JP6307825B2 - Protective plate support member, plasma source, and ion beam irradiation apparatus - Google Patents

Description

  The present invention relates to an adhesion-preventing plate support member for attaching an adhesion-preventing plate inside a plasma generation container used in a plasma processing apparatus or an ion beam irradiation apparatus, and further to a plasma source including the adhesion-preventing plate support member.

  For plasma processing equipment such as plasma CVD equipment and plasma doping equipment called PLAD, and ion beam irradiation equipment such as ion implantation equipment and ion beam orientation equipment, it is effective to prevent corrosion of the inner wall of the plasma production vessel and to clean the inside of the plasma production vessel. Therefore, a detachable lining (also referred to as a liner or an adhesion-preventing plate) as disclosed in Patent Document 1 is provided along the inner wall of the plasma generation container.

  The attachment and detachment of the adhesion prevention plate is performed by moving the adhesion prevention plate in one direction as described in Patent Document 2, for example. As a specific configuration, a plurality of deposition preventing plate support members having a main body portion and an end portion extending from the main body portion are attached inside the plasma generation container. Since a gap is formed between the end portion of the adhesion-preventing plate support member and the inner wall surface of the plasma generation container, the adhesion-preventing plate is attached or removed by sliding using this gap.

JP-A-5-182623 JP 2013-20737 A

  If the structure of patent document 2 is used, the workability | operativity which concerns on attachment and removal of an adhesion prevention board will improve markedly. However, since the inside of the plasma generation container is exposed to the plasma, the deposition preventing plate supporting member itself is consumed. In this case, the adhesion-preventing plate support member is replaced. However, if the adhesion-prevention plate support member is removed, the member that supports one end of the adhesion-prevention plate is completely lost, so the adhesion-prevention plate generates plasma. It falls to the floor of the container. In order to prevent the deposition plate from falling onto the floor, it is necessary to remove the deposition plate itself before removing the deposition plate support member. If it becomes like this, time will be required for the replacement | exchange operation | work of the deposition-proof board support member.

  On the other hand, since the protection plate is replaced during regular maintenance, it is conceivable to replace the protection plate support member at this time. However, when the protection plate support member is replaced after waiting for the replacement time of the protection plate, the end of the protection plate support member is greatly deformed, and the end of the deformed protection plate support member and There is a concern that an adhesion-preventing plate may be sandwiched between the wall of the plasma generation container. In this case, when removing the protection plate, the protection plate can no longer be removed by sliding. If it becomes so, the workability | operativity which concerns on the replacement | exchange work of a protection board will fall remarkably.

  Accordingly, the main object of the present invention is to provide an adhesion-preventing plate support member that can be easily replaced and a plasma source including the same, and to improve workability related to the replacement of the adhesion-prevention plate.

  A deposition plate support member disposed in a plasma generation container used in a plasma processing apparatus or an ion beam irradiation apparatus, wherein the first member is fixed to the inner wall of the plasma generation container, and is fixed to the first member. And a second member having a protrusion protruding from at least the peripheral edge of the first member in a direction along the inner wall surface of the plasma generation container when viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation container. The projecting portion is separated from the inner wall surface of the plasma generation container in a direction substantially perpendicular to the inner wall surface of the plasma generation container.

  With such a configuration, the second member is exposed to the plasma generated inside the plasma generation container, but the first member fixed to the inner wall of the plasma generation container is difficult to be exposed to the plasma. For this reason, when exchanging the adhesion-preventing plate support member, only the second member that is exposed to the plasma and is damaged may be replaced. In this case, since the first member is fixed to the inner wall of the plasma generation container, the end portion of the deposition preventing plate can be supported by this member. As a result, it is not necessary to remove the adhesion-preventing plate when replacing the adhesion-preventing plate support member. Can be improved.

  It is desirable that the second member includes the first member when viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation container.

  With such a configuration, the first member is covered with the second member, and therefore the first member is not completely exposed to the plasma. Therefore, since the replacement of the first member is completely unnecessary, only the second member needs to be replaced.

  It is desirable that the second member includes a recess that houses a part of the first member.

  With such a configuration, the second member can be stably fixed to the first member by the recess.

  The first member and the second member are preferably made of a nonmagnetic material.

  A magnetic field may be formed inside the plasma generation container. If the adhesion-preventing plate support member is made of a non-magnetic material, it does not affect such a magnetic field, so that the degree of freedom of arrangement of the adhesion-prevention plate support member is improved.

As a configuration of the plasma source, any plasma source may be used as long as the above-described deposition preventing plate supporting member is attached to the inner wall of the plasma generation container.
Moreover, what is necessary is just an ion beam irradiation apparatus provided with the above-mentioned adhesion-prevention-plate support member.

  The second member is exposed to plasma generated inside the plasma generation container, but the first member fixed to the inner wall of the plasma generation container is difficult to be exposed to plasma. For this reason, when exchanging the adhesion-preventing plate support member, in many cases, it is only necessary to replace the second member that is exposed to plasma and is greatly damaged. When exchanging the second member, the first member can be fixed to the inner wall of the plasma generation container, so that the end portion of the deposition preventing plate can be supported by this member. As a result, it is not necessary to remove the adhesion-preventing plate when replacing the adhesion-preventing plate support member. Can be improved.

It is a perspective view which shows an example of a plasma production container. It is the schematic which shows an example of the adhesion prevention board support member of this invention. It is sectional drawing by the AA line of FIG. 2, BB line, and CC line. It is the schematic which shows the 2nd Example of the adhesion prevention board support member of this invention. It is the schematic which shows the 3rd Example of the adhesion prevention board support member of this invention. It is the schematic which shows the 4th Example of the adhesion prevention board support member of this invention. It is the schematic which shows the 5th Example of the adhesion prevention board support member of this invention.

  In a semiconductor manufacturing apparatus, a plasma source including a plasma generation container in which plasma is generated is provided.

  FIG. 1 shows examples of a plasma source P including various forms of plasma generation containers 1. The plasma source P shown in FIG. 1 (A) includes a plasma generation container 1 whose outer shape is substantially cylindrical, and the plasma source P shown in FIG. 1 (B) has a plasma generation container 1 whose outer shape is substantially cubic. I have. Further, the plasma source P shown in FIG. 1 (C) has a plasma generation vessel 1 in which an opening 7 is formed in the plasma generation vessel 1 shown in FIG. 1 (B) to lead out an ion beam or plasma to the outside of the vessel. It has.

  As for the plasma generation method, as conventionally known, gas is introduced into the container, an anode and a cathode having different potentials are provided, and thermoelectrons that ionize the gas are emitted from the cathode to generate plasma. Instead of this method and gas ionization by thermoelectrons, a method of introducing a high frequency into the container is used.

  FIG. 2 shows a state in which the deposition preventing plate 2 is supported inside the plasma generation vessel 1 using the deposition preventing plate support member F of the present invention. In this example, three deposition prevention plates 2 are individually supported along the inner wall surface of the plasma generation container 1. The adhesion preventing plate support member F includes a first member 3 fixed to the inner wall surface of the plasma generation container 1 and a second member 4 fixed to the first member 3. For example, each member is fixed using a bolt 5. In the Y-axis direction shown in the figure, the deposition prevention plates 2 are slid along the directions of the arrows S1 to S3 between the separation prevention plate support members F that are spaced apart from each other, so that the deposition prevention plates 2 become plasma generating containers. 1 is attached along the inner wall surface. The XYZ axes described in this drawing and the subsequent drawings are orthogonal to each other.

  3A to 3C, cross-sectional views taken along lines AA, BB, and CC shown in FIG. 2 are depicted. Based on this, the details of the configuration of the deposition preventing plate supporting member F will be described.

  As illustrated in FIGS. 3A and 3B, the second member 4 has a recess 6, and the first member fixed to the inner wall of the plasma generation vessel 1 in the recess 6. A part of the member 3 is accommodated. If such a concave portion 6 is provided, the second member 4 can be easily assembled to the first member 3. Instead of providing the recess 6 in the second member 4, a recess may be provided in the first member 3, and this may be used for positioning or the like when assembling both members. Even with such a configuration, it is possible to achieve an effect equivalent to that of providing the recess 6 in the second member 4.

  As illustrated in FIGS. 3A to 3C, when viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation vessel 1 (the direction indicated by the arrow E or the Z-axis direction in the drawing). The second member 4 includes the first member 3. Note that the inclusion means that the first member 3 cannot be completely seen (hidden) by the second member 4 when viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation vessel 1. Point to. Further, the term “substantially vertical” includes a range that is substantially vertical and deviates from vertical by several degrees.

  The second member 4 has a protruding portion that protrudes from the periphery of the first member 3, and when the second member 4 is viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation container 1, the second member 4 The first member 3 is configured to be completely hidden by the member 4. The protrusion part which the 2nd member 4 protruded is a location corresponding to the area | region D as described in FIG. The protrusion of the second member 4 corresponding to the region D is separated from the inner wall surface of the plasma generation container 1 when viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation container 1. Using the space between the protruding portion and the inner wall surface of the plasma generation container 1, the deposition preventing plate 2 is slid to be attached or detached.

  With such a configuration, the second member 4 is exposed to plasma generated inside the plasma generation container 1, but the first member 3 fixed to the inner wall of the plasma generation container 1 is exposed to plasma. It becomes difficult. For this reason, when exchanging the adhesion-preventing plate support member F, only the second member 4 that is exposed to the plasma and is damaged may be replaced. In this case, since the first member 3 can be fixed to the inner wall of the plasma generation vessel 1, the end of the deposition preventing plate 2 can be supported by the first member 3. Thereby, it becomes unnecessary to remove the deposition preventing plate 2 when replacing the deposition preventing plate support member F.

  It is not necessary for the second member 4 to include the first member 3. If at least a part of the first member 3 is hidden by the second member 4, the replacement frequency of the first member 3 is reduced compared to the case where all of the first member 3 is exposed to plasma. be able to. For example, when the deposition preventing plate 2 is supported by one end portion in the Y-axis direction of the deposition preventing plate support member F, any one of the protrusions corresponding to the region D illustrated in FIGS. The second member 4 may be configured so that one of them is formed. Of course, the second member 4 may be configured to completely hide (include) the first member 3. If done in this way, the replacement frequency of the first member 3 can be drastically reduced.

  FIG. 4 is a schematic view showing a second embodiment of the deposition preventing plate supporting member F of the present invention. The difference from the example of FIG. 3 is that when the wall surface is viewed from a direction substantially perpendicular to the inner wall surface of the plasma generation vessel 1, a part of the first member 3 is hidden by the second member 4. It is not completely hidden. Even in such a configuration, since a part of the first member 3 is hidden by the second member 4, damage to the first member 3 due to plasma can be reduced.

  FIG. 5 is a schematic view showing a third embodiment of the deposition preventing plate supporting member F of the present invention. In the embodiment so far, the recess 6 is formed in the second member 4, but in the embodiment of FIG. 5, the second fixing member 4 does not include the recess 6. If the positioning of the two members 4 is not performed when the second member 4 is attached to the first member 3, the configuration shown in FIG. 5 may be used.

  FIG. 6 is a schematic view showing a fourth embodiment of the deposition preventing plate supporting member F of the present invention. As illustrated in FIG. 6, the adhesion-preventing plate support member F may be divided into a plurality along the direction in which the adhesion-preventing plate 2 is slid. Such a configuration may be used. However, in order to more easily attach and remove the adhesion-preventing plate support member F, it is better to configure the adhesion-prevention plate support member F as a single unit rather than dividing it into a plurality of pieces.

  7A and 7B are schematic views showing a fifth embodiment of the adhesion-preventing plate support member F of the present invention. Even if the shape of the plasma generation container 1 is curved, the present invention can be applied. In the case of FIG. 7A, when the curvature of the wall surface of the plasma generation container 1 is increased, it becomes impossible to attach the deposition preventing plate 2 by sliding. In this case, as shown in FIG. 7B, an adhesion-preventing plate support member F is provided, and, for example, the adhesion-prevention plate 2 is attached by sliding in the direction of arrow S1 from the upper side to the lower side of the drawing. Just do it.

  The material of the 1st member 3 and the 2nd member 4 which comprise the adhesion prevention board support member F described in the previous Example should just be a nonmagnetic material. In some cases, a magnetic field distribution for confining plasma is formed inside the plasma generation container 1. If the adherence plate support member F is a magnetic material, such a magnetic field distribution may be affected. However, if this is made of a non-magnetic material, the magnetic field distribution formed inside the plasma generation vessel 1 will be improved. There is no need to consider the effects of Thereby, the arrangement | positioning freedom degree of the adhesion prevention board support member F can be improved significantly. As the nonmagnetic material, it is conceivable to use austenitic stainless steel in consideration of heat resistance and wear resistance.

  It is not necessary to apply the present invention to all of the adhesion-preventing plate support members F arranged inside the plasma generation container 1. For example, in the case where a plurality of deposition plates are provided, for some deposition plates, a configuration in which the deposition plates are stopped with bolts may be used in consideration of the configuration of the plasma generation container. On this, other attachment plates may be attached and detached by sliding using the attachment plate support member F to which the present invention is applied.

  In addition to the above, it goes without saying that various improvements and modifications may be made without departing from the scope of the present invention.

1. 1. Plasma generation container 2. Protection plate First member 4. Second member 6. Recess 7 Opening F. Protective plate support member P.I. Plasma source

Claims (6)

A deposition plate support member disposed in a plasma generation container used in a plasma processing apparatus or an ion beam irradiation apparatus,
A first member disposed only on one inner wall surface of the plasma generating chamber,
A member that is detachable from the first member and is attached to the first member and at least the first member in a direction along the inner wall surface when viewed from a direction substantially perpendicular to the inner wall surface. A second member having a protruding portion protruding from the periphery of
The projecting portion is separated from the inner wall surface in a direction substantially perpendicular to the inner wall surface, and the second member covers the first member when viewed from a direction substantially perpendicular to the inner wall surface . Attachment plate support member. The adhesion preventing plate supporting member according to claim 1, wherein a separation distance between the second member and the inner wall surface is larger than a thickness dimension of the adhesion preventing plate disposed between the two members.   The deposition preventing plate supporting member according to claim 1, wherein the second member includes a recess that houses a part of the first member.   4. The adhesion-preventing plate support member according to claim 1, wherein the first member and the second member are made of a nonmagnetic material. 5.   A plasma source in which the adhesion-preventing plate supporting member according to claim 1 is attached to an inner wall of the plasma generation container. An ion beam irradiation apparatus comprising the plasma source according to claim 5 .