CN102081262B - Ultraviolet lamp - Google Patents
Ultraviolet lamp Download PDFInfo
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- CN102081262B CN102081262B CN201010555651.9A CN201010555651A CN102081262B CN 102081262 B CN102081262 B CN 102081262B CN 201010555651 A CN201010555651 A CN 201010555651A CN 102081262 B CN102081262 B CN 102081262B
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- lamp
- reflecting plate
- ultraviolet
- condition
- axle
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- 239000000463 material Substances 0.000 claims abstract description 16
- 230000035699 permeability Effects 0.000 claims abstract description 5
- 238000001816 cooling Methods 0.000 claims description 30
- 238000010586 diagram Methods 0.000 description 23
- 239000004973 liquid crystal related substance Substances 0.000 description 15
- 230000005855 radiation Effects 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000002826 coolant Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000004049 embossing Methods 0.000 description 4
- 229910052716 thallium Inorganic materials 0.000 description 4
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical group [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- KPHWPUGNDIVLNH-UHFFFAOYSA-M diclofenac sodium Chemical compound [Na+].[O-]C(=O)CC1=CC=CC=C1NC1=C(Cl)C=CC=C1Cl KPHWPUGNDIVLNH-UHFFFAOYSA-M 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Abstract
Ultraviolet lamp of the present invention, comprising: UV-lamp, and it is formed as tubulose by the material with ultraviolet permeability; There is the reflecting plate of diffusely reflecting surface, described reflecting plate and described UV-lamp are oppositely disposed, and the cross section being formed as presenting in the plane orthogonal with the axle of this UV-lamp is parabolic shape, the described parabolic shape of described reflecting plate meets at least one party in two conditions be made up of following first condition and second condition, described first condition is that minimum profile curvature radius R is more than 82mm and below 88mm, and described second condition is that A/F W is more than 227mm and below 300mm.
Description
Technical field
The present invention relates to a kind of such as towards the ultraviolet lamp to panel (processed substrate) irradiation ultraviolet radiation in manufacture of the manufacture of liquid crystal panel.
Background technology
In the manufacture of liquid crystal panel, liquid crystal is sealed with to inside and cools with the processed substrate with photoreactive polymer body, and from ultraviolet lamp to its irradiation ultraviolet radiation.Be provided with in ultraviolet lamp suppress below wavelength 340nm ultraviolet through wave filter, by the Ultraviolet radiation via this wave filter, the polymer body reaction of the inside of processed substrate is made to form counterpart (for example, referring to JP2008-116672 (KOKAI).
In the above-described techniques, in order to carry out the high-quality manufacture of liquid crystal panel, the oriented film that controlling forms the direction orientation making liquid crystal in regulation is well very important.Although generally using " rubbing manipulation " of the examination film that uses cloth to wipe with, use during rubbing manipulation can have that dust falls, bind dirt or the problem such as the semiconductor element that causes processed substrate to have due to electrostatic etc. is damaged.
Therefore, the instead technology of rubbing manipulation, employing be on substrate, form photoreactivity material, by irradiation ultraviolet radiation make photoreactivity matter chemistry react with the technology making it have orientating function.At this moment, such problem can be there is: if the ultraviolet generation intensity inequality of irradiating liquid crystal panel (processed substrate), just controlling can not be formed uniformly oriented film well.
Therefore, as the example of the ultraviolet lamp making ultraviolet intensity inequality reduce, such as, the ultraviolet lamp that JPH8-225992 (KOKAI), WO2006/094220, JPH6-260295 (KOKAI) etc. disclose is had.These devices, in order to improve intensity inequality, adopt the reflecting plate that ultraviolet is reflected to the direction of processed substrate, and also recite in the publication and preferably implement certain processing in advance and have light diffusing to make this reflecting surface.But, even if adopt the Surface-micromachining process described in these documents, on the alleviating of intensity inequality or limited, especially in the manufacture purposes of liquid crystal panel, go back the ultraviolet lamp that desired strength is uneven less.
Summary of the invention
The object of the present invention is to provide and a kind ofly can irradiate the ultraviolet ultraviolet lamp of homogeneous intensity to more large area.
In order to solve above-mentioned problem, the ultraviolet lamp of an example of the present invention, is characterized in that, comprising: UV-lamp, it is formed as tubulose by the material with ultraviolet permeability; With the reflecting plate with diffusely reflecting surface, described reflecting plate and described UV-lamp are oppositely disposed, and the cross section being formed as presenting in the plane orthogonal with the axle of this UV-lamp is parabolic shape, the described parabolic shape of described reflecting plate meets at least one party in two conditions be made up of following first condition and second condition, described first condition is that minimum profile curvature radius R is more than 82mm and below 88mm, and described second condition is that A/F W is more than 227mm and below 300mm.
Adopt the present invention, can provide a kind of can irradiate the ultraviolet ultraviolet lamp of homogeneous intensity to more large area.
Accompanying drawing explanation
Fig. 1 is the longitdinal cross-section diagram of the basic structure of the ultraviolet lamp that an example of the present invention is shown.
Fig. 2 is the longitdinal cross-section diagram of the direction of arrow of the A-Aa position shown in Fig. 1.
Fig. 3 is the structural drawing representing the UV-lamp shown in Fig. 1 slightly in detail.
Fig. 4 compares to illustrate that the intensity of Ferrious material halide lamp and thallium system metal halide lamp divides photodistributed chart.
Fig. 5 is the stereographic map of an example of the reflector shape of the reflecting plate shown in key diagram 1.
Fig. 6 be amplify the reflecting plate of display shown in Fig. 5 by the key diagram of the region surface of arrow A indication.
Fig. 7 A, Fig. 7 B are the key diagrams comparing the display reflecting plate of comparative example and the ultraviolet reflection form of the reflecting plate shown in Fig. 5.
Fig. 8 is the chart shown in the intensity distributions in the Ultraviolet radiation face irradiated by the ultraviolet lamp shown in Fig. 1 compares with comparative example.
Fig. 9 is the arrangement plan (cross section diagram) further illustrating the ultraviolet lamp middle-ultraviolet lamp lamp of example and the position relationship of reflecting plate.
Figure 10 illustrates the table respectively uniformity coefficient of the intensity in the Ultraviolet radiation face when minimum profile curvature radius R of the reflecting plate of the ultraviolet lamp of example and A/F W is changed being measured to obtained result.
Figure 11 is the chart that situation when extracting that the A/F W of reflecting plate is 230mm in the table shown in Figure 10 is drawn.
Figure 12 is the chart that situation when extracting that the minimum profile curvature radius R of reflecting plate is 85mm in the table shown in Figure 10 is drawn.
Figure 13 is the longitdinal cross-section diagram of the basic structure of the ultraviolet lamp that other examples of the present invention are shown.
Figure 14 is the longitdinal cross-section diagram of the direction of arrow of the B-Ba position shown in Figure 13.
Figure 15 is the partial enlarged drawing of the longitdinal cross-section diagram shown in Figure 14.
Figure 16 is the longitdinal cross-section diagram of the structure of the ultraviolet lamp briefly showing another example of the present invention.
Symbol description
100 UV-lamp
200,300 cooling units
11 discharge spaces
12 luminotrons
13a, 13b electrode
14a, 14b inside conductor
15a, 15b metal forming
16a, 16b socket
17a, 17b wire
18 cooling blocks
181 cooling fins
19,94 reflecting plates
21 lampshades
23 window portions
24 short wavelength's sidelight cutoff filters
25,93 long wavelength's sidelight cutoff filters
26 covers
27 suction inlets
28 blow vents
29 aiutages
30a, 30b supply lines
61 reflectings surface
Pipe in 31
32 outer tubes
33a, 33b connecting pipe
34 liquid coolants.
Embodiment
(explanation of embodiment)
Embodiments of the invention are described with reference to accompanying drawing, but provide these accompanying drawings just for graphic object, in any case they are not used to restriction invention.
Below, with reference to accompanying drawing, enforcement optimal morphology of the present invention is described in detail.
Fig. 1 ~ Fig. 3 is used to the figure of the ultraviolet lamp that an example of the present invention is described, Fig. 1 is the longitdinal cross-section diagram that its basic structure is shown, Fig. 2 is the longitdinal cross-section diagram of the direction of arrow of the A-Aa position shown in Fig. 1, and Fig. 3 is the structural drawing representing the UV-lamp shown in Fig. 1 slightly in detail.
As shown in Figure 1 and Figure 2, this ultraviolet lamp has such as 4 UV-lamp 100 and cooling unit 200.
As shown in Figure 3, UV-lamp 100 is provided with the luminotron 12 with airtight discharge space 11, and this luminotron 12 is made up of the quartz glass with ultraviolet permeability, and is formed as tubulose.In the inside at the direction of principal axis two ends of this luminotron 12, be configured with electrode 13a, 13b of a pair such as tungsten material.Luminotron 12 is that such as external diameter φ is 27.5mm, wall thickness m is 1.5mm, luminous long L is the mono-layer tube of about 1800mm.
Electrode 13a, 13b are welded in one end of metal forming 15a, 15b respectively by inside conductor 14a, 14b.The other end of metal forming 15a, 15b is welded in the one end of the outer conductor that figure does not show.A part of metal forming 15a, 15b is used for heating the luminotron 12 between inside conductor 14a, 14b and outer conductor and sealing.
In addition, as long as the material that metal forming 15a, 15b are close with the coefficient of thermal expansion of quartz glass forming luminotron 12, any material can, what adopt at this is the thin plate of the molybdenum meeting this condition.The other end of the outer conductor that one end is connected with metal forming 15a, 15b respectively, be electrically connected with insulated enclosure power supply wire 17a, 17b in socket 16a, 16b of such as pottery system, and the power circuit that wire 17a, 17b and figure do not show connects.
In discharge space 11, except the rare gas of sufficient amount discharged for pilot arc, also, be sealed with mercury, halogen and from as at least one selected the group making the iron of the metal of luminescence-utraviolet, tin, indium, bismuth, thallium and manganese form.Thus, the luminescence-utraviolet of wavelength 300 ~ 400nm can be made.In addition, technically usually often using the border of wavelength 380nm as ultraviolet light and visible light, but be a continuous wavelength region due to what represent in the application, therefore it be expressed as easily " ultraviolet of wavelength 300 ~ 400nm ".
Fig. 4 is that the intensity of the Ferrious material halide lamp of the iron compared in the described luminescent metal of display inclosure and the thallium system metal halide lamp of inclosure thallium divides photodistributed chart.As can be seen from Figure 4, utilize these lamps, the ultraviolet of wavelength 300 ~ 400nm can be obtained.
Referring again to Fig. 1, Fig. 2, symbol 18 is the cooling blocks be made up of such as aluminium.The one side side of cooling block 18 abuts the reflecting plate 19 relative with top half side face of UV-lamp 100, is formed with multiple cooling fin 181 in another side side.Reflecting plate 19 by such as SUS (stainless steel) material, aluminium etc. as material.
In addition, between the back side of reflecting plate 19 and cooling block 18, be configured with the high component of heat conductivity (not shown), the heat of reflecting plate 19 more easily can be passed to cooling block 18, more high efficiency cooling can be realized thus.
As shown in Figure 5, in this example, reflecting plate 19 has cross section for such as Y=(1/170) X
2the reflector shape (cross section is parabolic shape) of function shape.Reflecting plate 19 is oppositely disposed with UV-lamp 100 at certain intervals, and it is parabolic shape in the cross section that the plane orthogonal with the axle of UV-lamp 100 presents.Again, its reflecting surface is for having diffusible reflecting surface.Being described an example of its surface state, such as, is the state shown in Fig. 6.Fig. 6 be amplify the reflecting plate of display shown in Fig. 5 by the key diagram of the region surface of arrow A indication.That is, the reflecting surface 61 that surface composition is surfacewise tiny becomes the surface of the state of diffusion into the light emitted.Thus, as shown in Figure 7 B, the ultraviolet scattered reflection on reflecting plate 19 is incided.Fig. 7 A, Fig. 7 B are the key diagrams comparing the display reflecting plate of comparative example and the ultraviolet reflection form of the reflecting plate shown in Fig. 5.The reflecting plate 19 with the reflecting surface 61 of such diffusion function can be formed by the punch process of such as mould.Again, also can be obtained by the embossing processing on surface.
When use aluminium as reflecting plate 19, as this surface imparting ultraviolet diffusible additive method, following such method can be adopted.As one of them, be there is the aluminium on the surface of implementing a mirror finish as base material, implement mallear stria processing on a surface or whitewash processing, being formed irregular concavo-convex.Or, also can not be formed irregular concavo-convex, but form the surface structure of the pattern according to regulation of such as cellular grade.
Again, as the reflecting plate 19 of another example, the evaporation layer by forming multiple layer metal oxide at glass surface also can be used to make it have the dichronic mirror of diffuse reflective especially to ultraviolet.Again, as the reflecting plate 19 of another example, the material that such as barium sulphate etc. also can be used to have a UV reflective is with thick particle diameter evaporation or the reflecting plate that sticks on glass surface or metal surface.
Referring again to Fig. 1, Fig. 2, cooling fin 181 plays the heat be easy to UV-lamp 100 occurs and dispels the heat, and makes the temperature of UV-lamp 100 not rise to the above effect of regulation.The lampshade 21 can accommodating UV-lamp 100 and reflecting plate 19 is formed in the downside of cooling block 18.
As shown in Figure 1 and Figure 2, the wall of the lampshade 21 relative with UV-lamp 100 is formed with the window portion 23 that the ultraviolet launched from UV-lamp 100 is passed through, this window portion 23 is provided with the ultraviolet short wavelength's sidelight cutoff filter 24 blocking such as below wavelength 320nm, and blocks the visible light of more than 400nm and ultrared long wavelength's sidelight cutoff filter 25.
When UV-lamp 100 electric discharge is lighted, the ultraviolet of wavelength 320 ~ 400nm irradiates the liquid crystal panel (processed substrate) as shone thing through short wavelength's sidelight cutoff filter 24 and long wavelength's sidelight cutoff filter 25.Thus, produce the chemical reaction of the photoreactivity material caused by ultraviolet, form oriented film.
In the upside of cooling block 18, the lamp direction of principal axis along UV-lamp 100 is configured with the part of cover 26 as cooling structure portion for covering cooling block 18.Be formed with suction inlet 27 in one end of the length direction of cover 26, be formed with blow vent 28 at the other end.Then, the aiutage 29 installing tubular makes it be communicated with blow vent 28.
One side of the high frequency output end of high frequency lamp device 500 is connected with an electrode 13a of UV-lamp 100 via supply lines 30a, wire 17a etc., and the opposing party of the high frequency output end of high frequency lamp device 300 is connected with another electrode 13b of UV-lamp 100 via supply lines 30b, wire 17b etc.When high frequency lamp device 500 is applied in power supply, HF voltage is applied between electrode 13a and electrode 13b, and ultraviolet can be made thus to produce in discharge space 11.
The intensity distributions in the Ultraviolet radiation face that the ultraviolet lamp shown in Fig. 1 irradiates by Fig. 8 and comparative example compare display.Here, the transverse axis " measuring point " of Fig. 8 represents the position on the straight line Z orthogonal with the length direction of reflecting plate 19 (with reference to Fig. 5) that get in the plane relative with reflecting plate 19.
As shown in Figure 8, this example is compared with comparative example, and the effect of the light diffusion function that the surface due to reflecting plate 19 has is all average intensity at the Zone Full of measuring point.
Therefore, the ultraviolet Line irradiation unit of this example can irradiate uniform ultraviolet to the liquid crystal panel (processed substrate) as shone thing, therefore can contribute to the yield rate improving liquid crystal panel manufacture.
Next, Fig. 9 is the arrangement plan (cross section diagram) further illustrating the ultraviolet lamp middle-ultraviolet lamp lamp 100 of example and the position relationship of reflecting plate 19.Below, the desired configuration relation of UV-lamp 100 and reflecting plate 19 is described.
As shown in Figure 9, reflecting plate 19 is central symmetry to both wings expansion with parabolic center axle, and the interval between its both wings is defined as A/F W.In addition, this reflecting plate 19 each cross section on the vertical direction of paper is all identical, and therefore parabolic center is defined as the parabolic center axle that extends to paper vertical direction.The full-size of the parabolical diagram above-below direction that the plane orthogonal with the direction of A/F W projects is defined as height H.Para-curve manifests minimum profile curvature radius R at parabolic center.And, generally on para-curve, define focus.Focus is defined as, and when the directional light comprising the light of the normal direction relative to parabolical center incides on reflecting plate 19, the reflected light of this directional light is concentrated on the point of a bit.Because reflecting plate 19 each cross section on the vertical direction of paper is all identical, therefore focus can be defined as the focal axis that extends to paper vertical direction.The luminous tubular axis of UV-lamp 100, as shown in the figure, is at least positioned at the plane comprising parabolic center axle and focal axis, parallel with these two axles.
Figure 10 illustrates the table respectively uniformity coefficient of the intensity in the Ultraviolet radiation face when minimum profile curvature radius R of the reflecting plate of the ultraviolet lamp of example and A/F W is changed being measured to obtained result.So-called uniformity coefficient refers to, the value degree of the intensity inequality in Ultraviolet radiation face quantized with the calculating formula specified, the lower then uniformity coefficient of numerical value [%] is better, and the higher then uniformity coefficient of numerical value [%] is poorer.Herein, use maximum intensity and minimum strength in Ultraviolet radiation face, obtain uniformity coefficient by calculating formula (maximum intensity-minimum strength)/(maximum intensity+minimum strength).In addition, here, what reflecting plate 19 adopted is that its surface is by embossing (emboss) finished reflecting plate.
In this mensuration, except limiting minimum profile curvature radius R, A/F W, also UV-lamp 100 is placed on wherein arbor distance from the position of parabolic center axle 55mm.Again, the diameter of UV-lamp 100 is 70mm.In addition, when parabolical A/F W, minimum profile curvature radius R are defined, parabolical height H is now uniquely determined.
As shown in Figure 10, intensity uniformity coefficient minimum profile curvature radius R be 85mm, A/F W be 230mm time for best.Therefore, under condition at this moment, parabolic center axle is 42.5mm to the distance of focal axis, and parabolical height H is 80mm.Because parabolic center axle to the distance of focal axis is 42.5mm, therefore the central shaft arrangement of UV-lamp 100 is in following such position, namely viewed from the parabolic center axle of reflecting plate 19 in the focal axis side of parabolic shape leaving reflecting plate 19, and the position inside the height being positioned at the parabolic shape of reflecting plate 19.When departing from this condition, such as luminous tubular axis compares focal axis when being positioned at parabolic center axle side, because the distance of reflecting plate 19 and lamp 100 is very near, therefore the thermal deformation of reflecting plate 19 easily occurs.Because this impact may cause uniformity coefficient to worsen.Again, when deviating to opposition side, when namely luminous tubular axis is positioned at outside the height of parabolic shape, reflected light is easily blocked by by lamp 100, and the utilization ratio of light declines, and therefore uniformity coefficient still can be deteriorated.
Figure 11 is the chart that situation when extracting that the A/F W of reflecting plate is 230mm in the table shown in Figure 10 is drawn.Figure 12 is the chart that situation when extracting that the minimum profile curvature radius R of reflecting plate is 85mm in the table shown in Figure 10 is drawn.In fig. 12, till being measured to W=300mm, this is because other restrictions spatially of device, can not be larger than this numerical value again.
From Figure 10 to Figure 12, in order to the uniformity coefficient of intensity is remained close to minimum, it can be made to meet be more than 82mm by parabolical minimum profile curvature radius R and below 88mm i.e. first condition and parabolical A/F W is more than 227mm and at least one party in two conditions forming of below 300mm i.e. second condition.If two conditions are all satisfied, then especially good.
In addition, in the mensuration that result is shown in Figure 10, what reflecting plate 19 adopted is the reflecting plate that its surface is processed by embossing, but in order to compare, have also been obtained use carry out such embossing processing before there is the reflecting plate of minute surface time result.Consequently, the uniformity coefficient of intensity is poor on the whole about 4%.Therefore, by making the reflecting surface of reflecting plate 19 have light diffusing, and the value of as described above parabolical minimum profile curvature radius R of reflecting plate 19 or the value of A/F W being limited, the particularly preferred reflecting plate of uniformity coefficient can be obtained.
Next, Figure 13 ~ Figure 15 is used to the figure of the ultraviolet lamp that another example of the present invention is described, Figure 13 is the longitdinal cross-section diagram that its basic structure is shown, Figure 14 is the longitdinal cross-section diagram of the direction of arrow of the B-Ba position shown in Figure 13, and Figure 15 is the partial enlarged drawing of the longitdinal cross-section diagram shown in Figure 14.In these figures, identical symbol is marked to the construct identical with the construct shown in the accompanying drawing illustrated.
In this example, in order to UV-lamp 100 be maintained set point of temperature (such as 850 DEG C) below, what its type of cooling adopted is water-cooled.This example is the same with the example illustrated with reference to Fig. 1, Fig. 2, also illustrates as follows for the structure with such as four UV-lamp 100.These four UV-lamp 100 are respectively with respective cooling unit 300.
Kept the interval of regulation by separator 91a, the 91b be installed on socket 16a, 16b of UV-lamp 100 between UV-lamp 100 and cooling unit 300.
Cooling unit 300 be have the cylindric material that there is ultraviolet permeability by quartz glass etc. form in pipe 31 and be located at the two-layer pipe of the outer tube 32 outside it.Wrap in UV-lamp 100 in interior pipe 31.
Its internal diameter of interior pipe 31 d1 of cooling unit 300 is such as 32mm, and outside diameter d 2 is such as 36mm, and the internal diameter d3 of outer tube 32 is such as 66mm, and outside diameter d 4 is such as 70mm.
In cooling unit 300, obtained the liquid coolant 34 of water etc. from outer loop by connecting pipe 33a, 33b of being located at the both ends of its periphery.That is, from the liquid coolant 34 that connecting pipe 33a side supplying temperature is low, liquid coolant 34 carries out cooling to UV-lamp 100 while mobile thus, and the liquid coolant 34 of heating is recovered from connecting pipe 33.Heating the liquid coolant 34 be recovered, by the cooling of not shown cooling device, are supplied to connecting pipe 33a side again.
Cut-off visible light and ultrared long wavelength's sidelight cutoff filter 93 is formed respectively at the outside surface of outer tube 32.Also according to circumstances, ultraviolet short wavelength's sidelight cutoff filter 92 that cut-off is unnecessary can be overlapped to form.
On the upside of the diagram of cooling unit 300, be configured with the reflecting plate 94 with reflecting surface, this reflecting surface has ultraviolet diffusivity.Reflecting plate 94 is such as the structure identical with the structure illustrated by reference Fig. 5, Fig. 6, Fig. 7 (b).
When UV-lamp 100 electric discharge is lighted, the ultraviolet of wavelength 320 ~ 400nm irradiates the liquid crystal panel (processed substrate) as shone thing through long wavelength's sidelight cutoff filter 93.Thus, produce the chemical reaction of the photoreactivity material caused by ultraviolet, form oriented film.
The ultraviolet of wavelength 320 ~ 400nm except from except UV-lamp 100 direct irradiation is on shone thing, also by being reached shone thing by reflecting plate 94 scattered reflection.The ultraviolet of the such superposition intensity on shone thing as already described, such as, in the distribution of good evenness as shown in Figure 8.Therefore, by being applicable to liquid crystal panel manufacture process, controlling oriented film can be formed uniformly well.
The ultraviolet Line irradiation unit of this example can irradiate uniform ultraviolet to the liquid crystal panel (processed substrate) as shone thing, therefore can contribute to the yield rate improving liquid crystal panel manufacture.In this example, owing to adopting the cooling unit 300 using liquid coolant 34, therefore cooling power is high, so UV-lamp 100 easily can be remained on set point of temperature (such as 850 DEG C) below, in such as device lifetime etc., has very large advantage.
Next, Figure 16 is the longitdinal cross-section diagram of the structure of the ultraviolet lamp briefly showing another example of the present invention.In the figure, to identical with the component shown in the accompanying drawing illustrated or be equivalent to identical component and mark identical symbol.As long as no the item that should add, just the description thereof will be omitted.
As shown in figure 16, this ultraviolet lamp is configured with eight UV-lamp 400 abreast in illustrated transverse direction, and each UV-lamp 400 is respectively with reflecting plate 410.The position relative with UV-lamp 400 of the opposition side of reflecting plate 410 is provided with optical filter 420.Then, the opposition side across optical filter 420 of UV-lamp 400 is the Ultraviolet radiation face of mounting shone thing.The diagram transverse width of this shadow surface is such as 1890mm, can be used in the manufacture of large-scale liquid crystal panel thus.
Even if the ultraviolet lamp of the king-sized shadow surface of such needs, also by being suitable for the technology identical with the technology illustrated by above-mentioned example, the ultraviolet of uniform strength can be irradiated.
The UV-lamp of each example described above is not limited to the metal halide lamp of illustrated such long arc, also can be the UV-lamp of flashlamp, dielectric barrier discharge lamp, electrodeless lamp etc.
The present invention is not limited to diagram herein and the specific form described, it comprises all any distortion done in the scope of claims.
Claims (5)
1. a ultraviolet lamp, is characterized in that, comprising:
UV-lamp, it is formed as tubulose by the material with ultraviolet permeability; With
Have the reflecting plate of diffusely reflecting surface, described reflecting plate and described UV-lamp are oppositely disposed, and the cross section being formed as presenting in the plane orthogonal with the axle of this UV-lamp is parabolic shape,
The described parabolic shape of described reflecting plate meets following first condition and second condition, described first condition is that minimum profile curvature radius R is more than 82mm and below 88mm, described second condition is that A/F W is more than 227mm and below 300mm, described A/F W refer to by from have minimum profile curvature radius point symmetry to both wings expansion the interconnective air line distance of end points.
2. ultraviolet lamp as claimed in claim 1, it is characterized in that, described UV-lamp is configured to, the described axle of described UV-lamp is positioned at following such position, namely viewed from the parabolic center axle of described reflecting plate, focal axis side is being left, and be positioned at by the point with described minimum profile curvature radius of the described parabolic shape by described reflecting plate and the position of wrapping symmetrically towards the triangle that the end points that described both wings are expanded is formed, described parabolic center axle refers to the axle with the point of minimum profile curvature radius of the described parabolic shape by described reflecting plate, described focal axis refers to the axle of the focus of the described parabolic shape by described reflecting plate.
3. ultraviolet lamp as described in claim 1 or 2, it is characterized in that also having cooling unit, described cooling unit is arranged on the opposition side of the side relative to described UV-lamp of described reflecting plate.
4. as described in claim 1 or 2 ultraviolet lamp, is characterized in that, also have be set to cover described UV-lamp, the water-cooled cooling unit of two-layer pipe.
5. ultraviolet lamp as described in claim 1 or 2, it is characterized in that, also there is short wavelength's sidelight cutoff filter and long wavelength's sidelight cutoff filter, both being arranged on the ultraviolet being irradiated to shone thing from described UV-lamp and described reflecting plate arrives in the space before this shone thing, the light of the short wavelength that described short wavelength's sidelight cutoff filter cutoff wavelength is shorter than this ultraviolet, described long wavelength's sidelight cutoff filter cutoff wavelength is than the light of the long wavelength of this ultraviolet line length.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009260062A JP2011107264A (en) | 2009-11-13 | 2009-11-13 | Uv ray irradiation device |
| JP2009-260062 | 2009-11-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102081262A CN102081262A (en) | 2011-06-01 |
| CN102081262B true CN102081262B (en) | 2015-09-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010555651.9A Expired - Fee Related CN102081262B (en) | 2009-11-13 | 2010-11-12 | Ultraviolet lamp |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2011107264A (en) |
| KR (1) | KR20110053183A (en) |
| CN (1) | CN102081262B (en) |
| TW (1) | TW201131263A (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289107A (en) * | 2011-07-01 | 2011-12-21 | 深圳市华星光电技术有限公司 | Device and method for making pretilt angle of liquid crystal panel |
| CN202794778U (en) * | 2012-08-20 | 2013-03-13 | 深圳市华星光电技术有限公司 | Liquid crystal alignment equipment |
| US9341951B2 (en) | 2012-12-21 | 2016-05-17 | Ultratech, Inc. | Wynn-dyson imaging system with reduced thermal distortion |
| CN103257481B (en) * | 2013-05-31 | 2015-09-30 | 深圳市华星光电技术有限公司 | Orientation ultraviolet liquid crystal irradiation unit, water cold sleeve |
| JP6349208B2 (en) * | 2014-09-09 | 2018-06-27 | 東京応化工業株式会社 | Ultraviolet irradiation apparatus, ultraviolet irradiation method, substrate processing apparatus, and manufacturing method of substrate processing apparatus |
| CN105689227B (en) * | 2016-03-19 | 2019-01-22 | 广州市龙珠化工有限公司 | A kind of rapidly coating paint line of rod-shaped utensil and coating process |
| KR101728980B1 (en) * | 2016-03-25 | 2017-04-20 | (주)쎄미시스코 | Apparatus for intense pulsed light sintering |
| FR3054326B1 (en) * | 2016-06-29 | 2022-07-15 | Valeo Comfort & Driving Assistance | IMAGE GENERATION DEVICE COMPRISING A THERMAL CONTACT ZONE AND ASSOCIATED HEAD-UP DISPLAY |
| KR101953442B1 (en) * | 2016-12-05 | 2019-02-28 | (주)쎄미시스코 | Apparatus for intense pulsed light sintering with water colorable |
| TWI825353B (en) * | 2019-10-07 | 2023-12-11 | 日商牛尾電機股份有限公司 | UV irradiation device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1831604A (en) * | 2005-09-07 | 2006-09-13 | 长兴化学工业股份有限公司 | Reflection chip with high light diffusion |
| CN101236321A (en) * | 2006-11-02 | 2008-08-06 | 哈利盛东芝照明株式会社 | Manufacturing device for liquid crystal display panel and manufacturing method of the same |
| CN101241207A (en) * | 2008-03-13 | 2008-08-13 | 长兴光学材料（苏州）有限公司 | Reflecting film |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87208844U (en) * | 1987-06-05 | 1988-03-30 | 赖克正 | Curved-surface-extending plane lamp chamber |
| JP2008116672A (en) * | 2006-11-02 | 2008-05-22 | Au Optronics Corp | Equipment and method for manufacturing liquid crystal panel |
-
2009
- 2009-11-13 JP JP2009260062A patent/JP2011107264A/en not_active Withdrawn
-
2010
- 2010-10-22 TW TW099136181A patent/TW201131263A/en unknown
- 2010-11-03 KR KR1020100108662A patent/KR20110053183A/en not_active Application Discontinuation
- 2010-11-12 CN CN201010555651.9A patent/CN102081262B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1831604A (en) * | 2005-09-07 | 2006-09-13 | 长兴化学工业股份有限公司 | Reflection chip with high light diffusion |
| CN101236321A (en) * | 2006-11-02 | 2008-08-06 | 哈利盛东芝照明株式会社 | Manufacturing device for liquid crystal display panel and manufacturing method of the same |
| CN101241207A (en) * | 2008-03-13 | 2008-08-13 | 长兴光学材料（苏州）有限公司 | Reflecting film |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011107264A (en) | 2011-06-02 |
| KR20110053183A (en) | 2011-05-19 |
| CN102081262A (en) | 2011-06-01 |
| TW201131263A (en) | 2011-09-16 |
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