TW201128216A - Method for producing optical film, optical film, polarizer and display - Google Patents

Method for producing optical film, optical film, polarizer and display Download PDF

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Publication number
TW201128216A
TW201128216A TW099141183A TW99141183A TW201128216A TW 201128216 A TW201128216 A TW 201128216A TW 099141183 A TW099141183 A TW 099141183A TW 99141183 A TW99141183 A TW 99141183A TW 201128216 A TW201128216 A TW 201128216A
Authority
TW
Taiwan
Prior art keywords
hard coat
layer
light
coat layer
composition
Prior art date
Application number
TW099141183A
Other languages
Chinese (zh)
Other versions
TWI443365B (en
Inventor
Yusuke Hayashi
Shin Miyanowaki
Seiji Shinohara
Shigeki Murakami
Koji Hashimoto
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Printing Co Ltd filed Critical Dainippon Printing Co Ltd
Publication of TW201128216A publication Critical patent/TW201128216A/en
Application granted granted Critical
Publication of TWI443365B publication Critical patent/TWI443365B/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • C08J7/0423Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08Cellulose derivatives
    • C08J2301/10Esters of organic acids
    • C08J2301/12Cellulose acetate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08J2433/16Homopolymers or copolymers of esters containing halogen atoms

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

Disclosed is a method for producing an optical film which has excellent productivity, prevents formation of interference fringes between a hard coat layer and a layer that is in contact with the substrate side of the hard coat layer, and has excellent visibility. The method comprises the steps of: preparing an optically-transparent substrate; preparing a first composition and a second composition, the first composition comprising a first resin and a first solvent, comprising no low refractive index component or comprising a low refractive index component of 5.0% by mass or less with respect to the mass of the first resin, and having viscosity μ 1 of 3 mPa.s or more, and the second composition comprising a second resin, a second solvent and a low refractive index component, and having viscosity μ 2 of 5mPa.s or more and a difference between μ 2 and μ 1 of 30 mPa.s or less; forming coating films by applying at least the first and second compositions simultaneously and adjacently to one side of the optically-transparent substrate in this order from the substrate; and curing the coating films by exposure to light or heating after drying the coating films, without pre-curing the films prior to the crying.

Description

201128216 六、發明說明: 【發明所屬之技術領域】 本發明係關於在諸如液晶顯示器(LCD)、陰極管顯示裝置 (CRT)、或電漿顯示器(PDP)等顯示器(影像顯示裝置)的前面 等處設置之光學薄膜、其製造方法、暨使用其之偏光板及顯 示器。 【先前技術】 在如上述的顯示器中’為提高該顯示面的檢視性,便要求 減少從諸如螢光燈、太陽光等外部光源所照射光線的反射。 抑制外部光之反射的方法’已知有使用在硬塗層等機能層的 最表面上設置低折射率層的抗反射膜之方法(例如專利文獻 1)。 但是,如專利文獻1的發明,將機能層形成用組成物施行 塗佈,並利用游離輻射線使半硬化而形成機能層,更進一步 在半硬化狀態的機能層上塗佈低折射率層形成用組成物,再 使完全硬化的方式(半硬化方式(half-curing))中,以及習知在 各層每層上分別塗佈組成物,再使完全硬化的逐次雙層塗佈 方式中,因為將施行複數次塗佈步驟及硬化步驟,因而生產 性不佳。 針對此情況’專利文獻2有提案:主旨在提供能將2層以 上的機能層同時施行雙層塗佈,俾可獲得高生產性、層間密 接性較高,且不致對各層間機能分離造成障礙的光學薄膜之 099141183 4 201128216 方气其係將分別含有游離輕射線硬化性樹脂的A層 與B層冋時施行雙層塗佈,經施行第!次游離韓射線照射(預 烘烤)後,接著施行乾燥,再施行第2次游離輻射線照射, 而使硬化(完麵彳_光學㈣之製造方法。 是除要求所雙層塗佈各層間之高密接性,亦要求所雙 層塗佈層與基材或基材側所接觸層間之高密接性。專利文獻 2係層間的密接性較高、各層_機能被分離,但在同時塗 佈的A層(硬塗層或防眩層)與㈣(折射率控制層)之間存在 有層界面。 再者,專利文獻1 f,企圖降低低折射率層的折射率而使 含有中妹子等低折射率微粒子,但純此使傭射率微粒 子合於低折射率層中,則低折射率層的折射率便會降低,但 因為低折射率層靠基材侧所鄰接之機能層的折射率較高於 低折射率層,因而在低折射率層與機能層的邊界(界面),於 低折射率層的低折射率微粒子與機能層會有折射率差,若施 行精密的膜厚控制,便會發生干涉紋,導致使用抗反射膜的 顯示器之顯示面’出現檢視性降低之問題。 [先行技術文獻] [專利文獻] [專利文獻1]日本專利特開2009-053691號公報 [專利文獻2]日本專利特開2008-250267號公報 【發明内容】 099141183 5 201128216 (發明所欲解決之問題) 本發明係為解決上述問題而完成,本發明第一目的係提 供:藉由施行同時㈣(雙層塗佈),而具有抗反射機能,且 維持務值、全光線穿透率及纽㈣狀,並藉由減少塗佈步 驟與硬化步驟而提升生產性,且藉由㈣因逐次塗佈所造成 的層間界面’而抑制層間干涉紋的發生,俾使密接性呈良 化,藉由在基材附近,增加與基材折射率同程度折射率的硬 塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,且密 接性優異的光學薄膜、及其製造方法。 本發明第二目的係提供:具備上述光學薄膜的偏光板。 本發明第三目的係提供:具備上述光學薄膜的顯示器。 (解決問題之手段) 本發明者等經深入鑽研,結果發現將第一組成物(其係未 含有低折射率微粒子與低折射率樹脂、或即使含有低折射率 树月曰亦疋相對於含光硬化性樹脂或熱硬化性樹脂的硬化性 樹脂質量減少至5質量%以下,且具有特定黏度)、與第二 組成物(其係含有低折射率微粒子,且具有特定黏度),從基 材侧使該第一組成物與第二組成物相鄰接並同時塗佈於基 材上、或在基材上所設置的層上,在未施行乾燥前的預烘烤 情況下便施行乾燥,接著藉由施行光照射或加熱而使硬化, 便能依高生產性獲得在Hc層的膜厚方向上,使低折射率微 粒子的存在呈HC層靠基材的對向側之界面側較多於靠基 099141183 201128216 材側’且呈越靠基材側職折料微粒子存在量越減少的分 佈’即形成從基材對向側的界面側起朝基材側呈低折射率: 粒子逐漸減少的分佈,並未形成如習知利用逐次雙層塗怖形 成低折射率層與Hc料、或如專利文獻2利用同時塗伟形 成時會出現的明確層界面,且具有抗反射機能,並在維持霧 值、全光線穿透率及減斑面狀的情況下H肖除因逐次 塗佈所產生的層間界面,便抑制層間的干涉紋發生,使密接 性呈良化,藉由在基材附近,增加與基材折射率同程度折射 率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發 生’且密接性優異的光學薄膜,遂完成本發明。 *即’本發明的光學薄膜之製造方法,係包括有:⑴準備光 穿透性基材的步驟;(ii)準備第—硬塗層用硬化性樹脂組成 物與第二硬塗層用硬化性樹脂組成物的步驟,該第一硬塗 層用硬化性樹脂組成物係含有具反應性之第—樹脂及第一 ♦劑’且未含有低折射率㈣?與低折料獅、或即使含 有低折射率樹脂亦是相對於該第—樹脂質量在5 G質量%以 下’黏度/XI為3mPa· s以上;該第二硬塗層用硬化性樹脂 組成物係含有從平均粒徑1G〜·細的低折射率微粒子及低 折射率樹賴構成群財選擇丨独上的骑射率成分、 以及具反應性的第二樹脂與第二溶劑,黏度μ2為5悉· s 、 且該⑹扣減掉5亥Ml的值係在30mPa · s以下;(出) 在該光穿透性基材一面侧,從該光穿透性基材側,至少使該 099141183 7 201128216 第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹 脂組成物相鄰接並施行同時塗佈,而形成塗膜的步驟;以及 (iv)使依上述(iii)步驟所獲得塗膜乾燥,接著施行光照射及/ 或加熱而使硬化的步驟;且在該(m)步驟與該(iv)步驟間並 未施行預烘烤。 將未含有低折射率微粒子與低折射率樹脂、或即使含有低 折射率樹脂亦是相對於第一樹脂質量減少至5.0質量%以 下’並具有上述特定黏度的第一 HC層用硬化性樹脂組成物 (以下簡稱「第一組成物」),以及含有從低折射率微粒子及 低折射率樹脂所構成群組中選擇1種以上的低折射率成 分’並具有上述特定黏度的第二HC層用硬化性樹脂組成物 (以下簡稱「第二組成物」),.從光穿透性基材側依使第一組 成物及第二組成物呈相鄰接位置狀態施行同時雙層塗佈,而 形成HC層且未施行預烘烤,藉此便使第二組成物中所含的 低折射率成分在HC層的膜厚方向上,存在呈11(:層靠光穿 透性基材的對向側之界面側較多於靠光穿透性基材侧,且形 成越靠光穿透性基材侧則低折射率成分存在量越減少的分 佈,呈從靠光穿透性基材的對向側之界面起朝光穿透性基材 側,該低折射率成分逐漸減少,便可獲得經抑制HC層内因 低折射率成分與HC層的樹脂間之折射率差所造成干涉紋 發生、以及HC層與基材之界面的干涉紋發生,且檢視性優 異的光學薄膜。 099141183 8 201128216 又’因為在未施行預烘烤的情況下便使塗膜乾燥,接著施 行光’、、、射或加熱而使塗膜硬化,因而相較於施行預烘烤而使 硬化的情況下’提高HC層、與光穿透性基材及HC層靠光 穿透f生基材側所鄰接層間之密接性。本發明中所謂「預烘烤」 係指未使塗膜進行正式硬化的光照射及/或加熱。又,所謂 「塗膜正式硬化」係指使塗膜乾燥而減少塗膜中的溶劑,經 硬化塗膜依JIS K5600-5-4(1999)所規定的鉛筆硬度試驗 (4.9Ν荷重),顯現出「η」以上硬度的硬化。 本發明光學薄膜之製造方法的較佳實施態樣,亦可獲得下 述光學薄膜,其在上述(iii)步驟中,將第一硬塗層用硬化性 樹脂組成物的塗膜潤濕膜厚設為T1,並將第二硬塗層用硬 化性樹脂組成物的塗膜潤濕膜厚設為T2時,藉由將T2除 以Τ1的值(即Τ2/Τ1)設為0.01〜1,便在硬塗層的膜厚方向 上,低折射率成分存在呈HC層靠光穿透性基材的對向側之 界面側較多於靠光穿透性基材側,且呈越靠光穿透性基材側 則低折射率成分存在量越減少的分佈,呈從靠光穿透性基材 的對向側之界面朝靠光穿透性基材側,該低折射率成分逐漸 減少,且在硬塗層的膜厚方向上,在從上述靠光穿透性基材 的對向側之界面起至達上述硬塗層乾燥膜厚7〇%為止的區 域中’存在有上述低折射率成分總量的7〇〜1〇〇%之分佈。 藉由形成此種低折射率成分的分佈,即便低折射率成分的 含有量減少,仍可充分顯現出光學薄膜的抗反射性能。 099141183 9 201128216 另外,在HC層膜厚方向上的低折射率微粒子分佈,係可 利用HC層膜厚方向截面的TEM(穿透型電子顯微鏡)照片進 行觀察》 HC層膜厚方向上的低折射率樹脂分佈,係例如將光學薄 膜使用熱硬化性樹脂予以包藏,再使用LEICA公司製超薄 切片機,從該經包藏的光學薄膜製作出厚80nm的超薄切 片’接著使用Ru04施行氣相染色,並利用TEM進行觀察 便可測定。 本發明光學薄膜之製造方法的較佳實施態樣,較佳係上 述第一硬塗層用硬化性樹脂組成物的黏度μΐ為3〜95mPa · s,上述第二硬塗層用硬化性樹脂組成物的黏度μ2為 5〜lOOmPa· s,因為可輕易地獲得具有上述特定低折射率成 分分佈的HC層。 本發明光學薄膜係依照上述光學薄膜之製造方法所獲得 的光學薄膜。 本發明光學薄膜的較佳實施態樣,亦可為在光穿透性基材 的一面側設有硬塗層的光學薄膜,其中,在上述硬塗層的膜 厚方向上’低折射率微粒子存在呈靠上述光穿透性基材之對 向侧的界面側較多於靠該光穿透性基材侧的狀態,且越靠該 光穿透性基材側則該低折射率微粒子的存在量越少,從該從 靠光穿透性基材的對向侧之界面朝靠光穿透性基材侧呈該 低折射率成分逐漸減少狀態,在該硬塗層内旅無層界面,在 099141183 10 201128216 §亥硬塗層對上述光穿透性基材的棋盤格密接性試驗中 ,可使 密接率成為90〜100〇/。。 此處所謂「棋盤格密接性試驗的密接率」係指在光學薄膜 罪HC層側表面上依lmm方塊劃入合計i⑻格的棋盤格, 再使用寬24mm黏貼帶(例如NIcmBAN(股)製工業用賽珞 膠帶(註冊商標))’施行5次連續剝離試驗,再根據下述基準 所計算出未剝落而殘留的方格比例。 密接率(%)=(未剝落的方格數/合計的方格數丨00) X100 本發明光學薄膜的較佳實施態樣,亦可硬塗層的膜厚方向 上’在從上述靠光穿透性基材的對向側之界面起至達上述硬 塗層乾制厚7G%為止的區財,存在有上㈣折射率微粒 子總量的70〜100%。 本發明的偏光板係在上述任一光學薄膜靠上述硬塗層的 對向之光穿透性基材側上,設有偏光片。 本發明的顯不器係在上述任一光學薄膜靠上述硬塗層的 對向之光穿透性基材側上,配置顯示面板。 (發明效果) 將第-組成物(其係未含有低折射率微粒子與低折射率樹 脂、或即使含有低折射率樹脂亦是屬上述特定量,且具有上 述特定黏度)、及第三組成物(其係含有低折射率微粒子及/201128216 VI. Description of the Invention: [Technical Field] The present invention relates to a display (image display device) such as a liquid crystal display (LCD), a cathode tube display device (CRT), or a plasma display (PDP), etc. The optical film disposed at the place, the manufacturing method thereof, and the polarizing plate and the display using the same. [Prior Art] In the display as described above, in order to improve the visibility of the display surface, it is required to reduce reflection from light irradiated from an external light source such as a fluorescent lamp or sunlight. A method of suppressing reflection of external light is known as a method of using an antireflection film in which a low refractive index layer is provided on the outermost surface of a functional layer such as a hard coat layer (for example, Patent Document 1). However, in the invention of Patent Document 1, the composition for forming a functional layer is applied, and the functional layer is formed by semi-hardening by means of free radiation, and the low refractive index layer is formed on the functional layer of the semi-hardened state. In the method of using the composition, the method of completely hardening (half-curing), and the conventional application of coating the composition on each layer of each layer, and then completely hardening the double-layer coating method, because A plurality of coating steps and hardening steps will be performed, and thus productivity is poor. In view of this, 'Patent Document 2 has a proposal: the main purpose is to provide two layers of functional layers at the same time, and to achieve high productivity, high interlayer adhesion, and no barrier to separation of functions between layers. Optical film of 099141183 4 201128216 The gas system will be coated with a layer of A and B layers of free light ray curable resin, respectively, and will be applied! After the secondary free Korean ray irradiation (prebaking), drying is performed, and then the second epilation radiation is applied to harden (the surface 彳_optical (4) manufacturing method is required. The high adhesion also requires high adhesion between the two-layer coating layer and the substrate or the substrate-side contact layer. Patent Document 2 has high adhesion between layers, and each layer is separated, but simultaneously coated. There is a layer interface between the A layer (hard coat layer or anti-glare layer) and (4) (refractive index control layer). Further, in Patent Document 1 f, an attempt is made to reduce the refractive index of the low-refractive-index layer to include a middle-sister, etc. Low-refractive-index microparticles, but purely the micro-refractive-index particles are incorporated into the low-refractive-index layer, the refractive index of the low-refractive-index layer is lowered, but the refractive index of the low-refractive-index layer is adjacent to the functional layer adjacent to the substrate side. The rate is higher than the low refractive index layer, so at the boundary (interface) between the low refractive index layer and the functional layer, the low refractive index microparticles in the low refractive index layer and the functional layer have a refractive index difference, if precise film thickness control is performed , interference patterns will occur, resulting in the use of anti-reverse In the display surface of the display of the film, there is a problem that the visibility is lowered. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-053691 [Patent Document 2] Japanese Patent Laid-Open No. 2008-250267 SUMMARY OF THE INVENTION [99] The present invention has been made to solve the above problems, and a first object of the present invention is to provide anti-reflection by performing simultaneous (four) (dual coating) Function, and maintain the duty, total light transmittance and New (four) shape, and improve the productivity by reducing the coating step and the hardening step, and suppress the interlayer interference by (4) the interlayer interface caused by successive coatings The occurrence of the grain, the adhesion is improved, and the ratio of the hard coating composition having the same refractive index as the refractive index of the substrate is increased in the vicinity of the substrate, thereby suppressing the occurrence of interference fringes between the hard coat layer and the substrate. An optical film excellent in adhesion and a method for producing the same. A second object of the present invention is to provide a polarizing plate comprising the above optical film. The third object of the present invention provides: providing the above optical film The present inventors have intensively studied and found that the first composition (which does not contain low refractive index fine particles and low refractive index resin, or even contains a low refractive index tree) The curable resin having a photocurable resin or a thermosetting resin is reduced in mass to 5% by mass or less, and has a specific viscosity, and the second composition (which contains low refractive index fine particles and has a specific viscosity), The first composition is adjacent to the second composition from the side of the substrate and simultaneously coated on the substrate or on the layer provided on the substrate, without pre-baking before drying. Drying is carried out, and then hardening is performed by light irradiation or heating, and the film thickness direction of the Hc layer can be obtained with high productivity, so that the presence of the low refractive index microparticles is the interface of the HC layer on the opposite side of the substrate. The side is more than the base 099141183 201128216 material side 'and the more the distribution of the amount of microparticles on the substrate side is reduced, that is, the formation of a low refractive index from the interface side of the opposite side of the substrate toward the substrate side: Particles gradually decrease The distribution does not form a clear layer interface which is conventionally formed by using a double-layer coating to form a low refractive index layer and a Hc material, or when it is formed by using the same coating as in Patent Document 2, and has anti-reflection function, and In the case of maintaining the haze value, the total light transmittance, and the smear-reducing surface, H is removed from the interlayer interface caused by the successive application, thereby suppressing the occurrence of interference fringes between the layers, and the adhesion is improved by the substrate. In the vicinity, an optical film having an increase in the ratio of the hard coat composition having the same refractive index as the refractive index of the substrate and suppressing the occurrence of interference fringes between the hard coat layer and the substrate and having excellent adhesion is completed. * The method for producing an optical film of the present invention includes: (1) a step of preparing a light-transmitting substrate; (ii) preparing a hardenable resin composition for a first hard coat layer and hardening for a second hard coat layer; In the step of the resin composition, the curable resin composition for the first hard coat layer contains a reactive first resin and a first ♦ agent and does not contain a low refractive index (four)? And a low-replication lion, or a low-refractive-index resin, is 5 G mass% or less with respect to the mass of the first resin, and the viscosity/XI is 3 mPa·s or more; the curable resin composition for the second hard coat layer The composition includes a low refractive index microparticle having an average particle diameter of 1 G to a fine refractive index and a low refractive index tree, and a second emissivity component and a second solvent having a reactivity, wherein the viscosity μ2 is 5, s, and (6) deducting the value of 5 hai Ml is below 30 mPa · s; (out) on the side of the light-transmitting substrate, from the side of the light-transmitting substrate, at least 099141183 7 201128216 The first hard coat layer hardenable resin composition and the second hard coat layer hardenable resin composition are adjacent to each other and are simultaneously coated to form a coating film; and (iv) is made as described above ( Iii) a step of drying the coating film obtained by the step, followed by light irradiation and/or heating to effect hardening; and pre-baking is not performed between the (m) step and the (iv) step. The first HC layer is made of a curable resin which does not contain the low refractive index fine particles and the low refractive index resin, or the low refractive index resin is reduced to 5.0 mass% or less with respect to the first resin mass and has the above specific viscosity. (hereinafter referred to as "first composition"), and a second HC layer containing one or more kinds of low refractive index components selected from the group consisting of low refractive index fine particles and low refractive index resins and having the above specific viscosity The curable resin composition (hereinafter referred to as "second composition") is subjected to double-layer coating while the first composition and the second composition are in the adjacent position from the side of the light-transmitting substrate. The HC layer is formed and pre-baking is not performed, whereby the low refractive index component contained in the second composition is present in the film thickness direction of the HC layer, and there is a pair of layers (the layer is light-transmitting substrate). The interface side on the side is more on the side of the light-transmitting substrate, and the side of the light-transmissive substrate is formed so that the amount of the low-refractive-index component decreases, and the light-transmissive substrate is formed. Opposite side interface toward the light transmissive substrate side When the low refractive index component is gradually decreased, interference grain generation due to a difference in refractive index between the low refractive index component and the resin of the HC layer in the HC layer, and interference fringes at the interface between the HC layer and the substrate can be obtained, and Optical film with excellent visibility. 099141183 8 201128216 And 'Because the coating film is dried without pre-baking, and then the light is applied, and the coating film is hardened, the coating film is hardened. In the case of curing and curing, the adhesion between the HC layer and the light-transmitting substrate and the HC layer by the light-transmitting substrate adjacent to the substrate side is improved. The term "pre-baking" in the present invention means Light irradiation and/or heating in which the coating film is not substantially hardened. The term "substantial curing of the coating film" means drying the coating film to reduce the solvent in the coating film, and the cured coating film is in accordance with JIS K5600-5-4 (1999). The predetermined pencil hardness test (4.9 Ν load) exhibits a hardness of "η" or more. In a preferred embodiment of the method for producing an optical film of the present invention, the following optical film can also be obtained, which is in the above (iii) In the step, the first hard coat When the coating film wetting film thickness of the curable resin composition is T1 and the coating film wetting thickness of the second hard coat layer curable resin composition is T2, by dividing T2 by Τ1 When the value (that is, Τ2/Τ1) is 0.01 to 1, the low refractive index component is present on the interface side of the opposite side of the light-transmitting substrate of the HC layer in the film thickness direction of the hard coat layer. On the light-transmissive substrate side, the amount of the low-refractive-index component decreases as the light-transmissive substrate side passes, and the light-penetrating substrate is placed on the opposite side of the light-transmitting substrate toward the light. On the side of the transparent substrate, the low refractive index component is gradually reduced, and in the film thickness direction of the hard coat layer, from the interface from the opposite side of the light transmissive substrate to the hard coat dry film In the region up to 7〇% thick, there is a distribution of 7〇~1〇〇% of the total amount of the low refractive index component. By forming the distribution of such a low refractive index component, the antireflection performance of the optical film can be sufficiently exhibited even if the content of the low refractive index component is reduced. 099141183 9 201128216 In addition, the distribution of low-refractive-index microparticles in the film thickness direction of the HC layer can be observed by TEM (transmission electron microscope) photograph of the cross section of the HC layer in the thickness direction. For the resin distribution, for example, an optical film is occluded with a thermosetting resin, and an ultrathin slice having a thickness of 80 nm is produced from the occluded optical film using an ultrathin slicer manufactured by LEICA Corporation, followed by gas phase dyeing using Ru04. And can be measured by observation using TEM. In a preferred embodiment of the method for producing an optical film of the present invention, it is preferred that the first hard coat layer has a viscosity μΐ of from 3 to 95 mPa·s, and the second hard coat layer is made of a curable resin. The viscosity μ2 of the object is 5 to 100 mPa·s because the HC layer having the specific low refractive index component distribution described above can be easily obtained. The optical film of the present invention is an optical film obtained by the above-described method for producing an optical film. In a preferred embodiment of the optical film of the present invention, an optical film having a hard coat layer on one side of the light-transmitting substrate may be used, wherein the low-refractive-index microparticles in the film thickness direction of the hard coat layer There is a state in which the interface side on the opposite side of the light-transmitting substrate is more on the side of the light-transmitting substrate, and the side of the light-permeable substrate is on the side of the light-permeable substrate. The less the amount is present, from the interface from the opposite side of the light-transmitting substrate toward the side of the light-permeable substrate, the low-refractive-index component is gradually reduced, and the layer has no layer interface in the hard coating layer. In 099141183 10 201128216 § Hai hard coating in the checkerboard adhesion test of the above light penetrating substrate, the adhesion rate can be made 90~100 〇 /. . Here, the "adhesive ratio of the checkerboard adhesion test" refers to a checkerboard in which the total i (8) grid is divided by 1 mm square on the side surface of the HC film of the optical film, and a 24 mm wide adhesive tape (for example, the NIcmBAN (stock) industry) is used. Five consecutive peeling tests were carried out using Celluloid Tape (registered trademark), and the percentage of the squares remaining without peeling was calculated according to the following criteria. Bonding ratio (%) = (number of squares not peeled off / total number of squares 丨 00) X100 The preferred embodiment of the optical film of the present invention may also be in the film thickness direction of the hard coat layer The interface between the opposite sides of the penetrating substrate is up to 7 G% of the dry thickness of the hard coat layer, and 70 to 100% of the total amount of the upper (four) refractive index particles is present. The polarizing plate of the present invention is provided with a polarizer on the side of the light-transmitting substrate opposite to the hard coat layer of any of the above optical films. The display device of the present invention is characterized in that the display panel is disposed on the side of the light-transmissive substrate on which the optical film is opposed to the hard coat layer. (Effect of the Invention) The first composition (which does not contain the low refractive index fine particles and the low refractive index resin, or the above specific amount even if the low refractive index resin is contained, and has the above specific viscosity), and the third composition (It contains low refractive index particles and /

或低折射率樹脂’並具有上述特定黏度),從光穿透性基材 側依使第-組成物及第二組成物呈相鄰接位置狀態施㈣ 099141183 11 S 201128216 時塗佈,在未施行預烘烤的情況下使塗膜乾燥,接著再施行 光照射或加熱而形成HC層,藉此便可獲得第二組成物中所 含的低折射率微粒子及/或低折射率樹脂,纟HC層的膜厚 方向上’存在呈此層靠光穿透性基材的對向側之界面側較 多於靠光穿透性基㈣,呈越靠光穿透性基材_其存在量 越f少的分佈,且形成從靠光穿透性基材的對向侧之界面起 朝靠光穿透性基材側呈該低折射率成分逐_少的分佈,並 且具有抗反射機能,並在維持霧值、全料穿透率及無紋斑 面狀的情況下’藉由減少塗佈步驟與硬化步驟而提升生產 性’且藉由消除因逐次塗佈所產生的層間界面,便抑制層間 的干涉紋發生,使密接性呈良化,# θ ==射率同程度折射率的硬塗組成物比;,而抑制=層與 _材_干涉紋發生,且密紐優異的光學薄膜。 【實施方式】 、 明以::首先,針對本發明的先學薄膜之製造方法進行說 月,接考再針對該光學薄膜進行說明。 飞 本發明中,(曱基)丙烯酸酯係指 。 内机岐㈤甲基丙_ 再者,本發明的光係不僅侷限於可 電磁波,尚涵蓋諸如電子射線之_ 可見區域波長的 與粒子射線线稱賊祕㈣、錢電磁波 本發明中,在無特別聲明的前提下,所謂「膜厚」係指乾 099141183 1 Λ 201128216 燥叫·的膜厚(乾燥膜厚)。 本么明中,所謂「硬塗層」係指依照JIS 1(5600-5-4(1999) 所規定的紐筆硬度試驗(4.9N荷重),達ΓΗ」以上的硬度。 另外,薄膜與薄片在JIS-K6900的定義中,所謂「薄片」 係心UI I其厚度相對於長度與寬度呈較小的扁平製 口口所:、薄膜」係指相較於長度及寬度之下,厚度屬於極 小,而最大厚度則為任意限定的薄扁平製品,通例係依捲筒 /式,應戶斤以’ 4片中就厚度特別薄者亦可稱之為薄膜, 口為薄片與薄膜的界線並無H易明確區分,因而本發 明將涵蓋厚度較厚者及較薄者等二者的涵義定㈣「薄膜」。 本發明中所謂「樹脂」係除單體、寡聚物之外,尚涵蓋聚 合物的概念,在經硬化後會成為HC層或其 的成分。 本發明中,所謂「分子量」係指當具分子量分佈的情況, 在而溶劑中利用凝膠滲透色層分析儀(啊)所測得聚苯 乙烯換异值的重量平均分子量’ t無具分子量分佈的情況, 便指化合物本身的分子量。 本發明中,所謂「低折射率微粒子的平均粒徑」係指當組 成物的微粒子情況,依動態光散射方法測定溶液巾的粒子, 並依累積分佈表示含一次粒徑及二次粒徑的粒徑分佈時之 50%粒徑(d财間粒徑),可使用日機裂(股)製·她扣粒 度分析計進行測定。當Hc層中的微粒子情况,便指 099141183 13 201128216 截面利用TEM照片所觀察難子2G個的平均值。 (光學薄膜之製造方法) 本發明的光學薄膜之製造方法,其雜在於包括有:⑴ 準備光穿透性基材的步驟;⑻準備第_硬塗層用硬化性樹 脂組成物與第二硬塗層用硬化性樹脂組成物的步驟,該第 -硬塗層用硬化性樹脂組成物係含有具反應性之第一樹脂 及第-溶劑,且未含有低折射率微粒子與低折射率樹脂、或 即使含有低折射率樹脂亦是相對於該第―樹脂質量在5.〇質 量%以下,黏度μΐ為3mpa · s以上;該第二硬塗層用硬化 性樹脂組成物係含有從平均粒徑1〇〜3〇〇11111的低折射率微粒 子及低折射率樹脂所構成群組中選擇丨種以上的低折射率 成分、以及具反應性的第二樹脂與第二溶劑,黏度从2為 5mPa· s以上’且該μ2扣減掉該…的值係在3〇1^.8以 下,(iii)在5亥光穿透性基材一面側,從該光穿透性基材側, 至少使該第一硬塗層用硬化性樹脂組成物與第二硬塗層用 硬化性樹脂組成物相鄰接並施行同時塗佈,而形成塗膜的 步驟;以及(IV)使依上述(也)步驟所獲得塗膜乾燥,接著施 行光照射及/或加熱而使硬化的步驟;且在該(出)步驟與該(iv) 步驟間並未施行預烘烤。 圖1所示係依照本發明之製造方法所獲得光學薄膜的HC 層中’低折射率微粒子分佈一例的截面示意圖。 光學薄膜1係在光穿透性基材10之一面侧上設置HC層 599141183 14 201128216 20’而HC層中,低折射率微粒子3〇係存在呈此層靠光 穿透性基材的對向側之界面側較多於靠光穿透性基材側狀 態,且越靠光穿透性基材_存在量越少的分佈,即,具有 從罪光穿透性基材的對向側之界面朝靠光穿透性基材側,呈 5亥低折射率成分逐漸減少的分佈。 圖2所耗習知依照逐次雙層㈣方式卿成抗反射膜 的低折射率層中,低折射率微粒子分佈—例的截面示意圖。 抗反射膜100係在光穿透性基材1〇的一面側,從光穿透 性基材側設置此層11G及低折射率層⑽,在低折射率層 内的低折射率微粒子30呈均勻分佈,因為經使Hc層完全 硬化而形成後,才形成低折射率層,因而低折射率微粒子並 非在HC層内,在低折射率層與HC層的界面處會有折射率 差變大,導致會產生干涉紋。又,HC層與低折射率層的界 面亦可明確的分辨出。且,若與圖丨的低折射率微粒子所存 在區域之厚度,為相同程度膜厚之較厚低折射率層係由習知 抗反射膜形成,便會發生干涉紋。 依此的話’習知逐次雙層塗佈方式中,若形成與依照本發 明塗饰方法賴得低折射率微粒子分佈的厚度,為相同程度 厚度之上層(低折射率層)’則在成為下層的組成物之硬化部 分、與成為上層的組成物之硬化部分便會有界面產生,而該 界面部分的上層組成物十所含低折射率微粒子、與下層組成 物中所含樹脂的折射率差較大,導致出現干涉紋。 099141183 15 201128216 相對於此,本發明光學薄膜之製造方法中,將第一組成物 (其係未含有低折射率微粒子與低折射率樹脂、或即使含有 低折射率樹脂亦是相對於第一樹脂質量在5 〇質量%以下, 且具有上述特定黏度)、及第二組成物(其係含有低折射率成 分,並具有上述特定黏度),從光穿透性基材側依使第一組 成物及第二組成物呈相鄰接位置狀態進行同時塗佈,而形成 HC層,且藉由未施行預烘烤,便如圖丨所示,第二組成物 中所含的低折射率成分在Hc層的膜厚方向上,存在呈HC 層#光穿透性基材的對向側之界面側較多於靠光穿透性基 材側,且越靠光穿透性基材側則低折射率微粒子存在量越減 少的分佈,即,形成從光穿透性基材的對向側之界面側起朝 光穿透性基材側,呈低折射率成分逐漸減少的分佈,而抑制 HC層内因低折射率成分與HC層的樹脂間之折射率差所造 成的干涉紋發生、以及抑制HC層與基材間之界面處發生干 涉紋,可獲得檢視性優異,且在H(:層、與光穿透性基材或 光穿透性基材側所鄰接層間之密接性優異的光學薄膜。 再者,因為無必要施行預烘烤,因而相較於施行預烘烤與 正式硬化4 2度光照射才使硬化的情況下,生產性亦屬優 異。 另外’當在光穿透性基材上利用同時塗佈形成含有低折射 率成分之低折射率微粒子的HC層時,該HC層與該光穿透 性基材間之密接性良好的理由雖尚未明確,但可推測如下理 099141183 16 201128216 由。即,若第一組成物中所含的樹脂接 則該樹脂會渗透於光穿透性基材中,並產生化 == 物 理性結合’因而推測會提升H c層與光穿透性基材間之密接 、性。相對於此’當HC層中所含低折射率微粒子並未形成如 •上述般越靠光穿透性基材_存在量越減少的分佈,而使在 HC層中呈均勻分散時’在Hc層中靠光穿透性基材側的界 面處,僅有低折射率微粒子所佔據部分會有因樹脂渗透而不 發生樹脂與基材間之化學性及/或物理性結合情形,推測密 接性並未獲提高。 再者,若在光穿透性基材上剛將第—組成物與第二組成物 施行同時塗佈後’便施行預烘烤,則在溶劑存在下,於樹脂 f透入光穿透性基材之前便會開始進行聚合或交聯,導致樹 月曰的分子㈣大,樹脂便不會參透人光穿透性基材中,即便 經乾燥後再施行光照射或加熱,推測密接性仍未獲提高。 由該等現象推測,在光穿透性基材上將第一組成物與第二 組成物施行同時塗佈,而形成上述具特定低折射率微粒子分 佈的本發明HC層時’會成為對光穿透性基材的密接性屬優 異者。 圖3所示係本發明的光學薄膜之製造方法中,將第一及第 二HC層用硬化性樹脂組成物施行同時塗佈的步驟—例之 示意圖。 在光穿透性基材1〇上,從楔具塗佈機頭40的狹縫51及 099141183 17 201128216 5 2分別將第—硬塗層用硬化性樹脂組成物6 q及第二硬塗層 用硬化性樹脂組成物70,依第-硬塗層用硬化㈣脂組^ 物位於光穿透性基材側上的方式,呈相鄰接施行同時雙層塗 佈’便形成第-硬塗層用硬化性樹脂組成物的塗膜Μ、及 第二硬塗層用硬化性樹脂組成物的塗膜71。另外,圖3中, 第一硬塗層用硬化性樹脂組成物與第二硬塗層用硬化性樹 脂組成物係原本呈-體而形成硬㈣,但為求說明簡化,便 將s亥二種組成物與其塗膜分開顏色圖示。 以下,針對在⑴及(ii)步驟中所準備的光穿透性基材、第 一組成物、及第二組成物進行說明。 (光穿透性基材) 本發明的光穿透性基材係在滿足能使用為光學薄膜之光 穿透性基材的物性前提下,其餘並無特別的限制,可適當選 擇使用習知公知在硬塗薄膜或光學薄膜中所採用的三醋酸 纖維素、聚對苯二曱酸乙二酯、或環烯烴聚合物等。 可見光域380〜780nm中的光穿透性基材之平均光穿透 率’較佳係50%以上、更佳係70%以上、特佳係85%以上。 另外,光穿透率的測定係使用紫外可見分光光度計(例如島 津製作所(股)製UV-3100PC),採在室溫、大氣中所測得的 值。 再者’亦可對光穿透性基材施行皂化處理、或設置底漆詹 等表面處理。又’在光穿透性基材中亦可添加諸如抗靜電劑 099141183 18 201128216 等添加劑。 光穿透性基材的厚度並無特別的限制,通常係 20/xm〜300/mi 左右,較佳係 4〇/mi〜2〇〇gm。 (第一硬塗層用硬化性樹脂組成物) 第-硬塗層用硬化性樹脂組成物係含有具反應性的第一 樹脂及第-㈣’且未含有減射率微粒子與低折射率樹脂 、或即使含有低折射率樹脂亦是相對於該第一樹脂質量在 5.0質量%以下,黏度μ1為5mpa · s以上。 第一組成物係未含有低折射率微粒子與低折射率樹脂、或 即使含有低折射率樹脂亦是相對於該第-樹脂的質量在5〇 質星X下並具有上述特定黏度,而後述第二組成物係含 有低折射率成分’並具有特定黏度,且依第—組成物較第二 組成物位於更靠光穿透性基材側的方式,藉由使該二種組成 物相鄰接進行同時塗佈,並在使第—組成物與第二組成物進 行硬化而形成Hc層時,HC層的膜厚方向上,從光穿透性 基材的對向側之界面顺減穿透性基材織低折射率成 分逐漸減少的分佈’當低折射率成分係低折射率微粒子的情 况便如圖1所示的低折射率微粒子分佈。 々、、成物的黏度μΐ係就從適度抑制後述在與第二組成 =之混合的觀點,較佳為油· s以上、更佳為i〇mpa · 、 x黏度係就從提兩塗佈性的觀點,較佳為 95mPa · S ^下、更佳為5QlJlPa · s以下、特佳為3GmPa · s 099141183 19 201128216 以下。又’第二組成物的黏度μ2減掉μ1的值(以下亦簡稱 「黏度差」)係在30mPa · s以下。黏度差係就從抑制混合冉 與所形成面狀的觀點,較佳係15mpa 口 以下、更佳係Or a low refractive index resin 'having the above specific viscosity), and coating the first composition and the second composition from the side of the light transmissive substrate in the state of adjacent position (4) 099141183 11 S 201128216 In the case of prebaking, the coating film is dried, and then light irradiation or heating is performed to form an HC layer, whereby low refractive index fine particles and/or low refractive index resin contained in the second composition can be obtained. In the film thickness direction of the HC layer, the interface side of the opposite side of the light-transmitting substrate is more than the light-transmitting substrate (four), and the light-transmissive substrate is present. a distribution with less f, and a distribution from the interface on the opposite side of the light-transmitting substrate toward the light-transmissive substrate side, and having an anti-reflection function, And by maintaining the haze value, the total material penetration rate, and the non-stained surface shape, 'improving productivity by reducing the coating step and the hardening step' and suppressing by eliminating the interlayer interface caused by successive coating The interference pattern between the layers occurs, so that the adhesion is favorable, # θ == the same rate of incidence Hard coating composition reflectance ratio; while suppressing interference with _ = _ material layer pattern occurs, and an optical film excellent in adhesion York. [Embodiment] It is to be noted that: First, the method for producing a precursor film of the present invention will be described, and the optical film will be described later. In the present invention, (fluorenyl) acrylate means. Internal machine 五 (5) methyl propyl _ Furthermore, the optical system of the present invention is not limited to electromagnetic waves, and covers such as the wavelength of the visible region of the electron ray and the particle ray line called the thief secret (four), the money electromagnetic wave in the present invention, in the absence Under the premise of special statement, the term "film thickness" refers to the film thickness (dry film thickness) of dry 099141183 1 Λ 201128216. In the present disclosure, the term "hard-coating" means a hardness of not less than 5% according to the pen hardness test (4.9 N load) prescribed in JIS 1 (5600-5-4 (1999). In addition, film and sheet In the definition of JIS-K6900, the so-called "slice" core UI I has a flat mouth with a thickness that is small relative to the length and width: "film" means that the thickness is minimal compared to the length and width. The maximum thickness is an arbitrarily defined thin flat product. The general method is according to the reel type. The thickness of the film is particularly thin, and the thickness of the film is not the boundary between the film and the film. H is clearly distinguishable, and thus the present invention will cover the meaning of both thicker and thinner (4) "films". The term "resin" in the present invention encompasses polymerization in addition to monomers and oligomers. The concept of the substance becomes a HC layer or a component thereof after being hardened. In the present invention, the term "molecular weight" means a case where a molecular weight distribution is used, and a gel permeation chromatography layer (ah) is used in a solvent. The weight average molecular weight of the polystyrene exchange value is measured. In the case of the distribution of the sub-quantity, the molecular weight of the compound itself is used. In the present invention, the "average particle diameter of the low-refractive-index microparticles" means that the particles of the solution towel are measured by a dynamic light scattering method in the case of the microparticles of the composition. The cumulative distribution indicates a 50% particle diameter (d grain size) when the particle size distribution of the primary particle diameter and the secondary particle diameter is included, and can be measured by using a Japanese machine crack (strand) system and a particle size analyzer. In the case of the fine particles in the layer, the average value of the 2G pieces of the hard film observed by the TEM photograph of 099141183 13 201128216 is used. (Manufacturing method of optical film) The manufacturing method of the optical film of the present invention includes: (1) Preparation light (8) a step of preparing a curable resin composition for a first hard coat layer and a curable resin composition for a second hard coat layer, wherein the curable resin composition for the first hard coat layer contains Reactive first resin and first solvent, and not containing low refractive index fine particles and low refractive index resin, or even containing low refractive index resin, relative to the first resin mass of 5. 〇 mass% The viscosity μΐ is 3 mPa·s or more; the curable resin composition for the second hard coat layer contains a group of low refractive index fine particles and a low refractive index resin having an average particle diameter of 1 〇 to 3 〇〇 11111. Selecting a low refractive index component or more and a reactive second resin and a second solvent, the viscosity is from 2 to 5 mPa·s or more 'and the value of the μ2 deducting the value is 3〇1^.8 In the following, (iii) at least one side of the light-transmitting substrate on the side of the light-transmitting substrate, the curable resin composition for the first hard coat layer and the second hard coat layer are cured. a step of forming a coating film adjacent to and applying the resin composition; and (IV) a step of drying the coating film obtained by the above (the) step, followed by performing light irradiation and/or heating; And pre-baking is not performed between the (out) step and the (iv) step. Fig. 1 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in the HC layer of the optical film obtained by the production method of the present invention. The optical film 1 is provided with an HC layer 599141183 14 201128216 20' on one side of the light-transmitting substrate 10, and in the HC layer, the low-refractive-index fine particles 3 are present in the opposite direction of the light-transmitting substrate. The interface side of the side is more in the state of the light-transmitting substrate side, and the lighter penetrating substrate _ is present in a smaller amount, that is, having a side opposite to the sin-transmitting substrate. The interface faces the light-transmissive substrate side, and has a distribution in which the low refractive index component is gradually reduced. Fig. 2 is a schematic cross-sectional view showing the distribution of low refractive index fine particles in the low refractive index layer of the antireflection film in accordance with the sequential two-layer (four) method. The anti-reflection film 100 is disposed on one surface side of the light-transmitting substrate 1A, and the layer 11G and the low-refractive-index layer (10) are provided from the side of the light-transmitting substrate, and the low-refractive-index particles 30 in the low-refractive-index layer are Evenly distributed, since the low refractive index layer is formed after the Hc layer is completely hardened, the low refractive index fine particles are not in the HC layer, and the refractive index difference becomes large at the interface between the low refractive index layer and the HC layer. , resulting in interference patterns. Further, the interface between the HC layer and the low refractive index layer can be clearly distinguished. Further, if the thickness of the region in which the low-refractive-index particles of Fig. 所 are present, and the thicker low-refractive-index layer having the same film thickness is formed of a conventional anti-reflection film, interference fringes occur. According to this, in the conventional double-layer coating method, if the thickness of the low-refractive-index particle distribution is determined in accordance with the coating method according to the present invention, the layer (low-refractive-index layer) of the same thickness is formed as the lower layer. The hardened portion of the composition has an interface with the hardened portion of the composition that becomes the upper layer, and the upper layer composition of the interface portion contains the refractive index difference between the low refractive index fine particles and the resin contained in the lower layer composition. Larger, resulting in interference patterns. 099141183 15 201128216 In contrast, in the method for producing an optical film of the present invention, the first composition (which does not contain low refractive index fine particles and low refractive index resin, or even contains a low refractive index resin is relative to the first resin) The mass is 5 〇 mass% or less, and has the above specific viscosity), and the second composition (which contains a low refractive index component and has the above specific viscosity), and the first composition is made from the side of the light transmissive substrate And the second composition is simultaneously coated in an adjacent position state to form an HC layer, and by performing prebaking, as shown in FIG. 2, the low refractive index component contained in the second composition is In the film thickness direction of the Hc layer, the interface side on the opposite side of the HC layer # light-transmitting substrate is more on the side of the light-transmitting substrate, and the side closer to the light-transmitting substrate is lower. The distribution in which the amount of the refractive index fine particles is decreased, that is, the distribution from the interface side on the opposite side of the light-transmitting substrate toward the light-transmitting substrate side, the distribution of the low refractive index component is gradually decreased, and the HC is suppressed. In the layer due to the low refractive index component and the resin of the HC layer Interference fringes caused by the difference in refractive index and suppression of interference fringes at the interface between the HC layer and the substrate, excellent visibility, and H (: layer, light transmissive substrate or light penetration) An optical film having excellent adhesion between adjacent layers on the side of the substrate. Further, since it is not necessary to perform prebaking, it is produced in comparison to the case where prebaking and formal hardening of 42 degrees of light irradiation are performed to cause hardening. It is also excellent. In addition, when an HC layer containing low refractive index fine particles having a low refractive index component is simultaneously coated on a light-transmissive substrate, the adhesion between the HC layer and the light-transmitting substrate is Although the reason for goodness is not clear, it can be presumed that the following is 091411183 16 201128216. That is, if the resin contained in the first composition is joined, the resin will penetrate into the light-transmitting substrate and be produced == The physical combination 'is therefore supposed to improve the adhesion between the H c layer and the light-transmitting substrate. Relative to this, when the low-refractive-index particles contained in the HC layer are not formed, the light penetrates as above. Substrate _ the presence of a reduced amount of distribution, When uniformly dispersed in the HC layer, 'at the interface of the Hc layer on the side of the light-transmitting substrate, only the portion occupied by the low-refractive-index particles may be infiltrated by the resin without chemical chemistry between the resin and the substrate. And/or physical bonding, it is presumed that the adhesion is not improved. Further, if the first composition and the second composition are applied simultaneously on the light-transmitting substrate, the pre-baking is performed. Then, in the presence of a solvent, the resin f starts to undergo polymerization or cross-linking before it penetrates into the light-transmitting substrate, resulting in a large (4) molecule of the tree, and the resin is not penetrated into the human light-permeable substrate. Even if it is dried and then subjected to light irradiation or heating, it is presumed that the adhesion is not improved. It is presumed that the first composition and the second composition are simultaneously coated on the light-transmitting substrate. When the HC layer of the present invention having a specific low refractive index fine particle distribution is formed, it is excellent in adhesion to a light-transmitting substrate. Fig. 3 is a schematic view showing a step of performing simultaneous coating of the first and second HC layer curable resin compositions in the method for producing an optical film of the present invention. The curable resin composition 6 q and the second hard coat layer for the first hard coat layer are respectively applied to the slit 51 of the wedge coating head 40 and 099141183 17 201128216 5 2 on the light-transmitting substrate 1A. The hardenable resin composition 70 is formed by applying a double-layer coating to form a first-hard coating layer in such a manner that the hardened (four) lipid composition for the first-hard coat layer is located on the side of the light-transmitting substrate. A coating film 71 of a curable resin composition for a layer and a coating film 71 of a curable resin composition for a second hard coat layer. In addition, in FIG. 3, the curable resin composition for the first hard coat layer and the curable resin composition for the second hard coat layer are originally formed into a body to form a hard (four), but for simplification of description, The composition is separated from its coating film by a color diagram. Hereinafter, the light-transmitting substrate, the first composition, and the second composition prepared in the steps (1) and (ii) will be described. (Light-transmitting substrate) The light-transmitting substrate of the present invention is not particularly limited as long as it satisfies the physical properties of the light-transmitting substrate which can be used as an optical film, and can be appropriately selected and used. A cellulose triacetate, a polyethylene terephthalate or a cycloolefin polymer used in a hard coat film or an optical film is known. The average light transmittance ' of the light-transmitting substrate in the visible light region of 380 to 780 nm is preferably 50% or more, more preferably 70% or more, and particularly preferably 85% or more. Further, the measurement of the light transmittance is carried out by using an ultraviolet-visible spectrophotometer (for example, UV-3100PC manufactured by Shimadzu Corporation) at a temperature measured at room temperature or in the atmosphere. Further, the light-transmitting substrate may be subjected to a saponification treatment or a surface treatment such as a primer. Further, an additive such as an antistatic agent 099141183 18 201128216 may be added to the light penetrating substrate. The thickness of the light-transmitting substrate is not particularly limited, but is usually about 20/xm to 300/mi, preferably 4 〇/mi to 2 〇〇 gm. (The curable resin composition for the first hard coat layer) The curable resin composition for the first hard coat layer contains the reactive first resin and the -(iv)' and does not contain the subtractive particle and the low refractive index resin. Or even if the resin containing a low refractive index is 5.0 mass % or less with respect to the mass of the first resin, the viscosity μ1 is 5 mPa · s or more. The first composition does not contain low-refractive-index fine particles and a low-refractive-index resin, or even contains a low-refractive-index resin, and has a specific viscosity as described above with respect to the mass of the first-resin, and is described later. The two compositions contain a low refractive index component and have a specific viscosity, and the two components are adjacent to each other in a manner that the second composition is located closer to the side of the light transmissive substrate than the second composition. Simultaneous coating, and when the first composition and the second composition are hardened to form the Hc layer, the interface of the opposite direction from the opposite side of the light-transmitting substrate is penetrated in the film thickness direction of the HC layer. The distribution of the low refractive index component of the substrate is gradually reduced. When the low refractive index component is a low refractive index microparticle, the low refractive index microparticle distribution as shown in FIG. 1 is obtained. From the viewpoint of moderately suppressing the mixing with the second composition =, it is preferable that the viscosity of the yttrium and the sputum is from the viewpoint of mixing with the second composition =, preferably oil s or more, more preferably i 〇 mpa · , and x viscosity is extracted from the two coatings. The viewpoint of the property is preferably 95 mPa · S ^ , more preferably 5 Ql JlPa · s or less, and particularly preferably 3 GmPa · s 099141183 19 201128216 or less. Further, the viscosity μ2 of the second composition minus the value of μ1 (hereinafter also referred to as "viscosity difference") is 30 mPa·s or less. The viscosity difference is preferably from 15 mpm or less, from the viewpoint of suppressing the mixing enthalpy and the formed surface.

HhnPa · s以下。又’第一組成物的黏度μ1與第二組成物的 黏度μ2 ’係就從塗佈性的觀點,較佳係大於^ 另外,第一組成物及後述第二組成物的黏度,係例如使用 Anton Paar公司製商品名MCR3〇1,並將測定夾具設: 卯5〇,依測定溫度為25°C、剪切速度為1〇〇〇〇[1/3]的條^'”', 將測定對象的組成物適量滴下於平台上便可進行測定。 第一組成物係未含有低折射率微粒子及低折射率樹脂、或 即使含有低折射率樹脂亦是相對於該第一樹脂質量在$ 〇 ^ 里/〇以下。此種低折射率成分係就從顯現出抗反射性能的觀 點,最好僅存在於HC層靠光穿透性基材的對向側之界面及 其附近部分而已。若HC層整體中的低折射率成分呈均勾存 在,並不會充分顯現出光學薄膜的抗反射性能,且亦會有無 法充分顯現出^^^層硬度的可能性。就此點而言,後述第二 組成物便具有使低折射率成分多數分佈於該界面及其附延 品或的作用。即便第一組成物中含有低折射率樹脂,但若屬 於上述量’則光學薄膜仍可獲得充分的抗反射性能。第〜級 成物中所含的低折射率樹脂量係相對於第一樹脂質量,較佳 為1質量%以下。 (第一樹脂) 099141183 201128216 第一樹脂係具反應性、經硬化便成為HC層基質的成分。 第一樹脂係具有經利用光照射或加熱’便使第一樹脂彼此 間、及與後述第二樹脂間產生聚合或交聯反應性。第一樹脂 係可為利用諸如紫外線等光照射而進行硬化的光硬化性樹 脂,亦可為利用加熱而進行硬化的熱硬化性樹脂。 當第一樹脂係光硬化性樹脂的情況,第一樹脂較佳係具有 聚合性不飽和基、更佳係具有游離輻射線硬化性不飽和基。 具體例係可舉例如:(曱基)丙烯醯基、乙烯基、烯丙基等乙 烯性不飽和鍵結及環氧基等等。. 當第一樹脂係熱硬化性樹脂的情況,第一樹脂係可舉例如 具有諸如:經基、魏基、胺基、環氧基、環氧丙基、異氣酸 酯基及烷氧基等者。 第一樹脂係就從利用交聯反應而提高HC層硬度的觀 點,較佳係1分子中具有反應性基達2個以上、更佳係具有 達3個以上。 光硬化性樹脂的第一樹脂係只要使用習知公知能成為HC 層基質的光硬化性樹脂便可,較佳係使用例如:季戊四醇三 丙烯酸酯(PETA)及二季戊四醇六丙烯酸酯(DPHA)等多官能 基單體。 熱硬化性樹脂的第一樹脂係可使用例如具環氧基之化合 物、及日本專利特開2006-106503號公報所記載的黏結劑性 環氧化合物。且,亦可使用日本專利特開2008-165041號公 099141183 21 201128216 報所記載的熱硬化性樹脂。 就從第-組成物黏度μ1車交容易調節的觀點,帛一樹脂的 分子S較佳係達500以上、更佳係大於1〇〇〇。又,就從第 一組成物黏度μΐ較容易調節的觀點,第一樹脂的分子量上 限值較佳係150000以下、更佳係5〇〇〇〇以下、特佳係2〇〇〇〇 以下。藉由將第一樹脂的分子量設定在該範圍内,便可抑制 後述第二組成物中所含的低折射率微粒子或低折射率樹 月曰,在HC層整體中呈均勻擴散情況,較容易使大多數存在 於HC層罪光穿透性基材的對向側之界面側。 分子量大於1000的樹脂,較佳係可舉例如:專利文獻i 所記載含有聚環氧烷鏈之聚合物D、或荒川化學工業(股)製 商品名BEAMSETDK卜新中村化學工業(股)製屬於1;¥硬 化型胺甲酸酯丙烯酸酯寡聚物的商品名Nh寡聚 U-15HA、以及日本合成化學工業(股)製商品名UV l7〇〇B 等。 就從抑制在HC層與基材的界面處發生干涉紋的觀點,最 好使第一樹脂中含有分子量1〇〇〇以下的樹脂。此種分子量 1000以下的樹脂’較佳係有如上述PETA或DPHA。 當第一樹脂係併用分子量1000以下的樹脂、以及除此之 外的樹脂(即分子量大於1000的樹脂)時,分子量1〇〇〇以下 的樹脂含有量係只要配合所需黏度等而適當調節便可,而分 子量1000以下的樹脂含有量相對於第一樹脂的總質量,最 099141183 22 201128216 好為50〜100質量%。 再者,就從HC層硬度的觀點,第一樹脂的分子量較佳係 5000以下。 此外,第一樹脂亦可使用例如專利文獻1所記載的黏結劑 C。該黏結劑C的市售物係有如重量平均分子量未滿 10000、且具有2以上聚合性不飽和基的胺曱酸酯丙烯酸酯 市售物,諸如:共榮公司化學(股)製商品名AH-600、AT-600、 UA-306H、UA-306T、UA-3061等;日本合成化學工業(股) 製商品名 UV-3000B、UV-3200B、UV-6300B、UV-6330B、 UV-7000B等;荒川化學工業(股)製商品名BEAMSET 500 系列(502H、504H、550B等);新中村化學工業(股)製商品 名U-6HA、UA_32P、U-324A;東亞合成(股)製商品名M_9〇5〇 等等。 第一樹脂的含有量若經適當調節後才使用便可,相對於第 一組成物的總固形份較佳為40〜90質量%、更佳為5〇〜8〇質 量%。 第一樹脂係可單獨使用1種、亦可組合使用2種以上。又, 第一樹脂係亦可與後述第二組成物中所含第二樹脂的基本 骨架、官能基種類或官能基數或分子量為相同,亦可為不同。 (第一溶劑) 第一溶劑係具有在第一組成物中,將如上述第—樹脂的固 形份予以溶解或分散而調節黏度的作用。 099141183 23 201128216 第一溶劑係可從習知公知硬塗層用組成物中所使用的溶 劑,選擇使用1種或2種以上。例如:曱乙酮(MEK)、甲基 異丁酮(MIBK)及曱苯等;或諸如曰本專利特開2〇〇5_316428 號公報記載的醇類、酮類、酯類、_化烴類、芳香族烴類、 醚類等。除此之外,第一溶劑尚可使用例如:四氫呋喃、丨,‘ 一β亏烷、二氧雜戊環烷及二異丙醚等醚類;以及曱甘醇、丙 二醇單曱醚(PGME)、曱甘醇醋酸酯等二醇類等等。 就從調整(提高)第一組成物黏度的觀點,第一溶劑最好係 黏度較高’較佳為ImP · s以上、更佳為2mP · s以上。此 種為提咼第一組成物黏度用的溶劑,較佳係有如丙二醇單曱 醚(PGME)等。 再者’藉由適當選擇第一溶劑的種類及上述光穿透性基材 的種類,第一 ί谷劑亦具有使上述第一樹脂其中一部分渗透於 上述光穿透性基材中的作用。 本务明中,藉由使用(或併用)對光穿透性基材具滲透性的 溶劑1(滲透性溶劑)’便可輕易地抑制第一樹脂滲透於基材 中而造成干涉紋發生情形,亦可提高密接性。 另外,本發明中所謂「渗透性」係指對光穿透性基材具滲 透的性質,此外尚涵蓋使光穿透性基材膨潤或濕潤的概念。 滲透性溶劑的具體例係可舉例如:曱乙酮、甲基異丁酮及 環己酮等酮類;醋酸甲酯、醋酸乙酯及醋酸丁酯等酯類;以 及鹵化烴及酚類。 099141183 24 201128216 當光穿透性基材係三醋酸纖維素(TAC)的情況所使用之 溶劑、以及當光穿透性基材係聚對苯二曱酸乙二酯(PET)的 情況所使用之溶劑,係有如日本專利特開2005-316428號公 報記載的溶劑。 特別係當光穿透性基材係三醋酸纖維素(TAC)的情況所 使用之溶劑,較佳為醋酸曱酯、醋酸乙酯、醋酸丁酯、及曱 乙酉同。 第一溶劑係可與後述第二組成物中所含的第二溶劑為相 同、亦可為不同。 第一組成物中,相對於第一溶劑的質量之下,第一樹脂的 質量比例係100〜400質量%,就從在HC層中,形成在光穿 透性基材對向側存在較多低折射率成分分佈的觀點,係屬較 佳。又,此時,後述第二組成物中,相對於第二溶劑的質量 之下,低折射率成分及第二樹脂的合計質量比例係100〜400 質量%。 (第一硬塗層用硬化性樹脂組成物的其他成分) 在第一組成物中除上述成分之外,於賦予機能性之目的 下,尚可含有諸如:聚合起始劑、抗靜電劑、增黏劑、以及 反應性或非反應性均塗劑等。 (聚合起始劑) 視需要亦可適當選擇使用自由基及陽離子聚合起始劑 等。該等聚合起始劑係利用光照射及/或加熱而分解,並產 099141183 25 201128216 生自由基或陽離子,而使進行自由基聚合與陽離子聚合者。 自由基聚合起始劑係可舉例如日本汽巴(股)製irgacure 184(1-羥-環己基-苯基-酮)。 當如含有環氧基的第一樹脂般,使用光陽離子聚合性第一 樹脂的情況’視需要可使用例如日本專利特開2〇ι〇_ι〇期 號公報記載的陽離子聚合起始劑。 當使用聚合起始劑的情況,其含有量係相對於第一組成物 的總固形份,較佳為使用1〜1()質量0/〇。 (抗靜電劑) 抗靜電劑係可使用習知公知抗靜電劑,可使用例如:日本 專利特開20()7_264221號公報所記載的四級_等陽離子 性抗靜電劑、或錫摻雜氧化銦(IT〇)等微粒子。 當使用抗靜電劑的情況,其含有量係相對於第一組成 總固形份,較佳為使用3〇〜6〇質量%。 (增黏劑) 在第一組成物中,於黏度調整之目的下,亦可含 增黏劑係可使用習知公知增黏劑,可舉例如··赂蛋:: =鹽等蛋白質系;聚乙稀醇、脂肪族醯胺、丙烯酸妓 物、1冰_酮、聚丙烯酸鈉等、_二_旨、= 甲驗順丁婦二酸酐共聚物的部㈣、以及乙块二醇; 糸增黏劑。其他尚可舉例如:微 及滑石等無機系增黏劑。 匕石夕、嶺土、膨潤. 099141183 26 201128216 上述有機系增黏劑及無機糸增黏劑係可單獨使用1種、亦 可組合使用2種以上。 當使用增黏劑的情況’其含有量係相對於第一組成物的總 固形份,較佳為使用0.1〜10質量%。 (均塗劑) 均塗劑係具有對HC表面賦予諸如塗佈安定性、滑性、防 污性或耐擦傷性的作用。 均塗劑係可使用習知公知抗反射膜中所使用的氟系、聚矽 氧系及丙稀酸系等均塗劑。可任意使用例如:DIC(股)製 MEGAFAC®系列(MCF350-5)等未具游離輻射線硬化性基的 氟系均塗劑、或信越化學工業(股)製χ22_163Α等具有游離 輻射線硬化性基的聚矽氧系均塗劑。 使用均塗劑時的含有直係當氟系均塗劑的情況’相對於第 -樹脂的質量將使肖5.0質量%以下,較佳係使帛〇1〜3〇 夤里%,當氟系以外的均塗劑之情況,相對於第一樹脂的質 量較佳係使用0.5〜10質量%。 再者’就從HC層硬度的觀點,均塗劑含有量係將對於第 一組成物與第二組成物的固形份合計質量,較佳為5 〇質量 %以下。 第-組成物通常係藉由在第—溶劑中,將第一樹脂、以及 其他視需要含有的聚合起始料,依照—般的調製法進行混 合而施行分散處理,便可調製得。進行混合分散時係可使用 099141183 27 201128216 塗料振盪機或珠磨機等。 (弟二硬塗層用硬化性樹脂組成物) 本發明光學薄膜之製造方法中所使用的第二硬塗層用硬 化性樹脂組成物’係含有從平均粒缉10〜300nm之低折射率 被粒子及低折射率樹脂所構成群組中選擇1種以上的低折 射率成分,並具有反應性的第二樹脂及第二溶劑’黏度 係5mPa · S以上,且黏度差在3〇mpa · S以下。 第二組成物係含有低折射率成分,具有上述特定黏度,且 依上述第一組成物位於較第二組成物更靠光穿透性基材側 的方式,使該二種組成物相鄰接並施行同時塗佈,藉此當使 第一組成物與第二組成物進行硬化而形成HC層時,在hc 層的膜厚方向中,形成從光穿透性基材的對向側之界面側起 朝光穿透性基材侧,呈低折射率成分逐漸減少的分佈,當該 低折射率成分係低折射率微粒子的情況,便如圖1所示的低 折射率微粒子分佈。 本發明光學薄膜之製造方法中所使用第二組成物的黏度 μ2,係就從適度抑制與上述第一組成物間之混合的觀點,較 佳為5mPa · s以上、更佳為i〇mPa · s以上。該黏度…係 就從提高塗佈性的觀點,較佳在1〇〇mPa· s以下、更佳在 50mPa.s以下、特佳在如爪以”以下。又,第—組成物的 黏度μΐ、與第二組成物的黏度μ2,就從塗佈性的觀點,較 佳係μ2大於μΐ。 099141183 28 201128216 (低折射率微粒子) 本發明第一光學薄膜之製造方法中所使用的低折射率微 粒子,係藉由大多數存在於HC層靠光穿透性基材的對向側 之界面側’便對本發明的光學薄膜賦予抗反射性。除低折射 率微粒子之外,尚可搭配使用後述低折射率樹脂。 低折射率微粒子係指折射率1204.45者。 低折射微粒子係可使用習知公知低折射率層中所使用的 粒子’可舉例如:專敎獻2所記載的中空二氧切微粒 子、或LiF(折射率氟化鎂、折射率⑶^叫折 射率1.38)、Na3A1F6(冰晶石、折射率1 33)、及祕㈣折 射率1.36)等金屬氟化物微粒子。 再者,低折射率微粒子係為能使與第二樹脂或上述第一行 脂產生交聯反應’亦可將其表面姻財料料飽和基或 熱硬化性基的有機成分予以被覆。被㈣方法係可使用日本 專利特開雇_165_號公報記載的反應性 調製方法。 低折射率微粒子的平均粒徑係就從防止此層的霧值上 升之觀點’便設定在3GG_以下。當低折射率微粒子係中 ,二氧化㈣粒子的情況,因為需要空隙,因而平均粒徑係 就從使顯現出折料降低效果_點,便設為以上。 低折射率微粒子的平均粒徑較佳係UMQGnm、更佳係 099141183 29 201128216 低折射率微粒子的含有量係只要適當調節便可使用,相對 於與第二組成物中所含第二樹脂的合計質量,較佳為%〜如 質量%、更佳為65〜90質量%。 (低折射率樹脂) 低折射率樹脂縣㈣縣職的折料為之 樹脂。除低折射率樹脂之外,亦可搭配使用上述低折射率微 粒子。 再者’因為低折射率樹脂係屬於在塗膜製膜後能成為沉 層基質-部分的成分,因而亦可兼具為後述第二樹脂而採用 低折射率樹脂。 低折射率㈣斜使用習知公知具有光硬化性基或熱硬 化性基等反應性基的含氟樹脂、未具反應性基的含氣樹脂 等。 具有光硬化性基的含氟樹脂係可舉例如:偏二氣乙稀、四 ft乙烯、六氟丙烯、全氟丁二烯、全氟_2,二甲基],3_二哼 唑等氟化烯烴類。 其他具有光硬化性基的含氟樹脂係可舉例如:(甲基)丙稀 酸三氟⑽、(甲基)丙稀酸切,3,3•五氟丙醋、(甲 細稀酸姆敗丁基)乙醋、(曱基)丙稀酸罐氣己基) 乙醋、(曱基)丙婦酸_2_(全氟辛基)乙能、(曱基)丙婦酸_2_(全 ' )乙^ α—氟曱基丙烯酸甲g旨、三氟甲基丙稀酸 乙醋等(甲基)丙烯酸醋化合物;i分子中含有至少具有3個 099141183 201128216 氟原子之碳數1〜14的氟化烷基、氟環烷基或氟化伸烷基、 以及至少2個(曱基)丙烯醯氧基的含氟多官能基(曱基)丙烯 酸酯化合物等。 具熱硬化性基的含氟樹脂係可使用例如:4_氟乙烯-全氟 .烧基乙烯醚共聚物、氟乙烯-烴系乙烯醚共聚物、以及環氧 樹脂、聚胺曱酸酯樹脂、纖維素樹脂、酚樹脂及聚醯亞胺樹 脂等氟改質物等等。 其他尚可使用日本專利特開2010-122603號公報所記載 含氟原子的聚合性化合物之聚合體或共聚物、以及含有聚石夕 氧的偏氟乙烯共聚物。 低折射率樹脂的分子量並無特別的限制,可適當選擇,但 就從調節第二組成物黏度的觀點,較佳為5〇〇〜5〇〇〇。 第二組成物中所含低折射率樹脂的含有量,係只要適當調 節便可,當低折射率樹月旨兼具為後述第二樹脂的情況,相對 於第二組成物的總固形份,較佳為7〇〜1〇〇質量0/〇。 (第二樹脂) 第二樹脂係屬於具有反應性’經硬化會成為HC層基質的 成分。第二樹脂係具有藉由光照射或加熱,便使第二樹脂彼 此間、以及與上述第一樹脂間產生聚合或交聯反應性。 第二樹脂係可為經諸如紫外線等光照射而硬化的光硬化 性樹月旨’亦可為經加熱而硬化的熱硬化性樹脂。當第二樹脂 係光硬化性樹脂崎沉,第項錄佳係具有聚合性不餘和 099141183 31 201128216 基,更佳係具有游離輻射線硬化性不飽和基。具體例係可舉 例如:(曱基)丙烯醯基、乙烯基、烯丙基等乙烯性不飽和鍵 結及環氧基等。 當第二樹脂係熱硬化性樹脂的情況,第二樹脂所具有的熱 硬化性基係可舉例如:羥基、羧基、胺基、環氧基、環氧丙 基、異氰酸酯基、及烷氧基等。 第二樹脂係就從利用交聯反應而提高HC層硬度的觀 點,較佳為1分子中具有2個以上硬化性基,更佳係具有3 個以上。 第二樹脂係可使用上述第一樹脂中所舉例者。 第二樹脂的含有量係只要適當調節再使用便可,相對於第 二組成物的總固形份,較佳為60質量〇/〇以下,且當第二樹 月曰兼具低折射率樹脂的情況’相對於第二組成物的總固形 份,亦可在100質量%以下。 第二樹脂係可單獨使用1種、亦可組合使用2種以上。 (第二溶劑) 第二溶劑係具有在第二組成物中,將如上述低折射率微粒 子或第二樹脂之類的固形份予以溶解或分散,而調節黏度的 作用。第一溶劑係可使用上述第一溶劑中所舉例者。 (第二硬塗層用硬化性樹脂組成物之其他成分) 第二組成物中除上述成分之外’在賦予機能性之目的下, 如同第一組成物,尚可更進一步含有諸如聚合起始劑、抗靜 099141183 32 201128216 電劑、增黏劑、防污劑、以及反應性或非反應性均 (聚合起始劑) θ寺。 聚合起始劑係可使用上述第一組成物中所舉例者。 , *使用聚合起始劑的情況,含有量係相對於第二組成物的 .總固形份’較佳為使用1〜5質量%。 (抗靜電劑) 抗靜電劑係可使用上述第一組成物中所舉例者。 當使用抗靜電劑的情況,含有量係相對於第二組成物的總 固形份’較佳為使用30〜60質量〇/〇。 (增黏劑) 支曰黏d係可使用上述第一組成物所舉例者。增黏劑的含有 1係相對於第一組成物的總固形份,較佳為使用〜1〇質 量%。 (防污劑) 防污沖j係防止光學薄膜的最表面髒污,且亦可對層賦 予耐擦傷性。防污劑係可在第一組成物及第二組成物雙方中 均3有就從依較少含有量便可有效率地顯現出防污性的觀 •點,防污劑最好僅含於第二組成物中。 防污釗係可使用習知公知的氟系化合物或矽系化合物等 防污劑(防污染劑)。 防’亏制係可舉例如日本專利特開2007-264279號公報所 記載的防污染劑。 099141183 33 201128216HhnPa · s below. Further, the viscosity μ1 of the first composition and the viscosity μ2 of the second composition are preferably greater than the coating property, and the viscosity of the first composition and the second composition described later is, for example, used. Anton Paar company's trade name MCR3〇1, and the measuring fixture: 卯5〇, according to the measured temperature of 25 ° C, the cutting speed of 1 〇〇〇〇 [1/3] of the strip ^ '"', will The composition of the measurement object can be measured by dropping an appropriate amount onto the platform. The first composition does not contain low refractive index fine particles and a low refractive index resin, or even if the low refractive index resin is contained, the mass is relative to the first resin. From the viewpoint of exhibiting antireflection performance, such a low refractive index component is preferably present only on the interface of the HC layer on the opposite side of the light transmissive substrate and its vicinity. If the low refractive index component of the entire HC layer is uniformly hooked, the antireflection performance of the optical film is not sufficiently exhibited, and there is a possibility that the hardness of the layer may not be sufficiently exhibited. The second composition described later has a majority distribution of low refractive index components. The effect of the interface and its extension or the like. Even if the first composition contains a low refractive index resin, the optical film can obtain sufficient antireflection properties if it belongs to the above amount. The amount of the low refractive index resin is preferably 1% by mass or less based on the mass of the first resin. (First resin) 099141183 201128216 The first resin is reactive and hardened to become a component of the HC layer matrix. It is characterized in that polymerization or crosslinking is caused between the first resin and the second resin described later by light irradiation or heating. The first resin may be photohardened by light irradiation such as ultraviolet rays. The resin may be a thermosetting resin which is cured by heating. In the case of the first resin-based photocurable resin, the first resin preferably has a polymerizable unsaturated group, and more preferably has free radiation hardening. Specific examples thereof include ethylenically unsaturated bonds such as (fluorenyl) acryl fluorenyl group, vinyl group, and allyl group, and epoxy groups, etc. When the first resin is thermally hardened In the case of a resin, the first resin may, for example, be a group such as a thiol group, a thiol group, an amine group, an epoxy group, a propylene group, an isophthalate group or an alkoxy group. From the viewpoint of improving the hardness of the HC layer by the crosslinking reaction, it is preferred that the number of reactive groups in one molecule is two or more, and more preferably three or more. The first resin of the photocurable resin is conventionally used. A photocurable resin which can be a substrate of the HC layer is known, and a polyfunctional monomer such as pentaerythritol triacrylate (PETA) or dipentaerythritol hexaacrylate (DPHA) is preferably used. For the resin, for example, a compound having an epoxy group and a binder epoxy compound described in JP-A-2006-106503 can be used. Further, Japanese Patent Laid-Open No. 2008-165041, No. 099141183 21 201128216 can also be used. The thermosetting resin described. From the viewpoint that the viscosity of the first-component viscosity μ1 is easily adjusted, the molecule S of the ruthenium resin is preferably 500 or more, more preferably more than 1 Å. Further, from the viewpoint that the viscosity of the first composition is relatively easy to adjust, the upper limit of the molecular weight of the first resin is preferably 150,000 or less, more preferably 5 Å or less, and particularly preferably 2 Å or less. By setting the molecular weight of the first resin within this range, it is possible to suppress low-refractive-index fine particles or low-refractive-index trees contained in the second composition described later, and it is easy to diffuse uniformly in the entire HC layer. Most of the interface side of the opposite side of the HC layer of the light-transmitting substrate is present. The resin having a molecular weight of more than 1,000 is preferably, for example, a polymer D containing a polyalkylene oxide chain described in Patent Document i or a product name of BEAMSETDK Bushin Nakamura Chemical Industry Co., Ltd. 1; The trade name of the hardened urethane acrylate oligomer is Nh oligomer U-15HA, and the trade name of the Japanese synthetic chemical industry (product) is UV l7〇〇B. From the viewpoint of suppressing occurrence of interference fringes at the interface between the HC layer and the substrate, it is preferable that the first resin contains a resin having a molecular weight of 1 Å or less. Such a resin having a molecular weight of 1,000 or less is preferably as described above for PETA or DPHA. When the first resin is used in combination with a resin having a molecular weight of 1,000 or less and a resin other than the above (that is, a resin having a molecular weight of more than 1,000), the resin content of a molecular weight of 1 Torr or less is appropriately adjusted as long as it is blended with a desired viscosity or the like. However, the resin content of the molecular weight of 1000 or less is preferably 50 to 100% by mass based on the total mass of the first resin, and most of the 099141183 22 201128216. Further, from the viewpoint of the hardness of the HC layer, the molecular weight of the first resin is preferably 5,000 or less. Further, for the first resin, for example, the binder C described in Patent Document 1 can be used. The commercially available product of the binder C is commercially available as an amine phthalate acrylate having a weight average molecular weight of less than 10,000 and having 2 or more polymerizable unsaturated groups, such as a product name AH manufactured by Kyoei Corporation Chemical Co., Ltd. -600, AT-600, UA-306H, UA-306T, UA-3061, etc.; Japan Synthetic Chemical Industry Co., Ltd. Manufacturer name UV-3000B, UV-3200B, UV-6300B, UV-6330B, UV-7000B, etc. ; Arakawa Chemical Industry Co., Ltd. trade name BEAMSET 500 series (502H, 504H, 550B, etc.); New Nakamura Chemical Industry Co., Ltd. trade name U-6HA, UA_32P, U-324A; East Asian synthetic (share) system name M_9〇5〇 and so on. The content of the first resin can be used as appropriate, and the total solid content of the first composition is preferably 40 to 90% by mass, more preferably 5 to 8% by mass. The first resin may be used singly or in combination of two or more. Further, the first resin may be the same as or different from the basic skeleton, the functional group type, the functional group number or the molecular weight of the second resin contained in the second composition described later. (First solvent) The first solvent has a function of adjusting the viscosity by dissolving or dispersing the solid portion of the above-mentioned first resin in the first composition. 099141183 23 201128216 The first solvent is one or more selected from the group consisting of the solvents used in the composition for a hard coat layer. For example, acetophenone (MEK), methyl isobutyl ketone (MIBK), fluorene or the like; or alcohols, ketones, esters, _hydrocarbons, such as those described in JP-A No. 5-316428 , aromatic hydrocarbons, ethers, etc. In addition to the above, the first solvent may also be used, for example, ethers such as tetrahydrofuran, hydrazine, 'a beta-anecane, dioxapentane and diisopropyl ether; and glycerol, propylene glycol monoterpene ether (PGME) , glycols such as glycerol acetate, and the like. From the viewpoint of adjusting (increasing) the viscosity of the first composition, the first solvent preferably has a high viscosity, preferably at least ImP·s or more, more preferably at least 2 mP·s. Such a solvent for improving the viscosity of the first composition is preferably a propylene glycol monoterpene ether (PGME) or the like. Further, by appropriately selecting the type of the first solvent and the kind of the light-transmitting substrate, the first gluten agent also has a function of allowing a part of the first resin to permeate into the light-transmitting substrate. In the present invention, by using (or using) a solvent 1 (permeable solvent) permeable to a light-transmitting substrate, the first resin can be easily inhibited from penetrating into the substrate to cause interference fringes. It can also improve the adhesion. Further, the term "permeability" as used in the present invention means a property of permeating a light-transmitting substrate, and further encompasses the concept of swelling or wetting a light-transmitting substrate. Specific examples of the osmotic solvent include ketones such as acetophenone, methyl isobutyl ketone and cyclohexanone; esters such as methyl acetate, ethyl acetate and butyl acetate; and halogenated hydrocarbons and phenols. 099141183 24 201128216 When the light penetrating substrate is a solvent used in the case of cellulose triacetate (TAC), and when the light penetrating substrate is polyethylene terephthalate (PET), The solvent is a solvent as described in JP-A-2005-316428. In particular, the solvent used in the case where the light-transmitting substrate is cellulose triacetate (TAC) is preferably decyl acetate, ethyl acetate, butyl acetate, and oxime. The first solvent may be the same as or different from the second solvent contained in the second composition described later. In the first composition, the mass ratio of the first resin is 100 to 400% by mass based on the mass of the first solvent, and is formed on the opposite side of the light-transmitting substrate from the HC layer. The viewpoint of the distribution of the low refractive index component is preferred. In this case, in the second composition described later, the total mass ratio of the low refractive index component to the second resin is 100 to 400% by mass based on the mass of the second solvent. (Other components of the curable resin composition for the first hard coat layer) In addition to the above components, the first composition may contain, for example, a polymerization initiator, an antistatic agent, or the like for the purpose of imparting functional properties. A tackifier, a reactive or non-reactive paint, and the like. (Polymerization Initiator) A radical and a cationic polymerization initiator may be appropriately selected as needed. These polymerization initiators are decomposed by light irradiation and/or heating, and produce radicals or cations of 099141183 25 201128216, which are subjected to radical polymerization and cationic polymerization. The radical polymerization initiator may, for example, be irgacure 184 (1-hydroxy-cyclohexyl-phenyl-ketone) manufactured by Ciba. When a photocationic polymerizable first resin is used as in the case of the first resin containing an epoxy group, a cationic polymerization initiator described in, for example, JP-A No. 2, 〇 〇 〇 〇 。 can be used. When a polymerization initiator is used, the content thereof is relative to the total solid content of the first composition, and preferably 1 to 1 () mass 0 / Torr. (Antistatic agent) The antistatic agent may be a conventionally known antistatic agent, and for example, a cationic antistatic agent such as a quaternary cation described in Japanese Patent Laid-Open Publication No. 20-264221, or tin-doped oxidation may be used. Microparticles such as indium (IT〇). When an antistatic agent is used, the content thereof is preferably from 3 〇 to 6 〇 by mass based on the total solid content of the first component. (Tackifier) In the first composition, a viscosity-increasing agent may be used for the purpose of viscosity adjustment, and a conventionally known tackifier may be used, and for example, a protein system such as: egg:: = salt; Polyethylene glycol, aliphatic decylamine, acrylate hydrazine, 1 ice ketone, sodium polyacrylate, etc., _ _ _, = 甲 丁 妇 妇 妇 妇 酸酐 酸酐 酸酐 ( ( ( ( ( 以及 以及 以及 以及 以及 以及 以及 以及 以及Adhesive. Other examples include inorganic tackifiers such as micro and talc. 99石夕,岭土,膨润. 099141183 26 201128216 The above-mentioned organic tackifiers and inorganic enamel tackifiers may be used singly or in combination of two or more. When the tackifier is used, the content thereof is preferably 0.1 to 10% by mass based on the total solid content of the first composition. (Co-coating agent) The leveling agent has an effect of imparting such properties as coating stability, slipperiness, antifouling property or scratch resistance to the surface of HC. As the leveling agent, a coating agent such as a fluorine-based, polyfluorene-based or acrylic-based one which is conventionally used for an antireflection film can be used. For example, a fluorinated coating agent such as a DIC (product) MEGAFAC® series (MCF350-5), which has no free radiation curable group, or a Shin-Etsu Chemical Co., Ltd. product, 22_163Α, can be used for free radiation hardening. The base polyoxynizer is a uniform coating agent. When the leveling agent is used, the case where the fluorine-based leveling agent is contained is 'the mass of the first resin is 5.0% by mass or less, and preferably 帛〇1 to 3% by weight. In the case of the above-mentioned leveling agent, it is preferable to use 0.5 to 10% by mass based on the mass of the first resin. Further, from the viewpoint of the hardness of the HC layer, the total coating agent content is preferably 5% by mass or less based on the total mass of the solid content of the first composition and the second composition. The first composition is usually prepared by mixing a first resin and other optional polymerization starting materials in a first solvent in accordance with a general preparation method to carry out dispersion treatment. For mixing and dispersion, 099141183 27 201128216 paint shaker or bead mill can be used. (The curable resin composition for the second hard coat layer) The curable resin composition for the second hard coat layer used in the method for producing an optical film of the present invention contains a low refractive index of 10 to 300 nm from the average particle size. One or more kinds of low refractive index components are selected from the group consisting of particles and a low refractive index resin, and the second resin having a reactivity and the second solvent have a viscosity of 5 mPa·s or more, and the viscosity difference is 3 〇 mPa · S. the following. The second composition contains a low refractive index component having the above specific viscosity, and the two components are adjacent to each other in such a manner that the first composition is located closer to the light transmissive substrate than the second composition. Simultaneous application is carried out, whereby when the first composition and the second composition are hardened to form an HC layer, an interface from the opposite side of the light-transmitting substrate is formed in the film thickness direction of the hc layer. The side of the light-transmissive substrate side has a distribution in which the low refractive index component gradually decreases. When the low refractive index component is a low refractive index fine particle, the low refractive index fine particles are distributed as shown in FIG. The viscosity μ2 of the second composition used in the method for producing an optical film of the present invention is preferably 5 mPa·s or more, and more preferably i〇mPa, from the viewpoint of moderately suppressing mixing with the first composition. s above. The viscosity is preferably from 1 〇〇 mPa·s or less, more preferably not more than 50 mPa·s, and particularly preferably less than, for example, from the viewpoint of improving coatability. Further, the viscosity of the first composition is μΐ. The viscosity μ2 of the second composition is preferably from the viewpoint of coatability, and μ2 is larger than μΐ. 099141183 28 201128216 (low refractive index fine particles) Low refractive index used in the method for producing the first optical film of the present invention The microparticles impart antireflection properties to the optical film of the present invention by the interface side of the opposite side of the light-transmitting substrate of the HC layer. In addition to the low refractive index microparticles, the latter can be used in combination. Low-refractive-index resin. The low-refractive-index microparticles refer to a refractive index of 1204.45. The low-refractive fine-particle micro-system can use the particles used in the conventionally known low-refractive-index layer, for example, the hollow dioxo described in 2 Micro-particles, or metal fluoride fine particles such as LiF (refractive index magnesium fluoride, refractive index (3) ^ refractive index 1.38), Na3A1F6 (cryolite, refractive index 1 33), and secret (4) refractive index 1.36). Rate microparticle system The second resin or the first line of fat may be subjected to a crosslinking reaction'. The organic component of the surface of the salty material or the thermosetting group may be coated. The method of the (4) method may use the Japanese patent special employment _165_ The reactive preparation method described in the publication No. 5, the average particle diameter of the low refractive index fine particles is set to be 3GG_ or less from the viewpoint of preventing the fog value of the layer from rising. In the low refractive index fine particle system, the (four) particles are In other cases, since the voids are required, the average particle diameter is from the viewpoint of exhibiting the effect of reducing the binder. The average particle diameter of the low refractive index fine particles is preferably UMQGnm, more preferably 099141183 29 201128216 low refractive index. The content of the fine particles can be used as long as it is appropriately adjusted, and is preferably from 0.01% by mass, more preferably from 65 to 90% by mass, based on the total mass of the second resin contained in the second composition. Resin resin) Low refractive index resin (4) Recycling resin for county job. In addition to low refractive index resin, the above low refractive index microparticles can also be used in combination. Since the coating film can be a component of the sink layer-partial portion after the film formation, it is also possible to use a low refractive index resin for the second resin to be described later. Low refractive index (four) oblique use is known to have a photocurable group or thermosetting. A fluorine-containing resin such as a reactive group or a gas-containing resin having no reactive group, etc. The fluorine-containing resin having a photocurable group may, for example, be ethylene dichloride, tetra pent ethylene or hexafluoropropylene. Fluorinated olefins such as perfluorobutadiene, perfluoro-2, dimethyl], 3-dicarbazole, etc. Other fluorine-containing resins having a photocurable group are, for example, (meth)acrylic acid Fluorine (10), (meth) acrylic acid diced, 3,3 • pentafluoropropyl vinegar, (methyl succinyl acetophenone) ethyl vinegar, (mercapto) acrylic acid tank hexyl ketone, vinegar, (曱B) Glycolate_2_(Perfluorooctyl)Benergy, (Mercapto)-pro-glycolic acid_2_(all') Ethyl-α-fluorodecyl acrylate A, trifluoromethyl acrylate a (meth)acrylic acid vinegar compound; i molecule having a fluorinated alkyl group, a fluorocycloalkyl group or a fluorinated alkyl group having at least three carbon atoms of from 1,091,411,183, 2011,282,816, and a fluorine atom, and 2 (Yue-yl) fluorine-containing polyfunctional (Yue-yl) acrylate compound Bing Xixi group and the like. The fluororesin having a thermosetting group can be, for example, a 4-fluoroethylene-perfluoro-alkylene ether copolymer, a fluoroethylene-hydrocarbon-based vinyl ether copolymer, and an epoxy resin or a polyamine phthalate resin. Fluorine modified materials such as cellulose resin, phenol resin and polyimine resin. Further, a polymer or a copolymer of a fluorine atom-containing polymerizable compound described in JP-A-2010-122603, and a polyvinylidene fluoride-containing vinylidene fluoride copolymer may be used. The molecular weight of the low refractive index resin is not particularly limited and may be appropriately selected, but from the viewpoint of adjusting the viscosity of the second composition, it is preferably 5 Å to 5 Å. The content of the low refractive index resin contained in the second composition may be appropriately adjusted, and when the low refractive index tree is used as the second resin described later, the total solid content of the second composition is Preferably, it is 7 〇 to 1 〇〇 mass 0/〇. (Second Resin) The second resin is a component which has reactivity and is hardened to become a matrix of the HC layer. The second resin has a polymerization or crosslinking reactivity between the second resin and the first resin by light irradiation or heating. The second resin may be a photocurable resin which is cured by light irradiation such as ultraviolet rays, and may be a thermosetting resin which is cured by heating. When the second resin-based photocurable resin is sturdy, the first item has a polymerizable property and a 099141183 31 201128216 basis, and more preferably has an epitaxial radiation-curable unsaturated group. Specific examples thereof include an ethylenically unsaturated bond such as a (fluorenyl) acrylonitrile group, a vinyl group, and an allyl group, and an epoxy group. In the case of the second resin-based thermosetting resin, the thermosetting group of the second resin may, for example, be a hydroxyl group, a carboxyl group, an amine group, an epoxy group, a glycidyl group, an isocyanate group, or an alkoxy group. Wait. The second resin is preferably one having two or more curable groups per molecule, and more preferably three or more, from the viewpoint of improving the hardness of the HC layer by the crosslinking reaction. As the second resin, those exemplified in the above first resin can be used. The content of the second resin is preferably 60 parts by mass or less based on the total solid content of the second composition, as long as it is appropriately adjusted and reused, and when the second tree has a low refractive index resin The case 'may be 100% by mass or less relative to the total solid content of the second composition. The second resin may be used singly or in combination of two or more. (Second solvent) The second solvent has a function of adjusting the viscosity by dissolving or dispersing a solid component such as the above-mentioned low refractive index fine particles or the second resin in the second composition. As the first solvent, those exemplified in the above first solvent can be used. (Other components of the curable resin composition for the second hard coat layer) The second composition may further contain, for example, a polymerization initiation, in addition to the above-described components, for the purpose of imparting functionality, like the first composition. Agent, anti-static 099141183 32 201128216 Electrolyte, tackifier, antifouling agent, and reactive or non-reactive (polymerization initiator) θ temple. As the polymerization initiator, those exemplified in the above first composition can be used. * When the polymerization initiator is used, the content is preferably from 1 to 5% by mass based on the total solid content of the second composition. (Antistatic Agent) As the antistatic agent, those exemplified in the above first composition can be used. When the antistatic agent is used, the content is preferably 30 to 60 mass 〇/〇 with respect to the total solid portion of the second composition. (Tackifier) The support d viscous d system can be exemplified by the above first composition. Preferably, the tackifier contains 1% relative to the total solids of the first composition, preferably ~1% by mass. (Antifouling agent) The antifouling agent prevents the outermost surface of the optical film from being soiled, and also imparts scratch resistance to the layer. The antifouling agent can be used in both the first composition and the second composition, and the antifouling property can be effectively exhibited from a small amount. The antifouling agent is preferably contained only in the antifouling agent. In the second composition. As the antifouling system, a conventionally known antifouling agent (antifouling agent) such as a fluorine compound or a lanthanoid compound can be used. The anti-pollution agent described in Japanese Laid-Open Patent Publication No. 2007-264279 is exemplified. 099141183 33 201128216

最好使用市售物的防污劑。此種市售物的防污劑(非反應 性),係可舉例如:DIC(股)製MEGAFAC®系列諸如:商品 名 MCF350-5、F445、F455、F178、F470、F475、F479、F477、 TF1025、F478 及 F178K 等;TOSHIBA SILICONE(股)製 TSF 系列等;信越化學工業(股)製X-22系列及KF系列等;以及 CHISSO(股)製 Silaplane® 系列等。 市售物的防污劑(反應性)係可舉例如:新中村化學工業(股) 製商品名SUA1900L10及商品名SUA1900L6 ; Daice卜 UCB(股)製商品名Ebecryl350、商品名Ebecryll360及商品 名KRM7〇39;日本合成化學工業(股)製UT3971 ; DIC(股) 製商品名DIFENSA TF30(H、商品名DIFENSA TF3000及商 品名DIFENSA TF3028 ;共榮公司化學(股)製商品名 LIGHT-PROCOAT AFC;3000 ;信越化學工業(股)製商品名 KNS5300;GE TOSHIBA SILICONE(股)製商品名 UVHC1105 及UVHC8550;以及日本塗料(股)製商品名ACS_1122等等。 (均塗劑) 均塗劑係可使用上述第一組成物中所舉例者。 均塗劑係可在第一組成物及第二組成物雙方中均含有。就 從效率佳地顯現出均塗劑機能的觀點,最好僅含於第二組成 物中。 使用均塗劑時的含有量,當氟系均塗劑的情況,相對於第 二樹脂的質量係使用5.0質量%以下、較佳係使用〇1〜3() 099141183 34 201128216 質量%,當氟系以外的均塗劑之情況,相對於第二樹脂的質 量,較佳係使用0.5〜10質量%。 第二組成物的調製方法係可使用上述第一組成物中所舉 例的方法。 (其他的機能層用組成物) 本發明光學薄膜之製造方法,在上述(iii)同時塗佈的步驟 中,只要於光穿透性基材的一面側,將至少上述第一及第二 組成物施行同時塗佈便可,為配合光學薄膜所要求的性能, 而適當地設置其他機能層,亦可準備其他的機能層用組成 物。 其他的機能層係可舉例如:抗靜電層及防污層。 另外,如後述,其他的機能層用組成物係若從光穿透性基 材側依第一及第二組成物呈相鄰接位置狀態施行塗佈,便可 配合其機能而設定適當的塗佈位置。 本發明光學薄膜之製造方法,在(iii)將第一組成物與第二 組成物施行同時塗佈的步驟中,將上述第一與第二組成物施 行同時塗佈的方法,係在能施行同時塗佈的前提下,其餘並 無特別的限制,可使用習知公知的方法,例如使用圖3所示 擠壓型模具塗佈機的方法。 光學薄膜之製造方法在(i i i)將第一組成物與第二組成物 施行同時塗佈的步驟中,當將第一組成物的塗膜潤濕膜厚設 為T1、將第二組成物的塗膜潤濕膜厚設為T2時,將T2/T1 099141183 35 201128216 設為0.01〜1,但就從效率佳地提高光學薄膜抗反射性的觀 點,較佳係在HC層的膜厚方向上,低折射率成分存在於 HC層靠光穿透性基材的對向側之界面侧較多於靠光穿透性 基材侧,且形成越靠光穿透性基材側,則低折射率成分存在 量越少的分佈’從靠光穿透性基材的對向側之界面朝靠光穿 透性基材側,呈該低折射率成分逐漸減少,且在硬塗層的膜 厚方向上’在從上述靠光穿透性基材的對向側之界面起至達 上述硬塗層乾燥膜厚70%為止的區域中,存在有上述低折射 率成分總夏的7〇〜100%之分佈。此處所謂「濁濕膜厚」係 指剛塗佈後,組成物中的溶劑揮發前之狀態的塗膜厚度,從 (光穿透性基材上所㈣組成物的體積/㈣面積)便可求得。 再者’當第-及第二組成物的塗佈係使用如圖3所示模具 塗佈機頭實施的情況,屬於模具塗佈機頭4〇與光穿透性樹 脂基材丨0間之距離的塗佈高度8Q、及在光穿透性樹脂基材 1〇上施行同時多層塗佈時的第—及第二組成物之塗膜合計 敍9〇,最好具有塗佈高度8〇<(厚度90的2倍)之關係。 藉由在保持此種關係的情況下施行同時多層塗佈,便使在光 穿=樹脂基材1G與模具塗佈機頭仙之間所形成塗佈液滴 呈安定化。特別係錢佈液滴係利用塗佈所形成層越薄膜化 則越谷易呈不安定’成為塗佈面出現斑點、條紋,導致外觀 惡化的原因,但藉由保持上述塗佈高度80與厚度90之關 係,便可輕易地使塗佈液滴呈安定化。另外,所謂「盡佈液 099141183 36 201128216 滴」係指在塗佈裝置與基材之間所生成的液體滯留。 上述其他的機能層用組成物係可與第一及第二組成物一 起施行同時塗佈,亦可在第一及第二組成物之外另行施行塗 佈。當施行同時塗佈的情況,在從光穿透性基材侧起依使第 一及第二組成物呈相鄰接位置狀態施行塗佈的前提下,可配 合其機能而設定適當塗佈位置。例如將抗靜電層用組成物與 第一及第二組成物一起施行同時塗佈時,只要在較圖3中的 模頭狹缝51更靠光穿透性基材搬送方向140上游侧(即圖3 中的狹缝51左側)設置第三狹缝(未圖示),再將抗靜電層用 組成物、第一及第二組成物施行同時塗佈便可。又,例如當 將抗靜電層用組成物、第一及第二組成物、以及防污層用組 成物施行同時塗佈時,只要在圖3中於狹縫51左側設置為 塗佈抗靜電層用組成物用的第三狹缝(未圖示),並在狹縫52 右側設置為塗佈防污層用組成物用的第四狹縫(未圖示),便 可將該四種組成物施行同時塗佈。 (iv)步驟的乾燥方法係例如減壓乾燥或加熱乾燥,以及組 合該等乾燥的方法等。又,當依常壓施行乾燥時,最好依 30〜110°C施行乾燥。 本發明中,在施行(iv)步驟之前(即,塗膜乾燥前)並無施 行預烘烤。 例如當第一或第二溶劑係使用曱基異丁酮的情況,通常依 室溫〜80°C、較佳40°C〜70°C範圍内的溫度,施行20秒〜3 099141183 37 201128216 分鐘、較佳30秒〜1分鐘程度時間的乾燥。 另外,本發明中,(iv)步驟中所謂「乾燥」係指即便施行 該乾燥,層的硬化尚未充分達當作製品用程度(例如JIS K5600-5-4( 1999)所規定的鉛筆硬度試驗(4.9N荷重)中,未滿 硬度「H」)的處理,相對於此,當第一樹脂與第二樹脂係含 有熱硬化性樹脂的情況’在乾燥後所施行的加熱,係利用依 施行該加熱,便使層的硬化能達當作製品用之充分程度(上 述鉛筆硬度試驗中達硬度「H」以上)的溫度,施行處理。 (iv)步驟的光照射方法主要係使用諸如紫外線、可見光、 電子束、或游離輻射線等。紫外線硬化的情況,係使用從諸 如超高壓水銀燈、咼壓水銀燈、低壓水銀燈、碳弧、氣弧或 金屬鹵素燈等的光線所發出紫外線等。能量線源的照射量係 依紫外線波長365nm的積分曝光量計,為5〇〜3〇〇mJ/cm2。 本發明並未施行預烘烤,而是使塗膜硬化(正式硬化)的光 照射或加熱係在塗膜乾燥後才實施。藉此,第二組成物中所 含低折射率成分便會在HC層的膜厚方向上,存在呈HC層 靠光穿透性基材的對向側之界面側較多於靠光穿透性基材 側’且越靠光穿透性基材彻】,則低折射率成分存在量越少的 分佈’從# S穿透性基材的對向側之界面朝靠光穿透性基材 側呈該低折射率成分逐漸減少,而可獲得經抑制hc層内因 低折射率成分與HC層的樹脂間之折射率差所造成干涉紋 發生情形、以及HC層與基材的界面處發生干涉紋情形,且 099141183 38 201128216 檢視性優異的光學薄膜。 再者□為在未知仃預烘烤的情況下便使塗膜乾燥 ,接著 施行光照射或加熱錢賴錢,因而純於施行預供烤而 :使更化的If況下將提向配層、與光穿透性基材或層 • 靠光穿透性基材側所鄰接層間之密接性。 再者□為必要&行預烘烤,因而相較於施行預烘烤與 正式硬化等2度光照射才使硬化的情況下,生產性亦屬優 異。 (光學薄膜) 本發明㈣學薄_依訂述製造方賴獲得,如圖i 所示’在光穿透性基材10的—面側至少設有Hc層2〇。 本發明的光學薄膜係藉由依照上述製造方法進行製造,便 使在第二組成物中所含低折射率微粒子及/或低折射率樹 脂’於HC層的膜厚方向上’存在呈Hc層靠光穿透性基材 的對向側之界面侧較多於靠光穿透性基材側,且越靠光穿透 性基材側則其存在量越少的分佈,可獲得經抑制Hc層内因 邊低折射率微粒子及/或低折射率樹脂、肖Hc層的樹脂間 • 之折射率差所造成干涉紋發生情形、以及HC層與基材的界 • 面處發生干涉紋情形,且檢視性優異的光學薄膜。 再者,因為在未施行預烘烤的情況下便使塗膜乾燥,接著 再利用光照射或加熱而使硬化,因而相較於施行預烘烤,接 著再^行乾燥、光照射或加熱而使硬化的情況下,並未出現 099141183 201128216 習知利用逐次雙層塗佈形成低折射率層與iiC層的情況、或 如專利文獻2般的利用同時塗佈形成之情況,所會出現明確 的層界面,且具有抗反射機能,在維持霧值、全光線穿透率 及無紋斑面狀的情況下,能抑制層間的干涉紋發生’而使密 接性呈良化,且藉由在基材附近,增加與基材折射率同程度 折射率的硬塗組成物比例,而抑制硬塗層與基材間的干涉紋 發生,且密接性優異。 本發明的光學薄膜係如上述製造方法所述,亦可施行其他 機能層用組成物塗佈而形成其他的機能層,例如當在第一組 成物的光穿透性基材側塗佈抗靜電層用組成物,而形成抗靜 電層時,便構成如圖4所示,從光穿透性基材1〇側起為抗 靜電層140及HC層20的層構成。 再者,如圖5所示,在HC層靠光穿透性基材的對向側之 面上,亦可設置防污層150。 HC層的乾燥膜厚(以下亦簡稱「膜厚」)係可配合所要求 的性能而適當調節,例如較佳為膜厚卜20μιη。 其他的機能層膜厚係可適當調節,例如抗靜電層的膜厚較 佳係0.05〜5μιη ’防污層的膜厚較佳係〇.〇ι〜10ηιη。 本發明的光學薄膜係配合所要求的性能,而藉由適當調節 上述第二組成物的低折射率微粒子、低折射率樹脂的種類與 含有量’便可調節其反射率,而對入射光的反射率較佳係 1〜3.75、更佳係1〜3.4。 099141183 40 201128216 反射率係使用日’本分光(股)製商品名V7100型紫外可見 分光光度計、及曰本分光(股)製商品名VAR-7010絕對反射 率測定裝置’將入射角設為5°、偏光片設為N偏光、測定 波長範圍設為380〜780nm’並將黑色膠帶貼合於光學薄膜靠 TAC基材侧,再將其設置於裝置中並進行測定。另外,將 利用測定波長範圍所求得測定結果的平均值視為反射率。 本發明光學薄膜的霧值係可配合所要求的性能而適當調 節’較佳為〇·1〜1.0%、更佳為〇 !〜〇 4%。 牙达平sf 務值係可根據JIS Κ7136,利用反射 村上色彩技術研究所(股)製)進行測定。 本發明光學薄膜的較佳實施態樣,在光穿透性基材的一面 侧設有硬塗層的光學賴,在上述硬塗層的膜厚方向上,伯 折射率微粒子存在呈在上述㈣透性基材㈣向側之界面 侧較多於該光穿透性基材側1越靠該衫透性基材側則該 低折射率微粒子的存在量越少,該從靠光穿透性基材的對向 側之界面朝靠光穿透性基材側,呈該低折射率成分逐漸減 少’在錢塗相並無層界面’在該硬塗層對上述光穿透性 基材的棋盤格密接性試驗中,可使密接率成為%〜⑽%。 如圖1所示,藉由在HC層内开^# &成此種低折射率微粒子的 为佈,便具有抗反射機能,且在 . 匕^ 牡准持務值、全光線穿透率及 '、,、、,文斑面狀的情況下,抑制層間的工、也 ^ u 爾間的切紋發生、使密接性呈 良化,藉由在基材附近,增加與基 材折射率同程度折射率的 099141183 41 201128216 硬塗組成物比例,而抑制硬塗層與基材間的干涉紋發生,便 可獲得密接性優異的光學薄膜。 所明硬塗層内的層界面」係指如圖2所示,於層内在組 成物的硬化部分發生界面(邊界)情形。層界面的具體例係有 如後述圖9所示2種組成物的硬化部分邊界。 本發明光學薄膜的較佳實施態樣,亦可於硬塗層的膜厚方 向上’在從上述靠光穿透性基材的對向側之界面起至達上述 硬塗層乾燥膜厚70%為止的區域中,存在有上述低折射率微 粒子總量的70〜100%。藉此便可效率佳地提高光學薄膜的 抗反射性。 本發明光學薄膜的全光線穿透率(η),就從透明性的觀 點’較佳係達90%以上、更佳係達92%以上。 光學薄膜的全光線穿透率係可根據JIS K7361,利用與霧 值相同的測定器進行測定。 (偏光板) 本發明偏光板的特徵在於:在上述光學薄膜靠上述硬塗層 的對向之光穿透性基材側上設有偏光片。 圖6所不係本發明偏光板的層構成一例示意圖。圖6所示 偏光板2係具備有:在光穿透性基材1〇上設有hc層2〇的 光學溝膜1、以及積層著保護膜160與偏光層170的偏光片 180 ’在光學薄膜1 # HC層20的對向之光穿透性基材1〇 侧設有偏光片180。 099141183 42 201128216 外’在Μ賴靠硬塗層的對向之_透性基材側配置 片’不僅光學_與偏光片係個卿成的情況,亦涵 盍構成光學_的構件係兼具構錢光片之構件的情況。 土再者’將本發明偏光板使用於顯示面板的情況,通常係在 靠偏光片側配置顯示面板。 另外,相關光學薄膜,因為若使用上述光學薄膜便可’因 =處便不在贅述1下,針對本發明偏光板的其他構成進 订說明。 (偏光片) 本發明所使用的偏Μ係在_有既定偏光特性的前提 :,其餘並無特別的限制,可使用―般在液晶顯示裝置中所 使用的偏光片。 偏光片係在能長期間保持既定偏光特性的形態下,其餘並 j別的限制’例如亦可僅由偏光層構成,亦可將保護膜與 、θ予以貼α。當將保護膜與偏光層予以貼合的情況,亦 =在偏光層的單面均護膜,亦可麵光層的雙面上 均有形成保護膜。 偏^層通常係可使用使硬含潤於由聚乙_構成的薄膜 將其藉由單軸延伸而使形成聚W醇與蛾之錯合物 # 〇 性:二:護膜:在能保護上述偏先層,且具有所需光穿透 的月】緹下’其餘並無特别的限制。 099141183 43 201128216 保護膜的光穿透性係在可見光區域中的穿透率較佳為 80%以上、更佳為90%以上。 另外’上述保護膜的穿透率係根據JIS K7361-l(塑膠-透 明材料的全光線穿透率試驗方法)便可進行測定。 構成保護膜的樹脂係可舉例如:纖維素衍生物、環烯烴系 樹脂、聚曱基丙稀酸曱酯、聚乙烯醇、聚醯亞胺、聚芳酯、 聚對苯二曱酸乙二酯等。其中,較佳為使用纖維素衍生物或 環烯烴系樹脂。 保護膜係可由單一層構成,亦可由複數層積層。又,當保 護膜係由複數層積層的情況,可由同一組成的複數層積層, 且亦可由具不同組成的複數層積層。 再者,保賴的厚度係在能將本發明偏絲的可撓性形成 於所需範圍内’且藉由與偏光層相貼合,便可將偏光片的尺 寸變化_於既定範圍⑽前提下,其餘並無㈣的限制, 但較佳為5〜200/πη範圍内、更佳為15〜15〇Mm範圍内、特 佳為30〜_m範圍内。若上述厚度較薄於5卿便會有本 發明偏光板尺寸變化變大的可能性。又,若上述厚度鄉於 2〇〇叫’例如當將本發明偏光板施行裁剪加工時,會有加工 屑增加、或裁剪刀片之磨損變快的可能性。 保護臈亦可為具有相位差性者。藉由使用具相位差性的保 護膜,便具有將本發明偏光板形成顯示面板之視角補償機能 的優點。 099141183 44 201128216 保護膜具有相位差性的態樣,係在能顯現出所需相位差性 態樣的前提下,其餘並無特別的限制。此種態樣係有如:保 護膜具有由單-層構成,且含有顯現出相位差性的光學特性 • 顯劑(developing agent),而具有相位差性的態樣,以及在由 上述樹脂構成的保護膜上,積層著含有具折射率異向性化合 物的相位差層之構成’藉此便具有相位差性的態樣。本發明 中,該等任一態樣均適於使用。 (顯示器) 本發明顯不器的特徵在於:在上述光學薄膜靠上述硬塗層 的對向之光穿透性基材侧上,配置顯示面板。 顯示器係可舉例如:LCD、PDP、ELD(有機EL、無機此)、 CRT 等。 顯示器係由:顯示器之視聽者側構件的顯示面板、以及含 驅動部的背面側構件構成。若舉液晶顯示器為例進行說明, 所謂「顯示面板」係由封鎖液晶材料的2片玻璃板(例如彩 色濾光片基板與陣列基板)、偏光板、及本發明光學薄膜等 構成的構件。若舉液晶顯示器為例進行說明,所謂「背面側 . 構件」係由通稱「背光源」的光源、控制LCD的驅動電路、 • 控制光源的電路、及機殼等構成的構件。此情況的液晶顯示 裔之層構成一例,係含有導光板或擴散薄膜等的背光源部, 在其視聽者側依序積層著偏光板、陣列基板、液晶層、彩色 濾光片基板、偏光板、及光學薄膜而構成。 099141183 45 201128216 上述顯示器另一例的PDP係具備有表面玻璃基板、以及 背面玻璃基板。該背面玻璃基板係配置呈在與該表面玻璃基 板相對向之間封入放電氣體狀態。當上述顯示器係PDp的 情況’亦有在表面玻璃基板的表面或其前面板(玻璃基板或 薄膜基板)上,設置上述光學薄膜。 上述顯示器係可為諸如:將若施加電壓便會發光的硫化 鋅、二胺類物質等發光體,蒸鍍於玻璃基板上,控制著對基 板所施加的電壓而進行顯示之ELD裝置,或者將電子信號 轉換為光而產生肉眼可看到影像的CRT等顯示器。此情 況,在ELD裝置或CRT的最表面或其前面板的表面設有上 述光學薄膜。 [實施例] 以下,舉實施例,針對本發明更進一步進行體的說明。該 等的記載並非限制本發明。 低折射率微粒子係使用日揮觸媒化成(股)製中空二氧化 矽微粒子(商品名THRULYA⑧DAS(平均粒徑5〇nm、MIBK 分散液、固形份20%》。 第一柄j曰(1)係使用荒川化學工業(股)製商品名beamset DK1(重量平均分子量2G嶋、固形份75%、mibk溶劑)。 第一私Μ曰(2)係使用曰本化藥(股)製季戊四醇三丙烯酸酯。 兼具第一樹脂的低折射率樹脂係使用共榮公司化學(股) 製LINC-3A(下述一般式⑴所示三丙稀酿基十七氣壬稀基-099141183 46 201128216 季戊四醇(主成分)、與季戊四醇三丙烯酸酯的混合物)。 [化1] 一般式(1)It is preferable to use a commercially available antifouling agent. Examples of the antifouling agent (non-reactive) of such a commercially available product are MEGAFAC® series manufactured by DIC, for example, trade names MCF350-5, F445, F455, F178, F470, F475, F479, F477, TF1025, F478, and F178K, etc.; TSF series made by TOSHIBA SILICONE Co., Ltd.; X-22 series and KF series manufactured by Shin-Etsu Chemical Co., Ltd.; and Silaplane® series made by CHISSO. The antifouling agent (reactivity) of the commercially available product may be, for example, a brand name of the company, which is manufactured by Shin-Nakamura Chemical Industry Co., Ltd., and a trade name of SUA1900L6; a product name of Ebecryl 350, a product name of Ebecryll 360, and a product name of KRM7. 〇39; Japan Synthetic Chemical Industry Co., Ltd. UT3971; DIC (share) system name DIFENSA TF30 (H, trade name DIFENSA TF3000 and trade name DIFENSA TF3028; Coron Chemical Chemical Co., Ltd. under the trade name LIGHT-PROCOAT AFC; 3000; Shin-Etsu Chemical Co., Ltd. product name KNS5300; GE TOSHIBA SILICONE (stock) product name UVHC1105 and UVHC8550; and Japanese paint (stock) product name ACS_1122, etc. (Co-coating agent) The above-mentioned first composition is exemplified. The leveling agent can be contained in both the first composition and the second composition. From the viewpoint of the efficiency of the coating agent function, it is preferable to include only In the case of using a leveling agent, the content of the fluorine-based leveling agent is 5.0% by mass or less based on the mass of the second resin, and preferably 〇1 to 3 () 099141183 34 201128216 quality% In the case of the leveling agent other than the fluorine type, it is preferably used in an amount of from 0.5 to 10% by mass based on the mass of the second resin. The method of preparing the second composition may be a method exemplified in the above first composition. (Other functional layer composition) In the method of producing the optical film of the present invention, at least one of the first and second compositions is provided on one side of the light-transmitting substrate in the step of (iii) simultaneous coating. The coating may be applied at the same time, and other functional layers may be appropriately disposed to match the performance required of the optical film, and other functional layer compositions may be prepared. Other functional layers may be, for example, an antistatic layer and an anti-static layer. Further, as will be described later, when the other functional layer component is applied from the side of the light-transmitting substrate in the state in which the first and second components are adjacent to each other, the function can be set in accordance with the function. A suitable coating position. In the method for producing an optical film of the present invention, in the step of (iii) applying the first composition and the second composition simultaneously, the first and second compositions are simultaneously coated. method, In the case where simultaneous coating can be carried out, the rest is not particularly limited, and a conventionally known method can be used, for example, a method using the extrusion die coater shown in Fig. 3. The method for producing an optical film is (iii) In the step of simultaneously applying the first composition and the second composition, the wet film thickness of the coating film of the first composition is set to T1, and the wet film thickness of the coating film of the second composition is set to T2. When T2/T1 099141183 35 201128216 is set to 0.01 to 1, from the viewpoint of improving the antireflection property of the optical film with high efficiency, it is preferable that the low refractive index component exists in the HC layer in the film thickness direction of the HC layer. The interface side on the opposite side of the light-transmitting substrate is more on the side of the light-transmitting substrate, and on the side closer to the light-transmitting substrate, the distribution of the low-refractive-index component is less. From the interface on the opposite side of the light-transmitting substrate toward the side of the light-transmitting substrate, the low refractive index component is gradually reduced, and in the film thickness direction of the hard coat layer, The interface on the opposite side of the permeable substrate is in the region up to 70% of the dry film thickness of the hard coat layer There is the low refractive index distribution component of the total summer 7〇~100%. Here, the term "turbidity and wet film thickness" means the thickness of the coating film in a state before the solvent is volatilized in the composition immediately after application, and the (volume/(four) area of the (four) composition on the light-transmitting substrate) Can be obtained. Further, when the coating of the first and second compositions is carried out using a die coating head as shown in FIG. 3, it belongs to the between the die coater head 4 and the light penetrating resin substrate. The coating height of the distance is 8 Q, and the coating film of the first and second compositions at the time of simultaneous multilayer coating is applied to the light-transmitting resin substrate 1 合, and preferably has a coating height of 8 〇. ((2 times the thickness of 90) relationship. By performing simultaneous multi-layer coating while maintaining such a relationship, the coating droplets formed between the light-passing resin substrate 1G and the mold coating head are stabilized. In particular, the thicker the layer formed by the application of the coating, the more the film becomes thinner, the more likely it is to become unstable, which is the cause of spots and streaks on the coated surface, which causes deterioration in appearance, but by maintaining the above-mentioned coating height 80 and thickness 90. The relationship can be easily stabilized by the coating droplets. In addition, the "dip liquid 099141183 36 201128216" refers to the liquid retention generated between the coating device and the substrate. The above other functional layer composition may be applied simultaneously with the first and second compositions, or may be additionally applied in addition to the first and second compositions. In the case of simultaneous coating, the coating position can be set in accordance with the function of the first and second compositions in the state of being adjacent to each other from the side of the light-permeable substrate. . For example, when the antistatic layer composition is applied simultaneously with the first and second compositions, it is only on the upstream side of the light transmissive substrate transport direction 140 in the die slit 51 of FIG. 3 (ie, A third slit (not shown) is provided on the left side of the slit 51 in Fig. 3, and the antistatic layer composition and the first and second compositions are simultaneously coated. Further, for example, when the composition for an antistatic layer, the first and second compositions, and the composition for an antifouling layer are simultaneously applied, as long as the antistatic layer is coated on the left side of the slit 51 in FIG. The fourth slit (not shown) for the composition is provided on the right side of the slit 52 as a fourth slit (not shown) for applying the composition for the antifouling layer, and the four compositions can be used. The material is applied at the same time. The drying method of the step (iv) is, for example, drying under reduced pressure or heating, and a method of combining the drying and the like. Further, when drying is carried out under normal pressure, it is preferred to carry out drying at 30 to 110 °C. In the present invention, prebaking is not performed before the step (iv) is carried out (i.e., before the coating film is dried). For example, when the first or second solvent is used in the case of decyl isobutyl ketone, it is usually carried out at a temperature ranging from room temperature to 80 ° C, preferably 40 ° C to 70 ° C, for 20 seconds to 3 099141183 37 201128216 minutes. Preferably, it is dried for a period of 30 seconds to 1 minute. Further, in the present invention, the term "drying" in the step (iv) means that even if the drying is performed, the hardening of the layer is not sufficiently sufficient to be used as a product (for example, the pencil hardness test specified in JIS K5600-5-4 (1999). In the case of the case where the first resin and the second resin contain a thermosetting resin, the heating performed after the drying is performed in the case of the 4.9N load. This heating allows the layer to be cured at a temperature sufficient for the product (the hardness "H" or higher in the pencil hardness test described above). The light irradiation method of the (iv) step mainly uses, for example, ultraviolet rays, visible light, electron beams, or free radiation. In the case of ultraviolet curing, ultraviolet rays emitted from light such as an ultrahigh pressure mercury lamp, a squirting mercury lamp, a low pressure mercury lamp, a carbon arc, an air arc or a metal halide lamp are used. The amount of irradiation of the energy ray source is 5 〇 to 3 〇〇 mJ/cm 2 in terms of an integrated exposure amount of an ultraviolet wavelength of 365 nm. In the present invention, the prebaking is not carried out, but the light irradiation or heating for hardening (formally hardening) the coating film is carried out after the coating film is dried. Thereby, the low refractive index component contained in the second composition is more likely to penetrate through the light in the film thickness direction of the HC layer than on the opposite side of the opposite side of the light-transmitting substrate of the HC layer. On the side of the substrate, and the light transmissive substrate is deeper, the distribution of the low refractive index component is less. The interface from the opposite side of the #S penetrating substrate toward the light-transmitting group. The low refractive index component of the material side is gradually reduced, and the occurrence of interference fringes caused by the difference in refractive index between the low refractive index component and the resin of the HC layer in the hc layer can be obtained, and the interface between the HC layer and the substrate occurs. Interference pattern, and 099141183 38 201128216 Optical film with excellent visibility. Furthermore, in order to pre-bake in an unknown state, the coating film is dried, and then light irradiation or heating is performed, so that it is purely pre-supplied: it will be lifted to the matching layer under the condition of being improved. Adhesion to a layer adjacent to the light-transmissive substrate or layer. Furthermore, it is necessary & pre-baked, and therefore, it is excellent in productivity in the case of hardening by 2 degree light irradiation such as prebaking and formal hardening. (Optical Film) The present invention (4) is thinly obtained by the manufacturer, and as shown in Fig. i, at least the Hc layer 2 is provided on the surface side of the light-transmitting substrate 10. The optical film of the present invention is produced by the above-described production method so that the low refractive index fine particles and/or the low refractive index resin ' contained in the second composition are present in the film thickness direction of the HC layer. The interface side on the opposite side of the light-transmitting substrate is more on the side of the light-transmitting substrate, and the smaller the distribution on the side of the light-transmitting substrate, the less Hc is obtained, and the suppressed Hc can be obtained. The occurrence of interference fringes in the layer due to the difference in refractive index between the low-refractive-index microparticles and/or the low-refractive-index resin and the resin of the Schematic Hc layer, and the interference pattern at the boundary between the HC layer and the substrate, and An optical film with excellent visibility. Furthermore, since the coating film is dried without pre-baking, and then hardened by light irradiation or heating, drying, light irradiation or heating is performed instead of pre-baking. In the case of hardening, there is no such thing as the case where the low-refractive-index layer and the iiC layer are formed by successive double-layer coating, or the simultaneous coating is formed as in Patent Document 2, and it is clear that there is no case in the case of 99141183 201128216. The layer interface has anti-reflection function, and can suppress the occurrence of interference fringes between the layers while maintaining the haze value, the total light transmittance, and the non-spotted surface shape, and the adhesion is improved, and by the substrate In the vicinity, the ratio of the hard coat composition having the same refractive index as the refractive index of the substrate is increased, and the occurrence of interference fringes between the hard coat layer and the substrate is suppressed, and the adhesion is excellent. The optical film of the present invention may be coated with other functional layer compositions to form other functional layers as described in the above production method, for example, when antistatic is applied to the light transmissive substrate side of the first composition. When the composition for the layer is formed to form an antistatic layer, it is formed as a layer of the antistatic layer 140 and the HC layer 20 from the side of the light-transmitting substrate 1 as shown in FIG. Further, as shown in Fig. 5, an anti-fouling layer 150 may be provided on the opposite side of the HC layer from the light-transmitting substrate. The dry film thickness of the HC layer (hereinafter also referred to as "film thickness") can be appropriately adjusted in accordance with the desired properties. For example, the film thickness is preferably 20 μm. The film thickness of the other functional layers can be appropriately adjusted. For example, the film thickness of the antistatic layer is preferably 0.05 to 5 μm. The film thickness of the antifouling layer is preferably 〇. The optical film of the present invention can adjust the reflectance by appropriately adjusting the type and content of the low refractive index fine particles and the low refractive index resin of the second composition, and adjusting the reflectance of the incident light. The reflectance is preferably from 1 to 3.75, more preferably from 1 to 3.4. 099141183 40 201128216 The reflectance is based on the product name V7100 UV-Vis spectrophotometer, and the product name VAR-7010 Absolute reflectance measuring device manufactured by 分本分光(股). °, the polarizer is N-polarized, the measurement wavelength range is 380 to 780 nm', and a black tape is bonded to the optical film on the side of the TAC substrate, and this is placed in a device and measured. Further, the average value of the measurement results obtained by using the measurement wavelength range is regarded as the reflectance. The haze value of the optical film of the present invention can be appropriately adjusted in accordance with the desired properties, preferably 〇1 to 1.0%, more preferably 〇?~〇 4%. The dentate sf value can be measured by JIS Κ7136 using the Resident Murakami Color Research Institute. In a preferred embodiment of the optical film of the present invention, an optical layer of a hard coat layer is provided on one side of the light-transmitting substrate, and in the film thickness direction of the hard coat layer, the primary refractive index particles are present in the above (4) The transmissive substrate (4) is more on the side of the interface side than the side on the side of the light-transmitting substrate 1 and the lower the amount of the low-refractive-index particles is, the less the amount of the low-refractive-index particles is present. The interface on the opposite side of the substrate faces the side of the light-permeable substrate, and the low-refractive-index component is gradually reduced, and there is no layer interface at the surface of the light-coated substrate. In the checkerboard adhesion test, the adhesion ratio can be made % to (10)%. As shown in Fig. 1, by using ^# & into such a low-refractive-index microparticle as a cloth in the HC layer, it has an anti-reflection function, and the 持^ 准 持 value, total light transmittance And ',,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The ratio of the composition of the same refractive index to 099141183 41 201128216 inhibits the occurrence of interference fringes between the hard coat layer and the substrate, and an optical film excellent in adhesion can be obtained. The layer interface in the hard coat layer is referred to as shown in Fig. 2, and an interface (boundary) occurs in the hardened portion of the composition in the layer. Specific examples of the layer interface include the boundary of the hardened portion of the two compositions shown in Fig. 9 which will be described later. In a preferred embodiment of the optical film of the present invention, the film thickness direction of the hard coat layer may be 'from the opposite side of the light-transmitting substrate to the dry film thickness of 70 In the region up to %, 70 to 100% of the total amount of the low refractive index fine particles are present. Thereby, the antireflection property of the optical film can be improved efficiently. The total light transmittance (?) of the optical film of the present invention is preferably from 90% or more, more preferably from 92% or more, from the viewpoint of transparency. The total light transmittance of the optical film can be measured by using a measuring instrument having the same haze value according to JIS K7361. (Polarizing Plate) The polarizing plate of the present invention is characterized in that a polarizing plate is provided on the side of the optical film opposite to the light-transmitting substrate of the hard coat layer. Fig. 6 is a schematic view showing an example of the layer constitution of the polarizing plate of the present invention. The polarizing plate 2 shown in FIG. 6 is provided with an optical groove film 1 in which an hc layer 2 is provided on a light-transmitting substrate 1A, and a polarizing plate 180' in which a protective film 160 and a polarizing layer 170 are laminated. A polarizing plate 180 is provided on the side of the opposite side of the light-transmitting substrate 1 of the film 1 # HC layer 20. 099141183 42 201128216 Externally, in the case of the opposite side of the hard coating, the permeable substrate side arranging sheet is not only optical _ and the polarizing film is a singularity, but also constitutes a component constituting the optical _ The situation of the components of the Qian Guang film. In the case where the polarizing plate of the present invention is used for a display panel, the display panel is usually disposed on the side of the polarizer. Further, in the case of the related optical film, if the above optical film is used, the other configuration of the polarizing plate of the present invention will be described with reference to the description of the optical film. (Polarizing Sheet) The eccentricity used in the present invention is based on the premise that _ has a predetermined polarization characteristic: the rest is not particularly limited, and a polarizer used in a liquid crystal display device can be used. The polarizer is in a form in which a predetermined polarizing characteristic is maintained for a long period of time, and the other restrictions may be made by, for example, only a polarizing layer, and the protective film may be attached to θ. When the protective film and the polarizing layer are bonded together, the protective film may be formed on both sides of the polarizing layer. The partial layer can usually be formed by using a film composed of polyethyl _ to be formed by a uniaxial stretching to form a complex of poly W alcohol and moth. 〇: 2: protective film: can protect There is no particular limitation on the rest of the above-mentioned layer and the month under which the desired light is transmitted. 099141183 43 201128216 The light transmittance of the protective film is preferably 80% or more, more preferably 90% or more in the visible light region. Further, the transmittance of the above protective film can be measured in accordance with JIS K7361-l (Test method for total light transmittance of plastic-transparent material). Examples of the resin constituting the protective film include a cellulose derivative, a cycloolefin resin, a polydecyl methacrylate, a polyvinyl alcohol, a polyimide, a polyarylate, and a polyethylene terephthalate. Ester and the like. Among them, a cellulose derivative or a cycloolefin resin is preferably used. The protective film may be composed of a single layer or a plurality of layers. Further, in the case where the protective film is laminated by a plurality of layers, a plurality of laminated layers of the same composition may be used, and a plurality of laminated layers having different compositions may also be used. Further, the thickness of the protective layer is such that the flexibility of the partial yarn of the present invention can be formed within a desired range', and the size of the polarizer can be changed by a predetermined range (10) by adhering to the polarizing layer. The remaining portion has no limitation of (4), but is preferably in the range of 5 to 200 / πη, more preferably in the range of 15 to 15 〇 Mm, and particularly preferably in the range of 30 to _m. If the thickness is thinner than 5, the size change of the polarizing plate of the present invention may become large. Further, if the thickness is 2, for example, when the polarizing plate of the present invention is subjected to cutting, there is a possibility that the processing chips are increased or the wear of the cutting blade is increased. The protection 臈 can also be a phase difference. By using the phase difference protective film, there is an advantage that the polarizing plate of the present invention forms the viewing angle compensating function of the display panel. 099141183 44 201128216 The protective film has a phase difference, and the rest is not particularly limited insofar as it exhibits the desired phase difference. Such a phenomenon is such that the protective film has a single-layer structure and contains an optical property exhibiting phase difference, a developing agent, a phase difference, and a resin composed of the above-mentioned resin. On the protective film, a structure in which a phase difference layer containing a refractive index anisotropic compound is laminated is formed, whereby a phase difference property is obtained. In the present invention, any of these aspects is suitable for use. (Display) The display of the present invention is characterized in that a display panel is disposed on the side of the optical film opposite to the light-transmitting substrate of the hard coat layer. The display may be, for example, an LCD, a PDP, an ELD (organic EL, inorganic), a CRT, or the like. The display is composed of a display panel of a viewer side member of the display and a back side member including a driving portion. In the case where the liquid crystal display is described as an example, the "display panel" is a member composed of two glass plates (for example, a color filter substrate and an array substrate) that block liquid crystal material, a polarizing plate, and an optical film of the present invention. As an example of the liquid crystal display, the "back side side member" is a member composed of a light source called "backlight", a drive circuit for controlling the LCD, a circuit for controlling the light source, and a casing. In this case, a liquid crystal display layer is composed of a backlight unit including a light guide plate or a diffusion film, and a polarizing plate, an array substrate, a liquid crystal layer, a color filter substrate, and a polarizing plate are sequentially laminated on the viewer side. And an optical film. 099141183 45 201128216 Another example of the above display PDP includes a front glass substrate and a rear glass substrate. The back glass substrate is disposed in a state in which a discharge gas is sealed between the surface glass substrate and the surface glass substrate. In the case where the display is PDp, the optical film is provided on the surface of the surface glass substrate or on the front panel (glass substrate or film substrate). The display device may be, for example, an ELD device that vaporizes a light-emitting body such as zinc sulfide or a diamine substance that emits light when a voltage is applied, and controls the voltage applied to the substrate to be displayed on the glass substrate, or A display such as a CRT that converts an electronic signal into light to produce an image that is visible to the naked eye. In this case, the above optical film is provided on the surface of the ELD device or the outermost surface of the CRT or the front panel thereof. [Examples] Hereinafter, the present invention will be further described by way of examples. The description of these does not limit the invention. The low-refractive-index microparticles are hollow cerium oxide microparticles (trade name: THRULYA8DAS (average particle diameter: 5 〇 nm, MIBK dispersion, solid fraction 20%) using a daily spheroidal catalyst. The first shank j 曰 (1) The brand name beamset DK1 (weight average molecular weight 2G 嶋, solid content 75%, mibk solvent) manufactured by Arakawa Chemical Industry Co., Ltd. is used. The first private sputum (2) is a pentaerythritol triacrylate manufactured by sulfonamide. A low-refractive-index resin having the first resin is a LINC-3A manufactured by Kyoei Chemical Co., Ltd. (the general formula (1) shown below is a tripropylene-based seventeen gas-powder-based group - 099141183 46 201128216 pentaerythritol (main a component), a mixture with pentaerythritol triacrylate). [Chemical Formula 1] General Formula (1)

、。-CH2—γ - CH2—〇一c-CH=CH2,. -CH2—γ - CH2—〇一c-CH=CH2

CF3—-CFCF3—CF

ch2 ΟCh2 Ο

聚合起始劑係使用日本汽巴(股)製商品名 IRGACURE(Irg)184。 均塗劑係使用DIC(股)製商品名MCF35〇_5(固形份5%)。 溶劑係使用MIBK。 光穿透性基材係使用富士薄膜(股)製TAC基材、商品名 TD80UL(厚度 80μηι)。 另外苐組成物及第一組成物的黏度係使用Anton Paar 公司製MCR301,依測定夾具為pp50、測定溫度為25^、 剪切速度為10000[l/s]的條件,將測定對象的組成物(油墨) 適量滴下於平台上並進行測定。 乾燥膜厚的測定係使用Mitutoyo製商品名DIGIMATIC INDICATOR CODE215-403,在玻璃上放置測定對象的樣品 並進行測定。 各化合物的簡稱分別如下: 099141183 47 201128216 ΡΕΤΑ :季戊四醇三丙烯酸酯 ΜΙΒΚ :甲基異丁酮 ΙΡΑ :異丙醇 TAC .二乙酿基纖維素 (第一硬塗層用硬化性樹脂組成物之調製) 分別調配人下述域成分,而㈣得第―硬塗制硬化性 樹脂組成物1及2、以及第二硬塗層用硬化性樹脂組成物卜 (第一硬塗層用硬化性樹脂組成物1) BEAMSETDKi : 64.72質量份(固形份換算48.54質量份) Irgl84 : 1.94 質量份 MCF350-5 : 0.97質量份(固形份換算〇 〇5質量份) MIBK : 32·36 質量份 (第一硬塗層用硬化性樹脂組成物2) ΡΕΤΑ : 75.49質量份(固形份換算56 62質量份)The polymerization initiator was sold under the trade name IRGACURE (Irg) 184 manufactured by Nippon Ciba. The coating agent was a trade name of MCF35〇_5 (solid content: 5%) manufactured by DIC. The solvent used MIBK. As the light-transmitting substrate, a TAC substrate made of Fujifilm Co., Ltd., and a trade name of TD80UL (thickness 80 μm) were used. Further, the viscosity of the ruthenium composition and the first composition was MCR301 manufactured by Anton Paar Co., Ltd., and the composition of the measurement target was measured under the conditions of a measurement jig of pp50, a measurement temperature of 25^, and a shear rate of 10000 [l/s]. (Ink) A suitable amount was dropped on the platform and measured. The measurement of the dry film thickness was carried out by placing a sample of the measurement target on a glass using a product name DIGIMATIC INDICATOR CODE 215-403 manufactured by Mitutoyo. The abbreviations of the respective compounds are as follows: 099141183 47 201128216 ΡΕΤΑ: pentaerythritol triacrylate ΜΙΒΚ: methyl isobutyl ketone oxime: isopropyl alcohol TAC. Diethyl styrene cellulose (modulation of the hardenable resin composition for the first hard coat layer) The first domain component is blended, and (4) the first hard coat resin composition 1 and 2, and the second hard coat resin composition (the first hard coat layer is made of a curable resin) 1) BEAMSETDKi: 64.72 parts by mass (48.54 parts by mass of solid content) Irgl84 : 1.94 parts by mass MCF350-5 : 0.97 parts by mass (5 parts by mass of solid content) MIBK : 32·36 parts by mass (first hard coat) Hardening resin composition for layer 2) ΡΕΤΑ : 75.49 parts by mass (56 62 parts by mass of solid content)

Irgl84 : 3.02 質量份 MCF350-5 : 3.02質量份(固形份換算〇 質量份) MIBK : 18.47 質量份 (第二硬塗層用硬化性樹脂組成物1) THRULYA® DAS : 75.81(固形份換算15.16質量份) BEAMSETDK1 : 13_48質量份(固形份換算1〇·11質量份) Irgl84 : 0.61 質量份 MCF350-5 : 10.11質量份(固形份換算0.51質量份) 099141183 48 201128216 (第二硬塗層用硬化性樹脂組成物2) THRULYA® DAS . 83.12(固形份換算16.62質量份) BEAMSET DK1 : 15.83質量份(固形份換算u 87質量份) Irgl84 : 0.48 質量份 MCF350-5 . 0.57質量份(固形份換算質量份) (第二硬塗層用硬化性樹脂組成物3) THRULYA® DAS : 73.95(固形份換算14.79質量份) BEAMSET DK1 : 24.65質量份(固形份換算18 49質量份) Irgl84 : 0.74 質量份 MCF350-5 : 0.67質量份(固形份換算〇 質量份) (第二硬塗層用硬化性樹脂組成物4) LINC-3A : 78.63 Irgl84 : 3.15 質量份 MCF350-5 : 15.73質量份(固形份換算〇 79質量份) MIBK : 2.49質量份 (光學薄膜之製作) (實施例1) 將上述第一硬塗層用硬化性樹脂組成物丨、及第二硬塗層 用硬化性樹脂組成物1,使用蒸發器將溶劑予以餾除,分別 將黏度調整為30mPa· s。接著,在依im/min速度進行搬送 的TAC基材(TD80UL)上’從TAC基材側依第一硬塗層用硬 化性樹脂組成物1及第二硬塗層用硬化性樹脂組成物丨的位 099141183 49 201128216 置關係施行雙層同時塗佈。此時,第一硬塗層用硬化性樹脂 組成物1及第二硬塗層用硬化性樹脂組成物1的塗膜之潤濕 膜厚,分別設為、ΙΟ/rni。 接著,將經雙層同時塗佈的塗膜,依70°C施行60秒鐘乾 燥’並於氮環境下’將紫外線依積分光通量成為12〇mj/cm2 方式施行照射而使塗膜硬化,藉此便形成乾燥膜厚10/xm的 硬塗層,便製得光學薄膜。 (比較例1) 除在實施例1中,未使用第二硬塗層用硬化性樹脂組成物 1,僅將第一硬塗層用硬化性樹脂組成物1依潤濕膜厚2〇βηι 施行塗佈,而形成乾燥膜厚9μιη的硬塗層之外,其餘均與 實施例1同樣的製作光學薄膜。 (比較例2) 除在實施例1中,未使用第一硬塗層用硬化性樹脂組成物 1,僅將第二硬塗層用硬化性樹脂組成物1依潤濕膜厚2〇/mi 施行塗佈,而形成乾燥膜厚10/rni的硬塗層之外,其餘均與 實施例1同樣的製作光學薄膜。 (比較例3) 除在實施例1中,僅將第一硬塗層用硬化性樹脂組成物1 依潤濕膜厚20/mi施行塗佈,並將該塗膜依70¾施行60秒 鐘乾燥,再於氮環境下’依紫外線成為積分光通量 120mJ/cm2的方式施行照射而使塗膜硬化,接著,再於該硬 099141183 50 201128216 化膜上’僅將第二硬塗層用硬化性樹脂組成物i依潤濕膜厚 10卿施行塗佈,再將該塗膜依7〇t施行6〇秒鐘乾燥,再 於氮每境下,將紫外線依積分光通量成為120mJ/cm2的方式 -施行照射而使塗膜硬化,便形成合計乾燥膜厚10興的硬塗 •層之外,其餘均與實施例1同樣的製作光學薄膜。 (實施例2) 將上述第-硬塗層用硬化性樹脂組成物i、及第二硬塗層 用硬化性樹脂組成物2,分別調整為黏度1〇mpa.s。接著, 在依2〇m/min速度進行搬送的TAC基材(T刪UL)上,從 TAC基材侧依第-硬塗層用硬錄樹脂喊物丨及第二硬 塗層用硬化性樹脂組成物2的位置_施行雙層同時塗 佈。此時,第-硬塗層用硬化性樹脂組成物1及第二硬塗層 用硬化性樹脂組成物2的塗膜之潤濕膜厚,分別設為 25/xm、5/im。 接著,將經雙層同日寺塗佈的塗膜,依贼施行6〇秒鐘乾 燥’再於氮環境下,將紫外線依積分光通量成為12〇爪知2 的方式施行照射*使塗膜硬化,藉此便形成乾燥膜厚心爪 的硬塗層,而製得光學薄膜。 , (實施例3) 除在實施例2中,將第—硬塗層用硬化性樹脂組成物丄、 及第二硬塗層用硬化性樹脂組成物2的塗膜之潤濕膜厚,分 別設為25μιη、Ιμιη,並形成乾燥膜厚8μηι的硬塗層之外, 099141183 51 201128216 其餘均與實施例2同樣的製作光學薄膜。 (實施例4) 除在實施例2中,將第一硬塗層用硬化性樹脂組成物1、 及第二硬塗層用硬化性樹脂組成物2的塗膜之潤濕膜厚,分 別設為18.75μιη、3.75/im,並形成乾燥膜厚6/mi的硬塗層 之外,其餘均與實施例2同樣的製作光學薄膜。 (比較例4) 除在實施例2中,未使用第二硬塗層用硬化性樹脂組成物 2’僅將第一硬塗層用硬化性樹脂組成物1依潤濕膜厚2〇Mm 施行塗佈,而形成乾燥膜厚11 μπι的硬塗層之外,其餘均與 實施例2同樣的製作光學薄膜。 (比較例5) 除在實施例2中’未使用第一硬塗層用硬化性樹脂組成物 1’僅將第二硬塗層用硬化性樹脂組成物2依潤濕膜厚1〇μιη 施行塗佈,而形成乾燥膜厚5μηι的硬塗層之外,其餘均與 實施例2同樣的製作光學薄膜。 (比較例6) 除在實施例2中,於施行第一硬塗層用硬化性樹脂組成物 1及第二硬塗層用硬化性樹脂組成物2的同時塗佈後,在乾 燥前,先於氮環境下,將紫外線依積分光通量成為50mJ/cm2 的方式施行照射(預烘烤)之外’其餘均與實施例2同樣的製 作光學薄膜。 099141183 52 201128216 (實施例5) 將上述第一硬塗層用硬化性樹脂組成物1、及第二硬塗層 用硬化性樹脂組成物3 ’分別將黏度調整為10mpa · s。接 著’在依20m/min速度進行搬送的TAC基材(TD80UL)上, 從TAC基材側起依第一硬塗層用硬化性樹脂組成物丨及第 二硬塗層用硬化性樹脂組成物3的位置關係施行雙層同時 塗佈。此時,第一硬塗層用硬化性樹脂組成物丨及第二硬塗 層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分別設為 25μιη、5μπι。 接著,將經施行雙層同時塗佈的塗膜,依70〇c施行6〇秒 鐘乾燥,再於氮環境下,將紫外線依積分光通量成為 120mJ/cm2的方式施行照射而使塗膜硬化,藉此便形成乾燥 膜厚9μηι的硬塗層,而製得光學薄膜。 (實施例6) 除在實施例5中,將第一硬塗層用硬化性樹脂組成物i、 及第二硬塗層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分 別設為25/xm、Ι/rni,並形成乾燥膜厚^拉的硬塗層之外, 其餘均與實施例5同樣的製作光學薄膜。 (實施例7) 除在實施例5中’將第一硬塗層用硬化性樹脂組成物卜 及第二硬塗層用硬化性樹脂組成物3的塗膜之潤濕膜厚,分 別設為18.75μιη、3.75μπι,並形成乾燥膜厚的硬塗層 099141183 53 201128216 之外,其餘均與實施例5同樣的製作光學薄膜。 (比較例7) 除在實施例5中,未使用第一硬塗層用硬化性樹脂組成物 1’僅將第二硬塗層用硬化性樹脂組成物3依潤濕膜厚1〇/mi 施行塗佈,而形成乾燥膜厚5μηι的硬塗層之外,其餘均與 實施例5同樣的製作光學薄膜。 (實施例8) 將上述第一硬塗層用硬化性樹脂組成物2、及第二硬塗層 用硬化性樹脂組成物4,分別將黏度調整為3〇mPa.y接 著,在依Im/min速度進行搬送的TAC基材(TD8〇UL)上, 從TAC基材側起依第-硬塗層用硬化性樹脂組成物2及第 -硬塗層用硬化性樹脂組成物4的位置關係施行雙層同時 塗佈。此時,第-硬塗層用硬化性樹脂組成物2及第二硬塗 層用硬化性樹脂組成物4的塗臈之潤濕膜厚,分別設為 20/im、ΙΟ/rni。 接著,將經施行雙層同時塗佈的塗膜,依饥施行6〇秒 鐘乾燥,再於氮環境下,將紫外線依積分光通量成為 120mJ/cm2❸方式騎麟而使㈣硬化,藉此便形成乾燥 膜厚14/mi的硬塗層,而製得光學薄膜。 (實施例9) 除在實施例8中,將雙層同時塗佈之塗膜的乾燥溫度設為 50°C之外’其餘均與實施例8同樣的製作光學薄膜。 099141183 54 201128216 (實施例ίο) 除在實施例8中,將雙層同時塗佈之塗膜的乾燥溫度設為 7〇°C之外’其餘均與實施例8同樣的製作光學薄膜。 (實施例11) 除在實施例8中,將雙層同時塗佈之塗膜的乾燥溫度設為 100°C之外,其餘均與實施例8同樣的製作光學薄膜。 (實施例12) 除在實施例10中,將第一硬塗層用硬化性樹脂組成物2、 及第二硬塗層用硬化性樹脂組成物4的塗膜之潤濕膜厚,分 別設為25評、5/xm之外,其餘均與實施例1〇同樣的製作 光學薄膜。 (比較例8) 除在實施例10中,未使用第二硬塗層用硬化性樹脂組成 物4,僅將第一硬塗層用硬化性樹脂組成物2依潤濕膜厚 20μηι施行塗佈’而形成乾燥膜厚9μπι的硬塗層之外,其餘 均與實施例1〇同樣的製作光學薄膜。 (比較例9) 除在實施例1〇中’未使用第一硬塗層用硬化性樹脂組成 物2,僅將第二硬塗層用硬化性樹脂組成物4依潤濕膜厚 ΙΟμιη施行塗佈’而形成乾燥膜厚8/xm的硬塗層之外,其餘 均與實施例1〇同樣的製作光學薄膜。 (實施例13) 099141183 55 201128216 除在實施例1中,將第一硬塗層用硬化性樹脂組成物卜 及第二硬塗層用硬化性樹脂組成物1的黏度,分別調整為 90mPa · s,並在施行同時塗佈時’將第—硬塗層用硬化性 樹脂組成物1、及第二硬塗層用硬化性樹脂組成物3的塗膜 之潤濕膜厚,分別設為25/xm、5μιη ’而形成乾燥膜厚18μπι 的硬塗層之外’其餘均與實施例1同樣的製作光學薄膜。 (比較例10) 除在實施例1中,將第一硬塗層用硬化性樹脂組成物1、 及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為 4mPa · s的方式進行調整’而形成乾燥膜厚5μιη的硬塗層 之外,其餘均與實施例1同樣的製作光學薄膜。 (比較例11) 除在實施例1中’將第一硬塗層用硬化性樹脂組成物1、 及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為 10mPa · s、4mPa · s的方式進行調整,而形成乾燥膜厚9/zm 的硬塗層之外,其餘均與實施例1同樣的製作光學薄膜。 (比較例12) 除在實施例1中’將第一硬塗層用硬化性樹脂組成物1、 及第二硬塗層用硬化性樹脂組成物1的黏度,分別成為 62mPa.s、10mPa,s的方式進行調整’而形成乾燥膜厚i7/xm 的硬塗層之外’其餘均與實施例1同樣的製作光學薄膜。 (比較例13) 099141183 56 201128216 在實施例1中,將第一硬塗層用硬化性樹脂組成物1、及 第二硬塗層用硬化性樹脂組成物1的黏度,分別成為 10mPa · s的方式進行調整,再將該經調整的2個組成物依 與實施例1中所使用的相同量進行混合,然後將該經混合 的組成物塗佈於TAC基材上。此時,該經混合的組成物之 塗膜潤濕膜厚係設為30μηι p 其次,將該塗膜依與實施例1同樣的施行乾燥、光照射, 而形成乾燥膜厚ΙΟμηι的硬塗層,便製得光學薄膜。 上述實施例及比較例中所使用的組成物種類、潤濕膜厚、 塗佈方式、乾燥膜厚及乾燥條件、以及TAC基材的搬送速 度,整理如下表1所示。 099141183 57 201128216 [表1] 表1 繼(編鄉 黏度(mPa · s) 潤濕膜/Κ/·αη) 塗佈方式 合計輕 燥满 ㈣ 嫌射牛 TAC紐 (m/min) 第一 .喊物 第二 組成物 第一 !碱救 第二組成物 黏麟 第一 !贼物 第二 系贼物 實施例1 1 1 30 30 0 20 10 同時塗佈 10 70〇C ' 60 秒 1 tbf交例1 1 無 30 無 30 20 無 普通塗佈 9 70°C ' 60 秒 1 tbfe#J2 無 1 無 30 30 無 20 普通塗佈 10 70。。' 60 秒 1 tbfef歹丨J3 1 1 30 30 0 20 10 逐次塗佈 10 70〇C ' 60秒 1 實施分J2 1 2 10 10 0 25 5 同時塗佈 11 70〇C ' 60秒 20 實施歹丨J3 1 2 10 10 0 25 1 同時塗佈 8 70〇C ' 60 秒 20 雜·ί歹丨J4 1 2 10 10 0 18.75 3.75 同時塗佈 6 70。(: ' 60秒 20 财交例4 1 無 10 無 10 20 無 普通塗佈 11 70〇C ' 60 秒 20 財交例5 無 2 無 10 10 無 10 普通塗佈 5 70〇C ' 60 秒 20 fcb|交例6 1 2 10 10 0 25 5 同時塗佈 9 雜烤後7〇〇C、60秒 20 實施例5 1 3 10 10 0 25 5 同時塗佈 9 70〇C ' 60 秒 20 實施例6 1 3 10 10 0 25 1 同時塗佈 8 70。(: ' 60秒 20 實施你J7 1 3 10 10 0 18.75 3.75 同時塗佈 5 70。。' 60 秒 20 tbferf歹丨]7 無 3 無 10 10 無 10 普通塗佈 5 70〇C ' 60 秒 20 你包例8 2 4 30 30 0 20 10 同時塗佈 14 25°C、60秒 1 實施例9 2 4 30 30 0 20 10 同時塗佈 14 50。。、60秒 1 實施例10 2 4 30 30 0 20 10 同時塗佈 14 70°C ' 60秒 1 實施例11 2 4 30 30 0 20 10 同時塗佈 14 100〇C ' 60 秒 1 實施例12 2 4 30 30 0 25 5 同時塗佈 14 70〇C ' 60秒 1 tbfei列 8 2 無 30 無 30 20 無 普通塗佈 9 70。。' 60 秒 1 tb$交例9 無 4 無 30 30 無 10 普通塗佈 8 70°C、60秒 1 實施例13 1 1 90 90 0 25 5 同時塗佈 18 70。。' 60 秒 1 tb|交例10 1 1 4 4 0 20 10 同時塗佈 5 70。。' 60秒 1 tb|交例11 1 1 10 4 6 20 10 同時塗佈 9 70T:' 60秒 1 tb$交例12 1 1 62 10 52 20 10 同時塗佈 17 70。。' 60秒 1 比較例13 1 1 10 10 0 30 普通塗佈 10 70t ' 60 秒 1 099141183 58 201128216 (光學薄膜之評估) 相關上迷實施例及比較例的光學薄膜,分別依如下述針對 反射率霧值(Hz)及全光線穿透率進行測定。又,相關上述 :實施例及比較例的光學薄臈,分別依如下述施行干涉紋評 ; 估。結果如表2所示。 再者只知例1的光學薄膜截面照片係如圖7及8所示, 比較例3的光學薄膜截面照片係如圖9所示。另外,圖8 勺截面’、,、片’係圖7的照片中,HC層靠ΤΑ。基材的對向側 之界面側放大照片。 (反射率之測定) 反射率的測疋係使用曰本分光(股)製商品名 V7100型紫 外可見分光光度計、及日本分光(股)製商品名 VAR-7010 絕 對反射率測定裝置,依入射角設為5。、偏光片為N偏光、 測疋波長範圍為380〜780nm,在光學薄膜靠TAC基材側貼 合著黑色膠帶’再將其設置於裝置上並進行測定。另外,將 依測定波長範圍所求得測定結果的平均值,視為反射率。 (霧值及全光線穿透率之測定) 霧值及全光線穿透率分別係根據JIS K-7136、JIS K7361 ’利用反射•穿透率計HM-150(村上色彩技術研究所(股)製) 進行測定。 (干涉紋之評估) 使用FUNATECH(股)製干涉紋檢查燈(Na燈),依目視進 099141183 59 201128216 行檢查,並依下述基準施行評估。 〇:幾乎無發現有干涉紋發生者 △:能模糊看到干涉紋者 X:明顯看到干涉紋者 [表2] 表2 特性 反射率(%) 霧值(%) 全光線穿透率Tt(%) 干涉紋 密接率 面狀(紋斑) 實施例1 3.17 0.5 92.2 〇 100% 〇 比較例1 4.11 0.2 92.3 〇 100% 〇 比較例2 2.76 0.8 92.3 X 83% 〇 比較例3 2.78 0.6 92.5 Δ 97% 〇 實施例2 3.12 0.4 92.2 〇 100% 〇 實施例3 3.25 0.3 92.5 〇 98% 〇 實施例4 3.32 0.4 92.4 〇 100% 〇 比較例4 4.05 0.2 92.3 〇 100% 〇 比較例5 2.67 2.3 92.5 X 75% 〇 比較例6 3.16 0.4 92.5 〇 87% 〇 實施例5 3.29 0.5 92.4 〇 97% 〇 實施例6 3.23 0.3 92.6 〇 99% 〇 實施例7 3.33 0.5 92.6 〇 99% 〇 比較例7 3.02 2.5 92.6 X 88% 〇 實施例8 3.50 0.3 92.2 〇 100% 〇 實施例9 3.52 0.3 92.3 〇 100% 〇 實施例10 3.75 0.3 92.3 〇 100% 〇 實施例11 3.75 0.3 92.4 〇 100% 〇· 實施例12 3.63 0.3 92.3 〇 100% 〇 比較例8 4.11 0.2 92.3 〇 100% 〇 比較例9 3.20 0.8 92.1 X 0% 〇 - 實施例13 3.09 0.9 91.5 〇 91% 〇 比較例10 3.80 0.4 92.3 〇 100% 〇 比較例11 3.75 0.5 92.3 〇 100% Δ 比較例12 無法測定 無法測定 無法測定 — — X 比較例13 3.77 0.4 92.4 Δ 92% 〇 60 099141183 201128216 (密接性之評估) 分別施行下述所 因而無法測定。 不 針對上述實施例及比較例的光學薄膜, 棋盤格密接性試驗的密接率測定。 另外’針對比較例12 ’因為面狀差, (棋盤格密接性試驗) 在光學薄膜靠HC層側表面上劃入 inim四方且合計ι〇〇 格的棋餘,使謂CHIBAN(股)製卫_ 2細賽路膠帶 (註冊商標)騎5 :欠連_賴驗,並根針絲準計算未 剝落而殘留的方格比例。 〃 密接率(%)=(未剝落的方格數/合計的方格數卿剛 (面狀之評估) 佈紋斑)利用目視進行 針對光學薄臈的外觀面狀(有無塗 評估。 〇:未看到塗佈紋斑者 △:能模糊看到塗佈紋斑者 X:明顯看到塗佈紋斑者 (結果整理) 由表2中得知,杳 μ八# & & 列均屬於反射率及霧值較低。實施例 的王光線穿透率呈91 s 0 以上的較高值。又’實施例均已抑 制十步、,文發生。又,音 只知例的密接性與面狀均呈良好。特別 係例1與實施例2的面狀較為良好。 由實施例1的光學薄膜剖視圖之圖7及圖8得知,中空二 099141183 61 201128216 氧化矽微粒子呈從HC層靠TAC基材的對向侧(上層側)起, 越靠TAC基材側則越減少的分佈,由圖8中得知,中空二 氧化矽微粒子,幾乎均分佈於從HC層靠TAC基材的對向 侧之界面起至5μηι處。 再者,若將圖7〜圖9進行比對,得知實施例i的情況, 第組成物經硬化部分、與第二組成物經硬化部分的邊界, 相較於比較例3之下,前者較為不明顯。 但疋,相當於貫施例1中無第二組成物情況的比較例】, 因為未含有中空二氧化矽微粒子,因而呈現僅與一般硬塗層 為相同的反射率。 相田於貫施例1中無第—組成物情況的比較例2,會有干 涉紋發生’密接率亦偏低。此現象推測係因為第二組成物中 所含的中空二氧化錢粒子,在HC層呈均勻分佈,並位於 HC層* TAC基材側界面,因而導致TAC基材與中空二氧 化石夕微粒子間之折射率差變大,而造成干涉朗發生。又, 推測依此因中空二氧化發微粒子位於hc層靠tac基材側 界面,造A HC料樹月旨渗透入TAC基材中並硬化的面積 縮小,導致密接性降低。 相备於在貫施例1巾並非施行同時塗佈而是施行逐次塗 佈I#况的比較例3 ’會模糊看到干涉紋。此現象推測如圖9 的截面照片所看到’第1成祕硬化部分與第二組成物經 更化4刀的邊界呈’區分’因該邊界部分的折射率差導致 099141183 62 201128216 干涉紋發生。 相當於實施例2中無第二組成物情況的比較例4,如同比 較例1,反射率形成僅與一般硬塗層相同的反射率。 相當於實施例2中無第一組成物情況的比較例5,如同比 較例2,會有干涉紋發生,且密接率亦偏低。 相當於實施例2中在乾燥前有施行預烘烤情況的比較例 6,密接率偏低。此現象推測因預烘烤的施行,導致第一組 成物與第二組成物進行硬化(樹脂的聚合或交聯),造成TAC 基材側的第一組成物中所含第一樹脂,並未充分滲透入TAC 基材中。 相當於實施例5中無第一組成物情況的比較例7,如同比 較例2,會有干涉紋發生,且密接率亦偏低。 相當於實施例10中無第二組成物情況的比較例8,如同 比較例1,僅成為與一般硬塗層為相同的反射率。 相當於實施例10中無第一組成物情況的比較例9,如同 比較例2,會有干涉紋發生,且密接率亦偏低。 相當於實施例1中第一組成物與第二組成物的黏度均較 小情況的比較例10,反射率較低於比較例1,但較高於實施 例1。此現象推測係因二個組成物的黏度較低,導致二個組 成物進行混合,造成在HC層靠TAC基材的對向侧(上層側) 所存在中空二氧化矽微粒子減少,導致反射率提高。 相當於實施例1中HC層上層側的第二組成物黏度較小情 099141183 63 201128216 況之比較例11,面狀非屬良好。 相當於實施例1中第一組成物與第二組成物的黏度差較 大情況之比較例12,有大量發生HC層表面的紋斑,導致 表面非呈平滑,造成因光的散射而無法進行反射率、霧值及 王光線穿透率的測定。 相當於實施例1中將第一組成物與第二組成物呈均勻混 合物施行塗佈情況的比較例13,反射率係與比較例1〇同等 級。又,會有干涉紋發生,且密接率亦偏低。此現象推測因 二個組成物經均勻混合後才施行塗佈,便如同比較例10, 在HC層靠TAC基材的對向側所存在中空二氧化矽微粒子 會減少’導致反射率提高。又,如同比較例2,因中空二氧 化矽微粒子位於HC層靠TAC基材側界面,導致干涉紋發 生’造成密接率降低。 【圖式簡單說明】 圖1為依照本發明製造方法所獲得光學薄膜的HC層中, 低折射率微粒子分佈一例的截面示意圖。 圖2為依照習知逐次雙層塗佈方式所獲得抗反射膜的低 折射率層中,低折射率微粒子分佈一例的截面示意圖。 圖3為本發明光學薄膜之製造方法中,將第一及第二HC 層用硬化性樹脂組成物施行同時塗佈的步驟一例示意圖。 圖4為本發明第二光學薄膜的層構造一例示意圖。 圖5為本發明第二光學薄膜的層構造另一例示意圖。 099141183 64 201128216 圖6為本發明偏光板的層構造一例示意圖。 圖7為實施例1的光學薄膜剖視圖。 圖8為實施例1的光學薄膜之硬塗層,在靠光穿透性基材 對向側的界面部分之放大剖視圖。 圖9為比較例3的光學薄膜剖視圖。 【主要元件符號說明】 1 光學薄膜 2 偏光板 10 光穿透性基材 20 硬塗層 30 低折射率微粒子 40 模頭 51 ' 52 狹缝 60 第一硬塗層用硬化性樹脂組成物 61 第一硬塗層用硬化性樹脂組成物之塗膜 70 第二硬塗層用硬化性樹脂組成物 71 第二硬塗層用硬化性樹脂組成物之塗膜 80 塗佈高度 90 第一及第二組成物之合計潤濕膜厚 100 習知抗反射膜 110 習知硬塗層 120 低折射率層 099141183 65 201128216 130 光穿透性基材之搬送方向 140 抗靜電層 150 防污層 160 保護膜 170 偏光層 180 偏光片 099141183 66Irgl84 : 3.02 parts by mass MCF350-5 : 3.02 parts by mass (solid content converted by mass parts) MIBK : 18.47 parts by mass (hardenable resin composition for second hard coat layer 1) THRULYA® DAS : 75.81 (solid content conversion 15.16 mass) (part) BEAMSETDK1 : 13_48 parts by mass (1〇·11 parts by mass of solid content) Irgl84 : 0.61 parts by mass MCF350-5 : 10.11 parts by mass (0.51 parts by mass of solid content) 099141183 48 201128216 (hardenability for second hard coat layer) Resin composition 2) THRULYA® DAS . 83.12 (16.62 parts by mass of solid content) BEAMSET DK1 : 15.83 parts by mass (87 parts by mass of solids) Irgl84 : 0.48 parts by mass MCF350-5 . 0.57 parts by mass (solid content conversion mass) (Part 2) Hardening resin composition for second hard coat 3 THRULYA® DAS : 73.95 (14.79 parts by mass of solid content) BEAMSET DK1 : 24.65 parts by mass (18 49 parts by mass of solid content) Irgl84 : 0.74 parts by mass MCF350 -5 : 0.67 parts by mass (calculated as solid content) (Current resin composition for second hard coat layer 4) LINC-3A : 78.63 Irgl84 : 3.15 parts by mass MCF350-5 : 15.73 parts by mass (solid content conversion) 79 parts by mass) MIBK: 2.49 parts by mass (production of optical film) (Example 1) The first hard coat layer curable resin composition 丨 and the second hard coat layer curable resin composition 1 are used. The solvent was distilled off by the evaporator, and the viscosity was adjusted to 30 mPa·s, respectively. Then, on the TAC substrate (TD80UL) which is transported at the im/min speed, 'the hard curable resin composition 1 for the first hard coat layer and the curable resin composition for the second hard coat layer are used from the TAC substrate side. The position of 099141183 49 201128216 is related to the implementation of double-layer simultaneous coating. In this case, the wet film thickness of the coating film of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer is set to ΙΟ/rni. Next, the coating film which was simultaneously coated by the double layer was dried at 70 ° C for 60 seconds, and the ultraviolet light was irradiated to the film according to the integrated luminous flux of 12 〇mj/cm 2 in a nitrogen atmosphere to cure the coating film. Thus, a hard coat layer having a dry film thickness of 10/xm was formed to obtain an optical film. (Comparative Example 1) In the first embodiment, the curable resin composition 1 for the second hard coat layer was not used, and only the curable resin composition 1 for the first hard coat layer was subjected to a wetting film thickness of 2 〇βηι. An optical film was produced in the same manner as in Example 1 except that a hard coat layer having a dry film thickness of 9 μm was formed by coating. (Comparative Example 2) In the first embodiment, the curable resin composition 1 for the first hard coat layer was not used, and only the curable resin composition 1 for the second hard coat layer was wetted to a thickness of 2 〇/mi. An optical film was produced in the same manner as in Example 1 except that the coating was applied to form a hard coat layer having a dry film thickness of 10/rni. (Comparative Example 3) Except that in Example 1, only the curable resin composition 1 for the first hard coat layer was applied at a wetting film thickness of 20/mi, and the film was dried by applying 702⁄4 for 60 seconds. Further, the coating film is cured by irradiation with an ultraviolet light having an integrated luminous flux of 120 mJ/cm 2 in a nitrogen atmosphere, and then the second hard coat layer is made of a curable resin on the hard 099141183 50 201128216 film. The coating i is applied according to the wetting film thickness of 10 qing, and then the coating film is dried for 6 〇 seconds for 7 〇t, and then the ultraviolet ray is integrated into the light flux of 120 mJ/cm 2 according to the integrated light flux. Further, an optical film was produced in the same manner as in Example 1 except that the coating film was cured to form a hard coating layer having a total dry film thickness of 10 Å. (Example 2) The curable resin composition i for the first hard coat layer and the curable resin composition 2 for the second hard coat layer were each adjusted to have a viscosity of 1 〇 mPa.s. Next, on the TAC substrate (T-cut UL) conveyed at a speed of 2 〇m/min, the hard-coating resin for the first-hard coat layer and the hardenability for the second hard coat layer are used from the TAC substrate side. The position of the resin composition 2 was applied at the same time as the double layer. In this case, the wet film thickness of the coating film of the curable resin composition 1 for the first hard coat layer and the curable resin composition 2 for the second hard coat layer is set to 25/xm and 5/im, respectively. Next, the coating film applied by the double-layered same-day temple is dried by the thief for 6 seconds, and then the ultraviolet light is irradiated with the integrated luminous flux to become 12 〇 claws. Thereby, a hard coat layer of a thick film of the dried film is formed, and an optical film is produced. (Example 3) The wetting film thickness of the coating film of the curable resin composition for the first hard coat layer and the curable resin composition 2 for the second hard coat layer in Example 2, respectively An optical film was produced in the same manner as in Example 2 except that a hard coat layer having a dry film thickness of 8 μm was formed at 25 μm and Ιμηη, and 099141183 51 201128216 was used. (Example 4) In the second embodiment, the wetting film thickness of the coating film for the first hard coat layer curable resin composition 1 and the second hard coat layer curable resin composition 2 is set separately. An optical film was produced in the same manner as in Example 2 except that it was 18.75 μm, 3.75/im, and a hard coat layer having a dry film thickness of 6/mi was formed. (Comparative Example 4) Except that in the second embodiment, the curable resin composition for the second hard coat layer 2' was used, and only the curable resin composition 1 for the first hard coat layer was subjected to a wetting film thickness of 2 〇Mm. An optical film was produced in the same manner as in Example 2 except that a hard coat layer having a dry film thickness of 11 μm was formed by coating. (Comparative Example 5) The second hard coat layer curable resin composition 2 was subjected to a wetting film thickness of 1 〇 μιη except that the curable resin composition 1 for the first hard coat layer was not used in the second embodiment. An optical film was produced in the same manner as in Example 2 except that a hard coat layer having a dry film thickness of 5 μm was formed by coating. (Comparative Example 6) After the application of the curable resin composition 1 for the first hard coat layer and the curable resin composition 2 for the second hard coat layer in the second embodiment, before drying, An optical film was produced in the same manner as in Example 2 except that the ultraviolet light was irradiated (prebaked) so that the integrated luminous flux was 50 mJ/cm 2 in a nitrogen atmosphere. 099141183 52 201128216 (Example 5) The first hard coat layer curable resin composition 1 and the second hard coat resistive resin composition 3' were each adjusted to have a viscosity of 10 mPa·s. Then, the curable resin composition for the first hard coat layer and the curable resin composition for the second hard coat layer are formed from the TAC substrate side on the TAC substrate (TD80UL) which is conveyed at a speed of 20 m/min. The positional relationship of 3 is applied at the same time as the double layer. In this case, the wetting film thickness of the coating film for the curable resin composition for the first hard coat layer and the curable resin composition 3 for the second hard coat layer is set to 25 μm and 5 μm, respectively. Then, the coating film which was applied at the same time as the double layer was dried at 70 ° C for 6 sec, and the ultraviolet ray was irradiated so as to have an integrated luminous flux of 120 mJ/cm 2 in a nitrogen atmosphere to cure the coating film. Thereby, a hard coat layer having a dry film thickness of 9 μm was formed to obtain an optical film. (Example 6) In the fifth embodiment, the wetting film thickness of the coating film for the first hard coat layer curable resin composition i and the second hard coat layer curable resin composition 3 is set separately. An optical film was produced in the same manner as in Example 5 except that it was 25/xm, Ι/rni, and a hard coat layer having a dry film thickness was formed. (Example 7) The wet film thickness of the coating film of the curable resin composition for the first hard coat layer and the curable resin composition 3 for the second hard coat layer was set to be the same as in Example 5, respectively. An optical film was produced in the same manner as in Example 5 except that 18.75 μm, 3.75 μm, and a hard coating layer having a dry film thickness of 099141183 53 201128216 were formed. (Comparative Example 7) In the fifth embodiment, the curable resin composition 1' for the first hard coat layer was not used, and only the curable resin composition 3 for the second hard coat layer was wetted to a thickness of 1 〇/mi. An optical film was produced in the same manner as in Example 5 except that the coating was applied to form a hard coat layer having a dry film thickness of 5 μm. (Example 8) The curable resin composition 2 for the first hard coat layer 2 and the curable resin composition 4 for the second hard coat layer were each adjusted to have a viscosity of 3 μmPa.y, followed by Im/ Positional relationship between the curable resin composition 2 for the first-hard coat layer and the curable resin composition 4 for the first hard coat layer from the TAC substrate side on the TAC substrate (TD8〇UL) Apply a double layer at the same time. In this case, the wetting film thickness of the curable resin composition 2 for the first hard coat layer and the curable resin composition 4 for the second hard coat layer is set to 20/im and ΙΟ/rni, respectively. Next, the coating film which is applied at the same time by double layer is dried for 6 seconds, and then ultraviolet rays are immersed in a nitrogen atmosphere to form a light flux of 120 mJ/cm 2 to harden (4), thereby forming An optical film was prepared by drying a hard coat layer having a film thickness of 14/mi. (Example 9) An optical film was produced in the same manner as in Example 8 except that in Example 8, the drying temperature of the coating film simultaneously coated with both layers was 50 °C. 099141183 54 201128216 (Example ίο) An optical film was produced in the same manner as in Example 8 except that in Example 8, the drying temperature of the coating film simultaneously coated with both layers was changed to 7 °C. (Example 11) An optical film was produced in the same manner as in Example 8 except that in Example 8, the drying temperature of the coating film simultaneously coated with both layers was changed to 100 °C. (Example 12) In the tenth embodiment, the wet film thickness of the coating film for the first hard coat layer curable resin composition 2 and the second hard coat layer curable resin composition 4 is set separately. An optical film was produced in the same manner as in Example 1 except for 25 evaluations and 5/xm. (Comparative Example 8) In the tenth embodiment, the curable resin composition 4 for the second hard coat layer was not used, and only the curable resin composition 2 for the first hard coat layer was applied by a wetting film thickness of 20 μm. An optical film was produced in the same manner as in Example 1 except that a hard coat layer having a dry film thickness of 9 μm was formed. (Comparative Example 9) Except that the first hard coat layer curable resin composition 2 was not used in the first embodiment, only the second hard coat layer curable resin composition 4 was applied by the wetting film thickness ΙΟμηη. An optical film was produced in the same manner as in Example 1 except that a cloth having a dry film thickness of 8/xm was formed. (Example 13) 099141183 55 201128216 In addition to the first embodiment, the viscosity of the curable resin composition for the first hard coat layer and the curable resin composition 1 for the second hard coat layer were adjusted to 90 mPa·s. In the simultaneous application, the wetting film thickness of the coating film for the first hard coat layer 1 and the second hard coat layer curable resin composition 3 is set to 25/. An optical film was produced in the same manner as in Example 1 except that xm and 5 μm were formed to form a hard coat layer having a dry film thickness of 18 μm. (Comparative Example 10) In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer was changed to 4 mPa·s. An optical film was produced in the same manner as in Example 1 except that a hard coat layer having a dry film thickness of 5 μm was formed. (Comparative Example 11) In the first embodiment, the viscosity of the curable resin composition 1 for the first hard coat layer and the curable resin composition 1 for the second hard coat layer was 10 mPa·s and 4 mPa, respectively. An optical film was produced in the same manner as in Example 1 except that the method of s was adjusted to form a hard coat layer having a dry film thickness of 9/zm. (Comparative Example 12) The viscosity of the curable resin composition 1 for the first hard coat layer 1 and the curable resin composition 1 for the second hard coat layer was set to 62 mPa·s and 10 mPa, respectively, in the first embodiment. An optical film was produced in the same manner as in Example 1 except that the method of adjusting s was performed to form a hard coat layer having a dry film thickness i7/xm. (Comparative Example 13) 099141183 56 201128216 In Example 1, the viscosity of the curable resin composition 1 for the first hard coat layer and the curable resin composition 1 for the second hard coat layer was 10 mPa·s, respectively. The manner was adjusted, and the adjusted two compositions were mixed in the same amount as used in Example 1, and the mixed composition was applied onto a TAC substrate. At this time, the coating film wetting film thickness of the mixed composition was set to 30 μm, and then the coating film was dried and irradiated in the same manner as in Example 1 to form a hard coat layer having a dry film thickness of ΙΟμηι. An optical film is produced. The composition types, wet film thickness, application method, dry film thickness and drying conditions, and transport speed of the TAC substrate used in the above examples and comparative examples are as shown in Table 1 below. 099141183 57 201128216 [Table 1] Table 1 Following (Editing viscosity (mPa · s) Wetting film / Κ / · αη) Coating method total light dry (four) 射 射 TA TAC New Zealand (m / min) First. Shout The second composition of the first material! The second component of the alkali rescue is the first one! The second thief of the thief is the first embodiment 1 1 30 30 0 20 10 simultaneously coated with 10 70 〇C '60 seconds 1 tbf example 1 1 No 30 No 30 20 No ordinary coating 9 70°C ' 60 seconds 1 tbfe #J2 No 1 No 30 30 No 20 Normal coating 10 70. . ' 60 seconds 1 tbfef 歹丨 J3 1 1 30 30 0 20 10 Successive application 10 70 〇 C ' 60 seconds 1 Implementation points J2 1 2 10 10 0 25 5 Simultaneous coating 11 70 〇 C ' 60 seconds 20 Implementation 歹丨J3 1 2 10 10 0 25 1 Simultaneously coating 8 70〇C ' 60 seconds 20 Miscellaneous 歹丨J4 1 2 10 10 0 18.75 3.75 Coated with 6 70 at the same time. (: ' 60 seconds 20 financial transactions example 4 1 no 10 no 10 20 no ordinary coating 11 70〇C ' 60 seconds 20 financial transactions example 5 no 2 no 10 10 no 10 ordinary coating 5 70〇C ' 60 seconds 20 Fcb|Cross Example 6 1 2 10 10 0 25 5 Simultaneous coating 9 After baking, 7〇〇C, 60 seconds 20 Example 5 1 3 10 10 0 25 5 Simultaneous coating 9 70〇C ' 60 seconds 20 Example 6 1 3 10 10 0 25 1 Apply 8 70 at the same time. (: ' 60 seconds 20 Implement your J7 1 3 10 10 0 18.75 3.75 Apply 5 70 at the same time.. 60 seconds 20 tbferf歹丨]7 No 3 No 10 10 No 10 Normal coating 5 70〇C ' 60 seconds 20 Your package example 8 2 4 30 30 0 20 10 Simultaneous coating 14 25 ° C, 60 seconds 1 Example 9 2 4 30 30 0 20 10 Simultaneous coating 14 50, 60 sec 1 Example 10 2 4 30 30 0 20 10 Simultaneous coating 14 70 ° C '60 sec 1 Example 11 2 4 30 30 0 20 10 Simultaneous coating 14 100 〇 C ' 60 sec 1 Implementation Example 12 2 4 30 30 0 25 5 Simultaneous coating 14 70〇C ' 60 seconds 1 tbfei column 8 2 No 30 No 30 20 No ordinary coating 9 70.' 60 seconds 1 tb$ Example 9 No 4 No 30 30 None 10 Ordinary coating 8 70 ° C, 60 seconds 1 Example 13 1 1 90 90 0 25 5 Simultaneous coating Cloth 18 70.. 60 seconds 1 tb|Crossing case 10 1 1 4 4 0 20 10 Simultaneously coating 5 70. '60 seconds 1 tb|Crossing case 11 1 1 10 4 6 20 10 Simultaneous coating 9 70T: ' 60 sec 1 tb$ 交例12 1 1 62 10 52 20 10 Simultaneous coating 17 70.' 60 sec 1 Comparative Example 13 1 1 10 10 0 30 Ordinary coating 10 70t ' 60 sec 1 099141183 58 201128216 (optical Evaluation of Films Related to the optical films of the examples and the comparative examples, the reflectance haze value (Hz) and the total light transmittance were measured as follows. Further, the optical thin films of the above examples and comparative examples were examined.臈, respectively, according to the following interference pattern evaluation; The results are shown in Table 2. Further, only the cross-sectional photograph of the optical film of Example 1 is shown in Figs. 7 and 8, and the cross-sectional photograph of the optical film of Comparative Example 3 is shown in Fig. 9. Further, in the photograph of Fig. 8 in the section "," and "sheet" of Fig. 7, the HC layer is abutted. The interface side of the opposite side of the substrate is enlarged. (Measurement of reflectance) The reflectance is measured by the product name V7100 UV-Vis spectrophotometer manufactured by Sakamoto Seiki Co., Ltd., and the product VAR-7010 absolute reflectance measuring device manufactured by JASCO Corporation. The angle is set to 5. The polarizer was N-polarized, and the measurement wavelength range was 380 to 780 nm. A black tape was attached to the optical film on the side of the TAC substrate, and then placed on a device and measured. Further, the average value of the measurement results obtained by the measurement wavelength range is regarded as the reflectance. (Measurement of fog value and total light transmittance) The fog value and total light transmittance are based on JIS K-7136 and JIS K7361 'Using the reflection and penetration rate meter HM-150 (Murako Color Technology Research Institute) System) Perform the measurement. (Evaluation of interference pattern) Using the FUNATECH (manufacturing) interference pattern inspection lamp (Na lamp), it was examined according to the line of 099141183 59 201128216 and evaluated according to the following criteria. 〇: Almost no interference pattern was found △: Can see blurry interference pattern X: Obviously see interference pattern [Table 2] Table 2 Characteristic reflectance (%) Fog value (%) Total light transmittance Tt (%) Interference pattern adhesion rate (spot) Example 1 3.17 0.5 92.2 〇100% 〇Comparative Example 1 4.11 0.2 92.3 〇100% 〇Comparative Example 2 2.76 0.8 92.3 X 83% 〇Comparative Example 3 2.78 0.6 92.5 Δ 97% 〇 Example 2 3.12 0.4 92.2 〇100% 〇Example 3 3.25 0.3 92.5 〇98% 〇Example 4 3.32 0.4 92.4 〇100% 〇Comparative Example 4 4.05 0.2 92.3 〇100% 〇Comparative Example 5 2.67 2.3 92.5 X 75% 〇Comparative Example 6 3.16 0.4 92.5 〇87% 〇Example 5 3.29 0.5 92.4 〇97% 〇Example 6 3.23 0.3 92.6 〇99% 〇Example 7 3.33 0.5 92.6 〇99% 〇Comparative Example 7 3.02 2.5 92.6 X 88% 〇Example 8 3.50 0.3 92.2 〇100% 〇Example 9 3.52 0.3 92.3 〇100% 〇Example 10 3.75 0.3 92.3 〇100% 〇Example 11 3.75 0.3 92.4 〇100% 〇· Example 12 3.63 0.3 92.3 〇100% 〇Comparative Example 8 4.11 0.2 92.3 〇100% 〇Compare Example 9 3.20 0.8 92.1 X 0% 〇- Example 13 3.09 0.9 91.5 〇91% 〇Comparative Example 10 3.80 0.4 92.3 〇100% 〇Comparative Example 11 3.75 0.5 92.3 〇100% Δ Comparative Example 12 Unmeasurable measurement cannot be determined - — X Comparative Example 13 3.77 0.4 92.4 Δ 92% 〇60 099141183 201128216 (Evaluation of adhesion) The following measures were performed and thus could not be measured. The adhesion ratio of the checkerboard adhesion test was not measured for the optical films of the above examples and comparative examples. In addition, 'for Comparative Example 12', because of the poor surface area, (checkerboard adhesion test), the indium of the optical film is placed on the side surface of the HC layer, and the total amount of the ι〇〇格 is added to make the CHIBAN (share) _ 2 fine race road tape (registered trademark) riding 5: owing to _ 赖 ,, and the needle thread is used to calculate the percentage of squares remaining without peeling off.密 Bonding rate (%) = (number of squares that are not peeled off / number of squares that are totaled (Evaluation of surface shape)) The appearance of the surface of the optical thin enamel is visually observed (with or without evaluation). No coating plaque was observed △: Can be blurred to see the coated plaque X: Apparently seeing the coating plaque (results finishing) As seen in Table 2, 杳μ八# && It belongs to the reflectivity and the low fog value. In the example, the king's light transmittance is higher than 91 s 0. In addition, the 'examples have been suppressed for ten steps, and the text occurs. Again, the sound is only known as the adhesion. It is good both in the shape of the surface. In particular, the surface shape of the first embodiment and the second embodiment is relatively good. From the cross-sectional view of the optical film of the first embodiment, it is known from Fig. 7 and Fig. 8 that the hollow yttrium 099141183 61 201128216 cerium oxide microparticles are from the HC layer. From the opposite side (upper side) of the TAC substrate, the distribution decreases toward the TAC substrate side. As shown in Fig. 8, the hollow ceria particles are almost uniformly distributed from the HC layer to the TAC substrate. The interface on the opposite side is up to 5 μm. Further, when comparing FIGS. 7 to 9, the case of the example i is known. The boundary between the hardened portion of the composition and the hardened portion of the second composition is less obvious than that of Comparative Example 3. However, 疋 corresponds to a comparative example in which no second composition is present in Example 1. 】 Because it does not contain hollow cerium oxide microparticles, it exhibits the same reflectance as that of the general hard coat layer. In Comparative Example 2, in which there is no first-component composition in Example 1, there is interference grain occurrence. The rate is also low. This phenomenon is presumed to be because the hollow dioxide particles contained in the second composition are uniformly distributed in the HC layer and are located at the interface of the HC layer* TAC substrate side, thus causing the TAC substrate and the hollow two. The difference in refractive index between the oxidized stone particles becomes larger, which causes the interference to occur. Moreover, it is speculated that the hollow oxidized particles are located at the tac substrate side interface of the hc layer, and the AHC material tree is infiltrated into the TAC base. The area in which the material hardens and shrinks is reduced, resulting in a decrease in the adhesion. In Comparative Example 3, which is not applied at the same time as the application of the first embodiment, but is applied successively, I will blur the interference pattern. Speculate the cross section shown in Figure 9. As seen in the film, the '1st secret hardening part and the second composition are 'distinguish' from the boundary of the 4th knife because the refractive index difference of the boundary part causes 099141183 62 201128216 interference pattern to occur. In Comparative Example 4 in the case of the second composition, as in Comparative Example 1, the reflectance was formed to have only the same reflectance as that of the general hard coat layer. Corresponding to Comparative Example 5 in the case where there was no first composition in Example 2, as in Comparative Example 2 There will be interference fringes, and the adhesion rate is also low. Corresponding to Comparative Example 6 in which pre-baking was performed before drying in Example 2, the adhesion rate was low. This phenomenon is presumed to be caused by the execution of prebaking. The first composition and the second composition are hardened (polymerization or crosslinking of the resin), and the first resin contained in the first composition on the TAC substrate side is not sufficiently infiltrated into the TAC substrate. In Comparative Example 7 which is equivalent to the case where the first composition is not present in Example 5, as in Comparative Example 2, interference fringes occur and the adhesion ratio is also low. Comparative Example 8 corresponding to the case where there was no second composition in Example 10, as in Comparative Example 1, was only the same reflectance as that of the general hard coat layer. In Comparative Example 9 in the case where the first composition was not present in Example 10, as in Comparative Example 2, interference fringes occurred and the adhesion ratio was also low. In Comparative Example 10 in which the viscosity of the first composition and the second composition in Example 1 were both small, the reflectance was lower than that of Comparative Example 1, but higher than that of Example 1. This phenomenon is presumed to be due to the low viscosity of the two compositions, resulting in the mixing of the two components, resulting in the reduction of the presence of hollow ceria particles in the HC layer on the opposite side (upper side) of the TAC substrate, resulting in reflectance. improve. The viscosity of the second composition corresponding to the upper layer side of the HC layer in Example 1 was less than that of Comparative Example 11 in the case of 099141183 63 201128216, and the planar shape was not good. In Comparative Example 12, which corresponds to a case where the difference in viscosity between the first composition and the second composition in Example 1 is large, a large number of plaques on the surface of the HC layer occur, resulting in a surface which is not smooth, which is impossible due to scattering of light. Determination of reflectance, fog value and king light transmittance. Corresponding to Example 13 in which the first composition and the second composition were uniformly coated in Example 1, the reflectance was the same as that of Comparative Example 1 . In addition, interference fringes occur and the adhesion rate is also low. This phenomenon is presumed to be applied because the two compositions are uniformly mixed, and as in Comparative Example 10, the presence of hollow cerium oxide microparticles on the opposite side of the TAC substrate in the HC layer is reduced, resulting in an increase in reflectance. Further, as in Comparative Example 2, the hollow uranium oxide fine particles were located at the interface of the HC layer on the side of the TAC substrate, causing the occurrence of interference fringes to cause a decrease in the adhesion ratio. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in an HC layer of an optical film obtained by the production method of the present invention. Fig. 2 is a schematic cross-sectional view showing an example of distribution of low refractive index fine particles in a low refractive index layer of an antireflection film obtained by a conventional double-layer coating method. Fig. 3 is a view showing an example of a procedure for simultaneously applying a first and second HC layer curable resin composition in the method for producing an optical film of the present invention. Fig. 4 is a view showing an example of a layer structure of a second optical film of the present invention. Fig. 5 is a view showing another example of the layer structure of the second optical film of the present invention. 099141183 64 201128216 FIG. 6 is a view showing an example of a layer structure of a polarizing plate of the present invention. Fig. 7 is a cross-sectional view showing the optical film of the first embodiment. Fig. 8 is an enlarged cross-sectional view showing the interface portion of the hard coat layer of the optical film of Example 1 on the opposite side to the opposite side of the light-transmitting substrate. 9 is a cross-sectional view of an optical film of Comparative Example 3. [Explanation of main component symbols] 1 Optical film 2 Polarizing plate 10 Light-transmissive substrate 20 Hard-coat layer 30 Low-refractive-index microparticle 40 Die 51 ' 52 Slit 60 First hard-coating hardenable resin composition 61 Coating film 70 for curable resin composition for hard coat layer Curable resin composition for second hard coat layer 71 Coating film 80 for curable resin composition for second hard coat layer Coating height 90 First and second Total Wetting Film Thickness of Composition 100 Conventional Anti-Reflection Film 110 Conventional Hard Coating Layer 120 Low Refractive Index Layer 099141183 65 201128216 130 Transport Direction of Light Penetrating Substrate 140 Antistatic Layer 150 Antifouling Layer 160 Protective Film 170 Polarizing layer 180 polarizer 099141183 66

Claims (1)

201128216 七、申請專利範圍: 1·一種光學薄膜之製造方法,其特徵係包括有. (i)準備光穿透性基材的步驟; ⑼準備第-硬塗層用硬化性樹脂組成物與第二硬塗層用 硬化性樹脂組成物的步驟,該第—硬塗相硬化性樹齡 成物係含有具反應性之第—翻旨及第—_,且未含低折射 率微粒子與低折射率樹脂、❹卩使含有低折料樹脂亦是相 對於該第-樹脂質量在5.0 f量%以下,黏度μΐ為3_· s以上;該第二硬塗層用硬化性樹驗成物係含有從平均粒 徑10〜鳥m的低折射率微粒子及低折射率樹脂所構成群組 中選擇之1種以上的低折射率成分、以及具反應性 的第二樹脂與第二溶劑,黏度μ2為5mpa· s以上,且該P 扣減掉該μΐ的值係在3〇mPa · S以下; (111)在该光穿透性基材之一面側,從該光穿透性基材側, 至少使該第一硬塗層用硬化性樹脂組成物與第二硬塗層用 硬化性樹脂組成物相鄰接並施行同時塗佈,而形成塗膜的步 驟;以及 (iv)使依上述(出)步驟所獲得之塗膜乾燥,接著施行光照 射及/或加熱而使之硬化的步驟; 且在該(出)步驟與該(iv)步驟間並未施行預烘烤。 2_如申請專利範圍第1項之光學薄膜之製造方法,其中, 在上述(iii)步驟中,將第一硬塗層用硬化性樹脂組成物的塗 099141183 67 201128216 201128216 硬化性樹脂組成 0.01〜1 〇 膜之潤濕膜厚設為τι,並將第二硬塗層用 物的塗膜之潤濕膜厚設為Τ2時,Τ2/Τ1為 3.如申請專利範圍第1項之光學薄膜之製造方法,其中 上述第一硬塗層用硬化性樹脂組成物的黏度^係 3〜95mPa · s,上述第二硬塗層用硬化性樹脂組成物的黏度 μ2 係 5〜l〇〇mPa · s 〇 4. 一種光學薄膜,係依照申請專利範圍第i至3項中任一 項之製造方法所獲得。 5. 如申請專利朗第4項之辟薄膜,係在光穿透性基材 的一面側設有硬塗層的光學薄膜,其中, 在上述硬塗層的膜厚方向上,低折射率微粒子存在於上述 光穿透性基材之對向側的界面❹於該光穿透性基材側,且 越#該光穿透性基材侧則該低折射率微粒子的存在量越 乂 ’伙4光穿透性基材的對向侧之界面朝光穿透性基材側, 該低折射率成分逐漸減少; 在該硬塗層内並無層界面; 該硬塗層對上述光穿透性基材的祺盤格密接性試驗中,密 接率係90〜1〇〇〇/。。 6』申明專觀圍第4項之光學薄臈,其卜在上述硬塗 層的膜厚方向’於從上述光穿透性基材的對向側之界面起至 上述硬塗層之乾燥膜厚的篇為止的區域中,存在有上述低 折射率微粒子總量的7〇〜_%。 099141183 68 201128216 7. —種偏光板,係在上述申請專利範圍第4項之光學薄膜 之上述硬塗層的對向之光穿透性基材側,設有偏光片。 8. —種顯示器,係在上述申請專利範圍第4項之光學薄膜 之上述硬塗層的對向之光穿透性基材側,配置顯示面板。 099141183 69201128216 VII. Patent application scope: 1. A method for producing an optical film, comprising: (i) a step of preparing a light-transmitting substrate; (9) preparing a hardenable resin composition for a first-hard coat layer and a step of a hardenable resin composition for a second hard coat layer, the first hard coat phase hardenable age-containing system containing a reactive first and a third, and having no low refractive index fine particles and a low refractive index The resin or the enamel contains the low-mole resin in an amount of 5.0 f or less with respect to the mass of the first resin, and the viscosity μΐ is 3 ·s or more; and the curable tree of the second hard coat layer contains the One or more kinds of low refractive index components selected from the group consisting of low refractive index fine particles and low refractive index resins having an average particle diameter of 10 to 10 m, and a second resin and a second solvent having reactivity, a viscosity μ2 of 5 mpa s or more, and the value of the P 减 minus the μ 系 is 3 〇 mPa · S or less; (111) on one side of the light-transmitting substrate, from the side of the light-transmitting substrate, at least Curing property of the curable resin composition for the first hard coat layer and the second hard coat layer a step of forming a coating film adjacent to and applying the lipid composition; and (iv) drying the coating film obtained by the above (out) step, followed by performing light irradiation and/or heating to harden the coating film. Step; and no prebaking is performed between the (out) step and the (iv) step. The method for producing an optical film according to the first aspect of the invention, wherein in the step (iii), the first hard coat layer is coated with a curable resin composition, and the composition of the curable resin is 0.019141183 67 201128216 201128216. 1 When the wetting film thickness of the ruthenium film is set to τι, and the wetting film thickness of the coating film of the second hard coat layer is Τ2, Τ2/Τ1 is 3. The optical film of claim 1 The method for producing a curable resin composition for a first hard coat layer is 3 to 95 mPa·s, and a viscosity μ2 of the curable resin composition for a second hard coat layer is 5 to 10 mPa. s 〇 4. An optical film obtained by the production method according to any one of the claims ir to 3 of the patent application. 5. The film of claim 4 is a thin film having a hard coat layer on one side of the light-transmitting substrate, wherein the low-refractive-index particles are in the film thickness direction of the hard coat layer. The interface existing on the opposite side of the light-transmitting substrate is on the side of the light-transmitting substrate, and the more the amount of the low-refractive-index particles is on the side of the light-permeable substrate 4 the opposite side of the light transmissive substrate is on the side of the light transmissive substrate, the low refractive index component is gradually reduced; there is no layer interface in the hard coat layer; the hard coat layer penetrates the light In the adhesion test of the substrate, the adhesion ratio was 90 to 1 〇〇〇/. . 6′′ an optical thinner of the fourth aspect of the invention, which is in the film thickness direction of the hard coat layer from the interface from the opposite side of the light-transmitting substrate to the dry film of the hard coat layer In the region up to the thick section, 7 〇 to _% of the total amount of the low refractive index fine particles are present. A polarizing plate is provided on the opposite side of the light-transmitting substrate of the hard coat layer of the optical film of the fourth aspect of the above patent application, and a polarizer is provided. A display panel in which a display panel is disposed on the opposite side of the light-transmitting substrate of the hard coat layer of the optical film of claim 4 of the above patent application. 099141183 69
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