201131263 六、發明說明： 【發明所屬之技術領域】 本發明係關於例如作為適於液晶面板之製造，對製造中 途之面板（被處理基板）照射紫外線之紫外線照射裝置。 【先前技術】 液晶面板之製造中’將使具有液晶體與光反應性之高分 子體密封於内部之被處理基板冷卻，且從紫外線照射裝置 對其照射紫外線。紫外線照射裝置上設有抑制波長34〇 以下之紫外線透過之濾波器，藉由通過該等之紫外線照 射’使被處理基板内部之高分子反應而形成對向部（例如 參照 JP2008-1 16672(KOKAI))。 根據上述技術，為製造高品質之液晶面板，控制性良好 地形成使液晶體於特定方向配向之配向膜很重要。一般向 來使用以布擦膜之「摩擦法」等，但使用摩擦法時，會有 灰麈落下而附著髒污，因靜電等而導致被處理基板上之半 導體元件破損等問題產生。 因此’作為取代摩擦法之技術，採用將光反應性物質形 成於基板上’並藉由照射紫外線而使光反應性物質產生化 本反應，使之具有配向功能之技術。此情形時，若照射於 液晶面板（被處理基板）之紫外線中產生強度不均，則有無 法控制性良好且均一地形成配向膜之問題。 因此’作為使紫外線之強度不均減少之紫外線照射裝置 之例’有揭示於评則-225992(〖0〖八1)'買02006/094220、 JPH6_260295(K〇KAI)等者。該等裝置為改善強度不均， 151460.doc 201131263 而使用使紫外線朝向被處理基板之方向反射之反射板進 而於該文獻中記載有較佳為實施使其反射表面具有光擴散 性等之特定加工。但’即使基於該等文獻所記載之表面加 工技術，在強度不均之減輕上亦有限度，尤其係用於製造 液晶面板時，仍需謀求強度不均的情形更小之紫外線照射 裝置。 … 【發明内容】 本發明之目的係提供一種可遍及更大之面積照射均一矣 度之紫外線之紫外線照射裝置。 為解決上述問題，本發明之-態樣之紫外線照射裝置々 特徵在於：其具備紫外線燈，其以具有紫外線透過性之木 料形成管狀；及反射板，其具有擴散反射面，該擴散反身 =與前述紫外線燈對向配置，且以在與該紫料燈之轴』 父之平面上描繪之剖面以成抛物線形狀之方式而形成 且，前述反射板之前述拋物線形狀滿足包含最小曲率半辛 R為82 mm以上88 mm以下之筮〗炊从 . 卜之第1條件，與開口寬度W為22 mm以上3 00 mm以下之箆9。/ Γ <弟2條件之2個條件中至少一方。 根據本發明，可提供一種可冶B s丄 種了遍及更大之面積照射均一 5 度之紫外線之紫外線照射襄置。 【實施方式】 (實施例之說明） 參照附圖記述本發明之實施例，但該等附圖僅為圖心 提供，在任何情況下皆非限定本發明者。 以下，針對用以實施本發明 之形態，一面參照附圖詳魚 151460.doc 201131263 說明。 圖1〜圖3係用以說明本發明之一實施形態之紫外線照射 之圖，圖1係顯示其基本構成之縱剖面圖.，圖2係圖丨中所 示之Α-Aa位置之箭視方向之縱剖面圖，圖3係稍詳細顯示 圖1中所示之紫外線燈之構成圖。 如圖1、圖2所示，該紫外線照射裝置例如具有4條紫外 線燈100與冷卻單元200。 如圖3所示，紫外線燈100具備具有紫外線透過性之石英 玻璃製且形成管狀之具有氣密之放電空間丨丨之發光管12。 於發光管12之軸方向兩端之内部，配置一對例如鎢材電極 13a、l；3b。發光管12係例如外徑小為η 5 mm、厚度血為丄5 mm、發光長l為1800 mm左右之一層管。 電極13a、13b分別經由内部引線14a、14b而被熔接於金 屬箔15a、15b之一端。於金屬箔15a、lsb2另一端瘪接有 未圖示之外部引線之一端。金屬箔15a、15b之部分係加熱 並被封内部引線14a、14b與外部引線間之發光管丨2者。 金屬箱15a、15b只要是熱膨脹率接近形成發光管12之石 英玻璃之熱膨脹率之熱膨脹率之材料則任意皆可，但在此 作為適於該條件者而使用鉬之薄板。於其中一端分別連接 於金屬箔15a、15b之外部引線之另一端上，例如電性連接 有被絕緣密封於陶瓷製插口丨6a、1 6b内之供電用引線 17a、17b，更且引線17&、17b與未圖示之電源電路連接。 於放電空間11内，除用以維持電弧放電之稀有氣體即充 分量之稀有氣體外’並密封有水銀、鹵素、乃至於選自由 151460.doc 201131263 用以使紫外線發光之金屬即鐵、錫、銦、鉍、鉈、及錳所 組成之群中之至少一種。藉此，可使波長3〇〇〜4〇〇 nm之紫 外線發光。又，技術上通常以具有波長38〇 nm且在紫外光 與可見光之交界之情形較多’但本說明書中為表示一個連 續波長區域，為方便起見故表現為「波長3〇〇〜4〇〇 nm之紫 外線」。 圖4係將密封有上述發光金屬中之鐵之鐵系金屬_素燈 與密封有銘之蛇系金屬_素燈中該等之強度光譜分佈進行 比較而顯示之圖。由圖4明顯可知，藉由該等燈可獲得波 長3 00〜400 nm之紫外線。 再次參照圖1、圖2 ’符號1 8係例如以铭製成之冷卻塊。 冷卻塊1 8於其一面側抵接有與紫外線燈1 〇〇之上部半周面 對向之反射板19，且於另一面側一體形成有複數之冷卻葉 片181。反射板19例如以SUS(不鏽鋼）材或鋁材等作為材 質。 又’在反射板19之背面與冷卻塊18之間配置熱傳導性高 之構件（未圖示），可使反射板19之熱更易於傳導至冷卻塊 1 8 ’由此可實現更有效率之冷卻。 如圖5所示’本實施形態中反射板19例如具有根據 Υ=(1/170).χ2之函數形式之剖面之反射面形狀（剖面為抛物 線形狀）。反射板19係以描繪於與紫外線燈ι〇〇之轴正交之 平面上之剖面成抛物線形狀之方式，相對於紫外線燈i 〇〇 以一定的間隔對向配置。另’該反射表面成為具有擴散性 之反射面。說明其表面形狀之一例，例如為如圖6所示之 151460.doc 201131263 狀態。圖6係將圖5所示之反射板中以箭頭A所示之區域表 面放大顯不之說明圖。即，沿著表面之曲面由細反射面Η 組合而成為使入射光擴散之狀態之表面。藉此，如圖”所 示，入射於反射板19之紫外線會被擴散並反射。圖7A、圖 7B係將比較例之反射板與圖5所示之反射板中該等之紫外 線反射態樣進行比較而顯示之說明圖。具有擁有如此擴散 功能之反射面61之反射板19例如可由模具衝壓加工而形 成。另，亦可利用表面之壓印加工而獲得。 使用IS材作為反射板19之情形時，作為用以對其表面賦 予紫外線擴散性之其他方法，亦可採用如下方法。其中一 種是例如將具有實施一次鏡面加工之表面之鋁材作為基 材，於其表面實施鎚紋處理或粉刷化處理而形成不規則之 凹凸。或亦可形成非不規則之凹凸，例如根據蜂巢狀等特 定圖案之表面構造。 另，作為另一其他例之反射板19,亦可使用藉由於玻璃 表面形成多層金屬氧化物之蒸鍍層而尤其對紫外線具有擴 散反射性之二向色鏡…作為又一其他例之反射板19, 亦可使用於玻璃表面或金屬表面，使例如硫酸鋇等具有紫 外線反射性之物質以粗粒徑蒸鍍或接著之反射板。 再-人參照圖1、圖2，葉片1 81發揮使紫外線燈丨〇〇等所產 生之熱易於逸出而不使紫外線燈100之溫度上升至特定以 上之作用。於冷卻塊18之下側，形成有可收納紫外線燈 100與反射板19之燈箱21。 如圖1、圖2所示，與紫外線燈100對向之燈箱21之壁形 151460.doc 201131263 成有使從紫外線燈100放射之紫外線通過之窗部23，於該 窗部23設有例如將波長320 nm以下之紫外線切斷之短波長 側光切濾波器24，與將波長400 nm以上之可見光及紅外線 切斷之長波長側光切濾波器25 » 若使紫外線燈100放電點燈，則波長32〇〜4〇〇 之紫外 線會通過短波長側光切濾波器24及長波長側光切濾波器25 而照射於被照射物即液晶面板（被處理基板）上。藉此，形 成利用紫外線而產生光反應性物質之化學反應之配向膜。 於冷部塊18之上側，沿著紫外線燈1〇〇之燈軸方向，配 置作為覆蓋冷卻塊18之冷卻構造部之一部分之罩％。於罩 %之長度方向之一端形成有吸入口 27，於另一端形成有通 虱口 28。並且，以與通氣口 28連通之方式安裝有筒狀之排 氣筒29。 於紫外線燈1〇〇之一方之電極13a，經由供電線3〇a、引 線17a等而連接有高頻點燈裝置鳩之高頻輸出端之一方， 於紫外線燈1〇〇之另—方之電極13b，經由供電線鳩引 線17b等一而連接有高頻點燈裝置3〇〇之高頻輸出端之另一 曰门頻點燈裝置3〇〇投入電源時，會使高頻電壓施加 於電極13a與電極13b之間，藉此可於放電 外線》 τ展王系 / 8係將圖1所示之紫外線照射裝置之紫外線照射面之強 义分佈與比較例進行比較之圖。此處圖8中橫軸之「測定 ^表示取與反射板19對向之平面上與反射板呢長度方 向正交之直線Z(參照圖5)上之位置。 151460.doc 201131263 如圖8所示，本實施形態之情形在與比較例之比較中， 在反射板19之表面所具有之光擴散功能之作用下，遍及測 定點之所有區域成平均強度。 因此’本實施形態之紫外線照射裝置可對被照射物即液 晶面板（被處理基板）照射均一之紫外線，由此有助於提高 液晶面板之製造良率。 接著，圖9係進而說明作為實施形態之紫外線照射裝置 中紫外線燈100與反射板19之位置關係之配置圖（剖面圖 不）。以下，針對紫外線燈100與反射板19之較佳配置關係 進行說明。 如圖9所示，反射板19係其兩葉片以抛物線中心軸為中 心對稱地擴大，且該兩葉片間之寬度定義成開口寬度w。 又，該反射板19之情形由於其在紙面垂直方向上之各剖面 相同，因此拋物線中心定義為於紙面垂直方向延長之拋物 線中心軸。投影於與開口寬度w之方向正交之平面上之抛 物線之圖示上下方向之最大尺寸定義成高度Η。抛物線於 拋物線中心顯示最小曲率半徑Re並且—般拋物線上定義 有焦點。焦點係定義為包含相對於拋物線之中心之法線方 向之光線之平行光人射於反射板19時該平行光之反射光聚 之點。反射板19之情形中，由於其在紙面垂直方 向上之各剖面相同’因此焦點可定義為於紙面垂直方向延 長之焦點軸。紫外線燈1〇〇之發光管軸如圖示，在包含拋 物線中心軸及焦點轴之平面内’至少位在與該等軸雙方平 行之位置。 151460.doc 201131263 圖ίο係顯示作為實施形態之紫外線照射裝置中使反射板 19之最小曲率半徑R及開口寬度W變化時，分別測定紫外 線照射面之強度之均齊度之結果之表。所謂均齊度，係以 特定計算式將紫外線照射面内之強度不均程度數值化者， 數值「％」越低均齊度越佳’數值「％」越高均齊度越差。 此處，使用紫外線照射面内之最大強度及最小強度，利用 (最大強度-最小強度）/(最大強度+最小強度）之計算式而求 得均齊度。又，此處反射板19使用其表面經壓印加工者。 該測定中’除規定最小曲率半徑R、開口寬度W外，並 使紫外線燈100位於其中心軸距離抛物線中心軸55 mm之位 置。另，紫外線燈100之直徑為70 mm。又，當規定拋物線 之開口寬度W、進而固定最小曲率半徑r時，抛物線之高 度Η規定為固定。 如圖1 0所示，強度之均齊度在最小曲率半徑R為85 mm、開口寬度W為230 mm時最佳。並且，此時之條件 下’抛物線中心軸至焦點軸之距離為42.5 mm，拋物線之 高度Η為80 mm。由於拋物線中心軸至焦點軸之距離為42.5 mm，因此紫外線燈1〇〇之中心軸係配置在從反射板19之拋 物線中心轴觀察較反射板19之拋物線形狀之焦點軸更遠之 側’且位於反射板19之抛物線形狀之高度内側。偏離該條 件之情形時，例如發光管軸比焦點軸位在更靠近拋物線中 心軸侧之情形時’由於反射板19與燈丨〇〇之距離變近，因 此推測易產生反射板19之熱變形。因該影響而推測均齊度 有惡化之可能性。另，偏離相反側之情形時，即發光管轴 151460.doc •10· 201131263 比抛物線形狀之高度位於更外側之情形時，反射光易變成 被請遮蔽之配置，故光之利用效率下降，因此推測均 齊度仍然劣化。 圖”係抽出圖10所示之表中反射板之開口寬度〜為23〇 麵時所描繪之圖。另，圖12係抽出圖10所示之表中反射 板之最小曲率半徑民為85 mm時所描繪之圖。圖Η中測定 至W=300 mm為止，此係由於作為農置之空間上之其他約 束而無法大於此值。 如觀察_至圖12可知，為將強度之均齊度保持為極為 接近，只要滿足包含拋物線之最小曲率半徑汉為82随以 上88 mm以下之第i條件，與作為拋物線之開口寬度w為 227 mm以上3〇〇瓜爪以下之第2條件之2個條件中至少一方 即可。若滿足2個條件雙方則尤其佳。 又，_示結果之測定中’作為反射板19使用其表面 經壓印加工者，但為做比較，針對使用具有進行如此塵印 加工前之鏡面之反射板之情形取得測定結果。該結果中， 大體言之，可知強度之均齊度劣化4%左右。由此，使反 射板19之反射面具有光擴散性，且對反射板19規定如上述 之抛物線之最小曲率半徑尺之值或開口寬度W之值，從而 可製成均齊度尤其高之反射板。 接著，圖13〜圖15係用以說明本發明之其他實施形能之 紫外線照射裝置之圖，圖13係顯示其基本構成之縱剖面 圖’圖14係圖13中所示之㈣位置之箭視方向之縱剖面 圖’圖15係圖14所示之縱剖面圖之部分局部放大圖。該等 151460.doc 201131263 圖中，對於與已說明之圖中所示者相同之構成物附加相同 符號》 根據本實施形態，為使紫外線燈100維持在特定溫度（例 如85(TC )以下，將其冷卻方式設為水冷。本實施形態亦與 參照圖1、圖2說明之實施形態同樣以例如具有4條紫外線 燈1 0 0之構成如下進行說明。s亥等4條紫外線燈1 〇 〇中分別 附有冷卻單元300。 紫外線燈1 00與冷卻單元300，於該等間利用安裝於紫外 線燈100之插口 16a、16b上之間隔件91a、91b而保持特定 間隔。 冷卻單元300具備由圓筒狀石英玻璃等具有紫外線透過 性材料組成之内管31與設於其外側之外管32，成二層管構 造。紫外線燈1 00内包於内管3 1中。 冷卻單元300之内管31之内徑di例如為32 mm，外徑们 例如為36 mm，外管32之内徑d3例如為66 mm，外徑扣例 如為70 mm。 冷卻單元300使用設於其外周之兩端部之連接管33a、 33b’可從外部循環水等冷卻液34。即’從連接管33a側供 給溫度低之冷卻液34 ’藉此冷卻液34_面進行紫外線燈 1〇0之冷卻且一面移動，並將變熱之冷卻液34從連接管33b 回收。將變熱且經时之冷卻液34以未_之冷卻裝置冷 卻，並再次供給至連接管33a側。 於外管32之各個外表面上，形成有切斷可見光及紅外線 之長波長側光切攄波器93。根據情形不同，亦可重㈣成 I51460.doc -12. 201131263 切斷不必要之紫外線之短波長側光切濾波器92。 於冷卻單元300之圖示上側，配置具備具有紫外線擴散 性之反射面之反射板94。反射板94係與參照圖5、圖6、圖 7(b)說明者之構成相同者。 若使紫外線燈100放電點燈，則波長32〇〜4〇〇 nm之紫外 線會透過長波長側光切濾波器93而照射於被照射物即液晶 面板（被處理基板）上。藉此，形成利用紫外線產生光反應 性物質之化學反應之配向膜。 波長320〜400 nm之紫外線除從紫外線燈1 〇〇直接照射於 被照射物外，亦會被反射板94擴散反射而到達被照射物 上。由如此額外之紫外線照射於被照射物上之強度，如前 已說明’成為例如圖8所示之均齊度高之分佈。由此，應 用於液晶面板製造過程時，可控制性良好且均一地形成配 向膜。 本實施形態之紫外線照射裝置亦可對被照射物即液晶面 板（被處理基板）照射均一之紫外線，藉此有助於提高液晶 面板之製造良率。本實施形態之情形中，因採用使用冷卻 液34之冷卻單元300故冷卻能力高，因此可使紫外線燈3〇〇 容易保持在特定溫度（例如85〇。〔：）以下，例如在裝置壽命等 點上優點大。 接著，圖1 6係概略地顯示本發明之再一其他實施形態之 紫外線照射裝置之構成之縱剖面圖。同圖中，對與已說明 之圖中所示者相同或相當者附加相同符號。只要無所應附 加之事項則省略其說明。 151460.doc -13- 201131263 * 如圖16所示，該紫外線照射裝置於圖示橫方向平行配置 8條紫外線燈400，且分別對其附有反射板41〇。在與反射 板410相反之側之紫外線燈對向之位f卜，< 1直上s又有濾波器 420。並且經由濾波器420在與紫外線燈4〇〇相反之側載置 有被照射物之紫外線照射面。該照射面之圖示橫方向之寬 度例如為1890 mm，藉此可作為適於大型液晶面板製造而 使用。 需要如此特別大之照射面之紫外線照射裝置，亦可藉由 應用與上述實施形態所說明之技術相同之技術，而可照射 均一強度之紫外線。 以上說明之各實施形態之紫外線燈不限於如所說明之長 弧之金屬齒素燈，亦可為閃光燈、介電質屏障放電燈或無 電極燈等紫外線燈。 / 本發明並非受限於此處圖解所述之特定態樣者，且吾人 應理解凡是屬於以下請求範圍中之變形者皆含在本發明範 圍内。 【圖式簡單說明】 圖1係顯示本發明之一實施形態之紫外線照射裝置之基 本構成之縱剖面圖。 圖2係圖1中所示之A-Aa位置之箭視方向之縱剖面圖。 圖3係稍詳細顯示圖1中所示之紫外線燈之構成圖。 圖4iT'將鐵系金屬鹵素燈與鉈系金屬鹵素燈中該等之強 度光譜分佈進行比較而顯示之圖。 圖5係說明圖1中所示之反射板之反射面形狀之一例之立 151460.doc 201131263 體圖。 圖6係將圖5所tf之反射板中以箭頭A所示之區域表面放 大顯示之說明圖。 圖7A冑7B係將比較例之反射板與圖5所示之反射板中 該等之紫外線反射態樣進行比較而顯示之說明圖。 體8係將利用圖1所示之紫外線照射裝置之紫外線照射面 之強度分佈與比較例進行比較之圖。 圖9係進而說明作為實施形態之紫外線照射裝置中紫外 線燈與反射板之位置關係之配置圖（剖面圖示）。 圖10係顯示作為實施形rn卜線照射裝置中使反射板 之最小曲率半㈣及開σ寬度w變化時之各紫外線照射面 之強度之均齊度的測定結果之表。 圖1係抽出描繪圖1()所示之表中反射板之開口寬度％為 230 mm時之圖。 圖係抽出緣圖丨〇所示之表中反射板之最小曲率半徑 R為85 mm時之圖。 圖係顯示本發明之其他實施形態之紫外線照射裝置之 構成之縱剖面圖。 圖14係圖9中所示之B_Ba位置之箭視方向之縱剖面圖。 圖15係圖14所示之縱剖面圖之一部分放大圖。 圖16係概略地顯不本發明之進而其他實施形態之紫外線 照射農置之構成之縱剖面圖。 【主要元件符號說明】 11 放電空間 151460.doc •15· 201131263 12 發光管 13a 、13b 電極 14a 、14b 内部引線 15a 、15b 金屬箔 16a 、16b 插口 17a 、17b 引線 18 冷卻塊 19、 94 反射板 21 燈箱 23 窗部 24 短波長側光切濾波器 25、 93 長波長側光切濾波器 26 罩 27 吸入口 28 通氣口 29 排氣筒 30a 、30b 供電線 31 内管 32 外管 33a 、33b 連接管 34 冷卻液 61 反射面 100 紫外線燈 181 葉片 200 、300 冷卻單元 151460.doc •16-[Technical Field] The present invention relates to, for example, an ultraviolet irradiation device that is suitable for the manufacture of a liquid crystal panel and that irradiates ultraviolet rays to a panel (substrate to be processed) in the middle of manufacturing. [Prior Art] In the manufacture of a liquid crystal panel, a substrate to be processed having a liquid crystal body and a photoreactive high molecular weight sealed inside is cooled, and ultraviolet rays are irradiated from the ultraviolet irradiation device. The ultraviolet irradiation device is provided with a filter that suppresses the transmission of ultraviolet rays having a wavelength of 34 〇 or less, and the polymer inside the substrate to be processed is reacted by the ultraviolet ray irradiation to form an opposite portion (for example, refer to JP 2008-1 16672 (KOKAI). )). According to the above technique, in order to manufacture a high-quality liquid crystal panel, it is important to form an alignment film in which a liquid crystal body is aligned in a specific direction with good controllability. In general, a "friction method" for rubbing a film is used, but when the rubbing method is used, there is a problem that the ash falls and adheres to the dirt, and the semiconductor element on the substrate to be processed is broken due to static electricity or the like. Therefore, as a technique for replacing the rubbing method, a technique in which a photoreactive substance is formed on a substrate and a photoreactive substance is generated by irradiation of ultraviolet rays to have an alignment function is obtained. In this case, if unevenness in intensity is caused by ultraviolet rays applied to the liquid crystal panel (substrate to be processed), there is a problem that the controllability is good and the alignment film is uniformly formed. Therefore, 'as an example of an ultraviolet irradiation device which reduces the intensity unevenness of ultraviolet rays' is disclosed in Evaluation No. -225992 (〖0〖8 1)' Buy 02006/094220, JPH6_260295 (K〇KAI) and the like. In order to improve the intensity unevenness, the apparatus uses a reflecting plate that reflects ultraviolet rays toward the substrate to be processed, and further describes in the literature that a specific processing for making the reflecting surface light diffusing or the like is preferably described. . However, even in the surface processing technique described in the above-mentioned documents, there is a limit to the reduction in the intensity unevenness, and in particular, when it is used for the production of a liquid crystal panel, an ultraviolet irradiation device having a smaller intensity unevenness is required. SUMMARY OF THE INVENTION An object of the present invention is to provide an ultraviolet ray irradiation apparatus which can illuminate a uniform ultraviolet ray over a larger area. In order to solve the above problems, the ultraviolet ray irradiation apparatus according to the present invention is characterized in that it has an ultraviolet ray lamp which is formed into a tubular shape by wood having ultraviolet ray permeability, and a reflection plate having a diffuse reflection surface, the diffusion reflexive body = The ultraviolet lamp is disposed opposite to each other and is formed in a parabolic shape in a cross section drawn on a plane parallel to the axis of the purple lamp, and the parabolic shape of the reflecting plate satisfies a minimum radius of half symmetry R 82 mm or more and 88 mm or less 炊 炊 炊 from the first condition of the Bu, and the opening width W is 22 mm or more and 300 mm or less. / Γ < at least one of the two conditions of the 2nd condition. According to the present invention, it is possible to provide an ultraviolet ray irradiation apparatus capable of illuminating a larger area of ultraviolet rays uniformly over 5 degrees. [Embodiment] (Description of Embodiments) The embodiments of the present invention are described with reference to the drawings, but the drawings are provided only for the purpose of the drawings, and the present invention is not limited in any way. Hereinafter, the form for carrying out the present invention will be described with reference to the accompanying drawings 151460.doc 201131263. 1 to 3 are views for explaining ultraviolet irradiation according to an embodiment of the present invention, and Fig. 1 is a longitudinal sectional view showing a basic configuration thereof, and Fig. 2 is an arrow showing a Α-Aa position shown in Fig. A longitudinal sectional view of the direction, and Fig. 3 is a structural view showing the ultraviolet lamp shown in Fig. 1 in a slightly more detailed manner. As shown in Figs. 1 and 2, the ultraviolet irradiation device has, for example, four ultraviolet lamps 100 and a cooling unit 200. As shown in Fig. 3, the ultraviolet lamp 100 is provided with an ultraviolet light-transmissive quartz glass tube which is formed into a tubular air-tight discharge space 丨丨. A pair of, for example, tungsten electrodes 13a, 1; 3b are disposed inside the both ends of the arc tube 12 in the axial direction. The arc tube 12 is, for example, a tube having a small outer diameter of η 5 mm, a thickness of blood of 丄5 mm, and an emission length of about 1800 mm. The electrodes 13a and 13b are welded to one ends of the metal foils 15a and 15b via the inner leads 14a and 14b, respectively. The other end of the metal foils 15a and lsb2 is connected to one end of an external lead (not shown). Portions of the metal foils 15a, 15b are heated and sealed by the light-emitting tubes 2 between the inner leads 14a, 14b and the outer leads. The metal cases 15a and 15b may be any material as long as the coefficient of thermal expansion is close to the coefficient of thermal expansion of the thermal expansion coefficient of the quartz glass forming the arc tube 12. However, a sheet made of molybdenum is used as a suitable condition. One end of each of the outer leads of the metal foils 15a, 15b is connected to one end, for example, electrically connected to the power supply leads 17a, 17b insulated and sealed in the ceramic sockets 6a, 16b, and the leads 17 & And 17b are connected to a power supply circuit not shown. In the discharge space 11, except for a rare gas for maintaining an arc discharge, that is, a sufficient amount of rare gas, and sealed with mercury, halogen, or even a metal selected from the group of 151460.doc 201131263 for illuminating ultraviolet rays, that is, iron, tin, At least one of the group consisting of indium, antimony, bismuth, and manganese. Thereby, the ultraviolet ray having a wavelength of 3 〇〇 to 4 〇〇 nm can be emitted. Further, the technique generally has a wavelength of 38 〇 nm and a boundary between ultraviolet light and visible light. However, in the present specification, a continuous wavelength region is indicated, and for the sake of convenience, it is expressed as "wavelength 3 〇〇 4 〇 〇nm ultraviolet rays." Fig. 4 is a view showing the intensity spectrum distribution of the iron-based metal-based lamp in which the iron in the above-mentioned luminescent metal is sealed and the snake-based metal-based lamp in the sealed state. As is apparent from Fig. 4, ultraviolet rays having a wavelength of 300 to 400 nm can be obtained by the lamps. Referring again to Figures 1 and 2, the symbol 18 is, for example, a cooling block made of the name. The cooling block 18 has a reflecting plate 19 opposed to the upper half surface of the ultraviolet lamp 1 于 on one surface side, and a plurality of cooling fins 181 integrally formed on the other surface side. The reflector 19 is made of, for example, SUS (stainless steel) material or aluminum material. Further, a member having high thermal conductivity (not shown) is disposed between the back surface of the reflecting plate 19 and the cooling block 18, so that the heat of the reflecting plate 19 can be more easily conducted to the cooling block 18', thereby achieving more efficient operation. cool down. As shown in Fig. 5, the reflecting plate 19 has a reflecting surface shape (a parabolic shape in cross section) of a cross section according to a function of Υ = (1/170). χ 2, for example. The reflecting plate 19 is disposed opposite to the ultraviolet lamp i 〇〇 at a predetermined interval so that the cross section drawn on the plane orthogonal to the axis of the ultraviolet lamp 成 is parabolic. Further, the reflecting surface becomes a diffusing reflecting surface. An example of the surface shape thereof will be described, for example, the state of 151460.doc 201131263 as shown in FIG. Fig. 6 is an enlarged view showing a region of the reflecting plate shown in Fig. 5, which is indicated by an arrow A. That is, the curved surface along the surface is combined by the thin reflecting surface 而 to form a surface in which the incident light is diffused. Thereby, as shown in the figure, the ultraviolet rays incident on the reflecting plate 19 are diffused and reflected. Figs. 7A and 7B show the ultraviolet reflecting patterns of the reflecting plate of the comparative example and the reflecting plate shown in Fig. 5. The reflection plate 19 having the reflection surface 61 having such a diffusion function can be formed, for example, by press working of a mold. Alternatively, it can be obtained by imprinting a surface. The IS material is used as the reflection plate 19 In other cases, as another method for imparting ultraviolet diffusibility to the surface thereof, the following method may be employed. One of them is, for example, an aluminum material having a surface subjected to mirror processing once, and a hammering treatment is performed on the surface thereof. Irregularities and irregularities may be formed by the brushing treatment, or non-irregular irregularities may be formed, for example, a surface structure according to a specific pattern such as a honeycomb shape. Further, as another reflection plate 19, a glass surface may be used. A dichroic mirror which forms a vapor-deposited layer of a plurality of metal oxides and has diffuse reflectance especially for ultraviolet rays... As another reflection plate 19 of another example, it is also possible to use On the glass surface or the metal surface, a material having ultraviolet reflectivity such as barium sulfate is vapor-deposited with a coarse particle diameter or a reflective plate. Further, referring to Figs. 1 and 2, the blade 1 81 is used to make an ultraviolet lamp or the like. The generated heat is apt to escape without causing the temperature of the ultraviolet lamp 100 to rise to a specific value or higher. On the lower side of the cooling block 18, a light box 21 accommodating the ultraviolet lamp 100 and the reflection plate 19 is formed. As shown in Fig. 2, the wall portion 151460.doc 201131263 of the light box 21 opposed to the ultraviolet lamp 100 has a window portion 23 through which the ultraviolet light emitted from the ultraviolet lamp 100 passes, and the window portion 23 is provided with, for example, a wavelength of 320 nm or less. The short-wavelength side optical cut filter 24 that cuts off ultraviolet light and the long-wavelength side optical cut filter that cuts visible light and infrared rays having a wavelength of 400 nm or more 25 » If the ultraviolet light 100 is discharged, the wavelength is 32 〇 4 The ultraviolet ray of the krypton is irradiated onto the liquid crystal panel (substrate to be processed) which is an object to be irradiated by the short-wavelength side optical cut filter 24 and the long-wavelength side optical cut filter 25, thereby forming light reactivity by ultraviolet rays. substance The alignment film of the chemical reaction. On the upper side of the cold block 18, along the direction of the lamp axis of the ultraviolet lamp, the cover % which is a part of the cooling structure portion covering the cooling block 18 is disposed. A suction port 27 is formed at one end, and a port 28 is formed at the other end. Further, a cylindrical exhaust pipe 29 is attached to communicate with the vent port 28. The electrode 13a of one of the ultraviolet lamps is passed through One of the high-frequency output terminals of the high-frequency lighting device 连接 is connected to the power supply line 3〇a, the lead wire 17a, and the like, and the other electrode 13b of the ultraviolet lamp 1 is connected via the power supply wire 鸠 lead 17b or the like. When the other gate frequency lighting device 3 of the high-frequency output terminal of the high-frequency lighting device 3 is turned on, a high-frequency voltage is applied between the electrode 13a and the electrode 13b, thereby discharging External line τ exhibition king system / 8 series The comparison of the strong distribution of the ultraviolet irradiation surface of the ultraviolet irradiation device shown in Fig. 1 with a comparative example. Here, the "measurement ^" of the horizontal axis in Fig. 8 indicates the position on the straight line Z (see Fig. 5) orthogonal to the longitudinal direction of the reflecting plate on the plane opposite to the reflecting plate 19. 151460.doc 201131263 In the case of the present embodiment, in comparison with the comparative example, the light intensity function of the surface of the reflecting plate 19 is averaged over all areas of the measurement point. Therefore, the ultraviolet irradiation device of the present embodiment The liquid crystal panel (substrate to be processed), which is an object to be irradiated, can be irradiated with uniform ultraviolet rays, thereby contributing to improvement in the production yield of the liquid crystal panel. Next, FIG. 9 further explains the ultraviolet lamp 100 and the ultraviolet irradiation device according to the embodiment. The arrangement diagram of the positional relationship of the reflecting plate 19 (the cross-sectional view is not shown). Hereinafter, a preferred arrangement relationship between the ultraviolet lamp 100 and the reflecting plate 19 will be described. As shown in Fig. 9, the reflecting plate 19 is a parabolic central axis of the two blades. The center is symmetrically enlarged, and the width between the two blades is defined as the opening width w. Further, since the reflection plate 19 is the same in the vertical direction of the paper surface, The center of the parabola is defined as the central axis of the parabola extending in the vertical direction of the paper. The maximum dimension of the parabola projected on the plane orthogonal to the direction of the opening width w is defined as the height Η. The parabola shows the minimum curvature at the center of the parabola. The radius Re and the parabola are defined with a focus. The focus is defined as the point at which the reflected light of the parallel light is incident when the collimator of the light containing the normal direction with respect to the center of the parabola is incident on the reflecting plate 19. In this case, since the cross-sections in the vertical direction of the paper are the same 'therefore, the focus can be defined as the focal axis extending in the vertical direction of the paper. The light-emitting tube axis of the ultraviolet lamp is as shown in the figure, including the parabolic central axis and the focus. The position in the plane of the axis is at least in a position parallel to both of the axes. 151460.doc 201131263 FIG. 1 is a view showing the difference between the minimum curvature radius R and the opening width W of the reflector 19 in the ultraviolet irradiation device according to the embodiment. A table for determining the uniformity of the intensity of the ultraviolet-irradiated surface. The so-called uniformity is determined by a specific calculation. The variation of intensity level of UV-irradiated surface by a numerical value, the value "%", the lower the better the uniformity of the 'number'% 'higher degree of uniformity of the worse. Here, the uniformity is obtained by using the calculation formula of (maximum strength - minimum strength) / (maximum strength + minimum intensity) using the maximum intensity and the minimum intensity in the ultraviolet irradiation surface. Further, here, the reflecting plate 19 is subjected to an embossing process on its surface. In this measurement, except for specifying the minimum radius of curvature R and the opening width W, the ultraviolet lamp 100 was placed at a position where its central axis was 55 mm from the central axis of the parabola. In addition, the ultraviolet lamp 100 has a diameter of 70 mm. Further, when the opening width W of the parabola is defined and the minimum radius of curvature r is fixed, the height of the parabola is fixed. As shown in Fig. 10, the uniformity of the intensity is optimal when the minimum radius of curvature R is 85 mm and the opening width W is 230 mm. Also, at this time, the distance from the central axis of the parabola to the focal axis is 42.5 mm, and the height of the parabola is 80 mm. Since the distance from the central axis of the parabola to the focal axis is 42.5 mm, the central axis of the ultraviolet lamp 1配置 is disposed on the side farther than the focal axis of the parabolic shape of the reflecting plate 19 from the parabolic central axis of the reflecting plate 19' Located inside the height of the parabolic shape of the reflecting plate 19. When the condition is deviated from the condition, for example, when the arc tube axis is closer to the parabolic center axis side than the focus axis position, since the distance between the reflecting plate 19 and the lamp cymbal becomes close, it is presumed that the thermal deformation of the reflecting plate 19 is likely to occur. . It is assumed that the uniformity is likely to deteriorate due to this influence. On the other hand, when the light-emitting tube axis 151460.doc •10·201131263 is located more outward than the height of the parabola shape, the reflected light tends to be shielded, so the light utilization efficiency is lowered. It is assumed that the uniformity is still deteriorating. Fig. 10 is a view taken when the opening width of the reflecting plate in the table shown in Fig. 10 is 23 〇. In addition, Fig. 12 is the minimum radius of curvature of the reflecting plate in the table shown in Fig. 10 is 85 mm. The graph depicted in the figure is measured to W=300 mm, which cannot be greater than this value due to other constraints on the space of the farm. As observed _ to Fig. 12, the uniformity of the intensity is Keep it in close proximity, as long as the ith condition of the minimum radius of curvature including the parabola is 82 and the ith condition of 88 mm or less, and the second condition of the opening width w of the parabola is 227 mm or more and 3 〇〇. At least one of the conditions may be sufficient. It is particularly preferable to satisfy both of the two conditions. In the measurement of the result, the surface of the reflector 19 is embossed, but for comparison, the dust is used for comparison. The result of the measurement was obtained in the case of the mirror-reflecting plate before the printing. In the results, it is understood that the uniformity of the strength is deteriorated by about 4%, whereby the reflecting surface of the reflecting plate 19 has light diffusibility, and The reflector 19 is specified as above The value of the minimum radius of curvature of the parabola or the value of the opening width W, so that a reflecting plate having a particularly uniform uniformity can be obtained. Next, FIG. 13 to FIG. 15 are for explaining ultraviolet irradiation of other embodiments of the present invention. FIG. 13 is a longitudinal sectional view showing the basic configuration of FIG. 14 and FIG. 14 is a longitudinal sectional view of the arrow direction shown in FIG. 13 and FIG. 15 is a partial portion of the longitudinal sectional view shown in FIG. In the figure, the same reference numerals are attached to the same components as those shown in the drawings. According to the present embodiment, the ultraviolet lamp 100 is maintained at a specific temperature (for example, 85 (TC). In the same manner as the embodiment described with reference to FIGS. 1 and 2, the configuration of the present invention is as follows. For example, the configuration of the four ultraviolet lamps 100 is as follows. Each of the crucibles is provided with a cooling unit 300. The ultraviolet lamp 100 and the cooling unit 300 are held at a certain interval by the spacers 91a and 91b attached to the sockets 16a and 16b of the ultraviolet lamp 100. The inner tube 31 made of an ultraviolet-ray permeable material such as cylindrical quartz glass and the outer tube 32 provided on the outer side thereof are provided in a two-layer tube structure. The ultraviolet lamp 100 is enclosed in the inner tube 31. The cooling unit 300 The inner diameter di of the inner tube 31 is, for example, 32 mm, the outer diameter is, for example, 36 mm, the inner diameter d3 of the outer tube 32 is, for example, 66 mm, and the outer diameter buckle is, for example, 70 mm. The cooling unit 300 uses two of the outer circumferences of the cooling unit 300. The end connecting pipes 33a and 33b' can circulate the cooling liquid 34 such as water from the outside. That is, the 'cooling liquid 34' having a low temperature is supplied from the side of the connecting pipe 33a, whereby the cooling liquid 34_ faces is cooled by the ultraviolet lamp 1〇0. While moving, the heated cooling liquid 34 is recovered from the connecting pipe 33b. The cooling liquid 34 which has become hot and with time is cooled by the cooling device and supplied to the side of the connecting pipe 33a again. A long-wavelength side cut chopper 93 that cuts visible light and infrared rays is formed on each outer surface of the outer tube 32. Depending on the situation, it can also be heavy (4) into I51460.doc -12. 201131263 Cut off the unnecessary ultraviolet light short-wavelength side optical cut filter 92. On the upper side of the cooling unit 300, a reflecting plate 94 having a reflecting surface having ultraviolet diffusibility is disposed. The reflector 94 is the same as that described with reference to Figs. 5, 6, and 7(b). When the ultraviolet lamp 100 is discharged and discharged, the ultraviolet ray having a wavelength of 32 〇 to 4 〇〇 nm is transmitted through the long-wavelength side optical cut filter 93 to the liquid crystal panel (substrate to be processed) which is an object to be irradiated. Thereby, an alignment film which generates a chemical reaction of a photoreactive substance by ultraviolet rays is formed. The ultraviolet light having a wavelength of 320 to 400 nm is directly irradiated to the object to be irradiated, and is also diffused and reflected by the reflecting plate 94 to reach the object to be irradiated. The intensity of the ultraviolet rays irradiated onto the object to be irradiated as described above has become a distribution having a high uniformity as shown, for example, in Fig. 8. Therefore, when applied to the liquid crystal panel manufacturing process, the alignment film can be formed with good controllability and uniformity. In the ultraviolet irradiation apparatus of the present embodiment, the liquid crystal panel (substrate to be processed) which is an object to be irradiated can be irradiated with uniform ultraviolet rays, thereby contributing to improvement in the production yield of the liquid crystal panel. In the case of the present embodiment, since the cooling unit 300 using the cooling liquid 34 is used, the cooling ability is high. Therefore, the ultraviolet lamp 3 can be easily maintained at a specific temperature (for example, 85 〇. or less), for example, in the life of the device. The advantages are great. Next, Fig. 16 is a longitudinal cross-sectional view schematically showing the configuration of an ultraviolet irradiation apparatus according to still another embodiment of the present invention. In the same figures, the same or equivalent elements as those shown in the drawings are attached. The description is omitted as long as there is nothing to do. 151460.doc -13- 201131263 * As shown in Fig. 16, the ultraviolet irradiation device has eight ultraviolet lamps 400 arranged in parallel in the horizontal direction of the figure, and a reflection plate 41 is attached thereto. The ultraviolet lamp on the side opposite to the reflecting plate 410 is opposed to the position, and the filter 1 is further applied to the <1 straight upper s. Further, the ultraviolet ray irradiation surface of the object to be irradiated is placed on the side opposite to the ultraviolet lamp 4 through the filter 420. The width of the irradiation surface in the horizontal direction is, for example, 1890 mm, whereby it can be used as a suitable liquid crystal panel. An ultraviolet irradiation apparatus which requires such a particularly large irradiation surface can be irradiated with ultraviolet light of uniform intensity by applying the same technique as that described in the above embodiment. The ultraviolet lamp of each embodiment described above is not limited to the long-arc metal tooth lamp as described, and may be an ultraviolet lamp such as a flash lamp, a dielectric barrier discharge lamp or an electrodeless lamp. The present invention is not limited to the specific aspects described herein, and it is to be understood that those skilled in the art are included in the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal sectional view showing a basic configuration of an ultraviolet irradiation apparatus according to an embodiment of the present invention. Figure 2 is a longitudinal sectional view of the arrow direction of the A-Aa position shown in Figure 1. Fig. 3 is a view showing the configuration of the ultraviolet lamp shown in Fig. 1 in a slightly more detailed manner. Fig. 4iT' is a graph showing the intensity spectral distribution of the iron-based metal halide lamp and the lanthanide metal halide lamp. Fig. 5 is a view showing an example of the shape of the reflecting surface of the reflecting plate shown in Fig. 1; 151460.doc 201131263. Fig. 6 is an explanatory view showing the surface of the reflecting plate of Fig. 5 enlarged by the area indicated by the arrow A. Figs. 7A and 7B are explanatory views showing a comparison between the reflecting plate of the comparative example and the ultraviolet reflecting state of the reflecting plate shown in Fig. 5. The body 8 is a graph in which the intensity distribution of the ultraviolet ray irradiation surface of the ultraviolet ray irradiation apparatus shown in Fig. 1 is compared with a comparative example. Fig. 9 is a plan view (cross-sectional view) showing the positional relationship between the ultraviolet lamp and the reflecting plate in the ultraviolet irradiation device of the embodiment. Fig. 10 is a table showing the results of measurement of the uniformity of the intensity of each ultraviolet-irradiated surface when the minimum curvature half (four) and the opening σ width w of the reflecting plate are changed in the rn-ray irradiation apparatus. Fig. 1 is a view showing a state in which the opening width % of the reflecting plate in the table shown in Fig. 1 () is 230 mm. The figure is taken as a graph showing the minimum radius of curvature R of the reflector in the table shown in the figure 85 85 mm. Fig. is a longitudinal sectional view showing the configuration of an ultraviolet irradiation apparatus according to another embodiment of the present invention. Figure 14 is a longitudinal sectional view showing the arrow direction of the B_Ba position shown in Figure 9. Figure 15 is a partially enlarged plan view showing a longitudinal section of Figure 14. Fig. 16 is a longitudinal cross-sectional view showing the structure of an ultraviolet irradiation agricultural apparatus according to still another embodiment of the present invention. [Description of main component symbols] 11 Discharge space 151460.doc •15· 201131263 12 Light-emitting tubes 13a, 13b Electrodes 14a, 14b Internal leads 15a, 15b Metal foils 16a, 16b Sockets 17a, 17b Leads 18 Cooling blocks 19, 94 Reflecting plates 21 Light box 23 window portion 24 short-wavelength side optical cut filter 25, 93 long-wavelength side optical cut filter 26 cover 27 suction port 28 vent 29 exhaust pipe 30a, 30b power supply line 31 inner tube 32 outer tube 33a, 33b connecting tube 34 Coolant 61 Reflector 100 UV lamp 181 Blade 200, 300 Cooling unit 151460.doc • 16-