TWI516769B - Conductive connector and method of manufacturing the same - Google Patents

Conductive connector and method of manufacturing the same Download PDF

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TWI516769B
TWI516769B TW103125334A TW103125334A TWI516769B TW I516769 B TWI516769 B TW I516769B TW 103125334 A TW103125334 A TW 103125334A TW 103125334 A TW103125334 A TW 103125334A TW I516769 B TWI516769 B TW I516769B
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conductive
conductive metal
portions
connector
insulating support
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TW103125334A
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TW201512664A (en
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黃珪植
李柄周
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Isc股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R3/00Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06716Elastic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/07364Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch
    • G01R1/07378Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch using an intermediate adapter, e.g. space transformers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733Geometry aspects
    • G01R1/06738Geometry aspects related to tip portion
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06755Material aspects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/22Contacts for co-operating by abutting
    • H01R13/24Contacts for co-operating by abutting resilient; resiliently-mounted
    • H01R13/2407Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
    • H01R13/2414Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means conductive elastomers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Measuring Leads Or Probes (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)

Description

導電連接器及其製造方法 Conductive connector and method of manufacturing same 【相關申請案】[related application]

本申請案主張2013年7月24日在韓國智慧財產局(KIPO)申請的韓國專利申請案第10-2013-0087499號的優先權權益,所述專利申請案的全部內容以引用的方式併入本文中。 The present application claims priority to Korean Patent Application No. 10-2013-0087499, filed on Jan. 24, 2013 in the Korean Intellectual Property Office (KIPO), the entire contents of which is incorporated by reference. In this article.

本發明的一個或多個實施方式有關於一種導體連接器及其製造方法,特別是有關於一種用於測試插孔的導電連接器,其用於檢測測試目標裝置的電特性,以其製造所述導電連接器的方法。 One or more embodiments of the present invention relate to a conductor connector and a method of fabricating the same, and more particularly to a conductive connector for testing a jack for detecting electrical characteristics of a test target device, A method of electrically conductive connectors.

一般而言,需於製造電子元件或電路板之後檢測其電特性,如半導體集成電路(integrated circuit,IC)或半導體封裝的電子元件,或是構成或安裝此電子元件的電路板。為了檢測測試目標裝置的電特性,需穩定位於測試目標裝置以及測試裝置(測試板)之間的電連接,為達此目的,需使用用於電連接的連接器。換句 話說,用於電連接的連接器提供測試目標裝置以及測試裝置的焊墊彼此連接,使得電信號可於兩個方向間交換。此用於電連接的連接器用於測試裝置中,其可檢測測試目標裝置,且由於測試目標裝置與其結合,因此而亦可稱作測試插孔。 In general, it is necessary to detect electrical characteristics after manufacturing an electronic component or a circuit board, such as an integrated circuit (IC) or an electronic component of a semiconductor package, or a circuit board constituting or mounting the electronic component. In order to detect the electrical characteristics of the test target device, it is necessary to stabilize the electrical connection between the test target device and the test device (test board), and for this purpose, a connector for electrical connection is required. Change sentence In other words, the connector for electrical connection provides the test target device and the pads of the test device are connected to each other such that the electrical signal can be exchanged between the two directions. This connector for electrical connection is used in a test device that can detect a test target device and, because it is combined with a test target device, can also be referred to as a test jack.

目前用於電連接的連接器,意即,一般而言會使用測試插孔、導電連接器以及彈簧銷。其中,導電連接器具有可連接彈性導電部分於測試目標裝置的端子的結構,且彈簧銷配製成可藉由預備於其中的彈簧而將彈性地與測試目標裝置的端子接觸。 Connectors currently used for electrical connections, that is, generally use test sockets, conductive connectors, and spring pins. Wherein, the conductive connector has a structure that can connect the elastic conductive portion to the terminal of the test target device, and the spring pin is configured to be elastically brought into contact with the terminal of the test target device by a spring prepared therein.

以此方式,於測試目標裝置以及測試裝置連接彼此時,目前的導電連接器以及彈簧銷減少可能發生的機械衝擊,進而被廣泛地用作測試插孔。 In this way, current conductive connectors and spring pins reduce the mechanical shock that can occur when the test target device and the test device are connected to each other, and are thus widely used as test sockets.

圖1示出一種目前用於電連接的連接器的導電連接器的範例,且圖2及3為圖1中所示目前的導電連接器的導電部分的放大平面圖及放大橫截面圖。 1 shows an example of a conductive connector of a connector currently used for electrical connection, and FIGS. 2 and 3 are enlarged plan views and enlarged cross-sectional views of a conductive portion of the current conductive connector shown in FIG. 1.

參考圖1至3,目前的導電連接器10包括多個導電部分12,其設置於對應測試目標裝置20的端子22的位置,以及絕緣支撐部分11,其可於支撐多個導電部分12時,使多個導電部分12彼此絕緣。 Referring to FIGS. 1 through 3, the current conductive connector 10 includes a plurality of conductive portions 12 disposed at positions corresponding to the terminals 22 of the test target device 20, and an insulating support portion 11 that can support the plurality of conductive portions 12, The plurality of conductive portions 12 are insulated from each other.

導電部分12具有如矽橡膠的絕緣彈性體11a所形成的構件的結構,其中導電粒子12a排列在厚度方向,即垂直方向中,且絕緣支撐部分11由和導電部分12中的彈性體11a相同的材料,如矽橡膠所形成。 The conductive portion 12 has a structure of a member formed of an insulating elastic body 11a such as ruthenium rubber, in which the conductive particles 12a are arranged in the thickness direction, that is, in the vertical direction, and the insulating support portion 11 is the same as the elastic body 11a in the conductive portion 12. Materials such as ruthenium rubber are formed.

導電連接器10安裝於測試裝置30上。當各個導電部分 12接觸測試裝置30的焊墊32時,若測試目標裝置20下降且測試目標裝置20的端子22向下施壓於導電部分12,則導電部分12中的導電粒子12a將彼此接觸,使得導電部分12成為導電的。在此過程中,導電部分12彈性地壓縮及變形,進而減少因導電部分12以及測試目標裝置20的端子22之間接觸而可能發生的機械衝擊。 The conductive connector 10 is mounted on the test device 30. When each conductive part When contacting the pad 32 of the test device 30, if the test target device 20 is lowered and the terminal 22 of the test target device 20 is pressed downward to the conductive portion 12, the conductive particles 12a in the conductive portion 12 will contact each other, so that the conductive portion 12 becomes electrically conductive. During this process, the conductive portion 12 is elastically compressed and deformed, thereby reducing mechanical shock that may occur due to contact between the conductive portion 12 and the terminal 22 of the test target device 20.

當以此方式使測試目標裝置20的端子22與測試裝置30 的焊墊32藉由導電連接器10的導電部分12彼此電連接時,若測試裝置30的焊墊32提供預定的測試信號,則所述信號會藉由導電連接器10的導電部分12傳遞至測試目標裝置20的端子22,進而可進行預定的電測試。 When the terminal 22 of the test target device 20 and the test device 30 are made in this way When the pads 32 are electrically connected to each other by the conductive portions 12 of the conductive connectors 10, if the pads 32 of the test device 30 provide a predetermined test signal, the signals are transmitted to the conductive portions 12 of the conductive connectors 10 to The terminal 22 of the target device 20 is tested to perform a predetermined electrical test.

如圖3所示,目前的導電連接器10的導電部分12具有 前述所述包括導電粒子12a的絕緣彈性體11a的結構,因此,僅有少量的導電粒子12a暴露於將接觸測試目標裝置20的端子22的導電部分12的上表面上。由於此原因,於導電部分12的導電粒子12a以及測試目標裝置20的端子22之間具有小接觸區域,而使導電部分12以及測試目標裝置20的端子22之間發生電接觸電阻增加或接觸失敗。因此,存在有導電連接器10的可靠性惡化的問題,意即,判別測試目標裝置20的高品質產品的能力惡化。 As shown in FIG. 3, the conductive portion 12 of the current conductive connector 10 has The foregoing structure of the insulating elastic body 11a including the conductive particles 12a is such that only a small amount of the conductive particles 12a are exposed on the upper surface of the conductive portion 12 which will contact the terminal 22 of the test target device 20. For this reason, there is a small contact area between the conductive particles 12a of the conductive portion 12 and the terminal 22 of the test target device 20, and an electrical contact resistance increase or contact failure occurs between the conductive portion 12 and the terminal 22 of the test target device 20. . Therefore, there is a problem that the reliability of the conductive connector 10 is deteriorated, that is, the ability to discriminate the high quality product of the test target device 20 is deteriorated.

本發明的一個或多個實施方式包括一導電連接器,配置為由於其形成於導電部分的上表面之上的導電金屬覆蓋層,而可減少測試目標裝置的端子以及導電部分之間的電接觸電阻。 One or more embodiments of the present invention include a conductive connector configured to reduce electrical contact between terminals of the test target device and the conductive portion due to its conductive metal cap layer formed over the upper surface of the conductive portion resistance.

其他觀點將於以下描述中闡述,且藉由實踐本實施方式,而可部分地從描述中得知或理解。 Other aspects will be set forth in the description which follows.

依據本發明的一個或多個實施方式,導電連接器設置於測試目標裝置以及測試裝置之間,且使測試目標裝置的端子以及測試裝置的焊墊彼此電連接,其包括多個導電部分,設置於對應測試目標裝置的端子的位置,且由其中有導電粒子排列於垂直方向上的彈性材料所形成,絕緣支撐部分,當支撐多個導電部分時,使多個導電部分彼此絕緣,以及導電金屬覆蓋層,形成於多個導電部分的上表面之上。 According to one or more embodiments of the present invention, a conductive connector is disposed between the test target device and the test device, and electrically connects the terminals of the test target device and the pads of the test device to each other, including a plurality of conductive portions, and is disposed Corresponding to the position of the terminal of the test target device, and formed of an elastic material in which the conductive particles are arranged in the vertical direction, the insulating support portion, when supporting the plurality of conductive portions, insulates the plurality of conductive portions from each other, and the conductive metal A cover layer is formed over the upper surface of the plurality of conductive portions.

於此,多個導電部分形成為自絕緣支撐部分的上表面向上突起,以及導電金屬覆蓋層形成於多個導電部分的突起部分的上表面之上。 Here, the plurality of conductive portions are formed to protrude upward from the upper surface of the insulating support portion, and the conductive metal cover layer is formed over the upper surface of the protruding portion of the plurality of conductive portions.

導電金屬覆蓋層可更形成於多個導電部分的突起部分的側表面之上。 A conductive metal cover layer may be formed over the side surface of the protruding portion of the plurality of conductive portions.

導電金屬覆蓋層可形成為具有相較於多個導電部分更大的直徑。 The conductive metal cap layer may be formed to have a larger diameter than the plurality of conductive portions.

用於引導測試目標裝置的端子至多個導電部分的中心的引導膜可附接於絕緣支撐部分的上表面,而多個孔洞形成於引導膜中,多個導電部分的突起部分插入於其中。 A guide film for guiding the terminal of the test target device to the center of the plurality of conductive portions may be attached to an upper surface of the insulating support portion, and a plurality of holes are formed in the guide film, and the protruding portions of the plurality of conductive portions are inserted therein.

導電金屬覆蓋層可具有約0.1μm至約10μm的厚度。 The conductive metal cover layer may have a thickness of from about 0.1 μm to about 10 μm.

導電金屬覆蓋層的導電金屬可包括至少由鐵、鎳、鉻、金、銀、銅、鉑、及其合金所組成的群組中擇一者。 The conductive metal of the conductive metal cap layer may comprise at least one of the group consisting of iron, nickel, chromium, gold, silver, copper, platinum, and alloys thereof.

導電金屬覆蓋層可由導電金屬奈米粒子所形成。 The conductive metal coating layer may be formed of conductive metal nanoparticles.

導電金屬奈米粒子的平均粒子直徑可約為10nm至約100nm。 The conductive metal nanoparticles may have an average particle diameter of from about 10 nm to about 100 nm.

依據本發明的一個或多個實施方式,一種製造導電連接器的方法包括將包括導電粒子的液態彈性體模製材料注入模型的模製空間中,藉由對注入於模型的模製空間中的模製材料在垂直方向上施加磁場以使導電粒子於垂直方向上排列,藉由硬化模製材料而形成多個導電部分以及絕緣支撐部分,以及形成導電金屬覆蓋層於多個導電部分的上表面之上。 In accordance with one or more embodiments of the present invention, a method of making a conductive connector includes injecting a liquid elastomer molding material including conductive particles into a molding space of a mold by injecting into a molding space of the mold The molding material applies a magnetic field in a vertical direction to align the conductive particles in a vertical direction, forms a plurality of conductive portions and an insulating support portion by hardening the molding material, and forms a conductive metal coating layer on the upper surface of the plurality of conductive portions Above.

於此,形成導電金屬覆蓋層可包括附接遮蓋膜,其中形成暴露多個導電部分的孔於絕緣支撐部分的上表面,形成導電金屬覆蓋層於遮蓋膜的上表面之上,以及藉由孔而暴露的多個導電部分的上表面之上,以及從絕緣支撐部分的上表面移除遮蓋膜,以移除形成於遮蓋膜的上表面之上的導電金屬覆蓋層。 Herein, forming the conductive metal cover layer may include attaching the cover film, wherein a hole exposing the plurality of conductive portions is formed on the upper surface of the insulating support portion, a conductive metal cover layer is formed on the upper surface of the cover film, and the hole is formed by the hole The cover film is removed from the upper surface of the exposed plurality of conductive portions, and the conductive film is formed on the upper surface of the cover film to remove the conductive metal cover layer formed on the upper surface of the cover film.

多個導電部分可形成為自絕緣支撐部分的上表面向上突起,以及導電金屬覆蓋層可形成於多個導電部分的突起部分的上表面之上。 A plurality of conductive portions may be formed to protrude upward from an upper surface of the insulating support portion, and a conductive metal cover layer may be formed over an upper surface of the protruding portion of the plurality of conductive portions.

導電金屬覆蓋層可更形成於多個導電部分的突起部分的側表面之上。 A conductive metal cover layer may be formed over the side surface of the protruding portion of the plurality of conductive portions.

導電金屬覆蓋層可形成為具有較多個導電部分更大的直徑。 The conductive metal cap layer may be formed to have a larger diameter than the plurality of conductive portions.

此方法可更包括附接引導膜於絕緣支撐部分的上表面,以引導測試目標裝置的端子至多個導電部分的中心,以及於引導膜中形成有多個孔洞,其中多個導電部分的突起部分插入於其中。 The method may further include attaching a guiding film to an upper surface of the insulating support portion to guide a terminal of the test target device to a center of the plurality of conductive portions, and forming a plurality of holes in the guiding film, wherein the protruding portions of the plurality of conductive portions Inserted in it.

形成於遮蓋膜中的孔可具有大於或等於多個導電部分的直徑。 The holes formed in the cover film may have a diameter greater than or equal to the plurality of conductive portions.

遮蓋膜可由聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、三乙酸纖維素(triacetate cellulous,TAC)、乙烯/醋酸乙烯酯共聚合物(ethylene vinyl acetate,EVA)、聚丙烯(polypropylene,PP)、或聚碳酸酯(polycarbonate,PC)、薄銅片、薄鋁片、以及薄不銹鋼片所組成的群組的材料中擇一而形成。 The cover film may be made of polyimide (PI), polyethylene terephthalate (PET), triacetate cellulous (TAC), ethylene/vinyl acetate copolymer (ethylene vinyl). One of the materials of the group consisting of acetate, EVA), polypropylene (PP), or polycarbonate (PC), a thin copper sheet, a thin aluminum sheet, and a thin stainless steel sheet is formed.

導電金屬層可形成為具有大約0.1μm至約10μm的厚度。 The conductive metal layer may be formed to have a thickness of about 0.1 μm to about 10 μm.

形成導電金屬覆蓋層包括依據印刷法而藉由提供導電金屬膠於遮蓋膜的上表面以及多個導電部分的上表面,以形成導電金屬覆蓋層,接著乾燥所提供的導電金屬膠。 Forming the conductive metal cap layer includes forming a conductive metal cap layer by providing a conductive metal paste on the upper surface of the mask film and the upper surface of the plurality of conductive portions in accordance with a printing method, followed by drying the supplied conductive metal paste.

形成導電金屬覆蓋層可包括藉由噴灑導電金屬奈米粒子的水溶液而提供所述水溶液於遮蓋膜的上表面,以及導電部分的上表面,接著乾燥所提供的水溶液以形成導電金屬覆蓋層。 Forming the conductive metal cap layer may include providing the aqueous solution on the upper surface of the mask film and the upper surface of the conductive portion by spraying an aqueous solution of the conductive metal nanoparticles, and then drying the supplied aqueous solution to form a conductive metal cap layer.

10、100、200、300‧‧‧導電連接器 10, 100, 200, 300‧‧‧ conductive connectors

11、110、210、310‧‧‧絕緣支撐部分 11, 110, 210, 310‧‧‧ insulated support

11a、110a、210a、310a‧‧‧彈性體 11a, 110a, 210a, 310a‧‧‧ Elastomers

12、120、220、320‧‧‧導電部分 12, 120, 220, 320‧‧‧ conductive parts

12a、120a、220a、320a‧‧‧導電粒子 12a, 120a, 220a, 320a‧‧‧ conductive particles

20‧‧‧測試目標裝置 20‧‧‧Test target device

22‧‧‧端子 22‧‧‧ Terminal

30‧‧‧測試裝置 30‧‧‧Testing device

32‧‧‧焊墊 32‧‧‧ solder pads

100a‧‧‧模製材料 100a‧‧‧Molded materials

130、230、330‧‧‧覆蓋層 130, 230, 330‧‧ ‧ overlay

150、250、350‧‧‧遮蓋膜 150, 250, 350‧‧‧ cover film

152、252、352‧‧‧孔 152, 252, 352‧ ‧ holes

222、322‧‧‧突起部分 222, 322‧‧‧ protruding parts

340‧‧‧引導膜 340‧‧‧ Guide film

342‧‧‧孔洞 342‧‧‧ hole

400‧‧‧模型 400‧‧‧ model

410‧‧‧下模 410‧‧‧下模

411、421‧‧‧非磁性材料層 411, 421‧‧‧ non-magnetic material layer

412、422‧‧‧磁性材料層 412, 422‧‧‧ magnetic material layer

414‧‧‧下磁性材料基板 414‧‧‧ Magnetic material substrate

420‧‧‧上模 420‧‧‧上模

424‧‧‧上磁性材料基板 424‧‧‧Upper magnetic material substrate

430‧‧‧間隙物 430‧‧ ‧ spacers

由以下實施方式的描述結合所附圖式後,將更明顯且容易理解此些及/或其他觀點,其中:圖1為目前的導電連接器的範例的橫截面圖;圖2及圖3為圖1中所示目前的導電連接器的導電部分的放大平面圖及放大橫截面圖;圖4為依據本發明的實施方式的導電連接器示意圖;圖5為圖4中所示導電部分以及覆蓋層的放大圖;圖6為依據本發明的另一實施方式的導電連接器的部分示意圖;圖7為依據本發明的又一實施方式的導電連接器的部分示意圖;圖8至11繪示出導電連接器的製造方法示意圖,其依據圖4中所示的本發明的實施方式;圖12及13繪示出導電連接器的製造方法示意圖,其依據圖6中所示的本發明的另一實施方式;圖14及15繪示出導電連接器的製造方法示意圖,其依據圖7中所示的本發明的又一實施方式。 These and/or other aspects will be more apparent and readily apparent from the following description of the embodiments, wherein: FIG. 1 is a cross-sectional view of an example of a current conductive connector; FIGS. 2 and 3 are 1 is an enlarged plan view and an enlarged cross-sectional view of a conductive portion of a current conductive connector shown in FIG. 1. FIG. 4 is a schematic view of a conductive connector according to an embodiment of the present invention; FIG. 5 is a conductive portion and a cover layer shown in FIG. Figure 6 is a partial schematic view of a conductive connector in accordance with another embodiment of the present invention; Figure 7 is a partial schematic view of a conductive connector in accordance with yet another embodiment of the present invention; Figures 8 through 11 illustrate conductive A schematic diagram of a method of manufacturing a connector according to the embodiment of the present invention shown in FIG. 4; FIGS. 12 and 13 are schematic views showing a method of manufacturing a conductive connector according to another embodiment of the present invention shown in FIG. 14 and 15 are schematic views showing a method of manufacturing a conductive connector according to still another embodiment of the present invention shown in FIG.

現在將於實施方式中詳細說明,其範例繪示於所附圖式中,其中相同參考符號意指相同元件。於此方面,本實施方式可具有不同形式,且不應被解釋為限定於此的描述。因此,藉由參考附圖,本實施方式僅用於以下描述以解釋本描述的各個方面。 The present invention will be described in detail with reference to the accompanying drawings. The present embodiments may have different forms in this regard, and should not be construed as being limited to the description. Accordingly, the present embodiments are to be considered as illustrative only,

圖4為依據本發明的實施方式的導電連接器示意圖,以 及圖5為圖4中所示導電部分以及覆蓋層的放大圖。 4 is a schematic view of a conductive connector in accordance with an embodiment of the present invention, And FIG. 5 is an enlarged view of the conductive portion and the cover layer shown in FIG.

一併參考圖4及5,依據本發明的實施方式的導電連接器 100為一個用於電連接的連接器,即為一測試插孔,其介於測試目標裝置20以及測試裝置30之間,以電連接測試目標裝置20的端子22以及測試裝置30的焊墊32於彼此。 Referring to Figures 4 and 5 together, a conductive connector in accordance with an embodiment of the present invention 100 is a connector for electrical connection, that is, a test jack interposed between the test target device 20 and the test device 30 to electrically connect the terminal 22 of the test target device 20 and the pad 32 of the test device 30. To each other.

導電連接器100使電流可於垂直方向中,且無法於垂直 於厚度方向的平面方向,即,水平方向中。導電連接器100配置成可藉由彈性收縮而變形,以吸收測試目標裝置20所施加的衝擊力。具體而言,導電連接器100包括多個導電部分120、絕緣支撐部分110,以及導電金屬覆蓋層130。 Conductive connector 100 allows current to be in the vertical direction and is not vertical In the plane direction of the thickness direction, that is, in the horizontal direction. The conductive connector 100 is configured to be deformed by elastic contraction to absorb the impact force applied by the test target device 20. Specifically, the conductive connector 100 includes a plurality of conductive portions 120, an insulating support portion 110, and a conductive metal cover layer 130.

導電部分120設置於對應測試目標裝置20的端子22的 位置,並具有其中有導電粒子120a於厚度方向上排列的彈性體110a的結構。 The conductive portion 120 is disposed at the terminal 22 corresponding to the test target device 20 The position has a structure in which the elastic body 110a in which the conductive particles 120a are arranged in the thickness direction.

導電部分120的水平橫截面可具有多種形狀,但最好具 有圓形橫截面。換句話說,導電部分120最好為圓柱狀。 The horizontal cross section of the conductive portion 120 can have a variety of shapes, but preferably Has a circular cross section. In other words, the conductive portion 120 is preferably cylindrical.

可使用具有交聯結構的耐熱性聚合物,以作為構成導電 部分120的彈性體110a。為獲得此彈性聚合物,可使用可形成固化聚合物的多種材料,然而,從塑型加工性和電性能的方面而言,液態矽橡膠較佳。亦可使用其他任何具有乙烯基或羥基等的固化性液態矽橡膠、縮合固化性液態系橡膠、液態矽橡膠。具體而言,具有二甲基矽酮生橡膠、甲基乙烯基矽酮生橡膠、甲基苯基乙烯基矽生橡膠等。 A heat resistant polymer having a crosslinked structure can be used as a constituent conductive The elastomer 110a of the portion 120. In order to obtain the elastic polymer, various materials which can form a cured polymer can be used, however, liquid ruthenium rubber is preferable from the viewpoints of mold processability and electrical properties. Any other curable liquid enamel rubber having a vinyl group or a hydroxyl group, a condensation curable liquid rubber, or a liquid ruthenium rubber may be used. Specifically, it has a dimethyl fluorenone raw rubber, a methyl vinyl fluorenone raw rubber, a methyl phenyl vinyl virgin rubber, or the like.

當導電部分120由矽橡膠的硬化材料所形成時,硬化的矽橡膠最好於150℃時,具有約10%或更小的永久壓縮變形,更佳為約8%或更小,且最佳為約6%或更小。當獲得具有大於10%的永久壓縮變形的導電連接器100被重複地在高溫環境下使用時,導電部分120中的導電粒子120a的鏈被破壞,而難以維持必需的導電性。 When the conductive portion 120 is formed of a hardened material of ruthenium rubber, the hardened ruthenium rubber preferably has a permanent compression set of about 10% or less at 150 ° C, more preferably about 8% or less, and is optimal. It is about 6% or less. When the conductive connector 100 having a permanent compression set greater than 10% is repeatedly used in a high temperature environment, the chain of the conductive particles 120a in the conductive portion 120 is broken, and it is difficult to maintain the necessary conductivity.

較佳可使用藉由於具有磁性的核心粒子(以下稱為「磁性核心粒子」)以覆蓋高導電金屬而獲得的粒子,作為構成導電部分120的導電粒子120a。磁性核心粒子較佳為具有平均約為3μm至約40μm的平均粒子直徑。於此,磁性核心粒子的平均粒子直徑以雷射繞射的方式測量。可使用鐵、鎳、鈷或其合金作為構成磁性核心粒子的材料,且該材料較佳具有約0.1Wb/m2或更大的飽和磁化強度,更佳約為0.3Wb/m2或更大,最佳約為0.5Wb/m2或更大。高導電性的金屬於0℃時具有約5x106Ω/m或更大的導電率。覆蓋於磁性核心粒子的表面上的高導電金屬為金、銀、銠、鉑、鉻等。其中,由於化學性質穩定且具有高導電率,因此金為較佳。 It is preferable to use particles obtained by covering the highly conductive metal by magnetic core particles (hereinafter referred to as "magnetic core particles") as the conductive particles 120a constituting the conductive portion 120. The magnetic core particles preferably have an average particle diameter of from about 3 μm to about 40 μm on average. Here, the average particle diameter of the magnetic core particles is measured in a laser diffraction manner. May be used iron, nickel, cobalt or an alloy as the material constituting the magnetic core particles, and the material preferably having from about 0.1Wb / m 2 or greater saturation magnetization, more preferably about 0.3Wb / m 2 or more Preferably, it is about 0.5 Wb/m 2 or more. The highly conductive metal has a conductivity of about 5 x 10 6 Ω/m or more at 0 °C. The highly conductive metal covering the surface of the magnetic core particles is gold, silver, rhodium, platinum, chromium, or the like. Among them, gold is preferred because of its stable chemical properties and high electrical conductivity.

絕緣支撐部分110於支撐導電部分120時,執行維持導電部分120之間絕緣的功能。絕緣支撐部分110較佳由與導電部分120中彈性體110a相同的材料所形成,如矽橡膠。然而,絕緣支撐部分110的材料並不限於矽橡膠,且可使用任何具有優良的彈性及絕緣性的材料。 The insulating support portion 110 performs a function of maintaining insulation between the conductive portions 120 when supporting the conductive portion 120. The insulating support portion 110 is preferably formed of the same material as the elastomer 110a of the conductive portion 120, such as a rubber. However, the material of the insulating support portion 110 is not limited to the ruthenium rubber, and any material having excellent elasticity and insulation can be used.

覆蓋層130覆蓋於將接觸測試目標裝置20的端子22的 導電部分的上表面之上。覆蓋層130可形成為具有與導電部分120相同的直徑。然而,覆蓋層130的直徑並不限於和導電部分120相同,且覆蓋層130可形成為具有比導電部分120大的直徑。另外,覆蓋層130較佳可形成具有約0.1μm至約10μm的厚度。 The cover layer 130 covers the terminal 22 that will contact the test target device 20 Above the upper surface of the conductive portion. The cover layer 130 may be formed to have the same diameter as the conductive portion 120. However, the diameter of the cover layer 130 is not limited to being the same as the conductive portion 120, and the cover layer 130 may be formed to have a larger diameter than the conductive portion 120. Additionally, the cover layer 130 is preferably formed to have a thickness of from about 0.1 μm to about 10 μm.

可使用如鐵、鎳、鉻、金、銀、銅、鉑、或其合金,以作為構成覆蓋層130的導電金屬。另外,覆蓋層130可由導電金屬的奈米粒子所形成,且導電金屬奈米粒子的平均粒子直徑較佳約為10nm至約100nm。 As the conductive metal constituting the cover layer 130, for example, iron, nickel, chromium, gold, silver, copper, platinum, or an alloy thereof can be used. In addition, the cover layer 130 may be formed of nano particles of a conductive metal, and the average particle diameter of the conductive metal nanoparticles is preferably from about 10 nm to about 100 nm.

具有前述所述依據本發明的實施方式的結構的導電連接器100,其操作及功效將於以下描述。 The operation and efficacy of the conductive connector 100 having the structure according to the embodiment of the present invention described above will be described below.

參考圖4,具有前述所述的結構的導電連接器100安裝於測試裝置30上,且於導電連接器100中,導電部分120的下表面將相對地接觸測試裝置30的焊墊32。當測試目標裝置20於此狀態中下降時,測試目標裝置20的端子22將接觸形成於導電部分120的上表面之上的覆蓋層130,並向下施壓於覆蓋層130以及導電部分120。此時,導電部分120中的導電粒子120a將接觸彼此,使得導電部分120成為電導通的。於此過程中,導電部分120彈性地壓縮而變形,因此而減少可能於導電部分120以及測試目標裝置20的端子22之間接觸時所發生的機械衝擊。 Referring to FIG. 4, the conductive connector 100 having the structure described above is mounted on the test device 30, and in the conductive connector 100, the lower surface of the conductive portion 120 will relatively contact the pad 32 of the test device 30. When the test target device 20 is lowered in this state, the terminal 22 of the test target device 20 will contact the cover layer 130 formed over the upper surface of the conductive portion 120 and press down on the cover layer 130 and the conductive portion 120. At this time, the conductive particles 120a in the conductive portion 120 will contact each other, so that the conductive portion 120 becomes electrically conductive. In this process, the conductive portion 120 is elastically compressed and deformed, thereby reducing the mechanical shock that may occur when the conductive portion 120 and the terminal 22 of the test target device 20 are in contact.

當測試目標裝置20的端子22藉由導電部分120以及覆蓋層130電連接於測試裝置30的焊墊32時,測試裝置30的焊墊32將提供預定的信號,並藉由導電部分120以及覆蓋層130傳遞 至測試目標裝置20的端子22,進而可進行預定的電測試。 When the terminal 22 of the test target device 20 is electrically connected to the pad 32 of the test device 30 by the conductive portion 120 and the cover layer 130, the pad 32 of the test device 30 will provide a predetermined signal and be covered by the conductive portion 120 and Layer 130 pass To the terminal 22 of the test target device 20, a predetermined electrical test can be performed.

導電連接器100具有以下所述的功效。 The conductive connector 100 has the following effects.

使用依據本發明實施方式的導電連接器100以測試目標裝置20的電測試過程中,如前述所述,測試目標裝置20的端子22將接觸形成於導電部分20的上表面之上的覆蓋層130,並因此使電接觸區域增加。因此,測試目標裝置20的端子22以及導電部分120之間的電接觸電阻減少,且電連接穩定。因此而改善導電連接器100的可靠性以及判別測試目標裝置20的高品質產品的能力。 In the electrical test process using the conductive connector 100 in accordance with an embodiment of the present invention to test the target device 20, as described above, the terminal 22 of the test target device 20 will contact the cover layer 130 formed over the upper surface of the conductive portion 20. And thus increase the electrical contact area. Therefore, the electrical contact resistance between the terminal 22 of the test target device 20 and the conductive portion 120 is reduced, and the electrical connection is stabilized. Therefore, the reliability of the conductive connector 100 and the ability to discriminate the high quality product of the target device 20 are improved.

此外,覆蓋層130由導電金屬所形成,因此較導電部分120硬。由於導電部分120的上表面以此方式覆蓋硬覆蓋層130,而可防止因導電部分120以及測試目標裝置20的端子22之間直接接觸所引起的磨損及損壞,且亦可防止由外來材料所引起導電部分120的汙染或損壞。因此,導電連接器100的壽命而可延長。 Further, the cover layer 130 is formed of a conductive metal and thus is harder than the conductive portion 120. Since the upper surface of the conductive portion 120 covers the hard cover layer 130 in this manner, wear and damage caused by direct contact between the conductive portion 120 and the terminal 22 of the test target device 20 can be prevented, and the foreign material can also be prevented. The contamination or damage of the conductive portion 120 is caused. Therefore, the life of the conductive connector 100 can be extended.

依據本發明的其他實施方式的導電連接器將於以下說明。 Conductive connectors in accordance with other embodiments of the present invention will be described below.

圖6為依據本發明的另一實施方式的導電連接器的部分示意圖,以及圖7為依據本發明的又一實施方式的導電連接器的部分示意圖。 6 is a partial schematic view of a conductive connector in accordance with another embodiment of the present invention, and FIG. 7 is a partial schematic view of a conductive connector in accordance with yet another embodiment of the present invention.

首先參考圖6,依據本發明的另一實施方式的導電連接器200包括多個導電部分220、絕緣支撐部分210、以及導電金屬覆蓋層230。 Referring first to FIG. 6, a conductive connector 200 in accordance with another embodiment of the present invention includes a plurality of conductive portions 220, an insulating support portion 210, and a conductive metal cap layer 230.

導電部分220設置於對應測試目標裝置20的端子22的 位置,並具有其中有導電粒子220a排列於厚度方向上的彈性體210a的結構。絕緣支撐部分210於支撐導電部分220時,執行維持導電部分220之間絕緣的功能。由於導電部分220以及絕緣支撐部分210的詳細組成與依據圖4及5所示的實施方式的導電連接器100中的導電部分120以及絕緣支撐部分110皆相同,因此將省略其詳細的描述。 The conductive portion 220 is disposed at the terminal 22 corresponding to the test target device 20 The position has a structure in which the conductive particles 220a are arranged in the thickness direction of the elastic body 210a. The insulating support portion 210 performs a function of maintaining insulation between the conductive portions 220 when supporting the conductive portion 220. Since the detailed composition of the conductive portion 220 and the insulating support portion 210 is the same as that of the conductive portion 120 and the insulating support portion 110 in the conductive connector 100 according to the embodiment shown in FIGS. 4 and 5, a detailed description thereof will be omitted.

然而,於此實施方式中,導電部分220形成為從絕緣支 撐部分210的上表面向上突起。換句話說,導電部分220包括突起部分222,其自絕緣支撐部分210的上表面向上突起一預定高度。當導電部分220以此方式自絕緣支撐部分210的上表面向上突起時,可確保其與測試目標裝置20的端子22的接觸。 However, in this embodiment, the conductive portion 220 is formed as an insulating branch The upper surface of the struts 210 protrudes upward. In other words, the conductive portion 220 includes a protruding portion 222 that protrudes upward from the upper surface of the insulating supporting portion 210 by a predetermined height. When the conductive portion 220 protrudes upward from the upper surface of the insulating support portion 210 in this manner, contact with the terminal 22 of the test target device 20 can be ensured.

在此情況下,覆蓋層230形成於導電部分220的突起部 分222的上表面之上。此外,覆蓋層230亦可形成於突起部分222的側表面之上,且可形成具有相較於導電部分220更大的直徑。 In this case, the cover layer 230 is formed on the protrusion of the conductive portion 220 Above the upper surface of the subsection 222. Further, the cover layer 230 may be formed over the side surface of the protruding portion 222 and may be formed to have a larger diameter than the conductive portion 220.

由於組成覆蓋層230的導電金屬,其種類以及厚度皆相 同於依據圖4及5所示的實施方式的導電連接器100中所組成覆蓋層130的導電金屬,因此將省略其詳細的描述。 Due to the conductive metal constituting the cover layer 230, the type and thickness thereof are The conductive metal constituting the cover layer 130 in the conductive connector 100 according to the embodiment shown in FIGS. 4 and 5 is omitted, and thus detailed description thereof will be omitted.

接著,參考圖7,根據本發明的又一實施方式的導電連接 器300包括多個導電部分320、絕緣支撐部分310、導電金屬覆蓋層330、以及引導膜340。 Next, referring to FIG. 7, a conductive connection according to still another embodiment of the present invention The device 300 includes a plurality of conductive portions 320, an insulating support portion 310, a conductive metal cover layer 330, and a guide film 340.

導電部分320設置於對應測試目標裝置20的端子22的 位置,並具有其中有導電粒子320a排列於厚度方向上的彈性體310a的結構。絕緣支撐部分310於支撐導電部分320時,執行維持導電部分320之間絕緣的功能。導電金屬覆蓋層330形成於導電部分320的突起部分322的上表面之上。此外,覆蓋層330亦可形成於突起部分322的側表面之上,且可形成具有相較於導電部分320更大的直徑。由於導電部分320、絕緣支撐部分310、以及導電金屬覆蓋層330的詳細組成與依據圖6所示的其他實施方式的導電連接器200中的導電部分220、絕緣支撐部分210、以及覆蓋層230皆相同,因此將省略其詳細的描述。 The conductive portion 320 is disposed at the terminal 22 corresponding to the test target device 20 The position has a structure in which the conductive particles 320a are arranged in the thickness direction of the elastic body 310a. The insulating support portion 310 performs a function of maintaining insulation between the conductive portions 320 when supporting the conductive portion 320. A conductive metal cap layer 330 is formed over the upper surface of the protruding portion 322 of the conductive portion 320. Further, the cover layer 330 may also be formed over the side surface of the protruding portion 322 and may be formed to have a larger diameter than the conductive portion 320. The detailed composition of the conductive portion 320, the insulating support portion 310, and the conductive metal cover layer 330 and the conductive portion 220, the insulating support portion 210, and the cover layer 230 in the conductive connector 200 according to other embodiments shown in FIG. The same, and thus a detailed description thereof will be omitted.

然而,於此實施方式中,當端子22下降而偏離導電部分 320的中心時,可引導測試目標裝置20的端子22至導電部分320的中心的引導膜340,其附接於絕緣支撐部分310的上表面。引導膜340形成為以預定的距離圍繞突起部分322的側表面。換句話說,其中插入有導電部分320的突起部分322的多個孔洞342形成於引導膜340中。孔洞342形成為具有相較於突起部分322更大的直徑。此外,引導膜340可具有相同於突起部分322的高度。 引導膜340可使用合成樹脂材料,如聚醯亞胺,然而引導膜340並不侷限於合成樹脂材料。 However, in this embodiment, when the terminal 22 is lowered and deviates from the conductive portion At the center of 320, a guide film 340 of the center of the test target device 20 to the center of the conductive portion 320, which is attached to the upper surface of the insulating support portion 310, may be guided. The guide film 340 is formed to surround the side surface of the protruding portion 322 by a predetermined distance. In other words, a plurality of holes 342 in which the protruding portion 322 of the conductive portion 320 is inserted are formed in the guide film 340. The hole 342 is formed to have a larger diameter than the protruding portion 322. Further, the guide film 340 may have the same height as the protruding portion 322. The guide film 340 may use a synthetic resin material such as polyimide, but the guide film 340 is not limited to a synthetic resin material.

由於導電連接器200以及具有前述所述依據本發明另一 實施方式的導電連接器300,其操作以及功效皆相同於依據圖4及5中所示的實施方式中的導電連接器100,因此將省略其詳細的描述。 Due to the electrically conductive connector 200 and having the aforementioned further according to the invention The conductive connector 300 of the embodiment has the same operation and efficiency as the conductive connector 100 according to the embodiment shown in FIGS. 4 and 5, and thus a detailed description thereof will be omitted.

具有依據本發明的實施方式的前述結構的導電連接器,其製造方法將描述於下。 A conductive connector having the foregoing structure according to an embodiment of the present invention, a manufacturing method thereof will be described below.

圖8至11繪示出導電連接器的製造方法示意圖,其依據圖4中所示的本發明的實施方式。 8 to 11 are schematic views showing a method of manufacturing a conductive connector in accordance with an embodiment of the present invention shown in FIG.

首先,如圖8所示,上模420設置於下模410上,且其中隔著間隙物430。於下模410以及上模420之間,形成有被間隙物430圍繞的模製空間。 First, as shown in FIG. 8, the upper mold 420 is disposed on the lower mold 410 with the spacer 430 interposed therebetween. A molding space surrounded by the spacer 430 is formed between the lower mold 410 and the upper mold 420.

於下模410中,磁性材料層412形成於下磁性材料基板414的上表面之上,對應導電連接器100的導電部分120的位置,意即,對應於測試目標裝置20的端子22的位置,以及非磁性材料層411形成於下磁性材料基板414的上表面之上,不同於磁性材料層412的位置。 In the lower mold 410, a magnetic material layer 412 is formed on the upper surface of the lower magnetic material substrate 414, corresponding to the position of the conductive portion 120 of the conductive connector 100, that is, corresponding to the position of the terminal 22 of the test target device 20. And a non-magnetic material layer 411 is formed over the upper surface of the lower magnetic material substrate 414, different from the position of the magnetic material layer 412.

上模420亦相同,磁性材料層422形成於上磁性材料基板424的下表面之上,對應導電連接器100的導電部分120的位置,以及非磁性材料層421形成於上磁性材料基板424的下表面之上,不同於磁性材料層422的位置。 The upper mold 420 is also the same, the magnetic material layer 422 is formed on the lower surface of the upper magnetic material substrate 424, corresponding to the position of the conductive portion 120 of the conductive connector 100, and the non-magnetic material layer 421 is formed under the upper magnetic material substrate 424. Above the surface, it is different from the position of the magnetic material layer 422.

接著,將模製材料100a注入於預備的模型400的模製空間之中。模製材料100a可藉由在如其中包括有大量的導電粒子120a的液態矽橡膠的液態彈性體110a而製得。彈性體110a以及導電粒子120a已於前述詳細描述。 Next, the molding material 100a is injected into the molding space of the preliminary mold 400. The molding material 100a can be produced by a liquid elastomer 110a of liquid ruthenium rubber including a large amount of conductive particles 120a therein. The elastomer 110a and the conductive particles 120a have been described in detail above.

接著,參考圖9,執行電磁體(未繪示),其分別設置於下模410的下表面以及上模420的上表面之上,從而於垂直方向上 對注入於模型400中的模製空間之中的模製材料100a施加磁場。然後,散佈於液態彈性體110a中的導電粒子120a聚集至上模420的磁性材料層422以及下模410的磁性材料層412之間,並於垂直方向上排列。 Next, referring to FIG. 9, electromagnets (not shown) are disposed, which are respectively disposed on the lower surface of the lower mold 410 and the upper surface of the upper mold 420, thereby being vertically oriented. A magnetic field is applied to the molding material 100a injected into the molding space in the mold 400. Then, the conductive particles 120a dispersed in the liquid elastomer 110a are collected between the magnetic material layer 422 of the upper mold 420 and the magnetic material layer 412 of the lower mold 410, and are arranged in the vertical direction.

再來,模製材料100a於模型400中經過大約1.5小時,且溫度例如約為100℃的硬化過程。接著,其中有導電粒子120a於垂直方向上排列的硬化彈性體110a形成多個導電部分120,且圍繞於多個導電部分120的硬化彈性體110a形成絕緣支撐部分110。 Further, the molding material 100a is subjected to a hardening process in the mold 400 for about 1.5 hours and at a temperature of, for example, about 100 °C. Next, the hardened elastic body 110a in which the conductive particles 120a are arranged in the vertical direction forms a plurality of conductive portions 120, and the hardened elastic body 110a surrounding the plurality of conductive portions 120 forms the insulating support portion 110.

接著,如圖10所示,遮蓋膜150附接於絕緣支撐部分110的上表面。多個孔152形成於遮蓋膜150中,且多個導電部分120藉由多個孔152而暴露。多個孔152的直徑可形成為等於或大於導電部分120的直徑。 Next, as shown in FIG. 10, the mask film 150 is attached to the upper surface of the insulating support portion 110. A plurality of holes 152 are formed in the cover film 150, and the plurality of conductive portions 120 are exposed by the plurality of holes 152. The diameter of the plurality of holes 152 may be formed to be equal to or larger than the diameter of the conductive portion 120.

作為遮蓋膜150的材料,非金屬材料中可使用聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、三乙酸纖維素(triacetate cellulous,TAC)、乙烯/醋酸乙烯酯共聚合物(ethylene vinyl acetate,EVA)、聚丙烯(polypropylene,PP)、或聚碳酸酯(polycarbonate,PC),以及金屬材料中亦可使用薄銅片、薄鋁片、或薄不銹鋼片。此外,可使用多種方法作為形成遮蓋膜150中的孔152的方法,例如雷射製程、機械鑽孔製程、溼蝕刻製程、以及基於利用光阻和光罩以曝光和顯影的方法。 As a material of the cover film 150, polyimide (PI), polyethylene terephthalate (PET), triacetate cellulous (TAC), ethylene can be used for the non-metal material. /ethylene vinyl acetate (EVA), polypropylene (PP), or polycarbonate (PC), and metal materials can also be used in thin copper, thin aluminum, or thin Stainless steel sheet. In addition, various methods can be used as a method of forming the holes 152 in the mask film 150, such as a laser process, a mechanical drilling process, a wet etching process, and a method based on exposure and development using a photoresist and a mask.

接著,如圖11所示,導電金屬覆蓋層130形成於遮蓋膜 150的上表面之上,以及藉由孔152而暴露的多個導電部分120的上表面之上。 Next, as shown in FIG. 11, a conductive metal cap layer 130 is formed on the mask film. Above the upper surface of 150, and over the upper surface of the plurality of conductive portions 120 exposed by the apertures 152.

具體而言,藉由使用印刷法而提供預定厚度的導電金屬膠於遮蓋膜150的上表面及多個導電部分120的上表面,接著加熱並乾燥所提供的導電金屬膠。然後,將導電金屬膠硬化,從而可形成導電金屬層130。此時,可使用例如鐵、鎳、鉻、金、銀、銅、鉑、或其合金以作為導電金屬。 Specifically, a conductive metal paste of a predetermined thickness is provided on the upper surface of the mask film 150 and the upper surface of the plurality of conductive portions 120 by using a printing method, followed by heating and drying the supplied conductive metal paste. Then, the conductive metal paste is hardened, so that the conductive metal layer 130 can be formed. At this time, for example, iron, nickel, chromium, gold, silver, copper, platinum, or an alloy thereof may be used as the conductive metal.

可替換地,可噴灑及提供預定厚度的導電金屬奈米粒子的水溶液於遮蓋膜150的上表面及多個導電部分120的上表面,接著乾操,進而可形成導電金屬覆蓋層130。此時,導電金屬奈米粒子的平均粒子直徑最好約為10nm至約100nm。 Alternatively, an aqueous solution of conductive metal nanoparticles of a predetermined thickness may be sprayed and provided on the upper surface of the cover film 150 and the upper surface of the plurality of conductive portions 120, followed by dry operation, thereby forming the conductive metal cover layer 130. At this time, the conductive metal nanoparticles preferably have an average particle diameter of about 10 nm to about 100 nm.

最後,移除遮蓋膜150。具體而言,當遮蓋膜150自絕緣支撐部分110的上表面卸除時,形成於遮蓋膜150的上表面之上的覆蓋層130會一同被移除,且留下覆蓋於多個導電部分120的上表面之上的導電金屬覆蓋層130。以此方式所形成的導電金屬覆蓋層130具有相同於導電部分120的直徑,或是依據形成於遮蓋膜150中的孔152而具有大於導電部分120的直徑。 Finally, the cover film 150 is removed. Specifically, when the cover film 150 is removed from the upper surface of the insulating support portion 110, the cover layer 130 formed over the upper surface of the cover film 150 is removed together, and is left overlying the plurality of conductive portions 120. A conductive metal cap layer 130 over the upper surface. The conductive metal cap layer 130 formed in this manner has the same diameter as the conductive portion 120 or has a larger diameter than the conductive portion 120 depending on the hole 152 formed in the mask film 150.

由此,便完成製造具有如圖4所示結構的導電連接器100。 Thus, the fabrication of the conductive connector 100 having the structure shown in FIG. 4 is completed.

圖12及13繪示出導電連接器的製造方法示意圖,其依據圖6中所示的本發明的另一實施方式。 12 and 13 are schematic views showing a method of manufacturing a conductive connector in accordance with another embodiment of the present invention shown in FIG.

由於依據本發明的另一實施方式的導電連接器200,其製 造方法類似於前述所述依據本發明的實施方式的導電連接器100的製造方法,因此以下描述將著重於前述方法與後述方法的差異處。 Due to the conductive connector 200 according to another embodiment of the present invention, The manufacturing method is similar to the manufacturing method of the conductive connector 100 according to the embodiment of the present invention described above, and therefore the following description will focus on the difference between the foregoing method and the method described later.

首先,如同圖8及9中所繪示的方式,形成多個導電部分220以及絕緣支撐部分210。此時,如圖12中所示,導電部分220自絕緣支撐部分210的上表面突起,而形成突起部分222。可藉由將圖8及9中所示的上模420的磁性材料層422形成為相對於非磁性材料層421而朝向上磁性材料基板424凹入,而獲得導電部分220的突起部分222。 First, as in the manner illustrated in FIGS. 8 and 9, a plurality of conductive portions 220 and an insulating support portion 210 are formed. At this time, as shown in FIG. 12, the conductive portion 220 protrudes from the upper surface of the insulating support portion 210 to form the protruding portion 222. The protruding portion 222 of the conductive portion 220 can be obtained by forming the magnetic material layer 422 of the upper mold 420 shown in FIGS. 8 and 9 to be recessed toward the upper magnetic material substrate 424 with respect to the non-magnetic material layer 421.

接著,遮蓋膜250附接於絕緣支撐部分210的上表面。多個孔252形成於遮蓋膜250中,且多個導電部分220的突起部分222藉由多個孔252而暴露。多個孔252的直徑可形成為等於或大於導電部分220的突起部分222的直徑。由於遮蓋膜250的材料以及形成孔252的方法相同於前述實施方式中所述,因此將省略其詳細的描述。 Next, the cover film 250 is attached to the upper surface of the insulating support portion 210. A plurality of holes 252 are formed in the cover film 250, and the protruding portions 222 of the plurality of conductive portions 220 are exposed by the plurality of holes 252. The diameter of the plurality of holes 252 may be formed to be equal to or larger than the diameter of the protruding portion 222 of the conductive portion 220. Since the material of the mask film 250 and the method of forming the hole 252 are the same as those described in the foregoing embodiment, a detailed description thereof will be omitted.

接著,如圖13所示,導電金屬覆蓋層230形成於遮蓋膜250的上表面之上,以及藉由孔252而暴露的多個導電部分220的上表面之上。此時,覆蓋層230亦可能形成於突起部分222的側表面之上。形成導電金屬覆蓋層230的方法相同於前述實施方式中所述。 Next, as shown in FIG. 13, a conductive metal cap layer 230 is formed over the upper surface of the mask film 250, and over the upper surface of the plurality of conductive portions 220 exposed by the holes 252. At this time, the cover layer 230 may also be formed on the side surface of the protruding portion 222. The method of forming the conductive metal cap layer 230 is the same as described in the previous embodiment.

最後,從絕緣支撐部分210的上表面卸除遮蓋膜250,進而移除形成於遮蓋膜250的上表面之上的覆蓋層230。因此,留下 覆蓋於多個導電部分220的突起部分222的上表面及側表面之上的導電金屬覆蓋層230。 Finally, the cover film 250 is removed from the upper surface of the insulating support portion 210, thereby removing the cover layer 230 formed over the upper surface of the cover film 250. So leave A conductive metal cap layer 230 overlying the upper surface and the side surface of the protruding portion 222 of the plurality of conductive portions 220.

由此,便完成製造具有如圖6所示結構的導電連接器200。 Thus, the fabrication of the conductive connector 200 having the structure shown in FIG. 6 is completed.

圖14及15繪示出導電連接器的製造方法示意圖,其依據圖7中所示的本發明的又一實施方式。 14 and 15 are schematic views showing a method of manufacturing a conductive connector in accordance with still another embodiment of the present invention shown in FIG.

由於依據本發明的又一實施方式的導電連接器300,其製造方法類似於前述所述依據本發明的另一實施方式的導電連接器200的製造方法,因此以下描述將著重於前述方法與後述方法的差異處。 Since the conductive connector 300 according to still another embodiment of the present invention is manufactured in a manner similar to the above-described manufacturing method of the conductive connector 200 according to another embodiment of the present invention, the following description will focus on the foregoing method and the following description. The difference in the method.

首先,參考圖14,與前述所述相同的方式,形成多個包括突起部分322的導電部分320以及絕緣支撐部分310。 First, referring to FIG. 14, in the same manner as described above, a plurality of conductive portions 320 including the protruding portions 322 and insulating support portions 310 are formed.

此外,引導膜340附接在絕緣支撐部分310的上表面,其形成有可使導電部分320的突起部分322插入於其中的多個孔洞342。於此,引導膜340可具有與突起部分322相同的高度,且多個孔洞342的直徑可形成為大於導電部分320的突起部分322的直徑。 Further, a guide film 340 is attached to the upper surface of the insulating support portion 310, which is formed with a plurality of holes 342 into which the protruding portion 322 of the conductive portion 320 can be inserted. Here, the guide film 340 may have the same height as the protruding portion 322, and the diameter of the plurality of holes 342 may be formed to be larger than the diameter of the protruding portion 322 of the conductive portion 320.

接著,遮蓋膜350附接於引導膜340的上表面。多個孔352形成於遮蓋膜350中,且多個導電部分320的突起部分322藉由多個孔352而暴露。多個孔352的直徑可形成為等同於引導膜340的孔洞342的直徑。換句話說,多個孔352的直徑可形成為等於或大於導電部分320的突起部分322的直徑。由於遮蓋膜 350的材料以及形成孔352的方法相同於前述實施方式中所述,因此將省略其詳細的描述。 Next, the mask film 350 is attached to the upper surface of the guide film 340. A plurality of holes 352 are formed in the cover film 350, and the protruding portions 322 of the plurality of conductive portions 320 are exposed by the plurality of holes 352. The diameter of the plurality of holes 352 may be formed to be equivalent to the diameter of the hole 342 of the guide film 340. In other words, the diameter of the plurality of holes 352 may be formed to be equal to or larger than the diameter of the protruding portion 322 of the conductive portion 320. Cover film The material of 350 and the method of forming the hole 352 are the same as those described in the foregoing embodiment, and thus a detailed description thereof will be omitted.

接著,如圖15所示,導電金屬覆蓋層330形成於遮蓋膜350的上表面之上,以及藉由孔352而暴露的多個導電部分320的上表面之上。此時,覆蓋層330亦可能形成於突起部分322的側表面之上。形成導電金屬覆蓋層330的方法相同於前述實施方式中所述。 Next, as shown in FIG. 15, a conductive metal cap layer 330 is formed over the upper surface of the mask film 350, and over the upper surface of the plurality of conductive portions 320 exposed by the holes 352. At this time, the cover layer 330 may also be formed on the side surface of the protruding portion 322. The method of forming the conductive metal cap layer 330 is the same as described in the foregoing embodiments.

最後,從引導膜340的上表面卸除遮蓋膜350,進而移除形成於遮蓋膜350的上表面之上的覆蓋層330。因此,留下覆蓋於多個導電部分320的突起部分322的上表面及側表面之上的導電金屬覆蓋層330。 Finally, the cover film 350 is removed from the upper surface of the guide film 340, thereby removing the cover layer 330 formed on the upper surface of the cover film 350. Therefore, the conductive metal cap layer 330 overlying the upper surface and the side surface of the protruding portion 322 of the plurality of conductive portions 320 is left.

由此,便完成製造具有如圖7所示結構的導電連接器300。 Thereby, the fabrication of the conductive connector 300 having the structure shown in FIG. 7 is completed.

基於上述,依據前述本發明的一個或多個的實施方式,在導電連接器中,導電金屬覆蓋層形成於導電部分的上表面之上,進而增加其與測試目標裝置的端子的接觸區域。因此,減少測試目標裝置的端子以及導電部分之間的電接觸電阻,且電連接穩定。因此,可改善導電連接器的可靠性,以及判別測試目標裝置的高品質產品的能力。 Based on the above, in accordance with one or more embodiments of the foregoing invention, in the conductive connector, a conductive metal cap layer is formed over the upper surface of the conductive portion, thereby increasing its contact area with the terminal of the test target device. Therefore, the electrical contact resistance between the terminals of the test target device and the conductive portion is reduced, and the electrical connection is stabilized. Therefore, the reliability of the conductive connector can be improved, and the ability to test the high quality product of the target device can be discriminated.

此外,由於導電部分的上表面覆蓋有較導電部分硬的覆蓋層,因此而可防止因導電部分以及測試目標裝置的端子之間直接接觸所引起的磨損及損壞,且亦可防止由外來材料所引起導電 部分的汙染或損壞。因此,導電連接器的壽命而可延長。 In addition, since the upper surface of the conductive portion is covered with a harder covering layer than the conductive portion, abrasion and damage caused by direct contact between the conductive portion and the terminal of the test target device can be prevented, and the foreign material can also be prevented. Causing conduction Part of the pollution or damage. Therefore, the life of the conductive connector can be extended.

應理解的是,於此描述的示例性實施方式僅應理解為描述性意義,而非用以限制之目的。通常應可理解每個實施方式中所描述的特徵以及觀點,可應用於其他實施方式中的其他類似的特徵或觀點。 It is understood that the exemplary embodiments described herein are to be understood as illustrative only and not limiting. The features and aspects described in each embodiment are generally understood to be applicable to other similar features or aspects in other embodiments.

雖然本發明的一個或多個實施方式參考附圖而描述,然而,本領域的通常知識者應可理解的是,可在不脫離本發明的精神以及以下所限定的申請專利範圍的情況下,作各種形式上及細節上的變化。 Although one or more embodiments of the present invention are described with reference to the drawings, it will be understood by those of ordinary skill in the art that, without departing from the spirit of the invention, Make changes in various forms and details.

100‧‧‧導電連接器 100‧‧‧Electrical connector

110‧‧‧絕緣支撐部分 110‧‧‧Insulation support

120‧‧‧導電部分 120‧‧‧Electrical part

120a‧‧‧導電粒子 120a‧‧‧ conductive particles

130‧‧‧覆蓋層 130‧‧‧ Coverage

20‧‧‧測試目標裝置 20‧‧‧Test target device

22‧‧‧端子 22‧‧‧ Terminal

30‧‧‧測試裝置 30‧‧‧Testing device

32‧‧‧焊墊 32‧‧‧ solder pads

Claims (15)

一種導電連接器,設置於測試目標裝置以及測試裝置之間,並使所述測試目標裝置的端子以及所述測試裝置的焊墊彼此電連接,所述導電連接器包括:多個導電部分,設置於對應所述測試目標裝置的所述端子的位置,且由其中導電粒子排列於垂直方向中的彈性材料所形成;絕緣支撐部分,當支撐所述多個導電部分時,使所述多個導電部分彼此絕緣;以及導電金屬覆蓋層,形成於所述多個導電部分的上表面之上,其中所述多個導電部分形成為自所述絕緣支撐部分的上表面向上突起,以及所述導電金屬覆蓋層形成於所述多個導電部分的突起部分的上表面及側表面之上。 a conductive connector disposed between the test target device and the test device, and electrically connecting the terminal of the test target device and the solder pads of the test device to each other, the conductive connector comprising: a plurality of conductive portions, setting And corresponding to the position of the terminal of the test target device, and formed by an elastic material in which the conductive particles are arranged in a vertical direction; and an insulating support portion that makes the plurality of conductive materials when supporting the plurality of conductive portions Partially insulated from each other; and a conductive metal coating layer formed over the upper surface of the plurality of conductive portions, wherein the plurality of conductive portions are formed to protrude upward from an upper surface of the insulating support portion, and the conductive metal A cover layer is formed over the upper surface and the side surface of the protruding portion of the plurality of conductive portions. 如申請專利範圍第1項所述的導電連接器,其中所述導電金屬覆蓋層形成為具有相較於所述多個導電部分更大的直徑。 The conductive connector of claim 1, wherein the conductive metal cover layer is formed to have a larger diameter than the plurality of conductive portions. 如申請專利範圍第1項所述的導電連接器,更包括引導膜,附接於所述絕緣支撐部分的所述上表面,並引導所述測試目標裝置的端子至所述多個導電部分的中心,其中多個孔洞形成於所述引導膜中,所述多個導電部分的所述突起部分插入其中。 The conductive connector of claim 1, further comprising a guiding film attached to the upper surface of the insulating support portion and guiding the terminal of the test target device to the plurality of conductive portions a center in which a plurality of holes are formed in the guide film, and the protruding portions of the plurality of conductive portions are inserted therein. 如申請專利範圍第1或3項所述的導電連接器,其中所述 導電金屬覆蓋層具有約0.1μm至約10μm的厚度。 The conductive connector of claim 1 or 3, wherein The conductive metal cap layer has a thickness of from about 0.1 μm to about 10 μm. 如申請專利範圍第1或3項所述的導電連接器,所述導電金屬覆蓋層的導電金屬包括至少由鐵、鎳、鉻、金、銀、銅、鉑、及其合金所組成的群組中擇一者。 The conductive connector of claim 1 or 3, wherein the conductive metal of the conductive metal cover layer comprises a group of at least iron, nickel, chromium, gold, silver, copper, platinum, and alloys thereof. Choose one of them. 如申請專利範圍第1或3項所述的導電連接器,其中所述導電金屬覆蓋層由導電金屬奈米粒子所形成。 The conductive connector of claim 1 or 3, wherein the conductive metal coating layer is formed of conductive metal nanoparticles. 如申請專利範圍第6項所述的導電連接器,其中所述導電金屬奈米粒子的平均粒子直徑約為10nm至約100nm。 The conductive connector of claim 6, wherein the conductive metal nanoparticles have an average particle diameter of from about 10 nm to about 100 nm. 一種製造如申請專利範圍第1項所述的導電連接器的方法,所述方法包括:將包括導電粒子的液態彈性體而製成的模製材料注入模型的模製空間中;對注入模型的模製空間中的所述模製材料於垂直方向上施加磁場以使所述導電粒子於垂直方向上排列;藉由硬化所述模製材料而形成所述多個導電部分以及所述絕緣支撐部分;以及形成所述導電金屬覆蓋層於所述多個導電部分的所述上表面之上,其中所述形成所述導電金屬覆蓋層包括:附接遮蓋膜,其中形成暴露所述多個導電部分的孔於所述絕緣支撐部分的上表面;形成所述導電金屬覆蓋層於所述遮蓋膜的上表面之上,以及藉由所述孔而暴露的所述多個導電部分的所述上表面之上;以及 從所述絕緣支撐部分的所述上表面移除所述遮蓋膜,以移除形成於所述遮蓋膜的所述上表面之上的所述導電金屬覆蓋層,其中所述多個導電部分形成為向上突起於所述絕緣支撐部分的所述上表面,以及所述導電金屬覆蓋層形成於所述多個導電部分的突起部分的上表面及側表面之上。 A method of manufacturing a conductive connector according to claim 1, wherein the method comprises: injecting a molding material made of a liquid elastomer including conductive particles into a molding space of a model; The molding material in the molding space applies a magnetic field in a vertical direction to align the conductive particles in a vertical direction; forming the plurality of conductive portions and the insulating support portion by hardening the molding material And forming the conductive metal cap layer over the upper surface of the plurality of conductive portions, wherein the forming the conductive metal cap layer comprises: attaching a mask film, wherein forming the plurality of conductive portions is exposed a hole in an upper surface of the insulating support portion; forming the conductive metal cover layer on an upper surface of the cover film, and the upper surface of the plurality of conductive portions exposed by the hole Above; and Removing the cover film from the upper surface of the insulating support portion to remove the conductive metal cover layer formed over the upper surface of the cover film, wherein the plurality of conductive portions are formed The upper surface of the insulating support portion is protruded upward, and the conductive metal cover layer is formed on the upper surface and the side surface of the protruding portion of the plurality of conductive portions. 如申請專利範圍第8項所述的方法,其中所述導電金屬覆蓋層形成為具有較所述多個導電部分更大的直徑。 The method of claim 8, wherein the conductive metal cover layer is formed to have a larger diameter than the plurality of conductive portions. 如申請專利範圍第8項所述的方法,更包括附接引導膜於所述絕緣支撐部分的所述上表面,以引導所述測試目標裝置的所述端子至所述多個導電部分的中心,其中於所述引導膜中形成有多個孔洞,其中所述多個導電部分的所述突起部分插入於其中。 The method of claim 8, further comprising attaching a guiding film to the upper surface of the insulating support portion to guide the terminal of the test target device to a center of the plurality of conductive portions Wherein a plurality of holes are formed in the guiding film, wherein the protruding portions of the plurality of conductive portions are inserted therein. 如申請專利範圍第8項所述的方法,其中形成於所述遮蓋膜中的所述孔具有大於或等於所述多個導電部分的直徑。 The method of claim 8, wherein the holes formed in the cover film have a diameter greater than or equal to the plurality of conductive portions. 如申請專利範圍第8項所述的方法,其中所述遮蓋膜由聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、三乙酸纖維素(triacetate cellulous,TAC)、乙烯/醋酸乙烯酯共聚合物(ethylene vinyl acetate,EVA)、聚丙烯(polypropylene,PP)、或聚碳酸酯(polycarbonate,PC)、薄銅片、薄鋁片、以及薄不銹鋼片所組成的群組的材料中擇一而形成。 The method of claim 8, wherein the cover film comprises polyimide (PI), polyethylene terephthalate (PET), triacetate cellulous. , TAC), ethylene vinyl acetate (EVA), polypropylene (PP), or polycarbonate (PC), thin copper, thin aluminum, and thin stainless steel One of the materials of the group formed is formed. 如申請專利範圍第8項所述的方法,其中所述導電金屬 層形成為具有大約0.1μm至約10μm的厚度。 The method of claim 8, wherein the conductive metal The layer is formed to have a thickness of about 0.1 μm to about 10 μm. 如申請專利範圍第8項所述的方法,其中所述形成所述導電金屬覆蓋層包括依據印刷法而藉由提供導電金屬膠於所述遮蓋膜的所述上表面,以及所述多個導電部分的所述上表面,以形成所述導電金屬覆蓋層,接著乾燥所提供的所述導電金屬膠。 The method of claim 8, wherein the forming the conductive metal cover layer comprises providing the conductive metal paste to the upper surface of the cover film according to a printing method, and the plurality of conductive Part of the upper surface to form the conductive metal cover layer, followed by drying the provided conductive metal paste. 如申請專利範圍第8項所述的方法,其中所述形成所述導電金屬覆蓋層包括藉由噴灑導電金屬奈米粒子的水溶液而提供所述水溶液於所述遮蓋膜的所述上表面,以及所述導電部分的所述上表面,接著乾燥所提供的所述水溶液以形成所述導電金屬覆蓋層。 The method of claim 8, wherein the forming the conductive metal coating layer comprises providing the aqueous solution to the upper surface of the cover film by spraying an aqueous solution of conductive metal nanoparticles, and The upper surface of the conductive portion is then dried to provide the aqueous solution to form the conductive metal cap layer.
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