CN103533739A - Cover fixture and cover fixing device of induction coupling plasma processing apparatus - Google Patents

Cover fixture and cover fixing device of induction coupling plasma processing apparatus Download PDF

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Publication number
CN103533739A
CN103533739A CN201310390661.5A CN201310390661A CN103533739A CN 103533739 A CN103533739 A CN 103533739A CN 201310390661 A CN201310390661 A CN 201310390661A CN 103533739 A CN103533739 A CN 103533739A
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China
Prior art keywords
cover
dielectric cover
dielectric
fixer
supported
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CN201310390661.5A
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CN103533739B (en
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佐藤亮
齐藤均
天野健次
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority claimed from CN201010141151.0A external-priority patent/CN101848596B/en
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Abstract

The invention provides a cover fixture and a cover fixing device of an induction coupling plasma processing apparatus, which can suppress breakage of a cover which covers the lower surface of a window member and production of particles and to easily attach and detach the cover to/from an induction coupling plasma processing apparatus. The dielectric cover of the induction coupling plasma processing apparatus includes portions to be supported which each have a lower surface and a side end connected with the lower surface. A dielectric cover fixture includes support portions which abut against the lower surfaces of the portions to be supported of the dielectric cover to support the portions to be supported with at least one of a support beam and a dielectric wall as a support member for supporting the dielectric wall with the portions sandwiched, and a portion to be fixed which is connected to the support portions, partially arranged by side ends of the portions to be supported, and fixed without change in positional relation with the support beam.

Description

The cover fixer of device for inductively coupled plasma processing and cover fixture
The application is to be dividing an application of March 25, application number in 2010 are 2010101411510, denomination of invention is " the cover fixer of device for inductively coupled plasma processing and cover fixture " application the applying date.
Technical field
The present invention relates to cover fixer and cover fixture for the cover that the lower surface that forms the window member of chamber top plate part is covered is fixed in device for inductively coupled plasma processing.
Background technology
At FPD(flat-panel monitor) manufacturing process in, the glass substrate that FPD is used carries out the various plasma treatment such as plasma etching, plasma ashing, plasma film forming.As the device that carries out such plasma treatment, be known to produce inductively coupled plasma (ICP) processing unit of high-density plasma.
Device for inductively coupled plasma processing comprises: process chamber, and it is kept airtightly, and can carry out plasma treatment to the substrate as handled object; Be configured in the high frequency antenna of process chamber outside.Process chamber has window member top plate portion, that consist of materials such as dielectrics that forms process chamber, and high frequency antenna is configured in the top of window member.In this device for inductively coupled plasma processing, by high frequency antenna is applied to High frequency power, across window member, in process chamber, form induction field, utilize this induction field the processing gas being directed in process chamber to be converted into plasma, the plasma treatment of substrate being stipulated with this plasma.
In device for inductively coupled plasma processing, in the time of in the lower surface of window member is exposed to process chamber, the lower surface of this window member is subject to the damage that plasma causes.Because window member cannot easily load and unload, therefore, even if sustain damage, also cannot easily change or clean.Therefore,, as described in patent documentation 1, utilization can easily be loaded and unloaded covers the lower surface that covers window member.Thus, can protect the lower surface of window member, and, can easily change or clean the cover sustaining damage.
Patent documentation 1: TOHKEMY 2001-28299 communique
As described in patent documentation 1, in the past, cover was fixed on the supporting member of window member by a plurality of screws.Illustrate in greater detail, in cover fixing means in the past, near the circumference of cover, part is formed with respectively a plurality of through holes that run through for the bar portion of screw, from the lower face side of cover, the bar portion of screw is inserted into each through hole, this bar portion is screwed in the supporting member of window member and cover is fixed.But, in this cover fixing means in the past, produced following problem.
While carrying out plasma treatment in process chamber, the lower surface of cover is exposed in plasma continuously, and therefore, the temperature of the lower surface of cover rises.In the process rising at the underlaying surface temperature covering, at the lower surface covering, produce inhomogeneous Temperature Distribution, result produces the small distortion such as stretching, bending in cover.Now, for example, for example, due to the thermal coefficient of expansion between the material (pottery) of cover and the material (aluminium) of supporting member different, the therefore deflection of cover and the deflection of supporting member generation difference.Therefore,, in the situation that near the part through hole that makes to cover does not move completely and utilizes screw that cover is fixed on to supporting member, near the part through hole of cover is applied to excessive stress, being covered with may be damaged from this part.
Therefore, also consider that the through-hole diameter by making to cover is fully greater than the bar portion diameter of screw, and, the mechanism that cover and screw can be relatively mobile is set, can not apply excessive stress near the part through hole of cover.However, in when distortion cover, the stress that cover is applied is also easy to concentrate near part through hole, and therefore, being easy to because take through hole is that the crackle that starting point produces causes the breakage of covering.
In addition, in cover fixing means in the past, at the end face of process chamber, be formed with a plurality of protuberances that the head by a plurality of screws forms.The secondary product producing during plasma treatment is easy to be attached on this protuberance.Therefore, in plasma treatment process, once be attached to the secondary product of screw head, from the head of screw, peel off and produce particulate (particles floating), this particulate just likely causes etching bad.In addition, screw head is consumed by plasma and produces particulate, and this particulate also likely causes etching bad.
And, in cover fixing means in the past, use a plurality of screws to fix cover, therefore there is the poor such problem points of handling operation of cover.In addition, the maximization of reply FPD, the process chamber of device for inductively coupled plasma processing is also maximized.In having the device for inductively coupled plasma processing of large-scale process chamber, window member and cover consist of a plurality of parts that are divided into respectively sometimes.In this case, use more screw for fixed cover, therefore, the handling operation of cover further reduces.
Summary of the invention
The present invention makes in view of this problem points, and its object is to provide a kind of cover fixer and cover fixture that can suppress the breakage of the cover for the lower surface of window member is covered and the generation of particulate and can easily load and unload the device for inductively coupled plasma processing of cover in device for inductively coupled plasma processing.
The cover fixer of device for inductively coupled plasma processing of the present invention is used to device for inductively coupled plasma processing.This device for inductively coupled plasma processing comprises: process chamber, and it has the window member that forms top plate portion, for carrying out plasma treatment; High frequency antenna, it is configured in the top of above-mentioned window member, for form induction field in above-mentioned process chamber; Supporting member, it is for supporting above-mentioned window member; Cover, it covers for the lower surface to above-mentioned window member.Cover fixer of the present invention is for fixing above-mentioned cover.
Cover fixer of the present invention comprises: support, and it is for supporting having as the portion of being supported of the lower surface of the part of above-mentioned cover; The portion that is fixed, it is fixed in above-mentioned supporting member.
Cover fixer of the present invention also can also have the screw that the above-mentioned portion of being fixed is fixed on to above-mentioned supporting member.In this case, the head of above-mentioned screw also can be configured in the top of above-mentioned supporting member, and the bar portion of above-mentioned screw runs through above-mentioned supporting member and is combined with the above-mentioned portion of being fixed.
In addition, in cover fixer of the present invention, above-mentioned support also can comprise: upper surface, itself and the above-mentioned lower surface butt that is supported portion; Lower surface, it is along with being fixed portion and diminishing with the distance of above-mentioned upper surface away from above-mentioned.
In addition, in cover fixer of the present invention, the above-mentioned lower surface that is supported portion can be also a part for the lower surface of above-mentioned cover, lower surface at above-mentioned cover, the mode being positioned at except the top of the above-mentioned lower surface that is supported the part portion with the above-mentioned lower surface that is supported portion is formed with stage portion, and above-mentioned support is configured in the above-mentioned stage portion on the lower surface of above-mentioned cover.In this case, above-mentioned support also can have the thickness equating with the step of above-mentioned stage portion.
When in addition, cover fixer of the present invention also can also be included in 2 cover fixer along continuous straight runs and is adjacent to configure, the sidepiece of the shape that is engaged with each other of the sidepiece of 2 cover fixers.
In addition, in cover fixer of the present invention, above-mentioned cover also can comprise having cover main body lower surface and upper surface, that form the major part of cover, the above-mentioned portion of being supported is configured in the top of the upper surface of above-mentioned cover main body, and above-mentioned support is configured in above-mentioned being supported between the lower surface of portion and the upper surface of above-mentioned cover main body.
The cover fixture of device for inductively coupled plasma processing of the present invention, for fixing above-mentioned cover, comprising: cover fixer of the present invention; And the fixed mechanism that the above-mentioned portion of being fixed of this cover fixer is fixed on to above-mentioned supporting member.
In cover fixture of the present invention, above-mentioned fixed mechanism can be also the mechanism of mentioning the above-mentioned portion that is fixed.Or above-mentioned fixed mechanism can be also the mechanism that the movement of the above-below direction of the above-mentioned portion that is fixed is limited.
Adopt the present invention, can use to comprise for the support of the portion that is supported of supporting cover and the cover fixer that is fixed on the portion that is fixed of supporting member and fix cover.Thus, adopt the present invention, a plurality of through holes that are not formed for the bar portion insertion of confession screw on cover just can fixed cover.As a result, adopt the present invention, play and can suppress the breakage of cover and the generation of particulate and can easily load and unload the such effect of cover.
Accompanying drawing explanation
Fig. 1 means the cutaway view of the device for inductively coupled plasma processing of the cover fixer that comprises the 1st execution mode of the present invention.
Fig. 2 means dielectric wall in Fig. 1 and the stereogram of hanger.
Fig. 3 means dielectric wall in Fig. 1 and the stereogram of high frequency antenna.
Fig. 4 means the cover in Fig. 1 and covers the upward view of fixer.
Fig. 5 means the cutaway view in the cross section of the position shown in the 5-5 in Fig. 4.
Fig. 6 is the cutaway view shown in a 6-6 example, in Fig. 4 of explanation cover fixer fixing means.
Fig. 7 means the cutaway view of another example of the fixing means that covers fixer.
Fig. 8 means the upward view of the cover of comparative example.
Fig. 9 means the cover of the 1st variation and the cutaway view of cover fixer of the 1st execution mode of the present invention.
Figure 10 means the cover of the 2nd variation and the upward view of cover fixer of the 1st execution mode of the present invention.
Figure 11 means the cover of the 3rd variation and the upward view of cover fixer of the 1st execution mode of the present invention.
Figure 12 means the cutaway view of an example of shape of sidepiece of the cover fixer of the 3rd variation.
Figure 13 means the stereogram of another example of shape of sidepiece of the cover fixer of the 3rd variation.
Figure 14 means the cover of the 4th variation and the upward view of cover fixer of the 1st execution mode of the present invention.
Figure 15 means the cover of the 5th variation and the cutaway view of cover fixer of the 1st execution mode of the present invention.
Figure 16 means the cover of the 6th variation and the upward view of cover fixer of the 1st execution mode of the present invention.
Figure 17 is the cover of explanation the 6th variation and the cutaway view shown in cover 17-17 fixer, in Figure 16.
Figure 18 means the cutaway view of another example of the fixing means that covers fixer.
Figure 19 means the cutaway view of the another example of the fixing means that covers fixer.
Figure 20 means the cutaway view of an example again of the fixing means of cover fixer.
Figure 21 means the cutaway view of the cover fixture of the 2nd execution mode of the present invention.
Figure 22 means the cutaway view of another state of the cover fixture shown in Figure 21.
Figure 23 means the cutaway view of the cover fixture of the 3rd execution mode of the present invention.
Figure 24 means the cutaway view of cover fixture of the variation of the 3rd execution mode of the present invention.
Figure 25 means the cutaway view of the cover fixture of the 4th execution mode of the present invention.
Figure 26 means the cutaway view of cover fixture of the variation of the 4th execution mode of the present invention.
Figure 27 means the cutaway view of the cover fixture of the 5th execution mode of the present invention.
Figure 28 means the stereogram of a part for the cover fixture in Figure 27.
Figure 29 means the cutaway view of the cover fixture of the 6th execution mode of the present invention.
Figure 30 means the cutaway view of the cover fixture of the 7th execution mode of the present invention.
Embodiment
the 1st execution mode
Below, with reference to accompanying drawing, embodiments of the present invention are described in detail.First, with reference to Fig. 1～Fig. 4, to comprising the structure of device for inductively coupled plasma processing of the cover fixer of the 1st execution mode of the present invention, describe.Fig. 1 means the cutaway view of device for inductively coupled plasma processing.Fig. 2 means the dielectric wall of the conduct " window member " in Fig. 1 and the stereogram of hanger.Fig. 3 means dielectric wall in Fig. 1 and the stereogram of high frequency antenna.Fig. 4 means the upward view of the dielectric cover of the conduct " cover " in Fig. 1 and the dielectric cover fixer of conduct " cover fixer ".
Device for inductively coupled plasma processing 1 shown in Fig. 1 for example carries out plasma treatment for glass substrate (being only denoted as below " the substrate ") S that FPD is used.As FPD, can list liquid crystal display (LCD), electroluminescence (Electro Luminescence; EL) display, Plasmia indicating panel (PDP) etc.
Device for inductively coupled plasma processing 1 comprises antenna chamber 4 and process chamber 5, and this antenna chamber 4 and process chamber 5 are to be forming as " window member " dielectric wall 6 of upper and lower 2 spaces by main body container 2 and the spatial division that is configured in this main body container 2 and in main body container 2.Antenna chamber 4 marks off the upside space of the dielectric wall 6 in main body container 2, and process chamber 5 marks off the lower side space of the dielectric wall 6 in main body container 2.Thereby dielectric wall 6 forms the bottom of antenna chamber 4, and form the top plate portion of process chamber 5.Process chamber 5 is kept airtightly, in process chamber 5, substrate is carried out to plasma treatment.
Main body container 2 is the containers with the square tube shape of top, bottom and 4 sidepieces.In addition, main body container 2 can be also the container with the drum of top, bottom and cylindrical portion.As the material of main body container 2, can adopt the conductive materials such as aluminium, aluminium alloy.In the situation that aluminium is used as to the material of main body container 2, for not from the internal face generation pollutant of main body container 2, the internal face of main body container 2 is implemented to alumite.In addition, main body container 2 ground connection.
Dielectric wall 6 forms has the roughly roughly rectangular shape of upper surface, bottom surface and 4 sides of square shape.The thickness of dielectric wall 6 is for example 30mm.Dielectric wall 6 is formed by dielectric material.As the material of dielectric wall 6, for example, can adopt Al 2o 3on pottery, quartzy.As an example, dielectric wall 6 is divided into 4 parts.That is, dielectric wall 6 has part 1 wall 6A, part 2 wall 6B, the 3rd part wall 6C and the 4th part wall 6D.In addition, dielectric wall 6 also can not be divided into 4 parts.
Device for inductively coupled plasma processing 1 also comprises bearing support 7 and the backbar 16 as the supporting member of supporting dielectric wall 6.Bearing support 7 is installed on the sidewall of main body container 2.As shown in Figure 2, backbar 16 is cross shape.4 part wall 6A, 6B, 6C, 6D of dielectric wall 6 are supported frame 7 and backbar 16 supportings.
Device for inductively coupled plasma processing 1 also comprises the hanger 8A of drum and hanger 8B, 8C, 8D, the 8E of cylindrical shape, and this hanger 8A, 8B, 8C, 8D, 8E have respectively the upper end being connected with the top plate portion of main body container 2.The backbar 16 thereon middle body (right-angled intersection part) on surface is connected in the bottom of hanger 8A.In addition, backbar 16 is connected in the bottom of hanger 8B, 8C, 8D, 8E in 4 places of the middle body on surface and the centre of 4 head portions of cross thereon.Like this, backbar 16 is configured to utilize the top plate portion of 5 hanger 8A～8E autonomous agent containers 2 to hang down, in the substantial middle location dimension water holding level state of the above-below direction of main body container 2 inside.
Though not shown, in backbar 16, be formed with for supplying with the gas flow path of processing gas described later and for emitting a plurality of peristomes of the processing gas that is fed into this gas flow path.As the material of backbar 16, can adopt conductive material.As this conductive material, preferably adopt the metal materials such as aluminium.In the situation that aluminium is used as to the material of backbar 16, in order not produce pollutant from surface, the surfaces externally and internally of backbar 16 is implemented to alumite.
Device for inductively coupled plasma processing 1 also comprises high frequency antenna (following brief note do antenna) 13, this high frequency antenna 13 be configured in antenna chamber 4 inside, be the outside of process chamber 5 and the top that is configured in dielectric wall 6.As shown in Figure 3, antenna 13 form roughly foursquare overlook be square spiral-shaped.Antenna 13 is configured on the upper surface of dielectric wall 6.Outer setting at main body container 2 has adaptation 14 and high frequency electric source 15.One end of antenna 13 is connected in high frequency electric source 15 by adaptation 14.The other end of antenna 13 is connected in the inwall of main body container 2, by main body container 2 ground connection.
Device for inductively coupled plasma processing 1 also comprises the dielectric cover 12 of the conduct " cover " that the lower surface of dielectric wall 6 is covered.Dielectric cover 12 form there is the upper surface of square shape roughly and bottom surface, 4 sides tabular.Dielectric cover 12 is formed by dielectric material.As the material of dielectric cover 12, for example, can adopt Al 2o 3on pottery, quartzy.
As an example, dielectric cover 12 is similarly divided into 4 parts with dielectric wall 6.That is, as shown in Figure 4, dielectric cover 12 has part 1 cover 12A, part 2 cover 12B, the 3rd part cover 12C and the 4th part cover 12D.The 1st～ 4th part cover 12A, 12B, 12C, 12D cover the lower surface of the 1st～4th part wall 6A of dielectric wall 6,6B, 6C, 6D respectively.In addition, dielectric cover 12 also can not be divided into 4 parts.
As shown in Figure 4, device for inductively coupled plasma processing 1 also comprise for fixing dielectric cover 12, as dielectric cover fixer 18A, 18B1,18B2,18B3, the 18B4 of " the cover fixer " of present embodiment.Describe in detail afterwards, dielectric cover 12 is fixed by dielectric cover fixer 18A, 18B1,18B2,18B3,18B4.In addition, though not shown, on dielectric cover 12, be formed with a plurality of peristomes corresponding with the peristome of backbar 16.
When substrate S is carried out to plasma treatment, from high frequency electric source 15, to antenna 13, supply with the High frequency power (for example High frequency power of 13.56MHz) that induction field forms use.Thus, can utilize antenna 13 at the interior formation induction field of process chamber 5.This induction field is converted into plasma by processing gas described later.
Outside at main body container 2 is also provided with gas supply device 20.Gas supply device 20 is connected in the gas flow path of backbar 16 by being inserted into gas supply pipe 21 in the hollow bulb of hanger 8A.The processing gas that gas supply device 20 adopts for supplying with plasma treatment.When carrying out plasma treatment, processing gas is fed in process chamber 5 by the peristome of the gas flow path in gas supply pipe 21, backbar 16, peristome and dielectric cover 12.As processing gas, for example, can adopt SF 6gas.
Device for inductively coupled plasma processing 1 also comprises pedestal 22, insulator frame 24, pillar 25, bellows 26 and gate valve 27.Pillar 25 is connected with the not shown lowering or hoisting gear that is arranged on main body container 2 belows, by being formed on the peristome of main body container 2 bottoms, is projected in process chamber 5.In addition, pillar 25 has hollow bulb.Insulator frame 24 is arranged on pillar 25.This insulator frame 24 forms the case shape of upper opening.In the bottom of insulator frame 24, be formed with the peristome continuous with the hollow bulb of pillar 25.Bellows 26, round pillar 25, is connected in the bottom interior wall of insulator frame 24 and main body container 2 airtightly.Thus, can maintain the air-tightness of process chamber 5.
Pedestal 22 is housed in insulator frame 24.Pedestal 22 has for loading the mounting surface 22A of substrate S.Mounting surface 22A is relative with dielectric cover 12.As the material of pedestal 22, such as adopting the conductive materials such as aluminium.In the situation that aluminium is used as to the material of pedestal 22, in order not produce pollutant from surface, alumite is implemented in the surface of pedestal 22.
In the outside of main body container 2, be also provided with adaptation 28 and high frequency electric source 29.Pedestal 22 is connected in adaptation 28 by the energising rod of the hollow bulb of the peristome through insulator frame 24 and pillar 25, and, by this adaptation 28, be connected in high frequency electric source 29.When substrate S is carried out to plasma treatment, from high frequency electric source 29, to pedestal 22, supply with the High frequency power (for example High frequency power of 380kHz) that bias voltage is used.This High frequency power is for being effectively incorporated into by the ion of plasma the substrate S being positioned on pedestal 22.
Gate valve 27 is arranged at the sidewall of main body container 2.Gate valve 27 has switching function, maintains down in off position the air-tightness of process chamber 5, and, can be between process chamber 5 and outside under open mode conveying substrate S.
Outside at main body container 2 is also provided with vacuum plant 30.The blast pipe 31 that vacuum plant 30 is connected via the bottom with main body container 2 is connected in process chamber 5.When substrate S is carried out to plasma treatment, the air that vacuum plant 30 is discharged in process chamber 5, will maintain vacuum atmosphere in process chamber 5.
Then, with reference to Fig. 4～Fig. 6, describe the dielectric cover fixer of present embodiment in detail.Fig. 4 represents dielectric cover 12 and dielectric cover fixer 18A, 18B1,18B2,18B3,18B4.Fig. 5 means the cutaway view in the cross section of the position shown in the 5-5 in Fig. 4.Fig. 6 means the cutaway view in the cross section of the position shown in the 6-6 in Fig. 4.In Fig. 4, circle mark represents screw.
As mentioned above, dielectric cover 12 has the 1st～4th part cover 12A～12D.In Fig. 4, part 1 cover 12A is configured in the top left region in the configuring area of whole dielectric cover 12, part 2 cover 12B is configured in the right regions in the configuring area of whole dielectric cover 12, the 3rd part cover 12C is configured in the region, lower-left in the configuring area of whole dielectric cover 12, and the 4th part cover 12D is configured in the lower right area in the configuring area of whole dielectric cover 12.
At the central portion of dielectric cover 12, in the 1st～ 4th part cover 12A, 12B, 12C, 12D, be formed with respectively notch part 12Aa, 12Ba, 12Ca, the 12Da of the L font of the peristome that becomes cross shape when they are combined.
The shape of the dielectric cover fixer 18A seeing from process chamber 5 sides is the slightly large cross shape of peristome of the cross shape that formed by notch part 12Aa, 12Ba, 12Ca, 12Da than the central portion at dielectric cover 12.And dielectric cover fixer 18A is configured to cover the peristome of the cross shape of dielectric cover 12.In addition, on dielectric cover fixer 18A, also can be formed with the peristome corresponding with the peristome of backbar 16.
The shape of the dielectric cover fixer 18B1～18B4 seeing from process chamber 5 sides is rectangle.What dielectric cover fixer 18B1 clipped the 1st and the 3rd part cover 12A, 12C between itself and bearing support 7 supports the 1st and the 3rd part cover 12A, 12C separately on one side.In addition, Yi Bian dielectric cover fixer 18B2 between itself and bearing support 7, clip the 2nd and the 4th part cover 12B, 12D support separately the 2nd and the 4th part cover 12B, 12D.In addition, Yi Bian dielectric cover fixer 18B3 between itself and bearing support 7, clip the 1st and part 2 cover 12A, 12B support separately the 1st and part 2 cover 12A, 12B.In addition, dielectric cover fixer 18B4 between itself and bearing support 7, clip the 3rd and the 4th part cover 12C, 12D separately on one side by its supporting.
Describe in detail afterwards, dielectric cover fixer 18A, 18B1,18B2,18B3,18B4 include 1 above support and 1 portion that is fixed.Support is that the downside being configured in as the portion that is supported of the part of dielectric cover 12 supports the part that this is supported portion.Dielectric cover 12 has the portion that is supported of all support equal numbers included with dielectric cover fixer 18A, 18B1,18B2,18B3,18B4.
Below, take dielectric cover fixer 18A, 18B1,18B2,18B3,18B4 describes structure and the effect of the dielectric cover fixer 18A shown in Fig. 6 in detail as representative.As shown in Figure 6, dielectric cover fixer 18A comprises the 1st support 18A1 of a part of supporting part 1 cover 12A, the 2nd support 18A2 and the 18A3 of portion that is fixed of a part of supporting part 2 cover 12B.Though not shown, dielectric cover fixer 18A also comprises the 3rd support of a part that supports the 3rd part cover 12C and the 4th support that supports a part of the 4th part cover 12D.The the 1st and the 2nd support 18A1,18A2 are configured to be connected in the 18A3 of portion that is fixed, and the 18A3 of portion that is certainly fixed extends to side.The 3rd is also identical with the 1st and the 2nd support 18A1,18A2 with the 4th support.
On the other hand, part 1 cover 12A has the 12A1 of the portion of being supported.The portion 12A1 of being supported have lower surface 12A1a and with the continuous side 12A1b of this lower surface 12A1a.Side 12A1b is also the ora terminalis of notch part 12Aa.Be supported the upper surface of the 12A1 of portion and at least one the lower surface butt in backbar 16 and part 1 wall 6A.In the example shown in Fig. 6, be supported the two lower surface butt of the upper surface of the 12A1 of portion and backbar 16 and part 1 wall 6A, but the upper surface that is supported the 12A1 of portion also can be connected to the only lower surface of in backbar 16 and part 1 wall 6A.
Equally, part 2 cover 12B has the 12B1 of the portion of being supported.The portion 12B1 of being supported have lower surface 12B1a and with the continuous side 12B1b of this lower surface 12B1a.Be supported the upper surface of the 12B1 of portion and at least one the lower surface butt in backbar 16 and part 2 wall 6B.In the example shown in Fig. 6, be supported the two lower surface butt of the upper surface of the 12B1 of portion and backbar 16 and part 2 wall 6B, but the upper surface that is supported the 12B1 of portion also can be connected to the only lower surface of in backbar 16 and part 2 wall 6B.
The the 3rd and the 4th part cover 12C, 12D also have respectively and the above-mentioned same portion that is supported of the 12A1 of portion, 12B1 that is supported.
The 1st support 18A1 have lower surface and with the upper surface that is supported the lower surface 12A1a butt of the 12A1 of portion.The 2nd support 18A2 have lower surface and with the upper surface that is supported the lower surface 12B1a butt of the 12B1 of portion.Equally, the 3rd support have lower surface and with the upper surface of the lower surface butt of the portion that is supported of the 3rd part cover 12C, the 4th support have lower surface and with the upper surface of the lower surface butt of the portion that is supported of the 4th part cover 12D.Each lower surface of the 1st～4th support becomes along with the taper surface away from being fixed the 18A3 of portion and diminishing with the distance of the upper surface of each support.
The shape of the 18A3 of the portion that is fixed seeing from process chamber 5 sides is to equate with the shape of the cross shape peristome of dielectric cover 12 or than its slightly smaller shape.The part of the 18A3 of portion of being fixed is inserted in the cross shape peristome of dielectric cover 12.This part that is fixed the 18A3 of portion be configured in be supported the 12A1 of portion side 12A1b, be supported the side of the side of the side 12B1b of the 12B1 of portion, the side of the 3rd support and the 4th support.
The portion 18A3 of being fixed is usingd itself and the mode that do not change as the position relationship between the backbar 16 of supporting member and is fixed.Specifically, the 18A3 of portion that is fixed is fixed on backbar 16 as follows.First, the be fixed upper surface of the 18A3 of portion is connected to the lower surface of backbar 16.Dielectric cover fixer 18A also comprises for the portion 18A3 of being fixed being fixed on to a plurality of screws of backbar 16.The quantity of this screw is for example 8 as shown in Figure 4.Fig. 6 represents wherein 2 screw 19A1,19A2.In the example shown in Fig. 6, the head of screw 19A1,19A2 is configured in the below of the 18A3 of portion that is fixed, and the bar portion of screw 19A1,19A2 runs through and is fixed the 18A3 of portion and combines with backbar 16.Screw except screw 19A1,19A2 is also identical with screw 19A1,19A2.
Fig. 7 means the cutaway view of another example of the fixing means of dielectric cover fixer 18A.In this example, the head of screw 19A1,19A2 is configured in the top of backbar 16, and the bar portion of screw 19A1,19A2 runs through backbar 16 and combines with the portion 18A3 of being fixed.Screw except screw 19A1,19A2 is also identical with screw 19A1,19A2.
By being fixed, the 18A3 of portion is fixed on backbar 16, between at least one in itself and backbar 16 and part 1 wall 6A of the 1st support 18A1, clip the portion 12A1 of being supported and support and be supported the 12A1 of portion, between at least one in itself and backbar 16 and part 2 wall 6B of the 2nd support 18A2, clip the portion 12B1 of being supported and support and be supported the 12B1 of portion.Equally, between at least one in itself and backbar 16 and the 3rd part wall 6C of the 3rd support, clip the portion that is supported that the 3rd part cover 12C supports in the portion of being supported of the 3rd part cover 12C, between at least one in itself and backbar 16 and the 4th part wall 6D of the 4th support, clip the portion that is supported that the 4th part cover 12D supports in the portion of being supported of the 4th part cover 12D.
Dielectric cover fixer 18B1～18B4 comprises respectively 1 support and 1 portion that is fixed.The shape of each support of dielectric cover fixer 18B1～18B4 is identical with the shape of each support of dielectric cover fixer 18A.Dielectric cover fixer 18B1～18B4 is configured in respectively the downside of the portion that is supported of the dielectric cover 12 in the position corresponding with support.The respectively portion of being fixed of dielectric cover fixer 18B1～18B4 is used a plurality of screws (being for example 2 screws as shown in Figure 4) to be fixed on the bearing support 7 as supporting member.Thus, each support of dielectric cover fixer 18B1～18B4 respectively its with at least one in bearing support 7 and dielectric wall 6 between clip the portion that is supported of supporting dielectric cover 12 in the portion of being supported of the dielectric cover 12 with the corresponding position of support.
As shown in Figure 4, part 1 cover 12A is fixed by dielectric cover fixer 18A, 18B1,18B3.Part 2 cover 12B is fixed by dielectric cover fixer 18A, 18B2,18B3.The 3rd part cover 12C is fixed by dielectric cover fixer 18A, 18B1,18B4.The 4th part cover 12D is fixed by dielectric cover fixer 18A, 18B2,18B4.
As described above, dielectric cover fixer 18A, 18B1,18B2,18B3, the 18B4 of present embodiment include support (for example 18A1 in Fig. 6,18A2) and the portion that is fixed (for example 18A3 in Fig. 6); Above-mentioned support and the lower surface butt that is supported portion (for example 12A1 in Fig. 6,12B1) described later, between at least one in above-mentioned support and supporting member (backbar 16, bearing support 7) and dielectric wall 6, clip the portion of being supported and support the portion of being supported, the above-mentioned portion of being supported is a part for dielectric cover 12, have lower surface and with the continuous side of this lower surface; The above-mentioned portion of being fixed is connected in this support, and its part is configured in the side of the side of the portion of being supported, and the mode not changing with the position relationship of itself and supporting member is fixed.
Each support of dielectric cover fixer 18A, 18B1,18B2,18B3,18B4 and at least one in supporting member and dielectric wall 6 play and between them, clip the portion that is supported of corresponding dielectric cover 12 and the fixedly effect of the fixture of dielectric cover 12.
Adopt present embodiment, on dielectric cover 12, be not formed for just fixing dielectric cover 12 of a plurality of through holes of running through for the bar portion of screw.Therefore, adopt present embodiment, the in the situation that of can preventing from having formed a plurality of through hole on dielectric cover 12, partly applying excessive stress causes 12 breakages of dielectric cover near to through hole.
In addition, in the present embodiment, the upper surface of the support by dielectric cover fixer is connected to the lower surface of the portion that is supported of dielectric cover 12, can support and fixing dielectric cover 12.Therefore, adopt present embodiment, in dielectric cover 12, be difficult to produce local stress and concentrate.From this respect, adopt present embodiment, also can prevent the breakage of dielectric cover 12.
In the present embodiment, not to use a plurality of screws and dielectric cover 12 is directly fixed on to supporting member, but use a plurality of screws that supporting member is fixed on in the portion of being fixed of dielectric cover fixer.Adopt present embodiment, compare with the situation of using a plurality of screws that dielectric cover 12 is directly fixed on to supporting member, can reduce the screw radical of use.Compare and describe with the comparative example shown in Fig. 8.
Fig. 8 means the upward view of the dielectric cover of comparative example.In Fig. 8, circle mark represents screw.In comparative example, the dielectric cover 12 of dielectric cover 222 and present embodiment similarly has 4 parts that are split to form and covers 222A, 222B, 222C, 222D.These 4 parts are covered 222A～222D and by 12 screws, are directly fixed on supporting member respectively.Thereby whole dielectric cover 222 is fixed on supporting member by 48 screws.Like this, in comparative example, because dielectric cover 222 is fixed by many screws, therefore, when changing or cleaning dielectric cover 222, the handling operation of dielectric cover 222 is poor.
With respect to this, in the present embodiment, as shown in Figure 4, dielectric cover 12 utilizes by 5 fixing dielectric cover fixer 18A, 18B1,18B2,18B3,18B4 of 16 screws of total and is indirectly fixed on supporting member.Therefore, adopt present embodiment, compare with the comparative example shown in Fig. 8, can significantly reduce the screw radical of use, result, can easily load and unload dielectric cover 12.
In addition, adopt present embodiment, as shown in Figure 6, even in the situation that be exposed to the fixedly portion that is fixed of dielectric cover fixer of mode in process chamber 5 with the head of screw, compare with the comparative example shown in Fig. 8, screw radical also significantly reduces, and therefore, the quantity that is exposed to the screw head in process chamber 5 also significantly reduces.Therefore, adopt present embodiment, the secondary product that can suppress to be attached to screw head peels off and produces particulate or screw head and by plasma, consumed and produce particulate from the head of screw.In addition, in the present embodiment, as shown in Figure 7, in the situation that be not exposed to the fixedly portion that is fixed of dielectric cover fixer of mode in process chamber 5 with the head of screw, can not produce particulate because of the head of screw completely.
But, at the thickness of the support of dielectric cover fixer, in the situation that any part is all constant, between the lower surface of support and side, be formed with the bight that is exposed to the right angle in process chamber 5.Secondary product is easy to be attached on this bight.Therefore, in this case, be easy to produce particulate because of bight.With respect to this, in the present embodiment, the lower surface of the support of dielectric cover fixer becomes along with the taper surface diminishing with the distance of support upper surface away from being supported portion.In this case, with the thickness of support any part all constant situation compare, the face that is exposed to the support in process chamber 5 approaches level and smooth face.Therefore, adopt present embodiment, can suppress to produce particulate because of the support of dielectric cover fixer.
variation
Below, the 1st～6th variation of the dielectric cover of present embodiment and dielectric cover fixer is described.Fig. 9 means the dielectric cover of the 1st variation and the cutaway view of dielectric cover fixer.Fig. 9 represents the cross section corresponding with Fig. 7.Part 1 cover 12A, part 2 cover 12B in dielectric cover 12 alternate figures 7 of the 1st variation and there is the part 1 cover 32A shown in Fig. 9, part 2 cover 32B.
Part 1 cover 32A has the 32A1 of the portion of being supported.The portion 32A1 of being supported have lower surface 32A1a and with the continuous side 32A1b of this lower surface 32A1a.The lower surface that is supported the 32A1 of portion is a part for the lower surface of part 1 cover 32A, and at the lower surface of part 1 cover 32A, the mode that is positioned at the lower surface top of the part except being supported the 32A1 of portion to be supported the lower surface of the 32A1 of portion is formed with stage portion.
Equally, part 2 cover 32B has the 32B1 of the portion of being supported.The portion 32B1 of being supported have lower surface 32B1a and with the continuous side 32B1b of this lower surface 32B1a.
The dielectric cover fixer 38A of the 1st variation is for the dielectric cover fixer 18A shown in alternate figures 7.Dielectric cover fixer 38A has the 1st support 38A1, the 2nd support 38A2, the 38A3 of portion that is fixed, not shown the 3rd and the 4th support.
The 1st support 38A1 is configured in the above-mentioned stage portion on the lower surface of part 1 cover 32A, and the upper surface of the 1st support 38A1 is connected to the lower surface 32A1a that is supported the 32A1 of portion.The 1st support 38A1 has the thickness equating with the step of above-mentioned stage portion.Therefore, between the lower surface of the 1st support 38A1 and the lower surface of the part except being supported the 32A1 of portion on part 1 cover 32A, there is no step.
Equally, the 2nd support 38A2 is configured in the above-mentioned stage portion on the lower surface of part 2 cover 32B, and the upper surface of the 2nd support 38A2 is connected to the lower surface 32B1a that is supported the 32B1 of portion.
The 18A3 of the portion that is fixed being fixed in the 38A3 of portion and Fig. 7 is similarly included screw 19A1,19A2 and is fixed on backbar 16 at 8 interior screws.
Though not shown, but in the 1st variation, the the 3rd and the 4th support of dielectric cover fixer 38A and their corresponding relation between portion and support and their corresponding relations being supported between portion of other dielectric cover fixers of being supported are identical with above-mentioned support 38A1 and the relation that is supported between the 32A1 of portion.
Adopt the 1st variation, between the lower surface of support of dielectric cover fixer and the lower surface of the part except being supported portion of dielectric cover 12, do not produce step.Therefore, can suppress to produce particulate because of the support of dielectric cover fixer.Other structures, effect and the effect of the dielectric cover fixer in the 1st variation is identical with the dielectric cover fixer shown in Fig. 7.
Figure 10 is the figure corresponding with Fig. 4, means the dielectric cover of the 2nd variation and the upward view of dielectric cover fixer.The dielectric cover fixer 48B1 of the 2nd variation, 48B2,48B3,48B4,48B5,48B6,48B7,48B8,48C1,48C2,48C3,48C4 are for dielectric cover fixer 18A, 18B1,18B2,18B3, the 18B4 shown in alternate figures 4.
Dielectric cover fixer 48B1,48B5 clip 2 limits of part 1 cover 12A and support part 1 cover 12A between itself and bearing support 7.Dielectric cover fixer 48B2,48B7 clip 2 limits of the 3rd part cover 12C and support the 3rd part cover 12C between itself and bearing support 7.Dielectric cover fixer 48B3,48B6 clip 2 limits of part 2 cover 12B and support part 2 cover 12B between itself and bearing support 7.Dielectric cover fixer 48B4,48B8 clip 2 limits of the 4th part cover 12D and support the 4th part cover 12D between itself and bearing support 7.
Dielectric cover fixer 48C1 is along the border configuration between part 1 cover 12A and the 3rd part cover 12C, for one side of supporting part cover 12A, 12C.Dielectric cover fixer 48C2 is along the border configuration between part 2 cover 12B and the 4th part cover 12D, for one side of supporting part cover 12B, 12D.Dielectric cover fixer 48C3 is along the border configuration between part 1 cover 12A and part 2 cover 12B, for one side of supporting part cover 12A, 12B.Dielectric cover fixer 48C4 is along the border configuration between the 3rd part cover 12C and the 4th part cover 12D, for one side of supporting part cover 12C, 12D.
Though not shown, dielectric cover fixer 48B1～48B8 is fixed on bearing support 7, dielectric cover fixer 48C1～48C4 is fixed on backbar 16.Also can on dielectric cover fixer 48C1～48C4, be formed with the peristome corresponding with the peristome of backbar 16.
Part 1 cover 12A is fixed by dielectric cover fixer 48B1,48B5,48C1,48C3.Part 2 cover 12B is fixed by dielectric cover fixer 48B3,48B6,48C2,48C3.The 3rd part cover 12C is fixed by dielectric cover fixer 48B2,48B7,48C1,48C4.The 4th part cover 12D is fixed by dielectric cover fixer 48B4,48B8,48C2,48C4.
Other structures, effect and the effect of the dielectric cover fixer of the 2nd variation is identical with the dielectric cover fixer shown in Fig. 6 or Fig. 7.
Figure 11 is the figure corresponding with Fig. 4, means the dielectric cover of the 3rd variation and the upward view of dielectric cover fixer.The dielectric cover fixer 58A of the 3rd variation, 58B1,58B2,58B3,58B4,58B5,58B6,58B7,58B8,58C1,58C2,58C3,58C4,58D1,58D2,58D3,58D4,58E1,58E2,58E3,58E4 are for dielectric cover fixer 18A, 18B1,18B2,18B3, the 18B4 shown in alternate figures 4.
The dielectric cover fixer 58A seeing from process chamber 5 sides is shaped as cross shape.The dielectric cover fixer 58B1～58B8 seeing from process chamber 5 sides, the shape of 58C1～58C4 are rectangle.The shape of the dielectric cover fixer 58D1～58D4 seeing from process chamber 5 sides is L word shape.The shape of the dielectric cover fixer 58E1～58E4 seeing from process chamber 5 sides is T word shape.
Dielectric cover fixer 58A configures in the mode of the cross shape peristome of the central portion of covering dielectric cover 12.In addition, also can on dielectric cover fixer 58A, form the peristome corresponding with the peristome of backbar 16.
Dielectric cover fixer 58B1～58B8,58C1～58C4 is configured in respectively and the dielectric cover fixer 48B1～48B8 shown in Figure 10, the position that 48C1～48C4 is identical, and a part for the lower surface of dielectric cover 12 is supported.
Dielectric cover fixer 58D1 configures in the mode that dielectric cover fixer 58B1,58B5 are linked up.Dielectric cover fixer 58D2 configures in the mode that dielectric cover fixer 58B3,58B6 are linked up.Dielectric cover fixer 58D3 configures in the mode that dielectric cover fixer 58B2,58B7 are linked up.Dielectric cover fixer 58D4 configures in the mode that dielectric cover fixer 58B4,58B8 are linked up.Dielectric cover fixer 58D1～58D4 supports a part for the lower surface of dielectric cover 12 respectively.
Dielectric cover fixer 58E1 configures in the mode that dielectric cover fixer 58B1,58B2,58C1 are linked up.Dielectric cover fixer 58E2 configures in the mode that dielectric cover fixer 58B3,58B4,58C2 are linked up.Dielectric cover fixer 58E3 configures in the mode that dielectric cover fixer 58B5,58B6,58C3 are linked up.Dielectric cover fixer 58E4 configures in the mode that dielectric cover fixer 58B7,58B8,58C4 are linked up.Dielectric cover fixer 58E1～58E4 supports a part for the lower surface of dielectric cover 12 respectively.
Though not shown, but dielectric cover fixer 58A, 58C1～58C4 are fixed in backbar 16, dielectric cover fixer 58B1～58B8,58D1～58D4 are fixed in bearing support 7, dielectric cover fixer 58E1～58E4 is fixed in bearing support 7 and backbar 16.Also can on dielectric cover fixer 58C1～58C4, be formed with the peristome corresponding with the peristome of backbar 16.
In the 3rd variation, 2 dielectric cover fixers that are adjacent in the horizontal direction configuration are connected.When each dielectric cover fixer is included in 2 dielectric cover fixers and is adjacent to configure in the horizontal direction, the sidepiece of the intermeshing shape of sidepiece of 2 dielectric cover fixers.
Figure 12 represents the example of shape of the intermeshing sidepiece of dielectric cover fixer 58A, 58C2.Figure 12 represents the cross section of locational 2 the dielectric cover fixers shown in the 12-12 in Figure 11.In this example, the sidepiece separately of dielectric cover fixer 58A, 58C2 has respectively neighbouring protuberance and recess.In dielectric cover fixer 58A and dielectric cover fixer 58C2, protuberance is contrary mutually with the position relationship of recess.So, the protuberance of dielectric cover fixer 58A enters into the recess of dielectric cover fixer 58C2, the protuberance of dielectric cover fixer 58C2 enters into the recess of dielectric cover fixer 58A, thereby the sidepiece of dielectric cover fixer 58A, 58C2 is intermeshing.
Figure 13 represents another example of the intermeshing sidepiece shape of dielectric cover fixer 58A, 58C2.In this example, same with the example shown in Figure 12, the sidepiece separately of dielectric cover fixer 58A, 58C2 has respectively neighbouring protuberance and recess.In this example, the protuberance of dielectric cover fixer 58C2 comprises adjacent in the horizontal direction convex portion and concave portion, and the recess of dielectric cover fixer 58A comprises concave portion and the convex portion that convex portion in the protuberance with dielectric cover fixer 58C2 and concave portion are meshed.
In the 3rd variation, the structure of the coupling part of 2 dielectric cover fixers that other are adjacent is also identical with Figure 12 or Figure 13.
In the 3rd variation, from process chamber 5 sides, the mutual whole border of lower surface that the whole outer rim of the lower surface of dielectric cover 12 and 2 adjacent parts are covered is covered by a plurality of dielectric cover fixers.Therefore, adopt the 3rd variation, from process chamber 5 sides, can cover the gap that produces between the peripheral part of dielectric cover 12 and bearing support 7 completely, the gaps that produce between 2 adjacent part covers.Thus, can suppress plasma and enter into above-mentioned gap.As a result, can suppress because plasma enters into above-mentioned gap backbar 16, bearing support 7 generation damages, paradoxical discharge.Particularly, when each dielectric cover fixer is included in 2 dielectric cover fixers and is adjacent to configure in the horizontal direction, the sidepiece of the intermeshing shape of sidepiece of 2 dielectric cover fixers, therefore, can bring into play significantly this effect.
Other structures, effect and the effect of the dielectric cover fixer of the 3rd variation is identical with the dielectric cover fixer shown in Fig. 6 or Fig. 7.
Figure 14 is the figure corresponding with Fig. 4, means the dielectric cover of the 4th variation and the upward view of dielectric cover fixer.Dielectric cover 12 shown in dielectric cover 72 alternate figures 4 of the 4th variation.Dielectric cover 72 is not divided into 4.
The dielectric cover fixer 78B1 of the 4th variation, 78B2,78B3,78B4 are for dielectric cover fixer 18A, 18B1,18B2,18B3, the 18B4 shown in alternate figures 4.Dielectric cover fixer 78B1,78B2,78B3,78B4 are respectively along the middle body configuration on each limit of dielectric cover 72 lower surfaces, for supporting each limit of dielectric cover 72.The shape of the dielectric cover fixer 78B1 seeing from process chamber 5 sides, 78B2,78B3,78B4 is rectangle.
Other structures, effect and the effect of the dielectric cover fixer of the 4th variation is identical with the dielectric cover fixer shown in Fig. 6 or Fig. 7.
Figure 15 means the dielectric cover of the 5th variation and the cutaway view of dielectric cover fixer.Figure 15 represents the cross section corresponding with Fig. 6 or Fig. 7 (wherein, screw 19A1,19A2 omit diagram).In the 5th variation, the shape of backbar 16A is different from the backbar 16 in Fig. 6 or Fig. 7.Specifically, backbar 16A has protuberance 16A1 in its lower end.
Dielectric cover fixer 79A is for the dielectric cover fixer 18A shown in alternate figures 6 or Fig. 7.Dielectric cover fixer 79A has the 1st support 79A1 of a part that supports part 1 cover 12A, support the 2nd support 79A2, the 79A3 of portion that is fixed of a part of part 2 cover 12B, the 3rd and the 4th not shown support.The the 1st and the 2nd support 79A1,79A2 are connected in the 79A3 of portion that is fixed, and, be configured to extend to side from the 79A3 of portion that is fixed.The 3rd is also identical with the 1st and the 2nd support 79A1,79A2 with the 4th support.In the 5th variation, the thickness (highly) of the 79A3 of portion that makes according to the shape of the protuberance 16A1 of backbar 16A to be fixed forms to such an extent that be less than the thickness (highly) of the dielectric cover fixer shown in Fig. 6 or Fig. 7.
The part 1 cover 12A of dielectric cover 12 is the structure identical with Fig. 6 or Fig. 7 with part 2 cover 12B, has the 12A1 of the portion of being supported, 12B1.Not shown the 3rd and the 4th part cover 12C, 12D also have respectively the same as described above portion that is supported.
The 1st support 79A1 have lower surface and with the upper surface that is supported the lower surface 12A1a butt of the 12A1 of portion.The 2nd support 79A2 have lower surface and with the upper surface that is supported the lower surface 12B1a butt of the 12B1 of portion.Equally, the 3rd support have lower surface and with the upper surface of the lower surface butt of the portion that is supported of the 3rd part cover 12C, the 4th support have lower surface and with the upper surface of the lower surface butt of the portion that is supported of the 4th part cover 12D.Each lower surface of the 1st～4th support becomes along with the taper surface away from being fixed the 79A3 of portion and diminishing with the distance of the upper surface of each support.
As shown in the 5th variation, dielectric cover fixer of the present invention can form various shapes according to the shape of the backbar 16 as supporting member, bearing support 7.
Other structures, effect and the effect of the dielectric cover fixer of the 5th variation is identical with the dielectric cover fixer shown in Fig. 6 or Fig. 7.
Figure 16 is the figure corresponding with Fig. 4, means the dielectric cover of the 6th variation and the upward view of dielectric cover fixer.Figure 17 means the dielectric cover of the 6th variation and the cutaway view of dielectric cover fixer.The dielectric cover 80 of the 6th variation is for the dielectric cover 12 shown in alternate figures 4.Dielectric cover 80 is similarly divided into 4 parts with dielectric wall 6.That is, as shown in figure 16, dielectric cover 80 has part 1 cover 80A, part 2 cover 80B, the 3rd part cover 80C and part 1 cover 80D.The 1st～ 4th part cover 80A, 80B, 80C, 80D cover the lower surface of the 1st～4th part wall 6A of dielectric wall 6,6B, 6C, 6D respectively.In addition, dielectric cover 80 also can not be divided into 4 parts.
In Figure 16, part 1 cover 80A is configured in the top left region in the configuring area of whole dielectric cover 80, part 2 cover 80B is configured in the right regions in the configuring area of whole dielectric cover 80, the 3rd part cover 80C is configured in the region, lower-left in the configuring area of whole dielectric cover 80, and the 4th part cover 80D is configured in the lower right area in the configuring area of whole dielectric cover 80.
At the central portion of dielectric cover 80, on the 1st～ 4th part cover 80A, 80B, 80C, 80D, be formed with respectively notch part 80Aa, 80Ba, 80Ca, the 80Da of the arc that becomes circular peristome when they are combined.
The shape of the dielectric cover fixer 81A seeing from process chamber 5 sides is slightly large round-shaped of the circular peristome that formed by notch part 80Aa, 80Ba, 80Ca, 80Da than the central portion at dielectric cover 80.And dielectric cover fixer 81A is configured to cover the circular peristome of dielectric cover 80.
Yi Bian what the dielectric cover fixer 81B1～81B4 dielectric cover fixer 81B1 seeing from process chamber 5 sides clipped the 1st and the 3rd part cover 80A, 80C between itself and bearing support 7 supports the 1st and the 3rd part cover 80A, 80C separately.In addition, Yi Bian dielectric cover fixer 81B2 between itself and bearing support 7, clip the 2nd and the 4th part cover 80B, 80D support separately the 2nd and the 4th part cover 80B, 80D.In addition, Yi Bian dielectric cover fixer 81B3 between itself and bearing support 7, clip the 1st and part 2 cover 80A, 80B support separately the 1st and part 2 cover 80A, 80B.In addition, Yi Bian dielectric cover fixer 81B4 between itself and bearing support 7, clip the 3rd and the 4th part cover 80C, 80D support separately the 3rd and the 4th part cover 80C, 80D.
Dielectric cover fixer 81A, 81B1,81B2,81B3,81B4 include 1 above support and 1 portion that is fixed.Support is to be configured in as the downside of the portion that is supported of the part of dielectric cover 80 part that is supported portion for supporting this.Dielectric cover 80 has the corresponding portion that is supported of all supports included with dielectric cover fixer 81A, 81B1,81B2,81B3,81B4.
Then, describe structure and the effect of dielectric cover fixer 81A in detail.As shown in figure 17, dielectric cover fixer 81A comprises the support 81A1 that is fixed the 81A3 of portion and a part of part 1 cover 80A and part 2 cover 80B is supported.Though not shown, the support 81A1 of dielectric cover fixer 81A in the form of a ring, also supports a part of a part of the 3rd part cover 80C and the 4th part cover 80D.Support 81A1 is connected in the 81A3 of portion that is fixed, and, be configured to round being fixed the 81A3 of portion extending to the side of the 81A3 of portion that is fixed.
On the other hand, part 1 cover 80A has the 80A1 of the portion of being supported.The portion 80A1 of being supported have lower surface 80A1a and with the continuous side 80A1b of this lower surface 80A1a.Side 80A1b is also the ora terminalis of notch part 80Aa.Be supported the upper surface of the 80A1 of portion and at least one the lower surface butt in backbar 16B and part 1 wall 6A.In the example shown in Figure 17, be supported the two lower surface butt of the upper surface of the 80A1 of portion and backbar 16B and part 1 wall 6A, but the upper surface that is supported the 80A1 of portion also can be connected to the only lower surface of in backbar 16B and part 1 wall 6A.Equally, part 2 cover 80B has the 80B1 of the portion of being supported.The portion 80B1 of being supported have lower surface 80B1a and with the continuous side 80B1b of this lower surface 80B1a.Be supported the upper surface of the 80B1 of portion and at least one the lower surface butt in backbar 16B and part 2 wall 6B.In the example shown in Figure 17, be supported the two lower surface butt of the upper surface of the 80B1 of portion and backbar 16B and part 2 wall 6B, but the upper surface that is supported the 80B1 of portion also can be connected to the only lower surface of in backbar 16B and part 2 wall 6B.
The the 3rd and the 4th part cover 80C, 80D also have be respectively the supported portion same with the 80A1 of the portion that is supported, the 80B1 of above-mentioned part 1 cover 80A and part 2 cover 80B.
The support 81A1 of dielectric cover fixer 81A have lower surface and with the upper surface that is supported the lower surface 80A1a butt of the 80A1 of portion.The lower surface of support 81A1 becomes along with away from the portion 81A3(of being fixed, along with the circumference towards support 81A1) and the taper surface that diminishes with the distance of the upper surface of support 81A1.The shape of the 81A3 of the portion that is fixed seeing from process chamber 5 is than slightly little round-shaped of the shape of the circular open portion of dielectric cover 80.The part of the 81A3 of portion of being fixed is inserted in the circular open portion of dielectric cover 80.This part that is fixed the 81A3 of portion be configured in be supported the 80A1 of portion side 80A1b, be supported the side of the side of the side 80B1b of the 80B1 of portion, the side of the 3rd support and the 4th support.
The 81A3 of the portion that is fixed of dielectric cover fixer 81A usings that it is fixed with the mode that position relationship as the backbar 16B of supporting member does not change.Specifically, the 81A3 of portion that is fixed is fixed on backbar 16B as described as follows.First, backbar 16B has recess 16B1, at this recess 16B1, is formed with thread groove (or ridge) 16B2 interior week.In addition, the top of the 81A3 of portion that is fixed has and protrudes columned protuberance 81A3a, in the periphery of this protuberance 81A3a, is formed with ridge (or thread groove) 81A3b.So dielectric cover fixer 81A is fixed on backbar 16B by the protuberance 81A3a of the 81A3 of portion that is fixed being screwed in the recess 16B1 of backbar 16B.Like this, the dielectric cover fixer 81A of the 6th variation does not adopt the fixed part of the other members such as screw just can be fixed on backbar 16B, therefore, can cut down part number of packages, and also can solve from the such problem of head generation particulate that is exposed to the screw of plasma.
Other structures, effect and the effect of the dielectric cover fixer 81A of the 6th variation are identical with the dielectric cover fixer shown in Fig. 6 or Fig. 7.
Then, with reference to the another example of the fixing means of the dielectric cover fixer of Figure 18～20 explanations present embodiment.At this, the dielectric cover fixer 18A shown in Fig. 6 or Fig. 7 of take describes as example, but other dielectric cover fixers that the fixing means of following explanation also can be applicable to enumerate in above-mentioned variation.
Figure 18 represents an example of the fixing means of dielectric cover fixer 18A.In this example, intermediate member 201a, 201b are respectively between between the 1st support 18A1 of dielectric cover fixer 18A and the 12A1 of the portion that is supported of part 1 cover 12A and between the 2nd support 18A2 of dielectric cover fixer 18A and the 12B1 of the portion that is supported of part 2 cover 12B.That is, dielectric cover fixer 18A clip intermediate member 201a, 201b and indirectly to dielectric cover 12(part 1 cover 12A, part 2 cover 12B) be fixed.Dielectric cover fixer 18A for example similarly adopts screw 19A1,19A2(to omit diagram at this with Fig. 6 or Fig. 7) fix.Intermediate member 201a is by the 1st support 18A1 and be supported the 12A1 of portion and clamp, and intermediate member 201b is clamped in the 2nd support 18A2 and is supported between the 12B1 of portion.Between not shown the 3rd part cover 12C and the 3rd support, also have respectively intermediate member same as described above between the 4th part cover 12D and the 4th support, but these intermediate members can be also integral pieces.
Figure 19 represents the another example of the fixing means of dielectric cover fixer 18A.In this example, intermediate member 202 is between the 18A3 of the portion that is fixed and backbar 16 of dielectric cover fixer 18A.That is, backbar 16 clip intermediate member 202 and indirectly by dielectric cover 12(part 1 cover 12A, part 2 cover 12B) be clipped between backbar 16 and dielectric cover fixer 18A.Dielectric cover fixer 18A for example similarly adopts screw 19A1,19A2(to omit diagram at this with Fig. 6 or Fig. 7) fix.The lower end in contact of the upper surface of intermediate member 202 and backbar 16.The lower surface of intermediate member 202 with the upper surface of the 12A1 of the portion that is supported of part 1 cover 12A, the upper surface of the 18A3 of the portion that is fixed of the upper surface of the 12B1 of the portion that is supported of part 2 cover 12B and dielectric cover fixer 18A contact.
Figure 20 represents an example again of the fixing means of dielectric cover fixer 18A.In this example, intermediate member 203a, 203b are respectively between dielectric cover fixer 18A(the be fixed 18A3 of portion and the 1st support 18A1) and the 32A1 of the portion that is supported of part 1 cover 32A between and dielectric cover fixer 18A(the be fixed 18A3 of portion and the 2nd support 18A2) and the 32B1 of the portion that is supported of part 2 cover 32B between.That is, dielectric cover fixer 18A clip intermediate member 203a, 203b and indirectly to dielectric cover 12(part 1 cover 32A, part 2 cover 32B) be fixed.
Part 1 cover 32A and part 2 cover 32B have the shape identical with above-mentioned the 1st variation (Fig. 9).That is, part 1 cover 32A has the 32A1 of the portion of being supported, this be supported the 32A1 of portion have lower surface 32A1a and with the continuous side 32A1b of this lower surface 32A1a.The lower surface that is supported the 32A1 of portion is a part for the lower surface of part 1 cover 32A, and at the lower surface of part 1 cover 32A, the mode of top that is positioned at the lower surface of the part except being supported the 32A1 of portion to be supported the lower surface of the 32A1 of portion is formed with stage portion.Intermediate member 203a forms the shape with this stage portion engagement.
Equally, part 2 cover 32B has the 32B1 of the portion of being supported, the portion 32B1 of being supported have lower surface 32B1a and with the continuous side 32B1b of this lower surface 32B1a.The lower surface that is supported the 32B1 of portion is a part for the lower surface of part 2 cover 32B, and at the lower surface of part 2 cover 32B, the mode of top that is positioned at the lower surface of the part except being supported the 32B1 of portion to be supported the lower surface of the 32B1 of portion is formed with stage portion.Intermediate member 203b forms the shape with this stage portion engagement.
Dielectric cover fixer 18A for example similarly adopts screw 19A1,19A2(to omit diagram at this with Fig. 6 or Fig. 7) fix.Intermediate member 203a is by the 1st support 18A1 and be supported the 32A1 of portion and clamp, and intermediate member 203b is clamped in the 2nd support 18A2 and is supported between the 32B1 of portion.
Between not shown the 3rd part cover and the 3rd support, also have respectively intermediate member same as described above between the 4th part cover and the 4th support, but these intermediate members can be also integral pieces.
Intermediate member 201a, 201b, 202 shown in Figure 18,19,20,203a, 203b are such as consisting of the materials such as pottery with anti-isoiony.By inserting intermediate member 201a, 201b, 202,203a, 203b, even if the change in size of dielectric cover 12 can not change size, the shape of dielectric cover fixer 18A self yet, can utilize dielectric cover fixer 18A fixing reliably.For example, even in the situation that as part 1 cover (12A, 32A) and part 2 cover (12B, 32B) and adopt the short material of Length Ratio Fig. 6, Fig. 7 in its thinner thickness, face direction, by inserting intermediate member 201a, 201b, 202,203a, 203b, also can between part 1 cover (12A, 32A), part 2 cover (12B, 32B) and dielectric cover fixer 18A, not produce gap, play and be fixed.
In addition, intermediate member 201a, 201b, 202,203a, 203b for example also can consist of fluororesin, silica gel elastomeric material.In this case, even the distortion such as dielectric cover 12 is flexible because heat produces, strain, also can absorb this distortion, therefore, can prevent the breakage of dielectric cover 12, and, can not produce gap, play, can maintain reliably the fixing state of dielectric cover 12 by dielectric cover fixer 18A.
As mentioned above, by inserting intermediate member, can utilize dielectric cover fixer 18A fixing dielectric cover 12 reliably, therefore, also can prevent that the plasma producing from entering to and backbar 16 is caused damage or paradoxical discharge occurs from the fixed position of dielectric cover 12 in process chamber 5.Other structures, effect and the effect of the dielectric cover fixer shown in Figure 18,19,20 is identical with the dielectric cover fixer shown in Fig. 6 or Fig. 7.
the 2nd execution mode
Then, with reference to Figure 21 and Figure 22, the dielectric cover fixture as " the cover fixture " of the 2nd execution mode of the present invention is described.Figure 21 means the cutaway view of the dielectric cover fixture of present embodiment.Figure 22 means the cutaway view of another state of the dielectric cover fixture shown in Figure 21.
The device for inductively coupled plasma processing of present embodiment substitutes the backbar 16 of the 1st execution mode and has backbar 86, substitute the dielectric cover 12 of the 1st execution mode and there is dielectric cover 82, substituting the dielectric cover fixer 18A of the 1st execution mode and there is the dielectric cover fixture 87A as " cover fixture ".In addition, below describe dielectric cover fixture 87A in detail, but in the present embodiment, substitute the dielectric cover fixer except dielectric cover fixer 18A in the 1st execution mode, and be provided with the dielectric cover fixture identical with dielectric cover fixture 87A.
On backbar 86, be formed with 1 through hole that extends through lower surface from upper surface.Through hole comprises interior perimembranous 86a, 86b, 86c, the 86d configuring in order to lower surface from the upper surface of backbar 86.The internal diameter of interior perimembranous 86a, 86c about equally.The internal diameter of interior perimembranous 86b, 86d about equally and be greater than the internal diameter of interior perimembranous 86a, 86c.At the boundary position of 2 adjacent interior perimembranous, be formed with the step formation face of the ring-type that 2 interior perimembranous are linked up.
The dielectric cover 12 of dielectric cover 82 and the 1st execution mode is similarly divided into 4 parts.That is, dielectric cover 82 has part 1 cover 82A, part 2 cover 82B, not shown the 3rd and the 4th part cover.
Part 1 cover 82A has the 82A1 of the portion of being supported.The portion 82A1 of being supported have lower surface and with the continuous side of this lower surface.The lower surface that is supported the 82A1 of portion is a part for the lower surface of part 1 cover 82A, and at the lower surface of part 1 cover 82A, the mode of top that is positioned at the lower surface of the part except being supported the 82A1 of portion to be supported the lower surface of the 82A1 of portion is formed with stage portion.Equally, part 2 cover 82B has the 82B1 of the portion of being supported.
Dielectric cover fixture 87A comprises dielectric cover fixer 88A and fixed mechanism 90.Dielectric cover fixer 38A shown in dielectric cover fixer 88A and Fig. 9 similarly has the 1st support 88A1, the 2nd support 88A2, the 88A3 of portion that is fixed, not shown the 3rd and the 4th support.
The 1st support 88A1 is configured in the above-mentioned stage portion on the lower surface of part 1 cover 82A, and the upper surface of the 1st support 88A1 is connected to the lower surface that is supported the 82A1 of portion.The 1st support 88A1 has the thickness equating with the step of above-mentioned stage portion.Therefore, between the lower surface of the 1st support 88A1 and the lower surface of the part except being supported the 82A1 of portion in part 1 cover 82A, there is no step.Equally, the upper surface of the 2nd support 88A2 is connected to the lower surface that is supported the 82B1 of portion.
The relation between portion of being supported of the 3rd support and the 3rd part cover and the relation being supported between portion of the 4th support and the 4th part cover are identical with the relation between above-mentioned the 1st support 88A1 and the 82A1 of the portion that is supported of part 1 cover 82A.The part of the 88A3 of portion of being fixed is configured in the side of side of the portion that is supported of the 1st～4th part cover.
Each support of dielectric cover fixer 88A respectively its with at least one in backbar 86 and dielectric wall 6 between clip the portion that is supported that dielectric cover 82 supports in the portion of being supported of the dielectric cover 82 that is positioned at the position corresponding with support.In addition, support 88A1, the 88A2 that Figure 21 and Figure 22 represent dielectric cover fixer 88A clips respectively and is supported the 82A1 of portion, 82B1 and supports the example that is supported the 82A1 of portion, 82B1 between itself and backbar 86.But, support 88A1,88A2 also can be respectively between itself and dielectric wall 6 or and backbar 86 and dielectric wall 6 clip between the two and be supported the 82A1 of portion, 82B1 and support and be supported the 82A1 of portion, 82B1.
In addition, the 88A3 of portion that is fixed has the hook 89 of the top of the upper surface that is configured in dielectric cover 82.Hook 89 is housed in interior perimembranous 86d.Near the internal diameter of part hook 89 its upper ends of formation is less than the general cylindrical shape shape of the internal diameter of other parts.Near the part upper end of hook 89 becomes the holding section that the part of fastened component 94 described later engages.
Fixed mechanism 90 be so that the mode that the 88A3 of the portion that is fixed of dielectric cover fixer 88A and the position relationship of backbar 86 do not change by the fixing mechanism of the 88A3 of the portion that is fixed of dielectric cover fixer 88A.In the present embodiment, particularly, fixed mechanism 90 is the mechanisms that use cylinder to mention the 88A3 of portion that is fixed.
Fixed mechanism 90 has bar 91 and the cylinder body 92 that forms cylinder.Cylinder body 92 is direct or be fixed on main body container 2 by other members.Fixed mechanism 90 also has spring 93 and fastened component 94.A part for fixed mechanism 90 is inserted in the through hole of backbar 86.
Bar 91 comprises the part 1 91a being housed in cylinder body 92, part 2 91b, the 3rd part 91c, the 4th part 91d, the 5th part 91e and the 6th part 91f that this part 1 91a downward connects successively certainly.The 1st～5th part 91a～91e all has cylindrical shape.The 6th part 91f has cone shape.
Part 2 91b runs through the bottom of cylinder body 92, is inserted into interior perimembranous 86a.The external diameter of part 2 91b is less than the external diameter of part 1 91a.The 3rd part 91c is configured in interior perimembranous 86c.The external diameter of the 3rd part 91c is greater than the external diameter of part 2 91b, and is less than the internal diameter of interior perimembranous 86a, 86c.
The 4th part 91d is configured in interior perimembranous 86b.The external diameter of the 4th part 91d is less than the external diameter of the 3rd part 91c.The 5th part 91e is inserted in the holding section of interior perimembranous 86c and hook 89, and its lower end part is in the below of holding section.The external diameter of the 5th part 91e is less than the external diameter of the 4th part 91d.
The 6th part 91f is housed in hook 89.The bottom surface diameter of the 6th part 91f is greater than the external diameter of the 5th part 91e, and is less than the internal diameter of the holding section of hook 89.
In the inside of cylinder body 92, by the inwall of cylinder body 92 and the upper surface of part 1 91a, form space.On cylinder body 92, be connected with for to above-mentioned space air supply and certainly this space discharge the pipe arrangement 95 of air.
Spring 93 is configured between the step formation face in the 3rd part 91c of bar 91 and the border of interior perimembranous 86b, 86c in interior perimembranous 86d.The 4th part 91d can configure up or down in the inner side of spring 93.Bar 91 is applied active force upward by spring.
A plurality of holding section 94c that fastened component 94 has flange 94a, is connected in a plurality of (for example 3) flat part 94b of this flange 94a lower end and is projected into respectively outside from the bottom of each flat part 94b.In flange 94a, be formed with 1 through hole that extends through lower surface from upper surface.In this through hole, be inserted with the 5th part 91e.The external diameter of flange 94a and the internal diameter of interior perimembranous 86c are about equally.The movement upward of flange 94a is by spring 93 or backbar 86 restrictions.Flat part 94b has flexible.The bottom of flat part 94b contacts with the 6th part 91f.
The effect of the dielectric cover fixture 87A of present embodiment then, is described.Figure 21 represents that fixed mechanism 90 is not by the fixing state of the 88A3 of the portion that is fixed of dielectric cover fixer 88A, and Figure 22 represents the state that the 88A3 of the portion that is fixed of 90 couples of dielectric cover fixer 88A of fixed mechanism is fixed.
State shown in Figure 21 be by from pipe arrangement 95 the inner space air supply to cylinder body 92 realize.Under this state, bar 91 is positioned at the lower end of movable range.Under this state, does not launch the bottom of a plurality of flat part 94b of fastened component 94, and a plurality of holding section 94c are not sticked in the holding section of hook 89.Thereby under this state, dielectric cover fixer 88A is not fixed on backbar 86, can dismantle dielectric cover fixer 88A and dielectric cover 82.
Stop the inner space air supply to cylinder body 92 from pipe arrangement 95, when air is discharged in the inner space of cylinder body 92, transfer to the state shown in Figure 22.Now, bar 91 is pushed to top by the active force of spring 93, and the bottom of a plurality of flat part 94b of fastened component 94 utilizes the 6th part 91f to launch laterally.As a result, a plurality of holding section 94c are sticked in the holding section of hook 89, and by mentioning the 88A3 of portion that is fixed, the mode that dielectric cover fixer 88A does not change with the position relationship of itself and backbar 86 is fixed on backbar 86.Thus, dielectric cover 82 is fixed by dielectric cover fixer 88A.
As described above, in the present embodiment, by mentioned the 88A3 of the portion that is fixed of dielectric cover fixer 88A by fixed mechanism 90, the mode that the position relationship of the 88A3 of portion with itself and supporting member (backbar 86) that be fixed do not changed is fixed.Therefore, adopt present embodiment, the handling operation of dielectric cover fixer 88A and dielectric cover 82 becomes easy.
In addition, in the present embodiment, the bar 91 of fixed mechanism 90 is applied active force upward by spring 93.Therefore, adopt present embodiment, even in the situation that generation is from the fault of cylinder body 92 gas leakage in the handling operation of dielectric cover 82, dielectric cover fixer 88A and dielectric cover 82 can not fall yet.
Other structures, effect and the effect of present embodiment is identical with the 1st execution mode.
the 3rd execution mode
Then, the dielectric cover fixture as " the cover fixture " of the 3rd execution mode of the present invention is described.Figure 23 means the cutaway view of the dielectric cover fixture of present embodiment.The device for inductively coupled plasma processing of present embodiment substitutes the backbar 86 of the 2nd execution mode and has backbar 96, substitute the dielectric cover 82 of the 2nd execution mode and there is dielectric cover 112, substituting the dielectric cover fixture 87A of the 2nd execution mode and there is dielectric cover fixture 120.In addition, below describe dielectric cover fixture 120 in detail, but in the present embodiment, substitute the dielectric cover fixture except dielectric cover fixture 87A in the 2nd execution mode, and be provided with the dielectric cover fixture identical with dielectric cover fixture 120.
In backbar 96, be formed with 1 the through hole 96a that extends through lower surface from upper surface.The dielectric cover 12 of dielectric cover 112 and the 1st execution mode is similarly divided into 4 parts.That is, dielectric cover 112 has part 1 cover 112A, part 2 cover 112B, not shown the 3rd and the 4th part cover.
Part 1 cover 112A has the 112A1 of the portion of being supported.The portion 112A1 of being supported have lower surface and with the continuous side of this lower surface.The lower surface that is supported the 112A1 of portion is a part for the lower surface of part 1 cover 112A, at the lower surface of part 1 cover 112A, the mode of top that is positioned at the lower surface of the part except being supported the 112A1 of portion to be supported the lower surface of the 112A1 of portion is formed with stage portion.Equally, part 2 cover 112B has the 112B1 of the portion of being supported.
Dielectric cover fixture 120 comprises as the bar 121 of dielectric cover fixer and as the cylinder body 122 of fixed mechanism.Bar 121 and cylinder body 122 form cylinder.Cylinder body 122 is configured in the top of backbar 96, directly or be fixed on main body container 2 by other members.Bar 121 is inserted in through hole 96a.
Bar 121 has upper end and is housed in the 121a of the portion that is fixed of the axle shape in cylinder body 122, the 1st support 121b1, the 2nd support 121b2 that from the bottom of the 121a of portion that is fixed, to side, extend respectively, the 3rd and the 4th not shown support.
The 1st support 121b1 is configured in the above-mentioned stage portion on the lower surface of part 1 cover 112A, and the upper surface of the 1st support 121b1 is connected to the lower surface that is supported the 112A1 of portion.The 1st support 121b1 has the thickness equating with the step of above-mentioned stage portion.Therefore, between the lower surface of the 1st support 121b1 and the lower surface of the part except being supported the 112A1 of portion in part 1 cover 112A, there is no step.Equally, the upper surface of the 2nd support 121b2 is connected to the lower surface that is supported the 112B1 of portion.
The relation between portion of being supported of the 3rd support and the 3rd part cover and the relation being supported between portion of the 4th support and the 4th part cover are identical with the relation between above-mentioned the 1st support 121b1 and the 112A1 of the portion that is supported of part 1 cover 112A.The part of the 121a of portion of being fixed is configured in the side of side of the portion that is supported of the 1st～4th part cover.
Above-mentioned each support respectively its with at least one in backbar 96 and dielectric wall 6 between clip the dielectric cover 112 that is positioned at the position corresponding with support the portion of being supported support dielectric cover 112.In addition, Figure 23 represents that support 121b1,121b2 clip respectively between itself and backbar 96 and is supported the 112A1 of portion, 112B1 and supports the example that is supported the 112A1 of portion, 112B1.But, support 121b1,121b2 also can be respectively between itself and dielectric wall 6 or and backbar 96 and dielectric wall 6 clip between the two and be supported the 112A1 of portion, 112B1 and support and be supported the 112A1 of portion, 112B1.
On cylinder body 122, be connected with pipe arrangement 123,124.From pipe arrangement 124 during to the interior air supply of cylinder body 122, from pipe arrangement 123 exhaust, bar 121 moves to the upper end of movable range.On the contrary, from pipe arrangement 123 during to the interior air supply of cylinder body 122, from pipe arrangement 124 exhaust, bar 121 moves to the lower end of movable range.
In the dielectric cover fixture 120 of present embodiment, while making bar 121 move to the upper end of movable range, by mentioning the 121a of portion that is fixed, the upper surface of support 121b1,121b2 is connected to respectively the lower surface that is supported the 112A1 of portion, 112B1.Thus, the mode not changing with the position relationship of itself and backbar 96 as the bar 121 of dielectric cover fixer is fixed on backbar 96.Thus, dielectric cover 112 is fixed by bar 121.
In addition, when making bar 121 move to the lower end of movable range, the upper surface of support 121b1,121b2, respectively away from the lower surface that is supported the 112A1 of portion, 112B1, is removed the fixing of dielectric cover 112.
Figure 24 means the cutaway view of the dielectric cover fixture 130 of modified embodiment of the present embodiment.The dielectric cover fixture 130 of this variation substitutes bar 121 in Figure 23 and cylinder body 122 and comprises as the tooth bar 131 of dielectric cover fixer and as the pinion 132 of fixed mechanism.Tooth bar 131 comprises: the 131a of the portion that is fixed that is inserted into the axle shape in through hole 96a; The 1st support 131b1, the 2nd support 131b2 extending to side from the bottom of the 131a of portion that is fixed respectively, the 3rd and the 4th not shown support.The shape of the 1st～4th support is identical with the 1st～4th support of the bar 121 shown in Figure 23 with effect.Pinion 132 is configured in the top of backbar 96, and it directly or can be arranged on rotatably on main body container 2 with respect to main body container 2 by other members.The part of the 131a of portion of being fixed is configured in the top of backbar 96, is formed with the tooth 131c for pinion 132 engagements in this part of side.
In the dielectric cover fixture 130 of the variation shown in Figure 24, by making pinion 132 rotations, tooth bar 131 moves along the vertical direction, thus, can similarly remove the fixing of dielectric cover 112 with the dielectric cover fixture 120 shown in Figure 23.
Other structures, effect and the effect of present embodiment is identical with the 2nd execution mode.
the 4th execution mode
Then, the dielectric cover fixture as " the cover fixture " of the 4th execution mode of the present invention is described.Figure 25 means the cutaway view of the dielectric cover fixture of present embodiment.The device for inductively coupled plasma processing of present embodiment substitutes the dielectric cover fixture 120 of the 3rd execution mode and has dielectric cover fixture 135.
Dielectric cover fixture 135 comprises dielectric cover fixer 148 and fixed mechanism 140.Dielectric cover fixer 148 has the 148a of the portion that is fixed of axle shape, the 1st support 148b1, the 2nd support 148b2 that from the bottom of the 148a of portion that is fixed, to side, extend respectively, the 3rd and the 4th not shown support.The shape of the 1st～4th support is identical with the 1st～4th support of the bar 121 shown in Figure 23 with effect.The portion 148a of being fixed is inserted in through hole 96a.The part of the 148a of portion of being fixed is configured in the top of backbar 96, in this part, is formed with the hole 148c that along continuous straight runs runs through.Dielectric cover fixture 135 also comprises cover 149, and this cover 149 is installed on backbar 96, for covering being configured in a part of the 148a of the portion that is fixed of backbar 96 tops.
Fixed mechanism 140 is mechanisms that the movement of the above-below direction of the 148a of portion that is fixed is limited.This fixed mechanism 140 has bar 141 and cylinder body 142.Bar 141 and cylinder body 142 form cylinder.Cylinder body 142 is for example fixed in dielectric wall 6.Bar 141 along continuous straight runs configurations, can run through cover 149 and be inserted in the 148c of hole.
On cylinder body 142, be connected with pipe arrangement 143,144.From pipe arrangement 144 during to the interior air supply of cylinder body 142, from pipe arrangement 143 exhaust, bar 141 is outstanding and be inserted in the 148c of hole.Thus, the movement of the above-below direction of the 148a of portion that is fixed is limited, and dielectric cover 112 is fixing by dielectric cover fixer 148.On the contrary, from pipe arrangement 143 during to the interior air supply of cylinder body 142, from pipe arrangement 144 exhaust, bar 141 exits from hole 148c.Thus, the portion 148a of being fixed can move along the vertical direction, removes the fixing of dielectric cover 112.
Figure 26 means the cutaway view of the dielectric cover fixture 136 of modified embodiment of the present embodiment.The dielectric cover fixture 136 of this variation substitutes fixed mechanism 140 in Figure 25 and has fixed mechanism 150.The pinion 152 that fixed mechanism 150 has the tooth bar 151 of alternative bar 141 and these tooth bar 151 along continuous straight runs are moved.Tooth bar 151 along continuous straight runs configurations, can run through cover 149 and be inserted in the 148c of hole.
In this variation, by making pinion 152 rotations, tooth bar 151 along continuous straight runs move, and thus, can similarly remove the fixing of dielectric cover 112 with the dielectric cover fixture 135 shown in Figure 25.
Other structures, effect and the effect of present embodiment is identical with the 3rd execution mode.
the 5th execution mode
Then, the dielectric cover fixture as " the cover fixture " of the 5th execution mode of the present invention is described.Figure 27 means the cutaway view of the dielectric cover fixture of present embodiment.Figure 28 means the stereogram of a part for the dielectric cover fixture in Figure 27.
The device for inductively coupled plasma processing of present embodiment substitutes the backbar 86 of the 2nd execution mode and has backbar 186, substitute the dielectric cover 82 of the 2nd execution mode and there is dielectric cover 182, substituting the dielectric cover fixture 87A of the 2nd execution mode and there is dielectric cover fixture 187A.
In backbar 186, be formed with 1 through hole that extends through lower surface from upper surface.Through hole comprises interior perimembranous 186a, the 186b configuring in order to lower surface from the upper surface of backbar 86.The internal diameter of interior perimembranous 186b is greater than the internal diameter of interior perimembranous 186a.
The dielectric cover 82 of dielectric cover 182 and the 2nd execution mode is similarly divided into 4 parts.That is, dielectric cover 182 has part 1 cover 182A, part 2 cover 182B, not shown the 3rd and the 4th part cover.
Part 1 cover 182A has the 182A1 of the portion of being supported.The portion 182A1 of being supported have lower surface and with the continuous side of this lower surface.The lower surface that is supported the 182A1 of portion is a part for the lower surface of part 1 cover 182A, at the lower surface of part 1 cover 182A, the mode of top that is positioned at the lower surface of the part except being supported the 182A1 of portion to be supported the lower surface of the 182A1 of portion is formed with stage portion.Equally, part 2 cover 182B has the 182B1 of the portion of being supported.
Dielectric cover fixture 187A comprises dielectric cover fixer 188A and fixed mechanism 190.The dielectric cover fixer 88A of dielectric cover fixer 188A and the 2nd execution mode similarly has the 1st support 188A1, the 2nd support 188A2, the 188A3 of portion that is fixed, not shown the 3rd and the 4th support.The shape of the 1st～4th support is identical with the 2nd execution mode with effect.
The portion 188A3 of being fixed has the hook 189 of the top that is configured in cover 182 upper surfaces.Hook 189 is housed in interior perimembranous 186b.On hook 189, surface is to the inner rectangular slit 189a that is shaped as overlooking that is formed with from it.In the inside of hook 189, below above-mentioned slit 189a, be also formed with the blank part 189b continuous with slit 189a.The shape of the blank part 189b overlooking is the circle with the diameter equating with the length dimension of slit 189a.At the boundary position of slit 189a and blank part 189b, be formed with the step that slit 189a and blank part 189b are linked up and form face.
The connector 193 that fixed mechanism 190 has retainer 191, motor 192, the rotating shaft of motor 192 and retainer 191 are linked up.As shown in figure 28, the 191c of key portion that retainer 191 has the 191b of bar portion, the 191a of plectane portion being connected with the upper end of the 191b of this bar portion, is connected with the lower end of the 191b of bar portion.The 191a of plectane portion is configured in the top of backbar 186 upper surfaces, is connected in connector 193.The 191b of bar portion is inserted in interior perimembranous 186a and slit 189a.The 191c of key portion has the rectangular shape that can pass through the size of slit 189a.The 191c of key portion can be housed in blank part 189b rotatably.In addition, the above-below direction size of the 191c of key portion and the above-below direction size of blank part 189b are about equally.
In the dielectric cover fixture 187A of present embodiment, while making the rotating shaft rotation of motor 192, the 191c of key portion of retainer 191 rotates in blank part 189b.Make the 191c of key portion stop at except can be by the position of slit 189a position time, the upper surface of the 191c of key portion is connected to the step that slit 189a and blank part 189b are linked up and forms face and dielectric cover fixer 188A is fixed, thus, dielectric cover 182 is fixed by dielectric cover fixer 188A.
Make the 191c of key portion stop at can be by slit 189a position time, the 191c of key portion is by slit 189a, thus dielectric cover fixer 188A can move to below.Thus, dielectric cover 182 is fixedly disengaged.
Other structures, effect and the effect of present embodiment is identical with the 2nd execution mode.
the 6th execution mode
Then, the dielectric cover fixture as " the cover fixture " of the 6th execution mode of the present invention is described.Figure 29 means the cutaway view of the dielectric cover fixture of present embodiment.The device for inductively coupled plasma processing of present embodiment substitutes the dielectric cover 82 of the 2nd execution mode and has dielectric cover 162, substitutes the dielectric cover fixture 87A of the 2nd execution mode and has dielectric cover fixture 290.Dielectric cover 162 both can be divided into a plurality of parts, also can be not divided.The structure of dielectric cover fixture 290 is identical with the fixed mechanism 90 of the 2nd execution mode.Therefore, the constitutive requirements mark Reference numeral identical with the constitutive requirements of fixed mechanism 90 to dielectric cover fixture 290.
Dielectric cover 162 comprises cover main body 162A and hook 162B, and this cover main body 162A has upper surface and lower surface, and for forming the major part of dielectric cover 162, this hook 162B is installed in the upper surface of this cover main body 162A.Hook 162B is housed in the interior perimembranous 86d of backbar 86.The internal diameter that hook 162B forms near the part its upper end is less than the general cylindrical shape shape of the internal diameter of other parts.Near the part upper end of hook 162B becomes the holding section 162B1 for a plurality of holding section 94c engagings of fastened component 94.Holding section 162B1 and dielectric cover of the present invention to be supported portion corresponding.Thereby, in the present embodiment, as the holding section 162B1 that is supported portion, be configured in the top of the upper surface of cover main body 162A.Holding section 162B1 have lower surface and with the continuous side (end of the inner circumferential side of holding section 162B1) of this lower surface.
In dielectric cover fixture 290, the 6th part 91f of bar 91 and the holding section 94c of fastened component 94 are housed in hook 162B.Fastened component 94 is corresponding with dielectric cover fixer of the present invention, the constitutive requirements of the dielectric cover fixture 290 except fastened component 94 with mention as the fastened component 94 of dielectric cover fixer, fixed mechanism of the present invention is corresponding.In addition, holding section 94c is corresponding with support of the present invention, and the part except the 94c of holding section in fastened component 94 is corresponding with the portion that is fixed of the present invention.Holding section 94c as support is configured in as being supported between the lower surface of holding section 162B1 and the upper surface of cover main body 162A of portion.A part that forms the flat part 94b of the portion that is fixed is configured in the side of the side of holding section 162B1.
In the present embodiment, from pipe arrangement 95 during the inner space air supply to cylinder body 92, bar 91 is positioned at the lower end of movable range.Under this state, does not launch the bottom of a plurality of flat part 94b of fastened component 94, and a plurality of holding section 94c are not sticked in the holding section 162B1 of hook 162B.Thereby, under this state, as the fastened component 94 of dielectric cover fixer, be not fixed on backbar 86, can dismantle dielectric cover 162.
Stop from pipe arrangement 95 the inner space air supply to cylinder body 92, while discharging air from the inner space of cylinder body 92, bar 91 is pushed to top by the active force of spring 93, the bottom of a plurality of flat part 94b of fastened component 94 is launched laterally by the 6th part 91f.As a result, a plurality of holding section 94c are sticked in the holding section 162B1 of hook 162B, and the mode not changing with the position relationship of itself and backbar 86 as the fastened component 94 of dielectric cover fixer is fixed on backbar 86.Thus, the mode that dielectric cover 162 does not change with the position relationship of itself and backbar 86 is fixed.
Other structures, effect and the effect of present embodiment is identical with the 2nd execution mode.
the 7th execution mode
Then, the dielectric cover fixture as " the cover fixture " of the 7th execution mode of the present invention is described.Figure 30 means the cutaway view of the dielectric cover fixture of present embodiment.The device for inductively coupled plasma processing of present embodiment substitutes the dielectric cover 182 of the 5th execution mode and has dielectric cover 382, substitutes the dielectric cover fixture 187A of the 5th execution mode and has dielectric cover fixture 390.Dielectric cover 382 both can be divided into a plurality of parts, also can be not divided.The structure of dielectric cover fixture 390 is identical with the fixed mechanism 190 of the 5th execution mode.Therefore, the constitutive requirements mark Reference numeral identical with the constitutive requirements of fixed mechanism 190 to dielectric cover fixture 390.
Dielectric cover 382 comprises cover main body 382A and hook 382B, and this cover main body 382A has upper surface and lower surface, and for forming the major part of dielectric cover 382, this hook 382B is installed in the upper surface of this cover main body 382A.Hook 382B is housed in the interior perimembranous 186b of backbar 186.The internal diameter that hook 382B forms near the part its upper end is less than the general cylindrical shape shape of the internal diameter of other parts.
The structure of hook 382B is identical with the hook 189 of the 5th execution mode.That is,, in hook 382B, surface is to the inner rectangular slit 382Ba that is shaped as overlooking that is formed with from it.In the inside of hook 382B, below above-mentioned slit 382Ba, be also formed with the blank part 382Bb continuous with slit 382Ba.The shape of the blank part 382Bb overlooking is the circle with the diameter equating with the length dimension of slit 382Ba.At the boundary position of slit 382Ba and blank part 382Bb, be formed with the step that slit 382Ba and blank part 382Bb are linked up and form face.
In addition, hook 382B has the 382B1 of the portion that is supported of the periphery that is formed on slit 382Ba.Thereby in the present embodiment, the portion 382B1 of being supported is configured in the top of the upper surface of cover main body 382A.The portion 382B1 of being supported have lower surface and with the continuous side (end of slit 382Ba) of this lower surface.
In the retainer 191 of dielectric cover fixture 390, the 191b of bar portion is inserted in interior perimembranous 186a and slit 382Ba.The 191c of key portion has can be by the rectangular shape of the such size of slit 382Ba.The 191c of key portion can be housed in blank part 382Bb rotatably.In addition, the above-below direction size of the 191c of key portion and the above-below direction size of blank part 382Bb are about equally.
Retainer 191 is corresponding with dielectric cover fixer of the present invention, and the constitutive requirements of the dielectric cover fixture 390 except retainer 191 are corresponding with fixed mechanism of the present invention.The 191c of key portion of retainer 191 comprises 2 support 191c1, the 191c2 that can be connected to the lower surface that is supported the 382B1 of portion.In retainer 191, the part except support 191c1,191c2 is corresponding with the portion that is fixed of the present invention.Support 191c1,191c2 are configured in and are supported between the lower surface of the 382B1 of portion and the upper surface of cover main body 382A.A part that forms the 191b of bar portion of the portion that is fixed is configured in the side of the side that is supported the 382B1 of portion.
In the dielectric cover fixture 390 of present embodiment, while making the rotating shaft rotation of motor 192, the 191c of key portion of retainer 191 rotates in blank part 382Bb.Make the 191c of key portion stop at except can be by the position of slit 382Ba position time, the upper surface of support 191c1,191c2 is connected to and is supported the lower surface of the 382B1 of portion and dielectric cover 382 is fixed.
Make the 191c of key portion stop at can be by slit 382Ba position time, the 191c of key portion is by slit 382Ba, thus dielectric cover 382 can move to below.Thus, remove the fixing of dielectric cover 382.
Other structures, effect and the effect of present embodiment is identical with the 5th execution mode.
In addition, the present invention is not limited to the respective embodiments described above, can carry out various changes.For example, in the present invention, the parts that cover fixer is fixed are not limited to the parts shown in each execution mode.

Claims (3)

1. a cover fixer for device for inductively coupled plasma processing, this device for inductively coupled plasma processing comprises: process chamber, it has the window member that forms top plate portion, for carrying out plasma treatment; High frequency antenna, it is configured in the top of above-mentioned window member, for form induction field in above-mentioned process chamber; Supporting member, it is for supporting above-mentioned window member; Cover, for covering the lower surface of above-mentioned window member, above-mentioned cover fixer is used for above-mentioned device for inductively coupled plasma processing, for fixing above-mentioned cover, it is characterized in that,
Comprise:
Support, it is for supporting having as the portion of being supported of the lower surface of the part of above-mentioned cover;
The portion that is fixed, it is fixed in above-mentioned supporting member,
Above-mentioned cover comprises cover main body, and this cover main body has lower surface and upper surface, forms the major part of cover, and the above-mentioned portion of being supported is configured in the top of the upper surface of above-mentioned cover main body;
Above-mentioned support is configured in above-mentioned being supported between the lower surface of portion and the upper surface of above-mentioned cover main body.
2. a cover fixture for device for inductively coupled plasma processing, this device for inductively coupled plasma processing comprises: process chamber, it has the window member that forms top plate portion, for carrying out plasma treatment; High frequency antenna, it is configured in the top of above-mentioned window member, for form induction field in above-mentioned process chamber; Supporting member, for supporting above-mentioned window member; Cover, for covering the lower surface of above-mentioned window member, above-mentioned cover fixture is used for above-mentioned device for inductively coupled plasma processing, for fixing above-mentioned cover, it is characterized in that,
The cover fixture of above-mentioned device for inductively coupled plasma processing comprises: cover fixer claimed in claim 1; The above-mentioned portion of being fixed of above-mentioned cover fixer is fixed on to the fixed mechanism of above-mentioned supporting member.
3. the cover fixture of device for inductively coupled plasma processing according to claim 2, is characterized in that,
Above-mentioned fixed mechanism is the mechanism of mentioning the above-mentioned portion that is fixed.
CN201310390661.5A 2009-03-25 2010-03-25 Cover fixing device of induction coupling plasma processing apparatus Active CN103533739B (en)

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JP2009-073023 2009-03-25
JP2010010711A JP5578865B2 (en) 2009-03-25 2010-01-21 Cover fixing tool and cover fixing device for inductively coupled plasma processing apparatus
JP2010-010711 2010-01-21
CN201010141151.0A CN101848596B (en) 2009-03-25 2010-03-25 The cover fixer of device for inductively coupled plasma processing and cover fixture

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CN103533739B (en) 2017-04-12
TWI555444B (en) 2016-10-21

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