TWI504970B - Ultraviolet radiation device - Google Patents

Ultraviolet radiation device Download PDF

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TWI504970B
TWI504970B TW100105643A TW100105643A TWI504970B TW I504970 B TWI504970 B TW I504970B TW 100105643 A TW100105643 A TW 100105643A TW 100105643 A TW100105643 A TW 100105643A TW I504970 B TWI504970 B TW I504970B
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Taiwan
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light source
light
air
space portion
liquid crystal
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TW100105643A
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Chinese (zh)
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TW201213930A (en
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Noritaka Takezoe
Shingo Sato
Shinichi Endo
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Ushio Electric Inc
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841Barrier, adhesion or liner layers
    • H01L21/76853Barrier, adhesion or liner layers characterized by particular after-treatment steps
    • H01L21/76861Post-treatment or after-treatment not introducing additional chemical elements into the layer
    • H01L21/76862Bombardment with particles, e.g. treatment in noble gas plasmas; UV irradiation

Description

紫外線照射裝置Ultraviolet irradiation device

本發明係關於例如液晶面板的製造工程中所使用之紫外線照射裝置。The present invention relates to an ultraviolet irradiation device used in, for example, a manufacturing process of a liquid crystal panel.

液晶面板70係如圖8所示,為於兩張玻璃板之間封入液晶的構造,例如,於一面形成多數主動元件(例如薄膜電晶體:TFT)72及液晶驅動用電極(透明電極:ITO)73,進而於其上形成配向膜74的第1玻璃板71,與於一面形成彩色濾光片76、透明電極77及配向膜78的第2玻璃板,以經由間隔物構件79而一面彼此相互對向之方式配置,並於第1玻璃板71及第2玻璃板72之間形成液晶層70而構成。As shown in FIG. 8, the liquid crystal panel 70 has a structure in which liquid crystal is sealed between two glass plates. For example, a plurality of active devices (for example, thin film transistor: TFT) 72 and liquid crystal driving electrodes (transparent electrodes: ITO) are formed on one surface. 73, the first glass plate 71 on which the alignment film 74 is formed, and the second glass plate on which the color filter 76, the transparent electrode 77, and the alignment film 78 are formed, via the spacer member 79, while facing each other The liquid crystal layer 70 is formed between the first glass plate 71 and the second glass plate 72 so as to be disposed opposite to each other.

於此種液晶面板70的製造工程中,公知有藉由對於還有對紫外線反應而聚合之光學活性物質(單體)的液晶之液晶面板,照射紫外線,進行液晶面板材的反應處理(預傾角發現處理,PSVA)之技術(參照專利文獻1)。於此技術中,利用一邊施加電壓,一邊將紫外線對液晶面板照射,可在使液晶配向於特定方向之狀態下使光學活性物質聚合,藉此,可賦予液晶所謂預傾角。In the manufacturing process of the liquid crystal panel 70, it is known that a liquid crystal panel of a liquid crystal having an optically active substance (monomer) polymerized by reacting with ultraviolet rays is irradiated with ultraviolet rays to perform a reaction treatment of a liquid crystal panel (pretilt angle). The technique of the treatment, PSVA) was found (refer to Patent Document 1). In this technique, by applying ultraviolet light to the liquid crystal panel while applying a voltage, the optically active material can be polymerized while the liquid crystal is aligned in a specific direction, whereby the so-called pretilt angle of the liquid crystal can be imparted.

於此種利用紫外線之液晶面板材的反應處理(PSVA)中,需要對於液晶之光學活性物質,以高照度照射紫外線之外,被要求液晶之光學活性物質不會暴露於高溫度下。In the reaction treatment (PSVA) of such a liquid crystal panel material using ultraviolet rays, it is required that the optically active material of the liquid crystal is irradiated with ultraviolet light with high illuminance, and the optically active material of the liquid crystal is required not to be exposed to a high temperature.

光學活性物質的反應速度係溫度依存性較高,照射中的溫度較高時則會過度聚合而使聚合物顆粒的成長過大。於是因為沒有均勻的預傾角而對比變差,會造成漏光。The reaction rate of the optically active material is high in temperature dependency, and when the temperature during irradiation is high, the polymerization proceeds excessively and the growth of the polymer particles is excessively large. Therefore, because there is no uniform pretilt angle, the contrast is deteriorated, which causes light leakage.

進而,液晶面板材之光照射面中產生溫度不均勻的話,光學活性物質的反應會產生偏差(差離),使液晶的傾斜(預傾角)也產生不均,此液晶之傾斜不均在成品時會造成濃淡不均。Further, when temperature unevenness occurs in the light-irradiated surface of the liquid crystal panel, the reaction of the optically active material is deviated (difference), and the tilt (pretilt angle) of the liquid crystal is also uneven, and the tilt of the liquid crystal is uneven in the finished product. It will cause unevenness.

如上所述,於液晶面板的製造工程中,在進行利用紫外線之液晶面板材的反應處理時,雖然被要求(1)將波長300~350nm的紫外線照射液晶面板,(2)液晶面板材的光照射面之紫外線照射的面內均勻性較高,(3)液晶面板材的溫度上升較少,液晶面板材的光照射面之溫度的面內均勻性較高,但是,不會對光學活性物質造成壞影響,可進行所希望之液晶面板材的反應處理的紫外線照射裝置並未被公知也是實情。As described above, in the manufacturing process of the liquid crystal panel, when the reaction treatment of the liquid crystal panel material using ultraviolet rays is performed, it is required to (1) irradiate ultraviolet light having a wavelength of 300 to 350 nm to the liquid crystal panel, and (2) light of the liquid crystal panel material. The in-plane uniformity of the ultraviolet irradiation on the irradiated surface is high, (3) the temperature rise of the liquid crystal panel is small, and the in-plane uniformity of the temperature of the light-irradiated surface of the liquid crystal panel is high, but the optically active substance is not An ultraviolet irradiation device which can cause a bad reaction and can perform a reaction treatment of a desired liquid crystal panel is not known.

[先前技術文獻][Previous Technical Literature]

[專利文獻][Patent Literature]

[專利文獻1] 日本特開2003-177408號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-177408

本發明係為了解決以上問題所發明者,目的為提供被處理對象物的光照射面之紫外線照度的面內均勻性較高,而且,被處理對象物的溫度上升較少,可進行被處理對象物的光照射面之溫度的面內均勻性高之紫外線照射處理的紫外線照射裝置。The present invention has been made to solve the above problems, and an object of the present invention is to provide an in-plane uniformity of ultraviolet illuminance on a light-irradiated surface of an object to be processed, and a temperature rise of the object to be processed is small, and the object to be processed can be processed. An ultraviolet irradiation device for ultraviolet irradiation treatment in which the in-plane uniformity of the temperature of the light-irradiated surface of the object is high.

本發明的紫外線照射裝置,係於包含光學活性物質之液晶面板的製造工程中所使用的紫外線照射裝置,其特徵為具備:光源單元,係分別放射於波長300nm~400nm中具有發光峰值的光之長條狀的準分子燈,及藉由在該準分子燈插通於內部之狀態下設置,且於具有透光性之兩端具有開口的筒狀之長條狀的外套管所構成之複數光源元件與身為被處理對象物的液晶面板材對向而並列排列所成;及冷卻機構,係具有導風用空間部及排風用空間部;前述光源元件個別之外套管的一端開口位於共通的導風用空間部,並且另一端開口位於共通的排風用空間部,對前述光源元件個別之外套管的內部,透過導風用空間部,導入冷卻風。The ultraviolet irradiation device of the present invention is an ultraviolet irradiation device used in a manufacturing process of a liquid crystal panel including an optically active material, and is characterized in that it includes a light source unit that emits light having an emission peak at a wavelength of 300 nm to 400 nm. a strip-shaped excimer lamp, and a plurality of tubular elongated outer sleeves provided in a state in which the excimer lamp is inserted inside, and having an opening at both ends of the light transmissive property The light source element is arranged in parallel with the liquid crystal panel which is the object to be processed, and the cooling mechanism has a space for guiding the air and a space for exhausting the air; The common air guiding space portion is located in the common air outlet space portion, and the inside of the casing other than the light source element is transmitted through the air guiding space portion to introduce the cooling air.

於本發明的紫外線照射裝置中,設為於前述光源單元與被處理對象物之間,具備由內周面藉由反射面所形成之空間所成的光導引部之構造為佳。In the ultraviolet irradiation device of the present invention, it is preferable that the light source unit and the object to be processed have a structure in which a light guiding portion formed by a space formed by a reflecting surface of the inner peripheral surface is formed.

進而,於本發明的紫外線照射裝置中,設為於前述冷卻機構中,藉由前述導風用空間部及排風用空間部,形成循環冷卻風流通路徑,於該循環冷卻風流通路徑,配置有 放熱用的熱交換器之構造為佳。Further, in the ultraviolet irradiation device of the present invention, in the cooling mechanism, the air-conditioning space portion and the air-exhausting space portion form a circulating cooling air circulation path, and the circulating cooling air circulation path is disposed. Have The heat exchanger for heat release is preferably constructed.

依據本發明的紫外線照射裝置,基本上,藉由複數光源元件被並列配置來構成光源單元,可對於被處理對象物,以均勻的照度分布,照射特定波長帶的紫外線。According to the ultraviolet irradiation apparatus of the present invention, basically, the plurality of light source elements are arranged side by side to constitute the light source unit, and ultraviolet rays of a specific wavelength band can be irradiated to the object to be processed with a uniform illuminance distribution.

而且,於各光源元件中,藉由外套管以其內部插通燈之狀態下設置,利用外套管所致之冷卻風導風功能,可直接冷卻燈的發光管,故複數燈每個燈都被均勻冷卻,可將來自燈本身的對於被處理對象物的放射熱之偏差抑制成較低,並且可抑制熱線對於被處理對象物照射,又,外套管其本身也藉由冷卻風冷卻,故可抑制對於被處理對象物的放射熱,例如,成為適合作為液晶面板的製造工程之液晶面板的反應處理(預傾角發現處理)中所使用之紫外線照射裝置者。Moreover, in each of the light source elements, the outer sleeve is disposed with the lamp inserted therein, and the cooling air guiding function by the outer sleeve can directly cool the light tube of the lamp, so each of the plurality of lamps When it is uniformly cooled, the deviation of the radiant heat from the lamp itself with respect to the object to be processed can be suppressed to be low, and the heat ray can be suppressed from being irradiated to the object to be processed, and the outer casing itself is also cooled by the cooling air. It is possible to suppress the radiant heat of the object to be processed, for example, an ultraviolet ray irradiation device used in a reaction process (pretilt angle finding process) of a liquid crystal panel which is a manufacturing process of a liquid crystal panel.

又,藉由設為更具備內周面是藉由反射面所形成之空間所成的光導引部的構造,可一邊充分確保對於被處理對象物的紫外線照射量,一邊擴大光源單元與被處理對象物之間的離開距離,故可更確實抑制光源單元的放射熱所致之影響,可降低被處理對象物的溫度上升,並且可抑制被處理對象物的面內之溫度不均勻性。In addition, by providing a structure in which the inner peripheral surface is a light guiding portion formed by the space formed by the reflecting surface, the light source unit and the light source unit can be enlarged while sufficiently ensuring the amount of ultraviolet irradiation to the object to be processed. Since the distance between the objects to be processed is determined, the influence of the radiation heat of the light source unit can be more reliably suppressed, the temperature rise of the object to be processed can be lowered, and the temperature unevenness in the surface of the object to be processed can be suppressed.

進而,藉由設為使用準分子燈的構造,因為不放射多餘的光成分,可確實降低被處理對象物的溫度上升之程度。Further, by using a structure in which an excimer lamp is used, it is possible to surely reduce the temperature rise of the object to be processed because no unnecessary light component is emitted.

進而,藉由設為冷卻機構具備熱交換器的構造,可形成密閉系的冷卻風循環供給路徑,即使在將紫外線照射裝置例如在無塵室內使用時,也不需要準備導管等,可簡潔地冷卻燈。Further, by providing a structure in which the cooling mechanism includes the heat exchanger, it is possible to form a sealed cooling air circulation supply path, and it is not necessary to prepare a duct or the like even when the ultraviolet irradiation apparatus is used in a clean room, for example, and it is succinctly Cool the lights.

圖1係揭示從正面方向觀看本發明之紫外線照射裝置的一構造例之內部構造的概略的說明圖,圖2係揭示從一側面方向觀看圖1所示之紫外線照射裝置之內部構造的概略的說明圖。1 is a schematic view showing an internal structure of a structure example of the ultraviolet irradiation device of the present invention viewed from the front direction, and FIG. 2 is a view showing an outline of the internal structure of the ultraviolet irradiation device shown in FIG. 1 viewed from a side surface direction. Illustrating.

此紫外線照射裝置係大致上由光源部10、冷卻部40、光導引部50及電源部60所構成。This ultraviolet irradiation device is basically constituted by the light source unit 10, the cooling unit 40, the light guiding unit 50, and the power supply unit 60.

光源部10係具備具有於下方開口之光照射用開口12的整體為箱型形狀的光源部殼體構件11,此光源部殼體構件11係其內部空間於上下方向被區分,下方側空間部為配置光源單元20的光源單元配置空間部15,並且上方側空間部為對應光源單元20之例如配置有變壓器35等的電裝體的電裝體配置空間部16。The light source unit 10 includes a light source unit case member 11 having a box shape in which the entire light irradiation opening 12 is opened downward. The light source unit case member 11 has its internal space divided in the vertical direction and the lower side space portion. The space unit 15 is disposed in the light source unit in which the light source unit 20 is disposed, and the upper side space portion is an electrical component arrangement space portion 16 corresponding to the electrical component unit of the light source unit 20, for example, a transformer 35 or the like.

又,於光源部殼體構件11內之構成光源單元20的燈25的長邊方向之一端側區域,具有藉由構成電裝體配置空間部16之一端側間隔壁13與光源部殼體構件11的一端壁11A來區分,而形成之用以將冷卻風導入至電裝體配置空間部16及光源單元配置空間部15個別之共通的導風用空間部18,並且於光源部殼體構件11內之燈的長邊方向之另一端側區域,具有藉由構成電裝體配置空間部16的另一端側間隔壁14與光源部殼體構件11的另一端壁11B來區分,而形成之共通的排風用空間部19。Further, one end side region in the longitudinal direction of the lamp 25 constituting the light source unit 20 in the light source unit case member 11 has an end side partition wall 13 and a light source portion housing member which constitute one of the electrical component arrangement space portions 16. The one end wall 11A of the eleventh portion 11 is formed to introduce the cooling air into the common air guiding space portion 18 of the electrical component arrangement space portion 16 and the light source unit arrangement space portion 15, and the light source portion housing member The other end side region in the longitudinal direction of the lamp in the eleventh portion is formed by distinguishing the other end side partition wall 14 constituting the electrical component arrangement space portion 16 from the other end wall 11B of the light source portion casing member 11 A common air exhaust space portion 19.

於形成電裝體配置空間部16的一端側間隔壁13,形成有用以將冷卻風導入至電裝體配置空間部16的導風用通風口13A,於形成電裝體配置空間部16的另一端側間隔壁14,形成有用以將冷卻風從電裝體配置空間部16排出的排風用通風口14A。The one end side partition wall 13 of the electrical component arrangement space portion 16 is formed, and the air guiding vent 13A for introducing the cooling air into the electrical component arrangement space portion 16 is formed to form the electrical component arrangement space portion 16 The one end side partition wall 14 forms an exhaust vent 14A for discharging the cooling air from the electrical component arrangement space portion 16.

光源單元20係如圖3所示,分別放射於波長300nm~400nm中具有發光峰值的光之長條狀的燈25,及藉由在此燈25插通於內部之狀態下沿著燈25設置之長條狀的外套管(筒狀套)24所構成之複數光源元件21在例如各個燈25的軸中心位於相同平面,並且相互平行延伸之狀態下,每等間隔並列配置而構成。As shown in FIG. 3, the light source unit 20 is an elongated lamp 25 that emits light having an emission peak in a wavelength of 300 nm to 400 nm, and is disposed along the lamp 25 in a state where the lamp 25 is inserted inside. The plurality of light source elements 21 formed of the long outer sleeves (cylindrical sleeves) 24 are configured such that the axial center of each of the lamps 25 is located on the same plane and extends in parallel with each other at equal intervals.

構成各個光源元件21的燈25,係經由燈保持部22,被保持固定於光源部殼體構件11,又,外套管24係在其一端開口位於導風用空間部18之狀態下,經由未圖示之保持構件,固定保持於光源部殼體構件11。The lamp 25 constituting each of the light source elements 21 is held and fixed to the light source unit case member 11 via the lamp holding portion 22, and the outer tube 24 is in a state in which one end opening is located in the air guiding space portion 18, and The holding member shown in the figure is fixedly held by the light source unit case member 11.

構成光源單元20的光源元件21的數量係例如32個,鄰接之光源元件21的離間距離p係例如90mm。The number of the light source elements 21 constituting the light source unit 20 is, for example, 32, and the distance d between the adjacent light source elements 21 is, for example, 90 mm.

構成光源單元20的燈25係例如藉由準分子燈所構成,例如,放射合適於使液晶面板材之液晶所包含之光學活性物質(單體)聚合的波長之300nm~400nm的紫外光。The lamp 25 constituting the light source unit 20 is constituted by, for example, an excimer lamp, and emits, for example, ultraviolet light having a wavelength of 300 nm to 400 nm suitable for polymerizing an optically active substance (monomer) contained in a liquid crystal of a liquid crystal panel.

圖4係揭示本發明的紫外線照射裝置中所使用之燈相關的準分子燈之一構造例,(A)立體圖,(B)揭示垂直於燈的長邊方向之剖面的剖面圖。Fig. 4 is a view showing a configuration example of a lamp-related excimer lamp used in the ultraviolet irradiation device of the present invention, (A) a perspective view, and (B) a cross-sectional view showing a cross section perpendicular to the longitudinal direction of the lamp.

此準分子燈25係於內部具備形成放電空間S之剖面矩形狀的中空長條狀的放電容器26,於此放電容器26的內部,作為放電用氣體,例如封入氙氣。在此,放電容器26例如由石英玻璃所成。The excimer lamp 25 is provided with a hollow elongated discharge vessel 26 having a rectangular cross section in which the discharge space S is formed. Inside the discharge vessel 26, for example, helium gas is sealed as a discharge gas. Here, the discharge vessel 26 is made of, for example, quartz glass.

於放電容器26之上壁26A及下壁26B個別的外表面,一對網狀的電極,亦即,作為高電壓供電電極而作用之一方的電極27A及作為接地電極而作用之另一方的電極27B以延伸於長邊方向之方式相互對向而配置。On the outer surface of the upper wall 26A and the lower wall 26B of the discharge vessel 26, a pair of mesh electrodes, that is, an electrode 27A which functions as a high voltage power supply electrode and an electrode which functions as a ground electrode 27B is disposed to face each other in such a manner as to extend in the longitudinal direction.

又,於放電容器26之除了下壁26B的壁面之內表面,在從外面側依序反射材層30、玻璃粉末層31及螢光體層32在被層積之狀態下設置,於形成光射出面之放電容器26的下壁26B之內表面,玻璃粉末層31及螢光體層32再被層積之狀態下設置。Further, in the inner surface of the wall surface of the lower wall 26B of the discharge vessel 26, the material layer 30, the glass powder layer 31, and the phosphor layer 32 are sequentially laminated from the outer surface side to be formed in a state where light is emitted. The inner surface of the lower wall 26B of the surface discharge vessel 26 is provided in a state in which the glass powder layer 31 and the phosphor layer 32 are further laminated.

反射材層30係例如藉由氧化矽與氧化鋁的混合物所構成。又,作為構成玻璃粉末層31的玻璃,例如可例示硼矽酸玻璃(Si-B-O系玻璃)及矽酸鋁玻璃(Si-Al-O系玻璃)、矽酸鋇玻璃,或者以該等任一組成為基準添加鹼土類氧化物或鹼金屬氧化物、金屬氧化物的玻璃等。The reflective material layer 30 is composed of, for example, a mixture of cerium oxide and aluminum oxide. In addition, examples of the glass constituting the glass powder layer 31 include borosilicate glass (Si-BO-based glass), aluminum silicate glass (Si-Al-O-based glass), bismuth citrate glass, or the like. A group of glass to which an alkaline earth oxide or an alkali metal oxide or a metal oxide is added as a standard is used.

又,作為構成螢光層32的螢光體,例如可例示銪賦活硼酸鍶(Sr-B-O:Eu(以下稱為「SBE」),中心波長368nm)螢光體、鈰賦活鋁酸鎂鑭(La-Mg-Al-O:Ce(以下稱為「LAM」),中心波長338nm(但是broad))螢光體、釓、鐠賦活磷酸鑭(La-P-O:Gd,Pr(以下稱為「LAP:Pr,Gd」),中心波長311nm)螢光體等。In addition, examples of the phosphor constituting the phosphor layer 32 include an endowment live lanthanum borate (Sr-BO: Eu (hereinafter referred to as "SBE"), a center wavelength of 368 nm) phosphor, and an endowurance magnesium aluminate strontium ( La-Mg-Al-O: Ce (hereinafter referred to as "LAM"), center wavelength 338 nm (but broad)) Phosphor, yttrium, and yttrium-activated yttrium phosphate (La-PO: Gd, Pr (hereinafter referred to as "LAP") :Pr, Gd"), center wavelength 311 nm) phosphor or the like.

外套管24係例如可透過300nm~400nm之波長帶的光之透光性材料,例如由石英玻璃所成的圓筒狀者,具有與燈25幾近相同之長度。The outer sleeve 24 is, for example, a light transmissive material that transmits light in a wavelength band of 300 nm to 400 nm, for example, a cylindrical shape made of quartz glass, and has a length nearly the same as that of the lamp 25.

又,構成形成於外套管24的內面與燈25的外面之間的冷卻風流通路徑24A之空隙的最小間隔部分之大小係例如16~30mm。Further, the size of the smallest space portion constituting the gap between the inner surface of the outer tube 24 and the outer surface of the lamp 25 and the cooling air flow path 24A is, for example, 16 to 30 mm.

冷卻部40係例如具備設置於光源部殼體構件11的上部之光源元件21的排列方向中央位置之箱型形狀的冷卻部殼體構件41,於此冷卻部殼體構件41的內部,例如配置有軸流風扇等的冷卻風扇42、於該冷卻風扇42的上流側中,例如配置有水冷散熱器等之放熱用的熱交換器43。The cooling unit 40 includes, for example, a box-shaped cooling unit case member 41 provided at a central position of the light source element 21 in the upper direction of the light source unit case member 11 , and the inside of the cooling unit case member 41 is disposed, for example. A cooling fan 42 such as an axial fan or the like, and a heat exchanger 43 for heat dissipation such as a water-cooled radiator is disposed on the upstream side of the cooling fan 42.

此冷卻部殼體構件41的內部空間,係經由分別設置於冷卻部殼體構件41的兩側之通風導管45,與光源部10之導風用空間部18及排風用空間部19連通,藉此,由冷卻風扇42供給之冷卻風經由光源部10之導風用空間部18,被導入至電裝體配置空間部16內,並且被導入至光源元件21之外套管24內,經由排風用空間部19被導入至冷卻部40之放熱用的熱交換器43,構成被閉鎖之循環冷卻風流通路徑的冷卻機構。The internal space of the cooling unit case member 41 communicates with the air guiding space portion 18 and the air exhausting space portion 19 of the light source unit 10 via the ventilation ducts 45 provided on both sides of the cooling unit case member 41, In this way, the cooling air supplied from the cooling fan 42 is introduced into the electrical component arrangement space portion 16 via the air guiding space portion 18 of the light source unit 10, and is introduced into the sleeve 24 outside the light source element 21, via the row. The air space portion 19 is introduced into the heat release heat exchanger 43 of the cooling unit 40, and constitutes a cooling mechanism for the closed circulating cooling air flow path.

光導引部50係具有一邊充分確保對於被處理對象物W的紫外線照射量,一邊用以於光源單元20與被處理對象物W之間確保充分大小的離開距離的作為所謂間隔物的功能,具有對應光源部殼體構件11之光照射用開口12的大小,以內周面藉由反射面形成之例如區分處理空間之矩形框狀之光導引構件51從光源部10的下面往下方延伸之方式安裝而構成。The light guiding unit 50 has a function as a so-called spacer for securing a sufficient distance between the light source unit 20 and the object to be processed W while sufficiently ensuring the amount of ultraviolet irradiation to the object W to be processed. The light guide opening 12 corresponding to the light source unit case member 11 has a rectangular frame-shaped light guiding member 51 formed of a reflecting surface by an inner peripheral surface, for example, which is divided into a processing space, and extends downward from the lower surface of the light source unit 10. The method is installed and constructed.

光導引構件51係如圖5所示,組合4張構件52A~52D而構成,構件52A~52D個別係藉由例如由鋁所成的基座構件53與例如由高亮度鋁所成的光反射性構件54所構成。The light guiding member 51 is configured by combining four sheets of members 52A to 52D as shown in FIG. 5. The members 52A to 52D are made of, for example, a base member 53 made of aluminum and light made of, for example, high-brightness aluminum. The reflective member 54 is constructed.

於光導引構件51之一方壁(一板狀構件52A),形成有用以將身為被處理對象物W的例如液晶面板材從位於光導引構件50的下側位準的載置面為水平之平台58搬出或搬入的搬送機器人(未圖示)之進入或退避用的開閉門55,可藉由此開閉門55的開閉,將滯留於光導引部50的熱解放至外部。圖1及圖2之符號59係平台架台。A wall surface (a plate-shaped member 52A) of the light guiding member 51 is formed so that, for example, a liquid crystal panel which is a workpiece W to be processed is placed from a lower surface of the light guiding member 50. The opening/closing door 55 for entering or retracting the transport robot (not shown) that is carried out or carried in by the horizontal platform 58 can open and close the opening and closing door 55, thereby releasing the heat accumulated in the light guiding unit 50 to the outside. The symbol 59 of Figures 1 and 2 is a platform stand.

電源部60係控制各燈25點燈者,根據重量之觀點及維護時的考量,通常與光源部10分離配置。但是,變壓器35係因產生高電壓,所以配置於光源部殼體構件11內部。The power supply unit 60 controls the lighting of each of the lamps 25, and is usually disposed separately from the light source unit 10 in view of weight and considerations during maintenance. However, since the transformer 35 generates a high voltage, it is disposed inside the light source unit case member 11.

針對前述之紫外線照射裝置的動作進行說明。The operation of the ultraviolet irradiation device described above will be described.

於此紫外線照射裝置中,平板狀的被處理對象物W(例如液晶面板構件)藉由搬送機器人,經由光導引構件51之開閉門55被搬入而載置於平台58上之狀態中,對準分子燈25之一方的27A,高頻電壓由電源部60藉由設置於電裝體配置空間部16之變壓器35升壓且被供給時,經由構成放電容器26的介電質材料,在放電空間S內產生介電質屏障放電,藉由介電質屏障放電而形成準分子,並藉由從準分子放射之光(氙氣之狀況為175nm的真空紫外光),激發構成螢光體層32的螢光體,300nm~400nm的紫外線透過放電容器26的下壁26B,並且通過另一方的電極27B之開口而放射。In the ultraviolet irradiation device, the flat object to be processed W (for example, a liquid crystal panel member) is carried by the transfer robot via the opening/closing door 55 of the light guiding member 51 and placed on the stage 58. 27A of one of the excimer lamps 25, when the high-frequency voltage is boosted and supplied by the power supply unit 60 by the transformer 35 provided in the electrical component arrangement space portion 16, the discharge is performed via the dielectric material constituting the discharge vessel 26 A dielectric barrier discharge is generated in the space S, an excimer is formed by discharge of the dielectric barrier, and the phosphor layer 32 is excited by light emitted from the excimer (vacuum ultraviolet light having a helium gas condition of 175 nm). In the phosphor, ultraviolet rays of 300 nm to 400 nm are transmitted through the lower wall 26B of the discharge vessel 26, and are radiated through the opening of the other electrode 27B.

另一方面,藉由驅動冷卻風扇42所供給之冷卻風經由光源部10之導風用空間部18,其一部份被導入至電裝體配置空間部16內,並且其他全部被導入至各光源元件21之外套管24內,具體來說,被導入至形成於外套管24的內面與準分子燈25的外面之間的冷卻風流通路徑24A內,藉此,冷卻準分子燈25及外套管24,之後,經由排風用空間部19被導入至熱交換器43而被冷卻,不會排出至裝置外部,再次,藉由冷卻風扇42供給冷卻風。On the other hand, the cooling air supplied from the driving cooling fan 42 passes through the air guiding space portion 18 of the light source unit 10, and a part thereof is introduced into the electrical component arrangement space portion 16, and all others are introduced into each. The sleeve 24 of the light source element 21 is specifically introduced into the cooling air flow path 24A formed between the inner surface of the outer sleeve 24 and the outer surface of the excimer lamp 25, thereby cooling the excimer lamp 25 and The outer sleeve 24 is then introduced into the heat exchanger 43 through the air outlet space portion 19 to be cooled, and is not discharged to the outside of the apparatus, and the cooling air is supplied again by the cooling fan 42.

然後,依據前述構造的紫外線照射裝置,複數光源元件21在位於各準分子燈25的軸中心,並且相互平行延伸之狀態下,被並列配置而構成光源單元20,藉此,基本上,對於被處理對象物W可利用均勻照度分布來照射300nm~400nm的波長帶之紫外線,而且,可降低被處理對象物W的溫度上升,並且抑制被處理對象物W面內之溫度不均勻性。亦即,於各光源元件21中,藉由外套管24在其內部被插通有準分子燈25之狀態下設置,利用外套管24所至之冷卻風導風功能(整風作用),可直接冷卻準分子燈25的放電容器26,故複數準分子燈25依各燈被均勻冷卻,可將準分子燈25本身所致之對被處理對象物W的放射熱之偏差抑制成較低,並且可抑制熱線對於被處理對象物W照射,而且,外套管24其本身也藉由冷卻風冷卻,故可抑制對於被處理對象物W的放射熱,藉此,可抑制被處理對象物W的溫度上升,並且取得被處理對象物W的面內之優良溫度均勻性。Then, according to the ultraviolet irradiation device of the above-described configuration, the plurality of light source elements 21 are arranged side by side in a state in which they are located at the center of the axis of each excimer lamp 25, and are arranged in parallel to constitute the light source unit 20, whereby basically, The object to be processed W can illuminate the ultraviolet ray of a wavelength band of 300 nm to 400 nm by the uniform illuminance distribution, and can reduce the temperature rise of the object W to be processed, and suppress temperature unevenness in the surface of the object W to be processed. That is, in each of the light source elements 21, the outer sleeve 24 is provided with the excimer lamp 25 inserted therein, and the cooling air guiding function (rectifying effect) by the outer sleeve 24 can be directly used. Since the discharge vessel 26 of the excimer lamp 25 is cooled, the plurality of excimer lamps 25 are uniformly cooled by the lamps, and the deviation of the radiant heat of the object W to be processed by the excimer lamp 25 itself can be suppressed to be low, and Since the heat ray can be prevented from being irradiated to the object W to be processed, and the outer tube 24 itself is cooled by the cooling air, the radiant heat to the object W to be processed can be suppressed, whereby the temperature of the object W to be processed can be suppressed. The temperature rises and the excellent temperature uniformity in the plane of the object W to be processed is obtained.

所以,例如,合適作為液晶面板的製造工程之液晶面板材的反應處理(預傾角發現處理)中所使用之紫外線照射裝置。For this reason, for example, it is suitable as an ultraviolet irradiation device used for the reaction process (pretilt angle finding process) of the liquid crystal panel of the manufacturing process of a liquid crystal panel.

又,藉由具備由內周面是藉由反射面所形成之空間所成的光導引部50,可一邊充分確保對於被處理對象物W的紫外線照射量,一邊擴大光源單元20與被處理對象物W之間的離開距離,故可更確實抑制光源單元20的放射熱所致之影響,可降低被處理對象物W的溫度上升,並且可取得被處理對象物W的面內之優良溫度均勻性。In addition, by providing the light guiding portion 50 formed by the space formed by the reflecting surface on the inner peripheral surface, the light source unit 20 can be enlarged and processed while sufficiently ensuring the amount of ultraviolet irradiation to the object W to be processed. Since the distance between the objects W is suppressed, the influence of the radiation heat of the light source unit 20 can be more reliably suppressed, and the temperature rise of the object W to be processed can be lowered, and the excellent temperature in the plane of the object W to be processed can be obtained. Uniformity.

進而,藉由設為使用準分子燈25,於此準分子燈25的放電空間S中產生之所定波長帶的紫外線(真空紫外線)藉由設置於放電容器26內表面的螢光體層32之作用,作為300nm~400nm的紫外線放射之構造,不會對被處理對象物W放射多餘的光成分,故可確實降低被處理對象物W的溫度上升。Further, by using the excimer lamp 25, ultraviolet rays (vacuum ultraviolet rays) of a predetermined wavelength band generated in the discharge space S of the excimer lamp 25 are acted upon by the phosphor layer 32 provided on the inner surface of the discharge vessel 26. In the structure of ultraviolet radiation of 300 nm to 400 nm, unnecessary light components are not emitted to the object W to be processed, so that the temperature rise of the object W to be processed can be surely lowered.

進而,又藉由設為具備放熱用的熱交換器43之構造,可形成被閉鎖(密閉系的)之冷卻風循環路徑,即使例如在無塵室內使用紫外線照射裝置之狀況中,因為不需要由裝置的外部來獲得冷卻風,及不用將冷卻風排出至裝置外部,故不需要連接導管等,可簡潔地構成冷卻機構。Further, by providing a structure including the heat exchanger 43 for heat release, it is possible to form a closed (closed) cooling air circulation path, and it is not necessary to use an ultraviolet irradiation device, for example, in a clean room. Since the cooling air is obtained from the outside of the apparatus and the cooling air is not discharged to the outside of the apparatus, it is not necessary to connect a duct or the like, and the cooling mechanism can be simplified.

又,因為是空冷式,也不會產生如果是水冷式的話則有發生之虞的漏水等的問題。Further, since it is an air-cooled type, there is no problem that water leakage occurs if it is water-cooled.

以下,針對為了確認本發明的效果而進行之實驗例進行說明。Hereinafter, an experimental example performed to confirm the effects of the present invention will be described.

<實驗例1><Experimental Example 1>

遵從圖1及圖2所示構造,製作具有以下構造之本發明相關的紫外線照射裝置。According to the structure shown in Fig. 1 and Fig. 2, an ultraviolet irradiation apparatus according to the present invention having the following structure was produced.

光源單元(20)係光源元件(21)的數量為32個,連接之光源元件的離間距離(燈的軸中心間距離p)為90mm。The number of the light source units (20) is 32, and the distance between the connected light source elements (the distance between the shaft centers of the lamps) is 90 mm.

構成各光源元件(21)的燈(25)係全長2800mm,橫縱的尺寸為43mm×15mm,燈輸出2kW,放電容器(26)的材質是石英玻璃,構成螢光體層(32)的螢光體為SBE,作為放電用氣體而封入氙氣的準分子燈,外套管(24)的材質是石英玻璃,全長2500mm,內徑76mm,厚度2.5mm的圓筒狀者。The lamp (25) constituting each light source element (21) has a total length of 2800 mm, a horizontal and vertical dimension of 43 mm × 15 mm, a lamp output of 2 kW, and a material of the discharge vessel (26) is quartz glass, and constitutes a phosphor layer (32). The body is SBE, and an excimer lamp in which helium gas is sealed as a discharge gas. The outer sleeve (24) is made of quartz glass and has a cylindrical shape of 2,500 mm in total length, 76 mm in inner diameter, and 2.5 mm in thickness.

冷卻風扇(42)係具有可對於1個光源元件(21),供給例如4m3 /min的送風量(在光源單元整體為128m3 /min)之冷卻風的送風能力之軸流風扇。導風用空間部(18)之壓力係500~1000Pa,冷卻風的溫度是30℃,排風用空間部(19)之風的溫度為60℃程度。The cooling fan (42) is an axial flow fan that can supply a blowing air of a cooling air of, for example, 4 m 3 /min (a total light source unit of 128 m 3 /min) to one light source element (21). The pressure in the air guiding space portion (18) is 500 to 1000 Pa, the temperature of the cooling air is 30 ° C, and the temperature of the wind in the air separating space portion (19) is about 60 °C.

光導引構件(51)的高度為300mm。The height of the light guiding member (51) is 300 mm.

被處理對象物(W)係橫縱的尺寸為2200mm×2500mm的試驗用液晶面板材,光源單元(20)與被處理對象物(W)的離間距離為400mm。The object to be processed (W) was a test liquid crystal panel having a horizontal and vertical dimension of 2,200 mm × 2,500 mm, and the distance between the light source unit (20) and the object to be processed (W) was 400 mm.

使用此紫外線照射裝置,使各光源元件(21)之燈(25)以全部相同點燈條件來點燈,將紫外線照射至身為被處理對象物(W)的試驗用液晶面板材,而測定試驗用液晶面板材的光照射面上之任意複數的測定處之照度及溫度,求出試驗用液晶面板材的光照射面之照度均勻性,可確認照度均勻度在±8.9%的範圍內。Using the ultraviolet irradiation device, the lamps (25) of the respective light source elements (21) are turned on under the same lighting conditions, and the ultraviolet rays are irradiated onto the test liquid crystal panel as the object to be processed (W). The illuminance uniformity of the light-irradiated surface of the test liquid crystal panel was determined by the illuminance and temperature of any of the plurality of measurement surfaces on the light-irradiated surface of the test liquid crystal panel, and it was confirmed that the illuminance uniformity was within ±8.9%.

又,試驗用液晶面板材的光照射面之溫度係可確認在從開始照射紫外線經過120秒間的時間之時間點,到達30℃±2℃(溫度上升的程度)。在此,照射紫外線之前的試驗用液晶面板材的表面溫度為25℃。In addition, the temperature of the light-irradiated surface of the test liquid crystal panel was confirmed to be 30 ° C ± 2 ° C (degree of temperature rise) at a time from the start of the irradiation of the ultraviolet light for 120 seconds. Here, the surface temperature of the liquid crystal panel for the test before the ultraviolet irradiation was 25 °C.

<照度均勻性><illuminance uniformity>

『照度均勻度』係將試驗用液晶面板材的光照射面之複數測定處中被測定的照度之平均值設為Ea,將複數測定處之各照度測定值設為Eb時,藉由(計算式)(Ea-Eb)/Ea[%]來界定。於實驗例1中,試驗用液晶面板材的光照射面之平均照度(Ea)約19mW/cm2The "illuminance uniformity" is obtained by setting the average value of the illuminance measured in the plurality of measurement portions of the light-irradiating surface of the test liquid crystal panel to Ea, and calculating the illuminance measurement value at the complex measurement portion as Eb. () Ea-Eb) / Ea [%] to define. In Experimental Example 1, the average illuminance (Ea) of the light-irradiated surface of the liquid crystal panel for the test was about 19 mW/cm 2 .

進而,又藉由熱量計,測定200nm~20000nm之波長帶的光之總放射熱量,相對於試驗用液晶面板材的總放射熱量為57mW/cm2 ,其中,300nm~400nm之波長帶的紫外線以外的光(並不助益於液晶面板材之光化學反應的光)所致之放射熱量為38mW/cm2 。在此,燈的表面溫度為250℃,外套管的表面溫度為約60℃。Further, the total amount of radiant heat of the light in the wavelength band of 200 nm to 20,000 nm was measured by a calorimeter, and the total amount of radiant heat of the liquid crystal panel for the test was 57 mW/cm 2 , and the ultraviolet ray of the wavelength band of 300 nm to 400 nm was used. The amount of radiant heat caused by the light (which does not contribute to the photochemical reaction of the liquid crystal panel) is 38 mW/cm 2 . Here, the surface temperature of the lamp was 250 ° C, and the surface temperature of the outer sleeve was about 60 ° C.

<比較實驗例1><Comparative Example 1>

遵從圖6所示之構造,製作比較用的紫外線照射裝置。此紫外線照射裝置係並未具備冷卻機構,與於前述實驗例1中製作之紫外線照射裝置的光源單元中,除了不具有外套管之外,具有相同構造的光源單元20A。於圖6中,符號51A係補助反射板,50A係於內部區分處理空間的殼體,關於與前述圖1及圖2所示者相同的構成構件,附加有相同符號。According to the structure shown in Fig. 6, a comparative ultraviolet irradiation device was produced. This ultraviolet irradiation apparatus does not include a cooling mechanism, and the light source unit of the ultraviolet irradiation apparatus manufactured in the above-described Experimental Example 1 has the light source unit 20A having the same structure except that the outer tube is not provided. In Fig. 6, reference numeral 51A denotes a reflector, and 50A denotes a housing which is internally divided into processing spaces, and the same components as those shown in Figs. 1 and 2 are denoted by the same reference numerals.

使用此紫外線照射裝置,使各光源元單元(20A)之各燈(25)以全部相同點燈條件來點燈,將紫外線照射至試驗用液晶面板材,與實驗例1相同,測定試驗用液晶面板材的光照射面上之任意複數的測定處之照度及溫度,求出試驗用液晶面板材的光照射面之照度均勻性,可確認照度均勻度在±10.8%的範圍內。再者,試驗用液晶面板材的光照射面之平均照度(Ea)約25mW/cm2Using the ultraviolet irradiation device, each of the lamps (25) of each light source unit (20A) was turned on under the same lighting conditions, and ultraviolet rays were irradiated onto the test liquid crystal panel. The test liquid crystal was measured in the same manner as in Experimental Example 1. The illuminance uniformity of the light-irradiated surface of the test liquid crystal panel was determined by the illuminance and temperature of any of the plurality of measurement surfaces on the light-irradiated surface of the surface plate, and it was confirmed that the illuminance uniformity was within ±10.8%. Further, the average illuminance (Ea) of the light-irradiated surface of the liquid crystal panel for the test was about 25 mW/cm 2 .

又,試驗用液晶面板材的光照射面之溫度係可確認在從開始照射紫外線經過120秒間的時間之時間點,到達60℃±12℃(溫度上升的程度)。In addition, the temperature of the light-irradiated surface of the test liquid crystal panel was confirmed to be 60 ° C ± 12 ° C (degree of temperature rise) from the time when the irradiation of the ultraviolet light was started for 120 seconds.

進而,又藉由熱量計,測定200nm~20000nm之波長帶的光之總放射熱量,相對於試驗用液晶面板材的總放射熱量為173mW/cm2 ,其中,300nm~400nm之波長帶的紫外線以外的光(並不助益於液晶面板材之光化學反應的光)所致之放射熱量為148mW/cm2 。在此,燈的表面溫度為約300℃。Further, the total amount of radiant heat of the light in the wavelength band of 200 nm to 20,000 nm was measured by a calorimeter, and the total amount of radiant heat of the liquid crystal panel for the test was 173 mW/cm 2 , and the ultraviolet ray of the wavelength band of 300 nm to 400 nm was used. The amount of radiant heat caused by the light (which does not contribute to the photochemical reaction of the liquid crystal panel) is 148 mW/cm 2 . Here, the surface temperature of the lamp is about 300 °C.

<比較實驗例2><Comparative Example 2>

遵從圖7所示之構造,製作比較用的紫外線照射裝置。此紫外線照射裝置係設為前述實驗例1中製作之紫外線照射裝置中,光源單元不具有外套管的構造,又,為了代替光導引部,設為於光照射用開口(12)的開口緣部設置補助反射板(51A),並且於光照射用開口(12)設置光透過窗(12A)之構造,除此之外,具有與前述實驗例1中製作之紫外線照射裝置相同的構造,關於相同構成構件,便利性上附加相同符號。於圖7中,符號50A係於內部區分處理空間的殼體。According to the structure shown in Fig. 7, a comparative ultraviolet irradiation device was produced. In the ultraviolet irradiation device manufactured in the above-described Experimental Example 1, the light source unit does not have an outer sleeve, and is used as an opening edge of the light irradiation opening (12) instead of the light guiding portion. In addition, the auxiliary reflection plate (51A) is provided, and the light transmission window (12A) is provided in the light irradiation opening (12), and has the same structure as the ultraviolet irradiation device produced in the above Experimental Example 1, The same constituent members are attached with the same symbols for convenience. In Fig. 7, reference numeral 50A is a housing that internally distinguishes the processing space.

使用此紫外線照射裝置,使各光源元單元(20A)之各燈(25)以全部相同點燈條件來點燈,將紫外線照射至試驗用液晶面板材,與實驗例1相同,測定試驗用液晶面板材的光照射面上之任意複數的測定處之照度及溫度,求出試驗用液晶面板材的光照射面之照度均勻性,可確認照度均勻度在±11.2%的範圍內。再者,試驗用液晶面板材的光照射面之平均照度(Ea)約21mW/cm2Using the ultraviolet irradiation device, each of the lamps (25) of each light source unit (20A) was turned on under the same lighting conditions, and ultraviolet rays were irradiated onto the test liquid crystal panel. The test liquid crystal was measured in the same manner as in Experimental Example 1. The illuminance uniformity of the light-irradiated surface of the test liquid crystal panel was determined by the illuminance and temperature of any of the plurality of measurement surfaces on the light-irradiated surface of the surface plate, and it was confirmed that the illuminance uniformity was within ±11.2%. Further, the average illuminance (Ea) of the light-irradiated surface of the liquid crystal panel for the test was about 21 mW/cm 2 .

又,試驗用液晶面板材的光照射面之溫度係可確認在從開始照射紫外線經過120秒間的時間之時間點,到達45℃±20℃(溫度上升的程度)。In addition, the temperature of the light-irradiated surface of the test liquid crystal panel was confirmed to be 45 ° C ± 20 ° C (degree of temperature rise) from the time when the irradiation of the ultraviolet light was started for 120 seconds.

進而,又藉由熱量計,測定200nm~20000nm之波長帶的光之總放射熱量,相對於試驗用液晶面板材的總放射熱量為110mW/cm2 ,其中,300nm~400nm之波長帶的紫外線以外的光(並不助益於液晶面板材之光化學反應的光)所致之放射熱量為89mW/cm2 。在此,燈的表面溫度為280℃,光透過窗的表面溫度為約147℃。Further, the total amount of radiant heat of the light in the wavelength band of 200 nm to 20,000 nm is measured by a calorimeter, and the total amount of radiant heat of the liquid crystal panel for test is 110 mW/cm 2 , and the ultraviolet ray of the wavelength band of 300 nm to 400 nm is not included. The amount of radiant heat caused by the light (which does not contribute to the photochemical reaction of the liquid crystal panel) is 89 mW/cm 2 . Here, the surface temperature of the lamp was 280 ° C, and the surface temperature of the light transmission window was about 147 ° C.

如上所述,依據關於本發明的紫外線照射裝置,可確認於被處理對象物的光照射面中,針對紫外線照度及溫度,可取得優良面內均勻性。As described above, according to the ultraviolet irradiation device of the present invention, it is possible to obtain excellent in-plane uniformity with respect to ultraviolet illuminance and temperature in the light-irradiated surface of the object to be processed.

又,可確認可降低紫外線照射所致之被處理對象物的溫度上升之程度。Moreover, it was confirmed that the degree of temperature rise of the object to be processed due to ultraviolet irradiation can be reduced.

以上,已針對本發明的實施形態進行說明,但是,本發明不限定於前述之實施形態者,可施加各種變更。Although the embodiments of the present invention have been described above, the present invention is not limited to the embodiments described above, and various modifications can be added.

例如,於本發明的紫外線照射裝置中,構成光源單元之光源元件的個數及排列方法,並不限定於前述實施例,可因應目的來適切設計變更。For example, in the ultraviolet irradiation device of the present invention, the number and arrangement method of the light source elements constituting the light source unit are not limited to the above-described embodiments, and the design changes can be appropriately made depending on the purpose.

10...光源部10. . . Light source department

11...光源部殼體構件11. . . Light source part housing member

11A...一端壁11A. . . One end wall

11B...另一端壁11B. . . Another end wall

12...光照射用開口12. . . Light irradiation opening

12A...光透過窗12A. . . Light transmission window

13...一端側間隔壁13. . . One end side partition

13A...導風用通風口13A. . . Air vent

14...另一端側間隔壁14. . . Other end spacer

14A...排風用通風口14A. . . Exhaust vent

15...光源單元配置空間部15. . . Light source unit configuration space

16...電裝體配置空間部16. . . Electrical assembly space

18...導風用空間部18. . . Air guide space department

19...排風用空間部19. . . Exhaust space department

20,20A...光源單元20,20A. . . Light source unit

21...光源元件twenty one. . . Light source component

22...燈保持部twenty two. . . Lamp holding unit

24...外套管(筒狀套)twenty four. . . Outer casing (cylindrical sleeve)

24A...冷卻風流通路徑24A. . . Cooling air circulation path

25...準分子放電燈(燈)25. . . Excimer discharge lamp (light)

26...放電容器26. . . Discharge capacitor

26A...上壁26A. . . Upper wall

26B...下壁26B. . . Lower wall

27A...一方的電極27A. . . One electrode

27B...另一方的電極27B. . . The other electrode

30...反射材層30. . . Reflective layer

31...玻璃粉末層31. . . Glass powder layer

32...螢光體層32. . . Phosphor layer

35...變壓器35. . . transformer

S...放電空間S. . . Discharge space

40...冷卻部40. . . Cooling section

41...冷卻部殼體構件41. . . Cooling section housing member

42...冷卻風扇42. . . cooling fan

43...熱交換器43. . . Heat exchanger

45...通風導管45. . . Ventilation duct

50‧‧‧光導引部50‧‧‧Light Guide

50A‧‧‧殼體50A‧‧‧shell

51‧‧‧光導引構件51‧‧‧Light guiding members

51A‧‧‧補助反射板51A‧‧‧Subsidy reflector

52A~52D‧‧‧板狀構件52A~52D‧‧‧plate-like members

53‧‧‧基座構件53‧‧‧Base member

54‧‧‧光反射性構件54‧‧‧Light reflective components

55‧‧‧開閉門55‧‧‧Open and close the door

58‧‧‧平台58‧‧‧ platform

59‧‧‧平台架台59‧‧‧ Platform stand

60‧‧‧電源部60‧‧‧Power Supply Department

W‧‧‧被處理對象物W‧‧‧Objects to be treated

70‧‧‧液晶面板70‧‧‧LCD panel

71‧‧‧第1玻璃板71‧‧‧1st glass plate

72‧‧‧主動元件72‧‧‧Active components

73‧‧‧液晶驅動用電極73‧‧‧Liquid for LCD drive

74‧‧‧配向膜74‧‧‧Alignment film

75‧‧‧第2玻璃板75‧‧‧2nd glass plate

76‧‧‧彩色濾光片76‧‧‧Color filters

77‧‧‧透明電極77‧‧‧Transparent electrode

78‧‧‧配向膜78‧‧‧Alignment film

79‧‧‧間隔物構件79‧‧‧ spacer components

80‧‧‧液晶層80‧‧‧Liquid layer

[圖1]揭示從正面方向觀看本發明之紫外線照射裝置的一構造例之內部構造的概略的說明圖。[Fig. 1] An explanatory view showing an outline of an internal structure of a structural example of the ultraviolet irradiation device of the present invention as seen from the front direction.

[圖2]揭示從一側面方向觀看圖1所示之紫外線照射裝置之內部構造的概略的說明圖。Fig. 2 is an explanatory view showing an outline of an internal structure of the ultraviolet irradiation device shown in Fig. 1 as seen from a side surface direction.

[圖3]概略揭示關於本發明的光源單元之光源元件的配置例的說明圖。Fig. 3 is an explanatory view schematically showing an arrangement example of a light source element of a light source unit according to the present invention.

[圖4]揭示本發明的紫外線照射裝置中所使用之燈相關的準分子燈之一構造例,(A)立體圖,(B)揭示垂直於燈的長邊方向之剖面的剖面圖。4 is a perspective view showing a configuration example of a lamp-related excimer lamp used in the ultraviolet irradiation device of the present invention, (A) a perspective view, and (B) a cross-sectional view perpendicular to a longitudinal direction of the lamp.

[圖5]揭示構成光導引部的光導引構件之一構造例,(A)立體圖,(B)光導引構件之側壁的端面圖。Fig. 5 is a view showing an example of a configuration of a light guiding member constituting a light guiding portion, (A) a perspective view, and (B) an end view of a side wall of the light guiding member.

[圖6]揭示從一側面方向觀看比較實驗例1中製作之比較用的紫外線照射裝置之內部構造的概略的說明圖。Fig. 6 is an explanatory view showing an outline of an internal structure of a comparative ultraviolet ray irradiation apparatus produced in Comparative Experimental Example 1 viewed from a side surface direction.

[圖7]揭示從一側面方向觀看比較實驗例2中製作之比較用的紫外線照射裝置之內部構造的概略的說明圖。FIG. 7 is an explanatory view showing an outline of an internal structure of a comparative ultraviolet irradiation device produced in Comparative Experimental Example 2, viewed from a side surface direction.

[圖8]揭示液晶面板之構造概略的說明用剖面圖。FIG. 8 is a cross-sectional view for explaining an outline of a structure of a liquid crystal panel.

10...光源部10. . . Light source department

11...光源部殼體構件11. . . Light source part housing member

11A...一端壁11A. . . One end wall

11B...另一端壁11B. . . Another end wall

12...光照射用開口12. . . Light irradiation opening

13...一端側間隔壁13. . . One end side partition

13A...導風用通風口13A. . . Air vent

14...另一端側間隔壁14. . . Other end spacer

14A...排風用通風口14A. . . Exhaust vent

15...光源單元配置空間部15. . . Light source unit configuration space

18...導風用空間部18. . . Air guide space department

19...排風用空間部19. . . Exhaust space department

20...光源單元20. . . Light source unit

21...光源元件twenty one. . . Light source component

22...燈保持部twenty two. . . Lamp holding unit

24...外套管(筒狀套)twenty four. . . Outer casing (cylindrical sleeve)

25...準分子放電燈(燈)25. . . Excimer discharge lamp (light)

40...冷卻部40. . . Cooling section

41...冷卻部殼體構件41. . . Cooling section housing member

42...冷卻風扇42. . . cooling fan

43...熱交換器43. . . Heat exchanger

45...通風導管45. . . Ventilation duct

50...光導引部50. . . Light guide

51...光導引構件51. . . Light guiding member

58...平台58. . . platform

59...平台架台59. . . Platform stand

W...被處理對象物W. . . Object to be processed

Claims (4)

一種紫外線照射裝置,係於包含光學活性物質之液晶面板的製造工程中所使用的紫外線照射裝置,其特徵為具備:光源單元,係分別放射於波長300nm~400nm中具有發光峰值的光之長條狀的準分子燈,及藉由在該準分子燈插通於內部之狀態下設置,且於具有透光性之兩端具有開口的筒狀之長條狀的外套管所構成之複數光源元件與身為被處理對象物的液晶面板材對向而並列排列所成;及冷卻機構,係具有導風用空間部及排風用空間部;前述光源元件個別之外套管的一端開口位於共通的導風用空間部,並且另一端開口位於共通的排風用空間部,對前述光源元件個別之外套管的內部,透過導風用空間部,導入冷卻風。 An ultraviolet irradiation device used in a manufacturing process of a liquid crystal panel including an optically active material, characterized in that the light source unit is provided with a light source unit that emits light having a light emission peak at a wavelength of 300 nm to 400 nm. An excimer lamp, and a plurality of light source elements which are provided in a state in which the excimer lamp is inserted inside, and are formed in a tubular elongated outer sleeve having openings at both ends of the light transmissive property And the cooling mechanism includes an air guiding space portion and an air exhausting space portion; and the one end opening of the sleeve is located in common The air-conducting space portion is located in the common air-exhausting space portion, and the cooling air is introduced into the air-conducting space portion through the inside of the casing other than the light source element. 如申請專利範圍第1項所記載之紫外線照射裝置,其中,於前述光源單元與被處理對象物之間,具備由內周面藉由反射面所形成之空間所成的光導引部。 The ultraviolet irradiation device according to the first aspect of the invention, wherein the light source unit and the object to be processed are provided with a light guiding portion formed by a space formed by the reflecting surface of the inner peripheral surface. 如申請專利範圍第1項或第2項所記載之紫外線照射裝置,其中,前述準分子燈具備剖面矩形狀的放電容器,前述外套管為圓筒狀。 The ultraviolet irradiation device according to the first or second aspect of the invention, wherein the excimer lamp includes a discharge vessel having a rectangular cross section, and the outer sleeve is cylindrical. 如申請專利範圍第1項或第2項所記載之紫外線照射裝置,其中, 於前述冷卻機構中,藉由前述導風用空間部及排風用空間部,形成循環冷卻風流通路徑,於該循環冷卻風流通路徑,配置有放熱用的熱交換器。 The ultraviolet irradiation device described in claim 1 or 2, wherein In the cooling mechanism, the air-conditioning space portion and the air-discharging space portion form a circulating cooling air flow path, and the heat-dissipating heat exchanger is disposed in the circulating cooling air flow path.
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JP2013154263A (en) * 2012-01-26 2013-08-15 Gs Yuasa Corp Ultraviolet irradiation apparatus
JP5630457B2 (en) * 2012-04-19 2014-11-26 ウシオ電機株式会社 Light irradiation device for solar cell testing
JP6171632B2 (en) * 2013-07-01 2017-08-02 東芝ライテック株式会社 Liquid crystal panel manufacturing apparatus and liquid crystal panel manufacturing method
JP6164072B2 (en) 2013-12-06 2017-07-19 東芝ライテック株式会社 Liquid crystal panel manufacturing apparatus and liquid crystal panel manufacturing method
JP6164142B2 (en) 2014-03-31 2017-07-19 東芝ライテック株式会社 Liquid crystal panel manufacturing apparatus and liquid crystal panel manufacturing method
JP2016007832A (en) * 2014-06-26 2016-01-18 株式会社東通研 Curing device of ultraviolet curing resin
JP6844292B2 (en) * 2017-02-09 2021-03-17 ウシオ電機株式会社 Light irradiator and light irradiator

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267512A (en) * 1993-03-10 1994-09-22 Iwasaki Electric Co Ltd High power ultraviolet irradiation light source
TW569168B (en) * 2001-10-02 2004-01-01 Fujitsu Display Tech Liquid crystal display device and method of fabricating the same
JP2004144884A (en) * 2002-10-23 2004-05-20 Ushio Inc Polarizing light irradiation device for optical orientation
TW200831981A (en) * 2006-11-02 2008-08-01 Harison Toshiba Lighting Corp Equipment and method for manufacturing liquid crystal panel

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5097136A (en) 1990-05-29 1992-03-17 Ultra-Lum, Inc. Apparatus for curing photosensitive coatings
JP3975506B2 (en) * 1997-04-22 2007-09-12 ソニー株式会社 Liquid crystal display device and cooling method of lamp part of liquid crystal display device
KR100916963B1 (en) * 2005-12-22 2009-09-14 주식회사 에이디피엔지니어링 Apparatus for Hardening Bonded Substrate Using UV
JP5195051B2 (en) * 2008-06-09 2013-05-08 ウシオ電機株式会社 UV irradiation equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267512A (en) * 1993-03-10 1994-09-22 Iwasaki Electric Co Ltd High power ultraviolet irradiation light source
TW569168B (en) * 2001-10-02 2004-01-01 Fujitsu Display Tech Liquid crystal display device and method of fabricating the same
JP2004144884A (en) * 2002-10-23 2004-05-20 Ushio Inc Polarizing light irradiation device for optical orientation
TW200831981A (en) * 2006-11-02 2008-08-01 Harison Toshiba Lighting Corp Equipment and method for manufacturing liquid crystal panel

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