TWI539029B - 用於欲處理之平坦材料之濕式化學處理的裝置及方法 - Google Patents

用於欲處理之平坦材料之濕式化學處理的裝置及方法 Download PDF

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Publication number
TWI539029B
TWI539029B TW103114753A TW103114753A TWI539029B TW I539029 B TWI539029 B TW I539029B TW 103114753 A TW103114753 A TW 103114753A TW 103114753 A TW103114753 A TW 103114753A TW I539029 B TWI539029 B TW I539029B
Authority
TW
Taiwan
Prior art keywords
liquid
module
processing
treated
flushing
Prior art date
Application number
TW103114753A
Other languages
English (en)
Chinese (zh)
Other versions
TW201500589A (zh
Inventor
亨利 庫茲
Original Assignee
德國艾托特克公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 德國艾托特克公司 filed Critical 德國艾托特克公司
Publication of TW201500589A publication Critical patent/TW201500589A/zh
Application granted granted Critical
Publication of TWI539029B publication Critical patent/TWI539029B/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/041Cleaning travelling work
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G3/00Apparatus for cleaning or pickling metallic material
    • C23G3/02Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously
    • C23G3/027Associated apparatus, e.g. for pretreating or after-treating
    • C23G3/029Associated apparatus, e.g. for pretreating or after-treating for removing the pickling fluid from the objects
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Dry Formation Of Fiberboard And The Like (AREA)
  • Ink Jet (AREA)
  • Pretreatment Of Seeds And Plants (AREA)
TW103114753A 2013-04-23 2014-04-23 用於欲處理之平坦材料之濕式化學處理的裝置及方法 TWI539029B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102013207343.7A DE102013207343B3 (de) 2013-04-23 2013-04-23 Vorrichtung und Verfahren zum nasschemischen Behandeln von flächigem Behandlungsgut

Publications (2)

Publication Number Publication Date
TW201500589A TW201500589A (zh) 2015-01-01
TWI539029B true TWI539029B (zh) 2016-06-21

Family

ID=50486902

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103114753A TWI539029B (zh) 2013-04-23 2014-04-23 用於欲處理之平坦材料之濕式化學處理的裝置及方法

Country Status (7)

Country Link
JP (1) JP5963992B1 (de)
KR (1) KR101731751B1 (de)
CN (1) CN105075406B (de)
AT (1) AT518975B1 (de)
DE (1) DE102013207343B3 (de)
TW (1) TWI539029B (de)
WO (1) WO2014173693A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015121349A1 (de) * 2015-12-08 2017-06-08 Staku Anlagenbau Gmbh Vorrichtung zur Oberflächenbehandlung eines Endlosmaterials sowie deren Verwendung
DE102019215572A1 (de) 2019-04-09 2020-10-15 Sms Group Gmbh Kaskadenspülanlage zum Behandeln eines bandförmigen Flachprodukts

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0329808A1 (de) * 1988-02-25 1989-08-30 Gebr. Schmid GmbH & Co. Verfahren und Vorrichtung zur Reinigung frisch verzinnter Leiterplatten
US5179967A (en) 1991-08-28 1993-01-19 Nelson Steel Apparatus for rinsing metal strip
DE4337988A1 (de) * 1993-11-06 1995-05-11 Hoellmueller Maschbau H Verfahren zur Herstellung von Multilayern sowie Vorrichtung zur Durchführung dieses Verfahrens
DE4418277A1 (de) 1994-05-26 1995-11-30 Atotech Deutschland Gmbh Verfahren zum Reinigen mit anschließendem Spülen in Anlagen zur Oberflächenbehandlung
DE19717511C2 (de) * 1997-04-25 2000-09-14 Atotech Deutschland Gmbh Verfahren zur spezifischen naßchemischen Behandlung von flachem Behandlungsgut in Durchlaufanlagen
DE19802755A1 (de) * 1998-01-26 1999-07-29 Hoellmueller Maschbau H Vorrichtung zum Behandeln plattenförmiger Gegenstände, insbesondere elektronischer Leiterplatten, mit einer Behandlungsflüssigkeit
EP0989790A1 (de) * 1998-09-22 2000-03-29 Agfa-Gevaert N.V. Vorrichtung und Verfahren zur Behandlung von Substraten mit einer Ätzflüssigkeit
DE102007035086B3 (de) * 2007-07-26 2008-10-30 Rena Sondermaschinen Gmbh Vorrichtung und Verfahren zur Oberflächenbehandlung von Gut in Durchlaufanlagen
JP5410598B2 (ja) * 2009-05-13 2014-02-05 アトテック・ドイチュラント・ゲーエムベーハー 平面的な被処理材料を処理するための方法およびアセンブリ、ならびに処理液を除去または離隔するためのデバイス
DE102009060676B4 (de) * 2009-12-28 2015-07-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum nasschemischen Behandeln von Behandlungsgut

Also Published As

Publication number Publication date
CN105075406B (zh) 2018-02-09
TW201500589A (zh) 2015-01-01
KR101731751B1 (ko) 2017-04-28
KR20150126970A (ko) 2015-11-13
JP5963992B1 (ja) 2016-08-03
CN105075406A (zh) 2015-11-18
AT518975A5 (de) 2018-03-15
WO2014173693A1 (en) 2014-10-30
AT518975B1 (de) 2018-03-15
DE102013207343B3 (de) 2014-08-28
JP2016524523A (ja) 2016-08-18

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