KR20110110717A - Ultraviolet irradiation apparatus - Google Patents

Abstract

(Problem) Ultraviolet irradiation with high in-plane uniformity of the ultraviolet illuminance in the light irradiation surface of a to-be-processed object, and low temperature rise of the to-be-processed object, and high in-plane uniformity of the temperature in the light irradiation surface of a to-be-processed object Providing the ultraviolet irradiation device which can process.
(Solution means) This ultraviolet irradiation apparatus is used in the manufacturing process of the liquid crystal panel containing a photoreactive substance, Comprising: An elongate lamp which emits the light which has an emission peak in wavelength 300nm-400nm, respectively, and A light source unit in which a plurality of light source elements constituted by an elongated outer tube having a light transmissive state installed while the lamp is inserted therein are arranged in parallel to face the liquid crystal panel material to be processed, and the light source It is provided with the cooling mechanism which supplies a cooling wind to the inside of the outer shell pipe in each element.

Description

Ultraviolet irradiation device {ULTRAVIOLET IRRADIATION APPARATUS}

This invention relates to the ultraviolet irradiation device used in the manufacturing process of a liquid crystal panel, for example.

As shown in FIG. 8, the liquid crystal panel 70 has the structure which enclosed the liquid crystal between two glass plates, For example, many active elements (for example, thin film transistor: TFT) (on one surface) ( 72 and a first glass plate 71 having a liquid crystal driving electrode (transparent electrode: ITO) 73 formed thereon and an alignment film 74 formed thereon, a color filter 76 and a transparent electrode 77 on one surface thereof. ) And the second glass plate 75 on which the alignment layer 78 is formed are disposed so that one surface thereof faces each other via the spacer member 79, and a liquid crystal layer (B) between the first glass plate 71 and the second glass plate 75. 80) is formed and configured.

In the manufacturing process of such a liquid crystal panel 70, the reaction process of a liquid crystal panel material (pretilt angle) by irradiating an ultraviolet-ray to the liquid crystal panel material containing the liquid crystal containing the photoreactive substance (monomer) which superpose | polymerizes in response to an ultraviolet-ray. The technique of performing expression processing and PSVA is known (refer patent document 1). In this technique, by irradiating an ultraviolet-ray to a liquid crystal panel material, applying a voltage, a photoreactive substance can be polymerized in the state which orientated the liquid crystal in a specific direction, and, therefore, a so-called pretilt angle can be provided to a liquid crystal. It is said.

In the reaction treatment (PSVA) of the liquid crystal panel material using such ultraviolet rays, it is necessary to irradiate ultraviolet rays with high irradiance to the photoreactive substance in the liquid crystal, while the photoreactive substance in the liquid crystal is not exposed to high temperature. Not required.

The reaction rate of the photoreactive substance is high in temperature dependence, and if the temperature during irradiation is high, the polymerization proceeds too much and the growth of polymer particles becomes too large. Then, since the uniform pretilt angle does not adhere, the contrast worsens or light leakage occurs.

Moreover, when temperature nonuniformity arises in the light irradiation surface in a liquid crystal panel material, a difference (unbalance) arises in reaction of a photoreactive substance, and a deviation arises in the inclination (pretilt angle) of a liquid crystal, The deviation of the inclination becomes a light and shade deviation at the time of product, and appears.

As mentioned above, when performing the reaction process of the liquid crystal panel material using an ultraviolet-ray in the manufacturing process of a liquid crystal panel, (A) the ultraviolet-ray of wavelength 300-350 nm is irradiated to a liquid crystal panel material, (B) the light tank of a liquid crystal panel material Although high in-plane uniformity of ultraviolet illuminance on the slope and (c) low temperature rise of the liquid crystal panel material and high in-plane uniformity of temperature on the light irradiation surface of the liquid crystal panel material are required, but adversely affect the photoreactive substance. It is a fact that the ultraviolet irradiation apparatus which can perform the reaction process of a desired liquid crystal panel material is unknown, without giving.

[Patent Document 1] Japanese Patent Laid-Open No. 2003-177408

This invention is made | formed in order to solve the above problem, The in-plane uniformity of the ultraviolet illuminance in the light irradiation surface of the to-be-processed object is high, and the temperature rise of the to-be-processed object is small, and the light irradiation surface of the to-be-processed object An object of the present invention is to provide an ultraviolet irradiation device capable of performing an ultraviolet irradiation treatment having a high in-plane uniformity of temperature in the substrate.

The ultraviolet irradiation device of this invention is an ultraviolet irradiation device used in the manufacturing process of the liquid crystal panel containing a photoreactive substance,

Each of the plurality of light source elements constituted by an elongated lamp having a light emission peak at a wavelength of 300 nm to 400 nm, and an elongated outer tube having a light transmissive shape, provided with the lamp inserted therein. A light source unit which is arranged in parallel to face the liquid crystal panel material to be processed;

It is characterized by including the cooling mechanism which supplies a cooling wind to the inside of the outer tube in each of the said light source elements.

In the ultraviolet irradiation device of this invention, it is preferable that the structure provided with the light guide part which consists of the space in which the inner peripheral surface was formed by the reflecting surface between the said light source unit and the to-be-processed target object.

In the ultraviolet irradiation device of the present invention, it is preferable that an excimer lamp is used as the lamp.

Moreover, in the ultraviolet irradiation device of this invention, it is preferable that the said cooling mechanism is the structure provided with the heat exchanger for heat dissipation.

According to the ultraviolet irradiation device of the present invention, basically, a light source unit in which a plurality of light source elements are arranged in parallel is constituted, so that ultraviolet rays in a specific wavelength range can be irradiated with a uniform illuminance distribution to a target object. have.

Further, in each light source element, since the outer tube is installed with the lamp inserted therein, the light emitting tube of the lamp can be directly cooled by the cooling wind guide function by the outer tube, A plurality of lamps can be uniformly cooled for each lamp to reduce the imbalance of the radiant heat from the lamp itself to the object to be treated, and to suppress the irradiation of the hot wire to the object to be treated. Since the cooling itself is also carried out by the cooling wind, radiant heat to the object to be treated can be suppressed, so that the temperature rise of the object to be treated can be reduced, and temperature nonuniformity in the surface of the object can be suppressed. For example, the ultraviolet-ray used in reaction process (pretilt angle expression process) of the liquid crystal panel material in a manufacturing process of a liquid crystal panel. It is preferred as the irradiation device.

Moreover, since the inner circumferential surface is further comprised of the light guide part which consists of the space formed by the reflecting surface, the distance between a light source unit and a to-be-processed object can be enlarged, ensuring sufficient ultraviolet irradiation amount to a to-be-processed object. As a result, the influence of the radiant heat of the light source unit can be more surely suppressed, the temperature rise of the target object can be reduced, and the temperature nonuniformity in the surface of the target object can be suppressed.

In addition, since an excimer lamp is used, since an extra light component is not radiated | emitted, the grade of the temperature rise of a to-be-processed object can be reliably made small.

In addition, since the cooling mechanism is configured to include a heat exchanger, it is possible to form a closed system cooling wind circulation supply path, and even when an ultraviolet irradiation device is used in a clean room, for example, it is necessary to prepare a duct or the like. Can be cooled compactly.

BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing seen from the front direction which shows the outline of the internal structure in one structural example of the ultraviolet irradiation device of this invention.
It is explanatory drawing seen from the one side direction which shows the outline of the internal structure of the ultraviolet irradiation device shown in FIG.
3 is an explanatory diagram schematically showing an arrangement example of a light source element in the light source unit according to the present invention.
Fig. 4 is a sectional view showing a cross section perpendicular to the longitudinal direction of the (A) perspective view and (B) the lamp, showing an example of the configuration of an excimer lamp related to the lamp used in the ultraviolet irradiation device of the present invention.
FIG. 5: is sectional drawing of (A) inclination, (B) side wall of a light guide member which shows one structural example of the light guide member which comprises a light guide part. FIG.
FIG. 6: is explanatory drawing seen from the one side direction which shows the outline of the internal structure in the ultraviolet irradiation device for comparison produced in the comparative experiment example 1. FIG.
FIG. 7: is explanatory drawing seen from one side direction which shows the outline of the internal structure in the ultraviolet irradiation device for comparison produced in the comparative experiment example 2. FIG.
8 is a cross-sectional view illustrating the outline of a structure of a liquid crystal panel.

FIG. 1: is explanatory drawing seen from the front direction which shows the outline of the internal structure in one structural example of the ultraviolet irradiation device of this invention, FIG. 2 shows the outline of the internal structure of the ultraviolet irradiation device shown in FIG. It is explanatory drawing seen from one side direction.

This ultraviolet irradiation apparatus is divided roughly and is comprised by the light source part 10, the cooling part 40, the light guide part 50, and the power supply part 60. As shown in FIG.

The light source part 10 is provided with the box-shaped light source part casing member 11 which has the light irradiation opening 12 opened below, and this internal space of this light source part casing member 11 is a vertical direction. The lower space portion is the light source unit arrangement space portion 15 in which the light source unit 20 is disposed, and the upper space portion corresponds to the light source unit 20. The electric body arrangement space part 16 in which a sieve is arrange | positioned is used.

Moreover, one end partition 13 which comprises the electric field arrangement space part 16 in the one end side area | region of the longitudinal direction of the lamp 25 which comprises the light source unit 20 in the light source part casing member 11, and A common guiding space for introducing cooling air into each of the electric field placing space 16 and the light source unit arranging space 15 formed by being partitioned by one end wall 11A of the light source casing member 11. The other end side partition wall 14 and the light source part casing member 11 constituting the electric field arrangement space portion 16 in the other end side region in the longitudinal direction of the lamp in the light source part casing member 11. It has the common space part 19 for air-winding which is partitioned off by the other end wall 11B of ().

The one end side partition wall 13 which forms the electric component arrangement space part 16 is provided with the guiding air vent 13A for introducing cooling air into the electric field arrangement space part 16, The electric field arrangement space part In the other end side partition wall 14 which forms 16, 14A of air vents for exhausting cooling wind from the electric field arrangement space part 16 are formed.

As shown in FIG. 3, the light source unit 20 includes an elongated lamp 25 that emits light having an emission peak at a wavelength of 300 nm to 400 nm, respectively, and the lamp 25 is inserted therein. A plurality of light source elements 21 constituted by an elongated outer tube (cylindrical jacket) 24 provided to extend along the lamp 25 in a state, for example, the axial center of each lamp 25 It is located in the same plane and extends in parallel with each other, and is arranged in parallel at equal intervals.

The lamps 25 constituting each of the light source elements 21 are held and fixed to the light source portion casing member 11 via the lamp holder 22, and the outer tube 24 has an opening at one end thereof. It is fixed to the light source part casing member 11 through the holding member which is not shown in the state located in the guiding space 18.

The number of light source elements 21 constituting the light source unit 20 is 32, for example, and the separation distance p of the adjacent light source elements 21 is 90 mm, for example.

The lamp 25 constituting the light source unit 20 is composed of, for example, an excimer lamp, and is suitable for polymerizing a photoreactive substance (monomer) contained in, for example, a liquid crystal in a liquid crystal panel material. Ultraviolet light with a wavelength of 300 nm to 400 nm is emitted.

Fig. 4 is a sectional view showing a cross section perpendicular to the longitudinal direction of the (A) perspective view and (B) the lamp, showing an example of the constitution of an excimer lamp according to the lamp used in the ultraviolet irradiation device of the present invention.

This excimer lamp 25 is provided with the hollow long discharge container 26 of the cross-sectional rectangular shape in which the discharge space S was formed inside, and this discharge container 26 is a discharge gas inside. For example, xenon gas is enclosed. Here, the discharge vessel 26 is made of, for example, quartz glass.

Each outer surface of the upper wall 26A and the lower wall 26B in the discharge vessel 26 has a pair of mesh-shaped electrodes, namely, one electrode 27A serving as a high voltage power feeding electrode and a ground electrode. The other electrodes 27B which function are arranged to face each other so as to extend in the longitudinal direction.

Moreover, the reflector layer 30, the glass powder layer 31, and the fluorescent substance layer 32 were laminated | stacked on the inner surface of the wall except the lower wall 26B of the discharge container 26 in order from an outer surface side, It is provided and is provided in the state which the glass powder layer 31 and the phosphor layer 32 laminated | stacked on the inner surface of the lower wall 26B of the discharge container 26 which forms a light output part.

The reflector layer 30 is made of a mixture of silica and alumina, for example.

As the glass constituting the glass powder layer 31, for example, borosilicate glass (Si-BO glass) and aluminosilicate glass (Si-Al-O glass), barium silicate glass, or any of these Based on one composition, the glass etc. which added alkaline-earth oxide, alkali oxide, and metal oxide can be illustrated.

As the phosphor constituting the phosphor layer 32, for example, europium-activated strontium borate (Sr-BO: Eu (hereinafter referred to as "SBE"), a center wavelength of 368 nm) phosphor, cerium-activated magnesium lanthanum aluminate ( La-Mg-Al-O: Ce (hereinafter referred to as "LAM"), central wavelength of 338 nm (broad) phosphor, gadolinium, praseodymium-activated lanthanum phosphate (La-P-0: Gd, Pr (hereinafter , "LAP: Pr, Gd".), Center wavelength 311 nm) fluorescent substance etc. can be illustrated.

The outer tube 24 is cylindrical, for example made of a light-transmissive material, for example, quartz glass, which transmits light in the wavelength range of 300 nm to 400 nm, and has a length substantially the same as that of the lamp 25.

Moreover, the magnitude | size of the minimum space | interval part of the space | interval which comprises the cooling airflow passage 24A formed between the inner surface of the outer tube 24 and the outer surface of the lamp 25 is 16-30 mm, for example.

The cooling part 40 is equipped with the box-shaped cooling part casing member 41 provided in the center position of the light source element 21 in the arrangement direction center, for example in the upper part of the light source part casing member 11, Inside the cooling unit casing member 41, for example, a cooling fan 42 such as an axial fan and an upstream side of the cooling fan 42, for example, a heat exchanger for heat dissipation such as a water cooling radiator ( 43) is arranged.

The internal space of this cooling part casing member 41 is a space for guiding part 18 and a blowing air in the light source part 10 via the ventilation duct 45 provided in each of both sides of the cooling part casing member 41. The cooling air supplied from the cooling fan 42 is communicated with the space for the space 19, and thus, the cooling air supplied from the cooling fan 42 is provided in the electric field arrangement space 16 via the space for the wind 18 in the light source unit 10. In addition, it is introduced into the outer tube 24 in each light source element 21, and is introduced into the heat exchanger 43 for heat dissipation in the cooling unit 40 via the air space space 19. The cooling mechanism which forms the closed circulation cooling wind distribution path | route which is formed is comprised.

The light guide unit 50 serves as a so-called spacer for securing a sufficient separation distance between the light source unit 20 and the object to be processed W while sufficiently securing the amount of ultraviolet irradiation to the object to be processed W. It also has a function, has a size corresponding to the opening 12 for light irradiation in the light source casing member 11, and has an inner circumferential surface formed by a reflecting surface, for example, a rectangular frame shape light guide member for partitioning a processing space. The 51 is attached so that it may extend upward from the lower surface of the light source part 10.

As shown in FIG. 5, the light guide member 1 is configured by combining four plate members 52A to 52D, and each of the plate members 52A to 52D is made of, for example, aluminum. It is comprised by the base member 53 and the light reflective member 54 which consists of high brightness aluminum, for example.

On one wall (one plate-like member 52A) in the light guide member 51, for example, a liquid crystal panel material, which is the object to be processed W, is located at the lower repel of the light guide portion 50. Opening and closing doors 55 are provided for the entry and exit of a transfer robot (not shown) to be carried in and out of the stage 58 where the mounting surface is horizontal, and the light guide part is opened and closed by opening and closing the opening and closing door 55. The heat collected in the 50 can be released to the outside. Reference numeral 59 in Figs. 1 and 2 denotes a stage mount frame.

The power supply unit 60 controls lighting of each lamp 25, and is usually disposed separately from the light source unit 10 in consideration of weight and maintenance. However, since the transformer 35 generates a high voltage, it is disposed inside the light source portion casing member 11.

The operation of the ultraviolet irradiation device will be described.

In this ultraviolet irradiation device, the to-be-processed target object W (for example, a liquid crystal panel member) is carried in via the opening-and-closing door 55 in the light guide member 51 by the transfer robot, and the stage 58 is carried out. ), The high frequency voltage is boosted to one electrode 27A of the excimer lamp 25 by the transformer 35 provided in the electric field arrangement space 16 than the power supply unit 60. And supplied, the dielectric barrier discharge is generated in the discharge space S via the dielectric material constituting the discharge vessel 26, and excimer molecules are formed by the dielectric barrier discharge, and light emitted from the excimer molecule (xenon gas In this case, the phosphor constituting the phosphor layer 32 is excited by 175 nm vacuum ultraviolet light), and ultraviolet rays of 300 nm to 400 nm pass through the lower wall 26B of the discharge vessel 26 and the other electrode. Passing through the opening of (27B) Is emitted.

On the other hand, a part of the cooling air supplied by the cooling fan 42 being driven is introduced into the electric field arrangement space part 16 via the guiding space part 18 of the light source part 10, and the other whole parts are respectively. Into the outer shell tube 24 of the light source element 21 of the light source element 21, specifically, is introduced into the cooling wind flow passage 24A formed between the inner surface of the outer tube tube 24 and the outer surface of the element 25, For this reason, the excimer lamp 25 and the outer tube 24 are cooled, and are introduce | transduced into the heat exchanger 43 through the air space space 19, and are cooled, and are not exhausted to the exterior of an apparatus again, Cooling wind is supplied by the cooling fan 42.

In this way, according to the ultraviolet irradiation device of the above configuration, the plurality of light source elements 21 are arranged in parallel while the axis centers of the excimer lamps 25 are located in the same horizontal plane and extend in parallel with each other. Since the light source unit 20 is comprised, the ultraviolet-ray of a wavelength range of 300 nm-400 nm can be irradiated basically with the uniform illuminance distribution with respect to the to-be-processed object W, and also the to-be-processed object ( The temperature rise of W) can be reduced, and the temperature nonuniformity in the surface of the target object W can be suppressed. That is, in each light source element 21, since the outer tube 24 is installed in the state which the excimer lamp 25 inserted in the inside, the cooling wind guiding function by the outer tube 24 (regular wind) Function), the discharge vessel 26 of the excimer lamp 25 can be directly cooled, so that the plurality of excimer lamps 25 are uniformly cooled for each lamp to be treated by the excimer lamp 25 itself. Since the imbalance of the radiant heat with respect to (W) can be suppressed small, it can suppress that a heating wire is irradiated with respect to the to-be-processed object W, and also the outer tube 24 itself is cooled by a cooling wind, Radiant heat to the object to be processed W can be suppressed, which makes it possible to reduce the temperature rise of the object to be processed W and to achieve high temperature uniformity in the plane of the object to be processed W. You can get it.

Therefore, for example, it becomes suitable as an ultraviolet irradiation device used in reaction process (pretilt angle expression process) of the liquid crystal panel material in the manufacturing process of a liquid crystal panel.

Moreover, since the inner peripheral surface is provided with the light guide part 50 which consists of the space formed by the reflective surface, the light source unit 20 and the to-be-processed object W are ensured, ensuring sufficient ultraviolet irradiation amount with respect to the to-be-processed object W. Since the separation distance between) can be made large, the influence by the radiant heat of the light source unit 20 can be suppressed more reliably, the temperature rise of the to-be-processed object W can be reduced, and the to-be-processed object ( High temperature uniformity in the plane of W) can be obtained.

In addition, the excimer lamp 25 is used, and the phosphor layer in which ultraviolet rays (vacuum ultraviolet rays) in a predetermined wavelength range generated in the discharge space S of the excimer lamp 25 are provided on the inner surface of the discharge vessel 26. By the action of (32), the structure is radiated as ultraviolet rays of 300 to 400 nm, so that the excess light component is not emitted to the object to be treated (W), thereby increasing the temperature of the object to be treated (W). You can certainly do it.

In addition, since the heat exchanger 43 for heat dissipation is provided, a closed (closed) cooling wind circulation path can be formed, and even when the ultraviolet irradiation device is used in a clean room, for example. Since it is not necessary to bring in the cooling wind from the outside of the apparatus, and to exhaust the cooling wind to the outside of the apparatus, there is no need to connect a duct or the like, and the cooling mechanism can be configured compactly.

In addition, by being air-cooled, problems such as water leakage, which may occur when water-cooled, do not occur.

EMBODIMENT OF THE INVENTION Hereinafter, the experiment example performed in order to confirm the effect of this invention is demonstrated.

<Experimental example 1>

According to the structure shown to FIG. 1 and FIG. 2, the ultraviolet irradiation device which concerns on this invention which has the following structures was produced.

The light source unit 20 is 32 in number of light source elements 21, and the separation distance (distance between shaft centers of a lamp) of adjacent light source elements is 90 mm.

The lamp 25 constituting each light source element 21 has a total length of 2800 mm, a longitudinal and horizontal dimension of 43 mm x 15 mm, a lamp output of 2 kPa, and a material of the discharge vessel 26 of quartz glass or phosphor layer. The phosphor constituting (32) is an excimer lamp containing SBE and xenon gas as a gas for discharging, wherein the outer tube 24 is made of quartz glass, a total length of 2500 mm, an inner diameter of 76 mm, and a thickness of 2.5 mm. It is cylindrical in shape.

The cooling fan 42 is an axial fan having a blowing ability capable of supplying, for example, cooling air of a blowing amount of 4 m 3 / min (128 m 3 / min in the entire light source unit) to one light source element 21. The pressure in the space part 18 for guiding wind is about 500-1000 Pa, the temperature of cooling wind is 30 degreeC, and the temperature of the wind in the space part 19 for ventilation wind is about 60 degreeC.

The height of the light guide member 51 is 300 mm.

The to-be-processed object W is a test liquid crystal panel material whose longitudinal and horizontal dimensions are 2200 mm x 2500 mm, and the distance between the light source unit 20 and the to-be-processed object w is 400 mm.

By using this ultraviolet irradiation device, all the lamps 25 in each light source element 21 are turned on under the same lighting conditions, and ultraviolet-ray is irradiated to the test liquid crystal panel material which is the to-be-processed object W, and the test liquid crystal panel material of It is confirmed that illuminance uniformity is in the range of ± 8.9% when the illuminance and temperature at any of a plurality of measurement points on the light irradiation surface are measured and the illuminance uniformity on the light irradiation surface of the test liquid crystal panel material is obtained. It became.

Moreover, it was confirmed that the temperature on the light irradiation surface of the test liquid crystal panel material reached 30 degreeC +/- 2 degreeC (degree of temperature rise) when the time for 120 second passed after ultraviolet-ray was started to irradiate. Here, the surface temperature of the liquid crystal panel material for a test before irradiating an ultraviolet-ray is 25 degreeC.

<Roughness uniformity>

When "illuminance uniformity" makes Ea and the illuminance measurement value in each of a some measurement point Eb the average value of the illuminance measured in the some measurement point in the light irradiation surface of the liquid crystal panel material for a test,

(Ea-Eb) / Ea (%)

Is defined by In Experimental Example 1, the average illuminance Ea on the light irradiation surface of the liquid crystal panel material for a test was about 19 mW / cm 2.

Moreover, when the total radiation amount of the light of the wavelength range of 200 nm-20000 nm was measured by the calorimeter, the total radiation amount with respect to the test liquid crystal panel material is 57 kW / cm <2>, Among these, 300 nm-400 nm The amount of radiant heat by light other than the ultraviolet-ray in a wavelength range (light which does not contribute to the photochemical reaction in a liquid crystal panel material) was 38 dl / cm <2>. Here, the surface temperature of the lamp was 250 ° C and the surface temperature of the outer tube was about 6.0 ° C.

<Comparative Experimental Example 1>

According to the structure shown in FIG. 6, the ultraviolet irradiation device for comparison was produced. This ultraviolet irradiation device does not include a cooling mechanism, and thus, in the light source unit of the ultraviolet irradiation device produced in Experimental Example 1, the light source unit 20A having the same configuration except that it does not have an outer tube is provided. Have In Fig. 6, reference numeral 51A denotes an auxiliary reflecting plate, and 50A denotes a casing that divides the processing space therein, and the same reference numerals are given to the same constituent members shown in Figs.

By using this ultraviolet irradiation device, all the lamps 25 in the light source unit 20A are all turned on under the same lighting conditions, and the ultraviolet rays are irradiated to the test liquid crystal panel material. It was confirmed that illuminance uniformity was in the range of ± 10.8% when the illuminance and temperature at any of a plurality of measurement points on the slope were measured and the illuminance uniformity on the light irradiation surface of the test liquid crystal panel material was determined. . In addition, the average illuminance Ea in the light irradiation surface of the liquid crystal panel material for a test was about 25 kPa / cm <2>.

Moreover, it was confirmed that the temperature on the light irradiation surface of the test liquid crystal panel material reached 60 degreeC +/- 12 degreeC (degree of temperature rise) when the time for 120 second passed after the ultraviolet ray started to irradiate.

Moreover, when the total radiation amount of the light of the wavelength range of 200 nm-20000 nm was measured with the calorimeter, the total radiation amount with respect to the liquid crystal panel material for a test is 173 kPa / cm <2>, Among these, 300 nm-400 nm The amount of radiant heat was 148 Pa / cm <2> by light other than the ultraviolet-ray of a wavelength range (light which does not contribute to the photochemical reaction in a liquid crystal panel material). Here, the surface temperature of the lamp was about 300 ° C.

<Comparative Experiment Example 2>

According to the structure shown in FIG. 7, the comparative ultraviolet irradiation device was produced. This ultraviolet irradiating apparatus is the ultraviolet irradiating apparatus produced in the said Experimental Example 1 WHEREIN: The light source unit does not have an outer tube, and it replaces the light guide part, and the opening of the opening 12 for light irradiation is replaced. The auxiliary reflecting plate 51A is provided at the edge portion, and the light transmitting window 12A is provided in the light irradiation opening 12, and has the same configuration as the ultraviolet irradiation device produced in Experimental Example 1 above. In addition, about the same structural member, the same code | symbol is attached | subjected for convenience. In Fig. 7, reference numeral 50A denotes a casing that divides the processing space therein.

By using this ultraviolet irradiation device, all the lamps 25 in the light source unit 20A are all turned on under the same lighting conditions, and the ultraviolet rays are irradiated to the test liquid crystal panel material. It was confirmed that illuminance uniformity was in the range of ± 11.2% when the illuminance and temperature at any of a plurality of measurement points on the slope were measured and the illuminance uniformity on the light irradiation surface of the test liquid crystal panel material was obtained. . In addition, the average roughness Ea in the light irradiation surface of the liquid crystal panel material for a test was about 21 mW / cm <2>.

In addition, it was confirmed that the temperature on the light irradiation surface of the test liquid crystal panel member reached 45 ° C. ± 20 ° C. (degree of temperature rise) at the time when 120 seconds had elapsed since the ultraviolet ray was started to be irradiated.

Moreover, when the total radiation amount of the light of the wavelength range of 200 nm-20000 nm was measured with the calorimeter, the total radiation amount with respect to the test liquid crystal panel material is 110 mW / cm <2>, Among these, 300 nm-400 nm The radiant heat amount by light other than the ultraviolet-ray of a wavelength range (light which does not contribute to the photochemical reaction in a liquid crystal panel material) was 89 dl / cm <2>. Here, the surface temperature of the lamp was about 280 ° C and the surface temperature of the light transmitting window was 147 ° C.

As mentioned above, according to the ultraviolet irradiation device which concerns on this invention, it was confirmed that high in-plane uniformity with respect to an ultraviolet light intensity and temperature in the light irradiation surface of a to-be-processed object.

Moreover, it was confirmed that the grade of the temperature rise of the to-be-processed object by ultraviolet irradiation can be made small.

As mentioned above, although embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.

For example, in the ultraviolet irradiation device of this invention, the number and arrangement | positioning method of the light source element which comprises a light source unit are not limited to the thing of the said embodiment, According to the objective, it can change a design suitably.

10: light source part 11: light source part casing member
11A: One end wall 11B: The other end wall
12: Light irradiation opening 12A: Light transmission window
13: One side partition 13A: Ventilation opening
14: Outer side partition 14A: Ventilation vents
15: light source unit arrangement space portion 16: electric field arrangement space portion
18: space for the wind 19: space for the wind
20, 20A: light source unit 21: light source element
22: lamp holder 24: outer tube (tubular jacket)
24A: Cooling air flow passage 25: Excimer discharge lamp (lamp)
26: discharge container 26A: top wall
26B: bottom wall 27A: one electrode
27B: other electrode 30: reflector layer
31: glass powder layer 32: phosphor layer
35: Trans S: discharge space
40: cooling part 41: cooling part casing member
42: cooling fan 43: heat exchanger
45: Ventilation duct 50: Light guide part
50A: casing 51: light guide member
51A: Secondary reflector 52A-52D: Plate-shaped member
53: base member 54: light reflective member
55: Opening and closing door 58: Stage
59: stage mount 60: power supply part
W: Object to be processed 70: Liquid crystal panel
71: first glass plate 72: active element
73: electrode for liquid crystal drive 74: alignment film
75: second glass plate 76: color filter
77: transparent electrode 78: alignment film
79: spacer member 80: liquid crystal layer

Claims (4)

In the ultraviolet irradiation device used in the manufacturing process of the liquid crystal panel containing a photoreactive substance,
Each of the plurality of light source elements constituted by an elongated lamp having a light emission peak at a wavelength of 300 nm to 400 nm, and an elongated outer tube having a light transmissive shape, provided with the lamp inserted therein. A light source unit which is arranged in parallel to face the liquid crystal panel material to be processed;
And a cooling mechanism for supplying cooling air to the inside of the outer tube in each of the light source elements. The method according to claim 1,
An ultraviolet irradiating apparatus, comprising a light guide portion having an inner circumferential surface formed by a reflective surface between the light source unit and the object to be processed. The method according to claim 1 or 2,
The lamp is an ultraviolet irradiation device, characterized in that the excimer lamp. The method according to claim 1 or 2,
The said cooling mechanism is equipped with the heat exchanger for heat radiation, The ultraviolet irradiation apparatus characterized by the above-mentioned.

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