TWI531416B - Liquid process apparatus and priming process method of the nozzle - Google Patents

Description

Liquid processing device and nozzle starting injection processing method

This invention relates to a coating apparatus for applying a treatment liquid to a substrate to be processed, and a method of processing a primer for the nozzle mounted thereon.

For example, in the field of manufacturing technology of LCDs, a process of selectively etching a semiconductor layer, an insulator layer, an electrode layer, or the like formed on an LCD substrate into a specific pattern is performed. At this time, a photoresist film is applied onto the LCD substrate to form a photoresist film, and the photoresist film is exposed in response to the circuit pattern. This is called development processing, so-called photolithography.

When the photoresist liquid is applied onto the LCD substrate, a photoresist supply nozzle that discharges the photosensitive resin in a solvent to form a photoresist is used, and the square LCD substrate is relatively moved to the nozzle. A method of applying a direction in which the longitudinal directions are orthogonal.

In this case, the photoresist supply nozzle has a slit-shaped discharge opening, and the discharge opening has a minute gap extending in the width direction of the LCD substrate, and the photoresist is discharged from the slit-shaped discharge opening in a strip shape (linear shape). The entire surface of the substrate is supplied to form a photoresist layer.

The photoresist supply nozzle used in the coating apparatus performs a priming injection process for uniformly adhering the photoresist to the discharge port of the nozzle before applying the photoresist to the substrate.

That is, the discharge port of the nozzle is placed directly above the priming roller which is rotatable, and the photoresist is discharged from the nozzle discharge port. Then by making The roller is rotated to wind up the photoresist, and the state of adhesion of the photoresist to the nozzle discharge port is adjusted, and the discharge state of the photoresist in the nozzle discharge port can be stabilized.

Several proposals have been made for the above-described priming injection processing method and apparatus thereof, for example, disclosed in Patent Document 1 shown below.

[Previous Technical Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-237046

However, for the priming injection process, as described earlier, immediately above the priming injection roller, the photoresist is discharged onto the roller by the action of discharging the photoresist liquid of the treatment liquid (medicine solution) by the nozzle. The photoresist is taken up by the rotation of the roller.

Fig. 9 is a view schematically showing a conventional priming process, in which the slit nozzle 10 is cut in the direction orthogonal to the longitudinal direction of the roller and the nozzle, directly above the priming roller 23, and the priming is performed. A state profile of the state of the process.

Fig. 9(A) shows that a predetermined amount of photoresist R is ejected from the center of the top of the roller 23 in the stop of rotation by the nozzle 10, so that the photoresist R is interposed between the front end of the nozzle 10 and the roller 23. The gap is in a state in which the photoresist R adheres to the roller 23 (liquid adhesion state).

In this state, as shown in FIG. 9(B), the state is stopped in a few seconds (standby state), and during this period, the photoresist R acts as a nozzle. 10 spit exports all expanded.

Next, in the ninth drawing (C), the roller 23 is rotationally driven in the clockwise direction as indicated by an arrow a, and the roller 23 is operated to wind up the photoresist R discharged from the nozzle 10. By the winding operation of the photoresist R of the roller 23, the state of the chemical solution between the nozzle and the roller is released, and as shown in Fig. 9(D), the photoresist R is removed from the front end of the nozzle 10. State (liquid cut state).

Accordingly, the amount of the photoresist liquid adhered to the front end of the nozzle 10 is adjusted to be uniform throughout, and the priming process is terminated.

However, in the above-described priming processing method, since a predetermined amount of photoresist liquid is discharged from the nozzle 10, and the roller 23 is taken up by the roller 23, the winding distance of the photoresist liquid on the roller 23 is commensurately changed. long. Therefore, even if the surface position of the roller is changed, even if the subsequent priming processing is performed, it is impossible to take the number of times of the priming injection processing.

Further, the amount of the photoresist liquid in the adhesion portion of the photoresist R shown in Fig. 9(A) is the largest, and the liquid is drooped and coated on the roller or the like as the roller rotates, making it difficult to ensure the subsequent start. Note the discharge to the liquid on the roller in process.

Therefore, since the frequency of cleaning the priming roller is increased, and a large amount of photoresist is attached to the roller, the cleaning liquid is wasted, and the photoresist R is wasted due to the priming treatment. overlapping.

In order to solve the above problem, although it is considered to adjust in advance to reduce the starter note When the discharge amount of the photo-resistance liquid in the treatment is reduced, the discharge amount of the single liquid is reduced, and it is impossible to discharge the same liquid in the entire longitudinal direction of the slit nozzle. As a result, it is impossible to form the photoresist liquid in the discharge port of the nozzle. The attachment state is adjusted to be the same.

That is, in the above-described priming treatment, in the initial stage, it is necessary to have the effect of expanding the liquid so that the photoresist is carried in the longitudinal direction of the roller, and therefore, especially in the above-mentioned liquid adhesion engineering In the middle, a certain amount of liquid must be spit out from the nozzle.

The present invention has been made in order to solve the problems of the prior art described above, and the object of the present invention is to provide a nozzle having a nozzle, and the nozzle has a slit-shaped discharge port in the width direction of the substrate, and the reduction is provided as a starter injection. The winding distance and the winding amount of the photoresist of the treatment liquid (chemical liquid) on the roller make it easy to wash the coating device of the priming roller and the priming treatment method of the nozzle.

The liquid processing apparatus according to the present invention, which is an independent request item which has been developed in order to solve the above problems, includes a long nozzle which discharges a chemical liquid from a discharge port, and a relative movement of the substrate to the nozzle. A liquid processing apparatus for a relative moving means, comprising: a priming injection roller disposed in one of the liquid processing apparatuses, configured to prepare a liquid processing of the chemical liquid on the substrate to be processed; and a nozzle moving mechanism; The discharge port of the nozzle is disposed directly above the priming injection roller; and the decompression means is disposed at the supply of the medicinal solution for supplying the medicinal solution to the nozzle In the middle of the road, the liquid medicine discharged from the nozzle can be temporarily sucked, and the nozzle moving mechanism is disposed directly above the longitudinal direction of the priming injection roller, and is opposed to the discharge port of the nozzle. In the state in which the priming injection is performed on the priming injection roller, the medicinal solution discharged to the priming injection roller is temporarily sucked to the nozzle side by the decompression means.

In addition, the nozzle injection start processing method in the liquid processing apparatus according to the present invention, which is described in the independent request item, is provided with a long nozzle that discharges the chemical liquid from the discharge port. And a method for processing a nozzle in a liquid processing apparatus of a liquid processing apparatus for relatively moving a substrate to move the counter relative to the nozzle, characterized in that: a liquid adhering step is performed, which is performed along a priming roller Directly above the longitudinal direction, in a state of being opposed to the discharge port of the nozzle, the chemical is discharged to the roller by the nozzle, so that the chemical solution is interposed between the nozzle and the roller; and the sucking step is performed. The step of temporarily sucking the liquid medicine discharged onto the priming roller to the nozzle side; and the winding step of pulverizing the liquid in the gap by rotating the priming roller The coil is taken up on the side of the roller, and the chemical solution between the nozzle and the roller is released to be in a liquid-breaking state.

In the state in which the chemical solution is discharged from the nozzle to the priming roller and the priming process is performed by the priming injection processing method of the coating device and the nozzle, a predetermined amount of the photoresist liquid is removed from the nozzle. The discharge is a state in which the liquid is adhered between the nozzle and the gap between the rolls. Thereafter, the liquid medicine to be discharged onto the priming roller is temporarily sucked to the nozzle side. Suction step.

In this way, in the liquid adhesion state in the first step, since the predetermined amount of the photoresist liquid can be discharged from the nozzle, the photoresist liquid can be expanded to the entire discharge port of the nozzle, and the subsequent start can be smoothly performed. Note for processing.

In the following, since the above-described reverse suction operation is carried out, the photoresist liquid which is intended to be excessively expanded on the roll is temporarily recovered, and the winding distance and the winding amount of the photoresist liquid on the priming roller can be reduced.

Therefore, since the amount of adhesion of the photoresist to the roller is reduced by the priming treatment, the cleaning of the roller can be facilitated, and the cleaning solution of the roller and the photoresist can be suppressed according to the priming treatment. Waste.

Further, since the distance from which the photoresist can be taken up by the roller can be shortened, the number of times that the priming treatment can be used can be increased in one roller. Accordingly, it is also possible to enjoy the effect of reducing the washing frequency of the rolls, or it is also possible to use a roll having a small diameter.

According to the invention, in the coating apparatus including the nozzle, the nozzle has a slit-shaped discharge port in the width direction of the substrate, so that the distance between the processing liquid and the processing liquid can be reduced. Since the winding amount is provided, it is possible to provide a coating device and a nozzle injection processing method for facilitating the cleaning of the priming roller.

Hereinafter, the coating device and the nozzle injection processing method according to the present invention will be described with reference to the drawings. In addition, the embodiment shown in FIG. 1 is an example of a unit which is applied to a glass substrate on which a substrate to be processed is floated and transported, and a coating film for forming a photoresist film is formed on the substrate. The coating device concerned.

As shown in Fig. 1, the coating apparatus 1 includes a floating transport unit 2A for transporting the glass substrate G one by one in a sheet form, and a substrate G from the floating transport unit 2A for roller transport. The roller transport unit 2B constitutes a so-called advection transport substrate G. The floating transport unit 2A is provided with a floating stage 3 extending in the X direction of the transport direction of the substrate.

Above the floating table 3, a plurality of gas discharge ports 3a and gas suction ports 3b are alternately arranged at intervals in the X direction and the Y direction as shown by the discharge amount of the inert gas from the gas discharge port 3a. The pressure load from the intake air amount from the gas intake port 3b is constant, and the glass substrate G is floated.

Further, in this embodiment, the substrate G is floated by gas ejection and suction, but the present invention is not limited thereto, and the substrate may be floated by the configuration in which only gas is ejected.

Further, in the above-described roller conveying portion 2B, a plurality of roller shafts 4a that are rotationally driven by the roller driving portion 4 are arranged in parallel in the subsequent stage of the floating table 3. A plurality of conveyance rollers 4b are attached to the respective roller shafts 4a, and the substrates G are conveyed by the rotation of the conveyance rollers 4b.

Further, on the left and right sides in the width direction (Y direction) of the floating table 3, a pair of guide rails 5 extending in parallel in the X direction are disposed. In the pair The guide rail 5 is provided with four substrate carriers 6 that move and hold the edge portions of the four corners of the glass substrate G from below and move on the guide rail 5. The substrate carriers 6 act to move the glass substrate G floating on the floating table 3 in the transport direction (X direction).

Further, in order to smoothly transfer the substrate from the floating conveyance unit 2A to the roller conveyance unit 2B, the guide rail 5 is extended not only to the left side of the floating table 3 but also to the side of the roller conveyance unit 2B. Furthermore, the holding of the substrate G of the substrate carrier 6 and the transport operation are controlled by the control unit 30 composed of a computer.

As shown in Fig. 1, a nozzle 10 for discharging a photoresist liquid to the glass substrate G is provided on the floating table 3 of the coating device 1. The nozzle 10 is formed in a long and slightly rectangular shape in the Y direction, and is formed to have a longer width in the Y direction than the glass substrate G, which will be described later in detail based on FIGS. 2 and 3 .

Further, in the configuration shown in Fig. 1, the glass substrate G is transported in the X direction between the lower portion of the nozzle 10 and the floating table 3. That is, the guide rail 5 and the substrate carrier 6 constitute a relative moving means for relatively moving the substrate G to the nozzle 10.

Further, as shown in Fig. 1, on one of the outer sides of the nozzle 10, a pair of guide rails 21 extending in the X direction are disposed. The nozzle 10 is held by a nozzle arm 22 that moves on the guide rail 21. Then, the nozzle 10 is configured to be movable in the X direction along the guide rail 21 by the drive mechanism of the nozzle arm 22. In addition to this, the nozzle arm 22 is provided with an elevating mechanism, whereby the nozzle 10 is configured to be movable up and down by a specific height.

With such a configuration, the nozzle 10 is configured to be on a glass substrate G discharges the discharge position of the photoresist and moves between the priming roller 23 and the standby unit 25 which are measured upstream.

Further, the drive mechanism and the elevating mechanism of the nozzle arm 22 are controlled by the control unit 30 composed of a computer, and the nozzle 10 is disposed at a position where the photoresist is applied to the substrate G, and is fixedly disposed. The nozzle moving mechanism that moves between the positions of the starter feed roller 23 and the standby unit 25 in the upper portion of the region where the substrate G is transported.

The priming roller 23 is used for the priming process of the discharge port 14 after the photoresist is uniformly adhered to the nozzle 10. The roller 23 is housed in the cleaning tank 24 so as to be rotatable about the axis, and is configured to be rotationally controlled by receiving a power from a driving source (not shown) by a command from the control unit 30.

At the time of the priming process of the nozzle 10, the discharge port 14 of the nozzle 10 is placed directly above the roller 23, and while the roller 23 is rotated, the photoresist is discharged from the discharge port 14 to the roller 23. Accordingly, the adhesion state of the photoresist liquid in the discharge port 14 is adjusted, and the discharge state of the photoresist liquid in the discharge port 14 can be stabilized.

Further, the standby unit 25 includes a nozzle cleaning unit 25a that removes excess photoresist liquid that has adhered to the discharge port 14 of the nozzle 10, and a virtual distribution unit 25b that performs so-called virtual discharge by the nozzle 10.

The coating apparatus 1 further includes a supply source 40 for the photoresist liquid and a supply source 41 for the cleaning liquid as an accessory device, and is configured between the nozzles 10 and the nozzles 10 to perform the chemical solution through the pump and the three-way valve. Supply.

That is, in the supply of photoresist (in the first figure, marked as photoresist) The supply source 40 includes a delivery pump 42, and the photoresist liquid can be supplied from the supply source 40 of the photoresist liquid to the pump 42 and the three-way valve 44, and the suction valve 46 functioning as a decompression means and the chemical supply path. 47 is supplied to the nozzle 10.

Further, the cleaning liquid supply source 41 stores the diluent for washing the nozzle 10, and the cleaning liquid can be supplied to the nozzle 10 via the delivery valve 43, the three-way valve 44, the chemical supply line 47, and the like.

Then, the delivery valves 42 and 43, the three-way valve 44, and the reverse suction valve 46 are configured to be controlled by the control unit 30 constituted by a computer.

Fig. 2 and Fig. 3 show the configuration of the slit nozzle 10 mounted on the coating device 1 shown in Fig. 1. In other words, Fig. 2 is a longitudinal cross-sectional view showing a state in which the slit portion of the nozzle is cut, and Fig. 3 is a cross-sectional view showing a state in which the direction of the arrow is viewed from the AA line in Fig. 2; .

The slit nozzle 10 has a configuration in which the first and second nozzle members 11 and 12 which are formed in a long shape are opposed to each other with a predetermined gap.

Then, in at least one of the first and second nozzle parts 11 and 12, a semi-cylindrical shape is formed along the longitudinal direction at a slightly central portion of the inner side surface of the first nozzle component 11 in at least one of the drawings. The burrow portion 13, which constitutes the cavity of the nozzle 10. Then, a chemical liquid introduction portion 15 is provided at an upper end portion of the center of the nozzle 10 so as to penetrate the cavity 13.

In the nozzle 10 having the above configuration, the photoresist liquid is introduced from the chemical liquid introduction portion 15 formed in the center of the longitudinal direction thereof, and the photoresist liquid flows through the cavity 13 to the longitudinal direction of the nozzle to act as a slit. The discharge port 14 formed at the lower end portion of the nozzle 10 is formed in a strip shape (linearly) to discharge the photoresist.

Next, Fig. 4 is mounted on the coating device 1 shown in Fig. 1, An example of the suck-up valve 46 disposed in the chemical supply path 47 between the pumps 42, 43 and the nozzle 10 is shown. This is composed of a cylinder 46a, a valve 46b that operates up and down in the cylinder 46a, a rod portion 46c that supports the valve 46b, an actuator 46d that moves the rod portion 46c up and down, and a coil spring 46e.

In the above configuration, when the actuator 46d is actuated by the command from the control unit 30 shown in Fig. 1, the lever portion 46c moves in the direction of the figure, and the valve 46b moves in the same direction. Therefore, the space volume 46f in the immediately below the valve 46b is temporarily expanded, and the inside of the chemical liquid supply path 47 to which the reverse suction valve 46 is connected is decompressed.

Further, when the actuator 46d is in the non-operating state, the position of the valve 46b is restored to the original state by the spring 46e.

The priming injection processing method of the nozzle 10 configured by the coating device 1 shown in Figs. 1 to 4 described above will be described based on the respective examples shown in Figs. 5 to 8 . In addition, each of the examples shown in Figs. 5 to 8 is a cross-sectional view in a state in which it is cut in a direction orthogonal to the longitudinal direction of the roller 23 and the nozzle 10, and shows the conventional start that has been described. Note is given to the same sectional view in Fig. 9 of the processing method.

Fig. 5 is a view showing a first example of a method of processing a priming method relating to the invention. First, with respect to the priming operation of the nozzle 10, as described with reference to Fig. 1, the slit-shaped discharge port 14 of the nozzle 10 is moved along the priming roller 23 by the nozzle moving mechanism including the nozzle arm 22. The direction of the long side is opposite to the top.

Fig. 5(A) shows the liquid-drawing step performed in the initial stage of the priming process, and the center of the top of the roller 23 in the rotation stop by the nozzle 10 is spit. A predetermined amount of photoresist R is prepared. Accordingly, the photoresist R adheres to the roller 23, and is in a state in which the photoresist R is interposed between the front end of the nozzle 10 and the roller 23.

By the execution of this step, the photoresist R acts on the roller 23 and spreads over the entire slit-like discharge port 14 of the nozzle 10.

Fig. 5(B) shows the step of a reverse suction valve which functions as a suction valve 46 which acts as a means of decompression. Accordingly, the photoresist R that is discharged onto the priming roller 23 is temporarily attracted to the nozzle 10 side.

Next, Fig. 5(C) shows an initial state of the winding step of the chemical liquid (photoresist liquid R), and the priming roller 23 is rotated in the clock direction in the direction of the arrow a in the figure. According to this, the roller 23 acts to take up the photoresist R which is interposed between the nozzles 10 to the side of the roller 23.

Fig. 5(D) shows the final state of the winding up step. In the example shown in the figure, the chemical solution (photoresist liquid R) interposed in the gap is taken up to the side of the roller 23, and the nozzle and the nozzle are released. The state between the rolls is in a state in which the chemical liquid is removed from the front end of the nozzle 10 (liquid cut state).

In the above-described liquid-breaking state, the amount of the photoresist liquid adhered to the front end of the nozzle 10 is adjusted to be almost uniform in the longitudinal direction thereof. At this point of time, the rotational driving of the roller 23 is stopped, and the priming process is ended.

The example shown in Fig. 5 is the most basic operation of the priming injection processing method according to the present invention, and the unique action effect described in the column for solving the above problems can be obtained.

Further, in the above-described priming processing method, in the sucking step shown in Fig. 5(B), the rotation of the priming roller 23 is stopped. Next, the drug solution attached to the roller is attracted, and then the winding step is started.

However, in the execution of the sucking step, the same effect can be obtained even if the above winding step is started.

Fig. 6 is a view showing a second example of the method of processing the priming. In this example, as a winding step, a rotation operation in the direction opposite to the start of the injection roller is performed, and a rotation operation in the opposite direction to the start of the injection roller is performed.

That is, Fig. 6(A) shows a liquid adhesion step which is the same as the liquid adhesion step shown in Fig. 5(A) which has already been described.

Next, Fig. 6(B) shows a sucking step. In this example, the priming roller 23 is rotationally driven in the direction of the arrow a in the same direction as the sucking action of the liquid medicine.

Next, as shown in Fig. 6(C), the priming roller 23 is rotationally driven in the other direction, that is, the arrow b direction. At this time, in the example shown in Fig. 6(C), although the reverse suction operation of the chemical liquid is stopped, the reverse suction operation may be continued even in the state shown in Fig. 6(C).

Fig. 6(D) shows an example in which the chemical liquid is taken up to the side of the roller 23 to be in a liquid-breaking state, and the reverse suction operation and the forward/reverse rotation of the roller 23 act as a relatively short roller. The distance in the direction of rotation becomes a liquid cut, which becomes a normal start-up processing.

Fig. 7 is a view showing a third example of the method of processing the priming. In this example, the application treatment is such that the promotion is in a liquid-breaking state at the end of the winding step.

That is, (A) to (C) in Fig. 7 have the same functions as those in Figs. 5(A) to (C) which have already been explained.

Then, Figure 7 (D) shows the situation of being liquid-cutting. At the end of the winding step, the rotation speed of the priming roller 23 is increased by the rotation speed indicated by the arrow a, and is accelerated as indicated by the arrow c to act to promote the liquid shutoff state. By performing such an operation, the distance in the relatively short rotational direction on the roller becomes a liquid-breaking state.

Further, in order to promote the liquid-breaking state, the nozzle 10 is moved in the horizontal direction as shown by the arrow d in Fig. 7 (D), and the horizontal distance between the nozzle 10 and the priming roller 23 is temporarily made. The action of sexual separation also works.

In the example shown in Fig. 7(D), the nozzle 10 can be moved in the X direction shown in Fig. 1 by the nozzle moving mechanism, and even by the action, it can be compared on the roller. In the short direction of rotation, the liquid is in a liquid-breaking state.

Further, even if the roller 23 is relatively moved in the horizontal direction, the nozzle 10 can be moved in the horizontal direction as shown by the arrow d in Fig. 7(D), and the same operational effects can be obtained. Further, if the rotation speed of the roller 23 is accelerated as indicated by the arrow c as shown in Fig. 7(D), and the nozzle 10 is moved in the horizontal direction as indicated by the arrow d At this time, it can be effectively turned off.

Fig. 8 is a view showing a fourth example of the method of processing the priming. In this example, after the liquid adhering step is performed, the operation of narrowing the gap between the nozzle and the roller is performed, and after the sucking step is performed, the gap between the nozzle and the roller is operated to return to the execution of the liquid adhering step. State.

That is, Fig. 8(A) shows a liquid adhering step which is the same as the liquid adhering step shown in Fig. 5(A) which has already been described.

Next, Fig. 8(B) shows a sucking step. In this example, the nozzle 10 is lowered to the direction of the arrow e so that the gap between the roller 23 and the nozzle 10 is narrowed, similarly to the sucking action of the chemical liquid.

Then, after the execution of the sucking step, the nozzle 10 is raised to the direction of the arrow f as shown in Fig. 8(C), and the gap between the roller 23 and the nozzle 10 is returned to the state at the time of execution of the liquid adhering step.

When the above operation is performed, the gap between the roller and the nozzle is temporarily narrowed, so that the discharge amount of the chemical liquid is small, and the distance in the relatively short rotation direction on the roller can be changed to the liquid-breaking state.

In addition, when the liquid cut state shown in Fig. 8(D) is reached, the rotation speed indicated by the arrow a is increased by the rotation speed of the roller 23 as indicated by the arrow c. It can be effectively turned off.

Further, in the embodiment described above, the decompression means for performing the sucking operation of the chemical liquid is the use of the reverse suction valve 46, but it can also be as shown in FIG. The reloading action of the pump 42 is performed.

Next, the second embodiment will be described. The same portions as those of the above embodiment are omitted. In this embodiment, when the priming process is performed, the distance S1 between the nozzle 10 and the priming roller 23 is first brought close to the distance S2 between the nozzle 10 and the substrate when the liquid is actually applied to the substrate. Almost equal (step 1). Thereafter, the roller 23 discharges the photoresist from the nozzle 10 while maintaining the rotation stop (step 2, FIG. 10(A)).

When a continuous accumulation liquid is generated between the nozzle 10 and the roller 23, the nozzle 10 is raised to a specific height while maintaining the continuous accumulation liquid (Fig. 10(B)). The position at which the nozzle 10 rises is attached to the liquid of the above embodiment. The position in the step is almost the same. Then, at the same time or after the rise of the nozzle 10, the roller 23 starts to rotate (step 3, Fig. 10 (C)). When the roller 23 is rotated, the liquid is removed from the nozzle 10, and the priming process is completed (Fig. 10(D)).

By performing the reverse suction operation as described above, the amount of the photoresist liquid applied to the roller 23 can be reduced in the priming process. When the nozzle 10 and the roller 23 are as close as possible, since the discharge of the photoresist is performed, the amount of the liquid to be accumulated can be reduced. Moreover, since it is close, it is easy to form a reservoir continuously. Then, when the nozzle 10 is close to the roller 23, since the roller 23 stops rotating, even if the rotation axis of the roller 23 is eccentric, the nozzle 10 and the roller 23 do not collide and are broken. Further, after the liquid adheres to the roller 23, the nozzle 10 starts to rotate by raising the nozzle 10, so that the liquid is removed from the nozzle 10. Furthermore, since the reverse suction operation is not required, the start-up processing time can be shortened.

Further, if it is desired to further reduce the amount of light applied to the roller 23, the reverse suction operation may be performed even after the above step 2. After that, the action of step 3 is performed.

Next, the third embodiment will be described. The same portions as those of the above embodiment are omitted. In the third embodiment, when the priming process is performed, the nozzle 10 and the priming roller 23 are first placed at the same position as in FIG. 5(A), and the photoresist is discharged from the nozzle 10 to stop the rotation. Roller 23 (step B1, Fig. 11 (A)).

Next, the roller 23 starts to rotate, and the photoresist liquid is wound up to the side of the roller 23 (step B2, Fig. 11 (B)).

Then, when the length of the photoresist wound by the roller 23 becomes a specific length, then Perform the reverse suction operation (Fig. 11 (C)). In this way, the length of the photoresist liquid formed on the roller 23 can be set to a desired length in the priming process (Fig. 11(D)). This is easy to set in the case of the roller 23, for example, four times, or five times of the priming process.

Further, even if the above embodiment is partially combined, the amount of the photoresist liquid adhered to the roller 23 can be reduced.

Further, the nozzle 16 is not limited to the slit nozzle having the slit-shaped discharge port. For example, even if it is a long nozzle which is formed to have a longer width than the glass substrate G, a plurality of fine holes are provided to serve as a nozzle for the discharge port. The same effect can be achieved.

Furthermore, although the above description is directed to an example in which the coating apparatus according to the present invention is applied to a photoresist coating processing unit, the coating apparatus according to the present invention is not limited to such a unit, and may be suitably used. Other substrate processing units, liquid processing devices, and the like.

1‧‧‧ Coating device

10‧‧‧ nozzle

14‧‧‧Exporting

23‧‧‧Starting injection roller

42, 43‧‧ ‧ pump

46‧‧‧Decompression means (reverse suction valve)

47‧‧‧Drug supply channel

G‧‧‧Processed substrate

Fig. 1 is a plan view showing the overall configuration of a coating apparatus according to the present invention.

Fig. 2 is a longitudinal sectional view showing a nozzle form of the coating device shown in Fig. 1.

Fig. 3 is an enlarged cross-sectional view showing the nozzle in the direction of the arrow viewed from the line A-A in Fig. 2.

Fig. 4 is a cross-sectional view showing an example of a reverse suction valve mounted on the coating device shown in Fig. 1.

Fig. 5 is a schematic view showing a first example of the priming processing performed in the coating apparatus shown in Fig. 1.

Fig. 6 is a schematic view showing the second example of the priming injection processing.

Fig. 7 is a schematic view showing the third example of the priming injection processing.

Fig. 8 is a view showing the fourth example of the priming injection processing.

Fig. 9 is a schematic view showing an example of a conventional priming process.

Fig. 10 is an explanatory view showing a priming injection process which is carried out in the second embodiment.

Fig. 11 is an explanatory view showing a priming injection process which is carried out in the third embodiment.

10‧‧‧ nozzle

23‧‧‧Starting injection roller

R‧‧‧ photoresist

Claims (9)

A liquid processing apparatus comprising: a long nozzle that discharges a chemical liquid from a discharge port; and a relative moving means for relatively moving the substrate to the nozzle, the liquid processing apparatus characterized by: a priming injection roller (priming) a roller) configured to prepare a liquid treatment of the chemical liquid on the substrate to be processed, and a nozzle moving mechanism capable of aligning the discharge port of the nozzle with the priming roller Directly above; and a decompression means, which is disposed in the chemical supply path for supplying the chemical to the nozzle, and can temporarily suck the chemical discharged from the nozzle, and the liquid processing device is configured by the nozzle The moving mechanism can be carried out in a state in which the priming injection nozzle is disposed directly above the longitudinal direction of the priming roller and the priming injection processing of the priming injection roller is performed. The liquid medicine discharged to the priming injection roller is temporarily sucked to the nozzle side by the above-described decompression means. The liquid processing apparatus according to claim 1, wherein the decompression means is temporarily provided in a chemical supply path between the nozzle and a pump for discharging the chemical from the nozzle, and the space volume can be temporarily expanded. Suck back valve. A priming injection processing method includes a long nozzle that discharges a chemical liquid from a discharge port, and a priming injection processing unit of a liquid processing apparatus in a liquid processing apparatus that relatively moves the substrate to the nozzle The method is characterized in that: a liquid adhering step is performed, which is performed directly above the longitudinal direction of the priming roller, and in a state of being opposed to the discharge port of the nozzle, the priming injection is performed by the nozzle The liquid is discharged from the roller, and the chemical solution is interposed between the nozzle and the priming roller; the sucking step is to temporarily attract the liquid discharged to the priming roller to the above a nozzle side; and a winding step of winding the chemical solution in the gap to the priming roller side by releasing the priming injection roller, and releasing the liquid medicine between the nozzle and the starting The liquid medicine injected into the roller is brought into a liquid-breaking state. The priming injection processing method according to the third aspect of the invention, wherein the winding step is started in the execution of the sucking step. The priming injection processing method according to the third aspect of the invention, wherein the winding step is followed by a rotation operation rotating in a direction of one of the priming injection rollers, and performing rotation in an opposite direction to the priming injection roller The rotation operation performs the above-described reverse suction step at least in a rotation operation in which one of the above-described priming rollers is rotated. The priming injection processing method according to the third aspect of the invention, wherein, when the winding step is completed, the rotation speed of the priming roller is accelerated to cause the liquid shutoff state. The priming injection processing method according to the third aspect of the invention, wherein, when the winding step is completed, the operation of separating the distance between the nozzle and the priming roller in the horizontal direction is performed. Liquid state. The priming injection processing method according to the third aspect of the invention, wherein after the liquid adhering step is performed, an operation of narrowing a gap between the nozzle and the priming roller is performed, and the sucking step is performed. Thereafter, the gap between the nozzle and the priming roller is returned to the state at the time of execution of the liquid adhering step, and the winding step is started. The priming injection processing method according to the eighth aspect of the invention, wherein, when the winding step is completed, the rotation speed of the priming roller is accelerated to cause the liquid shutoff state.