TWI559412B - 熱壓鍵合過程中固定多個半導體器件的設備和鍵合方法 - Google Patents

熱壓鍵合過程中固定多個半導體器件的設備和鍵合方法 Download PDF

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TWI559412B
TWI559412B TW103124676A TW103124676A TWI559412B TW I559412 B TWI559412 B TW I559412B TW 103124676 A TW103124676 A TW 103124676A TW 103124676 A TW103124676 A TW 103124676A TW I559412 B TWI559412 B TW I559412B
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substrate
semiconductor device
bonding
flip chip
pneumatic
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TW103124676A
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TW201505110A (zh
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文忠 陳
樊俊豪
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先進科技新加坡有限公司
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    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1702—For plural parts or plural areas of single part

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Description

熱壓鍵合過程中固定多個半導體器件的設備和鍵合方法
本發明涉及一種用於固定多個半導體器件的設備，具體但非排他地涉及將半導體器件從半導體器件供應源傳送至襯底，並通過熱壓鍵合(thermocompression bonding)將半導體器件鍵合至襯底。
在典型的倒裝晶片熱壓鍵合工序中，倒裝晶片通過真空吸附力被固定在倒裝晶片鍵合機的鍵合頭的鍵合夾體上。所以，倒裝晶片能夠從倒裝晶片供應源處單個地被傳送至襯底以進行熱壓鍵合。在倒裝晶片被固定在鍵合夾體上之後，成像系統被使用來確定倒裝晶片相對於鍵合在那裡的期望襯底位置的位置。具體地，成像系統包含有上視圖案識別系統以確定倒裝晶片的位置。上視圖案識別系統可以是固定的或者活動的查看攝像機。成像系統還包含有下視圖案識別系統以識別該倒裝晶片將被鍵合至此的期望襯底位置。下視圖案識別系統通常是移動的下視攝像機以定位襯底的期望鍵合盤位置。根據成像系統所捕獲的資料，倒裝晶片鍵合機的鍵合頭將會沿著X軸和/或Y軸相應地水準地移動，和/或圍繞垂直的Z軸旋轉一個θ角度，以便如此重新定位鍵合夾體以致於倒裝晶片將會準確地放置在襯底上。其後，鍵合夾體將會沿著垂直的Z軸以一個Z軸速度朝向襯底的期 望鍵合盤位置向下垂直地移動，直到倒裝晶片和期望鍵合盤位置接觸，然後熱壓鍵合被開始執行。對於被鍵合夾體所拾取的下一個倒裝晶片，重複該處理週期，每個處理週期通常需要大約3.5秒。所以，傳統的倒裝晶片鍵合機的產能容量以UPH(units-per-hour)表示大約為500。倒裝晶片熱壓鍵合工序也包括遵守各種曲線，如倒裝晶片和襯底之間的鍵合力曲線、鍵合夾體的溫度曲線和鍵合夾體的位置曲線。
由於倒裝晶片單個地被傳送給襯底，所以用於執行熱壓鍵合的倒裝晶片鍵合機的產能容量被限制。由於各種操作考慮，這得到更加惡化，如：需要在倒裝晶片和倒裝晶片被鍵合在此的襯底的相應鍵合盤位置之間進行精確的對齊定位；緩慢的Z軸速度需要避免襯底鍵合盤一旦與倒裝晶片接觸滴注在襯底鍵合盤上的粘合劑中形成氣洞(air voids)；很低的溫度需要用於粘合劑和倒裝晶片之間的接觸，其提高了固化時間；漫長的加熱時間以加熱倒裝晶片，其提高了每個熱壓鍵合處理週期的持續時間；以及漫長的冷卻時間以在下一個倒裝晶片被拾取以前冷卻鍵合夾體。
所以，本發明的目的是尋求消除用於熱壓鍵合的傳統倒裝晶片鍵合機的限制，並向普通公眾提供一個或多個有用的選擇。
因此，本發明第一方面提供一種用於在熱壓鍵合過程中固定多個半導體器件的設備，該設備包含有：主體；多個支撐表面，其位於主體的第一側面上，每個支撐表面被配置來在熱壓鍵合過程中固定至少一個單獨的半導體器件；多個內部管道，其位於主體內，每個內部管道從位於主體的第一側面的各自一個支撐表面的開口延伸至位於主體的第二側面的 開口；其中，位於主體的第二側面的開口被配置來連接至各自的氣動通路(pneumatic paths)上，以與之進行流體互通，每個氣動通路具有單獨可控的氣動吸附力(pneumatic suction force)，以致於位於主體的第一側面的支撐表面的開口被操作來抵靠於位於主體的第一側面的支撐表面有選擇地固定半導體器件，或者從那裡將半導體器件釋放。
本發明第二方面提供一種用於熱壓鍵合半導體器件的裝置，該裝置包含有：加熱器；以及如上所述的設備，其和加熱器相耦接；其中，該加熱器被操作來加熱該設備，以藉此加熱正被固定的半導體器件。
本發明協力廠商面提供一種通過熱壓鍵合將多個半導體器件鍵合至襯底上的方法，該方法包含有以下步驟：使用上述的設備將多個半導體器件從半導體器件供應源處傳送至襯底；通過熱壓鍵合將半導體器件鍵合至襯底上。
本發明的一些較佳但是可選的技術特徵/步驟已經描述在從屬請求項中。
100‧‧‧鍵合頭
102‧‧‧加熱器
104‧‧‧夾體
106‧‧‧主體
106a‧‧‧第一側面
106b‧‧‧第二側面
108‧‧‧支撐表面
110‧‧‧內部管道
110a‧‧‧開口
110b‧‧‧開口
112‧‧‧真空通路
113‧‧‧真空通路
200‧‧‧氣動真空通道
200a‧‧‧半導體器件通道
200b‧‧‧夾體通道
202‧‧‧通孔
202a‧‧‧第一通孔
202b‧‧‧第二通孔
204‧‧‧曲彎
300‧‧‧夾體
302‧‧‧接觸盤
302a‧‧‧支撐表面
304‧‧‧倒裝晶片
306‧‧‧倒裝晶片
400‧‧‧襯底
500‧‧‧倒裝晶片供應源
502‧‧‧倒裝晶片
602a‧‧‧倒裝晶片
602b‧‧‧倒裝晶片
702a‧‧‧倒裝晶片
702b‧‧‧倒裝晶片
現在結合附圖來描述本發明的較佳實施例，其中：圖1所示為根據本發明第一較佳實施例所述的、包含有加熱器和夾體的倒裝晶片鍵合機的鍵合頭；圖2a所示為圖1的鍵合頭的加熱器和夾體特別當它們被分開時的示意圖，而圖2b所示為當沿著圖2a所示方向中的剖面線A-A'所視時夾體的剖面示意圖；圖3所示為根據本發明第二較佳實施例所述的另一個夾體； 圖4表明了傳統襯底的典型佈置；圖5表明了通過熱壓鍵合的第一較佳方法將倒裝晶片同時鍵合至圖4的襯底的步驟；圖6表明了通過熱壓鍵合的第二較佳方法將倒裝晶片單個地放置於圖4的襯底的步驟；圖7表明了通過熱壓鍵合的第三較佳方法將倒裝晶片單個地放置於圖4的襯底的步驟。
圖1所示為用於在半導體器件(具體為倒裝晶片)和襯底(如引線框或雙馬樹脂(BT：Bismaleimide Triazine)襯底)之間進行熱壓鍵合的半導體器件鍵合機(具體為倒裝晶片鍵合機)的鍵合頭100。鍵合頭100包含有加熱器102和通過氣動真空吸附力耦接至該加熱器102上的設備(根據本發明第一實施例具體為夾體104)。該夾體104被配置來在熱壓鍵合過程中固定多個半導體器件，其包含有：i)主體106；ii)位於主體106的第一側面106a的多個支撐表面108，每個支撐表面108被配置來在熱壓鍵合過程中固定至少一個單獨的半導體器件；以及iii)位於主體106內的多個內部管道110(參見圖2b)，每個內部管道110從位於主體106的第一側面106a的各自一個支撐表面108的開口110a處延伸至位於主體106的第二側面106b的開口110b處。具體而言，位於主體106的第二側面106b的開口110b被操作來和單獨的氣動真空通路(pneumatic vacuum paths)112進行流體互通，其中每個真空通路112具有單獨可控的氣動真空吸附力。從而，位於主體106的第一側面106a的支撐表面108的開口110a被操作來有選擇性地抵靠於位於主體 106的第一側面106a的支撐表面108固定一個或多個半導體器件，或者將它們從那裡釋放。
圖2a所示為特別當它們被分開時的鍵合頭100的加熱器102和夾體104，並表明了加熱器102和夾體104的各自俯視示意圖。夾體104的俯視示意圖展示了包含有多個氣動真空通道200(pneumatic vacuum passages)的主體106的第二側面106b，氣動真空通道200包括多個半導體器件通道200a和一個夾體通道200b。半導體器件通道200a被操作來和以上提及的單獨真空通路112進行流體互通，而夾體通道200b被操作來和再一個具有也獨立可控的氣動真空吸附力的氣動真空通路113進行流體互通。
就如圖2a所示的加熱器102的俯視示意圖而言，可以看出，加熱器102包含有多個通孔202，其包括第一通孔202a和第二通孔202b。第一通孔202a被操作來和單獨的真空通路112進行流體互通，而第二通孔202b被操作來和再一個真空通路113進行流體互通。具體地，真空通路112被連接至單獨的氣動真空源V1、V2上，而真空通路113被連接至另一個氣動真空源V3上。這樣通過各自的真空吸附力，使得半導體器件實現了被夾體104有選擇性地固定，以及夾體104抵靠於加熱器102被固定。
由於加熱器102和夾體104二者均包含有扁平結構，當夾體104抵靠於加熱器102被固定時，加熱器102的基座表面和夾體104的頂面(即第二側面106b)相接觸，以在加熱器102和夾體104之間形成各自封閉的真空通路。所以，沿著加熱器102的第一通孔202a、半導體器件通道200a和夾體104的內部管道110所產生的真空吸附力能夠抵靠於夾體104的各自支撐表面108固定半導體器件，而沿著加熱器102的第二通孔202b、夾體通道200b 所產生的真空吸附力能夠抵靠於加熱器102固定夾體104。
當沿著真空通路112、113分佈的真空吸附力被單獨地控制時，夾體104能夠或者同時固定兩個半導體器件，在支撐表面108中的任何一個處固定一個單獨的半導體器件，或者根本什麼都沒有。而且，夾體104能夠被製成當沿著真空通路113分佈的真空吸附力被切換打開時和加熱器102相耦接，當所述的真空吸附力被切換關閉時和加熱器102相分離和隔開。
更為具體地，位於夾體104的主體106的第二側面106b的開口110b中的每一個被設置在各自半導體器件通道200a之一的端部。另外，半導體器件通道200a中的每一個包括帶有90度角的曲彎(kink)204。另一方面，夾體通道200b被設置環繞於主體106的第二側面106b的邊緣，以便於真空吸附力能夠相應地被分配環繞於所述的邊緣而將夾體104抵靠於加熱器102固定。
圖2b所示為當沿著圖2a所示方向中的剖面線A-A'所視時夾體104的剖面示意圖。可以看出，內部管道110從位於主體106的第一側面106a的支撐表面108中的各自開口110a處延伸至位於主體106的第二側面106b的各自開口110b處。同樣也可以看出，夾體104的支撐表面108對應於設置在夾體的主體106的第一側面106a的各個接觸盤206的表面。
圖3所示為根據本發明第二實施例所述的另一個夾體300。本發明第二實施例的夾體300類似於第一實施例的夾體104，除了有關接觸盤的特徵之外。具體地，第二實施例的夾體300包含有不同尺寸的接觸盤302，以便於接觸盤302的支撐表面302a被設置在不同高度處(或水平面處)，以容納和固定不同尺寸和厚度的不同半導體器件(所示為倒裝晶片304、 306)。值得注意的是，接觸盤302的支撐表面302a也可以包含有不同的表面區域以固定不同的半導體器件。
現在將會描述通過熱壓鍵合將半導體器件(如倒裝晶片)鍵合至襯底(如引線框)的各種方法。具體地，這些方法中的每一個包含有根據本發明第一實施例所述的、使用夾體104將半導體器件傳送至襯底的步驟。但是，值得注意的是，如果環境允許，本發明第二實施例的夾體300也可以被使用。
圖4表明了傳統襯底400的典型佈置，其包含有四塊鍵合盤，每塊鍵合盤設置有四行乘四列的鍵合盤。所以，襯底400包含有總共64塊鍵合盤，它們以四行乘16列設置。如圖4所示，襯底400包含有兩個壞的鍵合盤(以陰影塊表示)，它們不適合於鍵合有半導體器件。所以，半導體器件鍵合機(如倒裝晶片鍵合機)應較合適地在其處理器中記錄這些壞鍵合盤的各自位置，以避免將半導體器件鍵合至這些壞鍵合盤中的任何一個上，藉此避免浪費。對於良好的鍵合盤而言，在鍵合以前，諸如非導電性黏著劑(NCP：Non-Conductive Paste)或焊劑之類的粘著劑被施加在襯底400上的良好鍵合盤中每一個上。
圖5表明了根據熱壓鍵合處理的第一方法所述、通過倒裝晶片鍵合機的熱壓鍵合使用夾體104將兩個倒裝晶片502同時鍵合至襯底400上的步驟。具體而言，這個方法還包含有以下步驟：將這兩個倒裝晶片502從倒裝晶片供應源500同時傳送至襯底400。這通過啟動沿著真空通路112的真空源V1、V2以抵靠於夾體104固定倒裝晶片502而得以完成。值得注意的是，倒裝晶片502被夾體104固定時的相對位置應該匹配於襯底400上的相應 鍵合盤位置的相對位置。較佳地，倒裝晶片502的相對位置和相應鍵合盤位置的相對位置之間的精確度應該在2微米的精確度閾值以內。通過將倒裝晶片502從倒裝晶片供應源500處同時傳送至襯底400，並通過熱壓鍵合將所傳送的倒裝晶片同時鍵合至襯底400上，倒裝晶片鍵合機的UPH估計大約為1000。換句話說，和傳統的熱壓鍵合方法相比，通過使用夾體104，倒裝晶片鍵合機的產能容量能夠提高大約100%。
圖6表明了根據熱壓鍵合處理的第二方法，在兩個倒裝晶片602a、602b被單獨地放置於襯底400以前，使用成像設備(圖中未示)逐個地對齊定位該由夾體104固定的兩個倒裝晶片602a、602b的步驟。具體地，這種方法包含有以下步驟：通過倒裝晶片鍵合機使用夾體104，將這兩個倒裝晶片602a、602b從倒裝晶片供應源500同時傳送至襯底400；使用成像設備相對於襯底400上相應的鍵合盤位置對齊定位第一倒裝晶片602a和第二倒裝晶片602b；以及其後，在沒有完成熱壓鍵合的情形下，將第一倒裝晶片602a放置於襯底400上；縮回第二倒裝晶片602b，且使用由成像設備以前所獲得的相關位置資訊相對於襯底400上相應的鍵合盤位置對齊定位第二倒裝晶片602b，再然後，將第二倒裝晶片602b放置於襯底400上；最後，關於這兩個倒裝晶片602a、602b，同時在襯底400上完成熱壓鍵合。尤其是，相對於相應的鍵合盤位置對齊定位各個倒裝晶片602a、602b的步驟包含有：相對于成像設備重新定位夾體104。
由於粘合劑被預先施加於襯底400的鍵合盤上，所以即使熱壓鍵合沒有開始，放置於襯底400上的第一倒裝晶片602a的位置也能夠得以維持。值得注意的是，一旦將第一倒裝晶片602a放置於襯底400上，那麼真 空源VS1較佳地被控制來解除以前抵靠於夾體104固定第一倒裝晶片602a的真空吸附力。可是，真空源VS2保持啟動，以便於抵靠於夾體104固定的剩餘的第二倒裝晶片602b繼續被相應的真空吸附力固定定位。
較佳地，在第一倒裝晶片602a放置於襯底400之後，倒裝晶片鍵合機的鍵合頭100向上移動以在夾體104和第一倒裝晶片602a之間產生出足夠的空間，而便於避免當相對於襯底400的第二鍵合盤位置對齊定位第二倒裝晶片602b時干擾第一倒裝晶片602a(其已放置於襯底400上)的位置。在鍵合頭100向上移動過程中，以前固定第一倒裝晶片602a(其現在已放置於襯底400上)的來自支撐表面108的相應開口110a的正氣壓可能得以產生，以致於將第一倒裝晶片602a在襯底400上的位置更好地保持。這通過控制氣動真空源VS1以通過夾體104的相應的內部管道110產生正氣壓而得以完成。
在這種情形下，由於在所傳送的倒裝晶片602a、602b被單個地放置於襯底400的相應的鍵合盤位置以前，倒裝晶片602a、602b被單個地相對於襯底400的相應的鍵合盤位置對齊定位，所以倒裝晶片602a、602b被夾體104固定時的相對位置和相應鍵合盤位置的相對位置之間的精確度閾值能夠減輕至超過2微米。這種方法可以提供大約830的估算UPH。換而言之，和傳統的熱壓鍵合方法相比，通過使用夾體104，倒裝晶片鍵合機的產能容量能夠提高大約66%。
熱壓鍵合處理的協力廠商法也包含有夾體104的使用。具體地，這個方法包含有下述初始步驟：通過倒裝晶片鍵合機使用傳送設備，將倒裝晶片從倒裝晶片供應源500單個地傳送至襯底400；使用成像設備相 對於襯底400上相應的鍵合盤位置單個地對齊定位每個所傳送的倒裝晶片；以及其後，在沒有完成熱壓鍵合的情形下，將倒裝晶片放置於襯底上。該傳送設備可以是被配置來固定單個半導體器件的傳統夾體。
尤其是，倒裝晶片被單個地放置於襯底400的交替行的鍵合盤上，如第1行、第3行、第5行、第7行等。可是，不應理解為：倒裝晶片應被單個地放置於襯底400的奇數行的鍵合盤上。相反，應理解為：倒裝晶片應被設置于成行的鍵合盤上，該鍵合盤的行數對應於夾體104被配置來固定的倒裝晶片的數目的倍數加一。這意味著：如果另一種配置的夾體104被配置來固定三個倒裝晶片，那麼該倒裝晶片應被單個地放置于成行的鍵合盤上，該鍵合盤的行數對應於3的倍數再加一，如第1行、第4行、第7行、第10行等。
在該倒裝晶片已被單個地放置於襯底400之後，那麼倒裝晶片鍵合機的鍵合頭100將會重新定位它自己，以用本發明第一實施例的夾體104取代該傳送設備。接著然後，使用取代後的夾體104，來自倒裝晶片供應源500的倒裝晶片被傳送至襯底400。具體地，倒裝晶片被單個地放置於交替行的鍵合盤上，該交替行對應於第2行、第4行、第6行等。
類似地，抵靠於襯底400對齊定位由夾體104所固定的倒裝晶片的步驟得以被執行，以確保放置的精確度。參考圖7所示，當倒裝晶片702a沿著第2行被放置於襯底400的相應鍵合盤位置處時，夾體104的主體106的、沒有固定任何相應的倒裝晶片的支撐表面108之一和沿著第1行分佈的相應鍵合盤位置處的已有的倒裝晶片702b接觸。因此，這實現了所傳送的倒裝晶片702a和已有的倒裝晶片702b二者通過熱壓鍵合同時被鍵合至襯底 400上。這種方法可以提供大約630的估算UPH。換而言之，和傳統的熱壓鍵合方法相比，通過使用夾體104，倒裝晶片鍵合機的產能容量能夠提高大約26%。
在這種情形下，雖然倒裝晶片被夾體104單個地傳送至襯底400上，但值得注意的是，兩個或者更多的倒裝晶片可以被另一種配置的、能夠固定相同數目的倒裝晶片的夾體104所傳送。
實際上，襯底將會通常包含有如圖4所示的壞的鍵合盤。通過將倒裝晶片單個地放置於襯底400上，倒裝晶片鍵合機能夠有益地保證：沒有半導體器件被鍵合至任何一個壞的鍵合盤上，以藉此避免浪費。
在本發明所要求的保護範圍之內的其它各種實施例也可以被設想出。例如，雖然夾體104的較佳實施例已經被描述為包含有兩個支撐表面108，以在熱壓鍵合過程中同時固定兩個半導體器件，但值得注意的是，夾體104的其它實施例可包含有三個或更多這樣的、用於固定相同數量的半導體器件的支撐表面108。另外值得注意的是，襯底400可以是位於加固器(stiffener)上的重構後的襯底。
100‧‧‧鍵合頭
102‧‧‧加熱器
104‧‧‧夾體
106‧‧‧主體
108‧‧‧支撐表面

Claims (20)

  1. 一種用於在熱壓鍵合過程中固定多個半導體器件的設備，該設備包含有：主體；多個支撐表面，其位於主體的第一側面上，每個支撐表面被配置來在熱壓鍵合過程中固定至少一個半導體器件；多個內部管道，其位於主體內，每個內部管道從位於主體的第一側面的各自一個支撐表面的開口延伸至主體的第二側面的開口；其中，主體的第二側面的各該開口被配置來分別連接至各自的第一氣動通路上，以與之進行流體互通，每個第一氣動通路具有單獨可控的氣動吸附力，以致於位於主體的第一側面的支撐表面的開口被操作來抵靠於位於主體的第一側面的支撐表面有選擇地固定一個或多個半導體器件，或者從那裡將一個或多個半導體器件釋放；及封閉的夾體通道被設置環繞於主體的第二側面的表面被操作來和又一個氣動通路進行流體互通以在該主體形成一封閉的真空通路以將該設備抵靠於加熱器固定。
  2. 如請求項1所述的設備，其中，該主體的第二側面包含有多個第一氣動通道，該第一氣動通道被操作來和各自部分的第一氣動通路進行流體互通。
  3. 如請求項2所述的設備，其中，主體的第二側面的開口中的每一個設置在各自部分的第一氣動通道的端部。
  4. 如請求項2所述的設備，其中，每個第一氣動通道包含有曲彎。
  5. 如請求項1所述的設備，其中，該主體的第二側面包含有夾體通道，其被操作來和具有獨立可控的氣動吸附力的該氣動通路進行流體互通。
  6. 如請求項5所述的設備，其中，該夾體通道沿著主體的第二側面的邊緣設置。
  7. 如請求項1所述的設備，其中，位於主體的第一側面的支撐表面設置在用於固定不同半導體器件的不同高度處。
  8. 如請求項1所述的設備，其中，位於主體的第一側面的支撐表面包含有用於固定不同半導體器件的不同表面區域。
  9. 一種用於在熱壓鍵合過程中固定半導體器件的裝置，該裝置包含有：加熱器；以及如請求項1所述的設備，其和加熱器相耦接；其中，該加熱器被操作來加熱如請求項1所述的設備，以藉此加熱正被固定的半導體器件。
  10. 如請求項9所述的裝置，其中，該加熱器包含有多個通孔，該通孔被操作來和位於如請求項1所述的設備的主體內的各自部分的內部管道進行流體互通。
  11. 如請求項10所述的裝置，其中，如請求項1所述的主體的第二側面還包含有多個第一氣動通道，該第一氣動通道被操作來和各自部分的第一氣動通路進行流體互通，該加熱器的每個通孔和位於如請求項1所述設備的主體的第二側面的相應開口均設置在位於如請求項1所述的主體的第二側面的各自第一氣動通道之一的相對端部。
  12. 如請求項11所述的裝置，其中，該加熱器還包含有另一個通孔，該通孔被操作來和具有獨立可控的氣動吸附力的該氣動通路進行流體互通，以固定如請求項1所述的設備的主體，而便於如請求項1所述設備被操作來以可分離的方式耦接於該加熱器上。
  13. 一種通過熱壓鍵合將多個半導體器件鍵合至襯底上的方法，該方法包含有以下步驟：使用如請求項1所述的設備將多個半導體器件從半導體器件供應源處傳送至襯底；通過熱壓鍵合將半導體器件鍵合至襯底上。
  14. 如請求項13所述的方法，其中，該將半導體器件傳送的步驟包含有：將半導體器件同時從晶圓處傳送至襯底。
  15. 如請求項14所述的方法，其中，該將半導體器件鍵合至襯底上的步驟包含有以下步驟：使用成像設備抵靠於襯底單個地對齊定位由如請求項1所述的設備所固定的半導體器件；通過熱壓鍵合將半導體器件鍵合至襯底上。
  16. 如請求項15所述的方法，其中，對齊定位由如請求項1所述的設 備所固定的第一部分半導體器件的步驟之後，該方法還包含有以下步驟：在沒有完成熱壓鍵合的情形下，將第一部分半導體器件放置於襯底上。
  17. 如請求項16所述的方法，在將第一部分半導體器件放置於襯底上的步驟之後，該方法還包含有以下步驟：相對于成像設備重新定位如請求項1所述的設備。
  18. 如請求項17所述的方法，該方法還包含有以下步驟：從以前固定有第一部分半導體器件的如請求項1所述的設備的支撐表面的開口處產生正氣壓，以便於保持該第一部分半導體器件在襯底上的位置。
  19. 如請求項14所述的方法，該方法還包含有以下步驟：通過熱壓鍵合同時將半導體器件鍵合至襯底上。
  20. 如請求項13所述的方法，該方法還包含有以下步驟：使用傳送設備將多個半導體器件單個地從半導體器件供應源處傳送至襯底；以及使用如請求項1所述的設備取代該傳送設備，並使用如請求項1所述的設備將半導體器件傳送至襯底，其中，使用如請求項1所述的設備將半導體器件傳送至襯底的步驟包含有：將所選定的半導體器件從半導體器件供應源處傳送至襯底，以便於一旦所選定的半導體器件被放置於襯底上，沒有固定任何半導體器件的如請求項1所述的設備的主體的至少部分支撐表面和襯底上已經存在的半導體器件相接觸；以及通過熱壓鍵合，將所選定的半導體器件連同已經存在的半導體器件一起同時鍵合至襯底上。
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