TW201213930A - Ultraviolet irradiation apparatus - Google Patents

Ultraviolet irradiation apparatus Download PDF

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TW201213930A
TW201213930A TW100105643A TW100105643A TW201213930A TW 201213930 A TW201213930 A TW 201213930A TW 100105643 A TW100105643 A TW 100105643A TW 100105643 A TW100105643 A TW 100105643A TW 201213930 A TW201213930 A TW 201213930A
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Taiwan
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light source
light
ultraviolet irradiation
liquid crystal
crystal panel
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TW100105643A
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Chinese (zh)
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TWI504970B (en
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Noritaka Takezoe
Shingo Sato
Shinichi Endo
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Ushio Electric Inc
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841Barrier, adhesion or liner layers
    • H01L21/76853Barrier, adhesion or liner layers characterized by particular after-treatment steps
    • H01L21/76861Post-treatment or after-treatment not introducing additional chemical elements into the layer
    • H01L21/76862Bombardment with particles, e.g. treatment in noble gas plasmas; UV irradiation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Liquid Crystal (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Provided is an ultraviolet irradiation apparatus capable of achieving highly uniform ultraviolet illumination on the inner surface of an under-process target object, and less temperature rise in the under-process target object, able to perform an ultraviolet irradiation processing with high uniformity of the temperature on the inner surface of the under-process target object. The ultraviolet irradiation device is used for manufacturing the liquid crystal panel including optical active materials, comprising: light source units, including strip-shaped lamps respectively emitting a light with lighting peak value at wavelength between 300 to 400 nm, and a plurality of light source units constituted by transparent strip-shape outer sleeves, disposed in a state that the lamps are inserted internally, and the LCD materials as the target object to be processed are to be arranged in a row facing to each other; and a cooling mechanism for providing cooling air to the outer sleeve of each aforesaid light source unit.

Description

201213930 六、發明說明: 【發明所屬之技術領域】 本發明係關於例如液晶面板的製造工程中所使用之紫 外線照射裝置。 【先前技術】 液晶面板70係如圖8所示,爲於兩張玻璃板之間封 入液晶的構造,例如,於一面形成多數主動元件(例如薄 膜電晶體:TFT ) 72及液晶驅動用電極(透明電極:ITO )73,進而於其上形成配向膜74的第1玻璃板71,與於 一面形成彩色濾光片76、透明電極77及配向膜78的第2 玻璃板,以經由間隔物構件79而一面彼此相互對向之方 式配置’並於第1玻璃板71及第2玻璃板72之間形成液 晶層70而構成。 於此種液晶面板70的製造工程中,公知有藉由對於 還有對紫外線反應而聚合之光學活性物質(單體)的液晶 之液晶面板,照射紫外線,進行液晶面板材的反應處理( 預傾角發現處理,P S V A )之技術(參照專利文獻1 )。 於此技術中,利用一邊施加電壓,一邊將紫外線對液晶面 板照射’可在使液晶配向於特定方向之狀態下使光學活性 物質聚合,藉此,可賦予液晶所謂預傾角。 於此種利用紫外線之液晶面板材的反應處理(PSVA )中’需要對於液晶之光學活性物質,以高照度照射紫外 線之外’被要求液晶之光學活性物質不會暴露於高溫度下 -5- 201213930 光學活性物質的反應速度係溫度依存性較高,照射中 的溫度較高時則會過度聚合而使聚合物顆粒的成長過大。 於是因爲沒有均勻的預傾角而對比變差,會造成漏光。 進而,液晶面板材之光照射面中產生溫度不均勻的話 ,光學活性物質的反應會產生偏差(差離),使液晶的傾 斜(預傾角)也產生不均,此液晶之傾斜不均在成品時會 造成濃淡不均》 如上所述,於液晶面板的製造工程中,在進行利用紫 外線之液晶面板材的反應處理時,雖然被要求(1)將波 長3 00〜3 5 Onm的紫外線照射液晶面板,(2 )液晶面板 材的光照射面之紫外線照射的面內均勻性較高,(3 )液 晶面板材的溫度上升較少,液晶面板材的光照射面之溫度 的面內均勻性較高,但是,不會對光學活性物質造成壞影 容,可進行所希望之液晶面板材的反應處理的紫外線照射 裝置並未被公知也是實情。 [先前技術文獻] [專利文獻] [專利文獻1]日本特開2003 - 1 77408號公報 【發明內容】 [發明所欲解決之課題] 本發明係爲了解決以上問題所發明者,目的爲提供被 -6- 201213930 處理對象物的光照射面之紫外線照度的面內均勻性 而且,被處理對象物的溫度上升較少,可進行被處 物的光照射面之溫度的面內均勻性高之紫外線照射 紫外線照射裝置。 [用以解決課題之手段] 本發明的紫外線照射裝置,係於包含光學活性 液晶面板的製造工程中所使用的紫外線照射裝置, 爲具備: 光源單元,係分別放射於波長300nm〜400nm 發光峰値的光之長條狀的燈,及藉由在該當燈插通 之狀態下設置,且具有透光性之長條狀的外套管所 複數光源元件與身爲被處理對象物的液晶面板材對 列排列所成;及 冷卻機構’係對前述各光源元件之外套管的內 冷卻風。 於本發明的紫外線照射裝置中,設爲於前述光 與被處理對象物之間,具備由內周面藉由反射面所 空間所成的光導引部之構造爲佳。 又’於本發明的紫外線照射裝置中,設爲作爲 而使用準分子燈之構造爲佳。 進而,於本發明的紫外線照射裝置中,設爲前 機構係具備放熱用的熱交換器之構造爲佳。 較商^ 理對象 處理的 物質之 其特徵 中具有 於內部 構成之 向而並 部供給 源單元 形成之 前述燈 述冷卻 201213930 [發明的效果] 依據本發明的紫外線照射裝置,基本上,藉由複數光 源元件被並列配置來構成光源單元,可對於被處理對象物 ’以均勻的照度分布,照射特定波長帶的紫外線。 而且,於各光源元件中,藉由外套管以其內部插通燈 之狀態下設置,利用外套管所致之冷卻風導風功能,可直 接冷卻燈的發光管,故複數燈每個燈都被均勻冷卻,可將 來自燈本身的對於被處理對象物的放射熱之偏差抑制成較 低’並且可抑制熱線對於被處理對象物照射,又,外套管 其本身也藉由冷卻風冷卻,故可抑制對於被處理對象物的 放射熱,例如,成爲適合作爲液晶面板的製造工程之液晶 面板的反應處理(預傾角發現處理)中所使用之紫外線照 射裝置者。 又,藉由設爲更具備內周面是藉由反射面所形成之空 間所成的光導引部的構造,可一邊充分確保對於被處理對 象物的紫外線照射量,一邊擴大光源單元與被處理對象物 之間的離開距離,故可更確實抑制光源單元的放射熱所致 之影響,可降低被處理對象物的溫度上升,並且可抑制被 處理對象物的面內之溫度不均勻性。 進而,藉由設爲使用準分子燈的構造,因爲不放射多 餘的光成分,可確實降低被處理對象物的溫度上升之程度 〇 進而,藉由設爲冷卻機構具備熱交換器的構造,可形 成密閉系的冷卻風循環供給路徑,即使在將紫外線照射裝 -8- 201213930 置例如在無塵室內使用時’也不需要準備導管等,可簡潔 地冷卻燈。 【實施方式】 圖1係揭示從正面方向觀看本發明之紫外線照射裝置 的一構造例之內部構造的槪略的說明圖,圖2係揭示從— 側面方向觀看圖1所示之紫外線照射裝置之內部構造的槪 略的說明圖。 此紫外線照射裝置係大致上由光源部1 〇、冷卻部40 、光導引部50及電源部60所構成。 光源部1 0係具備具有於下方開口之光照射用開口】2 的整體爲箱型形狀的光源部殼體構件11,此光源部殻體 構件11係其內部空間於上下方向被區分,下方側空間部 爲配置光源單元2 0的光源單元配置空間部1 5,並且上方 側空間部爲對應光源單元2 0之例如配置有變壓器3 5等的 電裝體的電裝體配置空間部16。 又’於光源部殼體構件11內之構成光源單元20的燈 25的長邊方向之一端側區域,具有藉由構成電裝體配置 空間部1 6之一端側間隔壁1 3與光源部殼體構件11的一 端壁11A來區分,而形成之用以將冷卻風導入至電裝體 配置空間部1 6及光源單元配置空間部1 5個別之共通的導 風用空間部1 8,並且於光源部殼體構件1 1內之燈的長邊 方向之另一端側區域,具有藉由構成電裝體配置空間部 1 6的另一端側間隔壁1 4與光源部殻體構件1 1的另一端 -9 - 201213930 壁1 1 B來區分,而形成之共通的排風用空間部1 9。 於形成電裝體配置空間部1 6的一端側間隔壁1 3,形 成有用以將冷卻風導入至電裝體配置空間部16的導風用 通風口 1 3 A,於形成電裝體配置空間部1 6的另一端側間 隔壁1 4,形成有用以將冷卻風從電裝體配置空間部1 6排 出的排風用通風口 14A。 光源單元20係如圖3所示,分別放射於波長3 00nm 〜400nm中具有發光峰値的光之長條狀的燈25,及藉由 在此燈2 5插通於內部之狀態下沿著燈2 5設置之長條狀的 外套管(筒狀套)24所構成之複數光源元件21在例如各 個燈2 5的軸中心位於相同平面,並且相互平行延伸之狀 態下,每等間隔並列配置而構成。 構成各個光源元件2 1的燈2 5,係經由燈保持部22, 被保持固定於光源部殻體構件11,又,外套管24係在其 一端開口位於導風用空間部1 8之狀態下,經由未圖示之 保持構件’固定保持於光源部殻體構件1 1。 構成光源單元20的光源元件21的數量係例如32個 ’鄰接之光源元件2 1的離間距離p係例如90mm。 構成光源單元20的燈25係例如藉由準分子燈所構成 ’例如’放射合適於使液晶面板材之液晶所包含之光學活 性物質(單體)聚合的波長之30 0nm〜400nm的紫外光。 圖4係揭示本發明的紫外線照射裝置中所使用之燈相 關的準分子燈之一構造例,(A)立體圖,(B)揭示垂 直於燈的長邊方向之剖面的剖面圖。 -10- 201213930 此準分子燈2 5係於內部具備形成放電空間S之剖面 矩形狀的中空長條狀的放電容器26,於此放電容器26的 內部,作爲放電用氣體,例如封入氙氣。在此,放電容器 2 6例如由石英玻璃所成。 於放電容器26之上壁26A及下壁26B個別的外表面 ’一對網狀的電極,亦即,作爲高電壓供電電極而作用之 一方的電極27A及作爲接地電極而作用之另一方的電極 27B以延伸於長邊方向之方式相互對向而配置。 又,於放電容器26之除了下壁2 6B的壁面之內表面 ’在從外面側依序反射材層30'玻璃粉末層31及螢光體 層32在被層積之狀態下設置,於形成光射出面之放電容 器26的下壁26B之內表面,玻璃粉末層31及螢光體層 3 2再被層積之狀態下設置。 反射材層3 0係例如藉由氧化矽與氧化鋁的混合物所 構成。又,作爲構成玻璃粉末層31的玻璃,例如可例示 硼矽酸玻璃(Si-Β-Ο系玻璃)及矽酸鋁玻璃(Si-Al-Ο系 玻璃)、矽酸鋇玻璃,或者以該等任一·組成爲基準添加鹼 土類氧化物或鹼金屬氧化物、金屬氧化物的玻璃等。 又,作爲構成螢光層32的螢光饋,例如可例示銪賦 活硼酸緦(S r- B - Ο : Eu (以下稱爲「S B E」),中心波長 368nm)螢光體、铈賦活鋁酸鎂鑭(La-Mg-Al-〇: Ce (以 下稱爲「LAM」),中心波長3 3 8nm (但是broad))營 光體、釓、鐯賦活磷酸鑭(La-P-〇: G(i,Pr (以下稱爲厂 LAP : Pr,Gd」),中心波長3 1 Inm )螢光體等。 -11 - 201213930 外套管24係例如可透過300nm〜400nm之波長帶的 光之透光性材料,例如由石英玻璃所成的圓筒狀者,具有 與燈25幾近相同之長度。 又,構成形成於外套管24的內面與燈25的外面之間 的冷卻風流通路徑24A之空隙的最小間隔部分之大小係 例如1 6〜3 0 m m。 冷卻部40係例如具備設置於光源部殻體構件1 1的上 部之光源元件21的排列方向中央位置之箱型形狀的冷卻 部殻體構件4 1,於此冷卻部殻體構件4 1的內部,例如配 置有軸流風扇等的冷卻風扇42、於該當冷卻風扇42的上 流側中’例如配置有水冷散熱器等之放熱用的熱交換器 4 3° 此冷卻部殼體構件41的內部空間,係經由分別設置 於冷卻部殻體構件41的兩側之通風導管45,與光源部10 之導風用空間部18及排風用空間部19連通,藉此,由冷 卻風扇42供給之冷卻風經由光源部1 〇之導風用空間部 18’被導入至電裝體配置空間部16內,並且被導入至光 源元件21之外套管24內,經由排風用空間部19被導入 至冷卻部40之放熱用的熱交換器43,構成被閉鎖之循環 冷卻風流通路徑的冷卻機構。 光導引部50係具有一邊充分確保對於被處理對象物 w的紫外線照射量,一邊用以於光源單元20與被處理對 象物W之間確保充分大小的離開距離的作爲所謂間隔物 的功能’具有對應光源部殼體構件1丨之光照射用開口 12 -12- 201213930 的大小,以內周面藉由反射面形成之例如區分處理空間之 矩形框狀之光導引構件5 1從光源部1 0的下面往下方延伸 之方式安裝而構成。 光導引構件5 1係如圖5所示,組合4張構件52 A〜 52D而構成,構件52 A〜52D個別係藉由例如由鋁所成的 基座構件53與例如由高亮度鋁所成的光反射性構件54所 構成。 於光導引構件51之一方壁(一板狀構件52A),形 成有用以將身爲被處理對象物W的例如液晶面板材從位 於光導引構件5 0的下側位準的載置面爲水平之平台5 8搬 出或搬入的搬送機器人(未圖示)之進入或退避用的開閉 門55 ’可藉由此開閉門55的開閉,將滯留於光導引部50 的熱解放至外部。圖1及圖2之符號59係平台架台。 電源部60係控制各燈25點燈者,根據重量之觀點及 維護時的考量’通常與光源部1〇分離配置。但是,變壓 器3 5係因產生高電壓,所以配置於光源部殼體構件1 1內 部。 針對前述之紫外線照射裝置的動作進行說明。 s內產 於此紫外線照射裝置中’平板狀的被處理對象物w ( 例如液晶面板構件)藉由搬送機器人,經由光導引構件 51之開閉門55被搬入而載置於平台58上之狀態中,對 準分子燈25之一方的27A,高頻電壓由電源部6〇藉由設 置於電裝體配置空間部16之變壓器35升壓且被供給時, 經由構成放電容器26的介電質材料,在放電空間 -13- 201213930 生介電質屏障放電,藉由介電質屏障放電而形成準分子, 並藉由從準分子放射之光(氙氣之狀況爲175nm的真空 紫外光),激發構成螢光體層32的螢光體,3 OOnm〜 400nm的紫外線透過放電容器26的下壁26B,並且通過 另一方的電極27B之開口而放射。 另一方面,藉由驅動冷卻風扇42所供給之冷卻風經 由光源部10之導風用空間部18,其一部份被導入至電裝 體配置空間部16內,並且其他全部被導入至各光源元件 21之外套管24內,具體來說,被導入至形成於外套管24 的內面與準分子燈2 5的外面之間的冷卻風流通路徑2 4 A 內’藉此,冷卻準分子燈2 5及外套管2 4,之後,經由排 風用空間部19被導入至熱交換器43而被冷卻,不會排出 至裝置外部’再次’藉由冷卻風扇42供給冷卻風。 然後,依據前述構造的紫外線照射裝置,複數光源元 件2 1在位於各準分子燈2 5的軸中心,並且相互平行延伸 之狀態下,被並列配置而構成光源單元20,藉此,基本 上’對於被處理對象物W可利用均勻照度分布來照射 300nm〜400nm的波長帶之紫外線,而且,可降低被處理 對象物W的溫度上升’並且抑制被處理對象物w面內之 溫度不均勻性。亦即’於各光源元件21中,藉由外套管 24在其內部被插通有準分子燈25之狀態下設置,利用外 套管24所至之冷卻風導風功能(整風作用),可直接冷 卻準分子燈25的放電容器26,故複數準分子燈25依各 燈被均句冷卻’可將準分子燈25本身所致之對被處理對 -14- 201213930 象物W的放射熱之偏差抑制成較低,並且可抑制熱線對 於被處理對象物W照射,而且,外套管24其本身也藉由 冷卻風冷卻,故可抑制對於被處理對象物W的放射熱, 藉此,可抑制被處理對象物W的溫度上升,並且取得被 處理對象物W的面內之優良溫度均勻性。 所以,例如,合適作爲液晶面板的製造工程之液晶面 板材的反應處理(預傾角發現處理)中所使用之紫外線照 射裝置。 又,藉由具備由內周面是藉由反射面所形成之空間所 成的光導引部50,可一邊充分確保對於被處理對象物W 的紫外線照射量,一邊擴大光源單元20與被處理對象物 W之間的離開距離,故可更確實抑制光源單元20的放射 熱所致之影響,可降低被處理對象物W的溫度上升,並 且可取得被處理對象物W的面內之優良溫度均勻性。 進而,藉由設爲使用準分子燈25,於此準分子燈25 的放電空間S中產生之所定波長帶的紫外線(真空紫外線 )藉由設置於放電容器26內表面的螢光體層32之作用, 作爲300nm〜4〇Onm的紫外線放射之構造,不會對被處理 對象物W放射多餘的光成分,故可確實降低被處理對象 物W的溫度上升。 進而,又藉由設爲具備放熱用的熱交換器43之構造 ,可形成被閉鎖(密閉系的)之冷卻風循環路徑,即使例 如在無塵室內使用紫外線照射裝置之狀況中,因爲不需要 由裝置的外部來獲得冷卻風,及不用將冷卻風排出至裝置 -15- 201213930 外部,故不需要連接導管等,可簡潔地構成冷卻機構。 又,因爲是空冷式,也不會產生如果是水冷式的話則 有發生之虞的漏水等的問題。 以下,針對爲了確認本發明的效果而進行之實驗例進 行說明。 <實驗例1 > 遵從圖1及圖2所示構造,製作具有以下構造之本發 明相關的紫外線照射裝置。 光源單元(20 )係光源元件(21 )的數量爲32個, 連接之光源元件的離間距離(燈的軸中心間距離P )爲 90mm 〇 構成各光源元件(21)的燈(25)係全長2800mm, 橫縱的尺寸爲43mmxl5mm,燈輸出2kW,放電容器(26 )的材質是石英玻璃,構成螢光體層(32)的螢光體爲 SBE,作爲放電用氣體而封入氙氣的準分子燈,外套管( 24)的材質是石英玻璃,全長250 0mm,內徑76mm,厚 度2.5mm的圓筒狀者。 冷卻風扇(42)係具有可對於1個光源元件(21), 供給例如 4m3/min的送風量(在光源單元整體爲 12 8m3/min )之冷卻風的送風能力之軸流風扇。導風用空 間部(18 )之壓力係500〜lOOOPa,冷卻風的溫度是30°C ,排風用空間部(19)之風的溫度爲60°C程度》 光導引構件(51)的高度爲3 0 0mm。 -16· 201213930 被處理對象物(w )係橫縱的尺寸爲 2200mm x 2 5 00mm的試驗用液晶面板材,光源單元(20)與被處理 對象物(W )的離間距離爲400mm。 使用此紫外線照射裝置,使各光源元件(2 1 )之燈( 25 )以全部相同點燈條件來點燈,將紫外線照射至身爲被 處理對象物(W )的試驗用液晶面板材,而測定試驗用液 晶面板材的光照射面上之任意複數的測定處之照度及溫度 ,求出試驗用液晶面板材的光照射面之照度均勻性,可確 認照度均勻度在±8.9%的範圍內。 又,試驗用液晶面板材的光照射面之溫度係可確認在 從開始照射紫外線經過1 20秒間的時間之時間點,到達 30°C ±2°C (溫度上升的程度)。在此•照射紫外線之前的 試驗用液晶面板材的表面溫度爲25 °C。 <照度均勻性> 『照度均勻度』係將試驗用液晶面板材的光照射面之 複數測定處中被測定的照度之平均値設爲Ea,將複數測 定處之各照度測定値設爲Eb時, 藉由(計算式)(Ea-Eb)/Ea[%]來界定。於實驗 例1中,試驗用液晶面板材的光照射面之平均照度(Ea ) 約 1 9 m W / c m 2。 進而,又藉由熱量計,測定200nm〜20000nm之波長 帶的光之總放射熱量,相對於試驗用液晶面板材的總放射 熱量爲57mW/cm2,其中,3 00nrn〜400nm之波長帶的紫 -17- 201213930 外線以外的光(並不助益於液晶面板材之光化學反應的光 )所致之放射熱量爲38mW/cm2。在此,燈的表面溫度爲 250°C,外套管的表面溫度爲約60°C » <比較實驗例1 > 遵從圖6所示之構造,製作比較用的紫外線照射裝置 。此紫外線照射裝置係並未具備冷卻機構,與於前述實驗 例1中製作之紫外線照射裝置的光源單元中,除了不具有 外套管之外,具有相同構造的光源單元20A。於圖6中, 符號5 1 A係補助反射板,50A係於內部區分處理空間的殼 體,關於與前述圖1及圖2所示者相同的構成構件,附加 有相同符號。 使用此紫外線照射裝置,使各光源元單元(20A )之 各燈(25 )以全部相同點燈條件來點燈,將紫外線照射至 試驗用液晶面板材,與實驗例1相同,測定試驗用液晶面 板材的光照射面上之任意複數的測定處之照度及溫度,求 出試驗用液晶面板材的光照射面之照度均勻性,可確認照 度均句度在±10.8%的範圍內。再者,試驗用液晶面板材 的光照射面之平均照度(Ea )約25mW/cm2。 又,試驗用液晶面板材的光照射面之溫度係可確認在 從開始照射紫外線經過1 20秒間的時間之時間點,到達 60°C±12°C (溫度上升的程度)。 進而,又藉由熱量計,測定200nm〜20000nm之波長 帶的光之總放射熱量,相對於試驗用液晶面板材的總放射 -18- 201213930 熱量爲 173mW/cm2,其中,300nm〜400nm之波長帶的紫 外線以外的光(並不助益於液晶面板材之光化學反應的光 )所致之放射熱量爲148mW/cm2。在此,燈的表面溫度 爲約3 0 0 °C。 <比較實驗例2 > 遵從圖7所示之構造,製作比較用的紫外線照射裝置 。此紫外線照射裝置係設爲前述實驗例1中製作之紫外線 照射裝置中,光源單元不具有外套管的構造,又,爲了代 替光導引部,設爲於光照射用開口(】2 )的開口緣部設置 補助反射板(5 1 A ),並且於光照射用開口( 1 2 )設置光 透過窗(1 2 A )之構造,除此之外,具有與前述實驗例i 中製作之紫外線照射裝置相同的構造,關於相同構成構件 ,便利性上附加相同符號。於圖7中,符號5 Ο A係於內 部區分處理空間的殼體。 使用此紫外線照射裝置,使各光源元單元(20A )之 各燈(25 )以全部相同點燈條件來點燈,將紫外線照射至 試驗用液晶面板材,與實驗例1相同,測定試驗用液晶面 板材的光照射面上之任意複數的測定處之照度及溫度,求 出試驗用液晶面板材的光照射面之照度均勻性,可確認照 度均勻度在±11.2%的範圍內。再者,試驗用液晶面板材 的光照射面之平均照度(Ea )約2 1 mW/cm2。 又,試驗用液晶面板材的光照射面之溫度係可確認在 從開始照射紫外線經過1 20秒間的時間之時間點,到達 -19 - 201213930 45°C±20°C (溫度上升的程度)。 進而,又藉由熱量計,測定200nm〜20000nm之波長 帶的光之總放射熱量,相對於試驗用液晶面板材的總放射 熱量爲1 lOmW/cm2,其中,3 00nm〜400nm之波長帶的紫 外線以外的光(並不助益於液晶面板材之光化學反應的光 )所致之放射熱量爲89mW/cm2。在此,燈的表面溫度爲 280°C,光透過窗的表面溫度爲約147°C。 如上所述,依據關於本發明的紫外線照射裝置,可確 認於被處理對象物的光照射面中,針對紫外線照度及溫度 ,可取得優良面內均句性。 又,可確認可降低紫外線照射所致之被處理對象物的 溫度上升之程度。 以上,已針對本發明的實施形態進行說明,但是,本 發明不限定於前述之實施形態者,可施加各種變更。 例如,於本發明的紫外線照射裝置中,構成光源單元 之光源元件的個數及排列方法,並不限定於前述實施例, 可因應目的來適切設計變更》 【圖式簡單說明】 [圖】]揭示從正面方向觀看本發明之紫外線照射裝置 的一構造例之內部構造的槪略的說明圖。 [圖2 ]揭示從一側面方向觀看圖1所示之紫外線照射 裝置之內部構造的槪略的說明圖。 [圖3]槪略揭示關於本發明的光源單元之光源元件的 -20- 201213930 配置例的說明圖。 [圖4]揭示本發明的紫外線照射裝置中所使用之燈相 關的準分子燈之一構造例,(A)立體圖,(B)揭示垂 直於燈的長邊方向之剖面的剖面圖。 [圖5]揭示構成光導引部的光導引構件之一構造例, (A )立體圖,(B )光導引構件之側壁的端面圖。 [圖6]揭示從一側面方向觀看比較實驗例1中製作之 比較用的紫外線照射裝置之內部構造的槪略的說明圖。 [圖7]揭示從一側面方向觀看比較實驗例2中製作之 比較用的紫外線照射裝置之內部構造的槪略的說明圖。 [圖8]揭示液晶面板之構造槪略的說明用剖面圖。 【主要元件符號說明】 1 〇 :光源部 1 1 :光源部殼體構件 1 1 A :—端壁 1 1 B :另一端壁 1 2 :光照射用開口 12A :光透過窗 1 3 : ~端側間隔壁 13A :導風用通風口 1 4 :另一端側間隔壁 14A :排風用通風口 1 5 :光源單元配置空間部 -21 - 201213930 1 6 :電裝體配置空間部 1 8 :導風用空間部 1 9 :排風用空間部 20,20A:光源單元 2 1 :光源元件 22 :燈保持部 24 :外套管(筒狀套) 24A :冷卻風流通路徑 25 :準分子放電燈(燈) 26 :放電容器 26A :上壁 26B :下壁 27A :—方的電極 27B:另一方的電極 3 0 :反射材層 3 1 :玻璃粉末層 32 :螢光體層 3 5 :變壓器 S :放電空間 40 :冷卻部 4 1 :冷卻部殼體構件 4 2 :冷卻風扇 43 :熱交換器 45 :通風導管 -22 201213930 50 :光導引部 50A :殼體 51 :光導引構件 5 1 A :補助反射板 52A〜52D :板狀構件 5 3 :基座構件 54 :光反射性構件 5 5 :開閉門 58 :平台 59 :平台架台 60 :電源部 W :被處理對象物 7 0 :液晶面板 7 1 :第1玻璃板 7 2 :主動元件 73 :液晶驅動用電極 74 :配向膜 7 5 :第2玻璃板 76 :彩色濾光片 77 :透明電極 7 8 :配向膜 79 =間隔物構件 8 0 :液晶層201213930 SUMMARY OF THE INVENTION [Technical Field] The present invention relates to an ultraviolet irradiation device used in, for example, a manufacturing process of a liquid crystal panel. [Prior Art] As shown in FIG. 8, the liquid crystal panel 70 has a structure in which liquid crystal is sealed between two glass plates. For example, a plurality of active devices (for example, a thin film transistor: TFT) 72 and liquid crystal driving electrodes are formed on one surface (for example). The transparent electrode: ITO 73, and the first glass plate 71 on which the alignment film 74 is formed, and the second glass plate on which the color filter 76, the transparent electrode 77, and the alignment film 78 are formed to pass through the spacer member 79 is disposed so as to face each other and form a liquid crystal layer 70 between the first glass plate 71 and the second glass plate 72. In the manufacturing process of the liquid crystal panel 70, it is known that a liquid crystal panel of a liquid crystal having an optically active substance (monomer) polymerized in response to ultraviolet rays is irradiated with ultraviolet rays to perform a reaction treatment of a liquid crystal panel (pretilt angle). The technique of the discovery process (PSVA) is found (refer to Patent Document 1). In this technique, by irradiating the liquid crystal panel with ultraviolet rays while applying a voltage, the optically active substance can be polymerized in a state in which the liquid crystal is aligned in a specific direction, whereby the so-called pretilt angle of the liquid crystal can be imparted. In the reaction treatment (PSVA) of such a liquid crystal panel using ultraviolet rays, 'the optical active material for liquid crystal needs to be irradiated with ultraviolet light with high illumination. 'The liquid active material of the liquid crystal is required not to be exposed to high temperature-5- 201213930 The reaction rate of the optically active material is high in temperature dependence, and when the temperature during irradiation is high, the polymerization proceeds excessively and the growth of the polymer particles is excessively large. Therefore, because there is no uniform pretilt angle, the contrast is deteriorated, which causes light leakage. Further, when temperature unevenness occurs in the light-irradiated surface of the liquid crystal panel, the reaction of the optically active material is deviated (difference), and the tilt (pretilt angle) of the liquid crystal is also uneven, and the tilt of the liquid crystal is uneven in the finished product. In the manufacturing process of the liquid crystal panel, it is required to irradiate the liquid crystal with a wavelength of 300 to 3 The panel, (2) the in-plane uniformity of the ultraviolet irradiation of the light-irradiated surface of the liquid crystal panel is high, (3) the temperature rise of the liquid crystal panel is less, and the in-plane uniformity of the temperature of the light-irradiated surface of the liquid crystal panel is higher. The ultraviolet irradiation device which is high, but does not cause a bad influence on the optically active material, and which can perform the reaction treatment of the desired liquid crystal panel is not known. [PRIOR ART DOCUMENT] [Patent Document 1] [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. 2003- 1 77408. SUMMARY OF INVENTION [Problems to be Solved by the Invention] The present invention has been made to solve the above problems, and an object thereof is to provide -6- 201213930 In-plane uniformity of the ultraviolet illuminance of the light-irradiated surface of the object to be processed, and the temperature of the object to be processed is less increased, and the ultraviolet ray having high uniformity of the temperature of the light-irradiated surface of the object can be obtained. Irradiation of the ultraviolet irradiation device. [Means for Solving the Problem] The ultraviolet irradiation device of the present invention is an ultraviolet irradiation device used in a manufacturing process including an optically active liquid crystal panel, and includes a light source unit that emits light emission peaks at wavelengths of 300 nm to 400 nm, respectively. a long strip of light, and a plurality of light source elements and a liquid crystal panel which is an object to be processed, which are provided in a strip-shaped outer sleeve which is provided in a state in which the lamp is inserted. The arrangement of the columns; and the cooling mechanism 'is the internal cooling air of the casing outside the respective light source elements. In the ultraviolet irradiation device of the present invention, it is preferable to provide a structure in which the light guiding portion formed by the space of the reflecting surface is formed between the light and the object to be processed. Further, in the ultraviolet irradiation device of the present invention, it is preferable to use a structure in which an excimer lamp is used. Further, in the ultraviolet irradiation device of the present invention, it is preferable that the front mechanism is provided with a heat exchanger for heat release. The above-described illuminating device is formed by the illuminating device in accordance with the ultraviolet ray irradiation device of the present invention. The light source elements are arranged side by side to constitute a light source unit, and ultraviolet rays of a specific wavelength band can be irradiated to the object to be processed 'with a uniform illuminance distribution. Moreover, in each of the light source elements, the outer sleeve is disposed with the lamp inserted therein, and the cooling air guiding function by the outer sleeve can directly cool the light tube of the lamp, so each of the plurality of lamps When it is uniformly cooled, the deviation of the radiant heat from the lamp itself to the object to be processed can be suppressed to be lower, and the heat ray can be suppressed from being irradiated to the object to be processed, and the outer casing itself is cooled by the cooling air, so that the outer casing itself is cooled by the cooling air. It is possible to suppress the radiant heat of the object to be processed, for example, an ultraviolet ray irradiation device used in a reaction process (pretilt angle finding process) of a liquid crystal panel which is a manufacturing process of a liquid crystal panel. In addition, by providing a structure in which the inner peripheral surface is a light guiding portion formed by the space formed by the reflecting surface, the light source unit and the light source unit can be enlarged while sufficiently ensuring the amount of ultraviolet irradiation to the object to be processed. Since the distance between the objects to be processed is determined, the influence of the radiation heat of the light source unit can be more reliably suppressed, the temperature rise of the object to be processed can be lowered, and the temperature unevenness in the surface of the object to be processed can be suppressed. Further, by using a structure in which an excimer lamp is used, since the excess light component is not emitted, the temperature rise of the object to be processed can be surely lowered, and the structure in which the cooling mechanism includes the heat exchanger can be used. The cooling air circulation supply path of the closed system is formed, and even when the ultraviolet irradiation device-8-201213930 is used, for example, in a clean room, it is not necessary to prepare a duct or the like, and the lamp can be cooled succinctly. [Embodiment] FIG. 1 is a schematic explanatory view showing an internal structure of a configuration example of an ultraviolet irradiation device of the present invention viewed from a front direction, and FIG. 2 is a view showing the ultraviolet irradiation device shown in FIG. 1 viewed from a side direction. A schematic diagram of the internal structure. This ultraviolet irradiation device is basically constituted by the light source unit 1A, the cooling unit 40, the light guiding unit 50, and the power supply unit 60. The light source unit 10 has a box-shaped light source unit case member 11 having a light-emitting opening 2 that is open at the lower side, and the light source unit case 11 has its internal space divided in the vertical direction and the lower side. The space portion is a light source unit in which the light source unit 20 is disposed, and the space portion 15 is disposed, and the upper space portion is an electrical component arrangement space portion 16 in which an electric component such as a transformer 35 is disposed corresponding to the light source unit 20, for example. Further, one end side region in the longitudinal direction of the lamp 25 constituting the light source unit 20 in the light source unit case member 11 has an end side partition wall 13 and a light source portion shell which constitute one of the electrical component arrangement space portions 16 The end wall 11A of the body member 11 is divided, and the cooling air is introduced into the air guiding space portion 1 8 that is common to the electrical component arrangement space portion 16 and the light source unit arrangement space portion 15 and is The other end side region in the longitudinal direction of the lamp in the light source unit case member 1 1 has the other end side partition wall 14 and the light source unit case member 1 1 constituting the electrical component arrangement space portion 16 One end -9 - 201213930 Wall 1 1 B to distinguish, and form a common venting space part 1 9 . The one end side partition wall 13 of the electrical component arrangement space portion 16 is formed, and the air vent vent 1 3 A for introducing the cooling air into the electrical component arrangement space portion 16 is formed to form the electrical component arrangement space. The other end side partition wall 14 of the portion 16 forms an exhaust vent 14A for discharging the cooling air from the electrical component arrangement space portion 16. The light source unit 20 is a strip-shaped lamp 25 that emits light having a light-emitting peak 波长 at a wavelength of 300 nm to 400 nm, as shown in FIG. 3, and a state in which the lamp 25 is inserted inside. The plurality of light source elements 21 formed of the long outer sleeves (cylindrical sleeves) 24 provided by the lamps 25 are placed in parallel on the same plane, for example, in the state in which the centers of the respective lamps 25 are parallel to each other, and are arranged side by side at equal intervals. And constitute. The lamp 25 constituting each of the light source elements 21 is held and fixed to the light source unit case member 11 via the lamp holding portion 22, and the outer tube 24 is opened at the one end of the air guiding space portion 18. It is fixedly held by the light source unit case member 1 1 via a holding member 'not shown. The number of the light source elements 21 constituting the light source unit 20 is, for example, 32, and the distance d between the adjacent light source elements 2 1 is, for example, 90 mm. The lamp 25 constituting the light source unit 20 is made of, for example, an excimer lamp, for example, emitting ultraviolet light of a wavelength of 30 nm to 400 nm suitable for polymerizing an optically active substance (monomer) contained in a liquid crystal of a liquid crystal panel. Fig. 4 is a view showing an example of a structure of a lamp-related excimer lamp used in the ultraviolet irradiation device of the present invention, (A) a perspective view, and (B) a cross-sectional view showing a cross section perpendicular to the longitudinal direction of the lamp. -10-201213930 The excimer lamp 25 is provided with a hollow elongated discharge vessel 26 having a rectangular cross section formed in the discharge space S. Inside the discharge vessel 26, for example, helium gas is sealed as a discharge gas. Here, the discharge vessel 26 is made of, for example, quartz glass. A pair of mesh electrodes on the outer surface of the upper wall 26A and the lower wall 26B of the discharge vessel 26, that is, the electrode 27A which functions as a high voltage power supply electrode and the other electrode which functions as a ground electrode 27B is disposed to face each other in such a manner as to extend in the longitudinal direction. Further, the inner surface ' of the wall surface of the discharge vessel 26 except the lower wall 26B is disposed on the outer side from the outer surface side, and the glass powder layer 31 and the phosphor layer 32 are stacked in a state of being laminated. The inner surface of the lower wall 26B of the discharge vessel 26 on the exit surface is provided in a state in which the glass powder layer 31 and the phosphor layer 32 are further laminated. The reflective material layer 30 is composed of, for example, a mixture of cerium oxide and aluminum oxide. In addition, examples of the glass constituting the glass powder layer 31 include borosilicate glass (Si-lanthanum-based glass), aluminum silicate glass (Si-Al-lanthanum glass), and bismuth ruthenium silicate glass. An alkali earth oxide, an alkali metal oxide, a metal oxide glass or the like is added as a basis for any composition. In addition, as the fluorescent material constituting the fluorescent layer 32, for example, an endowment active boric acid borate (S r- B - Ο : Eu (hereinafter referred to as "SBE"), a center wavelength of 368 nm), a phosphor, an endowed live aluminate Magnesium lanthanum (La-Mg-Al-〇: Ce (hereinafter referred to as "LAM"), center wavelength 3 3 8 nm (but broad)) campsite, lanthanum, lanthanum active lanthanum (La-P-〇: G ( i, Pr (hereinafter referred to as factory LAP: Pr, Gd), center wavelength 3 1 Inm ) phosphor, etc. -11 - 201213930 The outer sleeve 24 is, for example, transmissive to light having a wavelength band of 300 nm to 400 nm. The material, for example, a cylindrical shape made of quartz glass, has a length almost the same as that of the lamp 25. Further, a space formed in the cooling air flow path 24A formed between the inner surface of the outer tube 24 and the outer surface of the lamp 25 is formed. The size of the minimum interval portion is, for example, 16 to 30 mm. The cooling portion 40 is, for example, a box-shaped cooling portion housing provided at the center in the arrangement direction of the light source elements 21 at the upper portion of the light source unit case member 1 1 . The member 4 1 is disposed inside the cooling unit case member 41, for example, a cooling fan 42 such as an axial fan is disposed. In the upstream side of the cooling fan 42, for example, a heat exchanger for heat dissipation such as a water-cooled radiator or the like is disposed. The internal space of the cooling unit case member 41 is provided on both sides of the cooling unit case member 41. The ventilation duct 45 communicates with the air guiding space portion 18 and the air exhausting space portion 19 of the light source unit 10, whereby the cooling air supplied from the cooling fan 42 is guided by the air guiding space portion 18' of the light source unit 1 It is introduced into the electrical component arrangement space portion 16 and introduced into the outer sleeve 24 of the light source element 21, and introduced into the heat release heat exchanger 43 of the cooling unit 40 via the air outlet space portion 19 to constitute a locked portion. The cooling mechanism that circulates the cooling air flow path. The light guiding unit 50 has a sufficient size to ensure sufficient separation between the light source unit 20 and the object W to be processed while sufficiently ensuring the amount of ultraviolet irradiation to the object w to be processed. The function of the distance as the spacer is different from the size of the light-irradiating opening 12 -12 to 201213930 corresponding to the light source unit case member 1 , and the inner peripheral surface is formed by the reflecting surface, for example, to distinguish the processing space. The frame-shaped light guiding member 51 is attached so as to extend downward from the lower surface of the light source unit 10. The light guiding member 51 is configured by combining four members 52A to 52D as shown in Fig. 5 . The members 52 A to 52D are each composed of, for example, a base member 53 made of aluminum and a light-reflecting member 54 made of, for example, high-brightness aluminum. One of the walls of the light guiding member 51 (a plate member) 52A), a transfer robot that is used to carry out or carry in, for example, a liquid crystal panel which is a target surface of the object to be processed W from a lower surface of the light guiding member 50 The opening and closing door 55' for entering or retracting as shown in the drawing can open and close the opening and closing door 55, and the heat retained in the light guiding portion 50 can be released to the outside. The symbol 59 of Figures 1 and 2 is a platform stand. The power supply unit 60 controls the lighting of each of the lamps 25, and is normally disposed apart from the light source unit 1A based on the viewpoint of weight and the consideration during maintenance. However, since the transformer 35 is generated at a high voltage, it is disposed inside the light source unit case member 1 1 . The operation of the ultraviolet irradiation device described above will be described. In the ultraviolet irradiation device, the flat object to be processed w (for example, a liquid crystal panel member) is carried by the transfer robot through the opening and closing door 55 of the light guiding member 51 and placed on the platform 58. In the case of 27A aligned with one of the molecular lamps 25, the high-frequency voltage is boosted by the power supply unit 6〇 by the transformer 35 provided in the electrical component arrangement space unit 16, and is supplied via the dielectric constituting the discharge capacitor 26. The material, in the discharge space -13-201213930, the dielectric barrier discharge, the excimer is formed by the discharge of the dielectric barrier, and is excited by the light emitted from the excimer (the vacuum ultraviolet light of 175 nm in the state of helium) In the phosphor constituting the phosphor layer 32, ultraviolet rays of 300 nm to 400 nm are transmitted through the lower wall 26B of the discharge vessel 26, and are radiated through the opening of the other electrode 27B. On the other hand, the cooling air supplied from the driving cooling fan 42 passes through the air guiding space portion 18 of the light source unit 10, and a part thereof is introduced into the electrical component arrangement space portion 16, and all others are introduced into each. The outer sleeve of the light source element 21, specifically, is introduced into the cooling air flow path 2 4 A formed between the inner surface of the outer sleeve 24 and the outer surface of the excimer lamp 25, thereby cooling the excimer The lamp 2 5 and the outer tube 24 are then introduced into the heat exchanger 43 via the air outlet space portion 19 to be cooled, and are not discharged to the outside of the device to supply the cooling air by the cooling fan 42. Then, according to the ultraviolet irradiation device of the above-described configuration, the plurality of light source elements 21 are arranged side by side in a state in which they are located at the axial center of each of the excimer lamps 25, and are arranged in parallel to constitute the light source unit 20, whereby substantially ' In the object to be processed W, ultraviolet rays of a wavelength band of 300 nm to 400 nm can be irradiated with a uniform illuminance distribution, and the temperature rise of the object W to be processed can be lowered, and temperature unevenness in the surface of the object to be processed w can be suppressed. That is, in each of the light source elements 21, the outer sleeve 24 is provided with the excimer lamp 25 inserted therein, and the cooling air guiding function (rectifying effect) by the outer sleeve 24 can be directly used. The discharge vessel 26 of the excimer lamp 25 is cooled, so that the plurality of excimer lamps 25 are uniformly cooled by the lamps, and the deviation of the radiation heat of the object W treated by the excimer lamp 25 itself can be treated. The suppression is low, and the heat ray can be suppressed from being irradiated to the object W to be processed, and the outer sleeve 24 itself is also cooled by the cooling air, so that the radiant heat to the object W to be processed can be suppressed, whereby the suppression can be suppressed. The temperature of the object W to be processed rises, and excellent temperature uniformity in the plane of the object W to be processed is obtained. Therefore, for example, it is suitable as an ultraviolet irradiation device used in a reaction treatment (pretilt angle finding treatment) of a liquid crystal panel for manufacturing a liquid crystal panel. In addition, by providing the light guiding portion 50 formed by the space formed by the reflecting surface on the inner peripheral surface, the light source unit 20 can be enlarged and processed while sufficiently ensuring the amount of ultraviolet irradiation to the object W to be processed. Since the distance between the objects W is suppressed, the influence of the radiation heat of the light source unit 20 can be more reliably suppressed, and the temperature rise of the object W to be processed can be lowered, and the excellent temperature in the plane of the object W to be processed can be obtained. Uniformity. Further, by using the excimer lamp 25, ultraviolet rays (vacuum ultraviolet rays) of a predetermined wavelength band generated in the discharge space S of the excimer lamp 25 are acted upon by the phosphor layer 32 provided on the inner surface of the discharge vessel 26. In the structure of ultraviolet radiation of 300 nm to 4 〇 Onm, unnecessary light components are not radiated to the object W to be processed, so that the temperature rise of the object W to be processed can be surely lowered. Further, by providing a structure including the heat exchanger 43 for heat release, it is possible to form a closed (closed) cooling air circulation path, and it is not necessary to use an ultraviolet irradiation device, for example, in a clean room. The cooling air is obtained from the outside of the device, and the cooling air is not discharged to the outside of the device -15-201213930. Therefore, it is not necessary to connect a duct or the like, and the cooling mechanism can be simply constructed. Further, since it is an air-cooled type, there is no problem that water leakage occurs if it is water-cooled. Hereinafter, an experimental example performed to confirm the effects of the present invention will be described. <Experimental Example 1> The ultraviolet irradiation device according to the present invention having the following structure was produced in accordance with the structure shown in Figs. 1 and 2 . The number of light source elements (20) is 32, and the distance between the connected light source elements (the distance P between the shaft centers of the lamps) is 90 mm. The total length of the lamps (25) constituting each light source element (21) 2800mm, the horizontal and vertical dimensions are 43mmxl5mm, the lamp output is 2kW, the discharge capacitor (26) is made of quartz glass, the phosphor that forms the phosphor layer (32) is SBE, and the xenon lamp is sealed as a discharge gas. The outer sleeve (24) is made of quartz glass and has a cylindrical shape of 250 mm in total length, 76 mm in inner diameter and 2.5 mm in thickness. The cooling fan (42) is an axial flow fan that can supply a cooling air of a cooling air of, for example, 4 m3/min (12 8 m3/min in the entire light source unit) to one light source element (21). The pressure system of the air guiding space portion (18) is 500 to 100 OPa, the temperature of the cooling air is 30 ° C, and the temperature of the wind in the air space portion (19) is 60 ° C. The light guiding member (51) The height is 300 mm. -16· 201213930 The object to be processed (w) is a test liquid crystal panel having a horizontal and vertical dimension of 2,200 mm × 2,500 mm, and the distance between the light source unit (20) and the object to be processed (W) is 400 mm. Using the ultraviolet irradiation device, the lamps (25) of the respective light source elements (2 1 ) are turned on under the same lighting conditions, and the ultraviolet rays are irradiated onto the test liquid crystal panel which is the object to be processed (W). The illuminance and temperature of the measurement unit at any of the plurality of light-irradiated surfaces of the test liquid crystal panel were measured, and the illuminance uniformity of the light-irradiated surface of the liquid crystal panel for the test was determined, and the illuminance uniformity was confirmed to be within ±8.9%. . In addition, the temperature of the light-irradiated surface of the test liquid crystal panel was confirmed to be 30 ° C ± 2 ° C (degree of temperature rise) from the time when the ultraviolet ray was irradiated for about 20 seconds. Here, the surface temperature of the test liquid crystal panel before the irradiation of ultraviolet rays was 25 °C. <Illuminance Uniformity> The "illuminance uniformity" is obtained by setting the average illuminance of the illuminance measured in the plurality of measurement portions of the light-irradiated surface of the test liquid crystal panel to Ea, and setting the illuminance measurement at the plurality of measurement positions to 値Eb is defined by (calculation) (Ea-Eb)/Ea[%]. In Experimental Example 1, the average illuminance (Ea) of the light-irradiated surface of the liquid crystal panel for the test was about 19 m W / c m 2 . Further, the total radiant heat of the light in the wavelength band of 200 nm to 20,000 nm is measured by a calorimeter, and the total radiant heat of the liquid crystal panel for the test is 57 mW/cm 2 , wherein the violet band of the wavelength band of 300 nr to 400 nm is 17- 201213930 The amount of radiation outside the outside line (light that does not contribute to the photochemical reaction of the liquid crystal panel) is 38 mW/cm2. Here, the surface temperature of the lamp was 250 ° C, and the surface temperature of the overtube was about 60 ° C » <Comparative Experimental Example 1 > The ultraviolet irradiation device for comparison was prepared in accordance with the structure shown in Fig. 6 . This ultraviolet irradiation apparatus does not include a cooling mechanism, and the light source unit of the ultraviolet irradiation apparatus manufactured in the above-described Experimental Example 1 has the light source unit 20A having the same structure except that the outer casing is not provided. In Fig. 6, reference numeral 5 1 A is a supplementary reflection plate, and 50A is a casing for distinguishing the processing space therein, and the same components as those shown in Figs. 1 and 2 are denoted by the same reference numerals. Using the ultraviolet irradiation device, the lamps (25) of the respective light source unit units (20A) were turned on under the same lighting conditions, and the ultraviolet rays were irradiated onto the liquid crystal panel for the test. The test liquid crystal was measured in the same manner as in the experimental example 1. The illuminance uniformity of the light-irradiated surface of the test liquid crystal panel was determined by the illuminance and temperature of any of the plurality of measurement surfaces on the light-irradiated surface of the surface plate, and it was confirmed that the illuminance uniformity was within the range of ±10.8%. Further, the average illuminance (Ea) of the light-irradiated surface of the liquid crystal panel for the test was about 25 mW/cm2. In addition, the temperature of the light-irradiated surface of the test liquid crystal panel was confirmed to be 60 ° C ± 12 ° C (degree of temperature rise) from the time when the ultraviolet ray was irradiated for about 20 seconds. Further, the total radiant heat of the light in the wavelength band of 200 nm to 20,000 nm is measured by a calorimeter, and the total amount of heat of the test liquid crystal panel is 173 m/cm 2 , which is a wavelength band of 300 nm to 400 nm. The amount of radiation other than ultraviolet light (light that does not contribute to the photochemical reaction of the liquid crystal panel) is 148 mW/cm2. Here, the surface temperature of the lamp is about 300 °C. <Comparative Experimental Example 2> The ultraviolet irradiation device for comparison was produced in accordance with the structure shown in Fig. 7 . In the ultraviolet irradiation device manufactured in the above-described Experimental Example 1, the light source unit does not have an outer sleeve, and is an opening for the light irradiation opening (2) instead of the light guiding portion. The edge portion is provided with a supplementary reflection plate (5 1 A ), and a light transmission window (1 2 A ) is provided in the light irradiation opening (1 2 ), and in addition to the ultraviolet irradiation produced in the above experimental example i The same configuration of the device is attached, and the same reference numerals are attached to the same constituent members. In Fig. 7, the symbol 5 Ο A is the housing that internally distinguishes the processing space. Using the ultraviolet irradiation device, the lamps (25) of the respective light source unit units (20A) were turned on under the same lighting conditions, and the ultraviolet rays were irradiated onto the liquid crystal panel for the test. The test liquid crystal was measured in the same manner as in the experimental example 1. The illuminance uniformity of the light-irradiated surface of the test liquid crystal panel was determined by the illuminance and temperature of any of the plurality of measurement surfaces on the light-irradiated surface of the surface plate, and it was confirmed that the illuminance uniformity was within ±11.2%. Further, the average illuminance (Ea) of the light-irradiated surface of the liquid crystal panel for the test was about 2 1 mW/cm 2 . In addition, the temperature of the light-irradiated surface of the test liquid crystal panel was confirmed to be -19 - 201213930 45 ° C ± 20 ° C (degree of temperature rise) from the time when the ultraviolet ray was irradiated for 1 to 20 seconds. Further, the total radiant heat of the light in the wavelength band of 200 nm to 20,000 nm is measured by a calorimeter, and the total radiant heat of the liquid crystal panel for the test is 1 lOmW/cm 2 , wherein the ultraviolet ray of the wavelength band of 300 nm to 400 nm The amount of external heat (light that does not contribute to the photochemical reaction of the liquid crystal panel) is 89 mW/cm2. Here, the surface temperature of the lamp was 280 ° C, and the surface temperature of the light transmission window was about 147 ° C. As described above, according to the ultraviolet irradiation apparatus of the present invention, it is possible to obtain excellent in-plane uniformity with respect to ultraviolet illuminance and temperature in the light-irradiated surface of the object to be processed. Further, it was confirmed that the degree of temperature rise of the object to be processed due to ultraviolet irradiation can be reduced. Although the embodiments of the present invention have been described above, the present invention is not limited to the embodiments described above, and various modifications can be added. For example, in the ultraviolet irradiation device of the present invention, the number and arrangement method of the light source elements constituting the light source unit are not limited to the above-described embodiments, and the design changes can be made according to the purpose. [Simplified description of the drawing] [Fig.] A schematic explanatory view of an internal structure of a structural example of the ultraviolet irradiation device of the present invention viewed from the front direction is disclosed. Fig. 2 is a schematic explanatory view showing the internal structure of the ultraviolet ray irradiation apparatus shown in Fig. 1 as viewed from a side surface direction. Fig. 3 is an explanatory view showing a configuration example of -20-201213930 of a light source unit of a light source unit of the present invention. Fig. 4 is a cross-sectional view showing a configuration of one of the lamp-related excimer lamps used in the ultraviolet irradiation device of the present invention, (A) a perspective view, and (B) showing a cross section perpendicular to the longitudinal direction of the lamp. Fig. 5 is a view showing an example of a configuration of a light guiding member constituting a light guiding portion, (A) a perspective view, and (B) an end view of a side wall of the light guiding member. Fig. 6 is a schematic explanatory view showing the internal structure of the ultraviolet irradiation device for comparison which was produced in Comparative Experimental Example 1 viewed from the side surface direction. Fig. 7 is a schematic explanatory view showing the internal structure of the ultraviolet irradiation device for comparison which was produced in Comparative Experimental Example 2 as seen from one side direction. Fig. 8 is a cross-sectional view for explaining a configuration of a liquid crystal panel. [Description of main component symbols] 1 〇: light source unit 1 1 : light source unit case member 1 1 A : end wall 1 1 B : other end wall 1 2 : light irradiation opening 12A : light transmission window 13 3 : ~ end Side partition wall 13A: Air vent vent 1 4 : Other end side partition wall 14A : Exhaust vent 1 5 : Light source unit arranging space 21 - 201213930 1 6 : Electrical component arrangement space 1 8 : Guide Wind space unit 1 9 : Exhaust space unit 20, 20A: Light source unit 2 1 : Light source element 22 : Lamp holding unit 24 : Outer casing (cylindrical sleeve) 24A : Cooling air flow path 25 : Excimer discharge lamp ( Lamp) 26: discharge vessel 26A: upper wall 26B: lower wall 27A: - square electrode 27B: the other electrode 3 0 : reflective material layer 3 1 : glass powder layer 32: phosphor layer 3 5 : transformer S: discharge Space 40: cooling portion 4 1 : cooling portion housing member 4 2 : cooling fan 43 : heat exchanger 45 : ventilation duct 22 201213930 50 : light guiding portion 50A : housing 51 : light guiding member 5 1 A : Substrate reflectors 52A to 52D: plate member 5 3 : base member 54 : light reflective member 5 5 : opening and closing door 58 : platform 59 : platform stand 60 : power supply unit W : Object to be processed 70: Liquid crystal panel 7 1 : First glass plate 7 2 : Active device 73 : Liquid crystal driving electrode 74 : Alignment film 7 5 : Second glass plate 76 : Color filter 77 : Transparent electrode 7 8 : alignment film 79 = spacer member 80: liquid crystal layer

Claims (1)

201213930 七、申請專利範圍: 1. 一種紫外線照射裝置,係於包含光學活性物質之 液晶面板的製造工程中所使用的紫外線照射裝置,其特徵 爲具備: 光源單元,係分別放射於波長300nm〜400nm中具有 發光峰値的光之長條狀的燈,及藉由在該當燈插通於內部 之狀態下設置,且具有透光性之長條狀的外套管所構成之 複數光源元件與身爲被處理對象物的液晶面板材對向而並 列排列所成;及 冷卻機構,係對前述各光源元件之外套管的內部供給 冷卻風。 2 .如申請專利範圍第1項所記載之紫外線照射裝置 ,其中, 於前述光源單元與被處理對象物之間,具備由內周面 藉由反射面所形成之空間所成的光導引部。 3. 如申請專利範圍第1項或第2項所記載之紫外線 照射裝置,其中, 前述燈係準分子燈。 4. 如申請專利範圍第1項或第2項所記載之紫外線 照射裝置,其中, 前述冷卻機構係具備放熱用的熱交換器。 -24-201213930 VII. Patent application scope: 1. An ultraviolet irradiation device used in a manufacturing process of a liquid crystal panel including an optically active material, characterized in that it comprises: a light source unit which emits light at a wavelength of 300 nm to 400 nm, respectively. a strip-shaped lamp having a light-emitting peak ,, and a plurality of light source elements each having a long outer sleeve that is provided in a state in which the lamp is inserted inside, and having a light transmissive shape The liquid crystal panel of the object to be processed is aligned in parallel, and the cooling mechanism supplies cooling air to the inside of the sleeve other than the respective light source elements. The ultraviolet irradiation device according to the first aspect of the invention, wherein the light source unit and the object to be processed are provided with a light guiding portion formed by a space formed by the reflecting surface of the inner peripheral surface. . 3. The ultraviolet irradiation device according to claim 1 or 2, wherein the lamp is an excimer lamp. 4. The ultraviolet irradiation device according to the first or second aspect of the invention, wherein the cooling mechanism is provided with a heat exchanger for heat release. -twenty four-
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