TWI555444B - A cover plate fixing device and a cover fixing device for - Google Patents

Description

Cover fixing device and cover fixing device of inductively coupled plasma processing device

The present invention relates to a cover fixture for fixing a cover plate and a cover fixing device for covering an underside of a window assembly constituting a top portion of a processing chamber in an inductively coupled plasma processing apparatus.

In the FPD (Flat Panel Display) process, various plasma treatments such as plasma etching, plasma ashing, and plasma film formation are performed on the glass substrate for FPD. As an apparatus for performing the plasma treatment, an inductively coupled plasma (ICP) processing apparatus capable of generating high-density plasma is known.

The inductively coupled plasma processing apparatus includes a processing chamber that is airtight and performs plasma processing on a substrate as a workpiece, and a high frequency antenna that is disposed outside the processing chamber. The processing chamber has a window assembly composed of a material such as a dielectric body constituting a top portion thereof, and the high frequency antenna is disposed above the window assembly. The inductively coupled plasma processing device generates an induced electric field in the processing chamber through a window assembly by applying high frequency electric power to the high frequency antenna, and the processing gas introduced into the processing chamber is converted into plasma by the induced electric field. The plasma is used to perform a specific plasma treatment on the substrate.

In the inductively coupled plasma processing apparatus, when the underside of the window member is exposed to the processing chamber, the lower portion of the window assembly is damaged by the plasma. Since the window assembly cannot be easily disassembled, it cannot be easily exchanged or cleaned even if it is damaged. Thus, as described in the patent document (Japanese Laid-Open Patent Publication No. 2001-28299), the lower side of the window assembly can be covered by a cover that can be easily attached and detached. Thereby, the underside of the window assembly can be protected, and the damaged cover can be easily exchanged or cleaned.

As described in the patent literature, it is known that the cover is fixed by a plurality of screws with respect to the support assembly of the window assembly. In more detail, the conventional method for fixing the cover is to be in the vicinity of the peripheral portion of the cover, each of which has a plurality of through holes through which the shaft portion of the screw can be inserted, and the shaft portion of the screw from the lower side of the cover. Each of the through holes is inserted, and the shaft portion is screwed to the support assembly of the window assembly to fix the cover. However, the conventional method of fixing the cover plate causes the following problems.

When the plasma treatment is performed in the processing chamber, the temperature rises due to continuous exposure of the underside of the cover to the plasma. In the heating process under the cover plate, uneven temperature distribution occurs under the cover plate, and as a result, the cover plate may be slightly deformed such as stretching or warping. At this time, since the coefficient of thermal expansion between the cover material (for example, ceramic) and the material of the support member (for example, aluminum) is different, the amount of deformation of the cover plate and the amount of deformation of the support member may differ. Therefore, the cover plate is fixed to the support assembly by screws, so that the vicinity of the through hole of the cover plate is completely unable to be displaced, and the portion near the through hole of the cover plate is subjected to excessive stress, and there is a Part of the damage caused by the cover.

Therefore, it is also considered that the diameter of the through hole of the cover plate is larger than the diameter of the shaft portion of the screw, and at the same time, a mechanism for allowing relative displacement of the cover plate and the screw is provided, thereby allowing the vicinity of the through hole of the cover plate Not subject to excessive stress. However, even if the stress applied to the cover is easily concentrated in the vicinity of the through hole when the cover is deformed, it is easy to cause cracks from the through hole as a starting point, and the cover is broken.

Further, in the conventional cover fixing method, a plurality of convex portions are formed on the top surface of the processing chamber due to the heads of the plurality of screws. At the convex portion, by-products generated by the plasma treatment are easily adhered. Therefore, in the plasma treatment, if the by-product attached to the screw head is peeled off from the screw head to generate fine particles (floating particles), the fine particles may cause etching failure. In addition, particles may be generated by the abrasion of the screw head due to the plasma, and the particles may also cause etching defects.

Further, in the conventional cover fixing method, since a plurality of screws are used to fix the cover, there is a problem that the workability of attaching and detaching the cover is poor. Further, in recent years, the processing chamber of the inductively coupled plasma processing apparatus has also increased in size in response to an increase in the size of the FPD. In an inductively coupled plasma processing apparatus having a large processing chamber, sometimes the window assembly and the cover are formed by dividing into a plurality of portions. In this case, in order to fix the cover, more screws are required, which makes the workability of the cover plate lower.

The present invention has been made in view of the above problems, and an object of the present invention is to provide an inductively coupled plasma processing apparatus capable of suppressing damage of a cover plate covering the underside of a window assembly and occurrence of particles, and the cover can be easily attached and detached. The cover fixture and the cover fixing device of the inductively coupled plasma processing device.

The cover fixture of the inductively coupled plasma processing apparatus of the present invention is applied to an inductively coupled plasma processing apparatus. The inductively coupled plasma processing apparatus includes a processing chamber having a window assembly constituting a top portion and performing plasma processing, a high frequency antenna disposed above the window assembly to form an induced electric field in the processing chamber, and support for supporting the window assembly a component, and a cover that covers the underside of the window assembly. The cover fixture of the present invention is used to fix the cover.

The cover fixture of the present invention is provided with: a support portion that supports a supported portion as a part of the cover; and a fixed portion that is fixed to the support assembly.

The cover fixture of the present invention may also be provided with a screw corresponding to the support assembly for fixing the fixed portion. At this time, the head of the screw may be disposed above the support assembly, and the shaft portion of the screw is coupled to the fixed portion through the support assembly.

Moreover, in the cover fixture of the present invention, the support portion may have an upper aspect that abuts to the lower side of the supported portion; and the lower aspect, along with the upper portion, away from the fixed portion The distance gradually becomes smaller.

Moreover, in the cover fixture of the present invention, the lower portion of the supported portion may also be a part of the lower side of the cover plate, and the lower portion of the cover plate is formed with a step portion such that the lower portion of the supported portion is located at the An upper position of the portion other than the support portion; the support portion may also be disposed at the step portion of the lower portion of the cover plate. In this case, the support portion may have a thickness equal to the step difference of the step portion.

Moreover, the cover fixture of the present invention may further have a side portion, and when the two cover fixtures are disposed adjacent to each other in the horizontal direction, the shape of the side portions may cause the sides of the two cover fixtures to mutually Engage.

Moreover, in the cover fixture of the present invention, the cover may also have a cover body having a lower aspect and an upper aspect to form a main portion of the cover; the supported portion may be disposed on the cover body. The support portion is disposed between the underside of the supported portion and the upper portion of the cover body.

The cover fixing device of the inductively coupled plasma processing device of the present invention is for fixing a cover plate, and is provided with: the cover fixture of the present invention; and fixing the fixed portion of the cover fixture to the support assembly The fixing mechanism at the place.

The cover fixing device of the present invention, wherein the fixing mechanism is a mechanism for pulling up the fixed portion. Alternatively, the fixing mechanism may be a mechanism that restricts movement of the fixed portion in the up and down direction.

According to the present invention, the cover can be fixed by using a cover member having a supported portion for supporting the cover and a cover fixing member fixed to the fixed portion of the support assembly. Therefore, according to the present invention, the cover plate can be fixed without forming a plurality of through holes for inserting the shaft portion of the screw at the cover. As a result, according to the present invention, it is possible to suppress breakage of the cover plate and generation of fine particles, and it is possible to achieve an effect that the cover plate can be easily attached and detached.

[First Embodiment]

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. First, the configuration of an inductively coupled plasma processing apparatus including the cover fixture according to the first embodiment of the present invention will be described with reference to Figs. 1 to 4 . 1 is a cross-sectional view showing an inductively coupled plasma processing apparatus. 2 is a perspective view of a dielectric body wall and a suspension as a "window assembly" of FIG. 1. 3 is a perspective view of the dielectric wall and the high frequency antenna of FIG. 1. 4 is a bottom plan view of a dielectric cover as a "cover" in FIG. 1 and a dielectric cover fixture as a "cover fixture".

The inductively coupled plasma processing apparatus 1 shown in Fig. 1 is used for plasma treatment of, for example, a glass substrate for FPD (hereinafter referred to as "substrate") S. The FPD may, for example, be a liquid crystal display (LCD), an electroluminescence (EL) display, a plasma display panel (PDP) or the like.

The inductively coupled plasma processing apparatus 1 includes an antenna chamber 4 and a processing chamber 5, and the main body container 2 is provided in the main body container 2, and the internal space of the main body container 2 is divided into upper and lower spaces as a "window assembly". The dielectric body wall 6 is constructed. The antenna chamber 4 is an upper space of the dielectric body wall 6 in the main body container 2, and the processing chamber 5 is a lower space of the dielectric body chamber 6 in the main body container 2. Therefore, the dielectric body wall 6 constitutes the bottom of the antenna chamber 4 and also constitutes the top of the processing chamber 5. The processing chamber 5 is kept airtight and the substrate is plasma treated there.

The body container 2 is a rectangular tubular container having an upper portion and a bottom portion and four side portions. Further, the main body container 2 may be a cylindrical container having an upper portion and a bottom portion and a cylindrical portion. As the material of the main body container 2, a conductive material such as aluminum or aluminum alloy can be used. In the case where aluminum is used as the material of the main body container 2, the inner wall surface of the main body container 2 is subjected to an Alumite treatment so that contaminants are not generated from the inner wall surface of the main body container 2. Further, the main body container 2 is in a grounded state.

The dielectric body wall 6 is formed into an approximately rectangular parallelepiped shape having an approximately square upper surface and a bottom surface and four side surfaces. The thickness of the dielectric body wall 6 is, for example, 30 mm. The dielectric body wall 6 is formed of a dielectric material. As a material of the dielectric body 6, a ceramic such as Al ₂ O ₃ or quartz can be used. As an example, the dielectric body wall 6 is divided into four pieces. That is, the dielectric body wall 6 has the first partial wall 6A, the second partial wall 6B, the third partial wall 6C, and the fourth partial wall 6D. In addition, the dielectric body wall 6 does not need to be divided into four parts.

The inductively coupled plasma processing apparatus 1 is further provided with a support frame 7 and a support beam 16 as a support assembly for supporting the dielectric body wall 6. The support frame 7 is attached to the side wall of the body container 2. The support beam 16 is of a cross type as shown in FIG. The four partial walls 6A, 6B, 6C, 6D of the dielectric body wall 6 are supported by the support frame 7 and the support beam 16.

The inductively coupled plasma processing apparatus 1 further includes a cylindrical suspension 8A and cylindrical suspensions 8B, 8C, 8D, 8E each having an upper end connected to the top of the body container 2. The central portion (cross cross portion) of the upper side of the support beam 16 is connected to the lower end portion of the suspension 8A. Further, the upper side of the support beam 16 is connected to the lower end portions of the suspension members 8B, 8C, 8D, 8E at four intermediate point positions between the central portion and the four front end portions of the cross. In this manner, the support beam 16 is suspended from the top of the main body container 2 by the five hangers 8A to 8E, and is disposed at a substantially central position in the upper and lower directions of the inside of the main body container 2, and is maintained in a horizontal state.

Although not shown in the drawings, the support beam 16 is formed with a gas flow path to which a processing gas to be described later is supplied, and a plurality of openings for ejecting the processing gas supplied to the gas flow path. As a material of the support beam 16, a conductive material can be used. As the conductive material, a metal material such as aluminum is preferably used. In the case where aluminum is used as the material of the support beam 16, an Alumite treatment should be performed on the inner and outer surfaces of the support beam 16 so that no contaminants are generated from the surface.

The inductively coupled plasma processing apparatus 1 further includes a high frequency antenna (hereinafter simply referred to as an antenna) 13 which is provided inside the antenna chamber 4 (that is, above the dielectric body wall 6 outside the processing chamber 5). As shown in FIG. 3, the antenna 13 is wound into a planar square shape of approximately square. The antenna 13 is disposed above the dielectric body wall 6. An integrator 14 and a high frequency power source 15 are disposed outside the main body container 2. One end of the antenna 13 is connected to the high frequency power source 15 via the integrator 14. The other end of the antenna 13 is connected to the inner wall of the body container 2, and is grounded via the body container 2.

The inductively coupled plasma processing apparatus 1 further includes a dielectric cover 12 as a "cover" covering the underside of the dielectric wall 6. The dielectric cover 12 is a plate-like body having an approximately square shape and a bottom surface and four side surfaces. The dielectric cover 12 is formed of a dielectric material. As a material of the dielectric cap 12, a ceramic such as Al ₂ O ₃ or quartz can be used.

For example, the dielectric cover 12 is divided into four portions in the same manner as the dielectric wall 6. That is, as shown in FIG. 4, the dielectric cover 12 has a first partial cover 12A, a second partial cover 12B, a third partial cover 12C, and a fourth partial cover 12D. The first to fourth partial cover plates 12A, 12B, 12C, and 12D each cover the first to fourth partial walls 6A, 6B, 6C, and 6D of the dielectric body wall 6. In addition, the dielectric cover 12 may not be divided into four parts.

As shown in FIG. 4, the inductively coupled plasma processing apparatus 1 further includes a dielectric cover fixture 18A, 18B1, 18B2, 18B3, and 18B4 as a cover for the embodiment in which the dielectric cover 12 is fixed. Plate fixture". As will be described later in detail, the dielectric cover 12 is fixed by the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4. Further, although not shown in the drawing, the dielectric cover 12 is formed with a plurality of openings corresponding to the opening of the support beam 16.

When the substrate S is subjected to plasma processing, high-frequency electric power (for example, high-frequency electric power of 13.56 MHz) for forming an induced electric field is supplied from the high-frequency power source 15 to the antenna 13. Thereby, an induced electric field is formed in the processing chamber 5 by the antenna 13. The induced electric field converts the processing gas described later into a plasma.

A gas supply device 20 is further disposed outside the main body container 2. The gas supply device 20 is connected to the gas flow path of the support beam 16 via a gas supply pipe 21 inserted into the hollow portion of the hanger 8A. The gas supply device 20 is for supplying a processing gas for plasma treatment. When the plasma treatment is performed, the processing gas is supplied into the processing chamber 5 through the gas supply pipe 21, the gas flow path and the opening in the support beam 16, and the opening of the dielectric cover 12. As the processing gas, for example, SF ₆ gas can be used.

The inductively coupled plasma processing apparatus 1 further includes a mounting table 22, an insulator frame 24, a support post 25, a bellows tube 26, and a gate valve 27. The pillar 25 is connected to a lifting device (not shown) provided below the body container 2, and protrudes into the processing chamber 5 through an opening formed at the bottom of the body container 2. Further, the pillar 25 has a hollow portion. The insulator frame 24 is disposed above the pillars 25. The insulator frame 24 is a box-shaped body in which an opening is formed in an upper portion. An opening portion connected to the hollow portion of the pillar 25 is formed at the bottom of the insulator frame 24. The bellows 26 surrounds the post 25 and is hermetically connected to the insulator frame 24 and the bottom inner wall of the body container 2. Thereby, the airtightness of the processing chamber 5 can be maintained.

The mounting table 22 is housed in the insulator frame 24 . The mounting table 22 has a mounting surface 22A on which the substrate S is placed. The mounting surface 22A faces the dielectric cover 12 . As a material of the mounting table 22, a conductive material such as aluminum can be used. In the case where aluminum is used as the material of the mounting table 22, the surface of the mounting table 22 is subjected to an Alumite treatment so that contaminants are not generated from the surface.

The inside of the main body container 2 is further provided with an integrator 28 and a high frequency power source 29. The mounting table 22 is connected to the integrator 28 via an energizing rod that penetrates the opening of the insulator frame 24 and the hollow portion of the pillar 25, and is connected to the high-frequency power source 29 via the integrator 28. When the substrate S is subjected to plasma processing, the bias high-frequency electric power (for example, high-frequency electric power of 380 kHz) is supplied from the high-frequency power source 29 to the mounting table 22. The high frequency electric power is used to efficiently attract ions in the plasma to the substrate S placed on the mounting table 22.

The gate valve 27 is disposed on the side wall of the body container 2. The gate valve 27 has a switching function to maintain the airtightness of the processing chamber 5 in the closed state, and to transport the substrate S between the processing chamber 5 and the outside in the open state.

A vacuum device 30 is further disposed outside the body container 2. The vacuum device 30 is connected to the processing chamber 5 via an exhaust pipe 31 connected to the bottom of the body container 2. When the substrate S is subjected to plasma treatment, the vacuum device 30 discharges the air in the processing chamber 5 to maintain the inside of the processing chamber 5 in a vacuum environment.

Next, the dielectric cover fixture of this embodiment will be described in detail with reference to Figs. 4 to 6 . 4 shows the dielectric cover 12 and the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4. Figure 5 is a cross-sectional view showing the position shown by line 5-5 in Figure 4, and Figure 6 is a cross-sectional view showing the position shown by line 6-6 in Figure 4. In Fig. 4, the circular marks represent screws.

As described above, the dielectric cover 12 has the first to fourth partial covers 12A to 12D. In FIG. 4, the first partial cover 12A is disposed in the upper left area of the dielectric cover 12, and the second partial cover 12B is disposed in the overall installation area of the dielectric cover 12. In the upper right area, the third partial cover 12C is disposed in the lower left area of the overall installation area of the dielectric cover 12, and the fourth partial cover 12D is disposed at the lower right of the overall arrangement area of the dielectric cover 12. region.

At the central portion of the dielectric cover 12, the first to fourth partial covers 12A, 12B, 12C, and 12D are each formed with L-shaped cutouts 12Aa, 12Ba, 12Ca, and 12Da, and when these are combined, A cross-shaped opening is formed.

Viewed from the side of the processing chamber 5, the shape of the dielectric cover fixture 18A is a cross type, and the cross-shaped opening formed by the cutout portions 12Aa, 12Ba, 12Ca, and 12Da at the central portion of the dielectric cover 12 is slightly Big. Next, the dielectric cover fixture 18A is placed and covered with the cross-shaped opening of the dielectric cover 12. Further, the dielectric cover fixture 18A may be formed with an opening corresponding to the closed portion of the support beam 16.

Viewed from the side of the processing chamber 5, the dielectric cover fixtures 18B1 to 18B4 are all rectangular in shape. The dielectric cover fixture 18B1 can support one side of each of the first and third partial covers 12A, 12C in a manner similar to the support frame 7. Further, the dielectric cover fixture 18B2 can support one side of each of the second and fourth partial covers 12B and 12D so as to be sandwiched between the support frames 7. Further, the dielectric cover fixture 18B3 can support one side of each of the first and second partial covers 12A and 12B so as to be sandwiched between the support frames 7. Further, the dielectric cover fixture 18B4 can support one side of each of the third and fourth partial covers 12C and 12D in a manner similar to the support frame 7.

As will be described in detail later, each of the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 includes one or more support portions and one fixed portion. The support portion is provided on the lower side of the supported portion as a part of the dielectric cover 12, and is a portion that supports the supported portion. The dielectric cover 12 has the same number of supported portions as the support portion (including the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4).

Hereinafter, the structure and function of the dielectric cover fixture 18A shown in FIG. 6 will be described in detail to represent the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4. As shown in FIG. 6, the dielectric cover fixture 18A is provided with a first support portion 18A1 supporting one portion of the first partial cover 12A and a portion supporting the second partial cover 12B. The second support portion 18A2 and the fixed portion 18A3. Although not shown in the drawings, the dielectric cover fixture 18A further includes a third support portion for supporting a portion of the third partial cover 12C, and a portion supporting the fourth partial cover 12D. The fourth support. The first and second support portions 18A1 and 18A2 are connected to the fixed portion 18A3 and are provided to extend laterally from the fixed portion 18A3. The third and fourth support portions are also the same as the first and second support portions 18A1 and 18A2.

On the other hand, the first partial cover 12A has a supported portion 12A1. The supported portion 12A1 has a lower face 12A1a and a side end 12A1b continuously formed to the lower face 12A1a. The side end 12A1b is also the end edge of the cutout portion 12Aa. The upper side of the supported portion 12A1 abuts on the lower side of at least one of the support beam 16 and the first partial wall 6A. In the example shown in FIG. 6, the upper side of the supported portion 12A1 is in contact with the lower side of the support beam 16 and the first partial wall 6A, but the upper portion of the supported portion 12A1 may only abut. The lower aspect of one of the support beam 16 and the first partial wall 6A.

Similarly, the second partial cover 12B has the supported portion 12B1. The supported portion 12B1 has a lower side 12B1a and a side end 12B1b continuously formed to the lower side 12B1a. The upper side of the supported portion 12B1 abuts on the lower side of at least one of the support beam 16 and the second partial wall 6B. In the example shown in FIG. 6, the upper side of the supported portion 12B1 abuts on the lower side of the support beam 16 and the second partial wall 6B, but the upper portion of the supported portion 12B1 may only abut against The lower aspect of one of the support beam 16 and the second partial wall 6B.

Each of the third and fourth partial cover plates 12C and 12D also has the same supported portion as the supported portions 12A1 and 12B1.

The first support portion 18A1 has an upper aspect that abuts on the lower side 12A1a of the supported portion 12A1, and the following aspects. The second support portion 18A2 has an upper aspect that abuts against the lower portion 12B1a of the supported portion 12B1, and the following aspects. Similarly, the third support portion has the above aspect of abutting against the supported portion of the third partial cover 12C, and the following aspects. The fourth support portion has the above aspect of abutting against the supported portion of the fourth partial cover 12D, and the following aspects. Each of the first to fourth support portions forms a tapered surface, and the distance from the upper portion of each of the support portions gradually decreases as it moves away from the fixed portion 18A3.

As seen from the side of the processing chamber 5, the shape of the supported portion 18A3 is equal to the shape of the cross-shaped opening of the dielectric cover 12, or slightly smaller than the shape. A portion of the fixed portion 18A3 is inserted into the cross-shaped opening of the dielectric cover 12. One of the fixed portions 18A3 is provided beside the supported portion 12A1 side end 12A1b, the supported portion 12B1 side end 12B1b, the third support portion side end, and the fourth support portion side end.

The fixed portion 18A3 is fixed so that the positional relationship with the support beam 16 (support member) does not change. Specifically, the fixed portion 18A3 is fixed to the support beam 16 as follows. First, the upper portion of the fixed portion 18A3 is brought into contact with the underside of the support beam 16. The dielectric cover fixture 18A further includes a plurality of screws for fixing the fixed portion 18A3 to the support beam 16. The number of the screws is, for example, eight as shown in FIG. Figure 6 shows two of the screws 19A1, 19A2. In the example shown in Fig. 6, the heads of the screws 19A1, 19A2 are disposed below the fixed portion 18A3, and the shaft portions of the screws 19A1, 19A2 are coupled to the support beam 16 through the fixed portion 18A3. Except for the screws 19A1, 19A2, the other screws are the same as the screws 19A1, 19A2.

Fig. 7 is a cross-sectional view showing another example of a method of fixing the dielectric cover fixture 18A. In this example, the heads of the screws 19A1, 19A2 are disposed above the support beam 16, and the shaft portions of the screws 19A1, 19A2 are inserted through the support beam 16 to be coupled to the fixed portion 18A3. Except for the screws 19A1, 19A2, the other screws are the same as the screws 19A1, 19A2.

When the fixed portion 18A3 is fixed to the support beam 16, the first support portion 18A1 is supported by the support portion 12A1 so as to be supported between at least one of the support beam 16 and the first partial wall 6A. In the portion 12A1 and the second support portion 18A2, the supported portion 12B1 is supported by sandwiching the support portion 12B1 between at least one of the support beam 16 and the second partial wall 6B. Similarly, the third support portion supports the supported portion like the supported portion of the third partial cover 12C between at least one of the support beam 16 and the third partial wall 6C, and the fourth support portion The support portion supports the supported portion like the supported portion of the fourth partial cover 12D between at least one of the support beam 16 and the fourth partial wall 6D.

Each of the dielectric cover fixtures 18B1 to 18B4 includes one support portion and one fixed portion. The shape of each of the support portions of the dielectric cover fixtures 18B1 to 18B4 is the same as the shape of each of the support portions of the dielectric cover fixture 18A. Each of the support portions of the dielectric cover fixtures 18B1 to 18B4 is disposed below the supported portion of the dielectric cover 12 (located at the position corresponding to the support portion). Each of the fixed portions of the dielectric cover fixtures 18B1 to 18B4 is fixed with respect to the support frame 7 as a support assembly, and a plurality of screws (for example, two screws shown in FIG. 4) are used. Thereby, the support portions of the dielectric cover fixtures 18B1 to 18B4 can be respectively supported between the support frame 7 and the dielectric body wall 6 to support the dielectric cover 12 (located on the corresponding support) The position of the department) is supported.

As shown in Fig. 4, the first partial cover 12A is fixed by the dielectric cover fixtures 18A, 1881, and 18B3. The second partial cover 12B is fixed by the dielectric cover fixtures 18A, 18B2, and 18B3. The third partial cover 12C is fixed by the dielectric cover fixtures 18A, 18B1, and 18B4. The fourth partial cover 12D is fixed by the dielectric cover fixtures 18A, 18B2, and 18B4.

As described above, the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 of the present embodiment are all provided with support portions (for example, 18A1 and 18A2 in FIG. 6) which are abutted to have a dielectric body. The lower aspect of one portion of the cover plate 12 and the support portion (for example, 12A1, 12B1 in FIG. 6) continuously formed to the side end of the lower aspect, and the support assembly (support beam 16, support frame 7) And at least one of the dielectric body walls 6 supports the supported portion in a manner of being supported by the support portion; and the fixed portion (for example, 18A3 in FIG. 6) is connected to the support portion, and a portion thereof The parts are placed beside the side end of the supported portion, and are fixed so that the positional relationship with the supporting member does not change.

Each of the support portions of the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4, and at least one of the support assembly and the dielectric body wall 6 can function as a clamp, and the corresponding dielectric cover can be used. A supported portion of 12 is interposed between the members to fix the dielectric cover 12.

According to this embodiment, the dielectric cover 12 can be fixed without forming a plurality of through holes for allowing the screw shaft portion to pass through the dielectric cover 12. Therefore, according to the present embodiment, when a plurality of through holes are formed in the dielectric cover 12, it is possible to prevent breakage of the dielectric cover 12 caused by excessive stress applied to the vicinity of the through holes.

Further, in the present embodiment, the dielectric cover 12 is supported and fixed by abutting the upper side of the support portion of the dielectric cover fixture to the lower portion of the supported portion of the dielectric cover 12. . Therefore, according to this embodiment, local stress concentration is less likely to occur at the dielectric cover 12. From this point of view, the dielectric cover 12 can be prevented from being damaged according to this embodiment.

In this embodiment, instead of using a plurality of screws to directly fix the dielectric cover 12 to the support assembly, a plurality of screws are used to fix the fixed portion of the dielectric cover fixture relative to the support assembly. fixed. Compared with the case where a plurality of screws are used to directly fix the dielectric cover 12 to the support assembly, the number of screws used can be reduced according to this embodiment. This point is explained by comparing the comparative example shown in FIG.

Figure 8 is a bottom plan view of a dielectric cover of a comparative example. In Fig. 8, the circular mark represents a screw. The dielectric cover 222 of the comparative example has four divided partial covers 222A, 222B, 222C, and 222D similarly to the dielectric cover 12 of the present embodiment. The four partial covers 222A-222D are each fixed directly to the support assembly by 12 screws. Therefore, the dielectric cover 222 is integrally fixed by the support members with 48 screws. In this way, in the comparative example, the dielectric cover 222 is fixed by a plurality of screws, so that when the dielectric cover 222 is exchanged or cleaned, the dielectric cover 222 is detached. Sexual deterioration.

In this regard, as shown in FIG. 4, the dielectric cover 12 is indirectly opposed by the five dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 fixed by a total of 16 screws. Support the component and fix it. Therefore, compared with the comparative example shown in Fig. 8, the number of screws used in the present embodiment can be greatly reduced, and as a result, the dielectric cover 12 can be detachably attached.

Further, in the present embodiment, as shown in FIG. 6, even when the screw head is exposed to the processing chamber 5, the fixed portion of the dielectric cover fixture is fixed, as shown in FIG. In the comparative example, since the number of screws can be greatly reduced, the number of screw heads exposed to the processing chamber 5 can be greatly reduced. Therefore, according to the present embodiment, it is possible to prevent the by-products adhering to the screw head from being peeled off from the screw head to generate fine particles, or to cause the particles to be worn by the plasma to generate fine particles. Further, in the present embodiment, as shown in Fig. 7, the fixed portion of the dielectric cover fixture is fixed without exposing the screw head to the processing chamber 5, and the screw head is not at all Produce particles.

However, when the thickness of the support portion of the dielectric cover fixture is constant regardless of the position, a right-angled corner portion exposed to the inside of the processing chamber 5 is formed between the lower portion of the support portion and the side surface. The corners are likely to adhere to by-products. Therefore, in this case, it is easy to generate particles due to the corners. On the other hand, in the present embodiment, the lower side of the support portion of the dielectric cover fixture has a tapered surface, and the distance from the upper portion of the support portion gradually decreases as it goes away from the fixed portion. At this time, the surface of the support portion exposed to the processing chamber 5 is closer to the smooth surface than when the thickness of the support portion is constant regardless of the position. Therefore, according to this embodiment, it is possible to suppress the generation of particles generated by the support portion of the dielectric cover fixture.

[Modification]

Hereinafter, the first to sixth modifications of the dielectric cover and the dielectric cover fixture of the present embodiment will be described. Fig. 9 is a cross-sectional view showing a dielectric cover and a dielectric cover fixture of a first modification. Figure 9 is a cross section showing a portion corresponding to Figure 7. The dielectric cover 12 of the first modification has the first partial cover 32A and the second partial cover 32B shown in FIG. 9 instead of the first partial cover 12A and the second portion shown in FIG. Part cover 12B.

The first partial cover 32A has a supported portion 32A1. The supported portion 32A1 has a lower face 32A1a and a side end 32A1b continuously formed to the lower face 32A1a. The lower side of the supported portion 32A1 is a part of the lower side of the first partial cover 32A, and the lower portion of the first partial cover 32A is formed with a step portion so that the lower portion of the supported portion 32A1 is supported. The upper position of the part below the part other than 32A1.

Similarly, the second partial cover 32B has a supported portion 32B1. The supported portion 32B1 has a lower face 32B1a and a side end 32B1b continuously formed to the lower face 32B1a.

The dielectric cover fixture 38A of the first modification can be substituted for the dielectric cover fixture 18A shown in FIG. The dielectric cover fixture 38A has a first support portion 38A1, a second support portion 38A2, a fixed portion 38A3, and third and fourth support portions (not shown).

The first support portion 38A1 is provided on the lower portion of the first partial cover 32A, and the upper portion of the first support portion 38A1 abuts against the lower portion 32A1a of the supported portion 32A1. The first support portion 38A1 has a thickness equal to the step difference of the step portion. Therefore, a step is not formed between the lower portion of the first support portion 38A1 and the portion other than the portion of the first partial cover 32A that is supported by 32A1.

Similarly, the second support portion 38A2 is provided at the step portion of the lower portion of the second partial cover 32B, and the second support portion 38A2 abuts on the lower portion 32B1a of the supported portion 32B1.

Similarly to the fixed portion 18A3 of Fig. 7, the fixed portion 38A3 is fixed to the support beam 16 by eight screws (screws 19A1, 19A2).

Although not shown in the drawings, in the first modification, the relationship between the third and fourth support portions of the dielectric cover fixture 38A, the supported portions corresponding thereto, and other dielectric covers are shown. The relationship between the support portion of the plate fixture and the supported portion corresponding to the plate fixture is the same as the relationship between the support portion 38A1 and the supported portion 32A1.

According to the first modification, there is no step difference between the lower side of the support portion of the dielectric cover fixture and the lower portion of the portion other than the supported portion of the dielectric cover 12. Therefore, generation of particles due to the support portion of the dielectric cover fixture can be suppressed. Other structures, operations, and effects of the dielectric cover fixture of the first modification are the same as those of the dielectric cover fixture shown in FIG.

Fig. 10 is a bottom plan view showing a dielectric cover and a dielectric cover fixture according to a second modification, corresponding to Fig. 4; The dielectric cover fixtures 48B1, 48B2, 48B3, 48B4, 48B5, 48B6, 48B7, 48B8, 48C1, 48C2, 48C3, 48C4 of the second modification are substituted for the dielectric cover fixture shown in FIG. 18A, 18B1, 18B2, 18B3, 18B4.

The dielectric cover fixtures 48B1, 48B5 are capable of sandwiching and supporting the edges of the first partial cover 12A with the support frame 7. The dielectric cover fixtures 48B2, 48B7 can be held between the support frame 7 to support and support the 2 edges of the third partial cover 12C. The dielectric cover fixtures 48B3, 48B6 can be held between the support frame 7 to support and support the 2 edges of the second partial cover 12B. The dielectric cover fixtures 48B4, 48B8 can be held between the support frame 7 to support and support the 2 edges of the fourth partial cover 12D.

The dielectric cover fixture 48C1 is disposed along the boundary between the first partial cover 12A and the third partial cover 12C to support one side of the partial cover 12A, 12C. The dielectric cover fixture 48C2 is disposed along the boundary between the second partial cover 12B and the fourth partial cover 12D to support one side of the partial cover 12B, 12D. The dielectric cover fixture 48C3 is disposed along the boundary between the first partial cover 12A and the second partial cover 12B to support one side of the partial cover 12A, 12B. The dielectric cover fixture 48C4 is disposed along the boundary between the third partial cover 12C and the fourth partial cover 12D to support one side of the partial cover 12C, 12D.

Although not shown, the dielectric cover fixtures 48B1 to 48B8 are fixed relative to the support frame 7, and the dielectric cover fixtures 48C1 to C4 are fixed relative to the support beam 16. The dielectric cover fixtures 48C1 to 48C4 may be formed with openings corresponding to the openings of the support beams 16.

The first partial cover 12A is fixed by the dielectric cover fixtures 48B1, 48B5, 48C1, and 48C3. The second partial cover 12B is fixed by the dielectric cover fixtures 48B3, 48B6, 48C2, and 48C3. The third partial cover 12C is fixed by the dielectric cover fixtures 48B2, 48B7, 48C1, 48C4. The fourth partial cover 12D is fixed by the dielectric cover fixtures 48B4, 48B8, 48C2, 48C4.

The other structure, function, and effect of the dielectric cover fixture of the second modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

Fig. 11 is a bottom plan view showing a dielectric cover and a dielectric cover fixture according to a third modification, corresponding to Fig. 4; Dielectric cover fixtures 58A, 58B1, 58B2, 58B3, 58B4, 58B5, 58B6, 58B7, 58B8, 58C1, 58C2, 58C3, 58C4, 58D1, 58D2, 58D3, 58D4, 58E1, 58E2 according to the third modification Replace the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 shown in FIG. 4 with 58E3 and 58E4.

Viewed from the side of the processing chamber 5, the dielectric cover fixture 58A has a cross shape. Viewed from the side of the processing chamber 5, the shape of the dielectric cover fixtures 58B1 to 58B8 and 58C1 to 58C4 are all rectangular. Viewed from the side of the processing chamber 5, the dielectric cover fixtures 58D1 to 58D4 are all L-shaped. Viewed from the side of the processing chamber 5, the dielectric cover fixtures 58E1 to 58E4 are all T-shaped.

The dielectric cover fixture 58A is provided to cover the cross-shaped opening of the central portion of the dielectric cover 12. Further, the dielectric cover fixture 58A may be formed with an opening corresponding to the opening of the support beam 16.

The dielectric cover fixtures 58B1 to 58B8 and 58C1 to 58C4 are respectively disposed at the same positions of the dielectric cover fixtures 48B1 to 48B8 and 48C1 to 48C4 as shown in FIG. 10 to support the dielectric cover 12 under the cover. Part of the aspect.

A dielectric cover fixture 58D1 is provided to connect the dielectric cover fixtures 58B1, 58B5. A dielectric cover fixture 58D2 is provided to connect the dielectric cover fixtures 58B3, 58B6. A dielectric cover fixture 58D3 is provided to connect the dielectric cover fixtures 58B2, 58B7. A dielectric cover fixture 58D4 is provided to connect the dielectric cover fixtures 58B4, 58B8. The dielectric cover fixtures 58D1 - 58D4 each support a portion of the underside of the dielectric cover 12.

A dielectric cover fixture 58E1 is provided to connect the dielectric cover fixtures 58B1, 58B2, 58C1. A dielectric cover fixture 58E2 is provided to connect the dielectric cover fixtures 58B3, 58B4, 58C2. A dielectric cover fixture 58E3 is provided to connect the dielectric cover fixtures 58B5, 58B6, 58C3. A dielectric cover fixture 58E4 is provided to connect the dielectric cover fixtures 58B7, 58B8, 58C4. The dielectric cover fixtures 58E1 to 58E4 each support a portion of the underside of the dielectric cover 12.

Although not shown in the drawings, the dielectric cover fixtures 58A, 58C1 - C4 are fixed relative to the support beam 16, and the dielectric cover fixtures 58B1 - 58B8, 58D1 - 58D4 are attached to the support frame 7 The fixed dielectric cover fixtures 58E1 to 58E4 are fixed relative to the support frame 7 and the support beam 16. The dielectric cover fixtures 58C1 to 58C4 may be formed with openings corresponding to the openings of the support beams 16.

In the third modification, the two dielectric cover fixing members provided adjacent to each other in the horizontal direction are connected to each other. Each of the dielectric cover fixing members is provided with a side that allows the side portions of the two dielectric cover fixing members to mesh with each other when the two dielectric cover fixing members are disposed adjacent to each other in the horizontal direction. unit.

Figure 12 shows an example of the shape of the sides of the dielectric cover fixtures 58A, 58C2 for intermeshing. Figure 12 is a cross-sectional view showing two dielectric cover fixtures at the positions shown by lines 12-12 in Figure 11. In this example, each side edge portion of the dielectric cover fixtures 58A, 58C2 has a convex portion and a concave portion that are adjacent to each other. The positional relationship between the dielectric cover fixture 58 and the convex portion and the recess of the dielectric cover fixture 58C2 is reversed. Then, the convex portion of the dielectric cover fixture 58A can be embedded in the concave portion of the dielectric cover fixture 58C2, and the convex portion of the dielectric cover fixture 58C2 can be embedded in the concave portion of the dielectric cover fixture 58A. So that the side portions of the dielectric cover fixtures 58A, 58C2 are engaged with each other.

Fig. 13 is a view showing another example of the shape of the side portions of the dielectric cover fixing members 58A, 58C2 which are engaged with each other. In this example, as in the example shown in Fig. 12, each side portion of the dielectric cover fixtures 58A, 58C2 has a convex portion and a concave portion that are vertically adjacent to each other. In this example, the convex portion of the dielectric cover fixture 58C2 includes a convex portion and a concave portion adjacent to each other in the horizontal direction, and the concave portion of the dielectric cover fixture 58A also includes a dielectric cover. The concave portion and the convex portion where the convex portion and the concave portion of the convex portion of the fixture 58C2 mesh with each other.

In the third modification, the structure of the connection portion of the other two adjacent dielectric cover fixtures is also the same as shown in Fig. 12 or Fig. 13.

In the third modification, from the side of the processing chamber 5, the entire outer edge of the lower surface of the dielectric cover 12 and the boundary between the two adjacent partial covers are composed of a plurality of dielectric bodies. Covered by the cover fixture. Therefore, according to the third modification, from the side of the processing chamber 5, the gap between the outer peripheral portion of the dielectric cover 12 and the support frame 7 and the two adjacent partial covers can be completely covered. The gap created between them. Thereby, it is possible to suppress plasma from entering the gap. As a result, damage or abnormal discharge of the support frame 7 and the support beam 16 due to plasma intrusion into the gap can be suppressed. In particular, when each of the dielectric cover fixtures is provided with two dielectric cover fixtures disposed adjacent to each other in the horizontal direction, the sides of the two dielectric cover fixtures can be provided. The effect is particularly remarkable in the case where the side portions of the mutually intermeshing shape are engaged.

Other structures, operations, and effects of the dielectric cover fixture of the third modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

Fig. 14 is a bottom plan view showing a dielectric cover and a dielectric cover fixture according to a fourth modification, corresponding to Fig. 4; The dielectric cover 72 of the fourth modification can be substituted for the dielectric cover 12 shown in FIG. The dielectric cover 72 is not divided into four pieces.

The dielectric cover fixtures 78B1, 78B2, 78B3, and 78B4 of the fourth modification can be substituted for the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 shown in FIG. The dielectric cover fixtures 78B1, 78B2, 78B3, 78B4 are each disposed along a central portion of each of the lower sides of the dielectric cover 72 to support the edges of the dielectric cover 72. Viewed from the side of the processing chamber 5, the dielectric cover fixtures 78B1, 78B2, 78B3, and 78B4 are all rectangular in shape.

The other structure, function, and effect of the dielectric cover fixture of the fourth modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

Figure 15 is a cross-sectional view showing a dielectric cover and a dielectric cover fixture of a fifth modification. Fig. 15 shows a cross section corresponding to the portion of Fig. 6 or Fig. 7 (however, the illustration of the screws 19A1, 19A2 is omitted). In the fifth modification, the shape of the support beam 16A is different from that of the support beam 16 of Fig. 6 or Fig. 7. Specifically, the support beam 16A has a convex portion 16A1 at its lower end.

The dielectric cover fixture 79A replaces the dielectric cover fixture 18A shown in FIG. 6 or 7. The dielectric cover fixture 79A has a first support portion 79A1 that supports a portion of the first partial cover 12A, and a second support portion 79A2 that supports a portion of the second partial cover 12B; a portion 79A3; and third and fourth support portions not shown. The first and second support portions 79A1 and 79A2 are connected to the fixed portion 79A3 and are provided to extend from the fixed portion 79A3 to the side. The third and fourth support portions are also the same as the first and second support portions 79A1 and 79A2. In the fifth modification, the shape of the convex portion 16A1 of the support beam 16A is matched so that the thickness (height) of the fixed portion 79A3 is made thinner than the dielectric cover fixture shown in Fig. 6 or Fig. 7.

The first partial cover 12A and the second partial cover 12B of the dielectric cover 12 have the same structure as that shown in FIG. 6 or 7, and have supported portions 12A1 and 12B1. Further, the third and fourth partial cover plates 12C and 12D, which are not shown in the drawings, each have the same supported portion as described above.

The first support portion 79A1 has an upper aspect of abutting to the lower side 12A1a of the supported portion 12A1; and the following. The second support portion 79A2 has an upper aspect of abutting to the underside 12B1a of the supported portion 12B1; and the following. Similarly, the third support portion has the above aspect of abutting to the underside of the supported portion of the third partial cover 12C; and the following. The fourth support portion has an upper aspect of abutting to the underside of the supported portion of the fourth partial cover 12D; and the following. Each of the first to fourth support portions has a tapered surface, and the distance from the upper portion of each of the support portions gradually decreases as it moves away from the fixed portion 79A3.

As shown in the fifth modification, the dielectric cover fixture of the present invention can be formed into various shapes corresponding to the shape of the support beam 16 and the support frame 7 as the support assembly.

Other structures, operations, and effects of the dielectric cover fixture of the fifth modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

Fig. 16 is a bottom plan view of the dielectric cover and the dielectric cover fixture according to the sixth modification, corresponding to Fig. 4; Figure 17 is a cross-sectional view showing a dielectric cover and a dielectric cover fixture of a sixth modification. The dielectric cover 80 of the sixth modification replaces the dielectric cover 12 shown in FIG. The dielectric cover 80 is divided into four portions in the same manner as the dielectric wall 6. That is, as shown in FIG. 16, the dielectric cover 80 has a first partial cover 80A, a second partial cover 80B, a third partial cover 80C, and a fourth partial cover 80D. The first to fourth partial cover plates 80A, 80B, 80C, and 80D each cover the lower side of the first to fourth partial walls 6A, 6B, 6C, and 6D of the dielectric body wall 6. In addition, the dielectric cover 80 may not need to be divided into four parts.

In Fig. 16, the first partial cover 80A is disposed in the upper left area in the overall installation area of the dielectric cover 80, and the second partial cover 80B is disposed on the upper right of the overall arrangement area of the dielectric cover 80. In the region, the third partial cover 80C is disposed in the lower left area of the overall installation area of the dielectric cover 80, and the fourth partial cover 80D is disposed in the lower right area of the overall arrangement area of the dielectric cover 80. .

In the central portion of the dielectric cover 80, the first to fourth partial cover plates 80A, 80B, 80C, and 80D are each formed with arcuate cutout portions 80Aa, 80Ba, 80Ca, and 80Da, and the combinations may be circular. Opening.

Viewed from the side of the processing chamber 5, the dielectric cover fixture 81A has a circular shape and is formed into a circular opening formed by the cut-away portions 80Aa, 80Ba, 80Ca, 80Da at the central portion of the dielectric cover 80. Slightly larger. Next, the dielectric cover fixture 81A is provided to cover the circular opening of the dielectric cover 80.

Viewed from the side of the processing chamber 5, the dielectric cover fixtures 81B1 to 81B4 are all rectangular in shape. A side between each of the first and third partial cover plates 80A, 80C is sandwiched between the dielectric cover fixture 81B1 and the support frame 7. Further, between the dielectric cover fixture 81B2 and the support frame 7, one side of each of the second and fourth partial covers 80B, 80D is sandwiched and supported. Further, between the dielectric cover fixture 81B3 and the support frame 7, one side of each of the first and second partial covers 80A, 80B is sandwiched and supported. Further, between the dielectric cover fixture 81B4 and the support frame 7, one side of each of the third and fourth partial cover plates 80C, 80D is sandwiched.

Each of the dielectric cover fixtures 81A, 81B1, 81B2, 81B3, and 81B4 includes one or more support portions and one fixed portion. The support portion is provided on a lower side of the supported portion as a part of the dielectric cover 80, and is a portion that supports the supported portion. The dielectric cover 80 has a supported portion corresponding to all of the support portions (including the support portions of the dielectric cover fixtures 81A, 81B1, 81B2, 81B3, and 81B4).

Next, the structure and function of the dielectric cover fixture 81A will be described in detail. As shown in FIG. 17, the dielectric cover fixture 81A includes a support portion 81A1 that supports one of the first partial cover 80A and the second partial cover 80B, and a fixed portion 81A3. Although not shown, the support portion 81A1 of the dielectric cover fixture 81A is formed in a ring shape, and also supports a portion of the third partial cover 80C and a portion of the fourth partial cover 80D. The support portion 81A1 is connected to the fixed portion 81A3, and surrounds the fixed portion 81A3 so as to extend along the side thereof.

On the other hand, the first partial cover 80A has a supported portion 80A1. The supported portion 80A1 has the lower side 80A1a, and the side end 80A1b side end 80A1b continuously formed to the lower side 80A1a is also the end edge of the cut-away portion 80Aa. The upper portion of the supported portion 80A1 abuts on the lower side of at least one of the support portion 16B and the first partial wall 6A. In the example shown in FIG. 17, the upper portion of the supported portion 80A1 abuts against both the support beam 16B and the first partial wall 6A, but the upper portion of the support portion 80A1 may only abut against the support beam. The lower aspect of either of 16B and the first partial wall 6A. Similarly, the second partial cover 80B has a supported portion 80B1. The supported portion 80B1 has a lower face 80B1a and a side end 80B1b continuously formed to the lower face 80B1a. The upper side of the supported portion 80B1 abuts on the lower side of at least one of the support portion 16B and the second partial wall 6B. In the example shown in FIG. 17, the upper portion of the supported portion 80B1 abuts against both the support beam 16B and the second partial wall 6B, but the upper portion of the support portion 80B1 may only abut against the support beam. The lower aspect of either of 16B and the second partial wall 6B.

Each of the third and fourth partial cover plates 80C and 80D also has the same supported portion as the supported portions 80A1 and 80B1 of the first partial cover 80A and the second partial cover 80B.

The support portion 81A1 of the dielectric cover fixture 81A has an upper aspect of abutting to the underside 80A1a of the supported portion 80A1, and the following aspects. The underside of the support portion 81A1 is tapered, and becomes gradually smaller from the upper portion of the support portion 81A1 as it goes away from the fixed portion 81A3 (that is, toward the peripheral portion of the support portion 81A1). The shape of the fixed portion 81A3 is slightly smaller than the shape of the circular opening portion of the dielectric cover 80 from the side of the processing chamber 5. A portion of the fixed portion 81A3 is inserted into the circular opening of the dielectric cover 80. A part of the fixed portion 81A3 is provided on the side end of the side end 80A1b of the supported portion 80A1, the side end 80B1b of the supported portion 80B1, the side end of the third support portion, and the side end of the fourth support portion.

The fixed portion 81A3 of the dielectric cover fixture 81A is fixed so that the positional relationship with the support beam 16B (support assembly) does not change. Specifically, the fixed portion 81A3 is fixed to the support beam 16B as follows. First, the support beam 16B has a recess 16B1, and a thread groove (or thread) 16B2 is formed on the inner circumference of the recess 16B1. Further, the upper portion of the fixed portion 81A3 has a convex portion 81A3a projecting in a columnar shape, and a screw (or thread groove) 81A3b is formed on the outer periphery of the convex portion 81A3a. Then, the dielectric cover fixture 81A is fixed to the support beam 16B by screwing the convex portion 81A3a of the fixed portion 81A3 to the concave portion 16B1 of the support beam 16B. As described above, the dielectric cover fixture 81A of the sixth modification can be fixed to the support beam 16B without using a fixing mechanism such as a screw or the like, and the number of parts can be reduced, and the leakage from the plasma can be solved. The problem of particles on the head of the screw.

Other structures, operations, and effects of the dielectric cover fixture 81A of the sixth modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

Next, another example of the method of fixing the dielectric cover fixture of the present embodiment will be described with reference to Figs. Here, the dielectric cover fixture 18A shown in FIG. 6 or FIG. 7 will be described as an example. However, the fixing method described below can also be applied to other dielectric cover fixtures other than the above-described modifications.

Fig. 18 is a view showing an example of a method of fixing the dielectric cover fixture 18A. In this example, between the first support portion 18A1 of the dielectric cover fixture 18A and the supported portion 12A1 of the first partial cover 12A, and the second support of the dielectric cover fixture 18A. The intermediate members 201a and 201b are interposed between the portion 18A2 and the supported portion 12B1 of the second partial cover 12B. That is, the dielectric cover fixture 18A indirectly fixes the dielectric cover 12 (the first partial cover 12A and the second partial cover 12B) via the intermediate members 201a and 201b. The dielectric cover fixture 18A is fixed by screws 19A1 and 19A2 (not shown) in the same manner as in FIG. 6 or FIG. 7, for example. The intermediate unit 201a is sandwiched between the first support portion 18A1 and the supported portion 12A1, and the intermediate unit 201b is sandwiched between the second support portion 18A2 and the supported portion 12B1. Between the third partial cover 12C and the third support portion not shown, and between the fourth partial cover 12D and the fourth support portion, each has the same intermediate assembly as described above, but the intermediate The components can also be integrated.

Fig. 19 shows another example of the fixing method of the dielectric cover fixture 18A. In this example, an intermediate assembly 202 is interposed between the fixed portion 18A3 of the dielectric cover fixture 18A and the support beam 16. That is, the support beam 16 is indirectly sandwiched between the dielectric cover fixture 18A via the intermediate assembly 202 to sandwich the dielectric cover 12 (the first partial cover 12A and the second partial cover 12a). . The dielectric cover fixture 18A is fixed to the support beam 16 using screws 19A1, 19A2 (not shown), for example, as in FIG. 6 or FIG. The upper portion of the intermediate assembly 202 abuts against the lower end of the support beam 16. The lower portion of the intermediate assembly 202 abuts on the upper side of the supported portion 12A1 of the first partial cover 12A, the upper side of the supported portion 12B1 of the second partial cover 12B, and the dielectric cover fixture 18A. The upper side of the fixed portion 18A3.

Fig. 20 is still another example of the method of fixing the dielectric cover fixture 18A. In this example, between the dielectric cover fixture 18A (the fixed portion 18A3 and the first support portion 18A1) and the supported portion 32A1 of the first partial cover 32A, and the dielectric cover are fixed. Between the 18A (fixed portion 18A3 and the second support portion 18A2) and the supported portion 32B1 of the second partial cover 32B, intermediate members 203a and 203b are interposed therebetween and fixed. That is, the dielectric cover fixture 18A indirectly fixes the dielectric cover 12 (the first partial cover 32A and the second partial cover 32B) via the intermediate members 203a and 203b.

The first partial cover 32A and the second partial cover 32B have the same shape as the first modification (FIG. 9). That is, the first partial cover 32A has a supported portion 32A1 having a lower surface 32A1a and a side end 32A1b continuously formed to the lower surface 32A1a. The underside of the supported portion 32A1 is a portion of the lower portion of the first partial cover 32A. The lower portion of the first partial cover 32A is formed with a stepped portion so that the lower portion of the supported portion 32A1 is supported. The upper position of the part below the part other than 32A1. The intermediate member 203a is formed in a shape that can be engaged with the step portion.

Similarly, the second partial cover 32B has a supported portion 32B1, and the supported portion 32B1 has a lower portion 32B1a and a side end 32B1b continuously formed to the lower portion 32B1a. The lower portion of the supported portion 32B1 is a part of the lower portion of the second partial cover plate 32B, and the lower portion of the second partial cover plate 32B is formed with a stepped portion so that the lower portion of the supported portion 32B1 is supported. The upper position of the part below the part other than 32B1. The intermediate member 203b is formed in a shape that can be engaged with the step portion.

The dielectric cover fixture 18A is fixed by screws 19A1, 19A2 (not shown), for example, as in Fig. 6 or Fig. 7 . The intermediate unit 203a is sandwiched between the first support portion 18A1 and the supported portion 32A1, and the intermediate unit 203b is sandwiched between the second support portion 18A2 and the supported portion 32B1.

Between the third partial cover and the third support, not shown, and between the fourth partial cover and the fourth support, each has the same intermediate assembly as described above, but these The intermediate components can also be integrated.

The intermediate members 201a, 201b, 202, 203a, and 203b shown in Figs. 18, 19, and 20 can be made of a material such as ceramic having plasma resistance. By interposing the intermediate components 201a, 201b, 202, 203a, 203b, even if the size of the dielectric cover 12 is changed, the size and shape of the dielectric cover fixture 18A itself need not be changed, and the dielectric can be dielectrically The body cover fixture 18A is securely fixed. For example, as the first partial cover (12A, 32A) and the second partial cover (12B, 32B), the case where the thickness is thinner or the length of the face direction is shorter than that of FIG. 6 or FIG. 7 is used. The intermediate members 201a, 201b, 202, 203a, and 203b are provided so as to be fixed and free from gaps or clearances between the dielectric cover fixtures 18A.

Further, the intermediate members 201a, 201b, 202, 203a, and 203b may be made of an elastic material such as fluororesin or enamel rubber. In this case, even if deformation due to expansion or contraction or strain is caused by the heat of the dielectric cover 12, the deformation can be absorbed, so that the dielectric cover 12 can be prevented from being damaged, and no gap or clearance is generated. The fixed state of the dielectric cover 12 is surely maintained by the dielectric cover fixture 18A.

As described above, by disposing the intermediate member, the dielectric cover member 12 can be surely fixed by the dielectric cover fixture 18A, so that the plasma generated by the processing chamber 5 can be prevented from passing through the dielectric cover 12 The intrusion of the fixed portion and damage of the support beam 16 can also prevent abnormal discharge from occurring. As shown in Figures 18, 19 and 20, the other structure, function and effect of the dielectric cover fixture are the same as those of the dielectric cover fixture shown in Fig. 6 or Fig. 7.

[Second Embodiment]

Next, a dielectric cover fixing device as a "cover fixing device" according to a second embodiment of the present invention will be described with reference to Figs. 21 and 22 . Figure 21 is a cross-sectional view showing a dielectric cover panel fixing device of the embodiment. Figure 22 is a cross-sectional view showing another state of the dielectric cover fixing device shown in Figure 21.

The inductively coupled plasma processing apparatus of the present embodiment includes a support beam 86 (instead of the support beam 16 of the first embodiment), a dielectric cover 82 (instead of the dielectric cover 12 of the first embodiment), and The dielectric cover fixing device 87A of the "cover fixing device" (instead of the dielectric cover 12 dielectric cover fixing device 18A of the first embodiment). In the following, the dielectric cover fixing device 87A will be described in detail. However, in the present embodiment, a dielectric cover fixing device similar to the dielectric cover fixing device 87A may be provided instead of the first embodiment. The dielectric cover is fixed with a dielectric cover fixture other than 18A.

The support beam 86 is formed with one through hole penetrating from the upper side to the lower side. The through hole includes inner peripheral portions 86a, 86b, 86c, 86d which are sequentially disposed from the upper side to the lower side of the support beam 86. The inner diameters of the inner peripheral portions 86a, 86c are approximately equal. The inner diameters of the inner peripheral portions 86b, 86d are approximately equal and larger than the inner diameters of the inner peripheral portions 86a, 86c. At the boundary position between the two adjacent inner peripheral portions, an annular step forming surface that connects the two inner peripheral portions is formed.

The dielectric cover 82 is divided into four portions in the same manner as the dielectric cover 12 of the first embodiment. That is, the dielectric cover 82 has a first partial cover 82A, a second partial cover 82B, and third and fourth partial cover plates not shown.

The first partial cover 82A has a supported portion 82A1. The supported portion 82A1 has a lower side and a side end continuously formed to the lower side. The underside of the supported portion 82A1 is a portion of the lower portion of the first partial cover plate 82A. The lower portion of the first partial cover plate 82A is formed with a stepped portion so that the lower portion of the supported portion 82A1 is positioned at the supported portion. The upper position of the part below the 82A1. Similarly, the second partial cover 82B has a supported portion 82B1.

The dielectric cover fixing device 87A is provided with a dielectric cover fixture 88A and a fixing mechanism 90. Similarly to the dielectric cover fixture 38A shown in FIG. 9, the dielectric cover fixture 88A has a first support portion 88A1, a second support portion 88A2, a supported portion 88A3, and a third portion not shown. With the 4th support.

The first support portion 88A1 is provided at the step portion of the lower portion of the first partial cover 82A, and the upper portion of the first support portion 88A1 abuts against the lower portion of the supported portion 82A1. The first support portion 88A1 has a thickness equal to the step difference of the step portion. Therefore, there is no difference between the lower side of the first support portion 88A1 and the lower portion of the portion other than the supported portion 82A1 of the first partial cover 82A. Similarly, the upper side of the second support portion 88A2 abuts against the lower portion of the supported portion 82B1.

The relationship between the third support portion and the supported portion of the third partial cover, and the relationship between the fourth support portion and the supported portion of the fourth partial cover are associated with the first support portion 88A1 and The relationship between the supported portions 82A1 of the first partial cover 82A is the same. A part of the fixed portion 88A3 is provided on the side of the side end of the supported portion of the first to fourth partial cover plates.

Each of the support portions of the dielectric cover fixture 88A is disposed between at least one of the support beam 86 and the dielectric wall 6 to respectively support the dielectric cover 82 at a corresponding position of the support portion. Supported by the Ministry. In addition, in the example shown in FIGS. 21 and 22, the support portions 88A1, 88A2 of the dielectric cover fixture 88A and the support beam 86 are respectively sandwiched and supported by the supported portions 82A1, 82B1. However, the support portions 88A1, 88A2 may also be sandwiched between the dielectric body wall 6 or the support beam 86 and the dielectric body wall 6 to support the supported portions 82A1, 82B1.

Further, the fixed portion 88A3 has a hook portion 89 provided at a position higher than the upper surface of the dielectric cover 82. The hook portion 89 is housed in the inner peripheral portion 86d. The hook portion 89 is formed into an approximately cylindrical shape, and the inner diameter of one portion near the upper end is smaller than the inner diameter of the other portion. A portion of the vicinity of the upper end of the hook portion 89 is formed with an engaging portion that is engaged with a portion of the engaging member 94 as will be described later.

The fixing mechanism 90 is a mechanism for fixing the fixed portion 88A3 of the dielectric cover fixture 88A so that the positional relationship with the support beam 86 does not change. In the present embodiment, in particular, the fixing mechanism 90 is a mechanism that raises the fixed portion 88A3 using a pneumatic cylinder.

The fixing mechanism 90 has a pressing rod 91 and a cylinder block 92 which constitute a pneumatic cylinder. The cylinder 92 is fixed relative to the body container 2 either directly or via other components. The securing mechanism 90 further has a spring 93 and a snap-fit assembly 94. A portion of the fixing mechanism 90 is inserted into the through hole of the support beam 86.

The pressing rod 91 includes a first portion 91a housed in the cylinder 92, and a second portion 91b, a third portion 91c, a fourth portion 91d, a fifth portion 91e and a sixth portion 91f. The first portion 91a is continuously arranged from the lower side to the lower side. Each of the first to fifth portions 91a to 91e has a cylindrical shape. The sixth portion 91f has a conical shape.

The second portion 91b penetrates the bottom of the cylinder 92 and is inserted into the inner peripheral portion 86a. The outer diameter of the second portion 91b is smaller than the outer diameter of the first portion 91a. The third portion 91c is provided in the inner peripheral portion 86b. The outer diameter of the third portion 91c is larger than the outer diameter of the second portion 91b and larger than the inner diameter of the inner peripheral portions 86a, 86c.

The fourth portion 91d is provided in the inner peripheral portion 86b. The outer diameter of the fourth portion 91d is smaller than the outer diameter of the third portion 91c. The fifth portion 91e is inserted into the engaging portion of the inner peripheral portion 86c and the hook portion 89, and the lower end portion thereof is located below the engaging portion. The outer diameter of the fifth portion 91e is smaller than the outer diameter of the fourth portion 91d.

The sixth portion 91f is housed in the hook portion 89. The diameter of the bottom surface of the sixth portion 91f is larger than the outer diameter of the fifth portion 91e and smaller than the inner diameter of the engaging portion of the hook portion 89.

The inside of the cylinder block 92 has a space formed by the inner wall of the cylinder block 92 and the upper portion of the first portion 91a. A pipe 95 is connected to the cylinder block 92 to supply gas to the space, or to discharge the gas from the space.

The spring 93 is disposed in the inner peripheral portion 86b and is provided between the step forming surface at the boundary between the third portion 91c of the pressing rod 91 and the inner peripheral portions 86b and 86c. The fourth portion 91d is disposed inside the spring 93 and is movable up and down. The pressing rod 91 is biased upward by the spring 93.

The engaging assembly 94 has a flange 94a, a plurality of (for example, three) flat portions 94b connected to the lower end of the flange 94a, and a plurality of engaging portions 94c each facing the lower end of each flat portion 94b. Outer protruding. The flange 94a is formed with one through hole penetrating from the upper side to the lower side. The fifth hole 91e is inserted into the through hole. The outer diameter of the flange 94a is approximately equal to the inner diameter of the inner peripheral portion 86c. The flange 94a is restricted in movement in the upward direction by the spring 93 or the support beam 86. The flat plate portion 94b has flexibility. The lower end portion of the flat plate portion 94b is in contact with the sixth portion 91f.

Next, the action of the dielectric cap plate fixing device 87A of the present embodiment will be described. 21 shows a state in which the fixing mechanism 90 has not fixed the fixed portion 88A3 of the dielectric cover fixture 88A, and FIG. 22 shows that the fixing mechanism 90 has fixed the fixed portion 88A3 of the dielectric cover fixture 88A. status.

The state shown in Fig. 21 can be realized by supplying gas from the pipe 95 to the internal space of the cylinder block 92. In this state, the pressing lever 91 is located at the lower end of the movable range. In this state, the lower end portions of the plurality of flat plate portions 94b of the engaging member 94 are not expanded, and the plurality of engaging portions 94c are not engaged with the engaging portions of the hook portions 89. Therefore, in this state, the dielectric cover fixture 88A is not fixed relative to the support beam 86, and the dielectric cover fixture 88A and the dielectric cover 82 can be removed.

When the gas is supplied from the pipe 95 to the internal space of the cylinder block 92 and the gas is discharged from the internal space of the cylinder block 92, the state shown in Fig. 22 is obtained. At this time, the pressing rod 91 is pushed upward by the elastic force of the spring 93, and the lower end portions of the plurality of flat plate portions 94b of the engaging unit 94 are expanded outward by the sixth portion 91f. As a result, the plurality of engaging portions 94c are engaged with the engaging portions of the hook portions 89, and by raising the fixed portions 88A3, the dielectric cover fixing members 88A are not changed between the supporting members and the supporting beams 86. The positional relationship can be fixed relative to the support beam 86. Thereby, the dielectric cover 82 can be fixed by the dielectric cover fixture 88A.

As described above, in the present embodiment, the fixed portion 88A3 of the dielectric cover fixture 88A is lifted by the fixing mechanism 90 to fix the fixed portion 88A3 to the support assembly (support beam 86). The positional relationship between them does not change. Therefore, according to this embodiment, the dielectric cover fixture 88A and the dielectric cover 82 can be easily attached and detached.

Further, in the present embodiment, the pressing rod 91 of the fixing mechanism 90 is biased upward by the spring 93. Therefore, according to the present embodiment, even in the case where the gas leaks from the cylinder 92 during the disassembly and assembly of the dielectric cover 82, the dielectric cover fixture 88A and the dielectric cover 82 do not. fall.

Other configurations, operations, and effects of the present embodiment are the same as those of the first embodiment.

[Third embodiment]

Next, a dielectric cover panel fixing device which is a "cover fixing device" according to a third embodiment of the present invention will be described. Figure 23 is a cross-sectional view showing a dielectric cover panel fixing device of the embodiment. The inductively coupled plasma processing apparatus according to the present embodiment includes a support beam 96 (instead of the support beam 86 of the second embodiment), a dielectric cover 112 (instead of the dielectric cover 82 of the second embodiment), and Dielectric cover fixing device 120 (instead of dielectric cover fixing device 87A of the second embodiment). Further, the dielectric cover fixing device 120 will be described in detail below. However, in the present embodiment, a dielectric cover fixing device similar to the dielectric cover fixing device 120 may be provided instead of the second embodiment. A dielectric cover fixing device other than the electrical cover fixing device 87A.

The support beam 96 is formed with one through hole 96a penetrating from the upper side to the lower side. The dielectric cover 112 is divided into four portions in the same manner as the dielectric cover 12 of the first embodiment. That is, the dielectric cover 112 has a first partial cover 112A, a second partial cover 112B, and third and fourth partial cover plates not shown.

The first partial cover 112A has a supported portion 112A1. The supported portion 112A1 has a lower side, and a side end continuously formed to the lower side. The underside of the supported portion 112A1 is a part of the lower portion of the first partial cover 112A. The first partial cover 112A is formed with a stepped portion on the lower side so that the lower portion of the supported portion 112A1 is positioned at the supported portion 112A1. The upper position of the aspect below. Similarly, the second partial cover 112B also has a supported portion 112B1.

The dielectric cover fixing device 120 is provided with a press bar 121 as a dielectric cover fixture and a cylinder 122 as a fixing mechanism. The pressure bar 121 and the cylinder 122 constitute a pneumatic cylinder. The cylinder 122 is disposed above the support beam 96 and is fixed relative to the body container 2 either directly or via other components.

The presser bar 121 has a shaft-shaped fixed portion 121a, and an upper end portion thereof is housed in the cylinder 122; and a first support portion 121b1, a second support portion 121b2, and third and fourth support portions not shown. Each extends from the lower end portion of the fixed portion 121a to the side.

The first support portion 121b1 is provided at the stepped portion of the first partial cover 112A, and the first support portion 121b1 is in contact with the support portion 112A1. The first support portion 121b1 has a thickness equal to the step difference of the step portion. Therefore, a step is not formed between the lower side of the first support portion 121b1 and the lower portion of the portion other than the supported portion 112A1 of the first partial cover 112A. Similarly, the upper side of the second support portion 121b2 abuts on the lower side of the supported portion 112B1.

The relationship between the third support portion and the supported portion of the third partial cover, and the relationship between the fourth support portion and the supported portion of the fourth partial cover are associated with the first support portion 112b1 The relationship between the supported portions 112A1 of the first partial cover 112A is the same. A part of the fixed portion 121a is provided on the side of the side end of the supported portion of the first to fourth partial cover plates.

Each of the support portions is sandwiched between at least one of the support beam 96 and the dielectric body wall 6 to support the supported portion of the dielectric cover 112 at a corresponding position of the support portion. Further, in the example shown in Fig. 23, the support portions 121b1, 121b2 are supported between the support beams 96 to support the supported portions 112A1, 112B1, respectively. However, the support portions 121b1, 121b2 may be sandwiched between the dielectric body walls 6 or between the support beam 96 and the dielectric body wall 6 to support the supported portions 112A1, 112B1, respectively.

The cylinders 122 are connected to the pipes 123 and 124. When the gas is supplied into the cylinder 122 by the pipe 124 and exhausted by the pipe 123, the pressure bar 121 can be moved to the upper end of the movable range. Conversely, when the gas is supplied into the cylinder 122 by the pipe 123 and exhausted by the pipe 124, the pressure bar 121 can be moved to the lower end of the movable range.

In the dielectric cap fixing device 120 of the present embodiment, when the pressing lever 121 is moved to the upper end of the movable range, the fixed portion 121a can be raised, whereby the upper portions of the supporting portions 121b1 and 121b2 are respectively abutted to each other. The underside of the supported portions 112A1, 112B1. Thereby, the pressing rod 121 as the dielectric cover fixture can be fixed with respect to the support beam 96 so that the positional relationship with the support beam 96 does not change. Thereby, the dielectric cover 112 can be fixed by the pressing bar 121.

Further, when the pressing lever 121 is moved to the lower end of the movable range, the upper portions of the supporting portions 121b1, 121b2 are detached from the lower side of the supported portions 112A1, 112B1 to release the fixing of the dielectric cover 112.

Fig. 24 is a cross-sectional view showing a dielectric cap fixing device 130 according to a modification of the embodiment. The dielectric cover fixing device 130 of this modification includes a rack 131 (as a body cover fixture) and a gear 132 (as a fixing mechanism) instead of the presser bar 121 and the cylinder 122 of FIG. The rack 131 has a shaft-shaped fixed portion 131a that is inserted into the through hole 96a, and a first support portion 131b1, a second support portion 131b2, and third and fourth support portions (not shown), each of which is fixed from the fixed portion The lower end of 131a extends to the side. The shape and function of the first to fourth support portions are the same as those of the first to fourth support portions of the presser bar 121 shown in Fig. 23 . A pinion 132 is disposed above the support beam 96 and is rotatably fixed relative to the body container 2 either directly or via other components. A portion of the fixed portion 131a is disposed above the support beam 96, and a side portion of the portion is formed with teeth 131c that mesh with the gear 132.

In the dielectric cap fixing device 130 of the modification shown in FIG. 24, the rack 131 is moved in the up and down direction by the rotation of the gear 132, thereby being the same as the dielectric cover fixing 120 shown in FIG. The fixing and releasing of the dielectric cover 112 can be performed.

Other configurations, operations, and effects of the present embodiment are the same as those of the second embodiment.

[Fourth embodiment]

Next, a dielectric cover fixing device which is a "cover fixing device" according to a fourth embodiment of the present invention will be described. Figure 25 is a cross-sectional view showing a dielectric cover panel fixing device of the embodiment. The inductively coupled plasma processing apparatus of the present embodiment includes a dielectric cover fixing device 135 instead of the dielectric cover fixing device 120 of the third embodiment.

The dielectric cover fixing device 135 is provided with a dielectric cover fixture 148 and a fixing mechanism 140. The dielectric cover fixture 148 has a shaft-shaped fixing portion 148a, and a first support portion 148b1, a second support portion 148b2, and third and fourth support portions not shown, which are each from the lower end of the fixed portion 148a. The section extends to the side. The shapes and functions of the first to fourth support portions are the same as those of the first to fourth support portions of the press bar 121 shown in Fig. 23 . The fixed portion 148a is inserted into the through hole 96a. A portion of the fixed portion 148a is disposed above the support beam 96, and a portion is formed with a hole 148c penetrating in a horizontal direction. The dielectric cover fixing device 135 is further provided with a cover 149 which is mounted above the support beam 96 to cover a portion of the fixed portion 148a disposed above the support beam 96.

The fixing mechanism 140 is a mechanism that restricts movement of the fixing portion 148a in the up and down direction. The fixing mechanism 140 has a pressing rod 141 and a cylinder 142. The pressure bar 141 and the cylinder 142 constitute a pneumatic cylinder. The cylinder 142 can be fixed, for example, relative to the dielectric body wall 6. The pressing rod 141 is disposed in the horizontal direction and penetrates the cover plate 149 to be inserted into the hole 148c.

The cylinders 142 are connected to the pipes 143 and 144. When the gas is supplied into the cylinder 142 by the pipe 144 and exhausted by the pipe 143, the pressure bar 141 is protruded and inserted into the hole 148c. Thereby, the movement of the fixed portion 148a in the up and down direction can be restricted to fix the dielectric cover 112 by the dielectric cover fixture 148. Conversely, when the gas is supplied into the cylinder 142 by the pipe 143 and exhausted by the pipe 144, the pressing rod 141 is withdrawn from the hole 148c. Thereby, the fixed portion 148a can be moved in the vertical direction to release the fixing of the dielectric cover 112.

Fig. 26 is a cross-sectional view showing a dielectric cover fixing device 136 according to a modification of the embodiment. The dielectric cover fixing device 136 of this modification is provided with a fixing mechanism 150 instead of the fixing mechanism 140 of FIG. The fixing mechanism 150 has a rack 151 (instead of the pressing rod 141) and a gear 152 that moves the rack 151 in the horizontal direction. The rack 151 is disposed in the horizontal direction and can be inserted into the hole 148c through the cover plate 149.

In this modification, the rack 151 is moved in the horizontal direction by the rotation of the gear 152, whereby the dielectric cover 112 can be fixed in the same manner as the dielectric cover fixing device 135 shown in FIG. With lifting.

Other configurations, operations, and effects of the present embodiment are the same as those of the third embodiment.

[Fifth Embodiment]

Next, a dielectric cover fixing device which is a "cover fixing device" according to a fifth embodiment of the present invention will be described. Figure 27 is a cross-sectional view showing a dielectric cap fixing device of the embodiment. Figure 28 is a perspective view showing a portion of the dielectric cover fixing device of Figure 27.

The inductively coupled plasma processing apparatus of the present embodiment includes a support beam 186 (instead of the support beam 86 of the second embodiment), a dielectric cover 182 (instead of the dielectric cover 82 of the second embodiment), and Dielectric cover fixing device 187A (instead of the dielectric cover fixing device 87A of the second embodiment).

The support frame 186 is formed with one through hole penetrating from the upper side to the lower side. The through hole includes inner peripheral portions 186a, 186b which are sequentially disposed from the upper side to the lower side of the support beam 86. The inner diameter of the inner peripheral portion 186b is larger than the inner diameter of the inner peripheral portion 186a.

The dielectric cover 182 is divided into four portions in the same manner as the dielectric cover 82 of the second embodiment. That is, the dielectric cover 182 has a first partial cover 182A, a second partial cover 182B, and third and fourth partial cover plates not shown.

The first partial cover 182A has a supported portion 182A1. The supported portion 182A1 has a lower side, and a side end continuously formed to the lower side. The lower portion of the supported portion 182A1 is a part of the lower portion of the first partial cover plate 182A. The lower portion of the first partial cover plate 182A is formed with a stepped portion so that the lower portion of the supported portion 182A1 is positioned at the supported portion 182A1. The upper position of the aspect below. Similarly, the second partial cover 182B has a supported portion 182B1.

The dielectric cover fixing device 187A is provided with a dielectric cover fixture 188A and a fixing mechanism 190. Similarly to the dielectric cover fixture 88A of the second embodiment, the dielectric cover fixture 188A includes a first support portion 188A1, a second support portion 188A2, a fixed portion 188A3, and a portion not shown. 3 and the 4th support. The shapes and functions of the first to fourth support portions are the same as those of the second embodiment.

The fixed portion 188A3 has a hook portion 189 that is disposed above the cover plate 182. The hook portion 189 is housed in the inner peripheral portion 186b. The hook portion 189 is formed with a rectangular slit 189a as viewed from above, and is continuously formed to the inside from the upper side. Further, inside the hook portion 189, a hollow portion 189b formed continuously with the slit 189a is formed below the slit 189a. Viewed from above, the shape of the cavity portion 189b is a circle having a diameter equal to the long diameter of the slit 189a. A step forming surface that connects the slit 189a and the cavity portion 189b is formed at a boundary position between the slit 189a and the cavity portion 189b.

The fixing mechanism 190 has a holder 191, a motor 192, and a joint 193 that connects the rotary shaft of the motor 192 with the holder 191. As shown in Fig. 28, the retainer 191 has a shaft portion 191b, a disc portion 191a connected to the upper end of the shaft portion 191b, and a key portion 191c connected to the lower end of the shaft portion 191b. The disc portion 191a is disposed above the support beam 186 and is coupled to the joint 193. The shaft portion 191b is inserted into the inner circumferential portion 186a and the slit 189a. The key portion 191c has a rectangular parallelepiped shape that can pass through the size of the slit 189a. The key portion 191c is rotatably housed in the cavity portion 189b. Further, the dimension of the upper portion of the key portion 191c is approximately equal to the dimension of the upper and lower sides of the cavity portion 189b.

In the dielectric cap fixing device 187A of the present embodiment, the key portion 191c of the retainer 191 is rotated in the cavity portion 189b by the rotary shaft of the rotary motor 192. When the key portion 191c is stopped at a position other than the position at which the slit 189a can pass, the upper portion of the key portion 191c abuts against the step forming surface of the joint slot 189a and the hollow portion 189b, and the dielectric cover is fixed. The 188A is fixed, whereby the dielectric cover 182 can be secured by the dielectric cover fixture 188A.

When the key portion 191c is stopped at a position where it can pass through the slit 189a, the key portion 191c can be moved downward by the slit 189a, and the dielectric cover fixture 188A can be moved downward, whereby the dielectric cover 182 can be released. Fixed.

Other configurations, operations, and effects of the present embodiment are the same as those of the second embodiment.

[Sixth embodiment]

Next, a dielectric cover fixing device which is a "cover fixing device" according to a sixth embodiment of the present invention will be described. Figure 29 is a cross-sectional view showing a dielectric cover panel fixing device of the embodiment. The inductively coupled plasma processing apparatus of the present embodiment includes a dielectric cover 162 (instead of the dielectric cover 82 of the second embodiment) and a dielectric cover fixing device 290 (instead of the second embodiment) Dielectric cover fixture 87A). The dielectric cover 162 may also be divided into a plurality of portions or may not be divided. The structure of the dielectric cover fixing device 290 is the same as that of the fixing mechanism 90 of the second embodiment. Therefore, the constituent elements of the dielectric cover fixing device 290 are given the same reference numerals as those of the fixing mechanism 90.

The dielectric cover 162 has a cover body 162A having the following aspects and upper aspects, and constituting a main portion of the dielectric cover 162; and a hook portion 162B mounted on the cover body 162A. . The hook portion 162B is housed in the inner peripheral portion 86d of the support beam 86. The hook portion 162B is formed in an approximately cylindrical shape, and an inner diameter of a portion near the upper end is smaller than an inner diameter of the other portion. One of the portions near the upper end of the hook portion 162B is formed with an engaging portion 162B1 that engages with the plurality of engaging portions 94c of the engaging member 94. The engaging portion 162B1 corresponds to the supported portion of the dielectric cover of the present invention. Therefore, in the present embodiment, the engaging portion 162B1 as the supported portion is provided above the cover body 162A. The engaging portion 162B1 has the lower side and the side end continuously formed to the lower side (the end portion on the inner peripheral side of the engaging portion 161B1).

In the dielectric cover fixing device 290, the sixth portion 91f of the pressing rod 91 and the engaging portion 94c of the engaging member 94 are housed in the hook portion 162B. The engaging component 94 corresponds to the dielectric cover fixture of the present invention, and the components of the dielectric cover fixing device 290 other than the engaging component 94 correspond to lifting the card as a dielectric cover fixture. Assembly 94 (i.e., the securing mechanism of the present invention). Further, the engaging portion 94c corresponds to the supporting portion of the present invention, and a portion other than the engaging portion 94c of the engaging member 94 corresponds to the fixed portion of the present invention. The engaging portion 94c as the supporting portion is provided between the lower portion of the engaging portion 162B1 as the supported portion and the upper portion of the cover body 162A. A part of the flat plate portion 94b constituting the fixed portion is provided on the side of the side end of the engaging portion 162B1.

In the present embodiment, when gas is supplied from the pipe 95 to the internal space of the cylinder block 92, the pressure bar 91 moves to the lower end of the movable range. In this state, the lower end portions of the plurality of flat plate portions 94b of the engaging member 94 are not expanded, and the plurality of engaging portions 94c are not engaged with the engaging portions 162B1 of the hook portion 162B. Therefore, in this state, the engaging member 94 as the dielectric cover fixture is not fixed relative to the support beam 86, and the dielectric cover 162 can be removed.

When the gas is supplied from the pipe 95 to the internal space of the cylinder block 92, and the gas is discharged from the internal space of the cylinder block 92, the pressing rod 91 is pushed up by the elastic force of the spring 93, so that the plurality of flat plates of the engaging member 94 are pushed. The lower end of 94b is expanded outward by the sixth portion 91f. As a result, the plurality of engaging portions 94c are engaged with the engaging portions 162B1 of the hook portions 162B, and the engaging members 94 as the dielectric cover fixing members are fixed to the supporting beams 86 to support them. The positional relationship of the beam 86 does not change. Thereby, the dielectric cover 162 can be fixed so that the positional relationship with the support beam 86 does not change.

Other configurations, operations, and effects of the present embodiment are the same as those of the second embodiment.

[Seventh embodiment]

Next, a dielectric cover fixing device which is a "cover fixing device" according to a seventh embodiment of the present invention will be described. Figure 30 is a cross-sectional view showing a dielectric cover panel fixing device of the embodiment. The inductively coupled plasma processing apparatus of the present embodiment includes a dielectric cover 382 (instead of the dielectric cover 182 of the fifth embodiment) and a dielectric cover fixing device 390 (instead of the fifth embodiment) Electrical cover plate fixing device 187A). The dielectric cover 382 can also be divided into a plurality of portions or not divided. The structure of the dielectric cover fixing device 390 is the same as that of the fixing mechanism 190 of the fifth embodiment. Therefore, the constituent elements of the dielectric cover fixing device 390 are given the same reference numerals as those of the fixing mechanism 190.

The dielectric cover 382 has a cover body 382A having the following aspects and aspects, and constituting a main portion of the dielectric cover 382; and a hook portion 382B attached to the cover body 382A. The hook portion 382B is housed in the inner peripheral portion 186d of the support beam 186. The hook portion 382B is formed into a substantially cylindrical shape, and an inner diameter of a portion near the upper end is smaller than an inner diameter of the other portion.

The structure of the hook portion 382B is the same as that of the hook portion 189 of the fifth embodiment. That is, the hook portion 382B is formed with a rectangular slit 382Ba as viewed from above, and is continuously formed to the inside from the upper side. Further, inside the hook portion 382B, a hollow portion 382Bb formed continuously with the slit 382Ba is formed below the slit 382Ba. Viewed from above, the shape of the cavity portion 382Bb is a circle having a diameter equal to the long diameter of the slot 382Ba. A step forming surface that connects the slit 382Ba and the cavity portion 382Bb is formed at a boundary position between the slit 382Ba and the cavity portion 382Bb.

Further, the hook portion 382B has a supported portion 382B1 formed around the slit 382Ba. Therefore, in the present embodiment, the supported portion 382B1 is provided above the cover body 382A. The supported portion 382B1 has the lower side and the side end (the end of the slit 382Ba) continuously formed to the lower side.

In the holder 191 of the dielectric cover fixing device 390, the shaft portion 191b is inserted into the inner peripheral portion 186a and the slit 382Ba. The key portion 191c has a rectangular parallelepiped shape that can pass through the size of the slit 382Ba. The key portion 191c is rotatably housed in the cavity portion 382Bb. Further, the dimension of the upper portion of the key portion 191c is approximately equal to the dimension of the upper and lower faces of the cavity portion 382Bb.

The holder 191 corresponds to the dielectric cover fixture of the present invention, and the components of the dielectric cover fixture 390 other than the holder 191 correspond to the fixing mechanism of the present invention. The key portion 191c of the retainer 191 includes two support portions 191c1, 191c2 that can abut against the lower portion of the supported portion 382B1. In the holder 191, portions other than the support portions 191c1, 191c2 correspond to the fixed portion of the present invention. The support portions 191c1, 191c2 are disposed between the lower side of the supported portion 382B1 and the upper portion of the cover body 382A. A part of the shaft portion 191b constituting the fixed portion is provided on the side of the side end of the supported portion 382B1.

In the dielectric cover fixing device 390 of the present embodiment, when the rotary shaft of the motor 192 is rotated, the key portion 191c of the retainer 191 is rotated in the hollow portion 382Bb. When the key portion 191c is stopped at a position beyond the position of the slot 382Ba, the upper portions of the support portions 191c1, 191c2 abut against the lower portion of the supported portion 382B1 to fix the dielectric cover 382.

When the key portion 191c is stopped at a position through the slit 382Ba, the dielectric cover 382 can be moved downward by passing the key portion 191c through the slit 382Ba. Thereby, the fixing of the dielectric cover 382 can be released.

Other configurations, operations, and effects of the present embodiment are the same as those of the fifth embodiment.

Further, the present invention is not limited to the above embodiments, and various modifications can be made. For example, in the present invention, the mechanism for fixing the cover fixture is not limited to those shown in the respective embodiments.

2. . . Body container

4. . . Antenna room

5. . . Processing room

6. . . Dielectric wall

6A. . . Part 1 wall

6B. . . Part 2 wall

6C. . . Part 3 wall

6D. . . Part 4 wall

7. . . Support frame

8A~8E. . . Suspension

12. . . Dielectric cover

12A. . . Part 1 cover

12Aa. . . Resection

12A1, 12B1. . . Supported part

12A1a. . . The next aspect

12A1b. . . Side end

12B. . . Part 2 cover

12Ba. . . Resection

12B1a. . . The next aspect

12B1b. . . Side end

12C. . . Part 3 cover

12Ca. . . Resection

12D. . . Part 4 cover

12Da. . . Resection

13. . . antenna

14. . . Integrator

15. . . High frequency power supply

16. . . Support beam

18A, 18B1, 18B2, 18B3, 18B4. . . Dielectric cover fixture

18A1, 18A2. . . Support

18A3. . . Fixed part

19A1, 19A2. . . Screw

20. . . Gas supply device

twenty one. . . Gas supply pipe

twenty two. . . Mounting table

22A. . . Mounting surface

twenty four. . . Insulator frame

25. . . pillar

26. . . Snake tube

27. . . gate

28. . . Integrator

29. . . High frequency power supply

30. . . Vacuum device

31. . . exhaust pipe

32A. . . Part 1 cover

32A1. . . Supported part

32A1a. . . The next aspect

32A1b. . . Side end

32B. . . Part 2 cover

32B1. . . Supported part

32B1a. . . The next aspect

32B1b. . . Side end

38A. . . Dielectric cover fixture

38A1, 38A2. . . Support

38A3. . . Fixed part

48B1~48B8, 48C1~48C4, 58A. . . Dielectric cover fixture

58B1~58B8, 58C1~58C4, 58D1~58D4. . . Dielectric cover fixture

58E1~58E4, 79A, 78B1~78B4. . . Dielectric cover fixture

79A1, 79A2. . . Support

79A3. . . Fixed part

80. . . Dielectric cover

80A. . . Part 1 cover

80A1. . . Supported part

80A1a. . . The next aspect

80A1b. . . Side end

80Aa. . . Resection

80B. . . Part 2 cover

80B1. . . Supported part

80B1a. . . The next aspect

80B1b. . . Side end

80Ba. . . Resection

80C. . . Part 3 cover

80Ca. . . Resection

80D. . . Part 4 cover

80Da. . . Resection

81A. . . Dielectric cover fixture

81A1. . . Support

81A3. . . Fixed part

81A3a. . . Convex

81A3b. . . Screw

81B1~81B4. . . Dielectric cover fixture

82. . . Dielectric cover

82A. . . Part 1 cover

82A1. . . Supported part

82B. . . Part 2 cover

82B1. . . Supported part

86. . . Support beam

86a~86d. . . Inner circumference

87A. . . Dielectric cover fixing device

88A. . . Dielectric cover fixture

88A1, 88A2. . . Support

88A3. . . Supported part

89. . . Hook

90. . . Fixing mechanism

91. . . Pressure bar

91a. . . Part 1

91b. . . Part 2

91c. . . Part 3

91d. . . Part 4

91e. . . Part 5

91f. . . Part 6

92. . . Cylinder block

93. . . spring

94. . . Clamping component

94a. . . Flange

94b. . . Flat section

94c. . . Clamping department

95. . . Piping

112. . . Dielectric cover

112A. . . Part 1 cover

112A1. . . Supported part

112B. . . Part 2 cover

112B1. . . Supported part

120. . . Dielectric cover fixing device

121. . . Pressure bar

121a. . . Fixed part

121b1, 121b2. . . Support

122. . . Cylinder block

123, 124. . . Piping

130. . . Dielectric cover fixing device

131. . . rack

131a. . . Fixed part

131b1, 131b2. . . Support

131c. . . tooth

132. . . gear

135. . . Dielectric cover fixing device

136. . . Dielectric cover fixing device

140. . . Fixing mechanism

141. . . Pressure bar

142. . . Cylinder block

143, 144. . . Piping

148. . . Dielectric cover fixture

148a. . . Fixed part

148b1, 148b2. . . Support

148c. . . hole

149. . . Cover

150. . . Fixing mechanism

151. . . rack

152. . . gear

162. . . Dielectric cover

162A. . . Cover body

162B. . . Hook

162B1. . . Clamping department

182. . . Dielectric cover

182A. . . Part 1 cover

182A1. . . Supported part

182B. . . Part 1 cover

182B1. . . Supported part

186. . . Support beam

186a, 186b. . . Inner circumference

187A. . . Dielectric cover fixing device

188A. . . Dielectric cover fixture

188A1, 188A2. . . Support

188A3. . . Fixed part

189. . . Hook

189a. . . Slot

189b. . . Cavity

190. . . Fixing mechanism

191. . . Holder

191a. . . Round plate

191b. . . Shaft

191c. . . Key

192. . . motor

193. . . Connector

201a, 201b. . . Intermediate component

202. . . Intermediate component

203a, 203b. . . Intermediate component

222. . . Dielectric cover

222A~222D. . . Partial cover

290. . . Dielectric cover fixing device

382. . . Dielectric cover

382A. . . Cover body

382B‧‧‧ hook

382B1‧‧‧Supported Department

382Ba‧‧‧Slot

382Bb‧‧‧The Cavity Department

390‧‧‧Dielectric cover fixing device

S‧‧‧Substrate

Fig. 1 is a cross-sectional view showing an inductively coupled plasma processing apparatus including a cover fixture according to a first embodiment of the present invention.

2 is a perspective view of the dielectric wall and the suspension of FIG. 1.

3 is a perspective view of the dielectric wall and the high frequency antenna of FIG. 1.

Figure 4 is a bottom plan view of the cover and cover fixture of Figure 1.

Figure 5 is a cross-sectional view showing the position shown by line 5-5 in Figure 4.

Fig. 6 is a cross-sectional view showing the example of the fixing method of the cover fixture, taken along line 6-6 of Fig. 4.

Fig. 7 is a cross-sectional view showing another example of a method of fixing a cover fixture.

Fig. 8 is a bottom view of the cover of the comparative example.

Fig. 9 is a cross-sectional view showing a cover plate and a cover fixture according to a first modification of the first embodiment of the present invention.

Fig. 10 is a bottom plan view of a cover plate and a cover fixture according to a second modification of the first embodiment of the present invention.

Fig. 11 is a bottom plan view of a cover plate and a cover fixture according to a third modification of the first embodiment of the present invention.

Fig. 12 is a cross-sectional view showing an example of a shape of a side portion of a cover fixture according to a third modification.

Fig. 13 is a perspective view showing another example of the shape of a side portion of the cover fixture of the third modification.

Fig. 14 is a bottom plan view of a cover plate and a cover fixture according to a fourth modification of the first embodiment of the present invention.

Fig. 15 is a cross-sectional view showing a cover plate and a cover fixture according to a fifth modification of the first embodiment of the present invention.

Fig. 16 is a bottom plan view of a cover plate and a cover fixture according to a sixth modification of the first embodiment of the present invention.

Fig. 17 is a cross-sectional view showing the cover plate and the cover fixture of the sixth modification, taken along line 17-17 of Fig. 16.

Figure 18 is a cross-sectional view showing another example of a method of fixing a cover fixture.

Figure 19 is a cross-sectional view showing still another example of a method of fixing a cover fixture.

Figure 20 is a cross-sectional view showing still another example of a method of fixing a cover fixture.

Figure 21 is a cross-sectional view showing a cover fixing device according to a second embodiment of the present invention.

Figure 22 is a cross-sectional view showing another state of the cover fixing device shown in Figure 21.

Figure 23 is a cross-sectional view showing a cover fixing device according to a third embodiment of the present invention.

Figure 24 is a cross-sectional view showing a cover fixing device according to a modification of the third embodiment of the present invention.

Figure 25 is a cross-sectional view showing a cover fixing device according to a fourth embodiment of the present invention.

Figure 26 is a cross-sectional view showing a cover fixing device according to a modification of the fourth embodiment of the present invention.

Figure 27 is a cross-sectional view showing a cover fixing device according to a fifth embodiment of the present invention.

Figure 28 is a partial perspective view of the cover fixing device of Figure 27.

Figure 29 is a cross-sectional view showing a cover fixing device according to a sixth embodiment of the present invention.

Figure 30 is a cross-sectional view showing a cover fixing device according to a seventh embodiment of the present invention.

6. . . Dielectric wall

6A. . . Part 1 wall

6B. . . Part 2 wall

12. . . Dielectric cover

12A. . . Part 1 cover

12A1, 12B1. . . Supported part

12A1a. . . The next aspect

12A1b. . . Side end

12B. . . Part 2 cover

12B1a. . . The next aspect

12B1b. . . Side end

16. . . Support beam

18A. . . Dielectric cover

18A1, 18A2. . . Support

18A3. . . Fixed part

19A1, 19A2. . . Screw

Claims (10)

A cover fixture for an inductively coupled plasma processing apparatus is applied to an inductively coupled plasma processing apparatus for fixing a cover plate, and the inductively coupled plasma processing apparatus is provided with a processing chamber having a window assembly constituting a top for plasma processing a high frequency antenna disposed above the window assembly to form an induced electric field in the processing chamber, a support assembly supporting the window assembly suspended from the upper portion, and at least one portion covering the lower portion of the window assembly and the support assembly The cover plate, the cover fixture has a support portion for supporting a lower portion of the cover portion as a part of the cover plate, and a fixed portion fixed to the support assembly; the cover plate is fixed The sling is suspended from the upper portion by being fixed to the support assembly. The cover fixture of the inductively coupled plasma processing apparatus of claim 1, further comprising a screw corresponding to the support assembly for fixing the fixed portion. The cover fixture of the inductively coupled plasma processing apparatus of claim 2, wherein a head of the screw is disposed above the support assembly, and a shaft portion of the screw is coupled to the support member to be fixed thereto unit. The cover fixture of the inductively coupled plasma processing apparatus according to any one of claims 1 to 3, wherein the support portion has an upper surface that abuts to a lower side of the supported portion; and a lower portion The surface gradually becomes smaller from the upper side as it moves away from the fixed portion. A cover fixture for an inductively coupled plasma processing apparatus is applied to an inductively coupled plasma processing apparatus for fixing a cover plate, and the inductively coupled plasma processing apparatus is provided with a processing chamber having a window assembly constituting a top for plasma processing a high frequency antenna disposed above the window assembly to form an induced electric field in the processing chamber, a support assembly supporting the window assembly, and a cover covering the underside of the window assembly and at least a portion of the support assembly, the cover The plate fixture is provided with: a support portion supporting a supported portion as a part of the cover plate; and a fixed portion fixed to the support assembly; wherein the supported portion is under the cover plate In one aspect, the lower surface of the cover is formed with a stepped portion such that the lower portion of the supported portion is located above the portion other than the supported portion; the support portion is disposed on the cover portion The next aspect of the paragraph is at the difference. The cover fixture of the inductively coupled plasma processing apparatus of claim 5, wherein the support portion has a thickness equal to a step difference of the step portion. A cover fixture for an inductively coupled plasma processing apparatus is applied to an inductively coupled plasma processing apparatus for fixing a cover plate, and the inductively coupled plasma processing apparatus is provided with a processing chamber having a window assembly constituting a top for plasma processing , disposed above the window assembly and at the site a high frequency antenna forming an induced electric field in the chamber, a support assembly supporting the window assembly, and a cover covering the underside of the window assembly and at least a portion of the support assembly, the cover fixture having: a support portion Supporting a supported portion as a part of the cover; and the fixed portion is fixed to the support assembly; and further comprising a side portion, when the two cover fixing members are adjacently disposed in the horizontal direction, The shape of the side portions causes the side portions of the two cover fixtures to engage each other. The cover fixture of the inductively coupled plasma processing apparatus of claim 1, wherein the cover has a cover body having a lower aspect and an upper aspect to form a main portion of the cover; the supported portion is The upper portion is disposed on the upper side of the cover body; the support portion is disposed between the lower portion of the supported portion and the upper portion of the cover body. A cover fixing device for an inductively coupled plasma processing device is applied to an inductively coupled plasma processing device for fixing a cover plate, and the inductively coupled plasma processing device is provided with: a window assembly constituting a top for plasma processing a processing chamber, a high frequency antenna disposed above the window assembly to form an induced electric field in the processing chamber, a support assembly supporting the window assembly, and the cover covering the underside of the window assembly, the cover fixing device is provided with: a cover fixture of the first aspect of the patent; and fixing the fixed portion of the cover fixture to the support assembly a fixing mechanism at the position; the fixing mechanism is a mechanism for pulling up the fixed portion. The cover fixing device of the inductively coupled plasma processing apparatus according to claim 9, wherein the fixing mechanism restricts the mechanism in which the fixed portion moves in the up and down direction.