TWI580059B - 製造用於太陽能電池之電極之方法 - Google Patents

製造用於太陽能電池之電極之方法 Download PDF

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Publication number
TWI580059B
TWI580059B TW098120498A TW98120498A TWI580059B TW I580059 B TWI580059 B TW I580059B TW 098120498 A TW098120498 A TW 098120498A TW 98120498 A TW98120498 A TW 98120498A TW I580059 B TWI580059 B TW I580059B
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TW
Taiwan
Prior art keywords
dispersion
laser
substrate
carrier
conductive layer
Prior art date
Application number
TW098120498A
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English (en)
Chinese (zh)
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TW201005960A (en
Inventor
瑞妮 奇曼
諾柏特 瓦格諾
喬根 卡克祖
喬根 普菲斯特
伍都 萊曼恩
Original Assignee
巴地斯顏料化工廠
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Filing date
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Application filed by 巴地斯顏料化工廠 filed Critical 巴地斯顏料化工廠
Publication of TW201005960A publication Critical patent/TW201005960A/zh
Application granted granted Critical
Publication of TWI580059B publication Critical patent/TWI580059B/zh

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Conductive Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Photovoltaic Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Inert Electrodes (AREA)
  • Catalysts (AREA)
  • Hybrid Cells (AREA)
TW098120498A 2008-06-18 2009-06-18 製造用於太陽能電池之電極之方法 TWI580059B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08158506 2008-06-18

Publications (2)

Publication Number Publication Date
TW201005960A TW201005960A (en) 2010-02-01
TWI580059B true TWI580059B (zh) 2017-04-21

Family

ID=41434490

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098120498A TWI580059B (zh) 2008-06-18 2009-06-18 製造用於太陽能電池之電極之方法

Country Status (11)

Country Link
US (1) US8247320B2 (enExample)
EP (1) EP2304814A2 (enExample)
JP (1) JP2011524646A (enExample)
KR (1) KR20110030539A (enExample)
CN (1) CN102067323A (enExample)
CA (1) CA2728055C (enExample)
IL (1) IL209780A (enExample)
MY (1) MY155485A (enExample)
RU (1) RU2505889C2 (enExample)
TW (1) TWI580059B (enExample)
WO (1) WO2009153192A2 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG178931A1 (en) 2009-09-04 2012-04-27 Basf Se Composition for printing electrodes
MX2012009464A (es) 2010-02-17 2012-09-12 Basf Se Proceso para producir uniones conductoras de electricidad entre celdas solares.
US20120231574A1 (en) * 2011-03-12 2012-09-13 Jiaxiong Wang Continuous Electroplating Apparatus with Assembled Modular Sections for Fabrications of Thin Film Solar Cells
KR102011477B1 (ko) * 2011-03-29 2019-08-16 썬 케미칼 코포레이션 왁스 요변체를 함유하는 고-종횡비 스크린 인쇄성 후막 페이스트 조성물
US9902866B2 (en) * 2011-04-22 2018-02-27 Northwestern University Methods for preparation of concentrated graphene ink compositions and related composite materials
US9834693B2 (en) * 2011-04-22 2017-12-05 Northwestern University Methods for preparation of concentrated graphene ink compositions and related composite materials
DE102011075025A1 (de) * 2011-04-29 2012-10-31 Schmid Technology Gmbh Verfahren und Vorrichtung zum Aufbringen von Drucksubstanz
KR101275636B1 (ko) 2011-08-30 2013-06-17 전자부품연구원 도핑 폴리머층을 포함하는 그래핀 기반 적층체
ZA201208283B (en) * 2011-11-04 2013-07-31 Heraeus Precious Metals North America Conshohocken Llc Organic vehicle for electroconductive paste
DE102012003866B4 (de) * 2012-02-23 2013-07-25 Universität Stuttgart Verfahren zum Kontaktieren eines Halbleitersubstrates, insbesondere zum Kontaktieren von Solarzellen, sowie Solarzellen
CN103366859B (zh) * 2012-03-29 2016-08-03 比亚迪股份有限公司 一种太阳能电池用导电浆料及其制备方法
CN103264226A (zh) * 2013-05-23 2013-08-28 广东工业大学 一种基于激光空化的碳纳米管植入方法
CN103779431B (zh) * 2013-12-19 2016-03-09 湖南红太阳光电科技有限公司 一种制备晶硅电池金属电极的方法
JP6581176B2 (ja) * 2014-07-02 2019-09-25 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company 有機エラストマーを含む導電性ペーストを使用した太陽電池電極の組み立て方法
TW201618319A (zh) * 2014-11-07 2016-05-16 Taiwan Carbon Nano Technology Corp 用於太陽能電池製程之導電助劑及使用該導電助劑的導電漿料
ES2677234T3 (es) * 2016-02-26 2018-07-31 Lpkf Laser & Electronics Ag Procedimiento para transferir una sustancia de impresión a un sustrato por medio de un rayo láser
CN106653148A (zh) * 2016-12-16 2017-05-10 杭州杭硕新材料科技有限公司 一种晶硅太阳能电池背面电极银浆及其制备方法
DE102017110040B4 (de) * 2017-05-10 2020-08-27 LPKF SolarQuipment GmbH Druckvorrichtung und Druckverfahren zur Übertragung einer Drucksubstanz von einem endlos umlaufenden Drucksubstanzträger auf ein Substrat
KR102238769B1 (ko) * 2018-04-23 2021-04-09 삼성에스디아이 주식회사 전극 형성용 조성물 및 이로부터 제조된 전극과 태양전지
KR102220531B1 (ko) 2018-04-23 2021-02-24 삼성에스디아이 주식회사 전극 형성용 조성물 및 이로부터 제조된 전극과 태양전지
DE102018111132A1 (de) * 2018-05-09 2019-11-14 Lpkf Laser & Electronics Aktiengesellschaft Verwendung einer Komponente in einer Zusammensetzung, Zusammensetzung für den Lasertransferdruck sowie Lasertransferdruckverfahren
US11903320B2 (en) 2019-01-28 2024-02-13 Wacker Chemie Ag Method for applying at least one silicone layer by laser transfer printing
CN111009590A (zh) * 2019-10-14 2020-04-14 中建材浚鑫科技有限公司 一种hjt太阳电池及其制备方法
CN111009588A (zh) * 2019-10-14 2020-04-14 中建材浚鑫科技有限公司 一种perc电池及其制备方法
WO2022231460A1 (ru) * 2021-04-28 2022-11-03 Илья Валентинович СМИРНОВ Материал с покрытием, нанесенным лазером
JP7690618B2 (ja) 2021-10-13 2025-06-10 ワッカー ケミー アクチエンゲゼルシャフト 非接触印刷プロセスのための導電性エラストマー印刷インク
EP4416745A1 (de) 2021-10-13 2024-08-21 Wacker Chemie AG ELEKTRISCH LEITFÄHIGE SILICONZUSAMMENSETZUNG MIT KOHLENSTOFFNANORÖHREN UND RUß
WO2023237192A1 (de) 2022-06-08 2023-12-14 Wacker Chemie Ag Elektrisch leitfähige elastomere drucktinte für kontaktlose druckverfahren
CN115148837A (zh) * 2022-06-29 2022-10-04 浙江晶科能源有限公司 一种太阳能电池及其制备方法和光伏组件
CN115083659B (zh) * 2022-07-20 2024-10-25 常州聚和新材料股份有限公司 用于激光转印的导电浆料、其制备方法及应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014885B1 (en) * 1999-07-19 2006-03-21 The United States Of America As Represented By The Secretary Of The Navy Direct-write laser transfer and processing
TW200806127A (en) * 2006-06-14 2008-01-16 Basf Ag Method for producing electrically conductive surfaces on a support

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4375007A (en) 1980-11-26 1983-02-22 E. I. Du Pont De Nemours & Co. Silicon solar cells with aluminum-magnesium alloy low resistance contacts
DE3702643A1 (de) 1986-02-10 1987-08-13 Toshiba Kawasaki Kk Tintenstrahlschreiber sowie schreibkopf und schreibkopfkassette dafuer
GB9803972D0 (en) * 1998-02-25 1998-04-22 Noble Peter J W A deposition method and apparatus therefor
GB2336161B (en) * 1998-04-06 2003-03-26 John Michael Lowe Method of providing conductive tracks on a printed circuit and apparatus for use in carrying out the method
US6177151B1 (en) 1999-01-27 2001-01-23 The United States Of America As Represented By The Secretary Of The Navy Matrix assisted pulsed laser evaporation direct write
DE10191123D2 (de) * 2000-03-30 2003-06-05 Aurentum Innovationstechnologi Druckverfahren und Druckmaschine hierfür
DE10051850A1 (de) 2000-03-30 2001-10-11 Aurentum Innovationstechnologi Druckverfahren und Druckmaschine hierfür
TW200521171A (en) * 2003-12-26 2005-07-01 Toshiba Kk Resin particles and resin layer containing metal micro particles, its forming method and circuit base board
EP1722984B1 (de) 2004-03-04 2008-06-04 Evonik Degussa GmbH Durch farbmittel transparent, transluzent oder gedeckt eingefärbte laserschweissbare kunststoffmaterialien
RU2303831C2 (ru) * 2004-06-21 2007-07-27 Открытое Акционерное Общество "Завод электронных материалов и приборов "Аналог" Паста алюминиевая для кремниевых солнечных элементов
US20070169806A1 (en) 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization
JP2007194580A (ja) 2005-12-21 2007-08-02 E I Du Pont De Nemours & Co 太陽電池電極用ペースト
TWI431380B (zh) * 2006-05-12 2014-03-21 Photon Dynamics Inc 沉積修復設備及方法
CN101203384B (zh) 2006-06-27 2012-02-01 三菱电机株式会社 丝网印刷机以及太阳能电池
DE102006033887B4 (de) 2006-07-21 2015-04-09 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Herstellung eines Mehrschichtkörpers mit leitfähiger Polymerschicht
GB0615651D0 (en) 2006-08-07 2006-09-13 Sun Chemical Bv A process for manufacturing solar cells
EP2108239A1 (de) 2007-01-05 2009-10-14 Basf Se Verfahren zur herstellung von elektrisch leitfähigen oberflächen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014885B1 (en) * 1999-07-19 2006-03-21 The United States Of America As Represented By The Secretary Of The Navy Direct-write laser transfer and processing
TW200806127A (en) * 2006-06-14 2008-01-16 Basf Ag Method for producing electrically conductive surfaces on a support

Also Published As

Publication number Publication date
US20110151614A1 (en) 2011-06-23
RU2011101492A (ru) 2012-07-27
WO2009153192A2 (de) 2009-12-23
US8247320B2 (en) 2012-08-21
TW201005960A (en) 2010-02-01
WO2009153192A3 (de) 2010-11-25
IL209780A (en) 2015-11-30
RU2505889C2 (ru) 2014-01-27
EP2304814A2 (de) 2011-04-06
KR20110030539A (ko) 2011-03-23
MY155485A (en) 2015-10-30
JP2011524646A (ja) 2011-09-01
CN102067323A (zh) 2011-05-18
CA2728055C (en) 2017-04-04
IL209780A0 (en) 2011-02-28
CA2728055A1 (en) 2009-12-23

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