TWI543396B - 多-異質接面奈米粒子、其製造方法及包含該粒子之製品 - Google Patents

多-異質接面奈米粒子、其製造方法及包含該粒子之製品 Download PDF

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TWI543396B
TWI543396B TW103109388A TW103109388A TWI543396B TW I543396 B TWI543396 B TW I543396B TW 103109388 A TW103109388 A TW 103109388A TW 103109388 A TW103109388 A TW 103109388A TW I543396 B TWI543396 B TW I543396B
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nanoparticle
dimensional
semiconductor
precursor
heterojunction
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TW201445767A (zh
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幕斯柏 西門
納瑞 歐
尤 任雅
索伊 納摩
彼得 崔夫納斯
柯候瑞 德斯巴德
傑奇 喬
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伊利諾大學受託人董事會
羅門哈斯電子材料有限公司
陶氏全球科技責任有限公司
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Description

多-異質接面奈米粒子、其製造方法及包含該粒子之製品
本發明係關於雙異質接面(heterojunction)奈米粒子,其製造方法及包含該粒子之製品。
半導體奈米晶體的關鍵優勢之一係其改善光電裝置之效率的潛力。球形奈米晶體異質結構,有時稱為核殼量子點,業經廣泛用於量子點發光二極體(LED)。於此等主要由I型(跨式)頻帶偏移組成之核殼異質結構中,該異質接面係僅作為鈍化層以改善光致發光效率。由於他們獨特的光學性質及電子性質,半導體奈米晶體業經在多種光電應用包括光伏(PV)、LED、固態發光、及顯示器中引起關注。此等微小晶體具有一個或多個若干奈米長之維度,可允許調諧其電子帶隙。帶隙及電子能階之改變係允許吾人控制其觀察到的半導體之光學及電學性質。
此外,當將兩種或更多種半導體材質放置一起時,取決於該等材質之相關頻帶偏移及頻帶對準,可預期新的及改善的光學性質及電子性質。於不相似半導體之 介面處形成的異質接面可有助於引導電子及電洞,且可作為多種裝置,包括PV、LED及電晶體之主動元件。藉由選擇相異之用於該核及殼的材質,可改變頻帶邊緣位置。惟,某些材質組合的有效帶隙及頻帶偏移可能大且可能阻擋載劑注入製程。因此,所欲者係製造具有多個異質接面之半導電奈米粒子。具有多個異質接面之粒子允許位於不同介面處之帶隙及頻帶偏移能憑藉具有超過兩種彼此選擇性接觸之半導體材質而予以調諧。
多個異質接面之益處係包括,藉由該中心「核」之表面鈍化,亦即,藉由製備具有I型頻帶偏移與II型頻帶偏移之組合的多個異質接面,促進載劑注入及/或阻斷,同時,提供改善之光致發光產率。除了I型核/殼之表面鈍化的同等益處之外,這促進達成對於一種類型之載劑的良好阻擋,同時,亦促進另一種類型之載劑的注入。
本文係揭露半導電奈米粒子,其包含:具有第一端及第二端之一維半導電奈米粒子;其中,該第二端係與該第一端相對;以及,兩個第一封端,其一者及另一者係分別與該一維半導電奈米粒子之第一端及第二端接觸;其中,與該第一端接觸之第一封端係包含第一半導體,且該第一封端自該一維半導電奈米粒子之第一端延伸以形成第一奈米晶體異質接面;與該第二端接觸之第一封端係包含第二半導體;且該第一封端自該一維半導電奈米粒子 之第二端延伸以形成第二奈米晶體異質接面;以及,其中,該第一半導體係與該第二半導體係於化學上彼此相異。
本文亦揭露一種方法,其係包含:令半導體之第一前驅物與半導體之第二前驅物反應以形成一維半導電奈米粒子;其中,該第一一維半導電奈米粒子係具有第一端及與該第一端相對之第二端;令半導體之第三前驅物與該一維奈米粒子反應,以形成接觸該一維奈米粒子之第一端的第一封端以形成第一異質接面;以及,令其上置有該第一封端之一維奈米粒子與半導體之第四前驅物反應,以形成置於該一維半導電奈米粒子之第二端的另一第一封端並形成第二異質接面;其中,該第二異質接面係組成上相異於該第一異質接面。
本文亦揭露一種製品,其係包含:第一電極;第二電極;以及,置於該第一電極與第二電極之間且包含半導電奈米粒子之層體;其中,該半導電奈米粒子係包含:具有第一端及第二端之一維半導電奈米粒子,其中,該第二端係與該第一端相對;以及兩個第一封端,其一者及另一者係分別與該一維半導電奈米粒子之第一端及第二端接觸;其中,與該第一端接觸之第一封端係包含第一半導體,且該第一封端自該一維半導電奈米粒子之第一端延伸以形成第一奈米晶體異質接面;與該第二端接觸之第一封端係包含第二半導體,且該第一封端自該一維半導電奈米粒子之第二端延伸以形成第二奈米晶體異質接面;以及,其中,該第一半導體係與該第二半導體係於化學上彼 此相異。
A---A’、120‧‧‧軸
100‧‧‧奈米粒子
102‧‧‧一維奈米粒子
103‧‧‧第一異質接面
104‧‧‧第一端
106‧‧‧第二端
108、108A、108B‧‧‧第一封端
109‧‧‧第二異質接面
110‧‧‧第二封端
122A‧‧‧第一節點
122B‧‧‧第二節點
300‧‧‧EL裝置
302‧‧‧基板
304‧‧‧第一電極
306‧‧‧電洞注入層
308‧‧‧電洞傳輸層
310‧‧‧奈米粒子層
312‧‧‧電子傳輸層
314‧‧‧第二電極
第1圖(A)係本文所揭露之經鈍化之奈米晶形半導電奈米粒子的描述;第1圖(B)係本文所揭露之經鈍化之奈米晶形半導電奈米粒子的描述;第2圖係顯示可如何地藉由改變該等奈米粒子之組成而令帶隙變化(亦即,空間上經調製)。於第2圖中,該奈米粒子係包含硫化鎘(CdS)一維奈米粒子,而且,該第一封端為硒化鎘(CdSe)且該第二封端為硒化鋅(ZnSe);第3圖亦顯示可如何地藉由改變該等奈米粒子之組成而令帶隙變化(亦即,空間上經調製)。於第3圖中,該一維奈米粒子係包含硫化鎘,同時,該第一封端係包含碲化鎘且該第二封端係包含硒化鋅;第4圖係例示性電場發光(EL)裝置的圖示說明;第5(A)圖係顯示核殼(CdSe/ZnS)量子點之EL譜的圖;第5(B)圖係顯示本文所揭露之奈米粒子(CdS奈米棒,藉由包含CdSe之第一封端及包含ZnSe之第二封端鈍化)之EL譜的圖;以及第6圖係顯示量子點及本文揭露之奈米粒子之積分之EL對電壓做的圖。
本文係揭露經鈍化之奈米晶形半導電奈米粒 子(後文中稱為奈米粒子),其係包含複數個異質接面,且當其用於裝置中時,促進增強發光之電荷載劑注入製程。該等奈米晶形半導電奈米粒子係僅於某些位置鈍化,同時在其他位置未經鈍化。此等經多-異質接面鈍化之奈米粒子可作為主動元件而用於易加工、高效能之光電裝置包括發光二極體(LED)中。該等奈米粒子係包含一維奈米粒子,其每一端置有與該一維奈米粒子接觸之一個封端或複數個封端。該等封端亦彼此接觸。該等封端係用以鈍化該一維奈米粒子。該等奈米粒子可關於至少一個軸對稱或不對稱。該等奈米粒子可於組成、幾何結構、及電子結構上不對稱,或於組成及結構兩者上皆不對稱。
於一實施例中,該奈米粒子係包含一維奈米粒子,該一維奈米粒子在沿著其縱軸之每一相對端包含封端。每一封端係具有相異之組成,由是提供具有多個異質接面之奈米粒子。於另一實施例中,該奈米粒子係包含一維奈米粒子,該一維奈米粒子在沿著其縱軸之每一相對端包含封端,且復包含置於該一維奈米粒子之徑向面(radical surface)上或該等封端上的節點。該徑向面亦界定該等棒之側表面。該等封端可具有彼此相似或相異之組成,及/或該等節點可具有彼此相似或相異之組成,只要該等封端之一者係具有相異於其他封端或該等節點之至少一者的組成即可。
於一實施例中,該等複數個封端係包含第一封端及部份地或完全地圍繞該第一封端之第二封端。該等 封端係三維奈米粒子,其至少一者係直接與該一維奈米粒子接觸。每一封端可與該一維奈米粒子接觸或不接觸。該第一封端與第二封端可具有彼此相異之組成。該等節點亦係三維奈米粒子,其尺寸可小於或大於該等封端之尺寸。
術語「異質接面」係意指一種半導體材質成長至另一半導體材質之晶格中的結構。術語「一維奈米粒子」係包括物件,其中,該奈米粒子之質量係隨著該奈米粒子之特徵維度(如,長度)之一次方改變。此係顯示於下式(1)中:M α Ld (1)其中,M係該粒子之質量,L係該粒子之長度,以及,d係決定該粒子之維數的指數。舉例而言,當d=1時,該粒子之質量係與該粒子之長度成正比,且該粒子稱為一維奈米粒子。當d=2時,該粒子係二維物件如板,而d=3係定義三維物件如筒狀或球狀。該等一維奈米粒子(d=1之粒子)係包括奈米棒、奈米管、奈米線、奈米鬚、奈米帶等。於一實施例中,該一維奈米粒子可為彎曲狀或波狀狀(如蛇狀),亦即,具有界於1與1.5之間的d值。
該等一維奈米粒子係具有橫截面,其特徵厚度維度直徑(如,圓形橫截面積之直徑,或正方形或矩形橫截面積之對角線)為1奈米(nm)至1,000nm,較佳2nm至50nm,且更佳5nm至20nm(如,約6、7、8、9、10、11、12、13、14、15、16、17、18、19、或20nm)。奈米棒係具有圓形橫截面之剛性棒,該橫截面之特徵維度係落入前 述範圍內。奈米線或奈米鬚係彎曲狀且具有相異之蛇形或蠕蟲形。奈米帶係具有被四個或五個線性側邊框界之橫截面。此等橫截面之實例係正方形、矩形、平行六面體、菱面體等。奈米管係具有實質上同心之孔,該孔橫貫該奈米棒之整個長度,從而造成管狀。此等一維奈米粒子之縱橫比係大於或等於2,較佳大於或等於5,且更佳大於或等於10。
該等一維奈米粒子係包含半導體,該等半導體係包括彼等為第II-VI族(ZnS、ZnSe、ZnTe、CdS、CdSe、CdTe、HgS、HgSe、HgTe等)、第III-V族(GaN、GaP、GaAs、GaSb、InN、InP、InAs、InSb、AlAs、AlP、AlSb等)及第IV族(Ge、Si、Pb等)材質、及其合金或其混合物。
該一維奈米粒子、該第一封端及該第二封端係各自包含半導體。該奈米棒與該第一封端之間的介面係提供第一異質接面,同時,該第一封端與該第二封端之間的介面係提供第二異質接面。以此方式,該奈米粒子可包含複數個異質接面。
現在,參照第1圖(A),該奈米粒子100係包含一維奈米粒子102,其係具有第一端104及第二端106。第一封端108係置於該第一端104,且該一維奈米粒子之第二端106係直接接觸該一維奈米粒子102。該第一封端108與該一維奈米粒子之第一端104之間的介面係形成第一異質接面103。於一實施例中,該第一封端108係接觸該一維奈米粒子102之該等端且不與該一維奈米粒子102 之縱向部份接觸。較佳係該第一封端108並不環繞整個一維奈米粒子102。
該第二封端110係於該一維奈米粒子102之一端或兩端接觸該第一封端108並環繞該第一封端108。該第二封端110可部份地或完全地環繞該第一封端108。較佳係該第二封端110並不環繞整個一維奈米粒子102。
該第二封端110與該第一封端108之間的介面係形成第二異質接面109。因此,第1圖中之奈米粒子100係雙異質接面奈米粒子。於更多封端係置於該第二封端110上之情況,該奈米粒子100將具有超過2個異質接面。於一例示性實施例中,該奈米粒子100可具有3個或更多個異質接面,較佳4個或更多個異質接面,或較佳5個或更多個異質接面。
於一實施例中,該一維奈米粒子接觸該第一封端處的異質接面係具有I型或準II型頻帶對準。於另一實施例中,該第二封端接觸該第一封端之點係具有I型或類II型頻帶對準。
該一維奈米粒子可包含奈米棒、奈米線、奈米管、奈米鬚等。於一例示性實施例中,該奈米粒子係奈米棒。所謂「一維」奈米粒子係因為其具有大於其直徑之長度,亦因為其質量係隨著其長度之一次方的改變而改變,如上文中等式(1)所示。
該一維奈米粒子可具有10至100nm,較佳12至50nm,且更佳14至30nm之長度。該一維奈米粒子 可具有2至10nm,較佳3至7nm之直徑。該一維奈米粒子係具有大於或等於約3,較佳大於或等於約7,且更佳大於或等於約12之縱橫比。該一維奈米粒子係奈米晶體,且包含二元、三元、或四元半導體。若需要,該半導體可包含5種或更多種元素。
於該一維奈米粒子中使用之半導體係第II-VI族化合物、第II-V族化合物、第III-VI族化合物、第III-V族化合物、第IV-VI族化合物、第I-III-VI族化合物、第II-IV-VI族化合物、或第II-IV-V族化合物。該一維奈米粒子更佳可選自下列所組成之群組:Si、Ge、Pb、SiGe、ZnS、ZnSe、ZnTe、CdS、CdSe、CdTe、HgS、HgSe、HgTe、AlN、AlP、AlAs、AlSb、GaN、GaP、GaAs、GaSb、GaSe、InN、InP、InAs、InSb、TlN、TlP、TlAs、TlSb、PbS、PbSe、PbTe等,或包含前述半導體之至少一者的組合。於一例示性實施例中,該一維奈米粒子係包含CdS。
現在,再次參照第1圖(A),該一維奈米粒子102係包含彼此相對之第一端104及第二端106。第一封端108係與該一維奈米粒子之第一端104及第二端106接觸。於一實施例中,該第一封端108可完全覆蓋該一維奈米粒子102之第一端104及第二端106。於另一實施例中,該第一封端108可成正切地接觸該第一端104及第二端106。通常,該第一封端108係球形或橢球形,且具有圓形或橢圓形之橫截面。於一實施例中,該第一封端與第二封端可係筒狀,但具有短於該一維奈米粒子的縱橫比。
該第一封端108之直徑為該一維奈米粒子之直徑的約0.5倍至約1.5倍,較佳約0.7倍至約1.2倍。於一實施例中,該等第一封端之直徑為1至15nm,較佳2至12nm。
於一實施例中,如上所述,該奈米粒子可係組成上不對稱但同時為結構上對稱。換言之,接觸該一維奈米粒子102之相對端的第一封端108及/或第二封端110可在相對端具有相異之組成,同時在維度及幾何上一致。此係於下文第1圖(B)中詳述。
於另一實施例(本文未顯示)中,該第一封端108及/或第二封端110可係組成上一致但具有相異之尺寸或相異之幾何形狀。此奈米粒子係稱為組成上對稱但維度上及幾何學不對稱。
該第二封端110除了接觸第一封端108外,亦與該一維奈米粒子102接觸。於一實施例中,該第二封端接觸該第一封端而不接觸該一維奈米粒子102。於一實施例中,該第二封端110部份地或完全地包封該第一封端108。該第二封端110通常係球形或橢球形且具有圓形或橢圓形之橫截面。儘管該第一封端108與該第二封端110具有圓形或橢圓形之橫截面,此等封端亦可能具有正方形、矩形、三角形或多邊形之橫截面。可藉由模板合成具有正方形、矩形、三角形或多邊形之橫截面,其中,於合成過程中,該一維奈米粒子係置於該模板中。該第一封端108及第二封端110可僅接觸該一維奈米粒子之一端(或104, 或106),或接觸該奈米粒子之兩端(104及106)。於一實施例中,該第二封端110係視需要存在,亦即,該一維奈米粒子僅具有置於該一維奈米粒子之每一端的第一封端108。惟,各第一封端108於組成上係彼此相異。此係於第1圖(B)中進一步詳述。
於一實施例中,該第一封端108與第二封端110係同心地安裝於該一維奈米粒子102上,亦即,他們係關於軸AA’(以數字120表示)而同心放置。儘管第1(A)圖說明該一維奈米粒子102、第一封端108及第二封端110係關於軸120同心放置,仍可能具有關於該一維奈米粒子102不同心安裝的第一封端108及/或第二封端110。
該第二封端110之直徑為該一維奈米粒子之直徑的約1.0倍至約3.0倍,較佳約1.5倍至約2.7倍。於一實施例中,該第二封端110之直徑為2至30nm,較佳3至15nm。
該第一封端與該第二封端係彼此化學相異,且係選自下列所組成之群組:Si、Ge、Pb、SiGe、ZnO、TiO2、ZnS、ZnSe、ZnTe、CdO、CdS、CdSe、CdTe、MgO、MgS、MgSe、MgTe、HgO、HgS、HgSe、HgTe、AlN、AlP、AlAs、AlSb、GaN、GaP、GaAs、GaSb、InN、InP、InAs、InSb、TlN、TlP、TlAs、TlSb、TlSb、PbS、PbSe、PbTe等,或包含前述半導體之至少一者的組合。於一例示性實施例中,該第一封端係CdTe或CdSe,而該第二封端係ZnSe。
鈍化分子如烷基膦類、氧化烷基膦類、胺 類、羧酸類等可置於該奈米棒異質結構之表面上,從而令溶解度及聚結性改變。光致發光之量子效率可藉由表面鈍化分子及/或藉由無機封端而改變。
第1圖(B)係說明僅具有置於該一維奈米粒子之相對端上之兩個第一封端108A及108B的一維奈米粒子。兩個第一封端108A及108B係具有彼此相異之組成,從而對該等一維奈米粒子提供兩個異質接面。於一實施例中,該等一維奈米粒子可具有置於其徑向面上之節點:第一節點122A及第二節點122B。節點122A及122B係包含半導體(如,上文列述之彼等用於第一封端及第二封端者),且係沿著該一維奈米粒子之徑向面隨機分佈。於該等一維奈米粒子之合成過程中,該等節點成核並於該等一維奈米粒子之表面上隨機生長。該節點與該一維奈米粒子之徑向面接觸之點為異質接面。
為了製造多-異質接面奈米粒子,所欲者係該等節點及封端具有彼此相異之組成。節點122A及122B可具有一致之組成或彼此相異之組成,此係取決於所欲之異質接面數目。當奈米粒子僅具有兩個具有一致之組成的第一封端108時,為了製造多異質接面奈米粒子,節點122A及/或122B係具有與封端108之彼等相異之組成。若封端108A與108B分別具有彼此相異之組成,則該等節點可具有彼此相似之組成且可與該封端之一者一致。於一實施例中,該等節點可具有與該等封端之任一者之組成相異的組成。於第一節點122A與一維奈米粒子徑向面之接觸點處 產生的異質接面,係與在第二節點122B與同一徑向面接觸點處產生的異質接面相異。藉由具有接觸該一維奈米粒子之徑向面之相異半導體組成的相異節點,該奈米粒子可具有多個異質接面。
於奈米粒子中存在雙異質接面之優勢在於可用以控制及改變該等奈米粒子之發射中心。此可用以影響發射性質,且亦可用以促進電荷移動性之改變。該異質接面除了提供表面鈍化效益(等同於I型核/殼)之外,亦提供選擇性阻擋(取決於載劑類型一電子或電洞),同時,許可該核發射中心的良好鈍化,亦即,其對於一種類型之載劑為良好的阻擋劑,同時促進另一類型之載劑的注入。
形成該異質接面之材質的組成物可用以影響該帶隙及頻帶偏移。帶隙,亦稱為能隙或頻帶間隙,係於無電子狀態能存在之固體中的能量範圍。於固體之電子頻帶結構圖中,該帶隙通常係指代,絕緣體及半導體中價帶頂部與傳導帶底部之間的能差(以電子伏特計)。
此係等同於將殼電子自其繞核軌道中脫離出來變為能夠於固體材質中自由移動之移動電荷載體所需的能量。因此,帶隙係決定固體導電性的一個重要因素。具有大帶隙之物質通常係絕緣體,彼等具有較小帶隙者係半導體,而導體則因為其價帶與傳導帶重疊而具有非常小之帶隙或無帶隙。頻帶偏移亦可用於電荷載劑之操控。帶隙及頻帶偏移可用以決定相關材質之光學性質,諸如特徵吸收/發射峰位置。
藉由改變該一維奈米粒子、第一封端及/或第二封端之組成及尺寸(直徑或長度),可改變能帶隙及頻帶偏移。改變能帶隙可用以改變於該奈米粒子中產生之光的波長、效率及強度。於一實施例中,第一封端與一維奈米粒子之間的傳導帶偏移係遠遠高於第一封端與第二封端之間的傳導帶偏移,並且,第一封端與一維奈米粒子之間的價帶偏移係遠遠低於第一封端與第二封端之間的價帶偏移。於另一實施例中,第一封端與一維奈米粒子之間的傳導帶偏移係遠遠低於第一封端與第二封端之間的傳導帶偏移,並且,第一封端與一維奈米粒子之間的價帶偏移係遠遠低於第一封端與第二封端之間的價帶偏移。於又一實施例中,藉由第一封端形成之兩個異質接面的一者係具有較另一者更小之傳導帶偏移及較大之價帶偏移,而另一者係具有較大之傳導帶偏移及較小之價帶偏移。
第2圖及第3圖係顯示可如何地藉由改變該等奈米粒子之組成而改變(空間上經調製)帶隙。於第2圖中,該奈米粒子係包含硫化鎘(CdS)一維奈米粒子,且第一封端為硒化鎘(CdSe),以及,第二封端為硒化鋅(ZnSe)。於第2圖中,硫化鎘一維奈米粒子與硒化鎘第一封端之間的介面係第一異質接面,而硒化鋅第二封端與硒化鎘第一封端之間的介面係第二異質接面。
自第2圖可見,硫化鎘之傳導帶與價帶之間的帶隙係大於2.4電子伏特,硒化鎘之傳導帶與價帶之間的帶隙係大於1.7電子伏特,以及,硒化鋅之傳導帶與價 帶之間的帶隙係大於2.7電子伏特。
藉由使用硒化鎘封端將硫化鎘一維奈米粒子封端,電荷載劑將被限制於硒化鎘區域,且可於鈍化該奈米粒子的同時將有效帶隙(亦即,激子能級)自2.4電子伏特(eV)降低至1.7eV。此能帶隙差異(亦即,激子能階)可影響奈米粒子之發光特徵,亦影響任何使用該等奈米粒子之裝置的發光特徵。此處所指之頻帶間隙能量係僅為基於獨立材質之整體特徵的實例,而由於量子限制效應,奈米粒子可具有不同於整體材質之帶隙。
藉由改變第一封端及第二封端之組成,可改變傳導帶與價帶之間的帶隙。舉例而言,於第3圖中可見,可藉由使用包含碲化鎘之第一封端而降低傳導帶與價帶之間的帶隙。於第3圖中可見,該一維奈米粒子係包含硫化鎘,同時,該第一封端係包含碲化鎘,且該第二封端係包含硒化鋅。藉由使用碲化鎘第一封端將該硫化鎘一維奈米粒子封端,可於施用之偏壓下將電荷載劑潛在地限制於碲化鎘區域,且帶寬係降低至1.75eV,同時,經封端之成份被鈍化。
用以製造該等奈米粒子之反應係詳述如下。下列縮寫係用以詳述反應劑。「TOPO、TOP、TBP、HDA、HPA、ODPA、OA、ODE、TDPA及TOA」係分別意指氧化三辛基膦、三辛基膦、三-正丁基膦、十六烷基胺、己基膦酸、十八烷基膦酸、辛基胺、十八烯、十四烷基膦酸及三辛基胺。
該等奈米粒子可藉由各種不同之方法製造。於一實施例中,於一種製造該等奈米粒子之方法中,半導體之第一前驅物(如,氧化鎘)係於第一溶劑中(如,氧化三辛基膦)與第一界面活性劑(如,正十八烷基膦酸)反應,以形成第一錯合物(如,Cd-ODPA:鎘-正十八烷基膦酸)。該第一界面活性劑係防止該等粒子彼此接觸。該第一錯合物係於150至400℃,具體200至350℃之溫度於惰性氣氛中形成。該惰性氣氛係包含氮、氬、二氧化碳等。於一例示性實施例中,該惰性氣氛係包含氮或氬且實質上不包括氧及水。該反應可於批式反應器或連續反應器中實施。於一例示性實施例中,該第一反應係於批式反應器中實施。
將第二前驅物(如,溶解於TOP中的硫(S))加入包含該第一錯合物之混合物中,以製備一維奈米粒子。該等一維奈米粒子之長度及直徑可藉由控制該第一前驅物及第二前驅物的量以及該第一界面活性劑的量而改變。亦可改變反應溫度及時間以改變該等一維奈米粒子之維度。該等一維奈米粒子之生長過程中的反應溫度通常係隨著該等一維奈米粒子之生長過程而下降。於一實施例中,於該等一維奈米粒子之生長過程中,反應溫度係自400℃下降至低於或等於350℃,較佳低於或等於330℃。藉由將該溫度下降至低於或等於300℃,較佳低於或等於275℃,且較佳低於或等於250℃而終止該等一維奈米粒子之生長。隨後,將該等一維奈米粒子純化並存儲以備鈍化製程,於鈍化製程中,該第一封端及第二封端係反應而接於其上。純 化係視需要者,且可藉由沉澱離心、傾析、過濾等實施。
隨後,藉由將第三前驅物(其係第一封端之前驅物,如,硒前驅物)加入包含溶劑及該等一維奈米粒子之反應混合物中而合成第一封端。該第一封端之形成終止該一維奈米粒子之長度方向上的生長。該第三前驅物係隨著另外之溶劑(如,三辛基膦)加入反應器中之該等一維奈米粒子的混合物中。反應溫度係增加至高於或等於100℃,具體高於或等於225℃,且更具體高於或等於250℃。該等一維奈米粒子與第三前驅物的反應於該等一維奈米粒子上製造第一封端。隨後,該等具有第一封端之一維奈米粒子可與該反應混合物之殘質分離,並藉由上揭之方法予以純化。於一例示性實施例中,係藉由將具有第一封端之一維奈米粒子溶解於溶劑中並隨後藉由離心而將其純化。
隨後,令第二封端反應而接於該第一封端上。此係藉由將第二封端生長於藉由該第一封端鈍化之一維奈米粒子上而施行。該第一封端係鈍化該一維奈米粒子之末端。將第四前驅物(其係第二封端之前驅物,如,醋酸鋅)與一種溶劑及配位子或與複數種溶劑及配位子一起引入反應器中。該等溶劑可經脫氣,之後將他們加熱至高於或等於150℃之溫度。於加熱過程中,可視需要形成中間體(如,油酸鋅)。隨後,將反應溶液冷卻至低於或等於100℃,較佳低於或等於50℃。可將其上反應有第一封端之一維奈米粒子與第五前驅物(如,硒前驅物)一起加入反應容器中,以形成第二封端。該第五前驅物係緩慢注入該反 應容器中。於該第五前驅物之注入過程中,該反應容器之溫度係增加至高於或等於200℃,較佳高於或等於約250℃。藉由加入該反應容器之第四前驅物及第五前驅物的量決定第二封端之厚度。如為所欲者,分離並純化所得奈米粒子(現在,其係包含藉由第一封端及第二封端進行封端的一維奈米粒子)。分離及純化方法係於上文中詳述。
於前述方法中,該第一前驅物及第四前驅物係包含鋇、銦、鋅、鎘、鎂、汞、鋁、鎵、鉈、或鉛。該第二前驅物、第三前驅物及第五前驅物係包含硒、碲、硫、砷、鉍、磷、或錫。
於上文詳述之方法中,該第一前驅物係以,以該第一錯合物之總重量為基準計,10至30重量百分比的量加入該反應混合物中。該第一界面活性劑係以,以該第一錯合物之總重量為基準計,70至90重量百分比的量加入該反應混合物中。該第二前驅物係以,以該一維奈米粒子之總重量為基準計,20至50重量百分比的量加入該反應混合物中。該第一前驅物與第二前驅物之莫耳比為4:1至1:1。
該第三前驅物係以,以該經鈍化之奈米粒子之總重量為基準計,20至50重量百分比的量加入該反應混合物中。該第四前驅物係以,以該經鈍化之奈米粒子之總重量為基準計,5至20重量百分比的量加入該反應混合物中。該第五前驅物係以,以該經鈍化之奈米粒子之總重量為基準計,5至20重量百分比的量加入該反應混合物 中。該第四前驅物與第五前驅物之莫耳比係自4:1至1:1。該等異質接面集中(亦即,他們係存在於該等一維奈米粒子之末端)該第一封端與第二封端之間,或位於該一維奈米粒子上之節點處。
該等具有複數個異質接面之奈米粒子可用於多種不同應用中。此等奈米粒子可用於雷射、電晶體、雙極性電晶體、太陽能電池等中。他們可於溶液中輕易地加工。
於一實施例中,該等奈米粒子係包含兩種類型之異質接面,其中,II型交錯式頻帶偏移係容許電子及電洞的有效注入,而I型偏移係定義用於高效發光之重組中心。此外,此等奈米粒子之各向異性棒形係改善奈米晶體效能。該各向異性形狀係允許裝置中適宜電荷層之半導體成份的對準。
該等奈米粒子可用於EL裝置中。例示性EL裝置係顯示於第4圖中。第4圖係說明包含具有雙異質接面之奈米粒子的EL裝置300。該裝置300係包含基板302、第一電極304、電洞注入層306、電洞傳輸層308、奈米粒子層310(其係含有本文中揭露之經鈍化的奈米粒子)、電子傳輸層312及第二電極314。該基板302通常係包含光透明、電絕緣之玻璃,或光透明、電絕緣之聚合物。該第一電極304可包含光透明之導電聚合物或金屬氧化物。該第一電極304之實例係氧化銦錫,氧化錫,及聚吡咯、聚苯胺、聚噻吩之薄膜等。用於該電洞注入層306之適宜的 電洞注入材質係PEDOT:PSS(聚(3,4-伸乙基二氧基噻吩)/聚(苯乙烯磺酸酯),其係兩種離子性聚合物之聚合物混合物。
該電洞傳輸層308係包含聚(9,9-二辛基-茀-共-N-(4-丁基-苯基)-二苯基胺)(TFB)、聚(N,N’-雙(4-丁基苯基)-N,N’-雙(苯基)聯苯胺)(poly-TPD)、聚-N-乙烯基咔唑(PVK)、四氟伸乙基-全氟-3,6-二氧雜-4-甲基-7-辛烯磺酸共聚物(PFI)、或氧化鎳(NiO)。該奈米粒子層310係包含上文詳述之奈米粒子,同時,該電子傳輸層312係包含氧化鋅或氧化鈦奈米粒子。該第二電極314(其係作為陰極)係包含金屬膜,其一個實例係鋁膜。其他材質可用於該第一電極304、電洞注入層306、電洞傳輸層308、電子傳輸層312及第二電極314中。
當以相同強度之光照射兩種組成物時,與具有相同成份但非經鈍化之奈米棒形式的比較性組成物相比,本文中揭露之經鈍化之奈米粒子於產生光致發光強度方面具有優勢。該等經鈍化之奈米粒子產生的光為波長區域550至700nm,強度峰值約在630nm,藉由改變該等封端之尺寸,亦可改變藉由該等奈米棒發射之光的顏色。
於一實施例中,當將該等經鈍化之奈米粒子置於表面上時,其可自組裝成彼此平行。該等一維奈米粒子之高縱橫比係允許此種形式之自組裝。該自組裝係允許增加之光致發光效率,且亦可用以自藉由光照射時製造多種顏色。
本文中揭露之組成物及方法係藉由下述非 限制性實施例予以例示。
[實施例]
實施例1
本實施例係展示經鈍化之奈米粒子的製造。反應係於N2氣層下於標準舒倫克線(Schlenk line)中進行。工業級氧化三辛基膦(TOPO)(90%)、工業級三辛基膦(TOP)(90%)、工業級辛基胺(OA)(90%)、工業級十八烯(ODE)(90%)、CdO(99.5%)、醋酸鋅(99.99%)、S粉(99.998%)、及Se粉(99.99%)係自西格瑪-阿德瑞希(Sigma Aldrich)獲得。正十八烷基膦酸(ODPA)係自PCI Synthesis獲得。ACS級氯仿、及甲醇係自Fischer Scientific獲得。材質係直接使用。
一維奈米粒子--CdS奈米棒之製備
首先,於50毫升(mL)三頸圓底燒瓶中準備2.0公克(g)(5.2毫莫耳(mmol))之TOPO、0.67g(2.0mmol)之ODPA及0.13g(2.0mmol)之CdO。將該混合物於150℃真空下脫氣30分鐘(min),隨後於攪拌下加熱至350℃。隨著Cd-ODPA錯合物於350℃形成,該燒瓶中之褐色溶液變得光學透明,且在約1小時後為無色。隨後,將該溶液於150℃脫氣10分鐘以移除錯合反應之副產物,包括O2及H2O。脫氣之後,將該溶液於N2氣層下加熱至350℃。使用注射器將溶解於1.5mL TOP中之含有16毫克(mg)(0.5mmol)硫(S)的硫前驅物迅速注入該燒瓶中。然後,該反應混合物被猝滅至330℃,此時,進行CdS之生長。於15分鐘後,藉由冷卻至250℃而終止CdS奈米棒之生長,此時,進行CdS 奈米棒上之CdSe生長。取CdS奈米棒之分裝樣,藉由以甲醇及丁醇沉澱而清洗之,再用於分析。將Se前驅物加入相同之反應燒瓶中,由是形成CdS/CdSe異質結構並如下揭者於N2氣氛下維持。
藉由第一封端鈍化該等奈米棒--CdS/CdSe奈米棒異質結構
於形成CdS奈米棒之後,將溶解於1.0mL TOP中之含有20mg(0.25mmol)之Se的Se前驅物通過注射泵以4毫升/小時(mL/h)之速率(總注射時間約15分鐘)於250℃緩慢注入。隨後,將該反應混合物於250℃再老化5分鐘,之後藉由噴氣將該反應燒瓶快速冷卻。取CdS/CdSe奈米棒異質結構之分裝樣,藉由以甲醇及丁醇沉澱而清洗之,再用於分析。將最終溶液溶解於氯仿中,並以每分鐘2,000轉(rpm)的速率離心。將沉澱再次溶解於氯仿中,並作為溶液保存。當將該溶液進行10倍稀釋時,CdS頻帶-邊緣吸收峰係對應0.75。
第二封端之形成--CdS/CdSe/ZnSe雙異質接面奈米棒
藉由在CdS/CdSe奈米棒異質結構上生長ZnSe而合成CdS/CdSe/ZnSe雙異質接面奈米棒。對於Zn前驅物,係將6mL之ODE、2mL之OA及0.18g(1.0mmol)之醋酸鋅於100℃脫氣30分鐘。將該混合物於N2氣氛下加熱至250℃,並隨後於1小時後形成油酸鋅。於冷卻至50℃之後,將2mL預先製備之CdS/CdSe溶液注入油酸鋅溶液中。令該混 合物中之氯仿於真空下蒸發30分鐘。藉由在250℃緩慢注入溶解於1.0mL TOP中之含有20mg(0.25mmol)之Se的Se前驅物而引發ZnSe生長。CdS/CdSe奈米棒異質結構上之ZnSe的厚度係藉由所注入Se的量控制。藉由在注入所欲量之Se前驅物後移除加熱套而終止ZnSe的生長。清洗過程與用於CdS奈米棒者相同。
替代性形成第二封端之方法--CdS/CdSe/ZnSe雙異質接面奈米棒
協調溶劑如TOA可替代性地用於生長ZnSe。將5mL之TOA、1.2mL之OA及0.18g(1.0mmol)之醋酸鋅於100℃脫氣30分鐘。將該混合物於N2氣氛下加熱至250℃,並因此於1小時後形成油酸鋅。於冷卻至50℃之後,將2mL預先製備之CdS/CdSe溶液注入油酸鋅溶液中。令該混合物中之氯仿於真空下蒸發30分鐘。藉由在250℃緩慢注入溶解於1.0mL TOP中之含有20mg(0.25mmol)之Se的Se前驅物而引發ZnSe生長。CdS/CdSe奈米棒異質結構上之ZnSe的厚度係藉由所注入Se的量控制。藉由在注入所欲量之Se前驅物後移除加熱套而終止ZnSe的生長。清洗過程與用於CdS奈米棒者相同。
實施例2
施行本實施例以展示該等奈米粒子於電場發光裝置中的用途。使用第4圖中顯示之裝置。該裝置300係包含玻璃基板302、包含氧化銦錫之第一電極304、包含PEDOT:PSS之電洞注入層306、包含TFB之電洞傳輸層308、其成 份詳述如下之奈米粒子層310、包含氧化鋅奈米粒子之電子傳輸層312、以及包含鋁之第二電極314。
該奈米粒子層310係含有本文揭露之奈米粒子(CdS奈米棒,藉由係包含CdSe之第一封端及包含ZnSe之第二封端而鈍化)或包含核殼量子點之比較性材質,其中,該核為CdSe且該殼為ZnSe。
具有各材質之EL裝置的EL效能係顯示於第5圖中。第5圖(A)係顯示核殼(CdSe/ZnS)量子點之EL譜,而第5圖(B)係顯示本文所揭露之奈米粒子(CdS奈米棒,藉由包含CdSe之第一封端及包含ZnSe之第二封端而鈍化)的EL譜。
自第5圖(A)及第5圖(B)可見,經鈍化之奈米棒的EL譜係偏移至較高波長。該核殼量子點於600nm具有峰值強度,而經鈍化之奈米棒於630nm具有峰值強度。具有經鈍化之奈米棒之裝置的EL強度約為2.5V,與具有核殼量子點之裝置約為4V的EL強度相比,前者係具有顯著降低之開啟電壓。
第6圖係顯示核殼CdSe/ZnS量子點及奈米粒子(CdS奈米棒,藉由包含CdSe之第一封端及包含ZnSe之第二封端而鈍化)之積分之EL對電壓的圖。自第6圖可見,於低壓區域,藉由包含CdSe之第一封端及包含ZnSe之第二封端鈍化之CdS奈米棒之積分之EL係大於量子點之積分之EL。
A---A’、120‧‧‧軸
100‧‧‧奈米粒子
102‧‧‧一維奈米粒子
103‧‧‧第一異質接面
104‧‧‧第一端
106‧‧‧第二端
108‧‧‧第一封端
109‧‧‧第二異質接面
110‧‧‧第二封端

Claims (27)

  1. 一種半導電奈米粒子,係包含:一維半導電奈米粒子,其具有第一端及第二端;其中,該第二端係與該第一端相對;兩個第一封端,其一者及另一者係分別與該一維半導電奈米粒子之第一端及第二端接觸;其中,與該第一端接觸之第一封端係包含第一半導體,且該第一封端自該一維半導電奈米粒子之第一端延伸以形成第一奈米晶體異質接面;與該第二端接觸之第一封端係包含第二半導體,且該第一封端自該一維半導電奈米粒子之第二端延伸以形成第二奈米晶體異質接面;以及,其中,該第一半導體係與該第二半導體係於化學上彼此相異;以及與於該一維半導電奈米粒子之第一端或第二端之第一封端接觸的第二封端,其中,該第二封端係具有相異於與其接觸之第一封端的化學組成。
  2. 如申請專利範圍第1項所述之半導電奈米粒子,其中,該第一封端令該一維半導電奈米粒子之發射中心移位及/或令該一維半導電奈米粒子之第一端鈍化。
  3. 如申請專利範圍第1項所述之半導電奈米粒子,其中,該第二封端係鈍化該第一封端。
  4. 如申請專利範圍第1項所述之半導電奈米粒子,其中,該一維奈米粒子係奈米棒、奈米管、奈米帶、或奈米鬚。
  5. 如申請專利範圍第1項所述之半導電奈米粒子,復包含 置於該一維奈米粒子之徑向面上的節點。
  6. 如申請專利範圍第5項所述之半導電奈米粒子,其中,該等節點係隨機分佈或以不連續之方式空間排列。
  7. 一種包含申請專利範圍第1項之半導電奈米粒子的製品。
  8. 如申請專利範圍第7項所述之製品,其中,該製品係光致發光裝置、陰極發光裝置、熱發光裝置、電場發光裝置、或光偵檢器之一者。
  9. 一種製造半導電奈米粒子的方法,係包含:令半導體之第一前驅物與半導體之第二前驅物反應以形成一維半導電奈米粒子;其中,該第一一維半導電奈米粒子係具有第一端及與該第一端相對之第二端;令半導體之第三前驅物與該一維奈米粒子反應,以形成接觸該一維奈米粒子之第一端的第一封端以形成第一異質接面;以及令其上置有該第一封端之該一維奈米粒子與半導體之第四前驅物反應,以形成置於該一維半導電奈米粒子之第二端的另一第一封端並形成第二異質接面;其中,該第二異質接面係組成上相異於該第一異質接面。
  10. 如申請專利範圍第9項所述之方法,其中,該第一前驅物係包含鎘,且該第二前驅物係包含硫。
  11. 如申請專利範圍第9項所述之方法,其中,該第三前驅物係包含鎘。
  12. 如申請專利範圍第9項所述之方法,其中,該第四前驅 物係包含鋅。
  13. 一種製品,係包含:第一電極;第二電極;以及置於該第一電極與第二電極之間且包含半導電奈米粒子的層體;其中,該半導電奈米粒子係包含:一維半導電奈米粒子,其具有第一端及第二端;其中,該第二端係與該第一端相對;兩個第一封端,其分別與該一維半導電奈米粒子之第一端及第二端接觸;其中,與該第一端接觸之第一封端係包含第一半導體,且該第一封端自該一維半導電奈米粒子之第一端延伸以形成第一奈米晶體異質接面;與該第二端接觸之第一封端係包含第二半導體,且該第一封端自該一維半導電奈米粒子之第二端延伸以形成第二奈米晶體異質接面;以及,其中,該第一半導體係與該第二半導體係於化學上彼此相異;以及與於該一維半導電奈米粒子之第一端或第二端之第一封端接觸的第二封端,其中,該第二封端係具有相異於與其接觸之第一封端的化學組成。
  14. 如申請專利範圍第13項所述之製品,其中,當該製品遭受電位及電流時,其發射可見光。
  15. 一種半導電奈米粒子,係包含:一維半導電奈米粒子,其具有第一端及第二端;其中,該第二端係與該第一端相對;以及 兩個第一封端,其一者及另一者係分別與該一維半導電奈米粒子之第一端及第二端接觸;其中,與該第一端接觸之第一封端係包含第一半導體,且該第一封端自該一維半導電奈米粒子之第一端延伸以形成第一奈米晶體異質接面;與該第二端接觸之第一封端係包含第二半導體,且該第一封端自該一維半導電奈米粒子之第二端延伸以形成第二奈米晶體異質接面;以及該第一封端成正切地接觸該第一端和該第二端。
  16. 如申請專利範圍第15項所述之半導電奈米粒子,其中,該第一半導體係與該第二半導體係於化學上彼此相異。
  17. 如申請專利範圍第15項所述之半導電奈米粒子,復包含置於該一維奈米粒子之徑向面上的節點。
  18. 如申請專利範圍第17項所述之半導電奈米粒子,其中,該等節點係隨機分佈或以不連續之方式空間排列。
  19. 一種包含申請專利範圍第15項之半導電奈米粒子的製品。
  20. 如申請專利範圍第19項所述之製品,其中,該製品係光致發光裝置、陰極發光裝置、熱發光裝置、電場發光裝置、或光偵檢器之一者。
  21. 一種方法,係包含:令半導體之第一前驅物與半導體之第二前驅物反應以形成一維半導電奈米粒子;其中,該第一一維半導電奈米粒子係具有第一端及與該第一端相對之第二端; 令半導體之第三前驅物與該一維奈米粒子反應,以形成正切地接觸該一維奈米粒子之第一端的第一封端以形成第一異質接面;以及令其上置有該第一封端之該一維奈米粒子與半導體之第四前驅物反應,以形成正切地接觸該一維奈米粒子之第二端的另一第一封端以形成第二異質接面。
  22. 如申請專利範圍第21項所述之方法,其中,該第二異質接面係組成上相異於該第一異質接面。
  23. 如申請專利範圍第21項所述之方法,其中,該第一前驅物係包含鎘,且該第二前驅物係包含硫。
  24. 如申請專利範圍第21項所述之方法,其中,該第三前驅物係包含鎘。
  25. 如申請專利範圍第21項所述之方法,其中,該第四前驅物係包含鋅。
  26. 一種半導電奈米粒子,係包含:一維半導電奈米粒子,其具有第一端及第二端;其中,該第二端係與該第一端相對;以及兩個第一封端,其一者及另一者係分別與該一維半導電奈米粒子之第一端及第二端接觸;其中,與該第一端接觸之第一封端係包含第一半導體,且該第一封端自該一維半導電奈米粒子之第一端延伸以形成第一奈米晶體異質接面;與該第二端接觸之第一封端係包含第二半導體,且該第一封端自該一維半導電奈米粒子之第二端延伸以形成第二奈米晶體異質接面;以及 半導電節點係置於該一維半導電奈米粒子之徑向面上。
  27. 申請專利範圍第26項所述之半導電奈米粒子,其中,該等節點係隨機分佈或以不連續之方式空間排列。
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