CN102081262A - Ultraviolet irradiation device - Google Patents
Ultraviolet irradiation device Download PDFInfo
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- CN102081262A CN102081262A CN2010105556519A CN201010555651A CN102081262A CN 102081262 A CN102081262 A CN 102081262A CN 2010105556519 A CN2010105556519 A CN 2010105556519A CN 201010555651 A CN201010555651 A CN 201010555651A CN 102081262 A CN102081262 A CN 102081262A
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- lamp
- reflecting plate
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- 239000000463 material Substances 0.000 claims abstract description 17
- 238000001816 cooling Methods 0.000 claims description 29
- 230000035699 permeability Effects 0.000 claims description 4
- 230000003760 hair shine Effects 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 23
- 239000004973 liquid crystal related substance Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000002826 coolant Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000004049 embossing Methods 0.000 description 4
- 239000000284 extract Substances 0.000 description 4
- 229910052716 thallium Inorganic materials 0.000 description 4
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
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- 238000010438 heat treatment Methods 0.000 description 2
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- 230000001788 irregular Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- KPHWPUGNDIVLNH-UHFFFAOYSA-M diclofenac sodium Chemical compound [Na+].[O-]C(=O)CC1=CC=CC=C1NC1=C(Cl)C=CC=C1Cl KPHWPUGNDIVLNH-UHFFFAOYSA-M 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Abstract
The invention provides an ultraviolet irradiation device, which comprises an ultraviolet lamp and a reflection plate equipped with a diffusion reflection surface. The ultraviolet lamp made of UV-permeable material is formed into a tubular shape. The reflection plate is arranged opposite to the ultraviolet lamp. The cross section of the reflection plate is in a parabolic shape on the plane orthogonal to the axis of the ultraviolet lamp. The parabolic shape of the reflection plate meets at least one of the following two conditions: The first condition is that the minimum curvature radius r is greater than 82 mm and less than 88 mm. The second condition is that the opening width w is greater than 227 mm and less than 300 mm.
Description
Technical field
The present invention relates to a kind of for example towards the ultraviolet lamp to panel (processed substrate) irradiation ultraviolet radiation in making of the manufacturing of liquid crystal panel.
Background technology
In the manufacturing of liquid crystal panel, processed substrate liquid crystal is arranged and have photoreactive polymer body is enclosed in inside cools off, and from ultraviolet lamp to its irradiation ultraviolet radiation.Be provided with in the ultraviolet lamp and suppress the following ultraviolet wave filter that sees through of wavelength 340nm, by ultraviolet ray irradiation via this wave filter, make the polymer body reaction of the inside of processed substrate form relative portion (for example, with reference to JP2008-116672 (KOKAI).
In above-mentioned technology, in order to carry out the high-quality manufacturing of liquid crystal panel, it is very important at the oriented film of the direction orientation of regulation that controlled formation well makes liquid crystal.Though general use is to use cloth to wipe with to try " rubbing manipulation " of film, can exist dust to fall, adhere to dirt or because the problems such as semiconductor element breakage that static etc. cause processed substrate to have when being to use rubbing manipulation.
Therefore, the technology of rubbing manipulation instead, employing be on substrate, to form the photoreactivity material, make photoreactivity material chemical reaction so that it has the technology of orientating function by irradiation ultraviolet radiation.At this moment, such problem can take place: if to the ultraviolet ray generation intensity inequality of liquid crystal panel (processed substrate) irradiation, just can not controlledly be formed uniformly oriented film well.
Therefore, as the example that makes the uneven ultraviolet lamp that reduces of ultraviolet intensity, the ultraviolet lamp that for example has JPH8-225992 (KOKAI), WO2006/094220, JPH6-260295 (KOKAI) etc. to be disclosed.These devices adopt to make the reflecting plate of ultraviolet ray to the direction reflection of processed substrate, and are also putting down in writing in the document and preferably implementing certain processing in advance so that this reflecting surface has light diffusing in order to improve the intensity inequality.But,, especially on the manufacturing purposes of liquid crystal panel, go back the littler ultraviolet lamp of desired strength inequality even the Surface-micromachining process that adopts these documents to put down in writing is still limited on the alleviating of intensity inequality.
Summary of the invention
The object of the present invention is to provide a kind of can be to the ultraviolet ultraviolet lamp of the irradiation of large tracts of land more homogeneous intensity.
In order to solve above-mentioned problem, the ultraviolet lamp of an example of the present invention is characterized in that, comprising: UV-lamp, and it forms tubulose by the material with ultraviolet permeability; With reflecting plate with diffusely reflecting surface, described reflecting plate is relative with described UV-lamp to be disposed, and form with the axle plane orthogonal of this UV-lamp on the cross section that presents be parabolic shape, the described parabolic shape of described reflecting plate satisfies at least one side in two conditions being made up of following first condition and second condition, described first condition is that minimum profile curvature radius R is that 82mm is above and below the 88mm, described second condition is that A/F W is more than the 227mm and below the 300mm.
Adopt the present invention, can provide a kind of can be to the ultraviolet ultraviolet lamp of large tracts of land irradiation homogeneous intensity more.
Description of drawings
Fig. 1 is the longitdinal cross-section diagram of basic structure that the ultraviolet lamp of an example of the present invention is shown.
Fig. 2 is the longitdinal cross-section diagram of the direction of arrow of the A-Aa position shown in Fig. 1.
Fig. 3 is the structural drawing of the UV-lamp shown in the presentation graphs 1 slightly at length.
Fig. 4 is that Ferrious material halide lamp and thallium relatively are shown is the chart that the intensity beam split of metal halide lamp distributes.
Fig. 5 is the stereographic map of an example of the reflector shape of the reflecting plate shown in the key diagram 1.
Fig. 6 is the key diagram by the region surface of arrow A indication that amplify to show reflecting plate shown in Figure 5.
Fig. 7 A, Fig. 7 B are the key diagrams that relatively shows the ultraviolet reflection form of the reflecting plate of comparative example and reflecting plate shown in Figure 5.
Fig. 8 is with the chart shown in the intensity distributions of the ultraviolet shadow surface that ultraviolet lamp shone shown in Figure 1 and the comparative example comparison.
Fig. 9 is the arrangement plan (cross section diagram) that further specifies the position relation of the ultraviolet lamp middle-ultraviolet lamp lamp of example and reflecting plate.
Figure 10 is the table that uniformity coefficient that the intensity of the ultraviolet shadow surface when making that the minimum profile curvature radius R of reflecting plate of ultraviolet lamp of example and A/F W change is shown is respectively measured resulting result.
Figure 11 is the chart that the A/F W that extracts reflecting plate in the table shown in Figure 10 situation when being 230mm is drawn.
Figure 12 is the chart that the minimum profile curvature radius R that extracts reflecting plate in the table shown in Figure 10 situation when being 85mm is drawn.
Figure 13 is the longitdinal cross-section diagram of basic structure that the ultraviolet lamp of other examples of the present invention is shown.
Figure 14 is the longitdinal cross-section diagram of the direction of arrow of the B-Ba position shown in Figure 13.
Figure 15 is the partial enlarged drawing of longitdinal cross-section diagram shown in Figure 14.
Figure 16 is the longitdinal cross-section diagram of structure that briefly shows the ultraviolet lamp of another example of the present invention.
Symbol description
100 UV-lamp
200,300 cooling units
11 discharge spaces
12 luminotrons
13a, 13b electrode
14a, 14b inside conductor
15a, 15b metal forming
16a, 16b socket
17a, 17b lead
18 cooling blocks
181 cooling fins
19,94 reflecting plates
21 lampshades
23 window portions
24 short wavelength's sidelight cutoff filters
25,93 long wavelength's sidelight cutoff filters
26 covers
27 suction inlets
28 blow vents
29 aiutages
30a, 30b supply lines
61 reflectings surface
Pipe in 31
32 outer tubes
33a, 33b connecting pipe
34 liquid coolants.
Embodiment
(explanation of embodiment)
Embodiments of the invention describe with reference to accompanying drawing, but provide these accompanying drawings just for graphic purpose, in any case they are not used for limiting invention.
Below, be elaborated to implementing optimal morphology of the present invention with reference to accompanying drawing.
Fig. 1～Fig. 3 is the figure that is used for illustrating the ultraviolet lamp of an example of the present invention, Fig. 1 is the longitdinal cross-section diagram that its basic structure is shown, Fig. 2 is the longitdinal cross-section diagram of the direction of arrow of the A-Aa position shown in Fig. 1, and Fig. 3 is the structural drawing of the UV-lamp shown in the presentation graphs 1 slightly at length.
As shown in Figure 1 and Figure 2, this ultraviolet lamp for example has 4 UV-lamp 100 and cooling unit 200.
As shown in Figure 3, UV-lamp 100 is provided with the luminotron 12 with airtight discharge space 11, and this luminotron 12 is made by the quartz glass with ultraviolet permeability, and forms tubulose.Inside at the direction of principal axis two ends of this luminotron 12 disposes electrode 13a, the 13b of a pair of for example tungsten material.Luminotron 12 is that for example external diameter φ is that 27.5mm, wall thickness m are that 1.5mm, luminous long L are the mono-layer tube about 1800mm.
Electrode 13a, 13b are welded in the end of metal forming 15a, 15b respectively by inside conductor 14a, 14b.The other end of metal forming 15a, 15b is welded in an end of the outer conductor that figure do not show.The part of metal forming 15a, 15b is used for the luminotron between inside conductor 14a, 14b and the outer conductor 12 is heated and seals.
In addition, metal forming 15a, 15b so long as with the approaching material of coefficient of thermal expansion of the quartz glass that forms luminotron 12, any material can, in this employing is the thin plate that meets the molybdenum of this condition.The other end of the outer conductor that one end is connected with metal forming 15a, 15b respectively be electrically connected with the power supply of insulated enclosure in socket 16a, the 16b of for example ceramic lead 17a, 17b, and lead 17a, 17b is connected with the power circuit that figure does not show.
In discharge space 11, except the rare gas of the sufficient amount that is used for pilot arc discharge, also enclose by mercury, halogen and from the group of forming as iron, tin, indium, bismuth, thallium and the manganese of the metal that luminescence-utraviolet is used select at least a.Thus, can make the luminescence-utraviolet of wavelength 300～400nm.In addition, technically usually often with the border of wavelength 380nm, but, therefore it is expressed as easily " ultraviolet ray of wavelength 300～400nm " because what represent among the application is a continuous wavelength zone as ultraviolet light and visible light.
Fig. 4 shows that relatively the Ferrious material halide lamp of enclosing the iron in the described luminescent metal and the thallium of enclosing thallium are the chart of the intensity beam split distribution of metal halide lamp.As can be seen from Figure 4, utilize these lamps, can access the ultraviolet ray of wavelength 300～400nm.
Referring again to Fig. 1, Fig. 2, symbol 18 is cooling blocks of being made by for example aluminium.The one side side butt of cooling block 18 has the reflecting plate 19 relative with the top half cycle face of UV-lamp 100, is formed with a plurality of cooling fins 181 in the another side side.Reflecting plate 19 for example SUS (stainless steel) material, aluminium etc. as material.
In addition, between the back side of reflecting plate 19 and cooling block 18, dispose the high member of heat conductivity (not shown), the heat of reflecting plate 19 more easily can be passed to cooling block 18, can realize more high efficiency cooling thus.
As shown in Figure 5, in this example, reflecting plate 19 has the cross section and is for example Y=(1/170) X
2The reflector shape (cross section is a parabolic shape) of function shape.Reflecting plate 19 at certain intervals with UV-lamp 100 relative configurations, it is a parabolic shape in the cross section that the axle plane orthogonal with UV-lamp 100 presents.Again, its reflecting surface is for having diffusible reflecting surface.An example to its surface state describes, and for example is state shown in Figure 6.Fig. 6 is the key diagram by the region surface of arrow A indication that amplify to show reflecting plate shown in Figure 5.That is, the tiny reflecting surface 61 of curved surface combination surfacewise becomes the surface of the state of diffusion into the light emitted.Thus, shown in Fig. 7 B, incide the ultraviolet scattered reflection on the reflecting plate 19.Fig. 7 A, Fig. 7 B are the key diagrams that relatively shows the ultraviolet reflection form of the reflecting plate of comparative example and reflecting plate shown in Figure 5.Reflecting plate 19 with reflecting surface 61 of such diffusion function can form by the punch process of for example mould.Also can obtain by the embossing processing on surface again.
Using under the situation of aluminium as reflecting plate 19, give ultraviolet diffusible additive method as being used for to this surface, can adopt following such method.As one of them, be will have the surface of implementing a mirror finish aluminium as base material, on this surface, implement mallear stria processing or whitewash processing, form irregular concavo-convex.Perhaps, also can not form irregular concavo-convexly, but form the surface structure of the pattern according to the rules of for example cellular grade.
As the reflecting plate 19 of another example, also can use evaporation layer to make it have the dichronic mirror of scattered reflection especially to ultraviolet ray by form the multiple layer metal oxide at glass surface again.Again, as the reflecting plate 19 of another example, also can use material that barium sulphate etc. for example has a ultraviolet reflection with thick particle diameter evaporation or stick to glass surface or the metal surface on reflecting plate.
Referring again to Fig. 1, Fig. 2, cooling fin 181 plays the heat that is easy to UV-lamp 100 is taken place and dispels the heat, and makes the temperature of UV-lamp 100 not rise to the above effect of regulation.Downside at cooling block 18 is formed with the lampshade 21 that can accommodate UV-lamp 100 and reflecting plate 19.
As shown in Figure 1 and Figure 2, be formed with the window portion 23 that passes through from the ultraviolet ray of UV-lamp 100 emissions that makes on the wall of the lampshade 21 relative with UV-lamp 100, this window portion 23 is provided with blocks for example ultraviolet short wavelength's sidelight cutoff filter 24 below the wavelength 320nm, and blocks 400nm above visible light and ultrared long wavelength's sidelight cutoff filter 25.
When UV-lamp 100 discharges were lighted, the ultraviolet ray of wavelength 320～400nm saw through short wavelength's sidelight cutoff filter 24 and 25 pairs of liquid crystal panels as shone thing of long wavelength's sidelight cutoff filter (processed substrate) shine.Thus, produce chemical reaction, form oriented film by the photoreactivity material that ultraviolet ray caused.
At the upside of cooling block 18, dispose the cover 26 that covers cooling block 18 a part along the lamp direction of principal axis of UV-lamp 100 as cooling structure portion.End at the length direction of cover 26 is formed with suction inlet 27, is formed with blow vent 28 at the other end.Then, the aiutage 29 of installation tubular makes it be communicated with blow vent 28.
One side of the high frequency output terminal of high frequency lamp device 500 is connected with an electrode 13a of UV-lamp 100 via supply lines 30a, lead 17a etc., and the opposing party of the high frequency output terminal of high frequency lamp device 300 is connected with another electrode 13b of UV-lamp 100 via supply lines 30b, lead 17b etc.When high frequency lamp device 500 was applied in power supply, HF voltage was applied between electrode 13a and the electrode 13b, and ultraviolet ray is produced in discharge space 11.
Fig. 8 compares demonstration with the intensity distributions and the comparative example of the ultraviolet shadow surface that ultraviolet lamp shone shown in Figure 1.Here, the transverse axis of Fig. 8 " measuring point " is illustrated in the position on the straight line Z (with reference to Fig. 5) of that got and length direction quadrature reflecting plate 19 on the plane relative with reflecting plate 19.
As shown in Figure 8, this example is compared with comparative example, because the effect of the light diffusion function that the surface had of reflecting plate 19, all is average intensity at the Zone Full of measuring point.
Therefore, therefore the ultraviolet Line irradiation unit of this example can help to improve the yield rate that liquid crystal panel is made to liquid crystal panel (processed substrate) the irradiation ultraviolet ray uniformly as shone thing.
Next, Fig. 9 is the arrangement plan (cross section diagram) that further specifies the position relation of the ultraviolet lamp middle-ultraviolet lamp lamp 100 of example and reflecting plate 19.Below, the desired configuration of UV-lamp 100 and reflecting plate 19 relation is described.
As shown in Figure 9, reflecting plate 19 is that central authorities expand to both wings symmetrically with the para-curve central shaft, and the interval between its both wings is defined as A/F W.In addition, this reflecting plate 19 each cross section on the vertical direction of paper all is identical, so the para-curve center is defined as the para-curve central shaft that prolongs to the paper vertical direction.With the direction plane orthogonal of A/F W on the full-size of parabolical diagram above-below direction of projection be defined as height H.Para-curve manifests minimum profile curvature radius R at the para-curve center.And, generally on para-curve, define focus.Focus is defined as, and when comprising directional light with respect to the light of the normal direction at parabolical center and inciding on the reflecting plate 19, the reflected light of this directional light is concentrated on the point of a bit.Because reflecting plate 19 each cross section on the vertical direction of paper all is identical, so focus can be defined as the focal axis that prolongs to the paper vertical direction.The luminous tubular axis of UV-lamp 100 as shown in the figure, is positioned at the plane that comprises para-curve central shaft and focal axis at least, and is parallel with these two axles.
Figure 10 is the table that uniformity coefficient that the intensity of the ultraviolet shadow surface when making that the minimum profile curvature radius R of reflecting plate of ultraviolet lamp of example and A/F W change is shown is respectively measured resulting result.So-called uniformity coefficient is meant, with the value that the calculating formula of regulation quantizes the degree of the intensity inequality in the ultraviolet shadow surface, the low more then uniformity coefficient of numerical value [%] is good more, and the high more then uniformity coefficient of numerical value [%] is poor more., use maximum intensity and minimum strength in the ultraviolet shadow surface herein, obtain uniformity coefficient by calculating formula (maximum intensity-minimum strength)/(maximum intensity+minimum strength).In addition, here, what reflecting plate 19 adopted is that its surface is by the finished reflecting plate of embossing (emboss).
In this is measured, except limiting minimum profile curvature radius R, A/F W, also UV-lamp 100 is placed on wherein arbor distance from the position of para-curve central shaft 55mm.Again, the diameter of UV-lamp 100 is 70mm.In addition, at parabolical A/F W, when minimum profile curvature radius R is defined, parabolical height H is determined by unique.
As shown in figure 10, the uniformity coefficient of intensity minimum profile curvature radius R be 85mm, A/F W during for 230mm for best.Therefore, under the condition at this moment, the para-curve central shaft is 42.5mm to the distance of focal axis, and parabolical height H is 80mm.Because para-curve central shaft to the distance of focal axis is 42.5mm, therefore the central shaft arrangement of UV-lamp 100 is in following such position, promptly see focal axis one side, and be positioned at the position of height inboard of the parabolic shape of reflecting plate 19 at the parabolic shape that leaves reflecting plate 19 from the para-curve central shaft of reflecting plate 19.When departing from this condition, when for example luminous tubular axis is compared focal axis and is positioned at para-curve central shaft side, because the distance of reflecting plate 19 and lamp 100 is very near, therefore the thermal deformation of reflecting plate 19 takes place easily.Because this influence may cause uniformity coefficient to worsen.Again, when deviating to opposition side, when promptly luminous tubular axis was positioned at the height outside of parabolic shape, reflected light was blocked by lamp 100 easily, and the utilization ratio of light descends, so uniformity coefficient still can variation.
Figure 11 is the chart that the A/F W that extracts reflecting plate in the table shown in Figure 10 situation when being 230mm is drawn.Figure 12 is the chart that the minimum profile curvature radius R that extracts reflecting plate in the table shown in Figure 10 situation when being 85mm is drawn.In Figure 12, be measured to till the W=300mm, this is because of other restrictions on the space of device, can not be bigger than this numerical value again.
From Figure 10 to Figure 12 as can be known, for the uniformity coefficient with intensity remains near minimum, it is satisfied by parabolical minimum profile curvature radius R is to be that first condition and parabolical A/F W are to be at least one side in two conditions forming of second condition more than the 227mm and below the 300mm more than the 82mm and below the 88mm.If it is two conditions all satisfy, then especially good.
In addition, in the mensuration in the results are shown in Figure 10, what reflecting plate 19 adopted is the reflecting plate that its surface is processed by embossing, but in order to compare, also obtained using carry out such embossing first being processed have the reflecting plate of minute surface the time the result.Consequently, the uniformity coefficient of intensity is poor on the whole about 4%.Therefore, by making the reflecting surface of reflecting plate 19 have light diffusing, and the value of the as described above parabolical minimum profile curvature radius R of reflecting plate 19 or the value of A/F W limited, can obtain the good especially reflecting plate of uniformity coefficient.
Next, Figure 13～Figure 15 is the figure that is used for illustrating the ultraviolet lamp of another example of the present invention, Figure 13 is the longitdinal cross-section diagram that its basic structure is shown, Figure 14 is the longitdinal cross-section diagram of the direction of arrow of the B-Ba position shown in Figure 13, and Figure 15 is the partial enlarged drawing of longitdinal cross-section diagram shown in Figure 14.In these figure, to the formation thing mark identical symbol identical with the formation thing shown in the accompanying drawing that has illustrated.
In this example, for UV-lamp 100 being maintained below the set point of temperature (for example 850 ℃), what its type of cooling adopted is water-cooled.This example is with the same with reference to the example of Fig. 1, Fig. 2 explanation, and also the structure of four UV-lamp 100 is that example is carried out following explanation for example to have.These four UV-lamp 100 are respectively with separately cooling unit 300.
The interval that keeps regulation between UV-lamp 100 and the cooling unit 300 by separator 91a, 91b on the socket 16a, the 16b that are installed on UV-lamp 100.
In the cooling unit 300, connecting pipe 33a, the 33b at the both ends by being located at its periphery obtains the liquid coolant 34 of water etc. from outer loop.That is, from the low liquid coolant 34 of connecting pipe 33a side supplying temperature, liquid coolant 34 is cooled off on one side UV-lamp 100 on one side and is moved thus, and the liquid coolant 34 of heating is recovered from connecting pipe 33.Heating and the liquid coolant 34 that has been recovered are supplied to connecting pipe 33a side once more by not shown cooling device cooling.
Outside surface at outer tube 32 is formed with respectively by visible light and ultrared long wavelength's sidelight cutoff filter 93.Also can according to circumstances overlap to form by unnecessary ultraviolet short wavelength's sidelight cutoff filter 92.
At the diagram upside of cooling unit 300, dispose reflecting plate 94 with reflecting surface, this reflecting surface has ultraviolet diffusivity.Reflecting plate 94 for example is and reference Fig. 5, Fig. 6, the illustrated identical structure of structure of Fig. 7 (b).
When UV-lamp 100 discharges were lighted, the ultraviolet ray of wavelength 320～400nm saw through 93 pairs of liquid crystal panels as shone thing of long wavelength's sidelight cutoff filter (processed substrate) and shines.Thus, produce chemical reaction, form oriented film by the photoreactivity material that ultraviolet ray caused.
The ultraviolet ray of wavelength 320～400nm except from UV-lamp 100 direct irradiations on the shone thing, also reach shone thing by plate 94 scattered reflections that are reflected.The intensity of Die Jia ultraviolet ray on shone thing is such as already explained like this, for example is the distribution of good evenness as shown in Figure 8.Therefore, by being applicable to the liquid crystal panel manufacture process, can controlledly be formed uniformly oriented film well.
Therefore the ultraviolet Line irradiation unit of this example can help to improve the yield rate that liquid crystal panel is made to liquid crystal panel (processed substrate) the irradiation ultraviolet ray uniformly as shone thing.In this example, owing to adopt the cooling unit 300 that uses liquid coolant 34, therefore cooling power height so UV-lamp 100 easily can be remained on below the set point of temperature (for example 850 ℃), has very big advantage aspect for example device lifetime etc.
Next, Figure 16 is the longitdinal cross-section diagram of structure that briefly shows the ultraviolet lamp of another example of the present invention.In the figure, to identical with the member shown in the accompanying drawing that has illustrated or be equivalent to the identical symbol of identical member mark.The short of item that should add is just omitted its explanation.
As shown in figure 16, this ultraviolet lamp laterally disposes eight UV-lamp 400 abreast illustrated, and each UV-lamp 400 is respectively with reflecting plate 410.On the position relative of the opposition side of reflecting plate 410, be provided with optical filter 420 with UV-lamp 400.Then, the opposition side across optical filter 420 of UV-lamp 400 is the ultraviolet shadow surface of mounting shone thing.The diagram transverse width of this shadow surface for example is 1890mm, can be used in the manufacturing of large-scale liquid crystal panel thus.
Even if the ultraviolet lamp of so king-sized shadow surface of needs also can be by being suitable for the technology identical technology illustrated with above-mentioned example, the ultraviolet ray of irradiation uniform strength.
More than the UV-lamp of Shuo Ming each example is not limited to the metal halide lamp of illustrated such long arc, also can be the UV-lamp of flashlamp, dielectric barrier discharge lamp, electrodeless lamp etc.
The present invention is not limited to diagram herein and the specific form that illustrated, it has comprised all any distortion of being done in the scope of claims.
Claims (5)
1. a ultraviolet lamp is characterized in that, comprising:
UV-lamp, it forms tubulose by the material with ultraviolet permeability; With
Reflecting plate with diffusely reflecting surface, described reflecting plate is relative with described UV-lamp to be disposed, and form with the axle plane orthogonal of this UV-lamp on the cross section that presents be parabolic shape,
The described parabolic shape of described reflecting plate satisfies at least one side in two conditions being made up of following first condition and second condition, described first condition is that minimum profile curvature radius R is that 82mm is above and below the 88mm, described second condition is that A/F W is more than the 227mm and below the 300mm.
2. ultraviolet lamp as claimed in claim 1, it is characterized in that, described UV-lamp is configured to, the described axle of this UV-lamp is positioned at following such position, promptly see focal axis one side, and be positioned at the position of height inboard of the described parabolic shape of described reflecting plate at the described parabolic shape that leaves described reflecting plate from the para-curve central shaft of described reflecting plate.
3. as claim 1 or 2 described ultraviolet lamps, it is characterized in that also having cooling unit, described cooling unit is arranged on the opposition side of a relative side with described UV-lamp of described reflecting plate.
4. as claim 1 or 2 described ultraviolet lamps, it is characterized in that also having and be set to cover water-cooled cooling unit described UV-lamp, two-layer pipe.
5. as claim 1 or 2 described ultraviolet lamps, it is characterized in that, also have short wavelength's sidelight cutoff filter and long wavelength's sidelight cutoff filter, the both is arranged on the ultraviolet ray that shines shone thing from described UV-lamp and described reflecting plate and arrives in the space before this shone thing, the short wavelength's that described short wavelength's sidelight cutoff filter cutoff wavelength is shorter than this ultraviolet ray light, described long wavelength's sidelight cutoff filter cutoff wavelength is than the long wavelength's of this ultraviolet line length light.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009260062A JP2011107264A (en) | 2009-11-13 | 2009-11-13 | Uv ray irradiation device |
| JP2009-260062 | 2009-11-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102081262A true CN102081262A (en) | 2011-06-01 |
| CN102081262B CN102081262B (en) | 2015-09-09 |
Family
ID=44087308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010555651.9A Expired - Fee Related CN102081262B (en) | 2009-11-13 | 2010-11-12 | Ultraviolet lamp |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2011107264A (en) |
| KR (1) | KR20110053183A (en) |
| CN (1) | CN102081262B (en) |
| TW (1) | TW201131263A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289107A (en) * | 2011-07-01 | 2011-12-21 | 深圳市华星光电技术有限公司 | Device and method for making pretilt angle of liquid crystal panel |
| CN103257481A (en) * | 2013-05-31 | 2013-08-21 | 深圳市华星光电技术有限公司 | Orientation ultraviolet ray liquid crystal irradiating device and water-cooling sleeve pipe |
| WO2014029117A1 (en) * | 2012-08-20 | 2014-02-27 | 深圳市华星光电技术有限公司 | Liquid crystal alignment device |
| CN105689227A (en) * | 2016-03-19 | 2016-06-22 | 广州市龙珠化工有限公司 | Coating line for rapid coating of rod-shaped appliance and coating process |
| CN107228561A (en) * | 2016-03-25 | 2017-10-03 | 塞米西斯科株式会社 | Light sintering equipment |
| CN108146065A (en) * | 2016-12-05 | 2018-06-12 | 塞米西斯科株式会社 | It is capable of the light sintering equipment of water cooling |
| CN109844605A (en) * | 2016-06-29 | 2019-06-04 | 法雷奥舒适驾驶助手公司 | Video generation device and relevant head-up display including thermally contacting area |
| CN114342042A (en) * | 2019-10-07 | 2022-04-12 | 优志旺电机株式会社 | Ultraviolet irradiation device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9341951B2 (en) * | 2012-12-21 | 2016-05-17 | Ultratech, Inc. | Wynn-dyson imaging system with reduced thermal distortion |
| JP6349208B2 (en) * | 2014-09-09 | 2018-06-27 | 東京応化工業株式会社 | Ultraviolet irradiation apparatus, ultraviolet irradiation method, substrate processing apparatus, and manufacturing method of substrate processing apparatus |
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| JP2008116672A (en) * | 2006-11-02 | 2008-05-22 | Au Optronics Corp | Equipment and method for manufacturing liquid crystal panel |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289107A (en) * | 2011-07-01 | 2011-12-21 | 深圳市华星光电技术有限公司 | Device and method for making pretilt angle of liquid crystal panel |
| WO2013004053A1 (en) * | 2011-07-01 | 2013-01-10 | 深圳市华星光电技术有限公司 | Device, method, sample table and light source device for making pre-tilt angle of liquid crystal panel |
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| CN103257481A (en) * | 2013-05-31 | 2013-08-21 | 深圳市华星光电技术有限公司 | Orientation ultraviolet ray liquid crystal irradiating device and water-cooling sleeve pipe |
| WO2014190586A1 (en) * | 2013-05-31 | 2014-12-04 | 深圳市华星光电技术有限公司 | Alignment ultraviolet liquid crystal illumination device, water-cooling sleeving |
| CN103257481B (en) * | 2013-05-31 | 2015-09-30 | 深圳市华星光电技术有限公司 | Orientation ultraviolet liquid crystal irradiation unit, water cold sleeve |
| CN105689227A (en) * | 2016-03-19 | 2016-06-22 | 广州市龙珠化工有限公司 | Coating line for rapid coating of rod-shaped appliance and coating process |
| CN105689227B (en) * | 2016-03-19 | 2019-01-22 | 广州市龙珠化工有限公司 | A kind of rapidly coating paint line of rod-shaped utensil and coating process |
| CN107228561A (en) * | 2016-03-25 | 2017-10-03 | 塞米西斯科株式会社 | Light sintering equipment |
| CN107228561B (en) * | 2016-03-25 | 2019-11-19 | 塞米西斯科株式会社 | Light sintering equipment |
| CN109844605A (en) * | 2016-06-29 | 2019-06-04 | 法雷奥舒适驾驶助手公司 | Video generation device and relevant head-up display including thermally contacting area |
| CN108146065A (en) * | 2016-12-05 | 2018-06-12 | 塞米西斯科株式会社 | It is capable of the light sintering equipment of water cooling |
| CN108146065B (en) * | 2016-12-05 | 2020-05-12 | 塞米西斯科株式会社 | Light sintering device capable of being cooled by water |
| CN114342042A (en) * | 2019-10-07 | 2022-04-12 | 优志旺电机株式会社 | Ultraviolet irradiation device |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201131263A (en) | 2011-09-16 |
| KR20110053183A (en) | 2011-05-19 |
| CN102081262B (en) | 2015-09-09 |
| JP2011107264A (en) | 2011-06-02 |
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