KR101155121B1 - Cover fixing member and cover fixing device of inductively coupled plasma processing apparatus - Google Patents

Abstract

In the inductively coupled plasma processing apparatus, breakage of the cover covering the lower surface of the window member and generation of particles are suppressed, and the cover can be easily detached. The dielectric cover 12 of the inductively coupled plasma processing apparatus includes supported portions 12A1 and 12B1 having a lower surface and side ends leading to the lower surface. The dielectric cover fixture 18A is in contact with the lower surface of the supported portions 12A1 and 12B1 of the dielectric cover 12, and among the supporting beams 16 and the dielectric wall 6 as a supporting member for supporting the dielectric wall 6. Support portions 18A1 and 18A2 for supporting the supported portions 12A1 and 12B1 with at least one of the supported portions 12A1 and 12B1 interposed therebetween, and a part of which is connected to the support portions 18A1 and 18A2. It is provided on the side of the side end of 12A1, 12B1, and is provided with the fixing part 18A3 fixed so that the positional relationship with the support beam 16 may not change.

Description

COVER FIXING MEMBER AND COVER FIXING DEVICE OF INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS}

The present invention relates to a cover fixture and a cover fixing device for fixing a cover covering a lower surface of a window member constituting a ceiling portion of a processing chamber in an inductively coupled plasma processing apparatus.

In the manufacturing process of an FPD (flat panel display), various plasma processes, such as plasma etching, plasma ashing, and plasma film-forming, are performed with respect to the glass substrate for FPD. As an apparatus for performing such plasma processing, an inductively coupled plasma (ICP) processing apparatus capable of generating a high density plasma is known.

The inductively coupled plasma processing apparatus is provided with a processing chamber in which the plasma processing is performed on a substrate which is kept airtight and is a target object, and a high frequency antenna disposed outside the processing chamber. The processing chamber has a window member made of a material such as a dielectric constituting the ceiling portion, and the high frequency antenna is disposed above the window member. In the inductively coupled plasma processing apparatus, an induction electric field is formed in the processing chamber through the window member by applying high frequency power to the high frequency antenna, and the processing gas introduced into the processing chamber by the induction electric field is excited by the plasma, A predetermined plasma treatment is performed on the substrate.

In the inductively coupled plasma processing apparatus, if the lower surface of the window member is exposed to the processing chamber, the lower surface of the window member is damaged by the plasma. Since the window member cannot be easily attached or detached, it cannot be easily replaced or cleaned even if it is damaged. Then, as described in patent document 1, covering the lower surface of the window member with the cover which can be easily detached is performed. As a result, the lower surface of the window member can be protected, and the damaged cover can be easily replaced or cleaned.

Japanese Patent Laid-Open No. 2001-28299

As described in Patent Literature 1, the conventional cover was fixed by a plurality of screws to the support member of the window member. In more detail, in the conventional cover fixing method, a plurality of through holes through which the shaft portion of the screw is inserted are respectively formed in the vicinity of the periphery of the cover, and the shaft portion of the screw is inserted into the through holes from the lower surface side of the cover. The shaft was screwed into the support member of the window member to fix the cover. However, the following problem has arisen in this conventional cover fixing method.

When plasma processing is performed in the processing chamber, the temperature is raised because the lower surface of the cover is continuously exposed to the plasma. In the process of raising the temperature of the lower surface of the cover, an uneven temperature distribution occurs at the lower surface of the cover, and as a result, a slight deformation such as stretching or warping occurs in the cover. At this time, a difference arises in the deformation amount of a cover and the deformation amount of a support member from the difference of the thermal expansion coefficient of the material of a cover (for example, ceramic), and the material of a support member (for example, aluminum). For this reason, when the cover is fixed to the support member by screws so that the portion near the through-hole of the cover is not displaced at all, excessive stress is applied to the portion near the through-hole of the cover, and the cover may be damaged from this portion.

Therefore, it is also considered that the diameter of the through hole of the cover is sufficiently larger than the diameter of the shaft portion of the screw, and the mechanism in which the cover and the screw are relatively displaceable is provided so that excessive stress is not applied to the portion near the through hole of the cover. However, since the stress applied to the cover when the cover is deformed is likely to be concentrated in the vicinity of the through hole, the cover is likely to be broken due to the occurrence of cracks starting from the through hole.

In the conventional cover fixing method, a plurality of convex portions formed by the head portions of the plurality of screws are formed at the ceiling of the processing chamber. By-products generated during the plasma treatment tend to adhere to these convex portions. For this reason, during plasma processing, the by-product which once adhered to the head part of a screw peels from the head part of a screw, and generate | occur | produces a particle (floating particle), and this particle may cause the etching failure. In addition, the head portion of the screw is consumed by the plasma, and particles are generated, which may cause etching failure.

In addition, in the conventional cover fixing method, since the cover is fixed using many screws, there is a problem in that the detachable workability of the cover is poor. In recent years, the processing chamber of the inductively coupled plasma processing apparatus has also been enlarged in response to the increase in size of the FPD. In an inductively coupled plasma processing apparatus having a large processing chamber, the window member and the cover may be constituted by a plurality of divided portions. In this case, since more screws are used for fixing the cover, the detachable workability of the cover is further lowered.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object thereof is to induce breakage of a cover covering a lower surface of a window member and generation of particles in an inductively coupled plasma processing apparatus, and to induce a detachable cover easily. A cover fixture and a cover fixture of a combined plasma processing apparatus are provided.

The cover fixture of the inductively coupled plasma processing apparatus of the present invention is used in an inductively coupled plasma processing apparatus. This inductively coupled plasma processing apparatus has a window member constituting a ceiling portion, a processing chamber in which plasma processing is performed, a high frequency antenna disposed above the window member to form an induction field in the processing chamber, and the window member. And a cover covering the lower surface of the window member. The cover fixture of the present invention is to fix the cover.

The cover fastener of the present invention includes a support for supporting a supported portion having a lower surface which is a part of the cover, and a fixed portion fixed to the support member.

The cover fastener of the present invention may further include a screw that fixes the fixed part to the support member. In this case, the head portion of the screw may be disposed above the support member, and the shaft portion of the screw may be coupled to the fixed part through the support member.

Further, in the cover fastener of the present invention, the support portion may have an upper surface contacting the lower surface of the supported portion, and a lower surface distance from the upper surface becomes narrower as it moves away from the fixed portion.

In addition, in the cover fastener of the present invention, the lower surface of the supported portion is a part of the lower surface of the cover, and the lower surface of the cover is formed such that the stepped portion is located above the lower surface of the portion other than the supported portion. The support portion may be disposed at the stepped portion at the lower surface of the cover. In this case, the support part may have the same thickness as the step difference of the step part.

Moreover, the cover fixture of this invention may be provided with the side part of the shape which the side parts of two cover fixtures engage | engage when two cover fixtures are further arrange | positioned adjacent to a horizontal direction.

Further, in the cover fastener of the present invention, the cover has a lower surface and an upper surface and has a cover body constituting a main portion of the cover, wherein the supported portion is disposed above the upper surface of the cover body, and the supported portion is the supported portion. It may be arranged between the lower surface of the upper surface and the upper surface of the cover body.

The cover fixing apparatus of the inductively coupled plasma processing apparatus of the present invention fixes the cover, and includes a cover fixing apparatus of the present invention and a fixing mechanism for fixing the fixing portion of the cover fixing apparatus with the supporting member.

In the cover fastener of the present invention, the fixing mechanism may be a mechanism for pulling up the fixed part. Alternatively, the fixing mechanism may be a mechanism for regulating the movement of the defendant in the vertical direction.

According to the present invention, it becomes possible to fix the cover by using a cover fastener provided with a supporting portion for supporting the supported portion of the cover and a fixing portion fixed to the supporting member. Accordingly, according to the present invention, the cover can be fixed without forming a plurality of through holes through which the shaft portion of the screw is inserted. As a result, according to the present invention, the damage to the cover and the generation of particles can be suppressed, and the cover can be easily removed.

1 is a cross-sectional view showing an inductively coupled plasma processing apparatus including a cover fixture according to a first embodiment of the present invention.
FIG. 2 is a perspective view illustrating the dielectric wall and the suspender in FIG. 1. FIG.
3 is a perspective view illustrating the dielectric wall and the high frequency antenna of FIG. 1.
FIG. 4 is a bottom view of the cover and the cover fixture in FIG. 1. FIG.
FIG. 5 is a cross-sectional view showing a cross section of the position shown by a 5-5 line in FIG. 4.
It is sectional drawing shown by the 6-6 line | wire in FIG. 4 explaining an example of the fixing method of a cover fastener.
7 is a cross-sectional view showing another example of the fixing method of the cover fastener.
8 is a bottom view illustrating the cover in a comparative example.
Fig. 9 is a sectional view showing the cover and the cover fixture of the first modification in the first embodiment of the present invention.
Fig. 10 is a bottom view showing the cover and the cover fixture of the second modification in the first embodiment of the present invention.
Fig. 11 is a bottom view showing the cover and the cover fixture of the third modification in the first embodiment of the present invention.
It is sectional drawing which shows an example of the shape of the side part in the cover fixture of 3rd modified example.
It is a perspective view which shows the other example of the shape of the side part in the cover fixture of 3rd modification.
Fig. 14 is a bottom view showing the cover and the cover fixture of the fourth modification in the first embodiment of the present invention.
Fig. 15 is a sectional view showing the cover and the cover fixture of the fifth modification in the first embodiment of the present invention.
Fig. 16 is a bottom view showing the cover and the cover fastener of the sixth modified example in the first embodiment of the present invention.
17 is a cross-sectional view taken along the 17-17 line in FIG. 16 illustrating a cover and a cover fastener of a sixth modification.
18 is a cross-sectional view showing another example of the fixing method of the cover fastener.
19 is a cross-sectional view showing another example of the fixing method of the cover fastener.
20 is a cross-sectional view showing still another example of the fixing method of the cover fastener.
21 is a cross-sectional view showing a cover fixing device according to a second embodiment of the present invention.
22 is a cross-sectional view showing another state of the cover fixing device shown in FIG.
23 is a cross-sectional view showing a cover fixing device according to a third embodiment of the present invention.
Fig. 24 is a sectional view showing the cover fixing device of the modification in the third embodiment of the present invention.
25 is a sectional view showing the cover fixing device according to the fourth embodiment of the present invention.
It is sectional drawing which shows the cover fixing apparatus of the modified example in 4th Example of this invention.
27 is a sectional view showing the cover fixing device according to the fifth embodiment of the present invention.
FIG. 28 is a perspective view illustrating a part of the cover fixing device of FIG. 27. FIG.
29 is a sectional view showing the cover fixing device according to the sixth embodiment of the present invention.
30 is a cross-sectional view showing the cover fixing apparatus according to the seventh embodiment of the present invention.

[First Embodiment]

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. First, the configuration of the inductively coupled plasma processing apparatus including the cover fixture according to the first embodiment of the present invention will be described with reference to FIGS. 1 to 4. 1 is a cross-sectional view showing an inductively coupled plasma processing apparatus. FIG. 2 is a perspective view of a dielectric wall and suspender as a 'window member' in FIG. 3 is a perspective view illustrating the dielectric wall and the high frequency antenna of FIG. 1. FIG. 4 is a bottom view of the dielectric cover as a 'cover' and the dielectric cover fixture as a 'cover fixture' in FIG.

In the inductively coupled plasma processing apparatus 1 shown in FIG. 1, for example, plasma processing is performed on a glass substrate (hereinafter, simply referred to as a substrate) S for an FPD. Examples of the FPD include a liquid crystal display (LCD), an electro luminescence (EL) display, a plasma display panel (PDP), and the like.

The inductively coupled plasma processing apparatus 1 includes a main body container 2 and a dielectric wall 6 as a 'window member' disposed in the main body container 2 and partitioning a space in the main body container into two upper and lower spaces. The antenna chamber 4 and the process chamber 5 comprised by the above are provided. The antenna chamber 4 defines a space above the dielectric wall 6 in the body container 2, and the processing chamber 5 defines a space below the dielectric wall 6 in the body container 2. Regulate. Therefore, the dielectric wall 6 constitutes the bottom of the antenna chamber 4 and also constitutes the ceiling portion of the processing chamber 5. The processing chamber 5 is kept airtight, and plasma processing is performed thereon.

The main body container 2 is a rectangular cylindrical container having an upper part, a lower part and four side parts. Moreover, the main body container 2 may be a cylindrical container which has an upper part, a bottom part, and a cylindrical part. As a material of the main body container 2, electroconductive materials, such as aluminum and an aluminum alloy, are used. When aluminum is used as the material of the main body container 2, anodization is performed on the inner wall surface of the main body container 2 so that no contaminants are generated from the inner wall surface of the main body container 2. In addition, the main body container 2 is grounded.

The dielectric wall 6 has a substantially rectangular parallelepiped shape having four sides and an upper and lower surfaces of a substantially square shape. The thickness of the dielectric wall 6 is 30 mm, for example. The dielectric wall 6 is formed of a dielectric material. As a material of the dielectric wall 6, ceramic or quartz, such as Al2O3, is used, for example. As an example, the dielectric wall 6 is divided into four parts. That is, the dielectric wall 6 has the 1st partial wall 6A, the 2nd partial wall 6B, the 3rd partial wall 6C, and the 4th partial wall 6D. In addition, the dielectric wall 6 does not need to be divided into four parts.

The inductively coupled plasma processing apparatus 1 further includes a support shelf 7 and a support beam 16 as a support member for supporting the dielectric wall 6. The support shelf 7 is attached to the side wall of the main body container 2. As shown in FIG. 2, the support beam 16 has a cross shape (+). Four partial walls 6A, 6B, 6C, and 6D of the dielectric wall 6 are supported by the support shelf 7 and the support beam 16.

The inductively coupled plasma processing apparatus 1 further includes a cylindrical suspender 8A and a cylindrical suspender 8B, 8C, 8D, and 8E each having an upper end portion connected to the ceiling portion of the main body container 2. Equipped with. The support beam 16 is connected to the lower end part of the suspender 8A in the center part (intersection part of a cross) of the upper surface. The support beam 16 is connected to the lower ends of the suspenders 8B, 8C, 8D, and 8E at four positions in the middle of the center portion on the upper surface and the four tip portions of the cross. In this way, the support beam 16 is suspended from the ceiling part of the main body container 2 by five suspenders 8A-8E, and is horizontal in the position of about the center of the up-down direction inside the main body container 2 in a horizontal state. It is arranged to keep.

Although not shown, the support beam 16 is provided with a gas flow path to which a processing gas described later is supplied, and a plurality of openings for discharging the processing gas supplied to the gas flow path. As the material of the support beam 16, a conductive material is used. It is preferable to use metal materials, such as aluminum, as this electroconductive material. When aluminum is used as the material of the support beam 16, anodization is performed on the surfaces inside and outside the support beam 16 so that no contaminants are generated from the surface.

The inductively coupled plasma processing apparatus 1 is additionally a high frequency antenna (hereinafter simply referred to as an antenna) 13 inside the antenna chamber 4, that is, outside the processing chamber 5 and disposed above the dielectric wall 6. ). As shown in FIG. 3, the antenna 13 has a substantially square planar rectangular vortex shape. The antenna 13 is disposed on the upper surface of the dielectric wall 6. The matching unit 14 and the high frequency power supply 15 are provided outside the main body container 2. One end of the antenna 13 is connected to the high frequency power supply 15 via the matching unit 14. The other end of the antenna 13 is connected to the inner wall of the main body container 2 and is grounded via the main body container 2.

The inductively coupled plasma processing apparatus 1 further includes a dielectric cover 12 as a 'cover' covering the lower surface of the dielectric wall 6. The dielectric cover 12 has a plate shape having four sides and an upper and lower surfaces having a substantially square shape. The dielectric cover 12 is formed of a dielectric material. As a material of the dielectric cover 12, ceramic or quartz, such as Al2O3, is used, for example.

As an example, the dielectric cover 12 is divided into four parts like the dielectric wall 6. That is, as shown in FIG. 4, the dielectric cover 12 has a first partial cover 12A, a second partial cover 12B, a third partial cover 12C, and a fourth partial cover 12D. . The first to fourth partial covers 12A, 12B, 12C, and 12D respectively cover the lower surfaces of the first to fourth partial walls 6A, 6B, 6C, and 6D of the dielectric wall 6. In addition, the dielectric cover 12 does not have to be divided into four parts.

As shown in Fig. 4, the inductively coupled plasma processing apparatus 1 further comprises dielectric cover fixtures 18A, 18B1, 18B2, 18B3, 18B4 as 'cover fixtures' according to the present embodiment for fixing the dielectric cover 12. ). As will be described later in detail, the dielectric cover 12 is fixed by the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4. Although not shown, the dielectric cover 12 is provided with a plurality of openings corresponding to the openings of the support beam 16.

When the plasma processing is performed on the substrate S, the high frequency power (for example, high frequency power of 13.56 MHz) for induction field formation is supplied from the high frequency power supply 15 to the antenna 13. As a result, an induction electric field is formed in the processing chamber 5 by the antenna 13. This induction electric field excites the processing gas described later with plasma.

The gas supply device 20 is further provided outside the main body container 2. The gas supply apparatus 20 is connected to the gas flow path of the support beam 16 via the gas supply pipe 21 inserted in the hollow part of the suspender 8A. The gas supply device 20 is for supplying a processing gas used for plasma processing. When plasma processing is performed, the processing gas is supplied into the processing chamber 5 through the gas supply pipe 21, the gas flow path and the opening in the support beam 16, and the opening of the dielectric cover 12. As the processing gas, for example, SF ₆ gas is used.

The inductively coupled plasma processing apparatus 1 further includes a susceptor 22, an insulator frame 24, a support column 25, a bellows 26, and a gate valve 27. The support pillar 25 is connected to a lifting device (not shown) provided below the main body container 2, and protrudes into the processing chamber 5 through an opening formed in the bottom of the main body container 2. In addition, the support column 25 has a hollow part. The insulator frame 24 is provided on the support pillar 25. The insulator frame 24 has a box shape with an open upper portion. The bottom part of the insulator frame 24 is formed with an opening leading to the hollow part of the support column 25. The bellows 26 surrounds the support pillar 25 and is hermetically connected to the insulator frame 24 and the bottom inner wall of the main body container 2. Thereby, the airtightness of the process chamber 5 is maintained.

The susceptor 22 is housed in the insulator frame 24. The susceptor 22 has a mounting surface 22A for mounting the substrate S. As shown in FIG. The mounting surface 22A faces the dielectric cover 12. As a material of the susceptor 22, electroconductive material, such as aluminum, is used, for example. When aluminum is used as the material of the susceptor 22, anodization is performed on the surface of the susceptor 22 so that no contaminants are generated from the surface.

Outside of the main body container 2, a matching device 28 and a high frequency power supply 29 are further provided. The susceptor 22 is connected to the matching device 28 via an energizing rod inserted into the opening of the insulator frame 24 and the hollow portion of the support column 25, and through the matching device 28. It is connected to the high frequency power supply 29. When plasma processing is performed on the substrate S, the susceptor 22 is supplied with a high frequency power for biasing (for example, a high frequency power of 380 kHz) from the high frequency power supply 29. This high frequency power is used for effectively drawing ions in the plasma into the substrate S placed on the susceptor 22.

The gate valve 27 is provided on the side wall of the main body container 2. The gate valve 27 has an opening / closing function to maintain the airtightness of the processing chamber 5 in the closed state, and enable the transfer of the substrate S between the processing chamber 5 and the outside in the open state.

Outside of the main body container 2, the vacuum apparatus 30 is further provided. The vacuum apparatus 30 is connected to the process chamber 5 via the exhaust pipe 31 connected to the bottom part of the main body container 2. When plasma processing is performed on the substrate S, the vacuum apparatus 30 exhausts the air in the processing chamber 5 to maintain the inside of the processing chamber 5 in a vacuum atmosphere.

Next, the dielectric cover fixture according to the present embodiment will be described in detail with reference to FIGS. 4 to 6. 4, dielectric cover 12 and dielectric cover fixtures 18A, 18B1, 18B2, 18B3, 18B4 are shown. FIG. 5 is a cross-sectional view showing a cross section of the position shown by a 5-5 line in FIG. 4. FIG. 6 is a cross-sectional view illustrating a cross section of a position shown by lines 6-6 in FIG. 4. In Fig. 4 the circled sign shows the screw.

As described above, the dielectric cover 12 has first to fourth partial covers 12A to 12D. In FIG. 4, the first partial cover 12A is disposed in the upper left region of the entirety of the dielectric cover 12, and the second partial cover 12B is located in the upper right region of the entirety of the dielectric cover 12. And the third partial cover 12C is disposed in the lower left region of the layout region of the entire dielectric cover 12, and the fourth partial cover 12D is located in the lower right region of the layout region of the entire dielectric cover 12. It is arranged.

In the center portion of the dielectric cover 12, the first to fourth partial covers 12A, 12B, 12C, and 12D are L-shaped cutout portions 12Aa, 12Ba, which become cross-shaped openings when they are combined, respectively. 12Ca and 12Da) are formed.

The shape of the dielectric cover fixture 18A seen from the process chamber 5 side is a cross shape slightly larger than the cross-shaped opening formed by the cutouts 12Aa, 12Ba, 12Ca, 12Da in the center portion of the dielectric cover 12. The dielectric cover fastener 18A is disposed to cover the cross-shaped opening of the dielectric cover 12. In addition, an opening corresponding to the opening of the support beam 16 may be formed in the dielectric cover fixture 18A.

The shapes of the dielectric cover fixtures 18B1 to 18B4 seen from the process chamber 5 side are all rectangular. The dielectric cover fixture 18B1 supports one side of each of the first and third partial covers 12A, 12C so as to sandwich the support shelf 7. In addition, the dielectric cover fixture 18B2 supports each side of each of the second and fourth partial covers 12B, 12D so as to sandwich the support shelf 7. In addition, the dielectric cover fixture 18B3 supports one side of each of the first and second partial covers 12A, 12B so as to sandwich the support shelf 7. In addition, the dielectric cover fixture 18B4 supports each side of the third and fourth partial covers 12C and 12D so as to sandwich the support shelf 7.

As will be described in detail later, the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 are all provided with at least one support and one defendant. The support portion is a portion disposed below the supported portion that is part of the dielectric cover 12 to support this supported portion. The dielectric cover 12 has the same number of supported portions as all the supports included in the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, 18B4.

Hereinafter, the structure and operation of the dielectric cover fixture 18A shown in FIG. 6 will be described in detail on behalf of the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4. As shown in FIG. 6, the dielectric cover fixture 18A includes a first support portion 18A1 for supporting a portion of the first partial cover 12A and a second support portion for supporting a portion of the second partial cover 12B. 18A2 and the defendant 18A3 are provided. Although not shown, the dielectric cover fastener 18A further includes a third support for supporting a portion of the third partial cover 12C and a fourth support for supporting a portion of the fourth partial cover 12D. The 1st and 2nd support parts 18A1 and 18A2 are connected to the to-be-fixed part 18A3, and are arrange | positioned so that it may extend laterally from the to-be-fixed part 18A3. The third and fourth supports are also the same as the first and second supports 18A1 and 18A2.

On the other hand, the first partial cover 12A has a supported portion 12A1. The supported portion 12A1 has a lower surface 12A1a and a side end 12A1b leading to the lower surface 12A1a. The side end 12A1b is also the edge of the cutout 12Aa. The upper surface of the supported portion 12A1 is in contact with at least one lower surface of the support beam 16 and the first partial wall 6A. In the example shown in FIG. 6, the upper surface of the supported portion 12A1 is in contact with both lower surfaces of the support beam 16 and the first partial wall 6A, but the upper surface of the supported portion 12A1 is supported by the support beam 16. ) And the lower surface of only one of the first partial walls 6A.

Similarly, the second partial cover 12B has a supported portion 12B1. The supported portion 12B1 has a lower surface 12B1a and a side end 12B1b leading to the lower surface 12B1a. The upper surface of the supported portion 12B1 is in contact with at least one lower surface of the support beam 16 and the second partial wall 6B. In the example shown in FIG. 6, the upper surface of the supported portion 12B1 is in contact with both lower surfaces of the support beam 16 and the second partial wall 6B, but the upper surface of the supported portion 12B1 is supported by the support beam 16. ) And the lower surface of only one of the second partial walls 6B.

The third and fourth partial covers 12C and 12D also have the same supported portions as the supported portions 12A1 and 12B1, respectively.

The first supporting portion 18A1 has an upper surface and a lower surface which contact the lower surface 12A1a of the supported portion 12A1. The second support portion 18A2 has an upper surface and a lower surface in contact with the lower surface 12B1a of the supported portion 12B1. Similarly, the third support portion has an upper surface contacting the lower surface of the supported portion in the third partial cover 12C and a lower surface, and the fourth support portion contacts the lower surface of the supported portion in the fourth partial cover 12D. And have a lower surface. Each lower surface of the first to fourth supporting portions is a tapered surface in which the distance from the upper surface of each supporting portion becomes narrower as it moves away from the fixed portion 18A3.

The shape of the fixed portion 18A3 seen from the process chamber 5 side is the same as or slightly smaller than that of the cross-shaped opening of the dielectric cover 12. A portion of the pinned portion 18A3 is inserted into the cross-shaped opening of the dielectric cover 12. A part of this fixed part 18A3 is arrange | positioned at the side end 12A1b of the to-be-supported part 12A1, the side end 12B1b of the to-be-supported part 12B1, the side end of a 3rd support part, and the side end of a 4th support part.

The fixed part 18A3 is fixed so that the positional relationship with the support beam 16 which is a support member does not change. Specifically, the fixed portion 18A3 is fixed to the support beam 16 as follows. First, the upper surface of the defender 18A3 is in contact with the lower surface of the support beam 16. The dielectric cover fixture 18A further includes a plurality of screws for fixing the fixed portion 18A3 to the support beam 16. The number of these screws is eight, for example as shown in FIG. 6 shows two screws 19A1 and 19A2. In the example shown in FIG. 6, the head portions of the screws 19A1 and 19A2 are disposed below the pinned portions 18A3, and the shaft portions of the screws 19A1 and 19A2 penetrate the pinned portions 18A3 to support the beam 16. Is bound to Screws other than the screws 19A1 and 19A2 are also the same as the screws 19A1 and 19A2.

7 is a cross-sectional view showing another example of the fixing method of the dielectric cover fixture 18A. In this example, the head portions of the screws 19A1 and 19A2 are disposed above the support beam 16, and the shaft portions of the screws 19A1 and 19A2 are coupled to the pinned portion 18A3 through the support beam 16. . Screws other than the screws 19A1 and 19A2 are also the same as the screws 19A1 and 19A2.

The fixed portion 18A3 is fixed relative to the support beam 16 such that the first support 18A1 sandwiches the supported portion 12A1 between at least one of the support beam 16 and the first partial wall 6A. To support the supported portion 12A1, and the second supported portion 18A2 sandwiches the supported portion 12B1 between at least one of the support beam 16 and the second partial wall 6B, thereby supporting the supported portion 12B1. Support. Similarly, the third support portion sandwiches the supported portion of the third partial cover 12C between at least one of the support beam 16 and the third partial wall 6C to support the supported portion, and the fourth support portion The supported portion is supported by sandwiching the supported portion of the fourth partial cover 12D between at least one of the support beam 16 and the fourth partial wall 6D.

The dielectric cover fasteners 18B1 to 18B4 are each provided with one support and one retainer. The shape of each support of the dielectric cover fixtures 18B1 to 18B4 is the same as the shape of each support of the dielectric cover fixture 18A. Each support portion of the dielectric cover fixtures 18B1 to 18B4 is disposed below the supported portion of the dielectric cover 12 at a position corresponding to the support portion, respectively. Each of the fixing parts of the dielectric cover fasteners 18B1 to 18B4 is fixed to the support shelf 7 as the support member using a plurality of screws (for example, two screws as shown in FIG. 4). Accordingly, each supporting portion of the dielectric cover fasteners 18B1 to 18B4 is sandwiched between at least one of the supporting shelf 7 and the dielectric wall 6, respectively, of the supporting portion of the dielectric cover 12 at positions corresponding to the supporting portions. Support it.

As shown in Fig. 4, the first partial cover 12A is fixed by the dielectric cover fasteners 18A, 18B1, and 18B3. The second partial cover 12B is fixed by the dielectric cover fasteners 18A, 18B2, and 18B3. The third partial cover 12C is fixed by the dielectric cover fasteners 18A, 18B1, and 18B4. The fourth partial cover 12D is fixed by the dielectric cover fasteners 18A, 18B2, and 18B4.

As described above, the dielectric cover fasteners 18A, 18B1, 18B2, 18B3, and 18B4 according to the present embodiment are all part of the dielectric cover 12, and have a supported portion having a lower end and a side end leading to the lower surface (for example, And contacting the lower surface at 12A1 and 12B1 in FIG. 6 to sandwich the supported portion between at least one of the support member (support beam 16, support shelf 7) and dielectric wall 6. A supporting part (for example, 18A1 and 18A2 in FIG. 6) supporting the branch, and a fixed part connected to the supporting part and partly arranged on the side of the side end of the supported part so that the positional relationship with the supporting member is fixed so as not to change. (For example, 18A3 in FIG. 6).

Each support of the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, 18B4 and at least one of the support member and the dielectric wall 6 are sandwiched between the supported portions of the dielectric cover 12 corresponding therebetween. 12) It functions as a clamp for fixing.

According to this embodiment, the dielectric cover 12 can be fixed without forming a plurality of through holes through which the shaft portion of the screw is inserted in the dielectric cover 12. For this reason, according to the present embodiment, when the plurality of through holes are formed in the dielectric cover 12, it is possible to prevent breakage of the dielectric cover 12 caused by excessive stress applied to the portion near the through holes.

In addition, in the present embodiment, the dielectric cover 12 is supported and fixed by the upper surface of the supporting portion of the dielectric cover fixture contacting the lower surface of the supported portion of the dielectric cover 12. For this reason, according to this embodiment, local concentration of stress in the dielectric cover 12 is unlikely to occur. Also in this respect, according to the present embodiment, breakage of the dielectric cover 12 can be prevented.

In this embodiment, the dielectric cover 12 is not directly fixed to the support member by using a plurality of screws, but the fixing portion of the dielectric cover fastener is fixed to the support member by using a plurality of screws. According to this embodiment, the number of screws used can be reduced as compared with the case where the dielectric cover 12 is directly fixed to the support member by using a plurality of screws. This will be described in comparison with the comparative example shown in FIG. 8.

8 is a bottom view illustrating the dielectric cover in the comparative example. In Fig. 8, the circled mark shows the screw. In the comparative example, the dielectric cover 222 has four partial covers 222A, 222B, 222C, and 222D divided like the dielectric cover 12 in this embodiment. These four partial covers 222A to 222D are fixed to the support member directly by twelve screws, respectively. Thus, the entire dielectric cover 222 is fixed to the support member by 48 screws. As described above, in the comparative example, since the dielectric cover 222 is fixed by a plurality of screws, the detachable workability of the dielectric cover 222 when the dielectric cover 222 is replaced or cleaned is poor.

In contrast, in this embodiment, as shown in Fig. 4, the dielectric cover 12 is indirectly by five dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 fixed by 16 screws in total. It is fixed with respect to the supporting member. Therefore, according to this embodiment, the number of screws used can be greatly reduced as compared with the comparative example shown in FIG. 8, and as a result, the dielectric cover 12 can be easily attached and detached.

In addition, in this embodiment, as shown in FIG. 6, even when the fixing part of the dielectric cover fastener is fixed so that the head part of the screw is exposed in the processing chamber 5, the number of screws is larger than in the comparative example shown in FIG. The number of head parts of the screw exposed in the processing chamber 5 is greatly reduced in that the number of parts is significantly smaller. Therefore, according to the present embodiment, the by-product attached to the head portion of the screw is peeled off from the head portion of the screw to generate particles, or the head portion of the screw is consumed by plasma to suppress the generation of particles. In addition, in the present embodiment, as shown in FIG. 7, when the fixing part of the dielectric cover fixture is fixed so that the head part of the screw is not exposed in the processing chamber 5, particles are generated due to the head part of the screw. Completely gone.

By the way, when the thickness of the support portion of the dielectric cover fixture is constant regardless of the place, a right angled corner portion exposed in the processing chamber 5 is formed between the lower surface and the side surface of the support portion. By-products are easily attached to this corner portion. Therefore, in this case, particles are likely to be generated due to the edges. In contrast, in the present embodiment, the lower surface of the support of the dielectric cover fixture is a tapered surface in which the distance from the upper surface of the support becomes narrower as it moves away from the defendant. In this case, the surface of the support portion exposed in the processing chamber 5 is closer to the smooth surface than the case where the thickness of the support portion is constant regardless of the place. Therefore, according to this embodiment, it is possible to suppress the generation of particles due to the supporting portion of the dielectric cover fixture.

[Modification]

The first to sixth modifications of the dielectric cover and the dielectric cover fixture in the present embodiment will be described below. 9 is a sectional view showing the dielectric cover and the dielectric cover fixture of the first modification. FIG. 9 illustrates a cross section corresponding to FIG. 7. The dielectric cover 12 of the first modification has a first partial cover 32A and a second partial cover shown in FIG. 9 instead of the first partial cover 12A and the second partial cover 12B in FIG. 32B).

The first partial cover 32A has a supported portion 32A1. The supported portion 32A1 has a lower surface 32A1a and a side end 32A1b leading to the lower surface 32A1a. The lower surface of the supported portion 32A1 is part of the lower surface of the first partial cover 32A, and the lower surface of the supported portion 32A1 is lower than the lower surface of the portion other than the supported portion 32A1 on the lower surface of the first partial cover 32A. The stepped portion is formed so as to be located above.

Similarly, the second partial cover 32B has a supported portion 32B1. The supported portion 32B1 has a lower surface 32B1a and a side end 32B1b leading to the lower surface 32B1a.

The dielectric cover fixture 38A of the first modification replaces the dielectric cover fixture 18A shown in FIG. The dielectric cover fixture 38A has a first support portion 38A1, a second support portion 38A2, a fixed portion 38A3, and third and fourth supports not shown.

The 1st support part 38A1 is arrange | positioned at said step part in the lower surface of the 1st partial cover 32A, and the upper surface of the 1st support part 38A1 is in contact with the lower surface 32A1a of the to-be-supported part 32A1. The first support part 38A1 has the same thickness as the step difference of the stepped part. For this reason, there is no step between the lower surface of the 1st support part 38A1, and parts other than the to-be-supported part 32A1 in the 1st partial cover 32A.

Similarly, the second supporting portion 38A2 is disposed at the stepped portion at the lower surface of the second partial cover 32B, and the upper surface of the second supporting portion 38A2 is in contact with the lower surface 32B1a of the supported portion 32B1. have.

The fixed portion 38A3 is fixed to the support beam 16 by eight screws including the screws 19A1 and 19A2, similar to the fixed portion 18A3 in FIG.

Although not shown, in the first modification, the relationship between the third and fourth supports of the dielectric cover fixture 38A and the supported portions corresponding thereto, and the relationship between the supports of the other dielectric cover fixtures and the corresponding supported portions thereof It is the same as the relationship of the said support part 38A1 and the to-be-supported part 32A1.

According to the first modification, no step occurs between the lower surface of the support of the dielectric cover fixture and the lower surface of the portions other than the supported portion of the dielectric cover 12. For this reason, it can suppress that a particle generate | occur | produces due to the support part of a dielectric cover fixture. Other configurations, operations, and effects of the dielectric cover fixture in the first modification are the same as those of the dielectric cover fixture shown in FIG.

FIG. 10 is a bottom view illustrating the dielectric cover and the dielectric cover fixture of the second modified example, corresponding to FIG. 4. The dielectric cover fixtures 48B1, 48B2, 48B3, 48B4, 48B5, 48B6, 48B7, 48B8, 48C1, 48C2, 48C3, and 48C4 of the second modified example are the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, 18B4).

The dielectric cover fasteners 48B1 and 48B5 support two sides of the first partial cover 12A by sandwiching them with the support shelf 7. The dielectric cover fixtures 48B2 and 48B7 support the two sides of the third partial cover 12C by sandwiching them with the support shelf 7. The dielectric cover fasteners 48B3 and 48B6 support the two sides of the second partial cover 12B by sandwiching them with the support shelf 7. The dielectric cover fasteners 48B4 and 48B8 support the two sides of the fourth partial cover 12D by sandwiching them with the support shelf 7.

The dielectric cover fixture 48C1 is disposed along the boundary between the first partial cover 12A and the third partial cover 12C, and supports one side of the partial covers 12A and 12C. The dielectric cover fixture 48C2 is disposed along the boundary between the second partial cover 12B and the fourth partial cover 12D to support one side of the partial covers 12B and 12D. The dielectric cover fixture 48C3 is disposed along the boundary between the first partial cover 12A and the second partial cover 12B to support one side of the partial covers 12A and 12B. The dielectric cover fixture 48C4 is disposed along the boundary between the third partial cover 12C and the fourth partial cover 12D to support one side of the partial covers 12C and 12D.

Although not shown, the dielectric cover fasteners 48B1 to 48B8 are fixed to the support shelf 7, and the dielectric cover fasteners 48C1 to 48 C4 are fixed to the support beam 16. The openings corresponding to the openings of the support beams 16 may be formed in the dielectric cover fixtures 48C1 to 48C4.

The first partial cover 12A is fixed by the dielectric cover fasteners 48B1, 48B5, 48C1, 48C3. The second partial cover 12B is fixed by the dielectric cover fixtures 48B3, 48B6, 48C2, and 48C3. The third partial cover 12C is fixed by the dielectric cover fixtures 48B2, 48B7, 48C1, and 48C4. The fourth partial cover 12D is fixed by the dielectric cover fasteners 48B4, 48B8, 48C2, and 48C4.

Other configurations, operations, and effects in the dielectric cover fixture of the second modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

FIG. 11 is a bottom view illustrating the dielectric cover and the dielectric cover fixture of the third modification, which corresponds to FIG. 4. Dielectric cover fixtures 58A, 58B1, 58B2, 58B3, 58B4, 58B5, 58B6, 58B7, 58B8, 58C1, 58C2, 58C3, 58C4, 58D1, 58D2, 58D3, 58D4, 58E1, 58E2, 58E3, 58E4 Replaces the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, 18B4 shown in FIG.

The shape of the dielectric cover fixture 58A seen from the process chamber 5 side is a cross shape. The shapes of the dielectric cover fixtures 58B1 to 58B8 and 58C1 to 58C4 seen from the processing chamber 5 side are all rectangular. The shapes of the dielectric cover fixtures 58D1 to 58D4 seen from the process chamber 5 side are all L-shaped. The shapes of the dielectric cover fixtures 58E1 to 58E4 seen from the process chamber 5 side are all T-shaped.

The dielectric cover fixture 58A is disposed so as to cover the cross openings in the center portion of the dielectric cover 12. In addition, an opening corresponding to the opening of the support beam 16 may be formed in the dielectric cover fixture 58A.

The dielectric cover fixtures 58B1 to 58B8 and 58C1 to 58C4 are respectively disposed at the same positions as the dielectric cover fixtures 48B1 to 48B8 and 48C1 to 48C4 shown in FIG. 10 to support a portion of the bottom surface of the dielectric cover 12.

Dielectric cover fixture 58D1 is arranged to connect dielectric cover fixtures 58B1 and 58B5. Dielectric cover fixture 58D2 is arranged to connect dielectric cover fixtures 58B3 and 58B6. Dielectric cover fixture 58D3 is arranged to connect dielectric cover fixtures 58B2 and 58B7. Dielectric cover fixture 58D4 is arranged to connect dielectric cover fixtures 58B4 and 58B8. Dielectric cover fixtures 58D1-58D4 each support a portion of the bottom surface of dielectric cover 12.

The dielectric cover fixture 58E1 is arranged to connect the dielectric cover fixtures 58B1, 58B2, 58C1. The dielectric cover fixture 58E2 is arranged to connect the dielectric cover fixtures 58B3, 58B4, 58C2. The dielectric cover fixture 58E3 is arranged to connect the dielectric cover fixtures 58B5, 58B6, 58C3. The dielectric cover fixture 58E4 is arranged to connect the dielectric cover fixtures 58B7, 58B8, 58C4. Dielectric cover fixtures 58E1-58E4 each support a portion of the bottom surface of dielectric cover 12.

Although not shown, dielectric cover fixtures 58A, 58C1-58 C4 are secured relative to support beam 16, dielectric cover fixtures 58B1-58B8, 58D1-58D4 secured relative to support shelf 7, and dielectric The cover fixtures 58E1 to 58E4 are fixed to the support shelf 7 and the support beam 16. The openings corresponding to the openings of the support beams 16 may be formed in the dielectric cover fixtures 58C1 to 58C4.

In a third variant, two dielectric cover fixtures arranged adjacent in the horizontal direction are connected. Each of the dielectric cover fixtures has a side portion in which the sides of the two dielectric cover fixtures are engaged with each other when the two dielectric cover fixtures are disposed adjacent to each other in the horizontal direction.

FIG. 12 shows an example of the shape of the sides engaged with each other in the dielectric cover fixtures 58A, 58C2. FIG. 12 shows a cross section of two dielectric cover fixtures at the positions shown by lines 12-12 in FIG. 11. In this example, each side of the dielectric cover fasteners 58A, 58C2 has a convex portion and a concave portion that are vertically adjacent. In the dielectric cover fixture 58A and the dielectric cover fixture 58C2, the positional relationship between the convex portion and the recessed portion is opposite to each other. The convex portion of the dielectric cover fixture 58A enters the concave portion of the dielectric cover fixture 58C2, and the convex portion of the dielectric cover fixture 58C2 enters the concave portion of the dielectric cover fixture 58A. , Sides of 58C2) are engaged.

FIG. 13 shows another example of the shape of the engaging sides in the dielectric cover fixtures 58A, 58C2. In this example, similarly to the example shown in FIG. 12, each side portion of the dielectric cover fasteners 58A and 58C2 has a convex portion and a concave portion adjacent to each other up and down. In this example, the convex portions of the dielectric cover fixture 58C2 include convex portions and concave portions that are adjacent in the horizontal direction, and the concave portions of the dielectric cover fixture 58A and the convex portions at the convex portions of the dielectric cover fixture 58C2 A concave portion and a convex portion engaged with the concave portion are included.

In the third modification, the structure of the connecting portion of two other adjacent dielectric cover fixtures is also the same as in FIG. 12 or 13.

In the third modification, the entire outer edge of the lower surface of the dielectric cover 12 and the entire boundary between the lower surfaces of two adjacent partial covers are disposed on the plurality of dielectric cover fasteners when viewed from the processing chamber 5 side. Covered by. Therefore, according to the third modification, the gap between the outer circumferential portion of the dielectric cover 12 and the support shelf 7 when viewed from the processing chamber 5 side or between two adjacent partial covers. The gap can be completely covered. As a result, the inflow of plasma into the gap can be suppressed. As a result, it is possible to suppress the occurrence of damage or abnormal discharge of the support shelf 7 or the support beam 16 by the introduction of plasma into the gap. This effect is particularly exhibited by the fact that each of the dielectric cover fasteners has a side portion having a shape in which the sides of the two dielectric cover fasteners are engaged when the two dielectric cover fasteners are disposed adjacent to each other in the horizontal direction.

Other configurations, operations and effects of the dielectric cover fixture in the third modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

FIG. 14 is a bottom view illustrating the dielectric cover and the dielectric cover fixture of the fourth modified example, corresponding to FIG. 4. The dielectric cover 72 of the fourth modification replaces the dielectric cover 12 shown in FIG. The dielectric cover 72 is not divided into four.

The dielectric cover fixtures 78B1, 78B2, 78B3, and 78B4 of the fourth modification replace the dielectric cover fixtures 18A, 18B1, 18B2, 18B3, and 18B4 shown in FIG. The dielectric cover fixtures 78B1, 78B2, 78B3, and 78B4 are respectively disposed along the central portion of each side of the lower surface of the dielectric cover 72 to support each side of the dielectric cover 72. The shapes of the dielectric cover fixtures 78B1, 78B2, 78B3, and 78B4 seen from the process chamber 5 side are all rectangular.

Other configurations, operations and effects of the dielectric cover fixture in the fourth modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

FIG. 15 is a sectional view showing the dielectric cover and the dielectric cover fixture of the fifth modification. FIG. FIG. 15 shows a cross section corresponding to FIG. 6 or 7 (however, the screws 19A1 and 19A2 are not shown). In the fifth modification, the shape of the support beam 16A is different from the support beam 16 in FIG. 6 or 7. Specifically, the support beam 16A has a convex portion 16A1 at its lower end.

The dielectric cover fixture 79A replaces the dielectric cover fixture 18A shown in FIG. 6 or FIG. The dielectric cover fixture 79A includes a first support portion 79A1 for supporting a portion of the first partial cover 12A, a second support portion 79A2 for supporting a portion of the second partial cover 12B, and a fixed portion ( 79A3) and 3rd and 4th support parts which are not shown in figure. The 1st and 2nd support parts 79A1 and 79A2 are connected to the to-be-fixed part 79A3, and are arrange | positioned so that it may extend laterally from the to-be-fixed part 79A3. The third and fourth supports are also the same as the first and second supports 79A1 and 79A2. In the fifth modification, the thickness (height) of the fixing portion 79A3 is formed thinner than that of the dielectric cover fixture shown in FIG. 6 or 7 in accordance with the shape of the convex portion 16A1 of the support beam 16A.

The first partial cover 12A and the second partial cover 12B of the dielectric cover 12 have the same configuration as in FIG. 6 or 7 and have supported portions 12A1 and 12B1. The third and fourth partial covers 12C and 12D, which are not shown, also have the same supported portions as above.

The first supporting portion 79A1 has an upper surface and a lower surface which contact the lower surface 12A1a of the supported portion 12A1. The second support portion 79A2 has an upper surface and a lower surface in contact with the lower surface 12B1a of the supported portion 12B1. Similarly, the third support portion has an upper surface contacting the lower surface of the supported portion in the third partial cover 12C and a lower surface, and the fourth support portion contacts the lower surface of the supported portion in the fourth partial cover 12D. And have a lower surface. Each lower surface of the first to fourth supporting portions is a tapered surface in which the distance from the upper surface of each supporting portion becomes narrower as it moves away from the fixed portion 79A3.

As shown in the fifth modification, the dielectric cover fastener of the present invention can be made into various shapes depending on the shape of the support beam 16 or the support shelf 7 serving as the support member.

Other configurations, operations and effects of the dielectric cover fixture in the fifth modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

FIG. 16 is a bottom view illustrating the dielectric cover and the dielectric cover fixture of the sixth modified example, which corresponds to FIG. 4. 17 is a sectional view showing the dielectric cover and the dielectric cover fixture of the sixth modification. The dielectric cover 80 of the sixth modification replaces the dielectric cover 12 shown in FIG. The dielectric cover 80 is divided into four parts like the dielectric wall 6. That is, as shown in FIG. 16, the dielectric cover 80 has the 1st partial cover 80A, the 2nd partial cover 80B, the 3rd partial cover 80C, and the 4th partial cover 80D. . The first to fourth partial covers 80A, 80B, 80C, and 80D cover lower surfaces of the first to fourth partial walls 6A, 6B, 6C, and 6D of the dielectric wall 6, respectively. In addition, the dielectric cover 80 does not have to be divided into four parts.

In FIG. 16, the first partial cover 80A is disposed in the upper left region of the entirety of the dielectric cover 80, and the second partial cover 80B is located above the right of the entirety of the dielectric cover 80. Disposed in the region, the third partial cover 80C is disposed in the lower left region of the arrangement region of the entire dielectric cover 80, and the fourth partial cover 80D is located in the lower right of the arrangement region of the entire dielectric cover 80; It is arranged in the area.

At the center of the dielectric cover 80, the first to fourth partial covers 80A, 80B, 80C, and 80D are arc-shaped cutouts 80Aa, 80Ba, 80Ca, which are circular openings when they are combined, respectively. 80 Da) is formed.

The shape of the dielectric cover fastener 81A seen from the process chamber 5 side is a circle slightly larger than the circular opening formed by the cutouts 80Aa, 80Ba, 80Ca, 80Da at the center of the dielectric cover 80. The dielectric cover fixing member 81A is disposed to cover the circular opening of the dielectric cover 80.

The shapes of the dielectric cover fixtures 81B1 to 81B4 seen from the process chamber 5 side are all rectangular. The dielectric cover fixture 81B1 supports each side of the first and third partial covers 80A, 80C so as to sandwich between the support shelves 7. In addition, the dielectric cover fastener 81B2 supports each side of each of the second and fourth partial covers 80B and 80D so as to sandwich the support shelf 7. In addition, the dielectric cover fastener 81B3 supports one side of each of the first and second partial covers 80A, 80B so as to sandwich the support shelf 7. In addition, the dielectric cover fastener 81B4 supports one side of each of the third and fourth partial covers 80C and 80D so as to sandwich the support shelf 7.

The dielectric cover fasteners 81A, 81B1, 81B2, 81B3, and 81B4 are all provided with at least one support and one defendant. The support portion is disposed below the supported portion that is part of the dielectric cover 80, and is a portion that supports the supported portion. The dielectric cover 80 has supported portions corresponding to all the supporting portions included in the dielectric cover fixtures 81A, 81B1, 81B2, 81B3, and 81B4.

Next, the configuration and operation of the dielectric cover fixture 81A will be described in detail. As shown in FIG. 17, 81 A of dielectric cover fixtures are equipped with the support part 81A1 which supports a part of 1st partial cover 80A and the 2nd partial cover 80B, and the fixed part 81A3. . Although not shown, the support portion 81A1 of the dielectric cover fixing member 81A has an annular shape, and also supports a part of the third partial cover 80C and a part of the fourth partial cover 80D. The support part 81A1 is connected to the fixed part 81A3, and is arrange | positioned so that it may extend to the side surrounding the fixed part 81A3.

On the other hand, the first partial cover 80A has a supported portion 80A1. The supported portion 80A1 has a lower surface 80A1a and a side end 80A1b leading to the lower surface 80A1a. The side end 80A1b is also the edge of the cutout 80Aa. The upper surface of the supported portion 80A1 is in contact with at least one lower surface of the support beam 16B and the first partial wall 6A. In the example shown in FIG. 17, the upper surface of the supported portion 80A1 is in contact with both lower surfaces of the support beam 16B and the first partial wall 6A, while the upper surface of the supported portion 80A1 is supported by the support beam 16B. ) And the lower surface of only one of the first partial walls 6A. Similarly, the second partial cover 80B has a supported portion 80B1. The supported portion 80B1 has a lower surface 80B1a and a side end 80B1b leading to the lower surface 80B1a. The upper surface of the supported portion 80B1 is in contact with at least one lower surface of the support beam 16B and the second partial wall 6B. In the example shown in FIG. 17, the upper surface of the supported portion 80B1 is in contact with both lower surfaces of the support beam 16B and the second partial wall 6B, but the upper surface of the supported portion 80B1 is the support beam 16B. ) And the lower surface of only one of the second partial walls 6B.

The third and fourth partial covers 80C and 80D also have the same supported portions as the supported portions 80A1 and 80B1 of the first partial cover 80A and the second partial cover 80B, respectively.

The support portion 81A1 of the dielectric cover fixing member 81A has an upper surface and a lower surface which contact the lower surface 80A1a of the supported portion 80A1. The lower surface of the support part 81A1 becomes a taper surface which becomes narrow from the upper surface of the support part 81A1 as it moves away from the to-be-fixed part 81A3 (namely, toward the periphery part of the support part 81A1). The shape of the fixed portion 81A3 seen from the process chamber 5 side is a circle slightly smaller than the shape of the circular opening of the dielectric cover 80. A portion of the retainer 81A3 is inserted into the circular opening of the dielectric cover 80. A part of this fixed part 81A3 is arrange | positioned at the side end 80A1b of the to-be-supported part 80A1, the side end 80B1b of the to-be-supported part 80B1, the side end of a 3rd support part, and the side end of a 4th support part.

The fixing portion 81A3 of the dielectric cover fixing member 81A is fixed so that the positional relationship with the supporting beam 16B as the supporting member is not changed. Specifically, the fixed portion 81A3 is fixed to the support beam 16B as follows. First, the support beam 16B has a recessed portion 16B1, and a screw groove (or thread) 16B2 is formed in the inner circumference of the recessed portion 16B1. Moreover, the upper part of the to-be-fixed part 81A3 has the convex part 81A3a which protruded in the column shape, and the thread (or screw groove) 81A3b is formed in the outer periphery of this convex part 81A3a. The dielectric cover fixing member 81A is fixed to the supporting beam 16B by screwing the convex portion 81A3a of the fixing portion 81A3 into the recessed portion 16B1 of the supporting beam 16B. As described above, the dielectric cover fixture 81A of the sixth modification can be fixed to the support beam 6B without using a fixing means of a separate component such as a screw, so that the number of components can be reduced, and also exposed to plasma. The problem that particles are generated from the head of the screw that has been screwed can also be solved.

Other configurations, operations, and effects of the dielectric cover fixture 81A in the sixth modification are the same as those of the dielectric cover fixture shown in FIG. 6 or 7.

Next, another example of the fixing method of the dielectric cover fixture according to the present embodiment will be described with reference to FIGS. 18 to 20. Although the description will be given using the dielectric cover fastener 18A shown in FIG. 6 or 7 as an example, the fixing method described below is applicable to other dielectric cover fasteners described as the above modifications.

18 shows an example of a method of fixing the dielectric cover fixture 18A. In this example, between the first support portion 18A1 of the dielectric cover fixture 18A and the supported portion 12A1 of the first partial cover 12A, and the second support portion 18A2 and the first portion of the dielectric cover fixture 18A. Intermediate members 201a and 201b are interposed between the two-part covers 12B to be supported 12B1, respectively. That is, the dielectric cover fastener 18A fixes the dielectric cover 12 (first partial cover 12A, second partial cover 12B) indirectly through the intermediate members 201a and 201b. The dielectric cover fastener 18A is fixed using, for example, screws 19A1 and 19A2 (not shown here) in the same manner as in FIG. 6 or FIG. 7. The intermediate member 201a is interposed between the first support portion 18A1 and the supported portion 12A1, and the intermediate member 201b is interposed between the second support portion 18A2 and the supported portion 12B1. Although the 3rd partial cover 12C which is not shown in figure and the 3rd support part has the same intermediate member also between the 4th partial cover 12D and the 4th support part, respectively, these intermediate members may be integral bodies.

Fig. 19 shows another example of the method of fixing the dielectric cover fixture 18A. In this example, the intermediate member 202 is interposed between the fixing portion 18A3 of the dielectric cover fastener 18A and the support beam 16. That is, the support beam 16 indirectly connects the dielectric cover 12 (the first partial cover 12A and the second partial cover 12B) with the dielectric cover fixture 18A via the intermediate member 202. I'm sandwiching. The dielectric cover fixture 18A is fixed to the support beam 16 using screws 19A1 and 19A2 (not shown here), for example, similarly to Figs. 6 or 7. The upper surface of the intermediate member 202 is in contact with the lower end of the support beam 16. The lower surface of the intermediate member 202 is the upper surface of the supported portion 12A1 of the first partial cover 12A, the upper surface of the supported portion 12B1 of the second partial cover 12B, and the fixing portion of the dielectric cover fixture 18A ( It is in contact with the upper surface of 18A3).

20 shows another example of the method of fixing the dielectric cover fixture 18A. In this example, between dielectric cover fixture 18A (fixed portion 18A3 and first support portion 18A1) and supported portion 32A1 of first partial cover 32A, and dielectric cover fixture 18A (defendant) Intermediate members 203a and 203b are interposed between the government part 18A3 and the second support part 18A2 and the supported part 32B1 of the second partial cover 32B, respectively. That is, the dielectric cover fastener 18A fixes the dielectric cover 12 (first partial cover 32A, second partial cover 32B) indirectly via the intermediate members 203a and 203b.

The 1st partial cover 32A and the 2nd partial cover 32B have the same shape as the said 1st modification (FIG. 9). That is, the first partial cover 32A has a supported portion 32A1, and this supported portion 32A1 has a lower surface 32A1a and a side end 32A1b leading to the lower surface 32A1a. The lower surface of the supported portion 32A1 is part of the lower surface of the first partial cover 32A, and the lower surface of the supported portion 32A1 is lower than the lower surface of the portion other than the supported portion 32A1 on the lower surface of the first partial cover 32A. The stepped portion is formed so as to be located above. The intermediate member 203a forms the shape which meshes with this step part.

Similarly, the second partial cover 32B has a supported portion 32B1, and the supported portion 32B1 has a lower surface 32B1a and a side end 32B1b leading to the lower surface 32B1a. The lower surface of the supported portion 32B1 is part of the lower surface of the second partial cover 32B, and the lower surface of the supported portion 32B1 is lower than the lower surface of the portion other than the supported portion 32B1 on the lower surface of the second partial cover 32B. The stepped portion is formed so as to be located above. The intermediate member 203b has a shape engaged with the stepped portion.

The dielectric cover fastener 18A is fixed using, for example, screws 19A1 and 19A2 (not shown here) in the same manner as in FIG. 6 or FIG. 7. The intermediate member 203a is interposed between the first support part 18A1 and the supported part 32A1, and the intermediate member 203b is interposed between the second support part 18A2 and the supported part 32B1.

Although the 3rd partial cover which is not shown in figure, and the 3rd support part and the 4th partial cover and the 4th support part also have the same intermediate members, respectively, these intermediate members may be integral bodies.

The intermediate members 201a, 201b, 202, 203a, and 203b shown in Figs. 18, 19, and 20 may be made of a material such as ceramic having plasma resistance, for example. By interposing the intermediate members 201a, 201b, 202, 203a, and 203b, even if the size of the dielectric cover 12 changes, the dielectric cover fixture 18A can be secured without changing the size or shape of the dielectric cover fixture 18A itself. Can be fixed. For example, even when the first partial covers 12A and 32A and the second partial covers 12B and 32B have a thin thickness or a length in the plane direction is shorter than those in Figs. By interposing the members 201a, 201b, 202, 203a, and 203b, it is possible to fix the gap between the dielectric cover fixture 18A without generating a gap or movement.

The intermediate members 201a, 201b, 202, 203a, and 203b may be made of an elastic material such as fluororesin or silicone rubber, for example. In this case, even if the dielectric cover 12 is deformed due to heat, stretching or warping, the deformation can be absorbed, so that breakage of the dielectric cover 12 can be prevented and no gap or movement is generated. The fixing state of the dielectric cover 12 by the dielectric cover fastener 18A can be reliably maintained.

As described above, the dielectric cover 12 can be reliably fixed by the dielectric cover fixture 18A by interposing the intermediate member, so that the plasma generated in the processing chamber 5 is fixed to the dielectric cover 12. It can also be prevented from intruding from and damaging the support beam 16 or generating abnormal discharge. Other configurations, operations, and effects in the dielectric cover fasteners shown in Figs. 18, 19, and 20 are the same as those of the dielectric cover fasteners shown in Figs.

Second Embodiment

Next, a dielectric cover fixing device as a 'cover fixing device' according to a second embodiment of the present invention will be described with reference to FIGS. 21 and 22. FIG. 21 is a sectional view showing the dielectric cover fixing device according to the present embodiment. 22 is a cross-sectional view showing another state of the dielectric cover fixing device shown in FIG.

The inductively coupled plasma processing apparatus in this embodiment has a support beam 86 instead of the support beam 16 in the first embodiment, and the dielectric cover 82 in place of the dielectric cover 12 in the first embodiment. And a dielectric cover fixing device 87A as a 'cover fixing device' instead of the dielectric cover fixing device 18A in the first embodiment. Further, the dielectric cover fixing device 87A will be described in detail below. In this embodiment, the dielectric cover fixing device 87A is the same as the dielectric cover fixing device other than the dielectric cover fixing device 18A in the first embodiment. A dielectric cover fixing device is installed.

The support beam 86 is formed with one through hole penetrating from the upper surface to the lower surface. The through hole includes inner peripheral portions 86a, 86b, 86c, and 86d sequentially arranged from the upper surface of the support beam 86 to the lower surface. The inner diameters of the inner peripheral parts 86a and 86c are approximately the same. The inner diameters of the inner circumferences 86b and 86d are approximately the same, and are larger than the inner diameters of the inner circumferences 86a and 86c. At the position of the boundary of two adjacent inner peripheral parts, the ring-shaped step formation surface which connects two inner peripheral parts is formed.

The dielectric cover 82 is divided into four parts like the dielectric cover 12 in the first embodiment. That is, the dielectric cover 82 has a first partial cover 82A, a second partial cover 82B, and third and fourth partial covers not shown.

The first partial cover 82A has a supported portion 82A1. The supported portion 82A1 has a lower surface and a side end leading to the lower surface. The lower surface of the supported portion 82A1 is part of the lower surface of the first partial cover 82A, and the lower surface of the supported portion 82A1 is lower than the lower surface of the portion other than the supported portion 82A1 on the lower surface of the first partial cover 82A. The stepped portion is formed so as to be located above. Similarly, the second partial cover 82B has a supported portion 82B1.

The dielectric cover fixing device 87A includes a dielectric cover fixing device 88A and a fixing mechanism 90. The dielectric cover fixture 88A, like the dielectric cover fixture 38A shown in FIG. 9, has a first support portion 88A1, a second support portion 88A2, a fixed portion 88A3, and a third and not shown figure. Has a fourth support.

The 1st support part 88A1 is arrange | positioned at said step part in the lower surface of the 1st partial cover 82A, and the upper surface of the 1st support part 88A1 is in contact with the lower surface of the to-be-supported part 82A1. The 1st support part 88A1 has the same thickness as the step difference of said step part. For this reason, there is no step between the lower surface of the 1st support part 88A1 and the lower surface of parts other than the to-be-supported part 82A1 in the 1st partial cover 82A. Similarly, the upper surface of the second support portion 88A2 is in contact with the lower surface of the supported portion 82B1.

The relationship between the supported portion of the third support portion and the third partial cover and the supported portion of the fourth support portion and the fourth partial cover is the supported portion 82A1 of the first support portion 88A1 and the first partial cover 82A. Same as the relationship with A part of the fixed portion 88A3 is disposed on the side of the side end of the supported portion of the first to fourth partial covers.

Each support portion of the dielectric cover fixture 88A supports the sandwiched portion of the dielectric cover 82 at a position corresponding to the support portion by sandwiching between the support beam 86 and at least one of the dielectric walls 6. 21 and 22 show an example in which the support portions 88A1 and 88A2 of the dielectric cover fixture 88A support sandwiching the supported portions 82A1 and 82B1 with the support beam 86, respectively. have. However, the support portions 88A1 and 88A2 sandwich the supported portions 82A1 and 82B1, respectively, between the dielectric wall 6 or between the support beam 86 and both of the dielectric walls 6 to be supported. You may also

In addition, the fixed portion 88A3 has a hook 89 disposed above the upper surface of the dielectric cover 82. The hook 89 is accommodated in the inner peripheral portion 86d. The hook 89 has a substantially cylindrical shape in which the inner diameter of a part near the upper end is smaller than the inner diameter of the other part. A part of the upper end vicinity of the hook 89 is an engaging part to which a part of the engagement member 94 mentioned later engages.

The fixing mechanism 90 is a mechanism for fixing the fixed portion 88A3 of the dielectric cover fixture 88A so that the positional relationship with the support beam 86 does not change. In the present embodiment, in particular, the fixing mechanism 90 is a mechanism for pulling up the fixed portion 88A3 by using an air cylinder.

The fixing mechanism 90 has a rod 91 and a cylinder 92 constituting the air cylinder. The cylinder 92 is fixed to the main body container 2 directly or through another member. The fixing mechanism 90 further has a spring 93 and an engagement member 94. A part of the fixing mechanism 90 is inserted into the through hole of the support beam 86.

The rod 91 includes a first portion 91a accommodated in the cylinder 92, a second portion 91b, a third portion 91c, and a fourth portion sequentially connected downward from the first portion 91a. 91d, the 5th part 91e, and the 6th part 91f are included. The first to fifth portions 91a to 91e all have a cylindrical shape. The sixth portion 91f has a conical shape.

The second portion 91b penetrates the bottom of the cylinder 92 and is inserted into the inner circumferential portion 86a. The outer diameter of the second portion 91b is smaller than the outer diameter of the first portion 91a. The third portion 91c is disposed in the inner circumferential portion 86b. The outer diameter of the third portion 91c is larger than the outer diameter of the second portion 91b and larger than the inner diameters of the inner circumferential portions 86a and 86c.

The fourth portion 91d is disposed in the inner circumferential portion 86b. The outer diameter of the fourth portion 91d is smaller than the outer diameter of the third portion 91c. The fifth portion 91e is inserted into the engaging portion of the inner circumferential portion 86c and the hook 89, and the lower end portion thereof is located below the engaging portion. The outer diameter of the fifth portion 91e is smaller than the outer diameter of the fourth portion 91d.

The sixth portion 91f is accommodated in the hook 89. The diameter of the bottom face of the sixth portion 91f is larger than the outer diameter of the fifth portion 91e and smaller than the inner diameter of the engaging portion of the hook 89.

Inside the cylinder 92, a space is formed by the inner wall of the cylinder 92 and the upper surface of the first portion 91a. The cylinder 92 is connected with a pipe 95 for supplying air to the space and for evacuating the air from the space.

The spring 93 is arrange | positioned in the inner peripheral part 86b between the 3rd part 91c of the rod 91, and the step formation surface in the boundary of the inner peripheral parts 86b and 86c. The fourth part 91d is arranged to be able to move up and down inside the spring 93. The rod 91 is applied upward by the spring 93.

The engagement member 94 is located outward from the flange 94a, a plurality of (for example, three) flat plate portions 94b connected to the lower end of the flange 94a, and a lower end portion of each flat plate portion 94b. It has a plurality of engaging portions 94c that protrude. The flange 94a is formed with one through hole penetrating from the upper surface to the lower surface. The fifth portion 91e is inserted through this through hole. The outer diameter of the flange 94a is approximately equal to the inner diameter of the inner circumferential portion 86c. The flange 94a is restricted from moving upward by the spring 93 or the support beam 86. The flat plate portion 94b has flexibility. The lower end part of the flat plate part 94b is in contact with the sixth part 91f.

Next, the operation of the dielectric cover fixing device 87A according to the present embodiment will be described. FIG. 21 shows a state in which the fixing mechanism 90 does not fix the fixed portion 88A3 of the dielectric cover fixture 88A, and FIG. 22 shows that the fixing mechanism 90 has a fixed portion 88A3 of the dielectric cover fixture 88A. ) Is shown in a fixed state.

The state shown in FIG. 21 is realized by supplying air from the pipe 95 to the space inside the cylinder 92. In this state, the rod 91 is located at the lower end of the movable range. In this state, the lower ends of the plurality of flat plates 94b of the engaging member 94 do not open, and the plurality of engaging portions 94c are not engaged with the engaging portions of the hooks 89. Therefore, in this state, the dielectric cover fixture 88A is not fixed to the support beam 86, so that the dielectric cover fixture 88A and the dielectric cover 82 can be separated.

When supply of air from the piping 95 to the space inside the cylinder 92 is stopped, and air is exhausted from the space inside the cylinder 92, it transfers to the state shown in FIG. At this time, the rod 91 is pushed upward by the force applied by the spring 93, and the lower end portions of the plurality of flat plates 94b of the engaging member 94 are opened out by the sixth portion 91f. As a result, the plurality of engaging portions 94c are engaged with the engaging portions of the hook 89 and the fixed portion 88A3 is pulled up, so that the positional relationship with the support beam 86 is not changed in the dielectric cover fixture 88A. So that it is fixed relative to the support beam 86. Accordingly, the dielectric cover 82 is fixed by the dielectric cover fixture 88A.

As described above, in this embodiment, the fixing unit 88A3 is pulled up by the fixing mechanism 90 to hold the fixing unit 88A3 with the supporting member (support beam 86). Fix the positional relationship so that it does not change. For this reason, according to this embodiment, attachment / detachment work of the dielectric cover fixture 88A and the dielectric cover 82 becomes easy.

In addition, in this embodiment, the rod 91 of the fixing mechanism 90 is applied upward by the spring 93. For this reason, according to the present embodiment, even when a problem occurs in which air is released from the cylinder 92 during the detachment operation of the dielectric cover 82, the dielectric cover fixture 88A and the dielectric cover 82 do not fall.

Other configurations, operations, and effects in this embodiment are the same as in the first embodiment.

[Third Embodiment]

Next, a dielectric cover fixing device as a 'cover fixing device' according to a third embodiment of the present invention will be described. 23 is a sectional view showing the dielectric cover fixing device according to the present embodiment. The inductively coupled plasma processing apparatus in this embodiment has a support beam 96 instead of the support beam 86 in the second embodiment, and the dielectric cover 112 in place of the dielectric cover 82 in the second embodiment. ), And instead of the dielectric cover fixing device 87A in the second embodiment, the dielectric cover fixing device 120 is provided. In addition, the dielectric cover fixing device 120 will be described in detail below. In this embodiment, the dielectric cover fixing device 120 is replaced with the dielectric cover fixing device other than the dielectric cover fixing device 87A in the second embodiment. The same dielectric cover fixing device is installed.

The support beam 96 is formed with one through hole 96a penetrating from the upper surface to the lower surface. The dielectric cover 112 is divided into four parts like the dielectric cover 12 in the first embodiment. That is, the dielectric cover 112 has a first partial cover 112A, a second partial cover 112B, and third and fourth partial covers not shown.

The first partial cover 112A has a supported portion 112A1. The supported portion 112A1 has a lower surface and a side end leading to the lower surface. The lower surface of the supported portion 112A1 is part of the lower surface of the first partial cover 112A, and the lower surface of the supported portion 112A1 is lower than the lower surface of the portion other than the supported portion 112A1 on the lower surface of the first partial cover 112A. The stepped portion is formed so as to be located above. Similarly, the second partial cover 112B has a supported portion 112B1.

The dielectric cover fixing device 120 includes a rod 121 as the dielectric cover fixing device and a cylinder 122 as the fixing mechanism. The rod 121 and the cylinder 122 constitute an air cylinder. The cylinder 122 is arrange | positioned above the support beam 96, and is fixed with respect to the main body container 2 directly or through another member. The rod 121 is inserted through the through hole 96a.

The rod 121 has a shaft-shaped fixed part 121a having an upper end accommodated in the cylinder 122, a first support part 121b1, a second support part 121b2, and a side extending from the lower end of the fixed part 121a, respectively. It has the 3rd and 4th support part which is not shown in figure.

The 1st support part 121b1 is arrange | positioned at said step part in the lower surface of the 1st partial cover 112A, and the upper surface of the 1st support part 121b1 is in contact with the lower surface of the to-be-supported part 112A1. The first support part 121b1 has the same thickness as the step difference of said step part. For this reason, there is no step between the lower surface of the 1st support part 121b1 and the lower surface of parts other than the to-be-supported part 112A1 in the 1st partial cover 112A. Similarly, the upper surface of the second support portion 121b2 is in contact with the lower surface of the supported portion 112B1.

The relationship between the supported portion of the third support portion and the third partial cover, and the relationship between the supported portion of the fourth support portion and the fourth partial cover is the supported portion 112A1 of the first support portion 112b1 and the first partial cover 112A. Is the same as A part of the fixed part 121a is arrange | positioned at the side end of the to-be-supported part of 1st-4th partial cover.

Each of the supporting portions supports a sandwiched portion of the dielectric cover 112 at a position corresponding to the supporting portion so as to sandwich between the supporting beam 96 and at least one of the dielectric walls 6. 23 shows an example in which the supporting portions 121b1 and 121b2 support sandwiching the supported portions 112A1 and 112B1 with the supporting beam 96, respectively. However, the support portions 121b1 and 121b2 sandwich the supported portions 112A1 and 112B1, respectively, between the dielectric wall 6 or between the support beam 96 and both of the dielectric wall 6 so as to be supported. You may also

Pipes 123 and 124 are connected to the cylinder 122. When air is supplied from the pipe 124 into the cylinder 122 and exhausted from the pipe 123, the rod 121 moves to the upper end of the movable range. On the contrary, when air is supplied from the pipe 123 into the cylinder 122 and exhausted from the pipe 124, the rod 121 moves to the lower end of the movable range.

In the dielectric cover fixing device 120 according to the present embodiment, when the rod 121 is moved to the upper end of the movable range, the fixing parts 121a are pulled up so that the upper surfaces of the supporting parts 121b1 and 121b2 are supported by the supporting parts 112A1, respectively. 112B1). Accordingly, the rod 121 as the dielectric cover fixture is fixed to the support beam 96 so that the positional relationship with the support beam 96 does not change. Accordingly, the dielectric cover 112 is fixed by the rod 121.

Moreover, when the rod 121 is moved to the lower end of the movable range, the upper surfaces of the supporting parts 121b1 and 121b2 are separated from the lower surfaces of the supported parts 112A1 and 112B1, respectively, and the fixing of the dielectric cover 112 is released.

24 is a cross-sectional view showing the dielectric cover fixing device 130 of the modification in this embodiment. The dielectric cover fixing device 130 of this modification replaces the rod 121 and the cylinder 122 in FIG. 23 with a rack 131 as the dielectric cover fixture and a pinion 132 as the fixing mechanism. Equipped. The rack 131 has an axially-shaped fixed part 131a inserted into the through hole 96a, a first supporting part 131b1 and a second supporting part 131b2 extending laterally from the lower end of the fixed part 131a, respectively. And third and fourth supports not shown. The shape and action of the first to fourth supports are the same as the first to fourth supports of the rod 121 shown in FIG. The pinion 132 is disposed above the support beam 96 and is rotatably mounted to the main body container 2 directly or via another member. A part of the pinned portion 131a is disposed above the support beam 96, and a tooth 131c to which the pinion 132 is engaged is formed on the side of the part.

In the dielectric cover fixing device 130 of the modified example shown in FIG. 24, the rack 131 is moved in the vertical direction by rotating the pinion 132, and accordingly, the dielectric cover fixing device 120 shown in FIG. The cover 112 can be fixed and released.

Other configurations, operations, and effects in this embodiment are the same as in the second embodiment.

[Fourth Embodiment]

Next, a dielectric cover fixing device as a 'cover fixing device' according to a fourth embodiment of the present invention will be described. 25 is a sectional view showing the dielectric cover fixing device according to the present embodiment. The inductively coupled plasma processing apparatus in this embodiment includes a dielectric cover fixing device 135 in place of the dielectric cover fixing device 120 in the third embodiment.

The dielectric cover fixing device 135 includes a dielectric cover fixing device 148 and a fixing mechanism 140. The dielectric cover fixture 148 has an axial shaped retainer 148a, a first support 148b1, a second support 148b2, and third and not shown, which extend laterally from the lower end of the retainer 148a, respectively. Has a fourth support. The shape and action of the first to fourth supports are the same as the first to fourth supports of the rod 121 shown in FIG. The pinned portion 148a is inserted through the through hole 96a. A part of the pinned portion 148a is disposed above the support beam 96, and a part of which is formed with a hole 148c penetrating in the horizontal direction. The dielectric cover fixing device 135 further includes a cover 149 that is mounted on the support beam 96 and covers a portion of the fixed part 148a disposed above the support beam 96.

The fixing mechanism 140 is a mechanism for regulating the movement of the defender 148a in the vertical direction. This fixing mechanism 140 has a rod 141 and a cylinder 142. The rod 141 and the cylinder 142 constitute an air cylinder. The cylinder 142 is fixed to the dielectric wall 6, for example. The rod 141 is disposed in the horizontal direction and can be inserted into the hole 148c through the cover 149.

Pipes 143 and 144 are connected to the cylinder 142. When air is supplied from the pipe 144 into the cylinder 142 and exhausted from the pipe 143, the rod 141 protrudes and is inserted into the hole 148c. As a result, the vertical movement of the pinned portion 148a is restricted, and the dielectric cover 112 is fixed by the dielectric cover fixture 148. On the contrary, when air is supplied from the pipe 143 into the cylinder 142 and exhausted from the pipe 144, the rod 141 exits from the hole 148c. As a result, the up and down movement of the fixed part 148a becomes possible, and the fixing of the dielectric cover 112 is released.

Fig. 26 is a sectional view showing the dielectric cover fixing device 136 of the modification in this embodiment. The dielectric cover fixing device 136 of this modification is provided with the fixing mechanism 150 instead of the fixing mechanism 140 in FIG. The fixing mechanism 150 has a rack 151 instead of the rod 141 and a pinion 152 for moving the rack 151 in the horizontal direction. The rack 151 is disposed in the horizontal direction and can be inserted into the hole 148c through the cover 149.

In this modification, the rack 151 is moved in the horizontal direction by rotating the pinion 152, whereby fixing and releasing of the dielectric cover 112 is performed similarly to the dielectric cover fixing device 135 shown in FIG. It becomes possible.

Other configurations, operations, and effects in this embodiment are the same as in the third embodiment.

[Fifth Embodiment]

Next, a dielectric cover fixing device as a 'cover fixing device' according to a fifth embodiment of the present invention will be described. 27 is a sectional view showing the dielectric cover fixing device according to the present embodiment. FIG. 28 is a perspective view illustrating a part of the dielectric cover fixing device of FIG. 27. FIG.

The inductively coupled plasma processing apparatus in this embodiment has a support beam 186 instead of the support beam 86 in the second embodiment, and the dielectric cover 182 instead of the dielectric cover 82 in the second embodiment. ) And a dielectric cover fixing device 187A instead of the dielectric cover fixing device 87A in the second embodiment.

The support beam 186 is formed with one through hole penetrating from the upper surface to the lower surface. The through hole includes inner circumferential portions 186a and 186b sequentially arranged from the upper surface of the support beam 86 to the lower surface. The inner diameter of the inner circumferential portion 186b is larger than the inner diameter of the inner circumferential portion 186a.

The dielectric cover 182 is divided into four parts like the dielectric cover 82 in the second embodiment. That is, the dielectric cover 182 has a first partial cover 182A, a second partial cover 182B, and third and fourth partial covers not shown.

The first partial cover 182A has a supported portion 182A1. The supported portion 182A1 has a lower surface and a side end leading to the lower surface. The lower surface of the supported portion 182A1 is part of the lower surface of the first partial cover 182A, and the lower surface of the supported portion 182A1 is lower than the lower surface of the portion other than the supported portion 182A1 on the lower surface of the first partial cover 182A. The stepped portion is formed so as to be located above. Similarly, the second partial cover 182B has a supported portion 182B1.

The dielectric cover fixing device 187A includes a dielectric cover fixing device 188A and a fixing mechanism 190. The dielectric cover fixture 188A, like the dielectric cover fixture 88A in the second embodiment, has a first support 188A1, a second support 188A2, a fixed part 188A3, and a third not shown. And a fourth support. The shape and action of the first to fourth supports are the same as in the second embodiment.

The pinned portion 188A3 has a hook 189 disposed above the upper surface of the cover 182. The hook 189 is accommodated in the inner circumference 186b. The hook 189 is formed with a slit 189a having a rectangular shape as viewed from above from its upper surface. In addition, a cavity 189b is formed in the hook 189 that extends from the slit 189a to the slit 189a. The shape of the cavity 189b seen from above is circular with the same diameter as the long diameter of the slit 189a. At the position of the boundary between the slit 189a and the cavity 189b, a step forming surface for connecting the slit 189a and the cavity 189b is formed.

The fixing mechanism 190 has a holder 191, a motor 192, and a joint 193 which connects the rotating shaft of the motor 192 to the holder 191. As shown in FIG. 28, the holder 191 includes a shaft portion 191b, a disc portion 191a connected to an upper end of the shaft portion 191b, and a latch portion 191c connected to a lower end of the shaft portion 191b. Have The disc portion 191a is disposed above the upper surface of the support beam 186 and connected to the joint 193. The shaft portion 191b is inserted into the inner circumferential portion 186a and the slit 189a. The latch portion 191c has a rectangular parallelepiped size that can pass through the slit 189a. The latch portion 191c is rotatably housed in the cavity 189b. In addition, the dimension of the up-down direction of the latch part 191c is substantially the same as the dimension of the up-down direction of the cavity 189b.

In the dielectric cover fixing device 187A according to the present embodiment, when the rotating shaft of the motor 192 is rotated, the latch 191c of the holder 191 rotates in the cavity 189b. When the latching portion 191c is stopped at a position other than the position where the slit 189a can pass, the upper surface of the latching portion 191c is in contact with the step forming surface connecting the slit 189a and the cavity 189b. Dielectric cover fixture 188A is secured, and dielectric cover 182 is secured by dielectric cover fixture 188A.

When the latch portion 191c is stopped at a position where the slit 189a can pass, the dielectric cover fixture 188A can be moved up and down by allowing the latch portion 191c to pass through the slit 189a. Thus, the fixing of the dielectric cover 182 is released.

Other configurations, operations, and effects in this embodiment are the same as in the second embodiment.

[Sixth Embodiment]

Next, a dielectric cover fixing device as a 'cover fixing device' according to a sixth embodiment of the present invention will be described. 29 is a sectional view showing the dielectric cover fixing device according to the present embodiment. The inductively coupled plasma processing apparatus in this embodiment has a dielectric cover 162 instead of the dielectric cover 82 in the second embodiment, and the dielectric cover in place of the dielectric cover fixing device 87A in the second embodiment. The fixing device 290 is provided. The dielectric cover 162 may or may not be divided into a plurality of portions. The structure of the dielectric cover fixing device 290 is the same as that of the fixing mechanism 90 in the second embodiment. For this reason, the same code | symbol as the component of the fixing mechanism 90 was attached | subjected to the component of the dielectric cover fixing apparatus 290. As shown in FIG.

The dielectric cover 162 has a lower surface and an upper surface, and has a cover body 162A constituting a main portion of the dielectric cover 162 and a hook 162B attached to the upper surface of the cover body 162A. The hook 162B is accommodated in the inner circumferential portion 86d of the support beam 86. The hook 162B has a substantially cylindrical shape in which the inner diameter of a part near the upper end is smaller than the inner diameter of the other part. A part of the upper end vicinity of the hook 162B becomes the engaging part 162B1 which the several engaging part 94c of the engaging member 94 engages. The engagement portion 162B1 corresponds to the supported portion of the dielectric cover in the present invention. Therefore, in this embodiment, the engaging portion 1 62B1, which is the supported portion, is disposed above the upper surface of the cover body 162A. The engagement portion 162B1 has a lower end and a side end (end portion on the inner circumferential side of the engagement portion 161B1) leading to the lower surface.

In the dielectric cover fixing device 290, the sixth portion 91f of the rod 91 and the engaging portion 94c of the engaging member 94 are accommodated in the hook 162B. The engagement member 94 corresponds to the dielectric cover fixture of the present invention, and the components of the dielectric cover fixing device 290 other than the engagement member 94 raise the engagement member 94 which is the dielectric cover fixture. Corresponds to the fixing mechanism. In addition, the engagement part 94c corresponds to the support part in this invention, and parts other than the engagement part 94c in the engagement member 94 correspond to the fixed part in this invention. The engaging portion 94c serving as the support portion is disposed between the lower surface of the engaging portion 162B1 serving as the supported portion and the upper surface of the cover body 162A. A portion of the flat plate portion 94b constituting the fixed portion is disposed on the side of the side end of the engaging portion 162B1.

In this embodiment, when air is supplied from the piping 95 to the space inside the cylinder 92, the rod 91 is located in the lower end of the movable range. In this state, the lower ends of the plurality of flat plates 94b of the engaging member 94 do not open, and the plurality of engaging portions 94c are not engaged with the engaging portions 162B1 of the hook 162B. Therefore, in this state, the engagement member 94, which is the dielectric cover fixing member, is not fixed to the support beam 86, so that the dielectric cover 162 can be separated.

When the supply of air from the pipe 95 to the space inside the cylinder 92 is stopped and the air is exhausted from the space inside the cylinder 92, the rod 91 is applied by the force of the spring 93. It is pushed upward and lower ends of the plurality of flat plate portions 94b of the engagement member 94 are opened out by the sixth portion 91f. As a result, the plurality of engaging portions 94c are engaged with the engaging portions 162B1 of the hook 162B, so that the engaging member 94, which is a dielectric cover fixture, does not change its positional relationship with the support beam 86. It is fixed with respect to 86. Accordingly, the dielectric cover 162 is fixed so that the positional relationship with the support beam 86 does not change.

Other configurations, operations, and effects in this embodiment are the same as in the second embodiment.

[Seventh Embodiment]

Next, a dielectric cover fixing device as a 'cover fixing device' according to a seventh embodiment of the present invention will be described. 30 is a sectional view showing the dielectric cover fixing device according to the present embodiment. The inductively coupled plasma processing apparatus in this embodiment has a dielectric cover 382 instead of the dielectric cover 182 in the fifth embodiment, and the dielectric cover in place of the dielectric cover fixing device 187A in the fifth embodiment. The fixing device 390 is provided. The dielectric cover 382 may or may not be divided into a plurality of portions. The structure of the dielectric cover fixing device 390 is the same as that of the fixing mechanism 190 in the fifth embodiment. For this reason, the same code | symbol as the component of the fixing mechanism 190 was attached | subjected to the component of the dielectric cover fixing apparatus 390. As shown in FIG.

The dielectric cover 382 has a lower surface and an upper surface, and has a cover body 382A constituting a main portion of the dielectric cover 382 and a hook 382B mounted on the upper surface of the cover body 382A. The hook 382B is received in the inner circumferential portion 186b of the support beam 186. The hook 382B has a substantially cylindrical shape in which the inner diameter of a part near the upper end is smaller than the inner diameter of the other part.

The structure of the hook 382B is the same as the hook 189 in the fifth embodiment. That is, the hook 382B is formed with a slit 382Ba having a rectangular shape as viewed from above from its upper surface. Moreover, the cavity part 382Bb which continues in the slit 382Ba below the said slit 382Ba is formed in the hook 382B. The shape of the cavity 382Bb seen from above is circular with the same diameter as the long diameter of the slit 382Ba. At the position of the boundary between the slit 382Ba and the cavity 382Bb, a step forming surface for connecting the slit 382Ba and the cavity 382Bb is formed.

In addition, the hook 382B has a supported portion 382B1 formed around the slit 382Ba. Therefore, in this embodiment, the supported portion 382B1 is disposed above the upper surface of the cover body 382A. The supported portion 382B1 has a lower surface and a side end (end of the slit 382Ba) leading to the lower surface.

In the holder 191 of the dielectric cover fixing device 390, the shaft portion 191b is inserted into the inner circumferential portion 186a and the slit 382Ba. The latch portion 191c has a rectangular parallelepiped size that can pass through the slit 382Ba. The latch portion 191c is rotatably housed in the cavity 382Bb. In addition, the dimension of the up-down direction of the latch part 191c is substantially the same as the dimension of the up-down direction of the cavity 382Bb.

The holder 191 corresponds to the dielectric cover fixture in the present invention, and the components of the dielectric cover fixing device 390 other than the holder 191 correspond to the fixing mechanism in the present invention. The latch portion 191c of the holder 191 includes two support portions 191c1 and 191c2 which are in contact with the bottom surface of the supported portion 382B1. Portions of the holder 191 other than the support portions 191c1 and 191c2 correspond to the fixed parts in the present invention. The support portions 191c1 and 191c2 are disposed between the lower surface of the supported portion 382B1 and the upper surface of the cover body 382A. A portion of the shaft portion 191b constituting the fixed portion is disposed on the side of the side end of the supported portion 382B1.

In the dielectric cover fixing device 390 according to the present embodiment, when the rotating shaft of the motor 192 is rotated, the latch portion 191c of the holder 191 rotates in the cavity 382Bb. When the latching portion 191c is stopped at a position other than the position that can pass through the slit 382Ba, the upper surfaces of the supporting portions 191c1 and 191c2 contact the lower surface of the supported portion 382B1 to fix the dielectric cover 382. .

When the latch portion 191c is stopped at a position that can pass through the slit 382Ba, the dielectric cover 382 can move downward by passing the latch portion 191c through the slit 382Ba. As a result, the dielectric cover 382 is released.

Other configurations, operations, and effects in this embodiment are the same as in the fifth embodiment.

In addition, this invention is not limited to each said embodiment, A various change is possible. For example, the means for fixing the cover fixture in the present invention is not limited to that shown in each embodiment.

1: inductively coupled plasma processing apparatus
2: body container
4: antenna chamber
5: treatment chamber
6: dielectric wall
7: support shelf
12: dielectric cover
12A1, 12B1: Supported part
13: antenna
16: support beam
18A, 18B1, 18B2, 18B3, 18B4: Dielectric Cover Fixture
18A1, 18A2: Support
18A3: Defendant Government
19A1, 19A2: Screw

Claims (11)

A processing chamber having a window member constituting the ceiling portion and performing plasma processing, a high frequency antenna disposed above the window member to form an induction electric field in the processing chamber, a supporting member for supporting the window member, and the window A cover fixture of an inductively coupled plasma processing apparatus for use in an inductively coupled plasma processing apparatus having a bottom surface of a member and a cover covering at least a portion of the support member, the cover fixture being fixed to the cover.
A support part which is a part of said cover and supports a to-be-supported part,
Defendant fixed to the support member
Cover fixture of the inductively coupled plasma processing apparatus, characterized in that it comprises a. The method of claim 1,
The cover fixture of the inductively coupled plasma processing apparatus, further comprising a screw for fixing the fixed part to the support member. The method of claim 2,
And the head portion of the screw is disposed above the support member, and the shaft portion of the screw is coupled to the fixed part through the support member. The method according to any one of claims 1 to 3,
And the support portion has a top surface in contact with a bottom surface of the supported portion, and a bottom surface in which the distance from the top surface is narrowed away from the fixed portion. The method according to any one of claims 1 to 3,
The lower surface of the supported portion is a part of the lower surface of the cover, and the lower surface of the cover has a stepped portion formed such that the lower surface of the supported portion is located above the lower surface of the portion other than the supported portion,
And the support portion is disposed on the stepped portion at the bottom surface of the cover. The method of claim 5, wherein
The support fixture of the inductively coupled plasma processing apparatus, characterized in that the support portion has the same thickness as the step difference. The method of claim 1,
A cover fixture of an inductively coupled plasma processing apparatus, characterized in that a side portion is formed in which sides of two cover fixtures are engaged when two cover fixtures are disposed adjacent to each other in a horizontal direction. The method of claim 1,
The cover has a lower surface and an upper surface, and includes a cover body constituting a main portion of the cover, wherein the supported portion is disposed above the upper surface of the cover body,
And the support portion is disposed between the lower surface of the supported portion and the upper surface of the cover body. A processing chamber having a window member constituting the ceiling portion and performing plasma processing, a high frequency antenna disposed above the window member to form an induction electric field in the processing chamber, a supporting member for supporting the window member, and the window A cover fixing device of an inductively coupled plasma processing apparatus for use in an inductively coupled plasma processing apparatus having a cover covering a lower surface of a member to fix the cover,
The cover fastener of Claim 1 or 8,
Fixing mechanism for fixing the fixed part of the cover fixture to the support member
The cover fixing device of the inductively coupled plasma processing apparatus, characterized in that it comprises a. The method of claim 9,
And the fixing mechanism is a mechanism for pulling up the fixed part. The method of claim 9,
The fixing mechanism is a cover fixing apparatus of the inductively coupled plasma processing apparatus, wherein the fixing mechanism is a mechanism for regulating the movement of the fixed part in the vertical direction.

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