume) is. The light-permeable substrate side is less, and high-refractive-index fine particles are not present or absent at the interface between the refractive index-slanted HC layer and the light-transmitting substrate and in the vicinity thereof. Therefore, even when the TAC substrate is used, the first solvent and the first binder component are easily impregnated into the TAC substrate, and interference fringes do not occur at the interface between the refractive index tilting HC layer and the TAC substrate, and an optical appearance of good appearance can be obtained. film.

(第一硬塗層用硬化性樹脂組成物)(curable resin composition for the first hard coat layer)

於本發明之光學薄膜之製造方法中使用的第一組成物,含有第一黏合劑成分及第一溶劑,且不含有高折射率微粒子,黏度為3~100mPa‧s。第一組成物比後述第二組成物更加位於光穿透性基材側般鄰接且同時塗佈。The first composition used in the method for producing an optical film of the present invention contains the first binder component and the first solvent, and does not contain high refractive index fine particles, and has a viscosity of 3 to 100 mPa·s. The first composition is adjacent to and coated at the same time as the second composition described later on the side of the light-transmitting substrate.

將不含有高折射率微粒子之第一組成物比含有高折射率微粒子之第二組成物在光穿透性基材側同時塗佈,於該等2種組成物所形成之折射率傾斜HC層中,在該折射率傾斜HC層的膜厚方向,高折射率微粒子愈接近光穿透性基材側存在量愈少。又,將第一組成物與第二組成物同時塗佈之情況,比將該2種組成物分別塗佈、硬化之逐次塗佈的情況,第一組成物與第二組成物以一體型式形成膜,且第二組成物所含之高折射率微粒子於該呈一體之膜中以愈接近光穿透性基材側愈少般適度分佈。藉此,第一組成物在折射率傾斜HC層的光穿透性基材側界面中,抑制經由高折射率微粒子與光穿透性基材或防靜電層等下層之折射率差而發生干涉條紋,具有防止光學薄膜外觀惡化的作用。The first composition not containing the high refractive index fine particles is coated on the light transmissive substrate side at the same time as the second composition containing the high refractive index fine particles, and the refractive index inclined HC layer formed by the two kinds of compositions In the film thickness direction of the gradient refractive index HC layer, the amount of the high refractive index microparticles is closer to the light transmissive substrate side. Further, when the first composition and the second composition are simultaneously coated, the first composition and the second composition are formed in an integral form than when the two compositions are applied and cured separately. The film, and the high refractive index fine particles contained in the second composition are moderately distributed in the integrated film as the closer to the side of the light penetrating substrate. Thereby, the first composition suppresses interference by the refractive index difference between the high refractive index fine particles and the lower layer such as the light transmissive substrate or the antistatic layer in the light transmissive substrate side interface of the refractive index tilting HC layer. Stripes have the effect of preventing the appearance of the optical film from deteriorating.

以下,說明關於第一組成物中所含之第一黏合劑成分及第一溶劑以及視需要亦可含有之其他的光聚合起始劑、增黏劑、微粒子、防靜電劑及勻塗劑。Hereinafter, the first binder component and the first solvent contained in the first composition and, if necessary, other photopolymerization initiators, tackifiers, fine particles, antistatic agents, and leveling agents may be described.

(第一黏合劑成分)(first binder component)

第一黏合劑成分係硬化成為折射率傾斜HC層的基質成分。The first binder component is hardened to form a matrix component of the refractive index tilted HC layer.

作為第一黏合劑成分,可列舉例如,(i)感應光而硬化的反應性黏合劑成分(以下,單稱為「光硬化性黏合劑成分」)、(ii)感應熱而硬化的反應性黏合劑成分(以下,單稱為「熱硬化性黏合劑成分」)及(iii)不會感應光及熱而經由乾燥或冷卻而固化的非反應性黏合劑成分。Examples of the first binder component include (i) a reactive binder component which is cured by induction light (hereinafter referred to as "photocurable binder component"), and (ii) reactivity which is hardened by induction heat. The binder component (hereinafter referred to as "thermosetting binder component") and (iii) a non-reactive binder component which is cured by drying or cooling without sensing light or heat.

又,光硬化性黏合劑成分及熱硬化性黏合劑成分,亦可感應光及熱而硬化的光及熱硬化性黏合劑成分。Further, the photocurable binder component and the thermosetting binder component may also be light and heat-curable light and thermosetting binder component.

光硬化性黏合劑成分中,亦特別以電離放射線所硬化的黏合劑成分(以下,單稱為「電離放射線硬化性黏合劑成分」),可調製塗佈適性優異的塗敷組成物,且易形成均勻的大面積塗膜。又,塗膜中之經由電離放射線硬化的黏合劑成分,塗佈後經由光聚合而硬化,可取得強度較高的硬化膜。In the photocurable adhesive component, a binder component which is cured by ionizing radiation (hereinafter referred to as "ionizing radiation curable adhesive component") can be prepared, and a coating composition having excellent coating properties can be prepared. A uniform large-area coating film is formed. Further, the binder component which is cured by ionizing radiation in the coating film is cured by photopolymerization after application, and a cured film having high strength can be obtained.

作為電離放射線硬化性黏合劑成分,可使用先前公知之經由電離放射線引起聚合等反應之具有聚合性官能基的單體、低聚物或聚合物。As the ionizing radiation-curable binder component, a monomer, oligomer or polymer having a polymerizable functional group which is previously known to cause polymerization or the like via ionizing radiation can be used.

聚合性官能基,例如,以丙烯醯基、乙烯基及烯丙基等之乙烯性不飽和鍵為佳。聚合性官能基,此外,亦可為環氧基。The polymerizable functional group is preferably an ethylenically unsaturated bond such as an acrylonitrile group, a vinyl group or an allyl group. The polymerizable functional group may further be an epoxy group.

電離放射線硬化性黏合劑成分,由增加硬化時之黏合劑成分彼此間的交聯方面而言,以1分子中具有2個以上聚合性官能基的黏合劑成分為佳。The ionizing radiation-curable adhesive component is preferably a binder component having two or more polymerizable functional groups in one molecule from the viewpoint of increasing the crosslinking between the binder components at the time of curing.

作為電離放射線硬化性黏合劑成分,可列舉例如,日本專利特開2004-300210號公報中記載的單官能(甲基)丙烯酸酯、二(甲基)丙烯酸酯、三(甲基)丙烯酸酯及多官能(甲基)丙烯酸酯及該等之EO(環氧乙烷)改質品等衍生物、聚合該等自由基聚合性單體的低聚物及具有乙烯性不飽和鍵的聚合物等。又,亦可使用含有環氧基之化合物般之光陽離子聚合性單體和低聚物。Examples of the ionizing radiation-curable adhesive component include monofunctional (meth) acrylate, di(meth) acrylate, and tri(meth) acrylate described in JP-A-2004-300210. a polyfunctional (meth) acrylate, a derivative such as the EO (ethylene oxide) modified product, an oligomer which polymerizes the radical polymerizable monomer, a polymer having an ethylenically unsaturated bond, or the like . Further, a photocationic polymerizable monomer and an oligomer such as a compound containing an epoxy group can also be used.

作為熱硬化性黏合劑成分,可列舉例如,具有環氧基之化合物及日本專利特開2006-106503號公報中記載的黏合劑性環氧化合物等。The thermosetting adhesive component may, for example, be a compound having an epoxy group, or a binder epoxy compound described in JP-A-2006-106503.

作為非反應性黏合劑成分,可列舉例如,日本專利特開2004-300210號公報中記載之聚丙烯酸、聚醯亞胺及聚乙烯醇等。Examples of the non-reactive adhesive component include polyacrylic acid, polyimide, and polyvinyl alcohol described in JP-A-2004-300210.

上述(i)~(iii)之黏合劑成分可使用單獨1種,且亦可組合使用2種以上。The binder components of the above (i) to (iii) may be used alone or in combination of two or more.

(第一溶劑)(first solvent)

第一溶劑具有調整第一組成物之黏度,並且對第一組成物賦予塗佈性的作用。The first solvent has a function of adjusting the viscosity of the first composition and imparting coatability to the first composition.

第一溶劑並無特別限定,可根據使用之光穿透性基材適當選擇使用。The first solvent is not particularly limited and may be appropriately selected and used depending on the light-transmitting substrate to be used.

作為第一溶劑,可列舉例如,日本專利特開2005-316428號公報記載之醇類、酮類、酯類、鹵化烴類、芳香族烴類、醚類等。Examples of the first solvent include alcohols, ketones, esters, halogenated hydrocarbons, aromatic hydrocarbons, and ethers described in JP-A-2005-316428.

作為第一溶劑,另外,可使用例如,四氫呋喃、1,4-二烷、二茂烷及二異丙醚等之醚類等。As the first solvent, in addition, for example, tetrahydrofuran, 1,4-two can be used. Alkane, two Ethers such as alkane and diisopropyl ether.

為防止干涉條紋發生,使用對於光穿透性基材具有浸透性的溶劑(浸透性溶劑)為佳。浸透性溶劑亦可與非浸透性溶劑併用。In order to prevent the occurrence of interference fringes, it is preferred to use a solvent (permeability solvent) having permeability to the light-transmitting substrate. The penetrating solvent can also be used in combination with a non-permeating solvent.

另外,於本發明中所謂浸透性,除了對光穿透性基材浸透的性質(即,狹義的浸透性)以外,包含使光穿透性基材泡脹或濕潤概念的意義。Further, the so-called permeability in the present invention includes the concept of swelling or wetting the light-transmitting substrate in addition to the property of impregnating the light-transmitting substrate (i.e., the permeability in a narrow sense).

作為浸透性溶劑的具體例,可列舉異丙醇、甲醇及乙醇等之醇類、甲基乙基酮、甲基異丁基酮及環己酮等之酮類、醋酸甲酯、醋酸乙酯及醋酸丁酯等之酯類、鹵化烴類、甲苯及二甲苯等之芳香族烴類及苯酚類。Specific examples of the penetrating solvent include alcohols such as isopropyl alcohol, methanol and ethanol, ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, methyl acetate and ethyl acetate. And esters such as butyl acetate, halogenated hydrocarbons, aromatic hydrocarbons such as toluene and xylene, and phenols.

光穿透性基材為三乙醯纖維素(TAC)之情況所使用的溶劑,以及光穿透性基材為聚對苯二甲酸乙二酯(PET)之情況所使用的溶劑,可列舉日本專利特開2005-316428號公報記載之溶劑。The solvent used for the case where the light-transmitting substrate is triacetyl cellulose (TAC) and the solvent used for the case where the light-transmitting substrate is polyethylene terephthalate (PET) can be enumerated. The solvent described in Japanese Laid-Open Patent Publication No. 2005-316428.

特別,光穿透性基材為三乙醯纖維素(TAC)之情況所使用的溶劑,以醋酸甲酯、醋酸乙酯、醋酸丁酯及甲基乙基酮為佳。In particular, the light-transmitting substrate is a solvent used in the case of triacetyl cellulose (TAC), and preferably methyl acetate, ethyl acetate, butyl acetate or methyl ethyl ketone.

光穿透性基材為聚對苯二甲酸乙二酯(PET)之情況所使用的溶劑為苯酚、氯苯、硝基苯、氯苯酚及六氟異丙醇為佳。The solvent used in the case where the light-transmitting substrate is polyethylene terephthalate (PET) is preferably phenol, chlorobenzene, nitrobenzene, chlorophenol or hexafluoroisopropanol.

又,上述酮類之溶劑除了浸漬性以外,具有使第一組成物可輕易且均勻塗佈光穿透性基材表面,且塗佈後溶劑的蒸發速度適度而難引起乾燥不勻的效果。因此,可輕易取得均勻厚度的大面積塗膜。Further, in addition to the impregnation property, the solvent of the ketone has an effect that the first composition can be easily and uniformly applied to the surface of the light-transmitting substrate, and the evaporation rate of the solvent after application is moderate, and it is difficult to cause unevenness in drying. Therefore, a large-area coating film having a uniform thickness can be easily obtained.

第一溶劑可使用單獨1種上述溶劑,且亦可組合使用2種以上。The first solvent may be used alone or in combination of two or more.

組合使用浸漬性溶劑及非浸透性溶劑作為第一溶劑時,相對於第一溶劑之全質量,浸透性溶劑之比例為50質量%以上為佳,且以80質量%以上為更佳。When the impregnating solvent and the non-permeating solvent are used in combination as the first solvent, the ratio of the penetrating solvent is preferably 50% by mass or more, and more preferably 80% by mass or more, based on the total mass of the first solvent.

(第一組成物之其他成分)(other components of the first composition)

於第一組成物中,在不超脫本發明主旨之範圍中,以促進第一黏合劑成分之硬化、調整黏度、硬度或賦予防靜電性等為目的,亦可含有光聚合起始劑、增黏劑、微粒子、防靜電劑及勻塗劑等其他成分。In the first composition, in order to promote the hardening of the first binder component, adjust the viscosity, hardness, or impart antistatic property, the first composition may contain a photopolymerization initiator, and may be added. Other ingredients such as adhesives, microparticles, antistatic agents and leveling agents.

(光聚合起始劑)(photopolymerization initiator)

作為光聚合起始劑,例如,可使用日本專利特開2007-272132號公報記載之乙醯苯類及二苯酮類等之光起始劑。As the photopolymerization initiator, for example, a photoinitiator such as acetophenone or benzophenone described in JP-A-2007-272132 can be used.

其中,以1-羥基-環乙基-苯基酮及2-甲基-1[4-(甲硫基)苯基]-2-啉基丙烷-1-酮,即使少量亦可開始並促進光聚合反應,故於本發明中較佳使用。Among them, 1-hydroxy-cycloethyl-phenyl ketone and 2-methyl-1[4-(methylthio)phenyl]-2- The morphyl propan-1-one, which can start and promote photopolymerization even in a small amount, is preferably used in the present invention.

於使用光陽離子聚合性之黏合劑成分之情況中,視需要例如可使用日本專利特開2010-107823號公報記載的陽離子聚合起始劑。In the case of using a photo-cationic polymerizable binder component, for example, a cationic polymerization initiator described in JP-A-2010-107823 can be used.

上述光聚合起始劑可使用單獨1種,且亦可組合使用2種以上。The photopolymerization initiator may be used alone or in combination of two or more.

上述光聚合起始劑亦可使用市售品,例如,1-羥基-環己基-苯基酮以IRGACURE 184的商品名由Ciba Specialty Chemicals(股)取得。A commercially available product can also be used as the above photopolymerization initiator. For example, 1-hydroxy-cyclohexyl-phenyl ketone is available from Ciba Specialty Chemicals under the trade name IRGACURE 184.

上述光聚合起始劑亦可使用單獨1種,且亦可組合使用2種以上。The photopolymerization initiator may be used alone or in combination of two or more.

使用光聚合起始劑時,其含量相對於第一組成物之全固形份使用0.1~20質量%為佳。When a photopolymerization initiator is used, the content thereof is preferably 0.1 to 20% by mass based on the total solid content of the first composition.

(增黏劑)(tackifier)

於第一組成物中以調整黏度為目的,亦可含有有機化合物及/或無機化合物之增黏劑。經由含有增黏劑,則可適度控制第一組成物與第二組成物的混合,且易於控制第二組成物所含之高折射率微粒子的分佈。For the purpose of adjusting the viscosity in the first composition, a tackifier of an organic compound and/or an inorganic compound may be contained. By containing the tackifier, the mixing of the first composition and the second composition can be appropriately controlled, and the distribution of the high refractive index fine particles contained in the second composition can be easily controlled.

作為有機合物的增黏劑,可列舉例如,乙基纖維素、羥丙基纖維素、丙烯酸樹脂、脂肪酸醯胺蠟、氧化聚乙烯、高分子聚酯之胺鹽、直鏈聚胺基醯胺與高分子酸聚酯之鹽、聚羧酸之醯胺溶液、烷基磺酸鹽、烷基烯丙基磺酸鹽、膠體系酯、聚酯樹脂、苯酚樹脂、三聚氰胺樹脂、環氧樹脂、胺基甲酸酯樹脂及聚醯亞胺樹脂以及將該等粉碎者。Examples of the tackifier of the organic compound include ethyl cellulose, hydroxypropyl cellulose, acrylic resin, fatty acid guanamine wax, oxidized polyethylene, amine salt of high molecular polyester, and linear polyamine hydrazine. Salt of amine and polymeric acid polyester, decylamine solution of polycarboxylic acid, alkyl sulfonate, alkyl allyl sulfonate, gum system ester, polyester resin, phenol resin, melamine resin, epoxy resin , urethane resin and polyimide resin and the pulverizer.

作為無機化合物之增黏劑,可列舉例如,硬脂酸鈣、硬脂酸鋅、硬脂酸鋁、氧化鋁、氧化鋅、氧化鎂、玻璃、矽藻土、氧化鈦、氧化鋯、二氧化矽、滑石、雲母、長石、高嶺石(高嶺土黏土)、葉蠟石(蠟石黏土)、絹雲母、膨潤土、膨潤石、蛭石類(蒙脫石、貝得石、囊脫石及皂石等)、有機膨潤土及有機蒙脫石等。Examples of the tackifier of the inorganic compound include calcium stearate, zinc stearate, aluminum stearate, aluminum oxide, zinc oxide, magnesium oxide, glass, diatomaceous earth, titanium oxide, zirconium oxide, and dioxide. Earthworms, talc, mica, feldspar, kaolinite (kaolin clay), pyrophyllite (waxite clay), sericite, bentonite, bentonite, vermiculite (montmorillonite, beidellite, smectite and saponite) Etc.), organic bentonite and organic montmorillonite.

增黏劑亦可使用市售品。作為有機化合物之增秥劑的市售品,可列鈝例如,日本曹達(股)製之SELNY-HPC-H、HPC-M、HPC-L、HPC-SL及HPC-SSL、三菱麗昂(股)製之DIYANAL BR系列、楠本化成(股)製之Dispalone #6900-20X、Dispalone #4200、Dispalone KS-873N及Dispalone #1850、BYK Chem Japan公司製之BYK-405及BYK-410、Rhom & Haas公司製之Primal RW-12W、伊藤製油(股)製之A-S-AT-20S、A-S-AT-350F、A-S-AD-10A及A-S-AD-160等。Commercially available products can also be used as the tackifier. As a commercial product of an organic compound as an enhancer, for example, SELNY-HPC-H, HPC-M, HPC-L, HPC-SL, and HPC-SSL, manufactured by Japan's Soda Co., Ltd., and Mitsubishi Rayon ( DIYANAL BR series, Nippon Kasei Co., Ltd. Dispalone #6900-20X, Dispalone #4200, Dispalone KS-873N and Dispalone #1850, BYK-405 and BYK-410, Rhom & BYK Chem Japan Primal RW-12W manufactured by Haas, AS-AT-20S, AS-AT-350F, AS-AD-10A and AS-AD-160 manufactured by Ito Oil Co., Ltd.

作為無機化合物之增黏劑的市售品,可列舉例如,白石工業(股)之Crown Clay、Bages Clay #60、Bages Clay KF及Optiwhite、土屋Kaolin工業(股)製之Kaolin JP-100、NN Kaolin Clay、ST Kaolin Clay及Hardsil、Enjel Hard(股)製之ASP-072、Satenton Plus、TRANSLINK 37及Highdrasdelami NCD、丸尾Calicum(股)製之SY Kaolin、OS CLAY、HA CLAY及MC HARD CLAY、Copchemical公司製之Rusentite SWN、Rusentite SAN、Rusentite STN、Rusentite SEN及Rusentite SPN、Cunimina工業公司製之Smecton、Hojun(股)製之Bengel、Bengel FW、S Ben、S Ben 74、Oruganite及Oruganite T、Wilba Elis公司製之穗高印、Oluben、250M、Benton 34及Benton38、日本Silica工業(股)製之Laponite、Laponite RD及Laponite RDS等。As a commercial product of the tackifier of the inorganic compound, for example, Crown Clay, Bages Clay #60, Bages Clay KF, and Optiwhite of White Rock Industries Co., Ltd., Kaolin JP-100, NN manufactured by Tsuchiya Kaolin Industries Co., Ltd. Kaolin Clay, ST Kaolin Clay and Hardsil, Enjel Hard (ASP), Satenton Plus, TRANSLINK 37 and Highdrasdelami NCD, SY Kaolin, OS CLAY, HA CLAY and MC HARD CLAY, Copchemical Company-made Rusentite SWN, Rusentite SAN, Rusentite STN, Rusentite SEN and Rusentite SPN, Smecton by Cunimina Industries, Bengel, Bengel FW, S Ben, S Ben 74, Oruganite and Oruganite T, Wilba Elis The company's Sui Gaoyin, Oluben, 250M, Benton 34 and Benton38, Japan's Silica Industries (shares) Laponite, Laponite RD and Laponite RDS.

由透明性的觀點而言較佳的增黏劑為上述有機化合物系的增黏劑,且其中亦以羥丙基纖維素、丙烯酸樹脂為佳。A preferred tackifier from the viewpoint of transparency is a tackifier of the above organic compound, and among them, hydroxypropylcellulose or acrylic resin is also preferred.

上述增黏劑可使用單獨1種,且亦可組合使用2種以上。One type of the above-mentioned tackifier may be used alone or two or more types may be used in combination.

使用增黏劑時,其含量相對於第一組成物之全固形份使用0.1~10質量%為佳。When the tackifier is used, the content thereof is preferably 0.1 to 10% by mass based on the total solid content of the first composition.

又,於後述之第二組成物中亦可含有增黏劑。此時,第一組成物及第二組成物之增黏劑可為相同,且亦可為相異。Further, a tackifier may be contained in the second composition described later. At this time, the tackifiers of the first composition and the second composition may be the same and may be different.

(微粒子)(microparticles)

微粒子使用於提高折射率傾斜HC層之硬度為其目的。The microparticles are used for the purpose of increasing the hardness of the gradient tilting HC layer.

作為此種提高硬度的微粒子,可列舉例如,專利文獻1中記載之表面具有反應性官能基的二氧化矽微粒子等。For example, the fine particles of the hardness-reducing fine particles include a cerium oxide fine particle having a reactive functional group on the surface described in Patent Document 1.

使用賦予硬度之微粒子時,其含量相對於第一組成物之第一黏合劑成分質量使用5~80質量%為佳。When the fine particles imparting hardness are used, the content thereof is preferably from 5 to 80% by mass based on the mass of the first binder component of the first composition.

(防靜電劑)(antistatic agent)

防靜電劑,係對折射率傾斜HC層賦予防靜電性的成分。The antistatic agent is a component that imparts antistatic properties to the gradient refractive index HC layer.

防靜電劑並無特別限定,可使用先前公知物質。The antistatic agent is not particularly limited, and a conventionally known one can be used.

作為防靜電劑,可列舉例如,專利文獻3中記載的陰離子性防靜電劑、陽離子防靜電劑、兩性防靜電劑、非離子性防靜電劑、電解質及離子性液體等。Examples of the antistatic agent include an anionic antistatic agent, a cationic antistatic agent, an amphoteric antistatic agent, a nonionic antistatic agent, an electrolyte, and an ionic liquid described in Patent Document 3.

防靜電劑之含量並無特別限定,若適當調節使用即可。例如,折射率傾斜HC層之表面電阻率為1.0×1013Ω/□以下為佳,以1.0×1011Ω/□以下為更佳,且以1.0×109Ω/□以下為再佳,以1.0×108Ω/□以下為特佳,故折射率傾斜HC層的表面電阻率若以此範圍般使用即可。The content of the antistatic agent is not particularly limited, and may be appropriately adjusted and used. For example, the surface resistivity of the gradient-indexed HC layer is preferably 1.0 × 10 13 Ω / □ or less, more preferably 1.0 × 10 11 Ω / □ or less, and more preferably 1.0 × 10 9 Ω / □ or less. It is particularly preferable that it is 1.0 × 10 8 Ω / □ or less, so that the surface resistivity of the gradient-indexed HC layer can be used in this range.

(勻塗劑)(leveling agent)

勻塗劑,在形成折射率傾斜HC層時對其表面,具有賦予塗佈性及/或平滑性的作用。The leveling agent has a function of imparting coatability and/or smoothness to the surface of the gradient-increasing HC layer.

作為勻塗劑,可使用先前公知之防止反射薄膜所用的氟系、聚矽氧系及丙烯酸系等之勻塗劑。例如,DIC(股)製Megafac系列(MCF350-5)等之不具有電離放射線硬化性基的勻塗劑、信越化學工業(股)製之X-22-163A等之具有電離放射線硬化性基的勻塗劑任一者均可使用。As the leveling agent, a leveling agent such as a fluorine-based, polyfluorene-based or acrylic-based one for a conventionally known antireflection film can be used. For example, a leveling agent which does not have an ionizing radiation curable group, such as the Megafac series (MCF350-5) manufactured by DIC Co., Ltd., or X-22-163A manufactured by Shin-Etsu Chemical Co., Ltd., has an ionizing radiation hardening group. Any of the leveling agents can be used.

使用勻塗劑時,其含量相對於第一黏合劑成分之質量使用5.0質量%以下為佳,且以使用0.1~3.0質量%為更佳。When the leveling agent is used, the content thereof is preferably 5.0% by mass or less based on the mass of the first binder component, and more preferably 0.1 to 3.0% by mass.

第一組成物,通常,於第一溶劑中將第一黏合劑成分及光聚合起始劑等任意使用之成分,根據一般的調製法,混合並且分散處理則可調製。於混合分散,可使用塗料分散器或珠粒磨等。In the first composition, a component which is arbitrarily used, such as a first binder component and a photopolymerization initiator, is usually prepared by mixing and dispersing the mixture according to a general preparation method. For mixing and dispersing, a paint disperser or a bead mill or the like can be used.

後述之第二組成物亦可同樣調製。The second composition described later can also be prepared in the same manner.

(第二硬塗層用硬化性樹脂組成物)(curable resin composition for second hard coat layer)

本發明之光學薄膜之製造方法中所用之第二組成物,含有平均粒徑1~100nm之高折射率微粒子、第二黏合劑成分及第二溶劑,且黏度為10~100mPa‧s。其次,將上述第一組成物比該第二組成物更位於光穿透性基材側般鄰接且同時塗佈。The second composition used in the method for producing an optical film of the present invention contains high refractive index fine particles having an average particle diameter of 1 to 100 nm, a second binder component, and a second solvent, and has a viscosity of 10 to 100 mPa·s. Next, the first composition is applied adjacent to the light-transmitting substrate side as compared with the second composition.

第二組成物,亦具有將折射率傾斜HC層的光穿透性基材對面側界面及其附近,有效率地高折射率化的作用。藉此,如圖4所示般,在折射率傾斜HC層的光穿透性基材對面側面(折射率傾斜HC層上)設置低折射率層之情況,和,如圖5所示般,在折射率傾斜HC層上,由該折射率傾斜HC層側開始設置高折射率層及低折射率層,則可更加提高光學薄膜的防止反射性。The second composition also has an effect of efficiently increasing the refractive index by obliquely tilting the refractive index of the HC layer to the surface side of the light-transmitting substrate and the vicinity thereof. Thereby, as shown in FIG. 4, a low refractive index layer is provided on the opposite side surface (on the refractive index inclined HC layer) of the light-transmitting substrate of the refractive index-inclined HC layer, and, as shown in FIG. When the high refractive index layer and the low refractive index layer are provided on the gradient inclined HC layer from the side of the refractive index inclined HC layer, the antireflection property of the optical film can be further improved.

以下,說明關於第二組成物所含之高折射率微粒子、第二黏合劑成分及第二溶劑以及視需要亦可含有之其他的光聚合起始劑、增黏劑、微粒子、防靜電劑及勻塗劑。Hereinafter, the high refractive index fine particles, the second adhesive component, the second solvent, and other photopolymerization initiators, tackifiers, fine particles, antistatic agents, and the like, which are contained in the second composition, and Leveling agent.

(高折射率微粒子)(high refractive index microparticles)

本發明之第二組成物所含的高折射率微粒子為平均粒徑為1~100nm。The high refractive index fine particles contained in the second composition of the present invention have an average particle diameter of 1 to 100 nm.

高折射率微粒子的平均粒徑,由透明性的觀點而言為100nm以下,由控制分散性的觀點而言為1nm以上。The average particle diameter of the high refractive index fine particles is 100 nm or less from the viewpoint of transparency, and is 1 nm or more from the viewpoint of controlling dispersibility.

高折射率微粒子的平均粒徑,由透明性的觀點而言為50nm以下為佳,以20nm以下為更佳。The average particle diameter of the high refractive index fine particles is preferably 50 nm or less from the viewpoint of transparency, and more preferably 20 nm or less.

於本發明之光學薄膜之製造方法中,經由將第一組成物與第二組成物的黏度作成特定的範圍,則即使同時塗佈該等2種組成物,亦可抑制第二組成物所含之高折射率微粒子於塗膜中均勻分散。In the method for producing an optical film of the present invention, by setting the viscosity of the first composition and the second composition to a specific range, even if the two compositions are simultaneously applied, the second composition can be suppressed. The high refractive index fine particles are uniformly dispersed in the coating film.

高折射率微粒子的平均粒徑,係意指以穿透型電子顯微鏡(TEM)照片觀察硬化膜(折射率傾斜HC層)剖面之粒子20個的平均值,若為1~100nm,則為一次粒徑及二級粒徑之任一者均可。The average particle diameter of the high refractive index microparticles means the average value of 20 particles of the cross section of the cured film (refractive index inclined HC layer) observed by a transmission electron microscope (TEM) photograph, and is once for 1 to 100 nm. Any of the particle size and the secondary particle diameter can be used.

高折射率微粒子之形狀並無特別限定,可使用球狀、鏈狀及針狀等物質。The shape of the high refractive index fine particles is not particularly limited, and materials such as a spherical shape, a chain shape, and a needle shape can be used.

作為高折射率微粒子,若折射率為1.50~2.80則無特別限定,可使用先前公知的高折射率微粒子。The high refractive index fine particles are not particularly limited as long as the refractive index is 1.50 to 2.80, and conventionally known high refractive index fine particles can be used.

作為上述高折射率微粒子,可列舉金屬氧化物微粒子。作為金屬氧化物微粒子,具體而言,可列舉例如,氧化鈦(TiO2、折射率:2.71)、氧化鋯(ZrO2、折射率:2.10)、氧化鈰(CeO2、折射率:2.20)、氧化錫(SnO2、折射率:2.00)、銻錫氧化物(ATO、折射率:1.75~1.95)、銦錫氧化物(ITO、折射率:1.95~2.00)、磷錫化合物(PTO、折射率:1.75~1.85)、氧化銻(Sb2O5、折射率:2.04)、鋁鋅氧化物(AZO、折射率:1.90~2.00)、鎵鋅氧化物(GZO、折射率:1.90~2.00)及銻氧化鋅(ZnSb2O6、折射率:1.90~2.00)等。Examples of the high refractive index fine particles include metal oxide fine particles. Specific examples of the metal oxide fine particles include titanium oxide (TiO 2 , refractive index: 2.71), zirconia (ZrO 2 , refractive index: 2.10), cerium oxide (CeO 2 , refractive index: 2.20), and Tin oxide (SnO 2 , refractive index: 2.00), antimony tin oxide (ATO, refractive index: 1.75 to 1.95), indium tin oxide (ITO, refractive index: 1.95 to 2.00), phosphorus tin compound (PTO, refractive index) : 1.75~1.85), yttrium oxide (Sb 2 O 5 , refractive index: 2.04), aluminum zinc oxide (AZO, refractive index: 1.90 to 2.00), gallium zinc oxide (GZO, refractive index: 1.90 to 2.00) and Zinc oxide (ZnSb 2 O 6 , refractive index: 1.90 to 2.00) and the like.

上述金屬氧化物微粒子中亦以氧化錫(SnO2)、銻錫氧化物(ATO)、銦錫氧化物(ITO)、磷錫化合物(PTO)、氧化銻(Sb2O5)、鋁鋅氧化物(AZO)、鎵鋅氧化物(GZO)及銻酸鋅(ZnSb2O6)為導電性金屬氧化物,具有控制粒子的擴散狀態,形成導電通道,並可賦予防靜電性的優點。The above metal oxide fine particles are also oxidized by tin oxide (SnO 2 ), antimony tin oxide (ATO), indium tin oxide (ITO), phosphorus tin compound (PTO), antimony oxide (Sb 2 O 5 ), aluminum zinc. The material (AZO), gallium zinc oxide (GZO), and zinc antimonate (ZnSb 2 O 6 ) are conductive metal oxides, and have the advantage of controlling the diffusion state of the particles, forming a conductive path, and imparting antistatic properties.

於本發明之光學薄膜之製造方法中,根據折射率傾HC層之光穿透性基材對面側面所設置的低折射率層或高折射率層,選擇或調整第二組成物所含之高折射率微粒子的種類及含量,且若調整折射率傾斜HC層的折射率即可。In the method for producing an optical film of the present invention, the high refractive index layer or the high refractive index layer provided on the opposite side surface of the light transmissive substrate of the refractive index tilting layer is selected or adjusted to be high in the second composition. The type and content of the refractive index fine particles may be adjusted by adjusting the refractive index of the HC layer.

具體而言,例如於折射率傾斜HC層的光穿透性基材對面側面設置低折射率層時,折射率傾斜HC層的折射率為1.50~2.80為佳。Specifically, for example, when the low refractive index layer is provided on the opposite side surface of the light-transmitting substrate of the refractive index-inclined HC layer, the refractive index of the refractive index-inclined HC layer is preferably 1.50 to 2.80.

於折射率傾斜HC層之光穿透性基材對面側面,由折射率傾斜HC層側,設置高折射率層及低折射率層時,折射率傾斜HC層的折射率比高折射率層更低,且比低折射率層更高。此時,例如,折射率傾斜HC層的折射率可為1.50~2.00。When the refractive index is inclined on the opposite side of the light-transmitting substrate of the HC layer, when the refractive index is inclined on the HC layer side, and the high refractive index layer and the low refractive index layer are provided, the refractive index of the inclined HC layer is higher than that of the high refractive index layer. Low and higher than the low refractive index layer. At this time, for example, the refractive index of the gradient HC layer may have a refractive index of 1.50 to 2.00.

另外,折射率傾斜HC層的折射率,意指折射率傾斜HC層之光穿透性基材對面側界面的折射率。Further, the refractive index of the refractive index is inclined by the refractive index of the HC layer, which means the refractive index of the opposite side interface of the light-transmitting substrate of the refractive index inclined HC layer.

第二組成物所含之高折射率微粒子,可使用單獨1種平均粒徑、形狀、折射率及材料等不同者,且亦可組合使用2種以上。The high-refractive-index fine particles contained in the second composition may be used alone or in combination of two or more kinds of the above-mentioned average particle diameter, shape, refractive index, and material.

(第二黏合劑成分)(second binder component)

第二黏合劑成分,係硬化成為折射率傾斜HC層之基質的成分。The second binder component is a component that hardens into a matrix of the gradient-increasing HC layer.

第二黏合劑成分可使用第一黏合劑成分所列舉者。The second binder component can be listed using the first binder component.

此外,亦可使用專利文獻3中記載之含有芳香環的樹脂、含有氟以外之氯、溴及碘等鹵素元素的樹脂及含有硫原子、氮原子及磷原子等原子之樹脂等的高折射率黏合劑成分。In addition, a high refractive index of a resin containing an aromatic ring described in Patent Document 3, a resin containing a halogen element such as chlorine, bromine or iodine other than fluorine, and a resin containing an atom such as a sulfur atom, a nitrogen atom or a phosphorus atom may be used. Adhesive ingredients.

第一黏合劑成分與第二黏合劑成分可為相同,且亦可為相異。The first binder component and the second binder component may be the same and may also be different.

第二黏合劑成分亦可使用單獨1種,且亦可組合使用2種以上。The second binder component may be used alone or in combination of two or more.

(第二溶劑)(second solvent)

第二溶劑可使用第一溶劑所列舉者。The second solvent can be used as listed for the first solvent.

第一溶劑與第二溶劑可為相同,且亦可為相異。The first solvent and the second solvent may be the same and may also be different.

第二溶劑亦可使用單獨1種,且亦可組合使用2種以上。The second solvent may be used alone or in combination of two or more.

(第二組成物之其他成分)(other components of the second composition)

於第二組成物中,在不超脫本發明主旨之範圍中,以促進第二黏合劑成分之硬化、賦予硬度或防靜電性等為目的,亦可含有光聚合起始劑、增黏劑、微粒子、分散劑、防靜電劑、防污劑及均塗劑等其他成分。The second composition may contain a photopolymerization initiator, a tackifier, or the like for the purpose of promoting the hardening of the second binder component, imparting hardness or antistatic property, etc. in the range of the present invention. Other components such as microparticles, dispersants, antistatic agents, antifouling agents, and leveling agents.

第二組成物中亦可含有的光聚合起始劑、增黏劑及防靜電劑可使用上述第一組成物所列舉者。The photopolymerization initiator, the tackifier, and the antistatic agent which may be contained in the second composition may be those described in the above first composition.

第一及第二組成物所含的光聚合起始劑、增黏劑及防靜電劑可分別相同,或不同。The photopolymerization initiator, the tackifier and the antistatic agent contained in the first and second compositions may be the same or different.

(微粒子)(microparticles)

以提高折射率傾斜HC層硬度為目的,第二組成物所含有的微粒子可使用二氧化矽(SiO2)、氧化鋁(Al2O3)等。For the purpose of increasing the hardness of the refractive index by tilting the HC layer, cerium oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), or the like can be used as the fine particles contained in the second composition.

(分散劑)(Dispersant)

為了控制高折射率微粒子的分散性,亦可使用分散劑。In order to control the dispersibility of the high refractive index fine particles, a dispersing agent can also be used.

作為分散劑,可列舉例如,專利文獻3中記載之BYK Chem Japan(股)製之Disperbyk系列等之具有陰離子性極性基的分散劑。For example, a dispersant having an anionic polar group such as the Disperbyk series manufactured by BYK Chem Japan Co., Ltd. described in Patent Document 3 can be mentioned.

(防污劑)(antifouling agent)

防污劑為防止光學薄膜最表面污染,亦可進一步對折射率傾斜HC層賦予耐擦傷性。The antifouling agent can further impart scratch resistance to the gradient refractive index HC layer in order to prevent contamination of the outermost surface of the optical film.

作為防污劑,亦可使用先前公知的氟系化合物或矽系化合物等之防污劑(防污染劑)。As the antifouling agent, a conventionally known antifouling agent (antifouling agent) such as a fluorine compound or a lanthanoid compound can also be used.

作為防污劑,可列舉例如,日本專利特開2007-264279號公報中記載的防污染劑。The antifouling agent described in Japanese Laid-Open Patent Publication No. 2007-264279 is exemplified as the antifouling agent.

使用市售品之防污劑亦佳。作為此種市售品的防污劑(非反應性)為DIC(股)製之Megafac系列,可列舉例如,商品名MCF350-5、F445、F455、F178、F470、F475、F479、F477、TF1025、F478及F178K等東芝Silicon(股)製之TSF系列等、信越化學工業(股)製之X-22系列及KF系列等以及Thiso(股)製之Sailar Plane系列等。It is also preferable to use an antifouling agent of a commercial product. The antifouling agent (non-reactive) of such a commercially available product is a Megafac series manufactured by DIC Co., Ltd., for example, trade names MCF350-5, F445, F455, F178, F470, F475, F479, F477, TF1025 , such as the TSF series made by Toshiba Silicon Co., Ltd., such as F478 and F178K, the X-22 series and KF series manufactured by Shin-Etsu Chemical Co., Ltd., and the Sailar Plane series of Thiso.

作為市售品之防污劑(反應性),可列舉新中材化學工業(股)製之商品名SUA 1900 L10及商品名SUA 1900L6、Diacel UCB(股)製之商品名Ebecryl 350、商品名Ebecryl 1360及商品名KRM7039、日本合成化學工業(股)製之UT3971、DIC(股)製之商品名Difenser TF3001、商品名Difenser TF3000及商品名Difenser TF3028、共榮社化學(股)製之商品名Light Procoat AFC3000、信越化學工業(股)製之商品名KNS5300、GE東芝Silicone(股)製之商品名UVHC1105及UVHC8550及日本Paint(股)製之商品名ACS-1122等。As an antifouling agent (reactivity) of a commercial item, the brand name of the brand name SUA 1900 L10, the brand name SUA 1900 L6, and the name of Eacryl 350 manufactured by Diacel UCB, manufactured by Shinkansen Chemical Industry Co., Ltd., and the trade name are listed. Ebecryl 1360 and trade name KRM7039, UT3971, manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name Difenser TF3001, trade name Difenser TF3000, and trade name Difenser TF3028, manufactured by Kyoritsu Chemical Co., Ltd. Light Procoat AFC3000, trade name KNS5300 manufactured by Shin-Etsu Chemical Co., Ltd., trade name UVHC1105 and UVHC8550 manufactured by GE Toshiba Silicone Co., Ltd., and ACS-1122 manufactured by Japan Paint Co., Ltd., etc.

(勻塗劑)(leveling agent)

作為第二組成物所用之勻塗劑,可使用上述第一組成物所列舉者。As the leveling agent used for the second composition, those enumerated as the above first composition can be used.

使用勻塗劑時,其含量相對於第二黏合劑成分之質量使用5.0質量%以下為佳,且以使用0.1~3.0質量%為更佳。When the leveling agent is used, the content thereof is preferably 5.0% by mass or less based on the mass of the second binder component, and more preferably 0.1 to 3.0% by mass.

於本發明之光學薄膜之製造方法中,在上述(iv)步驟後,亦可進一步包含有(v)在上述折射率傾斜硬塗層上,直接或介隔著高折射率層形成低折射率層的步驟。In the method for producing an optical film of the present invention, after the step (iv), the method further includes (v) forming a low refractive index directly or via the high refractive index layer on the refractive index inclined hard coat layer. The steps of the layer.

如此積層低折射率層,則可更加提高光學薄膜的防止反射性。By laminating the low refractive index layer in this manner, the antireflection property of the optical film can be further improved.

高折射率層係比折射率傾斜HC層更高折射率之層,被設置於折射率傾斜HC層與低折射率層之間,具有更加提高光學薄膜之防止反射性的作用。The layer having a higher refractive index than the gradient refractive index HC layer of the high refractive index layer is provided between the gradient refractive index HC layer and the low refractive index layer, and has an effect of further improving the antireflection property of the optical film.

高折射率層,可作成先前公知之防止反射薄膜中所用的高折射率層。The high refractive index layer can be formed into a high refractive index layer used in the previously known antireflection film.

例如,可使用含有上述折射率傾斜HC層所列舉的高折射率微粒子、黏合劑成分及溶劑的組成物形成。For example, it can be formed using a composition containing the high refractive index fine particles, the binder component, and the solvent exemplified above for the gradient refractive index HC layer.

高折射率層之折射率,若比該高折射率層之光穿透性基材側所設置之折射率傾斜HC層更高即可。The refractive index of the high refractive index layer may be higher than the refractive index inclined HC layer provided on the light transmissive substrate side of the high refractive index layer.

又,上述高折射率微粒子中,使用導電性金屬氧化物下,可賦予防靜電性。Further, in the high refractive index fine particles, an antistatic property can be imparted by using a conductive metal oxide.

高折射率層的膜厚,若適當設定即可,例如,10~300nm為佳。The film thickness of the high refractive index layer may be appropriately set, and for example, 10 to 300 nm is preferable.

(低折射率層)(low refractive index layer)

低折射率層,被設置於折射率傾斜HC層或高折射率層之光穿透性基材對面側面,具有更加提高光學薄膜之防止反射性的作用。The low refractive index layer is provided on the opposite side surface of the light-transmitting substrate of the refractive index inclined HC layer or the high refractive index layer, and has an effect of further improving the antireflection property of the optical film.

低折射率層的折射率,若比折射率傾斜HC層及高折射率層更低即可,例如,1.49以下為佳,以1.47以下為更佳,且以1.42以下為特佳。The refractive index of the low refractive index layer may be lower than the refractive index gradient HC layer and the high refractive index layer, and is preferably 1.49 or less, more preferably 1.47 or less, and particularly preferably 1.42 or less.

低折射率層之膜厚若適當設定即可,例如,10~300nm為佳。The film thickness of the low refractive index layer may be appropriately set, and for example, 10 to 300 nm is preferable.

低折射率層可使用除了黏合劑成分、溶劑以外,含有低折射率化之低折射率微粒子、低折射率樹脂等之低折射率材料的組成物(以下,稱為「低折射率層用組成物」)形成。As the low refractive index layer, a composition of a low refractive index material such as a low refractive index fine particle or a low refractive index resin other than a binder component and a solvent (hereinafter referred to as "a composition for a low refractive index layer" can be used. ")").

此黏合劑成分及溶劑,可使用上述折射率傾斜HC層所列舉之高折射率微粒子、高折射率黏合劑成分以外的黏合劑成分及溶劑。As the binder component and the solvent, the high refractive index fine particles and the binder component other than the high refractive index binder and the solvent which are exemplified by the above-mentioned refractive index inclined HC layer can be used.

作為低折射率微粒子,使用專利文獻1中記載之具有空隙之微粒子(中空微粒子)和金屬氟化物為佳。As the low refractive index fine particles, fine particles (hollow fine particles) having a void described in Patent Document 1 and metal fluoride are preferably used.

具有空隙之微粒子的材料,為減低低折射率層之折射率,使用二氧化矽或氟樹脂為佳。The material having the voided fine particles is preferably a ruthenium oxide or a fluororesin for reducing the refractive index of the low refractive index layer.

具有空隙之微粒子的平均粒徑為5~300nm為佳,且以10~80nm為佳。The average particle diameter of the fine particles having a void is preferably from 5 to 300 nm, and more preferably from 10 to 80 nm.

作為金屬氟化物,使用先前公知之低折射率材料所用者即可,例如,可使用LiF(折射率1.4)、MgF2(氟化鎂、折射率1.4)、3NaF、AlF3(折射率1.4)、AlF3(折射率1.4)、Na3AlF6(冰晶石、折射率1.33)及NaMgF3(折射率1.36)等。As the metal fluoride, a conventionally known low refractive index material may be used. For example, LiF (refractive index 1.4), MgF 2 (magnesium fluoride, refractive index 1.4), 3NaF, AlF 3 (refractive index 1.4) may be used. AlF 3 (refractive index 1.4), Na 3 AlF 6 (cryolite, refractive index 1.33), and NaMgF 3 (refractive index 1.36).

作為低折射率樹脂,可列舉例如,硬化性氟樹脂。硬化性氟樹脂可列舉具有光硬化性基及/或熱硬化性基的氟樹脂。The low refractive index resin may, for example, be a curable fluororesin. The curable fluororesin may, for example, be a fluororesin having a photocurable group and/or a thermosetting group.

作為光硬化性基,可列舉例如,上述第一黏合劑成分所列舉的丙烯醯基、乙烯基、烯丙基等之乙烯性不飽和鍵及環氧基等之聚合性官能基。The photocurable group may, for example, be an ethylenic unsaturated group such as an acryloyl group, a vinyl group or an allyl group, or a polymerizable functional group such as an epoxy group.

作為熱硬化性基,可列舉例如,羥基、羧基、胺基、環氧基、環氧丙基、異氰酸酯基及烷氧基等。Examples of the thermosetting group include a hydroxyl group, a carboxyl group, an amine group, an epoxy group, a glycidyl group, an isocyanate group, and an alkoxy group.

作為具有光硬化性基之硬化性氟樹脂,可列舉例如,氟乙烯、偏氟乙烯、四氟乙烯、六氟乙烯、全氟丁二烯、全氟-2,2-二甲基-1,3-二唑等之氟烯烴類。Examples of the curable fluororesin having a photocurable group include vinyl fluoride, vinylidene fluoride, tetrafluoroethylene, hexafluoroethylene, perfluorobutadiene, and perfluoro-2,2-dimethyl-1. 3-two A fluoroolefin such as azole.

另外,作為具有光硬化性基之硬化性氟樹脂,可列舉(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3,3-五氟丙酯、(甲基)丙烯酸2-(全氟丁基(乙酯、(甲基)丙烯酸2-(全氟己基)乙酯、(甲基)丙烯酸2-(全氟辛基)乙酯、(甲基)丙烯酸2-(全氟癸基)乙酯、α-三氟甲基丙烯酸甲酯、α-三氟甲基丙烯酸乙酯等之(甲基)丙烯酸酯化合物、1分子中具有至少3個氟原子之碳數1~14的氟烷基、氟環烷基或氟伸烷基、與具有至少2個(甲基)丙烯醯氧基的含氟多官能(甲基)丙烯酸酯化合物等。Further, examples of the curable fluororesin having a photocurable group include 2,2,2-trifluoroethyl (meth)acrylate and 2,2,3,3,3-pentafluoropropene (meth)acrylate. Ester, 2-(perfluorobutyl (ethyl), 2-(perfluorohexyl)ethyl (meth)acrylate, 2-(perfluorooctyl)ethyl (meth)acrylate, ( a (meth) acrylate compound such as 2-(perfluorodecyl)ethyl methacrylate, α-trifluoromethyl methacrylate or α-trifluoromethyl acrylate, having at least 3 molecules in one molecule a fluorine atom having 1 to 14 carbon atoms, a fluorocycloalkyl group or a fluorine alkyl group, and a fluorine-containing polyfunctional (meth) acrylate compound having at least two (meth) acryloxy groups. .

作為具有熱硬化基之硬化性氟樹脂,可使用例如,4-氟乙烯-全氟烷基乙烯醚共聚合體、氟乙烯-烴系乙烯醚共聚合體及環氧樹脂、聚胺基甲酸酯樹脂、纖維素樹脂、苯酚樹脂及聚醯亞胺樹脂等之氟改質品等。As the curable fluororesin having a thermosetting group, for example, a 4-fluoroethylene-perfluoroalkyl vinyl ether copolymer, a fluoroethylene-hydrocarbon vinyl ether copolymer, an epoxy resin, or a polyurethane resin can be used. , fluorine modified products such as cellulose resin, phenol resin and polyimine resin.

此外,亦可使用日本專利特開2010-122603號公報中記載之含有氟原子的聚合性化合物的聚合體、共聚合體及含有聚矽氧之偏氟乙烯共聚合體。Further, a polymer, a copolymer, and a polyvinylidene fluoride-containing vinylidene fluoride copolymer containing a fluorine atom-containing polymerizable compound described in JP-A-2010-122603 can also be used.

上述低折射率材料亦可使用單獨1種,且亦可組合使用2種以上。The above-mentioned low refractive index material may be used alone or in combination of two or more.

低折射率微粒子之含量若適當調節使用即可,相對於低折射率層用組成物之黏合劑成分與低折射率微粒子的合計質量以50~90質量%為佳,且更佳為55~70質量%。The content of the low-refractive-index microparticles is preferably 50 to 90% by mass, and more preferably 55 to 70, based on the total mass of the binder component and the low-refractive-index microparticles of the composition for the low-refractive-index layer. quality%.

使用硬化性氟樹脂時,其含量若適當調節使用即可,相對於低折射率層用組成物之全固形份以5~95質量%為佳,且更佳為25~60質量%。When the curable fluororesin is used, the content thereof may be appropriately adjusted, and it is preferably 5 to 95% by mass, and more preferably 25 to 60% by mass based on the total solid content of the composition for the low refractive index layer.

於本發明之光學薄膜之製造方法的較佳實施態樣中,硬化形成上述低折射率層的低折射率層用組成物,含有中空二氧化矽微粒子。藉此具有可取得具更優異之防止反射性的光學薄膜的優點。In a preferred embodiment of the method for producing an optical film of the present invention, the composition for a low refractive index layer which forms the low refractive index layer is cured, and hollow cerium oxide fine particles are contained. Thereby, there is an advantage that an optical film having more excellent antireflection properties can be obtained.

根據本發明之光學薄膜之製造方法所得的光學薄膜中,如後述,於折射率傾斜HC層中,在折射率傾斜HC層的膜厚方向中,高折射率微粒子之存在量愈接近光穿透性基材側愈少。即,於折射率傾斜HC層中,在折射率傾斜HC層的膜厚方向中,愈接近低折射率層側界面,高折射率微粒子的存在量愈多,故折射率傾斜HC層之低折射率層側的界面及其附近的折射率,相比於以相同膜厚且含有相同含量之高折射率微粒子的HC層逐次塗佈形成之情況、和以單層1次塗佈法形成之情況,更可有效率提高。因此,將含有中空二氧化矽微粒子的低折射率層用組成物硬化而形成的低折射率層,在該折射率傾斜HC層上形成,則可增大折射率傾斜HC層之低折射率層側的界面部分與低折射率層的折射率差,且取得具有優異之防止反射性的光學薄膜。In the optical film obtained by the method for producing an optical film of the present invention, as described later, in the gradient-inclined HC layer, in the film thickness direction of the gradient-graded HC layer, the amount of the high-refractive-index microparticles is closer to the light penetration. The less the side of the substrate. That is, in the gradient-inclined HC layer, in the film thickness direction of the gradient-graded HC layer, the closer to the low-refractive-index layer-side interface, the more the amount of the high-refractive-index microparticles is present, so the refractive index is inclined to the low refractive index of the HC layer. The refractive index at the interface on the rate layer side and the vicinity thereof are formed by successively coating the HC layer having the same film thickness and containing the same content of the high refractive index fine particles, and the case of forming by the single layer one-time coating method. , can be more efficient. Therefore, by forming a low refractive index layer formed by curing a low refractive index layer containing hollow cerium oxide fine particles on the refractive index inclined HC layer, the low refractive index layer of the refractive index inclined HC layer can be increased. The interface portion on the side has a difference in refractive index from the low refractive index layer, and an optical film having excellent antireflection properties is obtained.

於本發明之光學薄膜之製造方法的其他較佳實施態樣中,硬化形成上述低折射率層的低折射率層用組成物,含有由金屬氟化物及硬化性氟樹脂所組成群中選出至少1種之低折射率材料。如此即使低折射率層用組成物含有氟系低折射率材料作為低折射率材料之情況,亦具有可取得具充分防止反射性之光學薄膜的優點。In another preferred embodiment of the method for producing an optical film of the present invention, the composition for forming a low refractive index layer of the low refractive index layer is cured, and at least one selected from the group consisting of a metal fluoride and a curable fluororesin is selected. One type of low refractive index material. In the case where the composition for a low refractive index layer contains a fluorine-based low refractive index material as a low refractive index material, there is an advantage that an optical film having sufficient antireflection properties can be obtained.

金屬氟化物和硬化性之氟樹脂等的氟系低折射率材料,因折射率不如中空二氧化矽微粒子低,故降低低折射率層之折射率的效果比中空二氧化矽微粒子小。A fluorine-based low refractive index material such as a metal fluoride or a curable fluororesin has a lower refractive index than the hollow ceria particles, so that the effect of lowering the refractive index of the low refractive index layer is smaller than that of the hollow ceria particles.

根據先前之逐次塗佈和單層1次塗佈所形成之低折射率層/高折射率層(高折射率HC層)/基材之層構成的光學薄膜。如上述因為無法有效率提高高折射率層(高折射率HC層)之低折射率層側界面及其附近的折射率,故若於形成低折射率層之組成物中使用上述氟系低折射率材料,則無法取得充分的防止反射性。又,即使經由先前的逐次塗佈可提高高折射率層(高折射率HC層)之低折射率層側界面及其附近的折射率,亦在該高折射率層(高折射率HC層)與基材或該層之基材側層之間發生層界面,並且發生干涉條紋。An optical film composed of a layer of a low refractive index layer/high refractive index layer (high refractive index HC layer)/substrate formed by successive coating and single layer coating. As described above, since the refractive index of the low refractive index layer side interface and the vicinity thereof of the high refractive index layer (high refractive index HC layer) cannot be efficiently increased, the fluorine-based low refractive index is used in the composition for forming the low refractive index layer. At the rate of material, sufficient anti-reflection properties cannot be obtained. Further, even if the refractive index of the low refractive index layer side interface and the vicinity thereof of the high refractive index layer (high refractive index HC layer) can be increased by the previous sequential coating, the high refractive index layer (high refractive index HC layer) is also used. A layer interface occurs between the substrate or the substrate side layer of the layer, and interference fringes occur.

相對地,若根據本發明之光學薄膜之製造方法的上述較佳實施態樣,則如上述,可有效率提高折射率傾斜HC層之低折射率層側界面及其附近的折射率,並且亦可抑制干涉條紋的發生,故即使在低折射率層用組成物中使用氟系低折射率材料,亦可取得具有充分防止反射性的光學薄膜。In contrast, according to the above preferred embodiment of the method for producing an optical film of the present invention, as described above, the refractive index of the low refractive index layer side interface of the refractive index tilting HC layer and its vicinity can be efficiently increased, and Since the occurrence of interference fringes can be suppressed, even if a fluorine-based low refractive index material is used for the composition for a low refractive index layer, an optical film having sufficient antireflection properties can be obtained.

於本發明之光學薄膜之製造方法的其他較佳實施態樣中,硬化形成上述低折射率層的低折射率層用組成物,不含有中空二氧化矽微粒子,而含有由金屬氟化物及硬化性氟樹脂所組成群中選出至少1種的低折射率材料。如此,低折射率層用組成物不含有中空二氧化矽微粒子,而含有氟系低折射率材料作為低折射率材料時,具有可使充分的防止反射性和耐鹼化性兩相成立的優點。In another preferred embodiment of the method for producing an optical film of the present invention, the composition for forming a low refractive index layer of the low refractive index layer is hardened, and does not contain hollow ceria particles, but contains metal fluoride and hardens. At least one low refractive index material is selected from the group consisting of fluororesins. When the composition for a low refractive index layer does not contain hollow ceria particles, and the fluorine-based low refractive index material is used as a low refractive index material, it has the advantage that sufficient both antireflection and alkali resistance can be established. .

通常,於偏光元件的一側貼合光學薄膜製作偏光板時,將光學薄膜浸漬於鹼溶液中,並且進行將該光學薄膜的基材側表面親水化之處理(以下,稱為「鹼化處理」)。但是,在光學薄膜的最表面層含有二氧化矽微粒子(中空二氧化矽微粒子)之情況,該中空二氧化矽微粒子經由鹼化處理而由該最表面層脫落,並且具有易流出或溶解於鹼溶液中的性質。When the polarizing plate is bonded to the optical film on one side of the polarizing element, the optical film is immersed in an alkali solution, and the substrate side surface of the optical film is hydrophilized (hereinafter referred to as "alkaline treatment". "). However, in the case where the outermost layer of the optical film contains cerium oxide microparticles (hollow cerium oxide microparticles), the hollow cerium oxide microparticles are detached from the outermost layer by alkalization treatment, and have an easy flow or dissolution in the alkali The nature of the solution.

將最表面具有含中空二氧化矽微粒子之低折射率層的光學薄膜予以鹼化處理之情況,若中空二氧化矽微粒子經由鹼化處理而脫落,則中空二氧化矽微粒子的含量減少,因此低折射率層的折射率提高,有無法取得所需之防止反射性之虞。又,若中空二氧化矽微粒子於鹼溶液中流出或溶解,則有污渘鹼溶液之虞。When the optical film having the low refractive index layer containing the hollow cerium oxide fine particles on the outermost surface is alkalized, if the hollow cerium oxide fine particles are detached by alkalization treatment, the content of the hollow cerium oxide fine particles is reduced, so that it is low. The refractive index of the refractive index layer is increased, and there is a possibility that the desired antireflection property cannot be obtained. Further, if the hollow cerium oxide fine particles are discharged or dissolved in the alkali solution, there is a flaw in the contaminated alkali solution.

以往,將耐鹼化性低的光學薄膜予以鹼化處理之情況,在含有二氧化矽微粒子(中空二氧化矽微粒子)之最表面層(低折射率層)貼附保護薄膜,將最表面層(低折射率層)由鹼化處理的鹼溶液中加以保護。但是,在貼附保護薄膜,於鹼化處理後除去保護薄膜的方法中,步驟數和保護薄膜的成本增加,且光學薄膜的製造成本增大。In the case where the optical film having low alkali resistance is alkalized, a protective film is attached to the outermost layer (low refractive index layer) containing cerium oxide fine particles (hollow cerium oxide fine particles), and the outermost layer is applied. The (low refractive index layer) is protected by an alkalized alkali solution. However, in the method of attaching the protective film and removing the protective film after the alkalizing treatment, the number of steps and the cost of the protective film are increased, and the manufacturing cost of the optical film is increased.

相對地,若根據本發明之光學薄膜之製造方法的上述較佳實施態樣,則如上述,因可有效率提高折射率傾斜HC層之低折射率層側界面及其附近的折射率,故經由低折射率層用組成物不含有中空二氧化矽微粒子,而含有氟系低折射率材料,則可取得充分之防止反射性和耐鹼化性兩個成立的光學薄膜。In contrast, according to the above preferred embodiment of the method for producing an optical film of the present invention, as described above, since the refractive index of the low refractive index layer side interface and the vicinity thereof of the refractive index tilting HC layer can be efficiently increased, When the composition for a low refractive index layer does not contain hollow ceria particles and contains a fluorine-based low refractive index material, an optical film having sufficient antireflection properties and alkali resistance can be obtained.

因此,使用上述較佳實施態樣之光學薄膜進行鹼化處理之情況,不需要保護薄膜,且可減低步驟數和製造成本。Therefore, in the case where the optical film of the above preferred embodiment is subjected to alkalization treatment, the protective film is not required, and the number of steps and the manufacturing cost can be reduced.

於低折射率層中,亦可含有上述折射率傾斜HC層所列舉的光聚合起始劑和防污劑。The photopolymerization initiator and the antifouling agent exemplified above for the gradient refractive index HC layer may be contained in the low refractive index layer.

低折射率層和高折射率層如上述,若將含有黏合劑成分和溶劑的組成物同硬塗層塗佈,硬化形成即可。此外,低折射率層和高折射率層亦可經由真空蒸鍍、濺鍍、等離子體CVD、離子電鍍等之氣相法(或乾式塗敷法)形成。As described above, the low refractive index layer and the high refractive index layer may be formed by coating a composition containing a binder component and a solvent with a hard coat layer. Further, the low refractive index layer and the high refractive index layer may be formed by a vapor phase method (or a dry coating method) such as vacuum deposition, sputtering, plasma CVD, or ion plating.

於本發明之光學薄膜之製造方法中,在上述(i)步驟與(iii)步驟之間,亦可進一步包含(vi)在上述光穿透性基材之設置折射率傾斜硬塗層面形成防靜電層的步驟。In the method for producing an optical film of the present invention, the step (i) and the step (iii) may further comprise (vi) forming a refractive index oblique hard coat surface on the light-transmitting substrate. The step of the antistatic layer.

設置防靜電層,可更加提高光學薄膜的防靜電性。By providing an antistatic layer, the antistatic property of the optical film can be further improved.

防靜電層可使用含有防靜電劑、黏合劑成分及溶劑的組成物形成。The antistatic layer can be formed using a composition containing an antistatic agent, a binder component, and a solvent.

防靜電劑可使用上述折射率傾斜HC層所列舉者。As the antistatic agent, those exemplified by the above-mentioned refractive index inclined HC layer can be used.

防靜電劑之含量,相對於形成防靜電層之組成物的黏合劑成分質量使用50~400質量%為佳。The content of the antistatic agent is preferably from 50 to 400% by mass based on the mass of the binder component of the composition forming the antistatic layer.

形成防靜電層之組成物所含的黏合劑成分及溶劑,可使用上述折射率傾斜HC層所列舉的黏合劑成分及溶劑。As the binder component and the solvent contained in the composition of the antistatic layer, the binder component and the solvent exemplified by the above-mentioned refractive index gradient HC layer can be used.

於本發明之光學薄膜之製造方法中,在不損害光學薄膜之防止反射性的範圍中,亦可包含在光學薄膜之具有折射率傾斜HC層面側的最表面(光學薄膜之光穿透性基材對面側面),進一步設置防污層的步驟。In the method for producing an optical film of the present invention, in the range in which the antireflection property of the optical film is not impaired, it may be included in the outermost surface of the optical film having the gradient of the refractive index of the HC layer (the light penetrating base of the optical film) The opposite side of the material), the step of further providing an antifouling layer.

在最表面設置防污層,則可對光學薄膜賦予防污性及耐擦傷性等。When an antifouling layer is provided on the outermost surface, the optical film can be provided with antifouling properties, scratch resistance, and the like.

防污層可使用含有防污劑、黏合劑成分及溶劑之組成物形成。The antifouling layer can be formed using a composition containing an antifouling agent, a binder component, and a solvent.

防污劑可使用上述折射率傾斜HC層所列舉的勻塗劑和防污劑。As the antifouling agent, a leveling agent and an antifouling agent exemplified as the above-mentioned refractive index inclined HC layer can be used.

防污劑之含量,若根據要求性能適當調節即可。The content of the antifouling agent can be appropriately adjusted according to the required performance.

形成防污層之組成物所含的黏合劑成分及溶劑,可使用上述折射率傾斜HC層所列舉的高折射率黏合劑成分以外的黏合劑成分及溶劑。As the binder component and the solvent contained in the composition forming the antifouling layer, a binder component and a solvent other than the high refractive index binder component exemplified by the above-mentioned refractive index gradient HC layer can be used.

防污層的膜厚若適當設定即可,例如,10~300nm為佳。The film thickness of the antifouling layer may be appropriately set, and for example, 10 to 300 nm is preferable.

於本發明之光學薄膜之製造方法的(iii)步驟中,將第一組成物與第二組成物同時塗佈的方法並無特別限定,可使用先前公知的同時塗佈方法。In the step (iii) of the method for producing an optical film of the present invention, the method of simultaneously coating the first composition and the second composition is not particularly limited, and a conventionally known simultaneous coating method can be used.

作為同時塗佈方法,可列舉例如,具有2個以上狹縫(吐出口)之字模塗敷及滑動塗敷等。Examples of the simultaneous coating method include a die coating and a sliding coating having two or more slits (discharge ports).

圖2係示出使用擠出型字模塗敷器之同時塗佈方法之一例的示意圖。Fig. 2 is a schematic view showing an example of a simultaneous coating method using an extrusion type die coater.

在光穿透性基材10上由字模塗敷器頭部40之狹縫51及52,分別將第一硬塗層用硬化性樹脂組成物60及第二硬塗層用硬化性樹脂組成物70,在光穿透性基材側以位於第一硬塗層用硬化性樹脂組成物60般鄰接並同時塗佈,作成第一硬塗層用硬化性樹脂組成物的塗膜61及第二硬塗層用硬化性樹脂組成物的塗膜71。另外,於圖2中,第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物本來呈一體形成1個硬塗層,但為了便利說明將該二種組成物和其塗膜分開顏色記載。The curable resin composition 60 for the first hard coat layer and the curable resin composition for the second hard coat layer are respectively formed on the light-transmitting substrate 10 by the slits 51 and 52 of the die coater head portion 40. In the case of the light-permeable substrate, the coating film 61 and the second coating of the curable resin composition for the first hard coat layer are formed adjacent to each other and applied at the same time as the curable resin composition 60 for the first hard coat layer. A coating film 71 of a curable resin composition for a hard coat layer. In addition, in FIG. 2, the first hard coat layer curable resin composition and the second hard coat layer curable resin composition are integrally formed into one hard coat layer, but the two compositions are conveniently described. It is separated from the color of the coating film.

又,同時塗佈時之第一組成物與第二組成物的濕膜厚,根據所要求性能適當調節即可。Further, the wet film thickness of the first composition and the second composition at the time of application may be appropriately adjusted depending on the desired properties.

將第一組成物之濕膜厚定為T1、第二組成物之塗膜的濕膜厚定為T2時,T2/T1(即,T2÷T1)為0.01~1,於折射率傾斜HC層之膜厚方向中,由光穿透性基材對面側界面直到折射率傾斜HC層之乾燥膜厚70%為止的區域,易分佈存在高折射率微粒子全量的70~100%,且由有效率控制高折射率微粒子分佈方面而言為佳。When the wet film thickness of the first composition is set to T1 and the wet film thickness of the coating film of the second composition is T2, T2/T1 (ie, T2÷T1) is 0.01 to 1, and the refractive index is inclined to the HC layer. In the film thickness direction, the region from the surface side interface of the light-transmitting substrate to the dry film thickness of the refractive index-inclination HC layer is 70%, and 70 to 100% of the total amount of the high-refractive-index particles is easily distributed, and the efficiency is high. It is preferable to control the distribution of the high refractive index fine particles.

另外,濕膜厚可由被塗佈體之搬送速度及面積以及組成物的吐出量求出。Further, the wet film thickness can be determined from the conveyance speed and area of the object to be coated and the discharge amount of the composition.

於本發明之光學薄膜之製造方法之(iv)步驟中,光照射主要使用紫外線、可見光、電子束或電離放射線等。於紫外線硬化之情況,可使用由超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧燈、氙弧燈或金屬鹵素燈等光線所發生的紫外線等。光照射量以紫外線波長365nm之積分曝光量計,若為50~300mJ/cm2即可。In the step (iv) of the method for producing an optical film of the present invention, ultraviolet light, visible light, electron beam or ionizing radiation or the like is mainly used for light irradiation. In the case of ultraviolet curing, ultraviolet rays generated by light such as an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a xenon arc lamp, or a metal halide lamp can be used. The amount of light irradiation may be 50 to 300 mJ/cm 2 in terms of an integrated exposure amount of an ultraviolet wavelength of 365 nm.

又,於(iv)步驟中,在光照射前視需要亦可進行適當乾燥。作為乾燥方法,可列舉例如,減壓乾燥或加熱乾燥、以及組合該等乾燥的方法等。又,以常壓乾燥之情況,於30~110℃乾燥為佳。例如,使用甲基異丁基酮作為第一或第二溶劑時,通常以室溫~80℃、較佳為40℃~70℃範圍內之溫度,以20秒鐘~3分鐘、較佳為30秒鐘~1分鐘左右之時間進行乾燥。Further, in the step (iv), it may be appropriately dried before the light irradiation as needed. Examples of the drying method include a method of drying under reduced pressure or heating, and a method of combining the drying. Further, it is preferably dried at 30 to 110 ° C in the case of drying under normal pressure. For example, when methyl isobutyl ketone is used as the first or second solvent, it is usually at a temperature ranging from room temperature to 80 ° C, preferably from 40 ° C to 70 ° C, for 20 seconds to 3 minutes, preferably Dry for about 30 seconds to 1 minute.

(iv)步驟中所形成的折射率傾斜HC層之膜厚,根據所要求之硬度及防止反射性等適當調節即可。折射率傾斜HC層的膜厚例如可為1~20μm。(iv) The refractive index of the HC layer formed in the step may be appropriately adjusted according to the required hardness, antireflection property, and the like. The film thickness of the gradient refractive index HC layer may be, for example, 1 to 20 μm.

(光學薄膜)(optical film)

本發明之第一光學薄膜,其特徵為根據上述光學薄膜之製造方法所得者。The first optical film of the present invention is characterized by the method of producing the optical film described above.

本發明之第二光學薄膜,係在光穿透性基材的一面側,至少設置折射率傾斜硬塗層的光學薄膜,其特徵為該折射率傾斜硬塗層含有平均粒徑1~100nm的高折射率微粒子,且於該折射率傾斜硬塗層中,在該折射率傾斜硬塗層的膜厚方向,該高折射率微粒子的存在量愈接近該光穿透性基材側愈少。The second optical film of the present invention is an optical film having at least one refractive index oblique hard coat layer on one side of the light-transmitting substrate, wherein the refractive index oblique hard coat layer has an average particle diameter of 1 to 100 nm. The high refractive index fine particles, and in the refractive index oblique hard coat layer, the amount of the high refractive index fine particles is less toward the light transmissive substrate side in the film thickness direction of the gradient refractive index hard coat layer.

圖3係示意性示出本發明之光學薄膜的層構成及折射率傾斜HC層內之膜厚方向中之高折射率微粒子的分佈一例的剖面圖。3 is a cross-sectional view schematically showing an example of a layer configuration of an optical film of the present invention and a distribution of high refractive index fine particles in a film thickness direction in a refractive index gradient HC layer.

於圖3中,光學薄膜1在光穿透性基材10上設置折射率傾斜硬塗層20。其次,於折射率傾斜硬塗層20中,在折射率傾斜硬塗層的膜厚方向,高折射率微粒子的存在量愈接近光穿透性基材側愈少。In FIG. 3, the optical film 1 is provided with a refractive index oblique hard coat layer 20 on the light-transmitting substrate 10. Next, in the refractive index-inclined hard coat layer 20, the amount of the high refractive index fine particles is less toward the light-transmitting substrate side in the film thickness direction of the gradient refractive index hard coat layer.

圖4係示意性示出本發明之光學薄膜之層構成之另一例的剖面圖。另外,為了簡化說明,於圖4~6中,省略折射率傾斜HC層內的高折射率微粒子。Fig. 4 is a cross-sectional view schematically showing another example of the layer constitution of the optical film of the present invention. In addition, in order to simplify the description, in FIGS. 4 to 6, the high refractive index fine particles in the refractive index gradient HC layer are omitted.

在光穿透性基材10上,由該光穿透性基材側依序設置折射率傾斜硬塗層20及低折射率層80。On the light-transmitting substrate 10, a refractive index oblique hard coat layer 20 and a low refractive index layer 80 are sequentially provided from the side of the light-transmitting substrate.

於上述光學薄膜之製造方法中,在(iv)步驟後,進一步設置(v)在上述折射率傾斜硬塗層上,直接形成低折射率層之步驟,則可取得此種層構成的光學薄膜。In the above method for producing an optical film, after the step (iv), the step of directly forming the low refractive index layer on the refractive index oblique hard coat layer is further provided, and an optical film having such a layer can be obtained. .

圖5係示意性示出本發明之光學薄膜之層構成之另一例的剖面圖。Fig. 5 is a cross-sectional view schematically showing another example of the layer constitution of the optical film of the present invention.

在光穿透性基材10上,由該光穿透性基材側依序設置折射率傾斜硬塗層20、高折射率層90及低折射率層80。On the light-transmitting substrate 10, a refractive index oblique hard coat layer 20, a high refractive index layer 90, and a low refractive index layer 80 are sequentially provided from the light-transmitting substrate side.

於上述光學薄膜之製造方法中,在(iv)步驟後,進一步設置(v)在上述折射率傾斜硬塗層上,介隔著高折射率層形成低折射率層之步驟,則可取得此種層構成的光學薄膜。In the method for producing an optical film described above, after the step (iv), the step of forming a low refractive index layer on the refractive index oblique hard coat layer and the high refractive index layer is further provided. An optical film composed of a seed layer.

圖6係示意性示出本發明之光學薄膜之層構成之另一例的剖面圖。Fig. 6 is a cross-sectional view schematically showing another example of the layer constitution of the optical film of the present invention.

在光穿透性基材10上,由該光穿透性基材側依序設置防靜電層100、折射率傾斜硬塗層20、高折射率層90及低折射率層80。On the light-transmitting substrate 10, an antistatic layer 100, a refractive index-increasing hard coat layer 20, a high refractive index layer 90, and a low refractive index layer 80 are sequentially provided from the light-transmitting substrate side.

於上述光學薄膜之製造方法中,在(i)步驟與(iii)步驟之間,進一步設置(vi)在上述光穿透性基材之設置折射率傾斜硬塗層面形成防靜電層之步驟,則可取得此種層構成的光學薄膜。經由設置防靜電層,則可對光學薄膜賦予防靜電性。In the above method for producing an optical film, between (i) step and (iii), a step (vi) of forming an antistatic layer on the surface of the light-transmitting substrate at which the refractive index is inclined to the hard coat layer is further provided An optical film of such a layer can be obtained. By providing an antistatic layer, the optical film can be provided with antistatic properties.

本發明之第一光學薄膜,如上述,經由使用不含有特定黏度之高折射率微粒子的第一組成物和含有特定黏度之高折射率微粒子的第二組成物,並具有將該2種組成物以第1組成物比第2組成物更位於光穿透性基材側般鄰接且同時塗佈形成的折射率傾斜HC層,則可於該折射率傾斜HC層中,在該折射率傾斜HC層的膜厚方向,高折射率微粒子愈接近光穿透性基材側存在量愈少。因此,於折射率傾斜HC層之光穿透性基材側界面中,可抑制因高折射率微粒子與光穿透性基材或防靜電層等下層之折射率差所發生的干涉條紋,並且光學薄膜的外觀優異。The first optical film of the present invention, as described above, has a first composition containing high refractive index fine particles not containing a specific viscosity and a second composition containing high refractive index fine particles having a specific viscosity, and has the two compositions In the gradient-inclination HC layer in which the first composition is adjacent to the light-transmitting substrate side and coated at the same time as the second composition, the refractive index is inclined at the HC layer. The film thickness direction of the layer, the closer the high refractive index particles are to the side of the light penetrating substrate. Therefore, in the light transmissive substrate side interface of the gradient refractive index HC layer, interference fringes due to the difference in refractive index between the high refractive index microparticles and the lower layer such as the light transmissive substrate or the antistatic layer can be suppressed, and The optical film is excellent in appearance.

又,高折射率微粒子於折射率傾斜HC層內未均勻分佈,且多分佈於上層側,故可將折射率傾斜HC層之光穿透性基材對面側面有效率地高折射率化。因此,在該折射率傾斜HC層之光穿透性基材對面側面側,如圖4及圖5所示般設置低折射率層,則可提高光學薄膜的防止反射性。Further, since the high refractive index fine particles are not uniformly distributed in the gradient refractive index HC layer and are distributed on the upper layer side, the refractive index can be made to have a high refractive index on the opposite side surface of the light-transmitting substrate of the HC layer. Therefore, when the low refractive index layer is provided on the opposite side surface side of the light-transmitting substrate of the refractive index-inclined HC layer as shown in FIGS. 4 and 5, the antireflection property of the optical film can be improved.

於本發明之光學薄膜之較佳實施態樣中,上述低折射率層含有中空二氧化矽微粒子。藉此,係有光學薄膜具有優異之防止反射性的優點。In a preferred embodiment of the optical film of the present invention, the low refractive index layer contains hollow ceria particles. Thereby, there is an advantage that the optical film has excellent antireflection properties.

本發明之光學薄膜中,如圖3所示般,於折射率傾斜HC層中,在折射率傾斜HC層的膜厚方向,愈接近低折射率層側界面的部分,高折射率微粒子的存在量愈多,故折射率傾斜HC層之低折射率層側界面及其附近的折射率高。於該折射率傾斜HC層上之低折射率層中含有中空二氧化矽微粒子之情況,折射率傾斜HC層之低折射率層側之界面部分與低折射率層之折射率差大,且光學薄膜具有優異的防止反射性。In the optical film of the present invention, as shown in FIG. 3, in the gradient-inclined HC layer, in the film thickness direction of the gradient-graded HC layer, the portion closer to the interface of the low-refractive-index layer side, the presence of high-refractive-index microparticles The larger the amount, the higher the refractive index of the low-refractive-index layer side interface of the refractive index-inclination HC layer and its vicinity. In the case where the low-refractive-index layer on the gradient-inclination HC layer contains hollow ceria particles, the difference in refractive index between the interface portion on the low-refractive-index layer side of the refractive index-inclined HC layer and the low-refractive-index layer is large, and the optical The film has excellent antireflection properties.

於本發明之光學薄膜之其他的較佳實施態樣中,即使上述低折射率層含有由金屬氟化物及氟樹脂所組成群中選出至少1種之低折射率成分之情況,亦可取得具有充分防止反射性的光學薄膜。In another preferred embodiment of the optical film of the present invention, even if the low refractive index layer contains at least one low refractive index component selected from the group consisting of a metal fluoride and a fluororesin, A reflective optical film is sufficiently prevented.

於本發明之光學薄膜之其他的較佳實施態樣中,上述低折射率層不含有中空二氧化矽微粒子,且含有由金屬氟化物及氟樹脂所組成群中選出至少1種的低折射率成分,就充分的防止反射性和耐鹼化性可兩相成立的觀點而言為佳。又,若使用此較佳實施態樣的光學薄膜,則在鹼化處理中不需要保護薄膜,可以低成本製作偏光板。In another preferred embodiment of the optical film of the present invention, the low refractive index layer does not contain hollow ceria particles, and contains at least one low refractive index selected from the group consisting of metal fluorides and fluororesins. The composition is preferable in terms of sufficient prevention of reflectance and alkali resistance. Further, when the optical film of the preferred embodiment is used, a protective film is not required in the alkalization treatment, and the polarizing plate can be produced at low cost.

本發明之光學薄膜所適宜設置的低折射率層、高折射率層、防靜電層及防污層,於光學薄膜之製造方法中已說明,故此處省略說明。The low refractive index layer, the high refractive index layer, the antistatic layer, and the antifouling layer which are suitably provided in the optical film of the present invention have been described in the method for producing an optical film, and thus the description thereof will be omitted.

本發明之光學薄膜之較佳實施態樣中,在上述折射率傾斜硬塗層中,由上述光穿透性基材對面側界面直到該折射率傾斜硬塗層膜厚之70%為止之區域中,存在上述高折射率微粒子全量的90%以上。In a preferred embodiment of the optical film of the present invention, in the refractive index oblique hard coat layer, the surface of the light-transmitting substrate opposite to the surface side until the refractive index is inclined to 70% of the film thickness of the hard coat layer In the above, 90% or more of the total amount of the high refractive index fine particles is present.

如圖3所示般,於折射率傾斜HC層中,由光穿透性基材對面側界面直到光穿透性基材側為止之折射率傾斜HC層膜厚的70%為止的區域中,存在高折射率微粒子的90%以上,且折射率傾斜HC層之光穿透性基材側界面存在的高折射率微粒子變少,更可抑制折射率傾斜HC層與光穿透性基材和防靜電層間的干涉條紋發生。As shown in FIG. 3, in the region where the refractive index is inclined, the refractive index of the light-transmitting substrate from the surface side interface to the light-transmitting substrate side is inclined to 70% of the film thickness of the HC layer. 90% or more of the high refractive index fine particles are present, and the high refractive index fine particles existing at the light transmissive substrate side interface of the refractive index inclined HC layer are less, and the refractive index tilting HC layer and the light transmissive substrate are further suppressed. Interference fringes between the antistatic layers occur.

另外,雖以圖3為例說明,但此折射率傾斜HC層內之高折射率微粒子的分佈,亦可如圖4~6般,設置其他層形成。Further, although FIG. 3 is taken as an example, the distribution of the high refractive index fine particles in the refractive index inclined HC layer may be formed by providing other layers as shown in FIGS. 4 to 6.

於本發明之光學薄膜中,於上述折射率傾斜硬塗層中,亦可作成在上述光穿透性基材側之界面附近區域含有增黏劑的態樣,以及折射率傾斜硬塗層全體中含有增黏劑的態樣。In the optical film of the present invention, in the above-mentioned refractive index oblique hard coat layer, a tackifier may be formed in the vicinity of the interface on the side of the light-transmitting substrate, and the refractive index inclined hard coat layer may be entirely Contains the appearance of a tackifier.

如上述,在形成折射率傾斜HC層之第一組成物中含有用以調整黏度之增黏劑時,折射率傾斜HC層之光穿透性基材側之界面附近區域,因為主要由第一組成物所形成,故於此區域中變成含有此增黏劑。As described above, when the first composition for forming the gradient-inclination HC layer contains the tackifier for adjusting the viscosity, the refractive index is inclined to the vicinity of the interface of the light-transmitting substrate side of the HC layer because it is mainly composed of Since the composition is formed, it becomes contained in this region.

又,於第一組成物及第二組成物兩者含有增黏劑之情況,變成在折射率傾斜HC層全體含有增黏劑。Further, when both the first composition and the second composition contain a tackifier, the viscosity-increasing HC layer contains a tackifier.

[實施例][Examples]

以下,列舉實施例,更加具體說明本發明。本發明不被此記載所限制。Hereinafter, the present invention will be described more specifically by way of examples. The invention is not limited by this description.

作為高折射率微粒子溶膠(1),使用日產化學工業(股)製之ZnSb2O6的異丙醇分散液、商品名CX-Z210IP-F2(平均粒徑15nm、固形份20%分散液)。As the high refractive index fine particle sol (1), an isopropyl alcohol dispersion of ZnSb 2 O 6 manufactured by Nissan Chemical Industries Co., Ltd., trade name CX-Z210IP-F2 (average particle diameter: 15 nm, solid content 20% dispersion) was used. .

作為高折射率微粒子溶膠(2),使用日產化學工業(股)製之PTO:磷酸摻混氧化錫的異丙醇分散液、商品名CX-S303IP(平均粒徑15nm、固形份30%分散液)。As the high refractive index granule sol (2), a PTO: phosphoric acid-doped tin oxide-containing isopropyl alcohol dispersion manufactured by Nissan Chemical Industries Co., Ltd., trade name CX-S303IP (average particle diameter 15 nm, solid content 30% dispersion liquid) was used. ).

作為高折射率微粒子溶膠(3),使用日產化學工業(股)製之ZrO2的MEK分散液、商品名OZ-S30K(平均粒徑10nm、固形份30%分散液)。As the high refractive index fine particle sol (3), a MEK dispersion of ZrO 2 manufactured by Nissan Chemical Industries Co., Ltd., trade name OZ-S30K (average particle diameter: 10 nm, solid content: 30% dispersion) was used.

作為低折射率微粒子,使用中空二氧化矽微粒子(平均一次粒徑50nm、固形份20%、空隙率40%)。As the low refractive index fine particles, hollow ceria fine particles (average primary particle diameter: 50 nm, solid content: 20%, void ratio: 40%) were used.

作為金屬氟化物,使用CI化成(股)製之冰晶石(Na3AlF6)、固形份15% MIBK溶液。As the metal fluoride, a cryolite (Na 3 AlF 6 ) manufactured by CI Chemical Co., Ltd., and a solid 15% MIBK solution were used.

作為黏合劑成分(1),使用新中村化學工業(股)製之多官能胺基甲酸酯丙烯酸酯、商品名U-4HA(分子量600、官能基數4)。As the binder component (1), a polyfunctional urethane acrylate manufactured by Shin-Nakamura Chemical Co., Ltd., trade name U-4HA (molecular weight 600, functional group number 4) was used.

作為黏合劑成分(2),使用日本化藥(股)製之商品名KAYARAD-DPHA(DPPA(二季戊四醇五丙烯酸酯:5官能)與DPHA(二季戊四醇六丙烯酸酯:6官能)的混合物)。As the binder component (2), a product name KAYARAD-DPHA (a mixture of DPPA (dipentaerythritol pentaacrylate: 5-functional) and DPHA (dipentaerythritol hexaacrylate: 6-functional)) manufactured by Nippon Kayaku Co., Ltd. was used.

作為黏合劑成分(3),使用日本化藥(股)製之季戊四醇三丙烯酸酯。As the binder component (3), pentaerythritol triacrylate manufactured by Nippon Kayaku Co., Ltd. was used.

作為黏合劑成分(4),使用共榮社化學工業(股)製之商品名LINC-3A(氟單體)As the binder component (4), the trade name LINC-3A (fluorinated monomer) manufactured by Kyoeisha Chemical Industry Co., Ltd. is used.

作為溶劑(1),使用對TAC基材具有浸透性的甲基乙基酮。As the solvent (1), methyl ethyl ketone which is impregnated with the TAC substrate is used.

作為溶劑(2),使用對於TAC基材不具有浸透性的異丙醇。As the solvent (2), isopropyl alcohol which does not have permeability to the TAC substrate is used.

作為溶劑(3),使用甲基異丁基酮。As the solvent (3), methyl isobutyl ketone was used.

作為增黏劑,使用日本曹達(股)製之商品名Selney HPC-M(羥丙基纖維素)。As the tackifier, Selney HPC-M (hydroxypropylcellulose) manufactured by Nippon Soda Co., Ltd. was used.

作為光聚合起始劑(1),使用Ciba Specialty Chemicals(股)製之商品名IRGACURE 184。As the photopolymerization initiator (1), trade name IRGACURE 184 manufactured by Ciba Specialty Chemicals Co., Ltd. was used.

作為光聚合起始劑(2),使用Ciba Specialty Chemicals(股)製之商品名IRGACLRE 127。As the photopolymerization initiator (2), trade name IRGACLRE 127 manufactured by Ciba Specialty Chemicals Co., Ltd. was used.

作為防污劑,使用信越化學工業(股)製之X-22-164E(反應性聚矽氧系防污劑)。As the antifouling agent, X-22-164E (reactive polyxanthoxy antifouling agent) manufactured by Shin-Etsu Chemical Co., Ltd. was used.

作為光穿透性基材,使用高士軟片(股)製之TAC基材、商品名TF 80UL(厚度80μm、折射率1.47)。As the light-transmitting substrate, a TAS substrate made of a Coats wafer (trade name), trade name: TF 80UL (thickness: 80 μm, refractive index: 1.47) was used.

各化合物的簡稱分別如下。The abbreviations of the respective compounds are as follows.

IPA:異丙醇IPA: isopropanol

MEK:甲基乙基酮MEK: methyl ethyl ketone

MIBK:甲基異丁基酮MIBK: methyl isobutyl ketone

PETA:季戊四醇三丙烯酸酯PETA: pentaerythritol triacrylate

TAC:三乙醯纖維素TAC: triacetyl cellulose

(組成物之調製)(modulation of composition)

分別,配合下述所示組成之成分調製組成物。The composition was prepared by mixing the components of the composition shown below.

(第一硬塗層用硬化性樹脂組成物1、黏度5.3mPa‧s)(curable resin composition for the first hard coat layer 1, viscosity 5.3 mPa ‧ s)

黏合劑成分(1)U-4HA:20質量份Adhesive composition (1) U-4HA: 20 parts by mass

黏合劑成分(2)KAYARAD-DPHA:30質量份Adhesive composition (2) KAYARAD-DPHA: 30 parts by mass

溶劑(1)MEK:37.5質量份Solvent (1) MEK: 37.5 parts by mass

溶劑(2)IPA:12.5質量份Solvent (2) IPA: 12.5 parts by mass

光聚合起始劑(1)IRGACURE 184:2質量份Photopolymerization initiator (1) IRGACURE 184: 2 parts by mass

(第二硬塗層用硬化性樹脂組成物1、黏度25.7mPa‧s)(The curable resin composition for the second hard coat layer 1 has a viscosity of 25.7 mPa ‧ s)

高折射率微粒子溶膠(1)CX-Z210 IP-F2:83.3質量份High refractive index microparticle sol (1) CX-Z210 IP-F2: 83.3 parts by mass

黏合劑成分(1)U-4HA:8.3質量份Adhesive composition (1) U-4HA: 8.3 parts by mass

溶劑(1)MEK:8.4質量份Solvent (1) MEK: 8.4 parts by mass

光聚合起始劑(1)IRGACURE 184:0.3質量份Photopolymerization initiator (1) IRGACURE 184: 0.3 parts by mass

(第二硬塗層用硬化性樹脂組成物2、黏度15.1mPa‧s)(The curable resin composition for the second hard coat layer 2, viscosity 15.1 mPa‧s)

高折射率微粒子溶膠(2) CX-S303IP:66.6質量份High refractive index microparticle sol (2) CX-S303IP: 66.6 parts by mass

黏合劑成分(1) U-4HA:20.0質量份Adhesive composition (1) U-4HA: 20.0 parts by mass

溶劑(1)MEK:13.4質量份Solvent (1) MEK: 13.4 parts by mass

光聚合起始劑(1)IRGACURE 184:0.8質量份Photopolymerization initiator (1) IRGACURE 184: 0.8 parts by mass

(第二硬塗層用硬化性樹脂組成物3、黏度28.5mPa‧s)(The curable resin composition 2 for the second hard coat layer, viscosity 28.5 mPa‧s)

高折射率微粒子溶膠(2) CX-S303IP:87.5質量份High refractive index microparticle sol (2) CX-S303IP: 87.5 parts by mass

黏合劑成分(1)U-4HA:8.7質量份Adhesive composition (1) U-4HA: 8.7 parts by mass

溶劑(1)MEK:3.8質量份Solvent (1) MEK: 3.8 parts by mass

光聚合起始劑(1)IRGACURE 184:0.4質量份Photopolymerization initiator (1) IRGACURE 184: 0.4 parts by mass

增黏劑經丙基纖維素:0.2質量份Tackifier by propyl cellulose: 0.2 parts by mass

(第二硬塗層用硬化性樹脂組成物4、黏度24.2mPa‧s)(Curable resin composition 4 for second hard coat layer, viscosity 24.2 mPa‧s)

高折射率微粒子溶膠(3) OZ-S30K:87.5質量份High refractive index microparticle sol (3) OZ-S30K: 87.5 parts by mass

黏合劑成分(1)U-4HA:8.7質量份Adhesive composition (1) U-4HA: 8.7 parts by mass

溶劑(1)MEK:3.8質量份Solvent (1) MEK: 3.8 parts by mass

光聚合起始劑(1)IRGACURE 184:0.4質量份Photopolymerization initiator (1) IRGACURE 184: 0.4 parts by mass

增黏劑經丙基纖維素:0.3質量份Tackifier by propyl cellulose: 0.3 parts by mass

(高折射率層用組成物)(Composition for high refractive index layer)

高折射率微粒子溶膠(1) CX-Z210IP-F2:28.6質量份High refractive index microparticle sol (1) CX-Z210IP-F2: 28.6 parts by mass

黏合劑成分(3)PETA:2.3質量份Adhesive composition (3) PETA: 2.3 parts by mass

溶劑(3)MIBK:69.1質量份Solvent (3) MIBK: 69.1 parts by mass

光聚合起始劑(2) IRGACURE 127:0.1質量份Photopolymerization initiator (2) IRGACURE 127: 0.1 parts by mass

(低折射率層用組成物1)(Composition for low refractive index layer 1)

中空二氧化矽微粒子:15.0質量份Hollow ceria microparticles: 15.0 parts by mass

黏合劑成分(3)PETA:1.0質量份Adhesive composition (3) PETA: 1.0 parts by mass

黏合劑成分(4)LINC-3A:1.0質量份Adhesive composition (4) LINC-3A: 1.0 parts by mass

溶劑(3)MIBK:83.0質量份Solvent (3) MIBK: 83.0 parts by mass

光聚合起始劑(2) IRGACURE 127:0.1質量份Photopolymerization initiator (2) IRGACURE 127: 0.1 parts by mass

(低折射率層用組成物2)(Composition 2 for low refractive index layer)

黏合劑成分(4)LINC-3A:3.0質量份Adhesive composition (4) LINC-3A: 3.0 parts by mass

光聚合起始劑(2)IRGACURE 127:0.15質量份Photopolymerization initiator (2) IRGACURE 127: 0.15 parts by mass

防污劑X-22-164E:0.06質量份Antifouling agent X-22-164E: 0.06 parts by mass

溶劑(3)MIBK:96.91質量份Solvent (3) MIBK: 96.91 parts by mass

(低折射率層用組成物3)(Composition 3 for low refractive index layer)

金屬氟化物(冰晶石):10質量份Metal fluoride (cryolite): 10 parts by mass

黏合劑成分(3)PETA:0.5質量份Adhesive composition (3) PETA: 0.5 parts by mass

黏合劑成分(4)LINC-3A:0.5質量份Adhesive composition (4) LINC-3A: 0.5 parts by mass

光聚合起始劑(2)IRGACURE 127:0.05質量份Photopolymerization initiator (2) IRGACURE 127: 0.05 parts by mass

防污劑X-22-164E:0.05質量份Antifouling agent X-22-164E: 0.05 parts by mass

溶劑(3)MIBK:88.9質量份Solvent (3) MIBK: 88.9 parts by mass

(實施例1)(Example 1)

於TAC基材上,使用2溝槽型板塗敷器,以上述第一組成物1比上述第二組成物1更位於基材(下層)側般,將該第一組成物1及第二組成物1,以塗佈速度20m/min鄰接進行同時塗佈,形成塗膜。將此塗膜乾燥30秒鐘,除去溶劑。其次對此塗膜使用紫外線照射裝置,以照射量80mJ/cm2進行紫外線照射,將塗膜硬化形成乾燥膜厚12μm的折射率傾斜HC層。The first composition 1 and the second composition are used on the TAC substrate by using a 2-grooved plate applicator such that the first composition 1 is located on the substrate (lower layer) side than the second composition 1 The composition 1 was applied at the same time at a coating speed of 20 m/min to form a coating film. The coating film was dried for 30 seconds to remove the solvent. Next, this coating film was irradiated with ultraviolet rays at an irradiation amount of 80 mJ/cm 2 using an ultraviolet irradiation device, and the coating film was cured to form a refractive index inclined HC layer having a dry film thickness of 12 μm.

其次,於此折射率傾斜HC層上,將上述低折射率層用組成物1使用溝槽型板塗佈,形成塗膜。對此塗膜同折射率傾斜HC層進行乾燥、紫外線照射,形成乾燥膜厚100nm的低折射率層,製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。Next, the composition 1 for the low refractive index layer is coated on the HC layer with a refractive index, and the coating film is formed by using a grooved plate. The coating film was dried with the refractive index-slanted HC layer and irradiated with ultraviolet rays to form a low refractive index layer having a dry film thickness of 100 nm, and an optical film having a refractive index-inclined HC layer and a low refractive index layer on a TAC substrate was produced.

(實施例2)(Example 2)

於實施例1中,除了使用第二組成物2代替第二組成物1以外,同實施例1處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, except that the second composition 2 was used instead of the second composition 1, an optical film having a refractive index inclined HC layer and a low refractive index layer formed on a TAC substrate was treated in the same manner as in Example 1.

(實施例3)(Example 3)

於實施例2中,除了於第一組成物1中加入0.5質量份增黏劑(Selney HPC-M)將黏度調整至14.8mPa‧s以外,同實施例2處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 2, except that 0.5 parts by mass of a tackifier (Selney HPC-M) was added to the first composition 1 to adjust the viscosity to 14.8 mPa ‧ , the same treatment as in Example 2 was carried out on a TAC substrate. The optical film of the HC layer and the low refractive index layer is inclined.

(實施例4)(Example 4)

於實施例1中,除了於第一組成物1中加入1.0質量份增黏劑(Selney HPC-M)將黏度調整至20.4mPa‧s,並且使用第二組成物3代替第二組成物1以外,同實施例1處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, except that 1.0 part by mass of a tackifier (Selney HPC-M) was added to the first composition 1 to adjust the viscosity to 20.4 mPa‧s, and the second composition 3 was used instead of the second composition 1. An optical film having a refractive index inclined HC layer and a low refractive index layer formed on a TAC substrate was treated in the same manner as in Example 1.

(實施例5)(Example 5)

於實施例1中,除了使用第二組成物4代替第二組成物1以外,同實施例1處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, an optical film having a refractive index-inclined HC layer and a low refractive index layer on a TAC substrate was produced in the same manner as in Example 1 except that the second composition 4 was used instead of the second composition 1.

(實施例6)(Example 6)

於實施例5中,除了於第一組成物1中加入1.0質量份增黏劑(Selney HPC-M)將黏度調整至20.4mPa‧s以外,同實施例5處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 5, except that 1.0 part by mass of a tackifier (Selney HPC-M) was added to the first composition 1 to adjust the viscosity to 20.4 mPa ‧ , the same treatment as in Example 5 was carried out on a TAC substrate. The optical film of the HC layer and the low refractive index layer is inclined.

(實施例7)(Example 7)

直到形成折射率傾斜HC層為止,同實施例1進行。The same procedure as in Example 1 was carried out until the formation of the refractive index tilting HC layer.

其次,於此折射率傾斜HC層上,將上述高折射率層用組成物使用溝槽型板塗佈,形成塗膜。對此塗膜同折射率傾斜HC層進行乾燥、紫外線照射,形成乾燥膜厚160nm的高折射率層。Next, the composition for the high refractive index layer was coated on the HC layer with a grooved plate to form a coating film. The coating film was dried with the refractive index-slanted HC layer and irradiated with ultraviolet rays to form a high refractive index layer having a dry film thickness of 160 nm.

其次,於此高折射率層上,將上述低折射率層用組成物1使用溝槽型板塗佈,形成塗膜。對此塗膜同折射率傾斜HC層進行乾燥、紫外線照射,形成乾燥膜厚100nm的低折射率層,製作於TAC基材上具有折射率傾斜HC層、高折射率層及低折射率層的光學薄膜。Next, on the high refractive index layer, the low refractive index layer composition 1 was applied using a grooved plate to form a coating film. The coating film was dried with the refractive index-slanted HC layer and irradiated with ultraviolet rays to form a low refractive index layer having a dry film thickness of 100 nm, and was formed on a TAC substrate having a refractive index-inclined HC layer, a high refractive index layer, and a low refractive index layer. Optical film.

(實施例8)(Example 8)

直到形成折射率傾斜HC層為止,同實施例5進行。The same procedure as in Example 5 was carried out until the formation of the refractive index tilting HC layer.

其次,於此折射率傾斜HC層上,將上述低折射率層用組成物2使用溝槽型板塗佈,形成塗膜。對此塗膜同折射率傾斜HC層進行乾燥、紫外線照射,形成乾燥膜厚100nm的低折射率層,製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。Next, the composition for low refractive index layer 2 was coated on the HC layer with a refractive index, and the coating film was formed by using a grooved plate. The coating film was dried with the refractive index-slanted HC layer and irradiated with ultraviolet rays to form a low refractive index layer having a dry film thickness of 100 nm, and an optical film having a refractive index-inclined HC layer and a low refractive index layer on a TAC substrate was produced.

(實施例9)(Example 9)

於實施例8中,除了使用低折射率層用組成物3代替低折射率層用組成物2以外,同實施例8處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 8, except that the composition 3 for the low refractive index layer was used instead of the composition 2 for the low refractive index layer, the same procedure as in Example 8 was carried out to produce a gradient refractive index HC layer and a low refractive index layer on a TAC substrate. Optical film.

(比較例1)(Comparative Example 1)

於實施例5中,除了使用未改變MEK與IPA之比並將此2種混合溶劑加至第一組成物1將第一組成物1的黏度調整至1.2mPa‧s,將MEK加至第二組成物4並將第二組成物4的黏度調整至2.5mPa‧s以外,同實施例5處理,製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 5, MEK was added to the second, except that the ratio of the unmodified MEK to the IPA was used and the two mixed solvents were added to the first composition 1 to adjust the viscosity of the first composition 1 to 1.2 mPa ‧ s. The composition 4 and the viscosity of the second composition 4 were adjusted to 2.5 mPa ‧ s, and treated in the same manner as in Example 5 to prepare an optical film having a gradient refractive index HC layer and a low refractive index layer on a TAC substrate.

(比較例2)(Comparative Example 2)

於實施例1中,除了使用於第一組成物1中加入10.0質量份增黏劑(Selney HPC-M),且,未改變第一組成物1之MEK與IPA之比並將此2種混合溶劑的份量減少,將第一組成物1的黏度調整至109.5mPa‧s者,以及於第二組成物1中加入5.0質量份增黏劑(Selney HPC-M),且,未改變第二組成物1之溶劑且份量減少將第二組成物2的黏度調整至110.3mPa‧s者以外,同實施例1處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, except that 10.0 parts by mass of a tackifier (Selney HPC-M) was added to the first composition 1, and the ratio of MEK to IPA of the first composition 1 was not changed and the two were mixed. The amount of the solvent was reduced, the viscosity of the first composition 1 was adjusted to 109.5 mPa‧s, and 5.0 parts by mass of the tackifier (Selney HPC-M) was added to the second composition 1, and the second composition was not changed. The solvent of the substance 1 was reduced in amount and the optical viscosity of the second composition 2 was adjusted to 110.3 mPa ‧ s. An optical film having a refractive index gradient HC layer and a low refractive index layer on a TAC substrate was prepared in the same manner as in Example 1.

(比較例3)(Comparative Example 3)

於實施例1中,除了使用未改變MEK與IPA之比並將此2種混合溶劑加至第一組成物1,將第一組成物1的黏度調整至1.2mPa‧s以外,同實施例1處理,製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, except that the ratio of the unmodified MEK to the IPA was used and the two mixed solvents were added to the first composition 1, the viscosity of the first composition 1 was adjusted to 1.2 mPa ‧ s, as in Example 1. The optical film having a gradient refractive index HC layer and a low refractive index layer on a TAC substrate was prepared.

(比較例4)(Comparative Example 4)

於實施例1中,除了使用於第一組成物1中加入10.0質量份增黏劑(Selney HPC-M),且,未改變第一組成物1之MEK與IPA之比並且將此2種混合溶劑的份量減少,將第一組成物1的黏度調整至109.5mPa‧s以外,同實施例1處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, except that 10.0 parts by mass of a tackifier (Selney HPC-M) was added to the first composition 1, and the ratio of MEK to IPA of the first composition 1 was not changed and the two were mixed. The amount of the solvent was reduced, and the viscosity of the first composition 1 was adjusted to 109.5 mPa ‧ s. An optical film having a refractive index gradient HC layer and a low refractive index layer on a TAC substrate was prepared in the same manner as in Example 1.

(比較例5)(Comparative Example 5)

於實施例5中,除了使用於第二組成物4中未使用增黏劑,且黏度調整至2.5mPa‧s以外,同實施例5處理,製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 5, except that the tackifier was not used in the second composition 4, and the viscosity was adjusted to 2.5 mPa ‧ s, it was treated in the same manner as in Example 5 to have a gradient refractive index HC layer on the TAC substrate. An optical film of a low refractive index layer.

(比較例6)(Comparative Example 6)

於實施例1中,除了使用於第二組成物1中加入5.0質量份增黏劑(Selney HPC-M),且,第二組成物1之溶劑份量減少並將黏度調整至110.3mPa‧s以外,同實施例1處理製作於TAC基材上具有折射率傾斜HC層及低折射率層的光學薄膜。In Example 1, except that 5.0 parts by mass of a tackifier (Selney HPC-M) was added to the second composition 1, and the amount of the solvent of the second composition 1 was decreased and the viscosity was adjusted to be 110.3 mPa·s. An optical film having a refractive index inclined HC layer and a low refractive index layer formed on a TAC substrate was treated in the same manner as in Example 1.

(比較例7)(Comparative Example 7)

於TAC基材上,將上述第一組成物1使用溝槽型板塗佈,形成塗膜。將此塗膜乾燥30秒鐘,除去溶劑。其次對此塗膜使用紫外線照射裝置,以照射量80mJ/cm2進行紫外線照射,將塗膜硬化形成乾燥膜厚12μm的HC層。The first composition 1 was coated on a TAC substrate using a grooved plate to form a coating film. The coating film was dried for 30 seconds to remove the solvent. Next, this coating film was irradiated with ultraviolet rays at an irradiation amount of 80 mJ/cm 2 using an ultraviolet irradiation device, and the coating film was cured to form an HC layer having a dry film thickness of 12 μm.

其次,於此HC層上,將上述低折射率層用組成物1使用溝槽型板塗佈,形成塗膜。對此塗膜同HC層進行乾燥、紫外線照射,形成乾燥膜厚100nm的低折射率層,製作於TAC基材上具有不含高折射率微粒子之HC層及低折射率層的光學薄膜。Next, on the HC layer, the composition 1 for the low refractive index layer was coated with a grooved plate to form a coating film. The coating film was dried with the HC layer and irradiated with ultraviolet rays to form a low refractive index layer having a dry film thickness of 100 nm, and an optical film having an HC layer and a low refractive index layer containing no high refractive index fine particles on the TAC substrate was produced.

(比較例8)(Comparative Example 8)

於比較例7中,除了使用低折射率層用組成物3代替低折射率層用組成物1以外,同比較例7處理,製作於TAC基材上具有不含高折射率微粒子之HC層及低折射率層的光學薄膜。In Comparative Example 7, except that the composition 3 for the low refractive index layer was used instead of the composition 1 for the low refractive index layer, the same treatment as in Comparative Example 7 was carried out to prepare an HC layer having no high refractive index fine particles on the TAC substrate. An optical film of a low refractive index layer.

(比較例9)(Comparative Example 9)

於TAC基材上,使用溝槽型板塗敷器,塗佈第一組成物1,並將此塗膜於溫度70度之熱烤爐中乾燥30秒鐘,除去溶劑。其次對此塗膜使用紫外線照射裝置,以照射量50mJ/cm2般照射硬化,形成膜厚7μm之不含高折射率微粒子的HC層。其次,於此HC層上,將第二組成物1使用溝槽型板塗敷器塗佈,並將此塗膜於溫度70度之熱烤爐中乾燥30秒鐘,除去溶劑。其次對此塗膜使用紫外線照射裝置,以照射量100mJ/cm2般照射,形成含有高折射率微粒子的HC層,並且形成上下2層合計膜厚為11μm的HC層。On the TAC substrate, the first composition 1 was applied using a grooved plate applicator, and the coating film was dried in a hot oven at 70 ° C for 30 seconds to remove the solvent. Then, this coating film was irradiated and cured by irradiation with an ultraviolet irradiation device at an irradiation amount of 50 mJ/cm 2 to form an HC layer containing no high refractive index fine particles having a thickness of 7 μm. Next, on the HC layer, the second composition 1 was coated using a grooved plate applicator, and the coating film was dried in a hot oven at 70 ° C for 30 seconds to remove the solvent. Then, the coating film was irradiated with an ultraviolet irradiation device at an irradiation dose of 100 mJ/cm 2 to form an HC layer containing high refractive index fine particles, and an HC layer having a total thickness of 11 μm was formed.

其次,於此HC層上,使用上述低折射率層用組成物1同實施例1形成乾燥膜厚100nm的低折射率層,製作於TAC基材上,由TAC基材側開始,具有不含高折射率微粒子之HC層、含有高折射率微粒子之HC層及低折射率層的光學薄膜。Next, on the HC layer, the low refractive index layer having a dry film thickness of 100 nm was formed in the same manner as in Example 1 using the composition 1 for the low refractive index layer, and was formed on the TAC substrate, and was not contained on the TAC substrate side. An optical film of an HC layer of high refractive index microparticles, an HC layer containing high refractive index microparticles, and a low refractive index layer.

(比較例10)(Comparative Example 10)

於比較例9中,除了使用低折射率層用組成物2代替低折射率層用組成物1以外,同比較例9處理,製作於TAC基材上,由TAC基材側開始,具有不含高折射率微粒子之HC層、含有高折射率微粒子之HC層及低折射率層的光學薄膜。In Comparative Example 9, except that the composition 2 for the low refractive index layer was used instead of the composition 1 for the low refractive index layer, it was processed on the TAC substrate in the same manner as in Comparative Example 9, and was formed from the TAC substrate side. An optical film of an HC layer of high refractive index microparticles, an HC layer containing high refractive index microparticles, and a low refractive index layer.

關於上述實施例及比較例之第一組成物及第二組成物的種類、黏度、塗佈方式及濕膜厚及所用之其他組成物整理示於表1。The types, viscosity, application method, wet film thickness, and other composition used in the first and second compositions of the above examples and comparative examples are shown in Table 1.

[表1][Table 1]

(光學薄膜之評估)(Evaluation of optical film)

關於上述實施例及比較例之光學薄膜,分別進行如下所示之反射率測定。對於上述實施例及比較例之光學薄膜,分別進行如下所示之干涉條紋、密合性、面狀(有無塗佈紋)、高折射率微粒子的分佈及生產性(適塗佈性和簡便性)的評估。又,關於實施例8與9、比較例7~10,進行耐鹼性的評估。其結果示於表2。The optical films of the above examples and comparative examples were each measured for reflectance as shown below. The optical films of the above-described examples and comparative examples were subjected to interference fringes, adhesion, planarity (with or without coating), distribution of high refractive index fine particles, and productivity (suitability and simplicity). )evaluation of. Further, regarding Examples 8 and 9, and Comparative Examples 7 to 10, evaluation of alkali resistance was performed. The results are shown in Table 2.

(反射率之測定)(Measurement of reflectance)

反射率之測定係使用日本分光(股)製之商品名V7100型紫外線可見光分光光度計及日本分光(股)製之商品名VAR-7010絕對反射率測定裝置,以入射角5°、偏光片為N偏光、測定波長範圍為380~780nm,並於光學薄膜的TAC基材側貼合黑膠帶,並將並設置於裝置進行測定。另外,將測定波長範圍所求出之測定結果的平均值定為反射率。The measurement of the reflectance was carried out by using the product name V7100 ultraviolet visible light spectrophotometer manufactured by JASCO Corporation and the product name VAR-7010 absolute reflectance measuring device manufactured by JASCO Corporation. The incident angle was 5° and the polarizer was used. The N-polarized light was measured at a wavelength range of 380 to 780 nm, and a black tape was attached to the TAC substrate side of the optical film, and the device was placed in a device for measurement. Further, the average value of the measurement results obtained by measuring the wavelength range was defined as the reflectance.

(干涉條紋的評估)(Evaluation of interference fringes)

使用Naftec(股)製之干涉條紋檢查燈(Na燈),以目視檢查,並以下述基準評估。An interference fringe inspection lamp (Na lamp) manufactured by Naftec Co., Ltd. was used for visual inspection and evaluated on the basis of the following criteria.

○:幾乎完全未觀察到干涉條紋的發生者○: The occurrence of interference fringes was hardly observed at all.

╳:清楚觀察到干涉條紋者╳: Obviously observe the interference fringe

(密合性之評估)(evaluation of adhesion)

關於上述實施例及比較例之光學薄膜,分別進行如下所示之橫盤格密合性試驗之密合率測定。With respect to the optical films of the above examples and comparative examples, the adhesion ratio of the transverse disk adhesion test shown below was measured.

(棋盤格密合性試驗)(checkerboard adhesion test)

在光學薄膜的低折射率層側表面之1mm正方中加入合計100格的基盤格,使用Nichiban(股)製工業用24mm Cello-Tape(註冊商標)進行5次連續剝離試驗,並且根據下述基準算出未剝離殘留之分量格的比例。A total of 100 cells of the base plate were placed in the 1 mm square of the low refractive index layer side surface of the optical film, and 5 continuous peeling tests were carried out using a 24 mm Cello-Tape (registered trademark) manufactured by Nichiban Co., Ltd., and based on the following criteria. Calculate the ratio of the undivided residual component.

密合率(%)=(未剝離之分量格數/合計之分量格數100)×100Adhesion rate (%) = (number of undivided parts / total number of parts of 100) × 100

(面狀之評估)(evaluation of the surface)

關於光學薄膜之外觀面狀(有無塗佈紋),以目視進行評估。Regarding the appearance of the optical film (with or without coating), it was evaluated visually.

○:未觀察到塗佈紋者○: No coating pattern was observed

△:模糊觀察到塗佈紋者△: Obscured to observe the coating pattern

╳:清楚觀察到塗佈紋者╳: Clearly observed the coated pattern

(折射率傾斜HC層中之高折射率微粒子的分佈)(Distribution of high refractive index fine particles in the gradient refractive index HC layer)

以TEM照片觀察光學薄膜的剖面,求出折射率傾斜HC層或HC層中高折射率微粒子全量90%所佔之由低折射率層側界面開始的膜厚比例。The cross section of the optical film was observed by a TEM photograph, and the film thickness ratio from the side of the low refractive index layer side occupied by 90% of the total amount of the high refractive index fine particles in the gradient gradient HC layer or the HC layer was determined.

(生產性(適塗佈性))(productive (suitable coating))

於上述各實施例及比較例中,以下述基準評估僅改變塗佈速度時之第一組成物及第二組成物對於TAC基材的適塗佈性。In each of the above examples and comparative examples, the applicability of the first composition and the second composition to the TAC substrate when only the coating speed was changed was evaluated on the basis of the following criteria.

○:即使塗佈速度10m/min以上亦可不產生塗佈紋地塗佈者○: even if the coating speed is 10 m/min or more, the coating pattern can be applied without coating.

△:可不產生塗佈紋地塗佈的塗佈速度為1m/min以下者△: The coating speed at which coating coating is not applied is 1 m/min or less.

╳:任意速度均產生塗佈紋者╳: Anyone who produces a coating at any speed

(耐鹼化性)(alkali resistance)

將光學薄膜,放保持於55℃的2當量濃度氫氧化鈉水溶液中,浸漬2分鐘。其次,充分水洗後,以70℃乾燥5分鐘。其次,使用#0000號的鋼絲絨,以摩擦荷重0.98N(100gf),來回摩擦10次,目視其後有無低折射率層損傷、剝落,並以下述基準評估。The optical film was placed in a 2 N aqueous solution of sodium hydroxide at 55 ° C and immersed for 2 minutes. Next, after sufficiently washing with water, it was dried at 70 ° C for 5 minutes. Next, steel wool of #0000 was used, rubbed back and forth for 10 times with a friction load of 0.98 N (100 gf), and the presence or absence of damage or peeling of the low refractive index layer was visually observed and evaluated on the following basis.

○:於低折射率層無損傷及剝落○: no damage and peeling on the low refractive index layer

╳:於低折射率層有損傷或剝落╳: damage or flaking on the low refractive index layer

又,由所得之反射率結果、和對於實施例1~9及比較例1~6之光學薄膜的折射率傾斜HC層,以XPS測定膜厚方向之高折射率微粒子存在量變化的結果,可確認任何折射率傾斜HC層均由低折射率層側的界面朝向TAC基材側的界面,折射率連續降低。Further, from the results of the reflectance obtained and the refractive index of the optical films of Examples 1 to 9 and Comparative Examples 1 to 6, the HC layer was measured, and the amount of the high refractive index fine particles in the film thickness direction was measured by XPS. It was confirmed that any of the refractive index-sloping HC layers was from the interface on the low refractive index layer side toward the interface on the TAC substrate side, and the refractive index was continuously lowered.

關於上述實施例及比較例,同時進行塗佈的實施例1~9及比較例1~6中,步驟數少,且可簡便進行光學薄膜的製作。In the above Examples and Comparative Examples, in Examples 1 to 9 and Comparative Examples 1 to 6 which were simultaneously coated, the number of steps was small, and the production of an optical film can be easily performed.

但是,進行逐次塗佈的比較例9及10中,組成物的塗佈和光照射之硬化步驟為多次使簡便性方面差。However, in Comparative Examples 9 and 10 in which the coating was successively applied, the coating of the composition and the hardening step of the light irradiation were inferior in terms of simplicity.

[表2][Table 2]

(結果之總結)(summary of results)

由表2,實施例1~7、比較例1~6及9之光學薄膜取得良好的反射率。特別,折射率傾斜HC層、高折射率層及低折射率層之層構成的實施例7取得低反射率。From Table 2, the optical films of Examples 1 to 7 and Comparative Examples 1 to 6 and 9 achieved good reflectance. In particular, Example 7 in which the layers of the refractive index-inclined HC layer, the high refractive index layer, and the low refractive index layer were formed had a low reflectance.

於低折射率層用組成物使用氟系低折射率材料的實施例8及9的光學薄膜,反射率分別為1.01和0.75,取得充分的防止反射性。特別,實施例9的光學薄膜中不含有中空二氧化矽微粒子,即使使用氟系低折射率材料,反射率亦比使用中空二氧化矽微粒子之比較例7的光學薄膜更低。若將實施例9之光學薄膜與比較例10之光學薄膜相對比,則均具有相同的低折射率層,並於鄰接低折射率層的HC層中含有高折射率微粒子,但以實施例9之光學薄膜的反射率較低。推測其係因實施例9的光學薄膜於折射率傾斜HC層內,有效率將低折射率層側的界面附近高折射率化,故比上層HC層全體中高折射率微粒子均勻分佈之比較例10的光學薄膜,可更加增大低折射率層與折射率傾斜HC層的折射率差。In the optical films of Examples 8 and 9 in which a fluorine-based low refractive index material was used for the composition for a low refractive index layer, the reflectances were 1.01 and 0.75, respectively, and sufficient antireflection properties were obtained. In particular, the optical film of Example 9 did not contain hollow ceria particles, and even if a fluorine-based low-refractive material was used, the reflectance was lower than that of Comparative Example 7 using hollow ceria particles. When the optical film of Example 9 was compared with the optical film of Comparative Example 10, both had the same low refractive index layer and contained high refractive index fine particles in the HC layer adjacent to the low refractive index layer, but Example 9 was used. The optical film has a low reflectance. It is presumed that the optical film of Example 9 is inclined in the HC layer with a refractive index, and the refractive index is increased in the vicinity of the interface on the side of the low refractive index layer. Therefore, Comparative Example 10 in which the high refractive index fine particles are uniformly distributed in the entire upper layer of the HC layer is considered. The optical film can further increase the refractive index difference between the low refractive index layer and the refractive index inclined HC layer.

實施例1~9及比較例1~8之光學薄膜於干涉條紋的評估為良好。The optical films of Examples 1 to 9 and Comparative Examples 1 to 8 were evaluated as good for interference fringes.

但是,經由逐次塗佈個別形成上下HC層之比較例9及10的光學薄膜,產生層界面,並且發生干涉條紋。However, by sequentially coating the optical films of Comparative Examples 9 and 10 in which the upper and lower HC layers were individually formed, a layer interface was generated, and interference fringes occurred.

實施例1~9之光學薄膜於密合性和面狀的評估為良好。The optical films of Examples 1 to 9 were evaluated as good in adhesion and surface.

但是,比較例1~6之光學薄膜比實施例的密合性更低,於面狀亦產生塗佈紋。特別,比較例2、4及6之光學薄膜的情況,第一組成物與第二組成物的至少一者黏度過高,於塗佈速度20m/min易產生塗佈紋,且面狀的評估為×。因產生塗佈紋使塗佈面的狀態差,故推測比較例2、4及6的光學薄膜為密合性的評估結果亦差。 However, the optical films of Comparative Examples 1 to 6 were lower in adhesion than the examples, and coated on the surface. In particular, in the case of the optical films of Comparative Examples 2, 4 and 6, the viscosity of at least one of the first composition and the second composition was too high, and the coating speed was easily generated at a coating speed of 20 m/min, and the evaluation of the surface was performed. For ×. Since the state of the coated surface was poor due to the occurrence of the coating pattern, it was estimated that the optical films of Comparative Examples 2, 4, and 6 were inferior in the evaluation results of the adhesion.

比較例7及8的光學薄膜為密合性和面狀的評估良好。推測其係因僅使用第一組成物1且以1次形成HC層。 The optical films of Comparative Examples 7 and 8 were evaluated for good adhesion and surface. It is presumed that it is because only the first composition 1 is used and the HC layer is formed once.

比較例9及10的光學薄膜於面狀的評估為良好,但密合性不夠充分。推測係因個別形成上下層,故層界面的密合性不夠充分。 The optical films of Comparative Examples 9 and 10 were evaluated as good in the planar shape, but the adhesion was insufficient. It is presumed that the upper and lower layers are formed individually, so the adhesion of the layer interface is insufficient.

實施例之光學薄膜的折射率傾斜HC層中,根據剖面觀察,高折射率微粒子之90%在折射率傾斜HC層之低折射率層側界面直到70%為止的膜厚中存在。 In the refractive index of the optical film of the example, in the HC layer, 90% of the high refractive index fine particles were present in the film thickness of the low refractive index layer side interface of the refractive index inclined HC layer up to 70% in terms of the cross section.

但是,比較例2以外之比較例1及3~6的光學薄膜中,高折射率微粒子在接近TAC基材側界面直到90%和95%的膜厚為止分佈。 However, in the optical films of Comparative Examples 1 and 3 to 6 other than Comparative Example 2, the high refractive index fine particles were distributed up to the film thickness of 90% and 95% near the TAC substrate side interface.

進行逐次塗佈之比較例9及10的光學薄膜中,在上層側含有高折射率微粒子之HC層的膜厚方向全體均勻分佈高折射率微粒子。 In the optical films of Comparative Examples 9 and 10 which were applied one by one, the high refractive index fine particles were uniformly distributed in the entire film thickness direction of the HC layer containing the high refractive index fine particles on the upper layer side.

實施例之第一組成物及第二組成物的黏度於生產性(適塗佈性)良好。 The viscosity of the first composition and the second composition of the examples was good in productivity (suitable coatability).

但是,比較例1~6中,不會產生塗佈紋且可生產的塗佈速 度低,或者即使減慢塗佈速度亦產生塗佈紋的結果。比較例7~10之光學薄膜未進行同時塗佈,因塗佈1種組成物、或者將組成物以各1種塗佈,故適塗佈性良好。 However, in Comparative Examples 1 to 6, the coating speed was not produced and the coating speed was produced. The degree is low, or even if the coating speed is slowed down, the result of the coating is produced. The optical films of Comparative Examples 7 to 10 were not simultaneously coated, and the coating properties were good because one composition was applied or the composition was applied in one form.

於低折射率層含有中空二氧化矽微粒子之比較例7及9的光學薄膜,耐鹼化性不夠充分。相對地,於低折射率層不含有中空二氧化矽微粒子之實施例8及9的光學薄膜,充分的防止反射性和耐鹼化性可兩相成立。 The optical films of Comparative Examples 7 and 9 in which the hollow cerium oxide fine particles were contained in the low refractive index layer were insufficient in alkali resistance. On the other hand, in the optical films of Examples 8 and 9 in which the low refractive index layer does not contain hollow ceria particles, the sufficient antireflection property and alkali resistance can be established in two phases.

1‧‧‧光學薄膜 1‧‧‧Optical film

10‧‧‧光穿透性基材 10‧‧‧Light penetrating substrate

20‧‧‧折射率傾斜硬塗層 20‧‧‧Refractive refractive index hard coating

30‧‧‧高折射率微粒子 30‧‧‧High refractive index microparticles

40‧‧‧型板塗敷器頭部 40‧‧‧ plate applicator head

51、52‧‧‧狹縫 51, 52‧‧‧ slit

60‧‧‧第一硬塗層用硬化性樹脂組成物 60‧‧‧First hardenable resin composition for hard coat

70‧‧‧第二硬塗層用硬化性樹脂組成物 70‧‧‧The hard curable resin composition for the second hard coat layer

80‧‧‧低折射率層 80‧‧‧Low refractive index layer

90‧‧‧高折射率微粒子 90‧‧‧High refractive index microparticles

100‧‧‧防靜電層 100‧‧‧Antistatic layer

圖1(a)、(b)係示意性示出本發明之光學薄膜之製造方法之一例圖。 Fig. 1 (a) and (b) are diagrams schematically showing an example of a method for producing an optical film of the present invention.

圖2係示出使用擠出型之型板塗敷器之同時塗佈方法之一例的示意圖。 Fig. 2 is a schematic view showing an example of a simultaneous coating method using an extrusion type plate applicator.

圖3係示意性示出本發明之光學薄膜之層構成及折射率傾斜HC層內之膜厚方向中之高折射率微粒子之分佈一例的剖面圖。 Fig. 3 is a cross-sectional view schematically showing an example of a layer configuration of an optical film of the present invention and a distribution of high refractive index fine particles in a film thickness direction in a refractive index gradient HC layer.

圖4係示意性示出本發明之光學薄膜之層構成的另一例的剖面圖。但,省略粒子的存在。 Fig. 4 is a cross-sectional view schematically showing another example of the layer constitution of the optical film of the present invention. However, the existence of particles is omitted.

圖5係示意性示出本發明之光學薄膜之層構成的另一例的剖面圖。但,省略粒子的存在。 Fig. 5 is a cross-sectional view schematically showing another example of the layer constitution of the optical film of the present invention. However, the existence of particles is omitted.

圖6係示意性示出本發明之光學薄膜之層構成的另一例的剖面圖。但,省略粒子的存在。 Fig. 6 is a cross-sectional view schematically showing another example of the layer constitution of the optical film of the present invention. However, the existence of particles is omitted.

1...光學薄膜1. . . Optical film

10...光穿透性基材10. . . Light penetrating substrate

20...折射率傾斜硬塗層20. . . Refractive index tilted hard coat

30...高折射率微粒子30. . . High refractive index microparticles

Claims (16)

一種光學薄膜之製造方法,其特徵為包含:(i)準備三乙醯纖維素基材作為光穿透性基材的步驟;(ii)準備第一硬塗層用硬化性樹脂組成物以及第二硬塗層用硬化性樹脂組成物的步驟;該第一硬塗層用硬化性樹脂組成物係含有第一黏合劑成分及第一溶劑,不含有高折射率微粒子,相對於上述第一溶劑之全質量,甲基乙基酮之比例為50質量%以上,且黏度為5~30mPa‧s;該第二硬塗層用硬化性樹脂組成物係含有平均粒徑1~100nm之高折射率微粒子、第二黏合劑成分及第二溶劑,相對於上述第二溶劑之全質量,甲基乙基酮之比例為50質量%以上,黏度為10~50mPa‧s,且黏度大於上述第一硬塗層用硬化性樹脂組成物;(iii)於該光穿透性基材的一面側,由該光穿透性基材側,將該第一硬塗層用硬化性樹脂組成物及該第二硬塗層用硬化性樹脂組成物予以鄰接,以該第一硬塗層用硬化性樹脂組成物比該第二硬塗層用硬化性樹脂組成物更加位於該光穿透性基材側般進行同時塗佈,作成塗膜的步驟;以及(iv)對上述(iii)步驟所得之塗膜進行光照射使其硬化,以形成折射率傾斜硬塗層的步驟。 A method for producing an optical film, comprising: (i) preparing a triacetyl cellulose substrate as a light penetrating substrate; (ii) preparing a first hard coat resin composition and a first a step of a curable resin composition for a second hard coat layer; the first hard coat layer curable resin composition comprising a first binder component and a first solvent, and no high refractive index microparticles, relative to the first solvent The total mass, the ratio of methyl ethyl ketone is 50% by mass or more, and the viscosity is 5 to 30 mPa s; the curable resin composition for the second hard coat layer contains a high refractive index of an average particle diameter of 1 to 100 nm. The microparticles, the second binder component, and the second solvent have a ratio of methyl ethyl ketone of 50% by mass or more, a viscosity of 10 to 50 mPa ‧ s, and a viscosity greater than the first hardness of the second solvent. a curable resin composition for coating; (iii) a curable resin composition for the first hard coat layer and the first surface side of the light transmissive substrate from the side of the light transmissive substrate The second hard coat layer is adjacent to the hard curable resin composition to the first hard coat layer a step of coating the curable resin composition on the side of the light-transmitting substrate more than the curable resin composition for the second hard coat layer to form a coating film; and (iv) the step (iii) above The obtained coating film is subjected to light irradiation to be hardened to form a step of slanting the hard coat layer. 如申請專利範圍第1項之光學薄膜之製造方法,其中,上述第一硬塗層用硬化性樹脂組成物及/或第二硬塗層用硬 化性樹脂組成物,係進一步含有增黏劑。 The method for producing an optical film according to claim 1, wherein the first hard coat layer curable resin composition and/or the second hard coat layer are hard. The chemical resin composition further contains a tackifier. 如申請專利範圍第1項之光學薄膜之製造方法,其中,上述第一硬塗層用硬化性樹脂組成物的黏度與上述第二硬塗層用硬化性樹脂組成物之黏度(mPa‧s)差的絕對值為30以下。 The method for producing an optical film according to the first aspect of the invention, wherein the viscosity of the curable resin composition for the first hard coat layer and the viscosity of the curable resin composition for the second hard coat layer (mPa ‧ s) The absolute value of the difference is 30 or less. 如申請專利範圍第1項之光學薄膜之製造方法,其中,於上述(iv)步驟後,進一步包含(v)在上述折射率傾斜硬塗層上,直接或介隔著高折射率層形成低折射率層的步驟。 The method for producing an optical film according to the first aspect of the invention, wherein after the step (iv), further comprising (v) forming a low or high dielectric layer on the refractive index inclined hard coat layer The step of the refractive index layer. 如申請專利範圍第4項之光學薄膜之製造方法,其中,硬化形成上述低折射率層的低折射率層用組成物,係含有中空二氧化矽微粒子。 The method for producing an optical film according to the fourth aspect of the invention, wherein the low refractive index layer composition for curing the low refractive index layer contains hollow cerium oxide fine particles. 如申請專利範圍第4項之光學薄膜之製造方法,其中,硬化形成上述低折射率層的低折射率層用組成物,係含有由金屬氟化物及硬化性氟樹脂所組成群中選出之至少1種的低折射率材料。 The method for producing an optical film according to the fourth aspect of the invention, wherein the composition for a low refractive index layer which is formed by curing the low refractive index layer contains at least one selected from the group consisting of a metal fluoride and a curable fluororesin. One type of low refractive index material. 如申請專利範圍第6項之光學薄膜之製造方法,其中,硬化形成上述低折射率層的低折射率層用組成物,係不含中空二氧化矽微粒子,而含有由金屬氟化物及硬化性氟樹脂所組成群中選出之至少1種的低折射率材料。 The method for producing an optical film according to the sixth aspect of the invention, wherein the low refractive index layer composition for curing the low refractive index layer is free of hollow ceria particles and contains metal fluoride and hardenability. At least one low refractive index material selected from the group consisting of fluororesins. 如申請專利範圍第1項之光學薄膜之製造方法,其中,在上述(i)步驟與(iii)步驟之間,進一步包含(vi)在上述光穿透性基材之設置折射率傾斜硬塗層的面形成防靜電層的步 驟。 The method for producing an optical film according to the first aspect of the invention, wherein the step (i) and the step (iii) further comprises (vi) setting a refractive index oblique hard coating on the light penetrating substrate. Step of forming the antistatic layer on the surface of the layer Step. 一種光學薄膜之製造方法,其特徵為包含:(i)準備光穿透性基材的步驟;(ii)準備第一硬塗層用硬化性樹脂組成物以及第二硬塗層用硬化性樹脂組成物的步驟;該第一硬塗層用硬化性樹脂組成物係含有第一黏合劑成分及第一溶劑,不含有高折射率微粒子,且黏度為3~100mPa‧s;該第二硬塗層用硬化性樹脂組成物係含有平均粒徑1~100nm之高折射率微粒子、第二黏合劑成分及第二溶劑,且黏度為10~100mPa‧s;(iii)於該光穿透性基材的一面側,由該光穿透性基材側,將該第一硬塗層用硬化性樹脂組成物及該第二硬塗層用硬化性樹脂組成物予以鄰接,以該第一硬塗層用硬化性樹脂組成物比該第二硬塗層用硬化性樹脂組成物更加位於該光穿透性基材側般進行同時塗佈,作成塗膜的步驟;(iv)對上述(iii)步驟所得之塗膜進行光照射使其硬化,以形成折射率傾斜硬塗層的步驟;以及(v)在上述(iv)步驟所得之上述折射率傾斜硬塗層上,直接或介隔著高折射率層,塗佈不含中空二氧化矽微粒子而含有由金屬氟化物及硬化性氟樹脂所組成群中選出之至少1種之低折射率材料的低折射率層用組成物,藉此形成低折射率層的步驟。 A method for producing an optical film, comprising: (i) a step of preparing a light-transmitting substrate; (ii) preparing a curable resin composition for a first hard coat layer and a curable resin for a second hard coat layer a step of constituting the first hard coat layer containing the first adhesive component and the first solvent, containing no high refractive index fine particles, and having a viscosity of 3 to 100 mPa·s; the second hard coat The layer hardenable resin composition contains high refractive index fine particles having an average particle diameter of 1 to 100 nm, a second adhesive component and a second solvent, and has a viscosity of 10 to 100 mPa·s; (iii) the light penetrating base. On the one side of the material, the curable resin composition for the first hard coat layer and the curable resin composition for the second hard coat layer are adjacent to each other on the side of the light-transmitting substrate, and the first hard coat is applied The layer hardening resin composition is coated on the side of the light-transmitting substrate more than the curable resin composition for the second hard coat layer to form a coating film; (iv) the above (iii) The coating film obtained in the step is subjected to light irradiation to be hardened to form a refractive index oblique hard coat layer. And (v) directly or intervening the high refractive index layer on the above-mentioned refractive index inclined hard coat layer obtained in the above step (iv), coating the hollow cerium oxide-free fine particles and containing the metal fluoride and hardening A step of forming a low refractive index layer by using a composition for a low refractive index layer of at least one of the low refractive index materials selected from the group consisting of fluororesins. 如申請專利範圍第9項之光學薄膜之製造方法,其中, 上述第一硬塗層用硬化性樹脂組成物及/或第二硬塗層用硬化性樹脂組成物,係進一步含有增黏劑。 The method for producing an optical film according to claim 9 of the patent application, wherein The curable resin composition for the first hard coat layer and/or the curable resin composition for the second hard coat layer further contains a tackifier. 如申請專利範圍第9項之光學薄膜之製造方法,其中,上述第一硬塗層用硬化性樹脂組成物的黏度與上述第二硬塗層用硬化性樹脂組成物之黏度(mPa‧s)差的絕對值為30以下。 The method for producing an optical film according to the ninth aspect of the invention, wherein the viscosity of the curable resin composition for the first hard coat layer and the curable resin composition for the second hard coat layer (mPa ‧ s) The absolute value of the difference is 30 or less. 如申請專利範圍第9項之光學薄膜之製造方法,其中,上述光穿透性基材為三乙醯纖維素基材,上述第一溶劑具有對該三乙醯纖維素基材之浸透性。 The method for producing an optical film according to claim 9, wherein the light-transmitting substrate is a triacetyl cellulose substrate, and the first solvent has a permeability to the triacetyl cellulose substrate. 如申請專利範圍第9項之光學薄膜之製造方法,其中,在上述(i)步驟與(iii)步驟之間,進一步包含(vi)在上述光穿透性基材之設置折射率傾斜硬塗層的面形成防靜電層的步驟。 The method for producing an optical film according to claim 9, wherein, between the steps (i) and (iii), further comprising (vi) setting a refractive index oblique hard coating on the light-transmitting substrate; The surface of the layer forms the step of forming an antistatic layer. 一種光學薄膜,其特徵為根據申請專利範圍第1至13項中任一項之方法而得。 An optical film obtained by the method according to any one of claims 1 to 13. 一種偏光板,其特徵為在偏光元件的一面側,將上述申請專利範圍第14項之光學薄膜,以該光學薄膜的光穿透性基材側朝向該偏光元件配置而成。 A polarizing plate characterized in that the optical film of the above-mentioned Patent Application No. 14 is disposed on one surface side of the polarizing element with the light-transmitting substrate side of the optical film facing the polarizing element. 一種影像顯示裝置,其特徵為具備申請專利範圍第14項之光學薄膜。 An image display device characterized by having an optical film of claim 14 of the patent application.
TW099143668A 2009-12-18 2010-12-14 Method for producing optical film, optical film, polarizer and image display device TWI581974B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009288095 2009-12-18
JP2010227431A JP5764903B2 (en) 2009-12-18 2010-10-07 Manufacturing method of optical film

Publications (2)

Publication Number Publication Date
TW201130658A TW201130658A (en) 2011-09-16
TWI581974B true TWI581974B (en) 2017-05-11

Family

ID=44167161

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099143668A TWI581974B (en) 2009-12-18 2010-12-14 Method for producing optical film, optical film, polarizer and image display device

Country Status (5)

Country Link
JP (1) JP5764903B2 (en)
KR (1) KR101404253B1 (en)
CN (1) CN102667534B (en)
TW (1) TWI581974B (en)
WO (1) WO2011074402A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103135148B (en) * 2011-08-03 2016-01-13 富士胶片株式会社 The manufacture method of the film of band coating
KR101226229B1 (en) 2011-08-26 2013-01-28 주식회사 엘지화학 Anti-reflective coating film
JP2013097362A (en) * 2011-11-07 2013-05-20 Nof Corp Composition for formation of high refractive index layer for antireflection film and antireflection film comprising high refractive index layer composed of the composition
KR101811913B1 (en) * 2012-01-11 2017-12-22 다이니폰 인사츠 가부시키가이샤 Method for manufacturing optical laminate
JP6235288B2 (en) 2013-09-30 2017-11-22 日東電工株式会社 Optical laminate
JP6194358B2 (en) * 2014-01-17 2017-09-06 日東電工株式会社 Adhesive sheet having a transparent adhesive layer
JP6275072B2 (en) * 2014-08-28 2018-02-07 富士フイルム株式会社 Antireflection laminate, polarizing plate, cover glass, image display device, and production method of antireflection laminate
JP6419548B2 (en) * 2014-11-27 2018-11-07 日東電工株式会社 Surface protective film, method for manufacturing surface protective film, and optical member
CN107430228B (en) * 2015-03-20 2020-03-03 柯尼卡美能达株式会社 Optical film and method for producing optical film
JP6060223B1 (en) * 2015-07-22 2017-01-11 日東電工株式会社 Cover member having a transparent adhesive layer
WO2017030391A1 (en) * 2015-08-18 2017-02-23 주식회사 엘지화학 Low refractive layer and anti-reflection film comprising same
KR101956830B1 (en) 2015-08-18 2019-03-12 주식회사 엘지화학 Low refractive layer and anti-reflective film comprising the same
KR102605517B1 (en) * 2015-09-30 2023-11-22 니폰 제온 가부시키가이샤 Antistatic hard coat film, polarizer, touch panel, liquid crystal display device and manufacturing method
EP3376296A1 (en) * 2017-03-13 2018-09-19 TIGER Coatings GmbH & Co. KG Non-impact printing device
CN107791632A (en) * 2017-11-24 2018-03-13 惠州市摩码菱丽光电材料有限公司 A kind of antiradar reflectivity of TAC base materials is without rainbow line hardening diaphragm and preparation method thereof
JP7455777B2 (en) * 2021-03-31 2024-03-26 日東電工株式会社 Optical laminates and image display devices

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086360A (en) * 2007-09-28 2009-04-23 Dainippon Printing Co Ltd Antireflection film
JP2009258400A (en) * 2008-04-17 2009-11-05 Jgc Catalysts & Chemicals Ltd Method of manufacturing optical substrate with light color mirror coat layer and optical substrate obtained from the same method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002350640A (en) * 2001-05-28 2002-12-04 Nitto Denko Corp Method for manufacturing protective film for polarizing plate, polarizing plate, optical film and liquid crystal display device using polarizing plate
JP4395349B2 (en) * 2003-09-29 2010-01-06 大日本印刷株式会社 Optical film and optical display device comprising this optical film
JP4900890B2 (en) * 2005-02-24 2012-03-21 富士フイルム株式会社 Optical film, method for producing optical film, polarizing plate, and image display device using the same
KR20080008346A (en) * 2005-03-30 2008-01-23 다이니폰 인사츠 가부시키가이샤 Polarizing plate
JP2006337663A (en) * 2005-06-01 2006-12-14 Fujifilm Holdings Corp Antireflection film, polarizing plate and image display apparatus using the same
JP5244302B2 (en) * 2005-08-25 2013-07-24 富士フイルム株式会社 Method for producing antireflection film
JP2007164166A (en) 2005-11-21 2007-06-28 Fujifilm Corp Optical film and antireflection film, polarizing plate and liquid crystal display device using the same
JP2008287072A (en) * 2007-05-18 2008-11-27 Fujifilm Corp Anti-glare film and anti-reflection film using the same
JP2009036817A (en) * 2007-07-31 2009-02-19 Konica Minolta Opto Inc Antireflective coating, and polarizing plate and image display device using the same
JP2009075192A (en) * 2007-09-19 2009-04-09 Jsr Corp Method for manufacturing polarizing plate
JP2009244382A (en) * 2008-03-28 2009-10-22 Sharp Corp Functional film and display apparatus
JP5659460B2 (en) * 2008-04-03 2015-01-28 大日本印刷株式会社 Optical film and method for producing the same
KR101207176B1 (en) * 2008-09-26 2012-11-30 가부시키가이샤 도모에가와 세이시쇼 Optical laminate and hardcoat film
JP2011039332A (en) * 2009-08-12 2011-02-24 Fujifilm Corp Optical film, method for manufacturing the same, polarizing plate and image display device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086360A (en) * 2007-09-28 2009-04-23 Dainippon Printing Co Ltd Antireflection film
JP2009258400A (en) * 2008-04-17 2009-11-05 Jgc Catalysts & Chemicals Ltd Method of manufacturing optical substrate with light color mirror coat layer and optical substrate obtained from the same method

Also Published As

Publication number Publication date
KR20120102054A (en) 2012-09-17
CN102667534B (en) 2014-11-05
KR101404253B1 (en) 2014-06-05
JP2011145649A (en) 2011-07-28
TW201130658A (en) 2011-09-16
JP5764903B2 (en) 2015-08-19
CN102667534A (en) 2012-09-12
WO2011074402A1 (en) 2011-06-23

Similar Documents

Publication Publication Date Title
TWI581974B (en) Method for producing optical film, optical film, polarizer and image display device
TWI443365B (en) Method for producing optical film, optical film, polarizer and display
JP5842320B2 (en) Manufacturing method of optical film, optical film, polarizing plate, and image display device
JP6551575B2 (en) LAMINATED FILM AND ITS MANUFACTURING METHOD, TOUCH PANEL DEVICE, IMAGE DISPLAY DEVICE, AND MOBILE DEVICE
TWI515271B (en) Anti-reflection film, anti-reflection film manufacturing method, polarizing film and image display device
TWI274662B (en) Laminated film, filter for display and display
TWI498212B (en) Optical laminate and hardcoat film
JP5933353B2 (en) Antireflection film, method for producing the same, polarizing plate, and image display device
TWI636277B (en) Anti-reflective film
KR20120067990A (en) Reflection prevention member and manufacture method for the same
KR20130041741A (en) Optical film, polarizing plate and image display device
JP5204706B2 (en) Method for producing Newton ring prevention film
TW200401904A (en) Process for the production of antiglare antireflective film
TWI756760B (en) Anti-reflection film
TW200401116A (en) High refraction film, high refraction film-forming coating composition, anti-reflection film, protective film for polarizing plate, polarizing plate and image display device
TW200535448A (en) Low reflection member
JP4712236B2 (en) Antireflection film, antireflection film, image display device, and manufacturing method thereof
JP2010195901A (en) Resin composition for hard coat, process of producing resin composition for hard coat, and substrate for anti-reflection coating
JP2012150226A (en) Antireflection film, method for manufacturing antireflection film and image display device
JP2009211061A (en) Antireflection film
JP2006255496A (en) Method of manufacturing laminated film
JP2007119765A (en) Coating composition for low refractive index layer and anti-reflection film
TWI375623B (en) Optical laminate and optical element
TWI482705B (en) Curable resin composition for antistatic layer, optical film, polarizing plate and display panel
JP2006096019A (en) Manufacturing method for laminated film