TWI443365B - Method for producing optical film, optical film, polarizer and display - Google Patents

Method for producing optical film, optical film, polarizer and display Download PDF

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TWI443365B
TWI443365B TW099141183A TW99141183A TWI443365B TW I443365 B TWI443365 B TW I443365B TW 099141183 A TW099141183 A TW 099141183A TW 99141183 A TW99141183 A TW 99141183A TW I443365 B TWI443365 B TW I443365B
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hard coat
coat layer
layer
light
refractive index
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TW201128216A (en
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Yusuke Hayashi
Shin Miyanowaki
Seiji Shinohara
Shigeki Murakami
Koji Hashimoto
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Dainippon Printing Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • C08J7/0423Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08Cellulose derivatives
    • C08J2301/10Esters of organic acids
    • C08J2301/12Cellulose acetate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08J2433/16Homopolymers or copolymers of esters containing halogen atoms

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)

Description

光學薄膜之製造方法,光學薄膜,偏光板及顯示器Optical film manufacturing method, optical film, polarizing plate and display

本發明係關於在諸如液晶顯示器(LCD)、陰極管顯示裝置(CRT)、或電漿顯示器(PDP)等顯示器(影像顯示裝置)的前面等處設置之光學薄膜、其製造方法、暨使用其之偏光板及顯示器。The present invention relates to an optical film disposed at the front of a display (image display device) such as a liquid crystal display (LCD), a cathode tube display device (CRT), or a plasma display (PDP), a method of manufacturing the same, and a use thereof Polarizer and display.

在如上述的顯示器中,為提高該顯示面的檢視性,便要求減少從諸如螢光燈、太陽光等外部光源所照射光線的反射。抑制外部光之反射的方法,已知有使用在硬塗層等機能層的最表面上設置低折射率層的抗反射膜之方法(例如專利文獻1)。In the display as described above, in order to improve the visibility of the display surface, it is required to reduce reflection from light irradiated from an external light source such as a fluorescent lamp or sunlight. A method of using an antireflection film provided with a low refractive index layer on the outermost surface of a functional layer such as a hard coat layer is known as a method of suppressing reflection of external light (for example, Patent Document 1).

但是,如專利文獻1的發明,將機能層形成用組成物施行塗佈,並利用游離輻射線使半硬化而形成機能層,更進一步在半硬化狀態的機能層上塗佈低折射率層形成用組成物,再使完全硬化的方式(半硬化方式(half-curing))中,以及習知在各層每層上分別塗佈組成物,再使完全硬化的逐次雙層塗佈方式中,因為將施行複數次塗佈步驟及硬化步驟,因而生產性不佳。However, in the invention of Patent Document 1, the composition for forming a functional layer is applied, and the functional layer is formed by semi-hardening by means of free radiation, and the low refractive index layer is formed on the functional layer of the semi-hardened state. In the method of using the composition, the method of completely hardening (half-curing), and the conventional application of coating the composition on each layer of each layer, and then completely hardening the double-layer coating method, because A plurality of coating steps and hardening steps will be performed, and thus productivity is poor.

針對此情況,專利文獻2有提案:主旨在提供能將2層以上的機能層同時施行雙層塗佈,俾可獲得高生產性、層間密接性較高,且不致對各層間機能分離造成障礙的光學薄膜之製造方法,其係將分別含有游離輻射線硬化性樹脂的A層與B層同時施行雙層塗佈,經施行第1次游離輻射線照射(預烘烤)後,接著施行乾燥,再施行第2次游離輻射線照射,而使硬化(完全硬化)的光學薄膜之製造方法。In view of this situation, Patent Document 2 proposes that the main purpose is to provide two-layer coating of two or more functional layers at the same time, which can achieve high productivity, high interlayer adhesion, and no obstacle to separation of functions between layers. In the method for producing an optical film, the layer A and the layer B each containing an exothermic radiation curable resin are simultaneously subjected to two-layer coating, and after performing the first epilation radiation (prebaking), followed by drying. A method of producing a cured (completely hardened) optical film by performing a second epilation radiation.

但是,除要求所雙層塗佈各層間之高密接性,亦要求所雙層塗佈層與基材或基材側所接觸層間之高密接性。專利文獻2係層間的密接性較高、各層間的機能被分離,但在同時塗佈的A層(硬塗層或防眩層)與B層(折射率控制層)之間存在有層界面。However, in addition to the high adhesion between the layers of the two-layer coating, high adhesion between the two-layer coating layer and the substrate or substrate-contacting layer is required. Patent Document 2 has high adhesion between layers and separation of functions between layers, but there is a layer interface between the A layer (hard coat layer or antiglare layer) and the B layer (refractive index control layer) which are simultaneously applied. .

再者,專利文獻1中,企圖降低低折射率層的折射率而使含有中空粒子等低折射率微粒子,但若依此使低折射率微粒子含於低折射率層中,則低折射率層的折射率便會降低,但因為低折射率層靠基材側所鄰接之機能層的折射率較高於低折射率層,因而在低折射率層與機能層的邊界(界面),於低折射率層的低折射率微粒子與機能層會有折射率差,若施行精密的膜厚控制,便會發生干涉紋,導致使用抗反射膜的顯示器之顯示面,出現檢視性降低之問題。Further, in Patent Document 1, an attempt is made to reduce the refractive index of the low refractive index layer to include low refractive index fine particles such as hollow particles, but if low refractive index fine particles are contained in the low refractive index layer, the low refractive index layer is formed. The refractive index is lowered, but since the refractive index of the functional layer adjacent to the substrate side of the low refractive index layer is higher than that of the low refractive index layer, the boundary (interface) between the low refractive index layer and the functional layer is low. The low refractive index fine particles of the refractive index layer and the functional layer have a refractive index difference. When precise film thickness control is performed, interference fringes occur, resulting in a display surface of the display using the antireflection film, which causes a problem of poor visibility.

[先行技術文獻][Advanced technical literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利特開2009-053691號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-053691

[專利文獻2]日本專利特開2008-250267號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-250267

本發明係為解決上述問題而完成,本發明第一目的係提供:藉由施行同時塗佈(雙層塗佈),而具有抗反射機能,且維持霧值、全光線穿透率及無紋斑面狀,並藉由減少塗佈步驟與硬化步驟而提升生產性,且藉由消除因逐次塗佈所造成的層間界面,而抑制層間干涉紋的發生,俾使密接性呈良化,藉由在基材附近,增加與基材折射率同程度折射率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,且密接性優異的光學薄膜、及其製造方法。The present invention has been made to solve the above problems, and a first object of the present invention is to provide an anti-reflection function by performing simultaneous coating (double-layer coating), and maintain fog value, total light transmittance, and no plaque. The surface is improved in productivity by reducing the coating step and the hardening step, and by eliminating the interfacial interface caused by successive coatings, the occurrence of interference fringes between the layers is suppressed, and the adhesion is improved. In the vicinity of the substrate, an optical film having a ratio of a hard coating composition having a refractive index of the same refractive index as that of the substrate is added, and interference between the hard coat layer and the substrate is suppressed, and an optical film having excellent adhesion is obtained, and a method for producing the same.

本發明第二目的係提供:具備上述光學薄膜的偏光板。A second object of the present invention is to provide a polarizing plate comprising the above optical film.

本發明第三目的係提供:具備上述光學薄膜的顯示器。A third object of the present invention is to provide a display comprising the above optical film.

本發明者等經深入鑽研,結果發現將第一組成物(其係未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於含光硬化性樹脂或熱硬化性樹脂的硬化性樹脂質量減少至5質量%以下,且具有特定黏度)、與第二組成物(其係含有低折射率微粒子,且具有特定黏度),從基材側使該第一組成物與第二組成物相鄰接並同時塗佈於基材上、或在基材上所設置的層上,在未施行乾燥前的預烘烤情況下便施行乾燥,接著藉由施行光照射或加熱而使硬化,便能依高生產性獲得在HC層的膜厚方向上,使低折射率微粒子的存在呈HC層靠基材的對向側之界面側較多於靠基材側,且呈越靠基材側則低折射率微粒子存在量越減少的分佈,即形成從基材對向側的界面側起朝基材側呈低折射率微粒子逐漸減少的分佈,並未形成如習知利用逐次雙層塗佈形成低折射率層與HC層時、或如專利文獻2利用同時塗佈形成時會出現的明確層界面,且具有抗反射機能,並在維持霧值、全光線穿透率及無紋斑面狀的情況下,藉由消除因逐次塗佈所產生的層間界面,便抑制層間的干涉紋發生,使密接性呈良化,藉由在基材附近,增加與基材折射率同程度折射率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,且密接性優異的光學薄膜,遂完成本發明。The inventors of the present invention have intensively studied and found that the first composition (which does not contain low refractive index fine particles and low refractive index resin, or even contains a low refractive index resin, is also resistant to photocurable resin or thermosetting property). The curable resin of the resin is reduced in mass to 5% by mass or less, and has a specific viscosity, and the second composition (which contains low refractive index fine particles and has a specific viscosity), and the first composition is made from the substrate side. The second composition is adjacent to and simultaneously coated on the substrate or on the layer provided on the substrate, and dried in the case of prebaking without drying, followed by light irradiation or heating. When the curing is performed, the film thickness direction of the HC layer can be obtained in accordance with high productivity, and the presence of the low refractive index fine particles is more on the interface side of the opposite side of the substrate than the substrate side of the HC layer. The distribution of the amount of the low-refractive-index microparticles decreases as the substrate side is formed, that is, the distribution of the low-refractive-index microparticles gradually decreases toward the substrate side from the interface side of the opposite side of the substrate, and is not formed as conventionally used. Sub-double coating to form a low refractive index When the layer and the HC layer are used, or a clear layer interface which is formed when the coating is formed by simultaneous coating as in Patent Document 2, and has an anti-reflection function, and in the case of maintaining the haze value, the total light transmittance, and the smear-free surface, By eliminating the interlayer interface generated by successive coatings, the occurrence of interference fringes between the layers is suppressed, and the adhesion is improved, and the hard coat composition having the same refractive index as the refractive index of the substrate is added in the vicinity of the substrate. The optical film which suppresses the occurrence of interference fringes between a hard-coat layer and a base material, and is excellent in adhesiveness, has completed the present invention.

即,本發明的光學薄膜之製造方法,係包括有:(i)準備光穿透性基材的步驟;(ii)準備第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物的步驟,該第一硬塗層用硬化性樹脂組成物係含有具反應性之第一樹脂及第一溶劑,且未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於該第一樹脂質量在5.0質量%以下,黏度μ1為3mPa‧s以上;該第二硬塗層用硬化性樹脂組成物係含有從平均粒徑10~300nm的低折射率微粒子及低折射率樹脂所構成群組中選擇1種以上的低折射率成分、以及具反應性的第二樹脂與第二溶劑,黏度μ2為5mPa‧s以上,且該μ2扣減掉該μ1的值係在30mPa‧s以下;(iii)在該光穿透性基材一面側,從該光穿透性基材側,至少使該第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物相鄰接並施行同時塗佈,而形成塗膜的步驟;以及(iv)使依上述(iii)步驟所獲得塗膜乾燥,接著施行光照射及/或加熱而使硬化的步驟;且在該(iii)步驟與該(iv)步驟間並未施行預烘烤。That is, the method for producing an optical film of the present invention includes: (i) a step of preparing a light-transmitting substrate; (ii) preparing a curable resin composition for a first hard coat layer and a second hard coat layer. a step of forming a curable resin composition containing a reactive first resin and a first solvent, and containing no low refractive index fine particles and a low refractive index resin, or even containing The low refractive index resin is also 5.0 mass% or less with respect to the mass of the first resin, and the viscosity μ1 is 3 mPa·s or more; the curable resin composition for the second hard coat layer contains a low average particle diameter of 10 to 300 nm. One or more kinds of low refractive index components and a second resin and a second solvent having reactivity are selected from the group consisting of the refractive index fine particles and the low refractive index resin, and the viscosity μ2 is 5 mPa·s or more, and the μ2 buckle is subtracted. The value of μ1 is 30 mPa·s or less; (iii) at least one side of the light-transmitting substrate, and the curable resin composition for the first hard coat layer is The second hard coat layer is adjacent to the hardened resin composition and simultaneously coated And forming a coating film; and (iv) drying the coating film obtained in the above step (iii), followed by performing light irradiation and/or heating to harden; and in the (iii) step and the (iv) Pre-bake is not performed between the steps.

將未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於第一樹脂質量減少至5.0質量%以下,並具有上述特定黏度的第一HC層用硬化性樹脂組成物(以下簡稱「第一組成物」),以及含有從低折射率微粒子及低折射率樹脂所構成群組中選擇1種以上的低折射率成分,並具有上述特定黏度的第二HC層用硬化性樹脂組成物(以下簡稱「第二組成物」),從光穿透性基材側依使第一組成物及第二組成物呈相鄰接位置狀態施行同時雙層塗佈,而形成HC層且未施行預烘烤,藉此便使第二組成物中所含的低折射率成分在HC層的膜厚方向上,存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,且形成越靠光穿透性基材側則低折射率成分存在量越減少的分佈,呈從靠光穿透性基材的對向側之界面起朝光穿透性基材側,該低折射率成分逐漸減少,便可獲得經抑制HC層內因低折射率成分與HC層的樹脂間之折射率差所造成干涉紋發生、以及HC層與基材之界面的干涉紋發生,且檢視性優異的光學薄膜。The first HC layer is made of a curable resin which does not contain low-refractive-index fine particles and a low-refractive-index resin, or which contains a low-refractive-index resin, is reduced to 5.0 mass% or less with respect to the first resin, and has the above specific viscosity. (hereinafter referred to as "first composition"), and a second HC layer containing one or more kinds of low refractive index components selected from the group consisting of low refractive index fine particles and low refractive index resins and having the above specific viscosity The curable resin composition (hereinafter referred to as "second composition") is formed by applying a double layer coating to the light-transmitting substrate side while the first composition and the second composition are adjacent to each other. The HC layer is not pre-baked, whereby the low refractive index component contained in the second composition is present in the film thickness direction of the HC layer, and the HC layer is on the opposite side of the light transmissive substrate. The interface side is more on the side of the light-transmitting substrate, and the side of the light-transmissive substrate side is formed such that the amount of the low-refractive-index component decreases, which is from the opposite side of the light-transmitting substrate. The interface is from the side of the light transmissive substrate, and the low refractive index component is By gradually decreasing, it is possible to obtain an interference pattern in which an interference pattern between the low refractive index component and the resin of the HC layer in the HC layer is suppressed, and interference fringes at the interface between the HC layer and the substrate are generated, and the optical property is excellent in visibility. film.

又,因為在未施行預烘烤的情況下便使塗膜乾燥,接著施行光照射或加熱而使塗膜硬化,因而相較於施行預烘烤而使硬化的情況下,提高HC層、與光穿透性基材及HC層靠光穿透性基材側所鄰接層間之密接性。本發明中所謂「預烘烤」係指未使塗膜進行正式硬化的光照射及/或加熱。又,所謂「塗膜正式硬化」係指使塗膜乾燥而減少塗膜中的溶劑,經硬化塗膜依JIS K5600-5-4(1999)所規定的鉛筆硬度試驗(4.9N荷重),顯現出「H」以上硬度的硬化。Further, since the coating film is dried without performing prebaking, and then the coating film is cured by light irradiation or heating, the HC layer and the HC layer are improved as compared with the case where the baking is performed by the prebaking. The light-transmitting substrate and the HC layer are adhered to each other by the adjacent layer on the side of the light-transmitting substrate. In the present invention, "prebaking" means light irradiation and/or heating in which the coating film is not substantially hardened. In addition, "the coating film is completely cured" means that the coating film is dried to reduce the solvent in the coating film, and the cured coating film is expressed by a pencil hardness test (4.9 N load) prescribed in JIS K5600-5-4 (1999). Hardening of hardness above "H".

本發明光學薄膜之製造方法的較佳實施態樣,亦可獲得下述光學薄膜,其在上述(iii)步驟中,將第一硬塗層用硬化性樹脂組成物的塗膜潤濕膜厚設為T1,並將第二硬塗層用硬化性樹脂組成物的塗膜潤濕膜厚設為T2時,藉由將T2除以T1的值(即T2/T1)設為0.01~1,便在硬塗層的膜厚方向上,低折射率成分存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,且呈越靠光穿透性基材側則低折射率成分存在量越減少的分佈,呈從靠光穿透性基材的對向側之界面朝靠光穿透性基材側,該低折射率成分逐漸減少,且在硬塗層的膜厚方向上,在從上述靠光穿透性基材的對向側之界面起至達上述硬塗層乾燥膜厚70%為止的區域中,存在有上述低折射率成分總量的70~100%之分佈。In a preferred embodiment of the method for producing an optical film of the present invention, an optical film may be obtained which has a film thickness of the coating film of the curable resin composition for the first hard coat layer in the step (iii). When T1 is used and the coating film wetting thickness of the curable resin composition for the second hard coat layer is T2, the value of T2 divided by T1 (that is, T2/T1) is set to 0.01 to 1, In the film thickness direction of the hard coat layer, the low refractive index component is present on the opposite side of the opposite side of the light-transmitting substrate of the HC layer, and is more light-receiving. On the side of the penetrating substrate, the distribution of the amount of the low refractive index component decreases, and the low refractive index component gradually decreases from the interface on the opposite side of the light transmissive substrate toward the side of the light transmissive substrate. And in the film thickness direction of the hard coat layer, in the region from the interface on the opposite side of the light-transmitting substrate to the dry film thickness of 70% of the hard coat layer, the low refractive index is present. The distribution of the total composition of 70~100%.

藉由形成此種低折射率成分的分佈,即便低折射率成分的含有量減少,仍可充分顯現出光學薄膜的抗反射性能。By forming the distribution of such a low refractive index component, even if the content of the low refractive index component is reduced, the antireflection performance of the optical film can be sufficiently exhibited.

另外,在HC層膜厚方向上的低折射率微粒子分佈,係可利用HC層膜厚方向截面的TEM(穿透型電子顯微鏡)照片進行觀察。Further, the distribution of the low refractive index fine particles in the film thickness direction of the HC layer can be observed by a TEM (transmission electron microscope) photograph of the cross section of the thickness direction of the HC layer.

HC層膜厚方向上的低折射率樹脂分佈,係例如將光學薄膜使用熱硬化性樹脂予以包藏,再使用LEICA公司製超薄切片機,從該經包藏的光學薄膜製作出厚80nm的超薄切片,接著使用RuO4施行氣相染色,並利用TEM進行觀察便可測定。The low refractive index resin distribution in the film thickness direction of the HC layer is, for example, an optical film is occluded with a thermosetting resin, and an ultrathin slicer manufactured by LEICA Co., Ltd. is used to prepare an ultrathin film having a thickness of 80 nm from the occluded optical film. Sectioning was followed by gas phase staining using RuO4 and observation by TEM.

本發明光學薄膜之製造方法的較佳實施態樣,較佳係上述第一硬塗層用硬化性樹脂組成物的黏度μ1為3~95mPa‧s,上述第二硬塗層用硬化性樹脂組成物的黏度μ2為5~100mPa‧s,因為可輕易地獲得具有上述特定低折射率成分分佈的HC層。In a preferred embodiment of the method for producing an optical film of the present invention, it is preferred that the first resin composition for a first hard coat layer has a viscosity μ1 of from 3 to 95 mPa·s, and the second hard coat layer is composed of a curable resin. The viscosity μ2 of the object is 5 to 100 mPa‧s because the HC layer having the specific low refractive index component distribution described above can be easily obtained.

本發明光學薄膜係依照上述光學薄膜之製造方法所獲得的光學薄膜。The optical film of the present invention is an optical film obtained in accordance with the above-described method for producing an optical film.

本發明光學薄膜的較佳實施態樣,亦可為在光穿透性基材的一面側設有硬塗層的光學薄膜,其中,在上述硬塗層的膜厚方向上,低折射率微粒子存在呈靠上述光穿透性基材之對向側的界面側較多於靠該光穿透性基材側的狀態,且越靠該光穿透性基材側則該低折射率微粒子的存在量越少,從該從靠光穿透性基材的對向側之界面朝靠光穿透性基材側呈該低折射率成分逐漸減少狀態,在該硬塗層內並無層界面,在該硬塗層對上述光穿透性基材的棋盤格密接性試驗中,可使密接率成為90~100%。A preferred embodiment of the optical film of the present invention may be an optical film having a hard coat layer on one side of the light-transmitting substrate, wherein the low-refractive-index particles are in the film thickness direction of the hard coat layer. There is a state in which the interface side on the opposite side of the light-transmitting substrate is more on the side of the light-transmitting substrate, and the side of the light-permeable substrate is on the side of the light-permeable substrate. The amount of the lower refractive index component is gradually reduced from the interface on the opposite side from the light-transmitting substrate toward the light-permeable substrate side, and there is no layer interface in the hard coat layer. In the checkerboard adhesion test of the hard coat layer to the light-transmitting substrate, the adhesion ratio can be made 90 to 100%.

此處所謂「棋盤格密接性試驗的密接率」係指在光學薄膜靠HC層側表面上依1mm方塊劃入合計100格的棋盤格,再使用寬24mm黏貼帶(例如NICHIBAN(股)製工業用賽珞膠帶(註冊商標)),施行5次連續剝離試驗,再根據下述基準所計算出未剝落而殘留的方格比例。Here, the "adhesive ratio of the checkerboard adhesion test" means that the optical film is divided into a checkerboard of 100 squares by 1 mm square on the side surface of the HC layer, and a width of 24 mm adhesive tape is used (for example, the ICICHIBAN system) Five consecutive peeling tests were carried out using cellophane tape (registered trademark), and the ratio of the squares remaining without peeling was calculated according to the following criteria.

密接率(%)=(未剝落的方格數/合計的方格數100)×100Bonding rate (%) = (number of squares without peeling off / total number of squares 100) × 100

本發明光學薄膜的較佳實施態樣,亦可硬塗層的膜厚方向上,在從上述靠光穿透性基材的對向側之界面起至達上述硬塗層乾燥膜厚70%為止的區域中,存在有上述低折射率微粒子總量的70~100%。In a preferred embodiment of the optical film of the present invention, the film thickness direction of the hard coat layer may be 70% from the interface of the opposite side of the light-transmitting substrate to the dry film thickness of the hard coat layer. In the region up to the above, 70 to 100% of the total amount of the low refractive index fine particles are present.

本發明的偏光板係在上述任一光學薄膜靠上述硬塗層的對向之光穿透性基材側上,設有偏光片。The polarizing plate of the present invention is provided with a polarizer on the side of the light-transmitting substrate on which the optical film is opposed to the hard coat layer.

本發明的顯示器係在上述任一光學薄膜靠上述硬塗層的對向之光穿透性基材側上,配置顯示面板。In the display of the present invention, the display panel is disposed on the side of the light-transmissive substrate on which the optical film is opposed to the hard coat layer.

將第一組成物(其係未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是屬上述特定量,且具有上述特定黏度)、及第二組成物(其係含有低折射率微粒子及/或低折射率樹脂,並具有上述特定黏度),從光穿透性基材側依使第一組成物及第二組成物呈相鄰接位置狀態施行同時塗佈,在未施行預烘烤的情況下使塗膜乾燥,接著再施行光照射或加熱而形成HC層,藉此便可獲得第二組成物中所含的低折射率微粒子及/或低折射率樹脂,在HC層的膜厚方向上,存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,呈越靠光穿透性基材側則其存在量越減少的分佈,且形成從靠光穿透性基材的對向側之界面起朝靠光穿透性基材側呈該低折射率成分逐漸減少的分佈,並且具有抗反射機能,並在維持霧值、全光線穿透率及無紋斑面狀的情況下,藉由減少塗佈步驟與硬化步驟而提升生產性,且藉由消除因逐次塗佈所產生的層間界面,便抑制層間的干涉紋發生,使密接性呈良化,藉由在基材附近,增加與基材折射率同程度折射率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,且密接性優異的光學薄膜。a first composition (which does not contain low refractive index fine particles and a low refractive index resin, or a specific refractive index even if a low refractive index resin is contained, and has the specific viscosity described above), and a second composition (which contains a low-refractive-index microparticle and/or a low-refractive-index resin having a specific viscosity as described above, and simultaneously applying the first composition and the second composition in a state of being adjacent to each other from the side of the light-transmitting substrate; The coating film is dried without performing prebaking, and then light irradiation or heating is performed to form an HC layer, whereby low refractive index fine particles and/or low refractive index resin contained in the second composition can be obtained. In the film thickness direction of the HC layer, the interface side of the opposite side of the light-transmitting substrate of the HC layer is more on the side of the light-transmitting substrate, and the side closer to the light-transmitting substrate is a distribution in which the amount of decrease is reduced, and a distribution in which the low refractive index component gradually decreases from the interface on the opposite side of the light-transmitting substrate toward the light-transmitting substrate side, and has an anti-reflection function And maintain the fog value, total light penetration and no plaque Next, the productivity is improved by reducing the coating step and the hardening step, and by eliminating the interlayer interface generated by the successive coating, the occurrence of interference fringes between the layers is suppressed, and the adhesion is improved by the substrate. In the vicinity, an optical film having a ratio of a hard coating composition having a refractive index of the same refractive index as that of the substrate is added, and interference fringes between the hard coat layer and the substrate are suppressed, and the adhesion is excellent.

以下,首先,針對本發明的光學薄膜之製造方法進行說明,接著再針對該光學薄膜進行說明。Hereinafter, first, a method of producing an optical film of the present invention will be described, and then the optical film will be described.

本發明中,(甲基)丙烯酸酯係指丙烯酸酯及/或甲基丙烯酸酯。In the present invention, (meth) acrylate means acrylate and/or methacrylate.

再者,本發明的光係不僅侷限於可見及非可見區域波長的電磁波,尚涵蓋諸如電子射線之類的粒子射線、以及電磁波與粒子射線之統稱的放射線或游離輻射線。Furthermore, the optical system of the present invention is not limited to electromagnetic waves of wavelengths of visible and non-visible regions, and encompasses particle rays such as electron rays, and radiation or free radiation which are collectively referred to as electromagnetic waves and particle rays.

本發明中,在無特別聲明的前提下,所謂「膜厚」係指乾燥時的膜厚(乾燥膜厚)。In the present invention, the term "film thickness" means the film thickness (dry film thickness) at the time of drying, unless otherwise stated.

本發明中,所謂「硬塗層」係指依照JIS K5600-5-4(1999)所規定的鉛筆硬度試驗(4.9N荷重),達「H」以上的硬度。In the present invention, the term "hard coat layer" means a hardness of "H" or more in accordance with a pencil hardness test (4.9 N load) prescribed in JIS K5600-5-4 (1999).

另外,薄膜與薄片在JIS-K6900的定義中,所謂「薄片」係指較薄且一般其厚度相對於長度與寬度呈較小的扁平製品,所謂「薄膜」係指相較於長度及寬度之下,厚度屬於極小,而最大厚度則為任意限定的薄扁平製品,通例係依捲筒形式供應。所以,薄片中就厚度特別薄者亦可稱之為薄膜,因為薄片與薄膜的界線並無一定,不易明確區分,因而本發明將涵蓋厚度較厚者及較薄者等二者的涵義定義為「薄膜」。Further, in the definition of the film and the sheet in the definition of JIS-K6900, the term "sheet" means a flat product which is thin and generally has a thickness which is small with respect to the length and the width, and the "film" means the length and the width. The thickness is extremely small, and the maximum thickness is an arbitrarily defined thin flat product, which is generally supplied in the form of a roll. Therefore, the thickness of the sheet is particularly thin, which may also be referred to as a film, because the boundary between the sheet and the film is not necessarily determined, and it is not easy to distinguish clearly. Therefore, the meaning of both the thicker and the thinner is defined as "film".

本發明中所謂「樹脂」係除單體、寡聚物之外,尚涵蓋聚合物的概念,在經硬化後會成為HC層或其他機能層之基質的成分。In the present invention, the term "resin" encompasses the concept of a polymer in addition to a monomer or an oligomer, and becomes a component of a matrix of an HC layer or other functional layer after being cured.

本發明中,所謂「分子量」係指當具分子量分佈的情況,在THF溶劑中利用凝膠滲透色層分析儀(GPC)所測得聚苯乙烯換算值的重量平均分子量,當無具分子量分佈的情況,便指化合物本身的分子量。In the present invention, the "molecular weight" means a weight average molecular weight measured by a gel permeation chromatography (GPC) in a THF solvent when a molecular weight distribution is used, when there is no molecular weight distribution. The case refers to the molecular weight of the compound itself.

本發明中,所謂「低折射率微粒子的平均粒徑」係指當組成物的微粒子情況,依動態光散射方法測定溶液中的粒子,並依累積分佈表示含一次粒徑及二次粒徑的粒徑分佈時之50%粒徑(d50中間粒徑),可使用日機裝(股)製Microtrac粒度分析計進行測定。當HC層中的微粒子情況,便指HC層截面利用TEM照片所觀察到粒子20個的平均值。In the present invention, the "average particle diameter of the low refractive index microparticles" means that the particles in the solution are measured by a dynamic light scattering method in the case of the microparticles of the composition, and the primary particle diameter and the secondary particle diameter are expressed by the cumulative distribution. The 50% particle diameter (d50 intermediate particle diameter) at the time of particle size distribution can be measured using a Microtrac particle size analyzer manufactured by Nikkiso Co., Ltd. When the particles in the HC layer are in the case of the HC layer, the average of 20 particles observed by the TEM photograph is used.

(光學薄膜之製造方法)(Method of manufacturing optical film)

本發明的光學薄膜之製造方法,其特徵在於包括有:(i)準備光穿透性基材的步驟;(ii)準備第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物的步驟,該第一硬塗層用硬化性樹脂組成物係含有具反應性之第一樹脂及第一溶劑,且未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於該第一樹脂質量在5.0質量%以下,黏度μ1為3mPa‧s以上;該第二硬塗層用硬化性樹脂組成物係含有從平均粒徑10~300nm的低折射率微粒子及低折射率樹脂所構成群組中選擇1種以上的低折射率成分、以及具反應性的第二樹脂與第二溶劑,黏度μ2為5mPa‧s以上,且該μ2扣減掉該μ1的值係在30mPa‧s以下;(iii)在該光穿透性基材一面側,從該光穿透性基材側,至少使該第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物相鄰接並施行同時塗佈,而形成塗膜的步驟;以及(iv)使依上述(iii)步驟所獲得塗膜乾燥,接著施行光照射及/或加熱而使硬化的步驟;且在該(iii)步驟與該(iv)步驟間並未施行預烘烤。A method for producing an optical film of the present invention, comprising: (i) a step of preparing a light-transmitting substrate; (ii) preparing a curable resin composition for a first hard coat layer and a second hard coat layer a step of forming a curable resin composition containing a reactive first resin and a first solvent, and containing no low refractive index fine particles and a low refractive index resin, or even containing The low refractive index resin is also 5.0 mass% or less with respect to the mass of the first resin, and the viscosity μ1 is 3 mPa·s or more; the curable resin composition for the second hard coat layer contains a low average particle diameter of 10 to 300 nm. One or more kinds of low refractive index components and a second resin and a second solvent having reactivity are selected from the group consisting of the refractive index fine particles and the low refractive index resin, and the viscosity μ2 is 5 mPa·s or more, and the μ2 buckle is subtracted. The value of μ1 is 30 mPa·s or less; (iii) at least one side of the light-transmitting substrate, and the curable resin composition for the first hard coat layer is The second hard coat layer is adjacent to the hardening resin composition and is subjected to the same a step of coating to form a coating film; and (iv) a step of drying the coating film obtained in the above step (iii), followed by performing light irradiation and/or heating to cure; and in the step (iii) (iv) Pre-baking is not performed between steps.

圖1所示係依照本發明之製造方法所獲得光學薄膜的HC層中,低折射率微粒子分佈一例的截面示意圖。Fig. 1 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in the HC layer of the optical film obtained by the production method of the present invention.

光學薄膜1係在光穿透性基材10之一面側上設置HC層20,而HC層中,低折射率微粒子30係存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側狀態,且越靠光穿透性基材側則存在量越少的分佈,即,具有從靠光穿透性基材的對向側之界面朝靠光穿透性基材側,呈該低折射率成分逐漸減少的分佈。In the optical film 1, the HC layer 20 is provided on one surface side of the light-transmitting substrate 10, and in the HC layer, the low-refractive-index particles 30 are present on the opposite side of the opposite side of the HC layer from the light-transmitting substrate. More than the light-transmitting substrate side state, and the lighter penetrating substrate side has a smaller amount of distribution, that is, having an interface from the opposite side of the light-transmitting substrate toward The light-transmissive substrate side has a distribution in which the low refractive index component gradually decreases.

圖2所示係習知依照逐次雙層塗佈方式所形成抗反射膜的低折射率層中,低折射率微粒子分佈一例的截面示意圖。Fig. 2 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in a low refractive index layer of an antireflection film formed by a sequential double coating method.

抗反射膜100係在光穿透性基材10的一面側,從光穿透性基材側設置HC層110及低折射率層120,在低折射率層內的低折射率微粒子30呈均勻分佈,因為經使HC層完全硬化而形成後,才形成低折射率層,因而低折射率微粒子並非在HC層內,在低折射率層與HC層的界面處會有折射率差變大,導致會產生干涉紋。又,HC層與低折射率層的界面亦可明確的分辨出。且,若與圖1的低折射率微粒子所存在區域之厚度,為相同程度膜厚之較厚低折射率層係由習知抗反射膜形成,便會發生干涉紋。The anti-reflection film 100 is provided on one surface side of the light-transmitting substrate 10, and the HC layer 110 and the low-refractive-index layer 120 are provided from the side of the light-transmitting substrate, and the low-refractive-index particles 30 in the low-refractive-index layer are uniform. Since the low refractive index layer is formed after the HC layer is completely hardened, the low refractive index fine particles are not in the HC layer, and the refractive index difference becomes large at the interface between the low refractive index layer and the HC layer. This causes interference patterns. Moreover, the interface between the HC layer and the low refractive index layer can be clearly distinguished. Further, if the thickness of the region where the low-refractive-index microparticles are present in Fig. 1 is thicker than the thickness of the film having the same thickness, the low-refractive-index layer is formed of a conventional anti-reflection film, and interference fringes occur.

依此的話,習知逐次雙層塗佈方式中,若形成與依照本發明塗佈方法所獲得低折射率微粒子分佈的厚度,為相同程度厚度之上層(低折射率層),則在成為下層的組成物之硬化部分、與成為上層的組成物之硬化部分便會有界面產生,而該界面部分的上層組成物中所含低折射率微粒子、與下層組成物中所含樹脂的折射率差較大,導致出現干涉紋。According to this, in the conventional double-layer coating method, if the thickness of the low-refractive-index particle distribution obtained by the coating method according to the present invention is formed to the same thickness as the upper layer (low-refractive-index layer), the lower layer is formed. The hardened portion of the composition and the hardened portion of the composition to be the upper layer are formed by an interface, and the refractive index difference between the low refractive index fine particles contained in the upper layer composition and the resin contained in the lower layer composition is Larger, resulting in interference patterns.

相對於此,本發明光學薄膜之製造方法中,將第一組成物(其係未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於第一樹脂質量在5.0質量%以下,且具有上述特定黏度)、及第二組成物(其係含有低折射率成分,並具有上述特定黏度),從光穿透性基材側依使第一組成物及第二組成物呈相鄰接位置狀態進行同時塗佈,而形成HC層,且藉由未施行預烘烤,便如圖1所示,第二組成物中所含的低折射率成分在HC層的膜厚方向上,存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,且越靠光穿透性基材側則低折射率微粒子存在量越減少的分佈,即,形成從光穿透性基材的對向側之界面側起朝光穿透性基材側,呈低折射率成分逐漸減少的分佈,而抑制HC層內因低折射率成分與HC層的樹脂間之折射率差所造成的干涉紋發生、以及抑制HC層與基材間之界面處發生干涉紋,可獲得檢視性優異,且在HC層、與光穿透性基材或光穿透性基材側所鄰接層間之密接性優異的光學薄膜。On the other hand, in the method for producing an optical film of the present invention, the first composition (which does not contain low refractive index fine particles and low refractive index resin, or even contains a low refractive index resin is also 5.0 with respect to the first resin mass) 5% by mass or less, and having a specific viscosity as described above, and a second composition (which contains a low refractive index component and having the specific viscosity described above), and the first composition and the second composition are supported from the side of the light-transmitting substrate The material is simultaneously coated in an adjacent position to form an HC layer, and by performing prebaking, as shown in FIG. 1, the low refractive index component contained in the second composition is in the film of the HC layer. In the thick direction, the interface side of the opposite side of the light-transmitting substrate of the HC layer is more on the side of the light-permeable substrate, and the side of the light-transmissive substrate is low-refractive-index particles. The distribution in which the amount is decreased, that is, the distribution from the interface side on the opposite side of the light-transmitting substrate toward the light-transmitting substrate side, the distribution of the low refractive index component is gradually decreased, and the low refractive index in the HC layer is suppressed. The interference pattern caused by the difference in refractive index between the composition of the component and the resin of the HC layer, Further, it is possible to suppress interference fringes at the interface between the HC layer and the substrate, and it is excellent in visibility, and excellent in adhesion between the HC layer and the layer adjacent to the light-transmitting substrate or the light-transmitting substrate. film.

再者,因為無必要施行預烘烤,因而相較於施行預烘烤與正式硬化等2度光照射才使硬化的情況下,生產性亦屬優異。Further, since it is not necessary to perform prebaking, it is excellent in productivity in the case where hardening is performed by two-degree light irradiation such as prebaking or main hardening.

另外,當在光穿透性基材上利用同時塗佈形成含有低折射率成分之低折射率微粒子的HC層時,該HC層與該光穿透性基材間之密接性良好的理由雖尚未明確,但可推測如下理由。即,若第一組成物中所含的樹脂接觸到光穿透性基材,則該樹脂會滲透於光穿透性基材中,並產生化學性及/或物理性結合,因而推測會提升HC層與光穿透性基材間之密接性。相對於此,當HC層中所含低折射率微粒子並未形成如上述般越靠光穿透性基材側則存在量越減少的分佈,而使在HC層中呈均勻分散時,在HC層中靠光穿透性基材側的界面處,僅有低折射率微粒子所佔據部分會有因樹脂滲透而不發生樹脂與基材間之化學性及/或物理性結合情形,推測密接性並未獲提高。Further, when the HC layer containing the low refractive index fine particles having a low refractive index component is simultaneously coated on the light-transmitting substrate, the reason for the good adhesion between the HC layer and the light-transmitting substrate is Not yet clear, but the following reasons can be speculated. That is, if the resin contained in the first composition contacts the light-transmitting substrate, the resin penetrates into the light-transmitting substrate and chemically and/or physically combines, so that it is presumed to be improved. Adhesion between the HC layer and the light-transmitting substrate. On the other hand, when the low-refractive-index microparticles contained in the HC layer are not formed as described above, the amount of the low-refractive-index microparticles is reduced as it is closer to the light-transmitting substrate side, and when it is uniformly dispersed in the HC layer, in HC At the interface of the light-transmissive substrate side of the layer, only the portion occupied by the low-refractive-index microparticles may be infiltrated by the resin without chemical and/or physical bonding between the resin and the substrate, and the adhesion is presumed. Not improved.

再者,若在光穿透性基材上剛將第一組成物與第二組成物施行同時塗佈後,便施行預烘烤,則在溶劑存在下,於樹脂滲透入光穿透性基材之前便會開始進行聚合或交聯,導致樹脂的分子量變大,樹脂便不會滲透入光穿透性基材中,即便經乾燥後再施行光照射或加熱,推測密接性仍未獲提高。Further, if the first composition and the second composition are applied simultaneously on the light-transmitting substrate, pre-baking is performed, and the light penetrating base is infiltrated into the resin in the presence of a solvent. Polymerization or cross-linking will begin before the material starts, resulting in a larger molecular weight of the resin, and the resin will not penetrate into the light-transmitting substrate. Even after drying, light irradiation or heating is performed, and the adhesion is not improved. .

由該等現象推測,在光穿透性基材上將第一組成物與第二組成物施行同時塗佈,而形成上述具特定低折射率微粒子分佈的本發明HC層時,會成為對光穿透性基材的密接性屬優異者。From these phenomena, it is presumed that the first composition and the second composition are simultaneously coated on the light-transmissive substrate, and when the HC layer of the present invention having the specific low-refractive-index particle distribution is formed, it becomes a light. The adhesion of the penetrating substrate is excellent.

圖3所示係本發明的光學薄膜之製造方法中,將第一及第二HC層用硬化性樹脂組成物施行同時塗佈的步驟一例之示意圖。Fig. 3 is a schematic view showing an example of a procedure for simultaneously applying the curable resin composition for the first and second HC layers in the method for producing an optical film of the present invention.

在光穿透性基材10上,從模具塗佈機頭40的狹縫51及52分別將第一硬塗層用硬化性樹脂組成物60及第二硬塗層用硬化性樹脂組成物70,依第一硬塗層用硬化性樹脂組成物位於光穿透性基材側上的方式,呈相鄰接施行同時雙層塗佈,便形成第一硬塗層用硬化性樹脂組成物的塗膜61、及第二硬塗層用硬化性樹脂組成物的塗膜71。另外,圖3中,第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物係原本呈一體而形成硬塗層,但為求說明簡化,便將該二種組成物與其塗膜分開顏色圖示。In the light-transmitting substrate 10, the first hard coat layer curable resin composition 60 and the second hard coat layer curable resin composition 70 are respectively used from the slits 51 and 52 of the die coater head 40. And the first hard coat layer curable resin composition is placed on the side of the light-transmitting substrate, and the double-layer coating is applied adjacent to the first hard coat layer to form the first hard coat layer curable resin composition. The coating film 71 and the coating film 71 of the curable resin composition for the second hard coat layer. In addition, in FIG. 3, the curable resin composition for the first hard coat layer and the curable resin composition for the second hard coat layer are integrally formed to form a hard coat layer, but for simplification of description, the two types are used. The composition is separated from its coating film by a color diagram.

以下,針對在(i)及(ii)步驟中所準備的光穿透性基材、第一組成物、及第二組成物進行說明。Hereinafter, the light-transmitting substrate, the first composition, and the second composition prepared in the steps (i) and (ii) will be described.

(光穿透性基材)(light penetrating substrate)

本發明的光穿透性基材係在滿足能使用為光學薄膜之光穿透性基材的物性前提下,其餘並無特別的限制,可適當選擇使用習知公知在硬塗薄膜或光學薄膜中所採用的三醋酸纖維素、聚對苯二甲酸乙二酯、或環烯烴聚合物等。The light-transmitting substrate of the present invention is not particularly limited as long as it satisfies the physical properties of the light-transmitting substrate which can be used as an optical film, and a conventionally known hard-coated film or optical film can be appropriately selected and used. The cellulose triacetate, polyethylene terephthalate, or cycloolefin polymer used in the medium.

可見光域380~780nm中的光穿透性基材之平均光穿透率,較佳係50%以上、更佳係70%以上、特佳係85%以上。另外,光穿透率的測定係使用紫外可見分光光度計(例如島津製作所(股)製UV-3100PC),採在室溫、大氣中所測得的值。The average light transmittance of the light-transmitting substrate in the visible light region of 380 to 780 nm is preferably 50% or more, more preferably 70% or more, and particularly preferably 85% or more. In addition, the measurement of the light transmittance is carried out by using an ultraviolet-visible spectrophotometer (for example, UV-3100PC manufactured by Shimadzu Corporation), and the values measured at room temperature and in the atmosphere.

再者,亦可對光穿透性基材施行皂化處理、或設置底漆層等表面處理。又,在光穿透性基材中亦可添加諸如抗靜電劑等添加劑。Further, the light-transmitting substrate may be subjected to a saponification treatment or a surface treatment such as a primer layer. Further, an additive such as an antistatic agent may be added to the light transmissive substrate.

光穿透性基材的厚度並無特別的限制,通常係20μm~300μm左右,較佳係40μm~200μm。The thickness of the light-transmitting substrate is not particularly limited, but is usually about 20 μm to 300 μm, preferably 40 μm to 200 μm.

(第一硬塗層用硬化性樹脂組成物)(curable resin composition for the first hard coat layer)

第一硬塗層用硬化性樹脂組成物係含有具反應性的第一樹脂及第一溶劑,且未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於該第一樹脂質量在5.0質量%以下,黏度μ1為5mPa‧s以上。The curable resin composition for the first hard coat layer contains a reactive first resin and a first solvent, and does not contain low refractive index fine particles and a low refractive index resin, or even contains a low refractive index resin. The first resin has a mass of 5.0% by mass or less and a viscosity μ1 of 5 mPa·s or more.

第一組成物係未含有低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於該第一樹脂的質量在5.0質量%以下,並具有上述特定黏度,而後述第二組成物係含有低折射率成分,並具有特定黏度,且依第一組成物較第二組成物位於更靠光穿透性基材側的方式,藉由使該二種組成物相鄰接進行同時塗佈,並在使第一組成物與第二組成物進行硬化而形成HC層時,HC層的膜厚方向上,從光穿透性基材的對向側之界面側起朝光穿透性基材側呈低折射率成分逐漸減少的分佈,當低折射率成分係低折射率微粒子的情況,便如圖1所示的低折射率微粒子分佈。The first composition does not contain the low refractive index fine particles and the low refractive index resin, or the low refractive index resin is 5.0 mass% or less with respect to the mass of the first resin, and has the above specific viscosity, and is described later. The composition contains a low refractive index component and has a specific viscosity, and the two compositions are adjacent to each other in a manner that the first composition is located closer to the side of the light transmissive substrate than the second composition. Simultaneously coating, and when the first composition and the second composition are hardened to form an HC layer, in the film thickness direction of the HC layer, the light is worn from the interface side of the opposite side of the light-transmitting substrate. The transparent substrate side has a distribution in which the low refractive index component gradually decreases, and when the low refractive index component is a low refractive index fine particle, the low refractive index fine particles are distributed as shown in FIG.

第一組成物的黏度μ1係就從適度抑制後述在與第二組成物間之混合的觀點,較佳為3mPa‧s以上、更佳為10mPa‧s以上。該黏度μ1係就從提高塗佈性的觀點,較佳為95mPa‧s以下、更佳為50mPa‧s以下、特佳為30mPa‧s以下。又,第二組成物的黏度μ2減掉μ1的值(以下亦簡稱「黏度差」)係在30mPa‧s以下。黏度差係就從抑制混合、與所形成面狀的觀點,較佳係15mPa‧s以下、更佳係10mPa‧s以下。又,第一組成物的黏度μ1與第二組成物的黏度μ2,係就從塗佈性的觀點,較佳係μ2大於μ1。The viscosity μ1 of the first composition is preferably 3 mPa ‧ s or more, and more preferably 10 mPa ‧ s or more from the viewpoint of appropriately suppressing mixing between the second composition and the second composition. The viscosity μ1 is preferably 95 mPa·s or less, more preferably 50 mPa·s or less, and particularly preferably 30 mPa·s or less from the viewpoint of improving coatability. Further, the viscosity μ2 of the second composition minus the value of μ1 (hereinafter also referred to as "viscosity difference") is 30 mPa ‧ or less. The viscosity difference is preferably 15 mPa ‧ or less, more preferably 10 mPa ‧ s or less from the viewpoint of suppressing mixing and forming a planar shape. Further, the viscosity μ1 of the first composition and the viscosity μ2 of the second composition are preferably from the viewpoint of coatability, and μ2 is larger than μ1.

另外,第一組成物及後述第二組成物的黏度,係例如使用Anton Paar公司製商品名MCR301,並將測定夾具設為PP50,依測定溫度為25℃、剪切速度為10000[l/s]的條件,將測定對象的組成物適量滴下於平台上便可進行測定。Further, the viscosity of the first composition and the second composition described later is, for example, a product name MCR301 manufactured by Anton Paar Co., Ltd., and the measurement jig is set to PP50, and the measurement temperature is 25 ° C, and the shear rate is 10000 [l/s. The conditions of the measurement object can be measured by dropping an appropriate amount of the composition of the measurement object onto the platform.

第一組成物係未含有低折射率微粒子及低折射率樹脂、或即使含有低折射率樹脂亦是相對於該第一樹脂質量在5.0質量%以下。此種低折射率成分係就從顯現出抗反射性能的觀點,最好僅存在於HC層靠光穿透性基材的對向側之界面及其附近部分而已。若HC層整體中的低折射率成分呈均勻存在,並不會充分顯現出光學薄膜的抗反射性能,且亦會有無法充分顯現出HC層硬度的可能性。就此點而言,後述第二組成物便具有使低折射率成分多數分佈於該界面及其附近區域的作用。即便第一組成物中含有低折射率樹脂,但若屬於上述量,則光學薄膜仍可獲得充分的抗反射性能。第一組成物中所含的低折射率樹脂量係相對於第一樹脂質量,較佳為1質量%以下。The first composition does not contain the low refractive index fine particles and the low refractive index resin, or is contained in the low refractive index resin at 5.0 mass% or less based on the mass of the first resin. Such a low refractive index component is preferably present only in the interface of the HC layer on the opposite side of the light transmissive substrate and its vicinity from the viewpoint of exhibiting antireflection performance. When the low refractive index component in the entire HC layer is uniformly present, the antireflection performance of the optical film is not sufficiently exhibited, and the hardness of the HC layer may not be sufficiently exhibited. In this regard, the second composition described later has a function of distributing a plurality of low refractive index components to the interface and its vicinity. Even if the first composition contains a low refractive index resin, if it is in the above amount, the optical film can still obtain sufficient antireflection performance. The amount of the low refractive index resin contained in the first composition is preferably 1% by mass or less based on the mass of the first resin.

(第一樹脂)(first resin)

第一樹脂係具反應性、經硬化便成為HC層基質的成分。第一樹脂係具有經利用光照射或加熱,便使第一樹脂彼此間、及與後述第二樹脂間產生聚合或交聯反應性。第一樹脂係可為利用諸如紫外線等光照射而進行硬化的光硬化性樹脂,亦可為利用加熱而進行硬化的熱硬化性樹脂。The first resin is reactive and hardened to become a component of the HC layer matrix. The first resin has a polymerization or crosslinking reactivity between the first resin and the second resin described later by irradiation with light or heating. The first resin may be a photocurable resin which is cured by light irradiation such as ultraviolet rays, or may be a thermosetting resin which is cured by heating.

當第一樹脂係光硬化性樹脂的情況,第一樹脂較佳係具有聚合性不飽和基、更佳係具有游離輻射線硬化性不飽和基。具體例係可舉例如:(甲基)丙烯醯基、乙烯基、烯丙基等乙烯性不飽和鍵結及環氧基等等。In the case of the first resin-based photocurable resin, the first resin preferably has a polymerizable unsaturated group, and more preferably has an epitaxial radiation-curable unsaturated group. Specific examples thereof include an ethylenically unsaturated bond such as a (meth)acryl fluorenyl group, a vinyl group, and an allyl group, and an epoxy group.

當第一樹脂係熱硬化性樹脂的情況,第一樹脂係可舉例如具有諸如:羥基、羧基、胺基、環氧基、環氧丙基、異氰酸酯基及烷氧基等者。In the case of the first resin-based thermosetting resin, the first resin may have, for example, a hydroxyl group, a carboxyl group, an amine group, an epoxy group, a glycidyl group, an isocyanate group, and an alkoxy group.

第一樹脂係就從利用交聯反應而提高HC層硬度的觀點,較佳係1分子中具有反應性基達2個以上、更佳係具有達3個以上。The first resin system preferably has two or more reactive groups per molecule, and more preferably three or more, from the viewpoint of improving the hardness of the HC layer by the crosslinking reaction.

光硬化性樹脂的第一樹脂係只要使用習知公知能成為HC層基質的光硬化性樹脂便可,較佳係使用例如:季戊四醇三丙烯酸酯(PETA)及二季戊四醇六丙烯酸酯(DPHA)等多官能基單體。The first resin of the photocurable resin may be a photocurable resin which is known to be an HC layer substrate, and preferably, for example, pentaerythritol triacrylate (PETA) and dipentaerythritol hexaacrylate (DPHA) are used. Polyfunctional monomer.

熱硬化性樹脂的第一樹脂係可使用例如具環氧基之化合物、及日本專利特開2006-106503號公報所記載的黏結劑性環氧化合物。且,亦可使用日本專利特開2008-165041號公報所記載的熱硬化性樹脂。For the first resin of the thermosetting resin, for example, a compound having an epoxy group and a binder epoxy compound described in JP-A-2006-106503 can be used. Further, a thermosetting resin described in JP-A-2008-165041 can also be used.

就從第一組成物黏度μ1較容易調節的觀點,第一樹脂的分子量較佳係達500以上、更佳係大於1000。又,就從第一組成物黏度μ1較容易調節的觀點,第一樹脂的分子量上限值較佳係150000以下、更佳係50000以下、特佳係20000以下。藉由將第一樹脂的分子量設定在該範圍內,便可抑制後述第二組成物中所含的低折射率微粒子或低折射率樹脂,在HC層整體中呈均勻擴散情況,較容易使大多數存在於HC層靠光穿透性基材的對向側之界面側。From the viewpoint that the viscosity of the first composition μ1 is relatively easy to adjust, the molecular weight of the first resin is preferably 500 or more, more preferably more than 1,000. Further, from the viewpoint that the first composition viscosity μ1 is easily adjusted, the upper limit of the molecular weight of the first resin is preferably 150,000 or less, more preferably 50,000 or less, and particularly preferably 20,000 or less. By setting the molecular weight of the first resin within this range, it is possible to suppress the low refractive index fine particles or the low refractive index resin contained in the second composition described later, and it is uniformly diffused in the entire HC layer, and it is easy to make it large. Most of them exist on the interface side of the HC layer on the opposite side of the light-transmitting substrate.

分子量大於1000的樹脂,較佳係可舉例如:專利文獻1所記載含有聚環氧烷鏈之聚合物D、或荒川化學工業(股)製商品名BEAMSET DK1、新中村化學工業(股)製屬於UV硬化型胺甲酸酯丙烯酸酯寡聚物的商品名NH寡聚U-15HA、以及日本合成化學工業(股)製商品名UV-1700B等。The resin having a molecular weight of more than 1,000 is preferably, for example, a polymer D containing a polyalkylene oxide chain described in Patent Document 1, or a product name BEAMSET DK1 manufactured by Arakawa Chemical Industry Co., Ltd., manufactured by Shin-Nakamura Chemical Industry Co., Ltd. The trade name is NH oligo U-15HA, which is a UV-curable urethane acrylate oligomer, and the trade name UV-1700B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.

就從抑制在HC層與基材的界面處發生干涉紋的觀點,最好使第一樹脂中含有分子量1000以下的樹脂。此種分子量1000以下的樹脂,較佳係有如上述PETA或DPHA。From the viewpoint of suppressing occurrence of interference fringes at the interface between the HC layer and the substrate, it is preferable to contain a resin having a molecular weight of 1,000 or less in the first resin. Such a resin having a molecular weight of 1,000 or less is preferably a PETA or DPHA as described above.

當第一樹脂係併用分子量1000以下的樹脂、以及除此之外的樹脂(即分子量大於1000的樹脂)時,分子量1000以下的樹脂含有量係只要配合所需黏度等而適當調節便可,而分子量1000以下的樹脂含有量相對於第一樹脂的總質量,最好為50~100質量%。When the first resin is used in combination with a resin having a molecular weight of 1,000 or less and a resin other than the above (that is, a resin having a molecular weight of more than 1,000), the resin content of the molecular weight of 1,000 or less may be appropriately adjusted by blending the desired viscosity or the like. The resin content of the molecular weight of 1,000 or less is preferably from 50 to 100% by mass based on the total mass of the first resin.

再者,就從HC層硬度的觀點,第一樹脂的分子量較佳係5000以下。Further, from the viewpoint of the hardness of the HC layer, the molecular weight of the first resin is preferably 5,000 or less.

此外,第一樹脂亦可使用例如專利文獻1所記載的黏結劑C。該黏結劑C的市售物係有如重量平均分子量未滿10000、且具有2以上聚合性不飽和基的胺甲酸酯丙烯酸酯市售物,諸如:共榮公司化學(股)製商品名AH-600、AT-600、UA-306H、UA-306T、UA-3061等;日本合成化學工業(股)製商品名UV-3000B、UV-3200B、UV-6300B、UV-6330B、UV-7000B等;荒川化學工業(股)製商品名BEAMSET 500系列(502H、504H、550B等);新中村化學工業(股)製商品名U-6HA、UA-32P、U-324A;東亞合成(股)製商品名M-9050等等。Further, for the first resin, for example, the binder C described in Patent Document 1 can be used. The commercially available product of the binder C is commercially available as a urethane acrylate having a weight average molecular weight of less than 10,000 and having 2 or more polymerizable unsaturated groups, such as a product name AH manufactured by Kyoei Corporation Chemical Co., Ltd. -600, AT-600, UA-306H, UA-306T, UA-3061, etc.; Japan Synthetic Chemical Industry Co., Ltd. trade name UV-3000B, UV-3200B, UV-6300B, UV-6330B, UV-7000B, etc. ; Arakawa Chemical Industry Co., Ltd. trade name BEAMSET 500 series (502H, 504H, 550B, etc.); New Nakamura Chemical Industry Co., Ltd. trade name U-6HA, UA-32P, U-324A; East Asia Synthetic (share) system Trade name M-9050 and so on.

第一樹脂的含有量若經適當調節後才使用便可,相對於第一組成物的總固形份較佳為40~90質量%、更佳為50~80質量%。The content of the first resin may be used after being appropriately adjusted, and the total solid content of the first composition is preferably 40 to 90% by mass, more preferably 50 to 80% by mass.

第一樹脂係可單獨使用1種、亦可組合使用2種以上。又,第一樹脂係亦可與後述第二組成物中所含第二樹脂的基本骨架、官能基種類或官能基數或分子量為相同,亦可為不同。The first resin may be used singly or in combination of two or more. Further, the first resin may be the same as or different from the basic skeleton, the functional group type, or the number of functional groups or molecular weight of the second resin contained in the second composition described later.

(第一溶劑)(first solvent)

第一溶劑係具有在第一組成物中,將如上述第一樹脂的固形份予以溶解或分散而調節黏度的作用。The first solvent has a function of adjusting the viscosity by dissolving or dispersing the solid portion of the first resin as in the first composition.

第一溶劑係可從習知公知硬塗層用組成物中所使用的溶劑,選擇使用1種或2種以上。例如:甲乙酮(MEK)、甲基異丁酮(MIBK)及甲苯等;或諸如日本專利特開2005-316428號公報記載的醇類、酮類、酯類、鹵化烴類、芳香族烴類、醚類等。除此之外,第一溶劑尚可使用例如:四氫呋喃、1,4-二烷、二氧雜戊環烷及二異丙醚等醚類;以及甲甘醇、丙二醇單甲醚(PGME)、甲甘醇醋酸酯等二醇類等等。The first solvent is one or two or more selected from the solvents used in the conventional composition for a hard coat layer. For example, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), toluene, etc.; or alcohols, ketones, esters, halogenated hydrocarbons, aromatic hydrocarbons, etc., as described in JP-A-2005-316428, Ethers, etc. In addition to this, the first solvent can be used, for example, tetrahydrofuran, 1,4-two An ether such as an alkane, a dioxolane or a diisopropyl ether; and a glycol such as methyl glycol, propylene glycol monomethyl ether (PGME) or methyl glycol acetate.

就從調整(提高)第一組成物黏度的觀點,第一溶劑最好係黏度較高,較佳為1mP‧s以上、更佳為2mP‧s以上。此種為提高第一組成物黏度用的溶劑,較佳係有如丙二醇單甲醚(PGME)等。From the viewpoint of adjusting (increasing) the viscosity of the first composition, the first solvent preferably has a high viscosity, preferably 1 mP·s or more, more preferably 2 mP·s or more. Such a solvent for increasing the viscosity of the first composition is preferably propylene glycol monomethyl ether (PGME) or the like.

再者,藉由適當選擇第一溶劑的種類及上述光穿透性基材的種類,第一溶劑亦具有使上述第一樹脂其中一部分滲透於上述光穿透性基材中的作用。Further, the first solvent also has a function of allowing a part of the first resin to permeate into the light-transmitting substrate by appropriately selecting the type of the first solvent and the type of the light-transmitting substrate.

本發明中,藉由使用(或併用)對光穿透性基材具滲透性的溶劑1(滲透性溶劑),便可輕易地抑制第一樹脂滲透於基材中而造成干涉紋發生情形,亦可提高密接性。In the present invention, by using (or using) a solvent 1 (permeable solvent) having permeability to a light-transmitting substrate, it is possible to easily suppress the occurrence of interference fringes in the first resin penetrating into the substrate. It can also improve the adhesion.

另外,本發明中所謂「滲透性」係指對光穿透性基材具滲透的性質,此外尚涵蓋使光穿透性基材膨潤或濕潤的概念。Further, the term "permeability" as used in the present invention means a property of permeating a light-transmitting substrate, and further encompasses the concept of swelling or wetting a light-transmitting substrate.

滲透性溶劑的具體例係可舉例如:甲乙酮、甲基異丁酮及環己酮等酮類;醋酸甲酯、醋酸乙酯及醋酸丁酯等酯類;以及鹵化烴及酚類。Specific examples of the osmotic solvent include ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; esters such as methyl acetate, ethyl acetate and butyl acetate; and halogenated hydrocarbons and phenols.

當光穿透性基材係三醋酸纖維素(TAC)的情況所使用之溶劑、以及當光穿透性基材係聚對苯二甲酸乙二酯(PET)的情況所使用之溶劑,係有如日本專利特開2005-316428號公報記載的溶劑。The solvent used in the case where the light-transmitting substrate is cellulose triacetate (TAC), and the solvent used in the case where the light-transmitting substrate is polyethylene terephthalate (PET). There is a solvent described in JP-A-2005-316428.

特別係當光穿透性基材係三醋酸纖維素(TAC)的情況所使用之溶劑,較佳為醋酸甲酯、醋酸乙酯、醋酸丁酯、及甲乙酮。In particular, the solvent used in the case where the light-transmitting substrate is cellulose triacetate (TAC) is preferably methyl acetate, ethyl acetate, butyl acetate, and methyl ethyl ketone.

第一溶劑係可與後述第二組成物中所含的第二溶劑為相同、亦可為不同。The first solvent may be the same as or different from the second solvent contained in the second composition described later.

第一組成物中,相對於第一溶劑的質量之下,第一樹脂的質量比例係100~400質量%,就從在HC層中,形成在光穿透性基材對向側存在較多低折射率成分分佈的觀點,係屬較佳。又,此時,後述第二組成物中,相對於第二溶劑的質量之下,低折射率成分及第二樹脂的合計質量比例係100~400質量%。In the first composition, the mass ratio of the first resin is 100 to 400% by mass based on the mass of the first solvent, and is formed on the opposite side of the light-transmitting substrate from the HC layer. The viewpoint of the distribution of the low refractive index component is preferred. Moreover, in this case, in the second composition described later, the total mass ratio of the low refractive index component and the second resin is 100 to 400% by mass based on the mass of the second solvent.

(第一硬塗層用硬化性樹脂組成物的其他成分)(Other components of the curable resin composition for the first hard coat layer)

在第一組成物中除上述成分之外,於賦予機能性之目的下,尚可含有諸如:聚合起始劑、抗靜電劑、增黏劑、以及反應性或非反應性均塗劑等。In addition to the above components, the first composition may contain, for example, a polymerization initiator, an antistatic agent, a tackifier, and a reactive or non-reactive coating agent, etc., for the purpose of imparting functionality.

(聚合起始劑)(polymerization initiator)

視需要亦可適當選擇使用自由基及陽離子聚合起始劑等。該等聚合起始劑係利用光照射及/或加熱而分解,並產生自由基或陽離子,而使進行自由基聚合與陽離子聚合者。自由基聚合起始劑係可舉例如日本汽巴(股)製IRGACURE 184(1-羥-環己基-苯基-酮)。A radical and a cationic polymerization initiator may be appropriately selected as needed. These polymerization initiators are decomposed by light irradiation and/or heating to generate radicals or cations, and are subjected to radical polymerization and cationic polymerization. The radical polymerization initiator may, for example, be IRGACURE 184 (1-hydroxy-cyclohexyl-phenyl-ketone) manufactured by Ciba.

當如含有環氧基的第一樹脂般,使用光陽離子聚合性第一樹脂的情況,視需要可使用例如日本專利特開2010-107823號公報記載的陽離子聚合起始劑。When a photocationic polymerizable first resin is used as in the case of the first resin containing an epoxy group, for example, a cationic polymerization initiator described in JP-A-2010-107823 can be used.

當使用聚合起始劑的情況,其含有量係相對於第一組成物的總固形份,較佳為使用1~10質量%。When a polymerization initiator is used, the content thereof is preferably from 1 to 10% by mass based on the total solid content of the first composition.

(抗靜電劑)(antistatic agent)

抗靜電劑係可使用習知公知抗靜電劑,可使用例如:日本專利特開2007-264221號公報所記載的四級銨鹽等陽離子性抗靜電劑、或錫摻雜氧化銦(ITO)等微粒子。For the antistatic agent, a conventionally known antistatic agent can be used, and for example, a cationic antistatic agent such as a quaternary ammonium salt described in JP-A-2007-264221, or tin-doped indium oxide (ITO) or the like can be used. Microparticles.

當使用抗靜電劑的情況,其含有量係相對於第一組成物的總固形份,較佳為使用30~60質量%。When the antistatic agent is used, the content thereof is preferably from 30 to 60% by mass based on the total solid content of the first composition.

(增黏劑)(tackifier)

在第一組成物中,於黏度調整之目的下,亦可含有增黏劑。In the first composition, a tackifier may also be contained for the purpose of viscosity adjustment.

增黏劑係可使用習知公知增黏劑,可舉例如:酪蛋白及酪蛋白的鹽等蛋白質系;聚乙烯醇、脂肪族醯胺、丙烯酸共聚物、聚乙烯吡咯烷酮、聚丙烯酸鈉等、聚醚二烷基酯、乙烯甲醚-順丁烯二酸酐共聚物的部分酯、以及乙炔二醇等有機系增黏劑。其他尚可舉例如:微二氧化矽、高嶺土、膨潤土及滑石等無機系增黏劑。As the tackifier, a conventionally known tackifier can be used, and examples thereof include protein systems such as casein and casein salts; polyvinyl alcohol, aliphatic guanamine, acrylic acid copolymer, polyvinylpyrrolidone, sodium polyacrylate, and the like. A polyether dialkyl ester, a partial ester of a vinyl methyl ether-maleic anhydride copolymer, and an organic tackifier such as acetylene glycol. Other examples include inorganic tackifiers such as micro-cerium oxide, kaolin, bentonite and talc.

上述有機系增黏劑及無機系增黏劑係可單獨使用1種、亦可組合使用2種以上。The organic tackifier and the inorganic tackifier may be used singly or in combination of two or more.

當使用增黏劑的情況,其含有量係相對於第一組成物的總固形份,較佳為使用0.1~10質量%。When a tackifier is used, the content thereof is preferably 0.1 to 10% by mass based on the total solid content of the first composition.

(均塗劑)(average paint)

均塗劑係具有對HC表面賦予諸如塗佈安定性、滑性、防污性或耐擦傷性的作用。The leveling agent has an effect of imparting such properties as coating stability, slipperiness, antifouling property or scratch resistance to the surface of the HC.

均塗劑係可使用習知公知抗反射膜中所使用的氟系、聚矽氧系及丙烯酸系等均塗劑。可任意使用例如:DIC(股)製MEGAFAC系列(MCF350-5)等未具游離輻射線硬化性基的氟系均塗劑、或信越化學工業(股)製X22-163A等具有游離輻射線硬化性基的聚矽氧系均塗劑。As the leveling agent, a leveling agent such as a fluorine-based, polyfluorene-based or acrylic-based one which is conventionally used for an antireflection film can be used. Can be used arbitrarily, for example: DIC (share) system MEGAFAC A fluorine-based coating agent having no free radiation curable group such as a series (MCF350-5) or a polyfluorene-based coating agent having an exothermic radiation curable group such as X22-163A manufactured by Shin-Etsu Chemical Co., Ltd.

使用均塗劑時的含有量係當氟系均塗劑的情況,相對於第一樹脂的質量將使用5.0質量%以下,較佳係使用0.1~3.0質量%,當氟系以外的均塗劑之情況,相對於第一樹脂的質量較佳係使用0.5~10質量%。When the content of the coating agent is a fluorine-based coating agent, it is used in an amount of 5.0% by mass or less, preferably 0.1 to 3.0% by mass, based on the mass of the first resin, and a coating agent other than the fluorine-based coating agent. In other cases, it is preferable to use 0.5 to 10% by mass based on the mass of the first resin.

再者,就從HC層硬度的觀點,均塗劑含有量係將對於第一組成物與第二組成物的固形份合計質量,較佳為5.0質量%以下。In addition, the coating agent content is preferably 5.0% by mass or less based on the total mass of the solid content of the first composition and the second composition from the viewpoint of the hardness of the HC layer.

第一組成物通常係藉由在第一溶劑中,將第一樹脂、以及其他視需要含有的聚合起始劑等,依照一般的調製法進行混合而施行分散處理,便可調製得。進行混合分散時係可使用塗料振盪機或珠磨機等。The first composition is usually prepared by mixing a first resin and other polymerization initiators as necessary in a first solvent in accordance with a general preparation method and performing a dispersion treatment. A paint shaker or a bead mill or the like can be used for mixing and dispersing.

(第二硬塗層用硬化性樹脂組成物)(curable resin composition for second hard coat layer)

本發明光學薄膜之製造方法中所使用的第二硬塗層用硬化性樹脂組成物,係含有從平均粒徑10~300nm之低折射率微粒子及低折射率樹脂所構成群組中選擇1種以上的低折射率成分,並具有反應性的第二樹脂及第二溶劑,黏度μ2係5mPa‧s以上,且黏度差在30mPa‧s以下。The curable resin composition for a second hard coat layer used in the method for producing an optical film of the present invention contains one selected from the group consisting of low refractive index fine particles having an average particle diameter of 10 to 300 nm and a low refractive index resin. The above low refractive index component has a reactive second resin and a second solvent, and has a viscosity μ2 of 5 mPa·s or more and a viscosity difference of 30 mPa·s or less.

第二組成物係含有低折射率成分,具有上述特定黏度,且依上述第一組成物位於較第二組成物更靠光穿透性基材側的方式,使該二種組成物相鄰接並施行同時塗佈,藉此當使第一組成物與第二組成物進行硬化而形成HC層時,在HC層的膜厚方向中,形成從光穿透性基材的對向側之界面側起朝光穿透性基材側,呈低折射率成分逐漸減少的分佈,當該低折射率成分係低折射率微粒子的情況,便如圖1所示的低折射率微粒子分佈。The second composition contains a low refractive index component having the above specific viscosity, and the two components are adjacent to each other in such a manner that the first composition is located closer to the light transmissive substrate than the second composition. Simultaneous coating is performed to form an interface between the opposite sides of the light-transmitting substrate in the film thickness direction of the HC layer when the first composition and the second composition are hardened to form an HC layer. The side of the light-transmissive substrate side has a distribution in which the low refractive index component gradually decreases. When the low refractive index component is a low refractive index fine particle, the low refractive index fine particles are distributed as shown in FIG.

本發明光學薄膜之製造方法中所使用第二組成物的黏度μ2,係就從適度抑制與上述第一組成物間之混合的觀點,較佳為5mPa‧s以上、更佳為10mPa‧s以上。該黏度μ2係就從提高塗佈性的觀點,較佳在100mPa‧s以下、更佳在50mPa‧s以下、特佳在30mPa‧s以下。又,第一組成物的黏度μ1、與第二組成物的黏度μ2,就從塗佈性的觀點,較佳係μ2大於μ1。The viscosity μ2 of the second composition used in the method for producing an optical film of the present invention is preferably 5 mPa ‧ or more, more preferably 10 mPa ‧ s or more from the viewpoint of moderately suppressing mixing with the first composition . The viscosity μ2 is preferably 100 mPa·s or less, more preferably 50 mPa·s or less, and particularly preferably 30 mPa·s or less from the viewpoint of improving coatability. Further, the viscosity μ1 of the first composition and the viscosity μ2 of the second composition are preferably μ2 larger than μ1 from the viewpoint of coatability.

(低折射率微粒子)(low refractive index microparticles)

本發明第一光學薄膜之製造方法中所使用的低折射率微粒子,係藉由大多數存在於HC層靠光穿透性基材的對向側之界面側,便對本發明的光學薄膜賦予抗反射性。除低折射率微粒子之外,尚可搭配使用後述低折射率樹脂。The low refractive index microparticles used in the method for producing a first optical film of the present invention impart resistance to the optical film of the present invention by most of the interface side of the HC layer which is on the opposite side of the light transmissive substrate. Reflective. In addition to the low refractive index fine particles, a low refractive index resin described later can be used in combination.

低折射率微粒子係指折射率1.20~1.45者。The low refractive index microparticles refer to those having a refractive index of 1.20 to 1.45.

低折射微粒子係可使用習知公知低折射率層中所使用的粒子,可舉例如:專利文獻2所記載的中空二氧化矽微粒子、或LiF(折射率1.39)、MgF2 (氟化鎂、折射率1.38)、AlF3 (折射率1.38)、Na3 AlF6 (冰晶石、折射率1.33)、及NaMgF3 (折射率1.36)等金屬氟化物微粒子。For the low-refractive-particles, the particles used in the conventionally known low-refractive-index layer can be used, and examples thereof include hollow cerium oxide fine particles described in Patent Document 2, LiF (refractive index 1.39), and MgF 2 (magnesium fluoride, Metal fluoride fine particles such as a refractive index of 1.38), AlF 3 (refractive index of 1.38), Na 3 AlF 6 (cryolite, refractive index of 1.33), and NaMgF 3 (refractive index of 1.36).

再者,低折射率微粒子係為能使與第二樹脂或上述第一樹脂產生交聯反應,亦可將其表面利用具有聚合性不飽和基或熱硬化性基的有機成分予以被覆。被覆的方法係可使用日本專利特開2008-165040號公報記載的反應性無機微粒子之調製方法。Further, the low refractive index fine particles may be subjected to a crosslinking reaction with the second resin or the first resin, or may be coated with an organic component having a polymerizable unsaturated group or a thermosetting group. For the method of coating, a method of preparing reactive inorganic fine particles described in JP-A-2008-165040 can be used.

低折射率微粒子的平均粒徑係就從防止HC層的霧值上升之觀點,便設定在300nm以下。當低折射率微粒子係中空二氧化矽微粒子的情況,因為需要空隙,因而平均粒徑係就從使顯現出折射率降低效果的觀點,便設為10nm以上。The average particle diameter of the low refractive index fine particles is set to be 300 nm or less from the viewpoint of preventing the fog value of the HC layer from rising. In the case of the low refractive index fine particles hollow cerium oxide fine particles, since the voids are required, the average particle diameter is 10 nm or more from the viewpoint of exhibiting the effect of lowering the refractive index.

低折射率微粒子的平均粒徑較佳係10~100nm、更佳係30~100nm。The average particle diameter of the low refractive index fine particles is preferably from 10 to 100 nm, more preferably from 30 to 100 nm.

低折射率微粒子的含有量係只要適當調節便可使用,相對於與第二組成物中所含第二樹脂的合計質量,較佳為50~90質量%、更佳為65~90質量%。The content of the low refractive index fine particles can be used as long as it is appropriately adjusted, and is preferably from 50 to 90% by mass, and more preferably from 65 to 90% by mass, based on the total mass of the second resin contained in the second composition.

(低折射率樹脂)(low refractive index resin)

低折射率樹脂係指經塗膜製膜後的折射率為1.30~1.45之樹脂。除低折射率樹脂之外,亦可搭配使用上述低折射率微粒子。The low refractive index resin refers to a resin having a refractive index of 1.30 to 1.45 after being formed into a film. In addition to the low refractive index resin, the above low refractive index fine particles may be used in combination.

再者,因為低折射率樹脂係屬於在塗膜製膜後能成為HC層基質一部分的成分,因而亦可兼具為後述第二樹脂而採用低折射率樹脂。In addition, since the low refractive index resin is a component which can become a part of the HC layer matrix after the coating film is formed, it is also possible to use a low refractive index resin as a second resin to be described later.

低折射率樹脂係可使用習知公知具有光硬化性基或熱硬化性基等反應性基的含氟樹脂、未具反應性基的含氟樹脂等。As the low refractive index resin, a fluorine-containing resin having a reactive group such as a photocurable group or a thermosetting group, a fluorine-containing resin having no reactive group, or the like can be used.

具有光硬化性基的含氟樹脂係可舉例如:偏二氟乙烯、四氟乙烯、六氟丙烯、全氟丁二烯、全氟-2,2-二甲基-1,3-二唑等氟化烯烴類。The fluorine-containing resin having a photocurable group may, for example, be vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene, perfluorobutadiene or perfluoro-2,2-dimethyl-1,3-di A fluorinated olefin such as azole.

其他具有光硬化性基的含氟樹脂係可舉例如:(甲基)丙烯酸-2,2,2-三氟乙酯、(甲基)丙烯酸-2,2,3,3,3-五氟丙酯、(甲基)丙烯酸-2-(全氟丁基)乙酯、(甲基)丙烯酸-2-(全氟己基)乙酯、(甲基)丙烯酸-2-(全氟辛基)乙酯、(甲基)丙烯酸-2-(全氟癸基)乙酯、α-三氟甲基丙烯酸甲酯、α-三氟甲基丙烯酸乙酯等(甲基)丙烯酸酯化合物;1分子中含有至少具有3個氟原子之碳數1~14的氟化烷基、氟環烷基或氟化伸烷基、以及至少2個(甲基)丙烯醯氧基的含氟多官能基(甲基)丙烯酸酯化合物等。Other fluorine-containing resins having a photocurable group include, for example, (meth)acrylic acid-2,2,2-trifluoroethyl ester, (meth)acrylic acid-2,2,3,3,3-pentafluoro. Propyl ester, 2-(perfluorobutyl)ethyl (meth)acrylate, 2-(perfluorohexyl)ethyl (meth)acrylate, 2-(perfluorooctyl) (meth)acrylate a (meth) acrylate compound such as ethyl ester, 2-(perfluorodecyl)ethyl (meth)acrylate, methyl α-trifluoromethyl methacrylate or ethyl α-trifluoromethyl acrylate; 1 molecule a fluorine-containing polyfunctional group containing at least three fluorine atoms having a fluorinated alkyl group having 1 to 14 carbon atoms, a fluorocycloalkyl group or a fluorinated alkyl group, and at least 2 (meth) propylene fluorenyl groups ( A methyl acrylate compound or the like.

具熱硬化性基的含氟樹脂係可使用例如:4-氟乙烯-全氟烷基乙烯醚共聚物、氟乙烯-烴系乙烯醚共聚物、以及環氧樹脂、聚胺甲酸酯樹脂、纖維素樹脂、酚樹脂及聚醯亞胺樹脂等氟改質物等等。As the fluorine-containing resin having a thermosetting group, for example, a 4-fluoroethylene-perfluoroalkyl vinyl ether copolymer, a vinyl fluoride-hydrocarbon vinyl ether copolymer, an epoxy resin, a polyurethane resin, or the like can be used. Fluorine modified materials such as cellulose resin, phenol resin and polyimine resin.

其他尚可使用日本專利特開2010-122603號公報所記載含氟原子的聚合性化合物之聚合體或共聚物、以及含有聚矽氧的偏氟乙烯共聚物。A polymer or a copolymer of a fluorine atom-containing polymerizable compound described in JP-A-2010-122603, and a polyfluorene-containing vinylidene fluoride copolymer may be used.

低折射率樹脂的分子量並無特別的限制,可適當選擇,但就從調節第二組成物黏度的觀點,較佳為500~5000。The molecular weight of the low refractive index resin is not particularly limited and may be appropriately selected, but it is preferably from 500 to 5,000 from the viewpoint of adjusting the viscosity of the second composition.

第二組成物中所含低折射率樹脂的含有量,係只要適當調節便可,當低折射率樹脂兼具為後述第二樹脂的情況,相對於第二組成物的總固形份,較佳為70~100質量%。The content of the low refractive index resin contained in the second composition may be appropriately adjusted, and when the low refractive index resin has the second resin described later, it is preferably the total solid content of the second composition. It is 70 to 100% by mass.

(第二樹脂)(second resin)

第二樹脂係屬於具有反應性,經硬化會成為HC層基質的成分。第二樹脂係具有藉由光照射或加熱,便使第二樹脂彼此間、以及與上述第一樹脂間產生聚合或交聯反應性。The second resin is a component which is reactive and hardens to form a matrix of the HC layer. The second resin has a polymerization or crosslinking reactivity between the second resins and the first resin by light irradiation or heating.

第二樹脂係可為經諸如紫外線等光照射而硬化的光硬化性樹脂,亦可為經加熱而硬化的熱硬化性樹脂。當第二樹脂係光硬化性樹脂的情況,第二樹脂較佳係具有聚合性不飽和基,更佳係具有游離輻射線硬化性不飽和基。具體例係可舉例如:(甲基)丙烯醯基、乙烯基、烯丙基等乙烯性不飽和鍵結及環氧基等。The second resin may be a photocurable resin which is cured by light irradiation such as ultraviolet rays, or may be a thermosetting resin which is cured by heating. In the case of the second resin-based photocurable resin, the second resin preferably has a polymerizable unsaturated group, and more preferably has an epitaxial radiation-curable unsaturated group. Specific examples thereof include an ethylenically unsaturated bond such as a (meth)acryl fluorenyl group, a vinyl group, and an allyl group, and an epoxy group.

當第二樹脂係熱硬化性樹脂的情況,第二樹脂所具有的熱硬化性基係可舉例如:羥基、羧基、胺基、環氧基、環氧丙基、異氰酸酯基、及烷氧基等。In the case of the second resin-based thermosetting resin, the thermosetting group of the second resin may, for example, be a hydroxyl group, a carboxyl group, an amine group, an epoxy group, a glycidyl group, an isocyanate group, or an alkoxy group. Wait.

第二樹脂係就從利用交聯反應而提高HC層硬度的觀點,較佳為1分子中具有2個以上硬化性基,更佳係具有3個以上。The second resin is preferably one or more curable groups per molecule, and more preferably three or more, from the viewpoint of improving the hardness of the HC layer by the crosslinking reaction.

第二樹脂係可使用上述第一樹脂中所舉例者。As the second resin, those exemplified in the above first resin can be used.

第二樹脂的含有量係只要適當調節再使用便可,相對於第二組成物的總固形份,較佳為60質量%以下,且當第二樹脂兼具低折射率樹脂的情況,相對於第二組成物的總固形份,亦可在100質量%以下。The content of the second resin is preferably 60% by mass or less based on the total solid content of the second composition as long as it is appropriately adjusted and used, and when the second resin has a low refractive index resin, The total solid content of the second composition may be 100% by mass or less.

第二樹脂係可單獨使用1種、亦可組合使用2種以上。The second resin may be used singly or in combination of two or more.

(第二溶劑)(second solvent)

第二溶劑係具有在第二組成物中,將如上述低折射率微粒子或第二樹脂之類的固形份予以溶解或分散,而調節黏度的作用。第二溶劑係可使用上述第一溶劑中所舉例者。The second solvent has a function of adjusting the viscosity by dissolving or dispersing a solid portion such as the above-mentioned low refractive index fine particles or the second resin in the second composition. As the second solvent, those exemplified in the above first solvent can be used.

(第二硬塗層用硬化性樹脂組成物之其他成分)(Other components of the curable resin composition for the second hard coat layer)

第二組成物中除上述成分之外,在賦予機能性之目的下,如同第一組成物,尚可更進一步含有諸如聚合起始劑、抗靜電劑、增黏劑、防污劑、以及反應性或非反應性均塗劑等。The second composition may further contain, for example, a polymerization initiator, an antistatic agent, a tackifier, an antifouling agent, and a reaction, in addition to the above components, for the purpose of imparting functionality, like the first composition. Sexual or non-reactive uniform paint and the like.

(聚合起始劑)(polymerization initiator)

聚合起始劑係可使用上述第一組成物中所舉例者。As the polymerization initiator, those exemplified in the above first composition can be used.

當使用聚合起始劑的情況,含有量係相對於第二組成物的總固形份,較佳為使用1~5質量%。When a polymerization initiator is used, the content is preferably from 1 to 5% by mass based on the total solid content of the second composition.

(抗靜電劑)(antistatic agent)

抗靜電劑係可使用上述第一組成物中所舉例者。As the antistatic agent, those exemplified in the above first composition can be used.

當使用抗靜電劑的情況,含有量係相對於第二組成物的總固形份,較佳為使用30~60質量%。When the antistatic agent is used, the content is preferably from 30 to 60% by mass based on the total solid content of the second composition.

(增黏劑)(tackifier)

增黏劑係可使用上述第一組成物所舉例者。增黏劑的含有量係相對於第二組成物的總固形份,較佳為使用0.1~10質量%。The tackifier can be exemplified by the above first composition. The content of the tackifier is preferably from 0.1 to 10% by mass based on the total solid content of the second composition.

(防污劑)(antifouling agent)

防污劑係防止光學薄膜的最表面髒污,且亦可對HC層賦予耐擦傷性。防污劑係可在第一組成物及第二組成物雙方中均含有。就從依較少含有量便可有效率地顯現出防污性的觀點,防污劑最好僅含於第二組成物中。The antifouling agent prevents the outermost surface of the optical film from being soiled, and also imparts scratch resistance to the HC layer. The antifouling agent can be contained in both the first composition and the second composition. The antifouling agent is preferably contained only in the second composition from the viewpoint that the antifouling property can be effectively exhibited in a small amount.

防污劑係可使用習知公知的氟系化合物或矽系化合物等防污劑(防污染劑)。As the antifouling agent, an antifouling agent (antifouling agent) such as a fluorine-based compound or a lanthanoid compound known in the art can be used.

防污劑係可舉例如日本專利特開2007-264279號公報所記載的防污染劑。The antifouling agent is, for example, an antifouling agent described in JP-A-2007-264279.

最好使用市售物的防污劑。此種市售物的防污劑(非反應性),係可舉例如:DIC(股)製MEGAFAC系列諸如:商品名MCF350-5、F445、F455、F178、F470、F475、F479、F477、TF1025、F478及F178K等;TOSHIBA SILICONE(股)製TSF系列等;信越化學工業(股)製X-22系列及KF系列等;以及CHISSO(股)製Silaplane系列等。It is preferable to use a commercially available antifouling agent. The antifouling agent (non-reactive) of such a commercially available product is, for example, MEGAFAC manufactured by DIC Co., Ltd. Series such as: trade name MCF350-5, F445, F455, F178, F470, F475, F479, F477, TF1025, F478 and F178K, etc.; TOSHIBA SILICONE (share) system TSF series, etc.; Shin-Etsu Chemical Industry Co., Ltd. X-22 Series and KF series, etc.; and CHIASO (share) system Silaplane Series, etc.

市售物的防污劑(反應性)係可舉例如:新中村化學工業(股)製商品名SUA1900L10及商品名SUA1900L6;Daicel‧UCB(股)製商品名Ebecry1350、商品名Ebecry11360及商品名KRM7039;日本合成化學工業(股)製UT3971;DIC(股)製商品名DIFENSA TF3001、商品名DIFENSA TF3000及商品名DIFENSA TF3028;共榮公司化學(股)製商品名LIGHT-PROCOAT AFC3000;信越化學工業(股)製商品名KNS5300;GE TOSHIBA SILICONE(股)製商品名UVHC1105及UVHC8550;以及日本塗料(股)製商品名ACS-1122等等。For the antifouling agent (reactivity) of the commercially available product, for example, the brand name SUA1900L10 and the brand name SUA1900L6 manufactured by Shin-Nakamura Chemical Industry Co., Ltd.; the product name Ebecry 1350, the product name Ebecry 11360, and the trade name KRM7039 manufactured by Daicel UCB Co., Ltd. KI3971 manufactured by Japan Synthetic Chemical Industry Co., Ltd.; DIFENSA TF3001, trade name DIFENSA TF3000 and trade name DIFENSA TF3028 under DIC (share); LIGHT-PROCOAT AFC3000 under the trade name of Coron Chemical Co., Ltd.; Shin-Etsu Chemical Industry ( The product name is KNS5300; the GE TOSHIBA SILICONE (stock) product name is UVHC1105 and UVHC8550; and the Japanese paint (stock) product name is ACS-1122 and so on.

(均塗劑)(average paint)

均塗劑係可使用上述第一組成物中所舉例者。As the leveling agent, those exemplified in the above first composition can be used.

均塗劑係可在第一組成物及第二組成物雙方中均含有。就從效率佳地顯現出均塗劑機能的觀點,最好僅含於第二組成物中。The leveling agent can be contained in both the first composition and the second composition. From the viewpoint of exhibiting a uniform coating function from the viewpoint of efficiency, it is preferable to contain only the second composition.

使用均塗劑時的含有量,當氟系均塗劑的情況,相對於第二樹脂的質量係使用5.0質量%以下、較佳係使用0.1~3.0質量%,當氟系以外的均塗劑之情況,相對於第二樹脂的質量,較佳係使用0.5~10質量%。In the case of using a leveling agent, in the case of a fluorine-based leveling agent, it is used in an amount of 5.0% by mass or less, preferably 0.1% to 3.0% by mass based on the mass of the second resin, and a coating agent other than the fluorine-based coating agent. In other cases, it is preferably 0.5 to 10% by mass based on the mass of the second resin.

第二組成物的調製方法係可使用上述第一組成物中所舉例的方法。The method of preparing the second composition can be carried out by the method exemplified in the above first composition.

(其他的機能層用組成物)(other functional layer composition)

本發明光學薄膜之製造方法,在上述(iii)同時塗佈的步驟中,只要於光穿透性基材的一面側,將至少上述第一及第二組成物施行同時塗佈便可,為配合光學薄膜所要求的性能,而適當地設置其他機能層,亦可準備其他的機能層用組成物。In the method for producing an optical film of the present invention, in the step of simultaneously coating (iii), at least one of the first and second compositions may be applied simultaneously on one surface side of the light-transmitting substrate. In combination with the performance required for the optical film, other functional layers may be appropriately disposed, and other functional layer compositions may be prepared.

其他的機能層係可舉例如:抗靜電層及防污層。Other functional layers include, for example, an antistatic layer and an antifouling layer.

另外,如後述,其他的機能層用組成物係若從光穿透性基材側依第一及第二組成物呈相鄰接位置狀態施行塗佈,便可配合其機能而設定適當的塗佈位置。Further, as will be described later, when the other functional layer component is applied from the side of the light-transmitting substrate in the state in which the first and second components are adjacent to each other, an appropriate coating can be set in accordance with the function. Cloth location.

本發明光學薄膜之製造方法,在(iii)將第一組成物與第二組成物施行同時塗佈的步驟中,將上述第一與第二組成物施行同時塗佈的方法,係在能施行同時塗佈的前提下,其餘並無特別的限制,可使用習知公知的方法,例如使用圖3所示擠壓型模具塗佈機的方法。In the method for producing an optical film of the present invention, in the step of (iii) applying the first composition and the second composition simultaneously, the method of simultaneously applying the first and second compositions can be carried out. On the premise of simultaneous coating, the rest is not particularly limited, and a conventionally known method such as the method using the extrusion type die coater shown in Fig. 3 can be used.

光學薄膜之製造方法在(iii)將第一組成物與第二組成物施行同時塗佈的步驟中,當將第一組成物的塗膜潤濕膜厚設為T1、將第二組成物的塗膜潤濕膜厚設為T2時,將T2/T1設為0.01~1,但就從效率佳地提高光學薄膜抗反射性的觀點,較佳係在HC層的膜厚方向上,低折射率成分存在於HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,且形成越靠光穿透性基材側,則低折射率成分存在量越少的分佈,從靠光穿透性基材的對向側之界面朝靠光穿透性基材側,呈該低折射率成分逐漸減少,且在硬塗層的膜厚方向上,在從上述靠光穿透性基材的對向側之界面起至連上述硬塗層乾燥膜厚70%為止的區域中,存在有上述低折射率成分總量的70~100%之分佈。此處所謂「潤濕膜厚」係指剛塗佈後,組成物中的溶劑揮發前之狀態的塗膜厚度,從(光穿透性基材上所塗佈組成物的體積/塗佈面積)便可求得。In the step of (iii) applying the first composition and the second composition simultaneously, the wet film thickness of the coating film of the first composition is set to T1, and the second composition is used. When the coating film wetting film thickness is T2, T2/T1 is set to 0.01 to 1, but from the viewpoint of improving the antireflection property of the optical film with high efficiency, it is preferable to have a low refractive index in the film thickness direction of the HC layer. The rate component exists in the interface side of the HC layer on the opposite side of the light transmissive substrate, more on the side of the light transmissive substrate, and on the side of the light transmissive substrate, the low refractive index component exists. The distribution of the smaller amount is gradually decreased from the interface on the opposite side of the light-transmitting substrate toward the side of the light-transmitting substrate, and in the film thickness direction of the hard coat layer, A distribution of 70 to 100% of the total amount of the low refractive index component is present in a region from the interface on the opposite side of the light-transmitting substrate to the dry film thickness of the hard coat layer of 70%. Here, the "wetting film thickness" means the thickness of the coating film in a state before the solvent is volatilized in the composition immediately after application, and the volume/coating area of the composition coated on the light-transmitting substrate. ) can be obtained.

再者,當第一及第二組成物的塗佈係使用如圖3所示模具塗佈機頭實施的情況,屬於模具塗佈機頭40與光穿透性樹脂基材10間之距離的塗佈高度80、及在光穿透性樹脂基材10上施行同時多層塗佈時的第一及第二組成物之塗膜合計厚度90,最好具有塗佈高度80<(厚度90的2倍)之關係。藉由在保持此種關係的情況下施行同時多層塗佈,便使在光穿透性樹脂基材10與模具塗佈機頭40之間所形成塗佈液滴呈安定化。特別係該塗佈液滴係利用塗佈所形成層越薄膜化則越容易呈不安定,成為塗佈面出現斑點、條紋,導致外觀惡化的原因,但藉由保持上述塗佈高度80與厚度90之關係,便可輕易地使塗佈液滴呈安定化。另外,所謂「塗佈液滴」係指在塗佈裝置與基材之間所生成的液體滯留。Further, when the coating of the first and second compositions is carried out using a die coating head as shown in FIG. 3, it belongs to the distance between the die coater head 40 and the light-transmitting resin substrate 10. The coating height 80 and the total thickness of the coating film of the first and second compositions at the time of simultaneous multilayer coating on the light-transmitting resin substrate 10 are preferably 90 (the thickness of 90) The relationship between times). By performing simultaneous multi-layer coating while maintaining such a relationship, the coating droplets formed between the light-transmitting resin substrate 10 and the mold coater head 40 are stabilized. In particular, when the coating droplets are formed into a film by coating, the film becomes more unstable, and the coating surface is likely to be spotted or streaked, which causes deterioration in appearance. However, by maintaining the above coating height 80 and thickness The relationship of 90 makes it easy to stabilize the coating droplets. In addition, the "coating droplet" means the liquid retention generated between the coating device and the substrate.

上述其他的機能層用組成物係可與第一及第二組成物一起施行同時塗佈,亦可在第一及第二組成物之外另行施行塗佈。當施行同時塗佈的情況,在從光穿透性基材側起依使第一及第二組成物呈相鄰接位置狀態施行塗佈的前提下,可配合其機能而設定適當塗佈位置。例如將抗靜電層用組成物與第一及第二組成物一起施行同時塗佈時,只要在較圖3中的模頭狹縫51更靠光穿透性基材搬送方向140上游側(即圖3中的狹縫51左側)設置第三狹縫(未圖示),再將抗靜電層用組成物、第一及第二組成物施行同時塗佈便可。又,例如當將抗靜電層用組成物、第一及第二組成物、以及防污層用組成物施行同時塗佈時,只要在圖3中於狹縫51左側設置為塗佈抗靜電層用組成物用的第三狹縫(未圖示),並在狹縫52右側設置為塗佈防污層用組成物用的第四狹縫(未圖示),便可將該四種組成物施行同時塗佈。The other functional layer composition may be applied simultaneously with the first and second compositions, or may be additionally applied in addition to the first and second compositions. In the case of simultaneous coating, the coating position can be set in accordance with the function of the first and second compositions in the state of being adjacent to each other from the side of the light-permeable substrate. . For example, when the antistatic layer composition is applied simultaneously with the first and second compositions, it is only on the upstream side of the light transmissive substrate transport direction 140 in the die slit 51 of FIG. 3 (ie, A third slit (not shown) is provided on the left side of the slit 51 in Fig. 3, and the antistatic layer composition and the first and second compositions are simultaneously coated. Further, for example, when the composition for an antistatic layer, the first and second compositions, and the composition for an antifouling layer are simultaneously applied, as long as the antistatic layer is coated on the left side of the slit 51 in FIG. The fourth slit (not shown) for the composition is provided on the right side of the slit 52 as a fourth slit (not shown) for applying the composition for the antifouling layer, and the four compositions can be used. The material is applied at the same time.

(iv)步驟的乾燥方法係例如減壓乾燥或加熱乾燥,以及組合該等乾燥的方法等。又,當依常壓施行乾燥時,最好依30~110℃施行乾燥。The drying method of the step (iv) is, for example, drying under reduced pressure or heating, and a method of combining the drying and the like. Further, when drying is carried out under normal pressure, it is preferred to carry out drying at 30 to 110 °C.

本發明中,在施行(iv)步驟之前(即,塗膜乾燥前)並無施行預烘烤。In the present invention, pre-baking is not performed before the step (iv) is performed (i.e., before the coating film is dried).

例如當第一或第二溶劑係使用甲基異丁酮的情況,通常依室溫~80℃、較佳40℃~70℃範圍內的溫度,施行20秒~3分鐘、較佳30秒~1分鐘程度時間的乾燥。For example, when the first or second solvent is methyl isobutyl ketone, it is usually carried out at a temperature ranging from room temperature to 80 ° C, preferably from 40 ° C to 70 ° C, for 20 seconds to 3 minutes, preferably 30 seconds. Dry for 1 minute.

另外,本發明中,(iv)步驟中所謂「乾燥」係指即便施行該乾燥,層的硬化尚未充分達當作製品用程度(例如JIS K5600-5-4(1999)所規定的鉛筆硬度試驗(4.9N荷重)中,未滿硬度「H」)的處理,相對於此,當第一樹脂與第二樹脂係含有熱硬化性樹脂的情況,在乾燥後所施行的加熱,係利用依施行該加熱,便使層的硬化能達當作製品用之充分程度(上述鉛筆硬度試驗中達硬度「H」以上)的溫度,施行處理。Further, in the present invention, the term "drying" in the step (iv) means that even if the drying is performed, the hardening of the layer is not sufficiently performed as a product (for example, the pencil hardness test prescribed in JIS K5600-5-4 (1999). In the case where the first resin and the second resin contain a thermosetting resin, the heating performed after the drying is performed by the use of the 4.9N load. This heating allows the layer to be cured at a temperature sufficient for the product (the hardness "H" or higher in the pencil hardness test described above).

(iv)步驟的光照射方法主要係使用諸如紫外線、可見光、電子束、或游離輻射線等。紫外線硬化的情況,係使用從諸如超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧、氙弧或金屬鹵素燈等的光線所發出紫外線等。能量線源的照射量係依紫外線波長365nm的積分曝光量計,為50~300mJ/cm2The light irradiation method of the (iv) step mainly uses, for example, ultraviolet rays, visible light, electron beams, or free radiation. In the case of ultraviolet curing, ultraviolet rays emitted from light such as an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a xenon arc or a metal halide lamp are used. The irradiation amount of the energy ray source is 50 to 300 mJ/cm 2 in terms of an integrated exposure amount of an ultraviolet wavelength of 365 nm.

本發明並未施行預烘烤,而是使塗膜硬化(正式硬化)的光照射或加熱係在塗膜乾燥後才實施。藉此,第二組成物中所含低折射率成分便會在HC層的膜厚方向上,存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,且越靠光穿透性基材側,則低折射率成分存在量越少的分佈,從靠光穿透性基材的對向側之界面朝靠光穿透性基材側呈該低折射率成分逐漸減少,而可獲得經抑制HC層內因低折射率成分與HC層的樹脂間之折射率差所造成干涉紋發生情形、以及HC層與基材的界面處發生干涉紋情形,且檢視性優異的光學薄膜。In the present invention, the prebaking is not performed, but the light irradiation or heating for hardening (formally hardening) the coating film is carried out after the coating film is dried. Thereby, the low refractive index component contained in the second composition is more likely to penetrate through the light in the film thickness direction of the HC layer than on the opposite side of the opposite side of the light-transmitting substrate of the HC layer. On the side of the substrate, and on the side of the light-transmitting substrate, the distribution of the low refractive index component is less, from the interface on the opposite side of the light-transmitting substrate toward the light-transmitting substrate. The side of the low refractive index component is gradually decreased, and the occurrence of interference fringes caused by the difference in refractive index between the low refractive index component and the resin of the HC layer in the HC layer can be obtained, and the interface between the HC layer and the substrate interferes. An optical film excellent in visibility and excellent in visibility.

再者,因為在未施行預烘烤的情況下便使塗膜乾燥,接著施行光照射或加熱而使塗膜硬化,因而相較於施行預烘烤而使硬化的情況下,將提高HC層、與光穿透性基材或HC層靠光穿透性基材側所鄰接層間之密接性。Further, since the coating film is dried without performing prebaking, and then the coating film is cured by light irradiation or heating, the HC layer is improved in comparison with the case where the prebaking is performed to harden. The adhesion between the light-transmissive substrate or the HC layer on the side adjacent to the side of the light-transmitting substrate.

再者,因為無必要施行預烘烤,因而相較於施行預烘烤與正式硬化等2度光照射才使硬化的情況下,生產性亦屬優異。Further, since it is not necessary to perform prebaking, it is excellent in productivity in the case where hardening is performed by two-degree light irradiation such as prebaking or main hardening.

(光學薄膜)(optical film)

本發明的光學薄膜係依照上述製造方法所獲得,如圖1所示,在光穿透性基材10的一面側至少設有HC層20。The optical film of the present invention is obtained by the above-described production method, and as shown in Fig. 1, at least one HC layer 20 is provided on one surface side of the light-transmitting substrate 10.

本發明的光學薄膜係藉由依照上述製造方法進行製造,便使在第二組成物中所含低折射率微粒子及/或低折射率樹脂,於HC層的膜厚方向上,存在呈HC層靠光穿透性基材的對向側之界面側較多於靠光穿透性基材側,且越靠光穿透性基材側則其存在量越少的分佈,可獲得經抑制HC層內因該低折射率微粒子及/或低折射率樹脂、與HC層的樹脂間之折射率差所造成干涉紋發生情形、以及HC層與基材的界面處發生干涉紋情形,且檢視性優異的光學薄膜。The optical film of the present invention is produced by the above-described production method so that the low refractive index fine particles and/or the low refractive index resin contained in the second composition are present in the HC layer in the film thickness direction. The interface side on the opposite side of the light-transmitting substrate is more on the side of the light-transmitting substrate, and the smaller the distribution on the side of the light-transmitting substrate, the less HC can be obtained. The occurrence of interference fringes due to the difference in refractive index between the low refractive index fine particles and/or the low refractive index resin and the resin of the HC layer in the layer, and the interference pattern at the interface between the HC layer and the substrate, and excellent visibility Optical film.

再者,因為在未施行預烘烤的情況下便使塗膜乾燥,接著再利用光照射或加熱而使硬化,因而相較於施行預烘烤,接著再施行乾燥、光照射或加熱而使硬化的情況下,並未出現習知利用逐次雙層塗佈形成低折射率層與HC層的情況、或如專利文獻2般的利用同時塗佈形成之情況,所會出現明確的層界面,且具有抗反射機能,在維持霧值、全光線穿透率及無紋斑面狀的情況下,能抑制層間的干涉紋發生,而使密接性呈良化,且藉由在基材附近,增加與基材折射率同程度折射率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,且密接性優異。Further, since the coating film is dried without performing prebaking, and then hardened by light irradiation or heating, drying, light irradiation or heating is performed in comparison with the prebaking. In the case of hardening, there is no known case where a low refractive index layer and an HC layer are formed by sequential double layer coating, or a case where simultaneous coating is formed as in Patent Document 2, and a clear layer interface occurs. It has an anti-reflective function, and it can suppress the occurrence of interference fringes between layers while maintaining the fog value, the total light transmittance, and the smear-free surface, and the adhesion is improved, and is increased in the vicinity of the substrate. The ratio of the hard coat composition having the same refractive index as the refractive index of the substrate suppresses the occurrence of interference fringes between the hard coat layer and the substrate, and is excellent in adhesion.

本發明的光學薄膜係如上述製造方法所述,亦可施行其他機能層用組成物塗佈而形成其他的機能層,例如當在第一組成物的光穿透性基材側塗佈抗靜電層用組成物,而形成抗靜電層時,便構成如圖4所示,從光穿透性基材10側起為抗靜電層140及HC層20的層構成。The optical film of the present invention may be coated with other functional layer compositions to form other functional layers as described in the above production method, for example, when antistatic is applied to the light transmissive substrate side of the first composition. When the composition for the layer is formed to form an antistatic layer, as shown in FIG. 4, the antistatic layer 140 and the layer of the HC layer 20 are formed from the side of the light-transmitting substrate 10.

再者,如圖5所示,在HC層靠光穿透性基材的對向側之面上,亦可設置防污層150。Further, as shown in FIG. 5, the anti-fouling layer 150 may be provided on the surface of the HC layer on the opposite side of the light-transmitting substrate.

HC層的乾燥膜厚(以下亦簡稱「膜厚」)係可配合所要求的性能而適當調節,例如較佳為膜厚1~20μm。The dry film thickness (hereinafter also referred to as "film thickness") of the HC layer can be appropriately adjusted in accordance with the required properties. For example, the film thickness is preferably 1 to 20 μm.

其他的機能層膜厚係可適當調節,例如抗靜電層的膜厚較佳係0.05~5μm,防污層的膜厚較佳係0.01~10nm。The film thickness of other functional layers can be appropriately adjusted. For example, the film thickness of the antistatic layer is preferably 0.05 to 5 μm, and the film thickness of the antifouling layer is preferably 0.01 to 10 nm.

本發明的光學薄膜係配合所要求的性能,而藉由適當調節上述第二組成物的低折射率微粒子、低折射率樹脂的種類與含有量,便可調節其反射率,而對入射光的反射率較佳係1~3.75、更佳係1~3.4。The optical film of the present invention can adjust the reflectance of the incident light by appropriately adjusting the kind and content of the low refractive index fine particles and the low refractive index resin of the second composition in accordance with the required properties. The reflectance is preferably from 1 to 3.75, more preferably from 1 to 3.4.

反射率係使用日本分光(股)製商品名V7100型紫外可見分光光度計、及日本分光(股)製商品名VAR-7010絕對反射率測定裝置,將入射角設為5°、偏光片設為N偏光、測定波長範圍設為380~780nm,並將黑色膠帶貼合於光學薄膜靠TAC基材側,再將其設置於裝置中並進行測定。另外,將利用測定波長範圍所求得測定結果的平均值視為反射率。The reflectance was obtained by using a spectrophotometer model V7100, a UV-visible spectrophotometer manufactured by JASCO Corporation, and a product of VAR-7010 absolute reflectance, manufactured by JASCO Corporation. The incident angle was set to 5° and the polarizer was set. The N-polarized light and the measurement wavelength range were set to 380 to 780 nm, and a black tape was bonded to the optical film on the side of the TAC substrate, and this was placed in a device and measured. Further, the average value of the measurement results obtained by using the measurement wavelength range is regarded as the reflectance.

本發明光學薄膜的霧值係可配合所要求的性能而適當調節,較佳為0.1~1.0%、更佳為0.1~0.4%。The haze value of the optical film of the present invention can be appropriately adjusted in accordance with the desired properties, and is preferably 0.1 to 1.0%, more preferably 0.1 to 0.4%.

霧值係可根據JIS K7136,利用反射‧穿透率計HM-150(村上色彩技術研究所(股)製)進行測定。The haze value can be measured by a reflection ‧ transmittance meter HM-150 (manufactured by Murakami Color Research Laboratory Co., Ltd.) in accordance with JIS K7136.

本發明光學薄膜的較佳實施態樣,在光穿透性基材的一面側設有硬塗層的光學薄膜,在上述硬塗層的膜厚方向上,低折射率微粒子存在呈在上述光穿透性基材的對向側之界面側較多於該光穿透性基材側,且越靠該光穿透性基材側則該低折射率微粒子的存在量越少,該從靠光穿透性基材的對向側之界面朝靠光穿透性基材側,呈該低折射率成分逐漸減少,在該硬塗層內並無層界面,在該硬塗層對上述光穿透性基材的棋盤格密接性試驗中,可使密接率成為90~100%。In a preferred embodiment of the optical film of the present invention, an optical film having a hard coat layer is provided on one surface side of the light-transmitting substrate, and in the film thickness direction of the hard coat layer, low-refractive-index particles are present in the light. The interface side of the opposite side of the penetrating substrate is more on the side of the light-transmitting substrate, and the smaller the amount of the low-refractive-index particles is on the side of the light-permeable substrate, the less The interface on the opposite side of the light-transmitting substrate faces the light-permeable substrate side, and the low-refractive-index component gradually decreases, and there is no layer interface in the hard coat layer. In the checkerboard adhesion test of the penetrating substrate, the adhesion ratio can be made 90 to 100%.

如圖1所示,藉由在HC層內形成此種低折射率微粒子的分佈,便具有抗反射機能,且在維持霧值、全光線穿透率及無紋斑面狀的情況下,抑制層間的干涉紋發生、使密接性呈良化,藉由在基材附近,增加與基材折射率同程度折射率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,便可獲得密接性優異的光學薄膜。As shown in FIG. 1, by forming such a distribution of low-refractive-index microparticles in the HC layer, it has an anti-reflection function, and suppresses interlayers while maintaining a haze value, a total light transmittance, and a speckle-free surface. The interference pattern is generated to improve the adhesion, and the ratio of the hard coating composition having the same refractive index as the refractive index of the substrate is increased in the vicinity of the substrate, thereby suppressing the occurrence of interference fringes between the hard coat layer and the substrate. An optical film excellent in adhesion can be obtained.

所謂「硬塗層內的層界面」係指如圖2所示,於層內在組成物的硬化部分發生界面(邊界)情形。層界面的具體例係有如後述表3(c)所示2種組成物的硬化部分邊界。The term "layer interface in the hard coat layer" means that an interface (boundary) occurs in the hardened portion of the composition in the layer as shown in Fig. 2 . Specific examples of the layer interface include the boundary of the hardened portion of the two compositions shown in Table 3 (c) to be described later.

本發明光學薄膜的較佳實施態樣,亦可於硬塗層的膜厚方向上,在從上述靠光穿透性基材的對向側之界面起至達上述硬塗層乾燥膜厚70%為止的區域中,存在有上述低折射率微粒子總量的70~100%。藉此便可效率佳地提高光學薄膜的抗反射性。In a preferred embodiment of the optical film of the present invention, in the film thickness direction of the hard coat layer, the dry film thickness of the hard coat layer is 70 from the interface on the opposite side of the light-transmitting substrate. In the region up to %, 70 to 100% of the total amount of the low refractive index fine particles are present. Thereby, the antireflection property of the optical film can be improved efficiently.

本發明光學薄膜的全光線穿透率(τt),就從透明性的觀點,較佳係達90%以上、更佳係達92%以上。The total light transmittance (τt) of the optical film of the present invention is preferably 90% or more, and more preferably 92% or more from the viewpoint of transparency.

光學薄膜的全光線穿透率係可根據JIS K7361,利用與霧值相同的測定器進行測定。The total light transmittance of the optical film can be measured by using a measuring instrument having the same haze value according to JIS K7361.

(偏光板)(polarizer)

本發明偏光板的特徵在於:在上述光學薄膜靠上述硬塗層的對向之光穿透性基材側上設有偏光片。The polarizing plate of the present invention is characterized in that a polarizing plate is provided on the side of the optical film opposite to the light-transmitting substrate of the hard coat layer.

圖6所示係本發明偏光板的層構成一例示意圖。圖6所示偏光板2係具備有:在光穿透性基材10上設有HC層20的光學薄膜1、以及積層著保護膜160與偏光層170的偏光片180,在光學薄膜1靠HC層20的對向之光穿透性基材10側設有偏光片180。Fig. 6 is a view showing an example of the layer constitution of the polarizing plate of the present invention. The polarizing plate 2 shown in FIG. 6 includes an optical film 1 in which the HC layer 20 is provided on the light-transmitting substrate 10, and a polarizing plate 180 in which the protective film 160 and the polarizing layer 170 are laminated, and the optical film 1 is placed on the optical film 1. A polarizer 180 is provided on the opposite side of the light-transmitting substrate 10 of the HC layer 20.

另外,在光學薄膜靠硬塗層的對向之光穿透性基材側配置有偏光片,不僅光學薄膜與偏光片係個別形成的情況,亦涵蓋構成光學薄膜的構件係兼具構成偏光片之構件的情況。Further, a polarizing plate is disposed on the side of the optically-transparent substrate on which the optical film is opposed to the hard coat layer, and not only the optical film and the polarizer are formed separately, but also the member constituting the optical film and the polarizer are formed. The condition of the components.

再者,將本發明偏光板使用於顯示面板的情況,通常係在靠偏光片側配置顯示面板。Further, in the case where the polarizing plate of the present invention is used for a display panel, the display panel is usually disposed on the side of the polarizer.

另外,相關光學薄膜,因為若使用上述光學薄膜便可,因而此處便不在贅述。以下,針對本發明偏光板的其他構成進行說明。Further, the related optical film is not described here because the above optical film can be used. Hereinafter, other configurations of the polarizing plate of the present invention will be described.

(偏光片)(polarizer)

本發明所使用的偏光片係在具備有既定偏光特性的前提下,其餘並無特別的限制,可使用一般在液晶顯示裝置中所使用的偏光片。The polarizer used in the present invention is not particularly limited as long as it has a predetermined polarizing property, and a polarizer generally used in a liquid crystal display device can be used.

偏光片係在能長期間保持既定偏光特性的形態下,其餘並無特別的限制,例如亦可僅由偏光層構成,亦可將保護膜與偏光層予以貼合。當將保護膜與偏光層予以貼合的情況,亦可僅在偏光層的單面上形成保護膜,亦可在偏光層的雙面上均有形成保護膜。The polarizer is in a form in which a predetermined polarizing characteristic is maintained for a long period of time, and the rest is not particularly limited. For example, the polarizing layer may be formed only by a polarizing layer, or the protective film may be bonded to the polarizing layer. When the protective film and the polarizing layer are bonded together, a protective film may be formed only on one surface of the polarizing layer, or a protective film may be formed on both surfaces of the polarizing layer.

偏光層通常係可使用使碘含潤於由聚乙烯醇構成的薄膜中,再將其藉由單軸延伸而使形成聚乙烯醇與碘之錯合物者。The polarizing layer is usually one which can be used to form iodine in a film composed of polyvinyl alcohol, and then to form a complex of polyvinyl alcohol and iodine by uniaxial stretching.

再者,保護膜係在能保護上述偏光層,且具有所需光穿透性的前提下,其餘並無特別的限制。Further, the protective film is not particularly limited as long as it can protect the above-mentioned polarizing layer and has desired light transmittance.

保護膜的光穿透性係在可見光區域中的穿透率較佳為80%以上、更佳為90%以上。The light transmittance of the protective film is preferably 80% or more, more preferably 90% or more in the visible light region.

另外,上述保護膜的穿透率係根據JIS K7361-1(塑膠-透明材料的全光線穿透率試驗方法)便可進行測定。Further, the transmittance of the above protective film can be measured in accordance with JIS K7361-1 (Test method for total light transmittance of plastic-transparent material).

構成保護膜的樹脂係可舉例如:纖維素衍生物、環烯烴系樹脂、聚甲基丙烯酸甲酯、聚乙烯醇、聚醯亞胺、聚芳酯、聚對苯二甲酸乙二酯等。其中,較佳為使用纖維素衍生物或環烯烴系樹脂。The resin constituting the protective film may, for example, be a cellulose derivative, a cycloolefin resin, polymethyl methacrylate, polyvinyl alcohol, polyimide, polyarylate or polyethylene terephthalate. Among them, a cellulose derivative or a cycloolefin resin is preferably used.

保護膜係可由單一層構成,亦可由複數層積層。又,當保護膜係由複數層積層的情況,可由同一組成的複數層積層,且亦可由具不同組成的複數層積層。The protective film may be composed of a single layer or a plurality of layers. Further, in the case where the protective film is laminated by a plurality of layers, a plurality of laminated layers of the same composition may be used, and a plurality of laminated layers having different compositions may also be used.

再者,保護膜的厚度係在能將本發明偏光板的可撓性形成於所需範圍內,且藉由與偏光層相貼合,便可將偏光片的尺寸變化限制於既定範圍內的前提下,其餘並無特別的限制,但較佳為5~200μm範圍內、更佳為15~150μm範圍內、特佳為30~100μm範圍內。若上述厚度較薄於5μm,便會有本發明偏光板尺寸變化變大的可能性。又,若上述厚度較厚於200μm,例如當將本發明偏光板施行裁剪加工時,會有加工屑增加、或裁剪刀片之磨損變快的可能性。Furthermore, the thickness of the protective film is such that the flexibility of the polarizing plate of the present invention can be formed within a desired range, and by conforming with the polarizing layer, the dimensional change of the polarizing plate can be limited to a predetermined range. The remainder is not particularly limited, but is preferably in the range of 5 to 200 μm, more preferably in the range of 15 to 150 μm, and particularly preferably in the range of 30 to 100 μm. If the thickness is thinner than 5 μm, there is a possibility that the dimensional change of the polarizing plate of the present invention becomes large. Further, when the thickness is thicker than 200 μm, for example, when the polarizing plate of the present invention is subjected to cutting, there is a possibility that the processing chips are increased or the wear of the cutting blade is increased.

保護膜亦可為具有相位差性者。藉由使用具相位差性的保護膜,便具有將本發明偏光板形成顯示面板之視角補償機能的優點。The protective film may also be of phase difference. By using a phase difference protective film, there is an advantage that the polarizing plate of the present invention forms the viewing angle compensation function of the display panel.

保護膜具有相位差性的態樣,係在能顯現出所需相位差性態樣的前提下,其餘並無特別的限制。此種態樣係有如:保護膜具有由單一層構成,且含有顯現出相位差性的光學特性顯劑(developing agent),而具有相位差性的態樣,以及在由上述樹脂構成的保護膜上,積層著含有具折射率異向性化合物的相位差層之構成,藉此便具有相位差性的態樣。本發明中,該等任一態樣均適於使用。The protective film has a phase difference, and the rest is not particularly limited insofar as it exhibits a desired phase difference. Such a pattern is such that the protective film has a single layer and contains an optical developing developer which exhibits phase difference, and has a phase difference, and a protective film composed of the above resin. In the above, a phase difference layer containing a refractive index anisotropic compound is laminated, whereby phase difference is obtained. In the present invention, any of these aspects is suitable for use.

(顯示器)(monitor)

本發明顯示器的特徵在於:在上述光學薄膜靠上述硬塗層的對向之光穿透性基材側上,配置顯示面板。The display of the present invention is characterized in that a display panel is disposed on the side of the optical film facing the light-transmitting substrate facing the hard coat layer.

顯示器係可舉例如:LCD、PDP、ELD(有機EL、無機EL)、CRT等。Examples of the display include LCD, PDP, ELD (organic EL, inorganic EL), CRT, and the like.

顯示器係由:顯示器之視聽者側構件的顯示面板、以及含驅動部的背面側構件構成。若舉液晶顯示器為例進行說明,所謂「顯示面板」係由封鎖液晶材料的2片玻璃板(例如彩色濾光片基板與陣列基板)、偏光板、及本發明光學薄膜等構成的構件。若舉液晶顯示器為例進行說明,所謂「背面側構件」係由通稱「背光源」的光源、控制LCD的驅動電路、控制光源的電路、及機殼等構成的構件。此情況的液晶顯示器之層構成一例,係含有導光板或擴散薄膜等的背光源部,在其視聽者側依序積層著偏光板、陣列基板、液晶層、彩色濾光片基板、偏光板、及光學薄膜而構成。The display is composed of a display panel of a viewer side member of the display and a back side member including a driving portion. In the case where the liquid crystal display is described as an example, the "display panel" is a member composed of two glass plates (for example, a color filter substrate and an array substrate) that block liquid crystal material, a polarizing plate, and an optical film of the present invention. In the case where the liquid crystal display is described as an example, the "back side member" is a member composed of a light source called "backlight", a drive circuit for controlling the LCD, a circuit for controlling the light source, and a casing. In this case, a layer configuration of a liquid crystal display includes a backlight unit such as a light guide plate or a diffusion film, and a polarizing plate, an array substrate, a liquid crystal layer, a color filter substrate, and a polarizing plate are sequentially laminated on the viewer side. And an optical film.

上述顯示器另一例的PDP係具備有表面玻璃基板、以及背面玻璃基板。該背面玻璃基板係配置呈在與該表面玻璃基板相對向之間封入放電氣體狀態。當上述顯示器係PDP的情況,亦有在表面玻璃基板的表面或其前面板(玻璃基板或薄膜基板)上,設置上述光學薄膜。The PDP of another example of the above display includes a front glass substrate and a rear glass substrate. The back glass substrate is disposed in a state in which a discharge gas is sealed between the surface glass substrate and the surface glass substrate. In the case where the display is a PDP, the optical film may be provided on the surface of the surface glass substrate or on the front panel (glass substrate or film substrate).

上述顯示器係可為諸如:將若施加電壓便會發光的硫化鋅、二胺類物質等發光體,蒸鍍於玻璃基板上,控制著對基板所施加的電壓而進行顯示之ELD裝置,或者將電子信號轉換為光而產生肉眼可看到影像的CRT等顯示器。此情況,在ELD裝置或CRT的最表面或其前面板的表面設有上述光學薄膜。The display device may be, for example, an ELD device that vaporizes a light-emitting body such as zinc sulfide or a diamine substance that emits light when a voltage is applied, and controls the voltage applied to the substrate to be displayed on the glass substrate, or A display such as a CRT that converts an electronic signal into light to produce an image that is visible to the naked eye. In this case, the above optical film is provided on the surface of the ELD device or the outermost surface of the CRT or the front panel thereof.

[實施例][Examples]

以下,舉實施例,針對本發明更進一步進行體的說明。該等的記載並非限制本發明。Hereinafter, the present invention will be further described by way of examples. The above description does not limit the invention.

低折射率微粒子係使用日揮觸媒化成(股)製中空二氧化矽微粒子(商品名THRULYADAS(平均粒徑50nm、MIBK分散液、固形份20%))。The low-refractive-index microparticles are hollow cerium oxide microparticles (trade name: THRULYA) DAS (average particle diameter: 50 nm, MIBK dispersion, solid content: 20%).

第一樹脂(1)係使用荒川化學工業(股)製商品名BEAMSET DK1(重量平均分子量20000、固形份75%、MIBK溶劑)。The first resin (1) was manufactured by Arakawa Chemical Industry Co., Ltd. under the trade name BEAMSET DK1 (weight average molecular weight: 20,000, solid content: 75%, MIBK solvent).

第一樹脂(2)係使用日本化藥(股)製季戊四醇三丙烯酸酯。The first resin (2) is a pentaerythritol triacrylate manufactured by Nippon Kayaku Co., Ltd.

兼具第一樹脂的低折射率樹脂係使用共榮公司化學(股)製LINC-3A(下述一般式(1)所示三丙烯醯基-十七氟壬烯基-季戊四醇(主成分)、與季戊四醇三丙烯酸酯的混合物)。The low refractive index resin having the first resin is LINC-3A manufactured by Kyoei Chemical Co., Ltd. (trimethylidene-heptadecafluorodecenyl-pentaerythritol (main component) represented by the following general formula (1) , a mixture with pentaerythritol triacrylate).

[化1][Chemical 1] 一般式(1)General formula (1)

聚合起始劑係使用日本汽巴(股)製商品名IRGACURE(Irg)184。The polymerization initiator was manufactured by Nippon Ciba (trade name) under the trade name IRGACURE (Irg) 184.

均塗劑係使用DIC(股)製商品名MCF350-5(固形份5%)。The coating agent was a trade name of MCF350-5 (solid content: 5%) manufactured by DIC.

溶劑係使用MIBK。The solvent used MIBK.

光穿透性基材係使用富士薄膜(股)製TAC基材、商品名TD80UL(厚度80μm)。As the light-transmitting substrate, a TAC substrate made of Fujifilm Co., Ltd., trade name: TD80UL (thickness: 80 μm) was used.

另外,第一組成物及第二組成物的黏度係使用Anton Paar公司製MCR301,依測定夾具為PP50、測定溫度為25℃、剪切速度為10000[l/s]的條件,將測定對象的組成物(油墨)適量滴下於平台上並進行測定。Further, the viscosity of the first composition and the second composition was measured using MCR301 manufactured by Anton Paar Co., Ltd. under the conditions of a measurement jig of PP50, a measurement temperature of 25 ° C, and a shear rate of 10000 [l/s]. The composition (ink) was dropped on the platform in an appropriate amount and measured.

乾燥膜厚的測定係使用Mitutoyo製商品名DIGIMATIC INDICATOR CODE215-403,在玻璃上放置測定對象的樣品並進行測定。The measurement of the dry film thickness was carried out by placing a sample of the measurement target on a glass using a product name DIGIMATIC INDICATOR CODE 215-403 manufactured by Mitutoyo.

各化合物的簡稱分別如下:The abbreviations for each compound are as follows:

PETA:季戊四醇三丙烯酸酯PETA: pentaerythritol triacrylate

MIBK:甲基異丁酮MIBK: methyl isobutyl ketone

IPA:異丙醇IPA: isopropanol

TAC:三乙醯基纖維素TAC: triethylenesulfonyl cellulose

(第一硬塗層用硬化性樹脂組成物之調製)(Preparation of curable resin composition for first hard coat layer)

分別調配入下述組成成分,而調製得第一硬塗層用硬化性樹脂組成物1及2、以及第二硬塗層用硬化性樹脂組成物1。The curable resin compositions 1 and 2 for the first hard coat layer and the curable resin composition 1 for the second hard coat layer were prepared by blending the following components.

(第一硬塗層用硬化性樹脂組成物1)(curable resin composition for the first hard coat layer 1)

BEAMSET DK1:64.72質量份(固形份換算48.54質量份)BEAMSET DK1: 64.72 parts by mass (48.54 parts by mass)

Irg184:1.94質量份Irg184: 1.94 parts by mass

MCF350-5:0.97質量份(固形份換算0.05質量份)MCF350-5: 0.97 parts by mass (0.05 parts by mass of solid content)

MIBK:32.36質量份MIBK: 32.36 parts by mass

(第一硬塗層用硬化性樹脂組成物2)(curable resin composition for the first hard coat layer 2)

PETA:75.49質量份(固形份換算56.62質量份)PETA: 75.49 parts by mass (56.62 parts by mass of solid content)

Irg184:3.02質量份Irg184: 3.02 parts by mass

MCF350-5:3.02質量份(固形份換算0.15質量份)MCF350-5: 3.02 parts by mass (0.15 parts by mass of solid content)

MIBK:18.47質量份MIBK: 18.47 parts by mass

(第二硬塗層用硬化性樹脂組成物1)(curable resin composition for the second hard coat layer 1)

THRULYADAS:75.81(固形份換算15.16質量份)THRULYA DAS: 75.81 (15.16 parts by mass)

BEAMSET DK1:13.48質量份(固形份換算10.11質量份)BEAMSET DK 1:13.48 parts by mass (10.11 parts by mass)

Irg184:0.61質量份Irg184: 0.61 parts by mass

MCF350-5:10.11質量份(固形份換算0.51質量份)MCF350-5: 10.11 parts by mass (0.51 parts by mass)

(第二硬塗層用硬化性樹脂組成物2)(Curable resin composition 2 for second hard coat layer)

THRULYADAS:83.12(固形份換算16.62質量份)THRULYA DAS: 83.12 (16.62 parts by mass of solid content)

BEAMSET DK1:15.83質量份(固形份換算11.87質量份)BEAMSET DK 1:15.83 parts by mass (11.87 parts by mass)

Irg184:0.48質量份Irg184: 0.48 parts by mass

MCF350-5:0.57質量份(固形份換算0.03質量份)MCF350-5: 0.57 parts by mass (0.03 parts by mass of solid content)

(第二硬塗層用硬化性樹脂組成物3)(Curable resin composition for the second hard coat layer 3)

THRULYADAS:73.95(固形份換算14.79質量份)THRULYA DAS: 73.95 (solid content conversion 14.79 parts by mass)

BEAMSET DK1:24.65質量份(固形份換算18.49質量份)BEAMSET DK1: 24.65 parts by mass (solid content conversion 18.49 parts by mass)

Irg184:0.74質量份Irg184: 0.74 parts by mass

MCF350-5:0.67質量份(固形份換算0.03質量份)MCF350-5: 0.67 parts by mass (0.03 parts by mass of solid content)

(第二硬塗層用硬化性樹脂組成物4)(Curable resin composition for the second hard coat layer 4)

LINC-3A:78.63LINC-3A: 78.63

Irg184:3.15質量份Irg184: 3.15 parts by mass

MCF350-5:15.73質量份(固形份換算0.79質量份)MCF350-5: 15.73 parts by mass (0.79 parts by mass of solid content)

MIBK:2.49質量份MIBK: 2.49 parts by mass

(光學薄膜之製作)(production of optical film) (實施例1)(Example 1)

將上述第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物1,使用蒸發器將溶劑予以餾除,分別將黏度調整為30mPa‧s。接著,在依1m/min速度進行搬送的TAC基材(TD80UL)上,從TAC基材側依第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物1的位置關係施行雙層同時塗佈。此時,第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物1的塗膜之潤濕膜厚,分別設為20μm、10μm。The curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer were distilled off using an evaporator, and the viscosity was adjusted to 30 mPa·s. Next, the curable resin composition 1 for the first hard coat layer and the curable resin composition 1 for the second hard coat layer are used from the TAC substrate side on the TAC substrate (TD80UL) which is conveyed at a speed of 1 m/min. The positional relationship is applied in two layers at the same time. In this case, the wet film thickness of the coating film of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer is set to 20 μm and 10 μm, respectively.

接著,將經雙層同時塗佈的塗膜,依70℃施行60秒鐘乾燥,並於氮環境下,將紫外線依積分光通量成為120mJ/cm2 方式施行照射而使塗膜硬化,藉此便形成乾燥膜厚10μm的硬塗層,便製得光學薄膜。Then, the coating film which was simultaneously coated by the double layer was dried at 70 ° C for 60 seconds, and the ultraviolet ray was irradiated with an integrated luminous flux of 120 mJ/cm 2 in a nitrogen atmosphere to cure the coating film. An optical film was obtained by forming a hard coat layer having a dry film thickness of 10 μm.

(比較例1)(Comparative Example 1)

除在實施例1中,未使用第二硬塗層用硬化性樹脂組成物1,僅將第一硬塗層用硬化性樹脂組成物1依潤濕膜厚20μm施行塗佈,而形成乾燥膜厚9μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, the curable resin composition 1 for the second hard coat layer was not used, and only the curable resin composition 1 for the first hard coat layer was applied by a wetting film thickness of 20 μm to form a dried film. An optical film was produced in the same manner as in Example 1 except that the hard coat layer was 9 μm thick.

(比較例2)(Comparative Example 2)

除在實施例1中,未使用第一硬塗層用硬化性樹脂組成物1,僅將第二硬塗層用硬化性樹脂組成物1依潤濕膜厚20μm施行塗佈,而形成乾燥膜厚10μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, the curable resin composition 1 for the first hard coat layer was not used, and only the curable resin composition 1 for the second hard coat layer was applied by a wetting film thickness of 20 μm to form a dried film. An optical film was produced in the same manner as in Example 1 except that the hard coat layer was 10 μm thick.

(比較例3)(Comparative Example 3)

除在實施例1中,僅將第一硬塗層用硬化性樹脂組成物1依潤濕膜厚20μm施行塗佈,並將該塗膜依70℃施行60秒鐘乾燥,再於氮環境下,依紫外線成為積分光通量120mJ/cm2 的方式施行照射而使塗膜硬化,接著,再於該硬化膜上,僅將第二硬塗層用硬化性樹脂組成物1依潤濕膜厚10μm施行塗佈,再將該塗膜依70℃施行60秒鐘乾燥,再於氮環境下,將紫外線依積分光通量成為120mJ/cm2 的方式施行照射而使塗膜硬化,便形成合計乾燥膜厚10μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, only the curable resin composition 1 for the first hard coat layer was applied by a wetting film thickness of 20 μm, and the coating film was dried at 70 ° C for 60 seconds, and then under a nitrogen atmosphere. The coating film is cured by irradiation with an ultraviolet light having an integrated luminous flux of 120 mJ/cm 2 , and then only the curable resin composition 1 for the second hard coat layer is applied to the cured film at a thickness of 10 μm. After coating, the coating film was dried at 70 ° C for 60 seconds, and then irradiated with ultraviolet light in an atmosphere of 120 mJ/cm 2 in a nitrogen atmosphere to cure the coating film to form a total dried film thickness of 10 μm. An optical film was produced in the same manner as in Example 1 except for the hard coat layer.

(實施例2)(Example 2)

將上述第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物2,分別調整為黏度10mPa‧s。接著,在依20m/min速度進行搬送的TAC基材(TD80UL)上,從TAC基材側依第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物2的位置關係施行雙層同時塗佈。此時,第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物2的塗膜之潤濕膜厚,分別設為25μm、5μm。The curable resin composition 1 for the first hard coat layer and the curable resin composition 2 for the second hard coat layer were each adjusted to have a viscosity of 10 mPa ‧ s. Then, the curable resin composition 1 for the first hard coat layer and the curable resin composition 2 for the second hard coat layer are used from the TAC substrate side on the TAC substrate (TD80UL) which is transported at a speed of 20 m/min. The positional relationship is applied in two layers at the same time. In this case, the wet film thickness of the coating film of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 2 for the second hard coat layer is set to 25 μm and 5 μm, respectively.

接著,將經雙層同時塗佈的塗膜,依70℃施行60秒鐘乾燥,再於氮環境下,將紫外線依積分光通量成為120mJ/cm2 的方式施行照射而使塗膜硬化,藉此便形成乾燥膜厚11μm的硬塗層,而製得光學薄膜。Then, the coating film which was simultaneously coated by the double layer was dried at 70 ° C for 60 seconds, and the ultraviolet ray was irradiated so as to have an integrated luminous flux of 120 mJ/cm 2 in a nitrogen atmosphere to cure the coating film. A hard coat layer having a dry film thickness of 11 μm was formed to prepare an optical film.

(實施例3)(Example 3)

除在實施例2中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物2的塗膜之潤濕膜厚,分別設為25μm、1μm,並形成乾燥膜厚8μm的硬塗層之外,其餘均與實施例2同樣的製作光學薄膜。In the second embodiment, the wet film thickness of the coating film for the first hard coat layer curable resin composition 1 and the second hard coat layer curable resin composition 2 is set to 25 μm and 1 μm, respectively. An optical film was produced in the same manner as in Example 2 except that a hard coat layer having a dry film thickness of 8 μm was formed.

(實施例4)(Example 4)

除在實施例2中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物2的塗膜之潤濕膜厚,分別設為18.75μm、3.75μm,並形成乾燥膜厚6μm的硬塗層之外,其餘均與實施例2同樣的製作光學薄膜。In the second embodiment, the wet film thickness of the coating film for the first hard coat layer curable resin composition 1 and the second hard coat layer curable resin composition 2 was set to 18.75 μm and 3.75, respectively. An optical film was produced in the same manner as in Example 2 except that a hard coat layer having a dry film thickness of 6 μm was formed in μm.

(比較例4)(Comparative Example 4)

除在實施例2中,未使用第二硬塗層用硬化性樹脂組成物2,僅將第一硬塗層用硬化性樹脂組成物1依潤濕膜厚20μm施行塗佈,而形成乾燥膜厚11μm的硬塗層之外,其餘均與實施例2同樣的製作光學薄膜。In the second embodiment, the curable resin composition 2 for the second hard coat layer was not used, and only the curable resin composition 1 for the first hard coat layer was applied by a wetting film thickness of 20 μm to form a dried film. An optical film was produced in the same manner as in Example 2 except that the hard coat layer was 11 μm thick.

(比較例5)(Comparative Example 5)

除在實施例2中,未使用第一硬塗層用硬化性樹脂組成物1,僅將第二硬塗層用硬化性樹脂組成物2依潤濕膜厚10μm施行塗佈,而形成乾燥膜厚5μm的硬塗層之外,其餘均與實施例2同樣的製作光學薄膜。In the second embodiment, the curable resin composition 1 for the first hard coat layer was not used, and only the curable resin composition 2 for the second hard coat layer was applied by a wetting film thickness of 10 μm to form a dried film. An optical film was produced in the same manner as in Example 2 except that the hard coat layer was 5 μm thick.

(比較例6)(Comparative Example 6)

除在實施例2中,於施行第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物2的同時塗佈後,在乾燥前,先於氮環境下,將紫外線依積分光通量成為50mJ/cm2 的方式施行照射(預烘烤)之外,其餘均與實施例2同樣的製作光學薄膜。In the second embodiment, after the first hard coat layer curable resin composition 1 and the second hard coat layer curable resin composition 2 are applied, the film is applied before the drying, before the drying. An optical film was produced in the same manner as in Example 2 except that the ultraviolet light was irradiated (prebaked) so that the integrated luminous flux was 50 mJ/cm 2 .

(實施例5)(Example 5)

將上述第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物3,分別將黏度調整為10mPa‧s。接著,在依20m/min速度進行搬送的TAC基材(TD80UL)上,從TAC基材側起依第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物3的位置關係施行雙層同時塗佈。此時,第一硬塗層用硬化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分別設為25μm、5μm。The curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 3 for the second hard coat layer were adjusted to have a viscosity of 10 mPa·s. Then, the curable resin composition 1 for the first hard coat layer and the curable resin composition for the second hard coat layer are used from the TAC substrate side on the TAC substrate (TD80UL) which is conveyed at a speed of 20 m/min. The positional relationship of 3 is applied at the same time as the double layer. In this case, the wet film thickness of the coating film of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 3 for the second hard coat layer is set to 25 μm and 5 μm, respectively.

接著,將經施行雙層同時塗佈的塗膜,依70℃施行60秒鐘乾燥,再於氮環境下,將紫外線依積分光通量成為120mJ/cm2 的方式施行照射而使塗膜硬化,藉此便形成乾燥膜厚9μm的硬塗層,而製得光學薄膜。Then, the coating film which was applied at the same time as the double layer was dried at 70 ° C for 60 seconds, and the ultraviolet ray was irradiated so as to have an integrated luminous flux of 120 mJ/cm 2 in a nitrogen atmosphere to cure the coating film. Thus, a hard coat layer having a dry film thickness of 9 μm was formed to prepare an optical film.

(實施例6)(Example 6)

除在實施例5中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分別設為25μm、1μm,並形成乾燥膜厚8μm的硬塗層之外,其餘均與實施例5同樣的製作光學薄膜。In the fifth embodiment, the wet film thickness of the coating film for the first hard coat layer curable resin composition 1 and the second hard coat layer curable resin composition 3 is set to 25 μm and 1 μm, respectively. An optical film was produced in the same manner as in Example 5 except that a hard coat layer having a dry film thickness of 8 μm was formed.

(實施例7)(Example 7)

除在實施例5中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分別設為18.75μm、3.75μm,並形成乾燥膜厚5μm的硬塗層之外,其餘均與實施例5同樣的製作光學薄膜。In the fifth embodiment, the wet film thickness of the coating film for the first hard coat layer curable resin composition 1 and the second hard coat layer curable resin composition 3 was set to 18.75 μm and 3.75, respectively. An optical film was produced in the same manner as in Example 5 except that a hard coat layer having a dry film thickness of 5 μm was formed in μm.

(比較例7)(Comparative Example 7)

除在實施例5中,未使用第一硬塗層用硬化性樹脂組成物1,僅將第二硬塗層用硬化性樹脂組成物3依潤濕膜厚10μm施行塗佈,而形成乾燥膜厚5μm的硬塗層之外,其餘均與實施例5同樣的製作光學薄膜。In the fifth embodiment, the curable resin composition 1 for the first hard coat layer was not used, and only the curable resin composition 3 for the second hard coat layer was applied by a wetting film thickness of 10 μm to form a dried film. An optical film was produced in the same manner as in Example 5 except that the hard coat layer was 5 μm thick.

(實施例8)(Example 8)

將上述第一硬塗層用硬化性樹脂組成物2、及第二硬塗層用硬化性樹脂組成物4,分別將黏度調整為30mPa‧s。接著,在依1m/min速度進行搬送的TAC基材(TD80UL)上,從TAC基材側起依第一硬塗層用硬化性樹脂組成物2及第二硬塗層用硬化性樹脂組成物4的位置關係施行雙層同時塗佈。此時,第一硬塗層用硬化性樹脂組成物2及第二硬塗層用硬化性樹脂組成物4的塗膜之潤濕膜厚,分別設為20μm、10μm。The curable resin composition 2 for the first hard coat layer 2 and the curable resin composition 4 for the second hard coat layer were each adjusted to have a viscosity of 30 mPa·s. Then, the curable resin composition 2 for the first hard coat layer and the curable resin composition for the second hard coat layer are used from the TAC substrate side on the TAC substrate (TD80UL) which is conveyed at a speed of 1 m/min. The positional relationship of 4 is applied in two layers at the same time. In this case, the wet film thickness of the coating film of the curable resin composition 2 for the first hard coat layer 2 and the curable resin composition 4 for the second hard coat layer is set to 20 μm and 10 μm, respectively.

接著,將經施行雙層同時塗佈的塗膜,依25℃施行60秒鐘乾燥,再於氮環境下,將紫外線依積分光通量成為120mJ/cm2 的方式施行照射而使塗膜硬化,藉此便形成乾燥膜厚14μm的硬塗層,而製得光學薄膜。Then, the coating film which was applied at the same time by double layer was dried at 25 ° C for 60 seconds, and the ultraviolet ray was irradiated so as to have an integrated luminous flux of 120 mJ/cm 2 in a nitrogen atmosphere to cure the coating film. Thus, a hard coat layer having a dry film thickness of 14 μm was formed to prepare an optical film.

(實施例9)(Example 9)

除在實施例8中,將雙層同時塗佈之塗膜的乾燥溫度設為50℃之外,其餘均與實施例8同樣的製作光學薄膜。An optical film was produced in the same manner as in Example 8 except that in Example 8, the drying temperature of the coating film simultaneously coated with both layers was changed to 50 °C.

(實施例10)(Embodiment 10)

除在實施例8中,將雙層同時塗佈之塗膜的乾燥溫度設為70℃之外,其餘均與實施例8同樣的製作光學薄膜。An optical film was produced in the same manner as in Example 8 except that in Example 8, the drying temperature of the coating film simultaneously coated with the two layers was changed to 70 °C.

(實施例11)(Example 11)

除在實施例8中,將雙層同時塗佈之塗膜的乾燥溫度設為100℃之外,其餘均與實施例8同樣的製作光學薄膜。An optical film was produced in the same manner as in Example 8 except that in Example 8, the drying temperature of the coating film simultaneously coated with both layers was changed to 100 °C.

(實施例12)(Embodiment 12)

除在實施例10中,將第一硬塗層用硬化性樹脂組成物2、及第二硬塗層用硬化性樹脂組成物4的塗膜之潤濕膜厚,分別設為25μm、5μm之外,其餘均與實施例10同樣的製作光學薄膜。In the tenth embodiment, the wet film thickness of the coating film for the first hard coat layer curable resin composition 2 and the second hard coat layer curable resin composition 4 is set to 25 μm and 5 μm, respectively. An optical film was produced in the same manner as in Example 10 except for the rest.

(比較例8)(Comparative Example 8)

除在實施例10中,未使用第二硬塗層用硬化性樹脂組成物4,僅將第一硬塗層用硬化性樹脂組成物2依潤濕膜厚20μm施行塗佈,而形成乾燥膜厚9μm的硬塗層之外,其餘均與實施例10同樣的製作光學薄膜。In the tenth embodiment, the curable resin composition 4 for the second hard coat layer was not used, and only the curable resin composition 2 for the first hard coat layer was applied by a wetting film thickness of 20 μm to form a dried film. An optical film was produced in the same manner as in Example 10 except that the hard coat layer was 9 μm thick.

(比較例9)(Comparative Example 9)

除在實施例10中,未使用第一硬塗層用硬化性樹脂組成物2,僅將第二硬塗層用硬化性樹脂組成物4依潤濕膜厚10μm施行塗佈,而形成乾燥膜厚8μm的硬塗層之外,其餘均與實施例10同樣的製作光學薄膜。In the tenth embodiment, the curable resin composition 2 for the first hard coat layer was not used, and only the curable resin composition 4 for the second hard coat layer was applied by a wetting film thickness of 10 μm to form a dried film. An optical film was produced in the same manner as in Example 10 except that the hard coat layer was 8 μm thick.

(實施例13)(Example 13)

除在實施例1中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物1的黏度,分別調整為90mPa‧s,並在施行同時塗佈時,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分別設為25μm、5μm,而形成乾燥膜厚18μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer was adjusted to 90 mPa ‧ s, respectively, and applied simultaneously. The wet film thickness of the coating film for the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 3 for the second hard coat layer is set to 25 μm and 5 μm, respectively, to form a dry film thickness. An optical film was produced in the same manner as in Example 1 except that a hard coat layer of 18 μm was used.

(比較例10)(Comparative Example 10)

除在實施例1中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為4mPa‧s的方式進行調整,而形成乾燥膜厚5μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer were adjusted so as to be 4 mPa·s, respectively, to form a dry film. An optical film was produced in the same manner as in Example 1 except that the hard coat layer having a film thickness of 5 μm was used.

(比較例11)(Comparative Example 11)

除在實施例1中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為10mPa‧s、4mPa‧s的方式進行調整,而形成乾燥膜厚9μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer were adjusted so as to be 10 mPa·s and 4 mPa·s, respectively. An optical film was produced in the same manner as in Example 1 except that a hard coat layer having a dry film thickness of 9 μm was formed.

(比較例12)(Comparative Example 12)

除在實施例1中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為62mPa‧s、10mPa‧s的方式進行調整,而形成乾燥膜厚17μm的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer were adjusted so as to be 62 mPa ‧ s and 10 mPa ‧ s, respectively. An optical film was produced in the same manner as in Example 1 except that a hard coat layer having a dry film thickness of 17 μm was formed.

(比較例13)(Comparative Example 13)

在實施例1中,將第一硬塗層用硬化性樹脂組成物1、及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為10mPa‧s的方式進行調整,再將該經調整的2個組成物依與實施例1中所使用的相同量進行混合,然後將該經混合的組成物塗佈於TAC基材上。此時,該經混合的組成物之塗膜潤濕膜厚係設為30μm。In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer are adjusted so as to be 10 mPa ‧ s, and the The adjusted two compositions were mixed in the same amounts as used in Example 1, and the mixed compositions were then coated on a TAC substrate. At this time, the coating film wetting film thickness of the mixed composition was set to 30 μm.

其次,將該塗膜依與實施例1同樣的施行乾燥、光照射,而形成乾燥膜厚10μm的硬塗層,便製得光學薄膜。Then, the coating film was dried and irradiated with light in the same manner as in Example 1 to form a hard coat layer having a dry film thickness of 10 μm to obtain an optical film.

上述實施例及比較例中所使用的組成物種類、潤濕膜厚、塗佈方式、乾燥膜厚及乾燥條件、以及TAC基材的搬送速度,整理如下表1所示。The composition types, wet film thickness, application method, dry film thickness and drying conditions, and transport speed of the TAC substrate used in the above examples and comparative examples are as shown in Table 1 below.

(光學薄膜之評估)(Evaluation of optical film)

相關上述實施例及比較例的光學薄膜,分別依如下述針對反射率、霧值(Hz)及全光線穿透率進行測定。又,相關上述實施例及比較例的光學薄膜,分別依如下述施行干涉紋評估。結果如表2所示。The optical films of the above-described examples and comparative examples were measured for reflectance, haze value (Hz), and total light transmittance as follows. Further, with respect to the optical films of the above-described examples and comparative examples, the interference pattern evaluation was performed as follows. The results are shown in Table 2.

再者,實施例1的光學薄膜截面照片係如表3(a)及(b)所示,比較例3的光學薄膜截面照片係如表3(c)所示。另外,表3(b)的截面照片,係表3(a)的照片中,HC層靠TAC基材的對向側之界面側放大照片。Further, the cross-sectional photograph of the optical film of Example 1 is shown in Tables 3(a) and (b), and the cross-sectional photograph of the optical film of Comparative Example 3 is shown in Table 3(c). Further, in the photograph of the cross section of Table 3 (b), in the photograph of Table 3 (a), the HC layer was enlarged by the interface side of the opposite side of the TAC substrate.

(反射率之測定)(Measurement of reflectance)

反射率的測定係使用日本分光(股)製商品名V7100型紫外可見分光光度計、及日本分光(股)製商品名VAR-7010絕對反射率測定裝置,依入射角設為5°、偏光片為N偏光、測定波長範圍為380~780nm,在光學薄膜靠TAC基材側貼合著黑色膠帶,再將其設置於裝置上並進行測定。另外,將依測定波長範圍所求得測定結果的平均值,視為反射率。The measurement of the reflectance was carried out by using a spectrophotometer model V7100, a UV-visible spectrophotometer manufactured by JASCO Corporation, and a product of VAR-7010 absolute reflectance, manufactured by JASCO Corporation. The incident angle was set to 5° and the polarizer was used. The N-polarized light was measured at a wavelength range of 380 to 780 nm, and a black tape was attached to the optical film on the side of the TAC substrate, and this was placed on a device and measured. Further, the average value of the measurement results obtained by the measurement wavelength range is regarded as the reflectance.

(霧值及全光線穿透率之測定)(Measurement of fog value and total light transmittance)

霧值及全光線穿透率分別係根據JIS K-7136、JIS K7361,利用反射.穿透率計HM-150(村上色彩技術研究所(股)製)進行測定。The fog value and total light transmittance are respectively reflected in accordance with JIS K-7136 and JIS K7361. The measurement was carried out by a transmittance meter HM-150 (manufactured by Murakami Color Technology Research Institute Co., Ltd.).

(干涉紋之評估)(evaluation of interference lines)

使用FUNATECH(股)製干涉紋檢查燈(Na燈),依目視進行檢查,並依下述基準施行評估。An interferometric inspection lamp (Na lamp) manufactured by FUNATECH Co., Ltd. was used for visual inspection, and evaluation was performed according to the following criteria.

○:幾乎無發現有干涉紋發生者○: almost no interference pattern was found

△:能模糊看到干涉紋者△: can see the interference pattern

╳:明顯看到干涉紋者╳: Obviously see the interference pattern

(密接性之評估)(evaluation of adhesion)

針對上述實施例及比較例的光學薄膜,分別施行下述所示棋盤格密接性試驗的密接率測定。With respect to the optical films of the above examples and comparative examples, the adhesion ratio measurement of the checkerboard adhesion test shown below was carried out.

另外,針對比較例12,因為面狀差,因而無法測定。Further, in Comparative Example 12, since the surface was inferior, measurement was impossible.

(棋盤格密接性試驗)(checkerboard adhesion test)

在光學薄膜靠HC層側表面上劃入1mm四方且合計100格的棋盤格,使用NICHIBAN(股)製工業用24mm賽珞膠帶(註冊商標)施行5次連續剝離試驗,並根據下述基準計算未剝落而殘留的方格比例。A 1 mm square and a total of 100 grids were placed on the side surface of the HC film on the side of the HC film, and 5 consecutive peeling tests were carried out using the ICGIBAN industrial 24mm celluloid tape (registered trademark), and calculated according to the following criteria. The proportion of squares remaining without peeling off.

密接率(%)=(未剝落的方格數/合計的方格數100)×100Bonding rate (%) = (number of squares without peeling off / total number of squares 100) × 100

(面狀之評估)(evaluation of the surface)

針對光學薄膜的外觀面狀(有無塗佈紋斑)利用目視進行評估。The appearance of the optical film (with or without coating streaks) was evaluated by visual observation.

○:未看到塗佈紋斑者○: No coating spots were seen

△:能模糊看到塗佈紋斑者△: Can blur the coating pattern

×:明顯看到塗佈紋斑者×: Obviously see the coated spot

(結果整理)(Results)

由表2中得知,實施例均屬於反射率及霧值較低。實施例的全光線穿透率呈91.5%以上的較高值。又,實施例均已抑制干涉紋發生。又,實施例的密接性與面狀均呈良好。特別係實施例1與實施例2的面狀較為良好。It is known from Table 2 that the examples are all low in reflectance and haze. The total light transmittance of the examples was a high value of 91.5% or more. Moreover, the examples have suppressed the occurrence of interference fringes. Further, the adhesion and the surface of the examples were both good. In particular, the surface shapes of Example 1 and Example 2 were relatively good.

由實施例1的光學薄膜剖視圖之表3(a)及(b)得知,中空 二氧化矽微粒子呈從HC層靠TAC基材的對向側(上層側)起,越靠TAC基材側則越減少的分佈,由表3(b)中得知,中空二氧化矽微粒子,幾乎均分佈於從HC層靠TAC基材的對向側之界面起至5μm處。It is known from Tables 3(a) and (b) of the optical film sectional view of Example 1, which is hollow. The cerium oxide microparticles are distributed from the opposite side (upper layer side) of the TAC substrate from the HC layer to the TAC substrate side, and the hollow cerium oxide microparticles are known from Table 3(b). Almost uniformly distributed from the interface of the HC layer on the opposite side of the TAC substrate to 5 μm.

再者,若將表3(a)~(c)進行比對,得知實施例1的情況,第一組成物經硬化部分、與第二組成物經硬化部分的邊界,相較於比較例3之下,前者較為不明顯。Further, when Tables 3(a) to (c) were compared, the case of Example 1 was obtained, and the boundary between the hardened portion of the first composition and the hardened portion of the second composition was compared with the comparative example. Under 3, the former is less obvious.

但是,相當於實施例1中無第二組成物情況的比較例1,因為未含有中空二氧化矽微粒子,因而呈現僅與一般硬塗層為相同的反射率。However, Comparative Example 1 corresponding to the case where the second composition was not contained in Example 1 did not contain hollow ceria particles, and thus exhibited the same reflectance as that of the general hard coat layer.

相當於實施例1中無第一組成物情況的比較例2,會有干涉紋發生,密接率亦偏低。此現象推測係因為第二組成物中所含的中空二氧化矽微粒子,在HC層呈均勻分佈,並位於HC層靠TAC基材側界面,因而導致TAC基材與中空二氧化矽微粒子間之折射率差變大,而造成干涉紋的發生。又,推測依此因中空二氧化矽微粒子位於HC層靠TAC基材側界面,造成HC層的樹脂滲透入TAC基材中並硬化的面積縮小,導致密接性降低。In Comparative Example 2, which is equivalent to the case where the first composition is not present in the first embodiment, interference fringes occur and the adhesion ratio is also low. This phenomenon is presumed to be because the hollow ceria particles contained in the second composition are uniformly distributed in the HC layer and located at the interface of the HC layer on the side of the TAC substrate, thereby causing a gap between the TAC substrate and the hollow ceria particles. The difference in refractive index becomes large, causing the occurrence of interference fringes. Further, it is presumed that since the hollow ceria particles are located at the interface of the HC layer on the side of the TAC substrate, the resin of the HC layer penetrates into the TAC substrate and the area of the hardening is reduced, resulting in a decrease in adhesion.

相當於在實施例1中並非施行同時塗佈而是施行逐次塗佈情況的比較例3,會模糊看到干涉紋。此現象推測如表3(c)的截面照片所看到,第一組成物經硬化部分與第二組成物經硬化部分的邊界呈清晰區分,因該邊界部分的折射率差導致干涉紋發生。Corresponding to Comparative Example 3 in which the simultaneous application was carried out without performing simultaneous coating in Example 1, the interference pattern was blurred. This phenomenon is presumed to be as clearly seen from the cross-sectional photograph of Table 3(c), in which the hardened portion of the first composition is clearly distinguished from the boundary of the hardened portion of the second composition, and the difference in refractive index of the boundary portion causes interference fringes to occur.

相當於實施例2中無第二組成物情況的比較例4,如同比較例1,反射率形成僅與一般硬塗層相同的反射率。Corresponding to Comparative Example 4 in the case where there was no second composition in Example 2, as in Comparative Example 1, the reflectance was the same as that of the general hard coat layer.

相當於實施例2中無第一組成物情況的比較例5,如同比較例2,會有干涉紋發生,且密接率亦偏低。Corresponding to Comparative Example 5 in the case where the first composition was not present in Example 2, as in Comparative Example 2, interference fringes occurred and the adhesion ratio was also low.

相當於實施例2中在乾燥前有施行預烘烤情況的比較例6,密接率偏低。此現象推測因預烘烤的施行,導致第一組成物與第二組成物進行硬化(樹脂的聚合或交聯),造成TAC基材側的第一組成物中所含第一樹脂,並未充分滲透入TAC基材中。Corresponding to Comparative Example 6 in which the prebaking was carried out before drying in Example 2, the adhesion rate was low. This phenomenon is presumed to cause hardening of the first composition and the second composition (polymerization or crosslinking of the resin) due to the pre-baking operation, resulting in the first resin contained in the first composition on the side of the TAC substrate, which is not Fully penetrate into the TAC substrate.

相當於實施例5中無第一組成物情況的比較例7,如同比較例2,會有干涉紋發生,且密接率亦偏低。Compared with Comparative Example 7 in the case where the first composition was not present in Example 5, as in Comparative Example 2, interference fringes occurred and the adhesion ratio was also low.

相當於實施例10中無第二組成物情況的比較例8,如同比較例1,僅成為與一般硬塗層為相同的反射率。Comparative Example 8 corresponding to the case where there was no second composition in Example 10, as in Comparative Example 1, was only the same reflectance as the general hard coat layer.

相當於實施例10中無第一組成物情況的比較例9,如同比較例2,會有干涉紋發生,且密接率亦偏低。Corresponding to Comparative Example 9 in the case where the first composition was not present in Example 10, as in Comparative Example 2, interference fringes occurred and the adhesion ratio was also low.

相當於實施例1中第一組成物與第二組成物的黏度均較小情況的比較例10,反射率較低於比較例1,但較高於實施例1。此現象推測係因二個組成物的黏度較低,導致二個組成物進行混合,造成在HC層靠TAC基材的對向側(上層側)所存在中空二氧化矽微粒子減少,導致反射率提高。In Comparative Example 10, which corresponds to the case where the viscosity of the first composition and the second composition in Example 1 was small, the reflectance was lower than that of Comparative Example 1, but was higher than that of Example 1. This phenomenon is presumed to be due to the low viscosity of the two compositions, resulting in the mixing of the two components, resulting in the reduction of hollow ceria particles in the HC layer on the opposite side (upper side) of the TAC substrate, resulting in reflectance. improve.

相當於實施例1中HC層上層側的第二組成物黏度較小情況之比較例11,面狀非屬良好。In Comparative Example 11 in which the viscosity of the second composition on the upper layer side of the HC layer in Example 1 was small, the planar shape was not good.

相當於實施例1中第一組成物與第二組成物的黏度差較大情況之比較例12,有大量發生HC層表面的紋斑,導致表面非呈平滑,造成因光的散射而無法進行反射率、霧值及全光線穿透率的測定。In Comparative Example 12, which corresponds to a case where the difference in viscosity between the first composition and the second composition in Example 1 is large, a large number of plaques on the surface of the HC layer occur, resulting in a surface which is not smooth, which is impossible due to scattering of light. Determination of reflectance, haze value and total light transmittance.

相當於實施例1中將第一組成物與第二組成物呈均勻混合物施行塗佈情況的比較例13,反射率係與比較例10同等級。又,會有干涉紋發生,且密接率亦偏低。此現象推測因二個組成物經均勻混合後才施行塗佈,便如同比較例10,在HC層靠TAC基材的對向側所存在中空二氧化矽微粒子會減少,導致反射率提高。又,如同比較例2,因中空二氧化矽微粒子位於HC層靠TAC基材側界面,導致干涉紋發生,造成密接率降低。Corresponding to Comparative Example 13 in which the first composition and the second composition were applied in a uniform mixture in Example 1, the reflectance was the same as that of Comparative Example 10. In addition, interference fringes occur and the adhesion rate is also low. This phenomenon is presumed to be applied because the two compositions are uniformly mixed, and as in Comparative Example 10, the presence of hollow ceria particles in the HC layer on the opposite side of the TAC substrate is reduced, resulting in an increase in reflectance. Further, as in Comparative Example 2, since the hollow ceria particles were located at the interface of the HC layer on the side of the TAC substrate, interference fringes occurred, and the adhesion rate was lowered.

[表3] [table 3]

1‧‧‧光學薄膜1‧‧‧Optical film

2‧‧‧偏光板2‧‧‧Polar plate

10‧‧‧光穿透性基材10‧‧‧Light penetrating substrate

20‧‧‧硬塗層20‧‧‧hard coating

30‧‧‧低折射率微粒子30‧‧‧Low-refractive-index microparticles

40‧‧‧模頭40‧‧‧Mold

51、52‧‧‧狹縫51, 52‧‧‧ slit

60‧‧‧第一硬塗層用硬化性樹脂組成物60‧‧‧First hardenable resin composition for hard coat

61‧‧‧第一硬塗層用硬化性樹脂組成物之塗膜61‧‧‧ Coating of hard curable resin composition for the first hard coat layer

70‧‧‧第二硬塗層用硬化性樹脂組成物70‧‧‧The hard curable resin composition for the second hard coat layer

71‧‧‧第二硬塗層用硬化性樹脂組成物之塗膜71‧‧‧Coating film of a hard curable resin composition for a second hard coat layer

80‧‧‧塗佈高度80‧‧‧ Coating height

90‧‧‧第一及第二組成物之合計潤濕膜厚90‧‧‧ Total wet film thickness of the first and second compositions

100‧‧‧習知抗反射膜100‧‧‧Study anti-reflection film

110‧‧‧習知硬塗層110‧‧‧Learly hard coating

120‧‧‧低折射率層120‧‧‧Low refractive index layer

130‧‧‧光穿透性基材之搬送方向130‧‧‧Transport direction of light penetrating substrate

140‧‧‧抗靜電層140‧‧‧Antistatic layer

150‧‧‧防污層150‧‧‧Anti-fouling layer

160‧‧‧保護膜160‧‧‧Protective film

170‧‧‧偏光層170‧‧‧ polarizing layer

180‧‧‧偏光片180‧‧‧ polarizer

圖1為依照本發明製造方法所獲得光學薄膜的HC層中,低折射率微粒子分佈一例的截面示意圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in an HC layer of an optical film obtained by the production method of the present invention.

圖2為依照習知逐次雙層塗佈方式所獲得抗反射膜的低折射率層中,低折射率微粒子分佈一例的截面示意圖。Fig. 2 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in a low refractive index layer of an antireflection film obtained by a conventional double-layer coating method.

圖3為本發明光學薄膜之製造方法中,將第一及第二HC層用硬化性樹脂組成物施行同時塗佈的步驟一例示意圖。Fig. 3 is a view showing an example of a procedure for simultaneously applying a first and second HC layer curable resin composition in the method for producing an optical film of the present invention.

圖4為本發明第二光學薄膜的層構造一例示意圖。Fig. 4 is a view showing an example of a layer structure of a second optical film of the present invention.

圖5為本發明第二光學薄膜的層構造另一例示意圖。Fig. 5 is a view showing another example of the layer structure of the second optical film of the present invention.

圖6為本發明偏光板的層構造一例示意圖。Fig. 6 is a view showing an example of a layer structure of a polarizing plate of the present invention.

1...光學薄膜1. . . Optical film

10...光穿透性基材10. . . Light penetrating substrate

20...硬塗層20. . . Hard coating

30...低折射率微粒子30. . . Low refractive index microparticles

Claims (9)

一種光學薄膜之製造方法,其特徵係包括有:(i)準備光穿透性基材的步驟;(ii)準備第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物的步驟,該第一硬塗層用硬化性樹脂組成物係含有具反應性之第一樹脂及第一溶劑,且未含低折射率微粒子與低折射率樹脂、或即使含有低折射率樹脂亦是相對於該第一樹脂質量在5.0質量%以下,黏度μ1為3mPa.s以上;該第二硬塗層用硬化性樹脂組成物係含有從平均粒徑10~300nm的低折射率微粒子及低折射率樹脂所構成群組中選擇之1種以上的低折射率成分、以及具反應性的第二樹脂與第二溶劑,黏度μ2為5mPa.s以上,且該μ2扣減掉該μ1的值係在30mPa.s以下;(iii)在該光穿透性基材之一面側,從該光穿透性基材側,至少使該第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹脂組成物相鄰接並施行同時塗佈,而形成塗膜的步驟;以及(iv)使依上述(iii)步驟所獲得之塗膜乾燥,接著施行光照射及/或加熱而使之硬化的步驟;且在該(iii)步驟與該(iv)步驟間並未施行預烘烤。 A method for producing an optical film, comprising: (i) a step of preparing a light-transmitting substrate; (ii) preparing a curable resin composition for the first hard coat layer and a hardenability for the second hard coat layer In the step of the resin composition, the first hard coat layer curable resin composition contains a reactive first resin and a first solvent, and does not contain low refractive index fine particles and a low refractive index resin, or even contains low refractive index The rate resin is also 5.0 mass% or less with respect to the mass of the first resin, and the viscosity μ1 is 3 mPa. s or more, the curable resin composition for the second hard coat layer contains one or more kinds of low refractive index components selected from the group consisting of low refractive index fine particles and low refractive index resins having an average particle diameter of 10 to 300 nm. And a reactive second resin and a second solvent, the viscosity μ2 is 5 mPa. s above, and the μ2 buckle minus the value of μ1 is at 30 mPa. (iii) at least one side of the light-transmitting substrate, from the side of the light-transmitting substrate, at least the hardening resin composition for the first hard coat layer and the second hard coat layer are hardened a resin composition adjacent to and performing simultaneous coating to form a coating film; and (iv) drying the coating film obtained according to the above step (iii), followed by performing light irradiation and/or heating to harden And the pre-baking is not performed between the (iii) step and the (iv) step. 如申請專利範圍第1項之光學薄膜之製造方法,其中,在上述(iii)步驟中,將第一硬塗層用硬化性樹脂組成物的塗 膜之潤濕膜厚設為T1,並將第二硬塗層用硬化性樹脂組成物的塗膜之潤濕膜厚設為T2時,T2/T1為0.01~1。 The method for producing an optical film according to claim 1, wherein in the step (iii), the first hard coat layer is coated with a curable resin composition. When the wet film thickness of the film is T1 and the wet film thickness of the coating film of the curable resin composition for the second hard coat layer is T2, T2/T1 is 0.01 to 1. 如申請專利範圍第2項之光學薄膜之製造方法,其中,在上述(iii)步驟中,第一硬塗層用硬化性樹脂組成物的塗膜之潤濕膜厚T1為18.75~25μm,第二硬塗層用硬化性樹脂組成物的塗膜之潤濕膜厚T2為1~10μm,且,上述(iv)步驟後之硬塗層之膜厚為5~18μm。 The method for producing an optical film according to the second aspect of the invention, wherein, in the step (iii), the wet film thickness T1 of the coating film of the curable resin composition for the first hard coat layer is 18.75 to 25 μm. The wet film thickness T2 of the coating film of the curable resin composition for the second hard coat layer is 1 to 10 μm, and the film thickness of the hard coat layer after the step (iv) is 5 to 18 μm. 如申請專利範圍第1項之光學薄膜之製造方法,其中,上述第一硬塗層用硬化性樹脂組成物的黏度μ1係3~95mPa.s,上述第二硬塗層用硬化性樹脂組成物的黏度μ2係5~100mPa.s。 The method for producing an optical film according to the first aspect of the invention, wherein the viscosity of the curable resin composition for the first hard coat layer is 1 to 95 mPa. s, the viscosity of the curable resin composition for the second hard coat layer is 2 to 100 mPa. s. 一種光學薄膜,係依照申請專利範圍第1至4項中任一項之製造方法所獲得。 An optical film obtained by the production method according to any one of claims 1 to 4. 如申請專利範圍第5項之光學薄膜,係在光穿透性基材的一面側設有硬塗層的光學薄膜,其中,在上述硬塗層的膜厚方向上,低折射率微粒子存在於上述光穿透性基材之對向側的界面側多於該光穿透性基材側,且越靠該光穿透性基材側則該低折射率微粒子的存在量越少,從該光穿透性基材的對向側之界面朝光穿透性基材側,該低折射率成分逐漸減少;在該硬塗層內並無層界面;該硬塗層對上述光穿透性基材的棋盤格密接性試驗中,密 接率係90~100%。 An optical film according to claim 5, wherein the optical film is provided with a hard coat layer on one side of the light-transmitting substrate, wherein low-refractive-index particles are present in the film thickness direction of the hard coat layer. The interface side of the opposite side of the light-transmitting substrate is more than the side of the light-transmitting substrate, and the amount of the low-refractive-index particles is smaller as the light-permeable substrate side is smaller. The opposite side of the light transmissive substrate faces the light transmissive substrate side, the low refractive index component gradually decreases; there is no layer interface in the hard coat layer; the hard coat layer has the above light penetration property In the checkerboard adhesion test of the substrate, the dense The connection rate is 90~100%. 如申請專利範圍第5項之光學薄膜,其中,在上述硬塗層的膜厚方向,於從上述光穿透性基材的對向側之界面起至上述硬塗層之乾燥膜厚的70%為止的區域中,存在有上述低折射率微粒子總量的70~100%。 The optical film of claim 5, wherein the film thickness of the hard coat layer is 70 from the interface on the opposite side of the light-transmitting substrate to the dry film thickness of the hard coat layer. In the region up to %, 70 to 100% of the total amount of the low refractive index fine particles are present. 一種偏光板,係在上述申請專利範圍第5項之光學薄膜之上述硬塗層側的對向側之光穿透性基材,設有偏光片。 A polarizing plate comprising a polarizing plate on a side opposite to the hard coat layer side of the optical film of the fifth aspect of the invention. 一種顯示器,係在上述申請專利範圍第5項之光學薄膜之上述硬塗層側的對向側之光穿透性基材,配置顯示面板。A display is provided with a display panel in a light-transmitting substrate on the opposite side of the hard coat layer side of the optical film of the fifth aspect of the above patent application.
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